CN205200048U - Tank body for cleaning flat plate member - Google Patents
Tank body for cleaning flat plate member Download PDFInfo
- Publication number
- CN205200048U CN205200048U CN201520962036.8U CN201520962036U CN205200048U CN 205200048 U CN205200048 U CN 205200048U CN 201520962036 U CN201520962036 U CN 201520962036U CN 205200048 U CN205200048 U CN 205200048U
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- China
- Prior art keywords
- spaced walls
- sidewall
- flow
- runner
- diapire
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Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 89
- 239000012530 fluid Substances 0.000 claims description 72
- 238000009826 distribution Methods 0.000 claims description 49
- 210000005056 cell body Anatomy 0.000 claims description 34
- 238000005192 partition Methods 0.000 abstract 10
- 239000007788 liquid Substances 0.000 description 23
- 239000002245 particle Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000002699 waste material Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Nozzles For Electric Vacuum Cleaners (AREA)
- Building Environments (AREA)
Abstract
The utility model discloses a tank body for cleaning flat plate members, which comprises a bottom wall, a first side wall, a second side wall, a first partition wall, a second partition wall and a first runner side wall, the first side wall is connected to a first side of the bottom wall, the second side wall is connected to a second side of the bottom wall opposite to the first side, the first partition wall is arranged between the first side wall and the second side wall, a first slot chamber is defined between the first partition wall and the first side wall, the second partition wall is provided between the first partition wall and the second side wall, the first flow channel side wall is provided between the first partition wall and the second partition wall, a first flow channel is defined between the first flow channel side wall and the first partition wall, and a second groove chamber is defined between the first flow channel side wall and the second partition wall.
Description
Technical field
The utility model relates to a kind of cell body, and particularly a kind of being used for cleans the cell body of planar plate members.
Background technology
Recently, glass baseplate is used on different products in large quantities, especially display pannel, but when manufacturing, cleaning glass baseplate needs the cleaning fluid of at substantial, and the waste water produced also must deliver to waste plant recycling, therefore not only makes production cost improve, and causes the waste of water resource.In addition, when additional clean liquid, often cause the disturbance of liquid in cell body, have impact on glass substrate surface in uneven thickness.Therefore how to reduce cleaning fluid consumption and stably additional clean liquid just become one of problem that industry is made great efforts.
Utility model content
Therefore, the utility model provide a kind of reduce cleaning fluid consumption and the cell body of Absorbable organic halogens ground additional clean liquid, to solve the problem.
For reaching above-mentioned purpose, the utility model discloses a kind of cell body being used for cleaning planar plate members, it includes a diapire, one the first side wall, one second sidewall, one first spaced walls, one second spaced walls and a first flow sidewall, described the first side wall is connected to one first side of described diapire, described the first side wall is formed with a blasthole, described second sidewall is connected to one second side of described diapire relative to described first side, described first spaced walls is arranged between described the first side wall and described second sidewall, one first groove room is defined between described first spaced walls and described the first side wall, described first spaced walls has one first spaced walls upper end and one first spaced walls lower end, described first spaced walls lower end is connected to described diapire, one first wall is defined high between described first spaced walls upper end and described diapire, described second spaced walls is arranged between described first spaced walls and described second sidewall, described second spaced walls has one second spaced walls upper end and one second spaced walls lower end, described second spaced walls lower end is connected to described diapire, one second wall is defined high between described second spaced walls upper end and described diapire, described first flow sidewall is arranged between described first spaced walls and described second spaced walls, a first flow is defined between described first flow sidewall and described first spaced walls, one second groove room is defined between described first flow sidewall and described second spaced walls, described first groove room and described second groove room are used for optionally holding described planar plate members, described first flow sidewall has a first flow sidewall upper and a first flow side wall lower ends, a first flow entrance is defined between described first flow sidewall upper and described first spaced walls upper end, there is between described first flow side wall lower ends and described diapire one first gap, described first flow is made to be communicated in described second groove room, wherein, described blasthole is in order to inject described first groove room by a cleaning fluid, described first wall is tall and big high in described second wall, the described cleaning fluid being injected described first groove room by described blasthole enters described first flow entrance by described first spaced walls upper end, and enter described second groove room by described first gap.
According to one of them embodiment of the utility model, described cell body also includes one first flow distribution plate, be arranged between described first flow side wall lower ends and described first spaced walls lower end, described first flow distribution plate is formed with multiple first shunting hole, the described cleaning fluid injected by described blasthole enters described first gap by described multiple first shunting hole.
According to one of them embodiment of the utility model, described first flow distribution plate mitered is in described first spaced walls and described first flow sidewall.
According to one of them embodiment of the utility model, define one first plate hight between described first flow sidewall upper and described diapire, it is high that described first plate hight is greater than described second wall.
According to one of them embodiment of the utility model, it is high that described first plate hight is less than described first wall.
According to one of them embodiment of the utility model, described first spaced walls upper end and described second spaced walls upper end are formed with a wave structure respectively.
According to one of them embodiment of the utility model, described cell body also includes one the 3rd spaced walls, one second runner sidewall and one the 3rd runner sidewall, described 3rd spaced walls is arranged between described second spaced walls and described second sidewall, described 3rd spaced walls has one the 3rd spaced walls upper end and one the 3rd spaced walls lower end, described 3rd spaced walls lower end connects described diapire, one the 3rd wall is defined high between described 3rd spaced walls upper end and described diapire, described second runner sidewall is arranged between described 3rd spaced walls and the second spaced walls, one second runner is defined between described second runner sidewall and described second spaced walls, a three groove chamber is defined between described second runner sidewall and described 3rd spaced walls, described planar plate members is optionally arranged on described first groove room, in described second groove room or described three groove chamber, described second runner sidewall has one second runner sidewall upper and one second runner side wall lower ends, one second flow channel entry point is defined between described second runner sidewall upper and described second spaced walls upper end, there is between described second runner side wall lower ends and described diapire one second gap, described second runner is made to be communicated in described three groove chamber, described 3rd runner sidewall is arranged between described 3rd spaced walls and described second sidewall, one the 3rd runner is defined between described 3rd runner sidewall and described 3rd spaced walls, one the 4th groove room is defined between described 3rd runner sidewall and described second sidewall, described 3rd runner sidewall has one the 3rd runner sidewall upper and one the 3rd runner side wall lower ends, one the 3rd flow channel entry point is defined between described 3rd runner sidewall upper and described 3rd spaced walls upper end, between described 3rd runner side wall lower ends and described diapire, there is a third space, make described 3rd flow passage in described 4th groove room, wherein, described second wall is tall and big high in described 3rd wall, the described cleaning fluid being entered described second groove room by described first gap enters described second flow channel entry point by described second spaced walls upper end, and enter described three groove chamber by described second gap, and the described cleaning fluid being entered described three groove chamber by described second gap enters described 3rd flow channel entry point by described 3rd spaced walls upper end, and enter described 4th groove room by described third space.
According to one of them embodiment of the utility model, described cell body also includes one first flow distribution plate, one second flow distribution plate and one the 3rd flow distribution plate, described first flow distribution plate is arranged between described first flow side wall lower ends and described first spaced walls lower end, described first flow distribution plate is formed with multiple first shunting hole, the described cleaning fluid injected by described blasthole enters described first gap by described multiple first shunting hole, described second flow distribution plate is arranged between described second runner side wall lower ends and described second spaced walls lower end, described second flow distribution plate is formed with multiple second shunting hole, the described cleaning fluid entering described second groove room enters described second gap by described multiple second shunting hole, described 3rd flow distribution plate is arranged between described 3rd runner side wall lower ends and described 3rd spaced walls lower end, described 3rd flow distribution plate is formed with multiple 3rd shunting hole, the described cleaning fluid entering described three groove chamber enters described third space by described multiple 3rd shunting hole.
According to one of them embodiment of the utility model, described first flow distribution plate mitered is in described first spaced walls and described first flow sidewall, described second flow distribution plate mitered is in described second spaced walls and described second runner sidewall, and described 3rd flow distribution plate mitered is in described 3rd spaced walls and described 3rd runner sidewall.
According to one of them embodiment of the utility model, one first plate hight is defined between described first flow sidewall upper and described diapire, one second plate hight is defined between described second runner sidewall upper and described diapire, one the 3rd plate hight is defined between described 3rd runner sidewall upper and described diapire, it is high that described first plate hight is greater than described second wall, and it is high that described second plate hight is greater than described 3rd wall.
