TWI620833B - 捲取成膜裝置 - Google Patents

捲取成膜裝置 Download PDF

Info

Publication number
TWI620833B
TWI620833B TW102118338A TW102118338A TWI620833B TW I620833 B TWI620833 B TW I620833B TW 102118338 A TW102118338 A TW 102118338A TW 102118338 A TW102118338 A TW 102118338A TW I620833 B TWI620833 B TW I620833B
Authority
TW
Taiwan
Prior art keywords
substrate
roller
vacuum chamber
precursor
zone
Prior art date
Application number
TW102118338A
Other languages
English (en)
Chinese (zh)
Other versions
TW201408815A (zh
Inventor
佐佐木康裕
加納滿
Original Assignee
凸版印刷股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 凸版印刷股份有限公司 filed Critical 凸版印刷股份有限公司
Publication of TW201408815A publication Critical patent/TW201408815A/zh
Application granted granted Critical
Publication of TWI620833B publication Critical patent/TWI620833B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/0221—Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
    • C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H20/00—Advancing webs
    • B65H20/02—Advancing webs by friction roller
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65H—HANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00—Handling processes for sheets or webs
    • B65H2301/50—Auxiliary process performed during handling process
    • B65H2301/51—Modifying a characteristic of handled material
    • B65H2301/511—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning
    • B65H2301/5114—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating
    • B65H2301/51145—Processing surface of handled material upon transport or guiding thereof, e.g. cleaning coating by vapour deposition

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
  • Advancing Webs (AREA)
  • Registering, Tensioning, Guiding Webs, And Rollers Therefor (AREA)
TW102118338A 2012-05-31 2013-05-24 捲取成膜裝置 TWI620833B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012123969 2012-05-31
JP2012-123969 2012-05-31

Publications (2)

Publication Number Publication Date
TW201408815A TW201408815A (zh) 2014-03-01
TWI620833B true TWI620833B (zh) 2018-04-11

Family

ID=49673203

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102118338A TWI620833B (zh) 2012-05-31 2013-05-24 捲取成膜裝置

Country Status (7)

Country Link
US (1) US9687868B2 (de)
EP (1) EP2860280A4 (de)
JP (1) JP6119745B2 (de)
KR (1) KR20150022782A (de)
CN (1) CN104364420A (de)
TW (1) TWI620833B (de)
WO (1) WO2013180005A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2692899B1 (de) * 2011-03-29 2017-04-19 Toppan Printing Co., Ltd. Rolle-zu-rolle atomlagenbeschichtung (ald)
SG11201509884RA (en) * 2013-06-27 2016-01-28 Picosun Oy Forming a substrate web track in an atomic layer deposition reactor
JPWO2017014092A1 (ja) * 2015-07-17 2018-04-26 凸版印刷株式会社 原子層堆積巻き取り成膜装置、原子層堆積方法
JP6875116B2 (ja) * 2015-12-22 2021-05-19 住友化学株式会社 フィルム製造方法およびフィルム巻出方法
JP6872894B2 (ja) * 2015-12-22 2021-05-19 住友化学株式会社 フィルム製造方法
CN109946940B (zh) * 2019-05-07 2024-04-12 珠海天威飞马打印耗材有限公司 一种处理盒的工作方法、处理盒和成像设备
DE102019007935B4 (de) * 2019-11-14 2023-06-29 Elfolion Gmbh Verfahren zum Bearbeiten flexibler Substrate und Vakuumbearbeitungsanlage zur Umsetzung des Verfahrens
CN113651159A (zh) * 2021-10-20 2021-11-16 常州欣盛半导体技术股份有限公司 Pi膜输送用的镜面轮及其使用方法
CN117144333B (zh) * 2023-09-21 2024-05-14 无锡松煜科技有限公司 一种柔性基底ald沉积氧化铝薄膜的方法及应用

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070281089A1 (en) * 2006-06-05 2007-12-06 General Electric Company Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
CN101406108A (zh) * 2006-03-26 2009-04-08 罗特斯应用技术公司 原子层沉积系统以及用于涂覆柔性衬底的方法
US20100054826A1 (en) * 2008-08-27 2010-03-04 Fujifilm Corporation Web transfer method and apparatus
JP2011178490A (ja) * 2010-02-26 2011-09-15 Fujifilm Corp 可撓性フィルムの搬送装置及びバリアフィルムの製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4944155B1 (de) * 1967-07-26 1974-11-26
DE2443663C3 (de) * 1974-09-12 1981-01-15 Basf Ag, 6700 Ludwigshafen Walzeneinrichtung zum fortlaufenden Transport von Folienbahnen
GB2259295A (en) * 1991-09-06 1993-03-10 Mcdonald George W Producing folded articles, e.g. maps
US5357178A (en) * 1993-07-09 1994-10-18 Gettys Corporation Web tensioning control system
JPH07112370A (ja) 1993-10-20 1995-05-02 Noritake Dia Kk 超砥粒メタルボンドホイールの製造方法
EP0995413A1 (de) * 1998-10-16 2000-04-26 The Procter & Gamble Company Verfahren zum Herstellen einer gelochten Bahn
US6604457B2 (en) * 2001-05-11 2003-08-12 Graftech Inc. Process and apparatus for embossing graphite articles
US20050172897A1 (en) 2004-02-09 2005-08-11 Frank Jansen Barrier layer process and arrangement
US7456429B2 (en) * 2006-03-29 2008-11-25 Eastman Kodak Company Apparatus for atomic layer deposition
JP2009149963A (ja) * 2007-12-22 2009-07-09 Sumitomo Metal Mining Co Ltd 真空成膜方法及び真空成膜装置
EP2364380A4 (de) * 2008-12-05 2012-07-04 Lotus Applied Technology Llc Schnelle abscheidung von dünnen filmen mit verbesserten barriereschichteigenschaften
TWM374407U (en) * 2009-08-11 2010-02-21 Zhi-Huang Zhou Roller structure of business machine
EP2692899B1 (de) * 2011-03-29 2017-04-19 Toppan Printing Co., Ltd. Rolle-zu-rolle atomlagenbeschichtung (ald)

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101406108A (zh) * 2006-03-26 2009-04-08 罗特斯应用技术公司 原子层沉积系统以及用于涂覆柔性衬底的方法
US20070281089A1 (en) * 2006-06-05 2007-12-06 General Electric Company Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
US20100054826A1 (en) * 2008-08-27 2010-03-04 Fujifilm Corporation Web transfer method and apparatus
JP2011178490A (ja) * 2010-02-26 2011-09-15 Fujifilm Corp 可撓性フィルムの搬送装置及びバリアフィルムの製造方法

Also Published As

Publication number Publication date
CN104364420A (zh) 2015-02-18
EP2860280A1 (de) 2015-04-15
JPWO2013180005A1 (ja) 2016-01-21
KR20150022782A (ko) 2015-03-04
WO2013180005A1 (ja) 2013-12-05
JP6119745B2 (ja) 2017-04-26
EP2860280A4 (de) 2016-03-23
US9687868B2 (en) 2017-06-27
TW201408815A (zh) 2014-03-01
US20150083043A1 (en) 2015-03-26

Similar Documents

Publication Publication Date Title
TWI620833B (zh) 捲取成膜裝置
JP5713038B2 (ja) フィルムの製造方法
KR101791033B1 (ko) 롤-투-롤 박막 증착을 위한 유연한 웹 기재의 한쪽 측면과 접촉하는 기재 이동 메커니즘
JP5859405B2 (ja) ガラスフィルム搬送装置
JP2017507247A (ja) 薄膜処理用途のための装置及び方法
WO2017014092A1 (ja) 原子層堆積巻き取り成膜装置、原子層堆積方法
JP2009179446A (ja) 巻取装置および巻取部材の作製方法
TW202236728A (zh) 使用碳酸鹽鈍化的鋰金屬表面改良
JP2016041630A (ja) ガラスフィルム搬送装置
JP5733507B2 (ja) 成膜方法
JPH06330319A (ja) 薄膜製造装置
WO2024111505A1 (ja) 電解コンデンサ用の電極箔の製造装置および製造方法
JP5736857B2 (ja) 成膜装置
WO2020151012A1 (zh) 光学薄膜的制备方法、卷绕镀膜机和微纳米结构色晶体
JP2006193757A (ja) 多層薄膜成膜装置及びそれを用いた多層薄膜の製造方法
JP2004307947A (ja) 真空成膜装置
KR20230173313A (ko) 아미노실란계 전구체를 이용한 실리콘 산화막의 선택적 증착 방법
JP2023145197A (ja) 接触角制御基材の製造方法
WO2018149510A1 (en) Deposition apparatus for coating a flexible substrate and method of coating a flexible substrate
JP2004307889A (ja) 真空成膜装置

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees