TWI747505B - 含矽之阻劑下層膜形成用組成物及圖案形成方法 - Google Patents
含矽之阻劑下層膜形成用組成物及圖案形成方法 Download PDFInfo
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- TWI747505B TWI747505B TW109131977A TW109131977A TWI747505B TW I747505 B TWI747505 B TW I747505B TW 109131977 A TW109131977 A TW 109131977A TW 109131977 A TW109131977 A TW 109131977A TW I747505 B TWI747505 B TW I747505B
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- BNEGLNUVJNVFPA-UHFFFAOYSA-L oxalate;tetrapropylazanium Chemical compound [O-]C(=O)C([O-])=O.CCC[N+](CCC)(CCC)CCC.CCC[N+](CCC)(CCC)CCC BNEGLNUVJNVFPA-UHFFFAOYSA-L 0.000 description 2
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- KYQKIQNFSSXMJR-UHFFFAOYSA-L phthalate tetraphenylphosphanium Chemical compound C(C=1C(C(=O)[O-])=CC=CC1)(=O)[O-].C1(=CC=CC=C1)[P+](C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1.C1(=CC=CC=C1)[P+](C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1 KYQKIQNFSSXMJR-UHFFFAOYSA-L 0.000 description 1
- NGJPFUZHXVGJDW-UHFFFAOYSA-L phthalate;tetrabutylazanium Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC NGJPFUZHXVGJDW-UHFFFAOYSA-L 0.000 description 1
- SQHGGAHUNVVVNZ-UHFFFAOYSA-L phthalate;tetraethylazanium Chemical compound CC[N+](CC)(CC)CC.CC[N+](CC)(CC)CC.[O-]C(=O)C1=CC=CC=C1C([O-])=O SQHGGAHUNVVVNZ-UHFFFAOYSA-L 0.000 description 1
- WPUNLMRHBNZKPI-UHFFFAOYSA-L phthalate;tetrapropylazanium Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O.CCC[N+](CCC)(CCC)CCC.CCC[N+](CCC)(CCC)CCC WPUNLMRHBNZKPI-UHFFFAOYSA-L 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
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- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
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- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000001508 potassium citrate Substances 0.000 description 1
- 229960002635 potassium citrate Drugs 0.000 description 1
- QEEAPRPFLLJWCF-UHFFFAOYSA-K potassium citrate (anhydrous) Chemical compound [K+].[K+].[K+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O QEEAPRPFLLJWCF-UHFFFAOYSA-K 0.000 description 1
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- WFIZEGIEIOHZCP-UHFFFAOYSA-M potassium formate Chemical compound [K+].[O-]C=O WFIZEGIEIOHZCP-UHFFFAOYSA-M 0.000 description 1
- SHPKCSFVQGSAJU-SEPHDYHBSA-L potassium fumarate Chemical compound [K+].[K+].[O-]C(=O)\C=C\C([O-])=O SHPKCSFVQGSAJU-SEPHDYHBSA-L 0.000 description 1
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- JMTCDHVHZSGGJA-UHFFFAOYSA-M potassium hydrogenoxalate Chemical compound [K+].OC(=O)C([O-])=O JMTCDHVHZSGGJA-UHFFFAOYSA-M 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
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- BWILYWWHXDGKQA-UHFFFAOYSA-M potassium propanoate Chemical compound [K+].CCC([O-])=O BWILYWWHXDGKQA-UHFFFAOYSA-M 0.000 description 1
- 235000010332 potassium propionate Nutrition 0.000 description 1
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- FRMWBRPWYBNAFB-UHFFFAOYSA-M potassium salicylate Chemical compound [K+].OC1=CC=CC=C1C([O-])=O FRMWBRPWYBNAFB-UHFFFAOYSA-M 0.000 description 1
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- QPMDWIOUHQWKHV-TYYBGVCCSA-M potassium;(e)-but-2-enedioate;hydron Chemical compound [H+].[K+].[O-]C(=O)\C=C\C([O-])=O QPMDWIOUHQWKHV-TYYBGVCCSA-M 0.000 description 1
- QPMDWIOUHQWKHV-ODZAUARKSA-M potassium;(z)-4-hydroxy-4-oxobut-2-enoate Chemical compound [K+].OC(=O)\C=C/C([O-])=O QPMDWIOUHQWKHV-ODZAUARKSA-M 0.000 description 1
- YNLZKJXZEZFHDO-UHFFFAOYSA-M potassium;2,2,2-trichloroacetate Chemical compound [K+].[O-]C(=O)C(Cl)(Cl)Cl YNLZKJXZEZFHDO-UHFFFAOYSA-M 0.000 description 1
- CUNPJFGIODEJLQ-UHFFFAOYSA-M potassium;2,2,2-trifluoroacetate Chemical compound [K+].[O-]C(=O)C(F)(F)F CUNPJFGIODEJLQ-UHFFFAOYSA-M 0.000 description 1
- KDGSZJXXQWMOKP-UHFFFAOYSA-M potassium;2,2-dichloroacetate Chemical compound [K+].[O-]C(=O)C(Cl)Cl KDGSZJXXQWMOKP-UHFFFAOYSA-M 0.000 description 1
- KPFSGNRRZMYZPH-UHFFFAOYSA-M potassium;2-chloroacetate Chemical compound [K+].[O-]C(=O)CCl KPFSGNRRZMYZPH-UHFFFAOYSA-M 0.000 description 1
- RWMKSKOZLCXHOK-UHFFFAOYSA-M potassium;butanoate Chemical compound [K+].CCCC([O-])=O RWMKSKOZLCXHOK-UHFFFAOYSA-M 0.000 description 1
- LBYLQJKRTJQVDQ-UHFFFAOYSA-M potassium;hydron;propanedioate Chemical compound [K+].OC(=O)CC([O-])=O LBYLQJKRTJQVDQ-UHFFFAOYSA-M 0.000 description 1
- XWIJIXWOZCRYEL-UHFFFAOYSA-M potassium;methanesulfonate Chemical compound [K+].CS([O-])(=O)=O XWIJIXWOZCRYEL-UHFFFAOYSA-M 0.000 description 1
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- GLGXXYFYZWQGEL-UHFFFAOYSA-M potassium;trifluoromethanesulfonate Chemical compound [K+].[O-]S(=O)(=O)C(F)(F)F GLGXXYFYZWQGEL-UHFFFAOYSA-M 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
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- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- LJTHRDIGXSIYMM-UHFFFAOYSA-N propan-1-olate tantalum(5+) Chemical compound [Ta+5].CCC[O-].CCC[O-].CCC[O-].CCC[O-].CCC[O-] LJTHRDIGXSIYMM-UHFFFAOYSA-N 0.000 description 1
- HKJYVRJHDIPMQB-UHFFFAOYSA-N propan-1-olate;titanium(4+) Chemical compound CCCO[Ti](OCCC)(OCCC)OCCC HKJYVRJHDIPMQB-UHFFFAOYSA-N 0.000 description 1
- XPGAWFIWCWKDDL-UHFFFAOYSA-N propan-1-olate;zirconium(4+) Chemical compound [Zr+4].CCC[O-].CCC[O-].CCC[O-].CCC[O-] XPGAWFIWCWKDDL-UHFFFAOYSA-N 0.000 description 1
- SZEGZMUSBCXNLO-UHFFFAOYSA-N propan-2-yl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C(C)C SZEGZMUSBCXNLO-UHFFFAOYSA-N 0.000 description 1
- YHNFWGSEMSWPBF-UHFFFAOYSA-N propan-2-yl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C(C)C YHNFWGSEMSWPBF-UHFFFAOYSA-N 0.000 description 1
- OLKGTELQBDKOOT-UHFFFAOYSA-L propanedioate;tetrabutylazanium Chemical compound [O-]C(=O)CC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC OLKGTELQBDKOOT-UHFFFAOYSA-L 0.000 description 1
- HHKJMCGICWRKQN-UHFFFAOYSA-L propanedioate;tetraethylazanium Chemical compound [O-]C(=O)CC([O-])=O.CC[N+](CC)(CC)CC.CC[N+](CC)(CC)CC HHKJMCGICWRKQN-UHFFFAOYSA-L 0.000 description 1
- HTXYZJFFLBEJGP-UHFFFAOYSA-L propanedioate;tetramethylazanium Chemical compound C[N+](C)(C)C.C[N+](C)(C)C.[O-]C(=O)CC([O-])=O HTXYZJFFLBEJGP-UHFFFAOYSA-L 0.000 description 1
- AOLHFTSRLXHBNU-UHFFFAOYSA-M propanoate;tetrabutylazanium Chemical compound CCC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC AOLHFTSRLXHBNU-UHFFFAOYSA-M 0.000 description 1
- ZEKIXPPWVVMOMQ-UHFFFAOYSA-M propanoate;tetraethylazanium Chemical compound CCC([O-])=O.CC[N+](CC)(CC)CC ZEKIXPPWVVMOMQ-UHFFFAOYSA-M 0.000 description 1
- OGPGZJLEIDWRHR-UHFFFAOYSA-M propanoate;tetraethylphosphanium Chemical compound CCC([O-])=O.CC[P+](CC)(CC)CC OGPGZJLEIDWRHR-UHFFFAOYSA-M 0.000 description 1
- XNWSMNKRGNKRKP-UHFFFAOYSA-M propanoate;tetramethylazanium Chemical compound CCC([O-])=O.C[N+](C)(C)C XNWSMNKRGNKRKP-UHFFFAOYSA-M 0.000 description 1
- PVINRUAXANHGMU-UHFFFAOYSA-M propanoate;tetraphenylphosphanium Chemical compound CCC([O-])=O.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 PVINRUAXANHGMU-UHFFFAOYSA-M 0.000 description 1
- VTIZRIDYIWLCRE-UHFFFAOYSA-M propanoate;tetrapropylazanium Chemical compound CCC([O-])=O.CCC[N+](CCC)(CCC)CCC VTIZRIDYIWLCRE-UHFFFAOYSA-M 0.000 description 1
- BVLKECPAIWFGHO-UHFFFAOYSA-M propanoate;triphenylsulfanium Chemical compound CCC([O-])=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 BVLKECPAIWFGHO-UHFFFAOYSA-M 0.000 description 1
- NCLVBCYENVSYCE-UHFFFAOYSA-N propoxyantimony Chemical compound CCCO[Sb] NCLVBCYENVSYCE-UHFFFAOYSA-N 0.000 description 1
- PMBLYMFPRDUCBQ-UHFFFAOYSA-N propoxyboron Chemical compound [B]OCCC PMBLYMFPRDUCBQ-UHFFFAOYSA-N 0.000 description 1
- VMHSRTQUBIMFJZ-UHFFFAOYSA-N propoxygermanium Chemical compound CCCO[Ge] VMHSRTQUBIMFJZ-UHFFFAOYSA-N 0.000 description 1
- ZMYXZXUHYAGGKG-UHFFFAOYSA-N propoxysilane Chemical compound CCCO[SiH3] ZMYXZXUHYAGGKG-UHFFFAOYSA-N 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 125000001725 pyrenyl group Chemical group 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 235000019265 sodium DL-malate Nutrition 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- WXMKPNITSTVMEF-UHFFFAOYSA-M sodium benzoate Chemical compound [Na+].[O-]C(=O)C1=CC=CC=C1 WXMKPNITSTVMEF-UHFFFAOYSA-M 0.000 description 1
- 235000010234 sodium benzoate Nutrition 0.000 description 1
- 239000004299 sodium benzoate Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- MFBOGIVSZKQAPD-UHFFFAOYSA-M sodium butyrate Chemical compound [Na+].CCCC([O-])=O MFBOGIVSZKQAPD-UHFFFAOYSA-M 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229940001593 sodium carbonate Drugs 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- FDRCDNZGSXJAFP-UHFFFAOYSA-M sodium chloroacetate Chemical compound [Na+].[O-]C(=O)CCl FDRCDNZGSXJAFP-UHFFFAOYSA-M 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229960001790 sodium citrate Drugs 0.000 description 1
- 229940080263 sodium dichloroacetate Drugs 0.000 description 1
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 1
- 235000019254 sodium formate Nutrition 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 239000001394 sodium malate Substances 0.000 description 1
- PRWXGRGLHYDWPS-UHFFFAOYSA-L sodium malonate Chemical compound [Na+].[Na+].[O-]C(=O)CC([O-])=O PRWXGRGLHYDWPS-UHFFFAOYSA-L 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- ZNCPFRVNHGOPAG-UHFFFAOYSA-L sodium oxalate Chemical compound [Na+].[Na+].[O-]C(=O)C([O-])=O ZNCPFRVNHGOPAG-UHFFFAOYSA-L 0.000 description 1
- 229940039790 sodium oxalate Drugs 0.000 description 1
- JXKPEJDQGNYQSM-UHFFFAOYSA-M sodium propionate Chemical compound [Na+].CCC([O-])=O JXKPEJDQGNYQSM-UHFFFAOYSA-M 0.000 description 1
- 235000010334 sodium propionate Nutrition 0.000 description 1
- 239000004324 sodium propionate Substances 0.000 description 1
- 229960003212 sodium propionate Drugs 0.000 description 1
- 229960004025 sodium salicylate Drugs 0.000 description 1
- VRVKOZSIJXBAJG-ODZAUARKSA-M sodium;(z)-but-2-enedioate;hydron Chemical compound [Na+].OC(=O)\C=C/C([O-])=O VRVKOZSIJXBAJG-ODZAUARKSA-M 0.000 description 1
- UYCAUPASBSROMS-AWQJXPNKSA-M sodium;2,2,2-trifluoroacetate Chemical compound [Na+].[O-][13C](=O)[13C](F)(F)F UYCAUPASBSROMS-AWQJXPNKSA-M 0.000 description 1
- LUPNKHXLFSSUGS-UHFFFAOYSA-M sodium;2,2-dichloroacetate Chemical compound [Na+].[O-]C(=O)C(Cl)Cl LUPNKHXLFSSUGS-UHFFFAOYSA-M 0.000 description 1
- LXWZLYDXYCQRJT-UHFFFAOYSA-M sodium;hydron;propanedioate Chemical compound [H+].[Na+].[O-]C(=O)CC([O-])=O LXWZLYDXYCQRJT-UHFFFAOYSA-M 0.000 description 1
- KKVTYAVXTDIPAP-UHFFFAOYSA-M sodium;methanesulfonate Chemical compound [Na+].CS([O-])(=O)=O KKVTYAVXTDIPAP-UHFFFAOYSA-M 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229940114926 stearate Drugs 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 150000008054 sulfonate salts Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- TULPIGUCPSGZIA-UHFFFAOYSA-I tantalum(5+) pentaphenoxide Chemical compound [Ta+5].[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1 TULPIGUCPSGZIA-UHFFFAOYSA-I 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- AMJIZHYMBDPGSP-UHFFFAOYSA-L terephthalate tetraethylphosphanium Chemical compound C(C1=CC=C(C(=O)[O-])C=C1)(=O)[O-].C(C)[P+](CC)(CC)CC.C(C)[P+](CC)(CC)CC AMJIZHYMBDPGSP-UHFFFAOYSA-L 0.000 description 1
- JJNJGSOLLMNJSD-UHFFFAOYSA-L terephthalate tetraphenylphosphanium Chemical compound C(C1=CC=C(C(=O)[O-])C=C1)(=O)[O-].C1(=CC=CC=C1)[P+](C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1.C1(=CC=CC=C1)[P+](C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1 JJNJGSOLLMNJSD-UHFFFAOYSA-L 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- XBLNHYLUTUZOGX-UHFFFAOYSA-L terephthalate;tetrabutylazanium Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC XBLNHYLUTUZOGX-UHFFFAOYSA-L 0.000 description 1
- VDEALLOCWQYOBY-UHFFFAOYSA-L terephthalate;tetraethylazanium Chemical compound CC[N+](CC)(CC)CC.CC[N+](CC)(CC)CC.[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 VDEALLOCWQYOBY-UHFFFAOYSA-L 0.000 description 1
- SFZIOISNGCFHIC-UHFFFAOYSA-L terephthalate;tetramethylazanium Chemical compound C[N+](C)(C)C.C[N+](C)(C)C.[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 SFZIOISNGCFHIC-UHFFFAOYSA-L 0.000 description 1
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- PYKSLEHEVAWOTJ-UHFFFAOYSA-N tetrabutoxystannane Chemical compound CCCCO[Sn](OCCCC)(OCCCC)OCCCC PYKSLEHEVAWOTJ-UHFFFAOYSA-N 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- NHGXDBSUJJNIRV-UHFFFAOYSA-M tetrabutylammonium chloride Chemical compound [Cl-].CCCC[N+](CCCC)(CCCC)CCCC NHGXDBSUJJNIRV-UHFFFAOYSA-M 0.000 description 1
- FLCDSBKFFIMXLQ-UHFFFAOYSA-M tetrabutylazanium;2,2,2-trichloroacetate Chemical compound [O-]C(=O)C(Cl)(Cl)Cl.CCCC[N+](CCCC)(CCCC)CCCC FLCDSBKFFIMXLQ-UHFFFAOYSA-M 0.000 description 1
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- MCZDHTKJGDCTAE-UHFFFAOYSA-M tetrabutylazanium;acetate Chemical compound CC([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC MCZDHTKJGDCTAE-UHFFFAOYSA-M 0.000 description 1
- WGYONVRJGWHMKV-UHFFFAOYSA-M tetrabutylazanium;benzoate Chemical compound [O-]C(=O)C1=CC=CC=C1.CCCC[N+](CCCC)(CCCC)CCCC WGYONVRJGWHMKV-UHFFFAOYSA-M 0.000 description 1
- UVVFKNZCYIIHGM-UHFFFAOYSA-L tetrabutylazanium;carbonate Chemical compound [O-]C([O-])=O.CCCC[N+](CCCC)(CCCC)CCCC.CCCC[N+](CCCC)(CCCC)CCCC UVVFKNZCYIIHGM-UHFFFAOYSA-L 0.000 description 1
- SNMZANHSFVMKKA-UHFFFAOYSA-M tetrabutylazanium;formate Chemical compound [O-]C=O.CCCC[N+](CCCC)(CCCC)CCCC SNMZANHSFVMKKA-UHFFFAOYSA-M 0.000 description 1
- DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical compound [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 description 1
- YNJQKNVVBBIPBA-UHFFFAOYSA-M tetrabutylazanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCCC[N+](CCCC)(CCCC)CCCC YNJQKNVVBBIPBA-UHFFFAOYSA-M 0.000 description 1
- FPADWGFFPCNGDD-UHFFFAOYSA-N tetraethoxystannane Chemical compound [Sn+4].CC[O-].CC[O-].CC[O-].CC[O-] FPADWGFFPCNGDD-UHFFFAOYSA-N 0.000 description 1
- HWCKGOZZJDHMNC-UHFFFAOYSA-M tetraethylammonium bromide Chemical compound [Br-].CC[N+](CC)(CC)CC HWCKGOZZJDHMNC-UHFFFAOYSA-M 0.000 description 1
- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
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- IANBDFWJYJFHQC-UHFFFAOYSA-M tetraethylazanium;2,2,2-trichloroacetate Chemical compound [O-]C(=O)C(Cl)(Cl)Cl.CC[N+](CC)(CC)CC IANBDFWJYJFHQC-UHFFFAOYSA-M 0.000 description 1
- SBOOKGHQWGEWCB-UHFFFAOYSA-M tetraethylazanium;2,2,2-trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F.CC[N+](CC)(CC)CC SBOOKGHQWGEWCB-UHFFFAOYSA-M 0.000 description 1
- GTCDARUMAMVCRO-UHFFFAOYSA-M tetraethylazanium;acetate Chemical compound CC([O-])=O.CC[N+](CC)(CC)CC GTCDARUMAMVCRO-UHFFFAOYSA-M 0.000 description 1
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- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- PUZYNDBTWXJXKN-UHFFFAOYSA-M tetraethylazanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CC[N+](CC)(CC)CC PUZYNDBTWXJXKN-UHFFFAOYSA-M 0.000 description 1
- XSROLYDXWLCEOE-UHFFFAOYSA-M tetraethylphosphanium 2,2,2-trichloroacetate Chemical compound C(C)[P+](CC)(CC)CC.ClC(C(=O)[O-])(Cl)Cl XSROLYDXWLCEOE-UHFFFAOYSA-M 0.000 description 1
- SRNKKVISDQLIIX-UHFFFAOYSA-M tetraethylphosphanium;2,2,2-trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F.CC[P+](CC)(CC)CC SRNKKVISDQLIIX-UHFFFAOYSA-M 0.000 description 1
- JRQMGUGXUVNKFF-UHFFFAOYSA-M tetraethylphosphanium;acetate Chemical compound CC([O-])=O.CC[P+](CC)(CC)CC JRQMGUGXUVNKFF-UHFFFAOYSA-M 0.000 description 1
- ZZSILJPVLCLAMM-UHFFFAOYSA-M tetraethylphosphanium;benzoate Chemical compound CC[P+](CC)(CC)CC.[O-]C(=O)C1=CC=CC=C1 ZZSILJPVLCLAMM-UHFFFAOYSA-M 0.000 description 1
- LIXPXSXEKKHIRR-UHFFFAOYSA-M tetraethylphosphanium;bromide Chemical compound [Br-].CC[P+](CC)(CC)CC LIXPXSXEKKHIRR-UHFFFAOYSA-M 0.000 description 1
- PSURFDQPSMCWMT-UHFFFAOYSA-L tetraethylphosphanium;carbonate Chemical compound [O-]C([O-])=O.CC[P+](CC)(CC)CC.CC[P+](CC)(CC)CC PSURFDQPSMCWMT-UHFFFAOYSA-L 0.000 description 1
- FBOJNMRAZJRCNS-UHFFFAOYSA-M tetraethylphosphanium;chloride Chemical compound [Cl-].CC[P+](CC)(CC)CC FBOJNMRAZJRCNS-UHFFFAOYSA-M 0.000 description 1
- ZOMVKCHODRHQEV-UHFFFAOYSA-M tetraethylphosphanium;hydroxide Chemical compound [OH-].CC[P+](CC)(CC)CC ZOMVKCHODRHQEV-UHFFFAOYSA-M 0.000 description 1
- WKSYTZHMRBAPAO-UHFFFAOYSA-M tetraethylphosphanium;iodide Chemical compound [I-].CC[P+](CC)(CC)CC WKSYTZHMRBAPAO-UHFFFAOYSA-M 0.000 description 1
- IYPJDYWPLUISDW-UHFFFAOYSA-N tetraethylphosphanium;nitrate Chemical compound [O-][N+]([O-])=O.CC[P+](CC)(CC)CC IYPJDYWPLUISDW-UHFFFAOYSA-N 0.000 description 1
- BPYSJOQJBAZTDB-UHFFFAOYSA-M tetraethylphosphanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CC[P+](CC)(CC)CC BPYSJOQJBAZTDB-UHFFFAOYSA-M 0.000 description 1
- TWRYZRQZQIBEIE-UHFFFAOYSA-N tetramethoxystannane Chemical compound [Sn+4].[O-]C.[O-]C.[O-]C.[O-]C TWRYZRQZQIBEIE-UHFFFAOYSA-N 0.000 description 1
- KVIIKBGGNBBOEI-UHFFFAOYSA-M tetramethylazanium;2,2,2-trichloroacetate Chemical compound C[N+](C)(C)C.[O-]C(=O)C(Cl)(Cl)Cl KVIIKBGGNBBOEI-UHFFFAOYSA-M 0.000 description 1
- MRYQZMHVZZSQRT-UHFFFAOYSA-M tetramethylazanium;acetate Chemical compound CC([O-])=O.C[N+](C)(C)C MRYQZMHVZZSQRT-UHFFFAOYSA-M 0.000 description 1
- IEVVGBFMAHJELO-UHFFFAOYSA-M tetramethylazanium;benzoate Chemical compound C[N+](C)(C)C.[O-]C(=O)C1=CC=CC=C1 IEVVGBFMAHJELO-UHFFFAOYSA-M 0.000 description 1
- WJZPIORVERXPPR-UHFFFAOYSA-L tetramethylazanium;carbonate Chemical compound [O-]C([O-])=O.C[N+](C)(C)C.C[N+](C)(C)C WJZPIORVERXPPR-UHFFFAOYSA-L 0.000 description 1
- WWIYWFVQZQOECA-UHFFFAOYSA-M tetramethylazanium;formate Chemical compound [O-]C=O.C[N+](C)(C)C WWIYWFVQZQOECA-UHFFFAOYSA-M 0.000 description 1
- RXMRGBVLCSYIBO-UHFFFAOYSA-M tetramethylazanium;iodide Chemical compound [I-].C[N+](C)(C)C RXMRGBVLCSYIBO-UHFFFAOYSA-M 0.000 description 1
- MANNXDXMUHZSRP-UHFFFAOYSA-M tetramethylazanium;trifluoromethanesulfonate Chemical compound C[N+](C)(C)C.[O-]S(=O)(=O)C(F)(F)F MANNXDXMUHZSRP-UHFFFAOYSA-M 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- MJHKPBXGJMKYAY-UHFFFAOYSA-N tetraoctylazanium;nitrate Chemical compound [O-][N+]([O-])=O.CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC MJHKPBXGJMKYAY-UHFFFAOYSA-N 0.000 description 1
