TWI712700B - Sputtering apparatus - Google Patents

Abstract

A sputtering apparatus of the invention includes a mask changer that is capable of changing a substantially-perpendicularly held mask frame with respect to a substrate on which a film is to be formed by sputtering in a chamber. The mask changer includes: a stock chamber that is capable of collectively stocking a plurality of mask frames in a state where surfaces thereof are parallel to each other and is capable of being hermetically-sealed; and a transporter that transfers the plurality of the stocked mask frames to a mask chamber that is a film formation position in the chamber. The stock chamber includes: a stock support that is movable forward and rearward in a direction substantially orthogonal to a mask surface of the mask frame; a drive support that selects a mask frame from the mask frames stocked by the stock support and causes the mask frame to be able to drive in a surface direction; and a transfer-upper support that is capable of supporting the mask frame so that an upper end of the mask frame is not inclined when the mask frame is transferred by the drive support.

Description

Sputtering device

The present invention relates to a sputtering device, and more particularly to a technology that is preferably used to replace the mask frame in a vertical conveying sputtering device.

For example, in the manufacturing process of organic EL (Electro Luminescence) displays, etc., a film forming device (sputtering device) that performs heating and film forming processes in a vacuum environment is used on a substrate containing glass, etc. .

In a general sputtering device, a cathode for sputtering is set in the chamber, and the object to be processed (substrate) is arranged facing the target material installed on the cathode with a certain interval in the decompressed chamber .

Next, Ar gas (inert gas) or the like is introduced into the chamber, and while the object to be processed is connected to the ground, a negative voltage is applied to the target to discharge it and ionize the Ar gas due to the discharge The discharged Ar ions collide with the target.

Next, by attaching the particles flying out of the target to the object to be processed, a film forming process is performed.

In the previous sputtering, a splash guard arranged around the substrate is sometimes used, but a mask for finely controlling the film forming area on the substrate surface is not used. The alignment of the substrate and the mask is performed by controlling the position of the substrate side with respect to the substantially fixed mask (splash plate) (for example, refer to Japanese Patent No. 5309150).

Recently, in the manufacture of organic EL displays described in Japanese Patent No. 5634522, the types of films previously only available for film formation by vapor deposition have become possible to sputter and form films. Therefore, it is explored to replace the vapor deposition of a device with a complicated and costly device structure and use sputtering for film formation.

In the film formation by vapor deposition, as described in Japanese Patent No. 5074368, a drive system for mask alignment is provided like an end effector to perform alignment.

However, the mask used in sputtering has an opening that controls the film formation area within the substrate surface. When the mask is used, the shape of the mask opening changes due to the attachment of film-forming particles, so the mask must be replaced frequently. As a result, as the number of mask replacements increases, the work time required to replace the mask increases. Furthermore, when the frequency of mask replacement is low, the frequency of mask alignment is also less, but as the number of mask replacement increases, the operation time required for mask alignment increases. Therefore, a request to reduce the operating time is proposed.

In addition, when using a splash guard that functions as a frame surrounding the substrate, the position accuracy between the splash guard and the substrate is about 0.1 mm to several mm. In contrast, the position accuracy between the mask and the substrate for restricting the film formation area on the substrate is approximately several µm to several tens of µm. Therefore, as the position accuracy between the mask and the substrate, an accuracy to the extent that the operator cannot directly perform alignment is required. Therefore, the time required for the alignment operation may be huge.

Therefore, it is desired to automate the alignment between the mask and the substrate and shorten the time required for the alignment operation. In addition, there is a requirement to improve the alignment accuracy between the mask and the substrate.

In addition, in the manufacture of organic EL displays, etc., when the size of the substrate exceeds 2000 mm, the weight of the mask set relative to the substrate is 500 kg to several tons. In particular, like an end effector, when the mask is provided with a driving system for driving the mask alignment, the weight increases and it is difficult for the operator to directly handle the replacement operation. Furthermore, since the mask alignment mechanism including the end effector is a relatively complex and heavy structure, the burden on maintenance operations is relatively large. Therefore, there is a demand to automate such maintenance operations.

Furthermore, there is a requirement to manufacture different types of substrates. In this case, it is necessary to be able to successively replace the masks of different shapes corresponding to substrates of different types. Therefore, there is a need to reduce the cost of manufacturing different types of substrates by shortening the operation time for replacing masks of different shapes, reducing the number of steps required for replacing masks of different shapes.

Furthermore, at the end of the film forming step, when the film forming chamber is exposed to the atmosphere and the mask is replaced, the surface of the mask and the surface on the cathode side are in contact with air. The air contact has an adverse effect on the surface of the mask and the surface on the cathode side. Although this adverse effect is set within the allowable range in the past, recently, as the requirements for film-forming characteristics have become more and more stringent, there has been a demand for mask replacement in a vacuum that maintains the seal.

The present invention has been completed in view of the above-mentioned matters and is intended to achieve the following objects. 1. It can easily realize the replacement of heavy objects, that is, the vertical conveying cover with a simple structure. 2. Automate the replacement of the mask. 3. The mask can be replaced without exposing the film forming chamber (chamber) to the atmosphere. 4. Shorten the time required to replace the mask. 5. When replacing the mask, the mask can be accurately aligned with the substrate.

The sputtering apparatus of the first aspect of the present invention solves the above-mentioned problems by the following, and has: a mask replacement mechanism that can replace a mask that is held substantially perpendicular to a substrate formed by sputtering in a chamber The cover frame; the cover replacement mechanism has: a sealable storage room, which can store a plurality of the cover frames in a state where the surfaces of the cover frames are substantially parallel to each other; and a transport mechanism, which will be selected from One of the plurality of stored mask frames is transported to the mask room as the film forming position in the chamber; the storage room is provided with a storage support part, which can hold the plurality of masks The frame supports a plurality of the mask frames in a state where the surfaces of the mask frame are substantially parallel to each other, and the plurality of mask frames can be moved back and forth in a direction substantially orthogonal to the surface of the mask frame; driving the support portion , Which can drive a mask frame selected from the mask frames stored in the storage support part in a substantially horizontal direction parallel to the surface of the mask frame; and convey the upper support part, which can be driven by When the driving support portion moves the mask frame, it supports the upper end of the mask frame without tilting.

In the sputtering device of the first aspect of the present invention, the storage support part may have: a storage placement part having a plurality of storage grooves that can support a plurality of lower ends of the mask frame; The support part can rise, fall and move back and forth. When ascending, it can abut against the lower ends of the plurality of mask frames placed in the storage groove of the storage placement part to form the plurality of masks. The frame is moved up to support a plurality of the mask frames as a raised position in a state separated from the stock placement part, and a plurality of the mask frames supported as the raised position are connected to the mask frame After the said surface is moved back and forth in a substantially orthogonal direction, it is lowered until it leaves the lower end of the said mask frame, and a plurality of said mask frames are placed in the said storage groove of the said storage place; and The upper supporting part of the material, which can support and release the positions on the upper side of the plurality of said frames stored in the said storage placing part, and can be the same as the lower supporting part of the said material at substantially orthogonal to the said surface of the said mask frame Move back and forth in the direction.

In the sputtering apparatus according to the first aspect of the present invention, the supporting portion under the storage may have: a plurality of supporting grooves extending in a direction substantially parallel to the surface of the storage mask frame and supporting the mask The lower end of the frame; and the storage position replacement drive part, which can move the plurality of the support grooves back and forth in a direction substantially orthogonal to the surface of the mask frame.

In the sputtering apparatus of the first aspect of the present invention, the upper support portion of the stock has: a clamping portion that can rotate about an axis extending in a direction orthogonal to the surface of the mask frame, and can rotate from Both sides of the direction orthogonal to the surface of the mask frame clamp the upper end of the mask frame; and the clamping portion can move back and forth in a direction parallel to the axis.

In addition, in the sputtering device of the first aspect of the present invention, the storage support portion may have: a storage placement portion having a plurality of storage grooves that can support a plurality of lower end positions of the mask frame; The driving support part has: a driving roller having an axis parallel to a direction substantially orthogonal to the surface of the mask frame and can be driven by a rotation driving part; and the driving roller can be rotationally driven by the rotation driving part, Select the mask frame that is in contact with the drive roller among the mask frames placed in the storage groove of the stock placement portion, and drive the mask in a direction parallel to the surface of the mask frame Hood frame.

Furthermore, in the sputtering apparatus according to the first aspect of the present invention, the upper conveying support portion may have an upper magnet portion, and the upper magnet portion may attract each other with the magnet portion provided at the upper end of the mask frame, and have Magnets are arranged in a magnetic circuit formed in a vertical plane that is substantially orthogonal to the direction parallel to the plane of the mask frame.

In addition, in the sputtering apparatus of the first aspect of the present invention, the storage chamber may have a sealing mechanism, and regardless of whether the mask frame is unused or used, the mask frame stored in the storage chamber When replacing the mask frame with the mask frame in the mask chamber that is the film forming position in the chamber, the mask can be transported while the storage chamber is sealed to the outside and communicated with the chamber Frame, and when the shield frame stored in the storage chamber is carried in or out to the outside, the shield can be carried in or out with the chamber sealed and the storage chamber connected to the outside Hood frame.

In addition, in the sputtering apparatus according to the first aspect of the present invention, the storage chamber is connected to a plurality of the chambers in such a way that the stored mask frame can be replaced.

In addition, in the sputtering apparatus according to the first aspect of the present invention, a mask alignment mechanism is provided in the mask chamber serving as the film forming position in the chamber so as to be parallel to the surface of the mask frame The two directions, the three axial directions orthogonal to the above-mentioned surface of the mask frame, and the six degrees of freedom in the three rotational directions around the axis of the above-mentioned three axial directions, the mask frame alignment.

The mask frame of the second aspect of the present invention is capable of being transported between the storage chamber and the mask chamber in the sputtering apparatus, and has a magnet part that is compatible with the above-mentioned supporting part provided on the upper carrying part. The upper magnet parts attract each other, and the magnets are arranged in such a way that they have a magnetic circuit formed in a vertical plane that is substantially orthogonal to a direction parallel to the above-mentioned surface of the above-mentioned mask frame.

The sputtering apparatus according to the first aspect of the present invention has: a replacement mechanism that can replace a mask frame held substantially perpendicular to the substrate formed by sputtering in the chamber; the replacement mechanism has: a hermetically sealed storage A material chamber, which can store a plurality of the above-mentioned mask frames in a state where the surfaces of the above-mentioned mask frames are substantially parallel to each other; and a conveying mechanism, which is selected from one mask frame among the plurality of stored mask frames The mask room is transported to the film forming position in the chamber; and the storage room is provided with: a storage support part which can hold a plurality of the mask frames in a state where the surfaces of the mask frames are substantially parallel to each other It supports a plurality of the mask frames, and can move the mask frames back and forth in a direction substantially orthogonal to the surface of the mask frame; the driving support part can be selected from the above-mentioned stored in the storage supporting part One of the mask frames is driven in a substantially horizontal direction parallel to the surface of the mask frame; and a conveying upper support part that can support the mask when the mask frame is moved by the driving support part The upper end of the frame does not tilt. Thereby, the replacement mechanism places a plurality of mask frames in the storage groove of the storage support part in the storage chamber. The replacement mechanism simultaneously moves the plurality of mask frames back and forth with the storage support part, and selects one of the plurality of mask frames and sets it in a state of contact with the driving support part. In this state, the replacement mechanism drives the lower end of a mask frame with the driving support part, and selects a mask frame in contact with the driving support part from the storage chamber to the mask that becomes the film forming position in the chamber Room transfer. At this time, the replacement mechanism supports the upper end of the mask frame by the conveying upper support part so as not to tilt. Furthermore, the replacement mechanism moves the stock support part back and forth to make the position contacting the drive support part vacant. In this state, the replacement mechanism conveys the mask frame from the mask chamber to the storage chamber by driving the driving support part in the reverse direction. With these actions of the replacement mechanism, the operator does not need to use a crane or the like to directly touch with hands, and the replacement of the mask frame can be automated. At the same time, the replacement of the mask frame between the closed storage chamber and the mask chamber which becomes the film forming position can be automated. By automating the replacement of the mask frame, compared with the case of direct replacement by the operator, in the vacuum chamber, it is possible to extremely reduce the particles generated by the attachments that accompany the film formation. In addition, the space saving of the sputtering device can be achieved.

Furthermore, by automating the replacement of the mask frame as described above, the masks corresponding to different types of substrates can be sequentially replaced. Thereby, the different types of substrates can be successively formed into films. At the same time, it is possible to automate the alignment of the mask and the substrate before the film forming process, which is necessary whenever the mask is replaced. Furthermore, more precise alignment of the mask and the substrate can be easily achieved.

In the sputtering device of the first aspect of the present invention, the storage support part has: a storage placement part having a plurality of storage grooves capable of supporting a plurality of lower ends of the mask frame; Section, which can rise, fall and move back and forth, and when ascends, it can abut the lower ends of the plurality of mask frames placed in the storage groove of the storage placement portion to form the plurality of mask frames Going up, a plurality of the mask frames are supported as a raised position in a state separated from the stock placement portion, and a plurality of the mask frames supported as the raised position are placed between the mask frame and the mask frame. After the above-mentioned surface is moved back and forth in a substantially orthogonal direction, it is lowered until it separates from the lower end of the above-mentioned mask frame, and a plurality of the above-mentioned mask frames are placed in the above-mentioned storage groove of the above-mentioned storage place; and The upper support part, which can support and release a plurality of positions on the upper side of the mask frame stored in the material holding part, and can be similar to the lower support part of the material in the same surface as the mask frame. Move back and forth in the opposite direction. As a result, on the upper surface of the stock placement portion, a plurality of parallel placement grooves are provided in a state of being spaced apart from each other in a direction substantially orthogonal to the mask frame surface. By placing the mask frame in the mounting groove and making it equal to the state where the faces of the plurality of mask frames are parallel to each other and the state where the plurality of mask frames are separated from each other, the storage groove can be placed Used and/or unused plural mask frames are stored in the slot. Furthermore, in this state, it is loaded and supported on the stock placement part, and the upper support part supports the upper position by the stock support part, and the lower support part raises/fronts and backs the multiple stored mask frames Move/lower to move the storage groove of the mask frame in the storage placement part. It is possible to select a mask frame which is placed by the lower support part of the storage material and the upper support part of the storage material and moves in the storage groove and is driven to abut against the driving support part. Thereby, one can be selected from a plurality of stored mask frames and transported by the driving support part to the film forming position of the film forming chamber. At the same time, it can extremely reduce the particles generated by the attachment of the mask frame in the storage room and the film forming room. Furthermore, the particles generated by the driving part for driving the mask frame can be extremely reduced. Thereby, particles can be prevented from re-attaching to the mask frame, etc., and the film-forming characteristics in the film-forming chamber can be prevented from being reduced.

In the splash device according to the first aspect of the present invention, the storage lower support portion has: a plurality of supporting grooves that extend in a direction substantially parallel to the surface of the stored mask frame and support the mask frame The lower end; and the storage position replacement drive part, which can move the plurality of the support grooves forward and backward in a direction substantially orthogonal to the surface of the mask frame. Thereby, the heavy object, that is, the mask frame, can be placed in the support groove while maintaining the parallel state, and the stock position replacement drive unit can move the mask frame in the front and rear direction. The parallel state is that the mask frame faces each other It is stored in the stock placement part in an equidistant manner in the front and rear direction (horizontal direction). In addition, when the mask frame is transported, the support groove can be moved in a direction substantially orthogonal to the mask surface of the mask frame so that only the one mask frame can be driven by the driving support portion.

In the splash device according to the first aspect of the present invention, the upper support portion of the storage material has: a clamping portion that can rotate about an axis extending in a direction orthogonal to the surface of the mask frame, and can rotate from Both sides of the direction orthogonal to the surface of the mask frame clamp the upper end of the mask frame; and the clamping portion can move back and forth in a direction parallel to the axis. Thereby, the clamping part can be rotated to maintain a specific angle around the axis, thereby supporting a plurality of masks placed in the storage groove of the storage holding part or the supporting groove of the supporting part under the storage The upper end of the frame does not tilt. Thereby, the plurality of mask frames can be placed on the storage placement part or the storage support part without interfering with each other. At the same time, when the mask frame is carried in and out by the driving support part, a plurality of mask frames can be moved to the storage position of the supporting part under the storage without interfering with each other.

Furthermore, in the splashing device according to the first aspect of the present invention, the storage support portion has: a storage placement portion having a plurality of storage grooves capable of supporting a plurality of lower end positions of the mask frame; The driving support part has: a driving roller having an axis parallel to a direction substantially orthogonal to the surface of the mask frame, and can be driven by a rotary driving part; and the driving roller can be selected by rotating the driving roller by the rotary driving part The mask frame abutting against the drive roller among the mask frames placed in the stock groove of the stock placement portion and drives the mask in a direction parallel to the surface of the mask frame frame. Thereby, among a plurality of mask frames supported and stored in a state where the surfaces of the plurality of mask frames are parallel, only one mask frame selected by abutting the driving roller is driven by the driving part to abut against it The driving roller at the lower end transports only the mask frame to the storage room.

Furthermore, in the sputtering device of the first aspect of the present invention, the upper conveying support portion may have an upper magnet portion, and the upper magnet portion may attract each other with the magnet portion provided at the upper end of the mask frame, and has Magnets are arranged in the form of a magnetic circuit formed in a vertical plane substantially orthogonal to the direction parallel to the plane of the mask frame. Due to the mutual attraction of the upper magnet part and the magnet part, in the storage chamber, the upper end of the shield frame can be supported by the upper magnet part to maintain a state of preventing tilt. At the same time, in the conveying path between the storage chamber and the film forming chamber, the upper end of the mask frame can be supported by the upper magnet part to maintain the state of preventing tilt.

In addition, in the splash device of the first aspect of the present invention, the storage chamber has a sealing mechanism, and regardless of whether the mask frame is unused or used, the mask frame stored in the storage chamber is combined with When the mask frame in the mask chamber which is the film forming position in the chamber is to be replaced, the mask frame can be transported while the storage chamber is sealed to the outside and communicated with the chamber , And when the mask frame stored in the storage chamber is carried in or out to the outside, the mask can be carried in or out with the chamber sealed and the storage chamber connected to the outside frame. Thereby, under the condition that the sealing mechanism is kept closed to the outside, the mask can be replaced between the storage chamber and the film forming chamber according to the vacuum atmosphere of the film forming atmosphere. At the same time, the unused mask can be moved in and the used mask can be moved out between the storage room and the outside while the film forming chamber is kept closed by the sealing mechanism. Thereby, the mask frame can be replaced without exposing the inner surface of the film forming chamber side of the backing plate to the atmosphere. Therefore, it is possible to prevent the degradation of the film forming characteristics. In addition, it is possible to shorten the time required for the replacement of the mask frame. Furthermore, the operation time and implementation cost of the maintenance of the splash device can be reduced. Moreover, it is possible to reduce manufacturing costs.

In addition, in the splashing device of the first aspect of the present invention, the storage chamber is connected to a plurality of the chambers in such a way that the stored mask frame can be replaced. Thereby, the mask frame can be automatically replaced with a plurality of chambers by one storage chamber. Thereby, compared with the case where the installation number of the film forming chamber (chamber) and the storage chamber is the same, the structure of the apparatus can be simplified. Therefore, space saving can be achieved. In addition, it is possible to reduce the frequency of maintenance for the storage room, etc. At the same time, the manufacturing cost of the splash device can be reduced.

In addition, in the sputtering device according to the first aspect of the present invention, a mask alignment mechanism is provided in the mask chamber as the film forming position in the chamber so as to be parallel to the surface of the mask frame The two directions, the three axial directions orthogonal to the above-mentioned surface of the mask frame, and the six degrees of freedom in the three rotational directions around the axis of the above-mentioned three axial directions, the mask frame alignment. Thereby, the mask frames of the masks corresponding to different types of substrates can be sequentially replaced. Moreover, such film formation can be continuously performed. At the same time, the alignment of the mask and the substrate accompanying the replacement of the mask can be automated, and the film formation can be easily performed with more precise alignment.

In addition, the mask frame can be aligned with the substrate by the mask alignment mechanism. Here, the above-mentioned mask alignment mechanism has: engaging portions arranged at both ends of the lower part of the mask frame; and supporting alignment portions arranged below the two ends of the film forming position of the mask frame to support The above-mentioned mask frame can be engaged with and aligned with the above-mentioned engagement part; and an upper alignment part, which can support the upper part of the mask frame; the above-mentioned alignment mechanism can make the above-mentioned mask frame and Become a horizontal movement of the front, back, left, and right. Furthermore, in this state, the upper part of the mask frame is slightly moved in the front and back direction orthogonal to the above-mentioned surface of the mask frame by the upper alignment portion. Thereby, in two directions parallel to the surface of the mask frame, three axial directions perpendicular to the surface of the mask frame, and three rotation directions around the axis of the three axial directions The six degrees of freedom are aligned with the aforementioned mask frame.

Specifically, the mask aligning mechanism has: engaging portions provided on both ends of the lower surface of the mask frame; and supporting alignment portions provided on the lower portions of both ends of the film forming position of the mask frame And can support the above-mentioned mask frame, and can be engaged with the above-mentioned engaging part and aligned; and the upper alignment part, which can support and release the above-mentioned mask frame, and can be orthogonal to the surface of the above-mentioned mask frame The direction is set to the position above the mask frame.

In the sputtering device according to the first aspect of the present invention, a driving portion aligned in the lateral direction parallel to the surface of the mask frame and the direction orthogonal to the surface of the support alignment portion is provided in the cavity indoor. Thereby, compared with the case where the driving part is located outside the chamber, the distance from the driving part to the shield frame whose position is controlled by the driving part can be shortened. Thereby, the position control of the mask frame can be performed with higher accuracy. At the same time, it is not necessary to displace the mask frame in the direction of gravity when it directly supports the mask frame which sometimes weighs more than 500 kg. Therefore, it is not necessary to use a drive unit that requires high output, but a stepping motor can be used. Therefore, the position control of the mask frame can be performed with higher accuracy than when a high-output servo motor is used. Furthermore, a space-saving stepping motor can be used, and the stepping motor can be sealed by a cover in the chamber. Therefore, it is possible to prevent the generation of dust and the like related to driving, to improve the film forming characteristics, to improve the yield, and to reduce the manufacturing cost.

In the sputtering device of the first aspect of the present invention, the drive portion for aligning the support alignment portion in the vertical direction and the upper alignment portion are in a direction orthogonal to the surface of the mask frame The driving part for alignment is provided outside the chamber. Thereby, when supporting the mask frame that sometimes weighs more than 500 kg and directly driving the mask frame, a high-output drive unit can be used without worrying about the space in the chamber. In addition, the dust generated from the driving part falls downward due to gravity, but due to the position on the upper side of the mask frame that affects the film forming characteristics, the driving part is located outside the chamber without generating the dust, which can prevent It adversely affects film-forming properties.

In addition, in the splash device of the first aspect of the present invention, the engaging portion has: an engaging concave portion disposed at one end of the lower surface of the mask frame and engaging with the convex portion of the supporting alignment portion; and The engaging groove portion is arranged on the other end of the lower surface of the mask frame and is engaged with the convex portion of the supporting alignment portion; and the engaging groove portion is provided along the lower end of the mask frame. Thereby, the engaging recess is engaged with the convex part of the supporting alignment part on one end side of the lower surface of the mask frame, and at the same time, the engaging groove part is engaged with the supporting pair on the other end side of the lower surface of the mask frame The protruding part of the quasi-part can be used to set the approximate position of the film forming position of the mask frame in one action. In addition, there is a little degree of freedom by engaging the groove portion, so even if the mask frame is slightly offset from the supporting alignment portion, alignment can be performed corresponding to the length of the engaging groove portion. In addition, the mask frame can be supported in a finely adjustable manner by engaging the engaging concave portion and the engaging groove portion with the supporting alignment portion.

Furthermore, in the film forming apparatus of the first aspect of the present invention, the upper alignment portion has: a clamping portion that can rotate about an axis extending in a direction orthogonal to the surface of the mask frame, and can rotate from The upper end of the mask frame is clamped on both sides in a direction orthogonal to the surface of the mask frame; the clamping portion is movable along the axial direction. Thereby, after the upper limit of the mask frame is released, the clamping part can be rotated about the axis to limit the support of the mask frame. Furthermore, by moving the clamping portion along the axis, the position of the mask frame is controlled in a direction orthogonal to the surface of the mask frame, thereby allowing six degrees of freedom in three axial directions and three rotational directions Align the above mask frame.

The mask frame of the second aspect of the present invention is capable of being transported between the storage chamber and the mask chamber in the sputtering apparatus, and has a magnet part that is compatible with the above-mentioned supporting part provided on the upper carrying part. The upper magnet parts attract each other, and the magnets are arranged in such a way that they have a magnetic circuit formed in a vertical plane that is substantially orthogonal to a direction parallel to the above-mentioned surface of the above-mentioned mask frame. Thereby, it is possible to support the upper end of the mask frame in the conveying path between the storage chamber and the film forming chamber, and the conveying path from the inside of the film forming chamber to the aligned position, while maintaining the protection against it. The state of tilt. In addition, it is possible to support the upper end of the mask frame and maintain the state of preventing it from tilting before or after the splashing process when replacing the mask.

The mask frame of the second aspect of the present invention is a mask frame for a mask that is held substantially vertically by a mask alignment mechanism for a substrate formed by sputtering in a chamber of a sputtering device. The alignment mechanism has: a support alignment portion, which is provided under the two ends of the film forming position of the mask frame in the sputtering device and can support the mask frame; and can be engaged with the support alignment portion The aligned engagement parts are arranged at both ends of the lower surface of the mask frame. Thereby, in the sputtering device having the space-saving support alignment portion and the dust-free upper alignment portion, a mask frame that is easy to align and has excellent film forming characteristics can be provided at low cost.

