TWI648296B - 氟聚合物及包含氟聚合物(i)的膜 - Google Patents
氟聚合物及包含氟聚合物(i)的膜 Download PDFInfo
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- TWI648296B TWI648296B TW106126556A TW106126556A TWI648296B TW I648296 B TWI648296 B TW I648296B TW 106126556 A TW106126556 A TW 106126556A TW 106126556 A TW106126556 A TW 106126556A TW I648296 B TWI648296 B TW I648296B
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- copolymer
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- porous membrane
- carbon atoms
- porous
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- 229920002313 fluoropolymer Polymers 0.000 title description 9
- 239000004811 fluoropolymer Substances 0.000 title description 9
- 239000012528 membrane Substances 0.000 claims abstract description 100
- 229920001577 copolymer Polymers 0.000 claims abstract description 57
- 239000012530 fluid Substances 0.000 claims abstract description 39
- -1 vinylphenyl group Chemical group 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 32
- 239000000178 monomer Substances 0.000 claims abstract description 27
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical group OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 claims abstract description 16
- PQHYOGIRXOKOEJ-UHFFFAOYSA-N 2-(1,2-dicarboxyethylamino)butanedioic acid Chemical group OC(=O)CC(C(O)=O)NC(C(O)=O)CC(O)=O PQHYOGIRXOKOEJ-UHFFFAOYSA-N 0.000 claims abstract description 13
- 125000001424 substituent group Chemical group 0.000 claims abstract description 9
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical group OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052796 boron Inorganic materials 0.000 claims abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 5
- 229910052717 sulfur Inorganic materials 0.000 claims abstract description 5
- 238000001914 filtration Methods 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 20
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- 238000000576 coating method Methods 0.000 claims description 17
- 229920000642 polymer Polymers 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 13
- 125000005843 halogen group Chemical group 0.000 claims description 12
- 125000003545 alkoxy group Chemical group 0.000 claims description 11
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims description 8
- 230000002378 acidificating effect Effects 0.000 claims description 7
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 7
- 125000004414 alkyl thio group Chemical group 0.000 claims description 7
- 150000001450 anions Chemical class 0.000 claims description 7
- 150000001768 cations Chemical class 0.000 claims description 7
- 125000002485 formyl group Chemical class [H]C(*)=O 0.000 claims description 7
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- 239000004812 Fluorinated ethylene propylene Substances 0.000 claims description 6
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- 239000000463 material Substances 0.000 claims description 6
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- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 5
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- GQQLLWNLHAMWAL-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-[(carbamoylamino)-carboxymethyl]amino]-2-cyano-2-nitroacetic acid Chemical compound N(C(=O)N)C(C(=O)O)N(CCN(CC(=O)O)CC(=O)O)C(C(=O)O)([N+](=O)[O-])C#N GQQLLWNLHAMWAL-UHFFFAOYSA-N 0.000 claims description 4
- 239000002033 PVDF binder Substances 0.000 claims description 4
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- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 4
- 239000000843 powder Substances 0.000 claims description 4
- 238000005266 casting Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 claims description 3
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- 238000005406 washing Methods 0.000 claims description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 2
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- JVFMQYOKBXVCQT-UHFFFAOYSA-N C(#N)C(C(=O)O)(N(CCN(CC(=O)O)CC(=O)O)CC(=O)O)[N+](=O)[O-].NC(=O)N Chemical compound C(#N)C(C(=O)O)(N(CCN(CC(=O)O)CC(=O)O)CC(=O)O)[N+](=O)[O-].NC(=O)N JVFMQYOKBXVCQT-UHFFFAOYSA-N 0.000 claims 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 claims 1
- 125000004093 cyano group Chemical group *C#N 0.000 claims 1
- 229960001484 edetic acid Drugs 0.000 claims 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical group FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 claims 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims 1
- 238000004377 microelectronic Methods 0.000 abstract description 9
- 229910021645 metal ion Inorganic materials 0.000 abstract description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 90
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- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 21
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- 239000000243 solution Substances 0.000 description 20
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- 125000000524 functional group Chemical group 0.000 description 18
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- 125000000217 alkyl group Chemical group 0.000 description 8
- 239000002245 particle Substances 0.000 description 8
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 6
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- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 6
- 238000002360 preparation method Methods 0.000 description 5
- 238000001878 scanning electron micrograph Methods 0.000 description 5
- FIKKDQZDISQACH-UHFFFAOYSA-N 1-ethenyl-3-(1,1,1,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctan-2-yloxymethyl)benzene Chemical compound FC(C(F)(F)F)(OCC=1C=C(C=C)C=CC1)C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F FIKKDQZDISQACH-UHFFFAOYSA-N 0.000 description 4
- 125000000129 anionic group Chemical group 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
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- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
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Abstract
本發明揭示一種共聚物、由該共聚物製備之多孔膜及一種使用該等多孔膜將金屬離子例如自微電子行業中產生之流體移除來處理流體的方法,其中該共聚物包括聚合單體單元I及聚合單體單元II,其中單體單元I具有式A-X-CH2-B,其中A為Rf-(CH2)n,Rf為式CF3-(CF2)x-之全氟烷基,其中x為3-12,n為1-6,X為O或S,且B為乙烯基苯基,單體單元II為鹵烷基苯乙烯,且視情況,其中鹵烷基之鹵基經視情況選用之取代基,例如乙二胺四乙酸、亞胺基二乙酸或亞胺基二琥珀酸置換。
Description
本發明係關於氟聚合物及包含氟聚合物(I)的膜。
正考慮將包含氟聚合物之膜用於過濾多種流體,例如用於自微電子流體移除痕量金屬雜質。一些此等膜之特徵為低表面能值或臨界潤濕表面張力(CWST)值及/或對有機溶劑及侵蝕性化學物質之抵抗性高。儘管此等膜存在一或多種優勢,但仍需要具有諸如低CWST值及/或對有機溶劑及/或侵蝕性化學物質之抵抗性提高之改良特性的氟聚合物及包含此類氟聚合物之膜。
本發明提供具有低CWST值之氟聚合物及由該等氟聚合物製備之膜。在一具體實例中,本發明提供包含聚合單體單元I及聚合單體單元II之共聚物,其中單體單元I具有下式:A-X-CH2-B,其中A為Rf-(CH2)n,Rf為式CF3-(CF2)x-之全氟烷基,x為3-12,n為1-6,X為O或S,且B為乙烯基苯基,且單體單元II為鹵烷基苯乙烯,且視情況
其中鹵烷基苯乙烯之鹵基經選自由以下組成之群之取代基置換:烷氧基、烷基羰基、羥烷基、酸性基團、鹼性基團、陽離子、陰離子、兩性離子、羥基、醯氧基、烷硫基、醛基、醯胺基、胺甲醯基、脲基、氰基、硝基、乙二胺四乙酸、亞胺基二乙酸及亞胺基二琥珀酸。
共聚物為超疏水聚合物且可用於賦予材料表面疏油特性,亦即低於25達因/公分之表面張力。本發明亦提供一種製備多孔膜之方法,該多孔膜包含安置於多孔載體上之共聚物。本發明進一步提供一種將流體、尤其微電子流體過濾至低於1ppb,較佳低於0.005ppb或低於大多數儀器之偵測極限之濃度的方法。
圖1說明根據本發明之一具體實例製備多孔膜之方法,其中諸如NaHCO3之顆粒用於產生孔。
圖2A描繪根據本發明之一具體實例製備之平板膜的橫截面之SEM顯微圖。圖2B描繪平板膜之一個側面之SEM顯微圖。圖2C描繪平板膜之另一側面之SEM顯微圖。
圖3描繪根據本發明之另一具體實例製備之多孔膜的橫截面之SEM顯微圖。
圖4說明根據一具體實例改質多孔膜以在表面上包括官能基之方法。
圖5描繪根據本發明之一具體實例製備之膜的金屬移除效率。
根據一具體實例,本發明提供一種包含聚合單體單元I及聚合單體單元II之共聚物,其中單體單元I具有下式:A-X-CH2-B,其中A為Rf-(CH2)n,Rf為式CF3-(CF2)x-之全氟烷基,x為3-12,n為1-6,X為O或S,且B為乙烯基苯基,且單體單元II為鹵烷基苯乙烯,且視情況
其中鹵烷基苯乙烯之鹵基經選自由以下組成之群之取代基置換:烷氧基、烷基羰基、羥烷基、酸性基團、鹼性基團、陽離子、陰離子、兩性離子、羥基、醯氧基、烷硫基、醛基、醯胺基、胺甲醯基、脲基、氰基、硝基、乙二胺四乙酸、亞胺基二乙酸及亞胺基二琥珀酸。
在共聚物之一具體實例中,n=2、3或4,尤其為2。
在以上具體實例中之任一者中,x=4、5、6、7或8,尤其為6。
在以上具體實例中之任一者中,單體單元II為氯烷基苯乙烯,尤其為氯甲基苯乙烯。鹵烷基或氯烷基可在苯乙烯上間位或對位取代,或單體II可為間位及對位取代之鹵烷基苯乙烯之混合物。
全氟烷基可在任何合適位置-鄰位、間位或對位,較佳間位或對位位置存在於B之苯環上,或可使用鄰位異構體、間位異構體及/或對位異構體之混合物。在本文中,「p/m」表明對位及間位異構體之混合物。
在以上具體實例中之任一者中,共聚物為嵌段共聚物,例如二嵌段、三嵌段或多嵌段共聚物,或無規共聚物。
「烷基」可為直鏈或分支鏈。根據一具體實例,烷基較佳為 C1-C22烷基。烷基之實例包括甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、異戊基、正己基、十六基及類似基團。此定義亦適用於「烷基」出現之任何地方,諸如羥烷基、單鹵烷基、二鹵烷基及三鹵烷基。C1-C22烷基亦可進一步經環烷基,例如C3-C11環烷基取代。
根據一具體實例,「烷氧基」較佳為C1-C22烷氧基。烷氧基之實例包括甲氧基、乙氧基、正丙氧基、異丙氧基、正丁氧基、第二丁氧基、異丁氧基、第三丁氧基、正戊氧基、異戊氧基、正己氧基、十六烷氧基及類似基團。
術語「鹵基」係指選自由以下組成之群之鹵素:氟、氯、溴及碘,較佳為氯。
不論何時指示結構中之原子數目範圍(例如C1-22、C1-12、C1-8、C1-6或C1-4烷基、烷氧基等),均特別涵蓋亦可使用屬於指示範圍內之任何子範圍或個別碳原子數目。因此,舉例而言,如關於本文中所提及之任何化學基團(例如烷基、烷氧基等)所使用之1-22個碳原子(例如C1-C22)、1-20個碳原子(例如C1-C20)、1-18個碳原子(例如C1-C20)、1-16個碳原子(例如C1-C16)、1-14個碳原子(例如C1-C14)、1-12個碳原子(例如C1-C12)、1-10個碳原子(例如C1-C10)、1-8個碳原子(例如C1-C8)、1-6個碳原子(例如C1-C6)、1-4個碳原子(例如C1-C4)、1-3個碳原子(例如C1-C3)或2-8個碳原子(例如C2-C8)的敍述涵蓋且特別描述適當時1個、2個、3個、4個、5個、6個、7個、8個、9個、10個、11個、12個、13個、14個、15個、16個、17個、18個、19個、20個、21個或22個碳原子,以及其任何子範圍,例如1-2個碳原子、1-3個碳原子、1-4個碳原子、1-5個碳原子、1-6 個碳原子、1-7個碳原子、1-8個碳原子、1-9個碳原子、1-10個碳原子、1-11個碳原子、1-12個碳原子、1-13個碳原子、1-14個碳原子、1-15個碳原子、1-16個碳原子、1-17個碳原子、1-18個碳原子、1-19個碳原子、1-20個碳原子、1-21個碳原子及1-22個碳原子,以及適當時其間任何範圍,諸如2-3個碳原子、2-4個碳原子、2-5個碳原子、2-6個碳原子、2-7個碳原子、2-8個碳原子、2-9個碳原子、2-10個碳原子、2-11個碳原子、2-12個碳原子、2-12個碳原子、2-13個碳原子、2-14個碳原子、2-15個碳原子、2-16個碳原子、2-17個碳原子、2-18個碳原子、2-19個碳原子、2-20個碳原子、2-21個碳原子及2-22個碳原子、3-4個碳原子、3-5個碳原子、3-6個碳原子、3-7個碳原子、3-8個碳原子、3-9個碳原子、3-10個碳原子、3-11個碳原子、3-12個碳原子、3至13個碳原子、3-14個碳原子、3-15個碳原子、3-16個碳原子、3-17個碳原子、3-18個碳原子、3-19個碳原子、3-20個碳原子、3-21個碳原子及3-22個碳原子,及4-5個碳原子、4-6個碳原子、4-7個碳原子、4-8個碳原子、4-9個碳原子、4-10個碳原子、4-11個碳原子、4-12個碳原子、4-13個碳原子、4-14個碳原子、4-15個碳原子、4-16個碳原子、4-17個碳原子、4-18個碳原子、4-19個碳原子、4-20個碳原子、4-21個碳原子、4-22個碳原子等。
在一具體實例中,共聚物係選自由以下組成之群:對位及/或間位取代之[[(全氟己基伸乙基)氧基]甲基]-苯乙烯與鹵烷基苯乙烯單體之共聚物;對位及/或間位取代之[[(全氟己基伸乙基)硫基]甲基]-苯乙烯與鹵烷基苯乙烯單體之共聚物;聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯與聚[氯甲基苯乙烯]之共聚物;聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯 與聚[氯甲基苯乙烯]之共聚物及聚[氯甲基苯乙烯]。
根據本發明之一具體實例,片段A包含選自由以下組成之群之單體:2-(全氟己基)乙醇、2-(全氟辛基)乙基硫醇、2-(全氟辛基)乙醇、2-(全氟己基)乙基硫醇、對位及/或間位取代之[[(全氟己基伸乙基)氧基]甲基]-苯乙烯以及對位及/或間位取代之[[(全氟己基伸乙基)硫基]甲基]-苯乙烯。不希望受任何特定理論或機制束縛,全氟烴提供疏油特性及提高的與基板之黏著性。
在一具體實例中,片段B包含苯乙烯及鹵基,其中鹵基為氯。在另一具體實例中,片段B包含選自由4-乙烯基苄基氯、3-乙烯基苄基氯、3,4-乙烯基苄基氯組成之群之單體。苯乙烯基團中之雙鍵使得與其他聚合物之聚合更容易且由於鹵基可經其他官能基取代,所以苯乙烯可輕易經多種官能基中之一或多者,包括帶正電及/或帶負電基團改質。
共聚物可藉由任何合適技術來製備。舉例而言,嵌段共聚物可如流程1中所說明製備,且無規共聚物可如流程2中所說明製備。
在一具體實例中,無規共聚物可藉由將1.4當量之4-對位或3,4-對-間-氯甲基苯乙烯與1當量之於甲苯中合適濃度之對或對,間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯,例如66重量%之對,間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯混合來合成。隨後添加3莫耳%之偶氮二異丁腈(AIBN)且混合物經脫氣20分鐘,之後,反應混合物在合適溫度,例如60℃下攪拌合適時間,例如14小時。反應混合物冷卻且用丙酮稀釋。所獲得之產物在甲醇中沈澱且混合2小時。將溶劑傾析且沈澱物再溶解於丙酮中。丙酮中之產物於新鮮甲醇中再沈澱且使用粗燒結漏斗過濾,用甲醇洗滌及在真空烘箱中乾燥隔夜。
在一具體實例中,無規共聚物之數目平均分子量為約1KDa至約500KDa,例如10KDa至約50KDa,且尤其約20KDa。在一具體實例中,數目平均分子量為398KDa。數目平均分子量藉由使用GPC確定。
嵌段共聚物可藉由任何合適方法合成,包括例如原子轉移自由基聚合(ATRP)、碘轉移聚合(ITP)、陰離子聚合及氮氧化物介導之自由基聚合(NMP)之其他形式。
嵌段共聚物之數目平均分子量為約1KDa至約9000KDa,尤其10KDa至約50KDa,且更尤其約20KDa。當嵌段共聚物之分子量將視聚合之持續時間而定時,對於進行86小時而言,嵌段之平均分子量為約8178KDa。
本發明進一步提供一種多孔膜,其包含安置於多孔載體,例如多孔聚合載體上之上述共聚物中之任一者。
在一具體實例中,多孔聚合載體係選自PVC/PAN、聚碸、聚醚碸、HDPE、PET、PPS、PPSU(聚苯碸)、PTFE、PVDF、PVF(聚氟乙烯)、PCTFE(聚氯三氟乙烯)、FEP(氟化乙烯-丙烯)、ETFE(聚乙烯四氟乙烯)、ECTFE(聚乙烯氯三氟乙烯)、PFPE(全氟聚醚)、PFSA(全氟磺酸)及全氟聚氧代環丁烷。
本發明進一步提供一種製備包含如上文所述之共聚物之多孔膜的方法,在一具體實例中,該方法包含:(i)使共聚物溶解於溶劑中以獲得包含該共聚物之溶液;(ii)澆鑄來自(i)之溶液以獲得塗層;(iii)使溶劑自塗層蒸發;視情況(iv)洗滌塗層以獲得多孔膜;及(v)視情況用選自由以下組成之群之取代基置換鹵烷基之鹵基中的一或多者:烷氧基、烷基羰基、羥烷基、酸性基團、鹼性基團、陽離子、陰離子、兩性離子、羥基、醯氧基、烷硫基、醛基、醯胺基、胺甲醯基、脲基、氰基、硝基、乙二胺四乙酸、亞胺基二乙酸及亞胺基二琥珀酸。
當鹵基視情況經取代基置換時,如上所指出,所得共聚物具 有較高表面張力值,例如達至約45達因/公分,尤其約40達因/公分至約45達因/公分。
視情況選用之置換可藉由任何合適方法進行。舉例而言,在步驟(iv)結束時所獲得之多孔膜可在改質劑,例如亞胺基二琥珀酸(IDSA)於水、NaOH及DMF之混合物中之溶液中浸沒合適時段。溶液可加熱至80℃。膜隨後用水及異丙醇(IPA)洗滌且乾燥。膜隨後在HCl中浸沒,用IPA沖洗且乾燥。
在一具體實例中,IDSA(15g)溶解於水(18g)、8M NaOH(10g)及DMF(45g)之混合物中。混合物傾倒於在皮氏培養皿(petri dish)中用DMF預潤濕之膜上。膜加熱至80℃,隔夜,先後用大量水及IPA沖洗。然後,膜在80℃下乾燥1小時。膜在3%HCl中浸沒兩小時,用水及IPA沖洗1小時,且再次在80℃下乾燥45分鐘。膜之表面張力在40-45達因/公分範圍內。
在另一具體實例中,亞胺基二乙酸(IDA)(60g)溶解於水(120g)、8M NaOH(140g)及DMF(160g)之混合物中。混合物隨後傾倒於在皮氏培養皿中用DMF預潤濕之膜上。膜加熱至80℃,隔夜,先後用大量水及IPA沖洗。然後,膜在80℃下乾燥1小時。膜在3%HCl中浸沒兩小時,且用水及IPA沖洗,隨後再次在80℃下乾燥45分鐘。所得膜之表面張力在45-48達因/公分範圍內。
在又一具體實例中,將含33%三乙胺(TEA)之水(50mL)與IPA(50mL)混合,且具有23達因/公分之CWST的塗佈聚(pfotms-ran-cms)之0.2μm PTFE在室溫下浸沒於溶液中隔夜。然後,膜用大量水沖洗且隨後 浸沒於IPA中隔夜。膜在80℃下乾燥30分鐘,且量測表面張力。CWST為38達因/公分。
在另一具體實例中,本發明提供一種製備包含如上文所述之共聚物之多孔膜的方法,該方法包含:(i)使共聚物及第二聚合物溶解於溶劑中以獲得包含該共聚物及該第二聚合物之溶液;(ii)將來自(i)之溶液與造孔粉末混合以獲得混合物;(iii)澆鑄來自(i)之混合物以獲得塗層;(iv)使溶劑自塗層蒸發;(v)洗滌該塗層以移除造孔粉末;及(vi)乾燥所得膜;以及(v)視情況用選自由以下組成之群之取代基置換鹵烷基之鹵基中的一或多者:烷氧基、烷基羰基、羥烷基、酸性基團、鹼性基團、陽離子、陰離子、兩性離子、羥基、醯氧基、烷硫基、醛基、醯胺基、胺甲醯基、脲基、氰基、硝基、乙二胺四乙酸、亞胺基二乙酸及亞胺基二琥珀酸。
多孔膜可為疏油性的,尤其為具有約23達因/公分或更少,例如22達因/公分或21達因/公分之CWST之疏油膜。多孔膜可為例如按功能製備之膜,其包含共聚物薄膜或纖維而不含多孔載體;或其可為塗佈有共聚物之多孔載體。
CWST可藉由合適方法量測。在一具體實例中,方法依賴於一組某種組成之溶液。各溶液具有特定表面張力。溶液表面張力以較小非相等增量處於15達因/公分至92達因/公分之範圍內。為量測膜表面張力, 將其位於白光台之頂部上,將一滴某一表面張力之溶液塗覆於多孔膜表面,且記錄液滴滲透多孔膜且變為亮白色(表明光穿過多孔膜)所花費之時間。當液滴滲透多孔膜所花費之時間10秒時,視為即刻潤濕。若時間>10秒,則溶液視為將多孔膜部分潤濕。
根據本發明之一具體實例,多孔膜為多孔膜,例如奈米多孔膜,例如孔直徑在1nm與100nm之間的多孔膜或孔直徑在1μm與10μm之間的微孔膜。
多孔膜亦可為在共聚物上包含一或多個額外官能基之官能化膜。多孔膜可為例如帶電膜。共聚物膜之官能化可產生達至約50達因/公分之CWST。官能基包括例如陽離子、陰離子或極性基團。
根據本發明之具體實例,多孔膜可具有多種組態,包括平面、平板、摺疊、管狀、螺旋形及中空纖維。在一個具體實例中,多孔膜為中空纖維膜。
根據本發明之具體實例之多孔膜典型地安置於包含至少一個入口及至少一個出口且界定入口與出口之間的至少一個流體流動路徑之殼體中,其中至少一個本發明膜或包括至少一個本發明膜之過濾器跨越流體流動路徑,以提供過濾裝置或過濾模組。在一具體實例中,提供一種過濾裝置,其包含:包含入口及第一出口且界定入口與第一出口之間的第一流體流動路徑的殼體;及至少一個本發明膜或包含至少一個本發明膜之過濾器,本發明膜或包含至少一個本發明膜之過濾器跨越第一流體流動路徑安置於殼體中。
較佳地,對於交叉流應用,至少一個本發明膜或包含至少一 個本發明膜之過濾器安置於包含至少一個入口及至少兩個出口且界定入口與第一出口之間的至少一個第一流體流動路徑及入口與第二出口之間的第二流體流動路徑之殼體中,其中本發明膜或包含至少一個本發明膜之過濾器跨越第一流體流動路徑以提供過濾裝置或過濾模組。在一說明性具體實例中,過濾裝置包含交叉流過濾模組、殼體,該殼體包含入口、包含濃縮物出口之第一出口及包含滲透物出口之第二出口且界定入口與第一出口之間的第一流體流動路徑及入口與第二出口之間的第二流體流動路徑,其中至少一個本發明膜或包含至少一個本發明膜之過濾器跨越第一流體流動路徑安置。
過濾裝置或模組可滅菌。可採用具有合適形狀且提供一入口及一或多個出口之任何殼體。
殼體可由任何合適剛性不可滲透之材料製造,包括任何不可滲透之熱塑性材料,其與處理中之流體相容。舉例而言,殼體可由以下製造:金屬,諸如不鏽鋼;或聚合物,例如透明或半透明聚合物,諸如丙烯酸樹脂、聚丙烯樹脂、聚苯乙烯樹脂或聚碳酸酯樹脂。
多孔膜可為按功能製備之膜(「FAM膜」),其可例如如圖1中所說明藉由以下來製備:將聚(pftoms-ran-cms)及第二聚合物(例如PVC-AN)摻合於THF中且以600rpm攪拌60分鐘,隨後將實現所需孔徑之可溶性顆粒,諸如NaHCO3顆粒加入溶液中且以1500rpm攪拌120分鐘。此混合物隨後澆鑄至玻璃板上之PET基板上。在室溫下緩慢蒸發THF之後,將膜浸沒於稀HCl溶液中隔夜以移除顆粒。視溶劑之沸點而定,所得膜於烘箱中在合適溫度,例如40℃至100℃,尤其80℃下或在室溫下乾燥 合適時間,例如60分鐘以移除溶劑。
合適第二聚合物包括PVC-AN、HDPE、PET、PPS、PPSU(聚苯碸)、PTFE、PVDF、PVF(聚氟乙烯)、PCTFE(聚氯三氟乙烯)、FEP(氟化乙烯-丙烯)、ETFE(聚乙烯四氟乙烯)、ECTFE(聚乙烯氯三氟乙烯)、PFPE(全氟聚醚)、PFSA(全氟磺酸)及全氟聚氧代環丁烷。
可用於以上方法之其他可溶性或可移除顆粒包括碳酸鉀、沸石、纖維素、可溶性纖維、矽石顆粒及奈米顆粒;例如氧化鋅。
多孔膜可以許多方式之一包含共聚物。舉例而言,多孔膜可包括包含共聚物之塗層。經塗佈之膜可例如藉由膜塗佈製得,其藉由將2%共聚物溶解於丙酮中進行且膜浸漬於聚合物溶液2秒。所得膜於烘箱中在合適溫度,例如80℃下乾燥約20分鐘,且多孔膜浸沒於IPA中約2小時,於烘箱中在80℃下乾燥30分鐘,且量測表面張力及重量增加。膜之實例之SEM顯微圖描繪於圖2中。
多孔膜可經改質以包括一或多個官能基。用於構建官能化膜之一般流程展示於圖4中。多孔膜可用帶電基團官能化。舉例而言,在一個具體實例中,多孔膜用陰離子基團官能化。陰離子膜之製備包括例如將EDTA(40g)溶解於水(100g)、8M NaOH(100g)及DMF(200g)之混合物中。混合物隨後傾倒於在皮氏培養皿中經DMF預潤濕之膜上。膜加熱至80℃,隔夜,先後用大量水及IPA沖洗。多孔膜在80℃下乾燥1小時且在3%HCl中浸沒兩小時,且用水及IPA沖洗,隨後再次在80℃下乾燥45分鐘。膜之表面張力在45-50達因/公分範圍內。在此方法中獲得之膜將99%之大多數痕量金屬自異丙醇移除。
氟化鏈必須以按聚合物之體積計,至少35%存在以便賦予多孔膜疏油性。
另外,為使聚合物可溶於非氟化溶劑,無規共聚物中之全氟-苯乙烯嵌段之體積比不可超過50%。
在另一具體實例中,多孔膜用陽離子基團官能化,製備如下:將含33%三乙胺之水(50mL)與IPA(50mL)混合,且在室溫下將多孔膜,例如PTFE浸沒於混合物中隔夜。然後,膜用水沖洗且浸沒於IPA中隔夜。膜在80℃下乾燥30分鐘,且量測表面張力。CWST為38達因/公分。
本發明包括以下具體實例,但不限於:1)包含片段A及片段A之無規共聚物,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;且片段B為氯甲基苯乙烯;2)包含片段A及片段B之嵌段共聚物,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;且片段B為氯甲基苯乙烯;3)可官能化無規共聚物及官能基,該無規共聚物包含片段A、片段A,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;片段B為氯甲基苯乙烯;且該官能基包含親水性、疏水性、帶正電或帶負電官能基;4)可官能化嵌段共聚物及官能基,該嵌段共聚物包含片段A、片段B,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;片段B為氯甲基苯乙烯;且該 官能基包含親水性、疏水性、帶正電或帶負電官能基;5)多孔膜,其包含親水性、疏水性或帶電膜及包含無規共聚物之塗層,該無規共聚物包含片段A及片段B,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;且片段B為氯甲基苯乙烯;其中當塗佈有該共聚物時,該多孔膜為具有23達因/公分或更少之表面張力之疏油膜;6)官能化膜,其包含親水性、疏水性或帶電膜及包含無規共聚物及官能基之塗層,該無規共聚物包含片段A、片段B及官能基,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;片段B為氯甲基苯乙烯;該官能基為帶電基團或親水性基團;其中當塗佈時,該多孔膜具有23達因/公分或更少之表面張力;7)多孔膜,其包含親水性、疏水性或帶電膜及包含嵌段共聚物之塗層,該嵌段共聚物包含片段A及片段B,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;且片段B為氯甲基苯乙烯;其中當塗佈有該共聚物時,該多孔膜為具有23達因/公分或更少之表面張力之疏油膜;8)帶電膜,其包含親水性、疏水性或帶電膜及包含無規共聚物及官能基之塗層,該無規共聚物包含片段A及片段B,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;片段B為氯甲基苯乙烯;該官能基包含乙二胺四乙酸、亞胺基二乙酸或亞胺基二琥珀酸;其中當塗佈有該共聚物時,該多孔膜具有達至50達因/公分或更少之表面張力,該表面張力可用於將痕量金屬離子 自微電子流體及水中移除;9)按功能上製備之疏油膜,其包含第一聚合物與包含片段A及片段B之無規共聚物之摻合物,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;片段B為氯甲基苯乙烯;其中該多孔膜具有23達因/公分或更少之表面張力;10)具有23達因或更少之表面張力之疏油性中空纖維膜,該多孔膜包含用於多孔膜之聚合物(諸如PES、PTFE、PVDF PVC/AN、PP、PE、HDPE、PET、PPS及PPSU)及包含片段A及片段B之無規或嵌段共聚物,其中片段A為聚[對/間-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯或聚[對/間-[[(全氟己基伸乙基)氧基]甲基]-苯乙烯;且片段B為氯甲基苯乙烯。
根據本發明之具體實例之多孔膜可用於多種應用中,包括例如診斷應用(包括例如樣品製備及/或診斷性側流裝置)、噴墨應用、微影術(例如替代基於HD/UHMW PE之介質)、過濾用於醫藥行業之流體、金屬移除、生產超純水、處理工業用水及表層水、過濾用於醫學應用之流體(包括用於家庭及/或患者使用,例如靜脈內應用,亦包括例如過濾生物流體,諸如血液(例如移除病毒))、過濾用於電子行業之流體(例如過濾微電子行業中之光阻流體及熱SPM)、過濾用於食品及飲料行業之流體、啤酒過濾、澄清、過濾含抗體及/或蛋白質之流體、過濾含核酸之流體、細胞偵測(包括原位)、細胞捕獲及/或過濾細胞培養物流體。可替代地或另外,根據本發明之具體實例之多孔膜可用於過濾空氣及/或氣體,及/或可用於排氣應用(例如允許空氣及/或氣體通過但不允許液體通過)。根據本發明之具體實例之多孔膜可用於多種裝置中,包括手術裝置及產品,諸如眼科手術產品。
本發明進一步提供一種過濾流體之方法,該方法包含使流體通過上述多孔膜中之任一者。舉例而言,痕量金屬雜質在下一代半導體及微電子材料製造中不斷引起問題。本發明之一個具體實例包含一種自流體,尤其微電子流體移除金屬之方法,其係藉由使含金屬流體通過包括共聚物之多孔膜且自流體移除金屬。在一個具體實例中,本發明方法包括使含金屬流體通過包括共聚物及官能基之官能化多孔膜且自流體移除金屬。官能化膜可將約99%之大多數痕量金屬自流體移除。
痕量金屬之實例包括Li、Na、K(及其他第1族金屬);Mg、Ca(及其他第2族金屬);Al(及其他第3族金屬)、Pb(及其他第4族金屬)、Sb、Bi(及其他第5族金屬)以及Cd、Cr、Mo、Pd、Ag、W、V、Mn、Fe、Ni、Cu、Zn(及其他過渡金屬)。
有利地,共聚物可賦予諸如多孔膜之材料以疏油特性,在材料上提供23達因或更少之表面張力而不需要後處理。包括共聚物之多孔膜在酸、鹼、有機溶劑、氧化劑中為穩定的且在高溫下及對γ照射穩定。可在多孔膜中實現高水突破壓力及空氣流動速率,且其可易於諸如用陽離子及陰離子基團官能化。
多孔膜可用於自許多應用,諸如微電子行業中之水及有機流體移除痕量金屬,例如使得濾液之濃度為0.005ppb或低於儀器之偵測極限。在一具體實例中,經處理之流體含有1ppb或更多痕量金屬,且濾液具有0.005ppb之痕量金屬濃度。
以下實施例進一步說明本發明,但當然不應解釋為以任何方式限制其範疇。
實施例1
此實施例說明根據本發明之一具體實例製備對-[[(全氟己基伸乙基)硫基]甲基]-苯乙烯與氯甲基苯乙烯之無規共聚物或聚(pfotms-ran-cms)。
在250mL經烘箱乾燥之圓底燒瓶中,將全氟己基乙基硫基甲基苯乙烯(60.3g,121.6mmol)、4-氯甲基苯乙烯(26g,171mmol,1.4當量)、甲苯(20mL)及AIBN(838mg,5mmol,3mol%)混合。反應混合物在0℃下經氮氣脫氣45分鐘,且在60℃下攪拌14小時,之後反應混合物冷卻且添加30mL丙酮。共聚物產物在甲醇(1L)中沈澱且混合2小時。將溶劑傾析且沈澱物再溶解於丙酮(200mL)中。丙酮中之產物再沈澱於新鮮甲醇(2L)中,過濾,用甲醇(500mL)洗滌,且在真空烘箱中乾燥隔夜。所得共聚物重58g。1H NMR譜確認共聚物之結構: 對-[[(全氟辛基伸乙基)硫基]甲基]-苯乙烯與氯甲基苯乙烯之無規共聚物(聚(pfdtms-ran-cms))亦使用相同步驟合成。
實施例2
此實施例說明根據本發明之一具體實例自聚(pfotms-ran-cms)製備膜。
將無規共聚物溶解於丙酮中且澆鑄在多孔載體上。因此,製得丙酮中之2%共聚物溶液且多孔載體PTFE或PES浸漬在共聚物溶液中2秒。所得經塗佈之載體於烘箱中在80℃下乾燥20分鐘,且浸沒於IPA中2小時,於烘箱中在80℃下乾燥30分鐘,且量測表面張力及重量增加。所獲得之重量增加及表面張力結果闡述於表1-表2中。
實施例3
此實施例說明根據本發明之一具體實例製備全氟己基乙基硫醇與氯甲基苯乙烯的嵌段共聚物,聚(pfotms-b-cms)。
聚(pfotms-嵌段-cms)藉由氯甲基苯乙烯與隨後在40h之後添加之全氟己基乙基硫基甲基苯乙烯的順序聚合來合成。氯甲基苯乙烯(14.5ml,6.5mL氯苯中之100mmol)、再結晶過氧化苯甲基(BPO)(0.242g,1mmol)與TEMPO(0.2g,1.3mmol)之溶液裝入圓底燒瓶中。在冰水浴中脫氣20分鐘之後,反應混合物在95℃下加熱3h以完全分解BPO,且在125 ℃下加熱40h以允許進行聚合。反應混合物冷卻至室溫,用3mL氯苯稀釋,且添加pfotms(31.18g,6mL氯苯中之62.9mmol)。混合物如前所述脫氣。反應在130℃下進行24h。在用氯仿(100mL)稀釋,自甲醇沈澱及乾燥之後獲得嵌段共聚物,自單體之產率為88%。NMR結果展示1/0.62之cms/pfotms比率。DSC結果表明嵌段共聚物具有兩個Tg(53℃及79℃)。嵌段共聚物之1H NMR譜確認共聚物之結構。表3展示一些特性,例如嵌段共聚物之Tg。
對-[[(全氟辛基伸乙基)硫基]甲基]-苯乙烯與氯甲基苯乙烯之嵌段共聚物聚(pfdtms-b-cms)亦使用相同步驟合成。
實施例4
此實施例說明根據本發明之一具體實例自共聚物製備多孔膜之方法。
如下摻合對-[[(全氟辛基伸乙基)硫基]甲基]-苯乙烯及氯甲基苯乙烯(聚(pfdtms-ran-cms))以及聚氯乙烯/丙烯腈(PVC-AN)。聚(pfdtms-ran-cms)與PVC-AN混合在THF中且以600rpm攪拌60分鐘。平均粒度為1.79μm之NaHCO3顆粒添加至溶液中且以1500rpm攪拌120分鐘。聚合物摻合物隨後澆鑄至塗佈有PEG 400之玻璃板上。可替代地,聚合物摻合物澆鑄至安放在玻璃板上之PET基板上。在室溫下緩慢蒸發THF之後,所得膜於稀HCl溶液中浸沒且蝕刻隔夜以移除顆粒且在80℃烘箱中乾 燥60分鐘。
所得膜藉由用EDTA、亞胺基二琥珀酸(IDSA)、三乙胺(TEA)或亞胺基二乙酸(IDA)處理進行電荷改質。表6闡述經IDA、EDTA及TEA改質之多孔膜之電荷密度值。
實施例5
此實施例說明使用實施例4之經EDTA或IDA改質之膜將痕量金屬離子自微電子流體,尤其水及異丙醇移除之方法。
根據本發明之一具體實例之多孔膜的金屬離子移除效率藉由將外加1ppb若干金屬之異丙醇過濾穿過經改質之膜來測試。在測試之前,所有測試設備均浸沒於3%HCl中24小時且在去離子水(DIW)中沖 洗。自三個不同平板介質樣品中切出三個47mm圓盤。各圓盤置放於殼體中以便對其刺激。各樣品用100mL IPA,隨後100mL 5%HCl及最後200mL DIW依序沖洗。20mL IPA沖洗穿過多孔膜且最後10mL作為空白介質收集。各樣品用外加1ppb金屬之IPA刺激。形成7mL/min之流出物流動速率。捨棄初始10mL流出物。將後面10mL流出物收集至PFA瓶中。收集流入及所有流出樣品用於ICP-MS分析。圖5展示濾液中之金屬濃度。本發明膜之金屬移除速率大於通用膜之金屬移除速率。
本文中所引用之所有參考文獻,包括公開案、專利申請案及專利均以引用之方式併入本文中,其引用程度就如同個別及特定地指示各參考文獻以引用之方式併入且全文闡述於本文中一般。
除非本文中另外指示或與上下文明顯矛盾,否則在描述本發明之上下文中(尤其在以下申請專利範圍之上下文中),應將術語「一(a/an)」及「該(the)」及「至少一個(at least one)」及類似涉及對象之使用解釋為涵蓋單數與複數兩者。除非本文另外指示或與上下文明顯矛盾,否則使用術語「至少一個」後接一或多個項目之清單(例如「A及B中之至少一者(at least one of A and B)」)應解釋為意謂選自所列舉項目之一個項目(A或B)或所列舉項目之兩個或超過兩個之任何組合(A及B)。除非另外指出,否則術語「包含(comprising)」、「具有(having)」、「包括(including)」及「含有(containing)」應解釋為開放式術語(亦即,意謂「包括但不限於(including,but not limited to,)」)。除非本文另外指示,否則本文中數值範圍之敍述僅意欲充當個別提及屬於該範圍內之各獨立值之速記方法,且各獨立值併入本說明書中,如同在本文中個別敍述一般。除非本文另外指示或另外與上下 文明顯矛盾,否則本文所述之所有方法可以任何合適順序進行。除非另外主張,否則使用本文所提供之任何及所有實例或例示性語言(例如「諸如」)僅意欲更好地闡明本發明而非對本發明之範疇造成限制。本說明書中之語言不應理解為指示實施本發明所必需之任何未主張要素。
本文描述本發明之較佳具體實例,其包括本發明人已知用於進行本發明之最佳模式。在閱讀前文描述之後,彼等較佳具體實例之變化對於一般技術者而言可變得顯而易見。本發明人期望熟習此項技術者適當時採用此類變化,且本發明人意欲以不同於本文中特定描述之其他方式來實施本發明。因此,在適用法律允許下,本發明包括隨附於本文之申請專利範圍中所敍述之主題的所有修改及同等物。此外,除非本文另外指示或另外與上下文明顯矛盾,否則本發明涵蓋上述要素呈其所有可能變化形式之任何組合。
Claims (12)
- 一種包含安置於多孔載體上之共聚物之多孔膜,其中該共聚物包含聚合單體單元I及聚合單體單元II之共聚物,其中:單體單元I具有式A-X-CH2-B,其中A為Rf-(CH2)n,Rf為式CF3-(CF2)x-之全氟烷基,其中x為3-12,n為1-6,X為O或S,且B為乙烯基苯基,單體單元II為鹵烷基苯乙烯,且視情況其中鹵烷基之該鹵基經選自由以下組成之群之取代基置換:烷氧基、烷基羰基、羥烷基、酸性基團、鹼性基團、陽離子、陰離子、兩性離子、羥基、醯氧基、烷硫基、醛基、醯胺基、胺甲醯基、脲基、氰基、硝基、乙二胺四乙酸、亞胺基二乙酸及亞胺基二琥珀酸。
- 如申請專利範圍第1項之多孔膜,其中n=2。
- 如申請專利範圍第1項或第2項之多孔膜,其中x=4-8。
- 如申請專利範圍第1項或第2項之多孔膜,其中單體單元II為氯烷基苯乙烯。
- 如申請專利範圍第1項或第2項之多孔膜,其中該鹵烷基為氯甲基。
- 如申請專利範圍第1項或第2項之多孔膜,該共聚物為嵌段共聚物。
- 如申請專利範圍第1項或第2項之多孔膜,該共聚物為無規共聚物(random copolymer)。
- 如申請專利範圍第1項或第2項之多孔膜,其中該多孔載體為多孔聚合載體。
- 如申請專利範圍第8項之多孔膜,其中該多孔聚合載體係選自PVC/PAN、聚碸、聚醚碸、HDPE、PET、PPS、PPSU(聚苯碸)、PTFE、PVDF、PVF(聚氟乙烯)、PCTFE(聚氯三氟乙烯)、FEP(氟化乙烯-丙烯)、ETFE(聚乙烯四氟乙烯)、ECTFE(聚乙烯氯三氟乙烯)、PFPE(全氟聚醚)、PFSA(全氟磺酸)及全氟聚氧代環丁烷。
- 一種製備如申請專利範圍第1項至第9項中任一項之多孔膜之方法,該方法包含:(i)使該共聚物溶解於溶劑中以獲得包含該共聚物之溶液;(ii)澆鑄來自(i)之該溶液以獲得塗層;(iii)使該溶劑自該塗層蒸發;視情況(iv)洗滌該塗層以獲得該多孔膜;及(v)視情況用選自由以下組成之群之取代基置換鹵烷基之該鹵基中的一或多者:烷氧基、烷基羰基、羥烷基、酸性基團、鹼性基團、陽離子、陰離子、兩性離子、羥基、醯氧基、烷硫基、醛基、醯胺基、胺甲醯基、脲基、氰基、硝基、乙二胺四乙酸、亞胺基二乙酸及亞胺基二琥珀酸。
- 一種製備包含共聚物之多孔膜之方法,其中該共聚物包含聚合單體單元I及聚合單體單元II,其中:單體單元I具有式A-X-CH2-B,其中A為Rf-(CH2)n,Rf為式CF3-(CF2)x-之全氟烷基,其中x為3-12,n為1-6,X為O或S,且B為乙烯基苯基,且單體單元II為鹵烷基苯乙烯;該方法包含:(i)使該共聚物及第二聚合物溶解於溶劑中以獲得包含該共聚物及該第二聚合物之溶液;(ii)將來自(i)之該溶液與造孔粉末混合以獲得混合物;(iii)澆鑄來自(ii)之該混合物以獲得塗層;(iv)使該溶劑自該塗層蒸發;(v)洗滌該塗層以移除該造孔粉末;及(vi)乾燥該所得膜;及(v)視情況用選自由以下組成之群之取代基置換鹵烷基之該鹵基中的一或多者:烷氧基、烷基羰基、羥烷基、酸性基團、鹼性基團、陽離子、陰離子、兩性離子、羥基、醯氧基、烷硫基、醛基、醯胺基、胺甲醯基、脲基、氰基、硝基、乙二胺四乙酸、亞胺基二乙酸及亞胺基二琥珀酸。
- 一種過濾流體之方法,該方法包含使該流體通過如申請專利範圍第1項至第9項中任一項之多孔膜。
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