TWI571320B - Basin for washing a plate member - Google Patents
Basin for washing a plate member Download PDFInfo
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- TWI571320B TWI571320B TW104135695A TW104135695A TWI571320B TW I571320 B TWI571320 B TW I571320B TW 104135695 A TW104135695 A TW 104135695A TW 104135695 A TW104135695 A TW 104135695A TW I571320 B TWI571320 B TW I571320B
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Description
本發明關於一種槽體，尤指一種用來清洗平板構件之槽體。The present invention relates to a tank body, and more particularly to a tank body for cleaning a flat member.
近來，玻璃基材大量地使用在不同的產品上，尤其是顯示器面板，然而於生產製造時，清洗玻璃基材需要耗費大量的清洗液，且所產生的廢水也必須送至廢水廠回收處理，因此不但使得生產成本提高，且造成水資源的浪費。此外，於補充清洗液時，往往會造成槽體內液體的擾動，影響了玻璃基材表面厚度不均勻。因此如何降低清洗液之消耗且穩定地補充清洗液便成為業界努力的課題之一。Recently, glass substrates have been widely used in different products, especially display panels. However, in manufacturing, it takes a lot of cleaning liquid to clean the glass substrate, and the generated wastewater must be sent to the wastewater plant for recycling. Therefore, not only the production cost is increased, but also the waste of water resources. In addition, when the cleaning liquid is replenished, the liquid in the tank is often disturbed, which affects the uneven thickness of the surface of the glass substrate. Therefore, how to reduce the consumption of the cleaning liquid and stably replenish the cleaning liquid has become one of the subjects of the industry.
因此，本發明提供一種可降低清洗液之消耗且可穩定地補充清洗液之槽體，以解決上述問題。Accordingly, the present invention provides a tank body which can reduce the consumption of the cleaning liquid and can stably replenish the cleaning liquid to solve the above problems.
為達成上述目的，本發明揭露一種用來清洗一平板構件之槽體，其包含有一底壁、一第一側壁、一第二側壁、一第一間隔壁、一第二間隔壁以及一第一流道側壁，該第一側壁連接於該底壁之一第一側，該第一側壁形成有一入水孔，該第二側壁連接於該底壁相對於該第一側之一第二側，該第一間隔壁設置於該第一側壁與該第二側壁之間，該第一間隔壁與該第一側壁間定義一第一槽室，該第一間隔壁具有一第一間隔壁上端及一第一間隔壁下端，該第一間隔壁下端連接於該底壁，該第一間隔壁上端與該底壁間定義一第一壁高，該第二間隔壁設置於該第一間隔壁與該第二側壁之間，該第二間隔壁具有一第二間隔壁上端及一第二間隔壁下端，該第二間隔壁下端連接於該底壁，該第二間隔壁上端與該底壁間定義一第二壁高，該第一流道側壁設置於該第一間隔壁與該第二間隔壁之間，該第一流道側壁與該第一間隔壁間定義一第一流道，該第一流道側壁與該第二間隔壁間定義一第二槽室，該平板構件選擇性地設置於該第一槽室或該第二槽室內，該第一流道側壁具有一第一流道側壁上端及一第一流道側壁下端，該第一流道側壁上端與該第一間隔壁上端間定義一第一流道入口，該第一流道側壁下端與該底壁間具有一第一間隙，使該第一流道連通於該第二槽室，其中，一清洗液經由該入水孔注入該第一槽室，該第一壁高大於該第二壁高，經由該入水孔注入該第一槽室之該清洗液經由該第一間隔壁上端進入該第一流道入口，並經由該第一間隙進入該第二槽室。In order to achieve the above object, the present invention discloses a tank for cleaning a flat member, which comprises a bottom wall, a first side wall, a second side wall, a first partition wall, a second partition wall and a first flow. a first side wall is connected to a first side of the bottom wall, the first side wall is formed with a water inlet hole, and the second side wall is connected to the second side of the bottom wall relative to the first side, the first side a partition wall is disposed between the first side wall and the second side wall, and a first groove chamber is defined between the first partition wall and the first side wall, the first partition wall has a first partition wall upper end and a first partition wall a lower end of the partition wall, the lower end of the first partition wall is connected to the bottom wall, a first wall height is defined between the upper end of the first partition wall and the bottom wall, and the second partition wall is disposed on the first partition wall and the first partition wall Between the two side walls, the second partition wall has a second partition wall upper end and a second partition wall lower end. The second partition wall lower end is connected to the bottom wall, and the second partition wall upper end defines a space between the bottom wall and the bottom partition wall. The second wall is high, and the first flow channel sidewall is disposed on the first partition wall Between the second partition walls, a first flow passage is defined between the first flow passage sidewall and the first partition wall, and a second groove chamber is defined between the first flow passage sidewall and the second partition wall, and the plate member is selectively The first flow channel side wall has a first flow channel sidewall upper end and a first flow channel sidewall lower end, and the upper end of the first flow channel sidewall and the upper end of the first partition wall are defined a first flow channel inlet having a first gap between the lower end of the first flow channel sidewall and the bottom wall, such that the first flow channel communicates with the second groove chamber, wherein a cleaning liquid is injected into the first groove through the water inlet hole The first wall height is greater than the second wall height, and the cleaning liquid injected into the first groove chamber through the water inlet hole enters the first flow channel inlet via the upper end of the first partition wall, and enters through the first gap Second tank chamber.
根據本發明其中之一實施例，該槽體另包含有一第一分流板，設置於該第一流道側壁下端與該第一間隔壁下端之間，該第一分流板上形成有複數個第一分流孔洞，由該入水孔注入之該清洗液經由該複數個第一分流孔洞進入該第一間隙。According to one embodiment of the present invention, the tank body further includes a first diverter plate disposed between the lower end of the first flow channel side wall and the lower end of the first partition wall, and the first diverter plate is formed with a plurality of first The diversion hole, the cleaning liquid injected from the water inlet hole enters the first gap through the plurality of first diversion holes.
根據本發明其中之一實施例，該第一分流板斜接於該第一間隔壁與該第一流道側壁。According to one embodiment of the present invention, the first splitter plate is obliquely connected to the first partition wall and the first flow channel side wall.
根據本發明其中之一實施例，該第一流道側壁上端與該底壁間定義一第一板高，該第一板高大於該第二壁高。According to one embodiment of the present invention, a first plate height is defined between an upper end of the first flow channel sidewall and the bottom wall, and the first plate height is greater than the second wall height.
