TWI631430B - Optical device, projection optical system, exposure device, and article manufacturing method - Google Patents

Optical device, projection optical system, exposure device, and article manufacturing method Download PDF

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Publication number
TWI631430B
TWI631430B TW105141624A TW105141624A TWI631430B TW I631430 B TWI631430 B TW I631430B TW 105141624 A TW105141624 A TW 105141624A TW 105141624 A TW105141624 A TW 105141624A TW I631430 B TWI631430 B TW I631430B
Authority
TW
Taiwan
Prior art keywords
mirror
back surface
actuator
area
optical device
Prior art date
Application number
TW105141624A
Other languages
English (en)
Chinese (zh)
Other versions
TW201740208A (zh
Inventor
崔長植
Original Assignee
佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 佳能股份有限公司 filed Critical 佳能股份有限公司
Publication of TW201740208A publication Critical patent/TW201740208A/zh
Application granted granted Critical
Publication of TWI631430B publication Critical patent/TWI631430B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/20—Light-tight connections for movable optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
TW105141624A 2016-01-19 2016-12-15 Optical device, projection optical system, exposure device, and article manufacturing method TWI631430B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016008283A JP2017129685A (ja) 2016-01-19 2016-01-19 光学装置、投影光学系、露光装置およびデバイス製造方法
JP2016-008283 2016-01-19

Publications (2)

Publication Number Publication Date
TW201740208A TW201740208A (zh) 2017-11-16
TWI631430B true TWI631430B (zh) 2018-08-01

Family

ID=59340869

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105141624A TWI631430B (zh) 2016-01-19 2016-12-15 Optical device, projection optical system, exposure device, and article manufacturing method

Country Status (4)

Country Link
JP (1) JP2017129685A (ja)
KR (1) KR20170087027A (ja)
CN (1) CN106980177A (ja)
TW (1) TWI631430B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6598827B2 (ja) * 2017-08-01 2019-10-30 キヤノン株式会社 光学装置、これを用いた露光装置、および物品の製造方法
CN108983414B (zh) * 2018-08-30 2024-01-30 京东方科技集团股份有限公司 光学反射镜、光学反射镜系统及曝光机
CN109932804B (zh) * 2019-03-04 2021-06-01 杭州电子科技大学 一种小口径轻型反射镜的柔性记忆合金支撑装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4817702B1 (ja) * 1968-12-26 1973-05-31
JP4817702B2 (ja) 2005-04-14 2011-11-16 キヤノン株式会社 光学装置及びそれを備えた露光装置
JP2015070214A (ja) * 2013-09-30 2015-04-13 キヤノン株式会社 光学装置、投影光学系、露光装置および物品の製造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3409214B2 (ja) * 1993-06-04 2003-05-26 コニカ株式会社 ポリゴンミラースキャナ装置
JP2008040299A (ja) * 2006-08-09 2008-02-21 Funai Electric Co Ltd 形状可変ミラー及び形状可変ミラーの製造方法
JP2012078861A (ja) * 2011-12-21 2012-04-19 Kyocera Mita Corp 光走査装置
JP5524254B2 (ja) * 2012-02-14 2014-06-18 富士フイルム株式会社 ミラー駆動装置及びその制御方法
JP6336274B2 (ja) * 2013-12-25 2018-06-06 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4817702B1 (ja) * 1968-12-26 1973-05-31
JP4817702B2 (ja) 2005-04-14 2011-11-16 キヤノン株式会社 光学装置及びそれを備えた露光装置
JP2015070214A (ja) * 2013-09-30 2015-04-13 キヤノン株式会社 光学装置、投影光学系、露光装置および物品の製造方法

Also Published As

Publication number Publication date
TW201740208A (zh) 2017-11-16
CN106980177A (zh) 2017-07-25
KR20170087027A (ko) 2017-07-27
JP2017129685A (ja) 2017-07-27

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