TW201628949A - Alignment device and alignment method - Google Patents

Alignment device and alignment method Download PDF

Info

Publication number
TW201628949A
TW201628949A TW104127330A TW104127330A TW201628949A TW 201628949 A TW201628949 A TW 201628949A TW 104127330 A TW104127330 A TW 104127330A TW 104127330 A TW104127330 A TW 104127330A TW 201628949 A TW201628949 A TW 201628949A
Authority
TW
Taiwan
Prior art keywords
sheet
wafer
holding surface
holding
lattice
Prior art date
Application number
TW104127330A
Other languages
Chinese (zh)
Other versions
TWI650280B (en
Inventor
Kimihiko Kawasaki
Original Assignee
Lintec Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lintec Corp filed Critical Lintec Corp
Publication of TW201628949A publication Critical patent/TW201628949A/en
Application granted granted Critical
Publication of TWI650280B publication Critical patent/TWI650280B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment

Abstract

To provide an alignment device which accurately expands a space between piece shape bodies, and to provide an alignment method. An alignment device (10) includes: holding means (20) which may hold piece shape bodies (CP) on a holding surface (22A); partition means (30) which may insert contact means (32) between the piece shape bodies (CP) held on the holding surface (22A); and alignment means (40) which moves the contact means (32) and the holding surface (22A) relative to each other and align the piece shape bodies (CP) at predetermined positions on the holding surface (22A) in a predetermined direction.

Description

排列裝置及排列方法 Arrangement device and alignment method

本發明係有關排列裝置及排列方法。 The present invention relates to an alignment device and an alignment method.

以往,知道有擴大複數之半導體晶片(以下,有單稱作晶片之情況)等之片狀體的間隔,而容易取出該片狀體之排列裝置(例如,文獻1:參照日本特開2012-204747號公報)。 Conventionally, it has been known that there is an arrangement in which a sheet-like body such as a semiconductor wafer (hereinafter, simply referred to as a wafer) is enlarged, and the sheet-like body is easily taken out (for example, Document 1: Refer to JP-A-2012- Bulletin No. 204747).

但,在如文獻1所記載之以往的排列裝置中,經由使加以貼合有複數之晶片的切割薄膜等之接著薄片伸張之時,為了擴大各晶片之間隔,而接著薄片的應力則對於晶片的移動帶來影響,而有無法均等地擴大晶片的間隔者。但如此之間隔的不同係極微小之故,各晶片係作為均等地擴大間隔者,將以計算所導出之位置(以下,有稱為理論上之位置情況)作為基準而經由搬送裝置或拾取裝置等之搬送手段而加以搬送,加以搭載於引線架或基板等之被搭載物上。其結果,晶片與被搭載物之相對位置關係則微妙地產生偏移,而打線接合的連接位置則產生偏移,以及晶片與被搭載物的端子彼此之位置產生偏移,產生有無法取 得此等之導通之不良情況。然而,如此之課題係不僅有關半導體裝置之製造,例如在緻密的機械構件或細微之裝飾品等亦可能產生。 However, in the conventional aligning apparatus described in Document 1, when the subsequent sheet of the dicing film or the like to which the plurality of wafers are bonded is stretched, in order to enlarge the interval between the wafers, the stress of the sheet is then applied to the wafer. The movement has an impact, and there are gaps in which the wafer cannot be equally enlarged. However, the difference in the interval is such that the wafers are equally enlarged, and the position derived by the calculation (hereinafter referred to as the theoretical position) is used as a reference via the transport device or the pick-up device. It is transported by means of a transport means, and is mounted on a mounted object such as a lead frame or a substrate. As a result, the relative positional relationship between the wafer and the object to be mounted is slightly shifted, and the connection position of the wire bonding is shifted, and the positions of the terminals of the wafer and the object to be mounted are shifted, which is unacceptable. Get the bad situation of this kind of conduction. However, such a subject is not only related to the manufacture of semiconductor devices, but also to dense mechanical components or subtle decorations.

發明概要 Summary of invention

本發明之目的係提供可正確地拉開各片狀體的間隔之排列裝置及排列方法者。 SUMMARY OF THE INVENTION An object of the present invention is to provide an arrangement device and an arrangement method for accurately separating the intervals of the respective sheet-like bodies.

本發明之排列裝置係其特徵為具備:可在保持面而保持複數之片狀體的保持手段,和可插入靠合手段於在前述保持面所保持之前述複數的片狀體間之間壁手段,和使前述靠合手段與前述保持面相對移動,以特定的方向而使各片狀體排列於前述保持面上的特定位置之排列手段者。 The aligning apparatus according to the present invention is characterized in that: the holding means for holding a plurality of sheet-like bodies on the holding surface, and the means for inserting the abutting means between the plurality of sheet-like bodies held by the holding surface And means for arranging the respective sheet-like bodies to be aligned with the holding surface at a specific position on the holding surface in a specific direction.

在本發明之排列裝置中,前述複數之片狀體係具備:加以貼合於接著薄片,可自前述接著薄片轉印前述複數之片狀體於前述保持面之轉印手段者為佳。 In the aligning apparatus of the present invention, the plurality of sheet-like systems preferably include a bonding means for attaching the plurality of sheet-like bodies to the holding surface from the subsequent sheet.

在本發明之排列裝置中,前述靠合手段係可配置為格子狀於前述複數的片狀體間之格子狀構件者為佳。 In the aligning apparatus of the present invention, it is preferable that the abutting means is disposed in a lattice shape in a lattice-like member between the plurality of sheet-like members.

本發明之排列方法係其特徵為具備:在保持面而保持複數之片狀體的工程,和插入靠合手段於在前述保持面所保持之前述複數的片狀體間之工程,和使前述靠合手段與前述保持面相對移動,以特定的方向而使各片狀體排列於前述保持面上的特定位置之排列的工程者。 The alignment method of the present invention is characterized in that it includes a process of holding a plurality of sheet-like bodies on a holding surface, and a process of inserting a means for abutting between the plurality of sheet-like bodies held by the holding surface, and An engineer who arranges the respective sheets in a specific direction and arranges the respective sheets in a specific position on the holding surface in a specific direction.

如根據本發明,於複數之片狀體間,可使靠合手段插 入而排列該片狀體之故,可未受到接著薄片之應力的影響,而正確地擴大片狀體的間隔者。 According to the present invention, between the plurality of sheets, the snapping means can be inserted By arranging the sheet-like body, it is possible to accurately enlarge the spacer of the sheet-like body without being affected by the stress of the subsequent sheet.

另外,如設置轉印手段時,因可經由應力而自對於各片狀體之間隔帶來影響之接著薄片,轉印各片狀體於保持面之故,可正確地擴大各片狀體之間隔者。 Further, when the transfer means is provided, the respective sheets can be transferred to the holding surface by the stress from the subsequent sheet which affects the interval between the respective sheet-like bodies, so that the respective sheet-like bodies can be accurately enlarged. Interval.

更且,如將靠合手段作為格子狀構件時,可一次在複數之片狀體間所有,插入格子狀構件而使該片狀體排列之故,可提升每單位時間之處理能力者。 Further, when the snapping means is used as the lattice-like member, it is possible to insert the lattice-like member at a time between the plurality of sheet-like members and arrange the sheet-like members at one time, thereby improving the processing ability per unit time.

10‧‧‧排列裝置 10‧‧‧ Alignment device

20‧‧‧保持手段 20‧‧‧Retention means

30,30A‧‧‧間壁手段 30, 30A‧‧‧ wall means

31,52,55‧‧‧直動馬達 31,52,55‧‧‧Directional motor

31A‧‧‧輸出軸 31A‧‧‧ Output shaft

32‧‧‧調和器 32‧‧‧Conditioner

33‧‧‧格子狀構件 33‧‧‧ lattice-like members

40,40A‧‧‧排列手段 40,40A‧‧‧Arrangement

41,51,54‧‧‧線性馬達 41,51,54‧‧‧linear motor

43A‧‧‧滑件 43A‧‧‧Sliding parts

53‧‧‧吸附墊片 53‧‧‧Adsorption gasket

56‧‧‧剝離板 56‧‧‧ peeling board

CP‧‧‧晶片 CP‧‧‧ wafer

WF‧‧‧晶圓 WF‧‧‧ wafer

圖1係有關本發明之第1實施形態之排列裝置的側面圖。 Fig. 1 is a side view showing an alignment device according to a first embodiment of the present invention.

圖2A係圖1之排列裝置之動作說明圖。 Fig. 2A is an explanatory view of the operation of the aligning device of Fig. 1.

圖2B係圖1之排列裝置之動作說明圖。 Fig. 2B is an explanatory view of the operation of the aligning device of Fig. 1.

圖2C係圖1之排列裝置之動作說明圖。 Fig. 2C is an explanatory view of the operation of the aligning device of Fig. 1.

圖3係有關本發明之第2實施形態之排列裝置的側面圖。 Fig. 3 is a side view showing an alignment device according to a second embodiment of the present invention.

圖4A係圖3之排列裝置之動作說明圖。 Fig. 4A is an explanatory view of the operation of the aligning device of Fig. 3.

圖4B係圖3之排列裝置之動作說明圖。 Fig. 4B is an explanatory view of the operation of the aligning device of Fig. 3.

圖4C係圖3之排列裝置之動作說明圖。 Fig. 4C is an explanatory view of the operation of the aligning device of Fig. 3.

圖4D係圖3之排列裝置之動作說明圖。 Fig. 4D is an explanatory view of the operation of the aligning device of Fig. 3.

圖4E係圖3之排列裝置之動作說明圖。 Fig. 4E is an explanatory view of the operation of the aligning device of Fig. 3.

以下,依據圖面而加以說明本發明之各實施形態。 Hereinafter, each embodiment of the present invention will be described based on the drawings.

然而,對於在各實施形態之同樣的構成,省略詳細之說明。 However, the detailed description of the same configurations in the respective embodiments will be omitted.

另外,在各實施形態之X軸,Y軸,Z軸係各自有正交的關係,X軸及Y軸係作為特定平面內的軸,Z軸係作為正交於前述特定平面的軸。更且,在各實施形態中,將自與Y軸平行之圖1中前側而視的情況作為基準,而顯示方向的情況,「上」則為Z軸的箭頭方向,而「下」則為其相反方向,「左」則為X軸之箭頭方向,「右」則為其相反方向,「前」則為Y軸之箭頭方向,「後」則作為其相反方向。 Further, in each of the X-axis, the Y-axis, and the Z-axis system of each embodiment, there are orthogonal relationships, the X-axis and the Y-axis are axes in a specific plane, and the Z-axis is an axis orthogonal to the specific plane. Further, in each of the embodiments, the case where the direction is displayed from the front side in FIG. 1 parallel to the Y-axis is used as the reference, and the "up" is the arrow direction of the Z-axis, and the "down" is In the opposite direction, "Left" is the direction of the arrow of the X-axis, "Right" is the opposite direction, "Front" is the direction of the arrow of the Y-axis, and "Right" is the opposite direction.

[第1實施形態] [First Embodiment]

在圖1中,排列裝置10係具備:可在保持面22A而保持做為複數的片狀體之晶片CP的保持手段20,和於在保持面22A加以保持之複數的晶片CP之間,可插入作為靠合手段之調和器32的間壁手段30,和使調和器32與保持面22A相對移動,使各晶片CP,於保持面22A上的特定位置,以特定方向排列之排列手段40,和可辨識各晶片CP之位置的光學檢測器或攝影手段等之未圖示之檢測手段。然而,晶片CP係由將半導體晶圓(以下,有單稱做晶圓之情況)WF切斷為格子狀者而加以形成。 In FIG. 1, the aligning device 10 is provided with a holding means 20 for holding the wafer CP as a plurality of sheet-like bodies on the holding surface 22A, and between the plurality of wafers CP held by the holding surface 22A. The partitioning means 30 for inserting the blender 32 as a means for abutting, and the arranging means 40 for arranging the respective wafers CP in a specific direction at a specific position on the holding surface 22A by relatively moving the blender 32 and the holding surface 22A, And an imaging means (not shown) such as an optical detector or a photographing means that can recognize the position of each wafer CP. However, the wafer CP is formed by cutting a semiconductor wafer (hereinafter, hereinafter referred to as a wafer) WF into a lattice shape.

保持手段20係具備:作為驅動機器之轉動馬達21,和由轉動馬達21之輸出軸21A所支持,具有經由減壓幫 浦或真空噴射器等之未圖示的減壓手段而可吸附保持晶片CP之保持面22A的平台22。 The holding means 20 is provided with a turning motor 21 as a driving machine and supported by an output shaft 21A of the turning motor 21, and has a decompression assist The platform 22 holding the holding surface 22A of the wafer CP can be adsorbed by a decompression means (not shown) such as a vacuum ejector or the like.

間壁手段30係具備:作為驅動機器之直動馬達31,和支持於直動馬達31之輸出軸31A的調和器32。調和器32係較晶圓WF的前後方向為長而加以設定,而該調和器32之下端部係作為前細形狀,成為容易插入於晶片CP間的形狀。 The partitioning means 30 includes a linear motion motor 31 as a drive device and a modulator 32 supported by the output shaft 31A of the linear motion motor 31. The blender 32 is set to be longer than the front-rear direction of the wafer WF, and the lower end portion of the blender 32 has a front thin shape and is easily inserted into the wafer CP.

排列手段40係具備作為以滑件41A而支持直動馬達31之驅動機器的線性馬達41。 The arranging means 40 is provided with a linear motor 41 as a driving device for supporting the linear motor 31 by the slider 41A.

在以上的排列裝置10中,對於使晶片CP排列之步驟加以說明。 In the above aligning device 10, the steps of arranging the wafers CP will be described.

首先,對於在加以配置各構件於初期位置的圖1中實線所示之狀態的排列裝置10而言,作業者或皮帶輸送機等之未圖示的搬送手段則將加以個片化成複數之晶片CP的晶圓WF,載置於保持面22A的特定位置。接著,保持手段20則驅動未圖示之減壓手段,在保持面22A吸附保持各晶片CP。 First, in the aligning device 10 in a state shown by the solid line in FIG. 1 in which the respective members are placed at the initial position, the transport means (not shown) such as the operator or the belt conveyor are singulated into a plurality of pieces. The wafer WF of the wafer CP is placed at a specific position of the holding surface 22A. Next, the holding means 20 drives a decompression means (not shown) to suck and hold the respective wafers CP on the holding surface 22A.

接著,將未圖示之檢測手段的檢測結果為基礎,保持手段20則驅動轉動馬達21,排列於前後方向之複數的晶片CP所成之複數的晶片列CP1則呈排列於左右方向地,使平台22轉動。之後,將未圖示之檢測手段的檢測結果為基礎,間壁手段30及排列手段40則驅動直動馬達31及線性馬達41,如在圖1中中央的兩點鎖鏈線所示地,於最左邊的晶片列CP1與自左邊第2個之晶片列CP1之 間,使調和器32插入。接著,排列手段40則驅動線性馬達41,如在圖1中左側的兩點鎖鏈線所示地,使調和器32移動於左方,而使最左邊的晶片列CP1移動至特定的位置。並且,排列手段40則經由上述同樣的動作,以調和器32,使左半分之晶片列CP1,從左依序移動至特定的位置之後,如在圖1中右側的兩點鎖鏈線所示地,使右半分之晶片列CP1,從右依序移動至特定的位置。經由此,如圖2A所示,各晶片列CP1則保持特定的間隔而排列於左右方向。 Next, based on the detection result of the detecting means (not shown), the holding means 20 drives the turning motor 21, and the plurality of wafer rows CP1 formed by the plurality of wafers CP arranged in the front-rear direction are arranged in the left-right direction. The platform 22 rotates. Thereafter, based on the detection result of the detecting means (not shown), the partitioning means 30 and the arranging means 40 drive the linear motor 31 and the linear motor 41 as shown by the two-point chain line at the center in FIG. The leftmost wafer row CP1 and the second wafer row CP1 from the left In the meantime, the blender 32 is inserted. Next, the arranging means 40 drives the linear motor 41, as shown by the two-point chain line on the left side in Fig. 1, moving the temper 32 to the left, and moving the leftmost wafer row CP1 to a specific position. Then, the arranging means 40 moves the left-half-divided wafer row CP1 from the left to the specific position by the same operation as described above, as shown by the two-point chain line on the right side in FIG. The right half of the wafer column CP1 is sequentially moved from the right to a specific position. As a result, as shown in FIG. 2A, each of the wafer rows CP1 is arranged at a predetermined interval in the left-right direction.

接著,保持手段20則驅動轉動馬達21,如圖2B所示地,使平台22,在與保持面22A平行之面內,轉動於特定角度(本實施形態情況90度)逆時針轉動方向。並且,間壁手段30及排列手段40則經由上述同樣的動作而使調和器32移動,如在圖2B中左側的兩點鎖鏈線所示地,使左半分之晶片列CP2,從左依序移動至左方之特定的位置之後,如同圖中右側的兩點鎖鏈線所示地,使右半分之晶片列CP2,從右依序移動至右方之特定的位置。經由此等,如圖2C所示,各晶片CP則保持特定的間隔,於保持面22A上之特定位置,以特定的方向進行排列。 Next, the holding means 20 drives the turning motor 21, and as shown in Fig. 2B, the table 22 is rotated in a counterclockwise direction at a specific angle (90 degrees in the present embodiment) in a plane parallel to the holding surface 22A. Further, the partitioning means 30 and the arranging means 40 move the temper 32 by the same operation as described above, and the left half of the wafer row CP2 is sequentially arranged from the left as shown by the two-point chain line on the left side in Fig. 2B. After moving to a specific position on the left side, as shown by the two-point chain line on the right side of the figure, the right half of the wafer row CP2 is sequentially moved from the right to a specific position on the right side. Thus, as shown in Fig. 2C, the wafers CP are arranged at a specific interval in a specific direction at a specific position on the holding surface 22A.

之後,間壁手段30及排列手段40則驅動直動馬達31及線性馬達41,使調和器32恢復為初期位置,保持手段20則停止未圖示之減壓手段的驅動之後,作業者或未圖示之搬送手段則將各晶片CP載置於引線框架或基板等之被搭載物上。並且,當將所有的晶片CP加以搭載於被 搭載物上時,之後反覆上述同樣的動作。 Thereafter, the partitioning means 30 and the arranging means 40 drive the linear motor 31 and the linear motor 41 to return the temper 32 to the initial position, and the holding means 20 stops the driving of the decompression means (not shown), and the operator or not In the transport method shown in the figure, each wafer CP is placed on a mounted object such as a lead frame or a substrate. And, when all the wafers CP are mounted on the When the object is mounted, the same operation as above is repeated.

如根據如以上之實施形態,可使調和器32插入至複數之晶片CP間而使該晶片CP排列之故,而未受到接著薄片之應力的影響,而可正確地擴大各晶片CP之間隔。 According to the above embodiment, the modulator 32 can be inserted between the plurality of wafers CP to arrange the wafers CP without being affected by the stress of the subsequent sheets, and the interval between the wafers CP can be accurately enlarged.

[第2實施形態] [Second Embodiment]

在圖3中,排列裝置10A係具備:保持手段20,和於在保持面22A加以保持之複數的晶片CP之間,可插入作為靠合手段之格子狀構件33的間壁手段30A,和使格子狀構件33與保持面22A相對移動,使各晶片CP,於保持面22A上的特定位置,以特定方向排列之排列手段40A,和可自接著薄片AS,將複數之晶片CP轉印於保持面22A之轉印手段50,和可辨識各晶片CP之位置的光學檢測器或攝影手段等之未圖示之檢測手段。然而,各晶片CP係在加以貼附於接著薄片AS之狀態,作為一體物WK而加以形成。 In FIG. 3, the aligning device 10A includes a holding means 20 and a partitioning means 30A for inserting a lattice-like member 33 as a means for abutting between a plurality of wafers CP held by the holding surface 22A, and The lattice member 33 and the holding surface 22A are relatively moved, and the wafers CP are arranged in a specific direction at a specific position on the holding surface 22A, and the plurality of wafers CP are transferred from the subsequent sheets AS. The transfer means 50 of the surface 22A and the detection means (not shown) such as an optical detector or a photographing means for recognizing the position of each wafer CP. However, each wafer CP is formed as a unitary body WK in a state of being attached to the succeeding sheet AS.

間壁手段30A係具備:直動馬達31,和支持於直動馬達31之輸出軸31A的格子狀構件33。格子狀構件33係具備基底板33A,和於基底板33A之下面33B,加以形成為格子狀的格子部33C,可以一次於複數的晶片CP間所有,插入格子部33C地加以設置。格子部33C之下端部係作為前細形狀,而成為容易插入至晶片CP間之形狀。 The partitioning means 30A includes a linear motion motor 31 and a lattice member 33 supported by the output shaft 31A of the linear motion motor 31. The lattice member 33 is provided with a base plate 33A and a lattice portion 33C formed in a lattice shape on the lower surface 33B of the base plate 33A, and can be inserted into the lattice portion 33C at a time between the plurality of wafers CP. The lower end portion of the lattice portion 33C has a shape of a front thin shape and is easily inserted into the wafer CP.

排列手段40A係具備:作為驅動機器之線性馬達 43,和加以支持於線性馬達43之滑件43A,作為以滑件44A而支持直動馬達31之驅動機器之線性馬達44。 The arranging means 40A is provided with a linear motor as a driving machine 43. A slider 43A supported by the linear motor 43 is provided as a linear motor 44 that supports the driving machine of the linear motor 31 by the slider 44A.

轉印手段50係具備:作為驅動機器之線性馬達51,和藉由支架51B而加以支持於線性馬達51之滑件51A的直動馬達52,和加以支持於直動馬達52之輸出軸52A,經由減壓幫浦或真空噴射器等之未圖示的減壓手段而可吸附保持接著薄片AS之吸附墊片53,和作為驅動機器之線性馬達54,和作為加以支持於線性馬達54之滑件54A的驅動機器之直動馬達55,和加以支持於直動馬達55之輸出軸55A之剝離板56。 The transfer means 50 includes a linear motor 51 as a drive device, a linear motor 52 supported by the slider 51B of the linear motor 51, and an output shaft 52A supported by the linear motor 52. The suction pad 53 of the subsequent sheet AS can be adsorbed and held by a decompression means (not shown) such as a decompression pump or a vacuum ejector, and the linear motor 54 as a drive machine, and the slide supported by the linear motor 54 The linear motion motor 55 of the drive machine of the piece 54A and the peeling plate 56 supported by the output shaft 55A of the linear motion motor 55.

在以上的排列裝置10A中,對於使晶片CP排列之步驟加以說明。 In the above aligning device 10A, the steps of arranging the wafers CP will be described.

首先,對於在加以配置各構件於初期位置的圖3所示之狀態的排列裝置10A而言,作業者或皮帶輸送機等之未圖示的搬送手段則將接著薄片AS做為上側而載置一體物WK於保持面22A的特定位置。接著,轉印手段50則驅動線性馬達51,54及直動馬達52,55,使吸附墊片53及剝離板56,移動至在圖4A中實線的位置。並且,轉印手段50則驅動未圖示的減壓手段,由吸附墊片53而吸附保持接著薄片AS之右端部。接著,轉印手段50則驅動線性馬達51,54及直動馬達52,而使吸附墊片53上升後,如在圖4A中兩點鎖鏈線所示地,使該吸附墊片53及剝離板56移動至左方。經由此,接著薄片AS則自晶片CP加以剝離,而該晶片CP則加以轉印至保持面22A。然 而,當自晶片CP加以剝離接著薄片AS時,轉印手段50則停止未圖示之減壓手段之驅動,使接著薄片AS落下而收容於位置在吸附墊片53下方的箱或袋等之未圖示的薄片回收手段內。之後,轉印手段50則驅動線性馬達51,54及直動馬達52,55,使吸附墊片53及剝離板56恢復至初期位置。 First, in the aligning device 10A in the state shown in FIG. 3 in which the respective members are placed in the initial position, the transport means (not shown) such as the operator or the belt conveyor is placed on the upper side of the sheet AS. The unitary body WK is at a specific position of the holding surface 22A. Next, the transfer means 50 drives the linear motors 51, 54 and the linear motors 52, 55 to move the suction pad 53 and the peeling plate 56 to the position of the solid line in Fig. 4A. Further, the transfer means 50 drives a decompression means (not shown), and the suction pad 53 sucks and holds the right end portion of the subsequent sheet AS. Next, the transfer means 50 drives the linear motors 51, 54 and the linear motor 52, and after the adsorption pad 53 is raised, the adsorption pad 53 and the peeling plate are made as shown by the two-point chain line in FIG. 4A. 56 moves to the left. Thereby, the sheet AS is peeled off from the wafer CP, and the wafer CP is transferred to the holding surface 22A. Of course When the wafer CP is peeled off from the wafer CP, the transfer means 50 stops the driving of the decompression means (not shown), and the subsequent sheet AS is dropped and stored in a box or bag positioned below the suction pad 53. In the sheet collecting means (not shown). Thereafter, the transfer means 50 drives the linear motors 51, 54 and the linear motors 52, 55 to return the adsorption pad 53 and the peeling plate 56 to the initial positions.