- XITYWQKWNJFZEG-UHFFFAOYSA-J tetraphenoxystannane Chemical compound [Sn+4].[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1 XITYWQKWNJFZEG-UHFFFAOYSA-J 0.000 description 1
- UAMLLALJRFFHBA-UHFFFAOYSA-M tetraphenylphosphanium 2,2,2-trichloroacetate Chemical compound ClC(C(=O)[O-])(Cl)Cl.C1(=CC=CC=C1)[P+](C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1 UAMLLALJRFFHBA-UHFFFAOYSA-M 0.000 description 1
- FDPJPTOZZRISMD-UHFFFAOYSA-M tetraphenylphosphanium;2,2,2-trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 FDPJPTOZZRISMD-UHFFFAOYSA-M 0.000 description 1
- HLNHDVOODYDVRZ-UHFFFAOYSA-M tetraphenylphosphanium;acetate Chemical compound CC([O-])=O.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 HLNHDVOODYDVRZ-UHFFFAOYSA-M 0.000 description 1
- FOUUISAQGPLIMM-UHFFFAOYSA-M tetraphenylphosphanium;benzoate Chemical compound [O-]C(=O)C1=CC=CC=C1.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 FOUUISAQGPLIMM-UHFFFAOYSA-M 0.000 description 1
- BRKFQVAOMSWFDU-UHFFFAOYSA-M tetraphenylphosphanium;bromide Chemical compound [Br-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 BRKFQVAOMSWFDU-UHFFFAOYSA-M 0.000 description 1
- MRFFLWSQLSQAJK-UHFFFAOYSA-L tetraphenylphosphanium;carbonate Chemical compound [O-]C([O-])=O.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 MRFFLWSQLSQAJK-UHFFFAOYSA-L 0.000 description 1
- VLDHXZBAXRDKQN-UHFFFAOYSA-M tetraphenylphosphanium;formate Chemical compound [O-]C=O.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 VLDHXZBAXRDKQN-UHFFFAOYSA-M 0.000 description 1
- XVHQFGPOVXTXPD-UHFFFAOYSA-M tetraphenylphosphanium;hydroxide Chemical compound [OH-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 XVHQFGPOVXTXPD-UHFFFAOYSA-M 0.000 description 1
- AEFPPQGZJFTXDR-UHFFFAOYSA-M tetraphenylphosphanium;iodide Chemical compound [I-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 AEFPPQGZJFTXDR-UHFFFAOYSA-M 0.000 description 1
- DBUVZKQSYMGPFQ-UHFFFAOYSA-N tetraphenylphosphanium;nitrate Chemical compound [O-][N+]([O-])=O.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 DBUVZKQSYMGPFQ-UHFFFAOYSA-N 0.000 description 1
- HSPFYCYQLYXTDL-UHFFFAOYSA-M tetraphenylphosphanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 HSPFYCYQLYXTDL-UHFFFAOYSA-M 0.000 description 1
- WAGFXJQAIZNSEQ-UHFFFAOYSA-M tetraphenylphosphonium chloride Chemical compound [Cl-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 WAGFXJQAIZNSEQ-UHFFFAOYSA-M 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- YFCQYHXBNVEQKQ-UHFFFAOYSA-N tetrapropoxystannane Chemical compound CCCO[Sn](OCCC)(OCCC)OCCC YFCQYHXBNVEQKQ-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- BGQMOFGZRJUORO-UHFFFAOYSA-M tetrapropylammonium bromide Chemical compound [Br-].CCC[N+](CCC)(CCC)CCC BGQMOFGZRJUORO-UHFFFAOYSA-M 0.000 description 1
- WGBAQVHWLZBRJU-UHFFFAOYSA-M tetrapropylazanium;2,2,2-trichloroacetate Chemical compound [O-]C(=O)C(Cl)(Cl)Cl.CCC[N+](CCC)(CCC)CCC WGBAQVHWLZBRJU-UHFFFAOYSA-M 0.000 description 1
- BQBCSZFEFRYJPX-UHFFFAOYSA-M tetrapropylazanium;2,2,2-trifluoroacetate Chemical compound [O-]C(=O)C(F)(F)F.CCC[N+](CCC)(CCC)CCC BQBCSZFEFRYJPX-UHFFFAOYSA-M 0.000 description 1
- QOHLYFXRPYZSJX-UHFFFAOYSA-M tetrapropylazanium;benzoate Chemical compound [O-]C(=O)C1=CC=CC=C1.CCC[N+](CCC)(CCC)CCC QOHLYFXRPYZSJX-UHFFFAOYSA-M 0.000 description 1
- DKBLJGBNSOBLAO-UHFFFAOYSA-L tetrapropylazanium;carbonate Chemical compound [O-]C([O-])=O.CCC[N+](CCC)(CCC)CCC.CCC[N+](CCC)(CCC)CCC DKBLJGBNSOBLAO-UHFFFAOYSA-L 0.000 description 1
- FBEVECUEMUUFKM-UHFFFAOYSA-M tetrapropylazanium;chloride Chemical compound [Cl-].CCC[N+](CCC)(CCC)CCC FBEVECUEMUUFKM-UHFFFAOYSA-M 0.000 description 1
- LENBOWGJEQXFCI-UHFFFAOYSA-M tetrapropylazanium;formate Chemical compound [O-]C=O.CCC[N+](CCC)(CCC)CCC LENBOWGJEQXFCI-UHFFFAOYSA-M 0.000 description 1
- GKXDJYKZFZVASJ-UHFFFAOYSA-M tetrapropylazanium;iodide Chemical compound [I-].CCC[N+](CCC)(CCC)CCC GKXDJYKZFZVASJ-UHFFFAOYSA-M 0.000 description 1
- HZPNJVXVIFRTRF-UHFFFAOYSA-N tetrapropylazanium;nitrate Chemical compound [O-][N+]([O-])=O.CCC[N+](CCC)(CCC)CCC HZPNJVXVIFRTRF-UHFFFAOYSA-N 0.000 description 1
- IGVWFPZXBUTUCG-UHFFFAOYSA-M tetrapropylazanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.CCC[N+](CCC)(CCC)CCC IGVWFPZXBUTUCG-UHFFFAOYSA-M 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- JMXKSZRRTHPKDL-UHFFFAOYSA-N titanium ethoxide Chemical compound [Ti+4].CC[O-].CC[O-].CC[O-].CC[O-] JMXKSZRRTHPKDL-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical group CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- WOZZOSDBXABUFO-UHFFFAOYSA-N tri(butan-2-yloxy)alumane Chemical compound [Al+3].CCC(C)[O-].CCC(C)[O-].CCC(C)[O-] WOZZOSDBXABUFO-UHFFFAOYSA-N 0.000 description 1
- MQVCTPXBBSKLFS-UHFFFAOYSA-N tri(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](OC(C)C)(OC(C)C)OC(C)C MQVCTPXBBSKLFS-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ALVYUZIFSCKIFP-UHFFFAOYSA-N triethoxy(2-methylpropyl)silane Chemical compound CCO[Si](CC(C)C)(OCC)OCC ALVYUZIFSCKIFP-UHFFFAOYSA-N 0.000 description 1
- UMFJXASDGBJDEB-UHFFFAOYSA-N triethoxy(prop-2-enyl)silane Chemical compound CCO[Si](CC=C)(OCC)OCC UMFJXASDGBJDEB-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- DQWPFSLDHJDLRL-UHFFFAOYSA-N triethyl phosphate Chemical compound CCOP(=O)(OCC)OCC DQWPFSLDHJDLRL-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- WMSWXWGJYOIACA-UHFFFAOYSA-M triethyl(phenyl)azanium;iodide Chemical compound [I-].CC[N+](CC)(CC)C1=CC=CC=C1 WMSWXWGJYOIACA-UHFFFAOYSA-M 0.000 description 1
- LRFUMYYTRFKMMB-UHFFFAOYSA-N trifluoromethyl acetate Chemical compound CC(=O)OC(F)(F)F LRFUMYYTRFKMMB-UHFFFAOYSA-N 0.000 description 1
- QFCVQKSWGFVMTB-UHFFFAOYSA-N trihexoxyalumane Chemical compound [Al+3].CCCCCC[O-].CCCCCC[O-].CCCCCC[O-] QFCVQKSWGFVMTB-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- UAEJRRZPRZCUBE-UHFFFAOYSA-N trimethoxyalumane Chemical compound [Al+3].[O-]C.[O-]C.[O-]C UAEJRRZPRZCUBE-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- BFPOZPZYPNVMHU-UHFFFAOYSA-M trimethyl-[3-(trifluoromethyl)phenyl]azanium;hydroxide Chemical compound [OH-].C[N+](C)(C)C1=CC=CC(C(F)(F)F)=C1 BFPOZPZYPNVMHU-UHFFFAOYSA-M 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- ZNEOHLHCKGUAEB-UHFFFAOYSA-N trimethylphenylammonium Chemical compound C[N+](C)(C)C1=CC=CC=C1 ZNEOHLHCKGUAEB-UHFFFAOYSA-N 0.000 description 1
- HADKRTWCOYPCPH-UHFFFAOYSA-M trimethylphenylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C1=CC=CC=C1 HADKRTWCOYPCPH-UHFFFAOYSA-M 0.000 description 1
- LIJDDOXRYWAXQG-UHFFFAOYSA-N tripentoxyalumane Chemical compound CCCCCO[Al](OCCCCC)OCCCCC LIJDDOXRYWAXQG-UHFFFAOYSA-N 0.000 description 1
- XZZGCKRBJSPNEF-UHFFFAOYSA-M triphenylsulfanium;acetate Chemical compound CC([O-])=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 XZZGCKRBJSPNEF-UHFFFAOYSA-M 0.000 description 1
- GOUGVXDHOZBESW-UHFFFAOYSA-M triphenylsulfanium;benzoate Chemical compound [O-]C(=O)C1=CC=CC=C1.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 GOUGVXDHOZBESW-UHFFFAOYSA-M 0.000 description 1
- UGPPZNGBFLGAKN-UHFFFAOYSA-M triphenylsulfanium;formate Chemical compound [O-]C=O.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 UGPPZNGBFLGAKN-UHFFFAOYSA-M 0.000 description 1
- VUWVDNLZJXLQPT-UHFFFAOYSA-N tripropoxy(propyl)silane Chemical compound CCCO[Si](CCC)(OCCC)OCCC VUWVDNLZJXLQPT-UHFFFAOYSA-N 0.000 description 1
- OBROYCQXICMORW-UHFFFAOYSA-N tripropoxyalumane Chemical compound [Al+3].CCC[O-].CCC[O-].CCC[O-] OBROYCQXICMORW-UHFFFAOYSA-N 0.000 description 1
- RXPQRKFMDQNODS-UHFFFAOYSA-N tripropyl phosphate Chemical compound CCCOP(=O)(OCCC)OCCC RXPQRKFMDQNODS-UHFFFAOYSA-N 0.000 description 1
- QOPBTFMUVTXWFF-UHFFFAOYSA-N tripropyl phosphite Chemical compound CCCOP(OCCC)OCCC QOPBTFMUVTXWFF-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- KJIOQYGWTQBHNH-UHFFFAOYSA-N undecanol Chemical compound CCCCCCCCCCCO KJIOQYGWTQBHNH-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- DJIFSIBYHXVGSS-UHFFFAOYSA-J zirconium(4+);tetraphenoxide Chemical compound [Zr+4].[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1.[O-]C1=CC=CC=C1 DJIFSIBYHXVGSS-UHFFFAOYSA-J 0.000 description 1
Classifications
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
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Abstract
Description
本發明關於含矽之阻劑下層膜形成用組成物、及使用該組成物之圖案形成方法。
伴隨大規模積體電路(LSI)之高積體化與高速化,圖案尺寸之微細化正急速進展。微影技術隨著此微細化,利用光源之短波長化及適當選擇與其對應之阻劑組成物,而達成了微細圖案的形成。成為其中心的是以單層使用之正型光阻組成物。此單層正型光阻組成物,係藉由使阻劑樹脂中擁有對於利用氯系或氟系之氣體電漿所為之乾蝕刻具有蝕刻耐性之骨架,且擁有曝光部會溶解之類的開關機制,而使曝光部溶解來形成圖案,並以殘存的阻劑圖案作為蝕刻遮罩來對被加工基板進行乾蝕刻加工。
但是,在維持所使用的光阻膜之膜厚的狀態下進行微細化,亦即將圖案寬縮得更小的情況,光阻膜的解析性能會降低,又,欲利用顯影液來對光阻膜進行圖案顯影的話,會發生所謂縱橫比變得過大,結果造成圖案崩壞的問題。因此,伴隨圖案的微細化,光阻膜也逐漸薄膜化。
另一方面,被加工基板的加工,通常使用如下方法:以形成有圖案之光阻膜作為蝕刻遮罩,並利用乾蝕刻來對基板進行加工;但現實中並不存在能於光阻膜與被加工基板之間取得完全的蝕刻選擇性之乾蝕刻方法。因此,會有在基板的加工中,阻劑膜也受到損壞而崩壞,且阻劑圖案變得無法正確地轉印到被加工基板的問題。於是,伴隨圖案的微細化,光阻組成物亦逐漸尋求更高的乾蝕刻耐性。但是,另一方面,為了將解析度提高,光阻組成物所使用的樹脂已逐漸尋求在曝光波長的光吸收小之樹脂。因此,隨著曝光光短波長化成為i射線、KrF、ArF,光阻組成物所使用的樹脂也逐漸變化成酚醛清漆樹脂、擁有多羥基苯乙烯、脂肪族多環狀骨架之樹脂,但現實中基板加工時的乾蝕刻條件下之蝕刻速度逐漸變快,解析度高之最近的光阻組成物反而會有蝕刻耐性變弱的傾向。
