CN102279488B - The method for making of colored optical filtering substrates and the exposure light shield of colored optical filtering substrates - Google Patents
The method for making of colored optical filtering substrates and the exposure light shield of colored optical filtering substrates Download PDFInfo
- Publication number
- CN102279488B CN102279488B CN201010196039.7A CN201010196039A CN102279488B CN 102279488 B CN102279488 B CN 102279488B CN 201010196039 A CN201010196039 A CN 201010196039A CN 102279488 B CN102279488 B CN 102279488B
- Authority
- CN
- China
- Prior art keywords
- optical filtering
- colored optical
- spacer
- filtering substrates
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Landscapes
- Optical Filters (AREA)
Abstract
The invention discloses a kind of method for making of colored optical filtering substrates and the exposure light shield of colored optical filtering substrates, even achieve the effect that thin clearances post shapes also can obtain abundant correction.Its technical scheme is: method comprises: form shielding pattern layer on the transparent substrate; The surface not forming shielding pattern layer on the transparent substrate forms the chromatic filter layer covering rgb light resistance; Shielding pattern layer and chromatic filter layer form transparency conducting layer; Form spacer, use the exposure light shield with spacer pattern in the exposure process forming spacer, wherein spacer pattern is the part adding protuberance and remove the limit of polygon pattern on the angle of polygon pattern.
Description
Technical field
The present invention relates to a kind of method for making of colored optical filtering substrates of liquid crystal indicator, particularly relate to and correction is carried out with the method for making of the colored optical filtering substrates of the liquid crystal indicator of the actual shaping form and design shape compatibility that improve spacer to spacer shape.
Background technology
Liquid crystal indicator, because of its portability and excellent display performance, not only in information communication device field, and achieves in general electric equipment field and popularizes fast.This type of liquid crystal indicator generally comprises: the array base palte the first transparency carrier being designed to have rectangular multiple pixel electrodes, and the second transparency carrier is designed to have the pixel electrode of corresponding array base palte and multiple optical filtering pixel of arranging and is covered in the colored optical filtering substrates of the counter electrode in optical filtering pixel.Surrounding's encapsulant laminating of the pixel electrode of array base palte and the counter electrode of colored optical filtering substrates, forms liquid crystal indicator after finally injecting liquid crystal between two substrates.
Between the pixel electrode and the counter electrode of colored optical filtering substrates of array base palte, be provided with spacer, play the effect of support and fixing two substrates spacing.Please participate in Fig. 1 and Fig. 2 simultaneously, the main fabrication processing of colored optical filtering substrates is: first form shielding pattern layer 11 (being called BM layer) with black resin material on the transparent substrate 10, then at the upper chromatic filter layer 12 (referred to as RGB layer) forming the resistance of covering rgb light of the peristome (position beyond shielding pattern layer 11) of transparency carrier 10, then form transparency conducting layer 13 (referred to as ITO layer) thereon, finally form spacer 14.
Previously separating ball (SpacerBall) is generally adopted to come interval first transparency carrier and the second transparency carrier.This function of separating ball replaced by the columnar interval element (PhotoSpacer, referred to as PS) of planting on the second transparency carrier gradually afterwards.Spacer PS can have a great impact the performance of final finished as the tie directly connecting the first transparency carrier and the second transparency carrier.
Transparency carrier mainly contains two aspects for the requirement of spacer PS: one is its height, and two is its global shapes.Spacer PS in the industry mostly generally is circular and square (comprising various polygon), and multiplex pigment dispersion method is formed, and namely forms spacer on the transparent substrate by coating, exposure, development.If but the shape of spacer PS is directly designed to square, due to the factor such as reflection diffraction of light in exposure process, the actual spacer PS formed mostly is circular or oval.
In the prior art, existed and adopted the mask set pattern of optical nearing penalty method to spacer PS to carry out correction, be generally carry out correction in the corner of squared design pattern, the compatibility of PS layout and actual shaping form can be improved.As shown in Figure 2, wherein the left side is the mask set pattern of spacer, and the right is the actual shaping form of correction effect.The correction effect of this traditional optical nearing penalty method be have circumscribed, along with spacer PS size constantly reduces, on light transmission light shield during small orifices diffraction diffraction impact strengthen, make the limitation of optical nearing penalty method day by day obvious.Even if carried out correction, on the spacer PS obtained, Bottom Shape has still leveled off to circle or ellipse.
Summary of the invention
The object of the invention is to solve the problem, provide a kind of method for making of colored optical filtering substrates, even achieve the effect that thin clearances post shapes also can obtain abundant correction.
Another object of the present invention is to the exposure light shield providing a kind of colored optical filtering substrates, in the exposure process that in making, relevant spacer is formed, guarantee that the true form of the last spacer formed conforms to design shape for colored optical filtering substrates.
Technical scheme of the present invention is: the method for making that present invention is disclosed a kind of colored optical filtering substrates, comprising:
(1) shielding pattern layer is formed on the transparent substrate;
(2) surface not forming shielding pattern layer on the transparent substrate forms the chromatic filter layer covering rgb light resistance;
(3) in shielding pattern layer and chromatic filter layer, transparency conducting layer is formed;
(4) form spacer, use the exposure light shield with spacer pattern in the exposure process forming spacer, wherein spacer pattern is the part adding protuberance and remove the limit of polygon pattern on the angle of polygon pattern.
According to an embodiment of the method for making of colored optical filtering substrates of the present invention, polygon pattern is regular polygon pattern.
According to an embodiment of the method for making of colored optical filtering substrates of the present invention, the size of this spacer pattern is 5 ~ 20 μm.
According to an embodiment of the method for making of colored optical filtering substrates of the present invention, be the exposure process using proximity exposure machine to complete spacer in step (4), wherein exposing clearance is 150 ~ 200 μm.
According to an embodiment of the method for making of colored optical filtering substrates of the present invention, step (4) forms spacer by pigment dispersion method.
According to an embodiment of the method for making of colored optical filtering substrates of the present invention, step (4) forms spacer by transfer printing.
According to an embodiment of the method for making of colored optical filtering substrates of the present invention, the shape of this protuberance comprises square, circular, oval or irregular figure.
According to an embodiment of the method for making of colored optical filtering substrates of the present invention, the shape of this removal part comprises square, circular, oval or irregular figure.
The present invention discloses a kind of exposure light shield of colored optical filtering substrates in addition, and with spacer pattern, wherein spacer pattern is the part adding protuberance and remove the limit of polygon pattern on the angle of polygon pattern.
According to an embodiment of the exposure light shield of colored optical filtering substrates of the present invention, polygon pattern is regular polygon pattern.
According to an embodiment of the exposure light shield of colored optical filtering substrates of the present invention, the size of this spacer pattern is 5 ~ 20 μm.
According to an embodiment of the exposure light shield of colored optical filtering substrates of the present invention, this exposure light shield is arranged in proximity exposure machine, and wherein exposing clearance is 150 ~ 200 μm.
According to an embodiment of the exposure light shield of colored optical filtering substrates of the present invention, the shape of this protuberance comprises square, circular, oval or irregular figure.
According to an embodiment of the exposure light shield of colored optical filtering substrates of the present invention, the shape of this removal part comprises square, circular, oval or irregular figure.
The present invention contrasts prior art following beneficial effect: the present invention, by improving the spacer pattern of exposure light shield, does not adopt in traditional optical nearing penalty method and only on polygonal angle, adds protuberance.For minute sized spacer PS (length of side is less than 20 μm), on light transmission light shield, during small orifices, the impact of diffraction diffraction is strengthened, and makes the limitation of optical nearing penalty method day by day obvious.Spacer pattern of the present invention, except adding except protuberance on polygonal angle, also eliminates the part on each limit on polygon.By this shape correction method of the present invention, even small PS pattern, sufficient correction effect also can be reached.
Accompanying drawing explanation
Figure 1A and 1B is the structural drawing of colored optical filtering substrates.
Fig. 2 adopts traditional exposure light shield of optical nearing penalty method and the schematic diagram of the actual shaping of spacer thereof.
Fig. 3 is the schematic diagram of foursquare exposure light shield preferred embodiment of the present invention and the actual shaping of spacer thereof.
Fig. 4 is the schematic diagram of the shape of other embodiments of foursquare exposure light shield of the present invention.
Fig. 5 is the embodiment of the exposure light shield of equilateral triangle of the present invention and the schematic diagram of the actual shaping of spacer thereof.
Fig. 6 is the embodiment of orthohexagonal exposure light shield of the present invention and the schematic diagram of the actual shaping of spacer thereof.
Embodiment
Below in conjunction with drawings and Examples, the invention will be further described.
Usually, the fabrication processing of colored optical filtering substrates is divided into four steps.
First step forms shielding pattern layer on the transparent substrate.
Presented here is the realization of pigment dispersion method: in this first step, first photosensitive compoistion (photoresistance) is used to form certain thickness by slot coated on the glass substrate, then after using heat dish to carry out the heating (thermal pretreatment) of 90 degrees Celsius, 120 seconds, use and the proximity exposure machine of high-pressure mercury-vapor lamp and the light shield with assignment graph are housed, at 60mJ/cm
2, exposure GAP200 μm condition exposure.After this development is implemented with conveyance type developing apparatus, namely potassium hydroxide system developer solution CDK-1 be 1.0% concentration developer solution (CDK-11 part, pure water be 99 parts of dilution proportion liquid, 23 DEG C), hydraulic pressure is set in 0.2MPa, development 60 seconds, then with pure water cleaning, the shielding pattern layer BM after developing is obtained.Then carry out the baking process of 40 minutes with the baking oven of 220 DEG C, define shielding pattern layer.
Second step is that the surface (being referred to as peristome) not forming shielding pattern layer on the transparent substrate forms the chromatic filter layer covering rgb light resistance.
In this step, its implementation procedure is identical with first step substrate, and unique difference is: be the photoresistance replacing BM to be formed with red, green, blue light resistance in the realization of pigment dispersion method.
3rd step forms transparency conducting layer in shielding pattern layer and chromatic filter layer.
Transparency conducting layer ITO (IndiumTinOxide) is formed by sputtering way on red pixel, green pixel and blue pixel and BM.
4th step forms spacer.
The formation of spacer can be realized by pigment dispersion method or transfer printing.In pigment dispersion method, roughly include coating, exposure and development three process.The present invention improves the exposure light shield in exposure process.As shown in Figure 3, original spacer pattern of light shield is square pattern (pattern) to the preferred mode that exposure light shield improves, and each additional protuberance on four angles of square pattern, protuberance is square in figure 3.Further, the four edges of square pattern respectively removes a part, the shape of removal part is the rectangle shown in Fig. 3, and the spacer pattern of the final light shield formed is exactly the shape on Fig. 3 left side.The size of spacer pattern is less, is generally the scope at 5 ~ 20 μm.And in the exposure process of spacer pattern, typically using proximity exposure machine (ProximityExposure), exposing clearance (namely light shield is to the spacing of substrate) is generally the scope at 150 ~ 200 μm.Other operations are identical with traditional approach, and the shape of the spacer made like this is square on the right of Fig. 3, and that is actual pattern comparatively conforms to layout.
It should be noted that, the protuberance added and the shape of removal part are all arbitrary, other shape has been enumerated in addition in Fig. 4, protuberance can be other irregular figures such as the part in the combination of square, circular, oval, multiple figure or figure, and removal part also can be other irregular figures such as the part in the combination of square, circular, oval, multiple figure or figure.
More expand, the present embodiment is for square original pattern, and in fact spacer pattern can be arbitrary polygon, certainly realizes effect and is preferably regular polygon, the square especially in the present embodiment.It is amendment based on equilateral triangle that Fig. 5 shows spacer pattern, and it is based on orthohexagonal amendment that Fig. 6 shows spacer pattern.In fig. 5 and fig., the left side is all shapes of the spacer pattern of light shield, and the right is all the shapes of the spacer made after the correction of correspondence.
Except above-mentioned pigment dispersion method forms spacer, spacer can also be formed by transfer printing.Transfer printing and pigment dispersion method are different at coating process, and transfer printing transfer film instead of photoresistance are coated with, and the above-mentioned exposure light shield being applied to pigment dispersion method still can be used in transfer printing.
Above-described embodiment is available to those of ordinary skill in the art to realize or uses of the present invention; those of ordinary skill in the art can be without departing from the present invention in the case of the inventive idea; various modifications or change are made to above-described embodiment; thus protection scope of the present invention not limit by above-described embodiment, and should be the maximum magnitude meeting the inventive features that claims are mentioned.
Claims (14)
1. a method for making for colored optical filtering substrates, comprising:
(1) shielding pattern layer is formed on the transparent substrate;
(2) surface not forming shielding pattern layer on the transparent substrate forms the chromatic filter layer covering rgb light resistance;
(3) in shielding pattern layer and chromatic filter layer, transparency conducting layer is formed;
(4) form spacer, use the exposure light shield with spacer pattern in the exposure process forming spacer, wherein spacer pattern is the part adding protuberance and remove the limit of polygon pattern on the angle of polygon pattern.
2. the method for making of colored optical filtering substrates according to claim 1, is characterized in that, polygon pattern is regular polygon pattern.
3. the method for making of colored optical filtering substrates according to claim 1, is characterized in that, the size of this spacer pattern is 5 ~ 20 μm.
4. the method for making of colored optical filtering substrates according to claim 1, is characterized in that, be the exposure process using proximity exposure machine to complete spacer in step (4), wherein exposing clearance is 150 ~ 200 μm.
5. the method for making of colored optical filtering substrates according to claim 1, is characterized in that, step (4) forms spacer by pigment dispersion method.
6. the method for making of colored optical filtering substrates according to claim 1, is characterized in that, step (4) forms spacer by transfer printing.
7. the method for making of colored optical filtering substrates according to claim 1, is characterized in that, the shape of this protuberance comprises square, circular, oval or irregular figure.
8. the method for making of colored optical filtering substrates according to claim 1, is characterized in that, the shape of this removal part comprises square, circular, oval or irregular figure.
9. an exposure light shield for colored optical filtering substrates, with spacer pattern, wherein spacer pattern is the part adding protuberance and remove the limit of polygon pattern on the angle of polygon pattern.
10. the exposure light shield of colored optical filtering substrates according to claim 9, is characterized in that, polygon pattern is regular polygon pattern.
The exposure light shield of 11. colored optical filtering substrates according to claim 9, is characterized in that, the size of this spacer pattern is 5 ~ 20 μm.
The exposure light shield of 12. colored optical filtering substrates according to claim 9, is characterized in that, this exposure light shield is arranged in proximity exposure machine, and wherein exposing clearance is 150 ~ 200 μm.
The exposure light shield of 13. colored optical filtering substrates according to claim 9, is characterized in that, the shape of this protuberance comprises square, circular, oval or irregular figure.
The exposure light shield of 14. colored optical filtering substrates according to claim 9, is characterized in that, the shape of this removal part comprises square, circular, oval or irregular figure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010196039.7A CN102279488B (en) | 2010-06-08 | 2010-06-08 | The method for making of colored optical filtering substrates and the exposure light shield of colored optical filtering substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010196039.7A CN102279488B (en) | 2010-06-08 | 2010-06-08 | The method for making of colored optical filtering substrates and the exposure light shield of colored optical filtering substrates |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102279488A CN102279488A (en) | 2011-12-14 |
| CN102279488B true CN102279488B (en) | 2015-12-09 |
Family
ID=45105022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010196039.7A Active CN102279488B (en) | 2010-06-08 | 2010-06-08 | The method for making of colored optical filtering substrates and the exposure light shield of colored optical filtering substrates |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102279488B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111274844B (en) * | 2018-12-04 | 2023-04-07 | 世界先进积体电路股份有限公司 | Semiconductor device and method of forming the same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101246230A (en) * | 2007-12-18 | 2008-08-20 | 深圳南玻伟光导电膜有限公司 | Semi-permeable colorful color filter |
| CN101276011A (en) * | 2007-03-27 | 2008-10-01 | 奇美电子股份有限公司 | Colorful optical filter and manufacturing method thereof |
| CN101303522A (en) * | 2007-05-10 | 2008-11-12 | 比亚迪股份有限公司 | Colored filter with spacer, liquid crystal display device and method for making the same |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101182314B1 (en) * | 2005-10-19 | 2012-09-20 | 엘지디스플레이 주식회사 | Liquid Crystal Display Device and Method for Manufacturing the Same |
-
2010
- 2010-06-08 CN CN201010196039.7A patent/CN102279488B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101276011A (en) * | 2007-03-27 | 2008-10-01 | 奇美电子股份有限公司 | Colorful optical filter and manufacturing method thereof |
| CN101303522A (en) * | 2007-05-10 | 2008-11-12 | 比亚迪股份有限公司 | Colored filter with spacer, liquid crystal display device and method for making the same |
| CN101246230A (en) * | 2007-12-18 | 2008-08-20 | 深圳南玻伟光导电膜有限公司 | Semi-permeable colorful color filter |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102279488A (en) | 2011-12-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9360700B2 (en) | Half-transmitting and half-reflecting color film substrate, manufacture method thereof and liquid crystal display device | |
| CN102023406B (en) | Liquid crystal display panel and method for producing same | |
| CN103033981B (en) | Colored filter substrate and manufacture method thereof and liquid crystal panel | |
| CN104297978B (en) | A kind of preparation method of display base plate, the preparation method of display device | |
| CN104678639A (en) | Method for manufacturing color filter substrate | |
| CN105867010B (en) | Color membrane substrates and preparation method thereof | |
| CN106200104B (en) | A kind of color membrane substrates and preparation method thereof and display panel | |
| CN103293746B (en) | A kind of liquid crystal indicator and preparation method thereof | |
| CN104698521B (en) | Color filter sheet, manufacturing method for color filter sheet and liquid crystal display device | |
| CN102681068A (en) | Colored filter and manufacturing method thereof | |
| CN101398570A (en) | LCD device and method for manufacturing same | |
| CN104865735A (en) | Color film substrate and manufacturing method thereof and liquid crystal display panel | |
| CN104614931B (en) | Mask plate and the method and color membrane substrates for manufacturing color membrane substrates | |
| CN106501989A (en) | A kind of substrate and preparation method thereof | |
| CN103901659B (en) | Filter, liquid crystal indicator for IPS mode liquid crystal display panel | |
| US20190265544A1 (en) | Mask plate, display substrate and method for manufacturing the same, display panel and display device | |
| CN105116650B (en) | Liquid crystal display panel | |
| CN108363233A (en) | Colored filter substrate and preparation method thereof | |
| CN103149730A (en) | Color film substrate and manufacturing method thereof, as well as liquid crystal display screen | |
| CN202141873U (en) | Color filter and liquid crystal display panel | |
| CN108153040A (en) | The production method of black matrix" and spacer | |
| WO2014139221A1 (en) | Method for manufacturing color filter substrate, color filter substrate, and display device | |
| TW200905262A (en) | Color filter substrate and manufacturing thereof and liquid crystal display panel | |
| CN102129136A (en) | Color filter substrate structure of liquid crystal display and manufacturing method thereof | |
| CN103901658A (en) | Light filter plate for liquid crystal display panel in IPS (in-plane switching) mode and liquid crystal display device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C53 | Correction of patent for invention or patent application | ||
| CB02 | Change of applicant information |
Address after: 201108 Shanghai city Minhang District Huaning road 3306 Lane 160 Applicant after: INESA DISPLAY MATERIALS CO., LTD. Address before: 201108 Shanghai city Minhang District Huaning road 3306 Lane 160 Applicant before: SAV Fushi Photoelectric Material Co., Ltd. |
|
| COR | Change of bibliographic data |
Free format text: CORRECT: APPLICANT; FROM: SVA-FUJIFILM OPTO-ELECTRONIC MATERIALS CO., LTD. TO: SHANGHAI INSTRUMENT DISPLAY MATERIAL CO., LTD. |
|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |