TWI576642B - Light irradiation device and light irradiation method - Google Patents

Description

Light irradiation device and light irradiation method

The present invention relates to a light irradiation device and a light irradiation method, which are provided with a light irradiation device and a light irradiation device which are provided with two workpiece carriers which are reciprocally movable on the same axis, and alternately irradiate the workpieces on the workpiece carriers. method.

In recent years, the directional treatment of an alignment film of a liquid crystal display element or a viewing layer compensation film of a liquid crystal display panel, which is an alignment layer of a predetermined wavelength, is referred to as a light orientation.

The light irradiation device used for the light orientation includes a rod-shaped light source having a length corresponding to the width of the light irradiation region, and a polarizing element that polarizes light from the light source, and is carried in a direction orthogonal to the longitudinal direction of the light source. The workpiece illuminates the polarized light.

The irradiation apparatus described above has, for example, the technique described in Patent Document 1. This technique employs a dual stage system and includes a first stage that can be moved back and forth between a first workpiece mounting position and an irradiation area set on one side of the irradiation area, and can be set on the other side of the irradiation area. A second stage that moves back and forth between the second workpiece mounting position and the irradiation area. and Further, the first stage and the second stage are alternately moved in the irradiation area, and the light is irradiated onto the workpiece on the stage, and the intermittent time can be reduced as compared with the case where only one stage is provided.

[Previous Technical Literature]

Patent Document 1: Japanese Laid-Open Patent Publication No. 2014-174352

[Summary of the Invention]

In the technique described in the above Patent Document 1, it is also possible to start the movement of the other stage (movement from the workpiece mounting position toward the irradiation area) for the purpose of shortening the intermittent time, and to connect one of the stage circuits to move (from The irradiation area is returned to the movement of the workpiece mounting position).

However, the period in which each stage moves in the irradiation region (the period during which the polarized light is irradiated) and the period in which the stage moves outside the irradiation region are different in the moving speed of the stage. Specifically, when each of the stages moves outside the irradiation area and only the workpiece is conveyed, the stage can be moved at a high speed. However, during the movement in the irradiation area, the stage is moved at a low speed in order to obtain a predetermined exposure amount.

For this reason, only the time when the approach movement of one of the stages starts is synchronized with the time when the circuit of the other stage starts moving, which causes interference between the stages due to the above-described difference in moving speed.

Therefore, an object of the present invention is to provide a light irradiation device capable of efficiently performing light irradiation processing without interfering with each other in a mode of a dual stage. Light irradiation method.

In order to solve the above problems, the light irradiation device according to the present invention is a light irradiation device that irradiates light to a workpiece passing through a predetermined irradiation region, and includes: placing a first workpiece and setting the conveyance axis of the irradiation region; a first stage that can move back and forth as a path movement between the first standby position on one side of the irradiation area and the irradiation area, and a movement from the first standby position toward the irradiation area; The workpiece is set between the second standby position on the other side of the irradiation region and the irradiation region on the conveyance shaft, and the movement from the second standby position toward the irradiation region is reciprocated as a loop movement a second stage; and individually controlling movement of the first stage and the second stage to alternately pass the first workpiece and the second workpiece through a control unit of the irradiation area, wherein the control unit controls the respective loads The stage moves at a moving speed slower than a preset maximum moving speed in the above-mentioned irradiation area, and is above the maximum moving speed Irradiation region is moved outside the loop, and no less than a distance between the moving speed of the stage closest approach distance is set movable in the irradiated region outside the advance.

As described above, a so-called dual stage method in which two stages on which a workpiece is placed is provided and light is alternately irradiated to each workpiece is employed. Thereby, in the irradiation of light to one of the stages, the workpiece replacement work of the other stage can be performed. Therefore, the intermittent time can be reduced and the productivity can be improved as compared with the case where only one stage is provided. Moreover, since the stage is moved outside the irradiation area, Moving at a moving speed not less than the closest distance between the stages, even if there is a difference in moving speed between the first stage and the second stage, interference between the stages is not generated and the movable load can be carried. The station effectively performs light irradiation treatment.

Further, in the above-described light irradiation device, the control unit may control the stage in which one of the first stage and the second stage moves outside the irradiation area, and when the other stage moves in a loop When the distance between the stages is longer than the closest distance, the one stage moves at the maximum moving speed, and when the distance between the stages is equal to or less than the closest distance, the one stage is carried by the other side. The moving speed of the station moves.

As described above, since the vehicle moves to a position where no interference occurs between the stages by the relatively high-speed path, and subsequently follows the stage that moves first, it is possible to avoid the interference between the stages and quickly reach the irradiation area. Therefore, after the light is irradiated to one of the workpieces, the other workpiece can be irradiated with light, and the intermittent time can be further shortened.

Further, in the above-described light irradiation device, the control unit may control one of the first stage and the second stage to move outside the irradiation area, and the other stage may move the other stage. The stage and the other stage of the stage follow the movement.

As described above, the stage that moves outside the irradiation area moves at the same moving speed as the other stage, and even if there is a difference in moving speed between the first stage and the second stage, it can be surely prevented. Interference between the stages.

Further, in the above-described light irradiation device, the control unit may control the one of the first stage and the second stage to move outside the irradiation area while the other stage is moving. When the position of the rear end portion in the circuit moving direction of the other stage is located closer to the second standby position side than the end position of the irradiation area on the second standby position side, the one stage is moved at the maximum moving speed.

As a result, when the stage that moves in the outward direction of the irradiation area completely enters the irradiation area, the stage can move relatively high speed to the entrance of the irradiation area regardless of the distance between the stages. Therefore, at least one of the two workpieces can be in a state in which the light irradiation treatment is often performed, and the interruption time can be further shortened.

Further, in the above-described light irradiation device, the control unit may control one of the first stage and the second stage to prohibit the movement of the other stage during the movement of the path.

