AU9507298A - Liquid reagent delivery system - Google Patents

Liquid reagent delivery system

Info

Publication number
AU9507298A
AU9507298A AU95072/98A AU9507298A AU9507298A AU 9507298 A AU9507298 A AU 9507298A AU 95072/98 A AU95072/98 A AU 95072/98A AU 9507298 A AU9507298 A AU 9507298A AU 9507298 A AU9507298 A AU 9507298A
Authority
AU
Australia
Prior art keywords
delivery system
liquid reagent
reagent delivery
liquid
reagent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU95072/98A
Inventor
Dennis F. Brestovansky
Peter S. Kirlin
Edward A. Sturm
Peter C. Van Buskirk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Technology Materials Inc
Original Assignee
Advanced Technology Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Technology Materials Inc filed Critical Advanced Technology Materials Inc
Publication of AU9507298A publication Critical patent/AU9507298A/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/408—Oxides of copper or solid solutions thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
AU95072/98A 1997-09-26 1998-09-25 Liquid reagent delivery system Abandoned AU9507298A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US93798297A 1997-09-26 1997-09-26
US08937982 1997-09-26
PCT/US1998/020020 WO1999016929A1 (en) 1997-09-26 1998-09-25 Liquid reagent delivery system

Publications (1)

Publication Number Publication Date
AU9507298A true AU9507298A (en) 1999-04-23

Family

ID=25470669

Family Applications (1)

Application Number Title Priority Date Filing Date
AU95072/98A Abandoned AU9507298A (en) 1997-09-26 1998-09-25 Liquid reagent delivery system

Country Status (2)

Country Link
AU (1) AU9507298A (en)
WO (1) WO1999016929A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020152955A1 (en) * 1999-12-30 2002-10-24 Yezdi Dordi Apparatus and method for depositing an electroless solution
DE10137673A1 (en) * 2001-08-01 2003-02-27 Infineon Technologies Ag Device for supplying gas mixtures to a CVD reactor
US8708320B2 (en) 2006-12-15 2014-04-29 Air Products And Chemicals, Inc. Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel
JP6647202B2 (en) * 2013-12-06 2020-02-14 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ Deposition arrangement, deposition device, and method of operation thereof
US11459654B2 (en) 2020-11-19 2022-10-04 Eugenus, Inc. Liquid precursor injection for thin film deposition

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3536451A (en) * 1965-01-21 1970-10-27 Isadore Ludwin System for cyclic pulsed pumping and fluid interaction
US3503412A (en) * 1968-02-26 1970-03-31 William H Schuler Two tank bulk fluid system
US4141312A (en) * 1977-05-16 1979-02-27 Fisher Scientific Company Apparatus for histological tissue processing
US4407431A (en) * 1981-03-04 1983-10-04 Hutter Iii Charles G System for dispensing curable compositions
US5203925A (en) * 1991-06-20 1993-04-20 Matsushita Electric Industrial Co., Ltd. Apparatus for producing a thin film of tantalum oxide
JPH06291040A (en) * 1992-03-03 1994-10-18 Rintetsuku:Kk Method and apparatus for vaporizing and supplying liquid
US5709745A (en) * 1993-01-25 1998-01-20 Ohio Aerospace Institute Compound semi-conductors and controlled doping thereof
US5616208A (en) * 1993-09-17 1997-04-01 Tokyo Electron Limited Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus
JP3122311B2 (en) * 1994-06-29 2001-01-09 東京エレクトロン株式会社 Apparatus for supplying liquid material to film forming chamber and method of using the same

Also Published As

Publication number Publication date
WO1999016929A1 (en) 1999-04-08

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase