TWI698414B - 新穎二胺、聚醯胺酸，及聚醯亞胺 - Google Patents

新穎二胺、聚醯胺酸，及聚醯亞胺 Download PDF

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Publication number
TWI698414B
TWI698414B TW103136647A TW103136647A TWI698414B TW I698414 B TWI698414 B TW I698414B TW 103136647 A TW103136647 A TW 103136647A TW 103136647 A TW103136647 A TW 103136647A TW I698414 B TWI698414 B TW I698414B
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formula
diamine
nitrophenyl
amine
reaction
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TW103136647A
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English (en)
Chinese (zh)
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TW201529540A (zh
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長尾将人
近藤光正
永井健太郎
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日商日產化學工業股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/20—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by nitrogen atoms not being part of nitro or nitroso groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/16—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by singly-bound oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
    • C07C271/06—Esters of carbamic acids
    • C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
    • C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
    • C07C271/22—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by carboxyl groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1003—Preparatory processes
    • C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
    • C08G73/105—Polyimides containing oxygen in the form of ether bonds in the main chain with oxygen only in the diamino moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
    • C08G73/1071—Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
    • C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
    • C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
    • C07C2603/18—Fluorenes; Hydrogenated fluorenes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/02—Alignment layer characterised by chemical composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/50—Improvements relating to the production of bulk chemicals
    • Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
TW103136647A 2013-10-23 2014-10-23 新穎二胺、聚醯胺酸，及聚醯亞胺 TWI698414B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2013220592 2013-10-23
JP2013-220592 2013-10-23
JP2013273459 2013-12-27
JP2013-273459 2013-12-27
JP2014186809 2014-09-12
JP2014-186809 2014-09-12

Publications (2)

Publication Number Publication Date
TW201529540A TW201529540A (zh) 2015-08-01
TWI698414B true TWI698414B (zh) 2020-07-11

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TW103136647A TWI698414B (zh) 2013-10-23 2014-10-23 新穎二胺、聚醯胺酸，及聚醯亞胺

Country Status (6)

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US (1) US10023530B2 (https=)
JP (4) JP6512103B2 (https=)
KR (1) KR102285777B1 (https=)
CN (2) CN110950781A (https=)
TW (1) TWI698414B (https=)
WO (1) WO2015060359A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102285777B1 (ko) 2013-10-23 2021-08-03 닛산 가가쿠 가부시키가이샤 신규 디아민, 폴리아믹산, 및 폴리이미드
JP2017090781A (ja) * 2015-11-13 2017-05-25 株式会社ジャパンディスプレイ 光配向膜用ワニス及び液晶表示装置
JP7299557B2 (ja) * 2016-09-13 2023-06-28 日産化学株式会社 液晶配向剤、液晶配向膜、及び液晶表示素子
KR20190060803A (ko) * 2016-09-29 2019-06-03 닛산 가가쿠 가부시키가이샤 액정 배향제, 액정 배향막, 및 액정 표시 소자
KR102544307B1 (ko) * 2017-01-13 2023-06-15 닛산 가가쿠 가부시키가이샤 방향족 디아민 화합물 전구체의 제조 방법
KR102842854B1 (ko) * 2018-03-30 2025-08-05 닛산 가가쿠 가부시키가이샤 신규한 액정 배향제, 액정 배향막 및 액정 표시 소자
KR102319883B1 (ko) * 2019-01-25 2021-11-01 주식회사 엘지화학 디아민 화합물, 및 이를 이용한 폴리이미드 전구체 및 폴리이미드 필름
KR102625318B1 (ko) * 2021-07-14 2024-01-16 한국생산기술연구원 폴리이미드, 감광성폴리이미드, 그 제조방법, 감광성폴리이미드를 이용한 마이크로패턴 및 그 형성방법
CN116731473B (zh) * 2023-07-13 2024-02-20 广州银塑阻燃新材料股份有限公司 一种基于纤维增强的阻燃复合母粒及其制备方法
WO2025115975A1 (ja) * 2023-11-30 2025-06-05 日産化学株式会社 芳香族アミノ化合物の製造方法
WO2025212232A1 (en) * 2024-04-04 2025-10-09 Hd Microsystems Method for forming photopolymerizable polyimide precursors

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110080547A1 (en) * 2009-10-01 2011-04-07 Masaki Matsumori Liquid crystal display device
JP2012193167A (ja) * 2011-03-02 2012-10-11 Jnc Corp ジアミン、これを用いた液晶配向剤、液晶表示素子および液晶配向膜の形成方法

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Publication number Priority date Publication date Assignee Title
US2627491A (en) * 1950-07-15 1953-02-03 Wyeth Corp Penicillin salts of substituted alkylene diamines
WO2010050523A1 (ja) 2008-10-29 2010-05-06 日産化学工業株式会社 ジアミン、ポリイミド、液晶配向剤及び液晶配向膜
JP5790645B2 (ja) * 2010-04-30 2015-10-07 日産化学工業株式会社 ビスアミノフェニルアルキルウレアの新規な製造方法
KR101828101B1 (ko) 2010-06-30 2018-03-22 닛산 가가쿠 고교 가부시키 가이샤 액정 배향제, 액정 배향막, 및 액정 표시 소자
JP6056752B2 (ja) * 2011-03-31 2017-01-11 日産化学工業株式会社 液晶配向剤及びそれを用いた液晶配向膜
KR102285777B1 (ko) * 2013-10-23 2021-08-03 닛산 가가쿠 가부시키가이샤 신규 디아민, 폴리아믹산, 및 폴리이미드

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110080547A1 (en) * 2009-10-01 2011-04-07 Masaki Matsumori Liquid crystal display device
JP2012193167A (ja) * 2011-03-02 2012-10-11 Jnc Corp ジアミン、これを用いた液晶配向剤、液晶表示素子および液晶配向膜の形成方法

Also Published As

Publication number Publication date
JP2021001207A (ja) 2021-01-07
JPWO2015060359A1 (ja) 2017-03-09
CN110950781A (zh) 2020-04-03
US20160264520A1 (en) 2016-09-15
CN105683155A (zh) 2016-06-15
JP2022103258A (ja) 2022-07-07
JP2019073549A (ja) 2019-05-16
TW201529540A (zh) 2015-08-01
US10023530B2 (en) 2018-07-17
WO2015060359A1 (ja) 2015-04-30
JP6512103B2 (ja) 2019-05-15
JP7175789B2 (ja) 2022-11-21
KR102285777B1 (ko) 2021-08-03
KR20160075572A (ko) 2016-06-29

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