Thereby, one of the stages can start the movement of the other stage after the start of the circuit movement, and the state in which the two stages move simultaneously can be avoided. Therefore, interference of the stages with each other can be surely avoided.

Further, in the above-described light irradiation device, the control unit may control one of the first stage and the second stage to switch to an approach movement from the one stage while the path is being moved. The turning position of the loop movement is started only at the target stop position set to the standby position side of the other stage, and the approach movement of the other stage is started, and when the other stage reaches the target stop position When the one of the above stages moves during the approach, the other stage is placed The stop is stopped at the target stop position until the stage starts to move.

As described above, when one of the stages moves during the approach, the other stage starts to move, so that the two workpieces can be more efficiently irradiated with light.

Further, in the above-described light irradiation device, the rotation of the periphery of the axis orthogonal to the stage surface of the first stage and the second stage is individually controlled, and the posture of the stage is used as a posture at the time of light irradiation. In the rotation control unit, the rotation control unit may control the rotation while the first stage and the second stage move in a section from a rotation allowable position before the respective standby positions reach the irradiation area.

When the rotation control unit is provided as described above, for example, when the workpiece is irradiated with polarized light, the direction of the workpiece can be set to a predetermined direction with respect to the polarization axis of the polarized light. Further, the rotation control of the stage is performed during the movement of the approach, and the length of the interruption time can be suppressed.

Further, in the above-described light irradiation device, when the rotation control unit performs the movement of the stage of the non-rotation control target, the rotation control unit may switch from the path movement of the non-rotation control target to the circuit movement. In the position, only the closest distance is set to the standby position side of the rotation control target, and when the circuit of the non-rotation control target is moved, only the closest distance is set from the position of the stage of the non-rotation control target. Rotate the standby position side of the control object.

Thereby, it is possible to avoid the interference between the stages and to perform the rotation control during the movement of the approach.

Further, in the above light irradiation device, the distance between the stages is The distance between the front end position of the first stage in the direction of movement of the first stage and the end position of the second stage in the direction of movement of the second stage may be the distance in the direction of the conveyance axis.

As described above, since the distance between the tip end positions in the direction in which the stages are moved in the respective stages is the distance between the stages, even when the shape of each stage or the rotation angle around the axis orthogonal to each stage surface is different, It is still possible to perform stage movement control that avoids interference between the stages.

Further, in the above-described light irradiation device, the light may be polarized light. As described above, it is also possible to use a polarized light irradiation device that performs a light directing treatment on a workpiece by irradiating polarized light.

Further, in the above-described light irradiation device, the first workpiece and the second workpiece may be irradiated with the light by both the approach movement and the loop movement. Thereby, light irradiation treatment can be performed without waste of energy.

Further, the light irradiation method according to the present invention is a light irradiation method for irradiating light to a workpiece passing through a predetermined irradiation region, and is individually controlled so that the first workpiece is placed on the conveyance shaft passing through the irradiation region, a first stage that can move back and forth between the irradiation area and the first standby position set on one side of the irradiation area, and the movement from the first standby position toward the irradiation area as a path movement; The workpiece is movable between the irradiation region and the second standby position set on the other side of the irradiation region on the conveyance shaft by a movement from the second standby position toward the irradiation region as a circuit movement When the moving second stage alternately passes the first workpiece and the second workpiece through the irradiation area, the stage is more advanced in the irradiation area. a moving speed at which the set maximum moving speed is slow, and in the circuit outside the irradiation area, the stage moves at the maximum moving speed, and the circuit outside the irradiation area is such that the distance between the stages is not less than The moving speed of the set closest distance is moved.

As described above, the so-called dual stage method in which the workpieces are alternately irradiated with light by the two stages on which the workpieces are placed is used. Thereby, in the irradiation of light to one of the stages, the workpiece replacement work of the other stage can be performed. Therefore, the intermittent time can be reduced and the productivity can be improved as compared with the case where there is only one stage. Further, when the stage that moves outside the irradiation area is moved at a moving speed that is not less than the closest distance between the stages, even if there is a difference in moving speed between the first stage and the second stage, There is also no interference between the stages, and the movable stage is effective for light irradiation processing.

In the light irradiation device of the present invention, in the dual stage mode, the stage on which the path can be moved can be moved at a moving speed that is not less than the closest distance from the other loaded stage. Therefore, even when there is a difference in moving speed between the first stage and the second stage, interference between the stages is not generated, and the light irradiation process can be performed efficiently.

10A, 10B‧‧‧Lighting Department

11‧‧‧Discharge lamp

12‧‧‧Mirror

13‧‧‧Polarizer unit

14‧‧‧shade

15‧‧‧ illuminated area

20‧‧‧Transportation Department

21A‧‧‧First stage

21B‧‧‧Second stage

22‧‧‧ Guides

23A, 23B‧‧‧ electromagnet

24A, 24B‧‧‧θ moving mechanism

30‧‧‧Control Department

31‧‧‧ linear scale

100‧‧‧Polarized light irradiation device

Fig. 1 is a view showing the schematic configuration of a polarized light irradiation device of the present embodiment. Mapping.

Fig. 2 is a view for explaining a movement section of each stage.

Fig. 3 is a view for explaining each stage.

Fig. 4 is a view for explaining each stage.

Fig. 5 is a flow chart showing the procedure of the stage speed control process of the first embodiment.

Fig. 6 is a view for explaining the operation of the first embodiment.

Fig. 7 is a view for explaining the operation of the first embodiment.

Fig. 8 is a view for explaining the operation of the first embodiment.

Fig. 9 is a view for explaining the operation of the first embodiment.

Fig. 10 is a view for explaining the operation of the first embodiment.

Fig. 11 is a flow chart showing the procedure of the stage speed control processing of the second embodiment.

Fig. 12 is a view for explaining the operation of the second embodiment.

Fig. 13 is a view for explaining the operation of the second embodiment.

Fig. 14 is a view for explaining the operation of the second embodiment.

Fig. 15 is a view for explaining the operation of the second embodiment.

Fig. 16 is a view for explaining the operation of the second embodiment.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(First embodiment)

Fig. 1 is a view showing the schematic configuration of a polarized light irradiation device of the present embodiment. Mapping.

The polarized light irradiation device 100 includes the light irradiation units 10A and 10B and the conveyance unit 20 that conveys the workpiece W. Here, the workpiece W is a rectangular substrate on which a light alignment film is formed, for example, to form a liquid crystal panel.

The polarized light irradiation device 100 irradiates polarized light (polarized light) of a predetermined wavelength from the light-irradiating portions 10A and 10B, and linearly moves the workpiece W by the transport unit 20, and illuminates the light-aligning film of the workpiece W with the polarized light. Directional processing.

Each of the light-irradiating portions 10A and 10B includes a lamp 11 having a linear light source and a mirror 12 that reflects the light of the lamp 11. Further, each of the light-irradiating portions 10A and 10B includes a polarizer unit 13 disposed on the light-emitting side thereof. Further, each of the light emitting portions 10A and 10B includes a lamp cover 14 that houses the lamp 11, the mirror 12, and the polarizer unit 13.

The light irradiation unit 10A and the light irradiation unit 10B are in a state in which the longitudinal direction of the lamp 11 coincides with the conveyance direction (X direction) orthogonal to the workpiece W (Y direction), and the conveyance direction (X direction) along the workpiece W. And set.

Hereinafter, specific configurations of the light irradiation units 10A and 10B will be described.

The lamp 11 is a long-sized lamp, and its light-emitting portion has a length corresponding to a width in a direction orthogonal to the conveyance direction of the workpiece W. The lamp 11 is, for example, a high-pressure mercury lamp or a metal halide mercury lamp in which mercury is added to other metals, and emits ultraviolet rays having a wavelength of 200 nm to 400 nm.

As the material of the light directing film, there is a material oriented with light having a wavelength of 254 nm, a material oriented with light having a wavelength of 313 nm, and light having a wavelength of 365 nm. Oriented materials are known, and the type of light source can be appropriately selected depending on the desired wavelength.

Further, as the light source, a linear light source in which an ultraviolet ray-emitting LED or an LD is arranged in a straight line may be used. At this time, the direction in which the LEDs or LDs are arranged is equivalent to the long direction of the lamp.

The mirror 12 is for reflecting the emitted light from the lamp 11 in a predetermined direction, and has a cross section of an elliptical or parabolic tubular concentrating mirror. The mirror 12 is disposed such that its longitudinal direction coincides with the longitudinal direction of the lamp 11.

The globe 14 is a light exit port through which the emitted light of the light 11 from the lamp 11 and the reflected light of the mirror 12 pass therethrough. The polarizer unit 13 is a light exit port attached to the globe 14, and polarizes light passing through the light exit.

The polarizer unit 13 has a configuration in which a plurality of polarizers are arranged along the longitudinal direction of the lamp 11. The plurality of polarizers are supported by, for example, a support.

The polarizer is, for example, a metal mesh type polarizing element, and the number of polarizers can be appropriately selected in accordance with the size of a region where the polarized light is irradiated. Further, each of the polarizers is disposed such that the transmission axes are oriented in the same direction.

The conveyance unit 20 includes a first stage 21A and a second stage 21B that hold the workpiece W, respectively. The two stages 21A and 21B are flat-shaped stages for adsorbing and holding the workpiece W by vacuum adsorption or the like. Further, in the present embodiment, each of the stages 21A, 21B and the workpiece W has a rectangular shape, but is not limited thereto and can be formed into an arbitrary shape. Further, the configuration is not limited to the configuration in which the workpiece W is sucked and held by the flat-shaped stage, and the workpiece W may be adsorbed and held by a plurality of pins.

Further, the transport unit 20 includes two guides 22 extending in the moving direction of the stages 21A and 21B, and electromagnets 23A and 23B configured as an example of a moving mechanism of the stages 21A and 21B. Here, the above-described moving mechanism is, for example, a linear motor stage. The linear motor stage floats the moving body (the stage 21A, 21B) by air on a flat platen having a salient pole of a ferromagnetic body in a checkerboard shape, and applies a magnetic force to the moving body to make the moving body and the stage The magnetic force between the salient poles of the plate changes, thereby moving the mechanism of the moving body. Further, the above-described moving mechanism may be a mechanism using a ball screw, for example.

As described above, the stages 21A and 21B are configured to reciprocate along the guide 22 that can be transported along the common conveyance axis.

Further, the transport unit 20 includes θ moving mechanisms 24A and 24B that can rotate the stages 21A and 21B in the θ direction (around the Z axis). That is, the stages 21A and 21B are rotatably attached to the θ direction on the fixed bases 25A and 25B, respectively, and the rotation angle thereof is adjusted by the θ moving mechanisms 24A and 24B.

The movement paths of the stages 21A and 21B are designed to pass right below the light irradiation portions 10A and 10B. The conveyance unit 20 is an irradiation area for transporting the workpiece W to the polarized light of the light irradiation units 10A and 10B, and constitutes an irradiation area therethrough. Further, the transport unit 20 is configured such that after the workpiece W completely passes through the irradiation region, the workpiece W is folded back and passed through the irradiation region again. The light directing process of the light directing film of the workpiece W is performed by both the path movement and the circuit movement.

Fig. 2 is a view for explaining a movement section of the stages 21A and 21B.

The first stage 21A is reciprocally moved to the other side of the irradiation area 15 set to the polarized light from the substrate mounting position (first standby position) P11 set at the workpiece mounting position on one side of the polarized light irradiation region 15. The interval up to the position P12. In addition, the second stage 21B is a substrate mounting position (second standby position) P21 that is set at a workpiece mounting position on the side opposite to the substrate mounting position P11 with the irradiation region 15 interposed therebetween, and can be reciprocated to be placed between the irradiation regions 15 A section from the folded-back position P22 on the side opposite to the folded-back position P12.

Here, the first stage 21A is provided with a movement from the substrate mounting position P11 toward the folding position P12 as an approach movement. Similarly, the movement of the second stage 21B from the substrate mounting position P21 toward the folding position P22 is also performed as the path movement. Further, the substrate mounting position is a position at which the substrate (work W) placed on the stage is replaced and adjusted, and the folded position is set between the irradiation region 15 and the substrate mounting position of the other stage. The path of the station moves to the switching position of the circuit movement.

For example, the X-direction distance L1 of the movement sections (P11 to P12) of the first stage 21A and the X-direction distance L2 of the movement sections (P21 to P22) of the second stage 21B are set to be substantially equal. Further, even if the second stage 21B is in an arbitrary posture by the rotational movement in the θ direction between the substrate mounting position of the first stage 21A and the irradiation area 15, the space passing through the irradiation area 15 can be secured. . In the same manner, the first stage 21A is in an arbitrary posture by the rotational movement in the θ direction between the substrate mounting position of the second stage 21B and the irradiation area 15. It is still possible to ensure a space that passes through the amount of the irradiation area 15 or more.

The basic operations of the stages 21A and 21B are as follows.

The first stage 21A performs the replacement work and the adjustment work of the workpiece W at the substrate mounting position P11, and after the adjustment is completed, the θ moving mechanism 24A is rotationally moved. Thereby, the direction of the workpiece W is made to be a predetermined direction with respect to the polarization axis of the polarized light.

Thereafter, the first stage 21A starts moving toward the irradiation area 15. When the irradiation region 15 reaches the folding position P12, the circuit movement starts and returns to the substrate mounting position P11. In the substrate mounting position P11, the replacement work and the adjustment work of the workpiece W are performed again, and after the adjustment is completed, the first stage 21A starts moving again toward the irradiation area 15. Repeat this action.

Similarly, in the second stage 21B, the workpiece W is replaced and adjusted in the substrate mounting position P21. After the adjustment is completed, the θ moving mechanism 24B is rotated and moved toward the irradiation region 15 to start the movement. The rotation angle of the second stage 21B at this time may also be different from the rotation angle of the first stage 21A. Further, when the second stage 21B reaches the return position P22 through the irradiation area 15, the circuit starts to move and returns to the substrate mounting position P21. Repeat this action.

Further, each of the stages 21A and 21B normally operates to move from the substrate mounting position toward the irradiation region 15 and the moving speed during the circuit movement from the irradiation region 15 to the substrate mounting position is set to a relatively high speed first movement. Speed (maximum moving speed) V1, other areas (between the irradiation area 15 and the irradiation area 15 and the folding position) The moving speed is set to a second moving speed V2 that is lower than the first moving speed V1.

The control unit 30 is a unit that controls the transport unit 20 (see FIG. 1) of the moving mechanism of the stage that realizes the stage operation. At this time, the control unit 30 acquires the speed information of each of the stages 21A and 21B from the linear scale 31 arranged in parallel with the conveyance axis, and calculates the speed information of each of the stages 21A and 21B based on the acquired position information. Further, the control unit 30 calculates the target moving position and the target moving speed of each of the stages 21A and 21B based on the acquired position information and the calculated speed information, and outputs the same to each unit of the transport unit 20.

Moreover, the control unit 30 controls the moving speed of each of the stages 21A and 21B so that the first stage 21A and the second stage 21B do not repeatedly interfere with each other while repeating the reciprocating movement on the common conveyance shaft as described above.

Specifically, while one of the stages moves during the approach, only the circuit of the other stage is allowed to move, and the movement of the path is prohibited. In addition, when one of the stages moves in the circuit and the other stage moves in the outside of the irradiation area, the moving speed of the stage that controls the movement of the path is such that the distance between the stages in the X direction (La described later) is set in advance. The closest distance (L0 to be described later) is not close.

Here, the closest distance L0 is a margin distance to which the subsequent stage can be stopped without causing interference between the stages even when the stage moving in advance is urgently stopped. The closest distance L0 is set, for example, according to the first moving speed V1 of the maximum moving speed.

Each of the stages 21A and 21B is rotatable in the θ direction as described above. Therefore, the above-described inter-station distance La is shown in FIG. 3, and is set to the front end position P13 of the first stage 21A (the right side of the third figure) and the second stage 21B (the direction of the second stage 21B). The X-direction distance of the foremost position P23 of the left side of the figure 3).

Further, each of the stages 21A and 21B is capable of individually controlling the rotation angle in the θ direction. As shown in FIG. 4, the first stage 21A and the second stage 21B are different in the rotation direction. At this time, the foremost position P14 of the first stage 21A in the approach direction and the foremost position P24 of the second stage 21B in the approach direction are also set as the inter-stage distance La.

Fig. 5 is a flowchart showing the procedure of the stage speed control processing executed by the control unit 30. The processing shown in FIG. 5 is processing when the control unit 30 controls the moving speed of the first stage 21A. Further, as for the processing for controlling the moving speed of the second stage 21B, as described below, only the "first stage" is replaced with the "second stage", and the "second stage" is replaced with the first. The stage may be omitted, and the description is omitted here.

First, in step S1, the control unit 30 determines whether or not the first stage 21A is moving in the loop. Here, the control unit 30 determines the position and the moving direction of the first stage 21A based on the position information of the first stage 21A, and determines whether or not the first stage 21A is moving in the loop.

When it is determined in this step S1 that the first stage 21A is moving in the loop, the process proceeds to step S2. On the other hand, when it is determined that the first stage 21A is not moving in the loop, that is, during the path movement or when the substrate mounting position is stopped, the process proceeds to step S3.

In step S2, the control unit 30 sets the target moving speed. The first stage 21A is normally operated, and this is output to the moving mechanism of the first stage 21A. In other words, when the first stage 21A moves toward the irradiation area 15 or when the circuit returns from the irradiation area 15 to the substrate mounting position, the target moving speed is set to the first moving speed V1 and is located in another area. In this case, the target moving speed is set to the second moving speed V2. Then, the set target moving speed is output to the moving mechanism of the first stage 21A.

In step S3, the control unit 30 determines whether or not the second stage 21B is moving in the approach. Here, the control unit 30 determines the moving direction of the second stage 21B based on the position information of the second stage 21B, and determines whether or not the second stage 21B is in the forward movement. When it is determined that the second stage 21B is moving in the approach, the process goes to step S4, and if it is determined that the second stage 21B is moving in the circuit, the process goes to step S5.

In step S4, the control unit 30 causes the first stage 21A to stand by at the board mounting position. That is, the control unit 30 sets the target moving speed to 0 so that the first stage 21A is stopped, and outputs the moving mechanism to the moving mechanism of the first stage 21A, and then moves to step S9, which will be described later.

In step S5, the control unit 30 determines whether or not at least a portion of the first stage 21A exists in the irradiation area 15. Further, when the first stage 21A is present in the irradiation area 15, the process proceeds to step S2, and if it exists outside the irradiation area 15, the process proceeds to step S6.

In step S6, the control unit 30 determines whether or not the inter-station distance La between the first stage 21A and the second stage 21B is longer than the closest distance L0. Here, the inter-station distance La is as described above, and is the first stage 21A. The distance between the foremost end position of the approach direction and the X-direction end position of the second stage 21B in the approach direction. The position of the foremost end of each stage in the approach direction is calculated based on the position of the stage, the size of the stage, and the rotation angle of the stage.

When the inter-station distance La is longer than the closest distance Lo, it is determined that the first stage 21A is in the normal operation and the process proceeds to step S2. If the inter-station distance La reaches the closest distance Lo, the process proceeds to step S7.

In step S7, the control unit 30 calculates the distance (irradiation area arrival distance Lb) from the first stage 21A to the irradiation area 15, and compares the irradiation area arrival distance Lb with the closest distance L0. Here, the irradiation region reaching distance Lb is a distance from the foremost end position of the first stage 21A in the approach direction to the end position of the substrate mounting position of the first stage 21A of the irradiation area 15, as shown in FIG. When the irradiation region reaching distance Lb is located at the most distal end position of the first stage 21A than the inlet of the irradiation region 15 (the left end portion of FIG. 6) on the retreating side (the left side of FIG. 6), it is assumed that Lb>0, When the front end position of one stage 21A is more on the forward side (the right side of FIG. 6) than the entrance of the irradiation area 15, Lb=0 is set.

When the irradiation area arrival distance Lb is equal to or greater than the closest distance L0, the process proceeds to step S8, and when the irradiation area arrival distance Lb is shorter than the closest distance L0, the process proceeds to step S2.

In step S8, the control unit 30 sets the target moving speed of the first stage 21A to the moving speed of the second stage 21B so that the first stage 21A follows the second stage 21B, and outputs the same to the first stage 21A. Mobile agency.

In step S9, the control unit 30 determines whether or not the drive control of the first stage 21A is completed. If it is determined that the control is continued, the process returns to step S1, and when the end control is determined, the stage speed control process is terminated.

Hereinafter, the operation of this embodiment will be described in detail with reference to FIGS. 6 to 10 .

In the state in which the first stage 21A is stopped at the substrate mounting position P11, the polarized light irradiation device 100 performs the replacement operation of the substrate on the first stage 21A and the adjustment operation of the substrate. When the adjustment operation is completed, the preparation for starting the movement of the first stage 21A is started (the step S1 in FIG. 5 is No).

At this time, as shown in FIG. 6, when the second stage 21B moves in the approach (Yes in step S3), the first stage 21A does not start the path movement, but stands by at the board mounting position (step S4). . Thereafter, the second stage 21B reaches the folding position, and when the circuit moves, the first stage 21A starts the path movement. That is, the first stage 21A is synchronized with the time at which the second stage 21B starts the circuit movement, and starts the path movement.

On the other hand, when the preparation for starting the movement of the first stage 21A is ready, when the second stage 21B starts the circuit movement (No in step S3), the first stage 21A is in its state. Start the move.

The moving speed of the first stage 21A at the start of the path movement is determined based on the inter-stage distance La and the irradiation area reaching distance Lb. For example, as shown in Fig. 7, when the inter-stage distance La is longer than the preset closest distance L0 (Yes in step S6), the first stage 21A performs normally Action (step S2). That is, the first stage 21A starts the path movement at the relatively high speed first moving speed V1.

The second stage 21B moves at a relatively low speed second moving speed V2 until it completely passes through the irradiation area 15 during the movement of the circuit. Therefore, when the first stage 21A starts the path movement at the first moving speed V1, the first stage 21A gradually catches up with the second stage 21B.

Further, as shown in Fig. 8, the distance between the stages La reaches the closest distance L0 before the rear end portion of the second stage 21B (the most distal position in the approach direction) enters the irradiation area 15 (in step S6) No, the step S7 is Yes), and the moving speed of the first stage 21A is decelerated to the second moving speed V2 (step S8). Thereby, the first stage 21A follows the second stage 21B in a state in which the inter-stage distance La is maintained at the closest distance L0.

