TWI620833B - 捲取成膜裝置 - Google Patents
捲取成膜裝置 Download PDFInfo
- Publication number
- TWI620833B TWI620833B TW102118338A TW102118338A TWI620833B TW I620833 B TWI620833 B TW I620833B TW 102118338 A TW102118338 A TW 102118338A TW 102118338 A TW102118338 A TW 102118338A TW I620833 B TWI620833 B TW I620833B
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate
- roller
- vacuum chamber
- precursor
- zone
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
- B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
- B05B13/0221—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
- C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
- C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H20/00—Advancing webs
- B65H20/02—Advancing webs by friction roller
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
- B65H2301/00—Handling processes for sheets or webs
- B65H2301/50—Auxiliary process performed during handling process
- B65H2301/51—Modifying a characteristic of handled material
- B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
- B65H2301/5114—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating
- B65H2301/51145—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating by vapour deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
- Advancing Webs (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012-123969 | 2012-05-31 | ||
JP2012123969 | 2012-05-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201408815A TW201408815A (zh) | 2014-03-01 |
TWI620833B true TWI620833B (zh) | 2018-04-11 |
Family
ID=49673203
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102118338A TWI620833B (zh) | 2012-05-31 | 2013-05-24 | 捲取成膜裝置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US9687868B2 (de) |
EP (1) | EP2860280A4 (de) |
JP (1) | JP6119745B2 (de) |
KR (1) | KR20150022782A (de) |
CN (1) | CN104364420A (de) |
TW (1) | TWI620833B (de) |
WO (1) | WO2013180005A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103459665B (zh) * | 2011-03-29 | 2017-02-22 | 凸版印刷株式会社 | 卷绕成膜装置 |
US9745661B2 (en) * | 2013-06-27 | 2017-08-29 | Picosun Oy | Method and apparatus for forming a substrate web track in an atomic layer deposition reactor |
WO2017014092A1 (ja) * | 2015-07-17 | 2017-01-26 | 凸版印刷株式会社 | 原子層堆積巻き取り成膜装置、原子層堆積方法 |
JP6875116B2 (ja) * | 2015-12-22 | 2021-05-19 | 住友化学株式会社 | フィルム製造方法およびフィルム巻出方法 |
JP6872894B2 (ja) * | 2015-12-22 | 2021-05-19 | 住友化学株式会社 | フィルム製造方法 |
CN109946940B (zh) * | 2019-05-07 | 2024-04-12 | 珠海天威飞马打印耗材有限公司 | 一种处理盒的工作方法、处理盒和成像设备 |
DE102019007935B4 (de) * | 2019-11-14 | 2023-06-29 | Elfolion Gmbh | Verfahren zum Bearbeiten flexibler Substrate und Vakuumbearbeitungsanlage zur Umsetzung des Verfahrens |
CN113651159A (zh) * | 2021-10-20 | 2021-11-16 | 常州欣盛半导体技术股份有限公司 | Pi膜输送用的镜面轮及其使用方法 |
CN117144333B (zh) * | 2023-09-21 | 2024-05-14 | 无锡松煜科技有限公司 | 一种柔性基底ald沉积氧化铝薄膜的方法及应用 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070281089A1 (en) * | 2006-06-05 | 2007-12-06 | General Electric Company | Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects |
CN101406108A (zh) * | 2006-03-26 | 2009-04-08 | 罗特斯应用技术公司 | 原子层沉积系统以及用于涂覆柔性衬底的方法 |
US20100054826A1 (en) * | 2008-08-27 | 2010-03-04 | Fujifilm Corporation | Web transfer method and apparatus |
JP2011178490A (ja) * | 2010-02-26 | 2011-09-15 | Fujifilm Corp | 可撓性フィルムの搬送装置及びバリアフィルムの製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4944155B1 (de) * | 1967-07-26 | 1974-11-26 | ||
DE2443663C3 (de) * | 1974-09-12 | 1981-01-15 | Basf Ag, 6700 Ludwigshafen | Walzeneinrichtung zum fortlaufenden Transport von Folienbahnen |
GB2259295A (en) * | 1991-09-06 | 1993-03-10 | Mcdonald George W | Producing folded articles, e.g. maps |
US5357178A (en) * | 1993-07-09 | 1994-10-18 | Gettys Corporation | Web tensioning control system |
JPH07112370A (ja) | 1993-10-20 | 1995-05-02 | Noritake Dia Kk | 超砥粒メタルボンドホイールの製造方法 |
EP0995413A1 (de) * | 1998-10-16 | 2000-04-26 | The Procter & Gamble Company | Verfahren zum Herstellen einer gelochten Bahn |
US6604457B2 (en) * | 2001-05-11 | 2003-08-12 | Graftech Inc. | Process and apparatus for embossing graphite articles |
US20050172897A1 (en) * | 2004-02-09 | 2005-08-11 | Frank Jansen | Barrier layer process and arrangement |
US7456429B2 (en) | 2006-03-29 | 2008-11-25 | Eastman Kodak Company | Apparatus for atomic layer deposition |
JP2009149963A (ja) * | 2007-12-22 | 2009-07-09 | Sumitomo Metal Mining Co Ltd | 真空成膜方法及び真空成膜装置 |
CN102239278A (zh) * | 2008-12-05 | 2011-11-09 | 莲花应用技术有限责任公司 | 具有改进的阻隔层性能的薄膜的高速沉积 |
TWM374407U (en) * | 2009-08-11 | 2010-02-21 | Zhi-Huang Zhou | Roller structure of business machine |
CN103459665B (zh) * | 2011-03-29 | 2017-02-22 | 凸版印刷株式会社 | 卷绕成膜装置 |
-
2013
- 2013-05-23 EP EP13796425.0A patent/EP2860280A4/de not_active Withdrawn
- 2013-05-23 JP JP2014518412A patent/JP6119745B2/ja not_active Expired - Fee Related
- 2013-05-23 KR KR1020147033044A patent/KR20150022782A/ko not_active Application Discontinuation
- 2013-05-23 WO PCT/JP2013/064351 patent/WO2013180005A1/ja active Application Filing
- 2013-05-23 CN CN201380027869.9A patent/CN104364420A/zh active Pending
- 2013-05-24 TW TW102118338A patent/TWI620833B/zh not_active IP Right Cessation
-
2014
- 2014-12-01 US US14/556,608 patent/US9687868B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101406108A (zh) * | 2006-03-26 | 2009-04-08 | 罗特斯应用技术公司 | 原子层沉积系统以及用于涂覆柔性衬底的方法 |
US20070281089A1 (en) * | 2006-06-05 | 2007-12-06 | General Electric Company | Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects |
US20100054826A1 (en) * | 2008-08-27 | 2010-03-04 | Fujifilm Corporation | Web transfer method and apparatus |
JP2011178490A (ja) * | 2010-02-26 | 2011-09-15 | Fujifilm Corp | 可撓性フィルムの搬送装置及びバリアフィルムの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN104364420A (zh) | 2015-02-18 |
EP2860280A4 (de) | 2016-03-23 |
TW201408815A (zh) | 2014-03-01 |
JPWO2013180005A1 (ja) | 2016-01-21 |
KR20150022782A (ko) | 2015-03-04 |
EP2860280A1 (de) | 2015-04-15 |
US9687868B2 (en) | 2017-06-27 |
US20150083043A1 (en) | 2015-03-26 |
WO2013180005A1 (ja) | 2013-12-05 |
JP6119745B2 (ja) | 2017-04-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |