TWI609779B - Copper foil containing adhesive layer,copper clad laminate and printed wiring board - Google Patents

Copper foil containing adhesive layer,copper clad laminate and printed wiring board Download PDF

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Publication number
TWI609779B
TWI609779B TW102101074A TW102101074A TWI609779B TW I609779 B TWI609779 B TW I609779B TW 102101074 A TW102101074 A TW 102101074A TW 102101074 A TW102101074 A TW 102101074A TW I609779 B TWI609779 B TW I609779B
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Taiwan
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adhesive layer
copper foil
copper
mass
parts
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TW102101074A
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Chinese (zh)
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TW201331025A (en
Inventor
松島敏文
佐藤哲朗
細川真
大澤和弘
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三井金屬鑛業股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/14Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to metal, e.g. car bodies
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0104Properties and characteristics in general
    • H05K2201/0133Elastomeric or compliant polymer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0145Polyester, e.g. polyethylene terephthalate [PET], polyethylene naphthalate [PEN]

Abstract

本發明之目的係提供一種具有充分撕離強度,同時除膠渣(desmear)液耐性高,且吸濕劣化較少之具備接著劑層之銅箔、貼銅積層板及印刷配線板。為達成該目的,而採用一種於銅箔之單面上具備接著劑層之具備接著劑銅箔,接著劑層係由對於聚伸苯基醚化合物100質量份含5質量份以上、65質量份以下之苯乙烯丁二烯嵌段共聚物之樹脂組成物所成之層。而且,本發明提供一種貼銅積層板,係使用該具備接著劑層之銅箔而獲得,及提供一種印刷配線板,其特徵係使用該貼銅積層板而獲得。 An object of the present invention is to provide a copper foil, a copper-clad laminate, and a printed wiring board having an adhesive layer which has sufficient tear strength and high desmear liquid resistance and which has less moisture absorption deterioration. In order to achieve the object, an adhesive copper foil having an adhesive layer on one side of a copper foil is used, and the adhesive layer is contained in an amount of 5 parts by mass or more and 65 parts by mass based on 100 parts by mass of the polyphenylene ether compound. The layer formed by the resin composition of the following styrene butadiene block copolymer. Further, the present invention provides a copper-clad laminate obtained by using the copper foil having the adhesive layer, and a printed wiring board obtained by using the copper-clad laminate.

Description

具備接著劑層之銅箔、貼銅積層板及印刷配線板 Copper foil with adhesive layer, copper laminated board and printed wiring board

本發明係關於印刷配線板用之具備接著劑層之銅箔、使用該具備接著劑層之銅箔之貼銅積層板及印刷配線板。 The present invention relates to a copper foil provided with an adhesive layer for a printed wiring board, a copper laminated board using the copper foil provided with the adhesive layer, and a printed wiring board.

過去以來,製造貼銅積層板或印刷配線板時,如專利文獻1或專利文獻2所揭示,係使用具備極薄接著劑層(底塗樹脂層)之銅箔(以下稱為「具備接著劑層之銅箔」)。該具備接著劑層之銅箔係接著劑層側面向樹脂基板或成為層間絕緣膜之預浸物、紙酚樹脂基材等樹脂基材上之方式層合,且藉由進行加熱加壓等,透過接著劑層,可確保樹脂基材與銅箔之良好貼合密著性。 In the past, when a copper-clad laminate or a printed wiring board was produced, as disclosed in Patent Document 1 or Patent Document 2, a copper foil having an extremely thin adhesive layer (primer resin layer) was used (hereinafter referred to as "with an adhesive". Layer of copper foil"). The side surface of the copper foil-based adhesive layer having the adhesive layer is laminated on a resin substrate or a prepreg which is an interlayer insulating film, or a resin substrate such as a paper phenol resin substrate, and is heated and pressurized. Through the adhesive layer, good adhesion of the resin substrate to the copper foil can be ensured.

專利文獻1(日本專利申請案:特開2005-53218號公報)或專利文獻2(日本專利申請案:特開2009-148962號公報)中揭示之接著劑為換算厚度為0.5μm~10μm之極薄半硬化狀態之樹脂層。該等接著劑層係使用混合環氧樹脂、可溶於溶劑中之芳香族聚醯胺樹脂及硬化促進劑等而成之樹脂組成物(以下稱為「PA系樹脂組成物」),或混合環氧樹脂、聚醚碸樹脂及硬化促進劑而成之樹脂組成物(以下稱為「PES系樹脂組成物」)而形成者。 The adhesive disclosed in the patent document 1 (Japanese Patent Application Laid-Open No. Hei. No. 2005-53218) or the patent document 2 (Japanese Patent Application Laid-Open No. Hei No. 2009-148962) has a thickness of 0.5 μm to 10 μm. A resin layer in a thin semi-hardened state. The adhesive layer is a resin composition (hereinafter referred to as "PA-based resin composition") obtained by mixing an epoxy resin, an aromatic polyamine resin soluble in a solvent, a curing accelerator, or the like, or a mixture thereof. A resin composition (hereinafter referred to as "PES-based resin composition") formed of an epoxy resin, a polyether oxime resin, and a curing accelerator is formed.

若使用此種具備接著劑層之銅箔,由於即使為低粗糙度之銅箔亦可確保與樹脂基材之密著性,故可不需要過去須進行之粗化處理步驟。據此,可提高製造效率,且可降低製造成本。又,使用該等具備接著劑層之銅箔時,利用蝕刻形成導體圖型時,由於不需要設置用以溶解粗化處理部分之過蝕刻時間,故可發揮以微細間距形成具備良好蝕刻因子之微細電路之優異效果。 When such a copper foil having an adhesive layer is used, the adhesion to the resin substrate can be ensured even with a low-roughness copper foil, so that the roughening treatment step which has to be performed in the past can be eliminated. According to this, the manufacturing efficiency can be improved, and the manufacturing cost can be reduced. Further, when the copper foil having the adhesive layer is used, when the conductor pattern is formed by etching, since it is not necessary to provide an overetching time for dissolving the roughened portion, it is possible to form a fine etching pitch with a good etching factor. The excellent effect of the micro circuit.

然而,上述例示之具備接著劑層之銅箔被要求提高對於去膠渣液等之耐藥品性或提高耐吸濕性劣化特性。 However, the copper foil provided with the adhesive layer exemplified above is required to improve chemical resistance to degreased liquid or the like or to improve moisture absorption deterioration resistance.

例如,製造多層印刷配線板時,用以連接層間之貫穿孔或盲孔等之孔洞會有利用鑽孔機或雷射加工而開孔之情況。此時,為了去除孔洞內部殘留之樹脂(膠渣)而使用由過錳酸鉀等所成之去膠渣液,進行去除膠渣之去膠渣處理。此時,使用PA系樹脂組成物所形成之接著劑層,由於在去膠渣處理時容易溶解於去膠渣液中,故有樹脂基材與銅箔之間之密著性在貫穿孔或盲孔等之周圍局部性地降低之虞。 For example, when manufacturing a multilayer printed wiring board, a hole for connecting a through hole or a blind hole between layers may be opened by a drill or laser processing. At this time, in order to remove the resin (slag) remaining in the inside of the hole, a degumming liquid made of potassium permanganate or the like is used, and the desmear treatment for removing the dross is performed. In this case, since the adhesive layer formed using the PA-based resin composition is easily dissolved in the degreasing liquid during the desmear treatment, the adhesion between the resin substrate and the copper foil is in the through-hole or The surrounding area of the blind hole or the like is locally lowered.

另一方面,使用PES系樹脂組成物所形成之接著劑層,其去膠渣液耐性高,即使施以去膠渣處理亦不會溶解。然而,會有吸濕後之撕離強度顯著劣化之問題。 On the other hand, the adhesive layer formed using the PES resin composition has high desmear resistance and does not dissolve even if subjected to desmear treatment. However, there is a problem that the tear strength after moisture absorption is remarkably deteriorated.

據此,本發明之目的係提供一種具有充分之撕離強度,同時去膠渣液耐性高,且耐吸濕劣化特性優異之具備接著劑層之銅箔、貼銅積層板及印刷配線板。 Accordingly, an object of the present invention is to provide a copper foil, a copper-clad laminate, and a printed wiring board having an adhesive layer which has sufficient tear strength and is excellent in degreasing resistance and excellent in moisture absorption deterioration resistance.

因此,經本發明人等進行積極研究之結果,發現採用由以下之樹脂組成物所成之層作為接著劑層可達成上述課題。 Therefore, as a result of active research by the inventors of the present invention, it has been found that the above problem can be attained by using a layer composed of the following resin composition as an adhesive layer.

本發明之具備接著劑層之銅箔為於銅箔之單面上具備接著劑層之具備接著劑層之銅箔,其特徵為前述接著劑層係由對於聚伸苯基醚化合物100質量份含5質量份以上、65質量份以下之苯乙烯丁二烯嵌段共聚物之樹脂組成物所成之層者。 The copper foil with an adhesive layer of the present invention is a copper foil having an adhesive layer provided with an adhesive layer on one surface of a copper foil, wherein the adhesive layer is 100 parts by mass for the polyphenylene ether compound. A layer composed of a resin composition of 5 parts by mass or more and 65 parts by mass or less of the styrene butadiene block copolymer.

本發明之具備接著劑層之銅箔中,較好在銅箔之表面粗糙度(Rzjis)為2μm以下之面上設置前述接著劑層。 In the copper foil provided with the adhesive layer of the present invention, the above-mentioned adhesive layer is preferably provided on the surface of the copper foil having a surface roughness (Rzjis) of 2 μm or less.

本發明之具備接著劑層之銅箔中,前述接著劑層之厚度較好為0.5μm~10μm。 In the copper foil provided with the adhesive layer of the present invention, the thickness of the adhesive layer is preferably from 0.5 μm to 10 μm.

本發明之具備接著劑層之銅箔中,前述接著劑層較好為包含使用由胺基官能性矽烷偶合劑、丙烯酸官能性矽烷偶合劑、甲基丙烯酸官能性矽烷偶合劑及乙烯基官能性矽烷偶合劑所選出之一種以上進行表面處理之填充劑粒子者。 In the copper foil with an adhesive layer of the present invention, the adhesive layer preferably contains an amino functional decane coupling agent, an acrylic functional decane coupling agent, a methacrylic functional decane coupling agent, and a vinyl functional group. One or more surface-treated filler particles selected from the decane coupling agent.

本發明之貼銅積層板之特徵為使用上述所記載之具備接著劑層之銅箔。 The copper-clad laminate of the present invention is characterized in that the copper foil having the adhesive layer described above is used.

本發明之印刷配線板之特徵為使用本發明之貼銅積層板而獲得者。而且,亦可較好地使用一種印刷配線板,其特徵係使用本發明之貼銅積層板,藉由蝕刻去除該貼銅積層板表面之銅箔層且以半加成法(semi-additive process)形成電路而獲得者。 The printed wiring board of the present invention is characterized by being obtained by using the copper-clad laminate of the present invention. Moreover, it is also preferable to use a printed wiring board characterized by using the copper-clad laminate of the present invention to remove the copper foil layer on the surface of the copper-clad laminate by etching and semi-additive process. ) The circuit is formed by the winner.

依據本發明,藉由採用由對於聚伸苯基醚化合物100質量份含5質量份以上、65質量份以下之苯乙烯丁二烯嵌段共聚物之樹脂組成物所成之層作為接著劑層,可使將該具備接著劑層之銅箔貼合於樹脂基材上時之密著性成為良好者。與此同時,印刷配線板之製造步驟中包含去膠渣處理時,亦可防止接著劑層溶解於去膠渣液中,且可形成吸濕後之撕離強度劣化較少之印刷配線板。 According to the invention, a layer composed of a resin composition containing 5 parts by mass or more and 65 parts by mass or less of the styrene-butadiene block copolymer for 100 parts by mass of the polyphenylene ether compound is used as the adhesive layer. The adhesion when the copper foil having the adhesive layer is bonded to the resin substrate can be improved. At the same time, when the desmear treatment is included in the manufacturing step of the printed wiring board, the adhesive layer can be prevented from being dissolved in the desmear liquid, and a printed wiring board having less deterioration in tear strength after moisture absorption can be formed.

以下說明本發明之具備接著劑層之銅箔、貼銅積層板及印刷配線板之實施形態。 Hereinafter, embodiments of the copper foil, the copper-clad laminate, and the printed wiring board provided with the adhesive layer of the present invention will be described.

〈具備接著劑層之銅箔〉 <copper foil with adhesive layer>

本發明之具備接著劑層之銅箔係作為印刷配線板之製造材料使用者,係於銅箔之單面上具備接著劑層之銅箔。本發明中之特徵為,於該銅箔之單面上具備之接著劑層係由對聚伸苯基醚化合物100質量份含5質量份以上、65質量份以下之苯乙烯丁二烯嵌段共聚物之樹脂組成物所成之層。以下依(1)銅箔、(2)接著劑層之順序針對各層之構成等加以說明。又,本發明中,接著劑層亦可為含填充劑粒子之構成。關於填充劑粒子,係與接著劑層分開另一項目予以說明。又,本實施形態中,主要列舉於樹脂基材上貼合該具備接著劑層之銅箔之情況加以說明。然而,本發明之具備接著劑層之銅箔之實施形態並不限於該等,該具備接著劑層之銅箔之接著劑層上進而設置作為絕緣層等功能之樹脂層者亦包含於本發明中。亦即,本發明只 要具備在下述說明之銅箔之單面上具有下述說明之特徵之接著劑者即可,該接著劑層之例係以貼銅積層板或印刷配線板全體來看時,只要是介隔在銅箔與構成絕緣層等之樹脂部分之間且具有使該兩者接著或密著之功能者即可。 The copper foil provided with the adhesive layer of the present invention is used as a material for manufacturing a printed wiring board, and is a copper foil having an adhesive layer on one surface of a copper foil. In the present invention, the adhesive layer provided on one side of the copper foil is a styrene butadiene block containing 5 parts by mass or more and 65 parts by mass or less based on 100 parts by mass of the polyphenylene ether compound. A layer formed by the resin composition of the copolymer. Hereinafter, the constitution of each layer will be described in the order of (1) copper foil and (2) adhesive layer. Further, in the present invention, the adhesive layer may be a composition containing filler particles. The filler particles are described separately from the adhesive layer. Further, in the present embodiment, a case where the copper foil having the adhesive layer is bonded to the resin substrate will be mainly described. However, the embodiment of the copper foil having the adhesive layer of the present invention is not limited thereto, and a resin layer having a function as an insulating layer or the like on the adhesive layer of the copper foil having the adhesive layer is also included in the present invention. in. That is, the invention only It is sufficient to provide an adhesive having the characteristics described below on one side of the copper foil described below. The example of the adhesive layer is as long as it is a copper-clad laminate or a printed wiring board. The copper foil and the resin portion constituting the insulating layer or the like may have a function of bringing the two together or in close contact.

(1) 銅箔 (1) Copper foil

本發明中,可使用電解銅箔或壓延銅箔等之任一種作為設置接著劑層之銅箔,關於銅箔之種類並無限制。又,於電解銅箔上設置接著劑層時,可在光澤面(滾筒面)或析出面(粗糙面)之任一面上設置接著劑層。另外,銅箔之厚度亦無特別限制,但較好在1.0μm~18μm之範圍之銅箔上設置該接著劑層。只要依據製造印刷配線板時所要求之特性,採用適當、適切之銅箔即可。 In the present invention, any one of an electrolytic copper foil or a rolled copper foil may be used as the copper foil provided with the adhesive layer, and the type of the copper foil is not limited. Further, when an adhesive layer is provided on the electrodeposited copper foil, an adhesive layer can be provided on either the gloss surface (roller surface) or the deposition surface (rough surface). Further, the thickness of the copper foil is not particularly limited, but it is preferable to provide the adhesive layer on the copper foil in the range of 1.0 μm to 18 μm. As long as the characteristics required for the manufacture of the printed wiring board are used, an appropriate and suitable copper foil can be used.

另外,本發明中,例如在5.0μm以下之銅箔之單面(一面側)具備接著層之構成時,可在銅箔之另一面上設置所謂之載體箔(支撐體)。藉由使用5.0μm以下之銅箔,可以良好之蝕刻因子形成電路間距更狹窄之高精細電路。 In the present invention, for example, when a single layer (one surface side) of a copper foil of 5.0 μm or less is provided with an adhesive layer, a so-called carrier foil (support) may be provided on the other surface of the copper foil. By using a copper foil of 5.0 μm or less, a high-definition circuit having a narrower circuit pitch can be formed with a good etching factor.

本發明中,較好對接著面之表面粗糙度(Rzjis)為2μm以下之銅箔設置接著劑層。而且,於銅箔本身經蝕刻加工,進行電路形成時,更好使用未施以粗化處理之銅箔。又,所謂接著面係指銅箔貼合於樹脂基材之側的面,且指設置接著劑層之面者。本發明之具備接著劑層之銅箔,與電解銅箔及壓延銅箔等之種類無關,針對接著面之表面粗糙度(Rzjis)為2μm以下之表面為平滑之銅箔,亦可藉由介隔在於銅箔與樹脂基材之間之接著劑層,獲得銅箔與樹脂基材之充分接著強度。亦即,本發明之具備接著劑層之銅箔,由於即使為無粗化銅箔,亦可獲得與樹脂基材之充分接著強度,故藉過去之蝕刻形成導體圖型時,並不需要使粗化處理部分溶解,可削減蝕刻所需之時間。因此,可形成蝕刻因子良好之電路。就形成更高精細電路之觀點而言,銅箔之表面粗糙度更好為1.8μm以下,又更好為1.5μm以下。 In the present invention, it is preferred to provide an adhesive layer to a copper foil having a surface roughness (Rzjis) of 2 μm or less. Further, when the copper foil itself is subjected to etching processing to form a circuit, it is preferable to use a copper foil which is not subjected to roughening treatment. Moreover, the term "back surface" refers to a surface on which a copper foil is bonded to the side of the resin substrate, and refers to a surface on which an adhesive layer is provided. The copper foil provided with the adhesive layer of the present invention is a smooth copper foil on the surface having a surface roughness (Rzjis) of 2 μm or less, regardless of the type of the electrolytic copper foil and the rolled copper foil, and may be separated by a spacer. The adhesive layer between the copper foil and the resin substrate provides sufficient adhesion strength between the copper foil and the resin substrate. In other words, the copper foil provided with the adhesive layer of the present invention can obtain sufficient adhesion strength to the resin substrate even if it is a non-roughened copper foil, so that it is not necessary to form a conductor pattern by etching in the past. The roughening treatment partially dissolves, and the time required for etching can be reduced. Therefore, a circuit having a good etching factor can be formed. The surface roughness of the copper foil is more preferably 1.8 μm or less, and still more preferably 1.5 μm or less from the viewpoint of forming a higher fine circuit.

另一方面,於採用將本發明之具備接著劑層之銅箔貼合於樹脂基材上獲得貼銅積層板後,蝕刻去除其表面之銅箔,使接著劑層露出, 於其全面設置種晶層(無電解銅層等),在該種晶層上未形成電路之部分形成鍍敷光阻,且僅在形成電路之部分以鍍敷法形成電路之半加成製程(Semi Additive Process=SAP法)時,較好使用施以粗化處理之銅箔。其原因為,藉由使用施以粗化處理之銅箔,可在硬化之接著劑層上殘留該粗化處理之複製形狀,增加接著面之比表面積,而實現與以SAP法形成之電路之密著性提高之故。此時施以粗化處理之銅箔之表面粗糙度(Rzjis)亦較好為2μm以下。接著,將前述接著劑層設置在施以該粗化處理之面上,成為本發明之具備接著劑層之銅箔。該銅箔之表面粗糙度超過2μm時,成為具備較大凹凸形狀之粗化處理之傾向較高,會有難以藉由光刻(flash etching)去除種晶層之傾向,處於電路間之絕緣性降低之傾向故較不佳。又,針對該SAP法詳述於後。 On the other hand, after attaching the copper foil provided with the adhesive layer of the present invention to a resin substrate to obtain a copper-clad laminate, the copper foil on the surface thereof is etched away to expose the adhesive layer. In the case where the seed layer (electroless copper layer, etc.) is completely provided, a plating resist is formed on a portion of the seed layer where no circuit is formed, and a half-addition process for forming a circuit by plating only in a portion where the circuit is formed (Semi Additive Process=SAP method) It is preferred to use a copper foil subjected to roughening treatment. The reason for this is that by using the copper foil subjected to the roughening treatment, the copying shape of the roughening treatment can be left on the hardened adhesive layer, and the specific surface area of the bonding surface can be increased to realize the circuit formed by the SAP method. The adhesion is improved. The surface roughness (Rzjis) of the copper foil subjected to the roughening treatment at this time is also preferably 2 μm or less. Next, the adhesive layer is placed on the surface subjected to the roughening treatment to form a copper foil having an adhesive layer of the present invention. When the surface roughness of the copper foil exceeds 2 μm, the roughening treatment with a large uneven shape tends to be high, and it is difficult to remove the seed layer by flash etching, and insulation between circuits is required. The tendency to lower is therefore less preferred. Further, the SAP method is described in detail later.

又,本發明亦可為對銅箔之表面施以防銹處理,於該防銹處理層之表面設置接著劑層之構成。對銅箔之防銹處理,列舉為使用鋅、鎳、鈷等之無機防銹處理,使用鉻酸鹽之鉻酸鹽處理,使用苯并三唑、咪唑有機劑之有機防銹處理等。又,本發明中,以下,於僅稱銅箔時有時係指已施以防銹處理之銅箔。 Further, in the present invention, the surface of the copper foil may be subjected to a rust-preventing treatment, and an adhesive layer may be provided on the surface of the rust-preventing treatment layer. The anti-rust treatment of the copper foil is exemplified by inorganic rust-preventing treatment using zinc, nickel, cobalt, etc., chromate treatment using chromate, organic rust-preventing treatment using benzotriazole or an imidazole organic agent. Further, in the present invention, the following is a case where the copper foil is referred to as a copper foil which has been subjected to rustproof treatment.

另外,本發明中,亦可為對銅箔之單側表面施以矽烷偶合劑,且在該矽烷偶合劑層之表面設置接著劑層之構成。藉由介隔矽烷偶合劑層將接著劑層設置在銅箔表面,而改善銅箔表面與接著劑層之潤濕性,而成為該具備接著劑層之銅箔貼合於樹脂基材上時之接著強度更良好者,可使貼合之密著性成為更良好者。而且,藉由介隔矽烷偶合劑層,相較於不存在矽烷偶合劑層之情況,可使銅箔更堅固地密著於樹脂基材上。又,本發明中,以下,於僅稱銅箔時,有時指已施以矽烷偶合劑處理之銅箔。 Further, in the present invention, a decane coupling agent may be applied to one side surface of the copper foil, and an adhesive layer may be provided on the surface of the decane coupling agent layer. By providing the adhesive layer on the surface of the copper foil via the decane coupling agent layer, the wettability of the surface of the copper foil and the adhesive layer is improved, and when the copper foil having the adhesive layer is attached to the resin substrate, Then, if the strength is better, the adhesion of the bonding can be made better. Further, by interposing the decane coupling agent layer, the copper foil can be more firmly adhered to the resin substrate than in the case where the decane coupling agent layer is not present. Further, in the present invention, in the following, when only copper foil is used, it may mean a copper foil which has been treated with a decane coupling agent.

至於矽烷偶合劑層,具體而言,可採用胺基官能性矽烷偶合劑層、丙烯酸官能性矽烷偶合劑層、甲基丙烯酸官能性矽烷偶合劑層、乙烯基官能性矽烷偶合劑層、巰基官能性矽烷偶合劑層等之使用各種矽烷偶合劑形成之層。 As the decane coupling agent layer, specifically, an amine functional decane coupling agent layer, an acrylic functional decane coupling agent layer, a methacrylic functional decane coupling agent layer, a vinyl functional decane coupling agent layer, a thiol functional group may be employed. A layer formed of various decane coupling agents, such as a decane coupling agent layer.

形成矽烷偶合劑層時,較好使以0.5g/l~10g/l將矽烷偶合劑溶解於作為溶劑之水中而成者,在室溫程度之溫度下,以浸漬法、淋洗法、 噴霧法等,使銅箔表面與矽烷偶合劑均勻接觸,使矽烷偶合劑均勻吸附於銅箔之表面。矽烷偶合劑係藉由與突出於銅箔表面之OH基縮合鍵結而形成被膜。使用矽烷偶合劑之濃度未達0.5g/l之溶液時,矽烷偶合劑對銅箔表面之吸附速度緩慢,不合於一般在商業基礎之精算故而不適當。另外,亦由於矽烷偶合劑對銅箔之表面不均勻地吸附故較不佳。另一方面,即使使用矽烷偶合劑之濃度超過10g/l之溶液時,吸附速度或均勻吸附性也無法對應地提高,就經濟上之觀點而言較不佳。 When the decane coupling agent layer is formed, it is preferred to dissolve the decane coupling agent in water as a solvent at a temperature of from 0.5 g/l to 10 g/l, at a temperature of room temperature, by a dipping method, a leaching method, The surface of the copper foil is uniformly contacted with the decane coupling agent by a spray method or the like to uniformly adsorb the decane coupling agent on the surface of the copper foil. The decane coupling agent forms a film by condensation bonding with an OH group protruding from the surface of the copper foil. When the concentration of the decane coupling agent is less than 0.5 g/l, the adsorption speed of the decane coupling agent on the surface of the copper foil is slow, which is not suitable for the actuarial calculation based on the commercial basis. In addition, it is also less preferable because the decane coupling agent does not uniformly adsorb the surface of the copper foil. On the other hand, even when a solution having a concentration of the decane coupling agent exceeding 10 g/l is used, the adsorption rate or the uniform adsorption property cannot be correspondingly improved, which is not economically preferable.