In addition, in the mask frame of the second aspect of the present invention, the engaging portion has: an engaging concave portion disposed at one end of the lower surface of the mask frame and engaging with the convex portion of the supporting alignment portion; And an engaging groove part, which is arranged at the other end of the lower surface of the mask frame and engaged with the convex part of the supporting alignment part; and the engaging groove part is arranged along the lower end of the mask frame. Thereby, at one end side (first end) of the lower surface of the mask frame, the engaging recess is engaged with the convex part supporting the alignment part, and at the same time, on the other end side (located with the first end) of the lower surface of the mask frame The second end on the opposite side of the end), the engaging groove part is engaged with the convex part of the supporting alignment part, so that the approximate position of the film forming position of the mask frame can be set in one operation. Furthermore, there is a little degree of freedom by engaging the groove portion, so even if the mask frame is slightly offset from the supporting alignment portion, the alignment can be performed corresponding to the length of the engaging groove portion. In addition, the mask frame can be supported in a finely adjustable manner by engaging the engaging concave portion and the engaging groove portion with the supporting alignment portion.

[Effects of Invention]

According to the aspect of the present invention, the following effects can be obtained: the mask frame of the vertical conveyance can be replaced by a simple structure with a small number of steps, and the alignment accuracy of the mask frame replacement can be improved, and The replacement of the mask frame can be automated, and the mask frame can be replaced without exposing the film forming chamber to the atmosphere, which can shorten the time required to replace the mask frame

Hereinafter, the first embodiment of the sputtering apparatus of the present invention will be described based on the drawings. In addition, the present embodiment is specifically described in order to better understand the gist of the invention, and unless otherwise specified, it does not limit the present inventors.

FIG. 1 is a schematic plan view showing the sputtering apparatus of this embodiment. In Figure 1, the symbol 1 is a sputtering device.

The sputtering device 1 of the present embodiment is a continuous or in-line vacuum processing device, which is used to form a TFT (Thin Film Transistor) on a processed substrate (substrate) S containing glass, etc., during the manufacturing process of a liquid crystal display: In the case of thin film transistors), the substrate S to be processed containing glass or resin is subjected to heating treatment, film formation treatment, etching treatment, etc. in a vacuum environment.

As shown in Fig. 1, the sputtering apparatus 1 of this embodiment is provided with: a loading/unloading chamber (chamber) 2, which is carried in/out of a substantially rectangular glass substrate (substrate to be processed) S; and a pressure-resistant film forming chamber ( Chamber) 4, which forms a transparent conductive film such as ZnO or In ₂ O ₃ on the glass substrate S by sputtering; the transfer chamber (chamber) 3 is located in the film forming chamber 4 and the loading/ Between the unloading room 2; and the storage room 50, which is used to store the mask frame F to be replaced. The sputtering apparatus 1 of this embodiment is shown as a side sputtering type in the figure.

The sputtering apparatus 1 is provided with a mask replacement mechanism 100 capable of replacing a mask frame F held substantially vertically. As the mask replacement mechanism 100, there is a transfer mechanism 60 for a storage chamber 50 and a mask chamber 43 that transfers the mask frame F to the film forming position in the chamber.

In addition, the sputtering apparatus 1 is provided with a film forming chamber 4B that is substantially equivalent to the film forming chamber 4. The film formation chamber 4B is connected to the transfer chamber 3 in the same manner as the film formation chamber 4 and is configured symmetrically with respect to the storage chamber 50.

In addition, the sputtering apparatus 1 connects the plurality of loading/unloading chambers (chambers) 2, film formation chambers (chambers) 4, and film formation chambers (chambers) 4B to the transfer chamber 3, respectively. Such chambers 2, 4, and 4B are configured as a loading/unloading chamber (chamber 2) and a plurality of processing chambers (chambers) 4, 4B formed adjacent to the transfer chamber 3 so as to mutually perform the film forming step.

Furthermore, it is also possible to connect a loading/unloading room equivalent to the loading/unloading room (chamber) 2 to the transfer room 3. In this case, for example, one loading/unloading chamber 2 is set as a loading chamber in which the glass substrate S is carried into the vacuum processing device (sputtering device) 1 from the outside, and the other loading/unloading chamber is set as the self-vacuum processing device 1 The glass substrate S is carried out to the outside unloading room. In addition, the film formation chamber 4 and the film formation chamber 4B may perform different film formation steps.

It is only necessary to form a shutoff valve between each of such chambers 2 and the transfer chamber 3, between the transfer chamber 3 and the chamber 4, and between the transfer chamber 3 and the chamber 4B.

In addition, between the chamber 4 and the storage chamber 50, and between the chamber 4B and the storage chamber 50, shutoff valves 58a and 58a serving as a sealing mechanism 58 are formed, respectively.

The loading/unloading chamber 2 can be provided with a positioning member capable of setting and aligning the mounting position of the glass substrate S carried in from the outside.

In addition, the loading/unloading chamber 2 may be equipped with a rough exhausting mechanism such as a rotary pump for roughing the chamber.

Inside the transfer chamber 3, as shown in FIG. 1, a transfer device (transfer robot) 3a is arranged.

The conveying device 3a has a rotating shaft, a robot arm attached to the rotating shaft, a robot hand formed at one end of the robot arm, and a vertical movement device. The robot arm is composed of first and second active arms that can be bent to each other, and first and second driven arms. The conveying device 3a can move the glass substrate S which is the object to be conveyed between the chambers 2, 3, 4, and 4B. In addition, as the conveying device 3a, an additional moving mechanism that moves the robot arm to a position in the horizontal direction or moves the glass substrate S in the horizontal direction may be provided.

As shown in Fig. 1, as a mechanism for supplying film-forming materials, the film-forming chamber 4 is provided with a target 7 which is erected inside the film-forming chamber 4; a backing plate (cathode electrode) 6 which holds the target 7; , Which applies a negative potential sputtering voltage to the backing plate 6; a gas introduction mechanism 8, which introduces the gas into the film forming chamber 4; and a turbomolecular pump and other high vacuum exhaust mechanism 9, which will form the film The inside of the chamber 4 is evacuated to a high vacuum. Inside the film forming chamber 4, for example, the target 6 is erected at a position farthest from the transfer chamber 3.

On the backing plate 6, a target 7 is fixed on the front surface side facing the ground surface substantially parallel to the glass substrate S. The backing plate (cathode electrode) 6 functions as an electrode for applying a sputtering voltage of negative potential to the target 7. The backing board 6 is connected to a power supply that applies a negative potential sputtering voltage.

On the back side of the cathode electrode 6, a magnetron magnetic circuit for forming a specific magnetic field on the target 7 is provided. In addition, the magnetron magnetic circuit is attached to the rocking mechanism and is configured to be rockable by a drive device for magnetic circuit rocking.

As shown in FIG. 1, the film formation chamber 4 is provided with: a sputtering space 41 which becomes the film formation front side of the glass substrate S during film formation; a back side space 42 which becomes the back surface side of the glass substrate S during film formation; And the mask room 43, which is located between the sputtering spaces 41 and the back space 42. A backing plate (cathode electrode) 6 to which a target 7 is fixed is arranged in the sputtering space 41.

As shown in FIG. 1, the mask chamber 43 is connected to the storage chamber 50 via a shutoff valve 58 a that becomes a sealing mechanism 58.

Inside the back space 42, a substrate holding mechanism 48 that holds the glass substrate S so as to face the target 7 during film formation is provided.

The mask aligning mechanism 10 is provided in the mask chamber 43 as described later.

The mask room 43 and the storage room 50 are provided with a mask frame F for holding the mask. In the mask room 43 and the storage room 50, as described later, a conveying mechanism 60 for conveying the mask frame F is provided between them.

Figure 2 is a perspective view showing the mask frame of this embodiment.

As shown in FIG. 2, the mask frame F has a structure in which a mask for restricting a film formation area not shown in the figure is opened on the inner side of a substantially rectangular frame Fa. The mask is a thin metal body and is set in a state of being stretched relative to the frame Fa.

The mask frame F is configured to be vertically arranged and transported. That is, the mask frame F includes: a substantially rectangular frame (frame) Fa, which is made of a non-magnetic body such as aluminum, and an upper frame support F6, which is provided to extend along the upper side of the frame (frame) Fa; And the slider F5, which is set as a round rod, extends along the lower side of the frame (frame) Fa.

In Fig. 2, the surface of the mask frame F is set to be substantially parallel to the YZ plane, at both ends of the lower end of the frame (frame) Fa of the mask frame F, that is, the lower side of the Z direction and the Y direction As described later, the two ends are respectively provided with an engaging portion F1 and an engaging portion F2.

Fig. 3 is a perspective view showing the storage chamber of the sputtering device of this embodiment. Fig. 4 is a schematic side view showing the stock support part, the drive support part, and the sealing mechanism of the stock chamber of this embodiment.

As shown in FIGS. 3 and 4, the storage chamber 50 has a substantially rectangular cross-sectional shape. Although not shown, the storage chamber 50 is provided with a high-vacuum exhaust mechanism such as a turbomolecular pump, which evacuates the inside of the storage chamber 50 to a high vacuum in the same way as the film forming chamber 4; and a gas introduction mechanism , Which introduces the gas into the storage chamber 50.

As shown in Figures 3 and 4, the storage chamber 50 is provided with storage support parts 51A, 51, 52A, 52, 53, 54 that can move back and forth, which can make the surfaces of the mask frame F parallel to each other In this state, a plurality of mask frames F are supported, and the plurality of mask frames F can be moved back and forth in a direction substantially orthogonal to the surface of the mask frame F (X direction).

As shown in Figures 3 and 4, the storage chamber 50 is provided with a drive support portion 55, which can be selected from the mask frame F stored in the storage support portion 51A, 51, 52A, 52, 53, 54 A mask frame F is driven in a direction parallel to the surface of the mask frame F (Y direction).

In addition, as shown in FIGS. 3 and 4, the storage chamber 50 is provided with a conveying upper support portion 56 which can support the upper end of the mask frame F when the mask frame F is moved in the X direction, Y direction, or Z direction The mask frame F is not inclined. Furthermore, as shown in FIGS. 3 and 4, the storage chamber 50 is provided with a sealing mechanism 58 that can seal the storage chamber 50.

As shown in Figures 3 and 4, the stock support parts 51A, 51, 52A, 52, 53, 54 have: a stock placement part 51A, a stock placement part 52A, a stock support part 51, 52, and Supporting parts 53, 54 on the stock.

The stock placement portion 51A has a plurality of storage grooves (placement grooves) 51Aa capable of supporting the lower end of the plurality of mask frames F in the storage chamber 50, and a driving groove 51Ab.

The stock placement part 52A, like the stock placement part 51A, has a plurality of storage grooves (placement grooves) 52Aa capable of supporting the lower end of the plurality of mask frames F, and a driving groove 52Ab.

The supporting parts 51 and 52 under the storage material can rise, fall and move back and forth. When the stock support parts 51 and 52 rise in the Z direction, they abut the lower ends of the plurality of mask frames F placed in the stock grooves 51Aa and 52Aa of the stock placement parts 51A and 52A, and these A plurality of mask frames F are pushed up, and the mask frame F can be supported in a state of being separated from the stock placement parts 51A, 52A, that is, at an elevated position. The lower support portions 51 and 52 can move back and forth so that the plurality of mask frames F located in the rising position move back and forth in a direction (X direction) substantially orthogonal to the surface of the mask frame F. Furthermore, the lower support parts 51 and 52 can move the mask frame F back and forth in the X direction and then lower it in the Z direction, and place the mask frame F on the stock holding parts 51A and 52A. The grooves 51Aa and 52Aa release the support of the mask frame F.

The upper support parts 53, 54 of the storage material can be supported and stored in the storage placing parts 51A, 52A or supported on the positions above the plurality of mask frames F of the lower support parts 51, 52, and can be stored together The material support parts 51 and 52 move back and forth (movement back and forth) in the same direction (X direction) synchronously.

In addition, in FIG. 4, there is a structure in which the drawings are omitted in the supporting parts 51 and 52 under the stock.

As shown in Figures 3 and 4, the storage placement portions 51A, 52A are spaced in the X direction and are arranged at the bottom 50a of the storage chamber 50 so that the mask frames F stored in the storage chamber 50 can be respectively pressed against Connected and placed on the lower end surface of the two ends.

The mounting groove 51Aa extends in the Y direction (horizontal direction) substantially parallel to the surface of the mask frame F so as to support the lower end of the mask frame F to be placed. In addition, a plurality of placement grooves 51Aa are provided at the top position of the block-shaped stock placement portion 51A so as to be spaced apart in the X direction. The mounting grooves 51Aa have uniform intervals in the X direction. The mounting grooves 51Aa have substantially the same depth dimension, and are arranged in substantially the same height direction (Z direction).

The drive groove 51Ab is provided in the plurality of placement grooves 51Aa, and becomes the top of the stock placement portion 51A at a position corresponding to the drive roller 55a described later in the X direction. That is, the drive groove 51Ab is arranged so as to coincide with the straight line in the Y direction connecting the drive rollers 55a and 55a described later.

The driving groove 51Ab has a shape that expands the mounting groove 51Aa. Here, the driving groove 51Ab is a shape expanded by the mounting groove 51Aa means that the depth dimension and width dimension of the driving groove 51Ab are set larger than the depth dimension and width dimension of the mounting groove 51Aa. At the same time, the driving groove 51Ab has a shape that expands the mounting groove 51Aa, which means that the driving groove 51Ab has a shape that can make the driven mask frame F different when the mask frame F is driven by the driving roller 55a described later. It is conveyed interfering with the stock placement part 51A.

The mask frame F is placed on the drive roller 55a described later on the path corresponding to the position of the drive groove 51Ab in the X direction.

As shown in FIG. 3 and FIG. 4, the lower storage support portions 51 and 52 are arranged at the bottom 50 a of the storage chamber 50. The lower storage support portion 51 and the lower storage support portion 52 are placed on both ends of the lower end of the mask frame F of the storage placement portions 51A, 52A so as to abut against the storage placement portion 51A, The position of the abutting position of 52A is arranged at an interval slightly narrower than the interval between the stock placement portion 51A and the stock placement portion 52A in the X direction.

As shown in FIG. 3 and FIG. 4, the lower support portion 51 for the storage is provided at the bottom 50 a of the storage chamber 50. The lower support portion 51 has a plurality of concave support grooves 51a, 51a extending in the Y direction substantially parallel to the surface of the mask frame F and spaced in the X direction. The lower support portion 51 for the stock can abut the lower end of the mask frame F with a plurality of support grooves 51a and 51a to support the mask frame F. The plurality of supporting grooves 51a, 51a are arranged at the top position of the groove supporting base 51b in a manner capable of moving integrally with the plurality of mask frames F.

The support grooves 51a and 51a have equal intervals in the X direction similarly to the mounting groove 51Aa. In addition, the supporting grooves 51a and 51a have substantially the same depth dimension. In addition, in each of the supporting grooves 51a, 51a, the bottom position is set at substantially the same position in the height direction (Z direction).

When the groove support base 51b moves up and down in the Z direction, the support grooves 51a, 51a can move from a position higher than the height position of the mounting groove 51Aa to a position lower than the height position of the mounting groove 51Aa.

Thereby, when the groove supporting base 51b rises in the Z direction, the supporting grooves 51a, 51a abut against the lower ends of the plurality of mask frames F placed in the storage groove 51Aa of the storage placing portion 51A, and The groove support base 51b further rises in the Z direction, so that the storage groove 51Aa can be supported away from the lower end of the plurality of mask frames F. Furthermore, in a state where the groove supporting base 51b is raised, so that the mask frame F does not abut against the stock placement portion 51A, the plurality of mask frames F can be aligned with the mask frame F It moves back and forth in a substantially orthogonal direction (X direction). In addition, when the groove supporting base 51b descends in the Z direction, the supporting grooves 51a and 51a move away from the lower end of the plurality of mask frames F, and the plurality of mask frames F can be placed in the storage groove 51Aa.

The supporting groove 51a of the lower supporting portion 51 may be configured to be smaller than the supporting groove 51Aa of the stock placing portion 51A. In this embodiment, instead of providing four mounting grooves 51Aa, three supporting grooves 51a can be provided.

The groove supporting base 51b has a dimension in the X direction that is larger than the arrangement dimension of the supporting grooves 51a and 51a in the X direction. The groove support base 51b is mounted on the X-direction restricting portion 51c extending in the X-direction so as to be able to move back and forth in the X-direction. The groove supporting base 51b restricts the movement direction to the X direction by the X direction restricting portion 51c.

The groove support base 51b is connected to an X drive shaft 51b1 extending in the X direction. The X drive shaft 51b1 is connected to the X drive motor 51b2 fixed to the X direction restricting portion 51c.

The X-direction restricting portion 51c has an X-direction dimension larger than the dimension of the groove supporting base 51b in the X-direction. The X-direction restricting portion 51c is provided near the bottom 50a of the storage chamber 50 so as to extend in the X direction.

The X-direction restricting portion 51c is connected to a Z drive shaft 51d that is installed substantially vertically. The Z drive shaft 51d is a ball screw or the like. The Z drive shaft 51d can pass through the bottom 50a of the storage chamber 50 hermetically. The Z drive shaft 51d is connected to a Z drive motor 51e arranged outside the chamber 50.

The X-direction restricting portion 51c is attached to the Z-direction restricting portion 51f erected on the bottom 50a of the storage chamber 50. The movement of the X direction restricting portion 51c is restricted in the Z direction by the Z direction restricting portion 51f.

The groove support base 51b, the X drive shaft 51b1, the X drive motor 51b2, the X direction restricting portion 51c, the Z drive shaft 51d, the Z drive motor 51e, and the Z direction restricting portion 51f constitute a stock position replacement drive portion. The storage position replacement drive unit can make the plurality of support grooves 51a, 51a reciprocate in the X direction and/or Z direction while maintaining the distance between the plurality of support grooves 51a, 51a in the X direction.

In the stock position replacement drive units 51b to 51f, the X drive shaft 51b1 is driven by the X drive motor 51b2, and the movement direction is restricted by the X direction restricting portion 51c, so that the groove support base 51b reciprocates in the X direction. In addition, in the stock position replacement drive units 51b to 51f, the Z drive shaft 51d is driven by the Z drive motor 51e, and the movement direction is restricted by the Z direction restriction portion 51f, and the X direction restriction portion 51c is reciprocated in the Z direction .

At the same time, in the storage placing portion 51A of the storage mask frame F, for example, five placing grooves 51Aa are provided, which can support five mask frames F at the same time. In the groove support base 51b for moving and replacing the storage position of the mask frame F, for example, three supporting grooves 51a are provided, and three mask frames F can be moved simultaneously.

As shown in FIG. 3, the stock placement part 51A and the stock placement part 52A are configured to differ only in the arrangement position in the Y direction, and the others are substantially the same. The stock placement portion 52A is arranged to be separated from the stock placement portion 51A by a distance corresponding to the dimension of the mask frame F in the Y direction. The stock placement portion 52A is provided in an arrangement in which the positions in the X direction and the Z direction are substantially the same as those of the stock placement portion 51A.

The mounting groove 52Aa extends in the Y direction (horizontal direction) substantially parallel to the surface of the mask frame F so as to support the lower end of the mask frame F to be placed. In addition, a plurality of placement grooves 52Aa are provided at the top position of the block-shaped stock placement portion 52A so as to be spaced apart in the X direction. The mounting grooves 52Aa and the mounting grooves 51Aa also have an equal interval in the X direction. The mounting grooves 52Aa have substantially the same depth dimension, and are arranged at substantially the same height direction (Z direction) position. Thereby, a plurality of mask frames F to be placed can be set in a substantially parallel state.

Among the plurality of mounting grooves 52Aa, the driving groove 52Ab is provided at the top position of the stock mounting portion 52A at a position corresponding to the driving roller 55a described later in the X direction. The driving groove 52Ab has a shape that expands the mounting groove 52Aa. Here, that the driving groove 52Ab has a shape that expands the mounting groove 52Aa means that in the driving groove 52Ab, the depth dimension and the width dimension are set larger than the mounting groove 52Aa. At the same time, the driving groove 52Ab has a shape that expands the mounting groove 52Aa, which means that the driving groove 52Ab is shaped so that the mask frame F can be driven when the mask frame F is driven by the driving roller 55a described later. The shape is conveyed without interfering with the stock placement part 52A.

On the passage corresponding to the position of the driving groove 52Ab in the X direction, the mask frame F is placed on the driving roller 55a described later.

As shown in FIG. 3, the lower support portion 52 and the lower support portion 51 are configured to differ only in the arrangement position in the Y direction, and the rest are substantially the same. The lower support portion 52 is arranged to be separated from the lower support portion 51 in the Y direction by a distance corresponding to the size of the mask frame F in the Y direction. The lower stock support portion 52 is arranged in a configuration in which the positions in the X direction and the Z direction are substantially the same as the lower stock support portion 51.

As shown in FIG. 3 and FIG. 4, the lower support portion 52 for the storage is provided at the bottom 50 a of the storage chamber 50. The lower supporting portion 52 has a plurality of concave supporting grooves 52a, 52a extending in the Y direction substantially parallel to the surface of the mask frame F and separated in the X direction. The lower support part 52 can support the shield frame F by abutting a plurality of support grooves 52 a and 52 a against the lower end of the mask frame F. The plurality of supporting grooves 52a, 52a are arranged at the top position of the groove supporting base 52b in such a manner that they can move integrally with the plurality of mask frames F.

The support grooves 52a and 52a have equal intervals in the X direction similarly to the support groove 51a. In addition, the supporting grooves 52a and 52a have substantially the same depth dimension. In addition, in each of the supporting grooves 52a, 52a, the bottom positions of the supporting grooves 52a and 52a are set to positions in the substantially same height direction (Z direction).

When the groove support base 52b moves up and down in the Z direction, the support grooves 52a, 52a can move from a position higher than the height position of the mounting groove 52Aa to a position lower than the height position of the mounting groove 52Aa.

Thereby, when the groove supporting base 52b rises in the Z direction, the supporting grooves 52a, 52a abut against the lower ends of the plurality of mask frames F placed in the stock groove 52Aa of the stock placing portion 52A, and The groove support base 52b then rises in the Z direction, so that the storage groove 52Aa can be supported away from the lower end of the plurality of mask frames F. Furthermore, in the state where the groove support base 52b is raised, the plurality of mask frames F can be moved back and forth in a direction substantially orthogonal to the surface of the mask frame F (X direction), so that the mask frame F does not It is in contact with the stock placement part 52A. Moreover, when the groove supporting base 52b descends in the Z direction, the supporting grooves 52a and 52a are away from the lower end of the plurality of mask frames F, and the plurality of mask frames F can be placed in the storage groove 52Aa.

The supporting groove 52a of the lower supporting portion 52 may be configured to be smaller than the placing groove 52Aa of the storing placing portion 52A. In this embodiment, in the same way as the lower storage support portion 51 and the storage placement portion 51A, it is possible to provide three support grooves 52a instead of four placement grooves 52Aa.

The groove supporting base 52b has a dimension in the X direction which is larger than the arrangement dimension of the supporting grooves 52a and 52a in the X direction. The groove support base 52b is mounted on the X-direction restricting portion 52c extending in the X direction so as to be able to move back and forth in the X direction. The moving direction of the groove support base 52b is restricted in the X direction by the X direction restricting portion 52c.

The groove support base 52b is connected to an X drive shaft 52b1 extending in the X direction. The X drive shaft 52b1 is connected to the X drive motor 52b2 fixed to the X direction restricting portion 52c.

The X-direction restricting portion 52c has a size in the X direction that is larger than the size of the groove support base 52b in the X direction. The X-direction restriction portion 52c is provided near the bottom 50a of the storage chamber 50 so as to extend in the X direction.

The X-direction restricting portion 52c is connected to a Z drive shaft 52d that is substantially vertically arranged. The Z drive shaft 52d is a ball screw or the like. The Z drive shaft 52d can pass through the bottom 50a of the storage chamber 50 hermetically. The Z drive shaft 52d is connected to a Z drive motor 52e arranged outside the chamber 50.

The X-direction restricting portion 52c is attached to the Z-direction restricting portion 52f erected on the bottom 50a of the storage chamber 50. The movement of the X direction restricting portion 52c is restricted in the Z direction by the Z direction restricting portion 52f.

The groove support base 52b, the X drive shaft 52b1, the X drive motor 52b2, the X direction restriction portion 52c, the Z drive shaft 52d, the Z drive motor 52e, and the Z direction restriction portion 52f constitute a stock position replacement drive portion. The storage position replacement drive unit can make the plurality of support grooves 52a, 52a reciprocate in the X direction and/or Z direction while maintaining the interval of the plurality of support grooves 52a, 52a in the X direction.

In the stock position replacement drive portions 52b to 52f, the X drive shaft 52b1 is driven by the X drive motor 52b2, and the movement direction is restricted by the X direction restriction portion 52c, so that the groove support base 52b reciprocates in the X direction. In addition, in the stock position replacement drive units 52b to 52f, the X-direction restricting portion 52c is reciprocated in the Z direction in a state where the Z drive shaft 52d is driven by the Z drive motor 52e and the movement direction is restricted by the Z direction restricting portion 52f .

At the same time, the storage holding portion 52A of the storage mask frame F is provided with, for example, five placing grooves 52Aa, which can support five mask frames F at the same time. In the groove support base 52b for moving and replacing the storage position of the mask frame F, for example, three supporting grooves 52a are provided, and the three mask frames F can be moved simultaneously.

In the lower stock support parts 51 and 52, the stock position replacement driving parts 51b to 51f and the stock position replacement driving parts 52b to 52f can be driven synchronously. Thereby, the support grooves 51a, 51a and the support grooves 52a, 52a can be driven in the Z direction and the X direction synchronously.

In addition, the X drive motor 51b2 and the X drive motor 52b2, the Z drive motor 51e, and the Z drive motor 52e, etc., which are synchronously driven in the storage support portions 51 and 52, may also be configured to be driven by one motor.

In the supporting parts 51 and 52 under the storage material, the supporting grooves 51a and the supporting grooves 52a located at corresponding positions in the X direction can be used to support the vicinity of both ends of a mask frame F in the Y direction. In addition, in the supporting parts 51 and 52 under the stock, the supporting groove 51a and the supporting groove 52a located at corresponding positions in the X direction can be moved around the two ends of the mask frame F in the Y direction. That is, by driving the storage position to replace the driving parts 51b to 52f, the mask frame F can be placed on the supporting groove 51a of the groove supporting base 51b and the supporting groove 52a of the groove supporting base 52b, and the storage The placement portion 51A and the stock placement portion 52A move in the X direction to change the placement position.

Here, the supporting groove 51a and the supporting groove 52a are located at corresponding positions in the X direction means that the supporting groove 51a and the supporting groove 52a are located on the same straight line extending in the Y direction.

In addition, in the lower stock support portions 51 and 52, the drive groove 51Ab and the drive groove 52Ab are provided at corresponding positions in the X direction.

Similarly, that the driving groove 51Ab and the driving groove 52Ab are located at corresponding positions in the X direction means that the driving groove 51Ab and the driving groove 52Ab are located on the same straight line extending in the Y direction.

Specifically, as shown in FIGS. 3 and 4, the support groove 51a shown on the far right in the lower support part 51 and the support groove 52a shown on the far right in the lower support part 52 Set the positions corresponding to each other in the X direction. Hereinafter, except for the drive groove 51Ab and the drive groove 52Ab, similarly, the lower support part 51 is shown in the nth support groove 51a from the right, and the lower support part 52 is shown The n-th support groove 52a from the right is set to correspond to each other in the X direction. Here, n is a natural number.

Similarly, in the storage placement portion 51A and the storage placement portion 52A, the placement groove 51Aa and the placement groove 52Aa located at corresponding positions in the X direction can support the Y direction of a mask frame F Near the ends of the upper.

The supporting grooves 51a are all arranged to be less than the preset number of stocks, that is, the total number of the placing grooves 51Aa (including the driving grooves 51Ab) and the extraction support grooves 58ga of the extraction support part 58g described later .

Similarly, the support grooves 52a are all arranged to be less than the preset number of stocks, that is, the total number of the placement grooves 52Aa (including the drive groove 52Ab) and the extraction support groove 58ga of the extraction support part 58g described later The number of articles.

In the lower support portion 51 and the lower support portion 52, a mask frame F is supported by the corresponding support groove 51a and the support groove 52a, respectively. The one mask frame F can move in the X direction while being supported by the supporting groove 51a and the supporting groove 52a.

As shown in Figures 3 and 4, the upper storage support portion 53 and the upper storage support portion 54 can support and release the upper side of a plurality of mask frames F stored in the lower storage support portion 51 and the lower storage support portion 52 . In addition, the upper stock support part 53 and the upper stock support part 54 can move back and forth in the X direction in synchronization with the X-direction movement of the lower stock support parts 51 and 52.

In addition, in FIG. 4, there is a configuration in which the illustration of the upper stock support portion 53 and the upper stock support portion 54 is omitted.

The stock upper support part 53 has a plurality of clamping parts 53a. The plurality of clamping portions 53a clamp and support the vicinity of the upper end of the mask frame F. In particular, the plurality of clamping portions 53a are positioned at both ends in the left-right direction (Y direction) at the upper end of the mask frame F, and clamp and support the corner portions located thereon.

In addition, the upper stock support part 53 has an X rotation drive part 53rx. The X rotation driving portion 53rx drives the clamping portion 53a in a substantially horizontal direction (X direction) perpendicular to the mask surface (ZY plane). The X rotation driving portion 53rx can drive the clamping portion 53a to adjust its position in the X direction. In addition, the X rotation driving portion 53rx rotates the clamping portion 53a in the YZ plane substantially parallel to the mask surface. The X rotation driving portion 53rx can engage and release the mask frame F by using the clamping portion 53a.

As shown in Figs. 3 and 4, the upper stock support 53 has a rotating shaft 53c extending in the X direction. A clamping portion 53a is provided at the front end of the rotating shaft 53c. The clamping portion 53a has a plurality of clamping pieces 53b and 53b. A plurality of clamping pieces 53b and 53b are at the upper end of the stored mask frame F, and abut each of the front and back sides of the mask frame F.

The plurality of clamping pieces 53b and 53b are spaced apart in the axial direction of the rotating shaft 53c. The distance between the clamping pieces 53b and 53b in the axial direction of the rotating shaft 53c is set to be approximately the same as the thickness of the mask frame F, or slightly larger. The plurality of clamping pieces 53b and 53b are all fixed in a state of being parallel to each other in the YZ direction which becomes the radial direction of the rotating shaft 53c.

Moreover, the X rotation drive part 53rx is connected to the base end side of the rotating shaft 53c. The rotation shaft 53c extends in the X direction. The base end side of the rotating shaft 53c is arranged so as to extend to the outside of the storage chamber 50.

The rotating shaft 53c and the clamping pieces 53b and 53b are arranged to cross each other so as to be substantially orthogonal. The front end side of the rotating shaft 53c is connected to the clamping pieces 53b and 53b.

For example, four clamping pieces 53b and 53b are provided on the rotating shaft 53c. A mask frame F can be held between the adjacent clamping pieces 53b and 53b. Therefore, the clamping portion 53a can hold three mask frames F. The number of the clamping pieces 53b corresponds to the number of the mask frames F moved by the supporting grooves 51a and the supporting grooves 52a in the mask frame F stored in the stock placement portion 51A.

The arrangement height of the rotating shaft 53c in the Z direction is set to a height position that does not abut the upper end of the mask frame F that is raised and lowered by the movement of the lower stock support 51 and the lower stock support 52 in the Z direction. The length of the clamping pieces 53b, 53b is the length that can support the upper end of the mask frame F even if the mask frame F is raised and lowered due to the movement of the lower stock support 51 and the lower stock support 52 in the Z direction . Thereby, even if the mask frame F is raised and lowered due to the movement of the lower support portion 51 and the lower support portion 52 in the Z direction, the clamping portion 53a can maintain the state of supporting the upper end of the mask frame F.

It is also possible to provide a convex portion 53e at the ends of the clamping pieces 53b and 53b so as to be located on the inner sides facing each other. When the convex parts 53e are clamped to the mask frame F, the convex parts 53e facing each other are in point contact with the front and back sides of the mask frame F. The convex portions 53e facing each other are the same as the convex portions 13Ad and 13Ae described later, and can be urged in the direction of approaching each other when the mask frame F is clamped.

As shown in FIGS. 3 and 4, the rotating shaft 53c extends in a substantially horizontal direction (X direction) perpendicular to the mask surface, and can rotate around the axis of the rotating shaft 53c. The rotating shaft 53c can advance and retreat in the axial direction (X direction) of the rotating shaft 53c.

At the front end of the rotating shaft 53c, a plurality of clamping pieces 53b and 53b, which become the clamping portion 53a, protrude in the radial direction of the rotating shaft 53c, and are connected and fixed in the axial direction of the rotating shaft 53c. A motor of the X rotation driving part 53rx is connected to the base end of the rotating shaft 53c, so that the rotating shaft 53c can be driven around the axis of the rotating shaft 53c.

In addition, in the X rotation driving portion 53rx, for example, a motor (not shown) is fixed to a flat plate portion extending parallel to the mask surface (YZ surface). In the X rotation driving part 53rx, the rotation shaft 53c is driven in the X direction by driving the flat plate part by the X driving part. When the clamping portion 53a drives the rotating shaft 53c in the X direction, it is driven in the X direction integrally with the rotating shaft 53c.

The X driving part not shown in the figure has: X motor, which is a stepping motor; X rotation shaft, which is driven by the X motor to rotate and extends along the X direction; X position limiting part, which is screwed on the X rotation shaft and can be moved along The axis direction of the X rotation shaft is relatively moved; and an X restriction portion, which restricts the movement of the X position restriction portion and the X motor in the X direction.

In the X driving part not shown, the X rotation shaft is rotated by the X motor, and the front end of the X rotation shaft can be rotated so that the X position restriction part connected to the front end of the X rotation shaft is opposite to the flat part Move in the X direction. The X restriction section restricts the movement direction of the X position restriction section. The not-shown flat part becomes the side part of the storage chamber (chamber) 50. The upper support part 53 of the stock can adjust the position of the clamping part 53a with the degree of freedom in the X direction. The upper support portion 53 for the storage is fixed to the side of the storage chamber (chamber) 50.

In addition, in FIG. 4, illustration of the X rotation drive unit 53rx and the like is omitted.

The X driving part of the X rotation driving part 53rx can move in the X direction. The movement of the X driving part of the X rotation driving part 53rx in the X direction can be replaced with the storage position of the lower support part 51 of the storage. The driving parts 51b, 51c, 51d, 51e, 51f and/or the storage of the lower support part 52 can be replaced. The movement of the material position replacement driving parts 52b, 52c, 52d, 52e, 52f in the X direction is synchronized. Thereby, the stored mask frame F can be moved along the X direction.

In addition, the X rotation driving portion 53rx is not limited to the above-mentioned configuration as long as it can move the clamping portion 53a back and forth in the X direction and can rotate around the rotation shaft 53c.

In the stock upper support part 53, first, the X rotation driving part 53rx drives the rotating shaft 53c around the axis of the rotating shaft 53c. Thereby, the angular position of the clamping portion 53a around the axis of the rotating shaft 53c in the upper supporting portion 53 of the stock is set. The angle of the clamping portion 53a is set to a position that does not interfere with the mask frame F carried in from the outside to the storage position. Here, as a position where the clamping portion 53a does not interfere with the mask frame F carried in from the outside to the stocking position, for example, the clamping piece 53b may be directed upward in the Z direction with respect to the rotation shaft 53c.

Next, in the X rotation driving part 53rx, the X rotation shaft is rotated by the X motor of the X driving part, and the X position restricting part is moved in the X direction. Thereby, the rotating shaft 53c is driven in the X direction and the position of the clamping portion 53a in the X direction is set so that the upper end of the mask frame F is located between the specific clamping pieces 53b and 53b.

In this state, the rotation shaft 53c is rotated around the axis of the rotation shaft 53c by the X rotation driving part 53rx. Thereby, the adjacent clamping pieces 53b and the clamping pieces 53b in the clamping portion 53a abut on the front and back of the upper end of the mask frame F. Furthermore, by the X rotation driving portion 53rx, the angular position of the clamping portion 53a around the axis of the rotation shaft 53c is set. Thereby, at the ends of the adjacent and opposed clamping pieces 53b and the clamping pieces 53b, the convex portions 53e abut against the upper ends of the front and back of the mask frame F, respectively. Thereby, the upper end of the mask frame F is clamped by the clamp part 53a.

In this state, in the X rotation driving part 53rx, the X rotation shaft is rotated by the X driving part, and the X position restricting part is moved in the X direction. Thereby, the rotating shaft 53c is driven in the X direction. At this time, the driving of the rotating shaft 53c in the X direction is synchronized with the driving of the lower support parts 51 and 52 in the X direction. Thereby, the position of the mask frame F in the storage state in the X direction can be set.

In addition, as the driving range of the rotating shaft 53c in the axial direction (X direction), the position in the YZ plane is set to a position where the position in the YZ plane deviates from the position of the upper support portion 58h described later, whereby the rotating shaft 53c and the clamping The portion 53a does not interfere with the upper support portion 58h.

In the upper stock support part 53, the drive system of the upper stock support part 53, that is, the motor of the X rotation drive part 53rx and the X motor of the X drive part are arranged outside the stock chamber (chamber) 50. Therefore, the angular position adjustment of the clamping portion 53a around the axis of the rotating shaft 53c can be performed from the outside of the storage chamber (chamber) 50. In addition, the position adjustment of the clamping portion 53a in the direction parallel to the axis of the rotating shaft 53c may be performed from the outer side of the storage chamber (chamber) 50. Thereby, the dust generated from the driving system of the upper support part 53 can be prevented from spreading (falling) into the storage chamber (chamber) 50.

The upper stock support portion 54 and the upper stock support portion 53 are arranged side by side in the left-right direction, that is, in the Y direction. As shown in FIG. 3, the upper storage support portion 54 and the upper storage support portion 53 are arranged to have a substantially symmetrical structure with respect to the center line (Z direction, gravity direction) of the mask frame F.

The upper support portion 54 for the stock has a plurality of clamping portions 54a. The plurality of clamping portions 54a clamp and support the vicinity of the upper end of the mask frame F. In particular, the plurality of clamping portions 54a clamp and support the vicinity of the corner portions located at the upper end of the mask frame F, which are the two ends in the left-right direction (Y direction).

In addition, the upper stock support part 54 has an X rotation drive part 54rx. The X rotation driving portion 54rx drives the clamping portion 54a in a substantially horizontal direction (X direction) perpendicular to the mask surface (ZY plane). The X rotation driving portion 54rx can drive the clamping portion 54a to adjust its position in the X direction. In addition, the X rotation driving portion 54rx rotates the clamping portion 54a in the YZ plane substantially parallel to the mask surface. The X rotation driving portion 54rx can engage and release the mask frame F by using the clamping portion 54a.

As shown in FIG. 3, the upper stock support 54 has a rotating shaft 54c extending in the X direction. A clamping portion 54a is provided at the front end of the rotating shaft 54c. The clamping portion 54a has a plurality of clamping pieces 54b and 54b. A plurality of clamping pieces 54b, 54b abut each of the front and back sides of the end of the stored mask frame F.

The plurality of clamping pieces 54b and 54b are separately arranged on a rotating shaft 54c extending in the X direction. The holding pieces 54b and 54b are in a state where the distance between each other in the axial direction of the rotating shaft 54c is approximately equal to or slightly larger than the thickness of the mask frame F. The plurality of clamping pieces 54b and 54b are all fixed in such a state that their base ends are parallel to each other in the YZ direction which becomes the radial direction of the rotating shaft 54c.

Moreover, the X rotation drive part 54rx is connected to the base end side of the rotation shaft 54c. The rotation shaft 54c extends in the X direction. The base end side of the rotating shaft 54c is arrange|positioned so that it may extend to the outer side of the storage chamber 50. As shown in FIG.

The rotating shaft 54c and the clamping pieces 54b, 54b are arranged to cross each other so as to be substantially orthogonal. The front end side of the rotating shaft 54c is connected to the clamping pieces 54b and 54b.

For example, four clamping pieces 54b and 54b are provided on the rotating shaft 54c. Between the adjacent clamping pieces 54b and 54b, a mask frame F can be held. Therefore, the clamping portion 54a can hold three mask frames F. The number of the clamping pieces 54b corresponds to the number of the mask frames F moved by the supporting groove 51a and the supporting groove 52a in the mask frame F stored in the stock placement portion 52A.

The arrangement height of the rotation shaft 54c in the Z direction is set to a height position that does not abut the upper end of the mask frame F that is raised and lowered due to the movement of the lower stock support portion 51 and the lower stock support portion 52 in the Z direction. The length dimension of the clamping pieces 54b and 54b is the length that can support the upper end of the mask frame F even if the mask frame F is raised and lowered due to the movement of the lower support portion 51 and the lower support portion 52 in the Z direction . Thereby, even if the mask frame F is raised and lowered due to the movement of the lower support portion 51 and the lower support portion 52 in the Z direction, the clamping portion 54a can maintain the state of supporting the upper end of the mask frame F.

Protrusions 54e can be provided at the ends of the clamping pieces 54b and 54b so as to be located on the inner sides facing each other. When the convex parts 54e are clamped to the mask frame F, the mutually opposed convex parts 54e are in point contact with the front and back sides of the mask frame F. The convex portions 54e facing each other can be urged in the direction of approaching each other in the same way as the convex portions 14Ad and 14Ae described later to clamp the mask frame F.

As shown in FIG. 3, the rotating shaft 54c extends in a substantially horizontal direction (X direction) perpendicular to the surface of the mask frame F, and can rotate around the axis of the rotating shaft 54c. The rotating shaft 54c can advance and retreat in the direction (X direction) that becomes the axis of the rotating shaft 54c.

At the front end of the rotating shaft 54c, a plurality of clamp pieces 54b and 54b which become the clamp portions 54a protrude in the radial direction of the rotating shaft 54c, and a plurality of them are continuously fixed in the direction which becomes the axis of the rotating shaft 54c. A motor of the X rotation driving part 54rx is connected to the base end of the rotating shaft 54c, so that the rotating shaft 54c can be driven around the axis of the rotating shaft 54c.

In addition, in the X rotation driving portion 54rx, for example, a motor (not shown) is fixed to a flat portion extending parallel to the mask surface (YZ surface). In the X rotation driving part 54rx, the rotation shaft 54c is driven in the X direction by driving the flat part by the X driving part. When the clamping part 54a drives the rotation shaft 54c in the X direction, it drives in the X direction integrally with the rotation shaft 54c.

The X driving part not shown in the figure has: X motor, which is a stepping motor; X rotation shaft, which is driven by the X motor to rotate and extends along the X direction; The axis direction of the X rotation shaft moves relatively; and the X restriction portion restricts the movement of the X position restriction portion and the X motor in the X direction.

In the X driving part not shown, the X rotation shaft is rotated by the X motor, and the front end of the X rotation shaft can be rotated so that the X position restriction part connected to the front end of the X rotation shaft is relative to The flat part moves in the X direction. The X restriction section restricts the movement direction of the X position restriction section. The not-shown flat part becomes the side part of the storage chamber (chamber) 50. The upper supporting portion 54 of the storage material can adjust the position of the clamping portion 54a with the degree of freedom in the X direction, and is fixed to the side of the storage chamber (chamber) 50.

The X driving part of the X rotation driving part 54rx can move in the X direction. The movement of the X driving part of the X rotation driving part 54rx in the X direction can be combined with the X driving part of the X rotation driving part 53rx and the stock position replacement driving parts 51b, 51c, 51d, 51e, 51f and The stock position replacement drive parts 52b, 52c, 52d, 52e, 52f of the stock lower support part 52 move synchronously in the X direction. By making the X rotation driving part 54rx, the X rotation driving part 53rx, the stock position replacement driving parts 51b, 51c, 51d, 51e, 51f, and the stock position replacement driving parts 52b, 52c, 52d, 52e, 52f synchronize along X It moves in the direction of X, and moves the stored mask frame F in the X direction.

In addition, the X rotation driving portion 54rx is not limited to the above-mentioned structure as long as it can move the clamping portion 54a back and forth in the X direction and can rotate around the rotation shaft 54c.

In the stock upper support part 54, first, the rotating shaft 54c is driven around the axis of the rotating shaft 54c by the X rotation driving part 54rx. Thereby, in the upper supporting portion 54 of the stock, the angular position of the clamping portion 54a around the axis of the rotating shaft 54c is set. The angle of the clamping portion 54a is set to a position that does not interfere with the mask frame F carried in from the outside to the storage position. Here, as a position where the clamping portion 54a does not interfere with the mask frame F carried in from the outside to the storage position, for example, the clamping piece 54b can be directed upward in the Z direction with respect to the rotation shaft 54c.

Next, in the X rotation driving part 54rx, the X rotation shaft is rotated by the X motor of the X driving part, and the X position restricting part is moved in the X direction. Thereby, the rotation shaft 54c is driven in the X direction to set the position of the clamping portion 54a in the X direction, so that the upper end of the mask frame F is located between the specific clamping pieces 54b and 54b.

In this state, the rotation shaft 54c is rotated around the axis by the X rotation driving portion 54rx. Thereby, adjacent clamping pieces 54b and clamping pieces 54b in the clamping portion 54a abut against the front and back of the upper end of the mask frame F. Furthermore, the angular position of the clamping portion 54a around the axis of the rotation shaft 54c is set by the X rotation driving portion 54rx. Thereby, at the ends of the adjacent and opposite clamping pieces 54b and 54b, the convex portions 54e abut against the upper ends of the front and back of the mask frame F, respectively. Thereby, the upper end of the mask frame F is clamped by the clamp part 54a.

In this state, in the X rotation driving portion 54rx, the X rotation shaft is rotated by the X driving portion, and the X position restricting portion is moved in the X direction. Thereby, the rotating shaft 54c is driven in the X direction. At this time, the drive of the rotation shaft 54c in the X direction is synchronized with the drive of the lower support parts 51 and 52 in the X direction. Thereby, the position of the mask frame F in the storage state in the X direction can be set.

In addition, as the driving range of the rotating shaft 54c in the axial direction (X direction), the position in the YZ plane is set to a position where the position in the YZ plane deviates from the position where the upper support portion 58h described later is deviated, whereby the rotating shaft 54c and the clamp The range in which the holding portion 54a does not interfere with the removal upper support portion 58h.

In the upper stock support part 54, the motor of the X rotation driving part 54rx and the X motor of the X driving part are arranged at positions outside the stock chamber (chamber) 50. Therefore, the angular position of the clamping portion 54a around the rotating shaft 54c can be adjusted from the outside of the storage chamber (chamber) 50. Moreover, the position adjustment in the axial direction of the rotating shaft 54c in the clamping part 54a may be performed from the outer side of the storage chamber (chamber) 50. Thereby, the dust generated from the driving system of the upper support part 54 can be prevented from spreading (falling) into the storage chamber (chamber) 50.

As shown in FIGS. 3 and 4, the mask frame F located at the position corresponding to the driving groove 51Ab and the driving groove 52Ab in the X direction can be placed on the driving support portion 55. The driving support portion 55 abuts against the lower end of the placed mask frame F, and can drive the mask frame F in the surface direction (Y direction). The driving support part 55 has a driving roller 55a and a rotation driving part 55b which rotationally drives the driving roller 55a.

In addition, in FIG. 4, there is a structure in which the illustration is omitted in the drive support portion 55, and only the drive roller 55a is shown.

Specifically, the drive support part 55 is arranged in the stock placement parts 51A and 52A shown in FIGS. 3 and 4, and is connected to form the second channel from the right, that is, the third channel from the left (stock position ) The line between the driving groove 51Ab and the driving groove 52Ab. In the driving support portion 55, the lower end of the mask frame F placed in the placement groove 51Aa and the placement groove 52Aa and the lower end of the mask frame F placed in the plurality of drive rollers 55a are the same For the height position (Z direction), set the upper end position of the drive roller 55a.

The driving support part 55 is provided in plural in the Y direction in the storage chamber (chamber) 50. In the driving support portion 55, the axial directions of the plurality of driving rollers 55a are parallel. The drive support part 55 is located between the stock placement part 51A and the stock placement part 52A. The driving support 55 can move the mask frame F in the Y direction. In FIG. 3, three drive support parts 55 are shown, but it is not limited to this number.

Furthermore, in the drive support portion 55, in addition to the position between the Y-direction stock placement portion 51A and the storage placement portion 52A, the storage placement portion 51A and the storage placement portion in the Y direction may also be A drive support portion 55 is provided at a position outside the portion 52A. In this case, in the drive support portion 55, the stock placement portions 51A, 52A shown in the figure are located in the second placement groove 51Aa from the right, that is, the third placement groove 51Aa from the left. The drive roller 55a is arranged on a straight line extending from the straight line of the placement groove 52Aa.

The arrangement interval of the driving support part 55 in the Y direction is set to be smaller than the length dimension of the mask frame F in the Y direction. Furthermore, the arrangement interval of the driving support part 55 in the Y direction can be appropriately set according to the weight of the mask frame F, the accuracy of position control, and the like.

Corresponding to the position of the mask frame F to be transported, a plurality of driving support parts 55 are appropriately driven and controlled in synchronization.

The driving roller 55a has an axis extending in the X direction, which is the direction in which the plurality of mounting grooves 51Aa are arranged. The driving roller 55a has an axis extending in the X direction orthogonal to the straight line connecting the driving groove 51Ab and the driving groove 52Ab.

The rotation driving part 55b supports the driving roller 55a so as to be rotatable. The upper end of the driving roller 55a protrudes from the top of the rotation driving part 55b.

The rotation drive motor 55e is connected to the rotation drive part 55b. The rotation drive motor 55e is fixed on the outside of the bottom 50a of the storage chamber 50. In addition, the rotation driving motor 55e may be fixed outside the side portion 50b of the storage chamber 50.

The driving roller 55a fixes the position in the XY plane with respect to the storage chamber 50. The driving roller 55a is set at a height position that does not interfere with the mask frame F placed on the supporting grooves 51a, 52a when the mask frame F placed on the supporting grooves 51a, 52a moves in the X direction.

Among the plurality of rotation driving parts 55b, the respective driving rollers 55a can be driven in synchronization with each other, and one mask frame F abutted by the plurality of driving rollers 55a at the same time can be driven in the Y direction.

As shown in FIG. 3 and FIG. 4, the upper transport support portion 56 is provided on the top 50 c of the storage chamber 50. The upper conveying support part 56 is arranged at a position between the upper stock support part 53 and the upper stock support part 54 in the Y direction. The upper conveyance support part 56 supports the upper end of the mask frame F so that it does not incline when the mask frame F moves in the Y direction. When the stored mask frame F is moved in the X direction by the stock support portions 51, 52, 53, 54, the upper conveyance support portion 56 can release the support of the mask frame F.

As shown in FIG. 3 and FIG. 4, the upper conveyance support part 56 has the upper magnet part 56a, the clamping part 56b, 56c, and the Z drive part 56f.

The upper magnet portion 56a is provided at a position in the X direction corresponding to the driving roller 55a. The upper magnet portion 56a can be raised and lowered in the Z direction. The upper magnet portion 56a extends in the Y direction.

The clamping portions 56b and 56c are separated from the upper magnet portion 56a in the X direction and the Y direction. The clamping portions 56b and 56c can be raised and lowered in the Z direction integrally with the upper magnet portion 56a.

The Z drive part 56f moves the upper magnet part 56a and the clamping parts 56b and 56c back and forth in the Z direction. Thereby, the Z driving part 56f can engage and release the mask frame F.

As shown in FIG. 3, the clamping part 56b and the clamping part 56c are arrange|positioned side by side in the Y direction which is a left-right direction. The clamping portion 56b and the clamping portion 56c are respectively located at both ends of the upper magnet portion 56a. The clamping portion 56b and the clamping portion 56c are provided to have a substantially symmetrical configuration with respect to the center line (Z direction, gravity direction) of the upper magnet portion 56a.

The clamping portion 56b is provided with a plurality of clamping pieces 56b1 and 56b1 protruding to the lower side in the Z direction than the upper magnet portion 56a. The plurality of clamping pieces 56b1 and 56b1 can abut each of the front and the back at the end of the stored mask frame F. A plurality of clamping pieces 56b1 and 56b1 are provided at the connecting portion 56b2 extending in the X direction.

The clamping pieces 56b1 and 56b1 are parallel to each other. The distance between the clamping pieces 56b1 and 56b1 in the X direction is set to be approximately equal to or slightly larger than the thickness of the mask frame F. The clamping pieces 56b1 and 56b1 are separately arranged in the X direction in which the connecting portion 56b2 extends.

As shown in FIG. 3, the connecting portion 56b2 extends in a substantially horizontal direction (X direction) perpendicular to the surface of the mask frame F. In addition, the upper side of the connecting portion 56b2 is connected to one end of the Z support portion 56d in the Y direction. The Z support part 56d extends to the outside of the storage chamber 50.

The upper end side of the Z support part 56d is connected to the Z drive part 56f. The Z support part 56d can be raised and lowered in the Z direction by the Z driving part 56f.

The base ends of the plurality of clamping pieces 56b1 and 56b1 are all connected and fixed to the connecting portion 56b2. The plurality of clamping pieces 56b1 and 56b1 are in a state of being parallel to each other. For example, four clamping pieces 56b1 and 56b1 are provided. Between the adjacent clamping pieces 56b1 and 56b1, a mask frame F can be held. The number of the clamping pieces 56b1 corresponds to the number of the mask frames F moved by the supporting grooves 51a and the supporting grooves 52a in the mask frame F stored in the stock placing portion 52A.

The length dimensions of the clamping pieces 56b1 and 56b1 are as follows: when the mask frame F moves due to the movement of the lower support parts 51, 52 in the Z direction, the upper end of the mask frame F does not abut the upper magnet part 56a and the connecting part 56b2.

Protrusions 56e may also be provided at the ends of the clamping pieces 56b1 and 56b1 so as to be located on the inner side surfaces facing each other. When the convex parts 56e are clamped to the mask frame F, the mutually opposed convex parts 56e are in point contact with the front and back sides of the mask frame F. The convex parts 56e facing each other can be urged in the direction of approaching each other to clamp the mask frame F like the convex parts 14Ad and 14Ae described later.

The clamping portion 56c is provided with a plurality of clamping pieces 56c1 and 56c1 that protrude more to the lower side in the Z direction than the upper magnet portion 56a. A plurality of clamping pieces 56c1 and 56c1 can abut each of the front and back of the end of the stored mask frame F. A plurality of clamping pieces 56c1 and 56c1 are provided at the connecting portion 56c2 extending in the X direction.

The clamping pieces 56c1 and 56c1 are parallel to each other. It is assumed that the distance between the clamping pieces 56c1 and 56c1 in the X direction is approximately equal to or slightly larger than the thickness of the mask frame F. The clamping pieces 56c1 and 56c1 are separately arranged in the X direction in which the connecting portion 56c2 extends.

As shown in FIG. 3, the connecting portion 56c2 extends in a substantially horizontal direction (X direction) perpendicular to the surface of the mask frame F. In addition, the upper side of the connecting portion 56c2 is connected to the Z support portion 56d at the end position on the opposite side of the end of the Z support portion 56d to which the connecting portion 56b2 is connected in the Y direction.

The connecting portion 56c2 can be raised and lowered in the Z direction integrally with the connecting portion 56b2 and the Z support portion 56d. The clamping pieces 56b1, 56b1 and the clamping pieces 56c1, 56c1 all extend in the Z direction. Therefore, even when the connecting portion 56c2, the connecting portion 56b2, and the Z support portion 56d move up and down in the Z direction, the direction in which the clamping pieces 56b1, 56b1 and the clamping pieces 56c1, 56c1 extend does not change.

The base ends of the plurality of clamping pieces 56c1 and 56c1 are all connected and fixed to the connecting portion 56c2. The plurality of clamping pieces 56c1 and 56c1 are in a state of being parallel to each other. For example, four clamping pieces 56c1 and 56c1 are provided. Between the adjacent clamping pieces 56c1 and 56c1, the mask frames F can be held one by one. The number of the clamping pieces 56c1 corresponds to the number of the mask frames F moved by the supporting groove 51a and the supporting groove 52a in the mask frame F stored in the stock placing portion 52A.

The length dimensions of the clamping pieces 56c1 and 56c1 are as follows: when the mask frame F moves due to the movement of the supporting parts 51 and 52 under the storage in the Z direction, the upper end of the mask frame F does not abut the upper magnet part 56a and the connecting part 56c2.

Protrusions 56e may also be provided at the ends of the clamping pieces 56c1 and 56c1 so as to be located on the inner sides facing each other. When the convex parts 56e are used to clamp the mask frame F, the mutually opposed convex parts 56e are in point contact with the front and back sides of the mask frame F. The convex parts 56e facing each other can be urged in the direction of approaching each other to clamp the mask frame F like the convex parts 14Ad and 14Ae described later.

The Z driving part 56f is arranged outside the storage chamber 50. The Z support part 56d penetrates the top part 50c of the storage chamber 50 in a manner to maintain a closed state. The Z support part 56d is arranged to be expandable and contractible by the Z driving part 56f.

In addition, in the Z driving portion 56f, the Z support portion 56d and the clamping portions 56b and 56c can advance and retreat integrally in the Z direction. In the Z driving portion 56f, the Z support portion 56d and the clamping portions 56b and 56c can advance and retreat in the Z direction without changing their postures.

When the upper support parts 53, 54 and the lower support parts 51, 52 move in the X direction, the Z drive part 56f advances the magnet part 56a and the clamping parts 56b, 56c on the upper support part 56 to the Z direction Move up. Thereby, the upper magnet part 56a, the clamping parts 56b1 and 56c1 will not interfere with the mask frame F which moves in the X direction.

Thereby, one or more mask frames F are supported by the supporting grooves 51a, 52a of the lower supporting parts 51, 52 of the lower end of the slider F5, and at the same time, the upper supporting parts 53, 54 of the material supporting the upper end In this state, the one or more mask frames F are moved in the X direction by the Z driving portion 56f, the upper magnet portion 56a, the clamping piece 56b1, and the clamping piece 56c1.

Similarly, first, the upper stock support parts 53, 54 and the lower stock support parts 51, 52 are moved in the X direction. Thereby, the mask frame F of the slider F5 at the lower end supported by the support grooves 51a and 52a is moved in the X direction.

By hand, by driving the Z driving portion 56f, the upper magnet portion 56a and the clamping portions 56b and 56c are moved downward in the Z direction. Thereby, the mask frame F is supported by the upper conveyance support part 56 again.

The upper magnet portion 56a has a plurality of magnets extending in the Y direction parallel to the conveying direction of the mask frame F. The magnet of the upper magnet part 56a attracts the upper frame support part F6 provided at the upper end of the mask frame F as described later. In addition, the magnet of the upper magnet portion 56a forms a magnetic circuit in a vertical plane (in the XZ plane) substantially orthogonal to the in-plane direction (YZ in-plane direction) of the mask frame F.

The upper magnet part 56a is arrange|positioned so that it may have substantially the same cross-section over the entire length of the upper conveyance support part 56 in the Y direction. The upper magnet part 56a and the upper frame support F6 of the mask frame F are attracted to each other by a magnetic circuit formed in the XZ plane. The magnetic circuit formed between the upper magnet portion 56a and the upper frame support F6 is formed over the entire length of the upper conveying support portion 56 in the Y direction.

In the upper conveyance support portion 56, the upper magnet portion 56a and the mask frame F are attracted and supported by each other. At this time, it is necessary to make the upper magnet portion 56a and the mask frame F a certain distance in the Z direction, and to position the upper frame support F6 of the mask frame F directly below the upper magnet portion 56a.

When the mask frame F driven by the driving roller 55a moves in the Y direction inside the storage chamber 50, the upper magnet part 56a attracts and supports the upper side of the mask frame F in the upper conveying support part 56. Thereby, the mask frame F can be moved in the Y direction. At the same time, in the upper conveyance support portion 56, the upper side of the mask frame F is also supported for the mask frame F of the slider F5 at the lower end supported by the placement grooves 51Aa, 52Aa.

In addition, when the mask frame F is moved in the X direction by the upper stock support parts 53, 54 and the lower stock support parts 51, 52, the Z support part 56f is raised by the Z drive part 56f. Thereby, the distance between the upper end of the mask frame F and the upper magnet part 56a is extended. Thereby, the magnetic circuit formed in the XZ plane by the upper magnet portion 56a and the upper frame support F6 is released. Thereby, the attraction and support of the upper part of the mask frame F by the upper magnet part 56a can be released.

Moreover, after the movement of the mask frame F in the X direction is completed, the Z support portion 56d is lowered by the Z driving portion 56f. This shortens the distance between the upper end of the mask frame F and the upper magnet portion 56a. Thereby, the magnetic circuit formed in the XZ plane by the upper magnet portion 56a and the upper shield support F6 can be formed again. Thereby, the attraction and support of the mask frame F by the upper magnet portion 56a is started.

The entire length of the upper magnet portion 56a of the upper conveying support portion 56 and the upper side frame support portion F6 of the mask frame F in the Y direction forms substantially the same magnetic circuit in the XZ plane. Thereby, the mutual attraction force can be set equally between the upper magnet portion 56a and the upper frame support portion F6 over the entire length of the upper frame support body F6 in the Y direction. Therefore, the mask frame F can be reliably prevented from tilting.

As shown in FIGS. 1, 3, and 4, the sealing mechanism 58 has a carry-in/out port 58b and a mask take-out filling port 58c. The carrying-in/outlet 58b has a shutoff valve 58a connecting the stock chamber 50 and the film forming chamber 4. The carry-in and carry-out port 58b is provided in the position which becomes the side part 50b of the Y direction of the storage chamber 50. The mask taking out and filling port 58c is provided in the position of the side part 50b of the X direction of the storage chamber 50.

As shown in FIGS. 1 and 3, the carry-in and carry-out port 58b is connected to the film formation chamber (chamber) 4 via a shutoff valve 58a. The loading/unloading port 58b is the loading/unloading port 58b which has the mask unloading and filling port 58c in a closed state and the storage chamber 50 in a state sealed from the outside, and is opened when the mask is changed to the film forming position in the chamber 4. Thereby, the carry-in and carry-out port 58b communicates with the chamber 4. The mask frame F is transported through the carry-in/out port 58b. In addition, when closing the carry-in and carry-out port 58b and the chamber 4 is in a closed state, the unused and used mask frame F in the storage chamber 50 is carried in and out of the storage chamber 50.

As shown in FIG. 3, the mask taking-out and filling port 58c can switch between the state of connecting the storage chamber 50 to the outside and the state of sealing the storage chamber 50 to the outside.

When the mask frame F is transported to the outside, the mask removal and filling port 58c is opened. In this case, the loading/unloading port 58b is closed and the chamber 4 is sealed.

Furthermore, when the mask frame F is transported to the chamber 4, the mask extraction filling port 58c is closed. In this case, the carry-in and carry-out port 58b is in an open state and communicates with the chamber 4.

Specifically, the mask taking-out and filling port 58c has: a plate-shaped opening and closing portion 58d, which is arranged at a position in the X direction in the side portion 50b of the storage chamber 50; and a rocking shaft 58e, which is connected to the lower portion of the opening and closing portion 58d and extends along Extending in the Y direction; and the rocking drive portion 58f, which is connected to the rocking shaft 58e and rocking the rocking shaft 58e.

As shown in FIG. 3, the opening-closing part 58d is provided with the extraction support part 58g at the position of the lower end side of both ends in Y direction. In the opening and closing portion 58d, an upper extraction support portion 58h is provided at a position above the extraction support portion 58g and both ends in the Y direction. In addition, at the peripheral position of the flat plate-shaped opening and closing portion 58d, a plurality of supporting protrusions 58k that abut and support the mask frame F are provided. The plurality of supporting protrusions 58k are all located inside the storage chamber 50 in the opening and closing portion 58d. The plurality of supporting protrusions 58k are arranged so as to protrude in the X direction.

The supporting convex portion 58k is set at a position to be arranged in the opening and closing portion 58d so as to correspond to the peripheral position of the mask frame F.

When the mask frame F is carried out from the storage chamber 50 to the outside, the opening and closing portion 58d rotates around the swing shaft 58e. At this time, the support convex portion 58k, the take-out support portion 58g, and the take-out upper support portion 58h rotate in synchronization with the opening and closing portion 58d to support the mask frame F to be taken out. In addition, when the mask frame F is carried into the storage chamber 50 from the outside, the support convex portion 58k, the extraction support portion 58g, and the extraction upper support portion 58h are provided so as not to support the base portions 51b, 52b and the clamping portion 53a against the groove. , 54a supports the position affected by the action of the mask frame F.

As shown in FIG. 3, the take-out support part 58g protrudes in the X direction inside the storage chamber 50 of the opening and closing part 58d. On the upper side of the extraction support portion 58g, a extraction support groove 58ga is provided. The lower end of the mask frame F can be placed on the removal support groove 58ga. In the take-out support portion 58g, when the opening and closing portion 58d closes the storage chamber 50, as described later, the take-out support grooves are arranged corresponding to the placement grooves 51Aa, 52Aa of the storage placing portions 51A, 52A 58ga.

Arrangement of the extraction support groove 58ga in a manner corresponding to the mounting grooves 51Aa and 52Aa means that the supporting parts 51 and 52 can simultaneously support the mask frame F placed in the extraction support groove 58ga and the mounting The mask frame F of the grooves 51Aa, 52Aa.

Specifically, the positional relationship between the extraction support groove 58ga and the placement grooves 51Aa, 52Aa in the X direction and the Z direction is set to the following X direction and Z direction positions: when the storage lower support portions 51, 52 are driven , The lower supporting parts 51, 52 can support the mask frame F placed in the placing grooves 51Aa, 52Aa and the mask frame F placed in the extraction support groove 58ga at the same time.

At this time, the extraction support groove 58ga and the placement grooves 51Aa and 52Aa are set at the same position (height) in the Z direction. Also, the distance between the take-out support groove 58ga and the adjacent placement groove 51Aa in the X direction and the distance between the adjacent placement groove 51Aa and the placement groove 51Aa in the stock placement portion 51A in the X direction Roughly equal. In this way, the extraction support groove 58ga is arranged close to the mounting groove 51Aa.

As shown in FIG. 3, the take-out upper support part 58h has a Z axis 58h1 and a support piece 58h2. The Z axis 58h1 is provided inside the storage chamber 50 in the opening and closing portion 58d. The Z axis 58h1 protrudes in the X direction. The Z axis 58h1 is set to be rotatable. The supporting piece 58h2 is arranged at the end of the Z axis 58h1 inside the storage chamber 50. The supporting piece 58h2 is arranged to protrude outside the Z axis 58h1 in the radial direction. The supporting piece 58h2 can rotate around the Z axis 58h1. The Z axis 58h1 can be used to set the angle and position of the support piece 58h2 from the outside of the storage chamber 50 in the opening and closing portion 58d by a rotation driving part not shown.

When swinging the opening and closing portion 58d, the lower end of the mask frame F is placed on the extraction support portion 58g. At the same time, when the opening and closing portion 58d is shaken, the support piece 58h2 rotates around the Z axis 58h1 and abuts against the upper surface of the mask frame F. Thereby, the mask frame F is shaken in synchronization with the opening and closing portion 58d. In addition, when the opening and closing portion 58d is rocked, the mask frame F abuts on the plurality of support convex portions 58k. Thereby, the mask frame F is supported by 58 d of opening and closing parts. Thereby, the mask frame F is shaken integrally with the opening and closing portion 58d.

The opening/closing part 58d is shaken, and the mask taking-out filling port 58c is closed by the opening/closing part 58d. At the same time, the opening and closing portion 58 d is shaken, and the mask frame F is carried into the storage chamber 50. Subsequently, the carried-in mask frame F is moved, and the mask frame F is placed on the mounting grooves 51Aa and 52Aa. Thereby, the mask frame F that has been carried in is stored in the storage room 50.

Hereinafter, the operation when the mask frame F is stored in the storage chamber 50 by the mask replacement mechanism 100 will be described.

First, before carrying in the mask frame F, the mask replacement mechanism 100 is set in the carrying in and out state. In the carrying in and out state of the mask replacement mechanism 100, the upper surface of the opening and closing portion 58d is horizontal. Thereby, in the carrying-in and carrying-out state of the mask replacement mechanism 100, the mask removal and filling opening 58c is completely opened. The mask replacement mechanism 100 swings the opening/closing part 58d from the carrying-in and carrying-out state, and is set to the closed state which closes the mask extraction filling port 58c. During the period from the loading and unloading state of the mask replacement mechanism 100 to the closing state of the mask replacement mechanism 100 closing the mask removal and filling port 58c, the upper stock support parts 53 and 54 are rotationally driven. The upper supporting parts 53 and 54 of the storage material rotate to the outward angular position where the clamping pieces 53b and 54b do not interfere with the mask frame F. Thereby, the holding pieces 53b and 54b are retracted in the upper support parts 53, 54 of the stock.

In the closed state of the mask replacement mechanism 100, the lower end of the mask frame F is placed in the extraction support groove 58ga of the extraction support portion 58g. In addition, in the mask replacement mechanism 100, during the period when the loading and unloading device is in the closed state, the groove supporting bases 51b, 52b of the lower support portions 51, 52 are driven, and the supporting grooves 51a, 52a are provided in the relatively unloading support. The lower position of the groove 58ga and the placement grooves 51Aa and 52Aa (the lower position in the Z direction).

In this state, the swing opening and closing portion 58d closes the mask taking-out and filling port 58c, and the mask replacement mechanism 100 is set in a closed state. In the closed state, the mask frame F becomes a vertical position erected in the Z direction.

At this time, the positions on both sides of the lower end of the mask frame F are respectively placed in the extraction support groove 58ga. In addition, the position on both sides of the upper end of the mask frame F abuts against the supporting piece 58h2 of the take-out upper supporting portion 58h. At the same time, the opening/closing portion 58d side of the mask frame F abuts against the supporting convex portion 58k. Thereby, the mask frame F is supported in the state standing parallel to the opening and closing part 58d.

Next, the upper stock support parts 53 and 54 are driven so that the clamping pieces 53b and 54b approach the opening and closing part 58d in the X direction. The clamping pieces 53b and 54b are driven in the X direction to a position where they can be clamped and placed on both sides of the upper end of the mask frame F of the extraction support groove 58ga by the clamping pieces 53b and 54b. Furthermore, the upper stock support parts 53, 54 are driven to rotate the clamping pieces 53b, 54b in the YZ plane. The clamping pieces 53b and 54b are rotated to a position where the upper end of the mask frame F placed in the extraction support groove 58ga abuts and clamps each of the front and back sides.

At the same time, in the removal of the upper support portion 58h, the support piece 58h2 is rotated around the Z axis 58h1. Thereby, the angle at which the supporting piece 58h2 does not abut the upper surface of the mask frame F is formed. Thereby, the mask frame F can be moved in the X direction.

Next, in the lower stock support portions 51, 52, the groove support base portions 51b, 52b are driven to the position closest to the opening and closing portion 58d in the X direction. Thereby, the straight line connecting the extraction support groove 58ga and the extraction support groove 58ga arranged at both sides of the lower end of the opening and closing portion 58d coincides with the straight line drawn along the extending direction of the support grooves 51a, 52a.

Furthermore, in a state where the support grooves 51a, 52a closest to the opening and closing portion 58d and the extraction support groove 58ga coincide in the X direction, the groove support bases 51b of the lower support portions 51, 52 are driven upward in the Z direction. , 52b. Thereby, the position of the support grooves 51a, 52a in the Z direction is higher than the straight line connecting the extraction support groove 58ga and the extraction support groove 58ga. As a result, the lower end of the mask frame F is placed in the supporting state of the supporting grooves 51a and 52a. At this time, the lower end of the mask frame F moves upward from the extraction support groove 58ga.

In addition, the distance in the Z direction of the support bases 51b and 52b of the ascending drive groove is a range that does not interfere with the upper end of the mask frame F and the rotation shafts 53c and 54c of the upper support parts 53, 54 of the stock. At the same time, the distance in the Z direction of the support bases 51b and 52b of the ascending drive groove is a range that does not interfere with the upper end of the mask frame F and the magnet portion 56a on the upper conveyance support 56.

Next, the lower stock support parts 51 and 52 and the upper stock support parts 53, 54 are driven synchronously in the X direction. Here, the movement distance of the lower stock support parts 51 and 52 in the X direction is equal to the movement distance of the upper stock support parts 53, 54. In addition, the movement distance of the lower support portions 51, 52 in the X direction and the movement distance of the upper support portions 53, 54 in the X direction are positions corresponding to the positions of the placement grooves 51Aa, 52Aa in the X direction, so that The cover frame F is mounted on the mounting grooves 51Aa and 52Aa.

Subsequently, the groove support bases 51b, 52b are driven in the Z direction in the lower support portions 51, 52 to lower them. Thereby, the support grooves 51a, 52a are made to be lower than the positions of the mounting grooves 51Aa, 52Aa. In this way, during the lowering of the groove support bases 51b and 52b, the lower end of the mask frame F is placed on the mounting grooves 51Aa and 52Aa.

Here, the mounting grooves 51Aa and 52Aa at the lower end of the mounting mask frame F can be appropriately selected as long as they are the driving ranges of the lower support parts 51 and 52 for the stock. For example, the mask frame F can be mounted on the mounting grooves 51Aa and 52Aa at the positions closest to the opening and closing portion 58d in the X direction. In this case, the movement distance of the lower stock support parts 51, 52 and the upper stock support parts 53, 54 in the X direction becomes the shortest.

Here, for the sake of explanation, in the mask replacement mechanism 100, the mask frame F that moves in the X direction is placed on the placement grooves 51Aa and 52Aa. The movement of the mask frame F in the mask replacement mechanism 100 also includes a case where the mask frame F that moves in the X direction is placed on the drive rollers 55a and 55a. The drive rollers 55a, 55a coincide with the drive grooves 51Ab, 52Ab in the X direction.

In addition, when the mask frame F is moved in the mask replacement mechanism 100, the lower end of the mask frame F can be placed on the driving rollers corresponding to the second driving grooves 51Ab and 52Ab from the right in FIGS. 3 and 4 55a, 55a. In this case, the lower end of the mask frame F becomes a position of the same height as the mask frame F when it is placed in the mounting grooves 51Aa and 52Aa.

At the same time, when the mask frame F is moved in the mask replacement mechanism 100, when the lower end of the mask frame F is placed in the mounting grooves 51Aa, 52Aa, both the upper support portion 56 and the upper magnet portion 56a and The clamping parts 56b and 56c descend, and the clamping pieces 56b1 and 56c1 of the clamping parts 56b and 56c clamp the upper end of the mask frame F at both ends. Thereby, the clamping pieces 56b1 and 56c1 of the clamping portions 56b and 56c can clamp the upper end of the mask frame F, and the support of the upper support portions 53, 54 of the stock can be released.

Furthermore, when the mask frame F is moved in the mask replacement mechanism 100, the lower end of the mask frame F is placed on the driving roller corresponding to the second driving grooves 51Ab and 52Ab from the right in FIGS. 3 and 4 In the case of 55a and 55a, the mask frame F is supported by the upper magnet part 56a. Thereby, the mask frame F at the upper end supported by the upper magnet part 56a can be conveyed by the driving roller 55a of the driving support part 55.

When the mask frame F is carried out in the mask replacement mechanism 100, the procedure is reversed to that described above.

Thereby, the sealing mechanism 58 of the mask replacement mechanism 100 sets the chamber 4 in a sealed state, and the unused or used mask frame F can be moved between the storage chamber 50 and the outside, and between the storage chamber 50 and Remove the unused or used mask frame F from the outside room.

As shown in FIG. 3, the transport mechanism 60 transports the mask frame F stored in the storage chamber 50 from the storage chamber 50 to the mask chamber 43 which is a film forming position in the chamber 4. The conveyance mechanism 60 has a conveyance drive unit 65 and a conveyance upper support unit 66.

The conveying driving unit 65 is provided along the conveying path of the mask frame F. The conveying drive unit 65 supports the upper part of the mask frame F. The upper transport support portion 66 supports the upper part of the mask frame F.

As shown in FIG. 3, the conveyance drive part 65 supports the mask frame F. At this time, the conveyance driving unit 65 abuts on the slider F5 at the lower end of the mask frame F. Moreover, the conveyance drive part 65 has the drive roller 65a which can drive the mask frame F in a surface direction (Y direction), and the rotation drive part 65b which rotationally drives the drive roller 65a.

The conveyance drive part 65 is provided in plural along the conveyance path from the storage chamber 50 to the mask frame F of the mask chamber 43 which is a film formation position. Thereby, the conveyance drive part 65 moves the mask frame F continuously. In addition, the arrangement interval of the conveying driving portion 65 on the conveying path of the mask frame F is set to be smaller than the length dimension of the mask frame F in the Y direction. The arrangement interval of the conveying driving portion 65 on the conveying path of the mask frame F can be set to be shorter by the weight of the mask frame F, the accuracy of position control, and the like.

The plurality of conveying drive parts 65 correspond to the positions of the mask frame F to be conveyed, and are appropriately synchronized and driven and controlled.

The driving roller 65a has an axis extending in the X direction orthogonal to the conveying path of the mask frame F.

The rotation driving part 65b rotates and drives the driving roller 65a. At the top of the conveying driving portion 65, the upper end of the driving roller 65a protrudes. The driving rollers 65a are all arranged inside the chambers 50 and 4. The rotation driving parts 65b are preferably arranged on the outer side of the chambers 50 and 4.

The upper conveying support portion 66 has a structure substantially equivalent to that of the magnet portion 56 a on the upper conveying support portion 56. The upper conveyance support portion 66 has a magnet that attracts the upper frame support body F6 to each other. The magnet of the upper conveyance support portion 66 forms a magnetic circuit in a vertical plane (in the XZ plane) substantially orthogonal to the in-plane direction (YZ in-plane direction) of the mask frame F. Thereby, the upper conveyance support part 66 supports the upper part of the mask frame F in conveyance.

The upper conveyance support portion 66 has a plurality of magnets that attract each other with the frame support body F6 provided on the upper end of the mask frame F. The upper conveyance support portion 66 has a plurality of magnets forming a magnetic circuit in a vertical plane (in the XZ plane) substantially orthogonal to the in-plane direction (YZ in-plane direction) of the mask frame F. The plural magnets of the upper conveying support portion 66 extend in the Y direction parallel to the conveying direction of the mask frame F.

The upper transport support portion 66 has substantially the same cross-sectional shape as the entire length of the upper transport support portion 66 in the Y direction. The entire length of the upper conveying support portion 66 in the Y direction of the upper conveying support portion 66 is substantially the same in the Y direction as the magnetic circuit formed in the XZ plane with the upper frame support F6 of the mask frame F. Thereby, the upper conveyance support portion 66 and the upper frame support F6 are attracted to each other substantially uniformly in the Y direction by the magnetic circuit.

In a state where the upper conveyance support portion 66 is at a certain distance from the mask frame F in the Z direction, the upper conveyance support portion 66 and the mask frame F attract each other. Thereby, the upper conveyance support part 66 supports the mask frame F. In addition, in a state where the upper frame support F6 of the mask frame F is located in the conveyance path directly below the upper conveyance support portion 66, the upper conveyance support portion 66 and the mask frame F attract each other. Thereby, the upper conveyance support part 66 supports the mask frame F.

In the conveyance path from the storage chamber 50 to the mask chamber 43, the upper conveyance support 66 moves the mask frame F driven by the driving rollers 65a, 65a, etc., in the Y direction. At this time, the upper side of the mask frame F is attracted by the upper conveyance support portion 66 extending along the conveyance path so that it does not incline. That is, the mask frame F is conveyed in a state where the lower end of the mask frame F is supported by the driving rollers 65a and 65a, and the upper side of the mask frame F is supported by the upper conveyance support portion 66.

Hereinafter, the mask replacement procedure of the mask replacement mechanism 100 of the sputtering apparatus 1 of this embodiment will be described.

5A to 5E are schematic plan views showing the sequence of changing the mask of the sputtering apparatus of this embodiment. 6A to 6F are schematic plan views showing the sequence of changing the mask of the sputtering apparatus of this embodiment. 7A to 7E are schematic plan views showing the sequence of changing the mask of the sputtering apparatus of this embodiment.

In the mask replacement mechanism 100 of the sputtering apparatus 1 of this embodiment, the following conditions are assumed when the mask is replaced.

First, as shown in FIG. 5A, the mask frame FA is arranged in the mask chamber 43 of the film forming chamber 4. The mask frame FA is in use. In the film formation chamber 4, sputtering film formation can be performed. At the same time, the mask frame FB is arranged in the mask chamber 43 of the film forming chamber 4B. The mask frame FB is in use. In the film formation chamber 4B, sputtering film formation can be performed.

In this state, as shown in FIG. 5B, the unused mask frame FC to be used in the film forming chamber 4 is carried into the storage chamber 50.

When carrying the mask frame FC into the storage chamber 50, first, the opening and closing portion 58d of the sealing mechanism 58 shown in FIG. 3 is set to an open state. Next, the mask frame FC is supported by the opening/closing part 58d by the extraction support parts 58g and 58g, the extraction upper support parts 58h, 58h, and the support convex part 58k.

At this time, the clamping parts 53a, 54a of the upper conveying support part 56, and the upper stock support part 53, 54 shown in FIG. 3 are in a retracted state. The upper conveyance support part 56 set in the retracted state is located at a position that does not interfere with the movement of the mask frame FC accompanying the swing of the opening and closing part 58d. The holding portions 53a, 54a of the upper stock support portions 53, 54 set in the retracted state are located at positions that do not interfere with the movement of the mask frame FC accompanying the swing of the opening and closing portion 58d. At the same time, the groove supporting bases 51b, 52b of the supporting parts 51, 52 under the stock are in a retracted state. The groove support bases 51b, 52b of the stock lower support portions 51, 52 set in the retracted state are located at positions that do not interfere with the movement of the mask frame FC accompanying the swing of the opening and closing portion 58d.

At the same time, the loading/unloading port 58b is closed by the shutoff valve 58a.

Next, the opening and closing portion 58d is oscillated about the oscillating shaft 58e by the oscillating driving portion 58f shown in FIG. 3. As a result, the opening and closing portion 58d stands upright. The opening and closing portion 58d closes the mask taking-out and filling port 58c. At the same time, as shown in FIG. 5C, the mask frame FC supported by the opening and closing portion 58d is in a vertical state.

In this state, first, the clamping portions 53a, 54a of the upper support portions 53, 54 of the stock are driven to rotate. Thereby, the clamping portions 53a and 54a abut against the positions on both sides of the upper end of the mask frame FC to clamp the mask frame FC. Thereby, the upper support parts 53 and 54 support the positions on both sides of the upper end of the mask frame FC.

Next, the upper extraction support parts 58h, 58h are rotated to release the support of the extraction upper support parts 58h, 58h on the upper end of the mask frame FC.

In this state, the groove supporting bases 51b, 52b of the lower supporting parts 51, 52 are driven upward. Thereby, the lower end of the mask frame FC is placed on the supporting grooves 51a and 52a. At the same time, the lower end of the mask frame FC is separated from the extraction support groove 58ga.

Next, the lower stock support parts 51 and 52 and the upper stock support parts 53, 54 are driven synchronously in the X direction. Thereby, the mask frame FC is moved in the X direction. As shown in FIG. 5D, the mask frame FC becomes a position in the X direction that coincides with the mounting grooves 51Aa, 52Aa closest to the opening and closing portion 58d.

In this state, the groove supporting bases 51b, 52b of the lower supporting parts 51, 52 are driven downward. Thereby, the lower end of the mask frame FC is mounted on the mounting grooves 51Aa and 52Aa. Furthermore, the lower end of the mask frame FC is separated from the supporting grooves 51a and 52a.

Next, the upper conveyance support part 56 is lowered. Thereby, the upper end of the mask frame FC is supported by the clamping parts 56b and 56c. At the same time, the support of the upper support parts 53, 54 of the stock material to the positions on both sides of the upper end of the mask frame FC is released.

Here, the gripping portions 56b and 56c of the upper conveying support portion 56 are located at positions that do not interfere with the removal upper support portion 58h in the X direction and in the direction parallel to the YZ plane.

In this manner, the lower stock support parts 51 and 52, the upper stock support parts 53, 54 and the upper conveyance support part 56 move the mask frame FC in the X direction and change the passage of the mask frame FC. At this time, the storage position (channel) corresponding to the extraction support groove 58ga is vacant.

Next, as shown in FIG. 5E, the unused mask frame FD to be used in the film forming chamber 4B is carried into the storage chamber 50.

The carrying in of the mask frame FD is performed in the same manner as the carrying in of the aforementioned mask frame FC. First, the opening and closing portion 58d of the sealing mechanism 58 shown in FIG. 3 is set to an open state. Next, the mask frame FD is supported by the opening and closing portion 58d by the extraction support portions 58g and 58g, the extraction upper support portions 58h and 58h, and the support protrusion 58k.

Next, the rocking shaft 58e is rocked by the rocking drive unit 58f shown in FIG. 3. Thereby, the mask take-out filling port 58c is closed by the opening and closing portion 58d. At the same time, as shown in FIG. 6A, the mask frame FD is in a vertical state.

Thereby, the mask frame FD is stored in the passage adjacent to the mask frame FC.

As described above, the mask frame FC and the mask frame FD are carried into the storage chamber 50. Furthermore, the mask frame FC and the mask frame FD are converted into channels, as shown in FIG. 6A, stored in a plurality of channels formed by the storage support parts 51 to 54 and the take-out support part 58g, approaching in the X direction Two channels on the side of the sputtering space 41.

Then, the film forming process of sputtering in the film forming chamber 4 is ended.

Next, as shown in FIG. 6B, the used mask frame FA used in the film formation chamber 4 is carried into the storage chamber 50 from the film formation chamber 4.

First, after the film forming process in the film forming chamber 4 is completed, the mask taking-out and filling port 58c is closed by the opening and closing portion 58d shown in FIG. 3. Subsequently, the inside of the storage chamber 50 is set to the same vacuum atmosphere as the inside of the film forming chamber 4 by a high-vacuum exhaust mechanism and a gas introduction mechanism not shown. In addition, the carry-in and carry-out port 58b communicating with the film forming chamber 4 is opened by the shutoff valve 58a.

Next, in the mask chamber 43 of the film forming chamber 4, the mask frame FA supported by the mask alignment mechanism 10 described later is carried out. In the carrying out of the mask frame FA, the upper frame support F6 at the upper end of the mask frame FA is supported by the upper conveyance support portion 66 of the conveyance mechanism 60 shown in FIG. 3. In the carrying out of the mask frame FA, the driving roller 65a is driven by the rotation driving part 65b of the conveying driving part 65. Thereby, the mask frame FA is conveyed along the conveyance path formed by the several conveyance drive part 65 and the upper conveyance support part 66.

The conveyed mask frame FA passes through the carrying-in/outgoing port 58b shown in FIG. 3. Subsequently, the driving roller 55a of the driving support part 55 abuts against the slider F5 at the lower end of the mask frame FA. At the same time, the drive roller 55a is rotationally driven by the rotational drive motor 55e. At this time, the rotation of the drive roller 55a by the rotation drive motor 55e is synchronized with the rotation of the drive roller 65a by the rotation drive portion 65b of the transport drive portion 65. Thereby, the slider F5 of the mask frame FA conveys the mask frame FA to the position corresponding to the mounting groove 51Aa and the mounting groove 52Aa in the Y direction. Thereby, the mask frame FA is placed on the driving rollers 55a, 55a corresponding to the driving grooves 51Ab, 52Ab.

At this time, the upper conveyance support portion 56 and the upper conveyance support portion 66 continuously form a conveyance path. Thereby, the upper end of the mask frame FA is supported by the upper magnet part 56a of the upper conveyance support part 56. Moreover, during the transportation of the mask frame FA, the opening state of the carrying-in/outlet 58b communicating with the film forming chamber 4 is maintained by the shutoff valve 58a. After the mask frame FA passes through the carry-in/out port 58b, the carry-in/out port 58b is closed.

Thereby, as shown in FIG. 6B, the mask frame FA is stored in the passage adjacent to the mask frame FC.

Next, as shown in FIG. 6C, the mask frames FA, FC, and FD are converted to only one channel in the X direction.

First, the upper stock support parts 53, 54 are moved to the opening and closing part 58d side in the X direction. In this state, the upper support parts 53 and 54 simultaneously clamp the positions on both sides of the upper ends of the mask frames FA, FC, and FD.

In this state, the upper conveying support portion 66 is raised to release the support of the upper ends of the mask frames FA and FC.

At the same time, the support of the upper support portion 58h on both sides of the upper end of the mask frame FD is released.

In this state, the groove supporting bases 51b, 52b of the lower supporting parts 51, 52 are driven upward. Thereby, the lower ends of the mask frames FA, FC, and FD are placed on the supporting grooves 51a, 52a at the same time. Thereby, the lower end of the mask frame FA is separated from the driving rollers 55a, 55a corresponding to the driving grooves 51Ab, 52Ab. At the same time, the lower end of the mask frame FC is separated from the mounting grooves 51Aa and 52Aa. At the same time, the lower end of the mask frame FD is separated from the extraction support groove 58ga.

Next, the lower stock support parts 51 and 52 and the upper stock support parts 53, 54 are driven synchronously in the X direction. Thereby, as shown in FIG. 6C, the mask frame FC is moved by one channel in the X direction until it abuts against the drive roller 55a of the drive support part 55. At the same time, the mask frames FA, FD and the mask frame FC are moved by one channel in the X direction.

In this state, the groove supporting bases 51b, 52b of the lower supporting parts 51, 52 are driven downward. Thereby, the lower ends of the mask frames FA and FD are mounted on the mounting grooves 51Aa and 52Aa. At the same time, the lower end of the mask frame FC is placed on the driving rollers 55a, 55a corresponding to the driving grooves 51Ab, 52Ab. Furthermore, the groove support bases 51b, 52b of the lower support portions 51, 52 are continuously lowered. Thereby, the support grooves 51a, 52a are separated from the lower ends of the mask frames FA, FC, and FD.

At this time, the passage which becomes the storage position corresponding to the extraction support groove 58ga and the passage which becomes the storage position on the most back side space 42 side in the X direction are vacated.

Next, as shown in FIG. 6D, from the storage chamber 50, the unused mask frame FC is transferred to the mask chamber 43 of the film forming chamber 4.

First, the upper conveyance support part 56 is lowered. Thereby, the positions on both sides of the upper ends of the mask frames FA, FC, and FD are supported by the clamping portions 56b, 56c. At the same time, the upper frame support body F6 at the upper end of the mask frame FC is supported by the upper magnet portion 56a.

Next, the holding parts 53a, 54a are rotationally driven in the upper support parts 53, 54 of the stock. Thereby, the support of the upper support parts 53, 54 of the stock material on the upper sides of the mask frames FA, FC, FD is released.

In this state, the drive roller 55a and the drive roller 65a are driven. Thereby, the mask frame FC is conveyed from the storage chamber 50 to the mask chamber 43 of the film formation chamber 4 along the conveyance path. At this time, the state where the upper frame support F6 at the upper end of the mask frame FC is supported by the upper magnet portion 56a of the upper conveyance support portion 56 and the upper conveyance support portion 66 shown in FIG. 3 is maintained.

The mask frame FC is passed through the carry-in/outlet 58b, and the mask frame FC is carried out from the storage compartment 50. Subsequently, the load-in/out port 58b is closed by the shutoff valve 58. Thereby, the film formation chamber 4 and the storage chamber 50 are hermetically sealed by the shutoff valve 58a.

The mask frame FC reaches the film forming position in the mask chamber 43 of the film chamber 4. The film forming position of the mask frame FC in the mask chamber 43 of the film forming chamber 4 is aligned by the mask alignment mechanism 10 as described later. The mask frame FC is supported by the mask alignment mechanism 10. After the alignment is completed, the sputtering film formation is started in the film formation chamber 4.

At this time, in the X direction, the passage at the storage position between the mask frame FA and the mask frame FD supported by the stock support parts 51 to 54 is vacated.

Next, as shown in FIG. 6E, the used mask frame FB used in the film formation chamber 4B is carried into the storage chamber 50.

First, after the film formation process of the film formation chamber 4B is completed, the carry-in/outlet 58b communicating with the film formation chamber 4B is opened by the shutoff valve 58a shown in FIG. 3.

At this time, the driving roller 55a of the driving support part 55 is located on the passage vacant between the mask frame FA and the mask frame FD supported by the stock support parts 51-54. Therefore, the drive roller 55a of the drive support part 55 abuts on the slider F5 at the lower end of the mask frame FB carried into the passage.

Next, in the mask room 43 of the film forming chamber 4B, the used mask frame FB supported by the mask alignment mechanism 10 described later is carried out. When the mask frame FB is carried out, the upper frame support F6 at the upper end is supported by the upper transport support portion 66 of the transport mechanism 60 shown in FIG. 3. In this state, when carrying out the mask frame FB, the drive roller 65a is driven by the rotation drive part 65b of the conveyance drive part 65. Thereby, the mask frame FB is conveyed along the conveyance path formed by the several conveyance drive part 65 and the upper conveyance support part 66.

The conveyed mask frame FB passes through the carry-in/out port 58b on the side of the film forming chamber 4B. Subsequently, the drive roller 55a of the drive support part 55 shown in FIG. 3 abuts against the slider F5 at the lower end of the mask frame FB. At the same time, the drive roller 55a is rotationally driven by the rotational drive motor 55e. At this time, the rotation of the drive roller 55a by the rotation drive motor 55e is synchronized with the rotation of the drive roller 65a by the rotation drive portion 65b of the transport drive portion 65. Thereby, the slider F5 that transports the mask frame FB to the mask frame FB can abut against the positions in the Y direction of the mounting groove 51Aa and the mounting groove 52Aa. Take this. The mask frame FB is placed on the drive rollers 55a, 55a corresponding to the drive grooves 51Ab, 52Ab.

Thereby, in the stock support parts 51, 52, 53, 54 shown in FIG. 3, the mask frame FB is stored in the passage between the mask frame FA and the mask frame FD.

At the same time, the upper conveyance support portion 56 and the upper conveyance support portion 66 continuously form a conveyance path. Thereby, the upper end of the mask frame FB is supported by the upper magnet part 56a of the upper conveyance support part 56. Moreover, during the transportation of the mask frame FB, the carry-in/outlet 58b communicating with the film forming chamber 4B is maintained in an open state by the shutoff valve 58a. After the mask frame FB passes through the loading/unloading port 58b, the loading/unloading port 58b is closed.

Next, as shown in FIG. 6F, the mask frames FA, FB, and FD are channel-changed so that the unused mask frame FD to be used in the film formation chamber 4B is transferred from the storage chamber 50 to the film formation chamber 4B. Ready state.

At this time, the carry-in/outlet 58b communicating with the film forming chamber 4B is set to an open state or a closed state by the shutoff valve 58a.

First, the upper transport support part 56 shown in FIG. 3 is raised. Thereby, the state in which the mask frames FA, FB, and FD are supported by the upper ends of the clamping portions 56b, 56c is released. At the same time, the rotating shafts 53c and 54c are rotationally driven to set the angles around the rotating shafts 53c and 54c. Thereby, the upper ends of the mask frames FA, FB, and FD are simultaneously supported by the clamping portions 53a, 54a, respectively.

In this state, similarly to the above-mentioned channel change, the support grooves 51a, 51a and the clamping portions 53a, 54a are moved in the X direction by the stock support portions 51, 52, 53, 54 shown in FIG. In this way, the channel conversion of the mask frames FA, FB, and FD is performed. Here, the position in the X direction is set so as to make the mask frame FD abut against the passage of the drive roller 55a. In this way, channel conversion is performed on the mask frames FA, FB, and FD.

When the channel conversion of the mask frames FA, FB, and FD is completed, take out the channel of the storage position corresponding to the support groove 58a, and the storage place 51A, 52A that is closest to the sputtering space 41 in the X direction 1 channel of the location is free. At this time, the mask frame FA is stored in the channel closest to the storage position on the side of the back space 42 in the X direction. Therefore, the channel of the storage position closest to the back space 42 side in the X direction is not vacated.

Next, when the passage change of the mask frames FA, FB, and FC is completed, the upper conveying support portion 56 is lowered to a state where the upper ends of the mask frames FA, FB, and FD are supported by the clamping portions 56b, 56c. At the same time, the clamping portions 53a and 54a are rotated and driven around the rotation shafts 53c and 54c to set the angle. Thereby, the support of the upper ends of the mask frames FA, FB, and FD by the clamping portions 53a and 54a is released. Thereby, the upper frame support F6 of the upper end of the mask frame FD is supported by the upper magnet part 56a of the conveyance upper support part 56.

Next, as shown in FIG. 7A, the unused mask frame FD is transferred from the storage chamber 50 to the mask chamber 43 of the film forming chamber 4B.

First, the carry-in and carry-out port 58b communicating with the film forming chamber 4B is opened or maintained by the shutoff valve 58a.

Here, the upper transport support part 56 shown in FIG. 3 descends. Thereby, the upper frame support body F6 at the upper end of the mask frame FD is supported by the upper magnet part 56a. In addition, the support of the upper end of the mask frame FD by the clamping portions 53a and 54a is released.

In this state, the drive roller 55a and the drive roller 65a are driven. Thereby, the mask frame FD is conveyed along the conveyance path from the storage chamber 50 to the mask chamber 43 of the film formation chamber 4B. At this time, the state where the upper frame support F6 at the upper end of the mask frame FD is supported by the upper magnet part 56a of the upper conveyance support part 56 and the upper conveyance support part 66 shown in FIG. 3 is maintained.

The mask frame FD is carried out from the storage chamber 50 through the carry-in and carry-out port 58b. Subsequently, the carry-in and carry-out port 58b is closed by the shutoff valve 58a. Thereby, the film formation chamber 4B and the storage chamber 50 are hermetically sealed by the shutoff valve 58a.

The mask frame FD reaches the film forming position of the mask chamber 43 of the film chamber 4B. The film forming position of the mask frame FD in the mask chamber 43 of the film forming chamber 4B is aligned by the mask alignment mechanism 10 as described later. The mask frame FD is supported by the mask alignment mechanism 10. After the alignment is completed, the sputtering film formation is started in the film formation chamber 4B.

At this time, the channel on the side of the sputtering space 41 is completely vacant than the mask frame FB supported by the stock support parts 51, 52, 53, 54.

Next, as shown in FIG. 7B, the passage is changed to prepare the used mask frame FB from the storage chamber 50 to be carried out to the outside.

In carrying out the mask frame FB, first, the rotating shafts 53c and 54c shown in FIG. 3 are rotationally driven. Thereby, the angle setting of the clamping parts 53a, 54a around the rotation shafts 53c, 54c is performed. Thereby, the upper ends of the mask frames FA and FB are simultaneously supported by the clamping portions 53a and 54a, respectively. At the same time, the upper conveyance support 56 is raised to a retracted state.

Next, similar to the above-mentioned channel change, the supporting grooves 51a, 52a are raised in the Z direction by the stock supporting parts 51, 52, 53, 54. Subsequently, the support grooves 51a, 52a are moved toward the sputtering space 41 in the X direction by the stock support portions 51, 52, 53, 54. Furthermore, the support grooves 51a, 52a are lowered in the Z direction by the stock support portions 51, 52, 53, 54. At the same time, in synchronization with the supporting grooves 51a and 52a, the clamping portions 53a and 54a are moved toward the sputtering space 41 in the X direction. As a result, the mask frames FA and FB are moved in the X direction in a direction approaching the opening and closing portion 58d in the closed state. In this way, the mask frames FA and FB are converted to channels by the stock support parts 51, 52, 53, 54. At this time, the mask frame FB is placed on the extraction support groove 58ga of the extraction support part 58g. At the same time, the position of the mask frame FB in the X direction is set in such a manner that the mask frame FB is placed on the placement grooves 51Aa, 52Aa on the side closest to the opening and closing portion 58d in the X direction.

At this time, in the X direction, the mask frame FA is located in the channel of the storage position adjacent to the mask frame FB.

Next, the support pieces 58h2 of the upper extraction support portion 58h located on the left and right of the mask frame FB are respectively rotated inwardly around the Z axis 58h1. Thereby, the upper side of the mask frame FB is supported by the support piece 58h2.

Next, the upper transport support part 56 shown in FIG. 3 is lowered. Thereby, the upper side of the mask frame FA is supported by the clamping parts 56b and 56c. Thereby, the mask frame FA is not inclined.

Next, the clamping parts 53a, 54a of the upper support parts 53, 54 shown in FIG. 3 are rotated. Thereby, the clamping parts 53a, 54a are in a retracted state. Thereby, the support of the upper sides of the mask frames FA and FB by the clamping portions 53a and 54a is released.

In this state, the opening and closing portion 58d is rocked around the rocking shaft 58e by the rocking drive portion 58f shown in FIG. 3. Thereby, as shown in FIG. 7C, the mask extraction and filling port 58 is set to an open state. At this time, the state in which the mask frame FB is supported by the opening/closing part 58d by the extraction support parts 58g, 58g and the extraction upper support parts 58h, 58h is maintained.

Next, the removal upper support parts 58h, 58h are rotated outward about the Z axis 58h1. Set the state where the support of the mask frame FB by the upper support portions 58h and 58h is removed. Subsequently, the mask frame FB is removed from the opening and closing portion 58d and carried out to the outside.

Next, the rocking shaft 58e is rocked by the rocking drive unit 58f shown in FIG. 3. Thereby, it is set as the vertical state in which the opening-closing part 58d was erected. Thereby, the mask taking-out and filling port 58c is hermetically sealed by the opening and closing portion 58d.

Furthermore, similarly to the above-mentioned mask frame FB, the passage is changed to prepare the mask frame FA to be taken out from the storage chamber 50 to the outside.

In carrying out the mask frame FA, first, the rotating shafts 53c and 54c shown in FIG. 3 are rotationally driven. Thereby, the angle setting of the clamping parts 53a, 54a around the rotation shafts 53c, 54c is performed. Thereby, the upper end of the mask frame FA is simultaneously supported by the clamping parts 53a, 54a, respectively. At the same time, the upper conveyance support 56 is raised to a retracted state.

Next, similar to the passage change of the mask frame FB described above, the support grooves 51a, 52a are raised in the Z direction by the stock support portions 51, 52, 53, 54. Subsequently, the support grooves 51a, 52a are moved toward the sputtering space 41 in the X direction by the stock support portions 51, 52, 53, 54. Furthermore, the support grooves 51a, 52a are lowered in the Z direction by the stock support portions 51, 52, 53, 54. At the same time, in synchronization with the supporting grooves 51a and 52a, the clamping portions 53a and 54a are moved toward the sputtering space 41 in the X direction. As a result, the mask frame FA is moved in a direction approaching the opening and closing portion 58d in the closed state. In this way, as shown in FIG. 7D, the mask frame FA is placed on the extraction support groove 58ga of the extraction support part 58g by the stock support parts 51, 52, 53, 54. In this way, the position of the mask frame FA in the X direction is set. Thereby, the channel conversion is performed on the mask frame FA.

Then, the support pieces 58h2 of the upper extraction support portion 58h located on the left and right sides of the mask frame FA are respectively rotated inwardly around the Z axis 58h1. Thereby, the upper end of the mask frame FA is supported by the supporting piece 58h2.

Next, the clamping parts 53a, 54a of the upper support parts 53, 54 shown in FIG. 3 are rotated. Thereby, the clamping parts 53a, 54a are in a retracted state. Thereby, the support of the upper side of the mask frame FA by the clamping portions 53a and 54a is released.

In this state, the opening and closing portion 58d is rocked around the rocking shaft 58e by the rocking drive portion 58f shown in FIG. 3. Thereby, as shown in FIG. 7E, the mask extraction and filling port 58 is set to an open state. At this time, the state in which the mask frame FA is supported by the opening/closing portion 58d by the extraction support portions 58g and 58g and the extraction upper support portions 58h and 58h is maintained.

Next, the removal upper support parts 58h, 58h are rotated outward about the Z axis 58h1. It is set to release the support of the mask frame FA by the upper support parts 58h and 58h. Subsequently, the mask frame FA is removed from the opening and closing portion 58d and carried out to the outside.

Thus, the mask replacement sequence of the mask replacement mechanism 100 is ended.

In the sputtering apparatus 1 of this embodiment, the mask replacement mechanism 100 stores a plurality of unused mask frames F. Furthermore, in the sputtering apparatus 1 of the present embodiment, one is selected from a plurality of unused mask frames F stored as needed. In the sputtering apparatus 1 of this embodiment, the selected unused mask frame F is transported to the mask chamber 43 which is the film forming position. Thereby, in the sputtering apparatus 1 of this embodiment, the replacement of the mask for the film formation chamber (chamber) 4 and the replacement of the mask for the film formation chamber (chamber) 4B can be automated. In the sputtering apparatus 1 of the present embodiment, a plurality of masks of the film forming chamber 4 can be replaced continuously. In the sputtering apparatus 1 of this embodiment, it is possible to continuously replace a plurality of masks of the film forming chamber 4B. Moreover, in the sputtering apparatus 1 of this embodiment, the mask replacement for the film formation chamber 4 and the mask replacement for the film formation chamber 4B can be continuously performed. Thereby, in the sputtering apparatus 1 of this embodiment, the time required for mask replacement can be shortened.

In the sputtering apparatus 1 of this embodiment, these masks can be replaced without exposing the film forming chamber 4 and the film forming chamber 4B to the atmosphere. Thereby, in the sputtering apparatus 1 of this embodiment, the particles etc. which adhere to the mask frame F, the board|substrate S, etc. in the inside of the film formation chamber 4 and the film formation chamber 4B due to mask replacement can be reduced. At the same time, in the sputtering apparatus 1 of the present embodiment, it is possible to reduce the adverse effects on the internal surfaces of the film forming chamber 4 and the film forming chamber 4B such as the cathode when exposed to the atmosphere. Thereby, the film forming quality of the sputtering device 1 can be improved.

In addition, in the sputtering apparatus 1 of this embodiment, the used mask frame F is stored in the storage chamber 50. Furthermore, in the sputtering apparatus 1 of this embodiment, the time point when the storage chamber 50 can be opened to the outside can be selected, and the used mask frame F can be taken out of the storage chamber 50 to the outside of the apparatus. That is, in the sputtering apparatus 1 of this embodiment, it is possible to select the time when the carry-in and carry-out port 58b is closed during the processing of the film forming chambers 4 and 4B, and the used mask frame F can be selected from the storage chamber 50 Take out to the outside of the device. Thereby, the operation time of the sputtering apparatus 1 of this embodiment can be shortened.

In the sputtering apparatus 1 of the present embodiment, it is configured to support the mask frame F in such a way that the upper conveying support parts 56, 66 and the upper frame support F6 are attracted to each other by a magnetic circuit. Thereby, in the sputtering apparatus 1 of this embodiment, unintended movement, such as the vibration of the mask frame F, does not generate|occur|produce during conveyance. At the same time, in the sputtering device 1 of the present embodiment, it is possible to prevent dust, particles, etc. from being generated at a position above the conveying path of the mask frame F. Thereby, in the sputtering apparatus 1 of this embodiment, the possibility of dust and particles falling onto the mask frame F can be reduced. Therefore, in the sputtering apparatus 1 of this embodiment, the film formation quality is not reduced. Moreover, in the sputtering apparatus 1 of this embodiment, the mask frame F can be conveyed stably.

In the sputtering apparatus 1 of the present embodiment, the storage support parts 51, 52, 53, 54 change the channels of the plurality of mask frames F stored. In the sputtering apparatus 1 of this embodiment, one can be selected from a plurality of mask frames F and transported to the film forming chambers 4 and 4B. Therefore, in the sputtering apparatus 1 of this embodiment, when different types of films are formed on a plurality of types of substrates S, the specific mask frame F can be transported to the film forming position in accordance with each setting condition.

Moreover, in the sputtering apparatus 1 of this embodiment, the mask replacement can be automated. Thereby, in the sputtering apparatus 1 of this embodiment, different types of mask frames F can be sequentially replaced corresponding to different types of substrates S. In the sputtering apparatus 1 of this embodiment, it is possible to continuously perform the film forming process using different types of mask frames F corresponding to different types of substrates S.

In the sputtering apparatus 1 of the present embodiment, regarding the transport or channel change of the mask frame F, the drive systems located on the upper side of the mask frame F are the upper storage support parts 53, 54 and the upper conveyance support 56 and take-out Upper support part 58h. The upper support parts 53, 54, the upper transport support part 56 and the upper take-out support part 58 h are all located outside the storage chamber 50. In addition, the upper stock support portions 53, 54, the upper conveyance support portion 56 and the upper take-out support portion 58h do not have the function of moving the mask frame F in the vertical direction that supports the weight of the mask frame F, which is a heavy object. Furthermore, the mask frame F, which is the heavy object, is conveyed in the chambers 4 and 50 by the driving roller 55a of the driving support part 55 located lower than the mask frame F. That is, in the sputtering apparatus 1 of this embodiment, the upper stock support parts 53, 54, the upper transport support part 56, and the upper take-out support part 58h located on the upper side of the mask frame F only need to use a small output motor . At the same time, the lower side of the mask frame F is driven by the driving support part 55 located on the lower side of the mask frame F. With these driving systems, in the sputtering apparatus 1 of this embodiment, the mask can be replaced. Thereby, in the sputtering apparatus 1 of this embodiment, it is not necessary to enlarge the drive system inside the chamber 4, 50, and it is set as high output. Therefore, in the sputtering apparatus 1 of this embodiment, the chambers 4 and 50 can be space-saving. Furthermore, in the sputtering apparatus 1 of this embodiment, the entire apparatus can be space-saving.

Hereinafter, the alignment of the mask frame of this embodiment will be described.

FIG. 8 is a perspective view showing the mask aligning mechanism of the mask chamber of the sputtering apparatus of this embodiment.

As shown in Figure 1, the mask aligning mechanism 10 in the mask chamber 43 can support the mask frame F shown in Fig. 2 in two directions parallel to the face of the mask frame F and with the mask frame The three axial directions orthogonal to the plane of F and the six degrees of freedom in the three rotational directions around the three axial axes are aligned with the mask frame F.

Specifically, as shown in FIG. 8, the mask alignment mechanism 10 includes: support alignment portions 11, 12 that support the lower end positions of the mask frame F; upper alignment portions 13, 14, etc. The upper side position of the mask frame F can be set in a direction orthogonal to the surface of the mask frame F, and the mask frame F can be supported and released; and the upper support parts 16, 16.

In the mask room 43, the film forming position is set such that the mask frame F shown in FIG. 2 is substantially parallel to the YZ plane. In addition, as the mask alignment mechanism 10, as shown in FIG. 8, at both ends of the lower end of the mask frame F, that is, on the lower side of the Z direction and the two ends of the Y direction, there are respectively provided with cards used for alignment. Joint part F1 and clamping part F2.

Fig. 9 is a perspective view showing the supporting alignment portion of the sputtering device of this embodiment. FIG. 10 is a perspective view showing the supporting alignment part of the sputtering device of this embodiment.

The support alignment portion 11 has a convex portion 11a, an X drive portion 11X, a Y drive portion 11Y, and a Z drive portion 11Z. The convex portion 11a is engaged with an engaging portion F1 provided on the mask frame F described later. The convex portion 11a is provided in a state where the top of the supporting alignment portion 11 protrudes upward. The X driving portion 11X can be driven when the position of the convex portion 11a is adjusted in a substantially horizontal direction (X direction) perpendicular to the mask surface. The Y driving part 11Y can be driven when the convex part 11a is positioned in a substantially horizontal direction (Y direction) parallel to the mask surface. The Z driving part 11Z can be driven when the convex part 11a is positionally adjusted in the vertical direction (Z direction).

The supporting alignment portion 11 is located at the end of the mask frame F at the film forming position of the mask chamber 43 shown in FIG. 1. In the support aligning part 11, as shown in FIG. 8, the position of the convex part 11a is set so that it may overlap with the conveyance path of the mask frame F defined by the several conveyance mechanism 60.

Specifically, the position of the support alignment portion 11 in the XY direction is set such that the position of the convex portion 11a in the XY direction is substantially the same on the line connecting the driving roller 65a of the conveying driving portion 65 provided on the conveying path.

In addition, as the position of the convex portion 11a in the Z direction, as will be described later, in a state where the convex portion 11a is lowered, the upper side of the convex portion 11a is lower than a plurality of conveying drive portions 65 connected to the conveying path. Line of drive roller 65a. At the same time, in the alignment state (film formation state) in which the convex portion 11a is raised, the upper side of the convex portion 11a is made higher than the line connecting the driving rollers 65a of the plurality of conveying driving portions 65 provided on the conveying path.

As shown in FIG. 8 and FIG. 9, the convex portion 11a is provided in a state of urging the base portion 11b upward. The upper side of the convex portion 11a has a spherical or hemispherical shape. The convex portion 11a is made of metal, for example, and can support a heavy mask frame F.

As shown in FIGS. 8 and 9, the X drive unit 11X has a motor 11Xa, a rotating shaft 11Xb, an X position restriction portion 11Xc, and a restriction portion 11Xd. The motor 11Xa is composed of a stepping motor. The rotating shaft 11Xb extends in the X direction and is rotationally driven by the motor 11Xa. The X position restricting portion 11Xc is screwed to the rotating shaft 11Xb and is relatively movable in the axial direction of the rotating shaft 11Xb. The restriction portion 11Xd restricts the movement of the X position restriction portion 11Xc and the motor 11Xa.

In the X driving portion 11X, the rotation shaft 11Xb is rotated by the motor 11Xa, so that the base portion 11b connected to the front end of the rotation shaft 11Xb can rotate in a state where the front end of the rotation shaft 11Xb can rotate relative to the X position restriction portion 11Xc moves in the X direction. The movement direction of the base 11b is restricted by the restricting portion 11Xd.

The lower end of the X position restricting portion 11Xc is connected and fixed to a substantially flat horizontal plate 11c. On the horizontal plate 11c, the weight of the base 11b is supported by the horizontal plate 11c, and the base 11b can move with respect to the horizontal plate 11c.

As shown in FIGS. 8 and 9, the Y drive unit 11Y has a motor 11Ya, a rotating shaft 11Yb, a Y position restriction portion 11Yc, and a restriction portion 11Yd. The motor 11Ya is constituted by a stepping motor. The rotating shaft 11Yb extends in the Y direction and is rotationally driven by the motor 11Ya. The Y position restricting portion 11Yc is screwed to the rotating shaft 11Yb and can move relatively along the axial direction of the rotating shaft 11Yb. The restriction portion 11Yd restricts the movement of the Y position restriction portion 11Yc and the motor 11Ya.

In the Y drive portion 11Y, the rotation shaft 11Yb is rotated by the motor 11Ya, so that the base 11d connected to the front end of the rotation shaft 11Yb in a state where the front end of the rotation shaft 11Yb can be rotated, has a Y position restriction portion 11Yc moves in the Y direction. The movement direction of the base 11d is restricted by the restricting portion 11Yd.

The upper end of the Y position restricting portion 11Yc is connected and fixed to a substantially flat horizontal plate 11c. On the horizontal plate 11c, the base 11d supports the weight of the components arranged on the horizontal plate 11c, and the horizontal plate 11c can move with respect to the base 11d.

As shown in FIGS. 8 and 9, the Z drive unit 11Z has a motor 11Za, a rotating shaft 11Zb, a Z position restriction portion 11Zc, and a restriction portion 11Zd. The motor 11Za is composed of a stepping motor or a servo motor. The rotating shaft 11Zb extends in the Z direction and is rotationally driven by the motor 11Za. The Z position restricting portion 11Zc is screwed to the rotating shaft 11Zb and can move relatively along the axial direction of the rotating shaft 11Zb. The restriction portion 11Zd restricts the movement of the Z position restriction portion 11Zc and the motor 11Za.

In the Z driving part 11Z, the rotation shaft 11Zb is rotated by the motor 11Za, so that the base 11d connected to the front end of the rotation shaft 11Zb in a state where the front end of the rotation shaft 11Zb can be rotated is restricted relative to the Z position The portion 11Zc moves in the Z direction. The movement direction of the base 11d is restricted by the restricting portion 11Zd.

The Z position restriction portion 11Zc is the bottom of the film formation chamber (chamber) 4. The supporting alignment portion 11 can adjust the position of the convex portion 11 a with the degree of freedom in the XYZ direction, and is fixed to the bottom of the film forming chamber (chamber) 4.

In the support alignment portion 11, the motor 11Xa and the motor 11Ya are both arranged in the chamber 4 and located below the mask frame F which is the film forming area. In this structure, since neither the X drive portion 11X nor the Y drive portion 11Y has the function of supporting a weight, that is, the weight of the mask frame F while driving, but only performs horizontal alignment, so only a small output motor is used. That is, it can be arranged in the chamber 4.

Therefore, in the X drive unit 11X and the Y drive unit 11Y, since both the motor 11Xa and the motor 11Ya are constituted by stepping motors, the drive controllability can be improved. At the same time, the X driving portion 11X and the Y driving portion 11Y can be arranged in close positions relative to the driven object, that is, the mask frame F inside the cavity 4. Therefore, compared with a case where a driving mechanism equipped with a shaft, an arm, etc. is used, for example, a case where it is driven at a distance from the outside of the chamber 4, the X driving section 11X and the Y driving section 11Y can perform the mask frame F with high accuracy. The location setting.

In addition, since the Z driving part 11Z supports a heavy object, that is, the weight of the mask frame F while driving, it must be a large motor with high output. At the same time, it must be arranged outside the chamber 4 without space-related restrictions.

The support alignment portion 12 has a convex portion 12a, an X drive portion 12X, a Y drive portion 12Y, and a Z drive portion 12Z. The convex portion 12a is engaged with an engaging portion F2 provided on the mask frame F described later. The convex portion 12a is provided in a state where the top of the supporting alignment portion 12 protrudes upward. The X driving portion 12X can be driven when the convex portion 12a is adjusted in a substantially horizontal direction (X direction) perpendicular to the mask surface. The Y driving portion 12Y can be driven when the convex portion 12a is positioned in a substantially horizontal direction (Y direction) parallel to the mask surface. The Z driving part 12Z can be driven when the convex part 12a is positionally adjusted in the vertical direction (Z direction).

The supporting alignment portion 12 is located at the end of the mask frame F in the film forming position in the mask chamber 43 shown in FIG. As shown in FIG. 8, the arrangement of the supporting alignment portion 12 in the XY direction is set such that the conveying path of the mask frame F defined by the arrangement of the plurality of conveying mechanisms 60 overlaps with the position of the convex portion 12a in the XY direction.

As the specific position of the supporting alignment part 12 in the XY direction, the position of the convex part 12a in the XY direction on the straight line connecting the driving roller 65a among the plurality of conveying driving parts 65 provided on the conveying path is set substantially the same .

In addition, as the position of the convex portion 12a in the Z direction, as described later, in the state where the convex portion 12a is lowered, the upper side of the convex portion 12a is connected to the driving rollers of the plurality of conveying driving portions 65 provided on the conveying path The lower position of the 65a line. At the same time, in the aligned state (film formation state) in which the convex portion 12a is raised, the upper side of the convex portion 12a is higher than the line connecting the driving rollers 65a of the plurality of conveying driving portions 65 provided on the conveying path.

The convex part 12a has the same structure as the convex part 11a, and as shown in FIG. 8, FIG. 10, it is provided in the state which urged the base part 12b upwards. The upper side of the convex portion 12a has a spherical or hemispherical shape. The convex portion 12a is made of metal, for example, and can support a heavy mask frame F.

As shown in Figs. 8 and 10, the X drive unit 12X has a motor 12Xa, a rotating shaft 12Xb, an X position restriction portion 12Xc, and a restriction portion 12Xd. The motor 12Xa is composed of a stepping motor. The rotating shaft 12Xb extends in the X direction and is rotationally driven by the motor 12Xa. The X position restricting portion 12Xc is screwed to the rotating shaft 12Xb and can move relatively along the axial direction of the rotating shaft 12Xb. The restriction portion 12Xd restricts the movement of the X position restriction portion 12Xc and the motor 12Xa.

In the X driving portion 12X, the rotation shaft 12Xb is rotated by the motor 12Xa, so that the base portion 12b connected to the front end of the rotation shaft 12Xb in a state where the front end of the rotation shaft 12Xb is rotatable relative to the X position restricting portion 12Xc Move in the X direction. The movement direction of the base 12b is restricted by the restricting portion 12Xd.

The lower end of the X position restricting portion 12Xc is connected and fixed to a substantially flat horizontal plate 12c. On the horizontal plate 12c, the weight of the base 12b is supported by the horizontal plate 12c, and the base 12b can move with respect to the horizontal plate 12c.

As shown in FIGS. 8 and 10, the Y drive unit 12Y includes a motor 12Ya, a rotating shaft 12Yb, a Y position restriction portion 12Yc, and a restriction portion 12Yd. The motor 12Ya is composed of a stepping motor. The rotating shaft 12Yb extends in the Y direction and is rotationally driven by the motor 12Ya. The Y position restricting portion 12Yc is screwed to the rotating shaft 12Yb and can move relatively along the axis of the rotating shaft 12Yb. The restriction portion 12Yd restricts the movement of the Y position restriction portion 12Yc and the motor 12Ya.

In the Y driving portion 12Y, the rotation shaft 12Yb is rotated by the motor 12Ya, so that the base 12d connected to the front end of the rotation shaft 12Yb in a state where the front end of the rotation shaft 12Yb is rotatable relative to the Y position restriction portion 12Yc moves in the Y direction. The movement direction of the base 12d is restricted by the restricting portion 12Yd.

The upper end of the Y position restricting portion 12Yc is connected and fixed to a substantially flat horizontal plate 12c. On the base 12d, the base 12d supports the weight of the components disposed on the horizontal plate 12c, and the horizontal plate 12c can move with respect to the base 12d.

As shown in FIGS. 8 and 10, the Z drive unit 12Z includes a motor 12Za, a rotating shaft 12Zb, a Z position restriction portion 12Zc, and a restriction portion 12Zd. The motor 12Za is composed of a stepping motor or a servo motor. The rotating shaft 12Zb extends in the Z direction and is rotationally driven by the motor 12Za. The Z position restricting portion 12Zc is screwed to the rotating shaft 12Zb and can move relatively along the axis of the rotating shaft 12Zb. The restriction portion 12Zd restricts the movement of the Z position restriction portion 12Zc and the motor 12Za.

In the Z driving part 12Z, the rotation shaft 12Zb is rotated by the motor 12Za, so that the base 12d connected to the front end of the rotation shaft 12Zb in a state where the front end of the rotation shaft 12Zb can rotate is restricted relative to the Z position The part 12Zc moves in the Z direction. The movement direction of the base 12d is restricted by the restricting portion 12Zd.

The Z position restriction portion 12Zc is the bottom of the film formation chamber (chamber) 4. The supporting alignment portion 12 can adjust the position of the convex portion 12a with the degree of freedom in the XYZ direction, and is fixed to the bottom of the film forming chamber (chamber) 4.

In the support alignment part 12, the motor 12Xa and the motor 12Ya are both arranged in the chamber 4, and are located below the mask frame F which is the film formation area. In this structure, since neither the X drive portion 12X nor the Y drive portion 12Y has the function of supporting a weight, that is, the weight of the mask frame F while driving, but only performs horizontal alignment, so only a small output motor is used. That is, it can be arranged in the chamber 4.

Therefore, in the X drive unit 12X and the Y drive unit 12Y, since both the motor 12Xa and the motor 12Ya are configured by stepping motors, the drive controllability can be improved. At the same time, the X driving part 12X and the Y driving part 12Y can be arranged in close proximity to the mask frame F, which is the driven object, in the chamber 4. Therefore, compared with the case of using a driving mechanism equipped with a shaft, an arm, etc., such as a case where it is driven at a distance from the outside of the chamber 4, the X driving part 12X and the Y driving part 12Y can perform the mask frame F with high accuracy. The setting of the position.

In addition, since the Z driving part 12Z supports the weight of the shield frame F while supporting the weight, it must be a large motor with high output. At the same time, it must be arranged outside the chamber 4 without space-related restrictions.

The supporting aligning portion 11 and the supporting aligning portion 12 have substantially the same structure, and are arranged at both ends of the film forming position of the mask frame F in the left-right direction.

Fig. 11 is a perspective view showing the upper alignment portion of the sputtering device of this embodiment. Fig. 12 is a perspective view showing the upper alignment portion of the sputtering device of this embodiment.

The upper alignment portion 13 has a clamping portion 13A, an X drive portion 13X, and a rotation drive portion 13R. The clamping portion 13A can clamp and buckle the end of the upper end of the mask frame F in the left-right direction (Y direction), that is, the part near the corner. The X driving part 13X can be driven when driving in a substantially horizontal direction (X direction) perpendicular to the mask surface to position the clamping part 13A. The rotation driving portion 13R can rotate the clamping portion 13A in the YZ plane substantially parallel to the mask surface.

As shown in FIG. 8 and FIG. 11, the clamping part 13A has clamping pieces 13Aa, 13Ab, and a base part 13Ac. The clamping pieces 13Aa and 13Ab abut each of the front and back of the mask frame F at the end of the mask frame F. The base 13Ac maintains the clamping pieces 13Aa and 13Ab in a parallel state, and sets the distance between the clamping pieces 13Aa and 13Ab to be approximately the same as the thickness of the mask frame F. The base ends of the clamping pieces 13Aa and 13Ab are fixed to the base 13Ac.

In addition, in the base portion 13Ac of the clamping portion 13A, the positions on the opposite side of the convex portions 13Ad, 13Ae in the extending direction of the clamping pieces 13Aa, 13Ab intersect with the clamping pieces 13Aa, 13Ab substantially orthogonally The front end of the rotating shaft 13B is connected to the ground.

At the ends of the clamping pieces 13Aa, 13Ab, protrusions 13Ad, 13Ae are provided so as to be located on the inner sides facing each other.

The convex portions 13Ad and 13Ae urge the direction of approaching each other so as not to shift the clamping pieces 13Aa and 13Ab from the mask frame F in the X direction when the clamping pieces 13Aa and 13Ab clamp the mask frame F. In addition, the convex portions 13Ad and 13Ae urge the direction of approaching each other as follows: when the clamping pieces 13Aa, 13Ab clamp the mask frame F, and the clamping pieces 13Aa, 13Ab and the mask frame F deviate in the X direction When moving, the mask frame F can be maintained between the clamping piece 13Aa and the clamping piece 13Ab so as to absorb the deviation.

The convex portions 13Ad and 13Ae each have a spherical or hemispherical shape protruding in the direction approaching each other, and are made of metal, for example, and can support the weight of the mask frame F.

The rotating shaft 13B extends in a substantially horizontal direction (X direction) perpendicular to the mask surface, and can rotate around the axis of the rotating shaft 13B. In addition, the rotating shaft 13B can advance and retreat in the axial direction (X direction).

At the front end of the rotating shaft 13B, the base portion 13Ac of the fixed clamping portion 13A is connected in a radially protruding manner. The base end of the rotating shaft 13B is connected to the motor 13Ra of the rotating drive part 13R, and can be driven around the axis of the rotating shaft 13B.

The motor 13Ra of the rotation driving portion 13R is fixed to a flat plate portion 13C extending parallel to the mask surface. By driving the X position restricting portion 13Xc with respect to the flat plate portion 13C by the X driving portion 13X, the rotating shaft 13B and the clamping portion 13A can be driven in the axial direction of the rotating shaft 13B.

As shown in FIGS. 8 and 11, the X drive unit 13X has a motor 13Xa, a rotating shaft 13Xb, an X position restriction portion 13Xc, and a restriction portion 13Xd. The motor 13Xa is constituted by a stepping motor. The rotating shaft 13Xb extends in the X direction and is rotationally driven by the motor 13Xa. The X position restricting portion 13Xc is screwed to the rotating shaft 13Xb and is relatively movable along the axial direction of the rotating shaft 13Xb. The restriction portion 13Xd restricts the movement of the X position restriction portion 13Xc and the motor 13Xa in the X direction.

In the X drive portion 13X, the rotation shaft 13Xb is rotated by the motor 13Xa, so that the X position restriction portion 13Xc connected to the proximal end of the rotation shaft 13Xb moves in the X direction relative to the flat plate portion 13C. The movement direction of the X position restriction portion 13Xc is restricted by the restriction portion 13Xd.

The flat plate portion 13C is a side portion of the film forming chamber (chamber) 4. The upper alignment portion 13 can adjust the position of the clamping portion 13A with the degree of freedom in the X direction, and is fixed to the side of the film forming chamber (chamber) 4.

In the upper alignment part 13, first, the rotation shaft 13B is driven around the axis by the motor 13Ra of the rotation driving part 13R. Thereby, the angular position around the axis of the rotating shaft 13B is set so that the clamping portion 13A becomes a position that does not interfere with the mask frame F set as the film forming position.

Next, as shown in FIG. 11, the rotation shaft 13Xb is rotated by the motor 13Xa of the X drive part 13X, and the X position control part 13Xc is moved to the X direction. Thereby, the rotating shaft 13B is driven in the axial direction to set the position of the clamping portion 13A in the X direction, and the upper end of the mask frame F is located between the clamping pieces 13Aa and 13Ab.

In this state, as shown in FIG. 12, the rotation shaft 13B is rotated around the axis by the motor 13Ra of the rotation driving portion 13R, thereby, the upper end of the mask frame F is located at the clamping piece 13Aa of the clamping portion 13A, The way between 13Ab is to set the angular position of the clamping portion 13A around the axis of the rotating shaft 13B. Thereby, the convex parts 13Ad and 13Ae abut on the front and back of the mask frame F, respectively, and the mask frame F is clamped by the clamping pieces 13Aa and 13Ab.

In this state, the rotating shaft 13Xb can be rotated by the motor 13Xa of the X driving part 13X to move the X position limiting part 13Xc in the X direction, thereby driving the rotating shaft 13B in the axial direction to finely adjust the upper end of the mask frame F Position in the X direction.

In the upper alignment part 13, the motor 13Ra of the rotation driving part 13R is arranged outside the film forming chamber (chamber) 4, and the motor 13Xa of the X driving part 13X is arranged in the film forming chamber (chamber) 4 Outside position. Therefore, it is possible to adjust the angular position of the clamping portion 13A around the axis of the rotating shaft 13B from the outside of the film forming chamber (chamber) 4. In addition, the position adjustment of the holding portion 13A in the axial direction of the rotating shaft 13B may be performed from the outer side of the film forming chamber (chamber) 4. Thereby, the dust generated in the chamber 4 can be prevented from spreading.

The upper aligning parts 13, 14 are arranged so as to be aligned in the left-right direction, that is, the Y direction. As shown in FIG. 8, the upper alignment portions 13 and 14 are provided to have a substantially symmetrical structure with respect to the center line (Z direction, gravity direction) of the mask frame F. Therefore, the upper aligning portion 14 only describes symbols below, and also has a configuration hidden in the figure.

The upper alignment portion 14 is provided with a clamping portion 14A, an X drive portion 14X, and a rotation drive portion 14R. The clamping part 14A can clamp and buckle the end of the upper end of the mask frame F in the left-right direction (Y direction), that is, the part near the corner. The X driving part 14X can be driven when driving in a substantially horizontal direction (X direction) perpendicular to the mask surface to position the clamping part 14A. The rotation driving part 14R can make the clamping part 14A rotate in the YZ plane substantially parallel to the mask surface.

As shown in FIG. 8, the clamping part 14A has clamping pieces 14Aa, 14Ab, and base part 14Ac. The clamping pieces 14Aa and 14Ab abut each of the front and back of the mask frame F at the end of the mask frame F. The base 14Ac maintains the clamping pieces 14Aa and 14Ab in a parallel state, and sets the distance between the clamping pieces 14Aa and 14Ab to be substantially the same as the thickness of the mask frame F. The base ends of the clamping pieces 14Aa and 14Ab are fixed to the base 14Ac.

In addition, in the base portion 14Ac of the clamping portion 14A, the positions opposite to the convex portions 14Ad, 14Ae in the extending direction of the clamping pieces 14Aa, 14Ab intersect with the clamping pieces 14Aa, 14Ab substantially orthogonally The front end of the rotating shaft 14B is connected to the ground.

At the ends of the clamping pieces 14Aa, 14Ab, convex portions 14Ad, 14Ae are provided so as to be located on the inner side surfaces facing each other.

The convex portions 14Ad, 14Ae urge the direction of approaching each other so that the clamping pieces 14Aa, 14Ab clamp the mask frame F so that the clamping pieces 14Aa, 14Ab and the mask frame F do not deviate in the X direction. In addition, the convex portions 14Ad, 14Ae apply force as follows: when the clamping pieces 14Aa, 14Ab clamp the mask frame F, and the clamping pieces 14Aa, 14Ab and the mask frame F are offset in the X direction, they can absorb This offset maintains the mask frame F between the clamping piece 14Aa and the clamping piece 14Ab.

The convex portions 14Ad and 14Ae each have a spherical or hemispherical shape protruding in a direction approaching each other, and are made of metal, for example, and can support the weight of the mask frame F.

The rotating shaft 14B extends in a substantially horizontal direction (X direction) perpendicular to the mask surface, and can rotate around the axis of the rotating shaft 14B. In addition, the rotating shaft 14B can advance and retreat in the axial direction (X direction).

The front end of the rotating shaft 14B is connected and fixed to the base portion 14Ac of the clamping portion 14A in a radially protruding manner. A motor 14Ra of the rotation driving part 14R is connected to the base end of the rotating shaft 14B, and it can be driven around the axis of the rotating shaft 14B.

The motor 14Ra of the rotation driving portion 14R is fixed to a flat plate portion 14C extending parallel to the mask surface. By driving the X position restricting portion 14Xc with respect to the flat plate portion 14C by the X driving portion 14X, the rotating shaft 14B and the clamping portion 14A can be driven along the axial direction of the rotating shaft 14B.

As shown in FIG. 8, the X driving unit 14X has a motor 14Xa, a rotating shaft 14Xb, an X position restriction portion 14Xc, and a restriction portion 14Xd. The motor 14Xa is constituted by a stepping motor. The rotating shaft 14Xb extends in the X direction and is rotationally driven by the motor 14Xa. The X position restricting portion 14Xc is screwed to the rotating shaft 14Xb and can move relatively along the axial direction of the rotating shaft 14Xb. The restriction portion 14Xd restricts the movement of the X position restriction portion 14Xc and the motor 14Xa in the X direction.

In the X driving portion 14X, the rotation shaft 14Xb is rotated by the motor 14Xa, so that the X position restriction portion 14Xc on the proximal side to which the rotation shaft 14Xb is connected moves in the X direction with respect to the flat plate portion 14C. The movement direction of the X position restriction portion 14Xc is restricted by the restriction portion 14Xd.

The flat plate portion 14C is a side portion of the film forming chamber (chamber) 4. The upper alignment portion 14 can adjust the position of the clamping portion 14A with the degree of freedom in the X direction, and is fixed to the side of the film forming chamber (chamber) 4.

In the upper alignment part 14, first, the rotation shaft 14B is driven around the axis by the motor 14Ra of the rotation driving part 14R. Thereby, the angular position around the axis of the rotating shaft 14B is set so that the clamping portion 14A becomes a position that does not interfere with the mask frame F set as the film forming position.

Next, the motor 14Xa of the X drive part 14X rotates the rotating shaft 14Xb, and the X position restriction part 14Xc is moved in the X direction. Thereby, the rotating shaft 14B is driven in the axial direction to set the position of the clamping portion 14A in the X direction, and the upper end of the mask frame F is located between the clamping pieces 14Aa and 14Ab.

In this state, the rotation shaft 14B is rotated around the axis by the motor 14Ra of the rotation driving part 14R. As a result, as shown in FIG. 8, the angular position of the clamping portion 14A around the axis of the rotating shaft 14B is set such that the upper end of the mask frame F is located between the clamping pieces 14Aa and 14Ab of the clamping portion 14A. As a result, the convex portions 14Ad and 14Ae abut against the front and back of the mask frame F, respectively, and the mask frame F is clamped by the clamping pieces 14Aa and 14Ab.

In this state, the rotating shaft 14Xb can be rotated by the motor 14Xa of the X driving part 14X, the X position restricting part 14Xc can be moved in the X direction, and the rotating shaft 14B can be driven in the axial direction to finely adjust the upper end of the mask frame F. Position in the X direction.

In the upper alignment part 14, the motor 14Ra of the rotation driving part 14R is also arranged outside the film formation chamber (chamber) 4, and the motor 14Xa of the X driving part 14X is arranged in the film formation chamber (chamber) 4 Outer position. Therefore, the angular position adjustment of the clamping portion 14A around the axis of the rotation shaft 14B and the position adjustment of the rotation shaft 14B of the clamping portion 14A in the axial direction are performed from the outside of the film forming chamber (chamber) 4. Thereby, the dust generated in the chamber 4 can be prevented from spreading.

Fig. 13 is a perspective view showing the engaging portion of the mask frame of this embodiment. Fig. 14 is a perspective view showing the engaging portion of the mask frame of this embodiment. FIG. 15 is a perspective view showing the engagement state of the supporting alignment part and the engagement part in the mask frame in the sputtering apparatus of this embodiment. FIG. 16 is a perspective view showing the engagement state of the supporting alignment part and the engagement part in the mask frame in the sputtering apparatus of this embodiment.

As shown in Figure 2, Figure 8, Figure 13, Figure 14, the mask frame F is provided with a card at both ends of the lower end of the substantially rectangular frame Fa, that is, the lower side of the Z direction and the two ends of the Y direction. Joint part F1 and clamping part F2.

As shown in Figures 8 and 13, the engaging portion F1 is provided on one end side of the mask frame F and protrudes below the lower end of the frame Fa. An engaging recess F1a is provided on the bottom surface of the engaging part F1.

As shown in FIG. 13, the engaging recessed portion F1a is formed to have a substantially spherical surface shape, and is engaged with the convex portion 11a supporting the alignment portion 11 and can restrict the position in the XY direction.

That is, even when the center position of the convex portion 11a is shifted from the center position of the engagement recess F1a in the radial direction in a plan view, when the convex portion 11a abuts against the engagement recess F1a, the convex portion 11a in the Z direction Close to the engaging recess F1a, the outer surface of the convex portion 11a also moves in the XY direction along the inner surface of the engaging recess F1a.

Then, finally, as shown in FIG. 15, the state where the convex portion 11a and the engaging concave portion F1a are closest in the Z direction, that is, the state where the engaging concave portion F1a is placed on the convex portion 11a, the entire circumference of the convex portion 11a is formed The circular pattern is in line contact with the entire circumference of the engaging recess F1a. Thereby, the position of the mask frame F is set so that the center position of the convex part 11a and the center position of the engagement recessed part F1a will be the same in the XY direction in a plan view.

In addition, the shape of the engagement recessed part F1a and the convex part 11a is not limited to the shape mentioned above as long as the position in the XY direction can mutually set the center position, and other shapes may be used.

For example, it is also possible to adopt a structure in which the concave-convex shape in which the engaging concave portion F1a and the convex portion 11a are fitted with each other is set to be opposite to the above-mentioned embodiment. Specifically, a structure in which a convex-shaped member is provided on the mask frame F and a concave-shaped member is provided on the support alignment portion 11 can be adopted. Moreover, as the shape of any one of the engagement recessed part F1a and the convex part 11a, the aspherical shape and the shape formed in the shape of a cone, the shape, such as a polygonal pyramid, may be used.

As shown in Figures 8 and 14, the engaging portion F2 is provided on one end side of the mask frame F, and protrudes below the lower end of the frame Fa. An engaging groove part F2a is provided on the bottom surface of the engaging part F2.

As shown in FIG. 14, the engaging groove portion F2a extends in a direction extending from the lower end of the frame Fa, that is, in the Y direction to have a substantially uniform shape. Furthermore, the engaging groove portion F2a has an arcuate surface shape that is substantially the same as the cross section of the engaging groove portion F2a in the XZ direction in the extending direction of the engaging groove portion F2a. The arc shape of the engaging groove portion F2a is formed to engage with the convex portion 12a of the supporting aligning portion 12, has freedom in the Y direction, and can set the position of the convex portion 12a in the X direction.

That is, even if the center position of the convex portion 12a is offset from the center position of the engaging groove portion F2a in either the X direction or the Y direction in the radial direction of the convex portion 12a in a plan view, the convex portion 12a is abutted In the case of the engaging groove portion F2a, as the Z-direction convex portion 12a approaches the engaging groove portion F2a, the outer surface of the convex portion 12a also moves in the XY direction along the inner surface of the engaging groove portion F2a.

Then, finally, as shown in FIG. 16, in the state where the convex portion 12a in the Z direction and the engaging groove portion F2a are closest, that is, the state where the engaging groove portion F2a is placed on the convex portion 12a, the convex portion 12a is The arc in the cross section along the X direction is in line contact with the inner surface of the engaging groove portion F2a in a manner consistent with the cross section along the X direction of the engaging groove portion F2a. Thereby, the position of the mask frame F is set so that the center position of the convex part 12a and the X direction center position of the engagement groove part F2a may coincide in the X direction in a plan view. At the same time, the convex portion 12a has a degree of freedom corresponding to the length of the engaging groove portion F2a in the Y direction with respect to the position of the engaging groove portion F2a extending in the Y direction in the Y direction, and is set at the position in the Y direction.

As shown in FIG. 8, the upper support portions 16 and 16 are provided at the center of the upper side of the mask frame F and located between the upper alignment portion 13 and the upper alignment portion 14 in the Y direction.

The upper support portions 16, 16 are supported by the support alignment portions 11, 12 to support the mask frame F, and are supported by the upper alignment portions 13, 14 before being aligned with the mask frame F, so that the mask frame F does not tilt The upper side of the mask frame F.

As shown in FIG. 8, the upper support parts 16, 16 have a magnet part 16a, and a Z drive part 16Z. The magnet portion 16a is provided on the upper end of the mask frame F including the central portion, specifically the entire length of the mask frame F except for the left and right ends of the mask frame F. The magnet portion 16a can attract the upper frame support F6 such as a magnet constituting the mask frame F to support the weight of the mask frame F. The Z driving part 16Z can drive the magnet part 16a in the Z direction.

As shown in FIG. 8, in the upper support parts 16 and 16, the position of the magnet part 16 a in the X direction is set to overlap with the conveying path of the mask frame F defined by the plural conveying mechanisms 60 and the magnet part 16 a in a plan view.

Furthermore, the position of the upper support portion 16 in the Z direction is set such that the magnet portion 16a at the lowest position is substantially aligned with the line connecting the upper conveyance support portion 66 provided on the conveyance path.

In the upper support portions 16, 16, the cross-sectional structure of the magnet portion 16a on the XZ plane is set to have a cross-sectional structure of the XZ plane equivalent to the above-mentioned upper conveying support portions 56, 66. The magnet portion 16a and the upper frame support F6 provided at the upper end of the mask frame F attract each other. The magnet portion 16a and the upper frame support F6 form a magnetic circuit in a vertical plane (in the XZ plane) that is substantially orthogonal to the in-plane direction (YZ in-plane direction) of the mask frame F.

In addition, the magnet portion 16a of the upper support portion 16 has the same structure as the upper magnet portion 56a of the upper conveyance support portion 56 shown in FIG. 3, and the symbol 56a in the figure is replaced with 16a.

The magnet portion 16a, like the upper magnet portion 56a described above, has a plurality of magnets extending in the Y direction parallel to the conveying direction of the mask frame F. The magnet of the magnet portion 16a and the upper frame support F6 provided on the upper end of the mask frame F attract each other. The magnet of the magnet portion 16a forms a magnetic circuit in a vertical plane (in the XZ plane) substantially orthogonal to the in-plane direction (YZ in-plane direction) of the mask frame F.

The cross-section of the magnet portion 16a is substantially the same as the entire length of the upper support portion 16 in the Y direction. Thereby, the magnetic circuit formed between the upper frame support body F6 and the magnet portion 16a is formed substantially the same in the entire length of the upper support portion 16 in the Y direction. Therefore, the mutual attraction force of the upper frame support F6 and the magnet portion 16a can be made substantially equal to the total length of the upper support portion 16 in the Y direction.

When the upper side of the mask frame F is supported by the upper support part 16, the Z-direction distance between the magnet part 16a and the upper frame support body F6 needs to be set to a specific range. At the same time, when the upper side of the mask frame F is supported by the upper support portion 16, the upper frame support body F6 must be located directly below the magnet portion 16a. When these conditions are met, the magnet portion 16a and the upper frame support F6 are attracted to each other, and the upper support portion 16 supports the mask frame F.

In the upper support portions 16, 16, a plurality of magnet portions 16a can be arranged along the upper end of the mask frame F located on the conveying path extending in the Y direction. In the upper support parts 16, 16, for example, the magnet part 16a can be divided into two as shown in FIG. In addition, in the upper supporting parts 16, 16, the magnet part 16a may be divided into three or more.

As shown in FIGS. 8 and 11, the Z drive unit 16Z has a motor 16Za, a rotating shaft 16Zb, a Z plate portion 16c, a restriction portion 16Zd, a connection portion 16b, and a Z position restriction portion 16Zc. The motor 16Za is composed of a stepping motor or a servo motor. The rotating shaft 16Zb extends in the Z direction and is rotationally driven by the motor 16Za. The Z plate portion 16c is screwed to the rotating shaft 16Zb and can move relatively in the axial direction of the rotating shaft 16Zb. The restriction portion 16Zd restricts the movement of the Z plate portion 16c and the motor 16Za. The connecting portion 16b connects the Z plate portion 16c and the magnet portion 16a. The lower end (end) of the rotating shaft 16Zb is connected to the Z position restriction portion 16Zc.

In the Z driving portion 16Z, the lower end (end) of the rotating shaft 16Zb is connected to the Z position restricting portion 16Zc in a rotatable state. By rotating the rotating shaft 16Zb with the motor 16Za, the rotating shaft 16Zb is rotated so as not to move in the Z direction with respect to the Z position restricting portion 16Zc. The movement direction of the Z plate portion 16c is restricted by the restriction portion 16Zd. The Z plate portion 16c is configured to move in the Z direction with respect to the Z position restriction portion 16Zc. Thereby, the Z plate portion 16c and the magnet portion 16a connected by the connecting portion 16b can be moved back and forth in the Z direction.

The Z position restriction portion 16Zc is the top of the film formation chamber (chamber) 4. The Z driving part 16Z can extend or retreat the magnet part 16 a in the Z direction, and is fixed to the top of the film forming chamber (chamber) 4.

In the upper support parts 16 and 16, the motor 16Za is arranged outside the Z position restriction part 16Zc located at the top of the film forming chamber (chamber) 4, that is, outside the chamber 4. It is possible to prevent the dust generated in the cavity 4 from spreading by allowing the connecting portion 16b to maintain a closed state and expand and contract in the Z direction.

Fig. 17 is a front view showing a state before alignment in the mask chamber of the sputtering apparatus of this embodiment. Fig. 18 is a front view showing the alignment state in the mask chamber of the sputtering apparatus of this embodiment.

In the sputtering apparatus 1 of the present embodiment, when the mask frame F is aligned, firstly, the storage chamber 50 to the mask chamber 43 shown in FIG. 2 will be driven by driving rollers 65a, 65a, etc. The mask frame F is in a state where the lower end slider F5 is supported by the driving rollers 65a, 65a, and the upper side of the mask frame F is attracted by the upper conveying support portion 66 to maintain a non-inclined state, and is conveyed along The path is transported and the transported mask frame F is located near the film forming position of the mask chamber 43.

Here, when the mask frame F is conveyed, as shown in FIG. 17, in the upper support parts 16 and 16, the Z driving part 16Z is driven so that the magnet part 16 a approaches the upper end of the mask frame F. At the same time, the magnet portion 16a is lowered to the lowest position. Thereby, the magnet portion 16a is positioned on the line connecting the upper conveyance support portion 66.

At this time, at the upper end of the mask frame F, the upper support portion 16 and the magnet portion 26 attract each other. Thereby, the upper end of the mask frame F is supported in a non-inclined manner. In the lower part of the mask frame F, the slider F5 does not abut against the supporting alignment parts 11 and 12, and the slider F5 abuts against the driving rollers 65a and 65a of the conveying driving part 65. Thereby, the lower part of the mask frame F is supported.

The straight line connecting the tops of the plurality of driving rollers 65a forming the conveying path is set to be higher than the position of the convex portions 11a, 12a of the supporting aligning portions 11, 12 in the Z direction, and can be set lower than the following later The position of the upper dead center of the raised convex portions 11a, 12a by supporting the alignment operation of the alignment portions 11, 12 is described.

Before the alignment operation of the mask frame F, as shown in FIG. 17, the positions of the support alignment portions 11, 12 set in the Z driving portions 11Z, 12Z to the convex portions 11a, 12a become the lowest position in the Z direction. In the X driving parts 11X and 12X and the Y driving parts 11Y and 12Y, the convex parts 11a and 12a may be located close to the film formation position in the XY plane direction. It means that with the rise of the convex portion 11a, the convex portion 11a can abut against any position on the inner surface of the engaging recess F1a, and with the rise of the convex portion 12a, the convex portion 12a can abut against the engaging groove portion F2a Any position on the inner surface.

At the same time, before the alignment action of the mask frame F, as shown in FIG. 17, the upper alignment portion 13 sets the angle of the clamping portion 13A in the rotation driving portion 13R around the axis of the rotation shaft 13B to be such that the mask frame F The angle that does not interfere with the mask frame F when located near the film formation position. Specifically, it is preferable to set the position of the clamping portion 13A at an angle at which the clamping portion 13A is located near the mask frame F, and the clamping portion 13A is inclined at least upward about the axis of the rotating shaft 13B.

In addition, the upper alignment portion 13 is set in the X driving portion 13X so that the upper end of the mask frame F is located between the clamping pieces 13Aa and 13Ab in the clamping portion 13A.

Similarly, before the alignment of the mask frame F, as shown in FIG. 14, the upper alignment portion 14 sets the angle of the clamping portion 14A in the rotation driving portion 14R around the axis of the rotation shaft 14B to be such that the mask frame F The angle that does not interfere with the mask frame F when located near the film formation position. Specifically, it is preferable to set the position of the clamping portion 14A at an angle at which the clamping portion 14A is located near the shield frame F and the clamping portion 14A is inclined at least upward about the axis of the rotation shaft 14B.

In addition, the upper alignment portion 14 is set so that the upper end of the mask frame F in the X driving portion 14X is located between the clamping pieces 14Aa and 14Ab in the clamping portion 14A.

Next, during the alignment operation, as shown in FIG. 18, the rotation driving portion 13R of the upper alignment portion 13 is driven, and as shown by the arrow r13 in FIG. 18, the clamping portion 13A is rotated around the axis of the rotation shaft 13B. Thereby, the angle of the clamping portion 13A is set so that the convex portions 13Ad and the convex portions 13Ae provided on the two facing surfaces between the clamping piece 13Aa and the clamping piece 13Ab respectively abut and support the mask The angle of the front and back of frame F.

At the same time, during the alignment operation, as shown in FIG. 18, the rotation driving portion 14R of the upper alignment portion 14 is driven, and as shown by the arrow r14 in FIG. 18, the clamping portion 14A is rotated around the axis of the rotation shaft 14B. Thereby, the angle of the clamping portion 14A is set so that the convex portions 14Ad and the convex portions 14Ae provided on the two facing surfaces between the clamping piece 14Aa and the clamping piece 14Ab respectively abut and support the mask The angle of the front and back of frame F.

Furthermore, after the operation of the rotation driving parts 13R, 14R of the upper alignment parts 13, 14 as shown by the arrows r13 and r14 in FIG. 18, or at the same time as this operation, the support alignment parts 11, 12 drive Z Drive unit 11Z, 12Z. Thereby, as shown by arrows r11 and r12 in FIG. 18, the convex portions 11a, 12a are raised, so that the convex portion 11a abuts against the inner surface of the engaging recess F1a, and the convex portion 12a abuts against the engaging groove The inner surface of part F2a.

By the actions of the Z driving parts 11Z and 12Z shown by the arrows r11 and r12 in FIG. 18, at the lower end of the mask frame F, the slider F5 is separated from the driving rollers 65 a and 65 a of the conveying mechanism 60. At the same time, it becomes a state where the weight of the mask frame F is supported by the supporting alignment parts 11 and 12.

In synchronization with the actions of the Z driving parts 11Z and 12Z shown by arrows r11 and r12 in FIG. 18, the Z driving parts 16Z of the upper support parts 16, 16 are driven. Thereby, as shown by the arrow r16 of FIG. 18, the magnet part 16a is raised, and the magnet part 16a is operated so that it does not abut against the raised mask frame F.

Thus, as shown by arrows r11 and r12 in FIG. 18, the convex portion 11a abuts on the inner surface of the engaging recess F1a, and the convex portion 12a abuts on the inner surface of the engaging groove portion F2a. Thereby, the lower end of the mask frame F is restricted to the position in the XY plane set by the convex portions 11a and 12a.

At the same time, as shown by arrow r13 in FIG. 18, the convex portion 13Ad of the clamping piece 13Aa and the convex portion 13Ae of the clamping piece 13Ab abut against the front and back of the mask frame F, respectively. Moreover, as shown by the arrow r14 of FIG. 18, the convex part 14Ad of the clamping piece 14Aa and the convex part 14Ae of the clamping piece 14Ab abut the front and back of the mask frame F, respectively. Thereby, the upper end of the mask frame F is restricted to the X-direction position set by the clamping parts 13A, 14A.

Furthermore, based on the alignment signal outputted by calculating the positional relationship between the glass substrate S and the mask frame F detected by a detection mechanism such as a camera, etc. by a calculation mechanism such as a control unit not shown The cover alignment mechanism 10 operates. Thereby, it is possible to control the positional relationship between the glass substrate S and the mask frame F in a manner of a preset sputtering film forming position.

At this time, in the supporting alignment parts 11 and 12, the X driving parts 11X and 12X, the Y driving parts 11Y and 12Y, and the Z driving parts 11Z and 12Z are driven. Furthermore, the X driving part 13X of the upper alignment parts 13 and 14 is driven. In this way, the position of the mask frame F in two directions in the ZY plane and the position of the mask frame F in the X direction orthogonal to the ZY plane, that is, the position on the three axes and the position around the three axes The six degrees of freedom of the three rotation directions (angles) of the axis are used to align the mask frame F.

Specifically, the support alignment portion 11 is used to set the position of the side end of the engaging portion F1 at the lower end of the mask frame F in three directions in the XYZ direction, and the support alignment portion 12 is used to perform the position setting of the lower end of the mask frame F The position setting of the side end of the engaging part F2 in the three directions of the XYZ direction, the upper alignment part 13 is used to set the position of the side end of the engaging part F1 at the upper end of the mask frame F in the X direction, and the upper part The alignment portion 14 sets the position of the side end of the engaging portion F2 at the upper end of the mask frame F in the X direction.

Thereby, the position setting of the glass substrate S and the mask frame F in the in-plane direction, and the inclination setting of the surfaces of the glass substrate S and the mask frame F can be performed simultaneously.

In this embodiment, in the supporting alignment parts 11 and 12, the X driving parts 11X, 12X, and the Y driving parts 11Y, 12Y are provided in the chamber 4. Thereby, compared with the case where the driving parts 11X, 12X, 11Y, and 12Y are arranged outside the chamber 4, the mask frame from the driving parts 11X, 12X, 11Y, 12Y to the position controlled by the driving parts can be shortened The distance of F. Thereby, the position control of the mask frame F can be performed with higher accuracy. At the same time, because stepping motors can be used for the drive units 11X, 12X, 11Y, and 12Y. Thereby, the position control of the mask frame F can be performed with higher accuracy compared with the case of using a high-output servo motor.

Furthermore, a space-saving stepping motor can be used in the driving parts 11X, 12X, 11Y, and 12Y, and the stepping motors are sealed in the chamber 4. Therefore, it is possible to prevent the generation of dust and the like related to the driving of the driving parts 11X, 12X, 11Y, and 12Y. Thereby, the film-forming characteristics of sputtering on the glass substrate S can be improved, the yield rate can be improved, and the manufacturing cost can be reduced.

In this embodiment, the Z driving parts 11Z and 12Z of the supporting alignment parts 11 and 12, and the rotation driving parts 13R and 14R of the upper alignment parts 13 and 14 and the X driving parts 13X and 14X are installed in the chamber 4 external. Thereby, when supporting the mask frame F which sometimes has a weight of 500 kg or more and directly driving the mask frame F, a high-output motor can be used without worrying about the space in the chamber 4. Furthermore, the dust generated from the driving parts 11Z and 12Z falls downward due to gravity, but the rotation driving parts 13R, 14R and the X driving part are arranged on the upper side of the mask frame F which affects the film forming characteristics 13X and 14X are located on the outer side of the chamber 4, so that the dust will not be generated, and the sputtering film forming characteristics of the glass substrate S can be prevented from causing adverse effects.

In this embodiment, the engagement portions F1, F2 and the convex portions 11a, 12a supporting the alignment portions 11, 12 have the above-mentioned structure, and the mask frame F can be supported by the convex portions 11a, 12a, and Only by driving the Z driving parts 11Z and 12Z of the supporting alignment parts 11 and 12, the position of the lower end of the mask frame F can be set. Furthermore, the mask frame F can be supported in a finely adjustable manner by only engaging the engaging recessed portion F1a and the engaging groove portion F2a with the convex portions 11a, 12a of the supporting alignment portions 11, 12.

In this embodiment, the upper alignment parts 13 and 14 have the above-mentioned structure, and the X driving parts 13X and 14X move the clamping parts 13A and 14A along the rotating shafts 13B and 14B to control the mask frame F in The position in the X direction can be aligned with the mask frame F with the above six degrees of freedom.

In the present embodiment, in the space-saving sputtering apparatus 1, the mask frame F can be easily aligned with a simple structure and dust-free, and excellent film-forming characteristics can be realized at low cost.

In addition, in this embodiment, as long as the mask replacement of the mask replacement mechanism 100 and the alignment of the mask frame F of the mask aligning mechanism 10 can be performed as described above, it is used as a driving and controlling mask frame separately The organization of F is not limited to that constituent.

In addition, in this embodiment, the vertical transport and the vertical film formation in which the substrate S and the mask frame F are in an upright position are described, but the horizontal transport in which the mask frame F is in a horizontal position may also be used. .

Hereinafter, the second embodiment of the sputtering apparatus of the present invention will be described based on the drawings.

Figure 19 is a schematic plan view showing a part of the sputtering apparatus of this embodiment. In this embodiment, the difference from the above-mentioned first embodiment lies in the arrangement of the storage chamber and the film forming chamber. The corresponding components of the first embodiment described above are denoted by the same reference numerals, and their description is omitted.

In this embodiment, as shown in FIG. 19, two storage chambers 50 and 50A are connected to one film formation chamber 4. In addition, in the figure, the loading/unloading room 2, the transfer room 3, etc. are omitted.

With this configuration, the storage chamber 50 on one side can be used as a loading chamber for the mask frame F, and a specific type and a specific number of mask frames F can be sequentially carried into the film forming chamber 4 from the outside. In addition, the storage chamber 50A on the other side is used as an unloading chamber for the mask frame F, and the mask frames F of a specific type and a specific number can be sequentially carried out from the film forming chamber 4 to the outside.

In this case, since the film forming chamber 4 is not exposed to the atmosphere, automatic mask replacement can be performed. At the same time, for the mask frame F before film formation, the mask frame F after film formation can be transported to different loading/unloading rooms. Therefore, it is possible to obtain the effect of reducing the adhesion of particles to the mask frame F before film formation and suppressing the influence of particles on sputtering.

Although the preferred embodiments of the present invention have been described and described above, it should be understood that these are examples of the present invention and should not be regarded as limiting. Additions, omissions, substitutions, and other changes can be made without departing from the scope of the present invention. Therefore, the present invention should not be regarded as limited by the above description, but by the scope of the patent application.

[Industrial availability]

Examples of applications of the present invention include vapor deposition, CVD (Chemical Vapor Deposition), etching, and the like.

1‧‧‧Sputtering device 2‧‧‧Loading/unloading chamber (chamber) 3‧‧‧Transfer room (chamber) 3a‧‧‧Conveying device 4‧‧‧Chamber (Film Forming Room) 4B‧‧‧Chamber (Film Forming Chamber) 6‧‧‧Backing plate (cathode electrode) 7‧‧‧Target 8‧‧‧Gas introduction mechanism 9‧‧‧High vacuum exhaust mechanism 10‧‧‧Mask alignment mechanism 11‧‧‧Support alignment part 11a‧‧‧Protrusion 11b‧‧‧Base 11c‧‧‧Horizontal plate 11d‧‧‧Base 11X‧‧‧X drive unit 11Xa‧‧‧Motor 11Xb‧‧‧Rotation axis 11Xc‧‧‧X position restriction 11Xd‧‧‧Restricted Department 11Y‧‧‧Y drive unit 11Ya‧‧‧Motor 11Yb‧‧‧Rotation axis 11Yc‧‧‧Y position restriction 11Yd‧‧‧Restricted Department 11Z‧‧‧Z drive unit 11Za‧‧‧Motor 11Zb‧‧‧Rotation axis 11Zc‧‧‧Z position restriction 11Zd‧‧‧Restriction Department 12‧‧‧Support alignment part 12a‧‧‧Protrusion 12b‧‧‧Base 12c‧‧‧Horizontal plate 12d‧‧‧Base 12X‧‧‧ X drive unit 12Xa‧‧‧Motor 12Xb‧‧‧Rotation axis 12Xc‧‧‧X position restriction 12Xd‧‧‧Restricted Department 12Y‧‧‧Y drive unit 12Ya‧‧‧Motor 12Yb‧‧‧Rotation axis 12Yc‧‧‧Y position restriction 12Yd‧‧‧Restricted Department 12Z‧‧‧Z drive unit 12Za‧‧‧Motor 12Zb‧‧‧Rotation axis 12Zc‧‧‧Z position restriction 12Zd‧‧‧Restriction Department 13‧‧‧Upper alignment part 13A‧‧‧Clamping part 13Aa‧‧‧Clamping piece 13Ab‧‧‧Clamping piece 13Ac‧‧‧Base 13Ad‧‧‧Protrusion 13Ae‧‧‧Protrusion 13B‧‧‧Rotating axis 13C‧‧‧Plate part 13R‧‧‧Rotation drive unit 13Ra‧‧‧Motor 13X‧‧‧X drive unit 13Xa‧‧‧Motor 13Xb‧‧‧Rotation axis 13Xc‧‧‧X position restriction 13Xd‧‧‧Restricted Department 14‧‧‧Upper alignment part 14A‧‧‧Clamping part 14Aa‧‧‧Clamping piece 14Ab‧‧‧Clamping piece 14Ac‧‧‧Base 14Ad‧‧‧Protrusion 14Ae‧‧‧Protrusion 14B‧‧‧Rotating axis 14C‧‧‧Plate part 14R‧‧‧Rotation drive unit 14Ra‧‧‧Motor 14X‧‧‧X drive unit 14Xa‧‧‧Motor 14Xb‧‧‧Rotation axis 14Xc‧‧‧X position restriction 14Xd‧‧‧Restriction 16‧‧‧Upper Support 16a‧‧‧Magnet part 16b‧‧‧Connecting part 16c‧‧‧Z Board Department 16Z‧‧‧Z drive unit 16Za‧‧‧Motor 16Zb‧‧‧Rotation axis 16Zc‧‧‧Z position restriction 16Zd‧‧‧Restriction 41‧‧‧Sputtering space 42‧‧‧Back space 43‧‧‧Masked Room 48‧‧‧Substrate holding mechanism 50‧‧‧Storage room 50A‧‧‧Storage room 50a‧‧‧Bottom 50b‧‧‧ side 50c‧‧‧Top 51‧‧‧Inventory Support Department (Inventory Support Department) 51a‧‧‧Support groove 51A‧‧‧Storage Placement Department (Storage Support Department) 51Aa‧‧‧Loading groove (stocking groove) 51Ab‧‧‧Drive groove 51b‧‧‧Groove support base (replacement of the drive for the storage position) 51b1‧‧‧X drive shaft 51b2‧‧‧X drive motor 51c‧‧‧X-direction restricting part (replacement driving part of stock position) 51d‧‧‧Z drive shaft (replacement of the drive for the storage position) 51e‧‧‧Z drive motor (replacement of storage position drive) 51f‧‧‧Z direction restricting part (replacement driving part of stock position) 52‧‧‧Inventory Support Department (Inventory Support Department) 52A‧‧‧Storage Placement Department (Storage Support Department) 52Aa‧‧‧Mounting groove (stocking groove) 52Ab‧‧‧Drive groove 52a‧‧‧Support groove 52b‧‧‧Groove support base (replacement of drive for storage position) 52b1‧‧‧X drive shaft 52b2‧‧‧X drive motor 52c‧‧‧X-direction restricting part (replacement driving part of stock position) 52d‧‧‧Z drive shaft (replacement of the drive for the storage position) 52e‧‧‧Z drive motor (replacement of the drive for the storage position) 52f‧‧‧Z direction restricting part (replacement driving part of stock position) 53‧‧‧Inventory Support Department (Inventory Support Department) 53a‧‧‧Clamping part 53b‧‧‧Clamping piece 53c‧‧‧Rotation axis 53e‧‧‧Protrusion 53rx‧‧‧X Rotation Drive 54‧‧‧Inventory Support Department (Inventory Support Department) 54a‧‧‧Clamping part 54b‧‧‧Clamping piece 54c‧‧‧Rotation axis 54e‧‧‧Protrusion 54rx‧‧‧X Rotation Drive 55‧‧‧Drive Support Department 55a‧‧‧Drive roller 55b‧‧‧Rotation drive unit 55c‧‧‧Abutment release driver 55d‧‧‧Z position restriction 55e‧‧‧Rotating drive motor 55f‧‧‧Rotation drive unit 55g‧‧‧Drive shaft 56‧‧‧Transfer to Support Department 56a‧‧‧Upper magnet part 56b‧‧‧Clamping part 56b1‧‧‧Clamping piece 56b2‧‧‧Connecting part 56c‧‧‧Clamping part 56c1‧‧‧Clamping piece 56c2‧‧‧Connecting part 56d‧‧‧Z Support Department 56e‧‧‧Protrusion 56f‧‧‧Z drive unit 58‧‧‧Closed institutions 58a‧‧‧Block valve 58b‧‧‧Move in/out 58c‧‧‧Mask removal filling port 58d‧‧‧Opening and closing part 58e‧‧‧Shaking shaft 58f‧‧‧Shaking Drive 58g‧‧‧Removing support part 58ga‧‧‧Remove the support groove 58h‧‧‧Remove the upper support part 58h1‧‧‧Z axis 58h2‧‧‧Support film 58k‧‧‧Protrusion 60‧‧‧Transportation mechanism 65‧‧‧Transport drive unit 65a‧‧‧Drive roller 65b‧‧‧Rotation drive unit 66‧‧‧Transfer to Support Department 100‧‧‧Mask replacement mechanism 661～664‧‧‧Magnet 665‧‧‧Magnetic Department 666‧‧‧Non-magnetic part 667‧‧‧lower surface F‧‧‧Mask frame Fa‧‧‧Frame FA‧‧‧Mask frame FB‧‧‧Mask frame FC‧‧‧Mask frame FD‧‧‧Mask frame F1‧‧‧Clamping part F1a‧‧‧Clamping recess F2‧‧‧Clamping part F2a‧‧‧Locking groove F5‧‧‧Slider F6‧‧‧Upper frame support F6a～F6d‧‧‧Magnet F6e‧‧‧Magnetic part F6f‧‧‧Non-magnetic part F6g‧‧‧Protection layer r11‧‧‧Arrow r12‧‧‧Arrow r13‧‧‧Arrow r14‧‧‧Arrow r16‧‧‧Arrow S‧‧‧Glass substrate (substrate) X‧‧‧direction Y‧‧‧ direction Z‧‧‧ direction

Fig. 1 is a schematic plan view showing the first embodiment of the sputtering apparatus of the present invention. Fig. 2 is a perspective view showing the first embodiment of the mask frame of the present invention. Fig. 3 is a perspective view showing the storage chamber of the first embodiment of the sputtering apparatus of the present invention. Fig. 4 is a schematic side view showing the stock support part, the drive support part and the sealing mechanism of the stock chamber of the first embodiment of the sputtering apparatus of the present invention. Fig. 5A is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 5B is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 5C is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. FIG. 5D is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 5E is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 6A is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 6B is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 6C is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 6D is a schematic plan view showing the sequence of mask replacement in the first embodiment of the sputtering apparatus of the present invention. Fig. 6E is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 6F is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 7A is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 7B is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 7C is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 7D is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. Fig. 7E is a schematic plan view showing the mask replacement sequence of the first embodiment of the sputtering apparatus of the present invention. 8 is a perspective view showing the mask alignment mechanism of the first embodiment of the sputtering apparatus of the present invention. Fig. 9 is a perspective view showing the engagement state of the supporting alignment portion of the first embodiment of the sputtering apparatus of the present invention. Fig. 10 is a perspective view showing the engagement state of the supporting alignment portion of the first embodiment of the sputtering apparatus of the present invention. 11 is a perspective view showing the released state of the upper alignment portion of the first embodiment of the sputtering apparatus of the present invention. Fig. 12 is a perspective view showing the engagement state of the upper alignment portion of the first embodiment of the sputtering apparatus of the present invention. Fig. 13 is a perspective view showing the engaging portion of the first embodiment of the mask frame of the present invention. Fig. 14 is a perspective view showing the engaging portion of the first embodiment of the mask frame of the present invention. Fig. 15 is a perspective view showing the engaged state of the supporting aligning part and the engaging part of the first embodiment of the sputtering apparatus of the present invention. Fig. 16 is a perspective view showing the engaged state of the supporting aligning portion and the engaging portion of the first embodiment of the sputtering apparatus of the present invention. Fig. 17 is a front view showing the state before the support of the alignment mechanism of the first embodiment of the sputtering apparatus of the present invention. Fig. 18 is a front view showing the supporting state of the alignment mechanism of the first embodiment of the sputtering apparatus of the present invention. Fig. 19 is a schematic plan view showing the second embodiment of the sputtering apparatus of the present invention.

50‧‧‧Storage room

50a‧‧‧Bottom

50b‧‧‧ side

50c‧‧‧Top

51‧‧‧Inventory Support Department (Inventory Support Department)

51a‧‧‧Support groove

51A‧‧‧Storage Placement Department (Storage Support Department)

51Aa‧‧‧Loading groove (stocking groove)

51Ab‧‧‧Storage groove

51b‧‧‧Groove support base (replacement of the drive for the storage position)

51c‧‧‧X-direction restricting part (replacement driving part of stock position)

51d‧‧‧Z drive shaft (replacement of the drive for the storage position)

51e‧‧‧Z drive motor (replacement of storage position drive)

51f‧‧‧Z direction restricting part (replacement driving part of stock position)

52A‧‧‧Storage Placement Department (Storage Support Department)

52Aa‧‧‧Mounting groove (stocking groove)

52Ab‧‧‧Drive groove

53‧‧‧Inventory Support Department (Inventory Support Department)

53a‧‧‧Clamping part

53b‧‧‧Clamping piece

53c‧‧‧Rotation axis

53e‧‧‧Protrusion

54‧‧‧Inventory Support Department (Inventory Support Department)

55‧‧‧Drive Support Department

55a‧‧‧Drive roller

56‧‧‧Transfer to Support Department

56a‧‧‧Upper magnet part

56b‧‧‧Clamping part

56b1‧‧‧Clamping piece

56c‧‧‧Clamping part

56c1‧‧‧Clamping piece

56d‧‧‧Z Support Department

56e‧‧‧Protrusion

56f‧‧‧Z drive unit

58‧‧‧Closed institutions

58b‧‧‧Move in/out

58c‧‧‧Mask removal filling port

58d‧‧‧Opening and closing part

58e‧‧‧Shaking shaft

58g‧‧‧Removing support part

58ga‧‧‧Remove the support groove

58h‧‧‧Remove the upper support part

58h1‧‧‧Z axis

58h2‧‧‧Support film

58k‧‧‧Protrusion

X‧‧‧direction

Y‧‧‧ direction

Z‧‧‧ direction

Claims (10)

A sputtering device has: a mask replacement mechanism that can replace a mask frame that is held substantially perpendicular to the substrate formed by sputtering in the chamber; the mask replacement mechanism has: a sealed storage A material chamber, which can store a plurality of the above-mentioned mask frames in a state where the surfaces of the above-mentioned mask frames are substantially parallel to each other; and a conveying mechanism, which is selected from one mask frame among the plurality of stored mask frames The mask room is transported to the film forming position in the chamber; and the storage room is provided with: a storage support part which can hold a plurality of the mask frames in a state where the surfaces of the mask frames are substantially parallel to each other It supports a plurality of the mask frames, and can move the mask frames back and forth in a direction substantially orthogonal to the surface of the mask frame; the driving support part can be selected from the above-mentioned stored in the storage supporting part One of the mask frames is driven in a substantially horizontal direction parallel to the surface of the mask frame; and a conveying upper support part that can support the mask when the mask frame is moved by the driving support part The upper end of the frame does not tilt. Such as the sputtering device of claim 1, wherein the storage support part has: a storage placement part, which has a plurality of storage grooves that can support a plurality of the lower ends of the mask frame; a lower storage support part, which Can rise, fall and move back and forth, and can be placed in The lower ends of the plurality of the mask frames of the storage groove of the storage placement portion abut and lift the plurality of the mask frames upwards as a state of being separated from the storage placement portion, that is, ascending positions A plurality of the above-mentioned mask frames are supported, and the plurality of the above-mentioned mask frames supported as the above-mentioned rising positions are moved back and forth in a direction substantially orthogonal to the above-mentioned surface of the above-mentioned mask frame, and then descended from the above-mentioned mask frame Until the lower end leaves, a plurality of the above-mentioned mask frames are placed in the above-mentioned storage groove of the above-mentioned storage place; and the upper support part of the storage, which can support and release the storage in the above-mentioned storage place A plurality of positions on the upper side of the mask frame can be moved back and forth in a direction substantially orthogonal to the surface of the mask frame, similarly to the lower support portion of the storage material. For example, the sputtering device of claim 2, wherein the lower supporting portion of the storage material has: a plurality of supporting grooves extending in a direction substantially parallel to the surface of the stored mask frame and supporting the lower end of the mask frame; And a storage position replacement drive unit, which can move the plurality of the support grooves back and forth in a substantially vertical direction and a direction substantially orthogonal to the surface of the mask frame. Such as the sputtering device of claim 2, wherein the upper support portion of the storage material has: a clamping portion that can rotate around an axis extending in a direction orthogonal to the surface of the mask frame, and can be automatically orthogonal to Both sides of the mask frame in the direction of the surface clamp the upper end of the mask frame; and the clamping portion can move back and forth in a direction parallel to the axis. Such as the sputtering device of claim 1, wherein the storage support part has: a storage placement part having a plurality of storage grooves that can support a plurality of lower end positions of the mask frame; the drive support part has: The drive roller has an axis parallel to the direction substantially orthogonal to the surface of the mask frame, and can be driven by a rotating drive part; and the drive roller can be selectively placed on the above by rotating the drive roller by the rotating drive part Among the mask frames of the stock groove of the stock placement portion, the mask frame abuts on the drive roller and drives the mask frame in a direction parallel to the surface of the mask frame. The sputtering device of claim 1, wherein the upper conveying support part has an upper magnet part, and the upper magnet part attracts each other with the magnet part provided at the upper end of the shield frame, and has a position parallel to and parallel to the shield frame. Magnets are arranged in the form of a magnetic circuit formed in a vertical plane whose direction of the above-mentioned surface of the cover frame is substantially orthogonal. For example, the sputtering device of claim 1, wherein the storage chamber has a closed mechanism, regardless of whether the mask frame is unused or used, the mask frame stored in the storage chamber and the mask frame located in the chamber When the mask frame in the mask room that becomes the film formation position is to be replaced, the storage The mask frame is transported in a state where the material chamber is sealed to the outside and communicated with the chamber. When the mask frame stored in the storage chamber is carried in or out to the outside, the chamber can be sealed and the When the storage chamber is in communication with the outside, the mask frame is carried in or out. Such as the sputtering device of claim 7, wherein the storage chamber is connected to a plurality of the chambers in such a way that the stored shield frame can be replaced. Such as the sputtering apparatus of claim 1, which has an alignment mechanism which is located in the mask chamber as the film forming position in the chamber, in two directions parallel to the surface of the mask frame and The three axial directions in the orthogonal direction orthogonal to the above-mentioned surface of the mask frame and the six degrees of freedom in the three rotation directions around the above-mentioned three axial axes are aligned with the above-mentioned mask frame. A mask frame, which can be transported between the above-mentioned storage room and the above-mentioned mask room in the sputtering device of claim 6, and has: a substantially rectangular frame; an upper frame support body having a side edge The magnet part is arranged so as to extend along the upper edge of the frame; and the slider is arranged so as to extend along the lower edge of the frame; and the upper magnet part arranged on the upper conveying support part is connected to the upper frame The supports attract each other, and a magnetic circuit is formed in a vertical plane that is substantially orthogonal to the direction parallel to the surface of the mask frame; the slider is provided by the storage support part provided in the storage chamber Supported by the support groove of the support department under the stock.

Images