考量此情形,而變得必須要以因為較薄而蝕刻耐性較弱的光阻膜來對被加工基板進行乾蝕刻加工,確保該加工步驟中的材料及處理已逐漸成為當務之急。
多層阻劑法係作為解決如此問題的方法之一。此方法係使與光阻膜(亦即阻劑上層膜)具有不同蝕刻選擇性的下層膜插介在阻劑上層膜與被加工基板之間,在阻劑上層膜獲得圖案後,以阻劑上層膜圖案作為乾蝕刻遮罩,利用乾蝕刻將圖案轉印到下層膜,再以下層膜作為乾蝕刻遮罩,利用乾蝕刻將圖案轉印到被加工基板之方法。
多層阻劑法中之一,有能使用單層阻劑法所使用的一般之阻劑組成物來實施的3層阻劑法。此3層阻劑法係例如:在被加工基板上將源自酚醛清漆樹脂等之有機膜予以成膜,於其上將含矽之阻劑下層膜予以成膜,再於其上形成通常的有機系光阻膜作為阻劑上層膜。在實施利用氟系氣體電漿所為之乾蝕刻時,有機系之阻劑上層膜由於可取得對比於含矽之阻劑下層膜為良好的蝕刻選擇比,故阻劑上層膜圖案可利用氟系氣體電漿所為之乾蝕刻而轉印到含矽之阻劑下層膜。根據此方法,即使使用難以形成具有用以直接對被加工基板進行加工之充分的膜厚之圖案的阻劑組成物、或對於基板的加工不具有充分的乾蝕刻耐性之阻劑組成物,仍可將圖案轉印到含矽之膜(阻劑下層膜),然後實施利用氧系或氫系氣體電漿所為之乾蝕刻之圖案轉印,則可獲得對於基板之加工具有充分的乾蝕刻耐性之源自酚醛清漆樹脂等之有機膜圖案。形成有機膜圖案後所殘留的含矽之膜通常會利用氟系氣體電漿所為之乾蝕刻、或鹼系、氟系等蝕刻液所為之濕式蝕刻,以不成為造成缺陷的原因之殘渣的方式予以去除。蝕刻速度不足時,發生來自含矽之膜的殘渣殘留而成為缺陷、或需要進行長時間的蝕刻處理而對被加工基板造成損壞等問題的可能性提高。如此為了正確的圖案化、及順利的去除,含矽之阻劑下層膜需要適當的蝕刻速度。
一方面,近年已開發出ArF浸潤式微影、EUV微影等,會逐漸趨於可形成更微細的圖案,另一方面,超微細圖案由於接地面積小,故極易崩塌,抑制圖案崩塌為非常大的課題。因此,抑止圖案崩塌的效果高之含矽之阻劑下層膜的開發成為當務之急。
在此,有人提出含有硬化觸媒之ArF或EUV微影用含矽之阻劑下層膜形成用組成物(專利文獻1、2)。該硬化觸媒係催化矽醇之縮合反應,並具有適於促進形成作為含矽之阻劑下層膜的主骨架之矽氧烷鍵結的結構。又,現已逐漸理解硬化觸媒的選擇會對阻劑下層膜的性質造成各種影響。例如可列舉酸-鹼性程度、親-疏水性、硬度、膜密度、蝕刻速度等。通過它們,進而也會對和上層阻劑之交互作用造成影響,而引起因密接性劣化導致之圖案崩塌、或阻劑拖尾之形狀,最後的基板加工不良會成為嚴重的問題。
另外還有人提出含有具有作為硬化觸媒而作用之基的矽烷化合物之含矽之阻劑下層膜形成用組成物作為含有硬化觸媒之含矽之阻劑下層膜形成用組成物(專利文獻3)。但是,在使用了EUV微影等之微細化更進一步之最先進的用途,有時會有圖案崩塌成為問題的情況,需要改善。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開2007-302873號
[專利文獻2]WO2013/161372號
[專利文獻3]WO2010/021290號
[發明所欲解決之課題]
本發明目的為提供:在多層阻劑法中,抑制超微細圖案崩塌的效果高,可形成良好的阻劑圖案,且具有適當的蝕刻速度之含矽之阻劑下層膜。
[解決課題之手段]
本發明係為了解決上述課題而成,提供一種含矽之阻劑下層膜形成用組成物,其特徵為至少含有下述通式(A-1)表示之4級銨鹽中之1種或2種以上、及熱交聯性聚矽氧烷(Sx)。
[化1]
式中,Ar1
表示也可具有取代基之碳數6~20之芳香族基、或碳數4~20之雜芳香族基。R11
分別獨立地表示碳數1~12之直鏈狀或分支狀或環狀之烷基、烯基、側氧基烷基或側氧基烯基、碳數6~20之有取代或無取代之芳基、或碳數7~12之芳烷基或芳基側氧基烷基,且這些基之一部分或全部的氫原子也可經取代。R11
中的2個也可互相鍵結並形成環。Z-
表示成為4級銨陽離子的相對離子之有機或無機陰離子。
本發明之含矽之阻劑下層膜形成用組成物所含的上述通式(A-1)表示之4級銨鹽係作為交聯觸媒而發揮功能,促進含矽之阻劑下層膜之熱硬化。熱硬化後之下層膜會兼具充分的蝕刻速度、及防止上層阻劑之圖案崩塌的效果、形成良好的阻劑圖案之效果。
本發明中,上述通式(A-1)表示之4級銨鹽宜為下述通式(A-2)表示者。
[化2]
式中,R11
如上所述。Z1-
表示成為4級銨陽離子的相對離子之有機或無機陰離子,且Z1-
之共軛酸Z1-H的沸點為200℃以下。
上述通式(A-1)表示之4級銨鹽係以上述通式(A-2)表示時,本發明的效果會更充分地發揮。
上述熱交聯性聚矽氧烷(Sx)宜含有下述通式(Sx-1)表示之重複單元、下述通式(Sx-2)表示之重複單元、及下述通式(Sx-3)表示之次結構中之任一種以上。
[化3]
[化4]
[化5]
式中,R1
、R2
、R3
分別為可相同也可相異之碳數1~30之1價有機基。
上述熱交聯性聚矽氧烷(Sx)含有上述特定結構時,本發明的效果會更充分地發揮。
本發明之含矽之阻劑下層膜形成用組成物可更含有酸產生劑。
藉由因應需要添加酸產生劑,可微調圖案形狀、曝光感度等。
本發明之含矽之阻劑下層膜形成用組成物含有酸產生劑時,酸產生劑宜為鋶鹽,且宜為利用高能射線的作用而產生酸之光酸產生劑。
此時,可將其它性能的降低控制在最小限度,同時可適度地調整阻劑上層膜的圖案形狀、曝光感度等,並且有時也會有對於減少來自阻劑上層膜的殘渣有效的情況。
本發明提供一種圖案形成方法,其特徵為包含下列步驟:於被加工體上使用塗佈型有機膜材料來形成有機膜、於前述有機膜之上使用上述所記載之含矽之阻劑下層膜形成用組成物來形成含矽之阻劑下層膜、於前述含矽之阻劑下層膜上使用由光阻組成物構成的阻劑上層膜用組成物來形成阻劑上層膜、於前述阻劑上層膜形成電路圖案、以前述形成有電路圖案之前述阻劑上層膜作為遮罩並利用蝕刻將圖案轉印到前述含矽之阻劑下層膜、以前述轉印有圖案之前述含矽之阻劑下層膜作為遮罩並利用蝕刻對前述有機膜進行圖案轉印、及以前述轉印有圖案之前述有機膜作為遮罩並利用蝕刻將圖案轉印到前述被加工體。
又,本發明提供一種圖案形成方法,其特徵為包含下列步驟:於被加工體上利用CVD法形成以碳作為主成分之硬遮罩、於前述硬遮罩之上使用上述所記載之含矽之阻劑下層膜形成用組成物來形成含矽之阻劑下層膜、於前述含矽之阻劑下層膜上使用由光阻組成物構成的阻劑上層膜用組成物來形成阻劑上層膜、於前述阻劑上層膜形成電路圖案、以前述形成有電路圖案之阻劑上層膜作為遮罩並利用蝕刻將圖案轉印到前述含矽之阻劑下層膜、以前述轉印有圖案之前述含矽之阻劑下層膜作為遮罩並利用乾蝕刻對前述硬遮罩進行圖案轉印、及以前述轉印有圖案之前述硬遮罩作為遮罩並利用乾蝕刻將圖案轉印到前述被加工體。
上述圖案形成方法會抑制阻劑上層膜的圖案崩塌,且可提供良好的阻劑圖案。又,乾蝕刻所為之朝含矽之阻劑下層膜之圖案轉印優良,此外,圖案化結束後所殘留的含矽之阻劑下層膜的去除容易且不易產生殘渣所導致之缺陷,故尤其在形成微細的圖案時係為實用的圖案形成方法。
於上述阻劑上層膜形成電路圖案之步驟中的圖案形成宜為利用波長為10nm以上且300nm以下之光微影、利用電子束所為之直接描繪、奈米壓印或它們的組合所為之圖案形成。
上述阻劑上層膜之圖案形成方法為上述特定之圖案形成方法時,本發明的效果會更充分地發揮。
上述被加工體可為半導體裝置基板、金屬膜、金屬碳化膜、金屬氧化膜、金屬氮化膜、金屬氧化碳化膜或金屬氧化氮化膜。
上述被加工體為上述特定者時,本發明的效果會更充分地發揮。
此外,構成上述被加工體的金屬宜為矽、鎵、鈦、鎢、鉿、鋯、鉻、鍺、銅、銀、金、銦、砷、鈀、鉭、銥、鋁、鐵、鉬、鈷或它們的合金。
構成上述被加工體的金屬為上述特定金屬時,本發明的效果會更充分地發揮。
[發明之效果]
含有特定結構的4級銨鹽之本發明之含矽之阻劑下層膜形成用組成物不僅可形成超微細的上層阻劑圖案而不會崩塌,還能形成良好的圖案形狀。又,由於阻劑上層膜與有機膜或硬遮罩之乾蝕刻選擇性優良,故能以良好產率於基板形成半導體裝置用之圖案。此外,本發明之含矽之阻劑下層膜形成用組成物可在和有機材料之間獲得高蝕刻選擇性,故可將形成的光阻圖案按順序使用乾蝕刻處理轉印到含矽之阻劑下層膜、有機膜或硬遮罩。又,本發明中,由於形成的含矽之阻劑下層膜具有充分的蝕刻速度,故圖案化結束後所殘留的含矽之阻劑下層膜可輕易去除,不易產生殘渣所導致之缺陷,故於微細的圖案之形成特別有效。
本發明關於用以形成半導體元件等之製造步驟中的微影所使用的塗佈型含矽之膜的組成物及使用該組成物之圖案形成方法。
如前所述,尋求可提供在多層阻劑法中,抑制超微細圖案崩塌的效果高,且可形成良好的阻劑圖案,並具有適當的蝕刻速度之含矽之阻劑下層膜的含矽之阻劑下層膜形成用組成物,及尋求使用該組成物之超微細圖案形成方法。
本發明人們為了達成前述目的而反覆深入探討後之結果發現,藉由將特定結構之4級銨鹽摻合於含矽之阻劑下層膜形成用組成物中,可提供在多層阻劑法中,抑制超微細圖案之崩塌,且可形成良好的阻劑圖案,更於加工時具有適當的蝕刻速度之含矽之阻劑下層膜,乃至完成本發明。
亦即,本發明為一種含矽之阻劑下層膜形成用組成物,至少含有後述通式(A-1)表示之4級銨鹽中之1種或2種以上、及熱交聯性聚矽氧烷(Sx)。
以下,針對本發明進行詳細地說明,但本發明不限於此。
<阻劑下層膜形成用組成物>
本發明之含矽之阻劑下層膜形成用組成物係至少含有下述通式(A-1)表示之4級銨鹽中之1種或2種以上、及熱交聯性聚矽氧烷(Sx)之含矽之阻劑下層膜形成用組成物。
[化6]
式中,Ar1
表示也可具有取代基之碳數6~20之芳香族基、或碳數4~20之雜芳香族基。R11
分別獨立地表示碳數1~12之直鏈狀或分支狀或環狀之烷基、烯基、側氧基烷基或側氧基烯基、碳數6~20之有取代或無取代之芳基、或碳數7~12之芳烷基或芳基側氧基烷基,且這些基之一部分或全部的氫原子也可經取代。R11
中的2個也可互相鍵結並形成環。Z-
表示成為4級銨陽離子的相對離子之有機或無機陰離子。
[通式(A-1)或(A-2)表示之4級銨鹽]
本發明之含矽之阻劑下層膜形成用組成物至少含有上述通式(A-1)表示之4級銨鹽中之1種或2種以上。該4級銨鹽係作為交聯觸媒而發揮功能,藉此促進熱硬化,形成的含矽之阻劑下層膜係由適當的組成、結構構成,具有足以用於加工之蝕刻速度。又,據認為該4級銨鹽中,氮原子具有的非共用電子對並不集中於直接鍵結的芳香環,故鹼性度可維持於適度,抑制上層阻劑之拖尾形狀同時成為適當的表面狀態,因而抑制了上層阻劑之圖案崩塌。
上述通式中,Ar1
表示也可具有取代基之碳數6~20之芳香族基、或碳數4~20之雜芳香族基。碳數6~20之芳香族基具體可例示:苯基、萘基、蒽基、菲基、芘基。碳數4~20之雜芳香族基具體可例示:呋喃基、硫代苯基、吡咯基、苯并呋喃基、吡啶基、吲哚基、㗁唑基、咪唑基、苯并咪唑基。也可具有的取代基可列舉:碳數1~12之直鏈狀或分支狀或環狀之飽和或不飽和烴基、芳香族烴基、雜芳香族基、烷氧基、羥基、酯基、羰基、胺基、鹵素基團、硫醚基、羧基、磺基、醯胺基、醯亞胺基、氰基、醛基、亞胺基、脲基、胺基甲酸酯基、碳酸酯基、硝基、磺醯基、及這些基組合而成的基。
上述通式中,R11
分別獨立地表示碳數1~12之直鏈狀或分支狀或環狀之烷基、烯基、側氧基烷基或側氧基烯基、碳數6~20之有取代或無取代之芳基、或碳數7~12之芳烷基或芳基側氧基烷基,且這些基之一部分或全部的氫原子也可經烷氧基等取代。烷基可列舉:甲基、乙基、丙基、異丙基、正丁基、二級丁基、三級丁基、戊基、己基、庚基、辛基、環戊基、環己基、環庚基、環丙基甲基、4-甲基環己基、環己基甲基、降莰基、金剛烷基等。烯基可列舉:乙烯基、烯丙基、丙烯基、丁烯基、己烯基、環己烯基等。側氧基烷基可列舉:2-側氧基環戊基、2-側氧基環己基、2-側氧基丙基、2-側氧基乙基、2-環戊基-2-側氧基乙基、2-環己基-2-側氧基乙基、2-(4-甲基環己基)-2-側氧基乙基等。側氧基烯基可列舉:3-側氧基丙烯基等。芳基可列舉:苯基、萘基、噻吩基等、或4-羥基苯基、4-甲氧基苯基、3-甲氧基苯基、2-甲氧基苯基、4-乙氧基苯基、4-三級丁氧基苯基、3-三級丁氧基苯基等烷氧基苯基;2-甲基苯基、3-甲基苯基、4-甲基苯基、4-乙基苯基、4-三級丁基苯基、4-正丁基苯基、2,4-二甲基苯基等烷基苯基;甲基萘基、乙基萘基等烷基萘基;甲氧基萘基、乙氧基萘基、正丙氧基萘基、正丁氧基萘基等烷氧基萘基;二甲基萘基、二乙基萘基等二烷基萘基;二甲氧基萘基、二乙氧基萘基等二烷氧基萘基等。芳烷基可列舉:苄基、1-苯基乙基、2-苯基乙基等。芳基側氧基烷基可列舉:2-苯基-2-側氧基乙基、2-(1-萘基)-2-側氧基乙基、2-(2-萘基)-2-側氧基乙基等2-芳基-2-側氧基乙基等。烷氧基可例示:甲氧基、乙氧基、三級丁氧基。又,R11
中的2個也可互相鍵結並形成環。此時,2個R11
鍵結而形成2價基。形成的2價基具體可例示:三亞甲基、四亞甲基、五亞甲基、3-氧雜五亞甲基、3-側氧基五亞甲基。
上述通式中,Z-
表示成為4級銨陽離子的相對離子之有機或無機陰離子。有機陰離子具體可例示:甲酸根、乙酸根、丙酸根、丁酸根、己酸根、苯甲酸根、三級丁基苯甲酸根、三氯乙酸根、三氟乙酸根、2-羥基-2,2-雙(三氟甲基)乙酸根、三甲基乙酸根、五氟丙酸根、甲烷磺酸根、丁烷磺酸根、苯磺酸根、甲苯磺酸根、三氟甲烷磺酸根、甲基硫酸根離子。無機陰離子具體可例示:氯化物離子、溴化物離子、碘化物離子、氟化物離子、氰化物離子、硝酸根離子、亞硝酸根離子、氫氧化物離子。
本發明中,上述通式(A-1)表示之4級銨鹽可單獨使用一種,也可混合使用二種以上。上述通式(A-1)表示之4級銨鹽的摻合量相對於後述基礎聚合物(Sx)100質量份,宜為0.01~50質量份,為0.1~40質量份更佳。
又,上述通式(A-1)表示之4級銨鹽宜以下述通式(A-2)表示。
[化7]
式中,R11
如上所述。Z1-
表示成為4級銨陽離子的相對離子之有機或無機陰離子,且Z1-
之共軛酸Z1-H的沸點為200℃以下。
上述通式(A-2)表示之4級銨鹽的相對離子Z1-
係以其共軛酸Z1-H的沸點成為200℃以下的方式進行選擇。共軛酸的沸點若為200℃以下,則不會有對阻劑之圖案崩塌表現負面作用之疑慮。共軛酸的沸點之下限並無特別限制,宜為-90℃以上。
上述通式(A-2)中,R11
與前述同樣。特徵係Z1-
表示成為4級銨陽離子的相對離子之有機或無機陰離子,且Z1-
之共軛酸Z1-H的沸點為200℃以下。Z1-
具體可例示:甲酸根、乙酸根、丙酸根、丁酸根、異丁酸根、三氯乙酸根、三氟乙酸根、一氯二氟乙酸根、2-羥基-2,2-雙(三氟甲基)乙酸根、三甲基乙酸根、五氟丙酸根、全氟丁酸根、甲烷磺酸根、三氟甲烷磺酸根、氯化物離子、溴化物離子、碘化物離子、氟化物離子、氰化物離子、硝酸根離子、亞硝酸根離子、氫氧化物離子。在提高本發明之效果的方面,其中,為三氟乙酸根、2-羥基-2,2-雙(三氟甲基)乙酸根、五氟丙酸根、氯化物離子、溴化物離子、碘化物離子、硝酸根離子更佳。
前述通式(A-1)或(A-2)表示之4級銨鹽更具體可例示下述化合物,但不限於此。下式中,Me表示甲基,Et表示乙基,Ph表示苯基,以下皆同樣。
[熱交聯性聚矽氧烷(Sx)]
本發明之含矽之阻劑下層膜形成用組成物除了含有上述通式(A-1)或(A-2)表示之4級銨鹽中之1種或2種以上之外,還含有熱交聯性聚矽氧烷(Sx)。
本發明所使用的熱交聯性聚矽氧烷(Sx)宜含有下述通式(Sx-1)表示之重複單元、下述通式(Sx-2)表示之重複單元、及下述通式(Sx-3)表示之次結構中之任一種以上。
[化11]
[化12]
[化13]
式中,R1
、R2
、R3
分別為可相同也可相異之碳數1~30之1價有機基。
上述熱交聯性聚矽氧烷(Sx)可藉由將如下之水解性單體(Sm)進行水解縮合而製造。
水解性單體(Sm)具體而言可例示:四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷、四異丙氧基矽烷、三甲氧基矽烷、三乙氧基矽烷、三丙氧基矽烷、三異丙氧基矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三丙氧基矽烷、甲基三異丙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙基三丙氧基矽烷、乙基三異丙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三丙氧基矽烷、乙烯基三異丙氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、丙基三丙氧基矽烷、丙基三異丙氧基矽烷、異丙基三甲氧基矽烷、異丙基三乙氧基矽烷、異丙基三丙氧基矽烷、異丙基三異丙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽烷、丁基三丙氧基矽烷、丁基三異丙氧基矽烷、二級丁基三甲氧基矽烷、二級丁基三乙氧基矽烷、二級丁基三丙氧基矽烷、二級丁基三異丙氧基矽烷、三級丁基三甲氧基矽烷、三級丁基三乙氧基矽烷、三級丁基三丙氧基矽烷、三級丁基三異丙氧基矽烷、環丙基三甲氧基矽烷、環丙基三乙氧基矽烷、環丙基三丙氧基矽烷、環丙基三異丙氧基矽烷、環丁基三甲氧基矽烷、環丁基三乙氧基矽烷、環丁基三丙氧基矽烷、環丁基三異丙氧基矽烷、環戊基三甲氧基矽烷、環戊基三乙氧基矽烷、環戊基三丙氧基矽烷、環戊基三異丙氧基矽烷、環己基三甲氧基矽烷、環己基三乙氧基矽烷、環己基三丙氧基矽烷、環己基三異丙氧基矽烷、環己烯基三甲氧基矽烷、環己烯基三乙氧基矽烷、環己烯基三丙氧基矽烷、環己烯基三異丙氧基矽烷、環己烯基乙基三甲氧基矽烷、環己烯基乙基三乙氧基矽烷、環己烯基乙基三丙氧基矽烷、環己烯基乙基三異丙氧基矽烷、環辛基三甲氧基矽烷、環辛基三乙氧基矽烷、環辛基三丙氧基矽烷、環辛基三異丙氧基矽烷、環戊二烯基丙基三甲氧基矽烷、環戊二烯基丙基三乙氧基矽烷、環戊二烯基丙基三丙氧基矽烷、環戊二烯基丙基三異丙氧基矽烷、雙環庚烯基三甲氧基矽烷、雙環庚烯基三乙氧基矽烷、雙環庚烯基三丙氧基矽烷、雙環庚烯基三異丙氧基矽烷、雙環庚基三甲氧基矽烷、雙環庚基三乙氧基矽烷、雙環庚基三丙氧基矽烷、雙環庚基三異丙氧基矽烷、金剛烷基三甲氧基矽烷、金剛烷基三乙氧基矽烷、金剛烷基三丙氧基矽烷、金剛烷基三異丙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苯基三丙氧基矽烷、苯基三異丙氧基矽烷、苄基三甲氧基矽烷、苄基三乙氧基矽烷、苄基三丙氧基矽烷、苄基三異丙氧基矽烷、甲氧基苄基三甲氧基矽烷、甲氧基苄基三乙氧基矽烷、甲氧基苄基三丙氧基矽烷、甲氧基苄基三異丙氧基矽烷、甲苯基三甲氧基矽烷、甲苯基三乙氧基矽烷、甲苯基三丙氧基矽烷、甲苯基三異丙氧基矽烷、苯乙基三甲氧基矽烷、苯乙基三乙氧基矽烷、苯乙基三丙氧基矽烷、苯乙基三異丙氧基矽烷、萘基三甲氧基矽烷、萘基三乙氧基矽烷、萘基三丙氧基矽烷、萘基三異丙氧基矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、甲基乙基二甲氧基矽烷、甲基乙基二乙氧基矽烷、二甲基二丙氧基矽烷、二甲基二異丙氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、二乙基二丙氧基矽烷、二乙基二異丙氧基矽烷、二丙基二甲氧基矽烷、二丙基二乙氧基矽烷、二丙基二丙氧基矽烷、二丙基二異丙氧基矽烷、二異丙基二甲氧基矽烷、二異丙基二乙氧基矽烷、二異丙基二丙氧基矽烷、二異丙基二異丙氧基矽烷、二丁基二甲氧基矽烷、二丁基二乙氧基矽烷、二丁基二丙氧基矽烷、二丁基二異丙氧基矽烷、二(二級丁基)二甲氧基矽烷、二(二級丁基)二乙氧基矽烷、二(二級丁基)二丙氧基矽烷、二(二級丁基)二異丙氧基矽烷、二(三級丁基)二甲氧基矽烷、二(三級丁基)二乙氧基矽烷、二(三級丁基)二丙氧基矽烷、二(三級丁基)二異丙氧基矽烷、二環丙基二甲氧基矽烷、二環丙基二乙氧基矽烷、二環丙基二丙氧基矽烷、二環丙基二異丙氧基矽烷、二環丁基二甲氧基矽烷、二環丁基二乙氧基矽烷、二環丁基二丙氧基矽烷、二環丁基二異丙氧基矽烷、二環戊基二甲氧基矽烷、二環戊基二乙氧基矽烷、二環戊基二丙氧基矽烷、二環戊基二異丙氧基矽烷、二環己基二甲氧基矽烷、二環己基二乙氧基矽烷、二環己基二丙氧基矽烷、二環己基二異丙氧基矽烷、二環己烯基二甲氧基矽烷、二環己烯基二乙氧基矽烷、二環己烯基二丙氧基矽烷、二環己烯基二異丙氧基矽烷、二環己烯基乙基二甲氧基矽烷、二環己烯基乙基二乙氧基矽烷、二環己烯基乙基二丙氧基矽烷、二環己烯基乙基二異丙氧基矽烷、二環辛基二甲氧基矽烷、二環辛基二乙氧基矽烷、二環辛基二丙氧基矽烷、二環辛基二異丙氧基矽烷、二環戊二烯基丙基二甲氧基矽烷、二環戊二烯基丙基二乙氧基矽烷、二環戊二烯基丙基二丙氧基矽烷、二環戊二烯基丙基二異丙氧基矽烷、二(雙環庚烯基)二甲氧基矽烷、二(雙環庚烯基)二乙氧基矽烷、二(雙環庚烯基)二丙氧基矽烷、二(雙環庚烯基)二異丙氧基矽烷、二(雙環庚基)二甲氧基矽烷、二(雙環庚基)二乙氧基矽烷、二(雙環庚基)二丙氧基矽烷、二(雙環庚基)二異丙氧基矽烷、二金剛烷基二甲氧基矽烷、二金剛烷基二乙氧基矽烷、二金剛烷基二丙氧基矽烷、二金剛烷基二異丙氧基矽烷、二苯基二甲氧基矽烷、二苯基二乙氧基矽烷、甲基苯基二甲氧基矽烷、甲基苯基二乙氧基矽烷、二苯基二丙氧基矽烷、二苯基二異丙氧基矽烷、三甲基甲氧基矽烷、三甲基乙氧基矽烷、二甲基乙基甲氧基矽烷、二甲基乙基乙氧基矽烷、二甲基苯基甲氧基矽烷、二甲基苯基乙氧基矽烷、二甲基苄基甲氧基矽烷、二甲基苄基乙氧基矽烷、二甲基苯乙基甲氧基矽烷、二甲基苯乙基乙氧基矽烷等。
上述化合物宜例示:四甲氧基矽烷、四乙氧基矽烷、甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、異丙基三甲氧基矽烷、異丙基三乙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽烷、異丁基三甲氧基矽烷、異丁基三乙氧基矽烷、烯丙基三甲氧基矽烷、烯丙基三乙氧基矽烷、環戊基三甲氧基矽烷、環戊基三乙氧基矽烷、環己基三甲氧基矽烷、環己基三乙氧基矽烷、環己烯基三甲氧基矽烷、環己烯基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、苄基三甲氧基矽烷、苄基三乙氧基矽烷、苯乙基三甲氧基矽烷、苯乙基三乙氧基矽烷、二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、甲基乙基二甲氧基矽烷、甲基乙基二乙氧基矽烷、二丙基二甲氧基矽烷、二丁基二甲氧基矽烷、甲基苯基二甲氧基矽烷、甲基苯基二乙氧基矽烷、三甲基甲氧基矽烷、二甲基乙基甲氧基矽烷、二甲基苯基甲氧基矽烷、二甲基苄基甲氧基矽烷、二甲基苯乙基甲氧基矽烷等。
對應如上所例示作為水解性單體(Sm)的化合物之上述R1
、R2
、R3
表示之有機基之另外的例子可列舉具有1個以上之碳-氧單鍵或碳-氧雙鍵之有機基。具體而言,為具有選自於由醚鍵、酯鍵、烷氧基、羥基等構成之群組中之1種以上的基之有機基。該例可列舉如下通式(Sm-R)表示者。
(P-Q1
-(S1
)v1
-Q2
-)u
-(T)v2
-Q3
-(S2
)v3
-Q4
- (Sm-R)
通式(Sm-R)中,P為氫原子、環狀醚基、羥基、碳數1~4之烷氧基、碳數1~6之烷基羰基氧基、或碳數1~6之烷基羰基,Q1
、Q2
、Q3
、及Q4
各自獨立地為-Cq
H(2q-p)
Pp
-,式中,P同於上述,p為0~3之整數,q為0~10之整數,惟,q=0表示單鍵,u為0~3之整數,S1
與S2
各自獨立地表示-O-、-CO-、-OCO-、-COO-或-OCOO-。v1、v2、及v3各自獨立地表示0或1。T為由碳以外的2價原子、脂環、芳香環或雜環構成的2價基。T為也可含有氧原子等雜原子之脂環、芳香環或雜環的例係如下所示。T和Q2
與和Q3
鍵結的位置並無特別限制,可考量立體性因素所致之反應性、反應所使用的市售試藥之取得性等而適當地選擇。
通式(Sm-R)中之具有1個以上之碳-氧單鍵或碳-氧雙鍵之有機基的理想例可列舉如下者。另外,下式中,(Si)係用來表示和Si的鍵結位置而記載。
又,R1
、R2
、R3
之有機基的例也可使用具有因酸而分解之保護基的有機基。具體而言可列舉:日本特開2013-167669號公報之(0043)段落至(0048)段落所列舉的有機基、得自於日本特開2013-224279號公報之(0056)段落所例示之矽化合物的有機基。
此外,R1
、R2
、R3
之有機基的例也可使用具有氟原子的有機基。具體而言可列舉:得自於日本特開2012-53253號公報之(0059)段落至(0065)段落所例示之矽化合物的有機基。
上述水解性單體(Sm)係於上述次結構中,在以(Si)表示之矽上鍵結1個、2個或3個氯、溴、碘、乙醯氧基、甲氧基、乙氧基、丙氧基或丁氧基等作為水解性基。
[熱交聯性聚矽氧烷(Sx)之合成方法]
(合成方法1:酸觸媒)
本發明之熱交聯性聚矽氧烷(Sx)可藉由將1種水解性單體(Sm)或2種以上之混合物在酸觸媒的存在下實施水解縮合來製造。
此時使用的酸觸媒可列舉甲酸、乙酸、草酸、馬來酸、甲磺酸、苯磺酸、甲苯磺酸等有機酸;氫氟酸、鹽酸、氫溴酸、硫酸、硝酸、過氯酸、磷酸等無機酸。觸媒的使用量相對於單體1莫耳,為1×10-6
~10莫耳,宜為1×10-5
~5莫耳,為1×10-4
~1莫耳更佳。
從這些單體利用水解縮合來獲得熱交聯性聚矽氧烷(Sx)時的水的量就鍵結於單體之水解性取代基每1莫耳而言,宜添加0.01~100莫耳,添加0.05~50莫耳更佳,添加0.1~30莫耳再更佳。若為100莫耳以下,則反應所使用的裝置較小,較為經濟。
操作方法為在觸媒水溶液中添加單體並使水解縮合反應開始。此時,也可在觸媒水溶液中添加有機溶劑,也可將單體利用有機溶劑進行稀釋,亦可實施兩者。反應溫度為0~100℃,宜為5~80℃。宜為在單體滴加時保持溫度於5~80℃,其後在20~80℃使其熟成之方法。
可添加到觸媒水溶液中之有機溶劑、或可稀釋單體之有機溶劑宜為甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丁醇、2-甲基-1-丙醇、丙酮、乙腈、四氫呋喃、甲苯、己烷、乙酸乙酯、甲乙酮、甲基異丁基酮、環己酮、甲基戊基酮、丁烷二醇單甲醚、丙二醇單甲醚、乙二醇單甲醚、丁烷二醇單乙醚、丙二醇單乙醚、乙二醇單乙醚、丙二醇二甲醚、二乙二醇二甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸三級丁酯、丙酸三級丁酯、丙二醇單三級丁醚乙酸酯、γ-丁內酯及它們的混合物等。
這些溶劑之中,理想為水溶性者。例如可例舉:甲醇、乙醇、1-丙醇、2-丙醇等醇類;乙二醇、丙二醇等多元醇;丁烷二醇單甲醚、丙二醇單甲醚、乙二醇單甲醚、丁烷二醇單乙醚、丙二醇單乙醚、乙二醇單乙醚、丁烷二醇單丙醚、丙二醇單丙醚、乙二醇單丙醚等多元醇縮合物衍生物;丙酮、乙腈、四氫呋喃等。其中特別理想係沸點為100℃以下者。
另外,有機溶劑的使用量相對於單體1莫耳,為0~1,000ml,為0~500ml特佳。有機溶劑的使用量較少的話,反應容器較小,較為經濟。
其後,若有需要則實施觸媒的中和反應,並獲得反應混合物水溶液。此時,中和能使用的鹼性物質的量相對於觸媒所使用的酸,宜為0.1~2當量。該鹼性物質若為在水中呈現鹼性者,則可為任意之物質。
然後,宜利用減壓去除等從反應混合物去除水解縮合反應所生成的醇等副產物。此時加熱反應混合物的溫度取決於所添加的有機溶劑與反應所產生的醇等之種類,宜為0~100℃,為10~90℃更佳,為15~80℃再更佳。又,此時的減壓度取決於欲去除的有機溶劑及醇等之種類、排氣裝置、冷凝濃縮裝置及加熱溫度而不同,宜為大氣壓力以下,為以絕對壓力計80kPa以下更佳,為以絕對壓力計50kPa以下再更佳。正確地得知此時去除的醇量並不容易,但去除約80質量%以上之生成的醇等較為理想。
然後,也可從反應混合物將水解縮合所使用的酸觸媒去除。去除酸觸媒的方法為將水與熱交聯性聚矽氧烷溶液混合,並利用有機溶劑萃取熱交聯性聚矽氧烷。此時使用的有機溶劑宜為可溶解熱交聯性聚矽氧烷,且使其和水混合的話會分離成2層者。例如可列舉:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丁醇、2-甲基-1-丙醇、丙酮、四氫呋喃、甲苯、己烷、乙酸乙酯、環己酮、甲基戊基酮、丁烷二醇單甲醚、丙二醇單甲醚、乙二醇單甲醚、丁烷二醇單乙醚、丙二醇單乙醚、乙二醇單乙醚、丁烷二醇單丙醚、丙二醇單丙醚、乙二醇單丙醚、丙二醇二甲醚、二乙二醇二甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸三級丁酯、丙酸三級丁酯、丙二醇單三級丁醚乙酸酯、γ-丁內酯、甲基異丁基酮、環戊基甲醚及它們的混合物等。
此外,也可使用水溶性有機溶劑與水難溶性有機溶劑的混合物。例如宜為甲醇-乙酸乙酯混合物、乙醇-乙酸乙酯混合物、1-丙醇-乙酸乙酯混合物、2-丙醇-乙酸乙酯混合物、丁烷二醇單甲醚-乙酸乙酯混合物、丙二醇單甲醚-乙酸乙酯混合物、乙二醇單甲醚-乙酸乙酯混合物、丁烷二醇單乙醚-乙酸乙酯混合物、丙二醇單乙醚-乙酸乙酯混合物、乙二醇單乙醚-乙酸乙酯混合物、丁烷二醇單丙醚-乙酸乙酯混合物、丙二醇單丙醚-乙酸乙酯混合物、乙二醇單丙醚-乙酸乙酯混合物、甲醇-甲基異丁基酮混合物、乙醇-甲基異丁基酮混合物、1-丙醇-甲基異丁基酮混合物、2-丙醇-甲基異丁基酮混合物、丙二醇單甲醚-甲基異丁基酮混合物、乙二醇單甲醚-甲基異丁基酮混合物、丙二醇單乙醚-甲基異丁基酮混合物、乙二醇單乙醚-甲基異丁基酮混合物、丙二醇單丙醚-甲基異丁基酮混合物、乙二醇單丙醚-甲基異丁基酮混合物、甲醇-環戊基甲醚混合物、乙醇-環戊基甲醚混合物、1-丙醇-環戊基甲醚混合物、2-丙醇-環戊基甲醚混合物、丙二醇單甲醚-環戊基甲醚混合物、乙二醇單甲醚-環戊基甲醚混合物、丙二醇單乙醚-環戊基甲醚混合物、乙二醇單乙醚-環戊基甲醚混合物、丙二醇單丙醚-環戊基甲醚混合物、乙二醇單丙醚-環戊基甲醚混合物、甲醇-丙二醇甲醚乙酸酯混合物、乙醇-丙二醇甲醚乙酸酯混合物、1-丙醇-丙二醇甲醚乙酸酯混合物、2-丙醇-丙二醇甲醚乙酸酯混合物、丙二醇單甲醚-丙二醇甲醚乙酸酯混合物、乙二醇單甲醚-丙二醇甲醚乙酸酯混合物、丙二醇單乙醚-丙二醇甲醚乙酸酯混合物、乙二醇單乙醚-丙二醇甲醚乙酸酯混合物、丙二醇單丙醚-丙二醇甲醚乙酸酯混合物、乙二醇單丙醚-丙二醇甲醚乙酸酯混合物等,但組合並不限於此。
另外,水溶性有機溶劑與水難溶性有機溶劑的混合比例可適當地選擇,水溶性有機溶劑相對於水難溶性有機溶劑100質量份,為0.1~1,000質量份,宜為1~500質量份,為2~100質量份更佳。
然後,也可以中性水進行清洗。該水若使用通常被稱為去離子水、超純水者即可。該水的量相對於熱交聯性聚矽氧烷溶液1L,為0.01~100L,宜為0.05~50L,為0.1~5L更佳。該清洗方法若為將兩者放入相同的容器並攪拌後靜置將水層分離即可。清洗次數為1次以上即可,即使清洗10次以上也無法獲得相應的清洗效果,故宜為約1~5次。
其它將酸觸媒去除的方法可列舉利用離子交換樹脂所為之方法、以環氧乙烷、環氧丙烷等環氧化合物中和後予以去除之方法。這些方法可配合反應所使用的酸觸媒而適當地選擇。
利用此時的水洗操作,熱交聯性聚矽氧烷的一部分會逃往水層,有時會得到實質上和分級操作同等的效果,故水洗次數、清洗水的量視觸媒去除效果與分級效果而適當地選擇即可。
無論將最終的溶劑添加於殘留有酸觸媒之熱交聯性聚矽氧烷溶液及去除了酸觸媒之熱交聯性聚矽氧烷溶液中之任一者,並於減壓下進行溶劑交換,都會獲得期望的熱交聯性聚矽氧烷溶液。此時溶劑交換的溫度取決於欲去除之反應溶劑、萃取溶劑的種類,宜為0~100℃,為10~90℃更佳,為15~80℃再更佳。又,此時的減壓度取決於欲去除的萃取溶劑之種類、排氣裝置、冷凝濃縮裝置及加熱溫度而不同,宜為大氣壓力以下,為以絕對壓力計80kPa以下更佳,為以絕對壓力計50kPa以下再更佳。
此時,因為變更溶劑有時會有熱交聯性聚矽氧烷變得不安定的情況。此係取決於最終的溶劑與熱交聯性聚矽氧烷之相容性(compatibility)而會發生,為了防止此情況,也可添加日本特開2009-126940號公報(0181)~(0182)段落所記載之具有環狀醚作為取代基之1元或2元以上的醇作為安定劑。添加量相對於溶劑交換前的溶液中之熱交聯性聚矽氧烷100質量份,為0~25質量份,宜為0~15質量份,為0~5質量份更佳,但有添加時宜為0.5質量份以上。溶劑交換前的溶液中若有需要,也可添加具有環狀醚作為取代基之1元或2元以上的醇後實施溶劑交換操作。
熱交聯性聚矽氧烷若濃縮到一定濃度以上的話,會有縮合反應更進一步進行,並變化成無法再溶解於有機溶劑之狀態的疑慮,故宜事先製成適當的濃度之溶液狀態。又,過於稀薄的話,溶劑的量變得過多,故事先製成適當的濃度之溶液狀態較為經濟且理想。此時的濃度宜為0.1~20質量%。
添加於熱交聯性聚矽氧烷溶液中之最終的溶劑宜為醇系溶劑,為乙二醇、二乙二醇、三乙二醇、丙二醇、二丙二醇、丁烷二醇等的單烷基醚衍生物特佳。具體而言,宜為丁烷二醇單甲醚、丙二醇單甲醚、乙二醇單甲醚、丁烷二醇單乙醚、丙二醇單乙醚、乙二醇單乙醚、丁烷二醇單丙醚、丙二醇單丙醚、乙二醇單丙醚、二丙酮醇等。
這些溶劑若為主成分,則也可添加非醇系溶劑作為輔助溶劑。該輔助溶劑可例示丙酮、四氫呋喃、甲苯、己烷、乙酸乙酯、環己酮、甲基戊基酮、丙二醇二甲醚、二乙二醇二甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸三級丁酯、丙酸三級丁酯、丙二醇單三級丁醚乙酸酯、γ-丁內酯、甲基異丁基酮、環戊基甲醚等。
又,使用了酸觸媒的另一反應操作係於單體或單體的有機溶液中添加水或含水有機溶劑並使水解反應開始。此時觸媒可添加在單體或單體的有機溶液中,也可添加在水或含水有機溶劑中。反應溫度為0~100℃,宜為10~80℃。宜為在水滴加時加熱到10~50℃,其後昇溫到20~80℃使其熟成的方法。
使用有機溶劑時,宜為水溶性者,可列舉:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丁醇、2-甲基-1-丙醇、丙酮、四氫呋喃、乙腈、丁烷二醇單甲醚、丙二醇單甲醚、乙二醇單甲醚、丁烷二醇單乙醚、丙二醇單乙醚、乙二醇單乙醚、丁烷二醇單丙醚、丙二醇單丙醚、乙二醇單丙醚、丙二醇二甲醚、二乙二醇二甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚等多元醇縮合物衍生物及它們的混合物等。
有機溶劑的使用量相對於單體1莫耳,為0~1,000ml,為0~500ml特佳。有機溶劑的使用量較少則反應容器較小,較為經濟。得到的反應混合物之後處理可和前述方法同樣地進行後處理,並獲得熱交聯性聚矽氧烷。
(合成方法2:鹼觸媒)
又,熱交聯性聚矽氧烷(Sx)可藉由將1種水解性單體(Sm)或2種以上之混合物在鹼觸媒的存在下實施水解縮合來製造。此時使用的鹼觸媒可列舉:甲胺、乙胺、丙胺、丁胺、乙二胺、六亞甲二胺、二甲胺、二乙胺、乙基甲胺、三甲胺、三乙胺、三丙胺、三丁胺、環己胺、二環己胺、單乙醇胺、二乙醇胺、二甲基單乙醇胺、單甲基二乙醇胺、三乙醇胺、二氮雜雙環辛烷、二氮雜雙環環壬烯、二氮雜雙環十一烯、六亞甲四胺、苯胺、N,N-二甲基苯胺、吡啶、N,N-二甲基胺基吡啶、吡咯、哌𠯤、吡咯啶、哌啶、甲吡啶、氫氧化四甲基銨、氫氧化膽鹼、氫氧化四丙基銨、氫氧化四丁基銨、氨、氫氧化鋰、氫氧化鈉、氫氧化鉀、氫氧化鋇、氫氧化鈣等。觸媒的使用量相對於矽單體1莫耳,為1×10-6
莫耳~10莫耳,宜為1×10-5
莫耳~5莫耳,為1×10-4
莫耳~1莫耳更佳。
從上述單體利用水解縮合來獲得熱交聯性聚矽氧烷時的水的量就鍵結於單體之水解性取代基每1莫耳而言,宜添加0.1~50莫耳。若為50莫耳以下,則反應所使用的裝置較小,較為經濟。
操作方法為在觸媒水溶液中添加單體並使水解縮合反應開始。此時,也可在觸媒水溶液中添加有機溶劑,也可將單體利用有機溶劑進行稀釋,亦可實施兩者。反應溫度為0~100℃,宜為5~80℃。宜為在單體滴加時保持溫度於5~80℃,其後在20~80℃使其熟成之方法。
可添加到鹼觸媒水溶液中之有機溶劑、或可稀釋單體之有機溶劑宜使用和例示作為可添加到酸觸媒水溶液中之有機溶劑同樣者。另外,為了經濟地實施反應,有機溶劑的使用量相對於單體1莫耳宜為0~1,000ml。
其後,若有需要則實施觸媒的中和反應,並獲得反應混合物水溶液。此時,中和能使用的酸性物質的量相對於觸媒所使用的鹼性物質,宜為0.1~2當量。該酸性物質若為在水中呈現酸性者,則可為任意之物質。
然後,宜利用減壓去除等從反應混合物去除水解縮合反應所生成的醇等副產物。此時加熱反應混合物的溫度取決於所添加的有機溶劑與反應所產生的醇之種類,但宜為0~100℃,為10~90℃更佳,為15~80℃再更佳。又,此時的減壓度取決於欲去除的有機溶劑及醇之種類、排氣裝置、冷凝濃縮裝置及加熱溫度而不同,宜為大氣壓力以下,為以絕對壓力計80kPa以下更佳,為以絕對壓力計50kPa以下再更佳。正確地得知此時去除的醇量並不容易,但去除約80質量%以上之生成的醇較為理想。
然後,為了去除水解縮合所使用的鹼觸媒,而利用有機溶劑萃取熱交聯性聚矽氧烷。此時使用的有機溶劑宜為可溶解熱交聯性聚矽氧烷,且使其和水混合的話會分離成2層者。例如可列舉:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丁醇、2-甲基-1-丙醇、丙酮、四氫呋喃、甲苯、己烷、乙酸乙酯、環己酮、甲基戊基酮、丙二醇單甲醚、乙二醇單甲醚、丙二醇單乙醚、乙二醇單乙醚、丙二醇單丙醚、乙二醇單丙醚、丙二醇二甲醚、二乙二醇二甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙酮酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙酸三級丁酯、丙酸三級丁酯、丙二醇單三級丁醚乙酸酯、γ-丁內酯、甲基異丁基酮、環戊基甲醚、及它們的混合物等。
此外,也可使用水溶性有機溶劑與水難溶性有機溶劑的混合物。
去除鹼觸媒時所使用的有機溶劑之具體例可使用:作為去除酸觸媒時所使用者而具體地例示之上述有機溶劑、或和水溶性有機溶劑與水難性有機溶劑的混合物同樣者。
另外,水溶性有機溶劑與水難溶性有機溶劑的混合比例可適當地選擇,水溶性有機溶劑相對於難溶性有機溶劑100質量份,為0.1~1,000質量份,宜為1~500質量份,為2~100質量份更佳。
然後,以中性水進行清洗。該水若使用通常被稱為去離子水、超純水者即可。該水的量相對於熱交聯性聚矽氧烷溶液1L,為0.01~100L,宜為0.05~50L,為0.1~5L更佳。該清洗方法若為將兩者放入相同的容器並攪拌後靜置將水層分離即可。清洗次數為1次以上即可,即使清洗10次以上也無法獲得相應的清洗效果,故宜為約1~5次。
於清洗完畢的熱交聯性聚矽氧烷溶液中添加最終的溶劑,並於減壓下進行溶劑交換,藉此獲得期望的熱交聯性聚矽氧烷溶液。此時溶劑交換的溫度取決於欲去除之萃取溶劑的種類,宜為0~100℃,為10~90℃更佳,為15~80℃再更佳。又,此時的減壓度取決於欲去除的萃取溶劑之種類、排氣裝置、冷凝濃縮裝置及加熱溫度而不同,宜為大氣壓力以下,為以絕對壓力計80kPa以下更佳,為以絕對壓力計50kPa以下再更佳。
添加於熱交聯性聚矽氧烷溶液中之最終的溶劑宜為醇系溶劑,為乙二醇、二乙二醇、三乙二醇等的單烷基醚、丙二醇、二丙二醇等的單烷基醚特佳。具體而言,宜為丙二醇單甲醚、乙二醇單甲醚、丙二醇單乙醚、乙二醇單乙醚、丙二醇單丙醚、乙二醇單丙醚、二丙酮醇等。
又,使用了鹼觸媒的另一反應操作係於單體或單體的有機溶液中添加水或含水有機溶劑並使水解反應開始。此時觸媒可添加在單體或單體的有機溶液中,也可添加在水或含水有機溶劑中。反應溫度為0~100℃,宜為10~80℃。宜為在水滴加時加熱到10~50℃,其後昇溫到20~80℃使其熟成的方法。
可使用作為單體的有機溶液或含水有機溶劑的有機溶劑宜為水溶性者,可列舉:甲醇、乙醇、1-丙醇、2-丙醇、1-丁醇、2-丁醇、2-甲基-1-丙醇、丙酮、四氫呋喃、乙腈、丙二醇單甲醚、乙二醇單甲醚、丙二醇單乙醚、乙二醇單乙醚、丙二醇單丙醚、乙二醇單丙醚、丙二醇二甲醚、二乙二醇二甲醚、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯、丙二醇單丙醚等多元醇縮合物衍生物及它們的混合物等。
利用上述合成方法1或2獲得的熱交聯性聚矽氧烷的分子量不僅可藉由單體的選擇來調整,還可藉由控制聚合時的反應條件來調整,宜使用重量平均分子量100,000以下者,使用200~50,000者更佳,使用300~30,000者再更佳。重量平均分子量若為100,000以下,則不會有異物的產生、發生塗佈不均的情況。另外,上述重量平均分子量相關之數據係利用使用RI作為檢測器並使用四氫呋喃作為溶離溶劑之凝膠滲透層析法(GPC),並使用聚苯乙烯作為標準物質,以聚苯乙烯換算來表示分子量。
本發明使用的熱交聯性聚矽氧烷的物性取決於水解縮合時所使用的酸或鹼觸媒的種類、反應條件而不同。因此,可配合作為目的之阻劑下層膜的性能而適當地選擇。
此外,還可使用將1種或2種以上之水解性單體(Sm)與下述通式(Mm)表示之水解性金屬化合物的混合物以使用前述酸或鹼觸媒之條件製造而得的聚矽氧烷衍生物,作為阻劑下層膜形成用組成物的成分。
[化18]
式中,R7
、R8
為碳數1~30之有機基,m7+m8係依U的種類而決定之和價數相同的數,m7、m8為0以上之整數,U為週期表的III族、IV族、或V族的元素,且排除碳及矽。
此時使用的上述通式(Mm)表示之水解性金屬化合物可例示如下者。
U為硼時,通式(Mm)表示之化合物可例示甲氧基硼、乙氧基硼、丙氧基硼、丁氧基硼、戊氧基硼、己氧基硼、環戊氧基硼、環己氧基硼、烯丙氧基硼、苯氧基硼、甲氧基乙氧基硼、硼酸、氧化硼等作為單體。
U為鋁時,通式(Mm)表示之化合物可例示甲氧基鋁、乙氧基鋁、丙氧基鋁、丁氧基鋁、戊氧基鋁、己氧基鋁、環戊氧基鋁、環己氧基鋁、烯丙氧基鋁、苯氧基鋁、甲氧基乙氧基鋁、乙氧基乙氧基鋁、二丙氧基乙基乙醯乙酸鋁、二丁氧基乙基乙醯乙酸鋁、丙氧基雙乙基乙醯乙酸鋁、丁氧基雙乙基乙醯乙酸鋁、2,4-戊二酮酸鋁、2,2,6,6-四甲基-3,5-庚二酮酸鋁等作為單體。
U為鎵時,通式(Mm)表示之化合物可例示甲氧基鎵、乙氧基鎵、丙氧基鎵、丁氧基鎵、戊氧基鎵、己氧基鎵、環戊氧基鎵、環己氧基鎵、烯丙氧基鎵、苯氧基鎵、甲氧基乙氧基鎵、乙氧基乙氧基鎵、二丙氧基乙基乙醯乙酸鎵、二丁氧基乙基乙醯乙酸鎵、丙氧基雙乙基乙醯乙酸鎵、丁氧基雙乙基乙醯乙酸鎵、2,4-戊二酮酸鎵、2,2,6,6-四甲基-3,5-庚二酮酸鎵等作為單體。
U為釔時,通式(Mm)表示之化合物可例示甲氧基釔、乙氧基釔、丙氧基釔、丁氧基釔、戊氧基釔、己氧基釔、環戊氧基釔、環己氧基釔、烯丙氧基釔、苯氧基釔、甲氧基乙氧基釔、乙氧基乙氧基釔、二丙氧基乙基乙醯乙酸釔、二丁氧基乙基乙醯乙酸釔、丙氧基雙乙基乙醯乙酸釔、丁氧基雙乙基乙醯乙酸釔、2,4-戊二酮酸釔、2,2,6,6-四甲基-3,5-庚二酮酸釔等作為單體。
U為鍺時,通式(Mm)表示之化合物可例示甲氧基鍺、乙氧基鍺、丙氧基鍺、丁氧基鍺、戊氧基鍺、己氧基鍺、環戊氧基鍺、環己氧基鍺、烯丙氧基鍺、苯氧基鍺、甲氧基乙氧基鍺、乙氧基乙氧基鍺等作為單體。
U為鈦時,通式(Mm)表示之化合物可例示甲氧基鈦、乙氧基鈦、丙氧基鈦、丁氧基鈦、戊氧基鈦、己氧基鈦、環戊氧基鈦、環己氧基鈦、烯丙氧基鈦、苯氧基鈦、甲氧基乙氧基鈦、乙氧基乙氧基鈦、二丙氧基雙乙基乙醯乙酸鈦、二丁氧基雙乙基乙醯乙酸鈦、二丙氧基雙2,4-戊二酮酸鈦、二丁氧基雙2,4-戊二酮酸鈦等作為單體。
U為鉿時,通式(Mm)表示之化合物可例示甲氧基鉿、乙氧基鉿、丙氧基鉿、丁氧基鉿、戊氧基鉿、己氧基鉿、環戊氧基鉿、環己氧基鉿、烯丙氧基鉿、苯氧基鉿、甲氧基乙氧基鉿、乙氧基乙氧基鉿、二丙氧基雙乙基乙醯乙酸鉿、二丁氧基雙乙基乙醯乙酸鉿、二丙氧基雙2,4-戊二酮酸鉿、二丁氧基雙2,4-戊二酮酸鉿等作為單體。
U為錫時,通式(Mm)表示之化合物可例示甲氧基錫、乙氧基錫、丙氧基錫、丁氧基錫、苯氧基錫、甲氧基乙氧基錫、乙氧基乙氧基錫、2,4-戊二酮酸錫、2,2,6,6-四甲基-3,5-庚二酮酸錫等作為單體。
U為砷時,通式(Mm)表示之化合物可例示甲氧基砷、乙氧基砷、丙氧基砷、丁氧基砷、苯氧基砷等作為單體。
U為銻時,通式(Mm)表示之化合物可例示甲氧基銻、乙氧基銻、丙氧基銻、丁氧基銻、苯氧基銻、乙酸銻、丙酸銻等作為單體。
U為鈮時,通式(Mm)表示之化合物可例示甲氧基鈮、乙氧基鈮、丙氧基鈮、丁氧基鈮、苯氧基鈮等作為單體。
U為鉭時,通式(Mm)表示之化合物可例示甲氧基鉭、乙氧基鉭、丙氧基鉭、丁氧基鉭、苯氧基鉭等作為單體。
U為鉍時,通式(Mm)表示之化合物可例示甲氧基鉍、乙氧基鉍、丙氧基鉍、丁氧基鉍、苯氧基鉍等作為單體。
U為磷時,通式(Mm)表示之化合物可例示磷酸三甲酯、磷酸三乙酯、磷酸三丙酯、亞磷酸三甲酯、亞磷酸三乙酯、亞磷酸三丙酯、五氧化二磷等作為單體。
U為釩時,通式(Mm)表示之化合物可例示雙(2,4-戊二酮酸)氧化釩、2,4-戊二酮酸釩、三丁氧基氧化釩、三丙氧基氧化釩等作為單體。
U為鋯時,通式(Mm)表示之化合物可例示甲氧基鋯、乙氧基鋯、丙氧基鋯、丁氧基鋯、苯氧基鋯、雙(2,4-戊二酮酸)二丁氧基鋯、雙(2,2,6,6-四甲基-3,5-庚二酮酸)二丙氧基鋯等作為單體。
(酸產生劑)
本發明之含矽之阻劑下層膜形成用組成物也可更摻合1種或2種以上之酸產生劑。酸產生劑若為以熱酸產生劑、光酸產生劑、酸增殖劑等酸前驅體之形式而作用之物質,則可使用任一種,本發明中摻合的酸產生劑為係鋶鹽且利用高能射線的作用而產生酸之光酸產生劑更佳。更具體而言,可例示:日本特開2009-126940號公報(0160)~(0179)段落所記載之材料,但不限於此。
[其它成分]
(交聯觸媒(Xc))
本發明之含矽之阻劑下層膜形成用組成物除了摻合前述通式(A-1)表示之4級銨鹽之外,也可摻合其它交聯觸媒(Xc)。可摻合的交聯觸媒(Xc)可列舉下述通式(Xc0)表示之化合物。
La
Hb
A (Xc0)
式中,L為鋰、鈉、鉀、銣、銫、鋶、錪、鏻或銨,A為非親核性相對離子,a為1以上之整數,b為0或1以上之整數,且a+b為非親核性相對離子之價數。
就具體的(Xc0)而言,本發明使用的交聯觸媒(Xc)可列舉下述通式(Xc-1)之鋶鹽、(Xc-2)之錪鹽、(Xc-3)之鏻鹽、(Xc-4)之銨鹽、鹼金屬鹽等。
鋶鹽(Xc-1)、錪鹽(Xc-2)、鏻鹽(Xc-3)可例示如下者。
[化20]
式中,R204
、R205
、R206
、R207
分別表示碳數1~12之直鏈狀或分支狀或環狀的烷基、烯基、側氧基烷基或側氧基烯基、碳數6~20之有取代或無取代之芳基、或碳數7~12之芳烷基或芳基側氧基烷基,這些基之一部分或全部的氫原子也可取代為烷氧基等。又,R205
和R206
也可形成環,形成環時,R205
、R206
分別表示碳數1~6之伸烷基。A-
表示非親核性相對離子。R208
、R209
、R210
、R211
係和R204
、R205
、R206
、R207
同樣,但也可為氫原子。R208
和R209
、R208
和R209
和R210
也可形成環,形成環時,R208
和R209
以及R208
和R209
和R210
表示碳數3~10之伸烷基。
上述R204
、R205
、R206
、R207
、R208
、R209
、R210
、R211
可互為相同也可相異,具體而言可列舉甲基、乙基、丙基、異丙基、正丁基、二級丁基、三級丁基、戊基、己基、庚基、辛基等烷基;環戊基、環己基、環庚基、環丙基甲基、4-甲基環己基、環己基甲基、降莰基、金剛烷基等。烯基可列舉乙烯基、烯丙基、丙烯基、丁烯基、己烯基、環己烯基等。側氧基烷基可列舉2-側氧基環戊基、2-側氧基環己基等,還可列舉2-側氧基丙基、2-環戊基-2-側氧基乙基、2-環己基-2-側氧基乙基、2-(4-甲基環己基)-2-側氧基乙基等。芳基可列舉苯基、萘基等、或對甲氧基苯基、間甲氧基苯基、鄰甲氧基苯基、乙氧基苯基、對三級丁氧基苯基、間三級丁氧基苯基等烷氧基苯基;2-甲基苯基、3-甲基苯基、4-甲基苯基、乙基苯基、4-三級丁基苯基、4-丁基苯基、二甲基苯基等烷基苯基;甲基萘基、乙基萘基等烷基萘基;甲氧基萘基、乙氧基萘基等烷氧基萘基;二甲基萘基、二乙基萘基等二烷基萘基;二甲氧基萘基、二乙氧基萘基等二烷氧基萘基等。芳烷基可列舉苄基、苯基乙基、苯乙基等。芳基側氧基烷基可列舉2-苯基-2-側氧基乙基、2-(1-萘基)-2-側氧基乙基、2-(2-萘基)-2-側氧基乙基等2-芳基-2-側氧基乙基等。
A-
之非親核性相對離子可列舉氫氧根離子、甲酸根離子、乙酸根離子、丙酸根離子、丁酸根離子、戊酸根離子、己酸根離子、庚酸根離子、辛酸根離子、壬酸根離子、癸酸根離子、油酸根離子、硬脂酸根離子、亞麻油酸根離子、次亞麻油酸根離子、苯甲酸根離子、鄰苯二甲酸根離子、間苯二甲酸根離子、對苯二甲酸根離子、水楊酸根離子、三氟乙酸根離子、單氯乙酸根離子、二氯乙酸根離子、三氯乙酸根離子、氟離子、氯離子、溴離子、碘離子、硝酸根離子、亞硝酸根離子、氯酸根離子、溴酸根離子、甲磺酸根離子、對甲苯磺酸根離子、單甲基硫酸根離子等1價離子;1價或2價之草酸根離子、丙二酸根離子、甲基丙二酸根離子、乙基丙二酸根離子、丙基丙二酸根離子、丁基丙二酸根離子、二甲基丙二酸根離子、二乙基丙二酸根離子、琥珀酸根離子、甲基琥珀酸根離子、戊二酸根離子、己二酸根離子、伊康酸根離子、馬來酸根離子、富馬酸根離子、檸康酸根離子、檸檬酸根離子、碳酸根離子、硫酸根離子等。
鹼金屬鹽可列舉鋰、鈉、鉀、銫、鎂、鈣的氫氧化鹽、甲酸鹽、乙酸鹽、丙酸鹽、丁酸鹽、戊酸鹽、己酸鹽、庚酸鹽、辛酸鹽、壬酸鹽、癸酸鹽、油酸鹽、硬脂酸鹽、亞麻油酸鹽、次亞麻油酸鹽、苯甲酸鹽、鄰苯二甲酸鹽、間苯二甲酸鹽、對苯二甲酸鹽、水楊酸鹽、三氟乙酸鹽、單氯乙酸鹽、二氯乙酸鹽、三氯乙酸鹽等1價鹽;1價或2價之草酸鹽、丙二酸鹽、甲基丙二酸鹽、乙基丙二酸鹽、丙基丙二酸鹽、丁基丙二酸鹽、二甲基丙二酸鹽、二乙基丙二酸鹽、琥珀酸鹽、甲基琥珀酸鹽、戊二酸鹽、己二酸鹽、伊康酸鹽、馬來酸鹽、富馬酸鹽、檸康酸鹽、檸檬酸鹽、碳酸鹽等。
具體而言,鋶鹽(Xc-1)可列舉甲酸三苯基鋶、乙酸三苯基鋶、丙酸三苯基鋶、丁酸三苯基鋶、苯甲酸三苯基鋶、鄰苯二甲酸三苯基鋶、間苯二甲酸三苯基鋶、對苯二甲酸三苯基鋶、水楊酸三苯基鋶、三氟甲磺酸三苯基鋶、三氟乙酸三苯基鋶、單氯乙酸三苯基鋶、二氯乙酸三苯基鋶、三氯乙酸三苯基鋶、氫氧化三苯基鋶、硝酸三苯基鋶、氯化三苯基鋶、溴化三苯基鋶、草酸三苯基鋶、丙二酸三苯基鋶、甲基丙二酸三苯基鋶、乙基丙二酸三苯基鋶、丙基丙二酸三苯基鋶、丁基丙二酸三苯基鋶、二甲基丙二酸三苯基鋶、二乙基丙二酸三苯基鋶、琥珀酸三苯基鋶、甲基琥珀酸三苯基鋶、戊二酸三苯基鋶、己二酸三苯基鋶、伊康酸三苯基鋶、馬來酸三苯基鋶、富馬酸三苯基鋶、檸康酸三苯基鋶、檸檬酸三苯基鋶、碳酸三苯基鋶、草酸雙三苯基鋶、馬來酸雙三苯基鋶、富馬酸雙三苯基鋶、檸康酸雙三苯基鋶、檸檬酸雙三苯基鋶、碳酸雙三苯基鋶等。
又,錪鹽(Xc-2)具體而言可列舉甲酸二苯基錪、乙酸二苯基錪、丙酸二苯基錪、丁酸二苯基錪、苯甲酸二苯基錪、鄰苯二甲酸二苯基錪、間苯二甲酸二苯基錪、對苯二甲酸二苯基錪、水楊酸二苯基錪、三氟甲磺酸二苯基錪、三氟乙酸二苯基錪、單氯乙酸二苯基錪、二氯乙酸二苯基錪、三氯乙酸二苯基錪、氫氧化二苯基錪、硝酸二苯基錪、氯化二苯基錪、溴化二苯基錪、碘化二苯基錪、草酸二苯基錪、馬來酸二苯基錪、富馬酸二苯基錪、檸康酸二苯基錪、檸檬酸二苯基錪、碳酸二苯基錪、草酸雙二苯基錪、馬來酸雙二苯基錪、富馬酸雙二苯基錪、檸康酸雙二苯基錪、檸檬酸雙二苯基錪、碳酸雙二苯基錪等。
又,鏻鹽(Xc-3)具體而言可列舉甲酸四乙基鏻、乙酸四乙基鏻、丙酸四乙基鏻、丁酸四乙基鏻、苯甲酸四乙基鏻、鄰苯二甲酸四乙基鏻、間苯二甲酸四乙基鏻、對苯二甲酸四乙基鏻、水楊酸四乙基鏻、三氟甲磺酸四乙基鏻、三氟乙酸四乙基鏻、單氯乙酸四乙基鏻、二氯乙酸四乙基鏻、三氯乙酸四乙基鏻、氫氧化四乙基鏻、硝酸四乙基鏻、氯化四乙基鏻、溴化四乙基鏻、碘化四乙基鏻、草酸四乙基鏻、馬來酸四乙基鏻、富馬酸四乙基鏻、檸康酸四乙基鏻、檸檬酸四乙基鏻、碳酸四乙基鏻、草酸雙四乙基鏻、馬來酸雙四乙基鏻、富馬酸雙四乙基鏻、檸康酸雙四乙基鏻、檸檬酸雙四乙基鏻、碳酸雙四乙基鏻、甲酸四苯基鏻、乙酸四苯基鏻、丙酸四苯基鏻、丁酸四苯基鏻、苯甲酸四苯基鏻、鄰苯二甲酸四苯基鏻、間苯二甲酸四苯基鏻、對苯二甲酸四苯基鏻、水楊酸四苯基鏻、三氟甲磺酸四苯基鏻、三氟乙酸四苯基鏻、單氯乙酸四苯基鏻、二氯乙酸四苯基鏻、三氯乙酸四苯基鏻、氫氧化四苯基鏻、硝酸四苯基鏻、氯化四苯基鏻、溴化四苯基鏻、碘化四苯基鏻、草酸四苯基鏻、馬來酸四苯基鏻、富馬酸四苯基鏻、檸康酸四苯基鏻、檸檬酸四苯基鏻、碳酸四苯基鏻、草酸雙四苯基鏻、馬來酸雙四苯基鏻、富馬酸雙四苯基鏻、檸康酸雙四苯基鏻、檸檬酸雙四苯基鏻、碳酸雙四苯基鏻等。
另一方面,銨鹽(Xc-4)具體而言可例示甲酸四甲基銨、乙酸四甲基銨、丙酸四甲基銨、丁酸四甲基銨、苯甲酸四甲基銨、鄰苯二甲酸四甲基銨、間苯二甲酸四甲基銨、對苯二甲酸四甲基銨、水楊酸四甲基銨、三氟甲磺酸四甲基銨、三氟乙酸四甲基銨、單氯乙酸四甲基銨、二氯乙酸四甲基銨、三氯乙酸四甲基銨、氫氧化四甲基銨、硝酸四甲基銨、氯化四甲基銨、溴化四甲基銨、碘化四甲基銨、單甲基硫酸四甲基銨、草酸四甲基銨、丙二酸四甲基銨、馬來酸四甲基銨、富馬酸四甲基銨、檸康酸四甲基銨、檸檬酸四甲基銨、碳酸四甲基銨、草酸雙四甲基銨、丙二酸雙四甲基銨、馬來酸雙四甲基銨、富馬酸雙四甲基銨、檸康酸雙四甲基銨、檸檬酸雙四甲基銨、碳酸雙四甲基銨、甲酸四乙基銨、乙酸四乙基銨、丙酸四乙基銨、丁酸四乙基銨、苯甲酸四乙基銨、鄰苯二甲酸四乙基銨、間苯二甲酸四乙基銨、對苯二甲酸四乙基銨、水楊酸四乙基銨、三氟甲磺酸四乙基銨、三氟乙酸四乙基銨、單氯乙酸四乙基銨、二氯乙酸四乙基銨、三氯乙酸四乙基銨、氫氧化四乙基銨、硝酸四乙基銨、氯化四乙基銨、溴化四乙基銨、碘化四乙基銨、單甲基硫酸四乙基銨、草酸四乙基銨、丙二酸四乙基銨、馬來酸四乙基銨、富馬酸四乙基銨、檸康酸四乙基銨、檸檬酸四乙基銨、碳酸四乙基銨、草酸雙四乙基銨、丙二酸雙四乙基銨、馬來酸雙四乙基銨、富馬酸雙四乙基銨、檸康酸雙四乙基銨、檸檬酸雙四乙基銨、碳酸雙四乙基銨、甲酸四丙基銨、乙酸四丙基銨、丙酸四丙基銨、丁酸四丙基銨、苯甲酸四丙基銨、鄰苯二甲酸四丙基銨、間苯二甲酸四丙基銨、對苯二甲酸四丙基銨、水楊酸四丙基銨、三氟甲磺酸四丙基銨、三氟乙酸四丙基銨、單氯乙酸四丙基銨、二氯乙酸四丙基銨、三氯乙酸四丙基銨、氫氧化四丙基銨、硝酸四丙基銨、氯化四丙基銨、溴化四丙基銨、碘化四丙基銨、單甲基硫酸四丙基銨、草酸四丙基銨、丙二酸四丙基銨、馬來酸四丙基銨、富馬酸四丙基銨、檸康酸四丙基銨、檸檬酸四丙基銨、碳酸四丙基銨、草酸雙四丙基銨、丙二酸雙四丙基銨、馬來酸雙四丙基銨、富馬酸雙四丙基銨、檸康酸雙四丙基銨、檸檬酸雙四丙基銨、碳酸雙四丙基銨、甲酸四丁基銨、乙酸四丁基銨、丙酸四丁基銨、丁酸四丁基銨、苯甲酸四丁基銨、鄰苯二甲酸四丁基銨、間苯二甲酸四丁基銨、對苯二甲酸四丁基銨、水楊酸四丁基銨、三氟甲磺酸四丁基銨、三氟乙酸四丁基銨、單氯乙酸四丁基銨、二氯乙酸四丁基銨、三氯乙酸四丁基銨、氫氧化四丁基銨、硝酸四丁基銨、氯化四丁基銨、溴化四丁基銨、碘化四丁基銨、甲磺酸四丁基銨、單甲基硫酸四丁基銨、草酸四丁基銨、丙二酸四丁基銨、馬來酸四丁基銨、富馬酸四丁基銨、檸康酸四丁基銨、檸檬酸四丁基銨、碳酸四丁基銨、草酸雙四丁基銨、丙二酸雙四丁基銨、馬來酸雙四丁基銨、富馬酸雙四丁基銨、檸康酸雙四丁基銨、檸檬酸雙四丁基銨、碳酸雙四丁基銨等。
鹼金屬鹽可例示甲酸鋰、乙酸鋰、丙酸鋰、丁酸鋰、苯甲酸鋰、鄰苯二甲酸鋰、間苯二甲酸鋰、對苯二甲酸鋰、水楊酸鋰、三氟甲磺酸鋰、三氟乙酸鋰、單氯乙酸鋰、二氯乙酸鋰、三氯乙酸鋰、氫氧化鋰、硝酸鋰、氯化鋰、溴化鋰、碘化鋰、甲磺酸鋰、草酸氫鋰、丙二酸氫鋰、馬來酸氫鋰、富馬酸氫鋰、檸康酸氫鋰、檸檬酸氫鋰、碳酸氫鋰、草酸鋰、丙二酸鋰、馬來酸鋰、富馬酸鋰、檸康酸鋰、檸檬酸鋰、碳酸鋰、甲酸鈉、乙酸鈉、丙酸鈉、丁酸鈉、苯甲酸鈉、鄰苯二甲酸鈉、間苯二甲酸鈉、對苯二甲酸鈉、水楊酸鈉、三氟甲磺酸鈉、三氟乙酸鈉、單氯乙酸鈉、二氯乙酸鈉、三氯乙酸鈉、氫氧化鈉、硝酸鈉、氯化鈉、溴化鈉、碘化鈉、甲磺酸鈉、草酸氫鈉、丙二酸氫鈉、馬來酸氫鈉、富馬酸氫鈉、檸康酸氫鈉、檸檬酸氫鈉、碳酸氫鈉、草酸鈉、丙二酸鈉、馬來酸鈉、富馬酸鈉、檸康酸鈉、檸檬酸鈉、碳酸鈉、甲酸鉀、乙酸鉀、丙酸鉀、丁酸鉀、苯甲酸鉀、鄰苯二甲酸鉀、間苯二甲酸鉀、對苯二甲酸鉀、水楊酸鉀、三氟甲磺酸鉀、三氟乙酸鉀、單氯乙酸鉀、二氯乙酸鉀、三氯乙酸鉀、氫氧化鉀、硝酸鉀、氯化鉀、溴化鉀、碘化鉀、甲磺酸鉀、草酸氫鉀、丙二酸氫鉀、馬來酸氫鉀、富馬酸氫鉀、檸康酸氫鉀、檸檬酸氫鉀、碳酸氫鉀、草酸鉀、丙二酸鉀、馬來酸鉀、富馬酸鉀、檸康酸鉀、檸檬酸鉀、碳酸鉀等。
本發明中,也可在阻劑下層膜形成用組成物中摻合含有銨鹽、鋶鹽、鏻鹽、錪鹽作為結構的一部分之聚矽氧烷(Xc-10)作為交聯觸媒(Xc)。
用以製造此處使用的(Xc-10)的原料可使用下述通式(Xm)表示之化合物。
R1A A1
R2A A2
R3A A3
Si(OR0A
)(4-A1-A2-A3)
(Xm)
式中,R0A
為碳數1~6之烴基,R1A
、R2A
、R3A
之中,至少一個為具有銨鹽、鋶鹽、鏻鹽、錪鹽之有機基,其它則為氫原子或碳數1~30的1價有機基。A1、A2、A3為0或1,且1≦A1+A2+A3≦3。
在此,R0A
可例示甲基、乙基、正丙基、異丙基、正丁基、異丁基、二級丁基、三級丁基、正戊基、環戊基、正己基、環己基、苯基。
式中,RSA1
、RSA2
分別表示碳數1~20之直鏈狀或分支狀或環狀的烷基、烯基、側氧基烷基或側氧基烯基、碳數6~20之有取代或無取代的芳基、或碳數7~20之芳烷基或芳氧基烷基,且為這些基之一部分或全部的氫原子也可取代為烷氧基、胺基、烷基胺基、鹵素原子等之1價有機基。又,RSA1
和RSA2
也可和它們所鍵結的硫原子一起形成環,形成環時,RSA1
、RSA2
分別表示碳數1~6之伸烷基。RSA3
為碳數1~20之直鏈狀或分支狀或環狀的伸烷基、伸烯基、碳數6~20之有取代或無取代的伸芳基或伸芳烷基、這些基之一部分或全部的氫原子也可取代為烷氧基、胺基、烷基胺基等之2價有機基。RSA1
~RSA3
在其鏈或環的中間也可具有氧原子或氮原子。
另外,上述通式(Xm-1)中,(Si)係用來表示和Si的鍵結位置而記載。
X-
可列舉氫氧根離子、氟離子、氯離子、溴離子、碘離子、甲酸根離子、乙酸根離子、丙酸根離子、丁酸根離子、戊酸根離子、己酸根離子、庚酸根離子、辛酸根離子、壬酸根離子、癸酸根離子、油酸根離子、硬脂酸根離子、亞麻油酸根離子、次亞麻油酸根離子、苯甲酸根離子、對甲基苯甲酸根離子、對三級丁基苯甲酸根離子、鄰苯二甲酸根離子、間苯二甲酸根離子、對苯二甲酸根離子、水楊酸根離子、三氟乙酸根離子、單氯乙酸根離子、二氯乙酸根離子、三氯乙酸根離子、硝酸根離子、氯酸根離子、過氯酸根離子、溴酸根離子、碘酸根離子、甲磺酸根離子、苯磺酸根離子、甲苯磺酸根離子、單甲基硫酸根離子、硫酸氫根離子、草酸根離子、丙二酸根離子、甲基丙二酸根離子、乙基丙二酸根離子、丙基丙二酸根離子、丁基丙二酸根離子、二甲基丙二酸根離子、二乙基丙二酸根離子、琥珀酸根離子、甲基琥珀酸根離子、戊二酸根離子、己二酸根離子、伊康酸根離子、馬來酸根離子、富馬酸根離子、檸康酸根離子、檸檬酸根離子、碳酸根離子等。
例如,具有錪鹽作為結構的一部分之水解性矽化合物可例示下述通式(Xm-2)。
[化23]
式中,RIA1
表示碳數1~20之直鏈狀或分支狀或環狀的烷基、烯基、側氧基烷基或側氧基烯基、碳數6~20之有取代或無取代的芳基、碳數7~20之芳烷基或芳基側氧基烷基,且為這些基之一部分或全部的氫原子也可取代為烷氧基、胺基、烷基胺基、鹵素原子等之1價有機基。RIA2
為碳數1~20之直鏈狀或分支狀或環狀的伸烷基、伸烯基、碳數6~20之有取代或無取代的伸芳基或伸芳烷基、這些基之一部分或全部的氫原子也可取代為烷氧基、胺基、烷基胺基等之2價有機基。RIA1
、RIA2
在其鏈或環的中間也可具有氧原子或氮原子。
另外,上述通式(Xm-2)中,(Si)係用來表示和Si的鍵結位置而記載。X-
同於上述。
例如,具有鏻鹽作為結構的一部分之水解性矽化合物可例示下述通式(Xm-3)。
[化25]
式中,RPA1
、RPA2
、RPA3
分別表示碳數1~20之直鏈狀或分支狀或環狀的烷基、烯基、側氧基烷基或側氧基烯基、碳數6~20之有取代或無取代的芳基、碳數7~20之芳烷基或芳基側氧基烷基,且這些基之一部分或全部的氫原子也可取代為烷氧基、胺基、烷基胺基、鹵素原子等。又,RPA1
和RPA2
也可和它們所鍵結的磷原子一起形成環,形成環時,RPA1
、RPA2
分別表示碳數1~6之伸烷基。RPA4
為碳數1~20之直鏈狀或分支狀或環狀的伸烷基、伸烯基、碳數6~20之有取代或無取代的伸芳基或伸芳烷基,且這些基之一部分或全部的氫原子也可取代為烷氧基、胺基、烷基胺基等。RPA1
~RPA4
在其鏈或環的中間也可具有氧原子或氮原子。
另外,上述通式(Xm-3)中,(Si)係用來表示和Si的鍵結位置而記載。X-
同於上述。
例如,具有銨鹽作為結構的一部分之水解性矽化合物可例示下述通式(Xm-4)。
[化28]
式中,RNA1
、RNA2
、RNA3
分別表示氫、碳數1~20之直鏈狀或分支狀或環狀的烷基、烯基、側氧基烷基或側氧基烯基、碳數6~20之有取代或無取代的芳基、碳數7~20之芳烷基或芳氧基烷基,且為這些基之一部分或全部的氫原子也可取代為烷氧基、胺基、烷基胺基等之1價有機基。又,RNA1
和RNA2
也可和它們所鍵結的氮原子一起形成環,形成環時,RNA1
、RNA2
分別表示碳數1~6之伸烷基或含氮之環狀雜環、雜芳香環。RNA4
為碳數1~23之直鏈狀或分支狀或環狀之伸烷基、伸烯基、碳數6~29之有取代或無取代之伸芳基或伸芳烷基,且為這些基之一部分或全部的氫原子也可取代為烷氧基、胺基、烷基胺基等之2價有機基,RNA1
和RNA2
、RNA1
和RNA4
形成環狀結構且含有不飽和氮時nNA3
=0,除此之外nNA3
=1。RNA4
在其鏈或環的中間也可具有氧原子或氮原子。
另外,上述通式(Xm-4)中,(Si)係用來表示和Si的鍵結位置而記載。X-
同於上述。
為了製造(Xc-10)而和上述(Xm-1)、(Xm-2)、(Xm-3)、(Xm-4)同時使用的水解性矽化合物可例示上述水解性單體(Sm)。更可添加上述通式(Mm)表示之水解性金屬化合物(Mm)。
如此,可選擇所例示之單體(Xm-1)、(Xm-2)、(Xm-3)、(Xm-4)中之1種以上與(Sm)中之1種以上,若有必要再選擇(Mm)中之1種以上,並於反應前或反應中進行混合來製成形成(Xc-10)的反應原料。反應條件以和熱交聯性聚矽氧烷(Sx)的合成方法同樣的方法即可。
得到的含矽之化合物(Xc-10)之分子量不僅可藉由單體的選擇來調整,還可藉由控制聚合時的反應條件來調整,宜使用重量平均分子量100,000以下者,使用200~50,000者更佳,使用300~30,000者再更佳。重量平均分子量若為100,000以下,則不會有異物的產生、發生塗佈不均的情況。另外,上述重量平均分子量相關之數據係利用使用RI作為檢測器並使用四氫呋喃作為溶離溶劑之凝膠滲透層析法(GPC),並使用聚苯乙烯作為標準物質,以聚苯乙烯換算來表示分子量。
另外,上述交聯觸媒(Xc-1)、(Xc-2)、(Xc-3)、(Xc-4)、(Xc-10)可單獨使用1種或將2種以上組合使用。交聯觸媒的添加量,以和通式(A-1)表示之4級銨鹽之合計來表示,相對於基礎聚合物(利用上述方法得到的含矽之化合物(Sx))100質量份,宜為0.01~50質量份,為0.1~40質量份更佳。
(有機酸)
為了使本發明之含矽之阻劑下層膜形成用組成物的安定性改善,宜添加碳數為1~30之1價或2價以上之有機酸。此時所添加的酸可例示甲酸、乙酸、丙酸、丁酸、戊酸、己酸、庚酸、辛酸、壬酸、癸酸、油酸、硬脂酸、亞麻油酸、次亞麻油酸、苯甲酸、鄰苯二甲酸、間苯二甲酸、對苯二甲酸、水楊酸、三氟乙酸、單氯乙酸、二氯乙酸、三氯乙酸、草酸、丙二酸、甲基丙二酸、乙基丙二酸、丙基丙二酸、丁基丙二酸、二甲基丙二酸、二乙基丙二酸、琥珀酸、甲基琥珀酸、戊二酸、己二酸、伊康酸、馬來酸、富馬酸、檸康酸、檸檬酸等。為草酸、馬來酸、甲酸、乙酸、丙酸、檸檬酸等特佳。又,為了保持安定性,也可將2種以上的酸混合使用。
有機酸的添加量相對於本發明之含矽之阻劑下層膜形成用組成物所含的矽100質量份,為0.001~25質量份,宜為0.01~15質量份,為0.1~5質量份更佳。
或也可摻合上述有機酸以使換算成本發明之含矽之阻劑下層膜形成用組成物的pH成為0≦pH≦7較理想,成為0.3≦pH≦6.5更佳,成為0.5≦pH≦6再更佳。
(水)
本發明中,也可在組成物中添加水。添加水的話,本發明之含矽之阻劑下層膜形成用組成物中的聚矽氧烷化合物會進行水合,故微影性能會改善。本發明之含矽之阻劑下層膜形成用組成物的溶劑成分中的水之含有率超過0質量%且未達50質量%,為0.3~30質量%特佳,為0.5~20質量%更佳。水的添加量若為上述範圍內,則含矽之阻劑下層膜之均勻性良好,也不會有產生縮孔的疑慮,亦無微影性能降低的疑慮。
包含水之全部溶劑的使用量相對於基礎聚合物即聚矽氧烷化合物(Sx)100質量份,為100~100,000質量份,為200~50,000質量份特別理想。
(安定劑)
此外,本發明可在組成物中添加安定劑。安定劑可添加具有環狀醚作為取代基之1元或2元以上的醇。尤其添加日本特開2009-126940號公報(0181)~(0182)段落所記載之安定劑的話,可使含矽之阻劑下層膜形成用組成物的安定性改善。
(界面活性劑)
此外,本發明可因應需要在組成物中摻合界面活性劑。如此的界面活性劑,具體而言可添加日本特開2009-126940號公報(0185)段落所記載之材料。
(高沸點溶劑)
此外,本發明還可因應需要在組成物中添加沸點為180度以上之高沸點溶劑。此高沸點溶劑可例示1-辛醇、2-乙基己醇、1-壬醇、1-癸醇、1-十一醇、乙二醇、1,2-丙二醇、1,3-丁二醇、2,4-戊烷二醇、2-甲基-2,4-戊烷二醇、2,5-己烷二醇、2,4-庚烷二醇、2-乙基-1,3-己烷二醇、二乙二醇、二丙二醇、三乙二醇、三丙二醇、甘油、γ-丁內酯、三丙二醇單甲醚、二丙酮醇、乙酸正壬酯、乙酸乙二醇單乙醚、1,2-二乙醯氧基乙烷、1-乙醯氧基-2-甲氧基乙烷、1,2-二乙醯氧基丙烷、乙酸二乙二醇單甲醚、乙酸二乙二醇單乙醚、乙酸二乙二醇單正丁醚、乙酸丙二醇單甲醚、乙酸丙二醇單丙醚、乙酸丙二醇單丁醚、乙酸二丙二醇單甲醚、乙酸二丙二醇單乙醚等。
[圖案形成方法]
本發明之圖案形成方法中的一種圖案形成方法(所謂「多層阻劑法」),其特徵為包含下列步驟:於被加工體上使用塗佈型有機膜材料來形成有機膜、於上述有機膜之上使用上述本發明之含矽之阻劑下層膜形成用組成物來形成含矽之阻劑下層膜、於上述含矽之阻劑下層膜上使用由光阻組成物構成的阻劑上層膜用組成物來形成阻劑上層膜、於上述阻劑上層膜形成電路圖案、以上述形成有電路圖案之上述阻劑上層膜作為遮罩並利用蝕刻將圖案轉印到上述含矽之阻劑下層膜、以上述轉印有圖案之上述含矽之阻劑下層膜作為遮罩並利用蝕刻對有機膜進行圖案轉印、以上述轉印有圖案之上述有機膜作為遮罩並利用蝕刻將圖案轉印到上述被加工體。
本發明之圖案形成方法的另一種圖案形成方法(所謂「多層阻劑法」),其特徵為包含下列步驟:於被加工體上利用CVD法形成以碳作為主成分之硬遮罩、於上述硬遮罩之上使用上述本發明之含矽之阻劑下層膜形成用組成物來形成含矽之阻劑下層膜、於上述含矽之阻劑下層膜上使用由光阻組成物構成的阻劑上層膜用組成物來形成阻劑上層膜、於上述阻劑上層膜形成電路圖案、以上述形成有電路圖案之阻劑上層膜作為遮罩並利用蝕刻將圖案轉印到上述含矽之阻劑下層膜、以上述轉印有圖案之上述含矽之阻劑下層膜作為遮罩並利用乾蝕刻對上述硬遮罩進行圖案轉印、以上述轉印有圖案之上述硬遮罩作為遮罩並利用乾蝕刻將圖案轉印到上述被加工體。
使用本發明之含矽之阻劑下層膜形成用組成物來形成圖案的話,如上所述般藉由將硬遮罩、有機膜之組合最適化,可將光阻所形成的超微細圖案,以抑制圖案崩塌且為良好的形狀之方式形成於基板上。又,圖案形成後所殘留的含矽之阻劑下層膜之利用蝕刻等所為之去除容易,故可抑制成為缺陷的原因之殘渣,還可防止過量的蝕刻條件所導致之基板損壞。
如此般本發明之圖案形成方法會抑制阻劑上層膜之圖案崩塌,且可形成良好的圖案形狀。又,利用乾蝕刻所為之朝含矽之阻劑下層膜之圖案轉印優良,此外,圖案化結束後所殘留的含矽之阻劑下層膜之去除容易,而不易產生殘渣所導致之缺陷,故尤其係於微細的圖案之形成為實用的圖案形成方法。
另外,正型圖案形成方法在光阻膜形成、加熱處理後,實施曝光,通常使用鹼顯影液來實施鹼顯影,獲得正型阻劑圖案。又,曝光後宜實施曝光後烘烤(PEB)。
該鹼顯影液可使用氫氧化四甲基銨(TMAH)水溶液等。
於上述阻劑上層膜形成電路圖案之步驟中的圖案形成宜為利用波長為10nm以上且300nm以下之光微影、利用電子束所為之直接描繪、奈米壓印或它們的組合所為之圖案形成。
上述被加工體宜為半導體裝置基板、金屬膜、金屬碳化膜、金屬氧化膜、金屬氮化膜、金屬氧化碳化膜或金屬氧化氮化膜。
上述被加工體為如此時,本發明的效果會更充分地發揮。
構成上述被加工體之金屬宜為矽、鎵、鈦、鎢、鉿、鋯、鉻、鍺、銅、銀、金、銦、砷、鈀、鉭、銥、鋁、鐵、鉬、鈷或它們的合金。
構成上述被加工體之金屬為上述特定金屬時,本發明之效果會更充分地發揮。
[實施例]
以下,例示合成例及實施例與比較例來具體地說明本發明,但本發明不受這些記載限制。另外,下述例中%表示質量%,分子量Mw係利用GPC測定獲得之經聚苯乙烯換算之重量平均分子量。
[合成例1]
於甲醇120g、10%硝酸0.1g及去離子水60g的混合物中,添加化合物(101)30.6g、化合物(102)38.1g及化合物(110)5.9g的混合物,於40℃保持12小時,使其進行水解縮合。反應結束後,添加丙二醇乙醚(PGEE)600g,於減壓下餾去供於水解縮合之水分及副產物醇,獲得聚矽氧烷化合物1的PGEE溶液440g(化合物濃度10%)。測定聚矽氧烷化合物1之經聚苯乙烯換算之分子量時,Mw=2,900。
[合成例2~16]
以和合成例1同樣的條件,使用表1所示之單體實施[合成例2]至[合成例16],分別獲得標的物。
[表1]
合成例 | 反應原料 | Mw |
1 | 化合物(101):30.6g,化合物(102):38.1g,化合物(110):5.9g | 2900 |
2 | 化合物(101):30.6g,化合物(102):38.1g,化合物(111):6.4g | 2300 |
3 | 化合物(101):30.6g,化合物(102):38.1g,化合物(112):7.0g | 2900 |
4 | 化合物(101):30.6g,化合物(102):38.1g,化合物(113):6.8g | 2300 |
5 | 化合物(101):30.6g,化合物(102):38.1g,化合物(114):7.1g | 2500 |
6 | 化合物(101):30.6g,化合物(102):38.1g,化合物(115):8.9g | 2600 |
7 | 化合物(101):30.6g,化合物(102):38.1g,化合物(116):8.0g | 2300 |
8 | 化合物(100):5.0g,化合物(101):30.6g,化合物(102):38.1g | 2500 |
9 | 化合物(101):13.6g,化合物(102):53.3g,化合物(110):11.8g | 2100 |
10 | 化合物(101):13.6g,化合物(102):53.3g,化合物(111):12.7g | 2800 |
11 | 化合物(101):13.6g,化合物(102):53.3g,化合物(112):13.9g | 2500 |
12 | 化合物(101):13.6g,化合物(102):53.3g,化合物(113):13.5g | 2500 |
13 | 化合物(101):13.6g,化合物(102):53.3g,化合物(114):14.2g | 2700 |
14 | 化合物(101):13.6g,化合物(102):53.3g,化合物(115):17.7g | 2700 |
15 | 化合物(101):13.6g,化合物(102):53.3g,化合物(116):16.0g | 3000 |
16 | 化合物(100):5.0g,化合物(101):17.0g,化合物(102):53.3g | 2800 |
於下表示實施例、比較例所使用的化合物。
PhSi(OCH3
)3
…化合物(100)
CH3
Si(OCH3
)3
…化合物(101)
Si(OCH3
)4
…化合物(102)
[交聯觸媒之合成例]
於甲醇120g、10%硝酸0.1g及去離子水60g的混合物中,添加化合物(101)61.3g及化合物(117)12.9g的混合物,於40℃保持12小時,使其進行水解縮合。反應結束後,添加丙二醇乙醚(PGEE)300g,於減壓下餾去供於水解縮合之水分及副產物醇,獲得含銨鹽之聚矽氧烷化合物17的PGEE溶液250g(化合物濃度20%)。測定聚矽氧烷化合物17之經聚苯乙烯換算之分子量時,Mw=1,500。
[實施例、比較例]
以表2~6所示之比例混合上述合成例得到的聚矽氧烷化合物1~16、作為交聯觸媒之上述通式(A-1)表示之4級銨鹽或作為比較之交聯觸媒、光酸產生劑(表7記載之PAG-1~7)、酸、溶劑、水,並利用0.1μm之氟樹脂製的過濾器進行過濾,藉此分別製備含矽之下層膜形成用組成物溶液,分別為溶液1~96。
[表2]
編號 | 聚矽氧烷 (質量份) | 交聯觸媒 (質量份) | 光酸產生劑 (質量份) | 酸 (質量份) | 溶劑 (質量份) | 水 (質量份) |
溶液1 | 化合物1(1) | XL-1 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液2 | 化合物1(1) | XL-2 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液3 | 化合物1(1) | XL-3 (0.03) | 無 | 馬來酸 (0.01) | PGEE(90) GBL(10) | 水(10) |
溶液4 | 化合物1(1) | XL-7 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液5 | 化合物1(1) | XL-8 (0.03) | PAG-3 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液6 | 化合物1(1) | XL-9 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液7 | 化合物2(1) | XL-4 (0.03) | PAG-1 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液8 | 化合物2(1) | XL-5 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液9 | 化合物2(1) | XL-6 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液10 | 化合物2(1) | XL-10 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液11 | 化合物2(1) | XL-3(0.015) XL-11(0.015) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液12 | 化合物2(1) | XL-12 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液13 | 化合物3(1) | XL-1 (0.03) | PAG-6 (0.01) | 馬來酸 (0.01) | PGEE(90) PGME(10) | 水(10) |
溶液14 | 化合物3(1) | XL-2 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液15 | 化合物3(1) | XL-3 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液16 | 化合物3(1) | XL-13 (0.03) | PAG-3 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液17 | 化合物3(1) | XL-14 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液18 | 化合物3(1) | XL-15 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液19 | 化合物4(1) | XL-4 (0.03) | PAG-2 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液20 | 化合物4(1) | XL-5 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液21 | 化合物4(1) | XL-2(0.015) XL-3(0.015) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液22 | 化合物4(1) | XL-16 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
[表3]
編號 | 聚矽氧烷 (質量份) | 交聯觸媒 (質量份) | 光酸產生劑 (質量份) | 酸 (質量份) | 溶劑 (質量份) | 水 (質量份) |
溶液23 | 化合物4(1) | XL-17 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液24 | 化合物5(1) | XL-1 (0.03) | PAG-7 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液25 | 化合物5(1) | XL-2 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液26 | 化合物5(1) | XL-3 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液27 | 化合物5(1) | XL-7 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液28 | 化合物5(1) | XL-8 (0.03) | 無 | 馬來酸 (0.01) | PGEE(90) PGME(10) | 水(10) |
溶液29 | 化合物5(1) | XL-9 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液30 | 化合物6(1) | XL-4 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液31 | 化合物6(1) | XL-5 (0.03) | PAG-5 (0.01) | 馬來酸 (0.01) | PGEE(90) GBL(10) | 水(10) |
溶液32 | 化合物6(1) | XL-6 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液33 | 化合物6(1) | XL-10 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液34 | 化合物6(1) | XL-11 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液35 | 化合物6(1) | XL-12 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液36 | 化合物7(1) | XL-1 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液37 | 化合物7(1) | XL-2 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液38 | 化合物7(1) | XL-1(0.015) XL-4(0.015) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液39 | 化合物7(1) | XL-13 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液40 | 化合物7(1) | XL-14 (0.03) | PAG-6 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液41 | 化合物7(1) | XL-15 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液42 | 化合物8(1) | XL-4 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液43 | 化合物8(1) | XL-5 (0.03) | 無 | 馬來酸 (0.01) | PGEE(90) DAA(10) | 水(10) |
溶液44 | 化合物8(1) | XL-6 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
[表4]
編號 | 聚矽氧烷 (質量份) | 交聯觸媒 (質量份) | 光酸產生劑 (質量份) | 酸 (質量份) | 溶劑 (質量份) | 水 (質量份) |
溶液45 | 化合物8(1) | XL-16 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液46 | 化合物8(1) | XL-17 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液47 | 化合物9(1) | XL-1 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液48 | 化合物9(1) | XL-2 (0.03) | 無 | 馬來酸 (0.01) | PGEE(90) GBL(10) | 水(10) |
溶液49 | 化合物9(1) | XL-3 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液50 | 化合物9(1) | XL-7 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液51 | 化合物9(1) | XL-2(0.015) XL-8(0.015) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液52 | 化合物9(1) | XL-9 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液53 | 化合物10(1) | XL-4 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液54 | 化合物10(1) | XL-5 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液55 | 化合物10(1) | XL-6 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液56 | 化合物10(1) | XL-10 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液57 | 化合物10(1) | XL-11 (0.03) | 無 | 馬來酸 (0.01) | PGEE(90) PGME(10) | 水(10) |
