TWI676584B - Chip pick-and-place apparatus and chip pick-and-place and detection system - Google Patents
Chip pick-and-place apparatus and chip pick-and-place and detection system Download PDFInfo
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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Abstract
本發明公開一種晶片取放裝置及晶片取放與檢測系統,晶片取放裝置包括轉動組件、多個吸取組件及驅動組件。轉動組件外周圍上具有一傾斜狀軌道。多個吸取組件環繞地設置在所述轉動組件上,每一所述吸取組件包括能活動地設置在所述轉動組件上的一可活動元件以及一連動地設置在所述可活動元件上的吸嘴元件,所述可活動元件沿著所述傾斜狀軌道移動。驅動組件懸設並鄰近於其中一所述吸取組件,所述驅動組件包括對應於其中一所述吸取組件的活動式推抵元件。 The invention discloses a wafer pick-and-place device and a wafer pick-and-place and detection system. The wafer pick-and-place device includes a rotating component, a plurality of suction components, and a driving component. There is an inclined track on the outer periphery of the rotating component. A plurality of suction components are arranged on the rotating component in a circle, and each of the suction components includes a movable element movably disposed on the rotating component and a suction element movably disposed on the movable element. A mouth element, the movable element moving along the inclined track. A driving component is suspended and adjacent to one of the suction components, and the driving component includes a movable pushing element corresponding to one of the suction components.
Description
本發明涉及一種取放裝置及移送系統,特別是涉及一種可依序、連續地取放、運送晶片元件的晶片取放裝置及晶片取放與檢測系統。 The present invention relates to a pick-and-place device and a transfer system, and in particular to a wafer pick-and-place device and a wafer pick-and-place and detection system that can sequentially and continuously pick and place and transport wafer components.
晶圓(wafer)是一種半導體材料(例,矽晶)的薄片,用於積體電路或各式電子元件的製造,其直徑由數英吋至數十英吋不等。晶圓做為微電子元件的載體,在經過諸如感光劑塗佈、曝光、顯影、蝕刻、滲透、或蒸著等加工步驟,最後經測試、切割、封裝而製成積體電路或電子元件成品。於這些製程中,需配合加工步驟而將晶圓予以固定、位移、旋轉、或翻轉。因此,為了滿足製程需求,在加工時會提供晶圓夾具來夾持晶圓。 A wafer is a thin sheet of semiconductor material (for example, silicon) that is used in the manufacture of integrated circuits or various electronic components. Its diameter ranges from several inches to tens of inches. Wafers are used as carriers for microelectronic components. After undergoing processing steps such as photosensitizer coating, exposure, development, etching, penetration, or evaporation, they are finally tested, cut, and packaged to produce integrated circuits or electronic components. . In these processes, wafers need to be fixed, moved, rotated, or flipped in accordance with processing steps. Therefore, in order to meet the process requirements, wafer clamps are provided to hold wafers during processing.
然而,在現有技術的晶圓製程中,皆是以單一機械晶片夾具往復移動來夾持、運送晶片,因此,大大降低晶片的運送速度,而致使產能降低。 However, in the prior art wafer manufacturing process, a single mechanical wafer holder is used to reciprocate to hold and transport wafers. Therefore, the wafer transport speed is greatly reduced, and the productivity is reduced.
本發明所要解決的技術問題在於,針對現有技術的不足提供一種晶片取放裝置及晶片取放與檢測系統,以解決現有技藝的缺失。 The technical problem to be solved by the present invention is to provide a wafer pick-and-place device and a wafer pick-and-place and detection system in response to the shortcomings of the prior art, so as to solve the lack of existing techniques.
為了解決上述的技術問題,本發明所採用的其中一技術方案是,提供一種晶片取放裝置,其包括轉動組件、多個吸取組件及驅動組件。轉動組件外周圍上具有傾斜狀軌道。多個吸取組件環 繞地設置在所述轉動組件上,每一所述吸取組件包括能活動地設置在所述轉動組件上的可活動元件以及連動地設置在所述可活動元件上的吸嘴元件,所述可活動元件沿著所述傾斜狀軌道移動。驅動組件鄰近所述轉動組件,所述驅動組件包括活動式推抵元件。 In order to solve the above technical problems, one of the technical solutions adopted by the present invention is to provide a wafer pick-and-place device, which includes a rotating component, a plurality of suction components, and a driving component. There is an inclined rail on the outer periphery of the rotating component. Multiple suction component rings Each of the suction components includes a movable element movably disposed on the rotary component and a suction nozzle element interlockedly disposed on the movable component. The movable element moves along the inclined track. A driving assembly is adjacent to the rotating assembly, and the driving assembly includes a movable pushing element.
較佳地,所述轉動組件包括基座元件、轉動元件及散熱元件。所述傾斜狀軌道設置在所述基座元件的外周圍上。轉動元件能轉動地設置在所述基座元件中,多個所述吸取組件環繞地設置在所述轉動元件。散熱元件設置在所述轉動元件上,所述散熱元件具有凹槽部以及貫穿通道,所述貫穿通道的一端連接外部氣端,所述貫穿通道的另一端與所述凹槽部彼此相通。 Preferably, the rotation component includes a base element, a rotation element, and a heat dissipation element. The inclined rail is provided on an outer periphery of the base member. A rotating element is rotatably disposed in the base element, and a plurality of the suction components are disposed around the rotating element. A heat radiating element is provided on the rotating element. The heat radiating element has a groove portion and a penetrating channel. One end of the penetrating channel is connected to an external air end, and the other end of the penetrating channel is in communication with the groove portion.
較佳地,每一所述吸嘴元件包括能活動地設置在所述可活動元件上的吸取件、套設在所述吸取件的受抵件以及穿設於所述轉動元件且連接於所述吸取件的傳輸件。其中,對應於所述凹槽部的所述吸嘴元件的所述吸取件通過所述傳輸件以與所述凹槽部相通。 Preferably, each of the nozzle elements includes a suction member movably disposed on the movable member, an abutment member sleeved on the suction member, and a penetrating member connected to the rotating member and connected to the rotating member. The transfer member of the suction member is described. Wherein, the suction member corresponding to the nozzle element of the groove portion communicates with the groove portion through the transmission member.
較佳地,每一所述吸取組件還包括設置在所述可活動元件的復位構件,所述復位構件具有多個彈性件,所述吸取件穿設於所述復位構件,且所述受抵件設置在所述復位構件中並被多個所述彈性件所頂抵。 Preferably, each of the suction components further includes a reset member disposed on the movable element, the reset member has a plurality of elastic members, the suction member is penetrated through the reset member, and the receiving member A member is disposed in the reset member and is abutted by a plurality of the elastic members.
較佳地,每一所述可活動元件包括能活動地設置在所述轉動組件的活動件、固定在所述活動件的元件主體以及固定在所述元件主體且能滑動地設置在所述傾斜狀軌道上的連動件;其中,所述晶片取放裝置還包括懸設於所述散熱元件的第一驅熱組件以及鄰近於所述驅動組件的第二驅熱組件。 Preferably, each of the movable elements includes a movable member movably disposed on the rotating component, an element main body fixed on the movable element, and slidably disposed on the inclined body fixed on the element main body. A linking member on a rail-like track; wherein the wafer pick-and-place device further includes a first heat driving component suspended from the heat dissipating element and a second heat driving component adjacent to the drive component.
