TWI738882B - 光硬化性樹脂組成物、乾膜、硬化物及印刷配線板 - Google Patents
光硬化性樹脂組成物、乾膜、硬化物及印刷配線板 Download PDFInfo
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- TWI738882B TWI738882B TW106133854A TW106133854A TWI738882B TW I738882 B TWI738882 B TW I738882B TW 106133854 A TW106133854 A TW 106133854A TW 106133854 A TW106133854 A TW 106133854A TW I738882 B TWI738882 B TW I738882B
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- resin composition
- acrylate
- epoxy
- meth
- bisphenol
- Prior art date
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- 239000011342 resin composition Substances 0.000 title claims abstract description 74
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims abstract description 69
- 229930185605 Bisphenol Natural products 0.000 claims abstract description 60
- 239000004593 Epoxy Substances 0.000 claims abstract description 55
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims abstract description 53
- 229920005989 resin Polymers 0.000 claims abstract description 38
- 239000011347 resin Substances 0.000 claims abstract description 38
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- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 25
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- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 5
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- 150000008064 anhydrides Chemical class 0.000 claims 1
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- 229920001187 thermosetting polymer Polymers 0.000 description 20
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- 239000000463 material Substances 0.000 description 7
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- 125000003118 aryl group Chemical group 0.000 description 6
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- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 4
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- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
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- 150000001412 amines Chemical class 0.000 description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 4
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- 150000002513 isocyanates Chemical class 0.000 description 4
- 150000003077 polyols Chemical class 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 229910000679 solder Inorganic materials 0.000 description 4
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical group S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 4
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- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
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- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 3
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- 239000004841 bisphenol A epoxy resin Substances 0.000 description 3
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F20/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F20/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
-
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/58—Epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/67—Unsaturated compounds having active hydrogen
-
- C—CHEMISTRY; METALLURGY
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Abstract
本發明係提供一種可形成具有無滲出或斷線留白等之優異印刷性且具有優異耐龜裂性之硬化物的光硬化性樹脂組成物、具有由該組成物所得之樹脂層的乾膜、使該組成物或該乾膜之樹脂層硬化而得之硬化物及具有該硬化物之印刷配線板。該光硬化性樹脂組成物含有(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯、(B)光聚合起始劑、及(C)填料。