Then, as shown in Fig. 9, when the rear end portion (the most distal end position in the approach direction) of the second stage 21B enters the irradiation region 15, and the irradiation region reaching distance Lb is shorter than the closest distance L0 (in step S7, No), the operation of the first stage 21A is switched from the following operation of the second stage 21B to the normal operation (step S2). That is, the moving speed of the first stage 21A is accelerated to the first moving speed V1.

At this time, since the second stage 21B moves in the irradiation region 15 at the relatively low speed second moving speed V2, the first stage 21A is switched to the normal operation to bring the two closer to each other, and the inter-stage distance La is as the tenth. The graph representation becomes shorter than the closest distance L0.

However, when the first stage 21A reaches the irradiation area 15, Step S5 is Yes), and the moving speed is decelerated to the second moving speed V2 (step S2). Therefore, the first stage 21A and the second stage 21B move together at the second moving speed V2, and interference between the two stages does not occur.

Thereafter, when the second stage 21B completely passes through the irradiation region 15, it is returned to the substrate mounting position after being accelerated to the first moving speed V1. At this time, the first stage 21A continues to move in the irradiation area 15 at the second moving speed V2. The first stage 21A then moves to the loop when it reaches the folding position, and performs normal operation regardless of the position of the second stage 21B in the circuit before returning to the board mounting position.

As described above, the polarized light irradiation device of the present embodiment includes two workpiece stages (the first stage 21A and the second stage 21B) that can reciprocate on the same axis, and the substrates facing the workpiece stages are used. (Workpiece W) A so-called dual stage method in which polarized light is alternately irradiated. Thereby, in the irradiation of the polarized light of one of the stages, the substrate replacement operation of the other stage can be performed. Therefore, the intermittent time can be shortened and the productivity can be improved as compared with the case where there is only one workpiece stage.

In addition, when one of the stages moves during the circuit, the start of the approach movement of the other stage is prohibited, and the stage in which the one stage reaches the return position and the start of the circuit movement start, and the movement of the other stage starts. It is possible to avoid the situation in which the two stages together become the movement of the approach, and it is possible to surely avoid interference of the stages with each other. Further, since the circuit movement of the other stage can be started by continuing the circuit movement of one stage, the interruption time can be further shortened.

In addition, at this time, the first stage 21A and the second stage are considered. There is a difference in moving speed between 21B, and the position and degree of movement of the stage corresponding to the movement of the loop control the moving speed of the stage in which the external path moves in the irradiation area 15. That is, when the inter-stage distance La is longer than the preset closest distance L0, the stage for controlling the path movement is controlled to move at the first moving speed (maximum moving speed) V1, and the inter-station distance La is closest to the distance L0. At this time, the stage that controls the movement of the path is controlled to move at the same moving speed as the stage on which the circuit moves.

Thereby, the stage on which the approach movement starts is moved at the relatively high speed first moving speed V1 until the distance La between the stages reaches the closest distance L0, and once caught up in the irradiation area 15 at a relatively low speed second moving speed V2 When the stage in which the circuit moves is such that the distance La between the stages becomes the closest distance L0, the moving speed is switched to the second moving speed V2. Then, the stage on which the approach moves is to maintain the distance La between the stages at the stage closest to the distance L0 following the movement of the circuit. As described above, the stage on which the approach movement starts can catch up with the stage on which the circuit moves at a high speed so that the distance La between the stages is not smaller than the closest distance L0. Therefore, after the stage on which the loop moves passes through the irradiation area (the stage moved by the loop is passing through the irradiation area according to the closest distance L0), the stage on which the approach moves can enter the irradiation area. Therefore, the stages do not interfere with each other, and the light directing process can be performed efficiently.

Further, since the distance between the tip end position of the approach movement of the first stage 21A and the tip end position of the approach movement of the second stage 21B is the inter-stage distance La, each stage is as shown in Figs. 4 and 4 It is shown that even if the rotation is respectively performed in the θ direction, the interference between the stages can be appropriately avoided. In addition, at this time, according to the position or size of the stage, the rotation in the θ direction The angle is calculated by calculating the tip end position of the stage in the direction of movement of the stage, and the distance La between the stages can be appropriately calculated.

(Second embodiment)

Next, a second embodiment of the present invention will be described.

In the second embodiment, in the first embodiment described above, when one of the stages moves in the path, the start of the approach movement of the other stage is prohibited, and the movement of the other stage is permitted. Start.

Fig. 11 is a flowchart showing a procedure for executing the stage speed control processing by the control unit 30 of the second embodiment. The processing shown in Fig. 11 is the same as the processing of Fig. 5 except that step S4 of Fig. 5 is replaced with step S11. Therefore, the same step numbers are assigned to the portions that perform the same processing as in Fig. 5, and the description is centered on the processing of the different portions.

In step S11, the control unit 30 first sets the target stop position of the first stage 21A. The target stop position is a position away from the folding position P22 of the second stage 21B to the substrate mounting position side of the first stage 21A by a predetermined distance (for example, closest to the distance L0).

Next, the control unit 30 determines whether or not the position of the first stage 21A is located on the substrate mounting position side of the first stage 21A more than the target stop position. When it is determined that the target stage is positioned on the substrate mounting position side, the first stage 21A is moved toward the target stop position. It is assumed that the moving speed at this time is the first moving speed V1. On the other hand, when the first stage 21A reaches the target stop position, the first stage 21A is at the target stop position. stop.

That is, in the present embodiment, as shown in Fig. 12, even when the second stage 21B is moved in the way, the first stage 21A can start the path movement at the first moving speed V1 when the adjustment processing is completed at the board mounting position. However, the permission section of the approach movement of the first stage 21A at this time is the section from the folding position P22 of the second stage 21B to the target stop position P15 which is only the closest distance L0.