形成上述矽烷偶合劑層時使用之矽烷偶合劑,具體而言,列舉為以下者。可使用乙烯基三甲氧基矽烷、乙烯基苯基三甲氧基矽烷、γ-甲基丙醯烯氧基丙基三甲氧基矽烷、γ-縮水甘油氧基丙基三甲氧基矽烷、4-縮水甘油氧基丁基三甲氧基矽烷、γ-胺基丙基三甲氧基矽烷、N-β-(胺基乙基)-γ-胺基丙基三甲氧基矽烷、N-3-(4-(3-胺基丙氧基)丁氧基)丙基-3-胺基丙基三甲氧基矽烷、咪唑基矽烷、三嗪矽烷、γ-巰基丙基三甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷等之矽烷偶合劑。 The decane coupling agent used in the formation of the above decane coupling agent layer is specifically exemplified below. Vinyltrimethoxydecane, vinylphenyltrimethoxydecane, γ-methylpropenyloxypropyltrimethoxydecane, γ-glycidoxypropyltrimethoxydecane, 4-shrinkage can be used. Glyceroxybutyltrimethoxydecane, γ-aminopropyltrimethoxydecane, N-β-(aminoethyl)-γ-aminopropyltrimethoxydecane, N-3-(4- (3-Aminopropoxy)butoxy)propyl-3-aminopropyltrimethoxydecane, imidazolyl decane, triazine decane, γ-mercaptopropyltrimethoxydecane, 3-propene oxime A decane coupling agent such as propyltrimethoxydecane.

又,以下中稱為銅箔時,亦包含於銅箔表面形成矽烷偶合劑層之銅箔者,稱為銅箔表面時,亦包含為矽烷偶合劑層之表面之情況。 Further, when it is referred to as a copper foil hereinafter, a copper foil which forms a layer of a decane coupling agent on the surface of a copper foil is also referred to as a surface of a copper foil, and is also a surface of a layer of a decane coupling agent.

(2) 接著劑層 (2) Subsequent layer

接著,針對接著劑層加以說明。本發明中之特徵,為接著劑層係由對於聚伸苯基醚化合物100質量份含5質量份以上、65質量份以下之苯乙烯丁二烯嵌段共聚物之樹脂組成物所成之層。 Next, the adhesive layer will be described. In the present invention, the adhesive layer is a layer composed of a resin composition containing 5 parts by mass or more and 65 parts by mass or less of the styrene-butadiene block copolymer for 100 parts by mass of the polyphenylene ether compound. .

首先,針對聚伸苯基醚化合物加以說明。聚伸苯基醚化合物就其構造而言耐去膠渣液性高,幾乎不溶解於去膠渣液中。因此,藉由以聚伸苯基醚化合物作為主成分,構成接著劑層,可減少溶解於去膠渣液中之樹脂量。據此,印刷配線板之製造步驟等中,即使為存在有去膠渣處理步驟之情況,於去膠渣處理之前後,接著劑層不會局部溶解,且在去膠渣處理前後,樹脂基材與銅箔之間之密著性亦不會局部降低,在去膠渣處理後仍可確保銅箔與樹脂基材之良好密著性。又,藉由使用聚伸苯基醚化合物,可獲得低介電率及低介電正切之電特性良好之接著劑層。 First, the polyphenylene ether compound will be described. The polyphenylene ether compound is highly resistant to degumming in terms of its structure and hardly dissolves in the desmear liquid. Therefore, by forming a binder layer with a polyphenylene ether compound as a main component, the amount of the resin dissolved in the degreasing liquid can be reduced. According to this, in the manufacturing steps of the printed wiring board and the like, even in the case where the desmear treatment step is present, the adhesive layer is not partially dissolved after the desmear treatment, and the resin base is applied before and after the desmear treatment. The adhesion between the material and the copper foil is not locally lowered, and the good adhesion between the copper foil and the resin substrate can be ensured after the desmear treatment. Further, by using a polyphenylene ether compound, an adhesive layer having good dielectric properties of low dielectric constant and low dielectric tangent can be obtained.

本發明中使用之聚伸苯基醚化合物係以下通式表示。但,下 述通式中,R1、R2、R3、R4分別表示氫原子或碳數1~3之烴基。 The polyphenylene ether compound used in the present invention is represented by the following formula. But, under In the above formula, R1, R2, R3 and R4 each represent a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms.

Figure TWI609779BD00001
Figure TWI609779BD00001

作為上述聚伸苯基醚化合物,具體而言,可使用聚(2,6-二甲基-1,4-伸苯基)醚、聚(2,6-二乙基-1,4-伸苯基)醚、聚(2,6-二丙基-1,4-伸苯基)醚等。又,以上述通式表示之聚伸苯基醚化合物中,較好末端基為羥基。然而,本發明中,不僅是末端基為羥基之聚伸苯基醚化合物,亦可視需要較好地使用具有苯乙烯基或縮水甘油基之化合物,藉由習知之方法,使末端基改質之苯乙烯改質聚伸本基醚化合物,或亦可較好地使用縮水甘油基改質之聚伸苯基醚化合物等。另外,亦可使用該等之市售品。 As the above polyphenylene ether compound, specifically, poly(2,6-dimethyl-1,4-phenylene) ether, poly(2,6-diethyl-1,4-extension) can be used. Phenyl)ether, poly(2,6-dipropyl-1,4-phenylene)ether, and the like. Further, in the polyphenylene ether compound represented by the above formula, the terminal group is preferably a hydroxyl group. However, in the present invention, not only a polyphenylene ether compound having a terminal group of a hydroxyl group but also a compound having a styryl group or a glycidyl group can be preferably used, and the terminal group is modified by a conventional method. The styrene-modified polycondensation-based ether compound may be preferably a glycidyl-modified polyphenylene ether compound or the like. In addition, such commercial products can also be used.

聚伸苯基醚化合物之數平均分子量較好為500~4000,更好為1000~3000。聚伸苯基醚化合物之數平均分子量未達500時,所得接著劑層之可撓性變低故不佳。另一方面,聚伸苯基醚化合物之數平均分子量超過4000時,對於甲基乙基酮或甲苯等之溶劑的溶解性變低故較不佳。 The number average molecular weight of the polyphenylene ether compound is preferably from 500 to 4,000, more preferably from 1,000 to 3,000. When the number average molecular weight of the polyphenylene ether compound is less than 500, the flexibility of the obtained adhesive layer becomes low, which is not preferable. On the other hand, when the number average molecular weight of the polyphenylene ether compound exceeds 4,000, the solubility in a solvent such as methyl ethyl ketone or toluene becomes low, which is not preferable.

接著,針對苯乙烯丁二烯嵌段共聚物加以說明。苯乙烯丁二烯嵌段共聚物為對聚伸苯基醚化合物聚合(交聯)之成分。藉由使聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物聚合,利用源自丁二烯構造體部分之高柔軟性,使該接著劑層顯示彈性、可撓性。尤其,使用苯乙烯改質之聚伸苯基醚化合物或縮水甘油基改質之聚伸苯基醚化合物時,該傾向變得顯著。其結果,使接著劑層對銅箔之密著性提高,同時亦可提高耐龜裂性。而且,使用該具備接著劑層之銅箔製造印刷配線板時,可使電路之撕離強度成為實用上所要求之值。另外,藉由使用該苯乙烯丁二烯嵌段共聚物, 可提高耐吸濕劣化特性,可防止撕離強度在多濕環境下經時劣化。再者,苯乙烯丁二烯嵌段共聚物由於極性基較少,對於聚伸苯基醚化合物所具有之低介電特性造成之影響較少,故可維持源自聚伸苯基醚化合物之低介電率及低介電正切之良好電特性。 Next, the styrene butadiene block copolymer will be described. The styrene butadiene block copolymer is a component which polymerizes (crosslinks) a polyphenylene ether compound. By polymerizing the polyphenylene ether compound and the styrene butadiene block copolymer, the adhesive layer exhibits elasticity and flexibility by utilizing high flexibility derived from the butadiene structure portion. In particular, when a styrene-modified polyphenylene ether compound or a glycidyl-modified polyphenylene ether compound is used, this tendency becomes remarkable. As a result, the adhesion of the adhesive layer to the copper foil is improved, and the crack resistance can be improved. Further, when a printed wiring board is produced using the copper foil having the adhesive layer, the tear strength of the circuit can be made practically required. In addition, by using the styrene butadiene block copolymer, The hygroscopic deterioration resistance property can be improved, and the tear strength can be prevented from deteriorating over time in a humid environment. Furthermore, the styrene butadiene block copolymer has less influence on the low dielectric properties of the polyphenylene ether compound due to the less polar group, and thus can be maintained from the polyphenylene ether compound. Good electrical properties of low dielectric and low dielectric tangent.

接著,針對聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物之調配比加以說明。本發明中,對於聚伸苯基醚化合物100質量份,較好以5質量份以上、65質量份以下之範圍使用苯乙烯丁二烯嵌段共聚物。苯乙烯丁二烯嵌段共聚物相對於聚伸苯基醚化合物100質量份超過65質量份時,常態時之撕離強度降低,且,利用PCT(壓力鍋試驗)等進行高溫高濕環境下之加速試驗時,難以維持市場所要求水準之PCT後之撕離強度故較不佳。另外,苯乙烯丁二烯嵌段共聚物相對於聚伸苯基醚化合物100質量份未達5質量份時,除成膜困難以外,亦無法獲得充分之彈性、可撓性故不佳。此處,苯乙烯丁二烯嵌段共聚物相對於聚伸苯基醚化合物100質量份之調配比更好為10質量份以上,又更好為20質量份以上。藉由對於聚伸苯基醚化合物100質量份調配10質量份以上,較好20質量份以上之苯乙烯丁二烯嵌段共聚物,使成膜變得容易,且可對接著劑層賦予彈性及可撓性。 Next, the compounding ratio of the polyphenylene ether compound to the styrene butadiene block copolymer will be described. In the present invention, the styrene butadiene block copolymer is preferably used in an amount of from 5 parts by mass to 65 parts by mass per 100 parts by mass of the polyphenylene ether compound. When the styrene-butadiene block copolymer is more than 65 parts by mass based on 100 parts by mass of the polyphenylene ether compound, the tear strength is lowered in a normal state, and the PCT (pressure cooker test) or the like is used in a high-temperature and high-humidity environment. When accelerating the test, it is difficult to maintain the required peeling strength of the PCT after the market is required. In addition, when the styrene-butadiene block copolymer is less than 5 parts by mass based on 100 parts by mass of the polyphenylene ether compound, it is difficult to obtain sufficient elasticity and flexibility, and it is not preferable. Here, the blending ratio of the styrene-butadiene block copolymer to 100 parts by mass of the polyphenylene ether compound is more preferably 10 parts by mass or more, still more preferably 20 parts by mass or more. By disposing 10 parts by mass or more, preferably 20 parts by mass or more of the styrene butadiene block copolymer, 100 parts by mass of the polyphenylene ether compound, film formation becomes easy, and elasticity can be imparted to the adhesive layer. And flexibility.

另外,就常態時之撕離強度高,且耐吸濕劣化特性高之觀點而言,更好相對於聚伸苯基醚化合物100質量份以30質量份~55質量份之範圍調配苯乙烯丁二烯嵌段共聚物,又更好相對於聚伸苯基醚化合物100質量份以35質量份~45質量份之範圍調配苯乙烯丁二烯嵌段共聚物。藉由相對於聚伸苯基醚化合物100質量份以30質量份~55質量份之範圍調配苯乙烯丁二烯嵌段共聚物,而使常態時及PCT後之任一情況之撕離強度變高,可降低PCT前後之撕離強度之劣化率。藉由相對於聚伸苯基醚化合物100質量份以35質量份~45質量份之範圍調配苯乙烯丁二烯嵌段共聚物,而使PCT後之撕離強度變得更高,且使PCT前後之撕離強度之劣化率更為減低。 In addition, from the viewpoint of high tear strength in the normal state and high moisture absorption deterioration resistance, it is more preferable to formulate styrene butyl 2 to 100 parts by mass to 55 parts by mass based on 100 parts by mass of the polyphenylene ether compound. The olefin block copolymer further preferably has a styrene butadiene block copolymer in an amount of from 35 parts by mass to 45 parts by mass based on 100 parts by mass of the polyphenylene ether compound. By blending the styrene butadiene block copolymer in an amount of from 30 parts by mass to 55 parts by mass based on 100 parts by mass of the polyphenylene ether compound, the tear strength in any of the normal state and after the PCT is changed. High, can reduce the degradation rate of tear strength before and after PCT. By blending the styrene butadiene block copolymer in an amount of from 35 parts by mass to 45 parts by mass relative to 100 parts by mass of the polyphenylene ether compound, the tear strength after PCT is made higher, and the PCT is made The deterioration rate of the tear strength before and after is further reduced.

又,視需要,上述樹脂組成物亦可為含有環氧樹脂、硬化劑、硬化促進劑、熱可塑性粒子、著色劑、抗氧化劑、難燃劑、偶合劑等各種添加劑之構成。該等各種添加劑在不脫離本發明精神之範圍內可以適宜量 添加。 Further, the resin composition may be composed of various additives such as an epoxy resin, a curing agent, a curing accelerator, a thermoplastic particle, a colorant, an antioxidant, a flame retardant, and a coupling agent, as needed. The various additives may be suitably present within the scope of the spirit of the invention. Add to.

