TWI631430B - Optical device, projection optical system, exposure device, and article manufacturing method - Google Patents

Optical device, projection optical system, exposure device, and article manufacturing method Download PDF

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TWI631430B
TWI631430B TW105141624A TW105141624A TWI631430B TW I631430 B TWI631430 B TW I631430B TW 105141624 A TW105141624 A TW 105141624A TW 105141624 A TW105141624 A TW 105141624A TW I631430 B TWI631430 B TW I631430B
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Taiwan
Prior art keywords
mirror
back surface
actuator
area
optical device
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TW105141624A
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Chinese (zh)
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TW201740208A (en
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崔長植
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佳能股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/20Light-tight connections for movable optical elements
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70258Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825Mounting of individual elements, e.g. mounts, holders or supports

Abstract

本發明提供光學裝置、投影光學系統、曝光裝置以及物品製造方法。本發明減小了當鏡的形狀變形時鏡上產生的溫度分佈。光學裝置包括:鏡,具有反射面和與前述反射面的相反側的背面;底板;固定構材,固定於前述背面的一部分,以將前述鏡固定在前述底板上;以及多個致動器,分別向前述背面施加力以使前述反射面的形狀變化。其中,前述多個致動器包括:多個第一致動器,分別向前述背面中的第一區域施加力,前述第一區域包圍由前述固定構材固定的前述鏡的固定部;以及多個第二致動器,分別向前述背面中的包圍前述第一區域的第二區域施加力。前述第一致動器的推力生成的效率比前述第二致動器的推力生成的效率高。 The present invention provides an optical device, a projection optical system, an exposure device, and an article manufacturing method. The invention reduces the temperature distribution generated on the mirror when the shape of the mirror is deformed. The optical device includes a mirror having a reflecting surface and a back surface opposite to the reflecting surface; a base plate; a fixing member fixed to a part of the back surface to fix the mirror on the base plate; and a plurality of actuators, A force is applied to the rear surface to change the shape of the reflective surface. Wherein, the plurality of actuators include: a plurality of first actuators respectively applying a force to a first region in the back surface, the first region surrounding the fixing portion of the mirror fixed by the fixing structure; and Each of the second actuators applies a force to a second region surrounding the first region in the back surface. The efficiency of the thrust generation of the first actuator is higher than the efficiency of the thrust generation of the second actuator.

Description

光學裝置、投影光學系統、曝光裝置以及物品製造方法 Optical device, projection optical system, exposure device, and article manufacturing method

本發明涉及包含能夠變形的鏡(mirror)的光學裝置、投影光學系統、曝光裝置以及物品製造方法。 The present invention relates to an optical device including a deformable mirror, a projection optical system, an exposure device, and an article manufacturing method.

包含用於修正波面誤差和圖像失真的能夠變形的鏡的光學裝置特別地應用於半導體曝光裝置、液晶曝光裝置、或天體望遠鏡等。近年來,對曝光裝置中的解析度的要求越來越嚴格,因此對曝光像差的要求也變得嚴格。因此,為了修正曝光像差,提出了一種在曝光裝置中包含能夠變形的鏡的裝置構成。另外,在天文領域中,為了抑制空氣波動對設置在地上的望遠鏡的影響,也開始使用能夠變形的鏡。 An optical device including a deformable mirror for correcting wavefront errors and image distortion is particularly applied to a semiconductor exposure device, a liquid crystal exposure device, a astronomical telescope, or the like. In recent years, the requirements for the resolution in the exposure apparatus have become stricter, and therefore, the requirements for the exposure aberration have become stricter. Therefore, in order to correct exposure aberrations, a device configuration including a deformable mirror in an exposure device has been proposed. In addition, in the field of astronomy, in order to suppress the influence of air fluctuations on telescopes installed on the ground, deformable mirrors have also been used.

在日本專利第4817702號中,公開了一種配置有多個致動器(actuator)的光學裝置,該多個致動器保持能夠變形的鏡的中心部,並使鏡的中心部之外的區域的表面形狀變形。另外,在日本專利特開2015-70214號中,公開了一種混合搭載有高剛性的致動器和低剛性的致 動器以使鏡的固有頻率變高的光學裝置。 Japanese Patent No. 4777702 discloses an optical device provided with a plurality of actuators that hold a center portion of a deformable mirror and make an area outside the center portion of the mirror The surface shape is distorted. In addition, Japanese Patent Laid-Open No. 2015-70214 discloses a hybrid vehicle equipped with a high-rigidity actuator and a low-rigidity actuator. An optical device that raises the natural frequency of the mirror.

若在中心部保持能夠變形的鏡,則鏡的中心部附近區域的剛性與遠離中心部的周邊區域相比更高。因此,越靠近鏡表面的中心部的區域越難以變形,往往需要大的驅動力。本發明的發明人發現若為了改變鏡的表面形狀而使用例如具有相同推力常數的多個音圈馬達(voice coil motor,VCM)作為力致動器,則在鏡的中心部附近區域與周邊區域之間存在分佈較大的發熱量。由於鏡的中心部固定於基板上,因此中心部附近區域的VCM能夠輸出比周邊區域的VCM更大的力,從而發熱量變大。 When the deformable mirror is held at the center, the rigidity of the area near the center of the mirror is higher than that of the peripheral area far from the center. Therefore, the area closer to the center portion of the mirror surface is more difficult to deform, and a large driving force is often required. The inventors of the present invention have found that if a plurality of voice coil motors (VCMs) having the same thrust constant are used as force actuators in order to change the surface shape of a mirror, the area near the center of the mirror and the peripheral area There is a large amount of heat generated between them. Since the central part of the mirror is fixed on the substrate, the VCM in the vicinity of the central part can output a larger force than the VCM in the peripheral area, and the amount of heat generated becomes larger.

本發明的發明人獲取了在均等地設置了具有相同推力常數的多個VCM的情況下在鏡的中心部附近的中央區域與周邊區域的發熱量分佈。圖3示出了發熱量分佈的結果。如圖3所示,將鏡以同心圓狀二分為中央區域與周邊區域。若將中央區域與周邊區域的面積比分割為3%:97%,則面積為3%的中央區域中的發熱量占總發熱量的60%。在這種情況下,中央區域與周邊區域之間的單位面積的發熱量的比為49:1。若將中央區域與周邊區域的面積比分割為8%:92%,則面積為8%的中央區域中的發熱量占總發熱量的67%,中央區域與周邊區域之間的單位面積的發熱量的比為23:1。若將中央區域與周邊區域 的面積比分割為32%:68%,則面積為32%的中央區域中的發熱量占總發熱量的74%,中央區域與周邊區域之間的單位面積的發熱量的比為6:1。如上所述,鏡的中央區域中的發熱量占支配地位,其結果發現鏡的中心部附近的中央區域與周邊區域之間產生大的溫度分佈,並發生鏡的熱變形。 The inventors of the present invention obtained the heat generation distributions in the central region and the peripheral region near the center of the mirror when a plurality of VCMs having the same thrust constant are equally provided. Figure 3 shows the results of the calorific value distribution. As shown in FIG. 3, the mirror is divided into a central region and a peripheral region in a concentric circle shape. If the area ratio of the central area to the surrounding area is divided into 3%: 97%, the heat generation amount in the central area having an area of 3% accounts for 60% of the total heat generation amount. In this case, the ratio of the calorific value per unit area between the central area and the peripheral area is 49: 1. If the area ratio between the central area and the surrounding area is divided into 8%: 92%, the calorific value in the central area with an area of 8% accounts for 67% of the total calorific value, and the heat per unit area between the central area and the surrounding area is heat The ratio of the amounts is 23: 1. If the central area and the surrounding area The area ratio is divided into 32%: 68%, then the calorific value in the central area of 32% accounts for 74% of the total calorific value, and the ratio of the calorific value per unit area between the central area and the surrounding area is 6: 1 . As described above, the amount of heat generated in the central region of the mirror dominates. As a result, it is found that a large temperature distribution occurs between the central region near the central portion of the mirror and the peripheral region, and thermal deformation of the mirror occurs.

本發明提供一種對在鏡的形狀變形時在減小鏡上產生的溫度分佈的方面有利的光學裝置。 The present invention provides an optical device which is advantageous in terms of reducing a temperature distribution generated on a mirror when the shape of the mirror is deformed.

為了解決上述問題,本發明的光學裝置的特徵在於,包括:鏡,具有反射面和與前述反射面的相反側的背面;底板;固定構材,固定於前述背面的一部分,以將前述鏡固定在前述底板上;以及多個致動器,分別向前述背面施加力以使前述反射面的形狀變化,其中,前述多個致動器包括:多個第一致動器,分別向前述背面中的第一區域施加力,前述第一區域包圍由前述固定構材固定的前述鏡的固定部;以及多個第二致動器,分別向前述背面中的包圍前述第一區域的第二區域施加力,前述第一致動器的推力生成的效率比前述第二致動器的推力生成的效率高。 In order to solve the above problems, the optical device of the present invention is characterized by comprising: a mirror having a reflecting surface and a back surface opposite to the reflecting surface; a base plate; and a fixing member fixed to a part of the back surface to fix the mirror. On the bottom plate; and a plurality of actuators, each applying a force to the back surface to change the shape of the reflecting surface, wherein the plurality of actuators include: a plurality of first actuators, respectively, into the back surface A force is applied to a first area of the first area, the first area surrounds the fixing portion of the mirror fixed by the fixed structure, and a plurality of second actuators are applied to the second area of the back surface surrounding the first area, respectively The thrust generation efficiency of the first actuator is higher than the thrust generation efficiency of the second actuator.

根據本發明,能夠在鏡的形狀變形時減小鏡 上產生的溫度分佈。 According to the present invention, it is possible to reduce the size of the mirror when the shape of the mirror is deformed. The resulting temperature distribution.

1‧‧‧鏡 1‧‧‧mirror

1a‧‧‧表面 1a‧‧‧ surface

1b‧‧‧背面 1b‧‧‧ back

1b1‧‧‧第一區域 1b1‧‧‧ Zone 1

1b2‧‧‧第二區域 1b2‧‧‧Second Zone

2‧‧‧固定構材 2‧‧‧ fixed structure

3‧‧‧底板 3‧‧‧ floor

3b‧‧‧面 3b‧‧‧face

4‧‧‧第一致動器 4‧‧‧first actuator

4a‧‧‧第一磁體 4a‧‧‧first magnet

4b‧‧‧第一線圈 4b‧‧‧first coil

5‧‧‧第二致動器 5‧‧‧Second Actuator

5a‧‧‧第二磁體 5a‧‧‧Second magnet

5b‧‧‧第二線圈 5b‧‧‧Second coil

6‧‧‧控制部 6‧‧‧Control Department

6a‧‧‧運算部 6a‧‧‧ Computing Department

6b‧‧‧致動器驅動器 6b‧‧‧Actuator driver

50‧‧‧曝光裝置 50‧‧‧ exposure device

51‧‧‧控制部 51‧‧‧Control Department

52‧‧‧平面鏡 52‧‧‧ flat mirror

53‧‧‧凹面鏡 53‧‧‧Concave mirror

54‧‧‧凸面鏡 54‧‧‧ convex mirror

55‧‧‧遮罩 55‧‧‧Mask

56‧‧‧基板 56‧‧‧ substrate

52a‧‧‧第一面 52a‧‧‧First side

52b‧‧‧第二面 52b‧‧‧Second Side

53a‧‧‧第一面 53a‧‧‧First side

53b‧‧‧第二面 53b‧‧‧Second Side

IL‧‧‧照明光學系統 IL‧‧‧ Illumination Optical System

MS‧‧‧遮罩台 MS‧‧‧Mask

PO‧‧‧投影光學系統 PO‧‧‧ Projection Optical System

WS‧‧‧基板台 WS‧‧‧ Substrate

圖1係示出根據本發明的光學裝置的一例的圖。 FIG. 1 is a diagram showing an example of an optical device according to the present invention.

圖2係示出根據本發明的光學裝置的工作原理的圖。 FIG. 2 is a diagram showing an operation principle of an optical device according to the present invention.

圖3係說明本發明要解決的問題的圖。 FIG. 3 is a diagram illustrating a problem to be solved by the present invention.

圖4係示出根據本發明的曝光裝置的一例的圖。 FIG. 4 is a diagram showing an example of an exposure apparatus according to the present invention.

以下,參照附圖等說明本發明的實施形態。 Hereinafter, embodiments of the present invention will be described with reference to the drawings and the like.

