TWI687557B - Electrode polishing electrode frame, electrolytic polishing variable electrode frame, and electrolytic polishing device including the same - Google Patents

Electrode polishing electrode frame, electrolytic polishing variable electrode frame, and electrolytic polishing device including the same Download PDF

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TWI687557B
TWI687557B TW107134548A TW107134548A TWI687557B TW I687557 B TWI687557 B TW I687557B TW 107134548 A TW107134548 A TW 107134548A TW 107134548 A TW107134548 A TW 107134548A TW I687557 B TWI687557 B TW I687557B
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bracket
negative electrode
negative
plate
electrolytic
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TW201914743A (en
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黃在祥
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南韓商奧森里德股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00Electrolytic etching or polishing
    • C25F3/16Polishing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25FPROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F7/00Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating

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  • Chemical Kinetics & Catalysis (AREA)
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  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
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Abstract

本發明提供一種電解研磨用電極框架、可變型電極框架及包括其的電解研磨裝置。為了達成目的,一實施例的電極框架作為在內部形成有容納電解研磨物件和電解液的容納空間的電解槽中使用的電極框架,可以包括:負極框架,其與電解研磨物件隔開配置,包括第一方向的第一負極板、第二方向的第二負極板、與第一方向及第二方向不同方向的第三方向的第三負極板;及電極結合構件,其配置於電解研磨物件的角部,使第一負極板至第三負極板連接。電極結合構件可以包括與第一負極板結合的第一支架、與第二負極板結合的第二支架及與第三負極板結合的第三支架。在負極框架的一側,可以包括使負極框架從電解研磨物件的側面或底面隔開的隔開構件。The invention provides an electrode frame for electrolytic polishing, a variable electrode frame and an electrolytic polishing device including the same. In order to achieve the purpose, the electrode frame of an embodiment is used as an electrode frame in an electrolytic cell in which an accommodating space for accommodating an electrolytic abrasive article and an electrolyte is formed, and may include: a negative electrode frame that is spaced apart from the electrolytic abrasive article, including A first negative electrode plate in the first direction, a second negative electrode plate in the second direction, a third negative electrode plate in a third direction different from the first direction and the second direction; and an electrode coupling member, which is disposed on the electrolytic abrasive article The corners connect the first negative electrode plate to the third negative electrode plate. The electrode coupling member may include a first bracket combined with the first negative plate, a second bracket combined with the second negative plate, and a third bracket combined with the third negative plate. On one side of the negative electrode frame, a partition member that separates the negative electrode frame from the side surface or bottom surface of the electrolytic abrasive article may be included.

Description

電解研磨用電極框架、電解研磨用可變型電極框架及包括其的電解研磨裝置Electrode polishing electrode frame, electrolytic polishing variable electrode frame, and electrolytic polishing device including the same

涉及電解研磨用電極框架、電解研磨用可變型電極框架及包括其的電解研磨裝置,涉及一種用於提高電解研磨物件的研磨品質的電解研磨裝置。The invention relates to an electrode frame for electrolytic polishing, a variable electrode frame for electrolytic polishing, and an electrolytic polishing device including the same, and relates to an electrolytic polishing device for improving the polishing quality of electrolytic polishing objects.

一般而言,電解研磨(Electro polishing)是一種將溶解於電解液的金屬製品用作正極(Anode)、將在電解液中不溶性的金屬用作負極(Cathode),通過向所述正極與負極之間施加電壓,在作為電解研磨物件的金屬製品的表面引起電解來研磨金屬製品表面的方法。Generally speaking, Electropolishing is the use of a metal product dissolved in an electrolyte as an anode and a metal insoluble in an electrolyte as a cathode. A method of applying a voltage to the surface of a metal product as an electrolytic polishing object to cause electrolysis to polish the surface of the metal product.

為了利用電解研磨來研磨金屬,在電解槽中填充電解液,將要研磨的金屬安裝為正極,將不溶解於電解液的金屬安裝為負極,然後向正極和負極施加直流。In order to grind the metal by electrolytic grinding, the electrolytic cell is filled with an electrolyte, the metal to be grinded is installed as a positive electrode, and the metal insoluble in the electrolyte is installed as a negative electrode, and then DC is applied to the positive electrode and the negative electrode.

進行電解研磨後,大量含有從正極溶解的金屬離子的高黏度液體層(黏性層)包圍正極。在因金屬離子而飽和的液體層中,金屬不再溶解,形成高正極電位,因而與氧活躍地結合而形成氧化物皮膜。此時,溶解的金屬離子主要累積於金屬表面的凹陷部分,在凹陷部分,金屬離子的移動和擴散小,電性導通不暢,因而金屬不溶解。相反,在金屬表面的凸出部分,金屬離子層形成得薄,因而電流集中,容易使金屬表面溶解,整體而言,金屬表面變得平滑。After electrolytic polishing, a high-viscosity liquid layer (viscous layer) containing a large amount of metal ions dissolved from the positive electrode surrounds the positive electrode. In the liquid layer saturated with metal ions, the metal no longer dissolves, forming a high positive electrode potential, and thus actively combines with oxygen to form an oxide film. At this time, the dissolved metal ions mainly accumulate in the concave portion of the metal surface. In the concave portion, the movement and diffusion of the metal ions are small, and the electrical conduction is not smooth, so the metal is not dissolved. On the contrary, in the protruding part of the metal surface, the metal ion layer is formed thin, so the current is concentrated, it is easy to dissolve the metal surface, and overall, the metal surface becomes smooth.

電解研磨通過電解研磨裝置實施,以往技術的電解研磨裝置的極板以板形狀形成,各個負極板組裝成既定形態,與電解研磨物件的研磨面隔開地安裝。The electrolytic polishing is carried out by an electrolytic polishing device. The electrode plates of the conventional electrolytic polishing device are formed in a plate shape, and each negative electrode plate is assembled into a predetermined form, and is installed at a distance from the polishing surface of the electrolytic polishing object.

如上所述組裝的負極板應以不與電解研磨物件接觸的方式安裝於電解槽內。可是,負極板只有與電解研磨物件接近地保持既定距離並配置,才能實現均一研磨,提高電解研磨品質。The negative plate assembled as described above should be installed in the electrolytic cell in such a way that it does not come into contact with electrolytic abrasive objects. However, only when the negative electrode plate is kept at a predetermined distance and arranged close to the electrolytic polishing object can uniform polishing be achieved and the quality of electrolytic polishing can be improved.

但是在以往技術中,實際上無法將負極板以與電解研磨物件接近地保持既定距離的方式堅固地配置。However, in the conventional technology, it is practically impossible to firmly arrange the negative electrode plate so as to maintain a predetermined distance close to the electrolytic polishing object.

另一方面,本件申請的發明人研發了在電解研磨物件上形成的放出口使用負極托架而在使負極板接近電解研磨物件一側的同時均一地固定的發明,並獲專利授權(參照韓國授權專利10-1183218號)。On the other hand, the inventor of the present application developed an invention that uses a negative electrode bracket formed on the discharge port formed on the electrolytically polished object to uniformly fix the negative electrode plate while approaching the side of the electrolytically polished object, and obtained a patent authorization (see Korea Authorized patent No. 10-1183218).

但是,負極板由於需要與電解研磨物件距離相當近地安裝,因而負極板與電解研磨物件之間的空間非常狹小,特別是電解研磨物件的角部具有更狹小的空間。However, since the negative electrode plate needs to be installed relatively close to the electrolytically polished object, the space between the negative electrode plate and the electrolytically polished object is very narrow, especially the corner of the electrolytically polished object has a narrower space.

另一方面,作為現在原有領域的技術,為了將負極板在角部相互連接而需要使用各種夾具,在電解研磨物件角部的狹小空間,負極板的組裝相當困難,因此,發生組裝時間上升及費用上升的問題。On the other hand, as a technology in the prior art, various jigs need to be used in order to connect the negative electrode plates to each other at the corners. In the narrow space at the corners of the electrolytically polished object, the assembly of the negative electrode plates is quite difficult, so the assembly time increases And rising costs.

另外,當在電解研磨物件的角部空間組裝負極板時,連接固定負極板的多個夾具彼此妨礙,因而無法使用多個夾具,因此,存在無法堅固地固定負極板的問題。In addition, when the negative electrode plate is assembled in the corner space of the electrolytic polishing article, a plurality of jigs connecting and fixing the negative electrode plate interfere with each other, so that a plurality of jigs cannot be used, and therefore there is a problem that the negative electrode plate cannot be firmly fixed.

另外,為了使負極板固定而使用多個夾具,因此,在電解研磨物件的狹小的角部,發生夾具與電解研磨物件接觸而引起短路的問題。In addition, a plurality of jigs are used to fix the negative electrode plate. Therefore, at the narrow corners of the electrolytically polished object, a problem that the jig contacts the electrolytically polished object and causes a short circuit occurs.

另外,以往,原有的多個負極板借助於夾具而獨立地固定,此時,負極板在電解研磨過程因氧化等而會處於表面導電率下降的狀態,因此,在每當需要時而結合各個負極板的情況下,導電性低下,結果存在電解研磨的效率或品質低下的問題。In addition, in the past, the original multiple negative plates were independently fixed by means of jigs. At this time, the negative plates will be in a state where the surface conductivity decreases due to oxidation or the like during the electrolytic polishing process. Therefore, they are combined whenever necessary In the case of each negative electrode plate, the conductivity is lowered, and as a result, there is a problem that the efficiency or quality of electrolytic polishing is lowered.

又一方面,隨著電解研磨物件的大小及研磨面面積的多樣化,預先組裝的負極板在使用一次後丟棄,或者完全分離後重新組裝、安裝。因此,發生新製作或重新組裝負極板所需的時間及費用上升的問題。On the other hand, with the diversification of the size of the electrolytic polishing object and the area of the polishing surface, the pre-assembled negative electrode plate is discarded after being used once or completely separated and then reassembled and installed. Therefore, a problem arises in that the time and cost required to newly manufacture or reassemble the negative electrode plate increase.

特別是當電解研磨物件的形狀複雜時,例如,在電解研磨物件的上側寬度與下側寬度較寬而中間區域的寬度相對較窄的情況下,負極板的組裝或移動困難,實際上以大致的形態進行電解研磨。Especially when the shape of the electrolytic polishing object is complicated, for example, in the case where the upper and lower widths of the electrolytic polishing object are wider and the width of the middle region is relatively narrow, it is difficult to assemble or move the negative electrode plate. The form of electrolytic polishing.

例如,在電解研磨物件的形狀複雜的情況下,作為現在原有領域技術,將負極棒垂掛於電解槽,或以負極網形態形成大網後,將其垂掛於電解槽而大致地進行電解研磨,但卻是電解研磨品質或工序效率非常低的狀態。For example, when the shape of an electrolytic polishing object is complicated, as a prior art technique, a negative electrode rod is hung on an electrolytic cell or a large mesh is formed in the form of a negative electrode mesh, and then it is hung on an electrolytic cell to roughly perform electrolytic polishing , But it is a state of very low electrolytic polishing quality or process efficiency.

另一方面,以往技術的負極板借助於作為另外的支撐構件的夾具而支撐,但負極板與電解研磨物件之間的距離非常接近地配置,因而難以在負極板與電解研磨物件之間的狹小空間安裝夾具。即,由於夾具以導電性材質形成,因此,如果夾具與正極的電解研磨物件接觸,則與具有負極的負極板發生電性短路。On the other hand, the negative electrode plate of the prior art is supported by means of a jig that is another supporting member, but the distance between the negative electrode plate and the electrolytic polishing object is arranged very close, making it difficult to narrow the negative electrode plate and the electrolytic polishing object Space installation fixture. That is, since the jig is formed of a conductive material, if the jig comes into contact with the electrolytic abrasive article of the positive electrode, an electrical short-circuit occurs with the negative electrode plate having the negative electrode.

(要解決的技術問題)(Technical problems to be solved)

經由一實施例,目的是提供一種用於使在電解研磨物件的角部配置的多個負極板堅固地固定的電解研磨裝置。According to an embodiment, an object is to provide an electrolytic polishing device for firmly fixing a plurality of negative plates disposed at corners of an electrolytic polishing object.

另外,經由一實施例,目的是提供一種用於防止在電解研磨物件角部配置的多個夾具與電解研磨物件短路的電解研磨裝置。In addition, according to an embodiment, an object is to provide an electrolytic polishing device for preventing a short circuit between a plurality of jigs arranged at corners of an electrolytic polishing object and an electrolytic polishing object.

另外,經由一實施例,目的是提供一種能夠縮短在電解研磨物件角部配置的負極框架組裝時間的電解研磨裝置。In addition, according to an embodiment, an object is to provide an electrolytic polishing device capable of shortening the assembly time of a negative electrode frame disposed at a corner of an electrolytic polishing object.

另外,經由一實施例,目的是使得導電率優秀、電解研磨的效率及研磨品質優秀。In addition, through an embodiment, the purpose is to make the conductivity excellent, the efficiency of electrolytic polishing and the quality of polishing excellent.

另外,經由一實施例,目的是提供一種用於防止因夾具而發生負極板與電解研磨物件之間的電性短路的電解研磨裝置。In addition, according to an embodiment, an object is to provide an electrolytic polishing device for preventing an electrical short circuit between a negative electrode plate and an electrolytic polishing object due to a jig.

另外,經由一實施例,目的是提供一種能夠根據電解研磨物件的大小而擴張或縮小的可變型電極框架、電解研磨用電極框架的固定構件及包括其的電解研磨裝置。In addition, according to an embodiment, an object is to provide a variable electrode frame capable of expanding or contracting according to the size of an electrolytic polishing object, a fixing member of an electrode frame for electrolytic polishing, and an electrolytic polishing device including the same.

另外,經由一實施例,目的是提供一種即使在電解研磨物件形狀複雜的情況下也能夠有效電解研磨的可變型電極框架、電解研磨用電極框架的固定構件及包括其的電解研磨裝置。In addition, according to an embodiment, an object is to provide a variable electrode frame capable of effectively electrolytic polishing even when the shape of an electrolytic polishing object is complicated, a fixing member of an electrode frame for electrolytic polishing, and an electrolytic polishing device including the same.

另外,經由另一實施例,另一目的是提供一種用於防止因夾具而發生負極板與電解研磨物件之間的電性短路的電解研磨裝置。In addition, according to another embodiment, another object is to provide an electrolytic polishing device for preventing an electrical short circuit between a negative electrode plate and an electrolytic polishing object due to a jig.

(解決問題的手段)(Means for solving problems)

為了達成所述目的,一實施例中,電極框架作為在內部形成有容納電解研磨物件和電解液的容納空間的電解槽中使用的電極框架,可以包括:負極框架,其與所述電解研磨物件隔開配置,包括第一方向的第一負極板、第二方向的第二負極板、與所述第一方向及第二方向不同方向的第三方向的第三負極板;及電極結合構件,其配置於所述電解研磨物件的角部,使所述第一負極板至所述第三負極板連接。In order to achieve the above object, in one embodiment, the electrode frame is used as an electrode frame in an electrolytic cell in which an accommodating space for accommodating an electrolytic abrasive article and an electrolyte is formed, and may include a negative electrode frame that is in contact with the electrolytic abrasive article Spaced apart configuration, including a first negative electrode plate in a first direction, a second negative electrode plate in a second direction, a third negative electrode plate in a third direction different from the first direction and the second direction; and an electrode coupling member, It is arranged at the corner of the electrolytic polishing object, and connects the first negative electrode plate to the third negative electrode plate.

所述電極結合構件可以包括與所述第一負極板結合的第一支架、與所述第二負極板結合的第二支架及與所述第三負極板結合的第三支架。The electrode coupling member may include a first bracket combined with the first negative plate, a second bracket combined with the second negative plate, and a third bracket combined with the third negative plate.

在所述負極框架的一側,可以包括使所述負極框架從所述電解研磨物件的側面或底面隔開的隔開構件。On one side of the negative electrode frame, a partition member that separates the negative electrode frame from the side or bottom surface of the electrolytic abrasive article may be included.

另外,實施例的電極框架可以包括:第一負極板,其向第一方向配置並由多個支架構成;第二負極板,其向與所述第一方向構成既定角度的第二方向配置,由多個支架構成。In addition, the electrode frame of the embodiment may include: a first negative electrode plate arranged in a first direction and composed of a plurality of brackets; a second negative electrode plate arranged in a second direction that forms a predetermined angle with the first direction, Consists of multiple brackets.

所述第一負極板可以包括第一支架和第二支架,所述第一支架在一部分重疊於所述第二支架的狀態下,可以向從所述第二支架遠離或靠近的方向移動,所述第一支架與所述第二支架的重疊區域可以為變長或變短的可變型。The first negative plate may include a first bracket and a second bracket. The first bracket may move in a direction away from or close to the second bracket when a part of the second bracket overlaps the second bracket. The overlapping area of the first bracket and the second bracket may be a variable type that becomes longer or shorter.

電解研磨物件可以包括互不相同的寬度的第一區域和第二區域,所述可變型的第一負極板可變,以便能夠穿過所述電解研磨物件的第二區域,穿過所述第二區域的所述第一負極板為可變型,以便與所述電解研磨物件的第一區域的面積對應地可變。The electrolytic abrasive article may include a first area and a second area having different widths from each other, and the variable first negative electrode plate may be changed so as to be able to pass through the second area of the electrolytic abrasive article and pass through the first The first negative plates of the two regions are of a variable type so as to be variable corresponding to the area of the first region of the electrolytic abrasive article.

在一實施例中,電解研磨裝置可以包括所述電極框架。In an embodiment, the electrolytic polishing device may include the electrode frame.

(發明的效果)(Effect of invention)

經由一實施例,在電解研磨物件的角部配備電極結合構件,從而具有可以縮短多個負極板的組裝時間的效果。According to an embodiment, an electrode coupling member is provided at the corner of the electrolytically polished object, which has the effect of shortening the assembly time of a plurality of negative plates.

另外,經由一實施例,電極結合構件具有無需多個固定構件也可以使負極板更堅固地固定的效果。In addition, according to an embodiment, the electrode coupling member has an effect that the negative electrode plate can be more firmly fixed without a plurality of fixing members.

另外,在一實施例中具有的效果,電極結合構件可以在狹小的電解研磨物件的角部容易地安裝,可以防止與電解研磨物件短路。In addition, in an embodiment, there is an effect that the electrode coupling member can be easily installed at the corner of a narrow electrolytic abrasive article, and a short circuit with the electrolytic abrasive article can be prevented.

另外,在一實施例中,電極結合構件可以在具有90度以上的電解研磨物件的角部容易地安裝,具有可以對電解研磨物件的角部有效執行電解研磨的效果。In addition, in one embodiment, the electrode coupling member can be easily installed at the corner of the electrolytically polished object having a degree of 90 degrees or more, and has an effect that the electrolytic polishing can be effectively performed on the corner of the electrolytically polished object.

另外,在一實施例中,電極結合構件即使電解研磨物件的角部不具有頂點,也可以有效安裝,因而具有可以對電解研磨物件的角部有效執行電解研磨的效果。In addition, in one embodiment, the electrode coupling member can be effectively mounted even if the corner of the electrolytically polished object does not have a vertex, and thus has the effect that electrolytic polishing can be effectively performed on the corner of the electrolytically polished object.

另外,在一實施例中,在導電性優秀的狀態下,使負極板預先堅固地固定,準備負極框架、支架,從而具有導電率優秀、電解研磨效率及研磨品質非常優秀的技術效果。In addition, in one embodiment, in a state where the conductivity is excellent, the negative electrode plate is firmly fixed in advance, and a negative electrode frame and a bracket are prepared, which has the technical effects of excellent conductivity, excellent electrolytic polishing efficiency, and excellent polishing quality.

另外,在一實施例中,夾具還形成絕緣部,從而具有可以在負極框架與電解研磨物件之間的狹小空間可以容易地安裝的效果。In addition, in one embodiment, the jig also forms an insulating portion, thereby having the effect that the narrow space between the negative electrode frame and the electrolytic abrasive article can be easily installed.

另外,在一實施例中,可變型電極框架以與電解研磨物件的研磨面對應的大小組裝,配置於電解研磨物件的研磨面,從而具有可以節省新製作或重新組裝負極板所需的時間及費用的效果。In addition, in one embodiment, the variable electrode frame is assembled with a size corresponding to the polishing surface of the electrolytic polishing object, and is disposed on the polishing surface of the electrolytic polishing object, thereby saving time and time required for newly manufacturing or reassembling the negative electrode plate. Cost effect.

另外,經由一實施例可以提供即使在電解研磨物件形狀複雜的情況下也可以有效電解研磨的可變型電極框架及包括其的電解研磨裝置。In addition, according to an embodiment, it is possible to provide a variable electrode frame that can be effectively electrolytically polished even when the shape of the electrolytically polished object is complicated, and an electrolytic polishing device including the same.

另外,在一實施例中,可變型電極框架構成得使第一支架在第二支架上滑動結合,具有可以更有效控制可變型電極框架的大小的效果。In addition, in one embodiment, the variable electrode frame is configured such that the first bracket is slidingly coupled to the second bracket, which has the effect that the size of the variable electrode frame can be more effectively controlled.

另外,經由一實施例將具有互不相同面積並電性連接的多個可變型電極框架及輔助負極板配置於研磨面,從而具有可以對具有互不相同面積的電解研磨物件的研磨面有效進行電解研磨的效果。In addition, according to an embodiment, a plurality of variable electrode frames and auxiliary negative plates that are electrically connected to each other with different areas are arranged on the polishing surface, so that the polishing surface can be effectively performed on electrolytic polishing objects with different areas The effect of electrolytic polishing.

下面參照圖式,詳細說明實施例。The embodiments will be described in detail below with reference to the drawings.

圖1是顯示第一實施例的電解研磨裝置的立體圖,圖2是顯示第一實施例的電解研磨裝置的電極結合構件的立體圖,圖3是顯示第一實施例的電解研磨裝置的電極結合構件的分解立體圖,圖4a及圖4b是顯示第一實施例的電解研磨裝置的夾具的立體圖,圖5是顯示第一實施例的電解研磨裝置的負極框架的變形例的立體圖。1 is a perspective view showing the electrolytic polishing apparatus of the first embodiment, FIG. 2 is a perspective view showing the electrode coupling member of the electrolytic polishing apparatus of the first embodiment, and FIG. 3 is an electrode coupling member of the electrolytic polishing apparatus of the first embodiment. 4a and 4b are perspective views showing the jig of the electrolytic polishing device of the first embodiment, and FIG. 5 is a perspective view showing a modification of the negative electrode frame of the electrolytic polishing device of the first embodiment.

參照圖1,實施例的電極框架作為在內部形成有容納電解研磨物件200和電解液的容納空間的電解槽100中使用的電極框架,可以包括:負極框架500,其與所述電解研磨物件200隔開配置,包括第一方向的第一負極板510、第二方向的第二負極板520、與所述第一方向及第二方向不同方向的第三方向的第三負極板530;及電極結合構件400,其配置於所述電解研磨物件的角部,使所述第一負極板至所述第三板連接。Referring to FIG. 1, the electrode frame of the embodiment is used as an electrode frame in an electrolytic cell 100 in which an accommodating space for accommodating an electrolytic abrasive article 200 and an electrolyte is formed, and may include: a negative electrode frame 500 that is in contact with the electrolytic abrasive article 200 The spaced apart configuration includes a first negative electrode plate 510 in a first direction, a second negative electrode plate 520 in a second direction, and a third negative electrode plate 530 in a third direction different from the first direction and the second direction; and electrodes The coupling member 400 is disposed at the corner of the electrolytic polishing object, and connects the first negative electrode plate to the third plate.

另外,第一實施例的電解研磨裝置可以包括:容納電解研磨物件200和電解液的電解槽100;與所述電解研磨物件200隔開配置的負極框架500;配置於所述電解研磨物件200的角部並使所述負極框架500連接的電極結合構件400。在實施例中,電極框架可以包括負極框架。In addition, the electrolytic polishing apparatus of the first embodiment may include: an electrolytic cell 100 containing an electrolytic polishing object 200 and an electrolyte; a negative electrode frame 500 disposed apart from the electrolytic polishing object 200; The electrode coupling member 400 that connects the negative electrode frame 500 to the corner. In an embodiment, the electrode frame may include a negative electrode frame.

電解槽100可以以在內部配備有容納空間的箱形狀形成。電解槽100可以包括圓筒形、多邊箱或環形狀,但其形狀並不限定。The electrolytic cell 100 may be formed in a box shape equipped with an accommodating space inside. The electrolytic cell 100 may include a cylindrical shape, a polygonal box, or a ring shape, but the shape is not limited.

在電解槽100的內部可以填充有電解液。作為電解液,可以將從由蒸餾水(H2 O)、硫酸(H2 SO4)類、磷酸(H3 PO4 )類、鉻酸類、硝酸鈉(NaNO3 )、氯化鈉(NaCl)、甘油類構成的組中選擇的至少一種物質混合構成,但並不限定於此。The electrolytic cell 100 may be filled with electrolyte. As the electrolyte, it can be made from distilled water (H 2 O), sulfuric acid (H 2 SO 4 ), phosphoric acid (H 3 PO 4 ), chromic acid, sodium nitrate (NaNO 3 ), sodium chloride (NaCl), glycerin At least one substance selected from the group consisting of a class is mixed and constituted, but it is not limited to this.

電解液可以在填充於電解槽100的狀態下,在結束電解研磨物件200的電解研磨後更換。不同於此,電解液可以借助於在電解槽100的一側獨立地形成的泵而流入、流出。在電解槽100與泵之間,可以形成有電解液流入管、電解液流出管,可以還包括電解液流量調節部、篩檢程式。篩檢程式可以過濾電解液中包含的加工物渣滓及異物質。The electrolytic solution can be replaced after the electrolytic polishing of the electrolytic polishing article 200 is completed while the electrolytic cell 100 is filled. Unlike this, the electrolyte can flow in and out by means of a pump formed independently on one side of the electrolytic cell 100. Between the electrolytic cell 100 and the pump, an electrolyte inflow tube and an electrolyte outflow tube may be formed, and may further include an electrolyte flow adjustment part and a screening program. The screening program can filter the dregs and foreign substances contained in the electrolyte.

在電解槽100的內部可以容納電解研磨物件200。電解槽100的大小可以大於電解研磨物件200地形成。電解研磨物件200可以為多邊形的腔室或圓筒形的箱子。電解研磨物件200可以是用於OLED製造的腔室。另一方面,在電解研磨物件200為OLED用腔室或LED用MOCVD腔室等的情況下,也存在其重量為數百kg到數千kg(數噸)的巨大的情形。The electrolytic abrasive article 200 can be accommodated inside the electrolytic cell 100. The size of the electrolytic cell 100 may be larger than that of the electrolytic abrasive article 200. The electrolytic abrasive article 200 may be a polygonal chamber or a cylindrical box. The electrolytic abrasive article 200 may be a chamber for OLED manufacturing. On the other hand, when the electrolytic polishing article 200 is a chamber for OLEDs or a MOCVD chamber for LEDs, etc., there are also cases where the weight is hundreds to thousands of kilos (several tons).

另外,電解研磨物件200也可以是OLED腔室的一部分構成部件。電解研磨物件200可以為箱形狀或上下貫通形成的環形狀。電解研磨物件200並不限定於此,可以將所有金屬材質製品指定為電解研磨物件。電解研磨物件200浸於電解液內。In addition, the electrolytic abrasive article 200 may be a part of a component of the OLED chamber. The electrolytic polishing article 200 may have a box shape or a ring shape formed through vertically. The electrolytic polishing article 200 is not limited to this, and all metal materials can be designated as electrolytic polishing articles. The electrolytic abrasive article 200 is immersed in the electrolyte.

電解研磨物件200由於其重量相當大,因此,例如可以在利用起重機等吊起的狀態下,容納於電解槽100的容納空間。電解研磨物件200可以借助於另外的支撐構件,在電解槽100內部與電解研磨物件200的研磨面隔開地配置。電解研磨物件200的研磨面可以包括電解研磨物件的外側、內側、底面等。Since the electrolytic abrasive article 200 has a considerable weight, for example, it can be accommodated in the accommodating space of the electrolytic cell 100 in a state of being lifted by a crane or the like. The electrolytic polishing article 200 can be arranged in the electrolytic cell 100 at a distance from the polishing surface of the electrolytic polishing article 200 by means of another support member. The polishing surface of the electrolytic polishing object 200 may include the outer side, the inner side, the bottom surface, and the like of the electrolytic polishing object.

在電解槽200的外側還可以配置有整流器。整流器可以向電解研磨物件接入正極(+)的電壓,可以向負極框架500接入負極(-)的電壓。整流器可以借助於電線等而與電解研磨物件200電性連接。A rectifier may also be arranged outside the electrolytic cell 200. The rectifier can connect the voltage of the positive electrode (+) to the electrolytic grinding object, and can connect the voltage of the negative electrode (-) to the negative electrode frame 500. The rectifier may be electrically connected to the electrolytic abrasive article 200 by means of wires or the like.

負極框架500可以配置於電解研磨物件200的內部及外部。負極框架500可以與電解研磨物件200的研磨面隔開既定間隔配置。例如,負極框架500與電解研磨物件200按50mm±20mm距離均一地隔開配置,因而電解研磨效率提高,電解研磨品質非常優秀。The negative electrode frame 500 may be disposed inside and outside the electrolytic polishing article 200. The negative electrode frame 500 may be arranged at a predetermined interval from the polishing surface of the electrolytic polishing article 200. For example, the negative electrode frame 500 and the electrolytic polishing object 200 are uniformly spaced apart by a distance of 50 mm±20 mm, so the electrolytic polishing efficiency is improved and the electrolytic polishing quality is very excellent.

負極框架500可以選擇性地研磨作為電解研磨物件200研磨面的內側、外側或底面,或者研磨所有面。在本實施例中,為了說明的便利,對負極框架500配置於電解研磨物件200的內側的結構進行說明。The negative electrode frame 500 may selectively grind the inner side, the outer side, or the bottom surface as the polishing surface of the electrolytic polishing object 200, or polish all surfaces. In this embodiment, for convenience of explanation, the structure in which the negative electrode frame 500 is disposed inside the electrolytic polishing article 200 will be described.

負極框架500可以包括格子結構。負極框架500可以為導電率卓越的不銹鋼材料,但並不限定於此。負極框架500可以為條(bar)形狀、L字形狀、角形狀、棒形狀、線網、孔板金屬、圓形狀的板,但並不限定於此。The negative electrode frame 500 may include a lattice structure. The negative electrode frame 500 may be a stainless steel material having excellent conductivity, but it is not limited thereto. The negative electrode frame 500 may be a bar-shaped, L-shaped, angular, bar-shaped, wire mesh, orifice metal, or round-shaped plate, but it is not limited thereto.

負極框架500可以包括沿第一方向配置的第一負極板510、與第一方向不同方向例如構成垂直地配置的第二負極板520、與第一方向和第二方向不同方向例如構成垂直的第三負極板530。第一負極板510、第二負極板520、第三負極板530分別可以為條(bar)形狀、L字形狀、角形狀、棒形狀、線網、孔板金屬、圓形狀的板,但並不限定於此。The negative electrode frame 500 may include a first negative electrode plate 510 arranged along the first direction, a second negative electrode plate 520 arranged vertically different from the first direction, for example, and a different first direction arranged differently from the first direction and the second direction, for example. Three negative plates 530. The first negative electrode plate 510, the second negative electrode plate 520, and the third negative electrode plate 530 may be bar-shaped, L-shaped, angular, bar-shaped, wire mesh, orifice metal, or round-shaped plates, respectively. Not limited to this.

第一負極板510可以由多個板構成,構成得上下隔開地配置。第二負極板520可以由多個板構成,構成得上下隔開配置。第一負極板510和第二負極板520可以對研磨物件物200的內部側面進行研磨。The first negative electrode plate 510 may be composed of a plurality of plates, which are arranged so as to be spaced up and down. The second negative electrode plate 520 may be composed of a plurality of plates, which are configured to be spaced up and down. The first negative plate 510 and the second negative plate 520 may grind the inner side surface of the abrasive article 200.

在最下方配置的第一負極板510與第二負極板520之間,可以還配置有多個負極板,以格子結構配置。多個支架可以通過鉚釘、螺栓或焊接等組裝裝置而相互結合。如上所述組裝的負極框架500可以對電解研磨物件200的內部底面有效進行電解研磨。如果電解研磨物件200的底面不存在,則在最下方配置的第一負極板510與第二負極板520之間的多個負極板可以去除。Between the first negative electrode plate 510 and the second negative electrode plate 520 arranged at the bottom, a plurality of negative electrode plates may be further arranged in a lattice structure. Multiple brackets can be combined with each other through assembly devices such as rivets, bolts or welding. The negative electrode frame 500 assembled as described above can effectively perform electrolytic polishing on the inner bottom surface of the electrolytic polishing article 200. If the bottom surface of the electrolytic polishing article 200 does not exist, a plurality of negative electrode plates between the first negative electrode plate 510 and the second negative electrode plate 520 arranged at the bottom can be removed.

第三負極板530可以在第一負極板510與第二負極板520相交區域形成。多個第三負極板530可以與多個第一負極板510交叉配置。多個第三負極板530可以與多個第二負極板520交叉配置。第三負極板530可以沿電解研磨物件200的縱向配置。The third negative electrode plate 530 may be formed in a region where the first negative electrode plate 510 and the second negative electrode plate 520 intersect. The plurality of third negative plates 530 may be configured to cross the plurality of first negative plates 510. The plurality of third negative plates 530 may be cross-configured with the plurality of second negative plates 520. The third negative plate 530 may be arranged along the longitudinal direction of the electrolytic abrasive article 200.

第一負極板510與第二負極板520可以垂直地配置,但並不限定於此。另外,第三負極板530與第一負極板510可以垂直地配置,但並不限定於此。The first negative plate 510 and the second negative plate 520 may be arranged vertically, but it is not limited thereto. In addition, the third negative electrode plate 530 and the first negative electrode plate 510 may be arranged vertically, but it is not limited thereto.

如上所述的結構的負極框架500應與研磨面隔開配置,使得不與正極的電解研磨物件200接觸。為此,在負極框架500的一側可以配備有隔開構件700。隔開構件700可以安裝得使負極框架500與電解研磨物件200的側壁或底部隔開。下面對隔開構件700與負極框架500和電解研磨物件200的底部隔開的結構進行說明。The negative electrode frame 500 having the above-mentioned structure should be disposed apart from the polishing surface so as not to contact the electrolytic polishing article 200 of the positive electrode. For this, a partition member 700 may be provided on one side of the negative electrode frame 500. The partition member 700 may be installed to partition the negative electrode frame 500 from the side wall or bottom of the electrolytic abrasive article 200. The structure in which the partition member 700 is partitioned from the bottom of the negative electrode frame 500 and the electrolytic abrasive article 200 will be described below.

隔開構件700可以在第一負極板510上形成多個。隔開構件700可以在第二負極板520上形成多個。隔開構件700可以以絕緣材質形成。隔開構件700可以承受負極框架500的重量,可以以耐酸性強的材質形成。隔開構件700可以包括PVC、橡膠、聚氨酯橡膠、電木中某一者。隔開構件700可以借助於C型夾具600而與第一負極板510結合。隔開構件700可以由在一側具有棱角部的板形成,但其形狀不限定。The partition member 700 may be formed in plurality on the first negative plate 510. The partition member 700 may be formed in plurality on the second negative electrode plate 520. The partition member 700 may be formed of an insulating material. The partition member 700 can bear the weight of the negative electrode frame 500, and can be formed of a material with strong acid resistance. The partition member 700 may include any one of PVC, rubber, urethane rubber, and bakelite. The partition member 700 may be combined with the first negative plate 510 by means of the C-shaped clamp 600. The partition member 700 may be formed of a plate having angular portions on one side, but its shape is not limited.

上面說明了隔開構件700在第一負極板510及第二負極板520形成的情形,但並不限定於此,也可以安裝於第三負極板530的一側。The above describes the case where the partition member 700 is formed on the first negative electrode plate 510 and the second negative electrode plate 520, but it is not limited to this, and may be attached to one side of the third negative electrode plate 530.

上面對負極框架500具有固定長度的結構進行了說明,但可以使用使負極框架500大小隨著電解研磨物件200增大而可變的可變結構的負極框架300。其中,負極框架300以第一負極板510及第二負極板520結構為中心進行說明。The structure in which the negative electrode frame 500 has a fixed length has been described above, but it is possible to use a variable structure negative electrode frame 300 that makes the size of the negative electrode frame 500 variable as the electrolytic polishing article 200 increases. Among them, the negative electrode frame 300 is described centering on the structures of the first negative electrode plate 510 and the second negative electrode plate 520.

