TWI652363B - 沉積配置、沉積設備及其操作方法 - Google Patents
沉積配置、沉積設備及其操作方法 Download PDFInfo
- Publication number
- TWI652363B TWI652363B TW103141823A TW103141823A TWI652363B TW I652363 B TWI652363 B TW I652363B TW 103141823 A TW103141823 A TW 103141823A TW 103141823 A TW103141823 A TW 103141823A TW I652363 B TWI652363 B TW I652363B
- Authority
- TW
- Taiwan
- Prior art keywords
- chamber
- configuration
- line
- deposition
- substrate
- Prior art date
Links
- 238000000151 deposition Methods 0.000 title claims abstract description 127
- 230000008021 deposition Effects 0.000 title claims abstract description 113
- 238000000034 method Methods 0.000 title claims description 26
- 239000000463 material Substances 0.000 claims abstract description 182
- 238000001704 evaporation Methods 0.000 claims abstract description 87
- 239000000758 substrate Substances 0.000 claims abstract description 84
- 230000008020 evaporation Effects 0.000 claims abstract description 66
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 49
- 239000012530 fluid Substances 0.000 claims abstract description 46
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 32
- 238000004891 communication Methods 0.000 claims abstract description 8
- 239000007789 gas Substances 0.000 claims description 68
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical group [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 38
- 229910052783 alkali metal Inorganic materials 0.000 claims description 26
- 150000001340 alkali metals Chemical class 0.000 claims description 26
- 229910052786 argon Inorganic materials 0.000 claims description 19
- 239000012298 atmosphere Substances 0.000 claims description 8
- 230000001681 protective effect Effects 0.000 claims description 5
- 230000008016 vaporization Effects 0.000 claims description 4
- 238000012544 monitoring process Methods 0.000 claims description 3
- 239000002585 base Substances 0.000 claims description 2
- 239000003513 alkali Substances 0.000 abstract description 17
- 229910052744 lithium Inorganic materials 0.000 description 72
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 70
- 238000010438 heat treatment Methods 0.000 description 28
- 238000009826 distribution Methods 0.000 description 26
- 230000008018 melting Effects 0.000 description 15
- 238000002844 melting Methods 0.000 description 15
- 238000004140 cleaning Methods 0.000 description 13
- 239000007788 liquid Substances 0.000 description 13
- 239000011344 liquid material Substances 0.000 description 13
- 238000012545 processing Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 9
- 238000005259 measurement Methods 0.000 description 8
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 229910052700 potassium Inorganic materials 0.000 description 4
- 239000011591 potassium Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 229910001338 liquidmetal Inorganic materials 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009530 blood pressure measurement Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 229910052701 rubidium Inorganic materials 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/0064—Feeding of liquid into an evaporator
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/0082—Regulation; Control
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B14/00—Crucible or pot furnaces
- F27B14/08—Details specially adapted for crucible or pot furnaces
- F27B14/20—Arrangement of controlling, monitoring, alarm or like devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
- F27D19/00—Arrangements of controlling devices
- F27D2019/0028—Regulation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2013/075850 WO2015082022A1 (en) | 2013-12-06 | 2013-12-06 | Depositing arrangement, deposition apparatus and methods of operation thereof |
| ??PCT/EP2013/075850 | 2013-12-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201522681A TW201522681A (zh) | 2015-06-16 |
| TWI652363B true TWI652363B (zh) | 2019-03-01 |
Family
ID=49886884
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103141823A TWI652363B (zh) | 2013-12-06 | 2014-12-02 | 沉積配置、沉積設備及其操作方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20170022598A1 (enExample) |
| EP (1) | EP3077567B1 (enExample) |
| JP (1) | JP6647202B2 (enExample) |
| KR (1) | KR102137181B1 (enExample) |
| CN (2) | CN105874095A (enExample) |
| TW (1) | TWI652363B (enExample) |
| WO (1) | WO2015082022A1 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018103137A (ja) * | 2016-12-28 | 2018-07-05 | セイコーエプソン株式会社 | 液体吐出装置、方法およびコンピュータープログラム |
| US20210147975A1 (en) * | 2018-04-18 | 2021-05-20 | Applied Materials, Inc. | Evaporation source for deposition of evaporated material on a substrate, deposition apparatus, method for measuring a vapor pressure of evaporated material, and method for determining an evaporation rate of an evaporated material |
| EP3895236B1 (en) * | 2018-12-12 | 2025-08-13 | Elevated Materials Germany GmbH | Free-span coating systems and methods |
| WO2020251696A1 (en) | 2019-06-10 | 2020-12-17 | Applied Materials, Inc. | Processing system for forming layers |
| US11624113B2 (en) * | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
| KR102615500B1 (ko) * | 2019-10-21 | 2023-12-19 | 가부시키가이샤 아루박 | 막 형성장치 |
| CN115279935A (zh) * | 2020-03-26 | 2022-11-01 | 应用材料公司 | 蒸发源、具有蒸发源的沉积设备及其方法 |
| KR102859881B1 (ko) * | 2020-11-18 | 2025-09-12 | 주식회사 엘지화학 | 유기발광다이오드의 증착장치 |
| RU2765222C1 (ru) * | 2020-12-30 | 2022-01-26 | Тхе Баттериес Сп. з о.о. | Способ формирования пленки LiCoO2 и устройство для его реализации |
| CN116670321A (zh) * | 2021-01-15 | 2023-08-29 | 应用材料公司 | 用于提供液化材料的设备、用于配量液化材料的配量系统及方法 |
| CN113215535B (zh) * | 2021-05-21 | 2022-11-22 | 泊肃叶科技(沈阳)有限公司 | 一种蒸发速率智能可调的蒸发镀膜机 |
| CN120548781A (zh) * | 2022-10-28 | 2025-08-26 | 提升材料德国有限公司 | 多孔介质蒸发器 |
| CN119651320A (zh) * | 2023-09-15 | 2025-03-18 | 中国科学院大连化学物理研究所 | 一种大流量碱金属原子蒸气生产装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013143692A1 (en) | 2012-03-30 | 2013-10-03 | Tata Steel Nederland Technology B.V. | Method and apparatus for feeding liquid metal to an evaporator device |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2664852A (en) * | 1950-04-27 | 1954-01-05 | Nat Res Corp | Vapor coating apparatus |
| JPH01234560A (ja) * | 1988-03-11 | 1989-09-19 | Ulvac Corp | 蒸着装置における低融点蒸発材の供給方法及び装置 |
| US5135817A (en) * | 1988-07-06 | 1992-08-04 | Kabushiki Kaisha Kobe Seiko Sho | Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them |
| JPH02118064A (ja) * | 1988-10-27 | 1990-05-02 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
| JPH0372037A (ja) * | 1989-08-14 | 1991-03-27 | Toshiba Corp | 金属蒸気発生装置 |
| JPH06291040A (ja) * | 1992-03-03 | 1994-10-18 | Rintetsuku:Kk | 液体気化供給方法と液体気化供給器 |
| JPH06322501A (ja) * | 1993-05-12 | 1994-11-22 | Nippon Steel Corp | スリットノズル溶融メッキ法における溶融金属の吐出量制御方法 |
| US5492724A (en) * | 1994-02-22 | 1996-02-20 | Osram Sylvania Inc. | Method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor |
| WO1999016929A1 (en) * | 1997-09-26 | 1999-04-08 | Advanced Technology Materials, Inc. | Liquid reagent delivery system |
| JP4338246B2 (ja) * | 1998-11-27 | 2009-10-07 | キヤノンアネルバ株式会社 | Ｃｕ−ＣＶＤプロセス用原料とＣｕ−ＣＶＤ装置 |
| LV13383B (en) * | 2004-05-27 | 2006-02-20 | Sidrabe As | Method and device for vacuum vaporization metals or alloys |
| WO2006083929A2 (en) * | 2005-02-03 | 2006-08-10 | Applied Materials, Inc. | A physical vapor deposition plasma reactor with rf source power applied to the target |
| FR2900070B1 (fr) * | 2006-04-19 | 2008-07-11 | Kemstream Soc Par Actions Simp | Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif. |
| US20110308453A1 (en) * | 2008-01-31 | 2011-12-22 | Applied Materials, Inc. | Closed loop mocvd deposition control |
-
2013
- 2013-12-06 KR KR1020167018037A patent/KR102137181B1/ko active Active
- 2013-12-06 US US15/039,328 patent/US20170022598A1/en not_active Abandoned
- 2013-12-06 CN CN201380081379.7A patent/CN105874095A/zh active Pending
- 2013-12-06 JP JP2016536676A patent/JP6647202B2/ja active Active
- 2013-12-06 EP EP13814860.6A patent/EP3077567B1/en active Active
- 2013-12-06 CN CN202010001262.5A patent/CN111441015A/zh active Pending
- 2013-12-06 WO PCT/EP2013/075850 patent/WO2015082022A1/en not_active Ceased
-
2014
- 2014-12-02 TW TW103141823A patent/TWI652363B/zh not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013143692A1 (en) | 2012-03-30 | 2013-10-03 | Tata Steel Nederland Technology B.V. | Method and apparatus for feeding liquid metal to an evaporator device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2016540892A (ja) | 2016-12-28 |
| KR20160095091A (ko) | 2016-08-10 |
| CN111441015A (zh) | 2020-07-24 |
| JP6647202B2 (ja) | 2020-02-14 |
| WO2015082022A1 (en) | 2015-06-11 |
| EP3077567A1 (en) | 2016-10-12 |
| CN105874095A (zh) | 2016-08-17 |
| KR102137181B1 (ko) | 2020-08-13 |
| TW201522681A (zh) | 2015-06-16 |
| EP3077567B1 (en) | 2021-02-24 |
| US20170022598A1 (en) | 2017-01-26 |
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