CN109521608A - Display and method of manufacturing the same - Google Patents
Display and method of manufacturing the same Download PDFInfo
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- CN109521608A CN109521608A CN201811586703.1A CN201811586703A CN109521608A CN 109521608 A CN109521608 A CN 109521608A CN 201811586703 A CN201811586703 A CN 201811586703A CN 109521608 A CN109521608 A CN 109521608A
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- spacer
- substrate
- display
- finishing coat
- light
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- 125000006850 spacer group Chemical group 0.000 claims abstract description 180
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- 238000000034 method Methods 0.000 claims abstract description 81
- 230000008569 process Effects 0.000 claims abstract description 35
- 230000004048 modification Effects 0.000 claims abstract description 17
- 238000012986 modification Methods 0.000 claims abstract description 17
- 238000012545 processing Methods 0.000 claims description 43
- 238000006243 chemical reaction Methods 0.000 claims description 39
- 230000000903 blocking effect Effects 0.000 claims description 22
- 238000004132 cross linking Methods 0.000 claims description 21
- 229910010272 inorganic material Inorganic materials 0.000 claims description 17
- 239000011147 inorganic material Substances 0.000 claims description 17
- 238000006479 redox reaction Methods 0.000 claims description 12
- 238000000059 patterning Methods 0.000 claims description 11
- 238000002834 transmittance Methods 0.000 claims description 11
- 239000011159 matrix material Substances 0.000 claims description 8
- 239000011368 organic material Substances 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 5
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- 230000003287 optical effect Effects 0.000 claims description 3
- 238000001291 vacuum drying Methods 0.000 claims description 2
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- 238000012216 screening Methods 0.000 claims 1
- 239000005022 packaging material Substances 0.000 description 33
- 101000889450 Homo sapiens Trefoil factor 2 Proteins 0.000 description 24
- 102100039172 Trefoil factor 2 Human genes 0.000 description 24
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- -1 PI) Polymers 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
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- 239000011521 glass Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Abstract
The invention provides a display and a manufacturing method thereof. The manufacturing method of the display includes the following steps. A plurality of spacers are formed on the first substrate. A photosensitive material layer covering the spacer is formed on the first substrate. The photosensitive material layer is exposed through the patterned mask, wherein light used in the exposure process is irradiated to the top surface or the bottom surface of each spacer, and the light is irradiated to the photosensitive material layer on the sidewall of each spacer from the inside of each spacer through each spacer. After the exposure process is performed on the photosensitive material layer, the photosensitive material layer that is not exposed to light is removed by a developing process to form a surface modification layer on the top surface and the sidewalls of each spacer. And covering a second substrate on the surface modification layer, wherein the first substrate or the second substrate comprises a pixel array.
Description
Technical field
The present invention relates to a kind of display and its manufacturing methods, and in particular to a kind of display including spacer
And its manufacturing method.
Background technique
With the development of science and technology light, thin, short, small flat-panel screens (Flat Panel Display, FPD) gradually takes
The thick and heavy cathode crt display (Cathode Ray Tube, CRT) of generation tradition.For example, the plane developed is aobvious
Show that device may include liquid crystal display (LCD), organic light emitting display (OLED), electrophoretic display device (EPD) (EPD) etc..
In general, aforementioned display device would generally include black matrix" (black matrix), to prevent between pixel
Light leakage phenomena, and increase the comparative of color.However, since black matrix" usually uses photosensitive material with yellow light micro-photographing process
(photolithography) mode is formed, when its height need to reache a certain level, such as black photoresist spacer
(black photoresistance spacer, BPS) or black intercolumniation parting (black column spacer, BCS),
It is also easy to produce light shield and aligns bad or easily peelable problem, the stability in turn resulting in display is bad.
Summary of the invention
The present invention provides a kind of display and its manufacturing method, the first purpose can be with good stability.
The manufacturing method of the display of one embodiment of the invention includes the following steps.In forming multiple on first substrate
Parting.In the photosensitive material layer for forming covering spacer on first substrate.Photosensitive material layer is exposed by patterning mask
Light processing procedure wherein exposing to the top surface or bottom surface of each spacer for the light in exposure manufacture process, and passes through each spacer
Enable photosensitive material layer of the light on from each spacer internal irradiation to the side wall of each spacer.To photosensitive material layer into
After row exposure manufacture process, the photosensitive material layer for not exposed and shining by light is removed by developing manufacture process, in each spacer
Top surface and side wall form finishing coat.In covering the second substrate on finishing coat, wherein first substrate or the second substrate packet
Include pixel array.
The manufacturing method of the display of another embodiment of the present invention includes the following steps.It is multiple in being formed on first substrate
Spacer.In the light-shielding material layers for forming covering spacer on first substrate.Light-shielding material layers are covered in being formed on first substrate
With the photosensitive material layer of spacer.Processing procedure and developing manufacture process are exposed to photosensitive material layer by patterning mask, in each
Finishing coat is formed on the spacer, wherein finishing coat, which is formed in, covers the top surface of each spacer and the lightproof material of side wall
On the bed of material, and finishing coat expose portion light-shielding material layers.The part light-shielding material layers that finishing coat is exposed are removed, with
Light shield layer is formed, wherein light shield layer is formed between each spacer and finishing coat, and light shield layer covers the top of each spacer
It face and side wall and extends between first substrate and finishing coat.
The manufacturing method of the display of one more embodiment of the present invention includes the following steps.It is inorganic in being formed on first substrate
Material layer.In forming multiple organic spacer objects on inorganic material layer.In the material for forming the organic spacer of covering on inorganic material layer
The bed of material.Modification processing procedure (modified process) is carried out, so that some materials layer and organic spacer produce heat cross-linking reaction
Or redox reaction.After carrying out modification processing procedure, removed by developing manufacture process in material layer not with organic spacer produce
The part of heat cross-linking reaction or redox reaction, in forming surface modification on the top surface of each organic spacer object and side wall
Layer.In covering the second substrate on finishing coat, wherein first substrate or the second substrate include pixel array.
The display of one embodiment of the invention includes first substrate, multiple spacers, multiple finishing coats and
Two substrates.Spacer is set on first substrate, and wherein spacer can allow at least partly blue light and at least partially uv light
Pass through.Finishing coat is covered each by top surface and the side wall of each spacer, and wherein the visible light transmittance of finishing coat is less than
Or it is equal to 20%.The second substrate is covered on finishing coat, and wherein first substrate or the second substrate include pixel array.
The display of another embodiment of the present invention includes first substrate, multiple spacers, multiple finishing coats, multiple
Light shield layer and the second substrate.Spacer is set on first substrate, wherein spacer can allow at least partly blue light with extremely
Small part ultraviolet light passes through.Finishing coat is covered each by top surface and the side wall of each spacer.Light shield layer is respectively arranged at interval
Between object and finishing coat, wherein light shield layer covers the top surface of each spacer and side wall and extends to first substrate and surface is repaired
It adorns between layer.The second substrate is covered on finishing coat, and wherein first substrate or the second substrate include pixel array.
The display of one more embodiment of the present invention include first substrate, multiple spacers, multiple finishing coats and
The second substrate.Spacer is set on first substrate, wherein spacer can allow at least partly blue light with it is at least partially uv
Light passes through.Finishing coat is covered each by top surface and the side wall of each spacer, and wherein spacer and finishing coat are in stacked
Part has the visible light transmittance less than or equal to 5%.The second substrate is covered on finishing coat, wherein first substrate or
The second substrate includes pixel array.
Based on above-mentioned, in the manufacturing method of the display provided by an at least embodiment of the invention, due to for exposing
Light in light processing procedure can pass through each spacer and the photosensitive material on from each spacer internal irradiation to the side wall of each spacer
The bed of material so aloows light to expose to the part to be exposed in photosensitive material layer well, causes cross-linking reaction complete,
The problem of being also easy to produce removing to avoid the finishing coat being subsequently formed, and then make display with good stability.
In the manufacturing method of the display provided by an at least embodiment of the invention, material layer is formed in inorganic material
On layer and cover organic spacer, after modified processing procedure, some materials layer and organic spacer produce heat cross-linking reaction or oxidation
Reduction reaction so may make subsequent developed processing procedure and the finishing coat formed the problem of being not likely to produce removing, so that aobvious
Show that device is with good stability.
In the display provided by an at least embodiment of the invention and its manufacturing method, since light shield layer is formed in respectively
Between spacer and finishing coat, and light shield layer covers the top surface of each spacer and side wall and extends to first substrate and a little tables
Between the decorative layer of face, between so avoidable pixel the phenomenon that generation light leakage, so that display is with good stability.
In the display provided by an at least embodiment of the invention, finishing coat is covered each by the top of each spacer
Face and side wall, wherein the visible light transmittance of finishing coat is less than or equal to 20%, generates light leakage between so avoidable pixel
The phenomenon that, so that display is with good stability.
In the display provided by an at least embodiment of the invention, since finishing coat is covered each by each spacer
Top surface and side wall, wherein spacer and finishing coat in stacked part there is the visible light less than or equal to 5% to penetrate
Rate, the phenomenon that generating light leakage between so avoidable pixel, so that display is with good stability.
To make the foregoing features and advantages of the present invention clearer and more comprehensible, special embodiment below, and it is detailed to cooperate attached drawing to make
Carefully it is described as follows.
Detailed description of the invention
Figure 1A to Fig. 1 D is the diagrammatic cross-section of the manufacturing method of the display of one embodiment of the invention.
Fig. 2A and Fig. 2 B is the diagrammatic cross-section of the manufacturing method of the display of another embodiment of the present invention.
Fig. 3 A to Fig. 3 C is the diagrammatic cross-section of the manufacturing method of the display of yet another embodiment of the invention.
Fig. 4 A and Fig. 4 B are the diagrammatic cross-section of the manufacturing method of the display of further embodiment of this invention.
Fig. 5 is the diagrammatic cross-section of the display of one embodiment of the invention.
Wherein, the reference numerals are as follows:
100: display
S1, S11: first substrate
S2: the second substrate
SB1, SB2: substrate
PS: spacer
OPS: organic spacer object
CE: color conversion layer
AM: alignment mark
PL: flatness layer
IOPL: inorganic material layer
PM: photosensitive material layer
ML: material layer
MS: patterning mask
SML1, SML2, SML3: finishing coat
PX: pixel array
BM: black matrix"
LSM: light-shielding material layers
LS: light shield layer
T: height
L: light
MP: modification processing procedure
P: particle
Specific embodiment
Hereinafter with reference to the present embodiment attached drawing more fully to illustrate the present invention.However, the present invention also can with it is various not
Same form embodies, and should not necessarily be limited by embodiments described herein.In the accompanying drawings, for the sake of clarity, be exaggerated layer, film,
The thickness in panel, region etc..Throughout the specification, identical appended drawing reference indicates identical element.It should be appreciated that ought be such as
Layer, film, region or substrate element be referred to as at another element "upper" or " being connected to " another element, can be directly another
It is connect on one element or with another element or intermediary element can be there is also.On the contrary, when element is referred to as " directly another
On element " or when " being directly connected to " another element, intermediary element is not present.As it is used herein, " connection " can refer to object
Reason and/or electric connection.Furthermore " electric connection " or " coupling " is can there are other elements between two element.
" about " used herein, " approximation " or " substantial " includes described value and determines in those of ordinary skill in the art
Particular value acceptable deviation range in average value, it is contemplated that the spy of the measurement and error relevant to measurement that are discussed
Fixed number amount (that is, limitation of measuring system).For example, " about " can indicate in one or more standard deviations of described value, or
± 30%, in ± 20%, ± 10%, ± 5%.Furthermore " about " used herein, " approximation " or " substantial " can be according to optical
Matter, etching property or other properties to select more acceptable deviation range or standard deviation, and can not have to a standard deviation
It is applicable in whole property.
Unless otherwise defined, all terms (including technical and scientific term) used herein have leads with belonging to the present invention
The normally understood identical meaning of the those of ordinary skill in domain.It will be further appreciated that such as in usually used dictionary
Those of definition term should be interpreted as having and their meanings in the relevant technologies and context of the invention are consistent
Meaning, and will not be interpreted Utopian or excessively formal meaning, unless clearly definition so herein.
Figure 1A to Fig. 1 D is the diagrammatic cross-section of the manufacturing method of the display of one embodiment of the invention.Fig. 5 is the present invention
The diagrammatic cross-section of the display of one embodiment.
Figure 1A is please referred to, in forming multiple spacer PS on first substrate S1.First substrate S1 can for active array substrate,
Color conversion substrate or combinations thereof.For example, first substrate S1 may include pixel array, color conversion layer or combinations thereof.?
In the present embodiment, first substrate S1 is illustrated by taking color conversion substrate as an example, that is to say, that first substrate S1 may include to
A few color conversion layer CE.As shown in Figure 1A, first substrate S1 may include substrate SB1 and be formed in multiple on substrate SB1
Color conversion layer CE.Substrate SB1 may include glass baseplate, quartz substrate, organic polymer substrate or combinations thereof.Color conversion layer
CE can be chromatic filter layer, wavelength conversion layer or combinations thereof.Chromatic filter layer is, for example, red color resistance, green color blocking, blue color
Resistance or combinations thereof.Wavelength conversion layer is, for example, red fluorescence material, red phosphorescence material, red quantum dot material, green fluorescence
Material, green phosphorescent material, green quanta point material, blue fluorescent material, blue phosphor materials, blue quanta point material or its
Combination.It is so without being limited thereto, visual actual demand adjustment.In some embodiments, color conversion layer CE may be disposed at adjacent two
Between a spacer PS.
In some embodiments, first substrate S1 may also include alignment mark (alignment mark) AM, after ensuring
The contraposition precision of patterning mask MS used in continuous exposure manufacture process.For example, the one of them in spacer PS can
Be formed in it is on alignment mark AM and Chong Die with alignment mark AM, so can will be overlapped in alignment mark AM spacer PS view
For the extension of alignment mark AM, to improve, alignment mark AM is covered by film layer disposed thereon and causes to align precision drop
Low problem.
In some embodiments, first substrate S1 may also include flatness layer PL, be covered in color conversion layer CE and substrate
On SB1.The material of flatness layer PL can be organic insulating material, inorganic insulating material or combinations thereof.For example, organic insulation
Material can for polyimides (polyimide, PI), polyamic acid (polyamic acid, PAA), polyamide (polyamide,
PA), polyvinyl alcohol (polyvinyl alcohol, PVA), polyvinyl cinnamate (polyvinyl cinnamate,
PVCi), polymethyl methacrylate (poly (methyl methacrylate)) or other suitable photoresists or its group
It closes.Inorganic insulating material can be silica, silicon nitride, silicon oxynitride, siloxanes or combinations thereof.
Spacer PS can be formed via following steps: firstly, (not showing layer of spacer material for example in a manner of spin coating
It is formed on first substrate S1 out)；Later, above-mentioned layer of spacer material is patterned by way of lithographic, between being formed
Parting PS, so invention is not limited thereto.The material of spacer PS can be organic photoresist.The height T of spacer PS can be big
In or equal to 15 μm.In some embodiments, spacer PS can allow at least partly blue light to pass through at least partially uv light.
Figure 1B is please referred to, in the photosensitive material layer PM for forming covering spacer PS on first substrate S1.Photosensitive material layer PM
Material can be organic material, inorganic material or combinations thereof.The forming method of photosensitive material layer PM is, for example, spin-coating method.Some
In embodiment, the visible light transmittance of photosensitive material layer PM may be less than or equal to 20%.
Then, it is exposed processing procedure to PM layers of photosensitive material by patterning mask MS, wherein in exposure manufacture process
Light L exposes to the top surface TS or bottom surface BS of each spacer PS, and light L can be by spacer PS, from each spacer
Photosensitive material layer PM of the internal irradiation of PS to position on spacer PS side wall SW.In this way, which even if photosensitive material layer PM has
Have certain thickness (the height T for being greater than spacer PS), light L, which still is able to expose to well, is covered in spacer PS table
Photosensitive material layer PM (i.e. the part to be exposed in photosensitive material layer PM) on face, causes cross-linking reaction complete, to avoid subsequent
The finishing coat of formation is also easy to produce the problem of removing (peeling) or undercutting (undercut), and then display is allowed to have
Good stability.
In some embodiments, before being exposed processing procedure, pre-treatment optionally is carried out to photosensitive material layer PM
Processing procedure, wherein pre-treatment processing procedure may include baking processing procedure, vacuum drying processing procedure or combinations thereof.It for example, can be to unexposed
Photosensitive material layer PM carries out prebake conditions (pre-bake) and/or is dried in vacuo, so that the photosensitive material layer after pre-treatment processing procedure
The profile of PM is more similar to the profile that the surface of spacer PS and first substrate S1 are constituted, so that exposure manufacture process effect is more later
It is good.
In some embodiments, optionally formed in each spacer PS multiple particle P (only in
Fig. 1 D shows citing), enable light L employed in exposure manufacture process more uniformly out of each spacer PS
Portion exposes to photosensitive material layer PM of the position on spacer PS side wall SW.
Referring to Figure 1B and Fig. 1 C, after being exposed processing procedure to photosensitive material layer PM, by developing manufacture process come
Removal is not exposed the photosensitive material layer PM shone by light L, is repaired with forming surface in the top surface TS and side wall SW of each spacer PS
Adorn layer SML1.The visible light transmittance of finishing coat SML1 is less than or equal to 20%, can so prevent the light leakage between pixel
Phenomenon.In addition to this, neighbouring first substrate is difficult to be transferred in photosensitive material layer PM since aforementioned exposure manufacture process can improve light L
The part (i.e. exposure depth is deeper) of S1 is therefore formed by finishing coat SML1 and first substrate S1 after developed processing procedure
There is good adhesion between spacer PS, so that the problem of finishing coat SML1 is not likely to produce removing or undercutting,
And then make display with good stability.That is, the light L as employed in exposure manufacture process can pass through interval
Object PS and the photosensitive material layer PM from the internal irradiation of spacer PS to position on spacer PS side wall.Even if in this way, sense
Optical material layer PM has certain thickness, and light L still is able to expose to the photosensitive material being covered on the surface spacer PS well
Bed of material PM causes cross-linking reaction complete, to avoid the finishing coat SML1 that developed processing procedure is subsequently formed be also easy to produce removing or
The problem of being undercutting, and then make display 100 with good stability.
In some embodiments, it after carrying out developing manufacture process, is dried after optionally being carried out to finishing coat SML1
Roasting (post-bake) processing procedure, further to remove the aqueous vapor and solvent of remaining, so that the adhesion of finishing coat SML1 is more
It is good.
In some embodiments, spacer PS can allow at least partly blue light to pass through with part ultraviolet light, and spacer
PS and finishing coat SML1 has the visible light transmittance less than or equal to 5% in stacked part.For example, spacer
One of PS and finishing coat SML1 can be blue color blocking, and spacer PS and finishing coat SML1 is wherein another can
For red color resistance or yellow color blocking.In this way, which visible light is passing through spacer PS (such as blue color blocking) and finishing coat
It can be isolated when SML1 (such as red or yellow color blocking), also (or blue color blocking and yellow that is, blue color blocking and red color resistance
Color blocking) combination can have the technical effect of similar black photoresist spacer (BPS).In other embodiments, spacer PS and
One of finishing coat SML1 can be carmetta color blocking, and spacer PS and finishing coat SML1 is therein another is
Green color blocking.In this way, which visible light is to pass through spacer PS (such as carmetta color blocking) and finishing coat SML1 (such as green
Color color blocking) when can be isolated, also that is, the collocation of carmetta color blocking and green color blocking can have black photoresist spacer (BPS)
Technical effect.Based on above-mentioned, black is reached by the collocation of different color blocking materials by spacer PS and finishing coat SML1
The technical effect of photoresist spacer (BPS), so that photosensitive material layer PM is not required to be confined to low visible light on material selection to penetrate
The material (e.g., less than or equal to 20%) of rate, causes in exposure manufacture process, light L can be exposed to well and is covered in interval
Photosensitive material layer PM on the surface object PS, causes cross-linking reaction complete, the surface modification being subsequently formed to avoid developed processing procedure
Layer SML1 is also easy to produce the problem of removing or undercutting, and then makes display 100 with good stability.In the present embodiment,
Spacer PS can be blue color blocking, and finishing coat SML1 can be red color resistance.
Fig. 1 D is please referred to, in covering the second substrate S2 on finishing coat SML1.The second substrate S2 can be active array base
Plate, color conversion substrate or combinations thereof.For example, the second substrate S2 may include pixel array, color conversion layer or combinations thereof.
In the present embodiment, the second substrate S2 is illustrated by taking active array substrate as an example, that is to say, that the second substrate S1 may include
Pixel array PX.As shown in figure iD, the second substrate S2 may include substrate SB2 and the pixel array PX that is formed on substrate SB2.Base
Material SB2 may include glass baseplate, quartz substrate, organic polymer substrate or combinations thereof.In further embodiments, first substrate
S1 is also possible to active array substrate (as shown in Figure 5).In other words, the one of them in first substrate S1 or the second substrate S2
It may include pixel array.
Fig. 2A and Fig. 2 B be another embodiment of the present invention display manufacturing method diagrammatic cross-section, wherein Fig. 2A and
The manufacturing method of display shown in Fig. 2 B is substantially similar to the manufacturing method of display shown in Figure 1B and Fig. 1 C, difference
Being in exposure manufacture process is using color conversion layer CE as patterning mask, connection relationship, material and its processing procedure of remaining component
In hereinbefore at large being described, therefore it is no longer repeated below.
A and Fig. 2 B referring to figure 2., first substrate S11 include multiple color conversion layer CE, and each color conversion layer sets CE and is placed in
Between two adjacent spacer PS, and color conversion layer CE is as patterning mask used in exposure manufacture process.In other words
It says, in the present embodiment, color conversion layer CE exposes the bottom surface BS (and can be described as back and expose) of spacer PS.In this way, expose
Light L employed in light processing procedure can by spacer PS from the internal irradiation of spacer PS to position in spacer PS side wall
Photosensitive material layer PM on SW.Even if light L still is able to well in this way, which photosensitive material layer PM has certain thickness
The photosensitive material layer PM being covered on the surface spacer PS is exposed to, causes cross-linking reaction complete, after developed processing procedure
It is formed by the problem of finishing coat SML1 is also easy to produce removing or undercutting, and then makes display with good stability.
In addition to this, since exposure manufacture process is therefore can to omit one of light shield using color conversion layer CE as pattern picture mask
(such as mask MS is patterned shown in Figure 1B), to reduce the manufacturing cost of display.
In some embodiments, first substrate S11 optionally includes black matrix" BM, and wherein black matrix" BM is formed
In each color conversion layer CE side wall and expose the bottom surface BS of each spacer PS, so may make light used by exposure manufacture process
Line L can well from the internal irradiation of spacer PS to position on spacer PS side wall SW photosensitive material layer PM.
Fig. 3 A to Fig. 3 C is the diagrammatic cross-section of the manufacturing method of the display of another embodiment of the present invention, and wherein Fig. 3 A is extremely
The manufacturing method of display shown in Fig. 3 C is substantially similar to the manufacturing method of display shown in Figure 1B and Fig. 1 C, difference
It is in after on the surface that light-shielding material layers LSM is formed in first substrate S1 and spacer PS, just in shape on first substrate S1
At the photosensitive material layer PM of covering light-shielding material layers LSM and spacer PS, connection relationship, material and its processing procedure of remaining component are
In hereinbefore at large being described, therefore it is no longer repeated below.
A referring to figure 3., firstly, in forming multiple spacer PS on first substrate S1.Then, in shape on first substrate S1
At the light-shielding material layers LSM of covering spacer PS.The material of light-shielding material layers LSM can be metal.In some embodiments, it can adopt
Light-shielding material layers LSM is formed with the mode of physical vapour deposition (PVD) (PVD).Later, in formation covering lightproof material on first substrate S1
The photosensitive material layer PM of bed of material LSM and spacer PS.
Then, referring to Fig. 3 A and Fig. 3 B, photosensitive material layer PM is exposed and is shown by patterning mask MS
Shadow processing procedure, in forming finishing coat SML2 on each spacer PS, wherein finishing coat SML2 is formed in each interval of covering
On the light-shielding material layers LSM of the top surface TS and side wall SW of object.In the present embodiment, finishing coat SML2 expose portion lightproof material
Bed of material LSM, such as finishing coat SML2 expose one of the light-shielding material layers LSM between two adjacent spacer PS
Part.
In some embodiments, light-shielding material layers LSM optionally includes reflecting layer, so that used by exposure manufacture process
Light L can expose to the photosensitive material layer PM positioned at the surface light-shielding material layers LSM well, cause cross-linking reaction complete, with
It avoids the problem that being formed by finishing coat SML2 after developed processing procedure is also easy to produce removing or undercutting, and then allows display utensil
There is good stability.For example, even if light L exposes to the part of neighbouring light-shielding material layers LSM in photosensitive material layer PM
The intensity of (exposure depth is deeper) is less than light L and exposes to the intensity (being closer to exposure source) on the surface photosensitive material layer PM, but by
In the reason that light-shielding material layers LSM includes reflecting layer, therefore the part in photosensitive material layer PM far from exposure source still is able to carry out
Good photo-crosslinking.
Then, C referring to figure 3. removes the part light-shielding material layers LSM that finishing coat SML2 is exposed to be formed and be hidden
Photosphere LS.In the present embodiment, light shield layer LS is formed between each spacer PS and finishing coat SML2, and light shield layer LS covers
It covers the top surface TS and side wall SW of each spacer PS and extends between first substrate S1 and finishing coat SML2, it so can be into one
The phenomenon that light leakage is generated between avoiding pixel is walked, so that display is with good stability.
Fig. 4 A and Fig. 4 B be another embodiment of the present invention display manufacturing method diagrammatic cross-section, wherein Fig. 4 A and
The concept of the manufacturing method of display shown in Fig. 4 B be substantially similar to Figure 1A to and Fig. 1 C shown in display manufacturing method,
The difference is that forming finishing coat SML3, the company of remaining component in the way of heat cross-linking or redox reaction
Relationship, material and its processing procedure are connect in hereinbefore at large being described, therefore it is no longer repeated below.
Inorganic material layer IOPL is formed on A referring to figure 4., Yu Jicai SB1.It in some embodiments, can also be in the first base
Inorganic material layer IOPL is formed on plate S1.Then, in forming multiple organic spacer object OPS on inorganic material layer IOPL.Later, in
The material layer ML for covering organic spacer OPS is formed on inorganic material layer IOPL.Then, modification processing procedure MP is carried out, so that part
Material layer ML is reacted with organic spacer object OPS generation heat cross-linking or redox reaction, the intensity of so avoidable exposure light
The problem of being gradually decreased as exposure depth is bigger, so that subsequent developed processing procedure and the finishing coat that is formed are not likely to produce
The problem of removing, so that display is with good stability.
In the present embodiment, material layer ML is organic material layer, and above-mentioned modification processing procedure MP makes part organic material layer
Heat cross-linking is generated with organic spacer object OPS to react.It should be noted that above-mentioned heat cross-linking reaction only occur in organic material it
Between interface (interface), therefore modified without interface between organic material and inorganic material occurs
After processing procedure MP, material layer ML will not generate crosslinking with inorganic material layer IOPL.In further embodiments, material layer ML is liquid
Body layer, above-mentioned modification processing procedure MP make partially liq layer and organic spacer object OPS generate redox reaction (such as without electric
Plating).It should be noted that above-mentioned redox reaction only occurs in the interface between liquid level and organic material, without
Interface between liquid level and inorganic material occurs, therefore, after carrying out modification processing procedure MP, material layer ML will not with it is inorganic
Material layer IOPL generates redox reaction.
Material layer ML is removed by developing manufacture process after carrying out modification processing procedure MP referring to Fig. 4 A figure and 4B
In do not generate heat cross-linking with organic spacer object OPS and react or the part of redox reaction, in the top surface of each organic spacer object
With formation finishing coat SML3 on side wall.The visible light transmittance e.g., less than or equal to 20% of finishing coat SML3, such as
This can prevent the light leakage phenomena between pixel.In addition to this, due to it is aforementioned modification processing procedure MP can avoid exposure light intensity with
Exposure depth it is bigger and the problem of gradually decrease, therefore, finishing coat SML3 and first is formed by after developed processing procedure
Between substrate S1 and organic spacer object OPS have good adhesion so that finishing coat SML3 be not likely to produce removing or
The problem of undercutting, and then make display with good stability.
Hereinafter, the display that will illustrate the present embodiment by Fig. 1 D.In addition, the manufacturing method of the display of the present embodiment
Although being illustrated by taking above-mentioned manufacturing method as an example, but not limited to this.
Please refer to Fig. 1 D, display 100 include first substrate S1, multiple spacer PS, multiple finishing coat SML1 with
And the second substrate S2.Spacer PS is set on first substrate S1, and wherein spacer PS can allow at least partly blue light and portion
Ultraviolet light is divided to pass through.Finishing coat SML1 is covered each by top surface and the side wall of each spacer PS, wherein finishing coat SML1
Visible light transmittance be less than or equal to 20%.The second substrate S2 is covered on finishing coat SML1, wherein first substrate S1
Or the second substrate S2 includes pixel array PX.
In the manufacturing method of the display of an above-mentioned embodiment, due to can be by each for the light in exposure manufacture process
Spacer and the photosensitive material layer on from each spacer internal irradiation to the side wall of each spacer, so aloow light good
The part to be exposed in photosensitive material layer is exposed to well, causes cross-linking reaction complete, to avoid the surface modification being subsequently formed
The problem of layer is also easy to produce removing, and then make display with good stability.
In the manufacturing method of the display of above-mentioned another embodiment, material layer is formed on inorganic material layer and is covered with
Machine spacer, after modified processing procedure, some materials layer and organic spacer produce heat cross-linking reaction or redox reaction, so
May make subsequent developed processing procedure and the finishing coat formed the problem of being not likely to produce removing so that display have it is good
Stability.
In the manufacturing method of the display of above-mentioned another embodiment, since light shield layer is formed in each spacer and surface is repaired
It adorns between layer, and light shield layer covers the top surface of each spacer and side wall and extends between first substrate and a little finishing coats,
The phenomenon that generating light leakage between so avoidable pixel, so that display is with good stability.
In the display of an above-mentioned embodiment, finishing coat is covered each by top surface and the side wall of each spacer, wherein
The phenomenon that visible light transmittance of finishing coat is less than or equal to 20%, generates light leakage between so avoidable pixel, so that aobvious
Show that device is with good stability.
In the display of above-mentioned another embodiment, since light shield layer is formed between each spacer and finishing coat,
And light shield layer covers the top surface of each spacer and side wall and extends between first substrate and a little finishing coats, so can avoid
The phenomenon that light leakage is generated between pixel, so that display is with good stability.
In the display of above-mentioned another embodiment, since finishing coat is covered each by the top surface and side of each spacer
Wall, wherein spacer and finishing coat have the visible light transmittance for being less than or equal to 5% in stacked part, can so keep away
Exempt from the phenomenon that light leakage is generated between pixel, so that display is with good stability.
Although the present invention is disclosed as above with embodiment, however, it is not to limit the invention, any technical field
Middle technical staff, without departing from the spirit and scope of the present invention, when can make a little variation and retouching, therefore protection of the invention
Range is subject to view as defined in claim.
Claims (20)
1. a kind of manufacturing method of display, comprising:
In forming multiple spacers on a first substrate；
In the photosensitive material layer for forming the covering spacer on the first substrate；
One exposure manufacture process is carried out to the photosensitive material layer by a patterning mask, wherein for the light in the exposure manufacture process
It exposes to the top surface or a bottom surface of the respectively spacer, and enables the light from the respectively interval by the respectively spacer
The photosensitive material layer on object internal irradiation to the one side wall of the respectively spacer；
After carrying out the exposure manufacture process to the photosensitive material layer, removes not exposed by the light by a developing manufacture process and shine
The photosensitive material layer, to form a finishing coat in the top surface of the respectively spacer and the side wall；And
In covering a second substrate on the finishing coat, wherein the first substrate or the second substrate include a pixel battle array
Column.
2. the manufacturing method of display as described in claim 1, further includes:
Multiple particles are formed in the respectively spacer.
3. the manufacturing method of display as described in claim 1, wherein the first substrate includes an alignment mark, between described
One of them in parting is formed on the alignment mark and Chong Die with the alignment mark.
4. the manufacturing method of display as described in claim 1, wherein the first substrate includes multiple color conversion layers, respectively
The color conversion layer is set between the adjacent pairs in the spacer, and the color conversion layer is as in the exposure manufacture process
The used patterning mask.
5. the manufacturing method of display as claimed in claim 4, wherein the first substrate includes a black matrix", the black
Matrix is formed in the respectively one side wall of the color conversion layer and exposes the bottom surface of the respectively spacer.
6. the manufacturing method of display as described in claim 1, further includes:
Before carrying out the exposure manufacture process, a pre-treatment processing procedure is carried out to the photosensitive material layer, which includes baking
Processing procedure, vacuum drying processing procedure or combinations thereof.
7. a kind of manufacturing method of display, comprising:
In forming multiple spacers on a first substrate；
In the light-shielding material layers for forming the covering spacer on the first substrate；
In the photosensitive material layer for forming covering light-shielding material layers and the spacer on the first substrate；
One exposure manufacture process and a developing manufacture process are carried out to the photosensitive material layer by a patterning mask, on the respectively spacer
Form a finishing coat, wherein the finishing coat is formed in the screening for covering respectively a top surface of the spacer and one side wall
On optical material layer, and the finishing coat expose portion light-shielding material layers；
Part light-shielding material layers that the finishing coat is exposed are removed, to form a light shield layer, wherein the light shield layer is formed
In respectively between the spacer and the finishing coat, and the light shield layer covering respectively top surface of the spacer and the side wall and extension
To between the first substrate and the finishing coat.
8. the manufacturing method of display as claimed in claim 7, wherein the light-shielding material layers include a reflecting layer.
9. a kind of manufacturing method of display, comprising:
In forming an inorganic material layer on a first substrate；
In forming multiple organic spacer objects on the inorganic material layer；
In the material layer for forming the covering organic spacer object on the inorganic material layer；
A modification processing procedure is carried out, so that the part material layer and the organic spacer produce heat cross-linking reaction or redox are anti-
It answers；
After carrying out the modification processing procedure, is removed by a developing manufacture process in the material layer and do not generated with the organic spacer object
The part of heat cross-linking reaction or redox reaction, in forming a surface on a top surface of the respectively organic spacer object and one side wall
Decorative layer；And
In covering a second substrate on the finishing coat, wherein the first substrate or the second substrate include a pixel battle array
Column.
10. the manufacturing method of display as claimed in claim 9, wherein the material layer is an organic material layer, the modification system
Journey makes the part organic material layer and the organic spacer produce heat cross-linking reaction.
11. the manufacturing method of display as claimed in claim 9, wherein the material layer is a liquid level, so that the part liquid
Body layer and the organic spacer object generate redox reaction.
12. a kind of display, comprising:
One first substrate；
Multiple spacers are set on the first substrate, wherein the spacer can allow at least partly blue light and at least portion
Ultraviolet light is divided to pass through；
Multiple finishing coats are covered each by a top surface and the one side wall of the respectively spacer, wherein the finishing coat can
Light-exposed penetrance is less than or equal to 20%；And
One the second substrate is covered on the finishing coat, wherein the first substrate or the second substrate include a pixel battle array
Column.
13. display as claimed in claim 12, further includes:
Multiple particles are set in the respectively spacer.
14. display as claimed in claim 12, wherein the height of the spacer is greater than or equal to 15 μm.
15. display as claimed in claim 12, further includes:
Multiple light shield layers are respectively arranged between the spacer and the finishing coat, wherein the light shield layer covering is each
It the top surface of the spacer and the side wall and extends between the first substrate and the finishing coat.
16. a kind of display, comprising:
One first substrate；
Multiple spacers are set on the first substrate, wherein the spacer can allow at least partly blue light and at least portion
Ultraviolet light is divided to pass through；
Multiple finishing coats are covered each by a top surface and the one side wall of each spacer；
Multiple light shield layers are respectively arranged between the spacer and the finishing coat, wherein the light shield layer covering is each
It the top surface of the spacer and the side wall and extends between the first substrate and the finishing coat；And
One the second substrate is covered on the finishing coat, wherein the first substrate or the second substrate include a pixel battle array
Column.
17. a kind of display, comprising:
One first substrate；
Multiple spacers are set on the first substrate, wherein the spacer can allow at least partly blue light and at least portion
Ultraviolet light is divided to pass through；
Multiple finishing coats are covered each by a top surface and the one side wall of the respectively spacer, wherein the spacer and the table
Face decorative layer has the visible light transmittance less than or equal to 5% in stacked part；And
One the second substrate is covered on the finishing coat, wherein the first substrate or the second substrate include a pixel battle array
Column.
18. display as claimed in claim 17, wherein one of the spacer and the finishing coat are blue
Color blocking, the spacer and the finishing coat are therein another for red color resistance or yellow color blocking.
19. display as claimed in claim 17, wherein one of the spacer and the finishing coat are fuchsin
Color color blocking, the spacer and the finishing coat are therein another for green color blocking.
20. display as claimed in claim 17, wherein the spacer is blue color blocking, and the finishing coat is red
Color color blocking.
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| TW107136159A TWI750418B (en) | 2018-10-15 | 2018-10-15 | Display device and manufacturing method thereof |
| TW107136159 | 2018-10-15 |
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| CN111192529A (en) * | 2019-05-17 | 2020-05-22 | 友达光电股份有限公司 | Display panel and method for manufacturing the same |
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| TW202016661A (en) | 2020-05-01 |
| CN109521608B (en) | 2022-05-10 |
| TWI750418B (en) | 2021-12-21 |
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