如圖5所示,負極框架500的第一負極板510可以由多個支架構成,可以構成得其長度能夠加長或減小。第二負極板520的結構可以與第一負極板510的結構相同。下面,以第一負極板510的結構為中心進行說明。As shown in FIG. 5, the first negative electrode plate 510 of the negative electrode frame 500 may be composed of a plurality of brackets, and its length may be increased or decreased. The structure of the second negative plate 520 may be the same as the structure of the first negative plate 510. Hereinafter, the structure of the first negative electrode plate 510 will be mainly described.

第一負極板510可以構成得使多個支架連接。第一負極板510可以一部分重疊地配置,向相互遠離或靠近的方向移動。第一負極板510可以由多個支架構成,出於說明的便利,以第一負極板510由第一支架512和與所述第一支架512連接的第二支架514構成的結構為中心進行說明。在第一負極板510中,所述第一支架512可以稱為第一負極支架,所述第二支架514可以稱為第二負極支架。The first negative plate 510 may be configured to connect a plurality of brackets. The first negative plates 510 may be partially overlapped and moved toward or away from each other. The first negative plate 510 may be composed of a plurality of brackets. For convenience of description, the structure in which the first negative plate 510 is composed of the first bracket 512 and the second bracket 514 connected to the first bracket 512 will be mainly described . In the first negative electrode plate 510, the first support 512 may be referred to as a first negative support, and the second support 514 may be referred to as a second negative support.

第一支架512的一部分區域可以與第二支架514的一部分區域重疊形成。第一支架512與第二支架514的重疊的區域可以借助於C型夾具600而支撐。支撐第一支架512與第二支架514的C型夾具600可以稱為第四夾具。A portion of the first bracket 512 may overlap with a portion of the second bracket 514. The overlapping area of the first bracket 512 and the second bracket 514 may be supported by the C-clamp 600. The C-shaped clamp 600 supporting the first bracket 512 and the second bracket 514 may be referred to as a fourth clamp.

第一支架512與第二支架514可以沿相互遠離或靠近的方向移動。C型夾具600可以以第一支架512與第二支架514可以相互移動的程度的力,支撐第一支架512和第二支架514。不同於此,C型夾具600可以在使第一支架512和第二支架514移動後,進一步施加固定力,支撐第一支架512和第二支架514。The first bracket 512 and the second bracket 514 can move in directions away from or close to each other. The C-shaped clamp 600 can support the first bracket 512 and the second bracket 514 with a force such that the first bracket 512 and the second bracket 514 can move relative to each other. Unlike this, the C-shaped clamp 600 may further apply a fixing force after moving the first bracket 512 and the second bracket 514 to support the first bracket 512 and the second bracket 514.

第二負極板520可以與第一負極板510相同地包括第一支架522和第二支架524。第二負極板520的第一支架522可以沿從第二支架524遠離或靠近的方向移動。The second negative plate 520 may include the first bracket 522 and the second bracket 524 in the same manner as the first negative plate 510. The first bracket 522 of the second negative plate 520 may move in a direction away from or close to the second bracket 524.

第二負極板520的第一支架532和第二支架524可以一部分重疊地配置。第二負極板520的第一支架522與第二支架524的重疊的區域,可以借助於C型夾具600而支撐。因此,第二負極板530長度可變。The first bracket 532 and the second bracket 524 of the second negative electrode plate 520 may be partially overlapped. The overlapping area of the first bracket 522 and the second bracket 524 of the second negative electrode plate 520 can be supported by the C-shaped clamp 600. Therefore, the length of the second negative plate 530 is variable.

上面說明了第一負極板510和第二負極板520為可變結構的情形,但並不限定於此,第三負極板530可以由多個支架形成,以其長度可變的結構形成。The above describes the case where the first negative electrode plate 510 and the second negative electrode plate 520 have a variable structure, but it is not limited to this, and the third negative electrode plate 530 may be formed of a plurality of brackets and formed in a structure whose length is variable.

返回圖1,負極框架500與電解研磨物件200按50mm±20mm間隔配置,因而電解研磨物件200的角部的空間非常狹小。因此,在電解研磨物件200的角部,不容易結合多個負極框架500。在本實施例中,為了使多個負極框架500結合於電解研磨物件200的角部,可以配備有電極結合構件400。Returning to FIG. 1, the negative electrode frame 500 and the electrolytic polishing object 200 are arranged at an interval of 50 mm±20 mm, and therefore the space at the corner of the electrolytic polishing object 200 is very narrow. Therefore, it is not easy to join the plurality of negative electrode frames 500 at the corners of the electrolytic polishing article 200. In this embodiment, in order to couple the plurality of negative electrode frames 500 to the corners of the electrolytic abrasive article 200, an electrode coupling member 400 may be provided.

電極結合構件400可以配置於所述第一負極板510、第二負極板520與第三負極板530相交的區域。電極結合構件400可以使第一負極板510、第二負極板520、第三負極板530電性連接。電極結合構件400可以使第一負極板510、第二負極板520、第三負極板530固定。The electrode coupling member 400 may be disposed in a region where the first negative plate 510, the second negative plate 520, and the third negative plate 530 intersect. The electrode coupling member 400 may electrically connect the first negative electrode plate 510, the second negative electrode plate 520, and the third negative electrode plate 530. The electrode coupling member 400 may fix the first negative electrode plate 510, the second negative electrode plate 520, and the third negative electrode plate 530.

電極結合構件400可以包括與第一負極板510結合的第一支架410、與第二負極板520結合的第二支架420、與第三負極板530結合的第三支架430。The electrode coupling member 400 may include a first bracket 410 combined with the first negative plate 510, a second bracket 420 combined with the second negative plate 520, and a third bracket 430 combined with the third negative plate 530.

第一支架410可以以與第一負極板510對應的形狀形成。例如,第一支架至第三支架410、420、430可以包括L字形狀、條(bar)形狀、角形狀、棒形狀、圓形狀,但並不限定於此。第一負極板510可以借助於C型夾具600而在與第一支架410重疊的狀態下固定。The first bracket 410 may be formed in a shape corresponding to the first negative plate 510. For example, the first to third brackets 410, 420, and 430 may include an L shape, a bar shape, an angular shape, a bar shape, or a round shape, but it is not limited thereto. The first negative electrode plate 510 may be fixed in a state of overlapping with the first bracket 410 by means of the C-shaped clamp 600.

第二支架420可以借助於與C型夾具600而與第二負極板520結合,第三支架430可以借助於C型夾具600而與第三負極板530結合。固定所述第一負極板510的C型夾具600可以稱為第一夾具,固定所述第二負極板520的C型夾具600可以稱為第二夾具,固定所述第三負極板530的C型夾具600可以稱為第三夾具。The second bracket 420 may be combined with the second negative electrode plate 520 by means of the C-shaped clamp 600, and the third bracket 430 may be combined with the third negative plate 530 by means of the C-shaped clamp 600. The C-type jig 600 fixing the first negative plate 510 may be called a first jig, and the C-type jig 600 fixing the second negative plate 520 may be called a second jig, fixing the C of the third negative plate 530 The type jig 600 may be referred to as a third jig.

另一方面,C型夾具600以導電性材質形成,因而安裝於負極框架500與電解研磨物件200之間狹小空間的C型夾具600,會與電解研磨物件200接觸,在負極框架500與電解研磨物件200之間發生電性短路。On the other hand, the C-type jig 600 is formed of a conductive material, so the C-type jig 600 installed in the narrow space between the negative electrode frame 500 and the electrolytic polishing object 200 comes into contact with the electrolytic polishing object 200. An electrical short circuit occurs between the objects 200.

為了防止這種情況,如圖4所示,可以在固定負極框架500與電極結合構件400的固定部610的一側,還形成有絕緣部620。其中,固定部610可以分別配置於第一主體640和第二主體650的一側。第二主體650可以以C字形狀形成,與第一主體640結合。第一主體640可以結合於第二主體650並上下移動。因此,相向配置於第一主體640與第二主體650的固定部510,可以沿相互靠近方向或遠離方向移動。In order to prevent this, as shown in FIG. 4, an insulating portion 620 may be further formed on the side of the fixing portion 610 that fixes the negative electrode frame 500 and the electrode coupling member 400. Wherein, the fixing portion 610 may be disposed on one side of the first body 640 and the second body 650 respectively. The second body 650 may be formed in a C-shape and combined with the first body 640. The first body 640 may be combined with the second body 650 and move up and down. Therefore, the fixing portions 510 disposed opposite to the first body 640 and the second body 650 can move in a direction closer to or away from each other.

絕緣部620可以在固定部610的一側形成,與負極框架500和電極結合構件400接觸。因此,C型夾具600即使與電解研磨物件200的一側接觸,也可以防止電解研磨物件200與負極框架500之間的電性短路。絕緣部620可以包括具有彈性的材質。絕緣部620可以包括PVC、橡膠、聚氨酯橡膠、電木等,但並不限定於此。The insulating portion 620 may be formed on one side of the fixing portion 610 and contact the negative electrode frame 500 and the electrode coupling member 400. Therefore, even if the C-shaped jig 600 is in contact with one side of the electrolytic polishing article 200, an electrical short circuit between the electrolytic polishing article 200 and the negative electrode frame 500 can be prevented. The insulating portion 620 may include an elastic material. The insulating portion 620 may include PVC, rubber, polyurethane rubber, bakelite, etc., but is not limited thereto.

另外,C字形狀的第二主體650的一部分可以與電解研磨物件200或負極板的一側接觸。為了防止這種情況,可以在第二主體650的表面還包括絕緣膜650b。第二主體650的內部為了保持剛性而可以由導電性物質650a構成,可以在第二主體650的外側面塗布形成有絕緣膜650b。In addition, a part of the C-shaped second body 650 may be in contact with one side of the electrolytic abrasive article 200 or the negative electrode plate. To prevent this, an insulating film 650b may be further included on the surface of the second body 650. In order to maintain rigidity, the inside of the second body 650 may be composed of a conductive substance 650a, and an insulating film 650b may be coated on the outer surface of the second body 650.

另外,在C型夾具600上,為了使相互結合的框架的固定力最大化,還可以形成有凸部630。凸部630具有可以防止C型夾具600例如從負極框架500打滑、防止C型夾具600從電極結合構件400脫離的效果。In addition, in the C-shaped jig 600, in order to maximize the fixing force of the mutually joined frames, a convex portion 630 may be formed. The convex portion 630 has an effect of preventing the C-type jig 600 from slipping from the negative electrode frame 500, for example, and preventing the C-type jig 600 from being detached from the electrode coupling member 400.

以上是在C型夾具600的固定部610的一側形成絕緣部620,但也可以以絕緣材質形成固定部610,去除絕緣部620。In the above, the insulating portion 620 is formed on the side of the fixing portion 610 of the C-shaped jig 600. However, the fixing portion 610 may be formed of an insulating material, and the insulating portion 620 may be removed.

如圖2及圖3所示,可以配置得使第一支架410與第二支架420構成的角度θ23構成90度,但並非限定於此。第三支架430可以配置得與第一支架410及第二支架420構成90度,但並非限定於此。As shown in FIGS. 2 and 3, the angle θ23 formed by the first bracket 410 and the second bracket 420 may be 90 degrees, but it is not limited thereto. The third bracket 430 may be configured to form a 90-degree angle with the first bracket 410 and the second bracket 420, but it is not limited thereto.

第一支架410可以包括第一面412和第二面414。第一支架410的第二面414可以從第一支架410的第一面412折彎既定角度形成。在本實施例中,第一支架410的第一面412與第一支架410的第二面414構成的角θ1可以包括90度。The first bracket 410 may include a first face 412 and a second face 414. The second surface 414 of the first bracket 410 may be formed by bending a predetermined angle from the first surface 412 of the first bracket 410. In this embodiment, the angle θ1 formed by the first surface 412 of the first bracket 410 and the second surface 414 of the first bracket 410 may include 90 degrees.

第二支架420可以包括第一面422和第二面424。第二支架420的第二面424可以從第二支架420的第二面424折彎既定角度形成。在本實施例中,第二支架420的第一面422與第二支架420的第二面424構成的角θ2可以包括90度。The second bracket 420 may include a first face 422 and a second face 424. The second surface 424 of the second bracket 420 may be formed by bending a predetermined angle from the second surface 424 of the second bracket 420. In this embodiment, the angle θ2 formed by the first surface 422 of the second bracket 420 and the second surface 424 of the second bracket 420 may include 90 degrees.

第三支架430可以包括第一面432和第二面434。第三支架430的第二面434可以從第三支架434的第一面432折彎既定角度形成。在本實施例中,第三支架430的第一面432與第三支架430的第二面434構成的角θ3可以包括90度。The third bracket 430 may include a first face 432 and a second face 434. The second face 434 of the third bracket 430 may be formed by bending a predetermined angle from the first face 432 of the third bracket 434. In this embodiment, the angle θ3 formed by the first surface 432 of the third bracket 430 and the second surface 434 of the third bracket 430 may include 90 degrees.

第一支架410的第一面412可以在第三支架430的第二面434的後方,通過包括鉚釘、螺栓或焊接等的組裝方式而結合。為此,在第一支架410的第一面412與第三支架430的第二面434,可以形成有相同大小的孔H。The first surface 412 of the first bracket 410 can be combined behind the second surface 434 of the third bracket 430 by an assembly method including rivets, bolts, or welding. For this reason, holes H of the same size may be formed on the first surface 412 of the first bracket 410 and the second surface 434 of the third bracket 430.

第一支架410的第二面414可以在第二支架420的第二面424的後方,通過包括鉚釘、螺栓或焊接等的組裝方式而結合。為此,在第一支架410的第二面414與第二支架420的第二面424,可以形成有相同大小的孔H。The second surface 414 of the first bracket 410 may be combined behind the second surface 424 of the second bracket 420 by an assembly method including rivets, bolts, welding, or the like. For this reason, holes H of the same size may be formed on the second surface 414 of the first bracket 410 and the second surface 424 of the second bracket 420.

第二支架420的第一面422可以在第三支架430的第一面432的前方,通過包括鉚釘、螺栓或焊接等的組裝方式而結合。為此,在第二支架420的第一面422與第三支架430的第一面432,可以形成有相同大小的孔H。The first surface 422 of the second bracket 420 may be combined in front of the first surface 432 of the third bracket 430 by an assembly method including rivets, bolts, or welding. For this reason, holes H of the same size may be formed on the first surface 422 of the second bracket 420 and the first surface 432 of the third bracket 430.

電極結合構件400將第一支架410在第三支架430的後方結合,將第二支架420在第三支架430的前方結合,從而可以更堅固地組裝。另外,電極結合構件400借助於結合構件而結合,從而具有能夠提高導電率的效果。The electrode coupling member 400 combines the first bracket 410 behind the third bracket 430 and the second bracket 420 in front of the third bracket 430, so that it can be assembled more firmly. In addition, the electrode coupling member 400 is coupled by the coupling member, so that it has an effect that the electrical conductivity can be improved.

第一實施例的電極結合構件400具有可以縮短多個負極板組裝所需時間的效果。另外,第一實施例的電極結合構件400具有可以使負極板更堅固地固定的效果。另外,第一實施例的電極結合構件400容易地安裝於狹小的電解研磨物件200的角部,具有可以防止與電解研磨物件200短路的效果。The electrode coupling member 400 of the first embodiment has an effect that the time required for assembly of a plurality of negative plates can be shortened. In addition, the electrode coupling member 400 of the first embodiment has an effect that the negative electrode plate can be more firmly fixed. In addition, the electrode coupling member 400 of the first embodiment is easily attached to the corner of the narrow electrolytic polishing article 200, and has the effect of preventing a short circuit with the electrolytic polishing article 200.

另外,以往,原有的多個負極板借助於夾具而獨立地固定,此時,負極板在電解研磨過程因氧化等而會處於表面導電率下降的狀態,因此,在每當需要時而結合各個負極板的情況下,導電性低下,結果存在電解研磨的效率或品質低下的問題。In addition, in the past, the original multiple negative plates were independently fixed by means of jigs. At this time, the negative plates will be in a state where the surface conductivity decreases due to oxidation or the like during the electrolytic polishing process. Therefore, they are combined whenever necessary In the case of each negative electrode plate, the conductivity is lowered, and as a result, there is a problem that the efficiency or quality of electrolytic polishing is lowered.

根據實施例,在導電性優秀的狀態下,使負極板預先堅固地固定,準備負極框架、支架,從而具有導電率優秀、電解研磨效率及研磨品質非常優秀的複合性技術效果。According to the embodiment, in a state where the conductivity is excellent, the negative electrode plate is firmly fixed in advance, and the negative electrode frame and the bracket are prepared, thereby having a composite technical effect of excellent conductivity, electrolytic polishing efficiency, and very excellent polishing quality.

第一實施例可以限定於電解研磨物件200為四邊箱形狀的情形。當電解研磨物件200為四邊箱形狀時,電解研磨物件200的角部可以形成得具有90度。當然,實施例不限定於此,即使電解研磨物件200不是四邊箱形狀,在電解研磨物件200角部構成90度的情況下也可以應用。The first embodiment can be limited to the case where the electrolytic abrasive article 200 has a four-sided box shape. When the electrolytic abrasive article 200 has a four-sided box shape, the corner of the electrolytic abrasive article 200 may be formed to have 90 degrees. Of course, the embodiments are not limited to this, and even if the electrolytic polishing article 200 is not in the shape of a four-sided box, it can be applied when the corners of the electrolytic polishing article 200 constitute 90 degrees.

下面說明由電解研磨物件200的角部形狀決定的電極結合構件400的另一實施例。Next, another embodiment of the electrode coupling member 400 determined by the shape of the corner of the electrolytic polishing article 200 will be described.

圖6是顯示第二實施例的電解研磨裝置的概略立體圖,圖7是顯示第二實施例的電解研磨裝置的電極結合構件的立體圖。在第二實施例中,對電解研磨物件的角部為90度以上的情形進行說明。此時,電解研磨物件可以為多邊箱或多邊環形狀的腔室。FIG. 6 is a schematic perspective view showing the electrolytic polishing apparatus of the second embodiment, and FIG. 7 is a perspective view showing the electrode coupling member of the electrolytic polishing apparatus of the second embodiment. In the second embodiment, the case where the corner of the electrolytic polishing object is 90 degrees or more will be described. At this time, the electrolytic polishing object may be a chamber in the shape of a polygonal box or a polygonal ring.

如圖6所示,第二實施例的電解研磨裝置可以包括:電解槽100,其在內部配備有容納電解研磨物件200和電解液的容納空間;負極框架500,其與所述電解研磨物件200隔開配置,包括第一方向的第一負極板510、第二方向的第二負極板520、與所述第一方向及第二方向不同方向例如垂直的第三方向的第三負極板530;電極結合構件400,其配置於所述電解研磨物件200的角部,使所述第一負極板至所述第三負極板510、520、530連接。As shown in FIG. 6, the electrolytic polishing apparatus of the second embodiment may include: an electrolytic cell 100 equipped with an accommodating space for accommodating an electrolytic polishing object 200 and an electrolyte; a negative electrode frame 500 that is connected to the electrolytic polishing object 200 The spaced apart configuration includes a first negative electrode plate 510 in a first direction, a second negative electrode plate 520 in a second direction, and a third negative electrode plate 530 in a third direction that is different from the first direction and the second direction, for example, perpendicular to the third direction; The electrode coupling member 400 is disposed at the corner of the electrolytic abrasive article 200, and connects the first negative electrode plate to the third negative electrode plates 510, 520, and 530.

電解槽100可以以在內部配備有容納空間的箱形狀形成。電解槽100可以包括圓筒形或多邊箱形狀,但其形狀不限定。在電解槽100的內部可以填充有電解液。在電解槽100的外側還可以配置有整流器。整流器可以向電解研磨物件施加正極(+)的電壓,可以向負極框架施加負極(-)的電壓。The electrolytic cell 100 may be formed in a box shape equipped with an accommodating space inside. The electrolytic cell 100 may include a cylindrical shape or a polygonal box shape, but the shape is not limited. The electrolytic cell 100 may be filled with electrolyte. A rectifier may also be arranged outside the electrolytic cell 100. The rectifier can apply a positive (+) voltage to the electrolytic abrasive article, and can apply a negative (-) voltage to the negative frame.

負極框架500可以包括沿第一方向配置的第一負極板510、與第一方向構成垂直地配置的第二負極板520、與第一方向和第二方向構成垂直的第三負極板530。第一負極板510、第二負極板520、第三負極板530分別可以為條(bar)形狀、L字形狀、角形狀、棒形狀、線網、孔板金屬、圓形狀的板,但並不限定於此。The negative electrode frame 500 may include a first negative electrode plate 510 arranged along the first direction, a second negative electrode plate 520 arranged perpendicular to the first direction, and a third negative electrode plate 530 perpendicular to the first direction and the second direction. The first negative electrode plate 510, the second negative electrode plate 520, and the third negative electrode plate 530 may be bar-shaped, L-shaped, angular, bar-shaped, wire mesh, orifice metal, or round-shaped plates, respectively. Not limited to this.

第一負極板510可以由多個板構成,構成得上下隔開地配置。第二負極板可以由多個板構成,構成得上下隔開配置。第一負極板510和第二負極板520可以對電解研磨物件200的內側面進行研磨。在最下方配置的第一負極板510與第二負極板520之間,可以還配置有多個負極板,但其也可以省略。The first negative electrode plate 510 may be composed of a plurality of plates, which are arranged so as to be spaced up and down. The second negative electrode plate may be composed of a plurality of plates, which are configured to be spaced up and down. The first negative plate 510 and the second negative plate 520 may grind the inner side of the electrolytic abrasive article 200. Between the first negative electrode plate 510 and the second negative electrode plate 520 arranged at the bottom, a plurality of negative electrode plates may be further arranged, but they may also be omitted.

第三負極板530可以在第一負極板510與第二負極板520相交區域形成。第三負極板530可以沿電解研磨物件200的縱向配置。The third negative electrode plate 530 may be formed in a region where the first negative electrode plate 510 and the second negative electrode plate 520 intersect. The third negative plate 530 may be arranged along the longitudinal direction of the electrolytic abrasive article 200.

第一負極板510與第二負極板520可以垂直地配置,但並不限定於此。另外,第三負極板530與第一負極板510可以垂直地配置,但並不限定於此。The first negative plate 510 and the second negative plate 520 may be arranged vertically, but it is not limited thereto. In addition, the third negative electrode plate 530 and the first negative electrode plate 510 may be arranged vertically, but it is not limited thereto.

在第二實施例中,為了使在電解研磨物件200的角部配置的多個負極框架500結合,可以配備有電極結合構件400。其中,電解研磨物件200可以以多邊箱或多邊環形狀形成。In the second embodiment, in order to couple the plurality of negative electrode frames 500 arranged at the corners of the electrolytic polishing article 200, an electrode coupling member 400 may be provided. The electrolytic abrasive article 200 may be formed in the shape of a polygonal box or a polygonal ring.

電極結合構件400可以配置於所述第一負極板510、第二負極板520與第三負極板530相交的區域。電極結合構件400可以包括第一支架410、第二支架420及第三支架430。第一支架410可以與第一負極板510結合。第二支架420可以與第二負極板520結合。第三支架430可以與第三負極板530結合。The electrode coupling member 400 may be disposed in a region where the first negative plate 510, the second negative plate 520, and the third negative plate 530 intersect. The electrode coupling member 400 may include a first bracket 410, a second bracket 420, and a third bracket 430. The first bracket 410 may be combined with the first negative plate 510. The second bracket 420 may be combined with the second negative plate 520. The third bracket 430 may be combined with the third negative plate 530.

第一支架410可以以與第一負極板510對應的形狀形成。第一負極板510可以借助於C型夾具600而在與第一支架410重疊的狀態下固定。第二支架420可以借助於與C型夾具600而與第二負極板520結合,第三支架430可以借助於C型夾具600而與第三負極板530結合。The first bracket 410 may be formed in a shape corresponding to the first negative plate 510. The first negative electrode plate 510 may be fixed in a state of overlapping with the first bracket 410 by means of the C-shaped clamp 600. The second bracket 420 may be combined with the second negative electrode plate 520 by means of the C-shaped clamp 600, and the third bracket 430 may be combined with the third negative plate 530 by means of the C-shaped clamp 600.

如圖7所示,第一支架410與第二支架420構成的角度θ23可以超過90度形成。第一支架410與第二支架420之間的角度θ23可以與電解研磨物件200的角所構成的角度對應。第三支架430可以配置得與第一支架410及第二支架420具有90度。As shown in FIG. 7, the angle θ23 formed by the first bracket 410 and the second bracket 420 may be formed to exceed 90 degrees. The angle θ23 between the first bracket 410 and the second bracket 420 may correspond to the angle formed by the angle of the electrolytic abrasive article 200. The third bracket 430 may be disposed at 90 degrees to the first bracket 410 and the second bracket 420.

第一支架410可以包括第一面412和第二面414。第一支架410的第二面414可以從第一支架410的第一面412折彎既定角度形成。在本實施例中,第一支架410的第一面412與第一支架410的第二面414構成的角θ1可以包括90度。The first bracket 410 may include a first face 412 and a second face 414. The second surface 414 of the first bracket 410 may be formed by bending a predetermined angle from the first surface 412 of the first bracket 410. In this embodiment, the angle θ1 formed by the first surface 412 of the first bracket 410 and the second surface 414 of the first bracket 410 may include 90 degrees.

第二支架420可以包括第一面422和第二面424。第二支架420的第二面424可以從第二支架420的第一面422折彎既定角度形成。在本實施例中,第二支架420的第一面422與第二支架420的第二面424構成的角θ2可以包括90度。The second bracket 420 may include a first face 422 and a second face 424. The second surface 424 of the second bracket 420 may be formed by bending a predetermined angle from the first surface 422 of the second bracket 420. In this embodiment, the angle θ2 formed by the first surface 422 of the second bracket 420 and the second surface 424 of the second bracket 420 may include 90 degrees.

第三支架430可以包括第一面432和第二面434。第三支架430的第二面434可以從第三支架430的第一面432折彎既定角度形成。在本實施例中,第三支架430的第一面432與第三支架430的第二面434構成的角θ3可以以90度以上形成。第一支架410結合於第三支架430的第二面434,第二支架420結合於第三支架430的第一面432,因而第一支架410與第二支架420之間的角度θ23可以與第三支架430的第一面432與第二面434構成的角度θ3對應。The third bracket 430 may include a first face 432 and a second face 434. The second surface 434 of the third bracket 430 may be formed by bending a predetermined angle from the first surface 432 of the third bracket 430. In this embodiment, the angle θ3 formed by the first surface 432 of the third bracket 430 and the second surface 434 of the third bracket 430 may be formed at 90 degrees or more. The first bracket 410 is coupled to the second surface 434 of the third bracket 430, and the second bracket 420 is coupled to the first surface 432 of the third bracket 430. Therefore, the angle θ23 between the first bracket 410 and the second bracket 420 can be The angle θ3 formed by the first surface 432 of the three brackets 430 corresponds to the second surface 434.

第一支架410的第一面412可以在第三支架430的第二面434的後方,通過包括鉚釘、螺栓或焊接等的組裝方式而結合。第一支架410的第二面414可以在第二支架420的第二面424的後方,通過包括鉚釘、螺栓或焊接等的組裝方式而結合。第二支架420的第一面422可以在第三支架430的第一面432的前方,通過包括鉚釘、螺栓或焊接等的組裝方式而結合。The first surface 412 of the first bracket 410 can be combined behind the second surface 434 of the third bracket 430 by an assembly method including rivets, bolts, or welding. The second surface 414 of the first bracket 410 may be combined behind the second surface 424 of the second bracket 420 by an assembly method including rivets, bolts, welding, or the like. The first surface 422 of the second bracket 420 may be combined in front of the first surface 432 of the third bracket 430 by an assembly method including rivets, bolts, or welding.

第二實施例的電極結合構件400可以在具有90度以上的電解研磨物件200的角部容易地安裝,具有可以對電解研磨物件的角部有效地執行電解研磨的效果。The electrode coupling member 400 of the second embodiment can be easily installed at the corners of the electrolytic polishing article 200 having a degree of 90 degrees or more, and has an effect that electrolytic polishing can be effectively performed on the corners of the electrolytic polishing article.

圖8是顯示第三實施例的電解研磨裝置的概略立體圖。在第三實施例中,對在電解研磨物件的角部沒有頂點的情形的結構進行說明。此時,電解研磨物件可以為四邊或此外的多邊形狀的腔室。8 is a schematic perspective view showing an electrolytic polishing device of a third embodiment. In the third embodiment, the structure in the case where there is no vertex at the corner of the electrolytic polishing object will be described. At this time, the electrolytic polishing object may be a four-sided or other polygonal chamber.

如圖8所示,第三實施例的電解研磨裝置可以包括:電解槽100,其在內部配備有容納電解研磨物件200和電解液的容納空間;負極框架,其與所述電解研磨物件200隔開配置,包括第一方向的第一負極板510、第二方向的第二負極板520、與所述第一方向及第二方向垂直的第三方向的第三負極板530;電極結合構件400,其配置於所述電解研磨物件200的角部,使所述第一負極板至所述第三負極板510、520、530連接。As shown in FIG. 8, the electrolytic polishing apparatus of the third embodiment may include: an electrolytic cell 100 equipped with an accommodating space for accommodating an electrolytic polishing object 200 and an electrolyte; a negative electrode frame that is separated from the electrolytic polishing object 200 Open configuration, including a first negative electrode plate 510 in a first direction, a second negative electrode plate 520 in a second direction, and a third negative electrode plate 530 in a third direction perpendicular to the first and second directions; electrode coupling member 400 , Which is arranged at the corner of the electrolytic abrasive article 200 and connects the first negative electrode plate to the third negative electrode plate 510, 520, 530.

負極框架500可以包括沿第一方向配置的第一負極板510、與第一方向構成垂直地配置的第二負極板520、與第一方向和第二方向構成垂直的第三負極板530。第一負極板510、第二負極板520、第三負極板530分別可以為條(bar)形狀、L字形狀、角形狀、棒形狀、線網、孔板金屬、圓形狀的板,但並不限定於此。The negative electrode frame 500 may include a first negative electrode plate 510 arranged along the first direction, a second negative electrode plate 520 arranged perpendicular to the first direction, and a third negative electrode plate 530 perpendicular to the first direction and the second direction. The first negative electrode plate 510, the second negative electrode plate 520, and the third negative electrode plate 530 may be bar-shaped, L-shaped, angular, bar-shaped, wire mesh, orifice metal, or round-shaped plates, respectively. Not limited to this.

第一負極板510可以由多個板構成,構成得上下隔開地配置。第二負極板520可以由多個板構成,構成得上下隔開配置。第一負極板510和第二負極板520可以對電解研磨物件200的內側面進行研磨。在最下方配置的第一負極板510與第二負極板520之間,可以還配置有多個負極板,但其也可以省略。The first negative electrode plate 510 may be composed of a plurality of plates, which are arranged so as to be spaced up and down. The second negative electrode plate 520 may be composed of a plurality of plates, which are configured to be spaced up and down. The first negative plate 510 and the second negative plate 520 may grind the inner side of the electrolytic abrasive article 200. Between the first negative electrode plate 510 and the second negative electrode plate 520 arranged at the bottom, a plurality of negative electrode plates may be further arranged, but they may also be omitted.

第三負極板530可以在第一負極板510與第二負極板520相交區域形成。第三負極板530可以沿電解研磨物件200的縱向配置。第三負極板530可以包括相互隔開的右側的第三負極板530a和左側的第三負極板530b。The third negative electrode plate 530 may be formed in a region where the first negative electrode plate 510 and the second negative electrode plate 520 intersect. The third negative plate 530 may be arranged along the longitudinal direction of the electrolytic abrasive article 200. The third negative electrode plate 530 may include a right third negative electrode plate 530a and a left third negative electrode plate 530b spaced apart from each other.

電極結合構件400可以配置於所述第一負極板510、第二負極板520、左側及右側的第三負極板530a、530b相交的區域。電極結合構件400可以包括第一支架410、第二支架420、左側的第三支架430a和右側的第三支架430b。第一支架410可以與第一負極板510結合。第二支架420可以與第二負極板520結合。左側第三支架430a可以與左側的第三負極板530a結合。右側第三支架430b可以與右側的第三負極板530b結合。在左側的第三支架430a與右側的第三支架430b之間,可以還配置有連接構件440。連接構件440可以以金屬材質的不銹鋼材質形成。連接構件440以桿形狀形成,但其形狀不限定。The electrode coupling member 400 may be disposed in a region where the first negative electrode plate 510, the second negative electrode plate 520, and the third negative electrode plates 530a and 530b on the left and right intersect. The electrode coupling member 400 may include a first bracket 410, a second bracket 420, a third bracket 430a on the left side, and a third bracket 430b on the right side. The first bracket 410 may be combined with the first negative plate 510. The second bracket 420 may be combined with the second negative plate 520. The left third bracket 430a may be combined with the third negative plate 530a on the left. The right third bracket 430b may be combined with the third negative plate 530b on the right. Between the third bracket 430a on the left and the third bracket 430b on the right, a connection member 440 may be further arranged. The connection member 440 may be formed of a stainless steel material made of metal. The connection member 440 is formed in a rod shape, but the shape is not limited.

第一支架410可以以與第一負極板510對應的形狀形成。第一負極板510可以借助於C型夾具而在與第一支架410重疊的狀態下固定。第二支架420可以借助於C型夾具而與第二負極板520結合。左側第三支架430a可以借助於C型夾具而與左側的第三負極板530a結合。右側第三支架430b可以借助於C型夾具而與右側的第三負極板530b結合。The first bracket 410 may be formed in a shape corresponding to the first negative plate 510. The first negative electrode plate 510 may be fixed in a state of overlapping with the first bracket 410 by means of a C-shaped clamp. The second bracket 420 may be combined with the second negative plate 520 by means of a C-shaped jig. The left third bracket 430a may be combined with the third negative plate 530a on the left by means of a C-clamp. The right third bracket 430b may be combined with the right third negative plate 530b by means of a C-shaped clamp.

第一支架410與第二支架420構成的角度可以為90。不同於此,第一支架410與第二支架420構成的角度可以超過90度形成。當電解研磨物件200為四邊箱或環形狀的結構物時,第一支架410與第二支架420構成的角度可以為90度,當電解研磨物件200為多邊箱或環形狀的結構物時,第一支架410與第二支架420構成的角度可以超過90度。The angle formed by the first bracket 410 and the second bracket 420 may be 90. Unlike this, the angle formed by the first bracket 410 and the second bracket 420 may be formed over 90 degrees. When the electrolytic polishing object 200 is a four-sided box or ring-shaped structure, the angle formed by the first bracket 410 and the second bracket 420 may be 90 degrees. When the electrolytic polishing object 200 is a polygonal box or ring-shaped structure, the first The angle formed by one bracket 410 and the second bracket 420 may exceed 90 degrees.

第三實施例的電極結合構件400,即使電解研磨物件200的角部不具有頂點,也能夠有效地安裝,具有能夠對電解研磨物件200的角部有效地執行電解研磨的效果。The electrode coupling member 400 of the third embodiment can be effectively mounted even if the corners of the electrolytic polishing article 200 do not have vertices, and has the effect of efficiently performing electrolytic polishing on the corners of the electrolytic polishing article 200.

經由一實施例在電解研磨物件200的角部配備電極結合構件400,從而具有可以縮短多個負極板的組裝時間的效果。According to an embodiment, the electrode coupling member 400 is provided at the corner of the electrolytic abrasive article 200, so that the assembly time of a plurality of negative electrode plates can be shortened.

另外,經由一實施例的電極結合構件400具有無需多個固定構件便能夠使負極框架更堅固地固定的效果。In addition, the electrode coupling member 400 according to an embodiment has an effect that the negative electrode frame can be more firmly fixed without a plurality of fixing members.

另外,在一實施例中具有的效果,電極結合構件400可以在狹小的電解研磨物件200的角部容易地安裝,可以防止與電解研磨物件200短路。In addition, in an embodiment, there is an effect that the electrode coupling member 400 can be easily installed at the corner of the narrow electrolytic polishing article 200, and a short circuit with the electrolytic polishing article 200 can be prevented.

另外,實施例的電極結合構件400可以在具有90度以上的電解研磨物件的角部容易地安裝,具有可以對電解研磨物件200的角部有效執行電解研磨的效果。In addition, the electrode coupling member 400 of the embodiment can be easily installed at the corners of the electrolytic polishing article having a degree of 90 degrees or more, and has an effect that the electrolytic polishing can be effectively performed on the corners of the electrolytic polishing article 200.

另外,實施例的電極結合構件400即使電解研磨物件的角部不具有頂點,也可以有效安裝,因而具有可以對電解研磨物件200的角部有效執行電解研磨的效果。In addition, the electrode coupling member 400 of the embodiment can be effectively mounted even if the corners of the electrolytically polished article do not have vertices, and thus have the effect that electrolytic polishing can be effectively performed on the corners of the electrolytically polished article 200.

另外,實施例在導電性優秀的狀態下,使負極板預先堅固地固定,準備負極框架、支架,從而具有導電率優秀、電解研磨效率及研磨品質非常優秀的技術效果。In addition, in the embodiment, in a state where the conductivity is excellent, the negative electrode plate is firmly fixed in advance, and the negative electrode frame and the bracket are prepared, which has the technical effects of excellent conductivity, electrolytic polishing efficiency, and very excellent polishing quality.

然後,圖9是顯示第四實施例的具備可變型電極框架的電解研磨裝置的立體圖,圖10是顯示圖9的可變型負極框架的支撐結構的局部立體圖,圖11是以圖9的可變型負極框架為中心顯示的概略立體圖。Then, FIG. 9 is a perspective view showing an electrolytic polishing apparatus provided with a variable electrode frame of a fourth embodiment, FIG. 10 is a partial perspective view showing a support structure of the variable negative frame of FIG. 9, and FIG. 11 is a variable type of FIG. A schematic perspective view showing the negative electrode frame as the center.

在一實施例中,可變型電極框架可以包括可變型負極框架,但並非限定於此。In one embodiment, the variable electrode frame may include a variable negative electrode frame, but it is not limited thereto.

請參照圖9,第四實施例的電解研磨裝置可以包括:電解槽100,其在內部配備有容納電解研磨物件200和電解液的容納空間;可變型負極框架300,其配置於所述電解研磨物件200的研磨面的一側。Referring to FIG. 9, the electrolytic polishing apparatus of the fourth embodiment may include: an electrolytic cell 100 equipped with an accommodating space for accommodating the electrolytic polishing object 200 and the electrolyte; and a variable negative electrode frame 300 configured in the electrolytic polishing One side of the abrasive surface of the object 200.

電解槽100可以以在內部配備有容納空間的箱形狀形成。電解槽100可以包括圓筒形、多邊箱或環形狀,但其形狀並不限定。The electrolytic cell 100 may be formed in a box shape equipped with an accommodating space inside. The electrolytic cell 100 may include a cylindrical shape, a polygonal box, or a ring shape, but the shape is not limited.

在電解槽100的內部可以填充有電解液。作為電解液,可以將從由蒸餾水(H2 O)、硫酸(H2 SO4 )類、磷酸(H3 PO4 )類、鉻酸類、硝酸鈉(NaNO3 )、氯化鈉(NaCl)、甘油類構成的組中選擇的至少一種物質混合構成,但並不限定於此。The electrolytic cell 100 may be filled with electrolyte. As the electrolyte, you can choose from distilled water (H 2 O), sulfuric acid (H 2 SO 4 ), phosphoric acid (H 3 PO 4 ), chromic acid, sodium nitrate (NaNO 3 ), sodium chloride (NaCl), At least one substance selected from the group consisting of glycerin is mixed and constituted, but it is not limited thereto.

電解液可以在填充於電解槽100的狀態下,在結束電解研磨物件200的電解研磨後更換。不同於此,電解液可以借助於在電解槽100的一側獨立地形成的泵而流入、流出。在電解槽100與泵之間,可以形成有電解液流入管、電解液流出管,可以還包括電解液流量調節部、篩檢程式。篩檢程式可以過濾電解液中包含的加工物渣滓及異物質。The electrolytic solution can be replaced after the electrolytic polishing of the electrolytic polishing article 200 is completed while the electrolytic cell 100 is filled. Unlike this, the electrolyte can flow in and out by means of a pump formed independently on one side of the electrolytic cell 100. Between the electrolytic cell 100 and the pump, an electrolyte inflow tube and an electrolyte outflow tube may be formed, and may further include an electrolyte flow adjustment part and a screening program. The screening program can filter the dregs and foreign substances contained in the electrolyte.

在電解槽100的內部可以容納電解研磨物件200。電解槽100的大小可以大於電解研磨物件200地形成。電解研磨物件可以為多邊形或圓筒形的腔室或箱子。電解研磨物件200可以是用於OLED製造的腔室。The electrolytic abrasive article 200 can be accommodated inside the electrolytic cell 100. The size of the electrolytic cell 100 may be larger than that of the electrolytic abrasive article 200. The electrolytic abrasive article may be a polygonal or cylindrical chamber or box. The electrolytic abrasive article 200 may be a chamber for OLED manufacturing.

另一方面,在電解研磨物件為OLED用腔室或LED用MOCVD腔室等的情況下,也存在其重量為數百kg到數千kg(數噸)的巨大的情形。On the other hand, when the electrolytic polishing article is a chamber for OLED, a MOCVD chamber for LED, etc., there is also a huge case where the weight is hundreds to thousands of kilograms (several tons).

另外,電解研磨物件200也可以是OLED腔室的一部分構成部件。In addition, the electrolytic abrasive article 200 may be a part of a component of the OLED chamber.

本實施例中的電解研磨物件200可以是中心區域的寬度較小的結構。電解研磨物件200可以包括具有第一面積的第一區域210、在所述第一區域210上具有小於所述第一區域210面積的面積的第二區域230、在所述第二區域230上具有大於第二區域230面積的面積的第三區域250。第一區域210與第三區域230的面積可以相同或互不相同地形成。The electrolytic abrasive article 200 in this embodiment may have a structure with a smaller central region width. The electrolytic abrasive article 200 may include a first area 210 having a first area, a second area 230 having an area smaller than the area of the first area 210 on the first area 210, and having a second area 230 on the second area 230 The third region 250 is larger than the area of the second region 230. The areas of the first region 210 and the third region 230 may be the same or different from each other.

電解研磨物件200的形狀不限定於此,可以為板、箱形狀或上下貫通形成的環形狀。另外,電解研磨物件200可以將所有金屬材質的製品指定為電解研磨物件。The shape of the electrolytic polishing article 200 is not limited to this, and may be a plate, a box shape, or a ring shape formed through vertically. In addition, the electrolytic polishing article 200 can designate all metal materials as electrolytic polishing articles.

電解研磨物件200可以浸於電解液內。電解研磨物件200由於其重量相當大,因此,例如可以在利用起重機等吊起的狀態下,容納於電解槽100的容納空間。電解研磨物件200的研磨面可以包括電解研磨物件200的外側、內側、底面等。The electrolytic abrasive article 200 may be immersed in the electrolyte. Since the electrolytic abrasive article 200 has a considerable weight, for example, it can be accommodated in the accommodating space of the electrolytic cell 100 in a state of being lifted by a crane or the like. The polishing surface of the electrolytic polishing object 200 may include the outer side, the inner side, the bottom surface, and the like of the electrolytic polishing object 200.

在電解槽200的一側可以還配置有整流器。整流器可以向電解研磨物件施加正極(+)的電壓,可以向可變型負極框架300施加負極(-)的電壓。整流器可以借助於電線等而與電解研磨物件200電性連接。A rectifier may be further arranged on one side of the electrolytic cell 200. The rectifier may apply a positive (+) voltage to the electrolytic abrasive article, and may apply a negative (-) voltage to the variable negative frame 300. The rectifier may be electrically connected to the electrolytic abrasive article 200 by means of wires or the like.

可變型負極框架300可以配置於電解研磨物件200的內部及外部。可變型負極框架300可以與電解研磨物件200的研磨面隔開既定間隔配置。例如,可變型負極框架300可以與電解研磨物件200按50mm±20mm距離隔開配置。可變型負極框架300可以選擇性地研磨作為電解研磨物件200研磨面的內側、外側或底面,或者同時研磨所有面。在本實施例中,為了說明的便利,對可變型負極框架300配置於電解研磨物件200內側的結構進行說明。The variable negative electrode frame 300 may be arranged inside and outside the electrolytic polishing article 200. The variable negative electrode frame 300 may be arranged at a predetermined interval from the polishing surface of the electrolytic polishing article 200. For example, the variable negative electrode frame 300 may be arranged at a distance of 50 mm±20 mm from the electrolytic abrasive article 200. The variable negative electrode frame 300 can selectively grind the inner side, the outer side, or the bottom surface as the grinding surface of the electrolytic polishing object 200, or grind all surfaces at the same time. In this embodiment, for convenience of explanation, a structure in which the variable negative electrode frame 300 is disposed inside the electrolytic polishing object 200 will be described.

可變型負極框架300應配置於電解研磨物件200的第一區域210,配置於第一區域210的研磨面。如果電解研磨物件200的第二區域230不與第一區域210分離,則可變型負極框架300應穿過電解研磨物件200的第二區域230而配置於第一區域210。The variable negative electrode frame 300 should be disposed on the first region 210 of the electrolytic polishing object 200 and on the polishing surface of the first region 210. If the second region 230 of the electrolytic abrasive article 200 is not separated from the first region 210, the variable negative electrode frame 300 should be disposed in the first region 210 through the second region 230 of the electrolytic abrasive article 200.

以往,負極板由於其面積已經確定,因而不容易穿過電解研磨物件200的第二區域230。假如以往足以將穿過電解研磨物件200的第二區域230的大小形成負極板,則無法對電解研磨物件200的第一區域210有效地進行電解研磨。In the past, since the area of the negative electrode plate has been determined, it is not easy to pass through the second region 230 of the electrolytic abrasive article 200. If the size of the second region 230 passing through the electrolytic polishing article 200 is sufficiently large in the past to form a negative electrode plate, the first region 210 of the electrolytic polishing article 200 cannot be effectively electrolytically polished.

在本實施例中,為了將負極板配置於電解研磨物件200的第一區域210,可以配備有可變型負極框架300。在本實施例中,以在電解研磨物件200的第一區域210配置的可變型負極框架300為中心進行說明。在電解研磨物件200的第二區域230及第三區域250配置的負極板可以是固定的負極板,不同於此,也可以是可變型電極框架300。In this embodiment, in order to arrange the negative electrode plate in the first region 210 of the electrolytic abrasive article 200, a variable negative electrode frame 300 may be provided. In the present embodiment, the description will be centered on the variable negative electrode frame 300 disposed in the first region 210 of the electrolytic polishing article 200. The negative electrode plates disposed in the second region 230 and the third region 250 of the electrolytic polishing article 200 may be fixed negative electrode plates, and differently, or may be a variable electrode frame 300.

可變型負極框架300可以包括格子結構的板形狀。可變型負極框架300可以為導電率及耐酸性卓越的銅、鋁、不銹鋼材料,但並不限定於此。可變型負極框架300可以為條(bar)形狀、L字形狀、角形狀、棒形狀、圓形狀、線網形狀、孔板形狀的板,可以對其進行組合而構成。The variable negative electrode frame 300 may include a plate shape in a lattice structure. The variable negative electrode frame 300 may be made of copper, aluminum, or stainless steel with excellent conductivity and acid resistance, but it is not limited thereto. The variable negative electrode frame 300 may be a bar-shaped, L-shaped, corner-shaped, bar-shaped, round-shaped, wire mesh-shaped, or orifice-shaped plate, which may be configured by combining them.

可變型負極框架300可以包括第一負極板310和第二負極板320。The variable negative electrode frame 300 may include a first negative electrode plate 310 and a second negative electrode plate 320.

第一負極板310和第二負極板320可以配置得構成格子結構。第一負極板310可以以長桿形狀形成。第一負極板310可以由多個板構成,構成得相互隔開配置。第二負極板320可以以長桿形狀形成。第二負極板320可以由多個板構成,配置得相互隔開。第一負極板310和第二負極板320可以配置得構成90度,但並不限定於此。The first negative plate 310 and the second negative plate 320 may be configured to form a lattice structure. The first negative plate 310 may be formed in a long rod shape. The first negative plate 310 may be composed of a plurality of plates, which are configured to be spaced apart from each other. The second negative electrode plate 320 may be formed in a long rod shape. The second negative electrode plate 320 may be composed of a plurality of plates, arranged to be separated from each other. The first negative electrode plate 310 and the second negative electrode plate 320 may be arranged to constitute 90 degrees, but it is not limited thereto.

第一負極板310可以由多個支架構成,可以以其長度能夠變長或減小的方式構成。第二負極板320的結構可以與第一負極板310的結構相同。下面,以第一負極板310的結構為中心進行說明。The first negative electrode plate 310 may be composed of a plurality of brackets, and may be constituted in such a manner that its length can be lengthened or reduced. The structure of the second negative plate 320 may be the same as the structure of the first negative plate 310. Hereinafter, the structure of the first negative electrode plate 310 will be mainly described.

第一負極板310可以構成得使多個支架連接。第一負極板310可以一部分重疊地配置,向相互遠離或靠近的方向移動。第一負極板310可以由多個支架構成,出於說明的便利,以第一負極板310由第一支架312和與所述第一支架312連接的第二支架314構成的結構為中心進行說明。The first negative plate 310 may be configured to connect a plurality of brackets. The first negative plates 310 may be partially overlapped and moved in a direction away from or close to each other. The first negative plate 310 may be composed of a plurality of brackets. For convenience of description, the structure in which the first negative plate 310 is composed of the first bracket 312 and the second bracket 314 connected to the first bracket 312 will be mainly described .

第一支架312可以為L字形狀,但並不限定於此。第一支架312的一部分區域可以與第二支架314的一部分區域重疊形成。第一支架312與第二支架314的重疊的區域可以借助於C型夾具600而支撐。The first bracket 312 may be L-shaped, but it is not limited thereto. A portion of the first bracket 312 may overlap with a portion of the second bracket 314. The overlapping area of the first bracket 312 and the second bracket 314 may be supported by the C-shaped clamp 600.

如圖10所示,第一支架312可以包括第一面312a和第二面312b。第二面312b可以包括從第一面312a折彎既定角度的形狀。第二支架314可以以與第一支架312相同的形狀形成。As shown in FIG. 10, the first bracket 312 may include a first face 312a and a second face 312b. The second face 312b may include a shape bent at a predetermined angle from the first face 312a. The second bracket 314 may be formed in the same shape as the first bracket 312.

第一支架312的第一面312a可以與第二支架314的第一面314a重疊配置。第一支架312的第一面312a可以配置於第二支架314的第一面314a上,但並不限定於此。第一支架312的第二面312b可以與第二支架314的第二面314b重疊配置。第一支架312的第二面312b可以配置於第二支架314的第二面314b上,但並不限定於此。The first surface 312a of the first bracket 312 may be disposed overlapping the first surface 314a of the second bracket 314. The first surface 312a of the first bracket 312 may be disposed on the first surface 314a of the second bracket 314, but it is not limited thereto. The second surface 312b of the first bracket 312 may overlap the second surface 314b of the second bracket 314. The second surface 312b of the first bracket 312 may be disposed on the second surface 314b of the second bracket 314, but it is not limited thereto.

第一支架312的第一面312a與第二支架314的第一面314a的重疊區域可以借助於電解研磨用電極框架的固定構件而固定。在實施例中,電解研磨用電極框架的固定構件可以為夾具。The overlapping area of the first surface 312a of the first holder 312 and the first surface 314a of the second holder 314 can be fixed by the fixing member of the electrode frame for electrolytic polishing. In an embodiment, the fixing member of the electrode frame for electrolytic polishing may be a jig.

例如,第一支架312的第一面312a與第二支架314的第一面314a的重疊區域可以借助於C型夾具600而支撐,但並非限定於此。For example, the overlapping area of the first surface 312a of the first bracket 312 and the first surface 314a of the second bracket 314 may be supported by the C-shaped clamp 600, but it is not limited thereto.

C型夾具600可以如圖4a及圖4b所示構成,詳細內容採用前面記述的內容。The C-shaped jig 600 may be configured as shown in FIGS. 4a and 4b, and the details described above are adopted.

例如,C型夾具600可以包括第一主體640、第二主體650、分別在所述第一主體640及第二主體650的一側相向配置的固定部610。固定部610可以分別配置於第一主體640和第二主體650的一側。第二主體650可以以C字形狀形成,與第一主體640結合。第一主體640可以結合於第二主體650並上下移動。因此,相向配置於第一主體640與第二主體650的固定部610,可以沿相互靠近方向或遠離方向移動。For example, the C-shaped jig 600 may include a first body 640, a second body 650, and fixing portions 610 respectively disposed on one side of the first body 640 and the second body 650 facing each other. The fixing portion 610 may be disposed on one side of the first body 640 and the second body 650, respectively. The second body 650 may be formed in a C-shape and combined with the first body 640. The first body 640 may be combined with the second body 650 and move up and down. Therefore, the fixing portion 610 disposed opposite to the first body 640 and the second body 650 can move in a direction closer to or away from each other.

固定部610可以在重疊配置的第一支架312的第一面312a一側和第二支架314的第一面314a另一側配置,穩定地支撐第一支架312和第二支架314。C型夾具600可以以耐酸性優秀的不銹鋼材料形成。The fixing portion 610 may be arranged on one side of the first surface 312a of the first bracket 312 and the other side of the first surface 314a of the second bracket 314, and stably support the first bracket 312 and the second bracket 314. The C-shaped clamp 600 can be formed of a stainless steel material excellent in acid resistance.

在實施例中,電解研磨用電極框架的固定構件以固定負極板的功能為中心進行了說明,但電極框架的固定構件的功能並不限定於此。In the embodiment, the fixing member of the electrode frame for electrolytic polishing has been described focusing on the function of fixing the negative electrode plate, but the function of the fixing member of the electrode frame is not limited to this.

