CN101303522A - Colored filter with spacer, liquid crystal display device and method for making the same - Google Patents
Colored filter with spacer, liquid crystal display device and method for making the same Download PDFInfo
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- CN101303522A CN101303522A CNA2007100744026A CN200710074402A CN101303522A CN 101303522 A CN101303522 A CN 101303522A CN A2007100744026 A CNA2007100744026 A CN A2007100744026A CN 200710074402 A CN200710074402 A CN 200710074402A CN 101303522 A CN101303522 A CN 101303522A
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Abstract
The invention discloses a colorful optical filter base plate with fixed spacers and a manufacturing method thereof. The colorful optical filter comprises a transparent substrate, a colorful film layer, a latticed black matrix, a flat layer, a transparent electrode layer and a columnar spacer. Firstly, the well-known colorful optical filter base plate is coated with transparent photosensitive material and then exposed by a mask with preset patterns, after being treated by adopting micro-lithography, the transparent columnar or frustum-shaped spacers are directly formed on the colorful optical filter base plate; the central shafts of the spacers are perpendicular to the surface of the flat layer and corresponding to the intersection of gridlines of the black matrix. Since the spacers are directly formed on the colorful optical filter base plate and the height, distribution and density thereof are all preset and controllable, the liquid crystal thickness (CELL GAP) between LCD base plates can be kept uniform, thus avoiding arranging the spacers within a pixel to affect the porosity of LCD.
Description
[technical field]
The present invention relates to colored filter, LCD and preparation method thereof.
[background technology]
In LCD (LCD), liquid crystal layer is set between two substrates usually.Be directed to the LCD of TFT type, wherein be formed with first transparent electrode layer and TFT (Weimer triode) switch on first substrate, this first substrate is commonly called the TFT substrate.Be directed to the LCD of CSTN type, be formed with first transparent electrode layer on first substrate, this substrate then is called the white glass substrate.Be formed with the color rete and second transparent electrode layer that comprise a plurality of colour elements on second substrate, this second substrate is commonly called colored filter substrate.Colored filter is a critical component of realizing the LCD colorization.When first substrate and second substrate are combined,, need between two plate bases, sept to be set and supported for the thickness (this thickness is also referred to as CELL GAP) of controlling liquid crystal layer.
In the prior art, the spherical septs that adopt the method for dusting will have predetermined diameter are dispersed in first substrate or second substrate surface more.But this kind method is difficult to realize the even distribution of those septs on whole display plane.Can cause throughout in uneven thickness of liquid crystal layer like this, and can cause sept to flock together (claiming that also powder is poly-) part, thereby make bad display.And the position that in the process of spraying sept is disperseed can not be controlled, and causes that the part sept is inevasible to be set in the pixel, causes the porosity of LCD to reduce.
[summary of the invention]
Fundamental purpose of the present invention is to solve in the prior art LCD sept out of contior technical matters that distributes, and a kind of directly color filter making method of formation sept on substrate is provided, and makes the distributing position zone of sept controlled.
Another object of the present invention provides a kind of colored filter that has sept, and the LCD that has sept on the substrate, and the distributing position zone of this sept is controlled.
For achieving the above object, the invention provides a kind of color filter making method of interband parting, it may further comprise the steps:
A1, making colored filter substrate, described colored filter substrate comprises: transparent substrates, be attached to the color rete that includes a plurality of colour elements on the transparent substrates, between the sub-pixel of color rete, be used for the black matrix" of shading, be covered in the lip-deep flatness layer of color rete and black matrix" and be attached to transparent electrode layer on the flatness layer;
B1, on colored filter substrate, form photosensitive material layer;
C1, will by mask plate photosensitive material layer be exposed through the colored filter behind the step B1, be placed with a plurality of holes on the described mask plate, described hole through be provided for when exposure by light and make rayed on the photosensitive material layer and with corresponding zone, the position of black matrix" on;
D1, the colored filter after the exposure is carried out little shadow handle, on colored filter substrate, form the corresponding sept in position with black matrix".
Preferably, the photosensitive material layer among the step B1 is the transparent feel optical material layer.
As preferred version, the black-matrix layer of colored filter is latticed, hole among the step C1 on the mask plate is arranged on the corresponding position, mesh lines point of crossing of when exposure and black-matrix layer, correspondingly just is on the correspondence position of mesh lines point of crossing of black matrix" at the sept that forms on the substrate like this.
Further, pore shape is a rectangle on the mask plate, and its size is less than the size of the mesh lines point of crossing of black matrix"; And in step D1, the speed of concentration, temperature and little shadow by adjusting little shadow liquid is finely tuned the cross-sectional sizes of sept.
In wherein a kind of embodiment, in step B1, photosensitive material can be coated on the colored filter substrate by the mode of coating.
In the better implement mode, for make coating more even, make coating reach preset thickness, also colored filter is being carried out spin coating in coating on the colored filter substrate behind the photosensitive material.
Wherein, the overlay area of the photosensitive material layer that is coated with is greater than the graphics field of colored filter substrate.Scheme is the graph area field width 3～4mm of the overlay area of photosensitive material layer than colored filter substrate preferably.
In improved another kind of embodiment, for making photosensitive material better attached on the colored filter substrate, after steps A 1, before the step B1, also comprise the step that colored filter substrate is cleaned, further comprising the steps of after step B1, before the step C1: the colored filter that will be formed with photosensitive material layer toasts, and the temperature range of described baking is 80～120 ℃.
In further improved plan, further comprising the steps of after step D1: little movie queen's colored filter is toasted, and the temperature range of described baking is 200～250 ℃, and stoving time is 30-90 minute.
Correspondingly, the invention provides a kind of colored filter of interband parting, comprise colored filter substrate, described colored filter substrate comprises: transparent substrates, be attached to the color rete on the transparent substrates, between the sub-pixel of color rete, be used for the latticed black-matrix layer of shading, be attached to the flatness layer on color rete and the black-matrix layer, transparent electrode layer with being attached on the flatness layer is characterized in that: described colored filter also comprises column or the frustum sept that is attached on the flatness layer; The central shaft of described sept is perpendicular to the flatness layer surface, and the position of sept is corresponding with the band of position of the mesh lines point of crossing of black matrix".
For achieving the above object, the present invention also provides a kind of LCD, comprises opposed facing first substrate and colored filter substrate, is sealed with liquid crystal between described first substrate and the colored filter substrate; Described first substrate comprises first transparent substrates and first transparency electrode that is attached on first transparent substrates; Described colored filter substrate comprises second transparent substrates, be attached on second transparent substrates, pattern and the corresponding color rete of first transparency electrode, between the sub-pixel of color rete, be used for the latticed black matrix" of shading, be covered in the flatness layer on color rete and the black matrix" and be attached to second transparent electrode layer on the flatness layer; Between the described colored filter substrate and first substrate, be provided with column or frustum sept, described sept is perpendicular to the colored filter substrate and first substrate surface, and the band of position of the mesh lines point of crossing of black matrix" is corresponding on the position of described sept and the colored filter substrate.
For achieving the above object, the present invention also provides a kind of method for making of liquid crystal display substrate, may further comprise the steps:
A2, on transparent substrates, make transparent electrode layer;
B2, on the substrate that steps A 2 forms, form the transparent feel optical material layer;
C2, will expose to the transparent feel optical material layer by mask plate through the substrate behind the step B2, be placed with a plurality of holes on the described mask plate, described hole through be provided for when exposure by light and make rayed on the transparent feel optical material layer, it is corresponding that the described zone that is exposed is used for the position of mesh lines point of crossing of the black matrix" on substrate and colored filter assembling back and colored filter;
D2, the substrate after the exposure is carried out little shadow handle, on substrate, form sept.
The invention has the beneficial effects as follows:
(1) the present invention by etched mode colored filter substrate or with another substrate that colored filter substrate is faced mutually on form sept, in etching process, come the position of control interval thing formation by the position of the hole on the control mask plate, thereby sept can be evenly distributed, make the thickness of the liquid crystal between substrate can keep even, the poly-powder that the method for also having avoided dusting causes has improved brightness and the uniformity coefficient of LCD.
(2) position by the hole on the control mask plate can also be formed on the lighttight black matrix" The corresponding area by the control interval thing, avoids influencing the aperture opening ratio of LCD, has guaranteed the brightness of LCD.And sept adopts the transparent feel luminescent material to form, and light is not blocked basically, has further guaranteed the brightness of LCD.
(3) sept is arranged on corresponding position, black-matrix layer mesh lines point of crossing, helps the contraposition in the manufacture craft, further avoided influence pixel.
(4) by spin coating to photosensitive material, height that can the control interval thing, and owing to exposure, little shadow technology all are proven technique, by to control of process parameters in the micro-photographing process, the sectional area of control interval thing, shape easily, the parameter control when helping next step and forming liquid crystal panel.
[description of drawings]
Fig. 1 is known colorful filter structure synoptic diagram;
Fig. 2 is the colorful filter structure synoptic diagram of the specific embodiment of the invention;
Fig. 3 is the process chart of the specific embodiment of the invention;
Fig. 4 is the mask plate design partial schematic diagram of the specific embodiment of the invention;
Fig. 5 is the structural representation of liquid crystal indicator of the present invention.
[embodiment]
The present invention is described in further detail below in conjunction with the drawings and specific embodiments.
In embodiment one, the present embodiment sept is formed at colored filter substrate above, colored filter substrate can adopt existing various colored filter, existing colored filter normally by framework at a transparent SiO that is coated with
2On the glass substrate of film, the transparent flatness layer composition of on this transparency carrier, being furnished with in order to the black matrix" of shading and red rete, green rete, the blue rete arranged in certain sequence and being used to make flattening surface and playing a protective role.Existing a kind of typical colorful filter structure comprises that one is coated with SiO as shown in Figure 1
2The substrate of glass 14 of film, black-matrix layer 13, the color rete 12 that includes a plurality of colour elements, flatness layer 11, the electrode layer 10 that is carved with pattern are formed.Wherein black-matrix layer 13 is configured on substrate of glass 14 surfaces, and black-matrix layer is made up of the rectangle that intersects anyhow, forms the grid that exposes to the open air between the rectangle, with the part surface exposure with substrate.Color rete 12 is disposed in the middle of the grid.Flatness layer 11 is covered on color layer 12 and the black-matrix layer 13, and the electrode layer 10 that is carved with pattern is disposed on the flatness layer 11.
As shown in Figure 2 be that sept 15 is formed at the structure on as shown in Figure 1 the colored filter substrate.The sept 15 of column or frustum is attached on the flatness layer 11, the central shaft of sept 15 is perpendicular to flatness layer 11 surfaces, in order not influence light by pixel, the position of sept 15 is arranged on the top of black-matrix layer 13, the position that better scheme is a sept 15 is arranged on the top, formed zone, mesh lines point of crossing of black-matrix layer 13, and the size of sept 15 is less than the size in the formed zone, mesh lines point of crossing of black-matrix layer 13, and sept 15 adopts transparent material to make.
The above-mentioned color filter making method that has a sept as shown in Figure 3, specific implementation process comprises:
Step 1 provides colored filter substrate as shown in Figure 1, and this substrate is removed the foul that is attached to substrate surface through alkali lye cleaning, hairbrush cleaning, pure water cleaning, high-pressure spraying, air knife, infra-red drying (IR), ultraviolet ray (UV) after handling successively.Wherein alkali lye cleaning working concentration is 1～5% alkali lye, and pure water cleans the pure water that uses conductivity＜1%, and high-pressure spraying pressure is generally 8～10Mpa.
Step 2 is coated with the transparent feel luminescent material at the substrate surface of handling through step 1 in the mode that scraper is coated with.The transparent feel luminescent material can adopt transparent feel luminescent material of the prior art, for example transparent feel photopolymer resin.For satisfactory property that guarantees the coating of transparent feel luminescent material and the purpose that reaches the saving material, be advisable than substrate graph area field width 3～4mm with transparent feel luminescent material cover width in general scraper coating back.Certainly in this step, photosensitive material also can use translucent, opaque, and preferably clear photosensitive material of the present invention in case the figure aligning accuracy is not enough like this, when the figure off normal partly enters the color layer zone, can not cause too much influence to display effect.Coating also can be adopted other mode, and such as the SpinCoater mode, promptly masking liquid is dropped on glassly by glass substrate top nozzle, and then takes next step rotary coating mode to disperse photoresist.
Step 3, but be moved to the round turntable of high speed rotating by mechanical arm through the colored filter that is coated with the transparent feel luminescent material that step 2 is handled, substrate is fixed on the round turntable by the mode of vacuum suction, then, rotating disk carries out high speed rotating with the speed of setting, the transparent feel luminescent material of utilizing action of centrifugal force to make to coat substrate surface to around diffusion, thereby make the transparent feel luminescent material of substrate surface reach preset thickness.The setting of rotary speed generally will be determined according to the performance and the preset thickness value of transparent feel luminescent material.
Step 4, the colored filter of handling through step 3 is handled upside down into low-temperature bake equipment by mechanical arm, and purpose is to make transparent feel luminescent material preliminarily dried increase adhesion between itself and the substrate.The temperature of low-temperature bake is generally 80～120 ℃ in this step, and too high meeting causes between photosensitive material and substrate adhesion excessive, and it is too small to cross the low adhesion that can cause between photosensitive material and substrate, photosensitive material residual or peel off bad when causing micro-photographing process.
Step 5, the colored filter of handling through step 4 is handled upside down in the exposure device by delivery wheel, carry out uv-exposure by mask plate with predetermined pattern after, photochemical reaction can take place and form the commissure structure in the photosensitive material of exposure area.Mask plate used in this step has particular design.Be illustrated in figure 4 as the planimetric map of the mask plate that has predetermined hole, the zone that zone 2 is covered corresponding to the black-matrix layer 13 of the colored filter among Fig. 2 among the figure.The zone that zone 4 is covered corresponding to the color layer 12 of colored filter is also promptly corresponding to black-matrix layer 13 formed grids.Regional 3 corresponding to black-matrix layer 13 formed mesh lines cross-point region, zone 3 actual being included in the zone 2.Offer hole on zone 2, like this, the substrate that is coated with the transparent feel photopolymer resin can expose by the hole on this mask plate.The preferred mask plate of the present invention is designed to: in the position, mesh lines point of crossing corresponding to black-matrix layer 13, promptly hole is offered in the position in zone 3 among the figure.Because hole helps the aligning accuracy and the photosensitive material resolution of figure in position, mesh lines point of crossing, to the minimum that influences of viewing area.The size of hole is generally elected the area less than zone 2 as, for example is set to 9um*9um, to reduce the influence to the color pixel layer.The shape of hole can be square, also can be circular or other shape.
Step 6, the colored filter of handling through step 5 is handled upside down in a subtle way in the shadow equipment by delivery wheel, utilizes dissolution velocity different in little shadow liquid of exposure and territory, non-exposed area photosensitive material on the substrate, at substrate surface formation predetermined pattern.Little shadow liquid is generally inorganic weak bases, and the speed of the concentration by adjusting little shadow liquid, temperature, little shadow can realize the fine adjustments of pattern cross-sectional sizes.
Like this, the colored filter substrate that is coated with the transparent feel photopolymer resin by the mask board to explosure after little shadow be formed on column with certain altitude or frustum sept 15 on the black-matrix layer, the height of sept can be controlled by the spin coating making technology parameter of set-up procedure three, generally highly is controlled at 5.0 ± 0.5mm.
Step 7, the substrate of handling through step 6 with predetermined pattern is handled upside down into high-temperature baking equipment by delivery wheel, and purpose is to remove the materials such as solvent that remain in the photosensitive material, realizes the abundant sclerosis of photosensitive material.The temperature of high-temperature baking is generally 200～250 ℃, and stoving time is 30-90 minute, for example is set to 60 minutes.