Further, as long as the second stage 21B starts the circuit movement before the first stage 21A reaches the target stop position P15, the same operation as in the first embodiment described above can be performed. On the other hand, as shown in Fig. 13, even when the first stage 21A reaches the target stop position P15 and the second stage 21B moves in the approach, the first stage 21A stops at the target stop position P15, and stands by until the first load. The stage 21B starts to move the circuit.

Then, as shown in Fig. 14, when the second stage 21B reaches the return position P22 and starts the circuit movement (No in step S3), the first stage 21A starts the following of the second stage 21B (No in step S6, Step S8 is Yes). That is, the first stage 21A starts moving at the same moving speed (second moving speed V2) as the second stage 21B. The subsequent operations are the same as those of the first embodiment described above.

As described above, in the present embodiment, even when one of the stage approaches moves, the circuit movement of the other stage can be started. Therefore, the two workpieces W can be more efficiently subjected to light directing processing. In particular, when the speed difference between the first moving speed V1 and the second moving speed V2 is relatively small, or the substrate mounting position is set to be farther from the irradiation area. In the case of the case, the other stage of the stage is moved during the light irradiation of one of the stages, and it is effectively used in the case where the other stage of the stage is difficult to catch up with the stage.

When one of the stages moves in the approach, the path of the other stage is allowed to move from the other return position to the position on the substrate mounting position side of the one of the stages. Therefore, it is possible to surely prevent interference with the other stage of the approach movement.

(Third embodiment)

Next, a third embodiment of the present invention will be described.

In the third embodiment, in the first and second embodiments described above, the rotation operation in the θ direction of the stage is performed at the substrate mounting position, and the θ rotation can be performed while starting the movement after the completion of the rotation operation. Move and move.

In the present embodiment, the θ rotation operation of the first stage 21A and the second stage 21B is performed during the approach movement before entering the irradiation area 15, and is performed at a position where the distance between the stages La of the closest distance L0 or more can be secured. . Further, the time required for the θ rotation operation is shorter than the time required for the stage to move from the substrate mounting position to the irradiation region 15.

For example, when the substrate mounting on the first stage 21A is completed in the substrate mounting position, the first stage 21A performs the θ rotation operation and starts the path movement. In the case where the second stage 21B is moving during the approach, the section from the substrate mounting position to the target stop position P15 is a section that can be rotated by the θ. Here, the goal The stop position P15 is a position away from the substrate mounting position side of the first stage 21A by a predetermined distance (for example, the closest distance P10) from the folded position P22 of the second stage 21B.

When the first stage 21A reaches the target stop position P15 before the second stage 21B reaches the return position P22, the first stage 21A is stopped at the target stop position P15 and the θ rotation operation is performed.

Here, whether or not the first stage 21A has reached the target stop position P15 is determined by whether or not the position closest to the second stage 21B is rotated by the apex of the first stage 21A and the position closest to the second stage 21B is reached. In other words, when the leading end portion of the circle in the approach direction indicated by the two-dotted line in Fig. 15 reaches the target stop position P15, it is determined that the first stage 21A reaches the target stop position P15.

On the other hand, when the second stage 21B is moving in the circuit when the substrate mounting of the first stage 21A is completed, the second stage 21B is shown in Fig. 16 from the rear end position of the second stage 21B (the direction of the approach). The most extreme position of the first stage 21A is a section that can be rotated by the θ rotation of the first stage 21A.

At this time, the first stage 21A moves the path and performs the θ rotation operation at the first moving speed V1 at the normal moving speed until the distance La between the stages becomes the closest distance L0. When the inter-stage distance La becomes the closest distance L0, the second moving speed V2 similar to the second stage 21B maintains the closest distance L0 while moving in the way and performing the θ rotation operation. Here, the starting point of the calculation of the inter-station distance La is that the apex of the first stage 21A is rotated by θ to be the closest to the second load. The position of the stage 21B.

The operation after the completion of the θ rotation operation of the first stage 21A is the same as that of the first and second embodiments described above.

As described above, in the present embodiment, the θ rotation operation is performed while moving in the approach, so that the interruption time can be further shortened. Further, since the θ rotation operation can be performed at a position that is not close to the two closest stages of the closest distance L0, it is possible to surely prevent the occurrence of interference between the stages.

(Modification)

In each of the above embodiments, when one of the stages is moved by the path and the other stage is moved by the circuit, one of the stages follows the other stage so that the distance La between the stages reaches the closest distance L0. The case where one of the stages follows the other stage (moving at the same speed as the other stage) has been described, but is not limited thereto. For example, it is also possible to follow the other stage from the movement of one of the stages. Thereby, the moving speed of one of the preceding stages is controlled to control the moving speed of one of the stages, and even if the moving speed of the other stage is different depending on the moving section, the interference between the stages can be surely prevented. produce. However, in order to further shorten the interruption time, as in the above embodiments, it is preferable to move the subsequent stage at the maximum moving speed (first moving speed V1) so that the distance La between the stages becomes the closest distance L0. .

Further, in each of the above embodiments, the case where the distance La between the stages is the distance between the foremost end position of the approach direction of one of the stages and the foremost position of the approach direction of the other stage has been described, but

When the size of the workpiece W (substrate) on the stage is larger than the size of the stage, the distance La between the stages becomes the distance between the workpieces. At this time, the foremost position in the approach direction of the workpiece W is also the calculated base point of the distance between the workpieces.

Further, in each of the above embodiments, the distance between the stages can be set to the X-direction distance of the side of the approach direction of one of the stages and the side of the approach direction of the other stage (the closest part of the X direction). distance).

Further, in each of the above embodiments, the position and the moving speed of each stage are obtained by using the measurement results of the linear scale. However, the position and movement of each stage may be obtained by means other than the linear scale. speed.