較佳地,所述活動式推抵元件推抵鄰近所述驅動組件的所述吸取組件。 Preferably, the movable pushing element pushes against the suction component adjacent to the driving component.
為了解決上述的技術問題,本發明所採用的另外一技術方案是,提供一種晶片取放與檢測系統,其包括承載裝置、晶片取放 裝置及檢測裝置。承載裝置承載至少一晶片元件。晶片取放裝置鄰近於所述承載裝置,所述晶片取放裝置包括轉動組件、多個吸取組件及驅動組件。轉動組件外周圍上具有傾斜狀軌道。多個吸取組件環繞地設置在所述轉動組件上,每一所述吸取組件包括能活動地設置在所述轉動組件上的可活動元件以及連動地設置在所述可活動元件上的吸嘴元件,所述可活動元件沿著所述傾斜狀軌道移動。驅動組件鄰近所述轉動組件,所述驅動組件包括活動式推抵元件。檢測裝置鄰近於所述晶片取放裝置。其中,至少一所述晶片元件通過所述晶片取放裝置的運送,以從所述承載裝置移動到所述檢測裝置。 In order to solve the above technical problems, another technical solution adopted by the present invention is to provide a wafer pick-up and detection system, which includes a carrier device and a wafer pick-and-place system. Device and detection device. The carrying device carries at least one wafer element. The wafer pick-and-place device is adjacent to the carrier device. The wafer pick-and-place device includes a rotating component, a plurality of suction components, and a driving component. There is an inclined rail on the outer periphery of the rotating component. A plurality of suction components are arranged on the rotary component in a circle, and each of the suction components includes a movable element movably disposed on the rotary component and a nozzle element interlockedly disposed on the movable element. , The movable element moves along the inclined track. A driving assembly is adjacent to the rotating assembly, and the driving assembly includes a movable pushing element. The detection device is adjacent to the wafer pick-and-place device. Wherein, at least one of the wafer components is transported by the wafer pick-and-place device to move from the carrier device to the detection device.
較佳地,所述轉動組件包括基座元件、轉動元件及散熱元件。所述傾斜狀軌道環繞地設置在所述基座元件的外周圍上。轉動元件能轉動地設置在所述基座元件中,多個所述吸取組件環繞地設置在所述轉動元件。散熱元件設置在所述轉動元件上,所述散熱元件具有凹槽部以及貫穿通道,所述貫穿通道的一端連接外部氣端,所述貫穿通道的另一端與所述凹槽部彼此相通。 Preferably, the rotation component includes a base element, a rotation element, and a heat dissipation element. The slanted track is provided circumferentially on the outer periphery of the base element. A rotating element is rotatably disposed in the base element, and a plurality of the suction components are disposed around the rotating element. A heat radiating element is provided on the rotating element. The heat radiating element has a groove portion and a penetrating channel. One end of the penetrating channel is connected to an external air end, and the other end of the penetrating channel is in communication with the groove portion.
較佳地,每一所述吸嘴元件包括能活動地設置在所述可活動元件的吸取件、套設在所述吸取件的受抵件以及穿設於所述轉動元件且連接於所述吸取件的傳輸件。其中,對應於所述凹槽部的所述吸嘴元件的所述吸取件通過所述傳輸件以與所述凹槽部相通。 Preferably, each of the nozzle elements includes a suction member movably disposed on the movable element, an abutment member sleeved on the suction member, and a penetrating member connected to the rotating member and connected to the rotating member. Transfer of suction parts. Wherein, the suction member corresponding to the nozzle element of the groove portion communicates with the groove portion through the transmission member.
較佳地,每一所述吸取組件還包括設置在所述可活動元件的復位構件,所述復位構件具有多個彈性件,所述吸取件穿設於所述復位構件,且所述受抵件設置在所述復位構件中並被多個所述彈性件所頂抵。 Preferably, each of the suction components further includes a reset member disposed on the movable element, the reset member has a plurality of elastic members, the suction member is penetrated through the reset member, and the receiving member A member is disposed in the reset member and is abutted by a plurality of the elastic members.
較佳地,每一所述可活動元件包括能活動地設置在所述轉動組件的活動件、固定在所述活動件的元件主體以及固定在所述元件主體且能滑動地設置在所述傾斜狀軌道上的連動件;其中,所 述晶片取放裝置還包括懸設於所述散熱元件的第一驅熱組件以及鄰近於所述驅動組件的第二驅熱組件。 Preferably, each of the movable elements includes a movable member movably disposed on the rotating component, an element main body fixed on the movable element, and slidably disposed on the inclined body fixed on the element main body. Link on the orbit; The wafer pick-and-place device further includes a first driving component suspended from the heat dissipating element and a second driving component adjacent to the driving component.
較佳地,所述活動式推抵元件推抵鄰近所述驅動組件的所述吸取組件。 Preferably, the movable pushing element pushes against the suction component adjacent to the driving component.
本發明的有益效果在於,本發明所提供的晶片取放裝置及晶片取放與檢測系統,其能通過“在轉動組件上能活動地設置多個吸取組件”以及“驅動組件包括對應並能驅使其中一吸取組件作動的活動式推抵元件”的技術方案,以提升晶片的運送速度及產能。 The beneficial effect of the present invention is that the wafer pick-and-place device and the wafer pick-and-place and detection system provided by the present invention can pass “a plurality of sucking components can be movably arranged on the rotating component” and “the driving component includes corresponding and can drive One of them is a "movable push-to-actuate component" solution to increase the speed and throughput of wafers.
為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與圖式,然而所提供的圖式僅用於提供參考與說明,並非用來對本發明加以限制。 In order to further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention. However, the drawings provided are only for reference and description, and are not intended to limit the present invention.
S‧‧‧晶片取放與檢測系統 S‧‧‧Chip Pick and Place and Inspection System
1‧‧‧承載裝置 1‧‧‧ bearing device
10‧‧‧晶片元件 10‧‧‧Chip Components
2‧‧‧晶片取放裝置 2‧‧‧Chip pick and place device
20‧‧‧轉動組件 20‧‧‧Rotary components
200‧‧‧傾斜狀軌道 200‧‧‧ inclined track
201‧‧‧基座元件 201‧‧‧ base element
202‧‧‧轉動元件 202‧‧‧Rotating element
203‧‧‧散熱元件 203‧‧‧Cooling element
2030‧‧‧凹槽部 2030‧‧‧Groove part
2031‧‧‧貫穿通道 2031‧‧‧through channel
21‧‧‧吸取組件 21‧‧‧ Suction component
210‧‧‧可活動元件 210‧‧‧movable components
2100‧‧‧活動件 2100‧‧‧Event
2101‧‧‧元件主體 2101‧‧‧Element body
2102‧‧‧連動件 2102‧‧‧ Linkage
211‧‧‧吸嘴元件 211‧‧‧Nozzle element
2110‧‧‧吸取件 2110‧‧‧Pump
2110A‧‧‧吸嘴 2110A‧‧‧Nozzle
2111‧‧‧受抵件 2111‧‧‧ Arrivals
2112‧‧‧傳輸件 2112‧‧‧Transmission
212‧‧‧復位構件 212‧‧‧Reset member
2120‧‧‧彈性件 2120‧‧‧Elastic piece
22‧‧‧驅動組件 22‧‧‧Driver
220‧‧‧活動式推抵元件 220‧‧‧ movable push element
23‧‧‧第一驅熱組件 23‧‧‧First drive assembly
24‧‧‧第二驅熱組件 24‧‧‧Second drive component
3‧‧‧檢測裝置 3‧‧‧Detection device
4‧‧‧外部支撐基座 4‧‧‧ external support base
41‧‧‧支持結構 41‧‧‧Support Structure
5‧‧‧外部氣端 5‧‧‧ external air end
圖1為本發明第一實施例的晶片取放裝置的第一結構的示意圖。 FIG. 1 is a schematic diagram of a first structure of a wafer pick-and-place device according to a first embodiment of the present invention.