Description
[0001] 本發明係有關光硬化性樹脂組成物、乾膜、硬化物及印刷配線板。
[0002] 近幾年來,關於行動電話或個人電腦或觸控顯示器等,對小型化、高密度化、高精細化等之要求日益提高,該等中所形成之印刷配線板之抗焊阻劑或上覆層或層間絕緣等之絕緣層或導電電路或電極等之微細化亦要求比以往更大。 [0003] 對於此等要求,為了適用可以與圖型印刷法相比更高精細圖型化之光微影法,而使用由光硬化性樹脂組成物所成之絕緣膏或導電膏形成絕緣層或導電電路等(例如參考專利文獻1~6)。 [先前技術文獻] [專利文獻] [0004] 專利文獻1:日本特開2014-101412號公報 專利文獻2:日本特開2013-137511號公報 專利文獻3:日本特開2013-136727號公報 專利文獻4:國際公開第2010/113287號公報 專利文獻5:日本特開2014-167090號公報 專利文獻6:日本特開2015-026013號公報
[發明欲解決之課題] [0005] 即使為光微影型絕緣膏或導電膏,為了使藉顯影去除之部分僅可能少,實際上亦採用將各膏圖案印刷為概略形狀,隨後以光微影法形成高精細圖型之方法。且,亦探討不採用光微影法而將光硬化性樹脂組成物以圖型印刷進行圖型之方法。 [0006] 然而,膏進行圖型印刷時,若實際的膏圖型比網版之圖型形狀過大,則產生零件安裝時之安裝不良或導體間接觸引起短路等之缺陷。此意指膏滲出。膏滲出之一原因舉例為膏中之溶劑量過多。 [0007] 另一方面,為了抑制滲出而減少溶劑量時,膏的黏度過高,於圖型印刷時膏未轉印至基材上而發生斷線留白之缺陷,難以同時抑制滲出與斷線留白。 [0008] 又,隨著近幾年之電子機器之高性能化,絕緣膏及導電膏均亦變得重視硬化物之耐龜裂性。作為提高硬化物之耐龜裂性之方法之一舉例為高填充填料之方法。然而,以往之樹脂材料若高填充填料則膏的黏度顯著上升,有印刷性劣化之問題。 [0009] 因此,本發明之目的在於提供可形成具有圖型印刷時無滲出或斷線留白之優異印刷性且具有優異耐龜裂性之硬化物的光硬化性樹脂組成物、具有由該組成物所得之樹脂層的乾膜、其硬化物及具有該硬化物之印刷配線板。 [用以解決課題之手段] [0010] 本發明人等進行積極研究之結果,發現具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯與填料之濡濕性優異,且若將其搭配於光硬化性樹脂組成物中則即使不大量搭配溶劑亦可使膏的黏度降低,且即使高填充填料亦可維持龜裂耐性,且印刷性優異,因而完成本發明。 [0011] 亦即,本發明之光硬化性樹脂組成物之特徵係含有(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯、(B)光聚合起始劑、及(C)填料者。 [0012] 本發明之光硬化性樹脂組成物較好前述(C)填料的搭配量相對於光硬化性樹脂組成物之全質量而言,為70~95質量%。 [0013] 本發明之光硬化性樹脂組成物較好前述(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯具有羧基。 [0014] 本發明之光硬化性樹脂組成物較好前述(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之酸價在40~250 mgKOH/g之範圍內。 [0015] 本發明之光硬化性樹脂組成物較好前述(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之玻璃轉化溫度在-10~60℃之範圍內。 [0016] 本發明之乾膜之特徵係具有將前述光硬化性樹脂組成物塗佈於薄膜、進行乾燥而得到之樹脂層。 [0017] 本發明之硬化物之特徵係將前述光硬化性樹脂組成物、或前述乾膜的樹脂層硬化而得到。 [0018] 本發明之印刷配線板之特徵係具有前述硬化物。 [發明效果] [0019] 依據本發明,可提供可形成具有圖型印刷時無滲出或斷線留白等之優異印刷性且具有優異耐龜裂性之硬化物的光硬化性樹脂組成物、具有由該組成物所得之樹脂層的乾膜、其硬化物及具有該硬化物之印刷配線板。
[0020] 本發明之光硬化性樹脂組成物之特徵係含有(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯、(B)光聚合起始劑、及(C)填料者。依據本發明人等之積極研究之結果,發現藉由使用具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯,即使未大量搭配溶劑,亦可成為不產生滲出及斷線留白等之膏黏度。再者可知,賦予顯影性時,前述(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯係含有羧基之樹脂時,即使使用Na2
CO3
濃度為0.2質量%左右之稀鹼顯影液進行顯影,亦可抑制顯影殘渣之發生,且解像性亦改善。此認為係因為胺基甲酸酯鍵結及雙酚AD骨架顯示與填料之高濡濕性。且推測由於以稀鹼水溶液顯影,故有可能以對曝光部之損傷較少之狀態形成圖像,再者,曝光區域與未曝光區域對鹼顯影液之溶解對比度高的結果,解像性獲得改良。 [0021] 又,本發明之光硬化性樹脂組成物由於即使高填充填料印刷性亦優異,故可為了增加龜裂耐性或導電性等而以高搭配量含有填料。 [0022] 又,本發明之光硬化性樹脂組成物較好含有熱硬化性成分。以往例如導電膏時係於高溫燒成形成硬化物,並與基材密著,但近幾年來基於基材選擇性之觀點亦要求可在低溫形成硬化物。本發明之光硬化性樹脂組成物中搭配熱硬化性成分時,即使於低溫硬化亦可形成密著性優異之硬化物。 [0023] 本說明書中,所謂(甲基)丙烯酸酯係對丙烯酸酯及甲基丙烯酸酯總稱之用語,關於其他類似表現亦同樣。 [0024] 以下針對亦含有任意成分之本發明之光硬化性樹脂組成物中可含有之各成分加以說明。 [0025] [(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯] 本發明之光硬化性樹脂組成物含有(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯。(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯亦可含有羧基,該情形時,本發明之光硬化性樹脂組成物可成為鹼顯影型。又,不具有羧基時,亦可藉由搭配其他鹼溶解性成分而成為鹼顯影型。又,雙酚AD骨架於本技術領域中亦稱為雙酚E骨架。 [0026] (A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之合成方法並未特別限定,但可為例如於雙酚AD型環氧樹脂中添加二醇化合物,進而緩緩添加二異氰酸酯化合物,藉此獲得之雙酚AD型環氧胺基甲酸酯樹脂,進而與(甲基)丙烯酸縮水甘油酯反應,獲得具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯。本發明中,作為(A)成分較好使用如上述具有將使雙酚AD型環氧樹脂與二醇化合物反應後,進而與二異氰酸酯化合物反應所得之構造作為胺基甲酸酯鍵結及雙酚AD骨架之環氧(甲基)丙烯酸酯。 [0027] 又,(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯具有羧基時,亦即含羧基之雙酚AD型環氧胺基甲酸酯(甲基)丙烯酸酯樹脂時之合成方法並未特別限定,但可為例如使具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯與酸酐反應而獲得。如上述之含羧基之樹脂由於於主幹聚合物之側鏈具有多數游離羧基,故可藉由稀鹼水溶液顯影。