根據本發明其中之一實施例，該第一板高小於該第一壁高。According to one embodiment of the invention, the first panel height is less than the first wall height.
根據本發明其中之一實施例，該第一間隔壁上端及該第二間隔壁上端分別形成有一波浪結構。According to one embodiment of the present invention, the upper end of the first partition wall and the upper end of the second partition wall are respectively formed with a wave structure.
根據本發明其中之一實施例，該槽體另包含有一第三間隔壁、一第二流道側壁以及一第三流道側壁，該第三間隔壁設置於該第二間隔壁與該第二側壁之間，該第三間隔壁具有一第三間隔壁上端及一第三間隔壁下端，該第三間隔壁下端連接該底壁，該第三間隔壁上端與該底壁間定義一第三壁高，該第二流道側壁設置於該第三間隔壁與第二間隔壁之間，該第二流道側壁與該第二間隔壁間定義一第二流道，該第二流道側壁與該第三間隔壁間定義一第三槽室，該平板構件選擇性地設置於該第一槽室、該第二槽室或該第三槽室內，該第二流道側壁具有一第二流道側壁上端及一第二流道側壁下端，該第二流道側壁上端與該第二間隔壁上端間定義一第二流道入口，該第二流道側壁下端與該底壁間具有一第二間隙，使該第二流道連通於該第三槽室，該第三流道側壁設置於該第三間隔壁與該第二側壁之間，該第三流道側壁與該第三間隔壁間定義一第三流道，該第三流道側壁與該第二側壁間定義一第四槽室，該第三流道側壁具有一第三流道側壁上端及一第三流道側壁下端，該第三流道側壁上端與該第三間隔壁上端間定義一第三流道入口，該第三流道側壁下端與該底壁間具有一第三間隙，使該第三流道連通於該第四槽室，其中，該第二壁高大於該第三壁高，經由該第一間隙進入該第二槽室之該清洗液經由該第二間隔壁上端進入該第二流道入口，並經由該第二間隙進入該第三槽室，且經由該第二間隙進入該第三槽室之該清洗液經由該第三間隔壁上端進入該第三流道入口，並經由該第三間隙進入該第四槽室。According to one embodiment of the present invention, the tank body further includes a third partition wall, a second flow channel side wall and a third flow channel side wall, wherein the third partition wall is disposed on the second partition wall and the second partition wall Between the side walls, the third partition wall has a third partition wall upper end and a third partition wall lower end, the third partition wall lower end is connected to the bottom wall, and a third space is defined between the upper end of the third partition wall and the bottom wall a second flow channel sidewall is disposed between the third partition wall and the second partition wall, and a second flow channel is defined between the second flow channel sidewall and the second partition wall, the second flow channel sidewall Forming a third tank chamber between the third partition wall, the plate member is selectively disposed in the first tank chamber, the second tank chamber or the third tank chamber, and the second runner sidewall has a second An upper end of the side wall of the flow channel and a lower end of the side wall of the second flow channel define a second flow path inlet between the upper end of the second flow channel sidewall and the upper end of the second partition wall, and a lower end of the second flow channel sidewall and the bottom wall a second gap connecting the second flow passage to the third flow chamber, the third flow passage sidewall Between the third partition wall and the second side wall, a third flow path is defined between the third flow path side wall and the third partition wall, and a third space between the third flow path side wall and the second side wall is defined a fourth trough chamber having a third flow channel side wall upper end and a third flow channel side wall lower end, and a third flow path inlet is defined between the upper end of the third flow channel side wall and the upper end of the third partition wall. a third gap is formed between the lower end of the third flow channel sidewall and the bottom wall, so that the third flow channel communicates with the fourth groove chamber, wherein the second wall height is greater than the third wall height, and the first The cleaning liquid entering the second chamber through the gap enters the second channel inlet via the upper end of the second partition wall, enters the third chamber through the second gap, and enters the third slot via the second gap The cleaning liquid of the chamber enters the third flow path inlet through the upper end of the third partition wall, and enters the fourth groove chamber via the third gap.
根據本發明其中之一實施例，該槽體另包含有一第一分流板、一第二分流板以及一第三分流板，該第一分流板設置於該第一流道側壁下端與該第一間隔壁下端之間，該第一分流板上形成有複數個第一分流孔洞，由該入水孔注入之該清洗液經由該複數個第一分流孔洞進入該第一間隙，該第二分流板設置於該第二流道側壁下端與該第二間隔壁下端之間，該第二分流板上形成有複數個第二分流孔洞，進入該第二槽室之該清洗液經由該複數個第二分流孔洞進入該第二間隙，該第三分流板設置於該第三流道側壁下端與該第三間隔壁下端之間，該第三分流板上形成有複數個第三分流孔洞，進入該第三槽室之該清洗液經由該複數個第三分流孔洞進入該第三間隙。According to one embodiment of the present invention, the tank body further includes a first splitter plate, a second splitter plate and a third splitter plate. The first splitter plate is disposed at a lower end of the first flow channel side wall and the first space. Between the lower ends of the partition walls, a plurality of first shunt holes are formed in the first shunt plate, and the cleaning liquid injected from the water inlet holes enters the first gap through the plurality of first shunt holes, and the second shunt plate is disposed on the first shunt hole Between the lower end of the sidewall of the second flow channel and the lower end of the second partition wall, a plurality of second shunt holes are formed on the second shunt plate, and the cleaning liquid entering the second trough chamber passes through the plurality of second shunt holes Entering the second gap, the third splitter plate is disposed between the lower end of the third flow channel sidewall and the lower end of the third partition wall, and the third splitter plate is formed with a plurality of third split holes to enter the third slot The cleaning liquid of the chamber enters the third gap through the plurality of third diversion holes.
根據本發明其中之一實施例，該第一分流板斜接於該第一間隔壁與該第一流道側壁，該第二分流板斜接於該第二間隔壁與該第二流道側壁，且該第三分流板斜接於該第三間隔壁與該第三流道側壁。According to one embodiment of the present invention, the first splitter plate is obliquely connected to the first partition wall and the first flow channel sidewall, and the second splitter plate is obliquely connected to the second partition wall and the second flow channel sidewall. And the third splitter plate is obliquely connected to the third partition wall and the third flow channel sidewall.
根據本發明其中之一實施例，該第一流道側壁上端與該底壁間定義一第一板高，該第二流道側壁上端與該底壁間定義一第二板高，該第三流道側壁上端與該底壁間定義一第三板高，該第一板高大於該第二壁高，該第二板高大於該第三壁高。According to one embodiment of the present invention, a first plate height is defined between an upper end of the first flow channel sidewall and the bottom wall, and a second plate height is defined between the upper end of the second flow channel sidewall and the bottom wall, the third flow A third plate height is defined between the upper end of the side wall and the bottom wall, the first plate height is greater than the second wall height, and the second plate height is greater than the third wall height.
根據本發明其中之一實施例，該第一板高小於該第一壁高，該第二板高小於該第二壁高，該第三板高小於該第三壁高。According to an embodiment of the invention, the first plate height is lower than the first wall height, the second plate height is lower than the second wall height, and the third plate height is smaller than the third wall height.
根據本發明其中之一實施例，該第二側壁形成有連通於該第四槽室之一出水孔，且流入該第四槽室之該清洗液經由該出水孔流出。According to one embodiment of the present invention, the second side wall is formed with a water outlet hole communicating with one of the fourth tank chambers, and the cleaning liquid flowing into the fourth tank chamber flows out through the water outlet hole.
根據本發明其中之一實施例，該第一間隔壁上端、該第二間隔壁上端及該第三間隔壁上端分別形成有一波浪結構。According to one embodiment of the present invention, the first partition wall upper end, the second partition wall upper end and the third partition wall upper end are respectively formed with a wave structure.
綜上所述，本發明之槽體利用第一流道、第二流道及第三流道分別將由第一槽室、第二槽室及第三槽室流出之清洗液經由第一間隙、第二間隙及第三間隙流入第二槽室、第三槽室及第四槽室，使得清洗液可重複地再利用，以減少水資源的浪費。此外，本發明之槽體另利用第一間隙、第二間隙及第三間隙將清洗液由各對應流道之底端流入第二槽室、第三槽室及第四槽室，因此避免槽內清洗液產生過大的擾動，而影響玻璃基材之平整度。In summary, the tank body of the present invention uses the first flow passage, the second flow passage and the third flow passage to respectively pass the cleaning liquid flowing out from the first tank chamber, the second tank chamber and the third tank chamber through the first gap, the first gap The two gaps and the third gap flow into the second tank chamber, the third tank chamber and the fourth tank chamber, so that the washing liquid can be reused repeatedly to reduce waste of water resources. In addition, the tank body of the present invention further uses the first gap, the second gap and the third gap to flow the cleaning liquid from the bottom end of each corresponding flow passage into the second tank chamber, the third tank chamber and the fourth tank chamber, thereby avoiding the groove The internal cleaning fluid creates excessive disturbances that affect the flatness of the glass substrate.
以下實施例中所提到的方向用語，例如：上、下、左、右、前或後等，僅是參考附加圖式的方向。因此，使用的方向用語是用來說明並非用來限制本發明。請參閱第1圖至第3圖，第1圖為本發明實施例槽體1之外觀示意圖，第2圖為本發明實施例槽體1之上視圖，第3圖為本發明實施例第2圖中槽體1沿A-A線段之剖面示意圖。如第1圖至第3圖所示，槽體1用以清洗一平板構件2，且包含有一底壁10、一第一側壁11、一第二側壁12、一第一間隔壁13、一第二間隔壁14、一第一流道側壁15、一第三間隔壁16、一第二流道側壁17、一第三流道側壁18、一第一分流板19、一第二分流板20及一第三分流板21。The directional terms mentioned in the following embodiments, such as up, down, left, right, front or back, etc., are only directions referring to the additional drawings. Therefore, the directional terminology used is for the purpose of illustration and not limitation. 1 to 3, FIG. 1 is a schematic view showing the appearance of a tank body 1 according to an embodiment of the present invention, FIG. 2 is a top view of the tank body 1 according to an embodiment of the present invention, and FIG. 3 is a second embodiment of the present invention. A schematic cross-sectional view of the trough body 1 along the line AA in the figure. As shown in FIG. 1 to FIG. 3, the tank body 1 is used for cleaning a flat plate member 2, and includes a bottom wall 10, a first side wall 11, a second side wall 12, a first partition wall 13, and a first a second partition wall 14 , a first flow channel sidewall 15 , a third partition wall 16 , a second runner sidewall 17 , a third runner sidewall 18 , a first splitter 19 , a second splitter 20 , and a second partition The third splitter plate 21.
第一側壁11連接於底壁10之一第一側101，第一側壁11形成有一入水孔111，第二側壁12連接於底壁10相對於第一側101之一第二側102，第二側壁12形成有一出水孔121，第一間隔壁13設置於第一側壁11與第二側壁12之間，第一間隔壁13與第一側壁11間定義一第一槽室C1，一清洗液F經由入水孔111注入第一槽室C1，第一間隔壁13具有一第一間隔壁上端131及一第一間隔壁下端132，第一間隔壁下端132連接於底壁10，第一間隔壁上端131與底壁10間定義一第一壁高H1，第二間隔壁14設置於第一間隔壁13與第二側壁12之間，第二間隔壁14具有一第二間隔壁上端141及一第二間隔壁下端142，第二間隔壁下端142連接於底壁10，第二間隔壁上端141與底壁10間定義一第二壁高H2，第一流道側壁15設置於第一間隔壁13與第二間隔壁14之間，第一流道側壁15與第一間隔壁13間定義一第一流道P1，第一流道側壁15與第二間隔壁14間定義一第二槽室C2，第一流道側壁15具有一第一流道側壁上端151及一第一流道側壁下端152，第一流道側壁上端151與底壁10間定義一第一板高L1，第一流道側壁上端151與第一間隔壁上端131間定義一第一流道入口E1，第一流道側壁下端152與底壁10間具有一第一間隙G1，使第一流道P1連通於第二槽室C2。The first side wall 11 is connected to one of the first sides 101 of the bottom wall 10. The first side wall 11 is formed with a water inlet hole 111, and the second side wall 12 is connected to the bottom wall 10 with respect to the second side 102 of the first side 101. The water supply hole 121 is formed in the side wall 12. The first partition wall 13 is disposed between the first side wall 11 and the second side wall 12. A first groove chamber C1 is defined between the first partition wall 13 and the first side wall 11, and a cleaning liquid F is defined. The first partition wall 13 has a first partition wall upper end 131 and a first partition wall lower end 132. The first partition wall lower end 132 is connected to the bottom wall 10, and the first partition wall upper end is connected to the first partition wall C1. A first wall height H1 is defined between the 131 and the bottom wall 10. The second partition wall 14 is disposed between the first partition wall 13 and the second side wall 12. The second partition wall 14 has a second partition wall upper end 141 and a first partition wall 14 The second partition wall lower end 142 is connected to the bottom wall 10, and the second partition wall upper end 141 and the bottom wall 10 define a second wall height H2, and the first flow channel side wall 15 is disposed on the first partition wall 13 and Between the second partition walls 14 , a first flow path P1 is defined between the first flow path side wall 15 and the first partition wall 13 , and the first flow path side is defined. A second tank chamber C2 is defined between the wall 15 and the second partition wall 14. The first runner sidewall 15 has a first runner sidewall upper end 151 and a first runner sidewall lower end 152. The first runner sidewall is disposed between the upper end 151 and the bottom wall 10. Defining a first plate height L1, a first flow path inlet E1 is defined between the upper end wall 151 of the first flow channel and the upper end 131 of the first partition wall, and a first gap G1 is defined between the lower end 152 of the first flow channel sidewall and the bottom wall 10, so that The first-class track P1 is connected to the second tank chamber C2.