例如,在實施例中,電解研磨用電極框架的固定構件可以對既定的電極框架的托架與研磨物件構件間進行固定。例如,可以利用實施例的電解研磨用電極框架的固定構件,對研磨物件構件的既定的凸出部與電極框架托架之間進行固定。For example, in the embodiment, the fixing member of the electrode frame for electrolytic polishing may fix the bracket of the predetermined electrode frame and the polishing object member. For example, the fixing member of the electrode frame for electrolytic polishing of the embodiment can be used to fix a predetermined protrusion of the polishing article member and the electrode frame bracket.

另外,一實施例中的電解研磨用電極框架的固定構件可以對既定電極框架的托架與電極框架之間堅固地進行固定。In addition, the fixing member of the electrode frame for electrolytic polishing in one embodiment can firmly fix the bracket of the predetermined electrode frame and the electrode frame.

一實施例中言及的既定電極框架的托架的發明,是本件申請人、本件發明人另外的固有發明概念。The invention of the bracket of a predetermined electrode frame mentioned in an embodiment is another inherent invention concept of the applicant and the inventor.

請再參閱圖9及圖10,第一支架312的第一面312a與第二支架314的第一面314a可以向相互遠離或靠近的方向移動。C型夾具600可以以第一支架312的第一面312a和第二支架314的第一面314a能夠移動的程度的力,支撐第一支架312的第一面312a和第二支架314的第一面314a。不同於此,C型夾具600在使第一支架312的第一面312a和第二支架314的第一面314a移動後,可以進一步施加固定力,支撐第一支架312和第二支架314。9 and FIG. 10 again, the first surface 312a of the first bracket 312 and the first surface 314a of the second bracket 314 can move in directions away from or close to each other. The C-shaped jig 600 can support the first surface 312a of the first bracket 312 and the first of the second bracket 314 with a force such that the first surface 312a of the first bracket 312 and the first surface 314a of the second bracket 314 can move面314a. Unlike this, the C-shaped clamp 600 may further apply a fixing force to support the first bracket 312 and the second bracket 314 after moving the first surface 312a of the first bracket 312 and the first surface 314a of the second bracket 314.

第二負極板320可以與第一負極板310相同地包括第一支架和第二支架。第二負極板320可以桿形狀的板形成,但並不限定於此。第二負極板320的第一支架322可以沿從第二支架324遠離或靠近的方向移動。The second negative plate 320 may include the first bracket and the second bracket in the same manner as the first negative plate 310. The second negative electrode plate 320 may be formed as a rod-shaped plate, but it is not limited thereto. The first bracket 322 of the second negative electrode plate 320 may move in a direction away from or close to the second bracket 324.

第二負極板320的第一支架322和第二支架324可以一部分重疊地配置。第二負極板320的第一支架322與第二支架324的重疊的區域,可以借助於C型夾具600而支撐。因此,第二負極板320長度可變。The first bracket 322 and the second bracket 324 of the second negative electrode plate 320 may be partially overlapped. The overlapping area of the first bracket 322 and the second bracket 324 of the second negative electrode plate 320 can be supported by the C-shaped clamp 600. Therefore, the length of the second negative electrode plate 320 is variable.

如圖11所示,當多個支架的重複區域最小化時,可變型負極框架300可以具有最大面積。其中,可以假定多個支架的長度相同。As shown in FIG. 11, when the overlapping area of the plurality of supports is minimized, the variable negative electrode frame 300 may have the largest area. Among them, it can be assumed that a plurality of brackets have the same length.

第一負極板310的整體長度L11可以與構成第一負極板310的各個支架的長度L1的總和對應。第二負極板320的整體長度L21可以與構成第二負極板320的各個支架的長度L2的總和對應或稍小地形成。其中,除多個支架重複的區域的長度之外,可變型負極框架300的面積可以根據第一負極板310的整體長度L11和第二負極板320的整體長度L21而決定。The entire length L11 of the first negative plate 310 may correspond to the sum of the lengths L1 of the brackets constituting the first negative plate 310. The entire length L21 of the second negative electrode plate 320 may be formed corresponding to the sum of the lengths L2 of the brackets constituting the second negative electrode plate 320 or slightly smaller. Among them, the area of the variable negative electrode frame 300 may be determined according to the overall length L11 of the first negative electrode plate 310 and the overall length L21 of the second negative electrode plate 320, in addition to the length of the region where a plurality of brackets overlap.

相反,當多個支架的重複區域最大化時,可變型負極框架300可以具有最小面積。第一負極板310的整體長度L11可以是構成第一負極板310的一個支架長度L1的2倍。可以假定多個支架的長度相同,多個支架可以包括3個。第一負極板310的整體長度L11會因多個支架的個數而異。同樣地,第二負極板320也可以以與第一負極板310相同的方法控制其長度。In contrast, when the repeating area of the plurality of supports is maximized, the variable negative electrode frame 300 may have the smallest area. The entire length L11 of the first negative electrode plate 310 may be twice the length L1 of one bracket constituting the first negative electrode plate 310. It can be assumed that the lengths of multiple brackets are the same, and multiple brackets may include three. The overall length L11 of the first negative plate 310 will vary depending on the number of multiple brackets. Similarly, the length of the second negative electrode plate 320 can be controlled in the same way as the first negative electrode plate 310.

請再參閱圖9,如上所述的可變型負極框架300在穿過電解研磨物件200的第二區域230時可變,以便具有可穿過第二區域230的面積。接著,穿過第二區域230的可變型負極框架300可以與電解研磨物件200的第一區域210的研磨面面積對應地可變。Referring again to FIG. 9, the variable negative electrode frame 300 as described above is variable when passing through the second region 230 of the electrolytic abrasive article 200 so as to have an area that can pass through the second region 230. Next, the variable negative electrode frame 300 passing through the second region 230 may be changed correspondingly to the polishing surface area of the first region 210 of the electrolytic polishing object 200.

上面說明了同時控制第一負極板310與第二負極板320長度的情形,但可以根據研磨面的長度和寬度,適宜地變更第一負極板310或第二負極板320的長度。例如,根據電解研磨物件200的研磨面大小,組裝可變型負極框架300,如果將組裝的可變型負極框架300配置於電解研磨物件200的研磨面,則可以防止丟棄以往固定的負極板或重新組裝。The above describes the case where the lengths of the first negative plate 310 and the second negative plate 320 are controlled at the same time, but the length of the first negative plate 310 or the second negative plate 320 can be changed appropriately according to the length and width of the polishing surface. For example, according to the size of the polishing surface of the electrolytic polishing object 200, the variable negative electrode frame 300 is assembled. If the assembled variable negative electrode frame 300 is disposed on the polishing surface of the electrolytic polishing object 200, it is possible to prevent the conventionally fixed negative electrode plate from being discarded or reassembled .

如上所述的結構的可變型負極框架300應與研磨面隔開配置,以便不與正極電解研磨物件200接觸。為此,在可變型負極框架300的一側可以配備有隔開構件700。隔開構件700可以與可變型負極框架300和電解研磨物件200的側壁或底部隔開地安裝。下面對隔開構件700與可變型負極框架300和電解研磨物件200的底部隔開的結構進行說明。The variable-type negative electrode frame 300 having the structure described above should be disposed apart from the polishing surface so as not to contact the positive electrode electrolytic polishing article 200. For this, a partition member 700 may be provided on one side of the variable negative electrode frame 300. The partition member 700 may be installed spaced apart from the side wall or bottom of the variable negative electrode frame 300 and the electrolytic abrasive article 200. Next, the structure in which the partition member 700 is partitioned from the bottom of the variable negative electrode frame 300 and the electrolytic abrasive article 200 will be described.

隔開構件700可以在第一負極板310上形成多個。隔開構件700可以在第二負極板320上形成多個。隔開構件700可以以絕緣材質形成。隔開構件700可以承受可變型負極框架300的重量,可以以耐酸性強的材質形成。隔開構件700可以包括PVC、橡膠、聚氨酯橡膠、電木中某一者。隔開構件700可以借助於C型夾具600而與第一負極板310結合。隔開構件700可以由在一側具有棱角部的板形成,但其形狀不限定。The partition member 700 may be formed in plurality on the first negative electrode plate 310. The partition member 700 may be formed in plurality on the second negative electrode plate 320. The partition member 700 may be formed of an insulating material. The partition member 700 can bear the weight of the variable negative electrode frame 300, and can be formed of a material with strong acid resistance. The partition member 700 may include any one of PVC, rubber, urethane rubber, and bakelite. The partition member 700 may be combined with the first negative plate 310 by means of the C-shaped clamp 600. The partition member 700 may be formed of a plate having angular portions on one side, but its shape is not limited.

第四實施例的可變型負極框架300組裝成與電解研磨物件200的研磨面對應的大小,配置於電解研磨物件的研磨面,從而具有可以防止丟棄已經使用的負極板或重新組裝而導致時間及費用增加的效果。The variable negative electrode frame 300 of the fourth embodiment is assembled to a size corresponding to the polishing surface of the electrolytic polishing object 200, and is arranged on the polishing surface of the electrolytic polishing object, thereby having the ability to prevent discarding or reassembly of the used negative electrode plate, which may cause time and The effect of increased costs.

圖12是顯示第四實施例的可變型電極框架的變形例的概略立體圖,圖13及圖14是顯示可變型電極框架的運轉的剖面圖。12 is a schematic perspective view showing a modification of the variable electrode frame of the fourth embodiment, and FIGS. 13 and 14 are cross-sectional views showing the operation of the variable electrode frame.

如果參照圖12,可變型負極框架300可以包括第一負極板310和第二負極板320。If referring to FIG. 12, the variable negative electrode frame 300 may include a first negative electrode plate 310 and a second negative electrode plate 320.

第一負極板310和第二負極板320可以配置得構成格子結構。第一負極板310可以由多個板構成,構成得相互隔開配置。第二負極板320可以由多個板構成,配置得相互隔開。第一負極板310和第二負極板320可以配置得構成90度,但並不限定於此。The first negative plate 310 and the second negative plate 320 may be configured to form a lattice structure. The first negative plate 310 may be composed of a plurality of plates, which are configured to be spaced apart from each other. The second negative electrode plate 320 may be composed of a plurality of plates, arranged to be separated from each other. The first negative electrode plate 310 and the second negative electrode plate 320 may be arranged to constitute 90 degrees, but it is not limited thereto.

第一負極板310與第二負極板320分別由多個支架構成,可以構成得使其長度可以增加或減小。第一負極板310和第二負極板320的運轉結構相同,因而以第一負極板310為中心進行說明。The first negative electrode plate 310 and the second negative electrode plate 320 are respectively composed of a plurality of brackets, and may be configured so that the length thereof can be increased or decreased. Since the first negative plate 310 and the second negative plate 320 have the same operation structure, the first negative plate 310 will be mainly described.

第一負極板310可以構成得使多個支架連接。第一負極板310可以包括第一支架312、結合於所述第一支架312的一側的第二支架314、結合於所述第二支架314的一側的第三支架316。其中,支架的個數不限定為3個,出於說明的便利,對支架為3個的情形進行說明。The first negative plate 310 may be configured to connect a plurality of brackets. The first negative plate 310 may include a first bracket 312, a second bracket 314 coupled to one side of the first bracket 312, and a third bracket 316 coupled to one side of the second bracket 314. Among them, the number of brackets is not limited to three. For convenience of description, the case where there are three brackets will be described.

第一支架312可以以具有底部和側壁部的結構形成。例如,第一支架312可以是上部開放、其剖面為U字形狀的結構。第二支架314可以以由底部、側壁部及頂棚部構成的結構形成。例如,第二支架314可以包括一側和另一側貫通形成的多邊環形狀。第三支架316可以與第一支架312的形狀相同地形成。The first bracket 312 may be formed in a structure having a bottom and a side wall portion. For example, the first bracket 312 may be a structure with an open upper portion and a U-shaped cross section. The second bracket 314 may be formed with a structure composed of a bottom, a side wall portion, and a ceiling portion. For example, the second bracket 314 may include a polygonal ring shape formed through one side and the other side. The third bracket 316 may be formed in the same shape as the first bracket 312.

第一支架312可以插入於第二支架314內並滑動。第一支架312可以與第二支架314一部分或全體重疊地配置。與此相同,第三支架316可以與第二支架314一部分或全體重疊地配置。如果第一支架312、第二支架314及第三支架316的重疊區域達到最小,則第一負極板310的長度可以達到最大。相反,如果第一支架312、第二支架314及第三支架316的重疊區域達到最大,則第一負極板310的長度可以達到最小。The first bracket 312 may be inserted into the second bracket 314 and slide. The first bracket 312 and the second bracket 314 may be partially or entirely overlapped. Similarly to this, the third bracket 316 may be arranged to overlap a part or the whole of the second bracket 314. If the overlapping area of the first bracket 312, the second bracket 314, and the third bracket 316 is minimized, the length of the first negative plate 310 may be maximized. On the contrary, if the overlapping area of the first bracket 312, the second bracket 314, and the third bracket 316 reaches the maximum, the length of the first negative plate 310 may reach the minimum.

在第一支架312、第二支架314及第三支架316可以配備有用於固定的結合結構,以便第一支架312、第二支架314及第三支架316可以保持固定的狀態。The first bracket 312, the second bracket 314, and the third bracket 316 may be equipped with a coupling structure for fixing, so that the first bracket 312, the second bracket 314, and the third bracket 316 may be kept in a fixed state.

如圖13及圖14所示,在第一支架312的一側可以形成有凸出部312a。凸出部312a可以是圓球形狀。凸出部312a可以是表面摩擦力小的圓形形狀。凸出部312a借助施加於凸出部312a的力而可以容納到第一支架312的內部。為此,在第一支架312的內部,可以形成有能夠容納凸出部312a的槽。另外,在凸出部312a,可以還連接有彈性構件,例如彈簧構件。彈性構件使凸出部312a保持凸出的狀態,如果力施加於凸出部312a,則可以將凸出部312a誘導到第一支架312的內部。第三支架316的結構可以與第一支架相同。As shown in FIGS. 13 and 14, a protrusion 312 a may be formed on one side of the first bracket 312. The protrusion 312a may have a spherical shape. The protrusion 312a may have a circular shape with a small surface friction. The protrusion 312a can be accommodated inside the first bracket 312 by the force applied to the protrusion 312a. For this reason, inside the first bracket 312, a groove capable of accommodating the protrusion 312a may be formed. In addition, an elastic member such as a spring member may be connected to the protruding portion 312a. The elastic member maintains the protruding portion 312a in a protruding state, and if a force is applied to the protruding portion 312a, the protruding portion 312a can be induced into the first bracket 312. The structure of the third bracket 316 may be the same as the first bracket.

在第二支架314的一側,可以與第一支架312的凸出部312a及第三支架316的凸出部316a對應地形成有容納槽314a。容納槽314a可以以與第三支架316的凸出部316a形狀對應的形狀形成。容納槽314a可以在第二支架314的一側隔開配置多個。容納槽314a可以具有相同間隔地形成。On one side of the second bracket 314, a receiving groove 314a may be formed corresponding to the projection 312a of the first bracket 312 and the projection 316a of the third bracket 316. The receiving groove 314a may be formed in a shape corresponding to the shape of the protrusion 316a of the third bracket 316. A plurality of accommodation grooves 314a may be arranged on one side of the second bracket 314. The receiving grooves 314a may be formed with the same interval.

如果以一力沿第一方向施加於第一支架312,則第一支架312的凸出部312a可以結合於在第二支架314的最外廓配置的容納槽314a。與此相同,如果以一力沿著與第一方向相反的第二方向施加於第三支架316,則第三支架316的凸出部316a可以結合於在第二支架314的最外廓配置的容納槽314a。其中,第一支架312與第二支架314重疊的區域可以達到最小。第三支架316與第二支架314重疊的區域可以達到最小。因此,第一負極板310的長度可以達到最大。If a force is applied to the first bracket 312 in the first direction, the protrusion 312a of the first bracket 312 may be coupled to the receiving groove 314a disposed in the outermost profile of the second bracket 314. Similarly, if a force is applied to the third bracket 316 in a second direction opposite to the first direction, the protrusion 316a of the third bracket 316 can be combined with the outermost configuration of the second bracket 314 The accommodation groove 314a. The area where the first bracket 312 and the second bracket 314 overlap can be minimized. The area where the third bracket 316 overlaps the second bracket 314 can be minimized. Therefore, the length of the first negative plate 310 can be maximized.

如果再次沿第一方向向第一支架312施加力,則第一支架312的凸出部312a可以向第二支架314的內側移動,結合於在第二支架314的內側配置的容納槽314a。第一支架312的凸出部312a可以以球形狀形成,因而如果向第一支架312沿第一方向施加力,則在第一支架312的凸出部312a容納於第一支架312內部的狀態下,第一支架312向第二支架314的內側方向滑動。接著,第一支架312的凸出部312a可以凸出結合於第二支架314的另一容納槽314a,第一支架312可以穩定地固定於第二支架314。If a force is applied to the first bracket 312 again in the first direction, the protrusion 312a of the first bracket 312 can move toward the inside of the second bracket 314 and be coupled to the receiving groove 314a disposed inside the second bracket 314. The protrusion 312a of the first bracket 312 may be formed in a spherical shape, so if a force is applied to the first bracket 312 in the first direction, the protrusion 312a of the first bracket 312 is accommodated inside the first bracket 312 , The first bracket 312 slides inward of the second bracket 314. Next, the protruding portion 312a of the first bracket 312 may protrude and be combined with another receiving groove 314a of the second bracket 314, and the first bracket 312 may be stably fixed to the second bracket 314.

與此相同,如果向第三支架316沿第二方向施加力,則在第三支架316的凸出部316a容納到第三支架316內部的狀態下,第三支架316可以向第二支架314的內側方向滑動。接著,第三支架316的凸出部316a可以凸出結合於第二支架314的另一容納槽314a,第三支架316可以穩定地固定於第二支架314。Similarly, if a force is applied to the third bracket 316 in the second direction, the third bracket 316 may move toward the second bracket 314 in a state where the protrusion 316a of the third bracket 316 is accommodated inside the third bracket 316 Slide inside. Next, the protruding portion 316a of the third bracket 316 may protrude and be coupled to another receiving groove 314a of the second bracket 314, and the third bracket 316 may be stably fixed to the second bracket 314.

如果第一支架312與第二支架314重疊的區域及第三支架316與第二支架314重疊的區域達到最大,則第一負極板310的長度可以達到最小。If the area where the first support 312 overlaps the second support 314 and the area where the third support 316 overlaps the second support 314 reach the maximum, the length of the first negative plate 310 may reach the minimum.

