TWI624727B - Photosensitive composition, method for producing the photosensitive composition, method for forming a film using the photosensitive composition, method for suppressing adhesion when the photosensitive composition is stored, photopolymerization initiator, and photopolymerization initiator Production method - Google Patents

Photosensitive composition, method for producing the photosensitive composition, method for forming a film using the photosensitive composition, method for suppressing adhesion when the photosensitive composition is stored, photopolymerization initiator, and photopolymerization initiator Production method Download PDF

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Publication number
TWI624727B
TWI624727B TW105103584A TW105103584A TWI624727B TW I624727 B TWI624727 B TW I624727B TW 105103584 A TW105103584 A TW 105103584A TW 105103584 A TW105103584 A TW 105103584A TW I624727 B TWI624727 B TW I624727B
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TW
Taiwan
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group
photosensitive composition
mass
photopolymerization initiator
compound represented
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TW105103584A
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English (en)
Chinese (zh)
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TW201710791A (zh
Inventor
Naoto Yamaguchi
Eita Suga
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Tokyo Ohka Kogyo Co Ltd
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  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW105103584A 2015-09-02 2016-02-03 Photosensitive composition, method for producing the photosensitive composition, method for forming a film using the photosensitive composition, method for suppressing adhesion when the photosensitive composition is stored, photopolymerization initiator, and photopolymerization initiator Production method TWI624727B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015173242 2015-09-02
JP2016008924A JP6894188B2 (ja) 2015-09-02 2016-01-20 感光性組成物、当該感光性組成物の製造方法、当該感光性組成物を用いる膜の形成方法、感光性組成物の保管時の増粘抑制方法、光重合開始剤、及び光重合開始剤の製造方法

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TW201710791A TW201710791A (zh) 2017-03-16
TWI624727B true TWI624727B (zh) 2018-05-21

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TW105103584A TWI624727B (zh) 2015-09-02 2016-02-03 Photosensitive composition, method for producing the photosensitive composition, method for forming a film using the photosensitive composition, method for suppressing adhesion when the photosensitive composition is stored, photopolymerization initiator, and photopolymerization initiator Production method

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JP (1) JP6894188B2 (ja)
TW (1) TWI624727B (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101978977B1 (ko) * 2017-09-27 2019-05-15 제이에스알 가부시끼가이샤 감방사선성 조성물, 착색 조성물, 경화막, 절연막 및 그의 제조 방법, 스페이서 및 컬러 필터와 이들의 제조 방법, 그리고 액정 표시 소자
KR102381639B1 (ko) * 2018-11-16 2022-04-01 주식회사 엘지화학 감광성 수지 조성물, 감광재, 디스플레이 장치 및 감광성 수지 조성물의 저온 경화 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008138724A1 (en) * 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
WO2010133077A1 (zh) * 2009-05-19 2010-11-25 常州强力电子新材料有限公司 酮肟酯类光引发剂
US20150111152A1 (en) * 2012-05-03 2015-04-23 Korea Research Institute Of Chemical Technology Novel fluorene oxime ester compound, photopolymerization initiator and photoresist composition containing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005099286A (ja) * 2003-09-24 2005-04-14 Fuji Photo Film Co Ltd 平版印刷版原版
JP2006243564A (ja) * 2005-03-04 2006-09-14 Fuji Photo Film Co Ltd 感光性組成物及び感光性フィルム、並びに、永久パターン及びその形成方法
JP5890297B2 (ja) * 2011-12-22 2016-03-22 東京応化工業株式会社 感光性樹脂組成物、それを用いたカラーフィルタ及び表示装置、オキシムエステル化合物、並びに光重合開始剤
JP2014145957A (ja) * 2013-01-30 2014-08-14 Hitachi Chemical Dupont Microsystems Ltd ネガ型感光性樹脂組成物、及びそれを用いたパターン硬化膜の製造方法及び電子部品
JP5890337B2 (ja) * 2013-02-13 2016-03-22 東京応化工業株式会社 感放射線性樹脂組成物、絶縁膜、及び表示装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008138724A1 (en) * 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
WO2010133077A1 (zh) * 2009-05-19 2010-11-25 常州强力电子新材料有限公司 酮肟酯类光引发剂
US20150111152A1 (en) * 2012-05-03 2015-04-23 Korea Research Institute Of Chemical Technology Novel fluorene oxime ester compound, photopolymerization initiator and photoresist composition containing the same

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Publication number Publication date
JP2017049566A (ja) 2017-03-09
JP6894188B2 (ja) 2021-06-30
TW201710791A (zh) 2017-03-16

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