且,上述含羧基之樹脂的酸價較好為40~250 mgKOH/g之範圍,更好為40~200 mgKOH/g之範圍,又更好為45~120 mgKOH/g之範圍。上述含羧基之樹脂的酸價為40 mgKOH/g以上時,基於顯影性之觀點係較佳。另一方面若為250 mgKOH/g以下,基於藉由顯影液溶解曝光部,而使線細至必要以上,防止曝光部與未曝光部之溶解對比度惡化之觀點係較佳。 [0028] 又,(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之重量平均分子量雖隨樹脂骨架而異,但一般為2,000~150,000,進而較好為5,000~100,000之範圍者。質量平均分子量為2,000以上時,基於無觸黏性能等之觀點係較佳,於鹼顯影型時基於解像性之觀點亦較佳。另一方面,質量平均分子量為150,000以下時,基於儲存安定性等之觀點係較佳,鹼顯影型時基於顯影性之觀點亦較佳。重量平均分子量可藉由凝膠滲透層析法測定。 [0029] (A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之玻璃轉化溫度較好在-10~60℃之範圍內。-10℃以上時,無觸黏性能更優異。60℃以下時,龜裂耐性更良好。更好為0~40℃。 [0030] 本發明之光硬化性樹脂組成物中含有之(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯的玻璃轉化溫度可藉由感光性成分之示差掃描熱量計(DSC)測定而求出,本說明書之實施例係使用該方法測定。 [0031] (A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯可單獨使用1種或組合2種以上使用。 [0032] 本發明之光硬化性樹脂組成物在不阻礙本發明硬化之範圍內,可含有其他光硬化性樹脂。 [0033] [(B)光聚合起始劑] (B)光聚合起始劑並無特別限定,可使用例如肟酯系、苯乙酮系、苯偶因系、氧化膦系之光聚合起始劑。 本發明中,(B)光聚合起始劑較好為具有下述通式(I)表示之基之肟酯系聚合起始劑、或具有下述通式(II)表示之基之苯乙酮系光聚合起始劑。 [0034][0035] 通式(I)中,R1表示氫原子、碳數1~6之烷基或苯基,R2表示氫原子或碳數1~6之烷基。 [0036] 通式(II)中,R3及R4各獨立表示碳數1~12之烷基或碳數6~12之芳基烷基,R5及R6各獨立表示氫原子、或碳數1~6之烷基。或R5與R6亦可鍵結與式中之氮原子一起形成環,該環亦可含有醚鍵結。作為具體之例舉例為2-苄基-2-二甲胺基-1-(4-嗎啉基苯基)-丁酮-1或2-(二甲胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎啉基)苯基]-1-丁酮等。 [0037] 前述肟酯系光聚合起始劑中,以日本BASF公司製之CGI-325、IRGACURE OXE01、IRGACURE OXE02,ADEKA公司製之N-1919、NCI-831,日本化學工業公司製之TOE-004,常州強力電子新材料公司製之TR-PBG-304等較佳。 [0038] 前述具有以通式(II)表示之基之苯乙酮系光聚合起始劑舉例為2-甲基-1-[4-(甲硫基)苯基]-2-嗎啉基丙酮-1、2-苄基-2-二甲胺基-1-(4-嗎啉基苯基)-丁-1-酮、2-(二甲胺基)-2-[(4-甲基苯基)甲基]-1-[4-(4-嗎啉基)苯基]-1-丁酮、N,N-二甲基胺基苯乙酮等。作為市售品舉例為日本BASF公司製造之IRGACURE 907、IRGACURE 369、IRGACURE 379EG等。 [0039] (B)光聚合起始劑可單獨使用1種或組合2種以上使用。 [0040] (B)光聚合起始劑之搭配量並無特別限制,但相對於(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯100質量份,較好為0.01~30質量份,更好為0.5~15質量份。若為0.01質量份以上,則基於光硬化性或耐藥品性等之觀點係較佳。另一方面,若為30質量份以下,則基於控制因光聚合起始劑而於硬化塗膜表面之光吸收、改善深部硬化性之觀點係較佳。 [0041] [(C)填料] 作為(C)填料並未特別限定,可使用習知慣用之無機或有機填料。搭配(C)填料之目的並未特別限定,可為為了提高塗膜之物理強度等或賦予導電性。賦予導電性時較好使用導電性填料,且本發明之光硬化性樹脂組成物用於形成絕緣層時較好使用非導電性填料。 [0042] 導電性填料之材質若為可對本發明之光硬化性樹脂組成物賦予導電性則可使用任意者。作為此等導電性填料可舉例為Ag、Au、Pt、Pd、Ni、Cu、Al、Sn、Pb、Zn、Fe、Ir、Os、Rh、W、Mo、Ru等,該等中較好為Ag。該等導電性填料可以上述成分單體之形態使用,或亦可以合金或氧化物之形態使用。再者,亦可使用氧化錫(SnO2
)、氧化銦(In2
O3
)、ITO(銦錫氧化物)等。又,導電性填料可為碳黑、石墨、碳奈米管等之碳粉。但,由於會使光透過性降低,故需要注意。 [0043] 導電性填料之形狀並未特別限定,除了薄片狀以外,尤其較好為針狀或球狀。藉此,提高光透過性,或光硬化性樹脂組成物為鹼顯影型時可形成解像性優異之導電電路或電極。 [0044] 導電性填料為了形成微細線,最大粒徑較好為30μm以下。藉由將最大粒徑設為30μm以下,光硬化性樹脂組成物於鹼顯影型時能提高導電電路或電極之解像性。 [0045] 又,導電性填料使用電子顯微鏡(SEM)以10,000倍觀察之隨機10個導電性填料之平均粒徑,其範圍較好為0.1~10μm。平均粒徑為0.1μm以上時,基於導電性之觀點係較佳。另一方面,平均粒徑為10μm以下時,基於防止網版堵塞之觀點係較佳。又,較好使用藉由MICROTACK測定之平均粒徑為0.5~3.5μm之大小者。導電性填料較好為10-3
Ω‧cm以下。 [0046] 非導電性填料較好具有體積固有電阻率(JIS K 6911)為1010
Ω‧cm以上之非導電性。作為非導電性填料舉例為例如無定形氧化矽、熔融氧化矽、球狀氧化矽等之氧化矽、硫酸鋇、水滑石、滑石、黏土、碳酸鎂、碳酸鈣、氧化鋁、氧化鈦、氫氧化鋁、氮化矽、氮化鋁、氮化硼、Neuburger矽土粒子等。 [0047] (C)填料可單獨使用1種或組合2種以上使用。 [0048] (C)填料的搭配量,以光硬化性樹脂組成物之全質量為基準,較好為70~95質量%,更好為70~90質量%。填料之搭配量若為70質量%以上,則基於印刷性之觀點係較佳,搭配導電性填料時基於導電性之觀點亦較佳。另一方面,填料之搭配量若為95質量%以下,基於印刷性與光透過性之觀點係較佳。 [0049] (反應性稀釋劑) 本發明之光硬化性樹脂組成物為了以光進行交聯,較好使用反應性稀釋劑。作為反應性稀釋劑較好使用(甲基)丙烯酸酯化合物。又,反應性稀釋劑較好為多官能。多官能較好的理由係與官能基數為1時相比,光反應性提高,且鹼顯影型時之解像性優異之故。 [0050] 作為(甲基)丙烯酸酯化合物舉例為多官能(甲基)丙烯酸酯單體或寡聚物(2官能以上之(甲基)丙烯酸酯單體或寡聚物),具體舉例為例如慣用習知之聚酯(甲基)丙烯酸酯、聚醚(甲基)丙烯酸酯、胺基甲酸酯(甲基)丙烯酸酯、碳酸酯(甲基)丙烯酸酯、環氧(甲基)丙烯酸酯等。具體而言可舉例為丙烯酸2-羥基乙酯、丙烯酸2-羥基丙酯等丙烯酸羥基烷酯類;乙二醇、甲氧基四乙二醇、聚乙二醇、丙二醇等之二醇的二丙烯酸酯類;N,N-二甲基丙烯醯胺、N-羥甲基丙烯醯胺、N,N-二甲基胺基丙基丙烯醯胺等之丙烯醯胺類;丙烯酸N,N-二甲基胺基乙酯、丙烯酸N,N-二甲基胺基丙酯等丙烯酸胺基烷酯類;己二醇、三羥甲基丙烷、季戊四醇、二季戊四醇、參-羥基乙基異氰脲酸酯等多元醇或該等之環氧乙烷加成物、環氧丙烷加成物、或者ε-己內酯加成物等之多元丙烯酸酯類;苯氧基丙烯酸酯、雙酚A二丙烯酸酯、及該等酚類之環氧乙烷加成物或環氧丙烷加成物等多元丙烯酸酯類;丙三醇二縮水甘油醚、丙三醇三縮水甘油醚、三羥甲基丙烷三縮水甘油醚、三縮水甘油基異氰脲酸酯等縮水甘油醚之多元丙烯酸酯類;不限於上述,亦可列舉為使聚醚多元醇、聚碳酸酯二醇、羥基末端聚丁二烯、聚酯多元醇等之多元醇直接丙烯酸酯化,或者透過二異氰酸酯進行胺基甲酸酯丙烯酸酯化之丙烯酸酯類及三聚氰胺丙烯酸酯、及對應於上述丙烯酸酯之各甲基丙烯酸酯類之至少任一種等。 [0051] 再者,使甲酚酚醛清漆型環氧樹脂等多官能環氧樹脂與丙烯酸反應而成之環氧丙烯酸酯樹脂,或進而使該環氧丙烯酸酯樹脂之羥基與季戊四醇三丙烯酸酯等羥基丙烯酸酯與異佛爾酮二異氰酸酯等二異氰酸酯之半胺基甲酸酯化合物反應而成之環氧基胺基甲酸酯丙烯酸酯化合物等亦可使用作為反應性稀釋劑。該等環氧丙烯酸酯系樹脂可降低指觸乾燥性,且提高光硬化性。 [0052] 其中,較好使用多官能(甲基)丙烯酸酯單體,尤其較好為4官能之(甲基)丙烯酸酯單體。作為4官能之(甲基)丙烯酸酯單體舉例為季戊四醇四丙烯酸酯、季戊四醇四甲基丙烯酸酯等。 [0053] 反應性稀釋劑可單獨使用1種或組合2種以上使用。 [0054] 反應性稀釋劑之搭配量並未特別限定,相對於(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯100質量份,宜為10~100質量份,更好為20~80質量份之比例。10質量份以上時,光硬化性良好,於活性能量線照射後之鹼顯像中,易形成圖型之線。另一方面,100質量份以下時,對於鹼水溶液之溶解性良好,圖型膜不易變脆。 [0055] (熱硬化性成分) 本發明之光硬化性樹脂組成物,基於更提高龜裂耐性,較好含有熱硬化性成分。作為本發明中使用之熱硬化性成分可使用三聚氰胺樹脂、苯胍胺樹脂等之胺樹脂、封端異氰酸酯化合物、環狀碳酸酯化合物、多官能環氧化合物、多官能氧雜環丁烷化合物、環硫樹脂、三聚氰胺衍生物等之習知慣用之熱硬化性樹脂。熱硬化性成分可單獨使用1種或組合2種以上使用。本發明中,較好為自分子中具有2個以上環狀醚基及環狀硫醚基中選擇之至少任一種(以下簡稱為環狀(硫)醚基)之熱硬化成分,或1分子內具有2個以上異氰酸酯基或封端化異氰酸酯基之熱硬化性成分。 [0056] 上述之分子中具有2個以上環狀(硫)醚基之熱硬化成分為分子中具有2個以上之3、4或5員環之環狀醚基或環狀硫醚基之任一種或2種基之化合物,可舉例為例如,分子內具有至少2個以上環氧基之化合物,亦即多官能環氧化合物、分子內具有至少2個以上氧雜環丁基之化合物,亦即多官能氧雜環丁烷化合物,分子內具有2個以上硫醚基之化合物,亦即環硫樹脂等。 [0057] 作為前述多官能環氧化合物,舉例為例如三菱化學公司製之JER828、JER834、JER1001、JER1004,DIC公司製之Epiclon 840、Epiclon 850、Epiclon 1050、Epiclon 2055,東都化成公司製之EPOTOT YD-011、YD-013、YD-127、YD-128,道化學公司製之D.E.R.317、D.E.R.331、D.E.R.661、D.E.R.664,住友化學工業公司製之Sumi-epoxy ESA-011、ESA-014、ELA-115、ELA-128,旭化成工業公司製之A.E.R.330、A.E.R.331、A.E.R.661、A.E.R.664等之雙酚A型環氧樹脂;三菱化學公司製之JERYL 903,DIC公司製之Epiclon 152、Epiclon 165,東都化成公司製之EPOTOT YDB-400、YDB-500,道化學公司製之D.E.R.542,住友化學工業公司製之Sumi-epoxy ESB-400、ESB-700,旭化成工業公司製之A.E.R.711、A.E.R.714等之溴化環氧樹脂;三菱化學公司製之JER 152、JER 154,道化學公司製之D.E.N.431、D.E.N.438,DIC公司製之Epiclon N-730、Epiclon N-770、Epiclon N-865,東都化成公司製之EPOTOT YDCN-701、YDCN-704,日本化藥公司製之EPPN-201、EOCN-1025、EOCN-1020、EOCN-104S、RE-306,住友化學工業公司製之Sumi-epoxy ESCN-195X、ESCN-220,旭化成工業公司製之A.E.R. ECN-235、ECN-299等之酚醛清漆型環氧樹脂;DIC公司製之Epiclon 830,三菱化學公司製之JER 807,東都化成公司製之EPOTOT YDF-170、YDF-175、YDF-2004等之雙酚F型環氧樹脂;東都化成公司製之EPOTOT ST-2004、ST-2007、ST-3000等之氫化雙酚A型環氧樹脂;三菱化學公司製之JER 604,東都化成公司製之EPOTOT YH-434;住友化學工業公司製之Sumi-epoxy ELM-120等之縮水甘油胺型環氧樹脂;乙內醯脲型環氧樹脂;Dicel公司製之Celloxide 2021P等之脂環式環氧樹脂;三菱化學公司製之YL-933,道化學公司製之T.E.N., EPPN-501、EPPN-502等之三羥基苯基甲烷型環氧樹脂;三菱化學公司製之YL-6056、YX-4000、YL-6121等之雙二甲苯酚型或聯酚型環氧樹脂或該等之混合物;日本化藥公司製之EBPS-200,ADEKA公司製之EPX-30,DIC公司製之EXA-1514等之雙酚S型環氧樹脂;三菱化學公司製之JER 157S等之雙酚A酚醛清漆型環氧樹脂;三菱化學公司製之JERYL-931等之四羥苯基乙烷型環氧樹脂;日產化學工業公司製之TEPIC等之雜環式環氧樹脂;日本油脂公司製之Blenmer DGT等之二縮水甘油基苯二甲酸酯樹脂;東都化成公司製之ZX-1063等之四縮水甘油基二甲苯醯基乙烷樹脂;新日鐵化學公司製之ESN-190、ESN-360,DIC公司製之HP-4032、EXA-4750、EXA-4700等之含萘基之環氧樹脂;DIC公司製之HP-7200、HP-7200H等之具有二環戊二烯骨架之環氧樹脂;日本油脂公司製之CP-50S、CP-50M等之縮水甘油基甲基丙烯酸酯共聚物系環氧樹脂;進而有環己基馬來醯亞胺與縮水甘油基甲基丙烯酸酯之共聚合環氧樹脂;環氧改質之聚丁二烯橡膠衍生物(例如Daicel公司製之EPOLEAD PB-3600等),CTBN改質之環氧樹脂(例如東都化成公司製之YR-102、YR-450等)等,但並不限於該等。該等環氧樹脂可單獨使用1種,或組合2種以上使用。該等中,尤其較好為酚醛清漆型環氧樹脂、雜環式環氧樹脂、雙酚A型環氧樹脂或該等之混合物。 [0058] 前述多官能氧雜環丁烷化合物舉例為雙[(3-甲基-3-氧雜環丁基甲氧基)甲基]醚、雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]醚、1,4-雙[(3-甲基-3-氧雜環丁基甲氧基)甲基]苯、1,4-雙[(3-乙基-3-氧雜環丁基甲氧基)甲基]苯、丙烯酸(3-甲基-3-氧雜環丁基)甲酯、丙烯酸(3-乙基-3-氧雜環丁基)甲酯、甲基丙烯酸(3-甲基-3-氧雜環丁基)甲酯、甲基丙烯酸(3-乙基-3-氧雜環丁基)甲酯或該等之寡聚物或共聚物等多官能氧雜環丁烷類,以及與氧雜環丁烷醇與酚醛清漆樹脂、聚(對-羥基苯乙烯)、卡多(cardo)型雙酚類、杯芳烴(calixarene)類、杯間苯二酚芳烴(calixresorcinarene)類,或倍半矽氧烷等之與具有羥基之樹脂的醚化合物等。此外,亦列舉具有氧雜環丁烷環之不飽和單體與(甲基)丙烯酸烷酯之共聚物等。 [0059] 作為前述分子中具有2個以上環狀硫醚基之化合物舉例為例如三菱化學公司製之雙酚A型環硫樹脂YL7000等。且,亦可使用利用相同合成方法,將酚醛清漆型環氧樹脂之環氧基的氧原子取代為硫原子之環硫樹脂等。 [0060] 又,本發明之光硬化性樹脂組成物中,為了提高光硬化性樹脂組成物之硬化性及所得硬化膜之強韌性,較好添加1分子內具有2個以上之異氰酸酯基或封端化異氰酸酯基之化合物。此種1分子內具有2個以上之異氰酸酯基或封端化異氰酸酯基之化合物舉例為1分子內具有2個以上之異氰酸酯基之化合物,亦即聚異氰酸酯化合物、或1分子內具有2個以上之封端化異氰酸酯基之化合物,亦即經封端異氰酸酯化合物等。 [0061] 作為聚異氰酸酯化合物係使用例如芳香族聚異氰酸酯、脂肪族聚異氰酸酯或脂環式聚異氰酸酯。作為芳香族聚異氰酸酯之具體例可舉例為4,4’-二苯基甲烷二異氰酸酯、2,4-甲苯二異氰酸酯、2,6-甲苯二異氰酸酯、萘-1,5-二異氰酸酯、鄰-二甲苯二異氰酸酯、間-二甲苯二異氰酸酯及2,4-甲苯二聚物。脂肪族聚異氰酸酯之具體例舉例為四亞甲基二異氰酸酯、六亞甲基二異氰酸酯、亞甲基二異氰酸酯、三甲基六亞甲基二異氰酸酯、4,4-亞甲基雙(環己基異氰酸酯)及異佛爾酮二異氰酸酯。脂環式聚異氰酸酯之具體例舉例為雙環庚烷三異氰酸酯。以及先前列舉之異氰酸酯化合物之加成物、縮脲體及異氰脲酸酯體等。 [0062] 封端異氰酸酯化合物中所含之封端化異氰酸酯基係藉由使異氰酸酯基與封端劑反應而予以保護之暫時惰性化之基。加熱至特定溫度時該封端劑解離而生成異氰酸酯基。 [0063] 作為封端異氰酸酯化合物係使用異氰酸酯化合物與異氰酸酯封端劑之加成反應產物。可與封端劑反應之異氰酸酯化合物可舉例為異氰脲酸酯型、縮脲型、加成物型等。作為該異氰酸酯化合物係使用例如與上述同樣之芳香族聚異氰酸酯、脂肪族聚異氰酸酯或脂環式聚異氰酸酯。 [0064] 異氰酸酯封端劑可舉例為例如苯酚、甲酚、二甲酚、氯酚及乙基酚等酚系封端劑;ε-己內醯胺、δ-戊內醯胺、γ-丁內醯胺及β-丙內醯胺等內醯胺系封端劑;乙醯基乙酸乙酯及乙醯基丙酮等之活性亞甲基系封端劑;甲醇、乙醇、丙醇、丁醇、戊醇、乙二醇單甲基醚、乙二醇單乙基醚、乙二醇單丁基醚、二乙二醇單甲基醚、丙二醇單甲基醚、苄基醚、乙醇酸甲酯、乙醇酸丁酯、二丙酮醇、乳酸甲酯及乳酸乙酯等醇系封端劑;甲醛肟、乙醛肟、乙醯基肟、甲基乙基酮肟、二乙醯基單肟、環己烷肟等肟系封端劑;丁基硫醇、己基硫醇、第三丁基硫醇、硫酚、甲硫基酚、乙硫基酚等之硫醇系封端劑;乙酸醯胺、苯甲醯胺等之酸醯胺系封端劑;琥珀酸醯亞胺及馬來酸醯亞胺等之醯亞胺系封端劑;二甲基苯胺、苯胺、丁基胺、二丁基胺等胺系封端劑;咪唑、2-乙基咪唑等咪唑系封端劑;亞甲基亞胺及伸丙基亞胺等亞胺系封端劑等。 [0065] 封端異氰酸酯化合物亦可為市售者,舉例為例如7950、7951、7960、7961、7982、7990、7991、7992(以上為Baxenden公司製),Smidur BL-3175、BL-4165、BL-1100、BL-1265、Desmodur TPLS-2957、TPLS-2062、TPLS-2078、TPLS-2117、Desmosome 2170、Desmosome 2265(以上為住友拜耳胺基甲酸酯公司製)、Coronate 2512、Coronate 2513、Coronate 2520(以上為日本聚胺基甲酸酯工業公司製)、B-830、B-815、B-846、B-870、B-874、B-882(三井武田化學公司製)、DURANATE TPA-B80E、17B-60PX、E402-B80T、MF-B60B、MF-K60B、SBN-70D(旭化成公司製)、KARENZ MOI-BM(昭和電工公司製)等。又,Sumidur BL-3175、BL-4265為使用甲基乙基肟作為封端劑而得者。 [0066] 上述1分子內具有2個以上異氰酸酯基或封端化異氰酸酯基之化合物可單獨使用1種或組合2種以上使用。 [0067] 該等1分子內具有2個以上異氰酸酯基或封端化異氰酸酯基之化合物之搭配量,相對於(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯100質量份,宜為1~100質量份,更好為2~70質量份之比例。1質量份以上時,基於塗膜強韌性之觀點係較佳。另一方面,100質量份以下時,基於保存安定性之觀點係較佳。 [0068] 本發明之光硬化性樹脂組成物,為了更提高本發明脂效果或在不阻礙本發明效果之範圍為了進而發揮其他效果,可與上述成分一起含有以下例示之其他成分。 [0069] (有機酸) 作為有機酸較好為不具有芳香環之有機酸。藉由搭配不具有芳香環之有機酸,可抑制有機酸本身之光吸收性,相對地提高(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之光反應性,可獲得優異之解像性。其中較好為二羧酸,更好為2,2’-硫代二乙酸。 [0070] 有機酸之具體例舉例為2,2’-硫代二乙酸、己二酸、異丁酸、甲酸、檸檬酸、戊二酸、乙酸、草酸、酒石酸、乳酸、丙酮酸、丙二酸、丁酸、蘋果酸、水楊酸、苯甲酸、苯基乙酸、丙烯酸、馬來酸、富馬酸、巴豆酸等羧酸類;亞磷酸二丁酯、亞磷酸丁酯、亞磷酸二甲酯、亞磷酸甲酯、亞磷酸二丙酯、亞磷酸丙酯、亞磷酸二苯酯、亞磷酸苯酯、亞磷酸二異丙酯、亞磷酸異丙酯、亞磷酸正甲基-2-乙基己酯等亞磷酸之單或二酯類;磷酸二丁酯、磷酸丁酯、磷酸二甲酯、磷酸甲酯、磷酸二丙酯、磷酸丙酯、磷酸二苯酯、磷酸苯酯、磷酸二異丙酯、磷酸異丙酯、磷酸正丁基-2-乙基己酯等磷酸之單或二酯類等。 [0071] 上述有機酸之搭配量,相對於前述(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯100質量份,較好為1~10質量份之範圍。1質量份以上時,顯影性更良好,另一方面,10質量份以下時,解像性更優異。 [0072] (分散劑) 藉由搭配分散劑可改善光硬化性樹脂組成物之分散性、沉降性。 [0073] 作為分散劑舉例為例如ANTI-TERRA-U、ANTI-TERRA-U100、ANTI-TERRA-204、ANTI-TERRA-205、DISPERBYK-101、DISPERBYK-102、DISPERBYK-103、DISPERBYK-106、DISPERBYK-108、DISPERBYK-109、DISPERBYK-110、DISPERBYK-111、DISPERBYK-112、DISPERBYK-116、DISPERBYK-130、DISPERBYK-140、DISPERBYK-142、DISPERBYK-145、DISPERBYK-161、DISPERBYK-162、DISPERBYK-163、DISPERBYK-164、DISPERBYK-166、DISPERBYK-167、DISPERBYK-168、DISPERBYK-170、DISPERBYK-171、DISPERBYK-174、DISPERBYK-180、DISPERBYK-182、DISPERBYK-183、DISPERBYK-185、DISPERBYK-184、DISPERBYK-191、DISPERBYK-192、DISPERBYK-2000、DISPERBYK-2001、DISPERBYK-2009、DISPERBYK-2020、DISPERBYK-2025、DISPERBYK-2050、DISPERBYK-2070、DISPERBYK-2095、DISPERBYK-2096、DISPERBYK-2150、BYK-P104、BYK-P104S、BYK-P105、BYK-9076、BYK-9077、BYK-220S(日本BYK公司製)、DISPARLON 2150、DISPARLON 1210、DISPARLON KS-860、DISPARLON KS-873N、DISPARLON 7004、DISPARLON 1830、DISPARLON 1860、DISPARLON 1850、DISPARLON DA-400N、DISPARLON PW-36、DISPARLON DA-703-50(楠本化成公司製)、FLOREN G-450、FLOREN G-600、FLOREN G-820、FLOREN G-700、FLOREN DOPA-44、FLOREN DOPA-17(共榮社化學公司製)。 [0074] 分散劑之含量為了有效達成上述目的,相對於填料100質量份較好為0.1~10質量份,更好為0.5~8質量份。 [0075] (光聚合抑制劑) 藉由添加光聚合抑制劑,可在藉由曝光之於光硬化性樹脂組成物內部之自由基聚合之內,依據聚合抑制劑之種類及添加量抑制一定量之自由基聚合。藉此可抑制對於如散射光之較弱光之光反應。因此,可清晰地形成更微細導電電路之線,故可較好地使用。光聚合抑制劑只要是可使用作為光聚合抑制劑者即無特別限制,舉例為例如對-苯醌、萘醌、二第三丁基‧對甲酚、氫醌單甲醚、α-萘酚、乙醯脒乙酸酯、聯胺鹽酸鹽、氯化三甲基苄基銨、二硝基苯、苦味酸(picric acid)、醌二肟、鄰苯三酚(pyrogallol)、單寧酸(tannic acid)、間苯二酚、N-羥基N-亞硝基-苯胺銨鹽(Cupferron)、吩噻嗪(phenothiazine)等。 [0076] (熱硬化觸媒) 本發明之光硬化性樹脂組成物中使用上述分子中具有2個以上環狀(硫)醚基之熱硬化性成分時,較好含有熱硬化觸媒。作為此等熱硬化觸媒舉例為例如咪唑、2-甲基咪唑、2-乙基咪唑、2-乙基-4-甲基咪唑、2-苯基咪唑、4-苯基咪唑、1-氰基乙基-2-苯基咪唑、1-(2-氰基乙基)-2-乙基-4-甲基咪唑等咪唑衍生物;二氰二醯胺、苄基二甲基胺、4-(二甲胺基)-N,N-二甲基苄基胺、4-甲氧基-N,N-二甲基苄基胺、4-甲基-N,N-二甲基苄基胺等胺化合物,己二酸二醯肼、癸二酸二醯肼等醯肼化合物;三苯膦等之磷化合物等。又,市售者列舉為例如四國化成工業公司製之2MZ-A、2MZ-OK、2PHZ、2P4BHZ、2P4MHZ(均為咪唑系化合物之商品名)、SAN-APRO公司製之U-CAT3503N、U-CAT3502T(均為二甲胺之封端異氰酸酯化合物之商品名)、DBU、DBN、U-CATSA102、U-CAT5002(均為二環式脒化合物及其鹽)等。並不特別限於該等者,較好為環氧樹脂或氧雜環丁烷化合物之熱硬化觸媒,或者促進選自環氧基及氧雜環丁基之至少任一種與羧基之反應者即可,單獨使用1種或混合2種以上均無妨。又,亦可使用胍胺、乙醯胍胺、苯胍胺、三聚氰胺、2,4-二胺基-6-甲基丙烯醯氧基乙基-S-三嗪、2-乙烯基-2,4-二胺基-S-三嗪、2-乙烯基-4,6-二胺基-S-三嗪‧異氰脲酸加成物、2,4-二胺基-6-甲基丙烯醯氧基乙基-S-三嗪‧異氰脲酸加成物等S-三嗪衍生物,較好與前述熱硬化觸媒併用亦作為該等密著性賦予劑發揮功能之化合物。 [0077] 該等熱硬化觸媒之搭配量,以通常量之比例即已足夠,例如相對於含羧基之樹脂或分子中具有2個以上環狀(硫)醚基之熱硬化性成分100質量份,較好為0.1~20質量份,更好為0.5~15質量份。 [0078] (熱聚合抑制劑) 熱聚合抑制劑可用於防止本發明之光硬化性樹脂組成物之熱聚合或經時聚合。作為熱聚合抑制劑舉例為例如4-甲氧基苯酚、氫醌、烷基或芳基取代之氫醌、第三丁基兒茶酚、連苯三酚、2-羥基二苯甲酮、4-甲氧基-2-羥基二苯甲酮、氯化亞銅、四氯苯醌(chloranil)、萘胺、β-萘酚、2,6-二第三丁基-4-甲酚、2,2’-亞甲基雙(4-甲基-6-第三丁基苯酚)、吡啶、硝基苯、二硝基苯、苦味酸、4-甲苯胺、亞甲基藍、銅與有機螯合劑反應物、水楊酸甲酯、及亞硝基化合物、亞硝基化合物與Al之螯合物等。 [0079] (鏈轉移劑) 本發明之光硬化性樹脂組成物中,為提高感度,可使用作為鏈轉移劑而習知之N-苯基甘胺酸類、苯氧基乙酸類、硫苯氧基乙酸類、巰基噻唑等。若列舉鏈轉移劑之具體例,則為例如巰基琥珀酸、巰基乙酸、巰基丙酸、蛋胺酸、半胱胺酸、硫代水楊酸及其衍生物等之具有羧基之鏈轉移劑;巰基乙醇、巰基丙醇、巰基丁醇、巰基丙二醇、巰基丁二醇、羥基苯硫醇及其衍生物等之具有羥基之鏈轉移劑;1-丁硫醇、丁基-3-巰基丙酸酯、甲基-3-巰基丙酸酯、2,2-(伸乙二氧基)二乙烷硫醇、乙烷硫醇、4-甲基苯硫醇、十二烷基硫醇、丙烷硫醇、丁烷硫醇、戊烷硫醇、1-辛烷硫醇、環戊烷硫醇、環己烷硫醇、硫代丙三醇、4,4-硫基雙苯硫醇等。 [0080] 且,可使用多官能性硫醇系化合物,並無特別限制,但例如可使用己烷-1,6-二硫醇、癸烷-1,10-二硫醇、二巰基二乙醚、二巰基二乙基硫醚等脂肪族硫醇類,二甲苯二硫醇、4,4’-二巰基二苯基硫醚、1,4-苯二硫醇等芳香族硫醇類;乙二醇雙(巰基乙酸酯)、聚乙二醇雙(巰基乙酸酯)、丙二醇雙(巰基乙酸酯)、丙三醇參(巰基乙酸酯)、三羥甲基乙烷參(巰基乙酸酯)、三羥甲基丙烷參(巰基乙酸酯)、季戊四醇肆(巰基乙酸酯)、二季戊四醇陸(巰基乙酸酯)等多元醇之聚(巰基乙酸酯)類;乙二醇雙(3-巰基丙酸酯)、聚乙二醇雙(3-巰基丙酸酯)、丙二醇雙(3-巰基丙酸酯)、丙三醇參(3-巰基丙酸酯)、三羥甲基乙烷參(巰基丙酸酯)、三羥甲基丙烷參(3-巰基丙酸酯)、季戊四醇肆(3-巰基丙酸酯)、二季戊肆醇陸(3-巰基丙酸酯)等多元醇之聚(3-巰基丙酸酯)類;1,4-雙(3-巰基丁醯氧基)丁烷、1,3,5-參(3-巰基丁氧基乙基)-1,3,5-三嗪-2,4,6-(1H,3H,5H)-三酮、季戊四醇肆(3-巰基丁酸酯)等之聚(巰基丁酸酯)類。 [0081] 該等市售品可舉例例如BMPA、MPM、EHMP、NOMP、MBMP、STMP、TMMP、PEMP、DPMP及TEMPIC(以上為堺化學工業公司製)、KARENZ MT-PEI、KARENZ MT-BDI及KARENZ-NR1(以上為昭和電工公司製)等。 [0082] 再者,作為鏈轉移劑發揮作用之具有巰基之雜環化合物舉例為例如巰基-4-丁內酯(另稱為2-巰基-4-丁內酯(butanolide))、2-巰基-4-甲基-4-丁內酯、2-巰基-4-乙基-4-丁內酯、2-巰基-4-硫代丁內酯(butyrothiolactone)、2-巰基-4-丁內醯胺、N-甲氧基-2-巰基-4-丁內醯胺、N-乙氧基-2-巰基-4-丁內醯胺、N-甲基-2-巰基-4-丁內醯胺、N-乙基-2-巰基-4-丁內醯胺、N-(2-甲氧基)乙基-2-巰基-4-丁內醯胺、N-(2-乙氧基)乙基-2-巰基-4-丁內醯胺、2-巰基-5-戊內酯、2-巰基-5-戊內醯胺、N-甲基-2-巰基-5-戊內醯胺、N-乙基-2-巰基-5-戊內醯胺、N-(2-甲氧基)乙基-2-巰基-5-戊內醯胺、N-(2-乙氧基)乙基-2-巰基-5-戊內醯胺、2-巰基苯并噻唑、2-巰基-5-甲硫基-噻二唑、2-巰基-6-己內醯胺、2,4,6-三巰基-s-三嗪(三協化成公司製ZISNET F)、2-二丁胺基-4,6-二巰基-s-三嗪(三協化成公司製ZISNET DB)、及2-苯胺基-4,6-二巰基-s-三嗪(三協化成公司製ZISNET AF)等。 [0083] 尤其,作為不損及光硬化性樹脂組成物之顯像性之鏈轉移劑之具有巰基之雜環化合物,較好為2-巰基苯并咪唑、2-巰基苯并噁唑、2-巰基苯并噻唑(川口化學工業公司製AXEL M)、3-巰基-4-甲基-4H-1,2,4-三唑、5-甲基-1,3,4-噻二唑-2-硫醇、1-苯基-5-巰基-1H-四唑。該等鏈轉移劑可單獨使用1種或併用2種以上。 [0084] (其他添加成分) 本發明之光硬化性樹脂組成物中當然亦可視需要適當搭配習知慣用之成分,例如增黏劑、消泡‧調平劑、偶合劑、抗氧化劑、防銹劑、著色劑、有機溶劑等。 [0085] 本發明之光硬化性樹脂組成物可以乾膜化使用亦可作為液狀使用。作為液狀使用時,可為1液性亦可為2液性以上。於乾膜化時,係將本發明之光硬化性樹脂組成物塗佈於薄膜上、進行乾燥而形成所得之樹脂層。形成樹脂層後,基於防止於膜表面附著塵埃等之目的,較好進而於膜表面層合可剝離之薄膜。 [0086] (光硬化塗膜之形成) (A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯具有羧基時,可藉光微影法進行圖型化。以下,針對使用本發明之光硬化性樹脂組成物以光微影法形成光硬化塗膜之方法之一例予以說明。 [0087] 本發明之光硬化性樹脂組成物中,與上述各必須成分及與任意成分之混練分散係使用三輥或摻合機等之機械。如此分散之光硬化性樹脂組成物以網版印刷法、棒塗佈器、刮刀塗佈器等之適當塗佈方法塗佈於基材上。 [0088] 塗佈後,為了獲得指觸乾燥性較好使塗膜乾燥。作為乾燥方法並未特別限定。例如以熱風循環式乾燥爐、遠紅外線乾燥爐等,於不使(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯熱分解之溫度例如約60~120℃乾燥5~40分鐘左右使有機溶劑蒸發,而獲得無觸黏之塗膜。 [0089] 接著,使用具有特定之曝光圖型之負型遮罩,實施接觸曝光或非接觸曝光。作為曝光光源係使用鹵素燈、高壓水銀燈、雷射光、金屬鹵化物燈、黑色燈、無電極燈等。至於曝光量可為累積光量為200mJ/cm2
以下之低光量。又,亦可不使用遮罩,而利用雷射直接成像裝置於塗膜上形成圖型。 [0090] 接著,以噴霧法、浸漬法等之顯影使塗膜成為圖型狀。至於顯影液較好使用氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸鉀、矽酸鈉等金屬鹼性水溶液,或單乙醇胺、二乙醇胺、三乙醇胺等胺水溶液。尤其可較好地使用約1.5質量%以下濃度之稀鹼性水溶液,但只要將光硬化性樹脂組成物中之羧基皂化,去除未硬化部(未曝光部)即可,並不限於如上述之顯影液。 [0091] 依據本發明之光硬化性樹脂組成物,藉由使用稀鹼性水溶液作為顯影液,可對塗膜之損傷小,而且不產生顯影殘渣問題,獲得解像性亦優異之光硬化塗膜。 [0092] 因此,本發明一形態中,光硬化塗膜之形成方法中使用之顯影液較好為Na2
CO3
濃度為0.1~2.0質量%之稀鹼性水溶液,更好為Na2
CO3
濃度為0.2~1.0質量%之稀鹼性水溶液。 [0093] 顯影後,為了去除顯影後不要之顯影液,較好進行水洗或酸中和。 [0094] 接著使所得光硬化塗膜在不使(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯熱分解之溫度硬化。藉此可形成印刷性優異,且密著性及耐龜裂性優異之硬化塗膜。作為熱硬化溫度較好為180℃以下,更好為150℃以下,又更好為140℃以下,特佳為130℃以下。 [0095] 該等步驟中,可使用不具有耐熱性之樹脂製基材作為基材。具體而言,作為樹脂製基材可舉例為例如聚醯亞胺、聚酯系樹脂、聚醚碸(PES)、聚苯乙烯(PS)、聚甲基丙烯酸甲酯(PMMA)、聚碳酸酯(PC)、聚醯胺(PA)、聚丙烯(PP)、聚苯醚(PPO)等,可較好地使用聚酯系樹脂。又,亦可為玻璃基板等。又,作為上述基材,除了預先藉由銅等形成電路之印刷配線板或軟性印刷配線板以外,又可例例為使用利用紙酚、紙環氧樹脂、玻璃布環氧樹脂、玻璃聚醯亞胺、玻璃布/不織布環氧樹脂、玻璃布/紙環氧樹脂、合成纖維環氧樹脂、氟樹脂‧聚乙烯‧聚苯醚、聚苯氧化物‧異氰酸酯等之高頻電路用貼銅層合板等之材質,且舉例為全部等級(FR-4等)之貼銅層合板,此外舉例為玻璃基板、金屬基板、聚醯亞胺薄膜、PET薄膜、聚萘二甲酸乙二酯(PEN)薄膜、陶瓷基板、晶圓板等。 [0096] 本發明之光硬化性樹脂組成物可較好地使用於導電電路、電極、電磁波遮蔽形成、導電性接著劑等,又,亦較好使用作為用以於印刷配線板上形成硬化皮膜,亦即作為印刷配線板用,更好係使用於形成永久被膜、進而較佳使用以形成焊劑阻劑或保護層或層間絕緣材。特佳係用以形成焊劑阻劑亦即作為焊劑阻劑組成物使用。又,本發明之光硬化性樹脂組成物亦可使用以形成焊劑壩劑(dam)。 [實施例] [0097] 以下基於實施例具體說明本發明。但,本發明並不限於該等實施例。 [0098] <具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯(A-1)之合成> 將雙酚AD型環氧樹脂R-710(三井化學公司製):174g (0.5mol)溶解於卡必醇乙酸酯:500mL中,於該溶液中添加2-甲基氫醌:0.5g及作為二醇化合物之1,6-己二醇:142g(1.2mol),升溫至45℃。於該溶液中添加作為二異氰酸酯化合物之六亞甲基二異氰酸酯:202g(1.2mol),以使反應溫度不超過50℃之方式緩慢滴加。滴加結束後,使溫度上升至80℃,反應6小時直至藉由紅外線吸收光譜測定法,2250cm-1
附近之吸收消失為止。於該溶液中添加作為分子中具有不飽和雙鍵之環氧化合物之甲基丙烯酸縮水甘油酯:171g(1.2mol)後,升溫至95℃,反應6小時,獲得具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯(A-1)之樹脂溶液。固形分為55質量%,由DSC測定所得之Tg為25.3℃。 [0099] <具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯(A-2)之合成> 除了使用異佛酮二異氰酸酯:267g(1.2mol)作為異氰酸酯化合物以外,與(A-2)之方法同樣之條件進行反應,獲得具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯(A-2)之樹脂溶液。固形分為50質量%,由DSC測定所得之Tg為26.5℃。 [0100] <具有羧基、具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯(A-3)之合成> 於作為具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯之(A-1)之53重量%溶液:433g中,饋入三苯膦:0.5g與四氫苯二甲酸酐:183g(1.2mol),邊攪拌邊於110℃反應5小時。其結果,獲得具有羧基且具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯(A-3)之樹脂溶液。固形分為51質量%,固形分酸價為85 mgKOH/g,由DSC測定所得之Tg為19.2℃。 [0101] <具有羧基、具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯(A-4)之合成> 除了使用具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯之(A-2)之50重量%溶液:476g以外,與(A-3)之方法同樣之條件進行反應,獲得具有羧基、具有胺基甲酸酯鍵結及雙酚AD骨架的環氧丙烯酸酯(A-4)之樹脂溶液。固形分為53質量%,固形分酸價為82 mgKOH/g,由DSC測定所得之Tg為21.3℃。 [0102] 此處,酸價意指依據「JIS K 2501-2003石油製品及潤滑油-中和試驗方法」記載之方法藉由下述方法測定之值。且後述之酸價亦同樣。 [0103] [酸價之測定方法] 將試料溶解於以1:1之質量比混合二甲苯與二甲基甲醯胺之滴定溶劑中,藉由電位差滴定法以0.1mol/L氫氧化鉀‧乙醇溶液滴定。將滴定曲線上之拐彎點作為終點,自氫氧化鉀溶液之直至終點之滴定量算出酸價。 [0104] [光硬化性樹脂組成物之調製] 摻合攪拌下述表1及2中劑載之各成分,使用三輥混練機分散三次。隨後,添加卡必醇乙酸酯作為溶劑以使膏黏度成為250dPa‧s±20Pa‧s,獲得該表記載之各光硬化性樹脂組成物。 [0105] <評價方法> [0106] (黏度) 依據上述[光硬化性樹脂組成物之調製]製作之各光硬化性樹脂組成物使用東機產業公司製錐板型黏度計TVE-33H、錐體轉子形狀3°R9.7,以25℃、錐體轉子旋轉速度5rpm測定黏度。 [0107] (滲出、斷線留白評價用試驗片製作法) 將下述表1及2中記載之光硬化性樹脂組成物,於經磨砂輥研磨後水洗、乾燥之板厚1.6mmt之玻璃環氧樹脂基板上,使用380網眼、100μm/100μm之線與間隔(L/S)之SUS製壓延機版,以乾燥後之膜厚成為5μm之方式進行圖型塗佈,接著以熱風循環式乾燥爐於80℃乾燥30分鐘,製作指觸乾燥性良好之試驗片。 [0108] (滲出) 使用光學顯微鏡觀察以上述方法製作之試驗片,自下述式(1)算出滲出量並評價。 滲出量(μm)=實際圖型寬(μm)-100μm…式(1) [0109] (斷線留白) 目視觀察以上述方法製作之試驗片,評價乾燥塗膜之斷線留白程度。 ○:乾燥塗膜上無斷線留白。 △:乾燥塗膜上具有少許斷線留白。 ×:乾燥塗膜上明顯具有斷線留白。 [0110] (密著性、耐龜裂性評價用試驗片製作法) 將下述表1及2中記載之光硬化性樹脂組成物,於經磨砂輥研磨後水洗、乾燥之板厚1.6mmt之玻璃環氧樹脂基板上,使用380網眼、100μm/100μm之線與間隔(L/S)之SUS製壓延機版,以乾燥後之膜厚成為5μm之方式進行塗佈,接著以熱風循環式乾燥爐於80℃乾燥30分鐘,形成指觸乾燥性良好之塗膜。隨後,使用高壓水銀燈作為光源,以使各光硬化性樹脂組成物上之累積光量成為500mJ/cm2
之方式全面曝光。最後,以150℃×60分鐘硬化,製作耐龜裂性評價用試驗片。 [0111] (密著性) 對於上述方法製作之L/S=100μm/100μm之線與間隔(L/S),進行玻璃膠帶(註冊商標)剝離評價密著性。 ○:線完全無缺損。 △:具有相當少之線缺損。 ×:大幅具有線缺損。 [0112] (耐龜裂性) 進行將上述方法製作之試驗片以圖型為內側、外側之交互彎折並復原之彎曲動作,以光學顯微鏡觀察龜裂之有無並評價。 ◎:彎曲動作重複30次以上亦無龜裂。 ○:彎曲動作重複20次以上且未達30次具有龜裂。 △:彎曲動作重複10次以上且未達20次具有龜裂。 ×:彎曲動作重複未達10次具有龜裂。 [0113] (解像性評價用試驗片製作法) 將下述表1及2中記載之光硬化性樹脂組成物中,摻合含羧基之環氧丙烯酸酯之光硬化性樹脂組成物,於經磨砂輥研磨後水洗、乾燥之板厚1.6mmt之玻璃環氧樹脂基板上,使用380網眼之SUS製壓延機版,以乾燥後之膜厚成為5μm之方式進行全面塗佈,接著以熱風循環式乾燥爐於80℃乾燥30分鐘,製作指觸乾燥性良好之塗膜。隨後,使用高壓水銀燈作為光源,介隔30μm/40μm之線與間隔(L/S)之負型遮罩,以使各光硬化性樹脂組成物上之累積光量成為500mJ/cm2
之方式進行圖型曝光。接著以液溫30℃之Na2
CO3
濃度為0.2質量%之碳酸鈉水溶液進行顯影、水洗。最後,以150℃×60分鐘硬化,製作解像性評價用試驗片。 [0114] (解像性) 針對試驗片之30μm/40μm之線與間隔(L/S)評價解像性。 ○:線完全無缺損。 △:線稍有缺損。 ×:線有大幅缺損。 [0115] 試驗結果彙總示於表1及2。又,關於表1及2中各成分相關之數值未標註單位者表示質量份。 [0116][0117]*1:A-1,具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯,固形分55質量%,表中之搭配量為樹脂溶液之搭配量 *2:A-2,具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯,固形分50質量%,表中之搭配量為樹脂溶液之搭配量 *3:A-3,具有羧基、具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯,固形分51質量%,固形分酸價85 mgKOH/g,表中之搭配量為樹脂溶液之搭配量 *4:A-4,具有羧基、具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯,固形分53質量%,固形分酸價82 mgKOH/g,表中之搭配量為樹脂溶液之搭配量 *5:KAYARAD UXE-3000,日本化藥公司製之含羧基之雙酚A型胺基甲酸酯環氧丙烯酸酯,固形分65質量%,固形分酸價100 mgKOH/g,表中之搭配量為樹脂溶液之搭配量 *6:KAYARAD ZFR-1401H,日本化藥公司製之含羧基之雙酚A型胺基甲酸酯環氧丙烯酸酯,固形分63質量%,固形分酸價100 mgKOH/g,表中之搭配量為樹脂溶液之搭配量 *7:填料,堺化學工業公司製BARIACE B-30,硫酸鋇 *8:填料,龍森公司製FUSELEX WX,氧化矽 *9:填料,昭和電工公司製A-50-K,氧化鋁 *10:填料,石原產業公司製TIPAQUE CR-97,氧化鈦 *11:填料,DOWA電子公司製AG3-8F,銀粉 *12:光聚合起始劑,日本BASF公司製IRGACURE OXE02 *13:光聚合起始劑,日本BASF公司製IRGACURE 907 *14:反應性稀釋劑,新中村化學工業公司製NK OLIGO U-4HA,4官能胺基甲酸酯丙烯酸酯 *15:反應性稀釋劑,日本化學公司製KAYARAD TMPTA,三羥甲基丙烷三丙烯酸酯 *16:反應性稀釋劑,新中村化學公司製NK ESTER A-TMMT,季戊四醇四丙烯酸酯 *17:反應性稀釋劑,日本化學公司製KAYARAD DPHA,二季戊四醇六丙烯酸酯 *18:熱硬化性成分,三菱化學公司製JER828,雙酚A型環氧樹脂 *19:熱硬化性成分,旭化成公司製DURANATE MF-B60B,封端異氰酸酯 *20:分散劑,日本BYK公司製DISPERBYK-191 *21:有機酸,關東化學公司製,2,2’-硫代二乙酸 *22:溶劑,出光興產公司製IPSOL 150,石油系溶劑 [0118] 由上述表中所示之結果,可知本發明之光硬化性樹脂組成物可形成具有無滲出或斷線留白等之優異印刷性且具有優異耐龜裂性之硬化物。
Claims (10)
- 一種圖型印刷用之光硬化性樹脂組成物,其特徵係含有(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯、(B)光聚合起始劑、(C)填料、及溶劑的光硬化性樹脂組成物,前述環氧(甲基)丙烯酸酯係,雙酚AD型環氧樹脂與(甲基)丙烯酸縮水甘油酯之反應物,前述(C)填料的搭配量相對於光硬化性樹脂組成物之全質量而言,為70~95質量%。
- 一種鹼顯影型之光硬化性樹脂組成物,其特徵係含有(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯、(B)光聚合起始劑、(C)填料、及溶劑的光硬化性樹脂組成物,前述環氧(甲基)丙烯酸酯係,雙酚AD型環氧樹脂與(甲基)丙烯酸縮水甘油酯之反應物,與酸酐之反應物之含羧基之雙酚AD型環氧胺基甲酸酯(甲基)丙烯酸酯樹脂,前述(C)填料的搭配量相對於光硬化性樹脂組成物之全質量而言,為70~95質量%。
- 如請求項2之鹼顯影型之光硬化性樹脂組成物,其中,前述(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之酸價在40~250mgKOH/g之範圍內。
- 如請求項1之圖型印刷用之光硬化性樹脂組成物,其中,前述(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之玻璃轉化溫度在-10~60℃之範圍內。
- 如請求項2或3之鹼顯影型之光硬化性樹脂組成物,其中,前述(A)具有胺基甲酸酯鍵結及雙酚AD骨架的環氧(甲基)丙烯酸酯之玻璃轉化溫度在-10~60℃之範圍內。
- 一種鹼顯影型之乾膜,其特徵係具有將請求項2、3、5中任一項之鹼顯影型之光硬化性樹脂組成物塗佈於薄膜、進行乾燥而得到的樹脂層。
- 一種硬化物,其特徵係將請求項1之圖型印刷用之光硬化性樹脂組成物硬化而得到。
- 一種硬化物,其特徵係將請求項2、3、5中任一項之鹼顯影型之光硬化性樹脂組成物硬化而得到。
- 一種硬化物,其特徵係將請求項6之乾膜的樹脂層硬化而得到。
- 一種印刷配線板,其特徵係具有請求項7~9中任一項之硬化物。
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