TWI600797B - 電漿處理設備之內部構件以及其製造方法 - Google Patents

電漿處理設備之內部構件以及其製造方法 Download PDF

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Publication number
TWI600797B
TWI600797B TW104136937A TW104136937A TWI600797B TW I600797 B TWI600797 B TW I600797B TW 104136937 A TW104136937 A TW 104136937A TW 104136937 A TW104136937 A TW 104136937A TW I600797 B TWI600797 B TW I600797B
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TW
Taiwan
Prior art keywords
layer
plasma processing
processing apparatus
manufacturing
ceramic material
Prior art date
Application number
TW104136937A
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English (en)
Chinese (zh)
Other versions
TW201629266A (zh
Inventor
李省勳
鄭東勳
高賢哲
Original Assignee
台灣高美可科技股份有限公司
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Filing date
Publication date
Application filed by 台灣高美可科技股份有限公司 filed Critical 台灣高美可科技股份有限公司
Publication of TW201629266A publication Critical patent/TW201629266A/zh
Application granted granted Critical
Publication of TWI600797B publication Critical patent/TWI600797B/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/123—Spraying molten metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/18—After-treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • H01J37/32495—Means for protecting the vessel against plasma
TW104136937A 2014-11-11 2015-11-10 電漿處理設備之內部構件以及其製造方法 TWI600797B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140155785A KR102182690B1 (ko) 2014-11-11 2014-11-11 플라즈마 처리 장치용 내부재 및 이의 제조 방법

Publications (2)

Publication Number Publication Date
TW201629266A TW201629266A (zh) 2016-08-16
TWI600797B true TWI600797B (zh) 2017-10-01

Family

ID=56103168

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104136937A TWI600797B (zh) 2014-11-11 2015-11-10 電漿處理設備之內部構件以及其製造方法

Country Status (2)

Country Link
KR (1) KR102182690B1 (ko)
TW (1) TWI600797B (ko)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110468367A (zh) * 2019-08-05 2019-11-19 中国科学院金属研究所 基于等离子喷涂和冷喷涂技术的ic装备关键零部件表面防护涂层的制备方法
KR102522277B1 (ko) 2022-03-24 2023-04-17 주식회사 펨빅스 내플라즈마 2층 코팅막 구조물 및 이의 제조 방법

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6383964B1 (en) * 1998-11-27 2002-05-07 Kyocera Corporation Ceramic member resistant to halogen-plasma corrosion
CN101691307A (zh) * 2008-01-24 2010-04-07 信越化学工业株式会社 陶瓷喷涂部件、制备方法和供其使用的磨料介质
CN102084020A (zh) * 2008-02-26 2011-06-01 应用材料公司 可抵抗还原等离子体的含钇陶瓷涂层
US8067067B2 (en) * 2002-02-14 2011-11-29 Applied Materials, Inc. Clean, dense yttrium oxide coating protecting semiconductor processing apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3907625C1 (ko) * 1989-03-09 1990-02-15 Mtu Muenchen Gmbh
JP4643478B2 (ja) 2006-03-20 2011-03-02 トーカロ株式会社 半導体加工装置用セラミック被覆部材の製造方法
KR101380861B1 (ko) 2007-11-09 2014-04-03 참엔지니어링(주) 플라즈마 에칭 챔버
KR101932429B1 (ko) * 2012-05-04 2018-12-26 (주)코미코 내 플라즈마 코팅막, 이의 제조 방법 및 내 플라즈마성 부품

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6383964B1 (en) * 1998-11-27 2002-05-07 Kyocera Corporation Ceramic member resistant to halogen-plasma corrosion
US8067067B2 (en) * 2002-02-14 2011-11-29 Applied Materials, Inc. Clean, dense yttrium oxide coating protecting semiconductor processing apparatus
CN101691307A (zh) * 2008-01-24 2010-04-07 信越化学工业株式会社 陶瓷喷涂部件、制备方法和供其使用的磨料介质
CN102084020A (zh) * 2008-02-26 2011-06-01 应用材料公司 可抵抗还原等离子体的含钇陶瓷涂层

Also Published As

Publication number Publication date
TW201629266A (zh) 2016-08-16
KR102182690B1 (ko) 2020-11-25
KR20160055989A (ko) 2016-05-19

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