TWI590355B - Wafer testing fixture, wafer dynamic test fixture and wafer testing method - Google Patents

Wafer testing fixture, wafer dynamic test fixture and wafer testing method Download PDF

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Publication number
TWI590355B
TWI590355B TW105105688A TW105105688A TWI590355B TW I590355 B TWI590355 B TW I590355B TW 105105688 A TW105105688 A TW 105105688A TW 105105688 A TW105105688 A TW 105105688A TW I590355 B TWI590355 B TW I590355B
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wafer
test fixture
carrier
disposed
partial
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TW105105688A
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Chinese (zh)
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TW201730998A (en
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李其昌
洪嘉和
魏嘉生
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南茂科技股份有限公司
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Priority to TW105105688A priority Critical patent/TWI590355B/en
Priority to CN201610214859.1A priority patent/CN107123607B/en
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Publication of TW201730998A publication Critical patent/TW201730998A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere

Description

晶圓測試治具、晶圓動態測試治具以及晶圓測試方法Wafer test fixture, wafer dynamic test fixture, and wafer test method

本發明是有關於一種測試治具、動態測試治具以及測試方法,且特別是有關於一種晶圓測試治具、晶圓動態測試治具以及晶圓測試方法。The invention relates to a test fixture, a dynamic test fixture and a test method, and in particular to a wafer test fixture, a wafer dynamic test fixture and a wafer test method.

晶圓級晶片尺寸封裝(Wafer Level Chip Scale Package, WLCSP)可滿足電子產品對功耗、成本與輕薄短小等多項要求,尤其在微機電系統(Micro Electro Mechanical System, MEMS)元件應用日益普及下,更將成為晶圓級封裝產業成長的主要推手,因而吸引晶圓製造與封測代工業者大舉投入。The Wafer Level Chip Scale Package (WLCSP) meets the requirements of power consumption, cost, and thinness and shortness of electronic products, especially in the increasingly popular application of Micro Electro Mechanical System (MEMS) components. It will become the main driving force for the growth of the wafer-level packaging industry, thus attracting large investments from wafer fabrication and packaging manufacturers.

所謂晶圓級晶片尺寸封裝是直接在晶圓上進行全部或大多數的封裝測試程序後,再進行切割(Singulation)製成單顆元件,因此無須經過打線與填膠程序,而且封裝後的晶片尺寸等同晶粒原來大小。然而,傳統的晶圓級封裝測試程序均無法滿足須要做動態測試的微機電系統產品測試方面的需求,因此,業界便衍生出一種將切割後的晶片置於特殊長條狀載盤上,再將之置放於特殊的動態測試機台上進行最終測試(Final Test)的方式。The so-called wafer level wafer size package is performed on all or most of the package test procedures directly on the wafer, and then is singulated to form a single component, so there is no need to go through the wire bonding and filling process, and the packaged wafer The size is equal to the original size of the grain. However, traditional wafer-level package test procedures are unable to meet the requirements of MEMS products that require dynamic testing. Therefore, the industry has developed a method of placing the diced wafer on a special long carrier. Place it on a special dynamic test machine for Final Test.

然而,此動態測試機台的設備昂貴,且需購入多種配合的機台,例如:承載機台(loader)、傳送機台(handler)、測試機台(tester)以及卸載機台(unloader)等等,方能組織一條生產線,並且,配合的特殊載盤所能承載的晶粒數量太少,而測試前的準備與設定時間也過長,上述等問題皆使得目前的動態測試方法之產能難以提升,成本也難以降低,因而讓目前的動態測試方法在量產上處處充滿瓶頸。However, the equipment of this dynamic test machine is expensive, and it is necessary to purchase a variety of matching machines, such as a loader, a handler, a tester, and an unloader. In order to organize a production line, and the number of dies that can be carried by the special carrier is too small, and the preparation and setting time before the test is too long. These problems make the current dynamic test method difficult to produce. Ascension, the cost is also difficult to reduce, so the current dynamic test methods are full of bottlenecks in mass production.

本發明提供一種晶圓測試治具、晶圓動態測試治具以及晶圓測試方法,其可進行批次測試、有效提升一般晶圓測試以及動態測試的效率以及降低其測試的成本。The invention provides a wafer test fixture, a wafer dynamic test fixture and a wafer test method, which can perform batch test, effectively improve the efficiency of general wafer test and dynamic test, and reduce the cost of the test.

本發明的一種晶圓測試治具,其包括一承載盤以及一定位機構。承載盤經配置以承載一部分晶圓,其中部分晶圓包括多個晶片且為一晶圓的一部分。承載盤包括一定位溝槽、一第一側以及相對第一側的一第二側。定位溝槽設置於第一側並適於容置部分晶圓的一側緣。定位機構設置於第二側,並經配置與定位溝槽共同夾持部分晶圓。A wafer test fixture of the present invention includes a carrier tray and a positioning mechanism. The carrier disk is configured to carry a portion of the wafer, wherein a portion of the wafer includes a plurality of wafers and is part of a wafer. The carrier tray includes a positioning groove, a first side, and a second side opposite the first side. The positioning groove is disposed on the first side and is adapted to receive a side edge of the partial wafer. The positioning mechanism is disposed on the second side and configured to clamp a portion of the wafer together with the positioning groove.

在本發明的一實施例中,上述的定位機構包括具有彈性之一推抵件,推抵件設置於第二側並凸出於第二側。In an embodiment of the invention, the positioning mechanism includes one of the elastic pushing members, and the pushing member is disposed on the second side and protrudes from the second side.

在本發明的一實施例中,上述的推抵件包括至少一推抵斜面,部分晶圓包括一弧形側緣,其適於抵靠推抵斜面,使推抵件受壓迫而推抵部分晶圓往第一側移動以與定位溝槽卡合。In an embodiment of the invention, the pushing member comprises at least one pushing surface, and the partial wafer comprises an arc-shaped side edge adapted to abut against the inclined surface, so that the pushing member is pressed and pushed to the portion. The wafer moves toward the first side to engage with the positioning groove.

在本發明的一實施例中,上述的至少一推抵斜面的數量為多個,弧形側緣適於抵靠推抵斜面的其中之一。In an embodiment of the invention, the at least one of the at least one inclined surface is provided in plurality, and the curved side edge is adapted to abut against one of the inclined surfaces.

在本發明的一實施例中,上述的定位機構包括一推抵件,樞設於第二側,以移動於一初始位置以及一夾持位置之間。In an embodiment of the invention, the positioning mechanism includes a pushing member pivoted on the second side to move between an initial position and a clamping position.

在本發明的一實施例中,上述的推抵件包括彼此連接的一樞接端以及一推抵端,樞接端彈性樞接於第二側,當推抵件於初始位置時,推抵端凸出於第二側。In an embodiment of the invention, the pushing member includes a pivoting end and a pushing end connected to each other, and the pivoting end is elastically pivoted to the second side, and when the pushing member is in the initial position, the pushing The end protrudes from the second side.

在本發明的一實施例中,上述的部分晶圓適於抵靠推抵端,使推抵端推抵部分晶圓往第一側移動以與定位溝槽卡合。In an embodiment of the invention, the partial wafer is adapted to abut against the pushing end, and the pushing end is pushed against the partial wafer to move to the first side to engage with the positioning groove.

在本發明的一實施例中,上述的承載盤包括一承載底板以及一框架,框架框圍承載底板的一邊緣,以與承載底板共同定義出一容置空間,部分晶圓設置於容置空間內。In an embodiment of the present invention, the carrier tray includes a carrier substrate and a frame, and the frame frame surrounds an edge of the substrate to define a receiving space together with the carrier substrate, and a portion of the wafer is disposed in the receiving space. Inside.