溶液58 | 化合物10(1) | XL-12 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液59 | 化合物11(1) | XL-1 (0.03) | PAG-1 (0.01) | 馬來酸 (0.01) | PGEE(90) GBL(10) | 水(10) |
溶液60 | 化合物11(1) | XL-2 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液61 | 化合物11(1) | XL-3 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液62 | 化合物11(1) | XL-13 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液63 | 化合物11(1) | XL-14 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液64 | 化合物11(1) | XL-15 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液65 | 化合物12(1) | XL-4 (0.03) | PAG-4 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液66 | 化合物12(1) | XL-5 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
[表5]
編號 | 聚矽氧烷 (質量份) | 交聯觸媒 (質量份) | 光酸產生劑 (質量份) | 酸 (質量份) | 溶劑 (質量份) | 水 (質量份) |
溶液67 | 化合物12(1) | XL-6 (0.03) | 無 | 馬來酸 (0.01) | PGEE(90) PGME(10) | 水(10) |
溶液68 | 化合物12(1) | XL-16 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液69 | 化合物12(1) | XL-17 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液70 | 化合物13(1) | XL-1 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液71 | 化合物13(1) | XL-2 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液72 | 化合物13(1) | XL-3 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液73 | 化合物13(1) | XL-7 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液74 | 化合物13(1) | XL-8 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液75 | 化合物13(1) | XL-9 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液76 | 化合物14(1) | XL-4 (0.03) | PAG-4 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液77 | 化合物14(1) | XL-1(0.015) XL-2(0.015) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液78 | 化合物14(1) | XL-6 (0.03) | 無 | 馬來酸 (0.01) | PGEE(90) GBL(10) | 水(10) |
溶液79 | 化合物14(1) | XL-10 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液80 | 化合物14(1) | XL-11 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液81 | 化合物14(1) | XL-12 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液82 | 化合物15(1) | XL-1 (0.03) | PAG-5 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液83 | 化合物15(1) | XL-2 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液84 | 化合物15(1) | XL-3(0.015) XL-5(0.015) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液85 | 化合物15(1) | XL-13 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液86 | 化合物15(1) | XL-14 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液87 | 化合物15(1) | XL-15 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液88 | 化合物16(1) | XL-4 (0.03) | 無 | 馬來酸 (0.01) | PGEE(90) DAA(10) | 水(10) |
[表6]
編號 | 聚矽氧烷 (質量份) | 交聯觸媒 (質量份) | 光酸產生劑 (質量份) | 酸 (質量份) | 溶劑 (質量份) | 水 (質量份) |
溶液89 | 化合物16(1) | XL-5 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液90 | 化合物16(1) | XL-6 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液91 | 化合物16(1) | XL-16 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液92 | 化合物16(1) | XL-17 (0.03) | 無 | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液93 | 化合物1(1) | XL-18 (0.03) | PAG-1 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液94 | 化合物5(1) | XL-19 (0.03) | PAG-3 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液95 | 化合物7(1) | XL-20 (0.03) | PAG-4 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
溶液96 | 化合物14(1) | XL-21 (0.03) | PAG-5 (0.01) | 馬來酸 (0.01) | PGEE(100) | 水(10) |
使用的交聯觸媒如下所述。
XL-1…氫氧化三甲基苯基銨
XL-2…硝酸三甲基苯基銨
XL-3…碘化三乙基苯基銨
XL-4…氯化苄基二甲基苯基銨
XL-5…氯化二甲基二苯基銨
XL-6…氫氧化3-(三氟甲基)苯基三甲基銨
XL-7~17…參照下式
XL-18…硝酸四甲基銨
XL-19…硝酸四辛基銨
XL-20…碘化三甲基鋶
XL-21・・含銨鹽之聚矽氧烷化合物17
使用的溶劑如下所述。
PGEE…丙二醇乙醚
PGME…丙二醇甲醚
GBL…γ-丁內酯
DAA…二丙酮醇
(EUV圖案化試驗)
於矽晶圓上,將含矽之阻劑下層膜形成用組成物溶液1~96旋塗於矽基板上,並於220℃加熱60秒,製得膜厚25nm的含矽之膜即膜1~96(聚矽氧烷阻劑下層膜)。
然後,將以表8的比例使下述成分溶解而成的阻劑材料旋塗於膜1~96上,並使用加熱板於105℃預烘60秒,製得膜厚35nm之阻劑膜。使用ASML公司製EUV掃描式曝光機NXE3300(NA0.33,σ0.9/0.6,四極照明,晶圓上尺寸為節距36nm之L/S圖案)對其進行曝光,並於加熱板上實施100℃、60秒之PEB,再以2.38質量%TMAH水溶液實施30秒之顯影,獲得尺寸18nm之線圖案。
使用日立先端科技(股)製之測長SEM(CG5000)測定該線尺寸,於線寬15nm未觀察到圖案崩塌時評價為良好,觀察到圖案崩塌時評價為不良。又,剖面形狀利用日立先端科技(股)製電子顯微鏡(S-4800)進行觀測,未觀察到拖尾形狀時評價為良好,觀察到明顯的拖尾形狀時評價為不良。
使用的聚合物、淬滅劑、增感劑、界面活性劑及有機溶劑如下所述。
界面活性劑:3M公司製FC-4430
PGMEA:丙二醇單甲醚乙酸酯
CyHO:環己酮
PGME:丙二醇單甲醚
[表8]
成分 | 聚合物 | 淬滅劑 | 增感劑 | 界面活性劑 | 有機溶劑 |
組成 (質量份) | (100) | (4.0) | (2.1) | (0.25) | PGMEA(400) CyHO(2000) PGME(100) |
(塗佈膜蝕刻試驗)
於矽晶圓上旋塗含矽之阻劑下層膜形成用組成物溶液1~96,並於220℃加熱60秒,於矽基板上製得膜厚25nm的含矽之膜即膜1~96。
利用下述蝕刻條件對這些膜實施蝕刻試驗。
在下述條件下若乾蝕刻速度為44nm/min以上,則可謂具有充分的蝕刻速度。
利用CHF3
/CF4
系氣體之蝕刻試驗
裝置:東京威力科創(股)製乾蝕刻裝置Telius SP
蝕刻試驗:
腔室壓力 10Pa
Upper/Lower RF功率 200W/100W
CHF3
氣體流量 50ml/min
CF4
氣體流量 50ml/min
N2
氣體流量 100ml/min
處理時間 20sec
上述試驗的結果如表9~11所示。
[表9]
例 | 聚矽氧烷 阻劑下層膜 | 圖案崩塌/ 圖案形狀 | CHF3 /CF4 系氣體 乾蝕刻速度 (nm/min) |
實施例1-1 | 膜1 | 良好/良好 | 48.5 |
實施例1-2 | 膜2 | 良好/良好 | 49.2 |
實施例1-3 | 膜3 | 良好/良好 | 49.3 |
實施例1-4 | 膜4 | 良好/良好 | 48.7 |
實施例1-5 | 膜5 | 良好/良好 | 48.8 |
實施例1-6 | 膜6 | 良好/良好 | 48.6 |
實施例1-7 | 膜7 | 良好/良好 | 48.3 |
實施例1-8 | 膜8 | 良好/良好 | 49 |
實施例1-9 | 膜9 | 良好/良好 | 49 |
實施例1-10 | 膜10 | 良好/良好 | 49.1 |
實施例1-11 | 膜11 | 良好/良好 | 49.3 |
實施例1-12 | 膜12 | 良好/良好 | 48.8 |
實施例1-13 | 膜13 | 良好/良好 | 47.9 |
實施例1-14 | 膜14 | 良好/良好 | 48.2 |
實施例1-15 | 膜15 | 良好/良好 | 48.2 |
實施例1-16 | 膜16 | 良好/良好 | 48.7 |
實施例1-17 | 膜17 | 良好/良好 | 48.9 |
實施例1-18 | 膜18 | 良好/良好 | 49 |
實施例1-19 | 膜19 | 良好/良好 | 48 |
實施例1-20 | 膜20 | 良好/良好 | 47.6 |
實施例1-21 | 膜21 | 良好/良好 | 48.6 |
實施例1-22 | 膜22 | 良好/良好 | 48.9 |
實施例1-23 | 膜23 | 良好/良好 | 49.3 |
實施例1-24 | 膜24 | 良好/良好 | 47.6 |
實施例1-25 | 膜25 | 良好/良好 | 48.6 |
實施例1-26 | 膜26 | 良好/良好 | 49 |
實施例1-27 | 膜27 | 良好/良好 | 49.2 |
實施例1-28 | 膜28 | 良好/良好 | 48.8 |
實施例1-29 | 膜29 | 良好/良好 | 48.5 |
實施例1-30 | 膜30 | 良好/良好 | 47 |
實施例1-31 | 膜31 | 良好/良好 | 46.8 |
實施例1-32 | 膜32 | 良好/良好 | 47.3 |
實施例1-33 | 膜33 | 良好/良好 | 49.1 |
實施例1-34 | 膜34 | 良好/良好 | 48.8 |
實施例1-35 | 膜35 | 良好/良好 | 48.4 |
實施例1-36 | 膜36 | 良好/良好 | 48 |
實施例1-37 | 膜37 | 良好/良好 | 48.3 |
實施例1-38 | 膜38 | 良好/良好 | 48.4 |
實施例1-39 | 膜39 | 良好/良好 | 48.3 |
實施例1-40 | 膜40 | 良好/良好 | 48.5 |
[表10]
例 | 聚矽氧烷 阻劑下層膜 | 圖案崩塌/圖案形狀 | CHF3 /CF4 系氣體 乾蝕刻速度(nm/min) |
實施例1-41 | 膜41 | 良好/良好 | 48.7 |
實施例1-42 | 膜42 | 良好/良好 | 47.5 |
實施例1-43 | 膜43 | 良好/良好 | 47.6 |
實施例1-44 | 膜44 | 良好/良好 | 47.8 |
實施例1-45 | 膜45 | 良好/良好 | 49.1 |
實施例1-46 | 膜46 | 良好/良好 | 49.3 |
實施例1-47 | 膜47 | 良好/良好 | 48 |
實施例1-48 | 膜48 | 良好/良好 | 47.6 |
實施例1-49 | 膜49 | 良好/良好 | 48 |
實施例1-50 | 膜50 | 良好/良好 | 48.7 |
實施例1-51 | 膜51 | 良好/良好 | 48.9 |
實施例1-52 | 膜52 | 良好/良好 | 49.4 |
實施例1-53 | 膜53 | 良好/良好 | 48.4 |
實施例1-54 | 膜54 | 良好/良好 | 47.9 |
實施例1-55 | 膜55 | 良好/良好 | 48 |
實施例1-56 | 膜56 | 良好/良好 | 49.1 |
實施例1-57 | 膜57 | 良好/良好 | 49.3 |
實施例1-58 | 膜58 | 良好/良好 | 48.6 |
實施例1-59 | 膜59 | 良好/良好 | 46 |
實施例1-60 | 膜60 | 良好/良好 | 46.3 |
實施例1-61 | 膜61 | 良好/良好 | 46.5 |
實施例1-62 | 膜62 | 良好/良好 | 49.2 |
實施例1-63 | 膜63 | 良好/良好 | 48.8 |
實施例1-64 | 膜64 | 良好/良好 | 49.4 |
實施例1-65 | 膜65 | 良好/良好 | 47.1 |
實施例1-66 | 膜66 | 良好/良好 | 47.4 |
實施例1-67 | 膜67 | 良好/良好 | 47.6 |
實施例1-68 | 膜68 | 良好/良好 | 48.3 |
實施例1-69 | 膜69 | 良好/良好 | 48.6 |
實施例1-70 | 膜70 | 良好/良好 | 46.2 |
實施例1-71 | 膜71 | 良好/良好 | 46.8 |
實施例1-72 | 膜72 | 良好/良好 | 46.3 |
實施例1-73 | 膜73 | 良好/良好 | 48.3 |
實施例1-74 | 膜74 | 良好/良好 | 48.9 |
實施例1-75 | 膜75 | 良好/良好 | 48.2 |
實施例1-76 | 膜76 | 良好/良好 | 46.2 |
實施例1-77 | 膜77 | 良好/良好 | 47.2 |
實施例1-78 | 膜78 | 良好/良好 | 46.2 |
實施例1-79 | 膜79 | 良好/良好 | 48.5 |
實施例1-80 | 膜80 | 良好/良好 | 48.6 |
[表11]
例 | 聚矽氧烷 阻劑下層膜 | 圖案崩塌/ 圖案形狀 | CHF3 /CF4 系氣體 乾蝕刻速度 (nm/min) |
實施例1-81 | 膜81 | 良好/良好 | 48.5 |
實施例1-82 | 膜82 | 良好/良好 | 46.7 |
實施例1-83 | 膜83 | 良好/良好 | 46.2 |
實施例1-84 | 膜84 | 良好/良好 | 47.3 |
實施例1-85 | 膜85 | 良好/良好 | 48.6 |
實施例1-86 | 膜86 | 良好/良好 | 48.2 |
實施例1-87 | 膜87 | 良好/良好 | 48.1 |
實施例1-88 | 膜88 | 良好/良好 | 45.2 |
實施例1-89 | 膜89 | 良好/良好 | 46.3 |
實施例1-90 | 膜90 | 良好/良好 | 44.8 |
實施例1-91 | 膜91 | 良好/良好 | 47.8 |
實施例1-92 | 膜92 | 良好/良好 | 48.3 |
比較例1-1 | 膜93 | 不良/良好 | 48.7 |
比較例1-2 | 膜94 | 良好/不良 | 38.5 |
比較例1-3 | 膜95 | 不良/不良 | 47.8 |
比較例1-4 | 膜96 | 不良/不良 | 43.8 |
如表9~11所示,在使用本發明之上述通式(A-1)表示之4級銨鹽(XL-1~XL-17)作為交聯觸媒之實施例1-1~1-92中,可觀察到抑止圖案崩塌的效果、良好的圖案形狀,且可確認具有充分的蝕刻速度。
另一方面,在使用和上述通式(A-1)表示之4級銨鹽不同的鹽(XL-18~XL-21)作為交聯觸媒之比較例1-1、1-3、1-4中,於線寬15nm可觀察到圖案崩塌,在比較例1-2、1-3、1-4中,可觀察到明顯的拖尾形狀。又,在比較例1-2、1-4中,確認不具有充分的蝕刻速度。
由上可確認使用本發明之上述通式(A-1)表示之4級銨鹽(XL-1~XL-17)作為交聯觸媒時,具有比起習知技術優良的抑制圖案崩塌的效果與良好的圖案形成效果、及具有充分的蝕刻速度。
另外,本發明不限於上述實施型態。上述實施型態係為例示,具有和本發明申請專利範圍所記載之技術思想實質相同的構成、發揮同樣的作用效果者,均意欲包含於本發明之技術範圍內。
Claims (10)
- 一種含矽之阻劑下層膜形成用組成物,其特徵為至少含有:下述通式(A-1)表示之4級銨鹽中之1種或2種以上,及熱交聯性聚矽氧烷(Sx);且該通式(A-1)表示之4級銨鹽的摻合量相對於該熱交聯性聚矽氧烷(Sx)100質量份為0.01~50質量份;
- 如請求項1或2之含矽之阻劑下層膜形成用組成物,更含有酸產生劑。
- 如請求項4之含矽之阻劑下層膜形成用組成物,其中,該酸產生劑為鋶鹽,且為利用高能射線的作用而產生酸之光酸產生劑。
- 一種圖案形成方法,其特徵為包含下列步驟:於被加工體上使用塗佈型有機膜材料來形成有機膜,於該有機膜之上使用如請求項1至5中任一項之含矽之阻劑下層膜形成用組成物來形成含矽之阻劑下層膜,於該含矽之阻劑下層膜上使用由光阻組成物構成的阻劑上層膜用組成物來形成阻劑上層膜,於該阻劑上層膜形成電路圖案,以該形成有電路圖案之該阻劑上層膜作為遮罩並利用蝕刻將圖案轉印到該含矽之阻劑下層膜,以該轉印有圖案之該含矽之阻劑下層膜作為遮罩並利用蝕刻對該有機膜進行圖案轉印,及以該轉印有圖案之該有機膜作為遮罩並利用蝕刻將圖案轉印到該被加工體。
- 一種圖案形成方法,其特徵為包含下列步驟:於被加工體上利用CVD法形成以碳作為主成分之硬遮罩,於該硬遮罩之上使用如請求項1至5中任一項之含矽之阻劑下層膜形成用組成物來形成含矽之阻劑下層膜,於該含矽之阻劑下層膜上使用由光阻組成物構成的阻劑上層膜用組成物來形成阻劑上層膜,於該阻劑上層膜形成電路圖案, 以該形成有電路圖案之阻劑上層膜作為遮罩並利用蝕刻將圖案轉印到該含矽之阻劑下層膜,以該轉印有圖案之該含矽之阻劑下層膜作為遮罩並利用乾蝕刻對該硬遮罩進行圖案轉印,及以該轉印有圖案之該硬遮罩作為遮罩並利用乾蝕刻將圖案轉印到該被加工體。
- 如請求項6或7之圖案形成方法,其中,於該阻劑上層膜形成電路圖案之步驟中的圖案形成係利用波長為10nm以上且300nm以下之光微影、利用電子束所為之直接描繪、奈米壓印或它們的組合所為之圖案形成。
- 如請求項6或7之圖案形成方法,其中,該被加工體為半導體裝置基板、金屬膜、金屬碳化膜、金屬氧化膜、金屬氮化膜、金屬氧化碳化膜或金屬氧化氮化膜。
- 如請求項6或7之圖案形成方法,其中,構成該被加工體之金屬為矽、鎵、鈦、鎢、鉿、鋯、鉻、鍺、銅、銀、金、銦、砷、鈀、鉭、銥、鋁、鐵、鉬、鈷或它們的合金。
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