According to one of them embodiment of the utility model, it is high that described first plate hight is less than described first wall, and it is high that described second plate hight is less than described second wall, and it is high that described 3rd plate hight is less than described 3rd wall.
According to one of them embodiment of the utility model, described second sidewall is formed with the apopore being communicated in described 4th groove room, and the described cleaning fluid flowing into described 4th groove room is flowed out by described apopore.
According to one of them embodiment of the utility model, described first spaced walls upper end, described second spaced walls upper end and described 3rd spaced walls upper end are formed with a wave structure respectively.
In sum, cell body of the present utility model utilizes first flow, the second runner and the 3rd runner respectively the cleaning fluid flowed out by the first groove room, the second groove room and three groove chamber to be flowed into the second groove room, three groove chamber and the 4th groove room by the first gap, the second gap and third space, cleaning fluid can repeatedly be recycled, to reduce the waste of water resource.In addition, cell body of the present utility model utilizes the first gap, the second gap and third space that cleaning fluid is flowed into the second groove room, three groove chamber and the 4th groove room by the bottom of each corresponding runner further, therefore avoid groove cleaning liquid inside to produce excessive disturbance, and affect the flatness of glass baseplate.About aforementioned and other technology contents, feature and effect of the present utility model, in the following detailed description coordinated with reference to the embodiment of accompanying drawing, can clearly present.
Accompanying drawing explanation
Fig. 1 is the structural representation of the utility model embodiment cell body.
Fig. 2 is the top view of the utility model embodiment cell body.
Fig. 3 be in the utility model embodiment Fig. 2 cell body along the generalized section of A-A line segment.
Wherein, description of reference numerals is as follows:
1 cell body
10 diapires
101 first sides
102 second sides
11 the first side walls
111 blastholes
12 second sidewalls
121 apopores
13 first spaced walls
131 first spaced walls upper ends
132 first spaced walls lower ends
14 second spaced walls
141 second spaced walls upper ends
142 second spaced walls lower ends
15 first flow sidewalls
151 first flow sidewall upper
152 first flow side wall lower ends
16 the 3rd spaced walls
161 the 3rd spaced walls upper ends
162 the 3rd spaced walls lower ends
17 second runner sidewalls
171 second runner sidewall upper
172 second runner side wall lower ends
18 the 3rd runner sidewalls
181 the 3rd runner sidewall upper
182 the 3rd runner side wall lower ends
19 first flow distribution plates
190 first shunting holes
20 second flow distribution plates
200 second shunting holes
21 the 3rd flow distribution plates
210 the 3rd shunting holes
22 wave structures
2 planar plate members
C1 first groove room
C2 second groove room
C3 three groove chamber
C4 the 4th groove room
C10, C20, C30, C40 liquid level
E1 first flow entrance
E2 second flow channel entry point
E3 the 3rd flow channel entry point
F cleaning fluid
G1 first gap
G2 second gap
G3 third space
H1 first wall is high
H2 second wall is high
H3 the 3rd wall is high
L1 first plate hight
L2 second plate hight
L3 the 3rd plate hight
P1 first flow
P2 second runner
P3 the 3rd runner
X-direction
Detailed description of the invention
The direction term mentioned in following examples such as: upper and lower, left and right, front or rear etc., is only the direction with reference to attached drawings.Therefore, the direction term of use is used to illustrate and is not used for limiting the utility model.Refer to Fig. 1 to Fig. 3, Fig. 1 is the structural representation of the utility model embodiment cell body 1, and Fig. 2 is the top view of the utility model embodiment cell body 1, Fig. 3 be in the utility model embodiment Fig. 2 cell body 1 along the generalized section of A-A line segment.As shown in Figure 1 to Figure 3, cell body 1 in order to clean a planar plate members 2, and includes diapire 10, the first side wall 11,1 second sidewall 12,1 first spaced walls 13,1 second spaced walls 14, first flow sidewall 15, the 3rd spaced walls 16,1 second runner sidewall 17, the 3rd runner sidewall 18,1 first flow distribution plate 19,1 second flow distribution plate 20 and one the 3rd flow distribution plate 21.