接著,與第1實施形態作為同樣,保持手段20則使平台22轉動。之後,將未圖示之檢測手段的檢測結果為基礎,間壁手段30A及排列手段40A則驅動直動馬達31及線性馬達43,44,如圖4B所示,使格子部33C插入至複數之晶片CP間全部。此時,如圖4C所示,對於格子部33C而言之一部分的晶片CP之前後,左右方向的位置,及方向有成為不均之情況。因此,排列手段40A則驅動線性馬達44,如圖4D所示,使格子狀構件33移動至前方。經由此,晶片CP之前後方向位置及方向則經由格子部33C而加以矯正。之後,排列手段40A則驅動線性馬達43,如圖4E所示,使格子狀構件33移動至左方。經由此等,經由格子部33C而加以矯正晶片CP之左右方向位置,各晶片CP則保持特定的間隔,以特定的方向而排列於保持面22A上特定之位置。 Next, similarly to the first embodiment, the holding means 20 rotates the stage 22. Then, based on the detection result of the detecting means (not shown), the partitioning means 30A and the arranging means 40A drive the linear motor 31 and the linear motors 43, 44, and as shown in FIG. 4B, the lattice portion 33C is inserted into the plural. All of the wafers CP. At this time, as shown in FIG. 4C, the position and the direction of the left and right direction of the wafer CP before and after the wafer portion 33C are uneven. Therefore, the aligning means 40A drives the linear motor 44, and as shown in Fig. 4D, the lattice-like member 33 is moved to the front. Thereby, the position and direction of the wafer CP in the front and rear directions are corrected by the lattice portion 33C. Thereafter, the array means 40A drives the linear motor 43, and as shown in FIG. 4E, the lattice member 33 is moved to the left. By this, the position of the wafer CP in the left-right direction is corrected via the lattice portion 33C, and each wafer CP is held at a specific interval in a specific direction and arranged in a specific position on the holding surface 22A.

接著,間壁手段30A及排列手段40A則驅動直動馬達31及線性馬達43,44,使格子狀構件33恢復至初期位置。並且,保持手段20則停止未圖示之減壓手段的驅動之後,作業者或未圖示之搬送手段則將晶片CP搭載於 被搭載物上。並且,當將所有的晶片CP加以搭載於被搭載物上時,之後反覆上述同樣的動作。 Next, the partitioning means 30A and the arranging means 40A drive the linear motor 31 and the linear motors 43, 44 to return the lattice member 33 to the initial position. Further, after the holding means 20 stops the driving of the decompression means (not shown), the operator or the conveying means (not shown) mounts the wafer CP. It is mounted on the object. Then, when all the wafers CP are mounted on the object to be mounted, the same operation as described above is repeated.

經由如以上的實施形態,亦可得到與第1實施形態同樣的效果。 According to the above embodiment, the same effects as those of the first embodiment can be obtained.

另外,由設置轉印手段50者,因可自經由應力而對於各晶片CP間隔帶來的影響之接著薄片AS,將各晶片CP轉印至保持面22A之故,可正確地擴大各晶片CP之間隔者。 In addition, in the case where the transfer means 50 is provided, each wafer CP can be transferred to the holding surface 22A by the subsequent sheet AS which is affected by the stress on the interval of each wafer CP, so that each wafer CP can be accurately enlarged. The spacer.

更且,可以一次對於複數之晶片間全部,使格子部33C插入而使各晶片CP排列之故,可使每單位時間的處理能力提升。 Further, the lattice portion 33C can be inserted into all of the plurality of wafers at a time, and the wafers CP can be arranged in order to improve the processing capability per unit time.

如以上,為了實施本發明之最佳構成,方法等係在前述記載加以揭示,但本發明係不限定於此等者。即,本發明係主要關於特定之實施形態特別加以圖示,且加以說明,但在未自本發明之技術思想及目的的範圍脫離者,而對於以上所述之實施形態而言,在形狀,材質,數量,其他的詳細構成中,該業者可加上種種變形者。另外,限定上述揭示之形狀,材質等之記載係為了將本發明之理解作為理解而例示性地加以記載者,因並非限定本發明者,在除了此等形狀,材質等之限定的一部分或全部的限定之構件的名稱之記載係包含於本發明。 As described above, in order to carry out the best configuration of the present invention, methods and the like are disclosed in the above description, but the present invention is not limited thereto. That is, the present invention has been specifically described with respect to specific embodiments, but is not departing from the scope of the technical idea and object of the present invention, and in the above-described embodiments, in the shape, In terms of material, quantity, and other detailed composition, the manufacturer can add various deformers. In addition, the description of the shapes, materials, and the like described above is exemplarily described in order to understand the understanding of the present invention, and is not limited to the inventors, and some or all of the limitations of the shapes and the like are excluded. The description of the names of the defined members is included in the present invention.

例如,保持手段20係亦可以機械夾持或夾持柱等之夾持手段,庫倫力,接著劑,磁力等而保持晶片CP,而亦可為未保持晶片CP之構成。 For example, the holding means 20 may hold the wafer CP by mechanical clamping or clamping means such as a column, a Coulomb force, an adhesive, a magnetic force, or the like, or may be a configuration in which the wafer CP is not held.

保持手段20係保持可經由雷射光等而個片化成複數之晶片CP地加以形成脆弱層之晶圓WF,或加以形成可個片化為複數之晶片CP的溝(未貫通於上下方向的溝)之晶圓WF亦可。此情況,靠合手段係如具備可切斷晶圓WF之切斷刃即可。 The holding means 20 holds a wafer WF which can be formed into a plurality of wafers CP by laser light or the like to form a fragile layer, or a groove which can be formed into a plurality of wafers CP (not penetrated in the vertical direction) ) Wafer WF is also available. In this case, the means for closing may be provided with a cutting blade that can cut the wafer WF.