Further, in each of the above embodiments, the case where the present invention is applied to a polarized light irradiation device has been described, but the present invention is not limited thereto. For example, as long as the configuration in which the two stages can reciprocate along the same axis, there is a light irradiation in which the two stages are alternately transported from the standby position set on the same axis to the light irradiation area with the light irradiation region interposed therebetween. According to the present invention, the same effects as those of the above embodiments can be obtained by using the present invention. Examples of the light irradiation device include a DI (Direct-Image) exposure device or an ultraviolet irradiation device that performs thermal curing treatment by ultraviolet rays.

10A, 10B‧‧‧Lighting Department

11‧‧‧Discharge lamp

12‧‧‧Mirror

13‧‧‧Polarizer unit

14‧‧‧shade

20‧‧‧Transportation Department

21A‧‧‧First stage

21B‧‧‧Second stage

22‧‧‧ Guides

23A, 23B‧‧‧ electromagnet

24A, 24B‧‧‧θ moving mechanism

25A, 25B‧‧‧ fixed abutments

100‧‧‧Polarized light irradiation device

W‧‧‧Workpiece

Claims (11)

A light irradiation device is a light irradiation device that irradiates light to a workpiece passing through a predetermined irradiation region, and is characterized in that: a first stage is mounted on the first workpiece, and the first workpiece is placed on the conveyance shaft of the irradiation region, and is set. Between the first standby position on one side of the irradiation area and the irradiation area, the movement from the first standby position toward the irradiation area is movable as an approach movement, and the second stage is placed second. The workpiece is set between the second standby position on the other side of the irradiation region and the irradiation region on the conveyance shaft, and the movement from the second standby position toward the irradiation region is reciprocated as an approach movement And a control unit that individually controls movement of the first stage and the second stage to alternately pass the first workpiece and the second workpiece through the irradiation region, wherein the control unit controls the respective stages in the irradiation area a circuit that moves at a moving speed that is slower than a preset maximum moving speed and that is outside the above-mentioned irradiation area at the above-described maximum moving speed And moving in an approach path outside the irradiation area at a moving speed not less than a closest distance preset between the stages, the control unit, the stage of one of the first stage and the second stage is When the external path of the irradiation area moves and the other stage moves in a loop, when the distance between the stages is longer than the closest distance, the one stage is moved at the maximum moving speed, and the stage spacing is When the distance is less than or equal to the closest distance, the one stage is moved at the moving speed of the other stage. The light irradiation device according to the first aspect of the invention, wherein the control unit moves one of the first stage and the second stage to an external path of the irradiation area, and the other stage moves At this time, the one of the above stages and the other stage are moved. The light irradiation device according to the first or second aspect of the invention, wherein the control unit moves one of the first stage and the second stage outside the irradiation area, and the other side When the stage circuit moves, when the position of the rear end portion of the other stage in the circuit moving direction is located closer to the second standby position side than the end position of the irradiation area on the first standby position side, the control is performed at the maximum The moving speed moves the one of the above stages. The light irradiation device according to the first or second aspect of the invention, wherein the control unit prohibits the other of the first stage and the second stage from moving while the path is being moved. The approach of the station moves. The light irradiation device according to the first or second aspect of the invention, wherein the control unit is in the period in which the one of the first stage and the second stage moves during the approach. The turning position at which the path movement of one of the stages is switched to the circuit movement is opened only at the target stop position set to the standby position side of the other stage at the closest distance. When the other stage is moved to the target stop position, when the other stage moves to the target, the other stage is stopped at the target stop position to the one side. The stage starts moving the circuit. The light-irradiating device according to the first or second aspect of the invention, further comprising: individually controlling a rotation around a shaft orthogonal to the stage surface of the first stage and the second stage, The rotation control unit of the posture of the stage as the posture at the time of light irradiation, the rotation control unit is a section approaching the rotation permission position before the first stage and the second stage reach the irradiation area from the respective standby positions The above rotation is controlled during the movement. The light irradiation device according to claim 6, wherein the rotation permission position is switched from the movement of the stage to be non-rotation control when the rotation control unit performs the movement of the stage of the non-rotation control target At the return position of the loop movement, only the closest distance is set to the standby position side of the rotation control target, and when the circuit of the non-rotation control target moves, the position of the stage from the non-rotation control target is only the most The approach distance is set to the standby position side of the above-described rotation control target. The light irradiation device according to the first or second aspect of the invention, wherein the distance between the stages is a front end position in the direction of movement of the first stage, and an direction of movement of the second stage The distance between the front end positions in the direction of the conveyance axis. For example, the light irradiation device described in item 1 or 2 of the patent application scope The light is polarized light. The light-irradiating device according to the first or second aspect of the invention, wherein the first workpiece and the second workpiece are irradiated with the light by both the approach movement and the loop movement. A light irradiation method is a light irradiation method for irradiating light to a workpiece passing through a predetermined irradiation region, wherein the individual control is performed such that the first workpiece is placed on the conveyance axis of the irradiation region and set in the irradiation region a first stage that can move back and forth as a path movement between the first standby position on one of the first standby positions and the irradiation area, and the second workpiece is placed on the first standby position and the irradiation area The transport shaft is configured to be movable between the second standby position set on the other side of the irradiation region and the irradiation region, and the movement from the second standby position toward the irradiation region as a path movement The second stage controls the respective stages to alternately move the first workpiece and the second workpiece through the irradiation region, and moves in the irradiation region at a moving speed that is slower than a preset maximum moving speed, and the irradiation The circuit outside the area moves at the above maximum moving speed, and the distance outside the above-mentioned irradiation area is not less than the distance between the stages. The moving speed of the set closest distance is moved, and the control unit controls one of the first stage and the second stage to move outside the irradiation area, and the other stage is moved in the circuit. When the distance between the stages is longer than the closest distance, the one stage is moved at the maximum moving speed, and when the distance between the stages is equal to or less than the closest distance, the one stage is placed. It moves at the moving speed of the other stage.