The first side wall 11 is connected to one first side 101 of diapire 10, the first side wall 11 is formed with a blasthole 111, second sidewall 12 is connected to one second side 102 of diapire 10 relative to the first side 101, second sidewall 12 is formed with an apopore 121, first spaced walls 13 is arranged between the first side wall 11 and the second sidewall 12, one first groove room C1 is defined between the first spaced walls 13 and the first side wall 11, one cleaning fluid F injects the first groove room C1 by blasthole 111, first spaced walls 13 has one first spaced walls upper end 131 and one first spaced walls lower end 132, first spaced walls lower end 132 is connected to diapire 10, one first wall height H1 is defined between the first spaced walls upper end 131 and diapire 10, second spaced walls 14 is arranged between the first spaced walls 13 and the second sidewall 12, second spaced walls 14 has one second spaced walls upper end 141 and one second spaced walls lower end 142, second spaced walls lower end 142 is connected to diapire 10, one second wall height H2 is defined between the second spaced walls upper end 141 and diapire 10, first flow sidewall 15 is arranged between the first spaced walls 13 and the second spaced walls 14, a first flow P1 is defined between first flow sidewall 15 and the first spaced walls 13, one second groove room C2 is defined between first flow sidewall 15 and the second spaced walls 14, first flow sidewall 15 has first flow sidewall upper 151 and a first flow side wall lower ends 152, one first plate hight L1 is defined between first flow sidewall upper 151 and diapire 10, a first flow entrance E1 is defined between first flow sidewall upper 151 and the first spaced walls upper end 131, there is between first flow side wall lower ends 152 and diapire 10 one first clearance G 1, first flow P1 is made to be communicated in the second groove room C2.
3rd spaced walls 16 is arranged between the second spaced walls 14 and the second sidewall 12, 3rd spaced walls 16 has one the 3rd spaced walls upper end 161 and one the 3rd spaced walls lower end 162, 3rd spaced walls lower end 162 connects diapire 10, one the 3rd wall height H3 is defined between the 3rd spaced walls upper end 161 and diapire 10, second runner sidewall 17 is arranged between the 3rd spaced walls 16 and the second spaced walls 14, between the second runner sidewall 17 and the second spaced walls, 14 define one second runner P2, a three groove chamber C3 is defined between the second runner sidewall 17 and the 3rd spaced walls 16, second runner sidewall 17 has one second runner sidewall upper 171 and one second runner side wall lower ends 172, one second plate hight L2 is defined between the second runner sidewall upper 171 and diapire 10, one second flow channel entry point E2 is defined between the second runner sidewall upper 171 and the second spaced walls upper end 141, there is between the second runner side wall lower ends 172 and diapire 10 one second clearance G 2, the second runner P2 is made to be communicated in three groove chamber C3, 3rd runner sidewall 18 is arranged between the 3rd spaced walls 16 and the second sidewall 12, one the 3rd runner P3 is defined between the 3rd runner sidewall 18 and the 3rd spaced walls 16, one the 4th groove room C4 is defined between the 3rd runner sidewall 18 and the second sidewall 12, 3rd runner sidewall 18 has one the 3rd runner sidewall upper 181 and one the 3rd runner side wall lower ends 182, one the 3rd plate hight L3 is defined between the 3rd runner sidewall upper 181 and diapire 10, one the 3rd flow channel entry point E3 is defined between the 3rd runner sidewall upper 181 and the 3rd spaced walls upper end 161, there is between the 3rd runner side wall lower ends 182 and diapire 10 a third space G3, the 3rd runner P3 is made to be communicated in the 4th groove room C4.In this embodiment, the first wall height H1 is greater than the first plate hight L1, and the first plate hight L1 is greater than the second wall height H2, second wall height H2 is greater than the second plate hight L2, second plate hight L2 is greater than the 3rd wall height H3, and the 3rd wall height H3 is greater than the 3rd plate hight L3, but the utility model is not confined to this.In the present embodiment, the first spaced walls upper end 141, spaced walls upper end 131, second and the 3rd spaced walls upper end 161 can be formed with a wave structure 22 respectively.
As shown in Figure 1 to Figure 3, planar plate members 2 is optionally arranged in the first groove room C1, the second groove room C2, three groove chamber C3 or the 4th groove room C4, cleaning fluid F injects the first groove room C1 by blasthole 111, when the liquid level of cleaning fluid F in the first groove room C1 is greater than the first wall height H1, namely during the first spaced walls upper end 131 of the liquid level C10 of cleaning fluid F in the first groove room C1 higher than the first spaced walls 13, cleaning fluid F can overflow across the first spaced walls upper end 131 from liquid level C10, and enters first flow P1 by first flow entrance E1.Further, when cleaning fluid F overflows across the first spaced walls upper end 131 from liquid level C10, cleaning fluid F can evenly be overflowed across the first spaced walls upper end 131 by the wave structure 22 of position in the first spaced walls upper end 131, namely cleaning fluid F can by wave structure 22 along a length direction (i.e. direction X of the first spaced walls 13, overflow as shown in Figure 2) the first groove room C1 fifty-fifty, and enter first flow P1 by first flow entrance E1.
In like manner, when the liquid level of cleaning fluid F in the second groove room C2 is greater than the second wall height H2, namely during the second spaced walls upper end 141 of the liquid level C20 of cleaning fluid F in the second groove room C2 higher than the second spaced walls 14, cleaning fluid F can overflow across the second spaced walls upper end 141 from liquid level C20, and enters the second runner P2 by the second flow channel entry point E2.Further, when cleaning fluid F overflows across the second spaced walls upper end 141 from liquid level C20, cleaning fluid F can evenly be overflowed across the second spaced walls upper end 141 by the wave structure 22 of position in the second spaced walls upper end 141, namely cleaning fluid F can by wave structure 22 along length direction (the i.e. described direction X of the second spaced walls 14, overflow as shown in Figure 2) the second groove room C2 fifty-fifty, and enter the second runner P2 by the second flow channel entry point E2.By that analogy, cleaning fluid F overflows three groove chamber C3 and cleaning fluid F and overflows the process of the 4th groove room C4 and above-mentioned cleaning fluid F overflows the similar process that the first groove room C1 or cleaning fluid F overflows the second groove room C2, does not repeat them here.
As shown in Figure 3, first flow distribution plate 19 is arranged between first flow side wall lower ends 152 and the first spaced walls lower end 132, and mitered is in the first spaced walls 13 and first flow sidewall 15, first flow distribution plate 19 is formed with multiple first shunting hole 190, second flow distribution plate 20 is arranged between the second runner side wall lower ends 172 and the second spaced walls lower end 142, and mitered is in the second spaced walls 14 and the second runner sidewall 17, second flow distribution plate 20 is formed with multiple second shunting hole 200, 3rd flow distribution plate 21 is arranged between the 3rd runner side wall lower ends 182 and the 3rd spaced walls lower end 162, and mitered is in the 3rd spaced walls 16 and the 3rd runner sidewall 18, 3rd flow distribution plate 21 is formed with multiple 3rd shunting hole 210.
When cleaning fluid F enters first flow P1 by first flow entrance E1, the cleaning fluid F being entered first flow P1 by first flow entrance E1 by first flow P1 to downstream to the first flow distribution plate 19.When cleaning fluid F is to during downstream to the first flow distribution plate 19, cleaning fluid F flows through the first flow distribution plate 19 by the first shunting hole 190 on the first flow distribution plate 19, cleaning fluid F is shunted by the first shunting hole 190, and then come in the second groove room C2 through the first clearance G 1 fifty-fifty, first flow distribution plate 19 just can make cleaning fluid F on average and stably flow into the second groove room C2 whereby, and then makes the cleaning fluid F in the second groove room C2 keep a stable state.In like manner, when cleaning fluid F enters the second runner P2 by the second flow channel entry point E2, the cleaning fluid F being entered the second runner P2 by the second flow channel entry point E2 by the second runner P2 to downstream to the second flow distribution plate 20.When cleaning fluid F is to during downstream to the second flow distribution plate 20, cleaning fluid F flows through the second flow distribution plate 20 by the second shunting hole 200 on the second flow distribution plate 20, cleaning fluid F is shunted by the second shunting hole 200, and then come in three groove chamber C3 through the second clearance G 2 fifty-fifty, second flow distribution plate 20 just can make cleaning fluid F on average and stably flow into three groove chamber C3 whereby, and then makes the cleaning fluid F in three groove chamber C3 keep a stable state.By that analogy, cleaning fluid F comes the process of the 4th groove room C4 and above-mentioned cleaning fluid F through third space G3 and comes the process of the second groove room C2 or cleaning fluid F comes the similar process of three groove chamber C3 through the second clearance G 2 through the first clearance G 1, does not repeat them here.Finally, the cleaning fluid F entering the 4th groove room C4 is just flowed out by apopore 121.