第三間隔壁16設置於第二間隔壁14與第二側壁12之間，第三間隔壁16具有一第三間隔壁上端161及一第三間隔壁下端162，第三間隔壁下端162連接底壁10，第三間隔壁上端161與底壁10間定義一第三壁高H3，第二流道側壁17設置於第三間隔壁16與第二間隔壁14之間，第二流道側壁17與第二間隔壁間14定義一第二流道P2，第二流道側壁17與第三間隔壁16間定義一第三槽室C3，第二流道側壁17具有一第二流道側壁上端171及一第二流道側壁下端172，第二流道側壁上端171與底壁10間定義一第二板高L2，第二流道側壁上端171與第二間隔壁上端141間定義一第二流道入口E2，第二流道側壁下端172與底壁10間具有一第二間隙G2，使第二流道P2連通於第三槽室C3，第三流道側壁18設置於第三間隔壁16與第二側壁12之間，第三流道側壁18與第三間隔壁16間定義一第三流道P3，第三流道側壁18與第二側壁12間定義一第四槽室C4，第三流道側壁18具有一第三流道側壁上端181及一第三流道側壁下端182，第三流道側壁上端181與底壁10間定義一第三板高L3，第三流道側壁上端181與第三間隔壁上端161間定義一第三流道入口E3，第三流道側壁下端182與底壁10間具有一第三間隙G3，使第三流道P3連通於第四槽室C4。於此實施例中，第一壁高H1大於第一板高L1，第一板高L1大於第二壁高H2，第二壁高H2大於第二板高L2，第二板高L2大於第三壁高H3，第三壁高H3大於第三板高L3，然而本發明並不侷限於此。於本實施例中，第一間隔壁上端131、第二間隔壁上端141及第三間隔壁上端161可分別形成有一波浪結構22。The third partition wall 16 is disposed between the second partition wall 14 and the second side wall 12. The third partition wall 16 has a third partition wall upper end 161 and a third partition wall lower end 162. The third partition wall lower end 162 is connected to the bottom. The wall 10 defines a third wall height H3 between the upper end 161 of the third partition wall and the bottom wall 10. The second flow path side wall 17 is disposed between the third partition wall 16 and the second partition wall 14. The second flow path sidewall 17 A second flow path P2 is defined between the second partition wall 14 and a third flow space C3 defined between the second flow path side wall 17 and the third partition wall 16. The second flow path side wall 17 has a second flow path side end. 171 and a second flow channel sidewall lower end 172, a second plate height upper end 171 and a bottom plate wall 10 define a second plate height L2, and a second flow channel sidewall upper end 171 and a second partition wall upper end 141 define a second The flow path inlet E2 has a second gap G2 between the lower end 172 of the second flow channel side wall and the bottom wall 10, so that the second flow path P2 communicates with the third groove chamber C3, and the third flow path side wall 18 is disposed at the third partition wall. Between the first side wall 12 and the third side wall 12, a third flow path P3, a third flow path side wall 18 and a second space are defined between the third flow path side wall 18 and the third partition wall 16. A fourth trough chamber C4 is defined between the walls 12, and a third runner sidewall 18 has a third runner sidewall upper end 181 and a third runner sidewall lower end 182. The third runner sidewall defines an upper end 181 and the bottom wall 10. The third plate height L3 defines a third flow path inlet E3 between the upper end 181 of the third flow channel sidewall and the upper end 161 of the third partition wall, and a third gap G3 is formed between the lower end 182 of the third flow channel sidewall and the bottom wall 10 The third flow path P3 is connected to the fourth groove chamber C4. In this embodiment, the first wall height H1 is greater than the first plate height L1, the first plate height L1 is greater than the second wall height H2, the second wall height H2 is greater than the second plate height L2, and the second plate height L2 is greater than the third The wall height H3, the third wall height H3 is greater than the third plate height L3, but the present invention is not limited thereto. In this embodiment, the first partition wall upper end 131, the second partition wall upper end 141, and the third partition wall upper end 161 may be respectively formed with a wave structure 22.
如第1圖至第3圖所示，平板構件2可選擇性地設置於第一槽室C1、第二槽室C2、第三槽室C3或第四槽室C4內，清洗液F經由入水孔111注入第一槽室C1，當清洗液F在第一槽室C1中的一液面高度大於第一壁高H1時，即清洗液F在第一槽室C1中的一液面C10高於第一間隔壁13的第一間隔壁上端131時，清洗液F可自液面C10溢過第一間隔壁上端131，並經由第一流道入口E1進入第一流道P1。進一步地，當清洗液F自液面C10溢過第一間隔壁上端131時，位於第一間隔壁上端131的波浪結構22可將清洗液F均勻溢過第一間隔壁上端131，即清洗液F可藉由波浪結構22而沿第一間隔壁13之長度方向（即一方向X ，如第2圖所示）平均地溢出第一槽室C1，且經由第一流道入口E1進入第一流道P1。As shown in FIGS. 1 to 3, the plate member 2 is selectively disposed in the first tank chamber C1, the second tank chamber C2, the third tank chamber C3, or the fourth tank chamber C4, and the washing liquid F passes through the water. The hole 111 is injected into the first tank chamber C1, and when the liquid level height of the cleaning liquid F in the first tank chamber C1 is greater than the first wall height H1, that is, the liquid level C10 of the cleaning liquid F in the first tank chamber C1 is high. At the first partition wall upper end 131 of the first partition wall 13, the cleaning liquid F may overflow from the liquid surface C10 through the first partition wall upper end 131 and enter the first flow passage P1 via the first flow passage inlet E1. Further, when the cleaning liquid F overflows from the liquid surface C10 through the upper end 131 of the first partition wall, the wave structure 22 located at the upper end 131 of the first partition wall can uniformly overflow the cleaning liquid F through the upper end 131 of the first partition wall, that is, the cleaning liquid F may equally overflow the first chamber C1 along the length direction of the first partition wall 13 (ie, one direction X, as shown in FIG. 2) by the wave structure 22, and enter the first flow path via the first flow passage inlet E1. P1.
同理，當清洗液F在第二槽室C2中的一液面高度大於第二壁高H2時，即清洗液F在第二槽室C2中的一液面C20高於第二間隔壁14的第二間隔壁上端141時，清洗液F可自液面C20溢過第二間隔壁上端141，並經由第二流道入口E2進入第二流道P2。進一步地，當清洗液F自液面C20溢過第二間隔壁上端141時，位於第二間隔壁上端141的波浪結構22可將清洗液F均勻溢過第二間隔壁上端141，即清洗液F可藉由波浪結構22而沿第二間隔壁14之長度方向（即該方向X ，如第2圖所示）平均地溢出第二槽室C2，且經由第二流道入口E2進入第二流道P2。以此類推，清洗液F溢出第三槽室C3與清洗液F溢出第四槽室C4之過程與上述清洗液F溢出第一槽室C1或清洗液F溢出第二槽室C2之過程相似，於此不再贅述。Similarly, when the liquid level height of the cleaning liquid F in the second tank chamber C2 is greater than the second wall height H2, that is, one liquid surface C20 of the cleaning liquid F in the second tank chamber C2 is higher than the second partition wall 14 At the second partition wall upper end 141, the cleaning liquid F may overflow from the liquid surface C20 through the second partition wall upper end 141 and enter the second flow passage P2 via the second flow passage inlet E2. Further, when the cleaning liquid F overflows from the liquid surface C20 through the upper end 141 of the second partition wall, the wave structure 22 located at the upper end 141 of the second partition wall can uniformly overflow the cleaning liquid F through the upper end 141 of the second partition wall, that is, the cleaning liquid F may equally overflow the second chamber C2 along the length direction of the second partition wall 14 (ie, the direction X, as shown in FIG. 2) by the wave structure 22, and enter the second through the second runner inlet E2. Flow path P2. By analogy, the process in which the cleaning liquid F overflows the third tank chamber C3 and the cleaning liquid F overflows the fourth tank chamber C4 is similar to the process in which the cleaning liquid F overflows the first tank chamber C1 or the cleaning liquid F overflows the second tank chamber C2. This will not be repeated here.
如第3圖所示，第一分流板19設置於第一流道側壁下端152與第一間隔壁下端132之間，且斜接於第一間隔壁13與第一流道側壁15，第一分流板19上形成有複數個第一分流孔洞190，第二分流板20設置於第二流道側壁下端172與第二間隔壁下端142之間，且斜接於第二間隔壁14與第二流道側壁17，第二分流板20上形成有複數個第二分流孔洞200，第三分流板21設置於第三流道側壁下端182與第三間隔壁下端162之間，且斜接於第三間隔壁16與第三流道側壁18，第三分流板21上形成有複數個第三分流孔洞210。As shown in FIG. 3, the first splitter plate 19 is disposed between the lower end 152 of the first flow channel sidewall and the lower end 132 of the first partition wall, and is obliquely connected to the first partition wall 13 and the first flow channel sidewall 15, the first splitter plate. A plurality of first flow dividing holes 190 are formed in the second flow dividing wall 20, and the second flow dividing plate 20 is disposed between the second flow path sidewall lower end 172 and the second partitioning wall lower end 142, and is obliquely connected to the second partitioning wall 14 and the second flow path. a plurality of second diverting holes 200 are formed in the side wall 17, and the second diverter plate 20 is disposed between the lower end 182 of the third flow path side wall and the lower end 162 of the third partition wall, and is slanted to the third space. A plurality of third split holes 210 are formed in the partition wall 16 and the third flow passage side wall 18, and the third splitter plate 21.
當清洗液F經由第一流道入口E1進入第一流道P1時，經由第一流道入口E1進入第一流道P1的清洗液F可通過第一流道P1向下流至第一分流板19。當清洗液F向下流至第一分流板19時，清洗液F可經由第一分流板19上的第一分流孔洞190流過第一分流板19，使清洗液F被第一分流孔洞190分流，進而平均地經過第一間隙G1來到第二槽室C2內，藉此第一分流板19便可使清洗液F平均而穩定地流入第二槽室C2，進而使第二槽室C2內的清洗液F保持一穩定狀態。同理，當清洗液F經由第二流道入口E2進入第二流道P2時，經由第二流道入口E2進入第二流道P2的清洗液F可通過第二流道P2向下流至第二分流板20。當清洗液F向下流至第二分流板20時，清洗液F可經由第二分流板20上的第二分流孔洞200流過第二分流板20，使清洗液F被第二分流孔洞200分流，進而平均地經過第二間隙G2來到第三槽室C3內，藉此第二分流板20便可使清洗液F平均而穩定地流入第三槽室C3，進而使第三槽室C3內的清洗液F保持一穩定狀態。以此類推，清洗液F經過第三間隙G3來到第四槽室C4之過程與上述清洗液F經過第一間隙G1來到第二槽室C2之過程或清洗液F經過第二間隙G2來到第三槽室C3之過程相似，於此不再贅述。最後，進入第四槽室C4之清洗液F便經由出水孔121流出。When the cleaning liquid F enters the first flow path P1 via the first flow path inlet E1, the cleaning liquid F entering the first flow path P1 via the first flow path inlet E1 may flow down to the first flow dividing plate 19 through the first flow path P1. When the cleaning liquid F flows down to the first splitter plate 19, the cleaning liquid F can flow through the first splitter hole 19 through the first splitter hole 190 on the first splitter plate 19, so that the cleaning liquid F is shunted by the first splitter hole 190. And passing through the first gap G1 to the second tank chamber C2 on average, whereby the first splitter plate 19 allows the cleaning liquid F to flow into the second tank chamber C2 evenly and stably, thereby making the second tank chamber C2 The cleaning solution F maintains a steady state. Similarly, when the cleaning liquid F enters the second flow path P2 via the second flow path inlet E2, the cleaning liquid F entering the second flow path P2 via the second flow path inlet E2 can flow down to the second flow path P2. Two diverter plates 20. When the cleaning liquid F flows down to the second diverter plate 20, the cleaning liquid F can flow through the second diverter plate 20 through the second diverting hole 200 on the second diverter plate 20, so that the cleaning liquid F is diverted by the second diverting hole 200. And passing through the second gap G2 evenly into the third tank chamber C3, whereby the second manifold 20 can uniformly and stably flow the cleaning liquid F into the third tank chamber C3, thereby making the third tank chamber C3 The cleaning solution F maintains a steady state. By the way, the process of the cleaning liquid F passing through the third gap G3 to the fourth tank chamber C4 and the cleaning liquid F passing through the first gap G1 to the second tank chamber C2 or the cleaning liquid F passing through the second gap G2 The process to the third tank chamber C3 is similar and will not be described again here. Finally, the cleaning liquid F that has entered the fourth tank chamber C4 flows out through the water outlet hole 121.
