TWI701506B - 光阻圖型形成方法及光阻組成物 - Google Patents

光阻圖型形成方法及光阻組成物 Download PDF

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Publication number
TWI701506B
TWI701506B TW104121707A TW104121707A TWI701506B TW I701506 B TWI701506 B TW I701506B TW 104121707 A TW104121707 A TW 104121707A TW 104121707 A TW104121707 A TW 104121707A TW I701506 B TWI701506 B TW I701506B
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TW
Taiwan
Prior art keywords
group
formula
acid
photoresist
atom
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TW104121707A
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English (en)
Chinese (zh)
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TW201616237A (zh
Inventor
野村架奈
鈴木優一
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日商東京應化工業股份有限公司
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  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
TW104121707A 2014-07-08 2015-07-03 光阻圖型形成方法及光阻組成物 TWI701506B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-140640 2014-07-08
JP2014140640A JP2016018075A (ja) 2014-07-08 2014-07-08 レジストパターン形成方法及びレジスト組成物

Publications (2)

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TW201616237A TW201616237A (zh) 2016-05-01
TWI701506B true TWI701506B (zh) 2020-08-11

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TW104121707A TWI701506B (zh) 2014-07-08 2015-07-03 光阻圖型形成方法及光阻組成物

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JP (1) JP2016018075A (ko)
KR (1) KR102430119B1 (ko)
TW (1) TWI701506B (ko)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201245862A (en) * 2011-04-05 2012-11-16 Tokyo Ohka Kogyo Co Ltd Resist composition and method of forming resist pattern

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7147983B1 (en) 1996-10-07 2006-12-12 Shipley Company, L.L.C. Dyed photoresists and methods and articles of manufacture comprising same
JP2011016794A (ja) * 2009-06-12 2011-01-27 Sumitomo Chemical Co Ltd レジスト組成物の酸発生剤用の塩
JP5454458B2 (ja) * 2010-11-25 2014-03-26 信越化学工業株式会社 ポジ型レジスト材料及びパターン形成方法
JP6079217B2 (ja) * 2011-12-28 2017-02-15 Jsr株式会社 フォトレジスト組成物、レジストパターン形成方法及び酸発生剤

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201245862A (en) * 2011-04-05 2012-11-16 Tokyo Ohka Kogyo Co Ltd Resist composition and method of forming resist pattern

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Publication number Publication date
TW201616237A (zh) 2016-05-01
JP2016018075A (ja) 2016-02-01
KR102430119B1 (ko) 2022-08-05
KR20160006113A (ko) 2016-01-18

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