在本發明的一實施例中,上述的定位溝槽設置於框架的第一側上。In an embodiment of the invention, the positioning groove is disposed on the first side of the frame.

在本發明的一實施例中,上述的定位機構可動地設置於框架的第二側上。In an embodiment of the invention, the positioning mechanism is movably disposed on the second side of the frame.

在本發明的一實施例中,上述的晶圓測試治具更包括至少一擋板,設置於框架上以部分覆蓋部分晶圓的一上表面。In an embodiment of the invention, the wafer test fixture further includes at least one baffle disposed on the frame to partially cover an upper surface of the portion of the wafer.

在本發明的一實施例中,上述的定位機構為一定位凹槽。In an embodiment of the invention, the positioning mechanism is a positioning groove.

本發明的一種晶圓動態測試治具,其包括一承載盤以及一承載膠帶。承載盤經配置以承載一部分晶圓,其中部分晶圓包括多個晶片且為一晶圓的一部分。承載膠帶設置於承載盤的一承載盤面上,以固定部分晶圓。A wafer dynamic test fixture of the present invention includes a carrier tray and a carrier tape. The carrier disk is configured to carry a portion of the wafer, wherein a portion of the wafer includes a plurality of wafers and is part of a wafer. The carrier tape is disposed on a carrier surface of the carrier tray to fix a portion of the wafer.

在本發明的一實施例中,上述的承載盤的材質選自於玻璃或矽晶圓。In an embodiment of the invention, the material of the carrier tray is selected from a glass or a germanium wafer.

在本發明的一實施例中,上述的承載盤更包括一定位溝槽,其設置於第一側並適於容置部分晶圓的一側緣。In an embodiment of the invention, the carrier tray further includes a positioning groove disposed on the first side and adapted to receive a side edge of the partial wafer.

本發明的一種晶圓測試方法包括下列步驟。提供一晶圓測試治具,其中晶圓測試治具上承載並固定多個部分晶圓的其中之一,而各部分晶圓包括多個晶片且為一晶圓的一部分。對固定於晶圓測試治具的部分晶圓進行一晶圓測試。A wafer testing method of the present invention includes the following steps. A wafer test fixture is provided, wherein one of the plurality of partial wafers is carried and fixed on the wafer test fixture, and each of the partial wafers comprises a plurality of wafers and is part of a wafer. A wafer test is performed on a portion of the wafers fixed to the wafer test fixture.

在本發明的一實施例中,上述的晶圓測試方法更包括:提供晶圓;將晶圓切割為部分晶圓;將部分晶圓的其中之一固定於晶圓測試治具上。In an embodiment of the invention, the wafer testing method further includes: providing a wafer; cutting the wafer into a partial wafer; and fixing one of the partial wafers to the wafer test fixture.

在本發明的一實施例中,上述的晶圓測試治具包括一承載盤以及一定位機構,承載盤上承載部分晶圓,定位機構將部分晶圓固定於承載盤上。In an embodiment of the invention, the wafer test fixture includes a carrier tray and a positioning mechanism. The carrier tray carries a portion of the wafer, and the positioning mechanism fixes a portion of the wafer to the carrier tray.

在本發明的一實施例中,上述的定位機構將部分晶圓固定於承載盤的步驟更包括:將部分晶圓的一側緣設置於承載盤的一定位溝槽內,其中定位溝槽設置於承載盤的一第一側,定位機構設置於承載盤相對第一側的一第二側;將部分晶圓的另一側緣抵靠定位機構,使定位機構推抵部分晶圓,以與定位溝槽共同夾持部分晶圓。In an embodiment of the invention, the step of fixing the partial wafer to the carrier tray further includes: placing a side edge of the partial wafer in a positioning groove of the carrier, wherein the positioning groove is disposed. On a first side of the carrier, the positioning mechanism is disposed on a second side of the carrier relative to the first side; the other side of the portion of the wafer is abutted against the positioning mechanism, so that the positioning mechanism pushes the partial wafer to The positioning grooves collectively hold a portion of the wafer.

在本發明的一實施例中,上述的晶圓測試方法更包括:提供晶圓;將晶圓設置並固定於一承載膠帶上,其中承載膠帶設置於一承載盤上;將固定的晶圓及承載膠帶切割為多個晶圓測試單元,各晶圓測試單元包括部分晶圓以及晶圓測試治具,部分晶圓承載並固定於晶圓測試治具上。In an embodiment of the present invention, the wafer testing method further includes: providing a wafer; disposing and fixing the wafer on a carrier tape, wherein the carrier tape is disposed on a carrier tray; and the fixed wafer and The carrier tape is cut into a plurality of wafer test units, and each wafer test unit includes a part of the wafer and a wafer test fixture, and some of the wafers are carried and fixed on the wafer test fixture.

在本發明的一實施例中,上述的晶圓測試治具包括承載盤以及承載膠帶的一部分。In an embodiment of the invention, the wafer test fixture includes a carrier tray and a portion of the carrier tape.

在本發明的一實施例中,上述的晶圓測試方法更包括:在對固定於晶圓測試治具的部分晶圓進行晶圓測試之後,對晶圓測試治具進行一解膠製程。In an embodiment of the invention, the wafer testing method further comprises: performing a debonding process on the wafer test fixture after performing wafer testing on a portion of the wafer fixed to the wafer test fixture.

在本發明的一實施例中,上述的承載膠帶包括紫外光固化解膠膜,且解膠製程包括照射UV光。In an embodiment of the invention, the carrier tape comprises an ultraviolet curing film, and the dissolving process comprises irradiating UV light.

在本發明的一實施例中,上述的晶圓測試包括動態晶圓測試。In an embodiment of the invention, the wafer test described above includes a dynamic wafer test.

在本發明的一實施例中,上述的晶圓包括微機電系統(Micro Electro Mechanical System, MEMS)晶圓。In an embodiment of the invention, the wafer comprises a Micro Electro Mechanical System (MEMS) wafer.

基於上述,本發明是利用晶圓測試治具承載部分晶圓,使部分晶圓可輕易地透過定位機構而固定於晶圓測試治具的承載盤上。如此,本發明的晶圓測試方法即可透過晶圓測試治具而將部分晶圓載入尺寸相容的晶圓測試機台,以同時對部分晶圓的多個晶片進行晶圓測試。因此,本發明無須額外購入與晶圓測試機台配合的昂貴特殊載具及機台,可大幅降低晶圓測試的成本。除此之外,相較於習知將切割後的各個晶片逐一置放於特殊載具再進行測試的作法,本發明的晶圓測試方法及晶圓測試治具亦可大幅節省測試前的準備與設定時間,進而增加晶圓測試的效率。Based on the above, the present invention utilizes a wafer test fixture to carry a portion of the wafer so that a portion of the wafer can be easily fixed to the carrier of the wafer test fixture through the positioning mechanism. In this way, the wafer testing method of the present invention can load a part of the wafer into a dimensionally compatible wafer testing machine through the wafer testing fixture to simultaneously perform wafer testing on a plurality of wafers of a part of the wafer. Therefore, the present invention can significantly reduce the cost of wafer testing without the need to purchase additional expensive special carriers and machines that are compatible with the wafer testing machine. In addition, the wafer test method and the wafer test fixture of the present invention can also greatly save the preparation before testing, compared with the conventional method of placing the diced wafers on a special carrier and testing them one by one. And set the time, which in turn increases the efficiency of wafer testing.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.

圖1是依照本發明的一實施例的一種晶圓的示意圖。圖2是依照本發明的一實施例的一種晶圓測試治具承載部分晶圓的示意圖。請同時參照圖1及圖2,在本實施例中,晶圓測試治具100適於承載一部分晶圓210,以將此晶圓測試治具100連同其上的部分晶圓210載入一晶圓測試機台,以對上述的部分晶圓210進行晶圓測試。詳細而言,部分晶圓210可如圖1所示包括多個晶片,且部分晶圓210為晶圓200的一部分,其例如是透過對晶圓200進行切割而得,其具體步驟可例如為提供晶圓200,接著如圖1所示之將晶圓200切割為多個部分晶圓210,之後再如圖2所示之將部分晶圓210的其中之一固定於晶圓測試治具100上。1 is a schematic diagram of a wafer in accordance with an embodiment of the present invention. 2 is a schematic diagram of a wafer test fixture carrying a portion of a wafer in accordance with an embodiment of the invention. Referring to FIG. 1 and FIG. 2 simultaneously, in the embodiment, the wafer test fixture 100 is adapted to carry a portion of the wafer 210 to load the wafer test fixture 100 together with a portion of the wafer 210 thereon. A round test machine is used to perform wafer testing on a portion of the wafer 210 described above. In detail, a part of the wafer 210 may include a plurality of wafers as shown in FIG. 1 , and a part of the wafers 210 is a part of the wafers 200 , which is obtained by cutting the wafers 200 , for example, the specific steps may be, for example, The wafer 200 is provided, and then the wafer 200 is diced into a plurality of partial wafers 210 as shown in FIG. 1, and then one of the partial wafers 210 is fixed to the wafer test fixture 100 as shown in FIG. on.

須說明的是,圖1所示的部分晶圓210是透過對晶圓200進行四等分切割而得,亦即,部分晶圓210是晶圓200的四等分的其中之一,但本發明並不侷限於此。在其他實施例中,部分晶圓210亦可為晶圓200的其他任意等分的其中之一,例如二等分、八等分等等,只要部分晶圓210為晶圓200的一部分,且包含至少兩個以上之晶片即可。It should be noted that the partial wafer 210 shown in FIG. 1 is obtained by performing quarter-cutting of the wafer 200, that is, the partial wafer 210 is one of four quarters of the wafer 200, but The invention is not limited to this. In other embodiments, the partial wafer 210 may also be one of any other halving of the wafer 200, such as halving, octave, etc., as long as the partial wafer 210 is part of the wafer 200, and It suffices to include at least two or more wafers.

據此,本實施例的晶圓測試方法可包括下列步驟:首先,提供如圖2所示的晶圓測試治具100,其中,晶圓測試治具100上承載並固定多個部分晶圓210的其中之一,而各個部分晶圓210包括多個晶片,且為晶圓200的一部分。接著,對固定於晶圓測試治具100的部分晶圓210進行晶圓測試。舉例而言,晶圓200可包括微機電系統(Micro Electro Mechanical System, MEMS)晶圓,例如為加速度計、MEMS麥克風、磁力計或陀螺儀等,而前述的晶圓測試可包括動態晶圓測試。當然,本發明並不侷限於此,在其他實施例中,晶圓測試亦可為一般的晶圓測試或是任何晶圓測試過程中須移動晶圓者,均可利用本實施例之晶圓測試治具100來承載部分晶圓210以進行晶圓測試。應用於上述的晶圓測試方法的晶圓測試治具100可包括多種不同的態樣,以下將列舉其中的幾種態樣做詳細說明。Accordingly, the wafer testing method of the present embodiment may include the following steps: First, the wafer testing fixture 100 shown in FIG. 2 is provided, wherein the wafer testing fixture 100 carries and fixes a plurality of partial wafers 210. One of the plurality of wafers 210 includes a plurality of wafers and is part of the wafer 200. Next, wafer testing is performed on a portion of the wafer 210 fixed to the wafer test fixture 100. For example, the wafer 200 may include a Micro Electro Mechanical System (MEMS) wafer, such as an accelerometer, a MEMS microphone, a magnetometer, or a gyroscope, and the aforementioned wafer test may include dynamic wafer testing. . Of course, the present invention is not limited thereto. In other embodiments, the wafer test can also be a general wafer test or a wafer mover in any wafer test process, and the wafer test of the embodiment can be utilized. Fixture 100 carries a portion of wafer 210 for wafer testing. The wafer test fixture 100 applied to the wafer test method described above may include a variety of different aspects, and several of them will be described in detail below.

圖3是依照本發明的一實施例的一種晶圓測試治具的構件分解示意圖。圖4是圖3的晶圓測試治具的組裝示意圖。圖5是圖4的晶圓測試治具承載部分晶圓的示意圖。請同時參照圖3至圖5,在本實施例中,晶圓測試治具100a包括一承載盤110以及一定位機構120。承載盤100經配置以承載前述的部分晶圓210。承載盤110包括一定位溝槽112、一第一側S1以及相對第一側S1的一第二側S2。定位溝槽112設置於第一側S1並適於容置部分晶圓210的一側緣。定位機構120設置於第二側S2,並經配置與定位溝槽112共同夾持部分晶圓210。在本實施例中,承載盤110可為一矩形承載盤,當然,本發明並不以此為限,只要承載盤110的尺寸可與晶圓測試機台所需要的特定尺寸相容即可。3 is a schematic exploded view of a wafer test fixture according to an embodiment of the invention. 4 is a schematic view showing the assembly of the wafer test fixture of FIG. 3. FIG. 5 is a schematic diagram of the wafer test fixture carrying portion of the wafer of FIG. 4. FIG. Referring to FIG. 3 to FIG. 5 simultaneously, in the embodiment, the wafer test fixture 100a includes a carrier tray 110 and a positioning mechanism 120. The carrier disk 100 is configured to carry the aforementioned partial wafer 210. The carrier tray 110 includes a positioning groove 112, a first side S1 and a second side S2 opposite to the first side S1. The positioning groove 112 is disposed on the first side S1 and is adapted to receive a side edge of the partial wafer 210. The positioning mechanism 120 is disposed on the second side S2 and configured to clamp a portion of the wafer 210 together with the positioning groove 112. In this embodiment, the carrier 110 can be a rectangular carrier. Of course, the invention is not limited thereto, as long as the size of the carrier 110 is compatible with the specific size required for the wafer testing machine.

在這樣的結構配置下,晶圓200經切割為多個部分晶圓210後,部分晶圓210可輕易地透過定位機構120而固定於晶圓測試治具100的承載盤110上。如此,本實施例可透過晶圓測試治具100將部分晶圓210載入尺寸配合的晶圓測試機台,以同時對多個晶片進行晶圓測試,例如是一般之晶圓測試或晶圓級動態終端測試等。如此,本實施例無須額外購入與晶圓測試機台配合的特殊載具及機台,可大幅節省測試的成本。並且,相較於習知將切割後的晶片逐一置放於特殊載具再進行測試的作法,本實施例可大幅節省測試前的準備與設定時間,更可增加晶圓測試的效率。In such a configuration, after the wafer 200 is diced into a plurality of partial wafers 210, a portion of the wafers 210 can be easily fixed to the carrier 110 of the wafer test fixture 100 through the positioning mechanism 120. In this manner, the present embodiment can load a portion of the wafer 210 into the size-matched wafer testing machine through the wafer test fixture 100 to simultaneously perform wafer testing on a plurality of wafers, such as a general wafer test or wafer. Level dynamic terminal testing, etc. In this way, the embodiment does not require additional purchase of a special carrier and a machine that cooperate with the wafer testing machine, which can greatly reduce the cost of testing. Moreover, compared with the conventional method of placing the diced wafers on a special carrier and testing them, the present embodiment can greatly save the preparation and setting time before the test, and can increase the efficiency of the wafer test.

詳細而言,在本實施例中,承載盤110可包括一承載底板114以及一框架116,其中,框架116框圍承載底板114的邊緣,以與承載底板114共同定義出一容置空間,而上述的部分晶圓即設置於此容置空間內。在本實施例中,晶圓測試治具100a更包括至少一擋板130,設置於框架116之第一側S1上,以與承載底板114共同形成定位溝槽112。當然,本實施例僅用以舉例說明,本發明並不限制定位溝槽112的形態及形成手段。在其它實施例中,定位溝槽112亦可直接形成於框架116之框圍範圍上,廣義而言,只要是用於固定部份晶圓210之至少一側於承載底板114之框圍邊緣之設計,即使其外觀形狀為凹入、凸出於第二側S2或是與第二側共平面,都可視為定位溝槽112之等效技術。擋板130的數量可為多個,具體而言,擋板130的數量可例如為兩個,其例如分別置於第一側S1與第二側S2,其設置的方式可以單獨構件設置於框架116上或是於框架116直接一體成型,圖式中之設置方式僅用以說明,並不用以限制本案之實施方式。綜言之,擋板130用以其部分覆蓋部分晶圓210a的上表面,以進一步防止部分晶圓210a自晶圓測試治具100a掉落,同時亦可限制定位機構120定位於第二側S2依預定的路徑運作。在此須說明的是,為了更清楚呈現擋板130下方的結構,圖4及圖5中的擋板130以虛線繪示。在本實施例中,定位機構120可包括具有彈性之一推抵件124,其中,推抵件124設置於第二側S2並凸出於第二側S2。In detail, in this embodiment, the carrier tray 110 can include a carrying bottom plate 114 and a frame 116, wherein the frame 116 surrounds the edge of the bottom plate 114 to define an accommodating space together with the carrying bottom plate 114. The above partial wafer is disposed in the accommodating space. In this embodiment, the wafer test fixture 100a further includes at least one baffle 130 disposed on the first side S1 of the frame 116 to form a positioning groove 112 together with the carrier substrate 114. Of course, this embodiment is for illustrative purposes only, and the present invention does not limit the form and formation means of the positioning groove 112. In other embodiments, the positioning trenches 112 may also be formed directly on the frame of the frame 116. In a broad sense, as long as at least one side of the portion of the wafer 210 is fixed to the framed edge of the carrier substrate 114. The design, even if its appearance is concave, convex from the second side S2 or coplanar with the second side, can be considered as an equivalent technique for positioning the groove 112. The number of the baffles 130 may be plural. Specifically, the number of the baffles 130 may be, for example, two, which are respectively disposed on the first side S1 and the second side S2, respectively, and may be disposed in a separate component to the frame. 116 is either directly formed in the frame 116. The arrangement in the drawings is for illustrative purposes only and is not intended to limit the implementation of the present invention. In summary, the baffle 130 is used to partially cover the upper surface of the portion of the wafer 210a to further prevent the partial wafer 210a from falling from the wafer test fixture 100a, and also to limit the positioning mechanism 120 to the second side S2. Operate according to the scheduled path. It should be noted that the baffle 130 in FIGS. 4 and 5 is shown by a broken line in order to more clearly show the structure under the baffle 130. In the present embodiment, the positioning mechanism 120 may include one of the elastic pushing members 124, wherein the pushing member 124 is disposed on the second side S2 and protrudes from the second side S2.

進一步而言,本實施例的承載盤110可例如用以承載如圖2所示之晶圓200的邊緣區域之部分晶圓210a,其包括一弧形側緣,而推抵件124可包括對應於上述弧形側緣的至少一推抵斜面124a、124b。如此,當使用者欲將部分晶圓210設置於晶圓測試治具100a上時,可將部分晶圓210a的側緣先設置於定位溝槽112內,接著再將另一側的弧形側緣抵靠於推抵斜面124a、124b,使推抵件124受壓迫而產生彈性恢復力,並透過此彈性恢復力而推抵部分晶圓210a往第一側S1移動以與位於第一側S1的定位溝槽112卡合,定位機構120即可與定位溝槽112共同夾持部分晶圓210a。須說明的是,本實施例僅用以舉例說明,本發明並不限制部分晶圓210a設置於晶圓測試治具100a的設置方式。在其他實施例中,使用者亦可先以部分晶圓210a的一側緣推抵定位機構120的推抵件124,再將部分晶圓210a的另一側緣設置於定位溝槽112內,並透過推抵件124的彈性恢復力而推抵部分晶圓210a往第一側S1移動以與位於第一側S1的定位溝槽112卡合。Further, the carrier 110 of the present embodiment can be used, for example, to carry a portion of the wafer 210a of the edge region of the wafer 200 as shown in FIG. 2, which includes an arcuate side edge, and the pushing member 124 can include a corresponding At least one of the curved side edges pushes against the slopes 124a, 124b. As such, when the user wants to place part of the wafer 210 on the wafer test fixture 100a, the side edge of the partial wafer 210a may be first disposed in the positioning groove 112, and then the curved side of the other side may be disposed. The edge abuts against the inclined surfaces 124a and 124b, so that the pushing member 124 is pressed to generate an elastic restoring force, and the elastic restoring force is pushed to the partial wafer 210a to move to the first side S1 to be located on the first side S1. The positioning groove 112 is engaged, and the positioning mechanism 120 can clamp a part of the wafer 210a together with the positioning groove 112. It should be noted that the present embodiment is for illustrative purposes only, and the present invention does not limit the manner in which a portion of the wafer 210a is disposed on the wafer test fixture 100a. In other embodiments, the user may first push the one side edge of the partial wafer 210a against the pushing member 124 of the positioning mechanism 120, and then set the other side edge of the partial wafer 210a in the positioning groove 112. The portion of the wafer 210a is pushed to the first side S1 by the elastic restoring force of the pushing member 124 to be engaged with the positioning groove 112 at the first side S1.

在本實施例中,推抵件124的推抵斜面124a、124b的數量可為多個(繪示為兩個),如此,無論部分晶圓210a的設置方向為何(弧形側緣朝上或朝下),其弧形側緣皆可抵靠推抵斜面124a、124b的其中之一,因而可增加部分晶圓210a設置於晶圓測試治具100a上的設置彈性及便利性。當然,本實施例僅用以舉例說明,本實施例的承載盤110可用以承載任意之部分晶圓210,並不侷限於晶圓200的邊緣區域之部分晶圓210a。In this embodiment, the number of the pushing slopes 124a, 124b of the pushing member 124 may be plural (illustrated as two), so that regardless of the direction in which the partial wafers 210a are disposed (the curved side edges are upward or Downwardly, the curved side edges can abut against one of the inclined surfaces 124a, 124b, thereby increasing the flexibility and convenience of the partial wafer 210a disposed on the wafer test fixture 100a. Certainly, the embodiment is only used for exemplification. The carrier 110 of the embodiment can be used to carry any part of the wafer 210, and is not limited to a part of the wafer 210a of the edge region of the wafer 200.

由於部分晶圓210a是先卡合於第一側的定位溝槽112,再透過定位機構120的推抵而與定位溝槽112共同夾持部分晶圓210a,因此,部分晶圓210a的設置位置是以第一側S1為定位基準。此外,本實施例的晶圓測試治具100a更可包括一定位標記140,其設置於承載盤110上做為機台對位之用。Since the partial wafer 210a is first engaged with the positioning groove 112 of the first side, and then the partial wafer 210a is clamped together with the positioning groove 112 by the pushing of the positioning mechanism 120, the position of the partial wafer 210a is set. The first side S1 is used as a positioning reference. In addition, the wafer test fixture 100a of the present embodiment may further include a positioning mark 140 disposed on the carrier tray 110 for use in aligning the machine.

圖6是依照本發明的另一實施例的一種晶圓測試治具的構件分解示意圖。圖7是圖6的晶圓測試治具的組裝示意圖。圖8是圖7的晶圓測試治具承載部分晶圓的示意圖。在此必須說明的是,本實施例之晶圓測試治具100b與圖3至圖5之晶圓測試治具100a相似,因此,本實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,本實施例不再重複贅述。請參照圖6以及圖8,以下將針對本實施例之晶圓測試治具100b與圖3至圖5之晶圓測試治具100a的差異做說明。須說明的是,圖7及圖8中的擋板130以虛線繪示,以更清楚呈現擋板130下方的結構。6 is a schematic exploded view of a wafer test fixture in accordance with another embodiment of the present invention. 7 is a schematic view showing the assembly of the wafer test fixture of FIG. 6. 8 is a schematic diagram of the wafer test fixture carrying portion of the wafer of FIG. It should be noted that the wafer test fixture 100b of the present embodiment is similar to the wafer test fixture 100a of FIGS. 3 to 5, and therefore, this embodiment uses the component numbers and parts of the foregoing embodiments, wherein The same reference numerals are used to denote the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted part, reference may be made to the foregoing embodiment, and the description is not repeated herein. Referring to FIG. 6 and FIG. 8, the difference between the wafer test fixture 100b of the present embodiment and the wafer test fixture 100a of FIGS. 3 to 5 will be described below. It should be noted that the baffle 130 in FIGS. 7 and 8 is shown by a broken line to more clearly show the structure under the baffle 130.

在本實施例中,定位機構120包括一具彈性之推抵件,樞設於第二側S2,以移動於如圖7所示之一初始位置以及如圖8所示之一夾持位置之間。推抵件包括彼此連接的一樞接端126以及一推抵端128,其中,樞接端126彈性樞接於第二側S2,以帶動推抵端128可復位地移動於初始位置及夾持位置之間。並且,推抵件位於初始位置時,推抵端128凸出於第二側S2。如此配置,當使用者欲將部分晶圓210b設置於晶圓測試治具100b上時,可將部分晶圓210b的側緣先設置於定位溝槽112內,接者再將另一側的側緣抵靠於凸出於第二側S2的推抵端128,並利用推抵件的彈性復位力而使推抵端128往第一側S1的方向推抵部分晶圓210b往第一側S1移動以與位於第一側S1的定位溝槽112卡合,定位機構120即可與定位溝槽112共同夾持部分晶圓210b。當然,本實施例僅用以舉例說明,本發明並不限制部分晶圓210b設置於晶圓測試治具100b的設置方式。在其他實施例中,使用者亦可先以部分晶圓210b的一側緣推抵定位機構120,再將部分晶圓210b的另一側緣設置於定位溝槽112內,並透過推抵件的彈性恢復力而推抵部分晶圓210b往第一側S1移動,以與位於第一側S1的定位溝槽112卡合。In this embodiment, the positioning mechanism 120 includes an elastic pushing member pivotally disposed on the second side S2 to move to an initial position as shown in FIG. 7 and a clamping position as shown in FIG. between. The pushing member includes a pivoting end 126 and a pushing end 128 connected to each other, wherein the pivoting end 126 is elastically pivoted to the second side S2 to drive the pushing end 128 to be repositionably moved to the initial position and clamped Between locations. And, when the pushing member is in the initial position, the pushing end 128 protrudes from the second side S2. In this way, when the user wants to set part of the wafer 210b on the wafer test fixture 100b, the side edge of the partial wafer 210b can be first disposed in the positioning groove 112, and the side of the other side can be connected. The edge abuts against the pushing end 128 of the second side S2, and pushes the pushing end 128 to the first side S1 toward the first side S1 by the elastic restoring force of the pushing member to the first side S1 The movement is engaged with the positioning groove 112 located on the first side S1, and the positioning mechanism 120 can clamp the partial wafer 210b together with the positioning groove 112. Of course, this embodiment is for illustrative purposes only, and the present invention does not limit the manner in which part of the wafer 210b is disposed on the wafer test fixture 100b. In other embodiments, the user may first push the one side edge of the partial wafer 210b against the positioning mechanism 120, and then set the other side edge of the partial wafer 210b in the positioning groove 112, and pass through the pushing member. The elastic restoring force pushes the partial wafer 210b to move toward the first side S1 to engage with the positioning groove 112 located at the first side S1.

須說明的是,本實施例的晶圓測試治具100b可例如用以承載如圖2所示之晶圓200的中間區域之部分晶圓210b,其具有相較於邊緣區域之部分晶圓210a較為平直的側緣,且較無明顯之方向性。當然,本實施例僅用以舉例說明,本實施例的承載盤110可用以承載任意之部分晶圓210,並不侷限於晶圓200的中間區域之部分晶圓210b。It should be noted that the wafer test fixture 100b of the present embodiment can be used, for example, to carry a portion of the wafer 210b of the intermediate portion of the wafer 200 as shown in FIG. 2, which has a portion of the wafer 210a compared to the edge region. More straight side edges, and less obvious directionality. Of course, this embodiment is only used for exemplification. The carrier 110 of the present embodiment can be used to carry any part of the wafer 210, and is not limited to the partial wafer 210b of the intermediate portion of the wafer 200.

圖9是依照本發明的另一實施例的一種晶圓測試治具承載部分晶圓的示意圖。在此必須說明的是,本實施例之晶圓測試治具100c與圖3至圖5之晶圓測試治具100a相似,因此,本實施例沿用前述實施例的元件標號與部分內容,其中採用相同的標號來表示相同或近似的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,本實施例不再重複贅述。請參照圖9,以下將針對本實施例之晶圓測試治具100c與圖3至圖5之晶圓測試治具100a的差異做說明。須說明的是,圖9中的擋板130以虛線繪示,以更清楚呈現擋板130下方的結構。9 is a schematic diagram of a wafer test fixture carrying a portion of a wafer in accordance with another embodiment of the present invention. It should be noted that the wafer test fixture 100c of the present embodiment is similar to the wafer test fixture 100a of FIGS. 3 to 5, and therefore, this embodiment uses the component numbers and parts of the foregoing embodiments, wherein The same reference numerals are used to denote the same or similar elements, and the description of the same technical content is omitted. For the description of the omitted part, reference may be made to the foregoing embodiment, and the description is not repeated herein. Referring to FIG. 9, the difference between the wafer test fixture 100c of the present embodiment and the wafer test fixture 100a of FIGS. 3 to 5 will be described below. It should be noted that the baffle 130 in FIG. 9 is shown in dashed lines to more clearly show the structure under the baffle 130.

在本實施例中,定位機構120為一定位凹槽,其結構可相似於第一側S1的定位溝槽112,利用一擋板130設置於第二側S2形成一定位凹槽。也就是說,晶圓測試治具100c是利用位於第一側S1的定位溝槽112以及位於第二側S2的定位凹槽來共同夾持部分晶圓210的相對兩側緣,以將部分晶圓210固定於晶圓測試治具100c上。須說明的是,上述的實施例僅用以舉例說明,本發明並不限制定位機構120的實際結構態樣,只要晶圓測試治具100可用以承載部分晶圓210,並利用定位機構120將部分晶圓210固定於晶圓測試治具100上即為本發明所欲保護的範圍。In this embodiment, the positioning mechanism 120 is a positioning groove, and the structure thereof can be similar to the positioning groove 112 of the first side S1, and a positioning groove is formed on the second side S2 by using a baffle 130. That is, the wafer test fixture 100c uses the positioning grooves 112 on the first side S1 and the positioning grooves on the second side S2 to collectively clamp the opposite side edges of the partial wafer 210 to partially crystallize The circle 210 is fixed to the wafer test fixture 100c. It should be noted that the above embodiments are for illustrative purposes only, and the present invention does not limit the actual structural aspect of the positioning mechanism 120 as long as the wafer test fixture 100 can be used to carry a portion of the wafer 210 and utilize the positioning mechanism 120. The mounting of the partial wafer 210 on the wafer test fixture 100 is within the scope of the present invention.

圖10及圖11是依照本發明的另一實施例的一種晶圓動態測試治具承載部分晶圓的流程示意圖。圖12是依照本發明的另一實施例的一種晶圓動態測試治具承載部分晶圓的示意圖。晶圓測試方法除了如前所述之先將晶圓200切割為多個部分晶圓210,再將部分晶圓210設置於晶圓測試治具100上以外,亦可如圖10所示之先提供晶圓200,並將晶圓200設置且固定於一承載盤320上的一承載膠帶310上,再對固定的晶圓200及承載膠帶310進行切割,以形成如圖11所示之多個晶圓測試單元10,之後,再對此晶圓測試單元10進行晶圓測試。10 and FIG. 11 are schematic diagrams showing the flow of a wafer dynamic test fixture carrying a portion of a wafer according to another embodiment of the present invention. FIG. 12 is a schematic diagram of a wafer dynamic test fixture carrying portion wafer according to another embodiment of the present invention. The wafer test method may be performed by cutting the wafer 200 into a plurality of partial wafers 210 and then placing a portion of the wafers 210 on the wafer test fixture 100, as shown in FIG. A wafer 200 is provided, and the wafer 200 is disposed and fixed on a carrier tape 310 on a carrier 320, and the fixed wafer 200 and the carrier tape 310 are cut to form a plurality of layers as shown in FIG. Wafer test unit 10, after which wafer test is performed on wafer test unit 10.

詳細而言,各晶圓測單元10如圖11所示之包括部分晶圓210以及晶圓測試治具300,其中,部分晶圓210承載並固定於晶圓測試治具300上。在此須說明的是,本實施例所進行的晶圓測試可為一晶圓動態測試,因此,本實施例之晶圓測試治具300亦可為一晶圓動態測試治具300。詳細來說,晶圓動態測試治具300可包括承載膠帶310以及承載盤320,承載盤320經配置以承載上述的部分晶圓210,其材質可為玻璃、矽晶圓等類似材質。而承載膠帶310則設置於承載盤320的表面,以利用其黏性來固定部分晶圓210。更具體而言,由於晶圓測試治具300是由圖10所示之承載盤320及承載膠帶310所切割而來,故晶圓測試治具300的承載盤320實則為切割前的承載盤320的一部分,而晶圓測試治具300的承載膠帶310實則為切割前的承載膠帶310的一部分。此外,請參照圖12,承載盤320更可包括一定位溝槽322,其設置於晶圓測試治具300的第一側S1,用以容置部分晶圓210的側緣,以幫助部分晶圓210進行定位,更可進一步固定部分晶圓210於承載盤320上。當然,在其他實施例中,定位溝槽322亦可如圖12所示之設置於承載盤320的相對兩側,以利用兩側之定位溝槽322予以固定部分晶圓210於承載盤320上,並配合承載膠帶310定位。In detail, each of the wafer measuring units 10 includes a partial wafer 210 and a wafer test fixture 300 as shown in FIG. 11 , wherein a portion of the wafer 210 is carried and fixed on the wafer test fixture 300 . It should be noted that the wafer test performed in this embodiment may be a dynamic test of the wafer. Therefore, the wafer test fixture 300 of the embodiment may also be a wafer dynamic test fixture 300. In detail, the wafer dynamic test fixture 300 may include a carrier tape 310 and a carrier tray 320 configured to carry the above-mentioned partial wafer 210, which may be made of glass, germanium wafer or the like. The carrier tape 310 is disposed on the surface of the carrier tray 320 to fix a portion of the wafer 210 by utilizing its adhesiveness. More specifically, since the wafer test fixture 300 is cut by the carrier tray 320 and the carrier tape 310 shown in FIG. 10, the carrier tray 320 of the wafer test fixture 300 is actually the carrier tray 320 before cutting. A portion of the carrier tape 310 of the wafer test fixture 300 is actually part of the carrier tape 310 prior to cutting. In addition, referring to FIG. 12 , the carrier 320 further includes a positioning trench 322 disposed on the first side S1 of the wafer test fixture 300 for accommodating the side edge of the portion of the wafer 210 to assist the partial crystal. The circle 210 is positioned to further fix a portion of the wafer 210 on the carrier tray 320. Of course, in other embodiments, the positioning trenches 322 can also be disposed on opposite sides of the carrier 320 as shown in FIG. 12 to fix a portion of the wafer 210 on the carrier 320 by using the positioning trenches 322 on both sides. And positioning with the carrying tape 310.

在這樣的結構配置下,本實施例的晶圓測試方法更可在對部分晶圓210進行晶圓測試之後,再對晶圓測試治具300進行一解膠製程。在本實施例中,承載膠帶310可為紫外光固化解膠膜,如此,前述的解膠製程則可包括對承載膠帶310照射UV光,以大幅降低承載膠帶310的黏性,使部分晶圓210可輕易地自晶圓測試治具300上脫離。在本實施例中,承載盤320之外觀以矩形為例,當然,本發明並不以此為限,只要承載盤320的尺寸可與晶圓測試機台所需要的特定尺寸相容即可。Under such a structural configuration, the wafer testing method of the present embodiment can perform a debonding process on the wafer testing fixture 300 after performing wafer testing on a portion of the wafer 210. In this embodiment, the carrier tape 310 may be an ultraviolet curing film. Thus, the dissolving process may include irradiating the carrier tape 310 with UV light to greatly reduce the viscosity of the carrier tape 310, so that a portion of the wafer is partially removed. 210 can be easily detached from the wafer test fixture 300. In this embodiment, the appearance of the carrier 320 is exemplified by a rectangle. Of course, the invention is not limited thereto, as long as the size of the carrier 320 is compatible with the specific size required for the wafer testing machine.

綜上所述,本發明的晶圓測試方法是利用晶圓測試治具承載部分晶圓,使部分晶圓可輕易地透過定位機構而固定於晶圓測試治具的承載盤上,以對部分晶圓進行晶圓測試。也就是說,本發明可透過晶圓測試治具而將部分晶圓載入尺寸相容的晶圓測試機台,以同時對部分晶圓的多個晶片進行晶圓測試,例如是一般之晶圓測試或晶圓級動態終端測試等。如此,本發明無須額外購入與晶圓測試機台配合的昂貴特殊載具及機台,因而可大幅降低晶圓測試的成本。並且,相較於習知將切割後的各個晶片置放於特殊載具的作法,本發明的晶圓測試方法及晶圓測試治具可大幅節省測試前的準備與設定時間,更可增加晶圓測試的效率。In summary, the wafer testing method of the present invention utilizes a wafer test fixture to carry a portion of the wafer, so that part of the wafer can be easily fixed to the carrier of the wafer test fixture through the positioning mechanism, to partially The wafer is wafer tested. In other words, the present invention can load a part of the wafer into a dimensionally compatible wafer testing machine through a wafer test fixture to simultaneously perform wafer testing on a plurality of wafers of a part of the wafer, for example, a general crystal. Round test or wafer level dynamic terminal test. In this way, the invention does not require the purchase of expensive special carriers and machines that are compatible with the wafer testing machine, thereby greatly reducing the cost of wafer testing. Moreover, compared with the conventional method of placing the diced wafers on a special carrier, the wafer test method and the wafer test fixture of the present invention can greatly save the preparation and set time before the test, and can further increase the crystal. The efficiency of the round test.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

10‧‧‧晶圓測試單元10‧‧‧ Wafer Test Unit

100、100a、100b、100c、300‧‧‧晶圓測試治具100, 100a, 100b, 100c, 300‧‧‧ wafer test fixtures

110‧‧‧承載盤110‧‧‧Loading tray

112‧‧‧定位溝槽112‧‧‧ Positioning groove

114‧‧‧承載底板114‧‧‧ carrying base plate

116‧‧‧框架116‧‧‧Frame

124‧‧‧推抵件124‧‧‧Parts

124a、124b‧‧‧推抵斜面124a, 124b‧‧‧ pushed to the slope

126‧‧‧樞接端126‧‧‧ pivot end

128‧‧‧推抵端 128‧‧‧Pushing end

130‧‧‧擋板 130‧‧ ‧ baffle

140‧‧‧定位標記 140‧‧‧ Positioning Mark

200‧‧‧晶圓 200‧‧‧ wafer

210、210a、210b‧‧‧部分晶圓 210, 210a, 210b‧‧‧ part of the wafer

310‧‧‧承載膠帶 310‧‧‧ Carrying tape

320‧‧‧承載盤 320‧‧‧ Carrying tray

322‧‧‧定位溝槽 322‧‧‧Positioning groove

S1‧‧‧第一側 S1‧‧‧ first side

S2‧‧‧第二側 S2‧‧‧ second side

圖1是依照本發明的一實施例的一種晶圓的示意圖。 圖2是依照本發明的一實施例的一種晶圓測試治具承載部分晶圓的示意圖。 圖3是依照本發明的一實施例的一種晶圓測試治具的構件分解示意圖。 圖4是圖3的晶圓測試治具的組裝示意圖。 圖5是圖4的晶圓測試治具承載部分晶圓的示意圖。 圖6是依照本發明的另一實施例的一種晶圓測試治具的構件分解示意圖。 圖7是圖6的晶圓測試治具的組裝示意圖。 圖8是圖7的晶圓測試治具承載部分晶圓的示意圖。 圖9是依照本發明的另一實施例的一種晶圓測試治具承載部分晶圓的示意圖。 圖10及圖11是依照本發明的另一實施例的一種晶圓動態測試治具承載部分晶圓的流程示意圖。 圖12是依照本發明的另一實施例的一種晶圓動態測試治具承載部分晶圓的示意圖。1 is a schematic diagram of a wafer in accordance with an embodiment of the present invention. 2 is a schematic diagram of a wafer test fixture carrying a portion of a wafer in accordance with an embodiment of the invention. 3 is a schematic exploded view of a wafer test fixture according to an embodiment of the invention. 4 is a schematic view showing the assembly of the wafer test fixture of FIG. 3. FIG. 5 is a schematic diagram of the wafer test fixture carrying portion of the wafer of FIG. 4. FIG. 6 is a schematic exploded view of a wafer test fixture in accordance with another embodiment of the present invention. 7 is a schematic view showing the assembly of the wafer test fixture of FIG. 6. 8 is a schematic diagram of the wafer test fixture carrying portion of the wafer of FIG. 9 is a schematic diagram of a wafer test fixture carrying a portion of a wafer in accordance with another embodiment of the present invention. 10 and FIG. 11 are schematic diagrams showing the flow of a wafer dynamic test fixture carrying a portion of a wafer according to another embodiment of the present invention. FIG. 12 is a schematic diagram of a wafer dynamic test fixture carrying portion wafer according to another embodiment of the present invention.

100、100a、100b‧‧‧晶圓測試治具 100, 100a, 100b‧‧‧ wafer test fixture

210、210a、210b‧‧‧部分晶圓 210, 210a, 210b‧‧‧ part of the wafer

Claims (24)

一種晶圓測試治具,包括:一承載盤,經配置以承載一部分晶圓,其中該部分晶圓包括多個晶片且為一晶圓的一部分,該承載盤包括一定位溝槽、一第一側以及相對該第一側的一第二側,該定位溝槽設置於該第一側並適於容置該部分晶圓的一側緣;以及一定位機構,設置於該第二側,並經配置與該定位溝槽共同夾持該部分晶圓。 A wafer test fixture includes: a carrier tray configured to carry a portion of a wafer, wherein the portion of the wafer includes a plurality of wafers and is part of a wafer, the carrier tray includes a positioning trench, a first a positioning groove is disposed on the first side and is disposed to receive a side edge of the portion of the wafer; and a positioning mechanism is disposed on the second side, and a second side opposite to the first side The portion of the wafer is clamped together with the positioning groove. 如申請專利範圍第1項所述的晶圓測試治具,其中該定位機構包括具有彈性之一推抵件,設置於該第二側並凸出於該第二側。 The wafer test fixture of claim 1, wherein the positioning mechanism comprises a resilient pushing member disposed on the second side and protruding from the second side. 如申請專利範圍第2項所述的晶圓測試治具,其中該推抵件包括至少一推抵斜面,該部分晶圓包括一弧形側緣,其適於抵靠該推抵斜面,使該推抵件受壓迫而推抵該部分晶圓往該第一側移動以與該定位溝槽卡合。 The wafer test fixture of claim 2, wherein the pushing member comprises at least one pushing slope, the partial wafer comprising an arcuate side edge adapted to abut the pushing slope, so that The pushing member is pressed to push the portion of the wafer to move to the first side to engage with the positioning groove. 如申請專利範圍第3項所述的晶圓測試治具,其中該至少一推抵斜面的數量為多個,該弧形側緣適於抵靠該些推抵斜面的其中之一。 The wafer test fixture of claim 3, wherein the at least one of the plurality of slanting faces is plural, and the curved side edges are adapted to abut one of the push slanting faces. 如申請專利範圍第1項所述的晶圓測試治具,其中該定位機構包括具有彈性之一推抵件,設置於該第二側,以移動於一初始位置以及一夾持位置之間。 The wafer test fixture of claim 1, wherein the positioning mechanism comprises a resilient pushing member disposed on the second side to move between an initial position and a clamping position. 如申請專利範圍第5項所述的晶圓測試治具,其中該推抵件包括彼此連接的一樞接端以及一推抵端,該樞接端連接該第二側,當該推抵件於該初始位置時,該推抵端凸出於該第二側。 The wafer test fixture of claim 5, wherein the pushing member comprises a pivoting end connected to each other and a pushing end, the pivoting end connecting the second side, when the pushing part In the initial position, the pushing end protrudes from the second side. 如申請專利範圍第6項所述的晶圓測試治具,其中該部分晶圓適於抵靠該推抵端,使該推抵端推抵該部分晶圓往該第一側移動以與該定位溝槽卡合。 The wafer test fixture of claim 6, wherein the portion of the wafer is adapted to abut against the pushing end, and the pushing end is pushed against the portion of the wafer to move to the first side to Position the groove to engage. 如申請專利範圍第1項所述的晶圓測試治具,其中該承載盤包括一承載底板以及一框架,該框架框圍該承載底板的一邊緣,以與該承載底板共同定義出一容置空間,該部分晶圓設置於該容置空間內。 The wafer test fixture of claim 1, wherein the carrier tray comprises a carrier substrate and a frame, the frame surrounding an edge of the carrier substrate to define an accommodation together with the carrier substrate The portion of the wafer is disposed in the accommodating space. 如申請專利範圍第8項所述的晶圓測試治具,其中該定位機構可動地設置於該框架的該第二側上。 The wafer test fixture of claim 8, wherein the positioning mechanism is movably disposed on the second side of the frame. 如申請專利範圍第1項所述的晶圓測試治具,更包括至少一擋板,設置於該框架上以部分覆蓋該部分晶圓的一上表面。 The wafer test fixture of claim 1, further comprising at least one baffle disposed on the frame to partially cover an upper surface of the portion of the wafer. 如申請專利範圍第1項所述的晶圓測試治具,其中,該定位機構為一定位凹槽。 The wafer test fixture of claim 1, wherein the positioning mechanism is a positioning groove. 一種晶圓動態測試治具,包括:一承載盤,經配置以承載一部分晶圓,其中該部分晶圓包括多個晶片且為一晶圓的一部分,且該承載盤包括一定位溝槽、一第一側以及相對該第一側的一第二側,該定位溝槽設置於該第一側並適於容置該部分晶圓的一側緣; 一承載膠帶,設置於該承載盤的一承載盤面上,以固定該部分晶圓。 A wafer dynamic test fixture includes: a carrier tray configured to carry a portion of a wafer, wherein the portion of the wafer includes a plurality of wafers and is part of a wafer, and the carrier tray includes a positioning trench, a first side and a second side opposite to the first side, the positioning groove is disposed on the first side and is adapted to receive a side edge of the partial wafer; A carrier tape is disposed on a carrier surface of the carrier tray to fix the portion of the wafer. 如申請專利範圍第12項所述的晶圓動態測試治具,其中該承載盤材質選自於玻璃或矽晶圓。 The wafer dynamic test fixture of claim 12, wherein the carrier material is selected from a glass or a germanium wafer. 如申請專利範圍第12項所述的晶圓動態測試治具,其中該承載盤更包括另一定位溝槽,該另一定位溝槽設置於該第二側,並適於容置該部分晶圓的另一側緣。 The wafer dynamic test fixture of claim 12, wherein the carrier tray further comprises another positioning groove, the another positioning groove is disposed on the second side, and is adapted to receive the partial crystal The other side of the circle. 一種晶圓測試方法,包括:提供一晶圓測試治具,其中該晶圓測試治具上承載並固定多個部分晶圓的其中之一,各該部分晶圓包括多個晶片且為一晶圓的一部分;以及對固定於該晶圓測試治具的該部分晶圓進行一晶圓測試。 A wafer testing method includes: providing a wafer test fixture, wherein the wafer test fixture carries and fixes one of a plurality of partial wafers, each of the wafers comprising a plurality of wafers and being a crystal a portion of the circle; and performing a wafer test on the portion of the wafer that is attached to the wafer test fixture. 如申請專利範圍第15項所述的晶圓測試方法,更包括:提供該晶圓;將該晶圓切割為該些部分晶圓;以及將該些部分晶圓的其中之一固定於該晶圓測試治具上。 The wafer testing method of claim 15, further comprising: providing the wafer; cutting the wafer into the partial wafers; and fixing one of the partial wafers to the crystal Round test fixture. 如申請專利範圍第15項所述的晶圓測試方法,其中該晶圓測試治具包括一承載盤以及一定位機構,該承載盤上承載該部分晶圓,該定位機構將該部分晶圓固定於該承載盤上。 The wafer test method of claim 15, wherein the wafer test fixture comprises a carrier tray and a positioning mechanism, the carrier tray carries the portion of the wafer, and the positioning mechanism fixes the portion of the wafer On the carrier tray. 如申請專利範圍第17項所述的晶圓測試方法,其中該定位機構將該部分晶圓固定於該承載盤的步驟更包括: 將該部分晶圓的一側緣設置於該承載盤的一定位溝槽內,其中該定位溝槽設置於該承載盤的一第一側,該定位機構設置於該承載盤相對該第一側的一第二側;以及將該部分晶圓的另一側緣抵靠該定位機構,使該定位機構推抵該部分晶圓,以與該定位溝槽共同夾持該部分晶圓。 The wafer testing method of claim 17, wherein the step of fixing the partial wafer to the carrier tray further comprises: One side of the portion of the wafer is disposed in a positioning groove of the carrier, wherein the positioning groove is disposed on a first side of the carrier, and the positioning mechanism is disposed on the first side of the carrier And a second side of the portion of the wafer; and the other side edge of the portion of the wafer abuts the positioning mechanism, the positioning mechanism is pushed against the portion of the wafer to clamp the portion of the wafer together with the positioning groove. 如申請專利範圍第15項所述的晶圓測試方法,更包括:提供該晶圓;將該晶圓設置並固定於一承載膠帶上,其中該承載膠帶設置於一承載盤上;將固定的該晶圓及該承載膠帶切割為多個晶圓測試單元,各該晶圓測單元包括該部分晶圓以及該晶圓測試治具,該部分晶圓承載並固定於該晶圓測試治具上。 The wafer testing method of claim 15, further comprising: providing the wafer; and disposing and fixing the wafer on a carrier tape, wherein the carrier tape is disposed on a carrier tray; The wafer and the carrier tape are cut into a plurality of wafer test units, and each of the wafer measurement units includes the partial wafer and the wafer test fixture, and the portion of the wafer is carried and fixed on the wafer test fixture. 如申請專利範圍第19項所述的晶圓測試方法,其中該晶圓測試治具包括該承載盤的一部分以及該承載膠帶的一部分。 The wafer testing method of claim 19, wherein the wafer test fixture comprises a portion of the carrier tray and a portion of the carrier tape. 如申請專利範圍第19項所述的晶圓測試方法,更包括:在對固定於該晶圓測試治具的該部分晶圓進行該晶圓測試之後,對該晶圓測試治具進行一解膠製程。 The wafer testing method as described in claim 19, further comprising: after performing the wafer testing on the portion of the wafer fixed to the wafer test fixture, performing a solution on the wafer test fixture Glue process. 如申請專利範圍第21項所述的晶圓測試方法,其中該承載膠帶包括紫外光固化解膠膜,且該解膠製程包括照射UV光。 The wafer testing method of claim 21, wherein the carrier tape comprises an ultraviolet curing film, and the dissolving process comprises irradiating UV light. 如申請專利範圍第15項所述的晶圓測試方法,其中該晶圓測試包括動態晶圓測試。 The wafer test method of claim 15, wherein the wafer test comprises a dynamic wafer test. 如申請專利範圍第15項所述的晶圓測試方法,其中該晶圓包括微機電系統(Micro Electro Mechanical System,MEMS)晶圓。 The wafer testing method of claim 15, wherein the wafer comprises a Micro Electro Mechanical System (MEMS) wafer.
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