TWI576570B - 用於輻射測溫計之遠心光學裝置、使用遠心鏡片配置以減少輻射測溫計中雜散輻射之方法及溫度測量系統 - Google Patents
用於輻射測溫計之遠心光學裝置、使用遠心鏡片配置以減少輻射測溫計中雜散輻射之方法及溫度測量系統 Download PDFInfo
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- TWI576570B TWI576570B TW102121844A TW102121844A TWI576570B TW I576570 B TWI576570 B TW I576570B TW 102121844 A TW102121844 A TW 102121844A TW 102121844 A TW102121844 A TW 102121844A TW I576570 B TWI576570 B TW I576570B
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Links
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/07—Arrangements for adjusting the solid angle of collected radiation, e.g. adjusting or orienting field of view, tracking position or encoding angular position
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Plasma & Fusion (AREA)
- Radiation Pyrometers (AREA)
- Measurement Of Radiation (AREA)
- Apparatus For Disinfection Or Sterilisation (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/531,220 US9085824B2 (en) | 2012-06-22 | 2012-06-22 | Control of stray radiation in a CVD chamber |
| US13/531,162 US9448119B2 (en) | 2012-06-22 | 2012-06-22 | Radiation thermometer using off-focus telecentric optics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201403037A TW201403037A (zh) | 2014-01-16 |
| TWI576570B true TWI576570B (zh) | 2017-04-01 |
Family
ID=49769419
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW102121844A TWI576570B (zh) | 2012-06-22 | 2013-06-20 | 用於輻射測溫計之遠心光學裝置、使用遠心鏡片配置以減少輻射測溫計中雜散輻射之方法及溫度測量系統 |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JP2015528106A (ja) |
| KR (1) | KR101679995B1 (ja) |
| CN (2) | CN104520470B (ja) |
| DE (1) | DE112013003131T5 (ja) |
| SG (1) | SG11201408492QA (ja) |
| TW (1) | TWI576570B (ja) |
| WO (1) | WO2013192510A1 (ja) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103776548A (zh) * | 2014-02-14 | 2014-05-07 | 丹纳赫（上海）工业仪器技术研发有限公司 | 红外测温仪以及用于测量能量区域的温度的方法 |
| JP6274578B2 (ja) * | 2015-01-09 | 2018-02-07 | 信越半導体株式会社 | エピタキシャルウェーハの製造方法 |
| JP6574344B2 (ja) * | 2015-06-23 | 2019-09-11 | 株式会社Ｓｃｒｅｅｎホールディングス | 熱処理装置および熱処理方法 |
| DK3287190T3 (da) * | 2016-08-26 | 2020-08-10 | aquila biolabs GmbH | Fremgangsmåde til at overvåge en målprocesparameter |
| JP6824080B2 (ja) | 2017-03-17 | 2021-02-03 | 株式会社Ｓｃｒｅｅｎホールディングス | 熱処理装置および放射温度計の測定位置調整方法 |
| CN108254912B (zh) * | 2018-01-23 | 2020-03-27 | 电子科技大学 | 一种用于氮化物mocvd外延生长模式的实时显微监测系统 |
| CA3103428A1 (en) | 2018-06-22 | 2019-12-26 | Avava, Inc. | Feedback detection for a treatment device |
| CN110006533A (zh) * | 2019-04-11 | 2019-07-12 | 中国航发湖南动力机械研究所 | 用于抑制辐射源尺寸效应的器件及辐射测温计 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6614539B1 (en) * | 1999-05-11 | 2003-09-02 | Minolta Co., Ltd. | Telecentric optical system |
| US20080030715A1 (en) * | 2004-06-22 | 2008-02-07 | Nikon Corporation | Best Focus Detection Method, Exposure Method, And Exposure Apparatus |
| US7443496B2 (en) * | 1991-04-02 | 2008-10-28 | Hitachi, Ltd. | Apparatus and method for testing defects |
| US7728968B2 (en) * | 2000-09-12 | 2010-06-01 | Kla-Tencor Technologies Corporation | Excimer laser inspection system |
| TW201205049A (en) * | 2010-03-31 | 2012-02-01 | Konica Minolta Sensing Inc | Optical system for measurement, and color luminance meter and colorimeter using the same |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57200827A (en) * | 1981-06-04 | 1982-12-09 | Kansai Coke & Chem Co Ltd | Temperature measuring method of combustion chamber in coke oven |
| JPH07104210B2 (ja) * | 1987-03-27 | 1995-11-13 | ミノルタ株式会社 | 放射温度計 |
| US5209570A (en) * | 1989-05-30 | 1993-05-11 | Deutsche Forschungsanstalt Fur Luft- Und Raumfahrt E.V. | Device for measuring the radiation temperature of a melt in vacuum |
| JP4240754B2 (ja) * | 1999-05-11 | 2009-03-18 | コニカミノルタセンシング株式会社 | テレセントリック光学系 |
| US6680377B1 (en) * | 1999-05-14 | 2004-01-20 | Brandeis University | Nucleic acid-based detection |
| JP4949560B2 (ja) * | 1999-05-14 | 2012-06-13 | ブランディーズ・ユニバーシティ | 核酸をベースとする検出 |
| US6310347B1 (en) * | 1999-06-29 | 2001-10-30 | Goodrich Corporation | Spectrometer with planar reflective slit to minimize thermal background at focal plane |
| US6492625B1 (en) * | 2000-09-27 | 2002-12-10 | Emcore Corporation | Apparatus and method for controlling temperature uniformity of substrates |
| JP2002122480A (ja) * | 2000-10-12 | 2002-04-26 | Toshiba Corp | 温度測定方法および装置、並びにプラズマ処理装置 |
| US7056389B2 (en) * | 2001-05-23 | 2006-06-06 | Mattson Thermal Products | Method and device for thermal treatment of substrates |
| US7275861B2 (en) * | 2005-01-31 | 2007-10-02 | Veeco Instruments Inc. | Calibration wafer and method of calibrating in situ temperatures |
| US7946759B2 (en) * | 2007-02-16 | 2011-05-24 | Applied Materials, Inc. | Substrate temperature measurement by infrared transmission |
| EP2299250B1 (en) * | 2009-09-17 | 2014-04-23 | LayTec Aktiengesellschaft | Pyrometer adapted for detecting UV-radiation and use thereof |
| US9121760B2 (en) * | 2010-01-27 | 2015-09-01 | Ci Systems Ltd. | Room-temperature filtering for passive infrared imaging |
-
2013
- 2013-06-20 TW TW102121844A patent/TWI576570B/zh active
- 2013-06-21 KR KR1020157001355A patent/KR101679995B1/ko active IP Right Grant
- 2013-06-21 JP JP2015518605A patent/JP2015528106A/ja active Pending
- 2013-06-21 DE DE201311003131 patent/DE112013003131T5/de active Pending
- 2013-06-21 SG SG11201408492QA patent/SG11201408492QA/en unknown
- 2013-06-21 CN CN201380033049.0A patent/CN104520470B/zh active Active
- 2013-06-21 CN CN201710251847.0A patent/CN107267964B/zh active Active
- 2013-06-21 WO PCT/US2013/047024 patent/WO2013192510A1/en active Application Filing
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7443496B2 (en) * | 1991-04-02 | 2008-10-28 | Hitachi, Ltd. | Apparatus and method for testing defects |
| US6614539B1 (en) * | 1999-05-11 | 2003-09-02 | Minolta Co., Ltd. | Telecentric optical system |
| US7728968B2 (en) * | 2000-09-12 | 2010-06-01 | Kla-Tencor Technologies Corporation | Excimer laser inspection system |
| US20080030715A1 (en) * | 2004-06-22 | 2008-02-07 | Nikon Corporation | Best Focus Detection Method, Exposure Method, And Exposure Apparatus |
| TW201205049A (en) * | 2010-03-31 | 2012-02-01 | Konica Minolta Sensing Inc | Optical system for measurement, and color luminance meter and colorimeter using the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107267964A (zh) | 2017-10-20 |
| KR101679995B1 (ko) | 2016-12-06 |
| WO2013192510A1 (en) | 2013-12-27 |
| CN104520470A (zh) | 2015-04-15 |
| CN107267964B (zh) | 2020-06-05 |
| JP2015528106A (ja) | 2015-09-24 |
| KR20150021119A (ko) | 2015-02-27 |
| SG11201408492QA (en) | 2015-01-29 |
| DE112013003131T5 (de) | 2015-04-16 |
| CN104520470B (zh) | 2017-05-17 |
| TW201403037A (zh) | 2014-01-16 |
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