[光學裝置] [Optical device]

圖1的(b)示出了根據本實施形態的光學裝置的一例,圖1的(a)示出了該光學裝置的鏡的背面。如圖1的(b)所示,能夠變形的鏡1的一部分(例如中心部)經由固定構材2固定於底板3。鏡1的表面1a係反射面。鏡1的與反射面的相反側的背面1b包括包圍由固定構材2固定的中心部(保持區域)的中央區域(第一區域)1b1和包圍中央區域1b1的周邊區域(第二區域)1b2。中央區域1b1可以係鏡1的背面1b整體之中發熱量占支配地位的面積占例如3%或更小的中央部分的區域。或者,基於發明要解決的問題一欄中所示的發熱量分佈的資料,中央區域1b1可以係面積占鏡1的背面1b整體的 8%或更小的中央部分的區域。 FIG. 1 (b) illustrates an example of an optical device according to the present embodiment, and FIG. 1 (a) illustrates a rear surface of a mirror of the optical device. As shown in FIG. 1 (b), a part (for example, a central portion) of the deformable mirror 1 is fixed to the bottom plate 3 via a fixing member 2. The surface 1a of the mirror 1 is a reflecting surface. The back surface 1b of the mirror 1 on the side opposite to the reflection surface includes a central region (first region) 1b 1 surrounding a central portion (holding region) fixed by the fixing member 2 and a peripheral region (second region) surrounding the central region 1b 1 ) 1b 2 . The central region 1b 1 may be a central region having an area in which the amount of heat generation dominates, for example, 3% or less in the entire back surface 1b of the mirror 1. Alternatively, based on the data of the calorific value distribution shown in the column of the problem to be solved by the invention, the central area 1b 1 may be a central area having an area of 8% or less of the entire back surface 1b of the mirror 1.

在鏡背面1b的中央區域1b1中,例如通過粘著設置有多個第一磁體4a,在周邊區域1b2中,例如通過粘著設置有多個第二磁體5a。與鏡背面1b對置的底板3的面3b包括與鏡背面1b的中央區域1b1和周邊區域1b2相對應的中央區域及周邊區域。在底板3的中央區域中,與多個第一磁體4a對置地配置有多個第一線圈4b,在底板3的周邊區域中,與多個第二磁體5a對置地配置有多個第二線圈5b。第一線圈4b和第二線圈5b分別固定於底板3的面3b。如圖1的(a)所示,多個第一磁體4a和多個第二磁體5a能夠在鏡背面1b上呈放射狀配置。在這種情況下,與多個第一磁體4a和多個第二磁體5a類似,多個第一線圈4b和多個第二線圈5b也在底板面3b上呈放射狀配置。然而,所述磁體和線圈不限於呈放射狀配置。也可以採用例如使單位面積上的致動器的數量相同等其他的配置方式。 In the central region 1b 1 of the mirror back surface 1b, a plurality of first magnets 4a are provided, for example, by adhesion, and in the peripheral region 1b 2 , a plurality of second magnets 5a are provided, for example, by adhesion. The surface 3b of the bottom plate 3 facing the mirror back surface 1b includes a central region and a peripheral region corresponding to the central region 1b 1 and the peripheral region 1b 2 of the mirror back surface 1b. A plurality of first coils 4b are arranged opposite to the plurality of first magnets 4a in the central region of the bottom plate 3, and a plurality of second coils are arranged opposite to the plurality of second magnets 5a in the peripheral region of the bottom plate 3. 5b. The first coil 4b and the second coil 5b are fixed to the surface 3b of the base plate 3, respectively. As shown in FIG. 1 (a), the plurality of first magnets 4 a and the plurality of second magnets 5 a can be arranged radially on the mirror back surface 1 b. In this case, similar to the plurality of first magnets 4a and the plurality of second magnets 5a, the plurality of first coils 4b and the plurality of second coils 5b are also arranged radially on the bottom plate surface 3b. However, the magnets and coils are not limited to being arranged radially. Other arrangements such as making the number of actuators per unit area the same may be used.

在鏡背面1b和底板面3b的中央區域中配置的第一磁體4a和第一線圈4b構成了第一致動器4。通過使電流流過第一線圈4b,在第一磁體4a與第一線圈4b之間產生與電流成正比的力,從而能夠使鏡1的中央區域的形狀變化。在鏡背面1b和底板面3b的周邊區域中配置的第二磁體5a和第二線圈5b構成了第二致動器5。通過使電流流過第二線圈5b,在第二磁體5a與第二線圈5b之間產生與電流成正比的力,從而能夠使鏡1的周邊區域 的形狀變化。 The first magnet 4a and the first coil 4b arranged in the central regions of the mirror back surface 1b and the bottom plate surface 3b constitute the first actuator 4. By causing a current to flow through the first coil 4b, a force proportional to the current is generated between the first magnet 4a and the first coil 4b, so that the shape of the central region of the mirror 1 can be changed. The second magnet 5 a and the second coil 5 b arranged in the peripheral areas of the mirror back surface 1 b and the bottom plate surface 3 b constitute a second actuator 5. By passing a current through the second coil 5b, a force proportional to the current is generated between the second magnet 5a and the second coil 5b, so that the peripheral area of the mirror 1 can be made. Shape change.

在本實施形態中,使用作為非接觸力致動器之一的利用洛侖茲力的低成本的音圈馬達(VCM)作為第一致動器4、第二致動器5。然而,也可以使用VCM之外的其他力致動器作為第一致動器4、第二致動器5。 In this embodiment, a low-cost voice coil motor (VCM) using Lorentz force as one of the non-contact force actuators is used as the first actuator 4 and the second actuator 5. However, other force actuators other than VCM may be used as the first actuator 4 and the second actuator 5.

設VCM的推力常數(推力生成的效率)為Kr,線圈的電阻值為R,流過線圈的電流為I,則產生的力F由式(1)表示。另外,產生力F時所產生的發熱量P由式(2)表示。 Assuming that the thrust constant (efficiency of thrust generation) of VCM is K r , the resistance value of the coil is R, and the current flowing through the coil is I, the generated force F is expressed by formula (1). The calorific value P generated when the force F is generated is expressed by the formula (2).

F=Kf×I‧‧‧(1) F = K f × I‧‧‧ (1)

P=I2R=(F/Kf)2×R‧‧‧(2) P = I 2 R = (F / K f ) 2 × R‧‧‧ (2)

根據式(1),推力常數Kf越大,則產生相同的力F所需的電流值I越小。根據式(2),發熱量與電流的平方成正比,與線圈的電阻成正比。式(2)意味著要減少產生同樣的力時的VCM的發熱量,最有效的係減小電流值,其次係減小線圈的電阻。由此,通過使用推力常數大的致動器,能夠減小必要的驅動電流,從而能夠有效地減少發熱量。當然,減小線圈的電阻也能夠減少致動器的發熱量。 According to formula (1), the larger the thrust constant K f is, the smaller the current value I required to generate the same force F is. According to formula (2), the amount of heat generation is proportional to the square of the current and proportional to the resistance of the coil. Equation (2) means that to reduce the amount of heat generated by the VCM when the same force is generated, the most effective is to reduce the current value, and the second is to reduce the resistance of the coil. Therefore, by using an actuator having a large thrust constant, the necessary driving current can be reduced, and the amount of heat generation can be effectively reduced. Of course, reducing the resistance of the coil can also reduce the amount of heat generated by the actuator.

因此,在本實施形態中,作為使鏡1的中央區域變形的各第一致動器4,使用與使鏡1的周邊區域變形的各第二致動器5相比推力常數更大的致動器。在本實施形態中,多個第一致動器4具有彼此相同的推力常數,多個第二致動器5具有比第一致動器4的推力常數小並且彼此相同的推力常數。然而,多個第一致動器4和多個第 二致動器5也可以被構成為其配置位置與鏡1的中心部之間的距離越小則推力常數越大。在本實施形態中,提出了減少鏡1的中央區域中的發熱量的構成,但是也可以並用使底板3冷卻的溫控方式。或者,也可以並用將底板3的中央區域集中地冷卻的方式。 Therefore, in the present embodiment, as the first actuators 4 that deform the central region of the mirror 1, a larger thrust constant than the second actuators 5 that deform the peripheral region of the mirror 1 is used. Actuator. In the present embodiment, the plurality of first actuators 4 have the same thrust constant as each other, and the plurality of second actuators 5 have the thrust constants smaller than the thrust constant of the first actuator 4 and are the same as each other. However, the plurality of first actuators 4 and the plurality of first actuators 4 The two actuators 5 may be configured such that the smaller the distance between the arrangement position and the center portion of the mirror 1, the larger the thrust constant. In the present embodiment, a configuration for reducing the amount of heat generated in the central region of the mirror 1 has been proposed. However, a temperature control method for cooling the bottom plate 3 may be used in combination. Alternatively, a method of collectively cooling the central region of the bottom plate 3 may be used in combination.

接下來,使用圖2來說明根據本實施形態的光學裝置的工作原理。如圖2所示,光學裝置包括控制多個第一致動器4和多個第二致動器5的控制部6。控制部6可以包括運算部6a和致動器驅動器6b。為了修正光學性能的誤差,將希望鏡1變形成的形狀作為目標形狀發送到控制部6的運算部6a。運算部6a計算出致動器驅動器6b應當輸出的驅動指令值,並發送到致動器驅動器6b。致動器驅動器6b將運算部6a計算出的驅動指令值分別發送到多個第一致動器4和第二致動器5。各致動器產生必要的力,使鏡1的表面形狀變形,從而修正光學性能的誤差。圖2示出的係一例,並不限於此。 Next, the operation principle of the optical device according to this embodiment will be described using FIG. 2. As shown in FIG. 2, the optical device includes a control unit 6 that controls a plurality of first actuators 4 and a plurality of second actuators 5. The control section 6 may include a calculation section 6 a and an actuator driver 6 b. In order to correct the error in the optical performance, the shape desired to be formed by the mirror 1 is sent to the arithmetic unit 6 a of the control unit 6 as a target shape. The computing unit 6a calculates a driving command value to be output by the actuator driver 6b, and sends the value to the actuator driver 6b. The actuator driver 6b sends the driving command values calculated by the computing unit 6a to the plurality of first actuators 4 and the second actuators 5, respectively. Each actuator generates a necessary force to deform the surface shape of the mirror 1, thereby correcting an error in optical performance. An example of the system shown in FIG. 2 is not limited to this.

[曝光裝置] [Exposure device]

關於根據本實施形態的曝光裝置,參照圖4來說明。本實施形態的曝光裝置50可以包括照明光學系統IL、投影光學系統PO、能夠保持遮罩(原型)並移動的遮罩台(mask stage)MS以及能夠保持基板56並移動的基板台WS。另外,曝光裝置50可以包括控制使基板56曝光的處理的控制部51。 The exposure apparatus according to this embodiment will be described with reference to FIG. 4. The exposure apparatus 50 of this embodiment may include an illumination optical system IL, a projection optical system PO, a mask stage MS capable of holding and moving a mask (prototype), and a substrate stage WS capable of holding and moving the substrate 56. The exposure device 50 may include a control unit 51 that controls a process of exposing the substrate 56.

從照明光學系統IL所包含的光源(未示出)射出的光通過照明光學系統IL所包含的狹縫(slit)(未示出)能夠在遮罩55上形成例如在Y方向上較長的圓弧狀曝光區域。遮罩55和基板56分別由遮罩台MS和基板台WS保持,經由投影光學系統PO配置在光學上基本共軛的位置(投影光學系統PO的物面和像面的位置)上。投影光學系統PO具有規定的投影倍率(例如1/2倍),將形成於遮罩55的圖案投影到基板56上。此外,在與投影光學系統PO的物面平行的方向(例如X方向)上,以與投影光學系統PO的投影倍率相對應的速度比掃描遮罩台MS和基板台WS。由此,能夠將形成於遮罩55的圖案轉印到基板56上。 Light emitted from a light source (not shown) included in the illumination optical system IL can be formed on the mask 55 through a slit (not shown) included in the illumination optical system IL, for example, which is longer in the Y direction. Arc-shaped exposure area. The mask 55 and the substrate 56 are held by a mask stage MS and a substrate stage WS, respectively, and are arranged at positions that are substantially conjugated optically (positions of the object plane and image plane of the projection optical system PO) via the projection optical system PO. The projection optical system PO has a predetermined projection magnification (for example, 1/2 times), and projects a pattern formed on the mask 55 onto the substrate 56. In addition, the mask stage MS and the substrate stage WS are scanned at a speed ratio corresponding to the projection magnification of the projection optical system PO in a direction (for example, the X direction) parallel to the object plane of the projection optical system PO. Accordingly, the pattern formed on the mask 55 can be transferred to the substrate 56.

如圖4所示,投影光學系統PO例如可以被構成為包括平面鏡52、凹面鏡53以及凸面鏡54。從照明光學系統IL射出並透過遮罩55的曝光光被平面鏡52的第一面52a折射光路,並入射到凹面鏡53的第一面53a。在凹面鏡53的第一面53a上反射的曝光光在凸面鏡54處反射,並入射到凹面鏡53的第二面53b。在凹面鏡53的第二面53b上反射的曝光光被平面鏡52的第二面52b折射光路,並在基板上成像。在這種構造的投影光學系統PO中,凸面鏡54的表面成為光學瞳孔。在曝光裝置50的構成中,上述光學裝置例如可以用作使作為鏡1的凹面鏡53的反射面變形的裝置。通過將上述光學裝置用於曝光裝置50,能夠使凹面鏡53的反射面(第一面53a和第二 面53b)變形,從而能夠高精度地修正投影光學系統PO中的光學像差。在此,曝光裝置50中的控制部51可以被構為包括用於控制光學裝置中的致動器的控制部6。 As shown in FIG. 4, the projection optical system PO may be configured to include, for example, a flat mirror 52, a concave mirror 53, and a convex mirror 54. The exposure light emitted from the illumination optical system IL and transmitted through the mask 55 is refracted by the first surface 52 a of the plane mirror 52 and enters the first surface 53 a of the concave mirror 53. The exposure light reflected on the first surface 53 a of the concave mirror 53 is reflected by the convex mirror 54 and is incident on the second surface 53 b of the concave mirror 53. The exposure light reflected on the second surface 53b of the concave mirror 53 is refracted by the light path of the second surface 52b of the plane mirror 52, and is imaged on the substrate. In the projection optical system PO of such a configuration, the surface of the convex mirror 54 becomes an optical pupil. In the configuration of the exposure device 50, the above-mentioned optical device can be used, for example, as a device that deforms the reflecting surface of the concave mirror 53 as the mirror 1. By using the above-mentioned optical device for the exposure device 50, the reflecting surfaces (the first surface 53a and the second surface of the concave mirror 53) can be made The surface 53b) is deformed so that the optical aberration in the projection optical system PO can be corrected with high accuracy. Here, the control section 51 in the exposure device 50 may be configured to include a control section 6 for controlling an actuator in the optical device.

[物品的製造方法] [Production method of article]

根據本實施形態的物品的製造方法,適宜用於製造例如半導體裝置等的微型裝置或具有微細構造的元件等的物品。本實施形態的物品的製造方法包括使用上述曝光裝置在塗敷於基板的感光劑上形成潛像圖案的程序(基板曝光程序)和使在該程序中形成了潛像圖案的基板顯影的程序。此外,該製造方法還包括其他公知的程序(氧化、成膜、蒸鍍、摻雜、平坦化、蝕刻、去除抗蝕層剝離、切割、接合、封裝等)。與已有的方法相比,本實施形態的物品的製造方法在物品的性能、品質、生產率、生產成本之中的至少一方面有優勢。 The method for producing an article according to the present embodiment is suitable for producing articles such as micro devices such as semiconductor devices or elements having a fine structure. The method of manufacturing an article according to this embodiment includes a process of forming a latent image pattern on a photosensitive agent applied to a substrate (substrate exposure process) and a process of developing a substrate on which a latent image pattern is formed by using the exposure device. In addition, the manufacturing method includes other known procedures (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, etc.). Compared with the existing method, the method for manufacturing an article according to this embodiment is advantageous in at least one of performance, quality, productivity, and production cost of the article.

[其他實施例] [Other embodiments]

本發明還可以通過將實現上述實施形態的一個或更多的功能的程式經由網路或記憶媒體提供給系統或裝置,由該系統或裝置的電腦中的一個或更多處理器讀出並執行程式的處理來實現。另外,也可以通過實現一個或更多功能的電路(例如ASIC)來實現。 The present invention can also provide a system or device with a program that realizes one or more functions of the above-mentioned embodiment via a network or a memory medium, and can be read out and executed by one or more processors in a computer of the system or device. Program processing to achieve. Alternatively, it may be implemented by a circuit (such as an ASIC) that implements one or more functions.

雖然參照例示性實施例對本發明進行了描述,但是應當理解,本發明並不限於所公開的示例性實施 例。應當對所附申請專利範圍給予最寬的解釋,以使其涵蓋所有這些變形例以及等同的構成和功能。 Although the invention has been described with reference to exemplary embodiments, it is to be understood that the invention is not limited to the disclosed exemplary implementations example. The broadest explanation should be given to the scope of the attached patent application so that it covers all these variations and equivalent structures and functions.

Claims (9)

一種光學裝置,包括:鏡,具有反射面和與前述反射面的相反側的背面;底板;固定構材,固定於前述背面的一部分,以將前述鏡固定在前述底板上;以及多個致動器,分別向前述背面施加力以使前述反射面的形狀變化,其中,前述多個致動器包括:多個第一致動器,分別向前述背面中的第一區域施加力,前述第一區域包圍由前述固定構材固定的前述鏡的固定部;以及多個第二致動器,分別向前述背面中的包圍前述第一區域的第二區域施加力,使驅動電流為I、推力為F時,關於以F/I表示之推力生成的效率,前述第一致動器的推力生成的效率比前述第二致動器的推力生成的效率高。An optical device includes: a mirror having a reflecting surface and a back surface opposite to the reflecting surface; a base plate; a fixing member fixed to a part of the back surface to fix the mirror on the base plate; and a plurality of actuations And applying a force to the back surface to change the shape of the reflecting surface, wherein the plurality of actuators include: a plurality of first actuators that respectively apply a force to a first region in the back surface, and the first And a plurality of second actuators respectively apply a force to a second region surrounding the first region in the back surface, so that the driving current is I and the thrust is At F, regarding the efficiency of thrust generation represented by F / I, the efficiency of the thrust generation of the first actuator is higher than the efficiency of the thrust generation of the second actuator. 如申請專利範圍第1項的光學裝置,其中,被施加力的前述背面的區域與前述固定部之間的距離越小,前述第一致動器的效率和前述第二致動器的效率越高。For example, the optical device according to the first patent application scope, wherein the smaller the distance between the area of the back surface to which the force is applied and the fixed portion is, the more efficient the first actuator and the second actuator are. high. 如申請專利範圍第1項的光學裝置,其中,前述第一致動器和前述第二致動器係音圈馬達。For example, the optical device according to the scope of patent application, wherein the first actuator and the second actuator are voice coil motors. 如申請專利範圍第3項的光學裝置,其中,前述音圈馬達包括配置於前述背面的磁體和配置於前述底板的線圈。For example, the optical device according to claim 3, wherein the voice coil motor includes a magnet disposed on the back surface and a coil disposed on the bottom plate. 如申請專利範圍第1項的光學裝置,其中,前述第一區域係前述背面的8%或更小的區域。For example, in the optical device according to claim 1, wherein the first area is an area of 8% or less of the back surface. 如申請專利範圍第1項的光學裝置,其中,前述第一區域係前述背面的3%或更小的區域。For example, in the optical device according to claim 1, the first area is an area of 3% or less of the back surface. 一種將遮罩的圖案投影在基板上的投影光學系統,前述投影光學系統包括如申請專利範圍第1至6項中任一項的光學裝置。A projection optical system that projects a pattern of a mask on a substrate. The foregoing projection optical system includes an optical device according to any one of claims 1 to 6 of the scope of patent application. 一種使基板曝光的曝光裝置,所述曝光裝置包括如申請專利範圍第7項的投影光學系統。An exposure device for exposing a substrate, the exposure device includes a projection optical system as in item 7 of the scope of patent application. 一種物品製造方法,所述物品製造方法包括:使用如申請專利範圍第8項的曝光裝置使基板曝光的程序;以及使在前述程序中曝光的前述基板顯影的程序;從前述被顯影的前述基板製造物品。An article manufacturing method comprising: a program for exposing a substrate using an exposure device such as the item No. 8 of the scope of patent application; and a program for developing the substrate exposed in the program; and developing the substrate from the developed Create items.
TW105141624A 2016-01-19 2016-12-15 Optical device, projection optical system, exposure device, and article manufacturing method TWI631430B (en)

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