TWI662534B - 陣列基板及其製造方法及顯示屏 - Google Patents

陣列基板及其製造方法及顯示屏 Download PDF

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TWI662534B
TWI662534B TW107126042A TW107126042A TWI662534B TW I662534 B TWI662534 B TW I662534B TW 107126042 A TW107126042 A TW 107126042A TW 107126042 A TW107126042 A TW 107126042A TW I662534 B TWI662534 B TW I662534B
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inorganic film
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李瑶
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大陸商昆山國顯光電有限公司
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    • H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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Abstract

本發明是關於一種陣列基板，其包括顯示區以及位於顯示區外側的非顯示區；非顯示區包括：柔性基底，所述柔性基底的表面上設有至少一個凹槽，柔性基底上的相鄰凹槽之間的區域為走線區；無機膜層，所述無機膜層包括形成於走線區的第一無機膜層以及形成於所述凹槽的底壁的第二無機膜層，所述第二無機膜層與所述第一無機膜層之間被凹槽的側壁斷開；以及外圍金屬走線，形成於所述第一無機膜層的表面上。上述陣列基板的柔性基底的表面上設有凹槽，可以在無機膜層沉積時將無機膜層分隔成為至少一個相互獨立的部分，有效避免了無機膜層的斷裂，進而有效避免外圍金屬走線的斷裂。本發明還提供一種顯示屏和一種陣列基板的製造方法。

Description

陣列基板及其製造方法及顯示屏
本發明是有關於顯示技術領域，特別是關於一種陣列基板及其製造方法及顯示屏。
顯示屏包括顯示區（AA區）以及非顯示區（非AA區），為了達到某些功能，會要求非顯示區能夠彎折。例如為了實現窄邊框化，將非顯示區彎折到屏體的背面，從而減少邊框寬度。
但是，目前的顯示屏，在非顯示區的彎折過程中，非顯示區中的外圍金屬走線易斷裂，從而造成屏體不良。
基於此，有必要提供一種能夠有效防止外圍金屬走線斷裂的陣列基板。
本發明提供一種陣列基板，包括顯示區以及位於所述顯示區外側的非顯示區。所述非顯示區包括：柔性基底，所述柔性基底的表面上設有至少一個凹槽，所述柔性基底上的相鄰所述凹槽之間的區域為走線區；無機膜層，所述無機膜層包括形成於所述走線區的第一無機膜層以及形成於所述凹槽的底壁的第二無機膜層，所述第二無機膜層與所述第一無機膜層之間被凹槽的側壁斷開；以及外圍金屬走線，形成於所述第一無機膜層的表面上。
上述陣列基板的柔性基底表面設有凹槽，從而可以將無機膜層斷開形成第一無機膜層和第二無機膜層，其中第一無機膜層位於走線區，第二無機膜層位於凹槽的底壁，即可以在無機膜層沉積時將無機膜層分隔成為至少一個相互獨立的部分，從而在非顯示區彎折時減小無機膜層的彎曲應力，有效避免了無機膜層的斷裂，進而有效避免外圍金屬走線的斷裂，提高陣列基板的可靠性。
在其中一個實施例中，所述凹槽的側壁與所述凹槽的底壁的夾角小於90度。
在其中一個實施例中，所述凹槽的截面呈等腰梯形。
在其中一個實施例中，所述凹槽的側壁的截面呈圓弧狀。
在其中一個實施例中，所述凹槽的深度大於1微米。
在其中一個實施例中，相鄰兩所述金屬走線之間具有至少一個所述凹槽。
在其中一個實施例中，還包括形成於所述外圍金屬走線表面上的保護層。
在其中一個實施例中，所述柔性基底包括柔性基底主體層和柔性基底表層，所述凹槽貫穿所述柔性基底表層。
本發明還提供一種顯示屏，其包括本發明提供的陣列基板。
上述的顯示屏包括本發明提供的陣列基板，陣列基板的非顯示區的結構可以有效防止外圍金屬走線的斷裂，從而能夠更好的保證訊號的傳遞，延長顯示屏的使用壽命。
本發明還提供一種陣列基板的製造方法，所述陣列基板包括非顯示區，所述陣列基板的非顯示區的製造方法包括如下步驟。提供柔性基底；在所述柔性基底上形成凹槽；在所述柔性基底的表面上形成至少一個第一無機膜層，在所述凹槽的底壁上形成第二無機膜層；在所述第一無機膜層的表面上形成外圍金屬走線。
通過上述陣列基板的製造方法制得的陣列基板，可以在沉積無機膜層時直接將無機膜層分隔成為至少一個相互獨立的部分，從而在非顯示區彎折時減小無機膜層的彎曲應力，有效避免了無機膜層的斷裂，進而有效避免外圍金屬走線的斷裂。
為了使本發明的目的、技術方案及優點更加清楚明白，以下結合附圖及實施例，對本發明進行進一步詳細說明。應當理解，此處所描述的具體實施例僅僅用以解釋本發明，並不用於限定本發明。
需要說明的是，當元件被稱為“設置於”另一個元件，它可以直接在另一個元件上或者也可以存在居中的元件。當一個元件被認為是“連接”另一個元件，它可以是直接連接到另一個元件或者可能同時存在居中元件。本文所使用的術語“垂直的”、“水準的”、“左”、“右”以及類似的表述只是為了說明的目的，並不表示是唯一的實施方式。
如圖1至圖2所示，本發明實施例一提供的陣列基板300，包括顯示區310以及位於顯示區外側的非顯示區320。
其中，顯示區310（即AA區）為陣列基板100中與畫素單元對應的區域，在顯示區310中設有薄膜電晶體以及電容器等用於驅動圖元單元的電子元件。本發明對於顯示區310的具體結構沒有特殊限制，可以採用本領域技術人員認為合適的各種結構，在此不再贅述。
在本實施例中，非顯示區320（即非AA區）位於顯示區310所在側。當然，非顯示區320也可以存在於顯示區310外側的其他位置。
非顯示區320包括柔性基底321、無機膜層323以及外圍金屬走線325。
具體的，柔性基底321包括一層或多層柔性基板。柔性基底321表面設有至少一個凹槽3211，柔性基底321上得相鄰凹槽3211之間的區域為走線區3213。
無機膜層323包括同時形成於所述走線區3213的第一無機膜層3231以及形成於凹槽3211的底壁的第二無機膜層3233。第二無機膜層3233與第一無機膜層3231之間被凹槽3211的側壁斷開。外圍金屬走線325形成於第一無機膜層3231表面。
第二無機膜層3233與第一無機膜層3231之間被凹槽3211的側壁斷開。即將無機膜層323分隔成為至少一個相互獨立的部分，從而在非顯示區320彎折時減小無機膜層323的彎曲應力，有效避免了無機膜層323的斷裂，進而有效避免外圍金屬走線325的斷裂，提高陣列基板300的可靠性。
凹槽3211的側壁具有向凹槽3211外側凹的壁段，如凹槽3211的側壁為斜壁或凹槽3211側壁的截面呈圓弧狀等。此種結構，使得第一無機膜層3231和第二無機膜層3233可以通過一次無機物沉積製程完成，且使得無機物沉積時在凹槽3211的邊沿處產生爬坡斷裂現象，使得第一無機膜層3231和第二無機膜層3233相互獨立。
優選的，在本實施例中，凹槽3211的側壁與凹槽3211的底壁的夾角小於90度，即凹槽3211的側壁為向凹槽3211外側凹陷的斜壁。此種方案的結構簡單，便於實現。更優選的，凹槽3211的截面呈等腰梯形，即凹槽3211在垂直於凹槽3211延伸方向的截面呈等腰梯形。使得非顯示區320彎曲時的彎曲應力均勻，避免產生應力集中的現象。
凹槽3211的深度大於無機膜層323的厚度，從而使得無機膜層323沉積時，第一無機膜層3231與第二無機膜層3233之間被凹槽3211的側壁斷開。優選的，凹槽3211的深度大於1微米，從而能夠釋放足夠多的無機膜層的彎曲應力，確保防止無機膜層的斷裂。
在本實施例中，凹槽3211分佈均勻，且凹槽3211的大小相同，便於加工。當然，根據需要，凹槽3211的分佈可以不均勻，且凹槽3211的大小也可以不完全相同。
進一步地，第一無機膜層3231的寬度大於等於外圍金屬走線325的寬度，從而使得外圍金屬走線325能夠完全位於第一無機膜層3231上，且不經過凹槽3211處，從而不會導致外圍金屬走線325的爬坡斷裂現象，即能防止外圍金屬走線325斷裂，保證信號傳輸的可靠性。
在本實施例中，相鄰外圍金屬走線325之間僅具有一個凹槽3211。需要說明的是，相鄰兩所述金屬走線325之間還可以具有至少一個所述凹槽3211，能更多的釋放無機膜層323的彎曲應力，防止無機膜層323的斷裂，進而防止外圍金屬走線325的斷裂。
在另外一個實施例中，陣列基板300的非顯示區320還包括形成於外圍金屬走線325表面的保護層，用以防止外圍金屬走線325與水氧接觸，導致外圍金屬走線325被氧化。
如圖3所示，本發明實施例二提供的陣列基板，與陣列基板300不同的是，非顯示區330的柔性基底331包括柔性基底主體層3315和柔性基底表層3317。凹槽3311貫穿柔性基底表層3317。柔性基底主體層3315包括一層或多層柔性基板，柔性基底表層3317包括一層或多層柔性基板。優選的，可以控制柔性基底表層3317的厚度等於凹槽3311的深度，從而可以通過在柔性基底主體層3315表面形成圖案化的柔性基底表層3317的方式，以使柔性基底表層3317的鏤空區域與柔性基底主體層3315構成凹槽3311。
可以理解的是，凹槽3311的深度還可以大於或小於柔性基底表層3317的厚度，只要精確控制刻蝕深度即可。但要保證凹槽3311的深度大於無機膜層的厚度，從而使得無機膜層沉積時，走線區的第一無機膜層與凹槽3311底壁的第二無機膜層之間被凹槽3311的側壁斷開。
本發明提供一種顯示屏，包括本發明提供的陣列基板。
需要說明的是，顯示屏除了陣列基板，還包括其它器件，其它器件的具體結構以及器件之間的連接關係均可以採用本領域技術人員所習知的結構，此處不再贅述。
本發明提供的陣列基板的非顯示區的結構可以有效防止外圍金屬走線的斷裂，從而能夠更好的保證訊號的傳遞，延長顯示屏的使用壽命。
本發明提供了一種陣列基板的製造方法。陣列基板的非顯示區的製造方法具體的包括如下步驟：
S1，在柔性基底上形成凹槽。
具體的，可以通過刻蝕等方式直接在柔性基底的表面上形成凹槽。
在另外一個實施例中，柔性基底包括柔性基底主體層和柔性基底表層。柔性基底主體層包括至少一層柔性基板；柔性基底表層包括至少一層柔性基板。在柔性基底的表面形成至少一個凹槽的操作為：
提供柔性基底主體層；在柔性基底主體層上形成圖案化的柔性基底表層，以使柔性基底表層的鏤空區域與柔性基底主體層構成凹槽。
具體的，可以通過罩幕板等方式在柔性基底主體層上形成圖案化的柔性基底表層。
S2，沉積無機膜層，以在所述柔性基底的表面形成至少一個第一無機膜層和至少一個第二無機膜層。
具體的，在柔性基底的走線區形成第一無機膜層，在凹槽的底壁上形成第二無機膜層。
S3，在第一無機膜層表面上形成外圍金屬走線。
需要說明的是，陣列基板包括顯示區和非顯示區，顯示區的製造方法可採用本領域技術人員所習知的製造方法，此處不再贅述。
通過上述陣列基板的製造方法制得的陣列基板，可以在沉積無機膜層時直接將無機膜層分隔成為至少一個相互獨立的部分，從而在非顯示區彎折時減小無機膜層的彎曲應力，有效避免了無機膜層的斷裂，進而有效避免外圍金屬走線的斷裂。
上述陣列基板的柔性基底表面設有凹槽，從而可以將無機膜層斷開形成第一無機膜層和第二無機膜層，其中第一無機膜層位於走線區，第二無機膜層位於凹槽的底壁，即可以在無機膜層沉積時將無機膜層分隔成為至少一個相互獨立的部分，從而在非顯示區彎折時減小無機膜層的彎曲應力，有效避免了無機膜層的斷裂，進而有效避免外圍金屬走線的斷裂，提高陣列基板的可靠性。
以上所述實施例的各技術特徵可以進行任意的組合，為使描述簡潔，未對上述實施例中的各個技術特徵所有可能的組合都進行描述，然而，只要這些技術特徵的組合不存在矛盾，都應當認為是本說明書記載的範圍。
以上所述實施例僅表達了本發明的幾種實施方式，其描述較為具體和詳細，但並不能因此而理解為對本申請專利範圍的限制。
300‧‧‧陣列基板
310‧‧‧顯示區
320、330‧‧‧非顯示區
321、331‧‧‧柔性基底
323‧‧‧無機膜層
325‧‧‧外圍金屬走線
3211、3311‧‧‧凹槽
3213‧‧‧走線區
3231‧‧‧第一無機膜層
3233‧‧‧第二無機膜層
3315‧‧‧柔性基底主體層
3317‧‧‧柔性基底表層
圖1為本發明實施例一的陣列基板的結構示意圖。 圖2為圖1所示的陣列基板的非顯示區的截面示意圖。 圖3為本發明實施例二的陣列基板的非顯示區的截面示意圖。

Claims (10)

  1. 一種陣列基板，包括顯示區以及位於所述顯示區外側的非顯示區，其中所述非顯示區包括：柔性基底，所述柔性基底表面設有至少一個凹槽，所述柔性基底上的相鄰所述凹槽之間的區域為走線區；無機膜層，所述無機膜層包括形成於所述走線區的第一無機膜層以及形成於所述凹槽的底壁的第二無機膜層，所述第一無機膜層與所述第二無機膜層之間被所述凹槽的側壁斷開；以及外圍金屬走線，形成於所述第一無機膜層的表面上。
  2. 如申請專利範圍第1項所述的陣列基板，其中所述凹槽的側壁與所述凹槽的底壁的夾角小於90度。
  3. 如申請專利範圍第2項所述的陣列基板，其中所述凹槽的截面呈等腰梯形。
  4. 如申請專利範圍第1項所述的陣列基板，其中所述凹槽的側壁的截面呈圓弧狀。
  5. 如申請專利範圍第1項所述的陣列基板，其中所述凹槽的深度大於1微米。
  6. 如申請專利範圍第1項所述的陣列基板，其中相鄰兩所述金屬走線之間具有至少一個所述凹槽。
  7. 如申請專利範圍第1項所述的陣列基板，還包括形成於所述外圍金屬走線的表面上的保護層。
  8. 如申請專利範圍第1項所述的陣列基板，其中所述柔性基底包括柔性基底主體層和柔性基底表層，所述凹槽貫穿所述柔性基底表層。
  9. 一種顯示屏，包括如申請專利範圍第1項至第8項中任一項所述的陣列基板。
  10. 一種陣列基板的製造方法，所述陣列基板包括非顯示區，其中所述陣列基板的所述非顯示區的製造方法包括：提供柔性基底；在所述柔性基底上形成凹槽；在所述柔性基底的表面上形成第一無機膜層，在所述凹槽的底壁上形成第二無機膜層，其中所述第一無機膜層與所述第二無機膜層之間被所述凹槽的側壁斷開；以及在所述第一無機膜層的表面上形成外圍金屬走線。
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