圖2為本發明第一實施例的晶片取放裝置的第二結構的示意圖。 FIG. 2 is a schematic diagram of a second structure of the wafer pick-and-place device according to the first embodiment of the present invention.
圖3為本發明第二實施例的晶片取放裝置的第一結構的示意圖。 3 is a schematic diagram of a first structure of a wafer pick-and-place device according to a second embodiment of the present invention.
圖4為本發明第二實施例的晶片取放裝置的第二結構的示意圖。 4 is a schematic diagram of a second structure of a wafer pick-and-place device according to a second embodiment of the present invention.
圖5為本發明第三實施例的晶片取放裝置的剖面示意圖。 FIG. 5 is a schematic cross-sectional view of a wafer pick-and-place device according to a third embodiment of the present invention.
圖6為本發明第三實施例的晶片取放裝置的結構示意圖。 FIG. 6 is a schematic structural diagram of a wafer pick-and-place device according to a third embodiment of the present invention.
圖7為本發明的晶片取放與檢測系統的實施例的結構示意圖。 FIG. 7 is a schematic structural diagram of an embodiment of a wafer pick-and-place and detection system of the present invention.
以下是通過特定的具體實施例來說明本發明所公開有關“晶片取放裝置及晶片取放與檢測系統”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明 可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本發明的構思下進行各種修改與變更。另外,本發明的圖式僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。 The following is a description of the implementation of the “wafer pick-and-place device and wafer pick-and-place and detection system” disclosed in the present invention through specific specific examples. Those skilled in the art can understand the advantages and effects of the present invention from the contents disclosed in this specification. . this invention It can be implemented or applied through other different specific embodiments, and various details in this specification can also be based on different viewpoints and applications, and various modifications and changes can be made without departing from the concept of the present invention. In addition, the drawings of the present invention are only for simple and schematic illustrations, and are not drawn according to actual dimensions. The following embodiments will further describe the related technical content of the present invention in detail, but the disclosed content is not intended to limit the protection scope of the present invention.
應理解,雖然本文中可能使用術語第一、第二、第三等來描述各種元件或者訊號,但這些元件或者訊號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。 It should be understood that although the terms first, second, third, etc. may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are mainly used to distinguish one element from another element, or a signal from another signal. In addition, the term "or" as used herein should, depending on the actual situation, include any one or more of the associated listed items.
請參閱圖1及圖2,分別為本發明第一實施例的晶片取放裝置的第一結構示意圖及第二結構示意圖。如圖所示,晶片取放裝置2包括轉動組件20、多個吸取組件21及驅動組件22。轉動組件20外周圍上具有傾斜狀軌道200。多個吸取組件21環繞地設置在轉動組件20上,每一吸取組件21包括能活動地設置在轉動組件20上的可活動元件210以及連動地設置在可活動元件210上的吸嘴元件211,可活動元件210沿著傾斜狀軌道200移動。驅動組件22鄰近所述轉動組件20,驅動組件22包括活動式推抵元件220。其中,活動式推抵元件220推抵鄰近驅動組件22的吸取組件21。 Please refer to FIG. 1 and FIG. 2, which are a first structural schematic diagram and a second structural schematic diagram of a wafer pick-and-place device according to a first embodiment of the present invention, respectively. As shown in the figure, the wafer pick-and-place device 2 includes a rotation module 20, a plurality of suction modules 21, and a driving module 22. There is an inclined rail 200 on the outer periphery of the rotating assembly 20. A plurality of suction components 21 are arranged on the rotating component 20 in a circle, and each of the suction components 21 includes a movable element 210 movably disposed on the rotating component 20 and a nozzle element 211 disposed on the movable element 210 in tandem. The movable element 210 moves along the inclined rail 200. The driving assembly 22 is adjacent to the rotating assembly 20. The driving assembly 22 includes a movable pushing element 220. Wherein, the movable pushing element 220 pushes against the suction component 21 adjacent to the driving component 22.
具體而言,本發明的晶片取放裝置2包括了轉動組件20、多個吸取組件21及驅動組件22。轉動組件20可拆卸地設置在一外部支撐基座4上,其中,外部支撐基座4可位於晶圓製程中的任一機台上。每一吸取組件21通過可活動元件210能活動地設置在轉動組件20外周圍上的傾斜狀軌道200,而環繞地設置在轉動組件20上,可活動元件210上還連動地設置吸嘴元件211。而驅動 組件22可通過外部支撐基座4所延伸的支持結構41懸空設置,並鄰近於轉動組件20,且驅動組件22上的活動式推抵元件220可對應於其中一吸取組件21,其中,驅動組件22可包括音圈馬達(圖中未繪示),並透過音圈馬達驅使活動式推抵元件220進行往復位移。 Specifically, the wafer pick-and-place device 2 of the present invention includes a rotation module 20, a plurality of suction modules 21, and a driving module 22. The rotating assembly 20 is detachably disposed on an external support base 4, wherein the external support base 4 can be located on any machine in a wafer process. Each suction component 21 can be movably disposed on the outer periphery of the rotation component 20 by the movable member 210 on an inclined rail 200 on the outer periphery of the suction component 21, and is disposed on the rotation component 20 in a circular manner. . While driving The component 22 can be suspended by the supporting structure 41 extended by the external support base 4 and is adjacent to the rotating component 20, and the movable pushing element 220 on the driving component 22 can correspond to one of the suction components 21, wherein the driving component 22 may include a voice coil motor (not shown in the figure), and the movable pushing element 220 is reciprocated by the voice coil motor.
本發明的晶片取放裝置2在執行取得晶片元件10(如晶片)作動時,轉動組件20會以自身軸心為中心,進行轉動;同時,驅動組件22亦會驅使活動式推抵元件220進行往復運動,以推抵鄰近驅動組件22的吸取組件21,而使吸取組件21的吸嘴元件211取得晶片元件10。進一步而言,轉動組件20會以步進方式(但不以此為限)轉動,每當其中一可活動元件210上的吸嘴元件211與活動式推抵元件220對應後,驅動組件22會驅使活動式推抵元件220朝下方位移,使得活動式推抵元件220推抵並帶動吸嘴元件211朝下方位移,而使吸嘴元件211趨近承載裝置1,並吸取承載裝置1上的晶片元件10。接著,驅動組件22會驅使活動式推抵元件220朝上方位移,進行復位。此時,吸嘴元件211亦隨著朝上方位移,進行復位,完成取得晶片元件10作動。而後,轉動組件20會再次轉動,使得另一可活動元件210對應到驅動組件22,進而進行取得另一次的晶片元件10。其中,本發明的晶片取放裝置2吸嘴元件211取得晶片元件10的取得方式可為吸取方式,但不以此為限。 When the wafer pick-and-place device 2 of the present invention executes the operation of obtaining a wafer element 10 (such as a wafer), the rotating component 20 will rotate around its own axis; at the same time, the driving component 22 will also drive the movable pushing component 220 to perform Reciprocate to push against the suction component 21 adjacent to the driving component 22, so that the nozzle element 211 of the suction component 21 obtains the wafer component 10. Further, the rotating component 20 will rotate in a stepwise manner (but not limited to this). Whenever the nozzle element 211 on one of the movable elements 210 corresponds to the movable pushing element 220, the driving component 22 will The movable pushing element 220 is driven to be displaced downward, so that the movable pushing element 220 is pushed against and drives the nozzle element 211 to be displaced downward, so that the nozzle element 211 approaches the carrier device 1 and sucks the wafer on the carrier device 1 Element 10. Then, the driving assembly 22 will drive the movable pushing element 220 to be displaced upward and reset. At this time, the nozzle element 211 is also reset as it is displaced upward, and the operation of obtaining the wafer element 10 is completed. Then, the rotating component 20 will rotate again, so that the other movable component 210 corresponds to the driving component 22, and then another wafer component 10 is obtained. The method for acquiring the wafer element 10 by the nozzle element 211 of the wafer pick-and-place device 2 of the present invention may be a pick-up method, but is not limited thereto.
藉此,本發明的晶片取放裝置2可通過轉動組件20進行轉動與活動式推抵元件220進行往復運動,而使得每一吸嘴元件211可依序吸取承載裝置1上的晶片元件10。換言之,承載裝置1上的多個晶片元件10隨著轉動組件20進行轉動以及活動式推抵元件220進行往復運動,而被每一吸嘴元件211可依序吸取。 Thereby, the wafer pick-and-place device 2 of the present invention can be rotated by the rotating assembly 20 and reciprocated by the movable pushing element 220, so that each nozzle element 211 can sequentially suck the wafer element 10 on the carrying device 1. In other words, the plurality of wafer elements 10 on the carrier device 1 are rotated with the rotating assembly 20 and the movable pushing element 220 is reciprocated, and each of the nozzle elements 211 can be sequentially sucked.
此外,轉動組件20與驅動組件22的啟動與停止等作動,可由處理相關組件進行控制或由程式設定;並且,活動式推抵元件 220對應到其中一吸嘴元件211時會進行往復運動的實施手段,可透過程式設定或感測元件的偵測而實施。 In addition, the starting and stopping actions of the rotary assembly 20 and the drive assembly 22 can be controlled by the processing-related components or set by a program; and, the movable pushing element The implementation means that 220 corresponds to one of the nozzle elements 211 will perform reciprocating motion, which can be implemented by programming or detection of a sensing element.
值得一提的是,本發明的晶片取放裝置2不以上述所舉的例子為限。 It is worth mentioning that the wafer pick-and-place device 2 of the present invention is not limited to the above examples.
請參閱圖3及圖4,分別為本發明第二實施例的晶片取放裝置的第一結構示意圖及第二結構示意圖,並請一併參閱圖1及圖2。如圖所示,本實施例中所述的晶片取放裝置與上述第一實施例中所述的晶片取放裝置的相同組件的作動相似,在此不再贅述,值得注意的是,在本實施例中,轉動組件20較佳可包括基座元件201、轉動元件202及散熱元件203。傾斜狀軌道200設置在基座元件201的外周圍上。轉動元件202能轉動地設置在基座元件201中,多個吸取組件21環繞地設置在轉動元件202。散熱元件203設置在轉動元件202上,散熱元件203具有凹槽部2030以及貫穿通道2031,貫穿通道2031的一端連接外部氣端5,貫穿通道2031的另一端與凹槽部2030彼此相通。 Please refer to FIG. 3 and FIG. 4, which are respectively a first structural schematic diagram and a second structural schematic diagram of a wafer pick-and-place device according to a second embodiment of the present invention, and please refer to FIG. 1 and FIG. 2 together. As shown in the figure, the operations of the same components of the wafer pick-and-place device described in this embodiment are similar to those of the wafer pick-and-place device described in the first embodiment, and are not repeated here. It is worth noting that In the embodiment, the rotating component 20 may preferably include a base element 201, a rotating element 202 and a heat dissipation element 203. An inclined rail 200 is provided on the outer periphery of the base member 201. The rotating element 202 is rotatably disposed in the base element 201, and a plurality of suction components 21 are disposed around the rotating element 202. The heat dissipating element 203 is disposed on the rotating element 202. The heat dissipating element 203 has a groove portion 2030 and a through channel 2031. One end of the through channel 2031 is connected to the external air terminal 5. The other end of the through channel 2031 and the groove portion 2030 communicate with each other.
進一步地,每一吸嘴元件211較佳可包括能活動地設置在可活動元件210上的吸取件2110、套設在吸取件2110的受抵件2111以及穿設於轉動元件202且連接於吸取件2110的傳輸件2112。其中,對應於凹槽部2030的吸嘴元件211的吸取件2110通過傳輸件2112以與凹槽部2030相通。 Further, each nozzle element 211 may preferably include a suction element 2110 movably disposed on the movable element 210, a resisting element 2111 sleeved on the suction element 2110, and a rotating element 202 connected to the suction element. Piece 2110 of the transmission piece 2112. Wherein, the suction member 2110 of the nozzle element 211 corresponding to the groove portion 2030 is communicated with the groove portion 2030 through the transmission member 2112.
舉例而言,本發明的晶片取放裝置2的轉動組件20進一步還可包括基座元件201、轉動元件202及散熱元件203。基座元件201可為一般承載基座,材質不限定,其中,基座元件201可為獨立底座,或者也可與外部支撐基座4呈一體化設計;轉動元件202可為馬達,如圓形線性馬達或步進馬達,但不以此為限;散熱元件203可為環形結構的鰭片式散熱器,但不以此為限。基座元件 201可呈凹型結構,用於承載轉動元件202,其中,轉動元件202與基座元件201之間還可設置有軸承(圖中未繪示);並且,基座元件201的外周圍上具有傾斜狀軌道200;而多個吸取組件21可環繞地設置在轉動元件202外周圍,並能活動地設置在傾斜狀軌道200上。散熱元件203可設置在轉動元件202上,散熱元件203側邊可具有凹槽部2030,其中,凹槽部2030可環繞設置方式設置於散熱元件203部分本體,例如,凹槽部2030可環繞散熱元件203趨近驅動組件22的部分本體,但不以此為限;散熱元件203還具有貫穿通道2031,其貫穿散熱元件203本體,貫穿通道2031的一端連接外部氣端5,貫穿通道2031的另一端與凹槽部2030彼此相通。其中,散熱元件203可透過外部氣端5或外部支撐基座4固定,基座元件201則可透過外部支撐基座4固定,因此,在轉動元件202轉動時,基座元件201與散熱元件203可為靜止狀態。 For example, the rotating component 20 of the wafer pick-and-place device 2 of the present invention may further include a base element 201, a rotating element 202, and a heat dissipation element 203. The base element 201 may be a general bearing base, and the material is not limited. Among them, the base element 201 may be an independent base, or may be integrated with the external support base 4. The rotating element 202 may be a motor, such as a circular shape. A linear motor or a stepping motor is not limited thereto. The heat dissipation element 203 may be a fin-type heat sink with a ring structure, but is not limited thereto. Base element 201 may have a concave structure for carrying the rotating element 202, wherein a bearing (not shown in the figure) may be further provided between the rotating element 202 and the base element 201; and an outer periphery of the base element 201 is inclined The plurality of suction components 21 can be arranged around the outer periphery of the rotating element 202 and can be movably arranged on the inclined track 200. The heat dissipating element 203 may be disposed on the rotating element 202, and the side of the heat dissipating element 203 may have a recessed portion 2030. The recessed portion 2030 may be disposed in a surrounding manner on a portion of the heat dissipating element 203. The element 203 approaches, but is not limited to, a part of the body of the driving assembly 22; the heat dissipation element 203 also has a through channel 2031, which penetrates the body of the heat dissipation element 203, one end of the through channel 2031 is connected to the external air end 5, and One end communicates with the groove portion 2030. Among them, the heat dissipation element 203 can be fixed through the external air end 5 or the external support base 4, and the base element 201 can be fixed through the external support base 4. Therefore, when the rotation element 202 rotates, the base element 201 and the heat dissipation element 203 Can be stationary.
再者,本發明的吸嘴元件211進一步還可包括吸取件2110、受抵件2111與傳輸件2112。吸取件2110與傳輸件2112可為管狀結構,材質不限定。吸取件2110能活動地設置在可活動元件210上,吸取件2110一端具有吸嘴2110A,吸取件2110另一端則與傳輸件2112連接,且吸取件2110上還設置有受抵件2111。而傳輸件2112一端可與吸取件2110連接,傳輸件2112另一端則穿設於轉動元件202,並選擇性地與凹槽部2030相通。 Furthermore, the nozzle element 211 of the present invention may further include a suction member 2110, a resisting member 2111, and a transmission member 2112. The suction member 2110 and the transmission member 2112 may be tubular structures, and the material is not limited. The suction member 2110 can be movably disposed on the movable element 210, one end of the suction member 2110 has a suction nozzle 2110A, the other end of the suction member 2110 is connected to the transmission member 2112, and the suction member 2110 is further provided with a resisting member 2111. One end of the transmission member 2112 can be connected to the suction member 2110, and the other end of the transmission member 2112 is threaded through the rotating element 202 and selectively communicates with the groove portion 2030.
因此,在晶片取放裝置2執行取得晶片元件10作動時,轉動元件202會以自身軸心為中心,以步進方式(但不以此為限)進行轉動,並帶動每一吸取組件21一同位移。位移到轉動組件20遠離驅動組件22的一側的部分吸取組件21,由於沒有與凹槽部2030相通,所以不會產生吸力;而吸取組件21位移到轉動組件20趨近的一側時,吸取組件21的傳輸件2112則會與散熱元件203的凹槽部2030相通,由於貫穿通道2031接收外部氣端5所供給的氣體,使得傳輸件2112與吸取件2110形成負壓,而使吸取件 2110產生吸力。而在轉動元件202轉動後且其中一吸取組件21對應到活動式推抵元件220時,驅動組件22會驅使活動式推抵元件220朝下方位移,以推抵受抵件2111而使得受抵件2111帶動吸取件2110朝下方位移,而驅使吸取件2110趨近承載裝置1,進而讓吸取件2110透過負壓而經由吸嘴2110A吸取承載裝置1上的晶片元件10。而在驅動組件22驅使活動式推抵元件220朝上方位移,進行復位時,吸嘴元件211亦隨著朝上方位移,進行復位,完成取得晶片元件10作動。而後,轉動元件202會再次轉動,使得另一吸取組件21對應到驅動組件22,進而進行取得另一次的晶片元件10。 Therefore, when the wafer pick-and-place device 2 performs the operation of obtaining the wafer element 10, the rotating element 202 rotates in a stepwise manner (but not limited to this) with its own axis as the center, and drives each pick-up assembly 21 together. Displacement. The part of the suction assembly 21 that is moved to the side of the rotation assembly 20 away from the driving assembly 22 does not communicate with the groove portion 2030, so no suction force is generated. When the suction assembly 21 is moved to the side that is closer to the rotation assembly 20, the suction The transmission member 2112 of the module 21 is in communication with the groove portion 2030 of the heat dissipation element 203. Since the through-channel 2031 receives the gas supplied from the external air end 5, the transmission member 2112 and the suction member 2110 form a negative pressure, so that the suction member 2110 produces suction. After the rotating element 202 is rotated and one of the suction components 21 corresponds to the movable pushing element 220, the driving component 22 will drive the movable pushing element 220 to move downward to push against the abutment 2111 and make the abutment 2111 drives the sucking member 2110 to move downward, and drives the sucking member 2110 to approach the carrying device 1, and then allows the sucking member 2110 to suck the wafer element 10 on the carrying device 1 through the suction nozzle 2110A through negative pressure. And when the driving component 22 drives the movable pushing element 220 to be displaced upward, and is reset, the suction nozzle element 211 is also displaced upward to perform reset, and the operation of obtaining the wafer element 10 is completed. Then, the rotation element 202 is rotated again, so that the other pickup component 21 corresponds to the driving component 22, and then another wafer component 10 is obtained.
在吸取著晶片元件10的吸取組件21被轉動元件202帶動而位移至一特定位置,如吸取組件21的傳輸件2112未與凹槽部2030相通,此時,傳輸件2112無法接收外部氣端5所供給的氣體,造成氣路中斷,使得吸取件2110無法吸取晶片元件10,進而讓晶片元件10可脫離吸取件2110,而移動至檢測裝置3(如圖7所示)。 When the suction component 21 that sucks the wafer component 10 is driven to a specific position by the rotation component 202, for example, the transmission member 2112 of the suction component 21 is not in communication with the groove portion 2030. At this time, the transmission member 2112 cannot receive the external air end 5 The supplied gas causes the gas path to be interrupted, making the suction element 2110 unable to suck the wafer element 10, so that the wafer element 10 can be separated from the suction element 2110 and moved to the detection device 3 (as shown in FIG. 7).
上述實施態樣中,傳輸件2112一端也可具有真空產生器,並通過真空產生器與吸取件2110連接,因此,在傳輸件2112與凹槽部2030相通時,外部氣端5所供給的氣體與真空產生器產生負壓作動,使得吸取件2110產生吸力。並且,吸取組件21可透過傾斜狀軌道200的設計,在位移到轉動組件20前端的位置(靠近驅動組件22),可處於較低的位置;而在位移到轉動組件20後端或接近後端的位置(即遠離驅動組件22),可處於較高的位置,且吸嘴2110A會趨近、貼近檢測裝置3的檢測表面上。因此,在吸取晶片元件10的吸取組件21通過轉動元件202帶動由轉動組件20前端位移到轉動組件20後端位置時,由於此吸取組件21的傳輸件2112沒有與凹槽部2030相通,所以吸取件2110不會產生吸力,使得晶片元件10脫離吸取件2110而位移到檢測裝置3的檢測表面上。但不以此實施態樣為限。 In the above embodiment, a vacuum generator may be provided at one end of the transmission member 2112 and connected to the suction member 2110 through the vacuum generator. Therefore, when the transmission member 2112 communicates with the groove portion 2030, the gas supplied by the external air end 5 Acting on the negative pressure with the vacuum generator, the suction element 2110 generates a suction force. In addition, the suction component 21 can pass through the design of the inclined track 200, and can be in a lower position when it is displaced to the front end of the rotating component 20 (close to the driving component 22); The position (that is, away from the driving component 22) can be at a higher position, and the suction nozzle 2110A will approach and be close to the detection surface of the detection device 3. Therefore, when the suction assembly 21 that sucks the wafer element 10 is driven by the rotation element 202 to move from the front end of the rotation assembly 20 to the rear end position of the rotation assembly 20, since the transmission member 2112 of the suction assembly 21 does not communicate with the groove portion 2030, the suction The piece 2110 does not generate a suction force, so that the wafer element 10 is separated from the suction piece 2110 and displaced to the detection surface of the detection device 3. But this implementation is not limited.
此外,上述轉動元件202的運作過程中,轉動元件202所產生的熱能可透過散熱元件203帶走,以進行散熱。 In addition, during the operation of the rotating element 202 described above, the thermal energy generated by the rotating element 202 can be taken away through the heat dissipation element 203 for heat dissipation.
在本實施例之另一個較佳的實施態樣中,每一吸取組件21較佳還可包括設置在可活動元件210的復位構件212,復位構件212具有多個彈性件2120,吸取件2110穿設於復位構件212,且受抵件2111設置在復位構件212中並被多個彈性件2120所頂抵。 In another preferred implementation aspect of this embodiment, each of the suction components 21 may preferably further include a reset member 212 disposed on the movable member 210. The reset member 212 has a plurality of elastic members 2120, and the suction members 2110 pass through. The resetting member 212 is provided, and the abutment member 2111 is disposed in the resetting member 212 and is abutted by a plurality of elastic members 2120.
也就是說,本發明的每一吸取組件21進一步還可包括復位構件212,其可設置在可活動元件210,復位構件212上具有多個彈性件2120。而吸取件2110與受抵件2111可穿設於復位構件212,且受抵件2111被多個彈性件2120所頂抵。因此,在活動式推抵元件220推抵受抵件2111而使得受抵件2111帶動吸取件2110朝下方位移後,使得多個彈性件2120間接被壓縮,而在活動式推抵元件220進行復位時,由於多個彈性件2120藉由自身彈性回復力而進行伸長作動,使得受抵件2111受多個彈性件2120推抵而隨著朝上方位移。其中,復位構件212的結構可以對受抵件2111產生限位的作用,避免受抵件2111過度下降或上升。 That is, each of the suction components 21 of the present invention may further include a reset member 212, which may be disposed on the movable member 210, and the reset member 212 has a plurality of elastic members 2120. The suction member 2110 and the resisting member 2111 can pass through the resetting member 212, and the resisting member 2111 is pushed against by the elastic members 2120. Therefore, after the movable pushing element 220 pushes against the resisting element 2111 and the resisting element 2111 drives the suction element 2110 to move downward, a plurality of elastic members 2120 are indirectly compressed, and the movable pushing element 220 is reset. At this time, since the plurality of elastic members 2120 perform an elongation action by their own elastic restoring force, the resisting member 2111 is pushed by the plurality of elastic members 2120 and then moves upward. Among them, the structure of the resetting member 212 can have a limiting effect on the resisting member 2111 and avoid the excessive falling or rising of the resisting member 2111.
值得一提的是,本發明的晶片取放裝置2不以上述所舉的例子為限。 It is worth mentioning that the wafer pick-and-place device 2 of the present invention is not limited to the above examples.
請參閱圖5及圖6,為本發明第三實施例的晶片取放裝置的剖面示意圖與結構示意圖,並請一併參閱圖1至圖4。如圖所示,本實施例中所述的晶片取放裝置與上述各實施例中所述的晶片取放裝置的相同組件的作動相似,在此不再贅述,值得注意的是,在本實施例中,每一可活動元件210較佳可包括能活動地設置在轉動組件20的活動件2100、固定在活動件2100的元件主體2101以及固定在元件主體2101且能滑動地設置在傾斜狀軌道200上的連動件2102;其中,晶片取放裝置2較佳還可包括懸設於散熱元 件203的第一驅熱組件23以及鄰近於驅動組件22的第二驅熱組件24。 Please refer to FIG. 5 and FIG. 6, which are schematic cross-sectional views and structural diagrams of a wafer pick-and-place device according to a third embodiment of the present invention, and please refer to FIGS. 1 to 4 together. As shown in the figure, the operations of the same components of the wafer pick-and-place device described in this embodiment are similar to those of the wafer pick-and-place device described in the above embodiments, and are not repeated here. It is worth noting that in this implementation, For example, each movable element 210 may preferably include a movable element 2100 movably disposed on the rotating assembly 20, an element main body 2101 fixed on the movable element 2100, and a slidably arranged rail on the element main body 2101. Linking member 2102 on 200; among them, the wafer pick-and-place device 2 preferably further includes a heat sink suspended The first driving component 23 of the component 203 and the second driving component 24 adjacent to the driving component 22.
舉例而言,本發明的可活動元件210進一步還可包括活動件2100、元件主體2101與連動件2102。活動件2100可為交叉滾柱導軌,但不以此為限。元件主體2101可為板件結構,元件主體2101可透過活動件2100能活動地設置在轉動組件20的轉動元件202上,且元件主體2101上還設置了連動件2102,連動件2102能活動地接合於傾斜狀軌道200。因此,在轉動元件202轉動時,可透過連動件2102隨著傾斜狀軌道200逐漸上升、逐漸下降,並藉由活動件2100的設置,使得可活動元件210相對於轉動元件202進行逐漸上升、逐漸下降的作動,進而藉由可活動元件210帶動吸嘴元件211逐漸上升或逐漸下降。 For example, the movable element 210 of the present invention may further include a movable element 2100, an element main body 2101, and a linking element 2102. The movable member 2100 may be a cross roller guide, but is not limited thereto. The element main body 2101 can be a plate structure. The element main body 2101 can be movably disposed on the rotating element 202 of the rotating assembly 20 through the movable member 2100, and the element main body 2101 is further provided with a linking member 2102, and the linking member 2102 can be movably engaged于 斜 状 梁 200。 In the inclined track 200. Therefore, when the rotating element 202 rotates, the linking element 2102 can gradually rise and fall along with the inclined rail 200, and the movable element 210 can be gradually raised and gradually relative to the rotating element 202 by the setting of the movable element 2100. The lowering action further drives the suction nozzle element 211 to gradually rise or fall by the movable element 210.
並且,本發明的晶片取放裝置2進一步還可包括第一驅熱組件23與第二驅熱組件24,其皆可為風扇組件,但不以此為限。第一驅熱組件23可以懸設方式,設置於鄰近散熱元件203的位置。相同地,第二驅熱組件24也可以懸設方式,設置於鄰近驅動組件22的位置。因此,在在晶片取放裝置2運作的過程中,可透過第一驅熱組件23朝散熱元件203進行吹風,以加快散熱元件203的散熱速度;並且,利用第二驅熱組件24朝驅動組件22進行吹風,以將驅動組件22所產生的熱能帶離驅動組件22。藉此,達到加速散熱之功效。 In addition, the wafer pick-and-place device 2 of the present invention may further include a first driving component 23 and a second driving component 24, both of which may be fan components, but not limited thereto. The first heat driving component 23 may be suspended and disposed at a position adjacent to the heat dissipation element 203. Similarly, the second heat-dissipating component 24 may also be suspended and disposed at a position adjacent to the drive component 22. Therefore, during the operation of the wafer pick-and-place device 2, air can be blown toward the heat dissipation element 203 through the first driving component 23 to accelerate the heat dissipation speed of the heat dissipation component 203; and, the second driving component 24 is used to drive the component toward the driving component. 22 blows air to remove the thermal energy generated by the driving assembly 22 from the driving assembly 22. In this way, the effect of accelerated heat dissipation is achieved.
值得一提的是,本發明的晶片取放裝置2不以上述所舉的例子為限。 It is worth mentioning that the wafer pick-and-place device 2 of the present invention is not limited to the above examples.
請參閱圖7,為本發明的晶片取放與檢測系統的實施例的結構示意圖,並請一併參閱圖1至圖6。如圖所示,本實施例中所述的晶片取放與檢測系統與上述各實施例中所述的晶片取放裝置的相 同組件的作動相似,在此不再贅述,值得注意的是,在本實施例中,晶片取放與檢測系統S包括承載裝置1、晶片取放裝置2及檢測裝置3。承載裝置1承載至少一晶片元件10。晶片取放裝置2鄰近於承載裝置1,晶片取放裝置2包括轉動組件20、多個吸取組件21及驅動組件22。轉動組件20外周圍上具有傾斜狀軌道200。多個吸取組件21環繞地設置在轉動組件20上,每一吸取組件21包括能活動地設置在轉動組件20上的可活動元件210以及連動地設置在可活動元件210上的吸嘴元件211,可活動元件210沿著傾斜狀軌道200移動。驅動組件22鄰近所述轉動組件20,驅動組件22包括活動式推抵元件220。檢測裝置3鄰近於晶片取放裝置2。其中,至少一晶片元件10通過晶片取放裝置2的運送,以從承載裝置1移動到檢測裝置3。並且,活動式推抵元件220推抵鄰近驅動組件22的吸取組件21。 Please refer to FIG. 7, which is a schematic structural diagram of an embodiment of a wafer pick-and-place and inspection system according to the present invention, and please refer to FIGS. 1 to 6 together. As shown in the figure, the wafer picking and placing system described in this embodiment is similar to the wafer picking and placing device described in the above embodiments. The operations of the same components are similar and will not be repeated here. It is worth noting that, in this embodiment, the wafer pick-up and detection system S includes a carrier device 1, a wafer pick-up device 2, and a test device 3. The carrying device 1 carries at least one wafer element 10. The wafer pick-and-place device 2 is adjacent to the carrier device 1. The wafer pick-and-place device 2 includes a rotating component 20, a plurality of suction components 21 and a driving component 22. There is an inclined rail 200 on the outer periphery of the rotating assembly 20. A plurality of suction components 21 are arranged on the rotating component 20 in a circle, and each of the suction components 21 includes a movable element 210 movably disposed on the rotating component 20 and a nozzle element 211 disposed on the movable element 210 in tandem. The movable element 210 moves along the inclined rail 200. The driving assembly 22 is adjacent to the rotating assembly 20. The driving assembly 22 includes a movable pushing element 220. The detection device 3 is adjacent to the wafer pick-and-place device 2. Among them, at least one wafer element 10 is transported by the wafer pick-and-place device 2 to move from the carrier device 1 to the detection device 3. In addition, the movable pushing element 220 pushes against the suction component 21 adjacent to the driving component 22.
具體而言,本發明的晶片取放與檢測系統S包括了承載裝置1、晶片取放裝置2及檢測裝置3。承載裝置1可為承載晶片元件10(如晶片)的任何形式的載具,晶片取放裝置2結構如前述各實施例所述,在此不再特別贅述;而檢測裝置3則可為用於檢測晶片元件10的檢測機具或設備。其中,晶片取放裝置2可為依序、連續搬運多個晶片元件10的取放裝置,如前述各實施例所述。承載裝置1可鄰近於承載裝置1,較佳設置位置為驅動組件22與其中一吸取組件21的下方;而檢測裝置3也可鄰近於承載裝置1,較佳設置位置為另一吸取組件21的下方,檢測裝置3與承載裝置1之間距離一距離(依操作者需求或製造商而定)。 Specifically, the wafer picking and placing system S of the present invention includes a carrier device 1, a wafer picking and placing device 2, and a testing device 3. The carrier device 1 may be any form of carrier for carrying the wafer element 10 (such as a wafer). The structure of the wafer pick-and-place device 2 is as described in the previous embodiments, and is not described in detail here. The detection device 3 may be used for An inspection tool or equipment for inspecting the wafer element 10. The wafer pick-and-place device 2 may be a pick-and-place device that sequentially and continuously transports a plurality of wafer elements 10, as described in the foregoing embodiments. The carrying device 1 may be adjacent to the carrying device 1, and a preferred setting position is below the driving component 22 and one of the suction components 21; and the detecting device 3 may also be adjacent to the carrying device 1, and the preferred setting position is that of the other suction component 21. Below, there is a distance between the detection device 3 and the carrying device 1 (depending on the needs of the operator or the manufacturer).
承載裝置1上承載至少一個或多個晶片元件10,晶片取放裝置2經由人為或程式自動控制而執行取得、搬運晶片元件10(如晶片)的作動。轉動組件20以自身軸心為中心,以步進方式(但不以此為限)進行轉動,以依序、連續地帶動每一可活動元件210依序對應驅動組件22。而在每一可活動元件210與驅動組件22 對應到時,驅動組件22會驅使活動式推抵元件220進行往復運動,以利用活動式推抵元件220一併帶動吸嘴元件211進行往復運動,使得吸嘴元件211取得晶片元件10。因此,在驅動組件22驅使活動式推抵元件220朝下方位移時,活動式推抵元件220會推抵並帶動吸嘴元件211朝下方位移,而使吸嘴元件211趨近承載裝置1,此時,吸嘴元件211則可取得承載裝置1上的晶片元件10。接著,驅動組件22會驅使活動式推抵元件220朝上方位移,進行復位,而吸嘴元件211亦隨著朝上方位移,進行復位,完成取得晶片元件10的作動。 The carrier device 1 carries at least one or more wafer components 10, and the wafer pick-and-place device 2 performs operations of obtaining and carrying the wafer components 10 (such as wafers) through human or program automatic control. The rotating component 20 is centered on its own axis, and is rotated in a stepwise manner (but not limited thereto) to sequentially and continuously drive each movable element 210 to correspond to the driving component 22 in sequence. And in each movable element 210 and drive assembly 22 At the corresponding time, the driving component 22 will drive the movable pushing element 220 to reciprocate, so as to use the movable pushing element 220 to drive the nozzle element 211 to reciprocate, so that the nozzle element 211 obtains the wafer element 10. Therefore, when the driving assembly 22 drives the movable pushing element 220 to be displaced downward, the movable pushing element 220 will push against and drive the nozzle element 211 to be displaced downward, so that the nozzle element 211 approaches the carrying device 1. At this time, the nozzle element 211 can obtain the wafer element 10 on the carrier device 1. Then, the driving component 22 will drive the movable pushing element 220 to be displaced upward and reset, and the nozzle element 211 will also be displaced along with the upward displacement to reset, and the operation of obtaining the wafer element 10 is completed.