第二負極板320也可以與前面說明的第一負極板310支架結合結構相同地調節第二負極板320的長度。因此,可以使可變型負極框架300的面積有效地可變。The length of the second negative electrode plate 320 may be adjusted in the same manner as the bracket structure of the first negative electrode plate 310 described above. Therefore, the area of the variable negative electrode frame 300 can be effectively changed.

上面雖然構成得使第一支架312的凸出部312a向第一支架312的內部移動,但如果以彈性材質形成凸出部312a,則具有無需容納槽也可以與第二支架314結合的效果。Although the above structure is configured to move the protruding portion 312a of the first bracket 312 toward the inside of the first bracket 312, if the protruding portion 312a is formed of an elastic material, there is an effect that it can be combined with the second bracket 314 without a receiving groove.

上面圖示了在第一支架312的下部形成第一支架312的凸出部312a的情形,但不限定於此,也可以在第一支架312的側壁形成。與此對應地,第二支架314的容納槽314a也可以在所述第二支架314的側壁形成。The above illustrates the case where the protruding portion 312a of the first bracket 312 is formed on the lower portion of the first bracket 312, but it is not limited thereto, and may be formed on the side wall of the first bracket 312. Corresponding to this, the receiving groove 314a of the second bracket 314 may also be formed on the side wall of the second bracket 314.

如上所述的可變型負極板300構成得使第一支架312在第二支架314上滑動結合,具有可以更有效地控制可變型電極框架的大小的效果。The variable negative electrode plate 300 as described above is configured such that the first holder 312 is slidably coupled to the second holder 314, which has an effect that the size of the variable electrode frame can be controlled more effectively.

圖15是顯示第五實施例的具備可變型電極框架的電解研磨裝置的立體圖。15 is a perspective view showing an electrolytic polishing apparatus provided with a variable electrode frame in a fifth embodiment.

請參照圖15,第五實施例的電解研磨裝置可以包括:電解槽100,其在內部配備有容納電解研磨物件200和電解液的容納空間;可變型負極框架300,其配置於所述電解研磨物件200的研磨面的一側。Referring to FIG. 15, the electrolytic polishing device of the fifth embodiment may include: an electrolytic cell 100 equipped with an accommodating space for accommodating electrolytic polishing objects 200 and an electrolyte; a variable negative electrode frame 300 disposed in the electrolytic polishing One side of the abrasive surface of the object 200.

電解槽100可以以在內部配備有容納空間的箱形狀形成。電解槽100可以包括圓筒形、多邊箱或環形狀,但其形狀並不限定。在電解槽100的內部可以填充有電解液。作為電解液,可以將從由蒸餾水(H2 O)、硫酸(H2 SO4 )類、磷酸(H3 PO4 )類、鉻酸類、硝酸鈉(NaNO3 )、氯化鈉(NaCl)、甘油類構成的組中選擇的至少一種物質混合構成,但並不限定於此。The electrolytic cell 100 may be formed in a box shape equipped with an accommodation space inside. The electrolytic cell 100 may include a cylindrical shape, a polygonal box, or a ring shape, but the shape is not limited. The electrolytic cell 100 may be filled with electrolyte. As the electrolyte, you can choose from distilled water (H 2 O), sulfuric acid (H 2 SO 4 ), phosphoric acid (H 3 PO 4 ), chromic acid, sodium nitrate (NaNO 3 ), sodium chloride (NaCl), At least one substance selected from the group consisting of glycerin is mixed and constituted, but it is not limited thereto.

在電解槽100的內部可以容納電解研磨物件200。電解槽100的大小可以大於電解研磨物件200地形成。電解研磨物件可以為多邊形或圓筒形的腔室或箱子。電解研磨物件200可以是用於OLED製造的腔室。另外,電解研磨物件200也可以是OLED腔室的一部分構成部件。The electrolytic abrasive article 200 can be accommodated inside the electrolytic cell 100. The size of the electrolytic cell 100 may be larger than that of the electrolytic abrasive article 200. The electrolytic abrasive article may be a polygonal or cylindrical chamber or box. The electrolytic abrasive article 200 may be a chamber for OLED manufacturing. In addition, the electrolytic abrasive article 200 may be a part of a component of the OLED chamber.

在電解槽100的一側可以還配置有整流器。整流器可以向電解研磨物件施加正極(+)的電壓,可以向負極板300施加負極(-)的電壓。整流器可以借助於電線等而與電解研磨物件200電性連接。A rectifier may be further arranged on one side of the electrolytic cell 100. The rectifier may apply a positive (+) voltage to the electrolytic abrasive article, and may apply a negative (-) voltage to the negative plate 300. The rectifier may be electrically connected to the electrolytic abrasive article 200 by means of wires or the like.

可變型負極框架300可以包括格子結構的板形狀。可變型負極框架300可以為導電率及耐酸性卓越的銅、鋁、不銹鋼材料,但並不限定於此。可變型負極框架300可以為條(bar)形狀、L字形狀、角形狀、棒形狀、圓形狀、線網形狀、孔板形狀的板,可以對其進行組合而構成。The variable negative electrode frame 300 may include a plate shape in a lattice structure. The variable negative electrode frame 300 may be made of copper, aluminum, or stainless steel with excellent conductivity and acid resistance, but it is not limited thereto. The variable negative electrode frame 300 may be a bar-shaped, L-shaped, corner-shaped, bar-shaped, round-shaped, wire mesh-shaped, or orifice-shaped plate, which may be configured by combining them.

請參照圖9,可變型負極框架300可以包括第一負極板310和第二負極板320。第一負極板310和第二負極板320可以配置得構成格子結構。第一負極板310和第二負極板320可以配置得構成90度,但並不限定於此。第一負極板310與第二負極板320分別由多個支架構成,可以構成得使其長度可以增加或減小。可變型負極框架300的結構可以採用前面說明的第四實施例或變形例的結構。Referring to FIG. 9, the variable negative electrode frame 300 may include a first negative electrode plate 310 and a second negative electrode plate 320. The first negative plate 310 and the second negative plate 320 may be configured to form a lattice structure. The first negative electrode plate 310 and the second negative electrode plate 320 may be arranged to constitute 90 degrees, but it is not limited thereto. The first negative electrode plate 310 and the second negative electrode plate 320 are respectively composed of a plurality of brackets, and may be configured so that the length thereof can be increased or decreased. The structure of the variable negative electrode frame 300 may adopt the structure of the fourth embodiment or the modification described above.

第五實施例中的電解研磨物件200可以包括具有互不相同面積的多個區域。電解研磨物件200可以包括具有第一面積的第一區域210、具有小於第一區域210的面積的第二區域230、具有小於所述第二區域230的面積的第三區域250、具有小於所述第三區域250的面積的第四區域270。The electrolytic abrasive article 200 in the fifth embodiment may include a plurality of areas having mutually different areas. The electrolytic abrasive article 200 may include a first area 210 having a first area, a second area 230 having an area smaller than the first area 210, a third area 250 having an area smaller than the second area 230, having a area smaller than the The fourth area 270 is the area of the third area 250.

在電解研磨物件200的第一區域210,可以安裝有第一可變型電極框架300a。第一可變型電極框架300a可以調節第一負極板和第二負極板的長度,配置於第一區域210。第一可變型電極框架300a可以與電解研磨物件200的研磨面隔開地配置。第一可變型電極框架300a可以借助於在電解研磨物件200形成的放出口或另外的支架而支撐,與電解研磨物件200的研磨面隔開配置。In the first region 210 of the electrolytic abrasive article 200, a first variable electrode frame 300a may be installed. The first variable electrode frame 300 a can be adjusted to the length of the first negative electrode plate and the second negative electrode plate, and is arranged in the first region 210. The first variable electrode frame 300a may be disposed apart from the polishing surface of the electrolytic polishing article 200. The first variable electrode frame 300a may be supported by a discharge port formed in the electrolytic polishing article 200 or another bracket, and is disposed apart from the polishing surface of the electrolytic polishing article 200.

在電解研磨物件200的第二區域230,可以安裝有第二可變型電極框架300b。第二可變型電極框架300b可以調節第一負極板和第二負極板的長度,配置於電解研磨物件200的第二區域230。In the second region 230 of the electrolytic polishing article 200, a second variable electrode frame 300b may be installed. The second variable electrode frame 300b can adjust the length of the first negative electrode plate and the second negative electrode plate, and is disposed in the second region 230 of the electrolytic polishing article 200.

在電解研磨物件200的第三區域250,可以安裝有第三可變型電極框架300c。第三可變型電極框架300c可以調節第一負極板和第二負極板的長度,配置於電解研磨物件200的第三區域250。In the third region 250 of the electrolytic abrasive article 200, a third variable electrode frame 300c may be installed. The third variable electrode frame 300c can adjust the length of the first negative electrode plate and the second negative electrode plate, and is arranged in the third region 250 of the electrolytic abrasive article 200.

在第一可變型電極框架300a與第二可變型電極框架300b之間,可以配置有導電性連接板500。連接板500可以將施加於第一可變型電極框架300a的負極電位傳遞給第二可變型電極框架300b。連接板500的材質可以與可變型負極框架300的材質相同的形成。連接板500的形狀可以以條(bar)形狀、L字形狀、角形狀、棒形狀、圓形狀、線網形狀、孔板形狀中某一者形成。Between the first variable electrode frame 300a and the second variable electrode frame 300b, a conductive connection plate 500 may be disposed. The connection plate 500 may transfer the negative electrode potential applied to the first variable electrode frame 300a to the second variable electrode frame 300b. The material of the connection plate 500 may be formed in the same material as the variable negative electrode frame 300. The shape of the connection plate 500 may be formed in any one of a bar shape, an L shape, an angular shape, a bar shape, a round shape, a wire mesh shape, and an orifice plate shape.

與此相同,可以使連接板500配置於第二可變型電極框架300b與第三可變型電極框架300c之間。另外,在第一可變型電極框架300a與第三可變型電極框架300c之間,可以還形成有連接板500。連接板500可以在可變型負極框架300之間配置多個。Similarly to this, the connection plate 500 may be arranged between the second variable electrode frame 300b and the third variable electrode frame 300c. In addition, a connecting plate 500 may be further formed between the first variable electrode frame 300a and the third variable electrode frame 300c. A plurality of connection plates 500 may be arranged between the variable negative electrode frames 300.

在電解研磨物件200的第四區域270,可以還配置有輔助負極板600。電解研磨物件200的第四區域270可以是從電解研磨物件200的第二區域230凸出的區域。電解研磨物件200的第四區域270可以包括在電解研磨物件200上形成的寬度窄的區域或貫通形成的孔。電解研磨物件200的第四區域270可以以無法配置可變型負極框架300的程度的較小大小形成。In the fourth region 270 of the electrolytic abrasive article 200, an auxiliary negative plate 600 may be further arranged. The fourth region 270 of the electrolytic abrasive article 200 may be a region protruding from the second region 230 of the electrolytic abrasive article 200. The fourth region 270 of the electrolytic abrasive article 200 may include a narrow-width region formed on the electrolytic abrasive article 200 or a hole formed therethrough. The fourth region 270 of the electrolytic polishing article 200 may be formed in a small size to the extent that the variable negative electrode frame 300 cannot be arranged.

因此,輔助負極板600可以不以四邊板狀形成,而以桿形狀的板形成。輔助負極板600可以與電解研磨物件200的第四區域270的研磨面隔開地配置。輔助負極板600可以一部分具有曲線地形成,但並不限定於此。輔助負極板600傳遞負極電位,具有可以對電解研磨物件200的第四區域270有效地進行電解研磨的效果。Therefore, the auxiliary negative electrode plate 600 may not be formed in a quadrangular plate shape, but formed in a rod-shaped plate. The auxiliary negative plate 600 may be arranged at a distance from the polishing surface of the fourth region 270 of the electrolytic polishing article 200. The auxiliary negative plate 600 may be partially formed with a curve, but it is not limited thereto. The auxiliary negative electrode plate 600 transmits the negative electrode potential, and has an effect that the fourth region 270 of the electrolytic polishing object 200 can be effectively electrolytically polished.

上面是在電解研磨物件200的第四區域270配置一個輔助負極板600,但也可以配置2個以上輔助負極板600。In the above, one auxiliary negative plate 600 is arranged in the fourth region 270 of the electrolytic polishing article 200, but two or more auxiliary negative plates 600 may be arranged.

第五實施例的電解研磨裝置通過配置具有互不相同的面積並電性連接的多個可變型電極框架及輔助負極板,從而具有可以對具有互不相同面積的電解研磨物件的研磨面有效地進行電解研磨的效果。The electrolytic polishing apparatus of the fifth embodiment is provided with a plurality of variable electrode frames and auxiliary negative plates that have mutually different areas and are electrically connected, so as to have a polishing surface that can effectively grind electrolytic polishing articles having different areas The effect of electrolytic polishing.

(工業實用性)(Industrial applicability)

在一實施例中,在電解研磨物件的角部配備電極結合構件,從而具有可以縮短多個負極板的組裝時間的效果。In one embodiment, an electrode coupling member is provided at the corner of the electrolytically polished article, which has the effect of shortening the assembly time of a plurality of negative plates.

另外,在一實施例中,電極結合構件具有無需多個固定構件也可以使負極板更堅固地固定的效果。In addition, in one embodiment, the electrode coupling member has an effect that the negative electrode plate can be more firmly fixed without a plurality of fixing members.

另外,在一實施例中具有的效果,電極結合構件可以在狹小的電解研磨物件的角部容易地安裝,可以防止與電解研磨物件短路。In addition, in an embodiment, there is an effect that the electrode coupling member can be easily installed at the corner of a narrow electrolytic abrasive article, and a short circuit with the electrolytic abrasive article can be prevented.

另外,在一實施例中,電極結合構件可以在具有90度以上的電解研磨物件的角部容易地安裝,具有可以對電解研磨物件的角部有效執行電解研磨的效果。In addition, in one embodiment, the electrode coupling member can be easily installed at the corner of the electrolytically polished object having a degree of 90 degrees or more, and has an effect that the electrolytic polishing can be effectively performed on the corner of the electrolytically polished object.

另外,在一實施例中,電極結合構件即使電解研磨物件的角部不具有頂點,也可以有效安裝,因而具有可以對電解研磨物件的角部有效執行電解研磨的效果。In addition, in one embodiment, the electrode coupling member can be effectively mounted even if the corner of the electrolytically polished object does not have a vertex, and thus has the effect that electrolytic polishing can be effectively performed on the corner of the electrolytically polished object.

另外,在一實施例中,在導電性優秀的狀態下,使負極板預先堅固地固定,準備負極框架、支架,從而具有導電率優秀、電解研磨效率及研磨品質非常優秀的技術效果。In addition, in one embodiment, in a state where the conductivity is excellent, the negative electrode plate is firmly fixed in advance, and a negative electrode frame and a bracket are prepared, which has the technical effects of excellent conductivity, excellent electrolytic polishing efficiency, and excellent polishing quality.

另外,在一實施例中,夾具還形成絕緣部,從而具有可以在負極框架與電解研磨物件之間的狹小空間可以容易地安裝的效果。In addition, in one embodiment, the jig also forms an insulating portion, thereby having the effect that the narrow space between the negative electrode frame and the electrolytic abrasive article can be easily installed.

在一實施例中,可變型電極框架組裝成與電解研磨物件的研磨面對應的大小,配置於電解研磨物件的研磨面,從而具有可以節省新組裝負極板或重新組裝所需的時間及費用的效果。In one embodiment, the variable electrode frame is assembled to a size corresponding to the polishing surface of the electrolytic polishing object, and is disposed on the polishing surface of the electrolytic polishing object, thereby saving time and expense required for newly assembled negative electrode plates or reassembly effect.

另外,在一實施例中,可以提供即使在電解研磨物件形狀複雜的情況下也可以有效電解研磨的可變型電極框架及包括其的電解研磨裝置。In addition, in one embodiment, it is possible to provide a variable electrode frame that can be effectively electrolytically polished even when the shape of the electrolytically polished object is complicated, and an electrolytic polishing device including the same.

另外,在一實施例中,可變型電極框架構成得使第一支架在第二支架上滑動結合,具有可以更有效控制可變型電極框架的大小的效果。In addition, in one embodiment, the variable electrode frame is configured such that the first bracket is slidingly coupled to the second bracket, which has the effect that the size of the variable electrode frame can be more effectively controlled.

另外,在一實施例中,將具有互不相同面積並電性連接的多個可變型電極框架及輔助負極板配置於研磨面,從而具有可以對具有互不相同面積的電解研磨物件的研磨面有效進行電解研磨的效果。In addition, in one embodiment, a plurality of variable electrode frames having different areas and electrically connected to each other are arranged on the polishing surface, so as to have a polishing surface for electrolytic polishing objects having different areas The effect of electrolytic polishing effectively.

以上參照圖式及實施例進行了說明,但相應所屬領域具通常知識者的理解,在不超出以下申請專利範圍記載的實施例的技術思想的範圍內,實施例可以多樣地修改及變更。The above has been described with reference to the drawings and the embodiments. However, it is understood by those with ordinary knowledge in the field that the embodiments can be variously modified and changed within the scope of the technical idea of the embodiments described in the following patent applications.

100‧‧‧電解槽200‧‧‧電解研磨物件210‧‧‧第一區域230‧‧‧第二區域250‧‧‧第三區域270‧‧‧第四區域300‧‧‧負極框架300a‧‧‧第一可變型電極框架300b‧‧‧第二可變型電極框架300c‧‧‧第三可變型電極框架310‧‧‧第一負極板312‧‧‧第一支架312a‧‧‧第一面/凸出部312b‧‧‧第二面314‧‧‧第二支架314a‧‧‧容納槽316‧‧‧第三支架316a‧‧‧.凸出部320‧‧‧第二負極板322‧‧‧第一支架324‧‧‧第二支架400‧‧‧電極結合構件410‧‧‧第一支架412‧‧‧第一面414‧‧‧第二面420‧‧‧第二支架422‧‧‧第一面424‧‧‧第二面430‧‧‧第三支架430a‧‧‧右側第三支架430b‧‧‧左側第三支架432‧‧‧第一面434‧‧‧第二面440‧‧‧連接構件500‧‧‧負極框架/連接板510‧‧‧第一負極板512‧‧‧第一支架514‧‧‧第二支架520‧‧‧第二負極板522‧‧‧第一支架524‧‧‧第二支架530‧‧‧第三負極板530a‧‧‧右側第三負極板530b‧‧‧左側第三負極板600‧‧‧C型夾具/輔助負極板610‧‧‧固定部620‧‧‧絕緣部630‧‧‧凸部640‧‧‧第一主體650‧‧‧第二主體650a‧‧‧導電性物質650b‧‧‧絕緣膜700‧‧‧隔開構件H‧‧‧孔L1‧‧‧長度L11‧‧‧長度L2‧‧‧長度L21‧‧‧長度100‧‧‧Electrolyzer 200‧‧‧Electrolytic abrasive object 210‧‧‧First area 230‧‧‧Second area 250‧‧‧ Third area 270‧‧‧ Fourth area 300‧‧‧Negative frame 300a‧‧ ‧First variable electrode frame 300b‧‧‧Second variable electrode frame 300c‧‧‧third variable electrode frame 310‧‧‧First negative plate 312‧‧‧First bracket 312a‧‧‧First side/ Protruding portion 312b‧‧‧Second surface 314‧‧‧Second bracket 314a‧‧‧Accommodating groove 316‧‧‧ Third bracket 316a‧‧‧. Protruding portion 320‧‧‧Second negative plate 322‧‧‧ First bracket 324‧‧‧Second bracket 400‧‧‧Electrode bonding member 410‧‧‧First bracket 412‧‧‧First face 414‧‧‧Second face 420‧‧‧Second bracket 422‧‧‧ One side 424‧‧‧ Second side 430‧‧‧ Third bracket 430a‧‧‧Right third bracket 430b‧‧‧Left third bracket 432‧‧‧ First side 434‧‧‧Second side 440‧‧‧ Connecting member 500‧‧‧Negative frame/connecting plate 510‧‧‧First negative plate 512‧‧‧First bracket 514‧‧‧Second bracket 520‧‧‧Second negative plate 522‧‧‧First bracket 524‧ ‧‧Second bracket 530‧‧‧ Third negative electrode plate 530a‧‧‧Right third negative electrode plate 530b‧‧‧‧Left third negative electrode plate 600‧‧‧C-type clamp/auxiliary negative electrode plate 610‧‧‧Fixed part 620‧ ‧‧Insulation part 630‧‧‧Convex part 640‧‧‧First body 650‧‧‧Second body 650a‧‧‧Conducting substance 650b‧‧‧Insulation film 700‧‧‧Partition member H‧‧‧Hole L1 ‧‧‧L11‧‧‧L2‧‧‧L21‧‧‧L

[圖1]是顯示第一實施例的電解研磨裝置的立體圖。 [圖2]是顯示第一實施例的電解研磨裝置的電極結合構件的立體圖。 [圖3]是顯示第一實施例的電解研磨裝置的電極結合構件的分解立體圖。 [圖4a]-[圖4b]分別是顯示第一實施例的電解研磨裝置的夾具的立體圖。 [圖5]是顯示第一實施例的電解研磨裝置的負極框架的變形例的立體圖。 [圖6]是顯示第二實施例的電解研磨裝置的概略立體圖。 [圖7]是顯示第二實施例的電解研磨裝置的電極結合構件的立體圖。 [圖8]是顯示第三實施例的電解研磨裝置的概略立體圖。 [圖9]是顯示第四實施例的具備可變型電極框架的電解研磨裝置的立體圖。 [圖10]是顯示圖9的可變型負極框架的支撐結構的局部立體圖。 [圖11]是以圖9的可變型負極框架為中心顯示的概略立體圖。 [圖12]是顯示第四實施例的可變型負極框架的變形例的概略立體圖。 [圖13]-[圖14]分別是顯示可變型負極框架的運轉的剖面圖。 [圖15]是顯示第五實施例的具備可變型電極框架的電解研磨裝置的立體圖。[Fig. 1] A perspective view showing the electrolytic polishing device of the first embodiment. [Fig. 2] A perspective view showing the electrode coupling member of the electrolytic polishing device of the first embodiment. [Fig. 3] An exploded perspective view showing the electrode coupling member of the electrolytic polishing device of the first embodiment. [FIG. 4a]-[FIG. 4b] are perspective views showing jigs of the electrolytic polishing apparatus of the first embodiment, respectively. 5 is a perspective view showing a modification of the negative electrode frame of the electrolytic polishing device of the first embodiment. 6 is a schematic perspective view showing an electrolytic polishing device of a second embodiment. 7 is a perspective view showing the electrode coupling member of the electrolytic polishing device of the second embodiment. 8 is a schematic perspective view showing an electrolytic polishing device of a third embodiment. 9 is a perspective view showing an electrolytic polishing apparatus provided with a variable electrode frame according to a fourth embodiment. FIG. 10 is a partial perspective view showing the support structure of the variable negative electrode frame of FIG. 9. [FIG. 11] A schematic perspective view centered on the variable negative electrode frame of FIG. 9. 12 is a schematic perspective view showing a modification of the variable negative electrode frame of the fourth embodiment. [FIG. 13]-[FIG. 14] are cross-sectional views showing the operation of the variable negative electrode frame, respectively. [Fig. 15] Fig. 15 is a perspective view showing an electrolytic polishing device provided with a variable electrode frame according to a fifth embodiment.

100‧‧‧電解槽 100‧‧‧Electrolyzer

200‧‧‧電解研磨物件 200‧‧‧Electrolytic abrasive

400‧‧‧電極結合構件 400‧‧‧electrode bonding member

410‧‧‧第一支架 410‧‧‧First bracket

420‧‧‧第二支架 420‧‧‧Second bracket

430‧‧‧第三支架 430‧‧‧third bracket

500‧‧‧負極框架 500‧‧‧Negative frame

510‧‧‧第一負極板 510‧‧‧The first negative plate

520‧‧‧第二負極板 520‧‧‧Second negative plate

530‧‧‧第三負極板 530‧‧‧The third negative plate

600‧‧‧C型夾具 600‧‧‧C type fixture

700‧‧‧隔開構件 700‧‧‧Partition

Claims (10)

一種電極框架,該電極框架在內部配備有容納一電解研磨物件和一電解液的一容納空間的一電解槽中使用,包括:一負極框架,其與該電解研磨物件隔開配置,包括一第一方向的一第一負極板、一第二方向的一第二負極板、與該第一方向及該第二方向不同方向的一第三方向的一第三負極板,在該負極框架的一側包括使該負極框架從該電解研磨物件的側面或底面隔開的一隔開構件;及一電極結合構件,其配置於該電解研磨物件的一角部,使該第一負極板至該第三負極板連接該電極結合構件包括與該第一負極板結合的一第一支架、與該第二負極板結合的一第二支架及與該第三負極板結合的一第三支架。 An electrode frame, which is used in an electrolytic cell equipped with an accommodating space for accommodating an electrolytic abrasive article and an electrolyte, includes: a negative electrode frame, which is spaced apart from the electrolytic abrasive article, and includes a first A first negative plate in one direction, a second negative plate in a second direction, a third negative plate in a third direction different from the first direction and the second direction, a The side includes a partition member that separates the negative electrode frame from the side or bottom surface of the electrolytic abrasive article; and an electrode coupling member, which is disposed at a corner of the electrolytic abrasive article to make the first negative electrode plate to the third The negative electrode plate connecting the electrode combining member includes a first bracket combined with the first negative plate, a second bracket combined with the second negative plate, and a third bracket combined with the third negative plate. 如請求項1所述的電極框架,其中該第一支架至該第三支架分別包括一第一面和與該第一面構成一既定角度的一第二面,該第一負極板與該第一支架的該第一面或該第二面中至少某一個以上重疊配置,借助於一第一夾具而固定;該第一支架的該第一面在該第三支架的該第二面的後方結合,該第一支架的該第二面在該第二支架的該第二面的後方結合,該第二支架的該第一面在該第三支架的該第一面的前方結合。 The electrode frame according to claim 1, wherein the first bracket to the third bracket respectively include a first face and a second face forming a predetermined angle with the first face, the first negative plate and the first At least one or more of the first surface or the second surface of a bracket are overlapped and fixed by means of a first jig; the first surface of the first bracket is behind the second surface of the third bracket In combination, the second surface of the first bracket is combined behind the second surface of the second bracket, and the first surface of the second bracket is combined in front of the first surface of the third bracket. 如請求項1所述的電極框架,其中該第一支架與該第二支架之間的一角度與該電解研磨物件的該角部所構成的角度對應,該第一支架與該第二支架之間的該角度根據該第三支架的該第一面與該第三支架的該第二面之間的角度而決定。 The electrode frame according to claim 1, wherein an angle between the first support and the second support corresponds to an angle formed by the corner portion of the electrolytic abrasive object, the first support and the second support The angle between is determined according to the angle between the first surface of the third bracket and the second surface of the third bracket. 如請求項1所述的電極框架,其中該第三支架包括相互隔開配置的多個支架,在該第三支架的一側結合有該第一支架,在該第三支架的另一側 結合有第二支架,在該第三支架的一側與該第三支架的另一側之間還連接有一連接構件。 The electrode frame according to claim 1, wherein the third bracket comprises a plurality of brackets spaced apart from each other, the first bracket is combined on one side of the third bracket, and the other side of the third bracket A second bracket is combined, and a connecting member is connected between one side of the third bracket and the other side of the third bracket. 如請求項1所述的電極框架,其中該第一負極板包括一第一負極支架和一第二負極支架,該第一負極支架在一部分重疊於該第二負極支架的狀態下,向從該第二負極支架遠離或靠近的方向移動,該第一負極支架與該第二負極支架的重疊區域借助於一第四夾具而支撐。 The electrode frame according to claim 1, wherein the first negative electrode plate includes a first negative electrode support and a second negative electrode support, and the first negative electrode support is partially overlapped with the second negative electrode support, The second negative electrode holder moves away or closer, and the overlapping area of the first negative electrode holder and the second negative electrode holder is supported by a fourth jig. 一種可變型電極框架,包括:一第一負極板,其沿一第一方向配置,由多個支架構成,該第一負極板包括一第一支架和一第二支架,該第一支架在一部分重疊於該第二支架的狀態下,向從該第二支架遠離或靠近的方向移動;及一第二負極板,其沿與該第一方向構成一既定角度的一第二方向配置,由另外多個支架構成;其中,該第一支架與該第二支架的重疊區域為變長或變短的可變型,一電解研磨物件包括互不相同的寬度的一第一區域和一第二區域,該可變型的第一負極板可變,以便能夠穿過該電解研磨物件的該第二區域,穿過該第二區域的該第一負極板與該研磨物件物的該第一區域的面積對應地可變。 A variable electrode frame includes: a first negative plate, which is arranged along a first direction, and is composed of a plurality of brackets, the first negative plate includes a first bracket and a second bracket, the first bracket is in part In the state of being superimposed on the second bracket, move in a direction away from or close to the second bracket; and a second negative plate, which is arranged along a second direction that forms a predetermined angle with the first direction, by another A plurality of brackets; wherein, the overlapping area of the first bracket and the second bracket is a variable type that becomes longer or shorter, and an electrolytic abrasive article includes a first area and a second area having different widths from each other, The variable first negative plate is variable so as to be able to pass through the second area of the electrolytic abrasive article, and the first negative plate passing through the second area corresponds to the area of the first area of the abrasive article Earthly variable. 如請求項6所述的可變型電極框架,其中該第一支架與該第二支架的重疊區域借助於一夾具而支撐,該夾具還包括相向配置的一絕緣部,在該絕緣部的一面還形成有凸部。 The variable electrode frame according to claim 6, wherein the overlapping area of the first bracket and the second bracket is supported by means of a clamp, the clamp further includes an insulating portion arranged oppositely, and a side of the insulating portion A convex portion is formed. 如請求項6所述的可變型電極框架,其中該第一支架的該第一區域沿著該第二支架的該第二區域滑動,在該第一支架的一側,配置有從該第一 支架凸出或容納的一凸出部,在該第二支架的一側,配置有與該凸出部對應的多個容納槽。 The variable electrode frame according to claim 6, wherein the first region of the first bracket slides along the second region of the second bracket, and on the side of the first bracket, a A protruding portion protruding or accommodated by the bracket is provided with a plurality of accommodating grooves corresponding to the protruding portion on one side of the second bracket. 如請求項6所述的可變型電極框架,其中該電解研磨物件包括具有多個互不相同的面積的容納空間,該可變型電極框架具備多個以配置於該電解研磨物件的該等互不相同面積的容納空間的方式,該多個可變型電極框架利用導電性連接板相互連接,在該可變型電極框架的一側,還包括一輔助負極板。 The variable electrode frame according to claim 6, wherein the electrolytic abrasive article includes a plurality of accommodating spaces having mutually different areas, and the variable electrode frame is provided with a plurality of such mutually arranged dispositions on the electrolytic abrasive article In a manner of accommodating space with the same area, the plurality of variable electrode frames are connected to each other by a conductive connecting plate, and on one side of the variable electrode frame, an auxiliary negative plate is also included. 一種電解研磨裝置,包括請求項1至5中任意一項的電極框架或請求項6至9中任意一項的可變型電極框架。 An electrolytic polishing device includes the electrode frame of any one of claims 1 to 5 or the variable electrode frame of any one of claims 6 to 9.
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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001061080A1 (en) * 2000-02-14 2001-08-23 Advanced Cardiovascular Systems, Inc. Electro-polishing fixture and electrolyte solution for polishing nitinol stents and method of using same
TW200811318A (en) * 2006-08-24 2008-03-01 Extrude Hone Corp Machine and method for electrochemically polishing indentations within an aluminum wheel
TWM378231U (en) * 2009-11-19 2010-04-11 Chyuin Tai Entpr Co Ltd Movable separative type anode titanium sapphire
TWM423121U (en) * 2011-10-26 2012-02-21 shi-zhi Chen Conductive plate structure improvement for electroplating bath
TWM455731U (en) * 2012-03-23 2013-06-21 shi-zhi Chen Improved conductive plate structure for electroplating tank
WO2016056620A1 (en) * 2014-10-10 2016-04-14 マルイ鍍金工業株式会社 Rotor for polishing hollow tubes
WO2016171116A1 (en) * 2015-04-23 2016-10-27 株式会社カネカ Tubular body electropolishing apparatus, anode conductive member for electropolishing apparatus, and method for electropolishing tubular body
TWI572748B (en) * 2016-09-20 2017-03-01 翁健名 Electroplating rack for tubular structure

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1149682A (en) * 1966-08-12 1969-04-23 Hammond Machinery Builders Inc An abrasive device for use in an electro-chemical grinding procedure
US4127459A (en) * 1977-09-01 1978-11-28 Jumer John F Method and apparatus for incremental electro-polishing
JPS5462929A (en) * 1977-10-28 1979-05-21 Sumitomo Electric Ind Ltd Surface treating method for aluminum and aluminum alloy
US4272351A (en) * 1978-10-27 1981-06-09 Sumitomo Electric Industries, Ltd. Apparatus for electrolytic etching
JPH11138350A (en) * 1997-11-10 1999-05-25 Kobe Steel Ltd Method and device for grinding of internal surface of cylindrical part in aluminum hollow extruding section and aluminum hollow extruding section
JP3834687B2 (en) * 1998-06-05 2006-10-18 日新運輸工業株式会社 Electrolytic composite polishing method for outer peripheral surface of metal tube and photosensitive drum substrate formed by the method
JP2001014756A (en) * 1999-06-24 2001-01-19 Aiwa Co Ltd Washing device for bottle and surface treating device for bottle
KR200220232Y1 (en) * 2000-08-28 2001-04-16 금성제어기주식회사 Three axis angle bracket
US6723224B2 (en) * 2001-08-01 2004-04-20 Applied Materials Inc. Electro-chemical polishing apparatus
US20070034526A1 (en) * 2005-08-12 2007-02-15 Natsuki Makino Electrolytic processing apparatus and method
KR200430129Y1 (en) * 2006-08-04 2006-11-02 장관섭 Anodizing jig
KR20080021362A (en) * 2006-09-04 2008-03-07 (주) 미래이피 Electrolytic polishing apparatus and polishing method for pipe
DE102009013467B4 (en) * 2009-03-07 2014-12-31 GalvaConsult GmbH Method and device for the electrochemical treatment of material in treatment devices
KR101183218B1 (en) * 2011-08-30 2012-09-14 (주)한국마루이 Electrolytic polishing apparatus
CN203510989U (en) * 2013-09-30 2014-04-02 陈泽进 Electrolytic etching electroplating accumulation 3D printer
FR3039564B1 (en) * 2015-07-31 2017-08-25 Silimixt SUPPORT DEVICE FOR SUBSTRATE TO BE PROCESSED IN PARTICULAR BY CHEMICAL OR ELECTROCHEMICAL
KR101769924B1 (en) * 2017-04-24 2017-08-21 황재상 Electrolytic polishing apparatus
WO2019066584A1 (en) * 2017-09-28 2019-04-04 주식회사 어썸리드 Electrode frame for electropolishing and electropolishing apparatus comprising same
KR102226831B1 (en) * 2018-03-29 2021-03-11 황재상 Electrode frame having electrode separating member for electro polishing and electro polishing apparatus including the same

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001061080A1 (en) * 2000-02-14 2001-08-23 Advanced Cardiovascular Systems, Inc. Electro-polishing fixture and electrolyte solution for polishing nitinol stents and method of using same
TW200811318A (en) * 2006-08-24 2008-03-01 Extrude Hone Corp Machine and method for electrochemically polishing indentations within an aluminum wheel
TWM378231U (en) * 2009-11-19 2010-04-11 Chyuin Tai Entpr Co Ltd Movable separative type anode titanium sapphire
TWM423121U (en) * 2011-10-26 2012-02-21 shi-zhi Chen Conductive plate structure improvement for electroplating bath
TWM455731U (en) * 2012-03-23 2013-06-21 shi-zhi Chen Improved conductive plate structure for electroplating tank
WO2016056620A1 (en) * 2014-10-10 2016-04-14 マルイ鍍金工業株式会社 Rotor for polishing hollow tubes
WO2016171116A1 (en) * 2015-04-23 2016-10-27 株式会社カネカ Tubular body electropolishing apparatus, anode conductive member for electropolishing apparatus, and method for electropolishing tubular body
TWI572748B (en) * 2016-09-20 2017-03-01 翁健名 Electroplating rack for tubular structure

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