保持手段20係保持將晶圓WF例如,切斷為1度、30度、45度、60度等、任意之方向而加以個片化的晶片CP亦可。此情況,保持手段20係亦可將使平台22旋轉的特定角度,配合晶圓WF之切斷方向而做任意地設定。 The holding means 20 may hold the wafer CP in which the wafer WF is cut into, for example, 1 degree, 30 degrees, 45 degrees, 60 degrees, or the like in any direction. In this case, the holding means 20 can also arbitrarily set the specific angle at which the stage 22 is rotated, in accordance with the cutting direction of the wafer WF.

調和器32係可較晶圓WF之前後方向長度為短而加以形成,而亦可較晶片CP之前後方向長度為短而加以形成。此情況,排列手段40係如使1之晶片列CP1、CP2之晶片CP,從前方或後方依序移動即可。 The modulator 32 may be formed shorter than the length of the wafer WF in the front and rear directions, or may be formed shorter than the length of the wafer CP in the front and rear directions. In this case, the array means 40 may be such that the wafer CP of the wafer rows CP1 and CP2 of 1 is sequentially moved from the front or the rear.

調和器32及格子部33C係下端部則未加以形成為前細形狀亦可。 The lower end portion of the blender 32 and the lattice portion 33C may not be formed in a front thin shape.

取代調和器32,而採用線狀的構成亦可,而取代格子狀構件33,採用將線狀構件加以配置成格子狀的網狀構成亦可。 Instead of the modulator 32, a linear configuration may be employed, and instead of the lattice member 33, a mesh structure in which the linear members are arranged in a lattice shape may be employed.

格子狀構件33係並非複數之晶片CP間所有,而在晶片CP間部分,跨越複數之晶片列CP1、CP2而可插入格子部33C地設置亦可。如為作為如此之構成,雖較第2實施形態,處理能力係為下降,但可較第1實施形態之構成,使處理能力提升者。 The lattice member 33 is not included between the plurality of wafers CP, and may be interposed between the wafers CP so as to be inserted into the lattice portions 33C across the plurality of wafer rows CP1 and CP2. In such a configuration, although the processing capability is lower than that of the second embodiment, the processing capability can be improved as compared with the configuration of the first embodiment.

格子狀構件33係亦可為未具有基底板33A之格子部 33C單體者。 The lattice member 33 may be a lattice portion that does not have the base plate 33A. 33C single.

排列手段40,40A係在作為驅動機器之所謂XY平台,支持平台22,使調和器32或格子狀構件33停止,使平台22移動於前後或左右亦可,而亦可使調和器32或格子狀構件33與平台22之雙方移動於前後或左右。 The arranging means 40, 40A are used as a so-called XY stage as a driving machine, and the platform 22 is supported to stop the damper 32 or the lattice-like member 33, and the platform 22 can be moved to the front, rear, or left and right, and the temper 32 or grid can be used. Both the member 33 and the platform 22 move forward and backward or left and right.

排列手段40,40A係具備可在與保持面22A平行的面內轉動線性馬達41,43之驅動機器亦可,而未使平台22轉動而使線性馬達41,43轉動亦可,而亦可使平台22及線性馬達41,43之雙方轉動。未使平台22轉動之情況,可省略轉動馬達21者。 The arranging means 40, 40A are provided with a driving device that can rotate the linear motors 41, 43 in a plane parallel to the holding surface 22A, and the linear motors 41, 43 can be rotated without rotating the platform 22, and can also be Both the platform 22 and the linear motors 41, 43 rotate. If the platform 22 is not rotated, the motor 21 can be omitted.

排列手段40係在使右半分之晶片列CP1、CP2移動之後,使左半分之晶片列CP1、CP2移動亦可,而使除了最右邊的晶片列CP1、CP2移動之所有的晶片列CP1、CP2,從最左邊之晶片列CP1、CP2依序移動於左方亦可,而使除了最左邊的晶片列CP1、CP2移動之所有的晶片列CP1、CP2,從最右邊之晶片列CP1、CP2依序移動於右方亦可。 The arranging means 40 moves the wafer rows CP1, CP2 of the right half, and moves the wafer banks CP1, CP2 of the left half, and moves all the wafer rows CP1, CP2 except the rightmost wafer rows CP1, CP2. The wafer rows CP1 and CP2 from the leftmost row are sequentially moved to the left, and all the wafer rows CP1 and CP2 except the leftmost wafer row CP1 and CP2 are moved from the rightmost wafer columns CP1 and CP2. The order can also be moved to the right.

排列手段40A係使格子狀構件33移動於後方之後,使該格子狀構件33移動至右方亦可,而使格子狀構件33移動於左方或右方之後,使該格子狀構件33移動至前方或後方亦可。 After the array means 40A moves the lattice-like member 33 to the rear, the lattice-shaped member 33 may be moved to the right, and after the lattice-shaped member 33 is moved to the left or the right, the lattice-shaped member 33 is moved to the left. It can also be in front or behind.

排列手段40A係對於線性馬達43而言,例如,以30度、45度、60度等之任意的角度使線性馬達44交叉而使其支持於滑件43A,再使格子狀構件33移動至該角度的 方向。 In the arranging means 40A, for example, the linear motor 44 is crossed at an arbitrary angle of 30 degrees, 45 degrees, 60 degrees or the like to support the slider 43A, and the lattice member 33 is moved to the linear motor 43. Angled direction.

轉印手段50係例如,由夾持柱或多關節機械手臂等之把持手段而把持接著薄片AS,由該把持手段而拉伸接著薄片AS而自各晶片CP剝離該接著薄片AS亦可,例如,將剝離用接著薄片接著於接著薄片AS,拉伸該剝離用接著薄片而自各晶片CP剝離接著薄片AS亦可,而只要可自各晶片CP剝離接著薄片AS,並無加以限定。 The transfer means 50 is, for example, a holding sheet by a holding means such as a holding column or a multi-joint robot arm, and the sheet AS is stretched by the holding means, and the sheet AS is peeled off from each wafer CP. For example, The peeling back sheet is attached to the succeeding sheet AS, and the peeling back sheet is stretched and peeled off from the respective wafers CP to the sheet AS. The sheet AS may be peeled off from the respective wafers CP, and is not limited.