接著,針對接著劑層之厚度加以說明。本發明中,接著劑層之厚度(厚度計測得之厚度)較好在0.5μm~10μm之範圍內。接著劑層之厚度未達0.5μm時,接著劑層過薄,無法提高銅箔與接著劑層之密著性。相對於此,即使接著劑層之厚度即使超過10μm,銅箔與接著劑層之密著性亦無法對應地提高至其以上,會造成資源的浪費故不佳。 Next, the thickness of the adhesive layer will be described. In the present invention, the thickness of the adhesive layer (thickness measured by thickness) is preferably in the range of 0.5 μm to 10 μm. When the thickness of the subsequent layer is less than 0.5 μm, the adhesive layer is too thin, and the adhesion between the copper foil and the adhesive layer cannot be improved. On the other hand, even if the thickness of the adhesive layer exceeds 10 μm, the adhesion between the copper foil and the adhesive layer cannot be increased correspondingly, and the waste of resources is not preferable.

(3) 填充劑粒子 (3) filler particles

接著,針對填充劑粒子加以說明。本發明中如上述般,接著劑層亦可設為包含填充劑粒子之構成。藉由於接著劑層中含有填充劑粒子,相較於不含填充劑粒子之接著劑層,可提高常態時之撕離強度及耐吸濕劣化特性。另外,由上述樹脂組成物所成之接著劑層中含有填充劑粒子時,藉由使用施以特定之表面處理之填充劑粒子,而成為接著劑層與銅箔之密著性更為良好者,可更堅固地密著該具備接著劑層之銅箔與樹脂基材。其結果,可進一步提高撕離強度,且可抑制脫層之產生。 Next, the filler particles will be described. In the present invention, as described above, the adhesive layer may be configured to include filler particles. By containing the filler particles in the adhesive layer, the tear strength and the moisture absorption deterioration resistance in the normal state can be improved as compared with the adhesive layer containing no filler particles. Further, when the filler particles are formed in the adhesive layer formed of the above resin composition, the adhesion of the adhesive layer to the copper foil is further improved by using the filler particles to which the specific surface treatment is applied. The copper foil and the resin substrate having the adhesive layer can be adhered more firmly. As a result, the tear strength can be further improved, and the occurrence of delamination can be suppressed.

本發明中可使用之填充劑粒子,可列舉為熔融二氧化矽、結晶性二氧化矽、氧化鋁、氫氧化鋁、碳酸鈣、硫酸鋇、雲母、滑石等。可使用該等之任一種或混合兩種以上使用。 The filler particles usable in the present invention may, for example, be molten cerium oxide, crystalline cerium oxide, aluminum oxide, aluminum hydroxide, calcium carbonate, barium sulfate, mica or talc. Any one of these may be used or a mixture of two or more types may be used.

本發明中使用之填充劑粒子較好以矽烷偶合劑進行表面處理者。至於矽烷偶合劑,可使用胺基官能性矽烷偶合劑、丙烯酸官能性矽烷偶合劑、甲基丙烯酸官能性矽烷偶合劑、環氧官能性矽烷偶合劑、烯烴官能性矽烷偶合劑、巰基官能性矽烷偶合劑、乙烯基官能性矽烷偶合劑等各種矽烷偶合劑。上述中,更好為胺基官能性矽烷偶合劑、丙烯酸官能性矽烷偶合劑、甲基丙烯酸官能性矽烷偶合劑、乙烯基官能性矽烷偶合劑等。 The filler particles used in the present invention are preferably surface-treated with a decane coupling agent. As the decane coupling agent, an amine functional decane coupling agent, an acrylic functional decane coupling agent, a methacrylic functional decane coupling agent, an epoxy functional decane coupling agent, an olefin functional decane coupling agent, a thiol functional decane can be used. Various decane coupling agents such as a coupling agent and a vinyl functional decane coupling agent. Among the above, an amine functional decane coupling agent, an acrylic functional decane coupling agent, a methacrylic acid functional decane coupling agent, a vinyl functional decane coupling agent, and the like are more preferable.

藉由對於該等填充劑粒子,施以上述表面處理,可提高與溶劑之潤濕性,可使填充劑粒子良好地分散於樹脂溶液中。其結果,可使填充劑粒子均勻地分散於層內而獲得接著劑層。另外,藉由對填充劑粒子施以上述表面處理,而成為填充劑粒子與上述樹脂組成物之相溶性良好者,亦可成為填充劑粒子與樹脂組成物之密著性良好者。 By applying the above surface treatment to the filler particles, the wettability with the solvent can be improved, and the filler particles can be favorably dispersed in the resin solution. As a result, the filler particles can be uniformly dispersed in the layer to obtain an adhesive layer. In addition, by applying the surface treatment to the filler particles, the compatibility between the filler particles and the resin composition is good, and the adhesion between the filler particles and the resin composition can be improved.

作為上述矽烷偶合劑,具體列舉以下者。首先,作為胺基酸官能性矽烷偶合劑,列舉為N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-三乙氧基矽烷基-N-(1,3-二甲基-亞丁基)丙基胺、N-苯基-3-胺基丙基三甲氧基矽烷等。 Specific examples of the above decane coupling agent include the following. First, as the amino acid functional decane coupling agent, it is exemplified as N-2-(aminoethyl)-3-aminopropylmethyldimethoxydecane, N-2-(aminoethyl)- 3-aminopropyltrimethoxydecane, 3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxydecane, 3-triethoxydecyl-N-(1,3- Dimethyl-butylidene)propylamine, N-phenyl-3-aminopropyltrimethoxydecane, and the like.

至於甲基丙烯酸官能性矽烷偶合劑、丙烯酸官能性矽烷偶合劑,列舉為3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷等。 As for the methacrylic acid functional decane coupling agent and the acrylic functional decane coupling agent, it is exemplified by 3-methacryloxypropylmethyldimethoxydecane and 3-methylpropenyloxypropyltrimethoxy. Decane, 3-methacryloxypropylmethyldiethoxydecane, 3-methylpropenyloxypropyltriethoxydecane, 3-propenyloxypropyltrimethoxydecane, and the like.

又,作為乙烯官能性矽烷偶合劑,列舉為乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基苯基三乙氧基矽烷等。 Further, examples of the ethylene functional decane coupling agent include vinyltrimethoxydecane, vinyltriethoxysilane, vinylphenyltriethoxysilane, and the like.

再者,亦可使用甲基三甲氧基矽烷、二甲基二甲氧基矽烷、苯基三甲氧基矽烷、甲基三乙氧基矽烷、二甲基二乙氧基矽烷、苯基三乙氧基矽烷等之烷氧基矽烷。 Further, methyltrimethoxydecane, dimethyldimethoxydecane, phenyltrimethoxydecane, methyltriethoxydecane, dimethyldiethoxydecane, phenyltriethyl may also be used. An alkoxy decane such as oxydecane.

使用該等矽烷偶合劑之表面處理方法並無特別限制,可使用適當、適切之方法進行。 The surface treatment method using these decane coupling agents is not particularly limited, and it can be carried out by an appropriate and appropriate method.

另外,接著劑層中含有填充劑粒子時,其含有率較好為40質量%以下。其原因為若填充劑粒子之含有率超過40質量%,則構成接著劑層之樹脂組成物與銅箔之接觸面積降低,使接著強度急遽下降之故。 Further, when the filler particles are contained in the adhesive layer, the content thereof is preferably 40% by mass or less. When the content of the filler particles exceeds 40% by mass, the contact area between the resin composition constituting the adhesive layer and the copper foil is lowered, and the strength of the bonding is rapidly lowered.

另外,接著劑層中含有之填充劑粒子,較好使用以雷射繞射散射式粒度分布測定方法測定之體積累積粒徑D50之值為0.01μm~1.0μm之範圍內者,更好使用0.01μm~0.5μm之範圍內者。填充劑粒子之該體積累積粒徑D50之值未達0.01μm時,填充劑粒子太過於微粒,故於形成接著劑層時調製之樹脂溶液中難以均勻分散故較不佳。另一方面,填充劑粒子之該體積累積粒徑D50之值超過1.0μm時,會有銅箔與樹脂層之密著性降低之情況故較而不佳。就該觀點而言,填充劑粒子之該體積累積粒徑D50更好為0.5μm以下。藉由使用如此微粒之填充劑粒子,可進一步提高使用該具備接著劑層之銅箔形成電路時之撕離強度。 Further, filler particles comprising the next layer, it is preferred to use a laser diffraction scattering measuring particle size distribution measuring method of volume cumulative particle diameter D 50 is in a range of 0.01μm ~ 1.0μm of persons, make better use of Within the range of 0.01 μm to 0.5 μm. When the value of the volume cumulative particle diameter D 50 of the filler particles is less than 0.01 μm, the filler particles are too fine particles, so that it is difficult to uniformly disperse in the resin solution prepared when the adhesive layer is formed, which is not preferable. On the other hand, when the value of the volume cumulative particle diameter D 50 of the filler particles exceeds 1.0 μm, the adhesion between the copper foil and the resin layer may be lowered, which is not preferable. From this point of view, the volume cumulative particle diameter D 50 of the filler particles is more preferably 0.5 μm or less. By using the filler particles of such fine particles, the tear strength at the time of forming a circuit using the copper foil having the adhesive layer can be further improved.

〈具備接著劑層之銅箔之製造方法〉 <Method for Producing Copper Foil with Adhesive Layer>

接著,說明上述具備接著劑層之銅箔之製造方法之一例。上述具備接著劑層之銅箔之製造步驟,可例如大致分成(1)樹脂溶液調製步驟,(2)樹脂溶液塗佈步驟,及(3)乾燥步驟。以下針對各步驟加以說明。 Next, an example of a method of producing the copper foil having the adhesive layer described above will be described. The manufacturing step of the copper foil having the adhesive layer described above can be roughly divided into, for example, (1) a resin solution preparation step, (2) a resin solution coating step, and (3) a drying step. The following describes each step.

(1) 樹脂溶液調製步驟 (1) Resin solution preparation step

樹脂溶液調製步驟為調製相對於聚伸苯基醚化合物100質量份以5質量份~65質量份之範圍含苯乙烯丁二烯嵌段共聚物,同時使樹脂固體成分濃度成為10質量%~40質量%之樹脂溶液之步驟。調製該樹脂溶液時,可例如使以預定之調配比混合聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物而成之樹脂組成物溶解於溶劑中,亦可以使聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物分別溶解於溶劑者,以使聚伸苯基醚化合物及苯乙烯丁二烯嵌段共聚物成為特定之調配比之方式予以混合,樹脂溶液之調製方法並無特別限制。 The resin solution preparation step is to prepare a styrene-butadiene block copolymer in a range of 5 parts by mass to 65 parts by mass based on 100 parts by mass of the polyphenylene ether compound, and the solid content of the resin is 10% by mass to 40%. The step of mass% of the resin solution. When the resin solution is prepared, for example, a resin composition obtained by mixing a polyphenylene ether compound and a styrene butadiene block copolymer in a predetermined blending ratio may be dissolved in a solvent, or a polyphenylene ether may be obtained. The compound and the styrene butadiene block copolymer are respectively dissolved in a solvent, so that the polyphenylene ether compound and the styrene butadiene block copolymer are mixed in a specific blending ratio, and the resin solution is prepared. There are no special restrictions.

該步驟中使用之聚伸苯基醚化合物由於可使用與上述聚伸苯基醚化合物相同者,故於此處省略其說明。同樣地,苯乙烯丁二烯嵌段共聚物由於可使用與上述苯乙烯丁二烯嵌段共聚物相同者,故針對苯乙烯丁二烯嵌段共聚物亦省略說明。又,針對樹脂組成物中之聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物之調配比,也與上述接著劑層中之聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物之調配比相同,故此處針對聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物之調配比中之較佳範圍等之記載亦省略說明。 Since the polyphenylene ether compound used in this step can be the same as the above-mentioned polyphenylene ether compound, the description thereof is omitted here. Similarly, since the styrene butadiene block copolymer can be used in the same manner as the above styrene butadiene block copolymer, the description of the styrene butadiene block copolymer will be omitted. Further, the compounding ratio of the polyphenylene ether compound to the styrene butadiene block copolymer in the resin composition is also the block of the polyphenylene ether compound and the styrene butadiene block in the above adhesive layer. Since the blending ratio of the copolymer is the same, the description of the preferred range of the blending ratio of the polyphenylene ether compound to the styrene butadiene block copolymer is omitted.

至於樹脂溶液之溶劑,可使用甲基乙基酮等酮系溶劑、或甲苯等芳香族系溶劑。藉由使用該等溶劑容易使樹脂組成物溶解,且樹脂溶液之黏度之調整亦變容易。另外,該等溶劑之任一種在貼合該具備接著劑層之銅箔與樹脂基材時之加熱加壓時可效率良好地使溶劑揮發,揮發之氣體之淨化處理亦容易。 As the solvent of the resin solution, a ketone solvent such as methyl ethyl ketone or an aromatic solvent such as toluene can be used. The resin composition is easily dissolved by using the solvent, and the viscosity of the resin solution is adjusted easily. In addition, when any of these solvents is heated and pressurized when the copper foil having the adhesive layer is bonded to the resin substrate, the solvent can be volatilized efficiently, and the purification process of the volatilized gas is also easy.

另外,藉由使樹脂固體成分濃度成為10質量%~40質量%,可使溶液黏度成為適當者,且將樹脂溶液塗佈於銅箔表面上時,可精度良好地形成期望膜厚之塗佈膜。樹脂固體成分濃度未達10質量%時,溶液黏度低,樹脂溶液剛塗佈於銅箔表面後會流動,而難以形成膜厚均勻之塗佈 膜。另一方面,樹脂固體成分濃度超過40質量%時,由於溶液黏度過高,故難以形成10μm以下之塗佈膜。 In addition, when the resin solid content concentration is 10% by mass to 40% by mass, the solution viscosity can be made appropriate, and when the resin solution is applied onto the surface of the copper foil, the coating of the desired film thickness can be accurately formed. membrane. When the solid content of the resin is less than 10% by mass, the viscosity of the solution is low, and the resin solution flows immediately after being applied to the surface of the copper foil, and it is difficult to form a coating having a uniform film thickness. membrane. On the other hand, when the resin solid content concentration exceeds 40% by mass, since the solution viscosity is too high, it is difficult to form a coating film of 10 μm or less.

又,接著劑層中含有填充劑粒子時,係將於該階段中施以特定表面處理之填充劑粒子適量地混合於樹脂組成物中。填充劑粒子及表面處理、調配量等由於係如上述,故此處省略說明。另外,以下稱為樹脂組成物時,有時亦包含樹脂組成物含有填充劑粒子之情況。 Further, when the filler layer is contained in the adhesive layer, the filler particles which have been subjected to the specific surface treatment in this stage are appropriately mixed in the resin composition. Since the filler particles, the surface treatment, the blending amount, and the like are as described above, the description thereof is omitted here. In addition, when it is hereinafter referred to as a resin composition, the resin composition may contain a filler particle.

(2) 樹脂溶液塗佈步驟 (2) Resin solution coating step

樹脂溶液塗佈步驟係以使乾燥後之接著劑層之厚度成為0.5μm~10μm之方式,將該樹脂溶液塗佈於銅箔之單面上之步驟。塗佈樹脂溶液時之塗佈方法並無特別限制,只要依據形成之接著劑層之厚度,採用適當、適切之方法即可。然而,考慮形成0.1μm~10μm之極薄接著劑層時,較好採用有利於薄膜形成之方法,例如較好使用凹版塗佈器,將樹脂溶液塗佈於銅箔表面。 The resin solution coating step is a step of applying the resin solution to one side of the copper foil so that the thickness of the adhesive layer after drying is 0.5 μm to 10 μm. The coating method at the time of applying the resin solution is not particularly limited as long as it is appropriate and appropriate depending on the thickness of the formed adhesive layer. However, in consideration of forming an extremely thin adhesive layer of 0.1 μm to 10 μm, a method advantageous for film formation is preferably employed, and for example, a gravure coater is preferably used to apply a resin solution on the surface of the copper foil.

(3) 乾燥步驟 (3) Drying step

乾燥方法可依據過去習知之方法適當地進行,並無特別限制。藉由該步驟,使溶劑自塗佈膜揮發,同時使樹脂組成物之硬化反應在中間階段結束而成為半硬化狀態樹脂。藉由以上之步驟,可製造本發明之具備接著劑層之銅箔。 The drying method can be suitably carried out according to a conventionally known method, and is not particularly limited. By this step, the solvent is volatilized from the coating film, and the hardening reaction of the resin composition is terminated at the intermediate stage to become a semi-hardened state resin. By the above steps, the copper foil with the adhesive layer of the present invention can be produced.

〈貼銅積層板〉 <Copper laminated board>

接著,說明本發明之貼銅積層板之實施形態。本發明之貼銅積層板之特徵為使用上述本發明之具備接著劑層之銅箔。此處,如所周知,所謂貼銅積層板係指將銅箔置於將絕緣性樹脂含浸於紙、或玻璃布等而成之薄片以必要片數重疊之預浸片、紙酚樹脂基材等樹脂基材之一面或兩面上,經加熱加壓層合而成之板,且作為印刷配線板之製造材料使用。本發明中,作為載置於預浸體等之樹脂基材上之銅箔,係使用上述具備接著劑層之銅箔。接著,以使具備接著劑層之銅箔之接著劑層側面向樹脂基材之接著面側之方式,將該具備接著劑層之銅箔載置於樹脂基材之接著面上,並經加熱加壓。藉此,使樹脂基材之樹脂與接著劑層分別以熔融、硬化之過程,使樹脂基材之樹脂與接著劑層一體化,且使樹脂基材與銅箔堅固地密著。 Next, an embodiment of the copper-clad laminate of the present invention will be described. The copper-clad laminate of the present invention is characterized in that the copper foil having the adhesive layer of the present invention described above is used. Here, as is well-known, the copper-clad laminate is a prepreg sheet or a paper phenol resin substrate in which a copper foil is placed on a sheet obtained by impregnating an insulating resin with paper or glass cloth, and the number of sheets is overlapped. A plate obtained by laminating one or both sides of a resin substrate by heat and pressure, and used as a material for manufacturing a printed wiring board. In the present invention, as the copper foil placed on the resin substrate such as the prepreg, the above-described copper foil having the adhesive layer is used. Next, the copper foil having the adhesive layer is placed on the back surface of the resin substrate so that the side surface of the adhesive layer of the copper foil having the adhesive layer is on the adhesive surface side of the resin substrate, and is heated. Pressurize. Thereby, the resin of the resin base material and the adhesive layer are melted and hardened, and the resin of the resin base material and the adhesive layer are integrated, and the resin base material and the copper foil are firmly adhered.

〈印刷配線板〉 <Printed wiring board>

另外,本發明之印刷配線板之特徵為使用上述本發明之具備接著劑層之銅箔者,較好使用上述貼銅積層板。而且,本發明之印刷配線板當然亦可為多層印刷配線板,例如,可為使用該具備接著劑層之銅箔形成增層(build up)印刷配線板。另外,該印刷配線板亦可由貼銅積層板使用任何方法製造。 Further, the printed wiring board of the present invention is characterized in that the copper-clad laminate having the adhesive layer of the present invention is preferably used. Further, the printed wiring board of the present invention may of course be a multilayer printed wiring board. For example, a build-up printed wiring board may be formed using the copper foil provided with the adhesive layer. Further, the printed wiring board may be manufactured by any method using a copper-clad laminate.

本發明之貼銅積層板亦可較好地使用於以上述半加成法(semi Additive Process=SAP法)製造印刷配線板之情況。亦即,藉由使用利用本發明之具備接著劑層之銅箔之貼銅積層板,而可防止最終形成之電路與樹脂基材之密著性之下降之故。至於一般之SAP法,係採用以下所述之SAP-1或SAP-2之任一種製程。 The copper-clad laminate of the present invention can also be preferably used in the case of producing a printed wiring board by the above-described semi-additive process (SAP method). In other words, by using the copper-clad laminate using the copper foil having the adhesive layer of the present invention, it is possible to prevent the adhesion between the finally formed circuit and the resin substrate from being lowered. As for the general SAP method, any one of SAP-1 or SAP-2 described below is employed.

SAP-1:「完全蝕刻去除貼銅積層板之銅箔」→「以雷射法進行開孔加工」→「去膠渣處理」→「進行無電解銅電鍍,於樹脂基材上形成成為種晶層之無電解銅層」→「於未形成無電解銅層之電路之部位形成鍍敷光阻」→「以銅電鍍在無鍍敷光阻之部位上進行電路形成」→「剝離鍍敷光阻」→「以光刻法去除位於未形成電路之部位的無電解銅層」→「完成電路」 SAP-1: "To completely remove the copper foil of the copper-clad laminate" → "Drilling by laser method" → "Slag removal treatment" → "Electroless copper plating, forming a seed on a resin substrate "The electroless copper layer of the crystal layer" → "The plating resist is formed in the portion where the electroless copper layer is not formed" → "The circuit is formed by plating on the portion where the photoresist is not plated by copper plating" → "Peeling plating" "Photoresist" → "Photolithography to remove the electroless copper layer in the part where the circuit is not formed" → "Complete the circuit"

採用上述之SAP-1之製程時,為了完全蝕刻去除開孔加工前之貼銅積層板之銅箔,而藉由使其全面曝露並浸蝕於去膠渣溶液中,藉此,一般而言,所形成之穿孔內壁利用去膠渣處理而浸蝕及會有最終形成之電路與樹脂基材之密著性下降之傾向。然而,該SAP-1之製程中,使用本發明之貼銅積層板時,即使在開孔加工前完全蝕刻去除貼銅積層板之銅箔,樹脂基材之表面上仍存在耐去膠渣性能優異之接著劑層,故即使使全面曝露於去膠渣溶液中,亦可抑制最終形成之電路與樹脂基材的密著性之降低。 In the above-mentioned process of SAP-1, in order to completely etch and remove the copper foil of the copper-clad laminate before the hole processing, by fully exposing it and etching it into the desmear solution, in general, The formed inner wall of the perforation is etched by the desmear treatment and the adhesiveness of the finally formed circuit and the resin substrate tends to decrease. However, in the process of the SAP-1, when the copper-clad laminate of the present invention is used, even if the copper foil of the copper-clad laminate is completely etched and removed before the hole processing, the desmear resistance is still present on the surface of the resin substrate. Since the adhesive layer is excellent, even if it is fully exposed to the desmearing solution, the adhesion between the finally formed circuit and the resin substrate can be suppressed.

SAP-2:「以雷射法進行之開孔加工」→「去膠渣處理」→「完全蝕刻去除貼銅積層板之銅箔」→「進行無電解銅電鍍,於樹脂基材上形成成為種晶層之無電解銅層」→「於未形成無電解銅層之電路之部位上形成鍍敷光阻」→「以銅電鍍在無鍍敷光阻之部位上進行電路形成」→「剝離鍍敷光阻」→「以光刻法去除位於未形成電路之部位的無電解銅層」 →「完成電路」 SAP-2: "Drilling by laser method" → "Slag removal" → "To completely remove the copper foil of the copper-clad laminate" → "Pre-electrolytic copper plating, forming on the resin substrate "The electroless copper layer of the seed layer" → "The plating resist is formed on the portion of the circuit where the electroless copper layer is not formed" → "The circuit is formed by copper plating on the portion where the photoresist is not plated" → "Peeling Plated photoresist" → "Photolithography removes the electroless copper layer at the portion where the circuit is not formed" → "Complete circuit"

採用該SAP-2之製程時,完全蝕刻去除貼銅積層板之銅箔之前,由於以雷射法進行開孔加工,且進行去膠渣處理,故形成之穿孔周圍存在之接著劑層會有因去膠渣處理而浸蝕之傾向。然而,該SAP-2之製程中,使用本發明之貼銅積層板時,形成之穿孔開孔部周圍存在之接著劑層由於耐去膠渣性能優異,故可防止該部分因去膠渣處理造成之浸蝕,因而可維持焊盤(1and)形成部與樹脂基材之良好密著性故而較佳。 In the process of using the SAP-2, before the copper foil of the copper-clad laminate is completely etched and removed, since the hole is processed by the laser method and the desmear treatment is performed, the adhesive layer existing around the formed perforation may be The tendency to etch due to desmear treatment. However, in the process of the SAP-2, when the copper-clad laminate of the present invention is used, the adhesive layer existing around the perforated opening portion is excellent in the desmear resistance, so that the portion can be prevented from being treated by the desmear. Since the etching is caused, it is preferable to maintain good adhesion between the pad forming portion and the resin substrate.

上述說明之本發明之具備接著劑層之銅箔、貼銅積層板及印刷配線板之實施形態只不過為本發明之一樣態,當然在不離本發明精神之範圍內可進行適當之變更。另外,以下列舉實施例更具體說明本發明,但本發明當然不受以下實施例之限制。以下之比較例1~比較例3係為進行與實施例1~實施例5之對比者。而且,比較例4係為與實施例6進行對比者。 The embodiments of the copper foil, the copper-clad laminate, and the printed wiring board having the adhesive layer of the present invention described above are merely the same as those of the present invention, and may be appropriately modified without departing from the spirit of the invention. Further, the present invention will be more specifically described by the following examples, but the present invention is of course not limited by the following examples. The following Comparative Examples 1 to 3 are the same as those of Examples 1 to 5. Further, Comparative Example 4 is compared with Example 6.

[實施例1] [Example 1] 〈具備接著劑層之銅箔之製造〉 <Manufacture of Copper Foil with Adhesive Layer>

於實施例1,係如下述般製造具備接著劑層之銅箔。首先,於具備攪拌裝置、溫度調節機、回流管之1升4頸燒瓶中,饋入聚伸苯基醚樹脂(SABIC公司製造;MX-90)200g與甲苯400g,在60℃攪拌溶解。接著,於該燒瓶內,導入氯甲基苯乙烯10g,經攪拌溶解,使液溫成為80℃。接著,邊攪拌邊滴加導入氫氧化納50質量%水溶液24g,在80℃下持續攪拌3小時。接著,以1N鹽酸水溶液中和內容物後,添加甲醇使化合物沉澱,並經過濾。以甲醇水溶液(甲醇:蒸餾水=4:1)洗淨過濾物兩次後,乾燥去除溶劑、水分,獲得聚伸苯基醚化合物。 In Example 1, a copper foil provided with an adhesive layer was produced as follows. First, 200 g of polyphenylene ether resin (manufactured by SABIC Co., Ltd.; MX-90) and 400 g of toluene were fed into a one-liter four-necked flask equipped with a stirring device, a temperature regulator, and a reflux tube, and the mixture was stirred and dissolved at 60 °C. Next, 10 g of chloromethylstyrene was introduced into the flask, and the mixture was stirred and dissolved to adjust the liquid temperature to 80 °C. Next, 24 g of a 50% by mass aqueous solution of sodium hydroxide was added dropwise thereto with stirring, and stirring was continued at 80 ° C for 3 hours. Next, the content was neutralized with a 1 N aqueous hydrochloric acid solution, and then methanol was added to precipitate a compound, followed by filtration. After washing the filtrate twice with an aqueous methanol solution (methanol: distilled water = 4:1), the solvent and water were removed by drying to obtain a polyphenylene ether compound.

接著,使上述獲得之聚伸苯基醚化合物溶解於甲苯中,調製50質量%之聚伸苯基醚化合物溶液。又,使苯乙烯丁二烯嵌段共聚物(JSR股份有限公司製造;TR2003)溶解於甲苯中,調製30質量%之苯乙烯丁二烯嵌段共聚物溶液。以使苯乙烯丁二烯嵌段共聚物相對於聚伸苯基醚化合物100質量份成為10質量份之方式混合二者,同時使樹脂固體成分濃度成為25%之方式調製樹脂溶液(清漆料)。 Next, the polyphenylene ether compound obtained above was dissolved in toluene to prepare a 50% by mass solution of the polyphenylene ether compound. Further, a styrene butadiene block copolymer (manufactured by JSR Co., Ltd.; TR2003) was dissolved in toluene to prepare a 30% by mass styrene butadiene block copolymer solution. The styrene butadiene block copolymer is mixed with 100 parts by mass of the polyphenylene ether compound in an amount of 10 parts by mass, and the resin solution (varnish) is prepared so that the resin solid content concentration becomes 25%. .

接著,對3μm厚之附載體之極薄無粗化銅箔(表面粗糙度 (Rzjis)0.7μm)之表面施以包含鎳21mg/m2、鋅8mg/m2、鉻3mg/m2之防銹處理後,對該防銹處理層之表面施以胺基系矽烷偶合劑處理,形成矽烷偶合劑層。接著,於矽烷偶合劑層之表面使用凹版印刷,以使乾燥後之接著劑層之厚度成為2.5μm之方式,塗佈該樹脂溶液。形成塗佈膜後,在180℃乾燥2分鐘,藉此使樹脂組成物半硬化而製造含接著劑層的具備接著劑層之銅箔。 Next, the surface of the ultra-thin non-roughened copper foil (surface roughness (Rzjis) 0.7 μm) of the carrier having a thickness of 3 μm was applied with the prevention of nickel 21 mg/m 2 , zinc 8 mg/m 2 , and chromium 3 mg/m 2 . After the rust treatment, the surface of the rust-preventing treatment layer is treated with an amine-based decane coupling agent to form a decane coupling agent layer. Next, the resin solution was applied to the surface of the decane coupling agent layer by gravure printing so that the thickness of the adhesive layer after drying became 2.5 μm. After the coating film was formed, the resin composition was semi-cured at 180 ° C for 2 minutes to produce a copper foil having an adhesive layer containing an adhesive layer.

〈貼銅積層板之製造〉 <Manufacture of copper-clad laminates>

使如上述製造之具備接著劑層之銅箔之接著劑層側,與100μm厚之FR-4預浸片(三菱瓦斯化學股份有限公司製造:GHPL-830NS)之單面抵接,在220℃×90分鐘、40kgf/cm2之加熱加壓條件下熱壓著成形,而製造貼銅積層板。 The side of the adhesive layer of the copper foil having the adhesive layer produced as described above was brought into contact with one side of a 100 μm thick FR-4 prepreg (manufactured by Mitsubishi Gas Chemical Co., Ltd.: GHPL-830NS) at 220 ° C. The copper-clad laminate was produced by hot press forming under the heating and pressing conditions of ×90 minutes and 40 kgf/cm 2 .

〈撕離強度測定用樣品之製作〉 <Production of sample for measurement of tear strength>

自如上述製造之貼銅積層板之銅箔層撕離載體後,藉電解銅電鍍於表面上成為10μm厚之方式進行鍍敷,貼合乾薄膜形成蝕刻光阻層。接著,對蝕刻光阻層,使0.4mm寬之撕離強度測定用電路圖型進行曝光且顯像,形成蝕刻圖型。隨後,以銅蝕刻液進行電路蝕刻、蝕刻光阻剝離,製作電路厚度10μm之撕離強度測定用樣品。 After the copper foil layer of the copper-clad laminate produced as described above was peeled off from the carrier, plating was performed by electrolytic copper plating on the surface to a thickness of 10 μm, and the dry film was bonded to form an etching photoresist layer. Next, the photoresist layer was exposed and exposed to a 0.4 mm wide tear strength measuring circuit pattern to form an etching pattern. Subsequently, circuit etching and etching peeling were performed using a copper etching solution to prepare a sample for measuring the peeling strength of a circuit thickness of 10 μm.

〈去膠渣液耐性評價用樣品之製作〉 <Production of sample for evaluation of desmear resistance test>

又,本實施例中,係如下述製作去膠渣液耐性評價用樣品。首先,準備兩片以使厚度成為100μm之方式將上述調製之樹脂溶液塗佈於耐熱性薄膜之表面上並經乾燥而形成樹脂層者。接著,藉熱加工使樹脂層彼此貼合後,剝離耐熱性薄膜,且切割成5cm×5cm之方形,製作去膠渣液耐性評價用樣品。 Further, in the present Example, a sample for evaluation of the desmear liquid resistance was prepared as follows. First, two sheets were prepared so that the resin solution prepared above was applied to the surface of the heat-resistant film so as to have a thickness of 100 μm, and dried to form a resin layer. Then, the resin layers were bonded to each other by heat processing, and then the heat-resistant film was peeled off and cut into a square of 5 cm × 5 cm to prepare a sample for evaluation of the desmear liquid resistance.

[實施例2] [Embodiment 2]

除了相對於聚伸苯基醚化合物100質量份使用20質量份之苯乙烯丁二烯嵌段共聚物以外,餘與實施例1同樣製作具備接著劑層之銅箔及去膠渣液耐性評價用樣品。另外,除使用該實施例2之具備接著劑層之銅箔以外,餘與實施例1同樣,製造貼銅積層板,製作撕離強度測定用樣品。 A copper foil having an adhesive layer and a desmear liquid resistance evaluation were prepared in the same manner as in Example 1 except that 20 parts by mass of the styrene butadiene block copolymer was used per 100 parts by mass of the polyphenylene ether compound. sample. In addition, a copper-clad laminate was produced in the same manner as in Example 1 except that the copper foil having the adhesive layer of Example 2 was used, and a sample for measuring the peel strength was prepared.

[實施例3] [Example 3]

除相對於聚伸苯基醚化合物100質量份使用40質量份之苯乙烯丁二烯嵌段共聚物以外,餘與實施例1同樣製作具備接著劑層之銅箔及去膠渣液耐性評價用樣品。另外,除使用該具備接著劑層之銅箔以外,餘與實施例1同樣,製造貼銅積層板,製作撕離強度測定用樣品。 A copper foil having an adhesive layer and a desmear liquid resistance evaluation were prepared in the same manner as in Example 1 except that 40 parts by mass of the styrene butadiene block copolymer was used in an amount of 100 parts by mass based on 100 parts by mass of the polyphenylene ether compound. sample. In addition, a copper-clad laminate was produced in the same manner as in Example 1 except that the copper foil having the adhesive layer was used, and a sample for measuring the peel strength was prepared.

[實施例4] [Example 4]

除相對於聚伸苯基醚化合物100質量份使用60質量份之苯乙烯丁二烯嵌段共聚物以外,餘與實施例1同樣製作具備接著劑層之銅箔及去膠渣液耐性評價用樣品。另外,除使用該具備接著劑層之銅箔以外,餘與實施例1同樣,製造貼銅積層板,製作撕離強度測定用樣品。 A copper foil having an adhesive layer and a desmear liquid resistance evaluation were prepared in the same manner as in Example 1 except that 60 parts by mass of the styrene butadiene block copolymer was used in an amount of 100 parts by mass based on 100 parts by mass of the polyphenylene ether compound. sample. In addition, a copper-clad laminate was produced in the same manner as in Example 1 except that the copper foil having the adhesive layer was used, and a sample for measuring the peel strength was prepared.

[實施例5] [Example 5]

除了含30質量%之使用乙烯基三甲氧基矽烷作為乙烯系矽烷偶合劑進行處理表面而成之填充劑粒子(體積累積粒徑D50:0.3μm,二氧化矽)以外,餘與實施例3同樣,製作具備接著劑層之銅箔及去膠渣液耐性評價用樣品。另外,除使用該具備接著劑層之銅箔以外,餘與實施例1同樣,製造貼銅積層板,製作撕離強度測定用樣品。 In addition to 30% by mass of filler particles (volume cumulative particle diameter D 50 : 0.3 μm, cerium oxide) obtained by treating a surface using vinyl trimethoxy decane as a vinyl decane coupling agent, the same as in Example 3 Similarly, a copper foil having an adhesive layer and a sample for evaluation of the desmear liquid resistance were prepared. In addition, a copper-clad laminate was produced in the same manner as in Example 1 except that the copper foil having the adhesive layer was used, and a sample for measuring the peel strength was prepared.

接著,針對比較例1~比較例3加以說明。 Next, Comparative Example 1 to Comparative Example 3 will be described.

[比較例1] [Comparative Example 1]

除相對於聚伸苯基醚化合物100質量份使用70質量份之苯乙烯丁二烯嵌段共聚物以外,餘與實施例1同樣製作具備接著劑層之銅箔及去膠渣液耐性評價用樣品。另外,除使用該比較例1之具備接著劑層之銅箔以外,餘與實施例1同樣,製造貼銅積層板,且製作撕離強度測定用樣品。 A copper foil having an adhesive layer and a desmear liquid resistance evaluation were prepared in the same manner as in Example 1 except that 70 parts by mass of the styrene butadiene block copolymer was used in an amount of 100 parts by mass based on 100 parts by mass of the polyphenylene ether compound. sample. In addition, a copper-clad laminate was produced in the same manner as in Example 1 except that the copper foil having the adhesive layer of Comparative Example 1 was used, and a sample for measuring the peel strength was prepared.

[比較例2] [Comparative Example 2]

比較例2中,係調製專利文獻2之比較試料3所記載之樹脂溶液,且使用該樹脂溶液形成塗佈膜,將隨後之乾燥溫度設為150℃以外,餘與實施例1同樣製作具備接著劑層之銅箔及去膠渣液耐性評價用樣品。另外,除使用該比較例2之具備接著劑層之銅箔以外,餘與實施例1同樣,製造貼銅積層板,且製作撕離強度測定用樣品。以下敘述比較例2之樹脂溶液之調製方法。 In Comparative Example 2, the resin solution described in Comparative Sample 3 of Patent Document 2 was prepared, and a coating film was formed using the resin solution, and the subsequent drying temperature was changed to 150 ° C, and the same procedure as in Example 1 was carried out. A copper foil for the agent layer and a sample for evaluation of the desmear resistance. In addition, a copper-clad laminate was produced in the same manner as in Example 1 except that the copper foil having the adhesive layer of Comparative Example 2 was used, and a sample for measuring the peel strength was prepared. The preparation method of the resin solution of Comparative Example 2 will be described below.

比較例2中,使用芳香族聚醯胺樹脂聚合物(日本化藥股份 有限公司製造;BPAM-155)70質量份及環氧樹脂(日本化藥股份有限公司製造;EPPN-502)30質量份作為PA系樹脂組成物。接著,於該PA系樹脂組成物100質量份中混合作為硬化促進劑之咪唑系之2P4MHZ(四國化成股份有限公司製造)1質量份,作成樹脂組成物。使該樹脂組成物溶解於二甲基乙醯胺中,以使樹脂固體成分濃度成為15質量%之方式調製樹脂溶液。 In Comparative Example 2, an aromatic polyamide resin polymer (Nippon Chemical Co., Ltd.) was used. 70 parts by mass of BPAM-155) and epoxy resin (manufactured by Nippon Kayaku Co., Ltd.; EPPN-502) 30 parts by mass as a PA-based resin composition. Then, 1 part by mass of imidazole-based 2P4MHZ (manufactured by Shikoku Chemicals Co., Ltd.) as a curing accelerator was mixed with 100 parts by mass of the PA-based resin composition to prepare a resin composition. The resin composition was dissolved in dimethylacetamide to prepare a resin solution so that the resin solid content concentration became 15% by mass.

[比較例3] [Comparative Example 3]

比較例3中,係使用專利文獻1之實施例3所記載之第2樹脂組成物C調製底塗樹脂溶液,使用該底塗樹脂溶液形成塗佈膜,使隨後之乾燥溫度設為150℃以外,餘與實施例1同樣製作具備接著劑層之銅箔及去膠渣液耐性評價用樣品。另外,除使用該比較例3之具備接著劑層之銅箔以外,餘與實施例1同樣,製造貼銅積層板,且製作撕離強度測定用樣品。以下敘述比較例3之樹脂溶液之調製方法。 In the comparative example 3, the primer resin solution was prepared using the second resin composition C described in Example 3 of Patent Document 1, and the coating film was formed using the primer resin solution, and the subsequent drying temperature was 150 ° C. In the same manner as in Example 1, a copper foil having an adhesive layer and a sample for evaluation of the desmear liquid resistance were prepared. In addition, a copper-clad laminate was produced in the same manner as in Example 1 except that the copper foil having the adhesive layer of Comparative Example 3 was used, and a sample for measuring the peel strength was prepared. The preparation method of the resin solution of Comparative Example 3 will be described below.

比較例3中,使用聚醚碸樹脂(住友化學股份有限公司製造;SUMIKA EXCEL PES-5003P)70質量份及環氧樹脂(日本化藥股份有限公司製造;EPPN-502)30質量份作為PES系樹脂組成物。接著,於該PES系樹脂組成物100質量份中混合作為硬化促進劑之咪唑系之2P4MHZ(四國化成股份有限公司製造)1質量份,作成樹脂組成物。使該樹脂組成物溶解於二甲基乙醯胺中,以使樹脂固體成分濃度成為15質量%之方式調製樹脂溶液。 In Comparative Example 3, 70 parts by mass of a polyether oxime resin (manufactured by Sumitomo Chemical Co., Ltd.; SUMIKA EXCEL PES-5003P) and 30 parts by mass of an epoxy resin (manufactured by Nippon Kayaku Co., Ltd.; EPPN-502) were used as the PES system. Resin composition. Then, 1 part by mass of imidazole-based 2P4MHZ (manufactured by Shikoku Chemicals Co., Ltd.) as a curing accelerator was mixed with 100 parts by mass of the PES-based resin composition to prepare a resin composition. The resin composition was dissolved in dimethylacetamide to prepare a resin solution so that the resin solid content concentration became 15% by mass.

[評價1] [Evaluation 1]

使用如上述製造之實施例1~實施例5及比較例1~比較例3之各樣品,進行(1)去膠渣液耐性之評價,(2)撕離強度之評價,(3)焊接特性之評價。以下針對評價方法與評價結果分別加以說明。 Using each of the samples of Examples 1 to 5 and Comparative Examples 1 to 3 produced as described above, (1) evaluation of desmear resistance, (2) evaluation of tear strength, and (3) welding characteristics were performed. Evaluation. The evaluation methods and evaluation results are described below separately.

1.評價方法 Evaluation method (1) 去膠渣液耐性之評價 (1) Evaluation of the resistance of desmear liquid

去膠渣液耐性之評價係如下述般進行。分別使用3片實施例1~實施例4及比較例1~比較例3中製作之去膠渣液耐性評價用樣品,將各去膠渣液耐性評價用樣品浸漬在75℃之膨潤液(羅門哈斯電子材料股份有限公司製造)20分鐘後,於80℃之過錳酸鉀溶液(羅門哈斯電子材料股份有限公司製 造)(鹼當量度:1.25N)中20分鐘。隨後,浸漬在45℃之中和液(羅門哈斯電子材料股份有限公司製造)中5分鐘,並經水洗。測定供給於該一連串去膠渣處理前後之各去膠渣耐性評價用樣品之重量,求得去膠渣處理前後之重量減少率(%),求得其平均值。 The evaluation of the desmear resistance was carried out as follows. Three samples of the desmear liquid resistance evaluation samples prepared in Examples 1 to 4 and Comparative Examples 1 to 3 were used, and each of the desmear liquid resistance evaluation samples was immersed in a swelling liquid at 75 ° C (Solomon) After 20 minutes, a potassium permanganate solution at 80 ° C (made by Rohm and Haas Electronic Materials Co., Ltd.) Made) (base equivalent: 1.25 N) for 20 minutes. Subsequently, it was immersed in a liquid (manufactured by Rohm and Haas Electronic Materials Co., Ltd.) at 45 ° C for 5 minutes, and washed with water. The weight of each sample for desmear resistance evaluation before and after the series of desmearing treatments was measured, and the weight reduction rate (%) before and after the desmear treatment was determined, and the average value was obtained.

(2) 撕離強度之評價 (2) Evaluation of tear strength

撕離強度之評價係如下述般進行。使用實施例1~實施例5及比較例1~比較例3中製作之撕離強度測定用樣品,測定PCT前之撕離強度,且以此作為常態時之撕離強度。另外,測定在121℃、2atm、100%RH之壓力鍋槽中保持24小時後之撕離強度,將此作為PCT後之撕離強度。撕離強度之測定係依據JISC-6481進行。 The evaluation of the tear strength was carried out as follows. Using the samples for tear strength measurement prepared in Examples 1 to 5 and Comparative Examples 1 to 3, the tear strength before PCT was measured, and the tear strength was taken as the normal state. Further, the tear strength after holding for 24 hours in a pressure cooker tank at 121 ° C, 2 atm, and 100% RH was measured, and this was taken as the peeling strength after PCT. The measurement of the tear strength was carried out in accordance with JIS C-6481.

(3) 焊接特性之評價 (3) Evaluation of welding characteristics

焊接特性之評價係如下述般進行。自實施例1~實施例5及比較例1~比較例3中製造之具備接著劑層之銅箔切割出5cm×5cm之方形,且以使銅箔部份成為1/2大小(2.5cm×5cm)之方式施以蝕刻處理者,作為焊接特性評價用樣品。使各焊接特性評價用樣品,在121℃、2atm、100%RH之壓力鍋槽中保持5小時後,在260℃之焊料浴中浸漬1分鐘,且觀察有無膨脹發生。而且,未發生膨脹之情況判斷為處於PCT後之焊接特性為合格之水準且記為「○」。另一方面,發生膨脹之樣品記為「×」。 The evaluation of the welding characteristics was carried out as follows. The copper foil having the adhesive layer produced in Examples 1 to 5 and Comparative Examples 1 to 3 was cut into a square of 5 cm × 5 cm so that the copper foil portion became 1/2 size (2.5 cm × 5 cm) was applied as an etchant as a sample for evaluation of welding characteristics. Each sample for evaluation of the welding property was held in a pressure cooker tank at 121 ° C, 2 atm, and 100% RH for 5 hours, and then immersed in a solder bath at 260 ° C for 1 minute, and the presence or absence of expansion was observed. Further, in the case where no expansion occurred, it was judged that the welding property after the PCT was a level of pass and was marked as "○". On the other hand, the sample in which expansion occurred was referred to as "x".

2.評價結果 2. Evaluation results (1) 去膠渣液耐性之評價 (1) Evaluation of the resistance of desmear liquid

表1顯示去膠渣處理前後之重量減少率(%)之平均值。如表1所示,具備由聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物所成之接著劑層之實施例1~實施例4及比較例1,相對於比較例2之去膠渣處理後之重量減少率(%)較低,可確認藉由使用聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物構成接著劑層,可提供去膠渣液耐性獲得提高之具備接著劑層之銅箔。另一方面,確認比較例3之去膠渣處理後之重量減少率(%)為1%以下之較低。 Table 1 shows the average value of the weight reduction rate (%) before and after the desmear treatment. As shown in Table 1, Examples 1 to 4 and Comparative Example 1 comprising an adhesive layer formed of a polyphenylene ether compound and a styrene butadiene block copolymer were compared with Comparative Example 2. The weight reduction rate (%) after the treatment of the slag is low, and it can be confirmed that the use of the polyphenylene ether compound and the styrene butadiene block copolymer to form the adhesive layer can provide improved desmear resistance. A copper foil having an adhesive layer. On the other hand, it was confirmed that the weight reduction rate (%) after the desmear treatment of Comparative Example 3 was 1% or less.

Figure TWI609779BD00002
Figure TWI609779BD00002
Figure TWI609779BD00003
Figure TWI609779BD00003

(2) 撕離強度之評價 (2) Evaluation of tear strength

接著,表2顯示使用實施例1~實施例5及比較例1~比較例3中製造之撕離強度測定用樣品而測定之常態時之撕離強度,與PCT後之撕離強度、及PCT後之劣化率。 Next, Table 2 shows the tear strength in the normal state measured using the samples for tear strength measurement produced in Examples 1 to 5 and Comparative Examples 1 to 3, and the peel strength after PCT, and PCT. The rate of deterioration afterwards.

如表2所示,去膠渣液耐性高的比較例3,確認到PCT後之劣化率為83%之極高,PCT後之撕離強度平均亦為0.10kgf/cm,且吸濕劣化顯著。另一方面,比較例2顯示常態時之撕離強度平均為0.63kgf/cm,且PCT後之撕離強度平均為0.55kgf/cm。比較例2於PCT後雖仍維持市場所要求水準之撕離強度,但劣化率為12.7%。 As shown in Table 2, in Comparative Example 3 in which the desmear liquid resistance was high, it was confirmed that the deterioration rate after PCT was extremely high at 83%, and the tear strength after PCT was also 0.10 kgf/cm on average, and hygroscopic deterioration was remarkable. . On the other hand, in Comparative Example 2, the tear strength at the normal state was 0.63 kgf/cm on average, and the tear strength after PCT was 0.55 kgf/cm on average. Comparative Example 2 maintained the peeling strength required by the market after PCT, but the deterioration rate was 12.7%.

另一方面,使用聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物構成接著劑層(12)之實施例1~實施例5及比較例1,確認到劣化率為20%以下且耐吸濕劣化特性獲得改善。另外,藉由相對於聚伸苯基醚化合物100質量份以5質量份~65質量份之範圍調配苯乙烯丁二烯嵌段共聚物,認為獲得常態時為0.5kgf/cm以上,PCT後為0.45kgf/cm以上之值。尤其,藉由相對於聚伸苯基醚化合物100質量份以35質量份~45質量份之範圍調配苯乙烯丁二烯嵌段共聚物,認為可獲得PCT後之撕離強度為0.54kgf/cm以上之值。據此,藉由相對於聚伸苯基醚化合物100質量份以5質量份~65質量份之範圍調配苯乙烯丁二烯嵌段共聚物,確認可提供具有充分之撕離強度,同時去膠渣液耐性高,且耐吸濕劣化特性高之具備接著劑層之銅箔。又,比較例1係如上述,雖見到耐吸濕劣化特性之改善,但相較於實施例1~實施例5,常態時及PCT後之撕離強度稍低。 On the other hand, in Examples 1 to 5 and Comparative Example 1 in which the polyphenylene ether compound and the styrene-butadiene block copolymer were used to form the adhesive layer (12), it was confirmed that the deterioration rate was 20% or less. The moisture absorption deterioration resistance is improved. In addition, the styrene butadiene block copolymer is blended in an amount of from 5 parts by mass to 65 parts by mass based on 100 parts by mass of the polyphenylene ether compound, and it is considered to be 0.5 kgf/cm or more in the normal state, and is after PCT. A value of 0.45 kgf/cm or more. In particular, by blending the styrene butadiene block copolymer in an amount of from 35 parts by mass to 45 parts by mass based on 100 parts by mass of the polyphenylene ether compound, it is considered that the peeling strength after obtaining PCT is 0.54 kgf/cm. The above values. According to this, it is confirmed that the styrene butadiene block copolymer can be provided in a range of 5 parts by mass to 65 parts by mass based on 100 parts by mass of the polyphenylene ether compound, and it is confirmed that the peeling strength can be provided at the same time. A copper foil having an adhesive layer having high slag resistance and high moisture absorption deterioration resistance. Further, in Comparative Example 1, as described above, although improvement in moisture absorption deterioration resistance was observed, the tear strength at normal time and after PCT was slightly lower than in Examples 1 to 5.

Figure TWI609779BD00004
Figure TWI609779BD00004

(3) 焊接特性評價 (3) Evaluation of welding characteristics

如表1所示,相較於比較例3,具備由聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物所組成之接著劑層之實施例1~實施例5及比較例1均確認焊接特性為良好。 As shown in Table 1, Example 1 to Example 5 and Comparative Example 1 each having an adhesive layer composed of a polyphenylene ether compound and a styrene butadiene block copolymer were compared with Comparative Example 3. Confirm that the welding characteristics are good.

3.其他 3. Other

實施例3與實施例5僅在接著劑層中是否含有填充劑粒子方面不同。如表2所示,常態時及PCT後之撕離強度於含有填充劑粒子之實施例5者均顯示較高的值,故確認添加填充劑粒子能有效提高撕離強度。 Example 3 and Example 5 differ only in the presence or absence of filler particles in the adhesive layer. As shown in Table 2, the tear strength in the normal state and after the PCT showed a high value in Example 5 containing the filler particles, and it was confirmed that the addition of the filler particles can effectively improve the tear strength.

[實施例6] [Embodiment 6]

該實施例6係為評價上述之SAP-1之製程中之銅電路與樹脂基材之密著性,而藉以下簡易製程進行評價。以下針對各製程加以說明。 In the sixth embodiment, the adhesion between the copper circuit and the resin substrate in the process of the above-mentioned SAP-1 was evaluated, and the evaluation was carried out by the following simple process. The following describes each process.

貼銅積層板:使用與上述實施例3相同之樹脂組成,且與實施例1同樣,製造具備接著劑層之銅箔。又,此處使用之附載體之極薄銅箔係使用在實施例1中使用之3μm厚之附載體之極薄無粗化銅箔(表面粗糙度(Rzjis)0.7μm)之銅箔層之表面上附著微細銅粒而施以粗化處理,且粗化處理後之表面粗糙度(Rzjis)為1.9μm者。接著,與實施例1同樣,獲得貼銅積層板。 Copper-clad laminate: A copper foil having an adhesive layer was produced in the same manner as in Example 1 except that the same resin composition as in the above Example 3 was used. Further, the ultra-thin copper foil with a carrier used here is a copper foil layer of an extremely thin non-roughened copper foil (surface roughness (Rzjis) 0.7 μm) of a carrier of 3 μm thick used in Example 1. Fine copper particles were adhered to the surface and roughened, and the surface roughness (Rzjis) after the roughening treatment was 1.9 μm. Next, in the same manner as in Example 1, a copper-clad laminate was obtained.

銅箔層之去除:使用市售之硫酸-過氧化氫水性銅蝕刻液, 完全溶解去除於上述貼銅積層板之表面露出之銅箔層,作成於表面具備經硬化接著劑層之樹脂基材。 Removal of the copper foil layer: using a commercially available sulfuric acid-hydrogen peroxide aqueous copper etching solution, The copper foil layer exposed on the surface of the copper-clad laminate is completely dissolved and formed on the surface of the resin substrate having the cured adhesive layer on the surface.

去膠渣處理:使該表面上具備經硬化接著劑層之樹脂基材浸漬於上述之「(1)去膠渣液耐性之評價」中使用之去膠渣液中,進行同樣的去膠渣處理。 Desizing treatment: a resin substrate having a hardened adhesive layer on the surface is immersed in the degumming liquid used in the above "(1) Evaluation of degreasing resistance", and the same degumming is performed. deal with.

無電解銅鍍敷:接著,於去膠渣處理後之表面具備經硬化接著劑層之樹脂基材表面上,形成無電解銅鍍敷層作為種晶層,作成附無電解銅鍍敷層之樹脂基材。此時,採用市售之無電解銅鍍敷銅中使用之製程(使用上村工業股份有限公司製造之無電解銅鍍敷之製程)。 Electroless copper plating: Next, on the surface of the resin substrate having the hardened adhesive layer on the surface after the desmear treatment, an electroless copper plating layer is formed as a seed layer to form an electroless copper plating layer. Resin substrate. At this time, a process used in commercially available electroless copper-plated copper (using an electroless copper plating process manufactured by Shangcun Industrial Co., Ltd.) was used.

烘烤:無電解銅鍍敷結束時,對該附無電解銅鍍敷層之樹脂基材在大氣環境中進行150℃×30分鐘之加熱處理。 Baking: At the end of electroless copper plating, the resin substrate with the electroless copper plating layer is subjected to heat treatment at 150 ° C for 30 minutes in an atmospheric environment.

電路形成:在未進行該附無電解銅鍍敷層之樹脂基材之無電解銅鍍敷層之電路形成之部位形成鍍敷光阻。接著,進行銅電鍍,在鍍敷光阻之不存在部位析出銅而形成電路。進而,進行鍍敷光阻之剝離,於基材表面形成電路形狀。 Circuit formation: a plating resist is formed at a portion where a circuit for forming an electroless copper plating layer of a resin substrate with an electroless copper plating layer is not formed. Next, copper plating is performed, and copper is deposited in a portion where the plating resist does not exist to form an electric circuit. Further, peeling of the plating resist is performed to form a circuit shape on the surface of the substrate.

光刻:最後,使用市售之硫酸-過氧化氫水性銅蝕刻液,去除於電路間露出之附無電解銅鍍敷層之樹脂基材之表面上之無電解銅鍍敷層,經水洗、乾燥,而獲得具備電路寬0.4mm、電路厚18μm之銅電路,且得到可獲得焊接特性之評價試料之印刷配線板。接著,自該印刷配線板獲得上述撕離強度測定用樣品及焊接特性評價用樣品。 Photolithography: Finally, a commercially available sulfuric acid-hydrogen peroxide aqueous copper etching solution is used to remove the electroless copper plating layer on the surface of the resin substrate with the electroless copper plating layer exposed between the circuits, and washed with water. After drying, a copper circuit having a circuit width of 0.4 mm and a circuit thickness of 18 μm was obtained, and a printed wiring board having an evaluation sample for obtaining soldering characteristics was obtained. Next, the sample for peeling strength measurement and the sample for evaluation of welding characteristics were obtained from the printed wiring board.

[比較例4] [Comparative Example 4]

比較例4中,除使用上述比較例2之樹脂組成以外,餘與實施例6同樣,以SAP法製造印刷配線板,獲得上述撕離強度測定用樣品及焊接特性評價用樣品。 In Comparative Example 4, a printed wiring board was produced by the SAP method in the same manner as in Example 6 except that the resin composition of the above Comparative Example 2 was used, and the sample for measuring the peel strength and the sample for evaluation of the welding property were obtained.

[評價2] [Evaluation 2]

使用如上述般製造之實施例6及比較例4之樣品,進行(1)撕離強度之評價,(2)焊接特性之評價。以下針對評價方法及評價結果分別加以說明。 Using the samples of Example 6 and Comparative Example 4 produced as described above, (1) evaluation of tear strength and (2) evaluation of welding characteristics were performed. The evaluation methods and evaluation results are described below.

表3.

Figure TWI609779BD00005
table 3.
Figure TWI609779BD00005

1.評價方法 Evaluation method

該評價2中之「撕離強度之評價」、「焊接特性之評價」均採用上述之「評價1」相同之方法。因此,由於係重複說明故省略。 In the evaluation 2, "evaluation of tear strength" and "evaluation of welding characteristics" were the same as those of "evaluation 1" described above. Therefore, it is omitted because it is repeated.

2.評價結果 2. Evaluation results (1)撕離強度之評價 (1) Evaluation of tear strength

表3顯示使用實施例6及比較例4中製造之撕離強度測定用樣品測定之「常態時之撕離強度」、「PCT後之撕離強度」、及「PCT後之劣化率」。如該表3所示,採用與實施例3相同之使用聚伸苯基醚化合物與苯乙烯丁二嵌段共聚物構成之樹脂組成物之實施例6,顯示常態時之撕離強度平均為0.52kgf/cm,PCT後之撕離強度平均為0.47kgf/cm,確認成為劣化率係9.8%之耐吸濕劣化特性。相對於此,採用上述之去膠渣液耐性低的比較例2之樹脂組成的比較例4,顯示常態時之撕離強度平均為0.28kgf/cm,且PCT後之撕離強度平均為0.22kgf/cm,劣化率為21.4%,確認耐吸濕劣化特性降低。因此,比較例4之撕離強度相較於實施例6較低,認為原因係於比較例4之情況因去膠渣處理會使樹脂基材之表面溶解,使銅箔之粗化處理之複製形狀之凹凸形狀減少,而使接著面之比表面積減少所致。 Table 3 shows "Tear strength at normal time", "Tear strength after PCT", and "Degradation rate after PCT" measured using the samples for tear strength measurement produced in Example 6 and Comparative Example 4. As shown in Table 3, Example 6 using the same resin composition composed of a polyphenylene ether compound and a styrene butyl diblock copolymer as in Example 3 showed an average peeling strength of 0.52 in the normal state. Kgf/cm, the tear strength after PCT was 0.47 kgf/cm on average, and it was confirmed that the deterioration rate was 9.8%, and the moisture absorption deterioration resistance was obtained. On the other hand, Comparative Example 4 of the resin composition of Comparative Example 2 having the low desmear resistance described above showed an average tear strength of 0.28 kgf/cm in the normal state and an average peeling strength of 0.22 kgf after the PCT. /cm, the deterioration rate was 21.4%, and it was confirmed that the moisture absorption deterioration resistance was lowered. Therefore, the tear strength of Comparative Example 4 was lower than that of Example 6, and it was considered that the reason was that in the case of Comparative Example 4, the surface of the resin substrate was dissolved by the desmear treatment, and the roughening of the copper foil was replicated. The shape of the concavo-convex shape is reduced, and the specific surface area of the adjoining surface is reduced.

(2) 焊接特性之評價 (2) Evaluation of welding characteristics

如表3所示,具備由聚伸苯基醚化合物與苯乙烯丁二烯嵌段共聚物所組成之接著劑層之實施例6,相較於比較例4,確認焊接特性為良好。 As shown in Table 3, Example 6 having an adhesive layer composed of a polyphenylene ether compound and a styrene butadiene block copolymer was confirmed to have good soldering properties as compared with Comparative Example 4.

產業上之可利用性 Industrial availability

本發明之具備接著劑層之銅箔,藉由採用由相對於聚伸苯基醚化合物100質量份含10質量份~65質量份之範圍之苯乙烯丁二烯嵌段共聚物之樹脂組成物所成之層作為接著劑層,而可成為在該具備接著劑層之銅箔貼合 於樹脂基材上時之密著性良好者。且,同時,即使在印刷配線板之製造步驟中包含去膠渣處理時,亦可防止接著劑層溶解於去膠渣液中。又,可製造常態時具有充分之撕離強度,同時撕離強度之劣化較少之印刷配線板。因此,可提供可較好地用作為印刷配線板之製造材料之具備接著劑層之銅箔。 The copper foil with an adhesive layer of the present invention is a resin composition comprising a styrene butadiene block copolymer in an amount of from 10 parts by mass to 65 parts by mass based on 100 parts by mass of the polyphenylene ether compound. The formed layer is used as an adhesive layer, and can be bonded to the copper foil having the adhesive layer. When the resin substrate is used, the adhesion is good. Further, at the same time, even when the desmear treatment is included in the manufacturing step of the printed wiring board, the adhesive layer can be prevented from being dissolved in the desmear liquid. Further, it is possible to manufacture a printed wiring board having a sufficient tear strength in the normal state and having less deterioration in tear strength. Therefore, it is possible to provide a copper foil having an adhesive layer which can be preferably used as a material for producing a printed wiring board.

Claims (8)

一種具備接著劑層之銅箔,其係於銅箔之單面上具備接著劑層之具備接著劑層之銅箔,其特徵為:前述接著劑層為由對於主成分之聚伸苯基醚化合物100質量份含5質量份以上65質量份以下之苯乙烯丁二烯嵌段共聚物之樹脂組成物所成之層;其中前述聚伸苯基醚化合物,其末端具有羥基、苯乙烯基或縮水甘油基;及前述聚伸苯基醚化合物之數平均分子量為500至4000。 A copper foil having an adhesive layer which is a copper foil having an adhesive layer on a single side of a copper foil and having an adhesive layer, wherein the adhesive layer is a polyphenylene ether derived from a main component a compound comprising 100 parts by mass or more and 65 parts by mass or less of a resin composition of a styrene butadiene block copolymer; wherein the polyphenylene ether compound has a hydroxyl group, a styryl group or a terminal thereof; The glycidyl group; and the above polyphenylene ether compound have a number average molecular weight of 500 to 4,000. 如請求項1之具備接著劑層之銅箔,其中前述接著劑層為由對於聚伸苯基醚化合物100質量份含30質量份以上55質量份以下之苯乙烯丁二烯嵌段共聚物之樹脂組成物所成之層。 The copper foil having an adhesive layer according to claim 1, wherein the adhesive layer is a styrene butadiene block copolymer containing 30 parts by mass or more and 55 parts by mass or less based on 100 parts by mass of the polyphenylene ether compound. A layer formed of a resin composition. 如請求項1之具備接著劑層之銅箔,其中在銅箔之表面粗糙度(Rzjis)為2μm以下之面上設置前述接著劑層。 A copper foil having an adhesive layer according to claim 1, wherein the adhesive layer is provided on a surface of a copper foil having a surface roughness (Rzjis) of 2 μm or less. 如請求項1至3中任一項之具備接著劑層之銅箔,其中前述接著劑層之厚度為0.5μm~10μm。 The copper foil provided with an adhesive layer according to any one of claims 1 to 3, wherein the thickness of the adhesive layer is 0.5 μm to 10 μm. 如請求項1之具備接著劑層之銅箔,其中前述接著劑層為包含使用由胺基官能性矽烷偶合劑、丙烯酸官能性矽烷偶合劑、甲基丙烯酸官能性矽烷偶合劑及乙烯基官能性矽烷偶合劑所選出之一種以上進行表面處理之填充劑粒子者。 The copper foil with an adhesive layer according to claim 1, wherein the adhesive layer comprises an amine functional decane coupling agent, an acrylic functional decane coupling agent, a methacrylic acid functional decane coupling agent, and a vinyl functional group. One or more surface-treated filler particles selected from the decane coupling agent. 一種貼銅積層板,其特徵為使用如請求項1之具備接著劑層之銅箔者。 A copper-clad laminate characterized by using a copper foil having an adhesive layer as claimed in claim 1. 一種印刷配線板,其特徵為使用如請求項6之貼銅積層板獲得者。 A printed wiring board characterized by using a copper clad laminate as claimed in claim 6. 一種印刷配線板,其特徵為使用如請求項7之貼銅積層板,且藉由蝕刻去除該貼銅積層板表面之銅箔層,以半加成法(semi-additive process)形成電路而獲得。 A printed wiring board characterized by using a copper-clad laminate according to claim 7, and removing a copper foil layer on the surface of the copper-clad laminate by etching, and forming a circuit by a semi-additive process .
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