當欲清洗平板構件2時，可將平版構件2依序放置於第四槽室C4、第三槽室C3、第二槽室C2、第一槽室C1，即將平版構件2依序經由第四槽室C4、第三槽室C3、第二槽室C2、第一槽室C1清洗，而當平板構件2依上述經由第四槽室C4、第三槽室C3、第二槽室C2、第一槽室C1的順序清洗時，平板構件2在進入各槽室之前的潔淨程度，依序是平板構件2進入第四槽室C4之前的潔淨程度小於平板構件2進入第三槽室C3之前的潔淨程度，平板構件2進入第三槽室C3之前的潔淨程度小於平板構件2進入第二槽室C2之前的潔淨程度，且平板構件2進入第二槽室C2之前的潔淨程度小於平板構件2進入第一槽室C1之前的潔淨程度。When the plate member 2 is to be cleaned, the lithographic member 2 can be sequentially placed in the fourth tank chamber C4, the third tank chamber C3, the second tank chamber C2, and the first tank chamber C1, that is, the lithographic member 2 is sequentially passed through the fourth chamber. The tank chamber C4, the third tank chamber C3, the second tank chamber C2, and the first tank chamber C1 are cleaned, and when the plate member 2 passes through the fourth tank chamber C4, the third tank chamber C3, and the second tank chamber C2, When the cleaning of a tank chamber C1 is sequential, the degree of cleanliness of the plate member 2 before entering each of the tank chambers is, in order, the degree of cleanliness before the sheet member 2 enters the fourth tank chamber C4 is less than before the sheet member 2 enters the third tank chamber C3. The degree of cleanliness, the degree of cleanliness of the plate member 2 before entering the third groove chamber C3 is less than the degree of cleanliness before the plate member 2 enters the second groove chamber C2, and the degree of cleanliness before the plate member 2 enters the second groove chamber C2 is less than that of the plate member 2 The degree of cleanliness before the first tank chamber C1.
值得一提的是，隨著清洗液F由入水孔111持續注入第一槽室C1，清洗液F持續地由第一槽室C1溢出，使得清洗液F依序流經第一槽室C1、第一流道P1、第二槽室C2、第二流道P2、第三槽室C3、第三流道P3與第四槽室C4，加之上述平板構件2在進入各槽室之前的潔淨程度，使得第一槽室C1內清洗液F的一微粒濃度小於第二槽室C2內清洗液F的一微粒濃度，第二槽室C2內清洗液F的該微粒濃度小於第三槽室C3內清洗液F的一微粒濃度，第三槽室C3內清洗液F的該微粒濃度小於第四槽室內清洗液F的一微粒濃度，即第一槽室C1至第四槽室C4內清洗液F之該些微粒濃度依序遞減。因此當欲清洗平板構件2時，將平版構件2依序於第四槽室C4、第三槽室C3、第二槽室C2與第一槽室C1內清洗便可達到較佳之一清洗效果。此外，本發明另可以包含一循環過濾系統，連接於入水孔111及出水孔121，由出水孔121排出第四槽室C4之清洗液F可經過循環過濾系統淨化之後，再送至入水孔111，以減少清洗液之消耗。另外，由於各槽室溢出之清洗液F係流經對應之流道以及間隙由下而上地注入下一個槽室，因此溢出之清洗液不會直接落在下一個槽室的液面上，使得各槽室內液面並不會產生過大的波動，進而維持平板構件2之平整度。It is worth mentioning that as the cleaning liquid F is continuously injected into the first tank chamber C1 through the water inlet hole 111, the cleaning liquid F continuously overflows from the first tank chamber C1, so that the cleaning liquid F sequentially flows through the first tank chamber C1. The first flow path P1, the second flow chamber C2, the second flow path P2, the third groove chamber C3, the third flow path P3, and the fourth groove chamber C4, together with the cleanliness of the above-mentioned plate member 2 before entering each of the groove chambers, The concentration of a fine particle of the cleaning liquid F in the first tank chamber C1 is smaller than the concentration of a fine particle in the cleaning liquid F in the second tank chamber C2, and the concentration of the fine particles in the cleaning liquid F in the second tank chamber C2 is smaller than that in the third tank chamber C3. a particle concentration of the liquid F, the particle concentration of the cleaning liquid F in the third tank chamber C3 is smaller than a particle concentration of the cleaning liquid F in the fourth tank chamber, that is, the cleaning liquid F in the first tank chamber C1 to the fourth tank chamber C4 The particle concentrations are sequentially decreasing. Therefore, when the plate member 2 is to be cleaned, the lithographic member 2 is sequentially cleaned in the fourth tank chamber C4, the third tank chamber C3, the second tank chamber C2, and the first tank chamber C1 to achieve a better cleaning effect. In addition, the present invention may further comprise a circulating filtration system connected to the water inlet hole 111 and the water outlet hole 121. The cleaning liquid F discharged from the fourth tank chamber C4 by the water outlet hole 121 may be purified by the circulation filtration system and then sent to the water inlet hole 111. To reduce the consumption of cleaning fluid. In addition, since the cleaning liquid F overflowing from each of the tank chambers flows through the corresponding flow passage and the gap is injected from the bottom to the next tank chamber, the overflowing cleaning liquid does not directly fall on the liquid surface of the next tank chamber, so that The liquid level in each tank does not cause excessive fluctuations, thereby maintaining the flatness of the plate member 2.
綜上所述，本發明之槽體利用第一流道、第二流道及第三流道分別將由第一槽室、第二槽室及第三槽室流出之清洗液經由第一間隙、第二間隙及第三間隙流入第二槽室、第三槽室及第四槽室，使得清洗液可重複地再利用，以減少水資源的浪費。此外，本發明之槽體另利用第一間隙、第二間隙及第三間隙將清洗液由各對應流道之底端流入第二槽室、第三槽室及第四槽室，因此避免槽內清洗液產生過大的擾動，而影響玻璃基材之平整度。以上所述僅為本發明之較佳實施例，凡依本發明申請專利範圍所做之均等變化與修飾，皆應屬本發明之涵蓋範圍。In summary, the tank body of the present invention uses the first flow passage, the second flow passage and the third flow passage to respectively pass the cleaning liquid flowing out from the first tank chamber, the second tank chamber and the third tank chamber through the first gap, the first gap The two gaps and the third gap flow into the second tank chamber, the third tank chamber and the fourth tank chamber, so that the washing liquid can be reused repeatedly to reduce waste of water resources. In addition, the tank body of the present invention further uses the first gap, the second gap and the third gap to flow the cleaning liquid from the bottom end of each corresponding flow passage into the second tank chamber, the third tank chamber and the fourth tank chamber, thereby avoiding the groove The internal cleaning fluid creates excessive disturbances that affect the flatness of the glass substrate. The above are only the preferred embodiments of the present invention, and all changes and modifications made to the scope of the present invention should be within the scope of the present invention.
1 槽體 10 底壁 101 第一側 102 第二側 11 第一側壁 111 入水孔 12 第二側壁 121 出水孔 13 第一間隔壁 131 第一間隔壁上端 132 第一間隔壁下端 14 第二間隔壁 141 第二間隔壁上端 142 第二間隔壁下端 15 第一流道側壁 151 第一流道側壁上端 152 第一流道側壁下端 16 第三間隔壁 161 第三間隔壁上端 162 第三間隔壁下端 17 第二流道側壁 171 第二流道側壁上端 172 第二流道側壁下端 18 第三流道側壁 181 第三流道側壁上端 182 第三流道側壁下端 19 第一分流板 190 第一分流孔洞 20 第二分流板 200 第二分流孔洞 21 第三分流板 210 第三分流孔洞 22 波浪結構 2 平板構件 C1 第一槽室 C2 第二槽室 C3 第三槽室 C4 第四槽室 C10、C20、C30、C40 液面 E1 第一流道入口 E2 第二流道入口 E3 第三流道入口 F 清洗液 G1 第一間隙 G2 第二間隙 G3 第三間隙 H1 第一壁高 H2 第二壁高 H3 第三壁高 L1 第一板高 L2 第二板高 L3 第三板高 P1 第一流道 P2 第二流道 P3 第三流道 X 方向1 trough body 10 bottom wall 101 first side 102 second side 11 first side wall 111 water inlet hole 12 second side wall 121 water outlet hole 13 first partition wall 131 first partition wall upper end 132 first partition wall lower end 14 second partition wall 141 second partition wall upper end 142 second partition wall lower end 15 first flow passage side wall 151 first flow passage side wall upper end 152 first flow passage side wall lower end 16 third partition wall 161 third partition wall upper end 162 third partition wall lower end 17 second flow Road side wall 171 second flow channel side wall upper end 172 second flow channel side wall lower end 18 third flow channel side wall 181 third flow path side wall upper end 182 third flow path side wall lower end 19 first shunt plate 190 first shunt hole 20 second shunt Plate 200 second split hole 21 third split plate 210 third split hole 22 wave structure 2 plate member C1 first chamber C2 second chamber C3 third chamber C4 fourth chamber C10, C20, C30, C40 Face E1 first runner inlet E2 Second flow path inlet E3 Third flow path inlet F Cleaning liquid G1 First gap G2 Second gap G3 Third gap H1 First wall height H2 Second wall height H3 Third wall height L1 First plate height L2 Second plate High L3 third plate height P1 first flow path P2 second flow path P3 third flow path X direction
第1圖為本發明實施例槽體之外觀示意圖。 第2圖為本發明實施例槽體之上視圖。 第3圖為本發明實施例第2圖中槽體沿A-A線段之剖面示意圖。FIG. 1 is a schematic view showing the appearance of a tank body according to an embodiment of the present invention. Figure 2 is a top plan view of the tank body of the embodiment of the present invention. Figure 3 is a cross-sectional view of the trough body along line A-A in Figure 2 of the embodiment of the present invention.
1 槽體 10 底壁 101 第一側 102 第二側 11 第一側壁 111 入水孔 12 第二側壁 121 出水孔 13 第一間隔壁 131 第一間隔壁上端 132 第一間隔壁下端 14 第二間隔壁 141 第二間隔壁上端 142 第二間隔壁下端 15 第一流道側壁 151 第一流道側壁上端 152 第一流道側壁下端 16 第三間隔壁 161 第三間隔壁上端 162 第三間隔壁下端 17 第二流道側壁 171 第二流道側壁上端 172 第二流道側壁下端 18 第三流道側壁 181 第三流道側壁上端 182 第三流道側壁下端 19 第一分流板 190 第一分流孔洞 20 第二分流板 200 第二分流孔洞 21 第三分流板 210 第三分流孔洞 22 波浪結構 2 平板構件 C1 第一槽室 C2 第二槽室 C3 第三槽室 C4 第四槽室 C10、C20、C30、C40 液面 E1 第一流道入口 E2 第二流道入口 E3 第三流道入口 F 清洗液 G1 第一間隙 G2 第二間隙 G3 第三間隙 H1 第一壁高 H2 第二壁高 H3 第三壁高 L1 第一板高 L2 第二板高 L3 第三板高 P1 第一流道 P2 第二流道 P3 第三流道1 trough body 10 bottom wall 101 first side 102 second side 11 first side wall 111 water inlet hole 12 second side wall 121 water outlet hole 13 first partition wall 131 first partition wall upper end 132 first partition wall lower end 14 second partition wall 141 second partition wall upper end 142 second partition wall lower end 15 first flow passage side wall 151 first flow passage side wall upper end 152 first flow passage side wall lower end 16 third partition wall 161 third partition wall upper end 162 third partition wall lower end 17 second flow Road side wall 171 second flow channel side wall upper end 172 second flow channel side wall lower end 18 third flow channel side wall 181 third flow path side wall upper end 182 third flow path side wall lower end 19 first shunt plate 190 first shunt hole 20 second shunt Plate 200 second split hole 21 third split plate 210 third split hole 22 wave structure 2 plate member C1 first chamber C2 second chamber C3 third chamber C4 fourth chamber C10, C20, C30, C40 Face E1 first runner inlet E2 Second flow path inlet E3 Third flow path inlet F Cleaning liquid G1 First gap G2 Second gap G3 Third gap H1 First wall height H2 Second wall height H3 Third wall height L1 First plate height L2 Second plate High L3 third plate height P1 first flow path P2 second flow path P3 third flow path
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| CN201510842958.XA CN106391550B (en) | 2015-07-27 | 2015-11-26 | Tank body for cleaning flat plate member |
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| TW104135695A TWI571320B (en) | 2015-07-27 | 2015-10-30 | Basin for washing a plate member |
| TW104218819U TWM519645U (en) | 2015-07-27 | 2015-11-24 | Liquid recycling system capable of reducing liquid turbulence |
| TW104138864A TW201704129A (en) | 2015-07-27 | 2015-11-24 | Liquid recycling system capable of reducing liquid turbulence |
| TW104140900A TWI571321B (en) | 2015-07-27 | 2015-12-07 | Automation system for washing a plate member |
| TW104219574U TWM522082U (en) | 2015-07-27 | 2015-12-07 | Automation system for washing a plate member |
| TW105100047A TWI574895B (en) | 2015-07-27 | 2016-01-04 | Cassette body for holding a plate member |
| TW105100030A TWI572533B (en) | 2015-07-27 | 2016-01-04 | Cassette body for holding a plate member |
| TW105200012U TWM523187U (en) | 2015-07-27 | 2016-01-04 | Cassette body for holding a plate member |
| TW105200045U TWM521064U (en) | 2015-07-27 | 2016-01-04 | Cassette body capable of reducing liquid turbulence when soaking into a liquid |
| TW105100094A TWI561452B (en) | 2015-07-27 | 2016-01-04 | Cassette body capable of reducing liquid turbulence when soaking into a liquid |
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| TW104140900A TWI571321B (en) | 2015-07-27 | 2015-12-07 | Automation system for washing a plate member |
| TW104219574U TWM522082U (en) | 2015-07-27 | 2015-12-07 | Automation system for washing a plate member |
| TW105100047A TWI574895B (en) | 2015-07-27 | 2016-01-04 | Cassette body for holding a plate member |
| TW105100030A TWI572533B (en) | 2015-07-27 | 2016-01-04 | Cassette body for holding a plate member |
| TW105200012U TWM523187U (en) | 2015-07-27 | 2016-01-04 | Cassette body for holding a plate member |
| TW105200045U TWM521064U (en) | 2015-07-27 | 2016-01-04 | Cassette body capable of reducing liquid turbulence when soaking into a liquid |
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| CN203380142U (en) * | 2013-06-19 | 2014-01-08 | 镇江东艺机械有限公司 | Automatic cleaning machine for workpieces |
| CN103878138B (en) * | 2014-03-25 | 2016-10-05 | 福建浔兴拉链科技股份有限公司 | A kind of slider of zipper fastener cleaning machine |
| CN203890487U (en) * | 2014-04-29 | 2014-10-22 | 深圳市崇辉表面技术开发有限公司 | Electroplating turbulence device |
| TWM489375U (en) * | 2014-07-14 | 2014-11-01 | Chung King Enterprise Co Ltd | Substrate cassette with protection structure |
| CN104445007B (en) * | 2014-11-25 | 2016-08-24 | 镇江市顶智微电子科技有限公司 | A kind of filling bottle is corrected pushing and is rinsed system of going forward one by one |
| TWM515418U (en) * | 2015-07-27 | 2016-01-11 | 盟立自動化股份有限公司 | Basin for washing a plate member |
-
2015
- 2015-10-30 TW TW104217353U patent/TWM515418U/en unknown
- 2015-10-30 TW TW104135695A patent/TWI571320B/en active
- 2015-11-24 TW TW104218819U patent/TWM519645U/en not_active IP Right Cessation
- 2015-11-24 TW TW104138864A patent/TW201704129A/en unknown
- 2015-11-25 CN CN201510833225.XA patent/CN106391623B/en active Active
- 2015-11-25 CN CN201520953155.7U patent/CN205362162U/en not_active Withdrawn - After Issue
- 2015-12-07 TW TW104140900A patent/TWI571321B/en active
- 2015-12-07 TW TW104219574U patent/TWM522082U/en unknown
-
2016
- 2016-01-04 TW TW105100047A patent/TWI574895B/en not_active IP Right Cessation
- 2016-01-04 TW TW105100030A patent/TWI572533B/en active
- 2016-01-04 TW TW105200012U patent/TWM523187U/en not_active IP Right Cessation
- 2016-01-04 TW TW105200045U patent/TWM521064U/en unknown
- 2016-01-04 TW TW105100094A patent/TWI561452B/en active
- 2016-01-04 TW TW105200022U patent/TWM520515U/en unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050022845A1 (en) * | 2000-07-14 | 2005-02-03 | Sony Corporation | Substrate cleaning method and substrate cleaning apparatus |
| TW200946254A (en) * | 2008-03-07 | 2009-11-16 | Mitsui Du Pont Fluorchemical | Cleaning method and cleaning system for electronic part |
| CN104117501A (en) * | 2014-06-26 | 2014-10-29 | 苏州一合光学有限公司 | Tank arrangement structure of ultrasonic washing unit |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI571321B (en) | 2017-02-21 |
| TW201704103A (en) | 2017-02-01 |
| TWM522082U (en) | 2016-05-21 |
| CN106391623B (en) | 2018-09-18 |
| TWI572533B (en) | 2017-03-01 |
| TWM519645U (en) | 2016-04-01 |
| TWM521064U (en) | 2016-05-01 |
| TWM515418U (en) | 2016-01-11 |
| TWI574895B (en) | 2017-03-21 |
| TW201704130A (en) | 2017-02-01 |
| TWM523187U (en) | 2016-06-01 |
| CN106391623A (en) | 2017-02-15 |
| TWM520515U (en) | 2016-04-21 |
| TW201704129A (en) | 2017-02-01 |
| TW201703888A (en) | 2017-02-01 |
| TW201704116A (en) | 2017-02-01 |
| TWI561452B (en) | 2016-12-11 |
| TW201703887A (en) | 2017-02-01 |
| CN205362162U (en) | 2016-07-06 |
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