轉印手段50係取代剝離板56而亦可採用丸棒或滾軸,而未設置剝離板56或使其移動之驅動機器等亦可。 The transfer means 50 may be a paddle or a roller instead of the peeling plate 56, and a peeling plate 56 may not be provided or a driving machine or the like may be provided.

亦可將轉印手段50採用於第1實施形態,而對於第2實施形態,未採用轉印手段50,而作為如第1實施形態而將複數之晶片CP載置於保持面22A亦可。 In the first embodiment, the transfer means 50 may be employed. However, in the second embodiment, the plurality of wafers CP may be placed on the holding surface 22A as in the first embodiment.

另外,在本發明之接著薄片AS及片狀體的材質,種別,形狀等係並無特別加以限定。例如,接著薄片AS係為圓形,橢圓形,三角形或四角形等之多角形,而亦可為其他的形狀,亦可為感壓接著性,感熱接著性等之接著形態者。另外,如此之接著薄片AS係例如,亦可為僅接著劑層之單層的構成,於基材薄片與接著劑層之間具有中間層之構成,於基材薄片的上面具有蓋層等之3層以上的構成,更且,如可自接著劑層剝離基材薄片之所謂兩面接著薄片之構成亦可,而兩面接著薄片係亦可為具有單層或複層之中間層之構成,或未有中間層之單層或複層之構成。另外,作為片狀體係例如,亦可將食品,樹脂容器,矽半導體晶片或化合物半導體晶片等之半導體晶片,電路基 板,光碟等之資訊記錄基板,玻璃基板,鋼板,陶器,木板或樹脂板等,任意形態之構件或物品等作為對象者。然而,將接著薄片AS變更為機能性,用途性的讀法,例如,可將資訊記載用標籤,裝飾用標籤,保護薄片,切割膠帶,晶圓貼附膜,晶片接合膠帶,記錄層形成樹脂薄片等之任意的形狀之任意的薄片,薄膜,膠帶等貼上於如前述之任意的被著體者。 Further, the materials, types, shapes, and the like of the succeeding sheet AS and the sheet-like body of the present invention are not particularly limited. For example, the sheet AS may be a polygonal shape such as a circular shape, an elliptical shape, a triangular shape, or a square shape, and may have another shape, and may be a pressure-adhesive property or a thermal contact property. Further, the subsequent sheet AS may be, for example, a single layer of only the adhesive layer, and has an intermediate layer between the base sheet and the adhesive layer, and has a cap layer or the like on the upper surface of the base sheet. The configuration of three or more layers may further be such that a so-called two-sided sheet may be used to peel the substrate sheet from the adhesive layer, and the two-sided sheet may be a single layer or a layer of an intermediate layer, or There is no single layer or multiple layers of the intermediate layer. Further, as the sheet-like system, for example, a semiconductor wafer such as a food, a resin container, a semiconductor wafer or a compound semiconductor wafer, or a circuit base may be used. An information recording substrate such as a board or a disc, a glass substrate, a steel plate, a ceramics, a wood board, a resin board, or the like, and a member or an article of any form is targeted. However, the subsequent sheet AS is changed to a functional and versatile reading method, for example, a label for information recording, a label for decoration, a protective sheet, a dicing tape, a wafer attaching film, a wafer bonding tape, and a recording layer forming resin. Any sheet, film, tape, or the like of any shape such as a sheet is attached to any of the above-mentioned subjects.

在本發明之手段及工程係只要可達成對於此等手段及工程說明過之動作,機能或工程,並未加以限定者,而未完全加以限定於在前述實施形態所示之單一實施形態之構成物或工程者。例如,保持手段係只要如為可在保持面而保持複數之片狀體者,對照於申請最初之技術常識,而如為其技術範圍內者,未加以限定者(對於其他的手段及工程之說明係省略)。 The means and engineering of the present invention are not limited to the functions and functions described in the above-mentioned means and engineering, and are not completely limited to the constitution of the single embodiment shown in the above embodiments. Object or engineer. For example, the means of holding is as long as it is a sheet-like body that can hold a plurality of sheets on the holding surface, and is not limited to the technical expertise of the application, but is not limited to other means and engineering. The description is omitted.

另外,在前述實施形態之驅動機器係可採用轉動馬達,直動馬達,線性馬達,單軸機械手臂,多關節機械手臂等之電動機器,空氣壓缸,由壓壓缸,無桿壓缸及迴轉壓缸等之空氣壓缸等,並且亦可直接性或間接性地採用組合者(亦有與在實施形態例示之構成重複者)。 Further, in the driving machine of the above embodiment, a rotating motor, a linear motor, a linear motor, a single-axis robot arm, a multi-joint robot arm, an electric motor, an air cylinder, a pressure cylinder, a rodless cylinder, and the like can be used. An air cylinder such as a rotary cylinder or the like may be used as a direct or indirect combination (also a duplicate of the configuration exemplified in the embodiment).

10‧‧‧排列裝置 10‧‧‧ Alignment device

20‧‧‧保持手段 20‧‧‧Retention means

21‧‧‧轉動馬達 21‧‧‧Rotating motor

21A‧‧‧輸出軸 21A‧‧‧ Output shaft

22‧‧‧平台 22‧‧‧ platform

22A‧‧‧保持面 22A‧‧‧ Keep face

30‧‧‧間壁手段 30‧‧‧ Wall means

31‧‧‧直動馬達 31‧‧‧Directional motor

31A‧‧‧輸出軸 31A‧‧‧ Output shaft

32‧‧‧調和器 32‧‧‧Conditioner

40‧‧‧排列手段 40‧‧‧Arrangement

41‧‧‧線性馬達 41‧‧‧Linear motor

41A‧‧‧滑件 41A‧‧‧Sliding parts

CP‧‧‧晶片 CP‧‧‧ wafer

CP1‧‧‧晶片列 CP1‧‧‧ wafer array

WF‧‧‧晶圓 WF‧‧‧ wafer

Claims (4)

一種排列裝置,其特徵為具備:可在保持面而保持複數之片狀體的保持手段,和可插入靠合手段於在前述保持面所保持之前述複數的片狀體間之間壁手段,和使前述靠合手段與前述保持面相對移動,以特定的方向而使各片狀體排列於前述保持面上的特定位置之排列手段者。 An aligning device comprising: a holding means capable of holding a plurality of sheet-like bodies on a holding surface; and means for inserting a means for abutting between the plurality of sheet-like bodies held by the holding surface, And an arrangement means for arranging the respective sheet-like bodies at a specific position on the holding surface in a specific direction by moving the mating means relative to the holding surface. 如申請專利範圍第1項記載之排列裝置,其中,前述複數之片狀體係具備:加以貼合於接著薄片,可自前述接著薄片轉印前述複數之片狀體於前述保持面之轉印手段者。 The arranging device according to the first aspect of the invention, wherein the plurality of sheet-like systems include: a bonding means for bonding the plurality of sheet-like bodies to the holding surface from the sheet by bonding to the subsequent sheet By. 如申請專利範圍第1項或第2項記載之排列裝置,其中,前述靠合手段係可與前述複數之片狀體間,配置成格子狀之格子狀構件者。 The aligning device according to the first or second aspect of the invention, wherein the abutting means is arranged in a lattice-like lattice-like member between the plurality of sheet-like bodies. 一種排列方法,其特徵為具備:可在保持面而保持複數之片狀體的工程,和插入靠合手段於在前述保持面所保持之前述複數的片狀體間之工程,和使前述靠合手段與前述保持面相對移動,以特定的方向而使各片狀體排列於前述保持面上的特定位置之工程者。 An arrangement method comprising: a process of holding a plurality of sheet-like bodies on a holding surface; and a process of inserting a means for abutting between the plurality of sheet-like bodies held by the holding surface, and The means for moving in the opposite direction to the holding surface and arranging the respective sheet-like bodies in a specific position on the holding surface in a specific direction.
TW104127330A 2014-09-02 2015-08-21 Arrangement device and alignment method TWI650280B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014178407A JP6371641B2 (en) 2014-09-02 2014-09-02 Alignment apparatus and alignment method
JP2014-178407 2014-09-02

Publications (2)

Publication Number Publication Date
TW201628949A true TW201628949A (en) 2016-08-16
TWI650280B TWI650280B (en) 2019-02-11

Family

ID=55422561

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104127330A TWI650280B (en) 2014-09-02 2015-08-21 Arrangement device and alignment method

Country Status (4)

Country Link
JP (1) JP6371641B2 (en)
KR (1) KR102392848B1 (en)
CN (1) CN105390420B (en)
TW (1) TWI650280B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6983775B2 (en) * 2016-06-28 2021-12-17 リンテック株式会社 Manufacturing method of semiconductor device
CN107812719B (en) * 2017-10-24 2019-11-29 上海理工大学 Key billet sorts ordering system
JP7320932B2 (en) * 2017-11-10 2023-08-04 芝浦メカトロニクス株式会社 Deposition equipment and parts peeling equipment
JP6970432B2 (en) * 2017-11-30 2021-11-24 三星ダイヤモンド工業株式会社 Board alignment device
CN108364900B (en) * 2018-04-02 2024-03-08 无锡星微科技有限公司 Cylinder calibration table
CN108946004B (en) * 2018-05-30 2020-04-07 江苏易高烟草机械有限公司 Movable order separating device and method for sorting or buffer conveying process
KR102157647B1 (en) * 2018-11-30 2020-09-18 (주)플렉스컴 Apparatus and method for transferring wafer
CN111153195B (en) * 2019-12-30 2021-11-09 中山市威定机械制造有限公司 Automatic winding production line for double-mold strips

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09183024A (en) * 1995-12-28 1997-07-15 Taiyo Yuden Co Ltd Method and device for inserting work
JP2000327070A (en) * 1999-05-18 2000-11-28 Hitachi Ltd Packing method, carrying method and manufacture of semiconductor device
JP2001113420A (en) * 1999-10-19 2001-04-24 Sharp Corp Positioning method and device
JP3979772B2 (en) * 2000-08-18 2007-09-19 リンテック株式会社 Chip part peeling method
JP4592894B2 (en) * 2000-08-25 2010-12-08 Necエンジニアリング株式会社 Positioning device and positioning method
TWI225279B (en) * 2002-03-11 2004-12-11 Hitachi Ltd Semiconductor device and its manufacturing method
JP5912274B2 (en) 2011-03-28 2016-04-27 株式会社東京精密 Chip dividing / separating device and chip dividing / separating method
JP2013219245A (en) * 2012-04-10 2013-10-24 Canon Machinery Inc Method for manufacturing semiconductor device

Also Published As

Publication number Publication date
TWI650280B (en) 2019-02-11
KR20160027924A (en) 2016-03-10
JP2016054169A (en) 2016-04-14
CN105390420B (en) 2020-07-28
CN105390420A (en) 2016-03-09
JP6371641B2 (en) 2018-08-08
KR102392848B1 (en) 2022-04-29

Similar Documents

Publication Publication Date Title
TWI650280B (en) Arrangement device and alignment method
KR102047035B1 (en) Die bonding apparatus
JP6408366B2 (en) Separation device and separation method
TWI681481B (en) Array device and method
TW200947641A (en) Die bonding apparatus
JP2020183907A (en) Electronic component inspection device
JP6363947B2 (en) Separation device and separation method
KR101915878B1 (en) Substrate transfer teaching method and substrate processing system
US20040099112A1 (en) Plate-like carrying mechanism and dicing device with carrying mechanism
KR102486302B1 (en) Machining apparatus
JP6386866B2 (en) Separation device and separation method
JP6420623B2 (en) Separation device and separation method
TWI739997B (en) Spacer device and method
TWI798595B (en) Die bonding device
TW201407697A (en) Sheet adhering device and sheet adhering method
JP7002260B2 (en) Separation device and separation method
JP2018139280A (en) Positioning device and positioning method
TWI769220B (en) Separation device and separation method
JP2018139281A (en) Positioning device and positioning method
JP2016082139A (en) Separation device and separation method
JP2018139282A (en) Positioning device and positioning method
JP2013098323A (en) Support device and support method, sheet peeling device and peeling method, and sheet sticking device and sticking method
JP2019160904A (en) Orientation recognition apparatus, orientation recognition method, positioning apparatus, and positioning method
JP2018101729A (en) Transport device and transport method
JP2016127125A (en) Spacing device and spacing method