When for cleaning planar plate members 2, lithographic plate component 2 sequentially can be placed on the 4th groove room C4, three groove chamber C3, second groove room C2, first groove room C1, by lithographic plate component 2 sequentially by the 4th groove room C4, three groove chamber C3, second groove room C2, first groove room C1 cleans, and when planar plate members 2 is complied with above by the 4th groove room C4, three groove chamber C3, second groove room C2, when the order of the first groove room C1 is cleaned, planar plate members 2 is entering the clean level before each groove room, sequentially that planar plate members 2 clean level entered before the 4th groove room C4 is less than planar plate members 2 and enters clean level before three groove chamber C3, planar plate members 2 clean level entered before three groove chamber C3 is less than planar plate members 2 and enters clean level before the second groove room C2, and planar plate members 2 clean level entered before the second groove room C2 is less than planar plate members 2 enters clean level before the first groove room C1.
It is worth mentioning that, along with cleaning fluid F continues injection first groove room C1 by blasthole 111, cleaning fluid F is overflowed by the first groove room C1 constantly, cleaning fluid F is made sequentially to flow through the first groove room C1, first flow P1, second groove room C2, second runner P2, three groove chamber C3, 3rd runner P3 and the 4th groove room C4, add that above-mentioned planar plate members 2 is entering the clean level before each groove room, a particle concentration of the first groove room C1 cleaning liquid inside F is made to be less than a particle concentration of the second groove room C2 cleaning liquid inside F, the described particle concentration of the second groove room C2 cleaning liquid inside F is less than a particle concentration of three groove chamber C3 cleaning liquid inside F, the described particle concentration of three groove chamber C3 cleaning liquid inside F is less than a particle concentration of the indoor cleaning fluid F of the 4th groove, namely the first groove room C1 sequentially successively decreases to the more described particle concentration of the 4th groove room C4 cleaning liquid inside F.Therefore, when for cleaning planar plate members 2, lithographic plate component 2 is sequentially cleaned in the 4th groove room C4, three groove chamber C3, the second groove room C2 and the first groove room C1 and just can reach a preferably cleaning performance.In addition, the utility model separately can comprise a circulated filter system, is connected to blasthole 111 and apopore 121, and the cleaning fluid F discharging the 4th groove room C4 by apopore 121 can be passed through after circulated filter system purifies, deliver to blasthole 111 again, to reduce the consumption of cleaning fluid.In addition, cleaning fluid F due to each groove room spilling flows through corresponding runner and next groove room from bottom to top is injected in gap, therefore the cleaning fluid overflowed can not directly drop on the liquid level of next groove room, make the indoor liquid level of each groove can't produce excessive fluctuation, and then maintain the flatness of planar plate members 2.
In sum, cell body of the present utility model utilizes first flow, the second runner and the 3rd runner respectively the cleaning fluid flowed out by the first groove room, the second groove room and three groove chamber to be flowed into the second groove room, three groove chamber and the 4th groove room by the first gap, the second gap and third space, cleaning fluid can repeatedly be recycled, to reduce the waste of water resource.In addition, cell body of the present utility model utilizes the first gap, the second gap and third space that cleaning fluid is flowed into the second groove room, three groove chamber and the 4th groove room by the bottom of each corresponding runner further, therefore avoid groove cleaning liquid inside to produce excessive disturbance, and affect the flatness of glass baseplate.
The foregoing is only preferred embodiment of the present utility model, be not limited to the utility model, for a person skilled in the art, the utility model can have various modifications and variations.All within spirit of the present utility model and principle, any amendment done, equivalent replacement, improvement etc., all should be included within protection domain of the present utility model.
Claims (13)
1. be used for cleaning the cell body of planar plate members, it is characterized in that, include:
One diapire;
One the first side wall, be connected to one first side of described diapire, described the first side wall is formed with a blasthole;
One second sidewall, is connected to one second side of described diapire relative to described first side;
One first spaced walls, be arranged between described the first side wall and described second sidewall, one first groove room is defined between described first spaced walls and described the first side wall, described first spaced walls has one first spaced walls upper end and one first spaced walls lower end, described first spaced walls lower end is connected to described diapire, defines one first wall high between described first spaced walls upper end and described diapire;
One second spaced walls, be arranged between described first spaced walls and described second sidewall, described second spaced walls has one second spaced walls upper end and one second spaced walls lower end, described second spaced walls lower end is connected to described diapire, defines one second wall high between described second spaced walls upper end and described diapire; And
One first flow sidewall, be arranged between described first spaced walls and described second spaced walls, a first flow is defined between described first flow sidewall and described first spaced walls, one second groove room is defined between described first flow sidewall and described second spaced walls, described first groove room and described second groove room are used for optionally holding described planar plate members, described first flow sidewall has a first flow sidewall upper and a first flow side wall lower ends, a first flow entrance is defined between described first flow sidewall upper and described first spaced walls upper end, there is between described first flow side wall lower ends and described diapire one first gap, described first flow is made to be communicated in described second groove room,
Wherein, described blasthole is in order to inject described first groove room by a cleaning fluid, described first wall is tall and big high in described second wall, the described cleaning fluid being injected described first groove room by described blasthole enters described first flow entrance by described first spaced walls upper end, and enters described second groove room by described first gap.
2. cell body as claimed in claim 1, is characterized in that, also include:
One first flow distribution plate, be arranged between described first flow side wall lower ends and described first spaced walls lower end, described first flow distribution plate is formed with multiple first shunting hole, the described cleaning fluid injected by described blasthole enters described first gap by described multiple first shunting hole.
3. cell body as claimed in claim 2, it is characterized in that, described first flow distribution plate mitered is in described first spaced walls and described first flow sidewall.
4. cell body as claimed in claim 1, it is characterized in that, define one first plate hight between described first flow sidewall upper and described diapire, it is high that described first plate hight is greater than described second wall.
5. cell body as claimed in claim 4, it is characterized in that, it is high that described first plate hight is less than described first wall.
6. cell body as claimed in claim 1, it is characterized in that, described first spaced walls upper end and described second spaced walls upper end are formed with a wave structure respectively.
7. cell body as claimed in claim 1, is characterized in that, also include:
One the 3rd spaced walls, be arranged between described second spaced walls and described second sidewall, described 3rd spaced walls has one the 3rd spaced walls upper end and one the 3rd spaced walls lower end, described 3rd spaced walls lower end connects described diapire, defines one the 3rd wall high between described 3rd spaced walls upper end and described diapire;
One second runner sidewall, be arranged between described 3rd spaced walls and the second spaced walls, one second runner is defined between described second runner sidewall and described second spaced walls, a three groove chamber is defined between described second runner sidewall and described 3rd spaced walls, described second runner sidewall has one second runner sidewall upper and one second runner side wall lower ends, one second flow channel entry point is defined between described second runner sidewall upper and described second spaced walls upper end, there is between described second runner side wall lower ends and described diapire one second gap, described second runner is made to be communicated in described three groove chamber, and
One the 3rd runner sidewall, be arranged between described 3rd spaced walls and described second sidewall, one the 3rd runner is defined between described 3rd runner sidewall and described 3rd spaced walls, one the 4th groove room is defined between described 3rd runner sidewall and described second sidewall, described planar plate members is optionally arranged on described first groove room, described second groove room, described three groove chamber or described 4th groove indoor, described 3rd runner sidewall has one the 3rd runner sidewall upper and one the 3rd runner side wall lower ends, one the 3rd flow channel entry point is defined between described 3rd runner sidewall upper and described 3rd spaced walls upper end, between described 3rd runner side wall lower ends and described diapire, there is a third space, make described 3rd flow passage in described 4th groove room,
Wherein, described second wall is tall and big high in described 3rd wall, the described cleaning fluid being entered described second groove room by described first gap enters described second flow channel entry point by described second spaced walls upper end, and enter described three groove chamber by described second gap, and the described cleaning fluid being entered described three groove chamber by described second gap enters described 3rd flow channel entry point by described 3rd spaced walls upper end, and enter described 4th groove room by described third space.
8. cell body as claimed in claim 7, is characterized in that, also include:
One first flow distribution plate, be arranged between described first flow side wall lower ends and described first spaced walls lower end, described first flow distribution plate is formed with multiple first shunting hole, the described cleaning fluid injected by described blasthole enters described first gap by described multiple first shunting hole; And
One second flow distribution plate, be arranged between described second runner side wall lower ends and described second spaced walls lower end, described second flow distribution plate is formed with multiple second shunting hole, the described cleaning fluid entering described second groove room enters described second gap by described multiple second shunting hole;
One the 3rd flow distribution plate, be arranged between described 3rd runner side wall lower ends and described 3rd spaced walls lower end, described 3rd flow distribution plate is formed with multiple 3rd shunting hole, the described cleaning fluid entering described three groove chamber enters described third space by described multiple 3rd shunting hole.
9. cell body as claimed in claim 8, it is characterized in that, described first flow distribution plate mitered is in described first spaced walls and described first flow sidewall, described second flow distribution plate mitered is in described second spaced walls and described second runner sidewall, and described 3rd flow distribution plate mitered is in described 3rd spaced walls and described 3rd runner sidewall.
10. cell body as claimed in claim 7, it is characterized in that, one first plate hight is defined between described first flow sidewall upper and described diapire, one second plate hight is defined between described second runner sidewall upper and described diapire, one the 3rd plate hight is defined between described 3rd runner sidewall upper and described diapire, it is high that described first plate hight is greater than described second wall, and it is high that described second plate hight is greater than described 3rd wall.
11. cell bodies as claimed in claim 10, it is characterized in that, it is high that described first plate hight is less than described first wall, and it is high that described second plate hight is less than described second wall, and it is high that described 3rd plate hight is less than described 3rd wall.
12. cell bodies as claimed in claim 7, it is characterized in that, described second sidewall is formed with the apopore being communicated in described 4th groove room, and the described cleaning fluid flowing into described 4th groove room is flowed out by described apopore.
13. cell bodies as claimed in claim 7, is characterized in that, described first spaced walls upper end, described second spaced walls upper end and described 3rd spaced walls upper end are formed with a wave structure respectively.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562197105P | 2015-07-27 | 2015-07-27 | |
| US62/197,105 | 2015-07-27 | ||
| TW104135695 | 2015-10-30 | ||
| TW104135695A TWI571320B (en) | 2015-07-27 | 2015-10-30 | Basin for washing a plate member |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205200048U true CN205200048U (en) | 2016-05-04 |
Family
ID=55837789
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510842958.XA Active CN106391550B (en) | 2015-07-27 | 2015-11-26 | Tank body for cleaning flat plate member |
| CN201520962036.8U Withdrawn - After Issue CN205200048U (en) | 2015-07-27 | 2015-11-26 | Tank body for cleaning flat plate member |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510842958.XA Active CN106391550B (en) | 2015-07-27 | 2015-11-26 | Tank body for cleaning flat plate member |
Country Status (1)
| Country | Link |
|---|---|
| CN (2) | CN106391550B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106391550A (en) * | 2015-07-27 | 2017-02-15 | 盟立自动化股份有限公司 | Tank body for cleaning flat plate member |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5470475A (en) * | 1993-08-20 | 1995-11-28 | Envirex, Inc. | Clarifier |
| CN2400435Y (en) * | 1999-11-05 | 2000-10-11 | 张存信 | Improved combined water-filtering tank |
| JP4236072B2 (en) * | 2000-05-17 | 2009-03-11 | Ｄｏｗａホールディングス株式会社 | Oil-liquid separator |
| CN2542312Y (en) * | 2002-04-12 | 2003-04-02 | 庄朔崴 | Improved composite floating trough removing structure |
| AU2003901615A0 (en) * | 2003-04-04 | 2003-05-01 | The University Of Newcastle Research Associates Limited | Overflow launder |
| CN203861996U (en) * | 2014-02-07 | 2014-10-08 | 李时珍养生堂有限公司 | Bending flow channel type casing of water filter device |
| CN106391550B (en) * | 2015-07-27 | 2018-09-18 | 盟立自动化股份有限公司 | Tank body for cleaning flat plate member |
-
2015
- 2015-11-26 CN CN201510842958.XA patent/CN106391550B/en active Active
- 2015-11-26 CN CN201520962036.8U patent/CN205200048U/en not_active Withdrawn - After Issue
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106391550A (en) * | 2015-07-27 | 2017-02-15 | 盟立自动化股份有限公司 | Tank body for cleaning flat plate member |
| CN106391550B (en) * | 2015-07-27 | 2018-09-18 | 盟立自动化股份有限公司 | Tank body for cleaning flat plate member |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106391550A (en) | 2017-02-15 |
| CN106391550B (en) | 2018-09-18 |
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