TWI615673B - 著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置 - Google Patents
著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置 Download PDFInfo
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- TWI615673B TWI615673B TW103124653A TW103124653A TWI615673B TW I615673 B TWI615673 B TW I615673B TW 103124653 A TW103124653 A TW 103124653A TW 103124653 A TW103124653 A TW 103124653A TW I615673 B TWI615673 B TW I615673B
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- 0 CCC(C)(C)*(*)(C(C)(C)C)N Chemical compound CCC(C)(C)*(*)(C(C)(C)C)N 0.000 description 3
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
- C09B57/10—Metal complexes of organic compounds not being dyes in uncomplexed form
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B67/00—Influencing the physical, e.g. the dyeing or printing properties of dyestuffs without chemical reactions, e.g. by treating with solvents grinding or grinding assistants, coating of pigments or dyes; Process features in the making of dyestuff preparations; Dyestuff preparations of a special physical nature, e.g. tablets, films
- C09B67/006—Preparation of organic pigments
- C09B67/0063—Preparation of organic pigments of organic pigments with only macromolecular substances
- C09B67/0064—Preparation of organic pigments of organic pigments with only macromolecular substances of phthalocynanines with only macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B69/00—Dyes not provided for by a single group of this subclass
- C09B69/10—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
- C09B69/109—Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing other specific dyes
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Structural Engineering (AREA)
- Architecture (AREA)
- Engineering & Computer Science (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Nonlinear Science (AREA)
- Paints Or Removers (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013160685A JP6147133B2 (ja) | 2013-08-01 | 2013-08-01 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
JP2013-160685 | 2013-08-01 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201506535A TW201506535A (zh) | 2015-02-16 |
TWI615673B true TWI615673B (zh) | 2018-02-21 |
Family
ID=52431771
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103124653A TWI615673B (zh) | 2013-08-01 | 2014-07-18 | 著色組成物、硬化膜、彩色濾光片、彩色濾光片的製造方法、固體攝像元件及圖像顯示裝置 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6147133B2 (ja) |
KR (1) | KR101851548B1 (ja) |
TW (1) | TWI615673B (ja) |
WO (1) | WO2015016241A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6147134B2 (ja) * | 2013-08-01 | 2017-06-14 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
JP6054824B2 (ja) * | 2013-08-01 | 2016-12-27 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
JP6401134B2 (ja) * | 2015-09-10 | 2018-10-03 | 信越化学工業株式会社 | 導電性ポリマー複合体及び基板 |
JP6889543B2 (ja) * | 2016-01-14 | 2021-06-18 | 東友ファインケム株式会社Dongwoo Fine−Chem Co., Ltd. | 染料溶解液の製造方法 |
KR102067855B1 (ko) * | 2016-03-31 | 2020-01-17 | 주식회사 엘지화학 | 3차 아민을 포함하는 잔텐계 화합물 제조방법 |
JP7194492B2 (ja) * | 2016-10-24 | 2022-12-22 | 東京応化工業株式会社 | 感光性組成物、感光性組成物の製造方法、光重合開始剤、及び光重合開始剤の調製方法 |
TWI782935B (zh) | 2017-02-01 | 2022-11-11 | 日商富士軟片股份有限公司 | 樹脂組成物、樹脂膜、樹脂膜的製造方法、濾光器、固體攝像元件、圖像顯示裝置及紅外線感測器 |
JPWO2018163702A1 (ja) * | 2017-03-07 | 2019-12-26 | 富士フイルム株式会社 | 積層体、光学フィルタ、固体撮像素子、画像表示装置、赤外線センサおよびキット |
WO2019077912A1 (ja) * | 2017-10-20 | 2019-04-25 | 富士フイルム株式会社 | 着色組成物、膜の製造方法、カラーフィルタの製造方法、固体撮像素子の製造方法および画像表示装置の製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012032754A (ja) * | 2010-06-30 | 2012-02-16 | Fujifilm Corp | 着色硬化性組成物、カラーフィルタ、その製造方法、固体撮像素子、液晶表示装置、および色素多量体 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3175697B2 (ja) * | 1998-06-18 | 2001-06-11 | 日本電気株式会社 | 化学増幅系フォトレジスト |
JP4502367B2 (ja) * | 2004-02-04 | 2010-07-14 | 旭化成イーマテリアルズ株式会社 | レーザー彫刻可能な円筒状フレキソ印刷原版の製造方法 |
JP2008242311A (ja) * | 2007-03-28 | 2008-10-09 | Sumitomo Chemical Co Ltd | 着色感光性樹脂組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子 |
JP5142579B2 (ja) | 2007-04-16 | 2013-02-13 | 東洋インキScホールディングス株式会社 | 着色組成物およびそれを用いたカラーフィルタ |
JP2009175451A (ja) * | 2008-01-24 | 2009-08-06 | Sumitomo Chemical Co Ltd | 着色感光性組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子 |
JP2009175452A (ja) * | 2008-01-24 | 2009-08-06 | Sumitomo Chemical Co Ltd | 着色感光性組成物、並びにそれを用いた色フィルタアレイ及び固体撮像素子 |
JP5283747B2 (ja) * | 2011-02-09 | 2013-09-04 | 富士フイルム株式会社 | 着色感放射線性組成物、カラーフィルタ、その製造方法、固体撮像素子、及び液晶表示装置 |
US9052458B2 (en) * | 2011-03-17 | 2015-06-09 | Fujifilm Corporation | Radiation-sensitive colored composition, colored cured film, color filter and method of producing the same, solid-state imaging device, liquid crystal display apparatus, and method of producing dye |
JP6147134B2 (ja) * | 2013-08-01 | 2017-06-14 | 富士フイルム株式会社 | 着色組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
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2013
- 2013-08-01 JP JP2013160685A patent/JP6147133B2/ja active Active
-
2014
- 2014-07-18 TW TW103124653A patent/TWI615673B/zh active
- 2014-07-30 WO PCT/JP2014/070010 patent/WO2015016241A1/ja active Application Filing
- 2014-07-30 KR KR1020167002345A patent/KR101851548B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012032754A (ja) * | 2010-06-30 | 2012-02-16 | Fujifilm Corp | 着色硬化性組成物、カラーフィルタ、その製造方法、固体撮像素子、液晶表示装置、および色素多量体 |
Also Published As
Publication number | Publication date |
---|---|
JP2015030782A (ja) | 2015-02-16 |
KR20160025593A (ko) | 2016-03-08 |
WO2015016241A1 (ja) | 2015-02-05 |
JP6147133B2 (ja) | 2017-06-14 |
TW201506535A (zh) | 2015-02-16 |
KR101851548B1 (ko) | 2018-04-24 |
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