TWI659567B - Radome cover and plasma generating device using the same - Google Patents

Radome cover and plasma generating device using the same Download PDF

Info

Publication number
TWI659567B
TWI659567B TW103141194A TW103141194A TWI659567B TW I659567 B TWI659567 B TW I659567B TW 103141194 A TW103141194 A TW 103141194A TW 103141194 A TW103141194 A TW 103141194A TW I659567 B TWI659567 B TW I659567B
Authority
TW
Taiwan
Prior art keywords
radome
antenna
thickness
plasma
terminal
Prior art date
Application number
TW103141194A
Other languages
English (en)
Chinese (zh)
Other versions
TW201524006A (zh
Inventor
二宮史郎
佐藤正輝
Original Assignee
住友重機械離子技術有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友重機械離子技術有限公司 filed Critical 住友重機械離子技術有限公司
Publication of TW201524006A publication Critical patent/TW201524006A/zh
Application granted granted Critical
Publication of TWI659567B publication Critical patent/TWI659567B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/40—Radiating elements coated with or embedded in protective material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/42—Housings not intimately mechanically associated with radiating elements, e.g. radome
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q1/00—Details of, or arrangements associated with, antennas
    • H01Q1/42—Housings not intimately mechanically associated with radiating elements, e.g. radome
    • H01Q1/421—Means for correcting aberrations introduced by a radome
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01Q—ANTENNAS, i.e. RADIO AERIALS
    • H01Q7/00—Loop antennas with a substantially uniform current distribution around the loop and having a directional radiation pattern in a plane perpendicular to the plane of the loop
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/4652—Radiofrequency discharges using inductive coupling means, e.g. coils
    • H10P30/20—

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Details Of Aerials (AREA)
TW103141194A 2013-12-11 2014-11-27 Radome cover and plasma generating device using the same TWI659567B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013-256014 2013-12-11
JP2013256014A JP6147177B2 (ja) 2013-12-11 2013-12-11 アンテナカバー及びそれを用いたプラズマ発生装置

Publications (2)

Publication Number Publication Date
TW201524006A TW201524006A (zh) 2015-06-16
TWI659567B true TWI659567B (zh) 2019-05-11

Family

ID=53272106

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103141194A TWI659567B (zh) 2013-12-11 2014-11-27 Radome cover and plasma generating device using the same

Country Status (5)

Country Link
US (1) US9502759B2 (enExample)
JP (1) JP6147177B2 (enExample)
KR (1) KR102226099B1 (enExample)
CN (1) CN104716424B (enExample)
TW (1) TWI659567B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109300758A (zh) * 2018-09-27 2019-02-01 德淮半导体有限公司 离子植入机及离子源发生装置
KR102900424B1 (ko) * 2020-06-23 2025-12-16 미쿠니 일렉트론 코포레이션 유도결합플라즈마에 의해 스퍼터링 성막을 수행하는 성막장치
CN113972475B (zh) * 2020-07-24 2024-03-08 启碁科技股份有限公司 天线结构
US20230083497A1 (en) * 2021-09-15 2023-03-16 Applied Materials, Inc. Uniform plasma linear ion source

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0718433A (ja) 1993-06-30 1995-01-20 Kobe Steel Ltd Ｉｃｐスパッタリング処理装置
US5824158A (en) 1993-06-30 1998-10-20 Kabushiki Kaisha Kobe Seiko Sho Chemical vapor deposition using inductively coupled plasma and system therefor
JPH11317299A (ja) * 1998-02-17 1999-11-16 Toshiba Corp 高周波放電方法及びその装置並びに高周波処理装置
JP4122467B2 (ja) 1998-02-17 2008-07-23 株式会社東芝 高周波放電装置及び高周波処理装置
JP4089022B2 (ja) 1998-07-22 2008-05-21 日新イオン機器株式会社 自己電子放射型ｅｃｒイオンプラズマ源
JP2001203099A (ja) * 2000-01-20 2001-07-27 Yac Co Ltd プラズマ生成装置およびプラズマ処理装置
KR100523851B1 (ko) * 2003-05-07 2005-10-27 학교법인 성균관대학 대면적처리용 내장형 선형안테나를 구비하는 유도결합플라즈마 처리장치
JP5162108B2 (ja) * 2005-10-28 2013-03-13 日新電機株式会社 プラズマ生成方法及び装置並びにプラズマ処理装置
JP4001185B1 (ja) 2007-03-06 2007-10-31 日新イオン機器株式会社 プラズマ発生装置
JP5329796B2 (ja) * 2007-11-14 2013-10-30 株式会社イー・エム・ディー プラズマ処理装置
KR20090079696A (ko) * 2008-01-18 2009-07-22 삼성전자주식회사 선형 안테나를 구비한 플라즈마 처리 장치
JP4992885B2 (ja) 2008-11-21 2012-08-08 日新イオン機器株式会社 プラズマ発生装置
TW201105183A (en) * 2009-07-21 2011-02-01 Delta Electronics Inc Plasma generating apparatus
CN101990352A (zh) * 2009-08-07 2011-03-23 台达电子工业股份有限公司 电浆产生装置
CN103766004A (zh) * 2011-08-30 2014-04-30 株式会社Emd 等离子体处理装置用天线及使用该天线的等离子体处理装置
JP2013089477A (ja) * 2011-10-19 2013-05-13 Nissin Electric Co Ltd プラズマ発生装置

Also Published As

Publication number Publication date
US20150162657A1 (en) 2015-06-11
KR20150068307A (ko) 2015-06-19
TW201524006A (zh) 2015-06-16
KR102226099B1 (ko) 2021-03-09
CN104716424A (zh) 2015-06-17
US9502759B2 (en) 2016-11-22
CN104716424B (zh) 2020-08-21
JP6147177B2 (ja) 2017-06-14
JP2015115172A (ja) 2015-06-22

Similar Documents

Publication Publication Date Title
JP3714924B2 (ja) プラズマ処理装置
US8590485B2 (en) Small form factor plasma source for high density wide ribbon ion beam generation
US7673583B2 (en) Locally-efficient inductive plasma coupling for plasma processing system
TWI659567B (zh) Radome cover and plasma generating device using the same
TWI573168B (zh) A plasma processing apparatus, a plasma generating apparatus, an antenna structure, and a plasma generating method
KR20160055241A (ko) 플라즈마 발생 장치
KR20080077670A (ko) 유도성으로 결합된 고주파 플라즈마 플러드 건을 제공하기위한 기법
JP7199423B2 (ja) イオンビーム加速のためのｒｆ共振器
KR100903295B1 (ko) 이온빔 발생 장치 및 이온 빔 발생 방법
JP2012069509A (ja) プラズマ発生装置
KR101281188B1 (ko) 유도 결합 플라즈마 반응기
KR101718182B1 (ko) 플라즈마 처리 장치, 플라즈마 생성 장치, 안테나 구조체, 및 플라즈마 생성 방법
JP5325623B2 (ja) 電子源
KR102584240B1 (ko) 집속 유도 결합 플라즈마용 페라이트 쉴드를 포함하는 플라즈마 발생장치
JP6666599B2 (ja) 基板処理装置
US20240387151A1 (en) Inductively coupled plasma apparatus with novel faraday shield
TWI881491B (zh) 天線總成及處理系統
KR20090073548A (ko) 국소영역의 플라즈마 차폐장치 및 그 차폐방법
JP6150705B2 (ja) マイクロ波イオン源
JP2015109150A (ja) イオン源
JP2017123265A (ja) イオン源および絶縁機構
JP2017134934A (ja) イオン源
JP2017539071A (ja) 電極の導電性を維持するためのイン・サイチュ トリプルジャンクションの形成