而後,轉動組件20會再次轉動,使得另一個(下一個)可活動元件210對應到驅動組件22,以進行取得另一次的晶片元件10。並且,藉由,轉動組件20的連續轉動,上述取得晶片元件10的吸嘴元件211會被帶至檢測裝置3,以使吸嘴元件211可將晶片元件10運送至檢測裝置3,進行後續的晶片檢測流程。 Then, the rotating assembly 20 will rotate again, so that another (next) movable element 210 corresponds to the driving assembly 22 to obtain another wafer element 10. In addition, by the continuous rotation of the rotating assembly 20, the nozzle element 211 for obtaining the wafer element 10 described above is brought to the detection device 3, so that the nozzle element 211 can transport the wafer element 10 to the detection device 3 for subsequent Wafer inspection process.
值得一提的是,在本發明的晶片取放與檢測系統S進一步還可包含以下實施態樣,具體實施說明,請參閱上述各實施例,以及圖1至6。 It is worth mentioning that the wafer pick-and-place and inspection system S of the present invention may further include the following implementation modes. For specific implementation descriptions, please refer to the above embodiments and FIGS. 1 to 6.
轉動組件20較佳可包括基座元件201、轉動元件202及散熱元件203。基座元件201呈凹型結構,傾斜狀軌道200設置在基座元件201的外周圍上。轉動元件202能轉動地設置在基座元件201中,多個吸取組件21環繞地設置在轉動元件202。散熱元件203設置在轉動元件202上,散熱元件203具有凹槽部2030以及貫穿通道2031,貫穿通道2031的一端連接外部氣端5,貫穿通道2031的另一端與凹槽部2030彼此相通。 The rotating component 20 may preferably include a base element 201, a rotating element 202, and a heat dissipation element 203. The base element 201 has a concave structure, and an inclined rail 200 is provided on the outer periphery of the base element 201. The rotating element 202 is rotatably disposed in the base element 201, and a plurality of suction components 21 are disposed around the rotating element 202. The heat dissipating element 203 is disposed on the rotating element 202. The heat dissipating element 203 has a groove portion 2030 and a through channel 2031. One end of the through channel 2031 is connected to the external air terminal 5. The other end of the through channel 2031 and the groove portion 2030 communicate with each other.
並且,每一吸嘴元件211較佳可包括能活動地設置在可活動元件210上的吸取件2110、套設在吸取件2110的受抵件2111以及穿設於轉動元件202且連接於吸取件2110的傳輸件2112。其中,對應於凹槽部2030的吸嘴元件211的吸取件2110通過傳輸 件2112以與凹槽部2030相通。 In addition, each nozzle element 211 may preferably include a suction element 2110 movably disposed on the movable element 210, a resisting element 2111 sleeved on the suction element 2110, and a rotating element 202 and connected to the suction element. The transmission part 2110 of 2110. Among them, the suction piece 2110 of the nozzle element 211 corresponding to the groove portion 2030 is transmitted by The piece 2112 communicates with the groove portion 2030.
又,每一吸取組件21還可包括設置在可活動元件210的復位構件212,復位構件212具有多個彈性件2120,吸取件2110穿設於復位構件212,且受抵件2111設置在復位構件212中並被多個彈性件2120所頂抵。 In addition, each suction assembly 21 may further include a reset member 212 provided on the movable element 210. The reset member 212 has a plurality of elastic members 2120. The suction member 2110 is passed through the reset member 212, and the resisting member 2111 is provided on the reset member. 212 is abutted by a plurality of elastic members 2120.
上述各組件的具體實施方式請參閱前述第二實施例,在此不再贅述。 For specific implementation manners of the foregoing components, refer to the foregoing second embodiment, and details are not described herein again.
此外,在本發明的上述晶片取放與檢測系統S的實施態樣中,可活動元件210較佳可包括能活動地設置在轉動組件20的活動件2100、固定在活動件2100的元件主體2101以及固定在元件主體2101且能滑動地設置在傾斜狀軌道200上的連動件2102。具體的實施方式請參閱前述第三實施例,在此不再贅述。 In addition, in the embodiment of the above-mentioned wafer pick-and-place and detection system S of the present invention, the movable element 210 may preferably include a movable member 2100 movably disposed on the rotating assembly 20 and a component body 2101 fixed on the movable member 2100. And a link 2102 fixed to the element body 2101 and slidably provided on the inclined rail 200. For specific implementation, refer to the foregoing third embodiment, and details are not described herein again.
並且,晶片取放裝置2較佳還可包括懸設於散熱元件203的第一驅熱組件23以及鄰近於驅動組件22的第二驅熱組件24。具體的實施方式請參閱前述第四實施例,在此不再贅述。 In addition, the wafer pick-and-place device 2 may further include a first driving component 23 suspended from the heat dissipation element 203 and a second driving component 24 adjacent to the driving component 22. For specific implementation, refer to the foregoing fourth embodiment, and details are not described herein again.
然而,本發明的上述晶片取放與檢測系統S不以上述所舉的例子為限。 However, the above-mentioned wafer pick-and-place and inspection system S of the present invention is not limited to the above-mentioned examples.
本發明所提供的晶片取放裝置及晶片取放與檢測系統,其能通過“在轉動組件20上能活動地設置多個吸取組件21”以及“驅動組件20包括對應並能驅使其中一吸取組件21作動的活動式推抵元件220”的技術方案,以提升晶片的運送速度及產能。 The wafer pick-and-place device and the wafer pick-and-place and detection system provided by the present invention can pass “a plurality of suction components 21 can be movably disposed on the rotating component 20” and “the driving component 20 includes a corresponding suction component and can drive one of them. The 21-actuated movable push element 220 "technology solution improves the speed and throughput of wafer transportation.
更進一步來說,本發明的晶片取放裝置2及晶片取放與檢測系統S,通過“在轉動組件20上能活動地設置多個吸取組件21”、“轉動組件20依序、連續地帶動多個吸取組件21轉動”以及“驅動組件22利用活動式推抵元件220帶動吸取組件21進行往復運動”的技術方案,使得每一吸取組件21能利用吸嘴元件 211可依序吸取承載裝置1上的晶片元件10,並且,也可依序、連續地將晶片元件10放置到檢測裝置3上,以提升、提高晶片的運送速度,同時,也能提升、提高製程的產能。 Furthermore, the wafer pick-and-place device 2 and the wafer pick-and-place and detection system S of the present invention are sequentially and continuously driven by "the plurality of pick-up modules 21 can be movably arranged on the rotary module 20" and "the rotary module 20 The technical solutions of “the plurality of suction components 21 rotate” and “the driving component 22 uses the movable pushing element 220 to drive the suction component 21 to reciprocate”, so that each suction component 21 can use the nozzle element 211 can sequentially pick up the wafer components 10 on the carrying device 1, and can also sequentially and continuously place the wafer components 10 on the detection device 3 to improve and increase the wafer transport speed, and at the same time, can also lift and improve Process capacity.
以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的申請專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包括於本發明的申請專利範圍內。 The content disclosed above is only the preferred and feasible embodiment of the present invention, and therefore does not limit the scope of patent application of the present invention. Therefore, any equivalent technical changes made by using the description and drawings of the present invention are included in the application of the present invention. Within the scope of the patent.
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