Adopt density, position and cross sectional shape, the sectional area of the formed sept of this kind method all can to realize by the design that changes mask plate, can make column or the frustum that the cross section is circle or rectangle such as sept, the height of formed sept and the size of sectional area then can be finely tuned by the technological parameter of adjusting spin coating step and exposure, micro-photographing process.
After the formed colored filter of above step and another piece first substrate (for example TFT substrate or white glass) are combined and enclosing liquid crystal therein, can form a kind of liquid crystal indicator of the present invention.As shown in Figure 5, this liquid crystal indicator comprises opposed facing first substrate and colored filter substrate, is sealed with liquid crystal 18 by fluid sealant 19 between first substrate and the colored filter; First substrate comprises first transparent substrates 16, is attached to first transparency electrode 17 on first transparent substrates 16; Colored filter substrate comprises second transparent substrates 14, be attached on second transparent substrates 14, pattern and first transparency electrode, 17 corresponding color retes 12, between the sub-pixel of color rete 12, be used for the latticed black-matrix layer 13 of shading, be attached to the flatness layer 11 on color rete 12 and the black-matrix layer 13, be attached to second transparent electrode layer 10 on the flatness layer 11.And, this liquid crystal indicator also comprises column or the frustum sept 15 that directly is formed on the colored filter substrate, the central shaft of sept 15 is perpendicular to flatness layer 11 surface and corresponding to the position of the mesh lines point of crossing of black-matrix layer 13, and its top contacts with first substrate.For making things convenient for the orientation of liquid crystal molecule, also can on the outside surface of sept 15, flatness layer 11 and second transparent electrode layer 10, cover second oriented layer, on the outside surface of first transparent substrates 16 and first transparency electrode 17, cover first oriented layer.
Embodiment two, different with embodiment one be that sept is formed on the surface of first substrate of facing mutually with colored filter substrate.First substrate can adopt existing various TFT substrate or white glass substrate, and existing first substrate all comprises a transparent SiO that is coated with usually
2The glass substrate of film and the transparent electrode layer that is formed on the glass substrate adopt the method for making in the embodiment one, and sept is formed on glass substrate and the transparent electrode layer through exposure, little shadow.The position of sept regional corresponding with the black matrix" of colored filter after setting makes the assembling of first substrate and colored filter, the band of position of mesh lines point of crossing of black matrix" that is more preferably the position of sept and colored filter is corresponding.After first substrate and colored filter assembling, the top of sept contacts with colored filter.
Above content be in conjunction with concrete preferred implementation to further describing that the present invention did, can not assert that concrete enforcement of the present invention is confined to these explanations.For the general technical staff of the technical field of the invention, without departing from the inventive concept of the premise, can also make some simple deduction or replace, all should be considered as belonging to protection scope of the present invention.
Claims (14)
1. the color filter making method of an interband parting is characterized in that may further comprise the steps:
A1, making colored filter substrate, described colored filter substrate comprises: transparent substrates, be attached to the color rete that includes a plurality of colour elements on the transparent substrates, between the sub-pixel of color rete, be used for the black matrix" of shading, be covered in the lip-deep flatness layer of color rete and black matrix" and be attached to transparent electrode layer on the flatness layer;
B1, on colored filter substrate, form photosensitive material layer;
C1, will by mask plate photosensitive material layer be exposed through the colored filter behind the step B1, be placed with a plurality of holes on the described mask plate, described hole through be provided for when exposure by light and make rayed on the photosensitive material layer and with corresponding zone, the position of black matrix" on;
D1, the colored filter after the exposure is carried out little shadow handle, on colored filter substrate, form the corresponding sept in position with black matrix".
2. the color filter making method of interband parting as claimed in claim 1, it is characterized in that: described black matrix" is latticed, the hole on the mask plate described in the step C1 through be provided for when exposure by light and make rayed with the corresponding photosensitive material layer in the band of position of the mesh lines point of crossing of black matrix" on.
3. the color filter making method of interband parting as claimed in claim 2 is characterized in that: the photosensitive material layer among the described step B1 is the transparent feel optical material layer.
4. as the color filter making method of each described interband parting in the claim 1 to 3, it is characterized in that: the hole on the described mask plate is a rectangle, and the size of hole is less than the size of the mesh lines point of crossing of black matrix", in step D1, the speed of concentration, temperature and little shadow by adjusting little shadow liquid is finely tuned the cross-sectional sizes of sept.
5. the color filter making method of interband parting as claimed in claim 4 is characterized in that: in described step B1, form photosensitive material layer by the mode that is coated with on colored filter substrate.
6. the color filter making method of interband parting as claimed in claim 5 is characterized in that: also colored filter is being carried out spin coating behind the coating photosensitive material on the colored filter substrate.
7. the color filter making method of interband parting as claimed in claim 6 is characterized in that: in step B1, the overlay area of the photosensitive material layer of coating is greater than the graphics field of colored filter substrate.
8. the color filter making method of interband parting as claimed in claim 7 is characterized in that: the overlay area of described photosensitive material layer is than the graph area field width 3～4mm of colored filter substrate.
9. the color filter making method of interband parting as claimed in claim 5 is characterized in that:
After steps A 1, before the step B1, also comprise the step that colored filter substrate is cleaned;
Further comprising the steps of after step B1, before the step C1: the colored filter that will be formed with photosensitive material layer toasts, and the temperature range of described baking is 80～120 ℃.
10. the color filter making method of interband parting as claimed in claim 9, it is characterized in that: further comprising the steps of after step D1: little movie queen's colored filter is toasted, the temperature range of described baking is 200～250 ℃, and stoving time is 30-90 minute.
11. the colored filter of an interband parting, comprise colored filter substrate, described colored filter substrate comprises: transparent substrates, be attached to the color rete on the transparent substrates, between the sub-pixel of color rete, the latticed black matrix" that is used for shading, be covered in the lip-deep flatness layer of color rete and black matrix", with the transparent electrode layer that is attached on the flatness layer, it is characterized in that: described colored filter also comprises column or the frustum sept that is attached on the flatness layer, the central shaft of described sept is perpendicular to the flatness layer surface, and described sept is corresponding with the band of position of the mesh lines point of crossing of black matrix".
12. a LCD comprises opposed facing first substrate and colored filter substrate, is sealed with liquid crystal between described first substrate and the colored filter substrate; Described first substrate comprises first transparent substrates and first transparency electrode that is attached on first transparent substrates; Described colored filter substrate comprises second transparent substrates, be attached on second transparent substrates, pattern and the corresponding color rete of first transparency electrode, between the sub-pixel of color rete, be used for the latticed black matrix" of shading, be covered in the flatness layer on color rete and the black matrix" and be attached to second transparent electrode layer on the flatness layer; It is characterized in that: between the described colored filter substrate and first substrate, be provided with column or frustum sept, described sept is perpendicular to the colored filter substrate and first substrate surface, and the band of position of the mesh lines point of crossing of black matrix" is corresponding on the position of described sept and the colored filter substrate.
13. LCD as claimed in claim 12 is characterized in that: described sept is formed on the flatness layer of colored filter substrate, and the top of described sept contacts with first substrate; Perhaps described sept is formed on first substrate, and the top of described sept contacts with colored filter substrate.
14. the method for making of a liquid crystal display substrate is characterized in that: may further comprise the steps:
A2, on transparent substrates, make transparent electrode layer;
B2, on the substrate that steps A 2 forms, form the transparent feel optical material layer;
C2, will expose to the transparent feel optical material layer by mask plate through the substrate behind the step B2, be placed with a plurality of holes on the described mask plate, described hole through be provided for when exposure by light and make rayed on the transparent feel optical material layer, it is corresponding that the described zone that is exposed is used for the position of the black matrix" on substrate and colored filter assembling back and colored filter;
D2, the substrate after the exposure is carried out little shadow handle, on substrate, form sept.
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| CNA2007100744026A CN101303522A (en) | 2007-05-10 | 2007-05-10 | Colored filter with spacer, liquid crystal display device and method for making the same |
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| CNA2007100744026A CN101303522A (en) | 2007-05-10 | 2007-05-10 | Colored filter with spacer, liquid crystal display device and method for making the same |
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