CN106391550A - Tank body for cleaning flat plate member - Google Patents
Tank body for cleaning flat plate member Download PDFInfo
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- CN106391550A CN106391550A CN201510842958.XA CN201510842958A CN106391550A CN 106391550 A CN106391550 A CN 106391550A CN 201510842958 A CN201510842958 A CN 201510842958A CN 106391550 A CN106391550 A CN 106391550A
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- spaced walls
- flow
- side wall
- flow channel
- wall
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- 238000004140 cleaning Methods 0.000 title claims abstract description 20
- 239000012530 fluid Substances 0.000 claims description 70
- 238000009826 distribution Methods 0.000 claims description 46
- 210000005056 cell body Anatomy 0.000 claims description 32
- 238000005192 partition Methods 0.000 abstract 10
- 239000007788 liquid Substances 0.000 description 25
- 239000002245 particle Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000002699 waste material Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Nozzles For Electric Vacuum Cleaners (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Building Environments (AREA)
Abstract
The invention discloses a tank body for cleaning a flat plate member, which comprises a bottom wall, a first side wall, a second side wall, a first partition wall, a second partition wall and a first flow passage side wall, the first side wall is connected to a first side of the bottom wall, the second side wall is connected to a second side of the bottom wall opposite to the first side, the first partition wall is arranged between the first side wall and the second side wall, a first slot chamber is defined between the first partition wall and the first side wall, the second partition wall is provided between the first partition wall and the second side wall, the first flow channel side wall is provided between the first partition wall and the second partition wall, a first flow channel is defined between the first flow channel side wall and the first partition wall, and a second groove chamber is defined between the first flow channel side wall and the second partition wall.
Description
Technical field
The present invention relates to a kind of cell body, particularly to a kind of cell body for cleaning planar plate members.
Background technology
Recently, glass baseplate is used heavily on different products, especially display pannel, but is manufacturing
When, cleaning glass baseplate needs to expend substantial amounts of cleanout fluid, and produced waste water also must deliver to waste plant recycling, because
This not only makes production cost improve, and causes the waste of water resource.Additionally, in additional clean liquid, often causing cell body
The disturbance of interior liquid, have impact on glass substrate surface in uneven thickness.Therefore how to reduce the consumption of cleanout fluid and stably mend
Fill cleanout fluid and become one of problem made great efforts for industry.
Content of the invention
Therefore, the present invention provide a kind of reduce cleanout fluid consume and can stably additional clean liquid cell body, to solve
Certainly the problems referred to above.
For reaching above-mentioned purpose, the present invention discloses a kind of cell body for cleaning planar plate members, its include a diapire, one
The first side wall, a second sidewall, one first spaced walls, one second spaced walls and a first flow side wall, described the first side wall
It is connected to one first side of described diapire, described the first side wall is formed with a blasthole, and described second sidewall is connected to described bottom
Wall with respect to one second side of described first side, described first spaced walls be arranged on described the first side wall and described second sidewall it
Between, define one first groove room between described first spaced walls and described the first side wall, described first spaced walls have one first interval
Wall upper end and one first spaced walls lower end, described first spaced walls lower end is connected to described diapire, described first spaced walls upper end
Define one first wall high and between described diapire, described second spaced walls be arranged on described first spaced walls and described second sidewall it
Between, described second spaced walls have one second spaced walls upper end and one second spaced walls lower end, and described second spaced walls lower end is even
It is connected to described diapire, between described second spaced walls upper end and described diapire, defines one second wall height, described first flow side wall sets
Put between described first spaced walls and described second spaced walls, define between described first flow side wall and described first spaced walls
One first flow, defines one second groove room, described first groove room and institute between described first flow side wall and described second spaced walls
State the second groove room, for optionally accommodating described planar plate members, described first flow side wall, there is a first flow sidewall upper
And first flow side wall lower ends, define a first flow between described first flow sidewall upper and described first spaced walls upper end
Entrance, has one first gap between described first flow side wall lower ends and described diapire, so that described first flow is communicated in described
Second groove room, wherein, described blasthole in order to a cleanout fluid to be injected described first groove room, described first wall tall and big in described the
Two walls are high, enter institute by the described cleanout fluid that described blasthole injects described first groove room by described first spaced walls upper end
State first flow entrance, and described second groove room is entered by described first gap.
According to one of them embodiment of the present invention, described cell body also includes one first flow distribution plate, is arranged on described first
Between runner side wall lower ends and described first spaced walls lower end, described first flow distribution plate is formed with multiple first shunting holes,
The plurality of first shunting hole is passed through by the described cleanout fluid that described blasthole injects and enters described first gap.
According to one of them embodiment of the present invention, described first flow distribution plate mitered is in described first spaced walls and described first
Flow passage side wall.
According to one of them embodiment of the present invention, between described first flow sidewall upper and described diapire, define one first plate
Height, it is high that described first plate hight is more than described second wall.
According to one of them embodiment of the present invention, it is high that described first plate hight is less than described first wall.
According to one of them embodiment of the present invention, shape is distinguished in described first spaced walls upper end and described second spaced walls upper end
Cheng Youyi wave structure.
According to one of them embodiment of the present invention, described cell body also includes one the 3rd spaced walls, a second flow channel side wall
And a third flow channel side wall, described 3rd spaced walls are arranged between described second spaced walls and described second sidewall, described
3rd spaced walls have one the 3rd spaced walls upper end and one the 3rd spaced walls lower end, and described 3rd spaced walls lower end connects described bottom
Wall, it is high to define one the 3rd wall between described 3rd spaced walls upper end and described diapire, and described second flow channel side wall is arranged on described the
Between three spaced walls and the second spaced walls, between described second flow channel side wall and described second spaced walls, define a second flow channel, institute
State and between second flow channel side wall and described 3rd spaced walls, define a three groove chamber, described planar plate members are selectively disposed in described
In first groove room, described second groove room or described three groove chamber, described second flow channel side wall has a second flow channel sidewall upper
And second flow channel side wall lower ends, define a second flow channel between described second flow channel sidewall upper and described second spaced walls upper end
Entrance, has one second gap between described second flow channel side wall lower ends and described diapire, so that described second flow channel is communicated in described
Three groove chamber, described third flow channel side wall is arranged between described 3rd spaced walls and described second sidewall, described third flow channel
Define a third flow channel between side wall and described 3rd spaced walls, between described third flow channel side wall and described second sidewall, define one the
Four groove rooms, described third flow channel side wall has a third flow channel sidewall upper and third flow channel side wall lower ends, described 3rd stream
Define a third flow channel entrance between road sidewall upper and described 3rd spaced walls upper end, described third flow channel side wall lower ends with described
There is between diapire a third space, make described third flow channel be communicated in described 4th groove room, wherein, described second wall tall and big in institute
State the 3rd wall height, the described cleanout fluid of described second groove room is entered by described second spaced walls upper end by described first gap
Enter described second flow channel entrance, and described three groove chamber is entered by described second gap, and entered by described second gap
The described cleanout fluid entering described three groove chamber enters described third flow channel entrance by described 3rd spaced walls upper end, and passes through institute
State third space and enter described 4th groove room.
According to one of them embodiment of the present invention, described cell body also include one first flow distribution plate, one second flow distribution plate with
And one the 3rd flow distribution plate, described first flow distribution plate be arranged on described first flow side wall lower ends and described first spaced walls lower end it
Between, described first flow distribution plate is formed with multiple first shunting holes, institute is passed through by the described cleanout fluid that described blasthole injects
State multiple first shunting holes enter described first gaps, described second flow distribution plate be arranged on described second flow channel side wall lower ends with
Between described second spaced walls lower end, described second flow distribution plate is formed with multiple second shunting holes, enters described second groove
The described cleanout fluid of room passes through the plurality of second shunting hole and enters described second gap, and described 3rd flow distribution plate is arranged on institute
State between third flow channel side wall lower ends and described 3rd spaced walls lower end, described 3rd flow distribution plate is formed with multiple 3rd shuntings
Hole, the described cleanout fluid entering described three groove chamber passes through the plurality of 3rd shunting hole described third space of entrance.
According to one of them embodiment of the present invention, described first flow distribution plate mitered is in described first spaced walls and described first
Flow passage side wall, described second flow distribution plate mitered is in described second spaced walls and described second flow channel side wall, and described 3rd shunting
Plate mitered is in described 3rd spaced walls and described third flow channel side wall.
According to one of them embodiment of the present invention, between described first flow sidewall upper and described diapire, define one first plate
Height, between described second flow channel sidewall upper and described diapire define one second plate hight, described third flow channel sidewall upper with described
One the 3rd plate hight is defined, described first plate hight is more than described second wall height, described second plate hight is more than described 3rd wall between diapire
High.
According to one of them embodiment of the present invention, described first plate hight is less than described first wall height, and described second plate hight is little
High in described second wall, it is high that described 3rd plate hight is less than described 3rd wall.
According to one of them embodiment of the present invention, described second sidewall is formed with the water outlet being communicated in described 4th groove room
Hole, and flow into described 4th groove room described cleanout fluid flowed out by described apopore.
According to one of them embodiment of the present invention, described first spaced walls upper end, described second spaced walls upper end and described
3rd spaced walls upper end is respectively formed with a wave structure.
In sum, the cell body of the present invention utilize first flow, second flow channel and third flow channel respectively will by the first groove room,
The cleanout fluid that second groove room and three groove chamber flow out pass through the first gap, the second gap and third space flow into the second groove room, the
Three groove chamber and the 4th groove room so that cleanout fluid repeatably recycles, to reduce the waste of water resource.Additionally, the groove of the present invention
Cleanout fluid is flowed into the second groove by the bottom of each corresponding runner further with the first gap, the second gap and third space by body
Room, three groove chamber and the 4th groove room, therefore avoid groove cleaning liquid inside to produce excessive disturbance, and affect the smooth of glass baseplate
Degree.For the present invention aforementioned and other technology contents, feature and effect, following cooperation refer to the attached drawing embodiment detailed
In explanation, can clearly present.
Brief description
Fig. 1 is the structural representation of embodiment of the present invention cell body.
Fig. 2 is the top view of embodiment of the present invention cell body.
Fig. 3 be embodiment of the present invention Fig. 2 in cell body along line A-A section generalized section.
Wherein, description of reference numerals is as follows：
1 cell body
10 diapires
101 first sides
102 second sides
11 the first side walls
111 blastholes
12 second sidewalls
121 apopores
13 first spaced walls
131 first spaced walls upper ends
132 first spaced walls lower ends
14 second spaced walls
141 second spaced walls upper ends
142 second spaced walls lower ends
15 first flow side walls
151 first flow sidewall upper
152 first flow side wall lower ends
16 the 3rd spaced walls
161 the 3rd spaced walls upper ends
162 the 3rd spaced walls lower ends
17 second flow channel side walls
171 second flow channel sidewall upper
172 second flow channel side wall lower ends
18 third flow channel side walls
181 third flow channel sidewall upper
182 third flow channel side wall lower ends
19 first flow distribution plates
190 first shunting holes
20 second flow distribution plates
200 second shunting holes
21 the 3rd flow distribution plates
210 the 3rd shunting holes
22 wave structures
2 planar plate members
C1 the first groove room
C2 the second groove room
C3 three groove chamber
C4 the 4th groove room
C10, C20, C30, C40 liquid level
E1 first flow entrance
E2 second flow channel entrance
E3 third flow channel entrance
F cleanout fluid
G1 first gap
G2 second gap
G3 third space
H1 first wall is high
H2 second wall is high
H3 the 3rd wall is high
L1 first plate hight
L2 second plate hight
L3 the 3rd plate hight
P1 first flow
P2 second flow channel
P3 third flow channel
X direction
Specific embodiment
The direction term being previously mentioned in following examples, for example：Upper and lower, left and right, front or rear etc., it is only with reference to additional attached
The direction of figure.Therefore, the direction term of use is used to explanation not for limiting the present invention.Refer to Fig. 1 to Fig. 3, Fig. 1 is
The structural representation of embodiment of the present invention cell body 1, Fig. 2 is the top view of embodiment of the present invention cell body 1, and Fig. 3 is implemented for the present invention
In illustration 2, cell body 1 is along the generalized section of line A-A section.As shown in Figure 1 to Figure 3, cell body 1 is in order to clean planar plate members 2, and
Include a diapire 10, a first side wall 11, a second sidewall 12, one first spaced walls 13, one second spaced walls 14, one first
Flow passage side wall 15, one the 3rd spaced walls 16, a second flow channel side wall 17, a third flow channel side wall 18, one first flow distribution plate 19,
Second flow distribution plate 20 and one the 3rd flow distribution plate 21.
The first side wall 11 is connected to one first side 101 of diapire 10, and the first side wall 11 is formed with a blasthole 111, and second
Side wall 12 is connected to one second side 102 that diapire 10 is with respect to the first side 101, and second sidewall 12 is formed with an apopore 121, the
One spaced walls 13 are arranged between the first side wall 11 and second sidewall 12, define one the between the first spaced walls 13 and the first side wall 11
One groove room C1, a cleanout fluid F inject the first groove room C1 by blasthole 111, and the first spaced walls 13 have in one first spaced walls
End 131 and one first spaced walls lower end 132, the first spaced walls lower end 132 is connected to diapire 10, the first spaced walls upper end 131 with
The high H1 of one first wall is defined, the second spaced walls 14 are arranged between the first spaced walls 13 and second sidewall 12 between diapire 10, second
Spaced walls 14 have one second spaced walls upper end 141 and one second spaced walls lower end 142, and the second spaced walls lower end 142 is connected to
Diapire 10, defines the high H2 of one second wall between the second spaced walls upper end 141 and diapire 10, first flow side wall 15 is arranged between first
Between next door 13 and the second spaced walls 14, between first flow side wall 15 and the first spaced walls 13, define a first flow P1, first
One second groove room C2 is defined, first flow side wall 15 has on a first flow side wall between flow passage side wall 15 and the second spaced walls 14
End 151 and first flow side wall lower ends 152, define one first plate hight L1 between first flow sidewall upper 151 and diapire 10, the
A first flow entrance E1, first flow side wall lower ends are defined between one runner sidewall upper 151 and the first spaced walls upper end 131
There is between 152 and diapire 10 one first clearance G 1, make first flow P1 be communicated in the second groove room C2.
3rd spaced walls 16 are arranged between the second spaced walls 14 and second sidewall 12, and the 3rd spaced walls 16 have one the 3rd
Spaced walls upper end 161 and one the 3rd spaced walls lower end 162, the 3rd spaced walls lower end 162 connects diapire 10, the 3rd spaced walls upper end
The high H3 of one the 3rd wall is defined, second flow channel side wall 17 is arranged on the 3rd spaced walls 16 and the second spaced walls 14 between 161 and diapire 10
Between, between second flow channel side wall 17 and the second spaced walls, 14 define second flow channel P2, second flow channel side wall 17 and the 3rd interval
A three groove chamber C3 is defined, second flow channel side wall 17 has a second flow channel sidewall upper 171 and a second flow channel side between wall 16
Wall lower end 172, defines one second plate hight L2 between second flow channel sidewall upper 171 and diapire 10, second flow channel sidewall upper 171 with
Define a second flow channel entrance E2 between the second spaced walls upper end 141, between second flow channel side wall lower ends 172 and diapire 10, have one
Two clearance G 2, make second flow channel P2 be communicated in three groove chamber C3, third flow channel side wall 18 is arranged on the 3rd spaced walls 16 and second
Between side wall 12, between third flow channel side wall 18 and the 3rd spaced walls 16, define third flow channel P3, third flow channel side wall 18 and
One the 4th groove room C4 is defined, third flow channel side wall 18 has a third flow channel sidewall upper 181 and one the 3rd stream between two side walls 12
Road side wall lower ends 182, define one the 3rd plate hight L3, third flow channel sidewall upper between third flow channel sidewall upper 181 and diapire 10
181 and the 3rd define a third flow channel entrance E3 between spaced walls upper end 161, have between third flow channel side wall lower ends 182 and diapire 10
There is a third space G3, make third flow channel P3 be communicated in the 4th groove room C4.In this embodiment, the high H1 of the first wall is more than the first plate
High L1, the first plate hight L1 are more than the high H2 of the second wall, and the high H2 of the second wall is more than the second plate hight L2, and it is high that the second plate hight L2 is more than the 3rd wall
H3, the high H3 of the 3rd wall are more than the 3rd plate hight L3, but the present invention is not limited in this.In the present embodiment, in the first spaced walls
End the 131, second spaced walls upper end 141 and the 3rd spaced walls upper end 161 are respectively formed with a wave structure 22.
As shown in Figure 1 to Figure 3, planar plate members 2 are optionally provided at the first groove room C1, the second groove room C2, the 3rd groove
In room C3 or the 4th groove room C4, cleanout fluid F injects the first groove room C1 by blasthole 111, when cleanout fluid F is in the first groove room C1
A liquid level be more than the first wall high H1 when, that is, a liquid level C10 in the first groove room C1 for the cleanout fluid F be higher than the first spaced walls
During 13 the first spaced walls upper end 131, cleanout fluid F can overflow across the first spaced walls upper end 131 from liquid level C10, and by first-class
Road entrance E1 enters first flow P1.Further, when cleanout fluid F overflows across the first spaced walls upper end 131 from liquid level C10, position
Cleanout fluid F can uniformly be overflowed across the first spaced walls upper end 131, i.e. cleanout fluid F by the wave structure 22 in the first spaced walls upper end 131
First can fifty-fifty be overflowed by wave structure 22 by length direction (i.e. a direction X, as shown in Figure 2) along the first spaced walls 13
Groove room C1, and first flow P1 is entered by first flow entrance E1.
In the same manner, when as cleanout fluid F, the liquid level in the second groove room C2 is more than the second wall high H2, that is, cleanout fluid F exists
When a liquid level C20 in second groove room C2 is higher than the second spaced walls upper end 141 of the second spaced walls 14, cleanout fluid F can be from liquid level
C20 overflows across the second spaced walls upper end 141, and enters second flow channel P2 by second flow channel entrance E2.Further, work as cleanout fluid
F from liquid level C20 overflow across the second spaced walls upper end 141 when, the wave structure 22 in the second spaced walls upper end 141 for the position can be by cleanout fluid
F uniformly overflows across the second spaced walls upper end 141, that is, cleanout fluid F can by wave structure 22 the length side along the second spaced walls 14
Fifty-fifty overflow the second groove room C2 to (i.e. described direction X, as shown in Figure 2), and second is entered by second flow channel entrance E2
Road P2.By that analogy, cleanout fluid F overflows three groove chamber C3 and cleanout fluid F and overflows the process of the 4th groove room C4 and above-mentioned cleanout fluid F
Overflow the similar process that the first groove room C1 or cleanout fluid F overflows the second groove room C2, will not be described here.
As shown in figure 3, the first flow distribution plate 19 be arranged on first flow side wall lower ends 152 and the first spaced walls lower end 132 it
Between, and mitered, in the first spaced walls 13 and first flow side wall 15, the first flow distribution plate 19 is formed with multiple first shunting holes
190, the second flow distribution plate 20 is arranged between second flow channel side wall lower ends 172 and the second spaced walls lower end 142, and mitered is in second
Spaced walls 14 and second flow channel side wall 17, the second flow distribution plate 20 is formed with multiple second shunting holes 200, the 3rd flow distribution plate 21
It is arranged between third flow channel side wall lower ends 182 and the 3rd spaced walls lower end 162, and mitered is in the 3rd spaced walls 16 and the 3rd stream
Road side wall 18, the 3rd flow distribution plate 21 is formed with multiple 3rd shunting holes 210.
When cleanout fluid F enters first flow P1 by first flow entrance E1, enter the by first flow entrance E1
The cleanout fluid F of one runner P1 can flow downwardly to the first flow distribution plate 19 by first flow P1.When cleanout fluid F flows downwardly to first point
During stream plate 19, cleanout fluid F can flow through the first flow distribution plate 19 by the first shunting hole 190 on the first flow distribution plate 19, makes cleaning
Liquid F is shunted by the first shunting hole 190, and then fifty-fifty comes in the second groove room C2 through the first clearance G 1, first point whereby
Stream plate 19 just can make cleanout fluid F averagely and stably flow into the second groove room C2, and then so that the cleanout fluid F in the second groove room C2 is kept
One steady statue.In the same manner, when cleanout fluid F enters second flow channel P2 by second flow channel entrance E2, by second flow channel entrance
The cleanout fluid F that E2 enters second flow channel P2 can flow downwardly to the second flow distribution plate 20 by second flow channel P2.When cleanout fluid F is to dirty
During to the second flow distribution plate 20, cleanout fluid F can flow through the second flow distribution plate by the second shunting hole 200 on the second flow distribution plate 20
20, so that cleanout fluid F is shunted by the second shunting hole 200, and then fifty-fifty come in three groove chamber C3 through the second clearance G 2, borrow
This second flow distribution plate 20 just can make cleanout fluid F averagely and stably flow into three groove chamber C3, and then makes clear in three groove chamber C3
Washing liquid F keeps a steady statue.By that analogy, cleanout fluid F through third space G3 come the process of the 4th groove room C4 with above-mentioned
Cleanout fluid F comes the process of the second groove room C2 through the first clearance G 1 or cleanout fluid F comes three groove chamber through the second clearance G 2
The similar process of C3, will not be described here.Finally, the cleanout fluid F of entrance the 4th groove room C4 will pass through apopore 121 and flows out.
When planar plate members 2 to be cleaned, can by lithographic plate component 2 be sequentially placed on the 4th groove room C4, three groove chamber C3, second
Groove room C2, the first groove room C1, will lithographic plate component 2 sequentially pass through the 4th groove room C4, three groove chamber C3, the second groove room C2, first
Groove room C1 cleans, and works as planar plate members 2 according to above by the 4th groove room C4, three groove chamber C3, the second groove room C2, the first groove room C1
Order cleaning when, planar plate members 2 enter each groove room before clean level, be sequentially planar plate members 2 enter the 4th groove room
Clean level before C4 is less than the clean level before planar plate members 2 entrance three groove chamber C3, and planar plate members 2 enter the 3rd groove
Clean level before the C3 of room is less than planar plate members 2 and enters clean level before the second groove room C2, and planar plate members 2 enter the
Clean level before two groove room C2 is less than planar plate members 2 and enters the clean level before the first groove room C1.
It is noted that the first groove room C1 is persistently injected by blasthole 111 with cleanout fluid F, cleanout fluid F constantly by
First groove room C1 overflows so that cleanout fluid F sequentially flows through the first groove room C1, first flow P1, the second groove room C2, second flow channel
P2, three groove chamber C3, third flow channel P3 and the 4th groove room C4, add that above-mentioned planar plate members 2 are entering the cleaning before each groove room
Degree so that the first groove room C1 cleaning liquid inside F a particle concentration be less than the second groove room C2 cleaning liquid inside F a particle concentration,
The described particle concentration of the second groove room C2 cleaning liquid inside F is less than a particle concentration of three groove chamber C3 cleaning liquid inside F, three groove chamber
The described particle concentration of C3 cleaning liquid inside F is less than a particle concentration of the 4th groove interior cleanout fluid F, i.e. the first groove room C1 to the 4th
The more described particle concentration of groove room C4 cleaning liquid inside F sequentially successively decreases.Therefore when planar plate members 2 to be cleaned, by lithographic plate component 2 according to
Sequence is cleaned in the 4th groove room C4, three groove chamber C3, the second groove room C2 and the first groove room C1 and just be can reach preferably one cleaning effect
Really.Additionally, the present invention separately can comprise a circulated filter system, it is connected to blasthole 111 and apopore 121, by apopore 121
The cleanout fluid F discharging the 4th groove room C4 after circulated filter system purifies, then can deliver to blasthole 111, to reduce cleaning
The consumption of liquid.Further, since the cleanout fluid F that each groove room is overflowed flows through corresponding runner and next from bottom to top is injected in gap
Individual groove room, the therefore cleanout fluid of spilling will not directly fall on the liquid level of next groove room so that each groove interior liquid level can't
Produce excessive fluctuation, and then maintain the flatness of planar plate members 2.
In sum, the cell body of the present invention utilize first flow, second flow channel and third flow channel respectively will by the first groove room,
The cleanout fluid that second groove room and three groove chamber flow out pass through the first gap, the second gap and third space flow into the second groove room, the
Three groove chamber and the 4th groove room so that cleanout fluid repeatably recycles, to reduce the waste of water resource.Additionally, the groove of the present invention
Cleanout fluid is flowed into the second groove by the bottom of each corresponding runner further with the first gap, the second gap and third space by body
Room, three groove chamber and the 4th groove room, therefore avoid groove cleaning liquid inside to produce excessive disturbance, and affect the smooth of glass baseplate
Degree.
The foregoing is only the preferred embodiments of the present invention, be not limited to the present invention, for the skill of this area
For art personnel, the present invention can have various modifications and variations.All within the spirit and principles in the present invention, made any repair
Change, equivalent, improvement etc., should be included within the scope of the present invention.
Claims (13)
1. a kind of cell body for cleaning planar plate members is it is characterised in that include：
One diapire；
One the first side wall, is connected to one first side of described diapire, and described the first side wall is formed with a blasthole；
One second sidewall, is connected to one second side that described diapire is with respect to described first side；
One first spaced walls, are arranged between described the first side wall and described second sidewall, described first spaced walls and described the
One first groove room is defined, described first spaced walls have one first spaced walls upper end and one first spaced walls lower end between the wall of side,
Described first spaced walls lower end is connected to described diapire, defines one first wall between described first spaced walls upper end and described diapire
High；
One second spaced walls, are arranged between described first spaced walls and described second sidewall, described second spaced walls have one
Second spaced walls upper end and one second spaced walls lower end, described second spaced walls lower end is connected to described diapire, between described second
One second wall is defined high between next door upper end and described diapire；And
One first flow side wall, is arranged between described first spaced walls and described second spaced walls, described first flow side wall
Define a first flow and between described first spaced walls, between described first flow side wall and described second spaced walls, define one second
Groove room, described first groove room and described second groove room are used for optionally accommodating described planar plate members, described first flow side wall
There is a first flow sidewall upper and first flow side wall lower ends, described first flow sidewall upper and described first interval
Define a first flow entrance between wall upper end, there is between described first flow side wall lower ends and described diapire one first gap, make
Described first flow is communicated in described second groove room；
Wherein, described blasthole in order to by one cleanout fluid inject described first groove room, described first wall tall and big in described second wall
Height, passes through described first spaced walls upper end entrance described the by the described cleanout fluid that described blasthole injects described first groove room
One flow channel entry point, and described second groove room is entered by described first gap.
2. cell body as claimed in claim 1 is it is characterised in that also include：
One first flow distribution plate, is arranged between described first flow side wall lower ends and described first spaced walls lower end, described first
Multiple first shunting holes are formed with flow distribution plate, pass through the plurality of first point by the described cleanout fluid that described blasthole injects
Discharge orifice hole enters described first gap.
3. cell body as claimed in claim 2 is it is characterised in that described first flow distribution plate mitered is in described first spaced walls and institute
State first flow side wall.
4. cell body as claimed in claim 1 is it is characterised in that define one between described first flow sidewall upper and described diapire
First plate hight, it is high that described first plate hight is more than described second wall.
5. cell body as claimed in claim 4 is it is characterised in that described first plate hight is less than described first wall height.
6. cell body as claimed in claim 1 is it is characterised in that described first spaced walls upper end and described second spaced walls upper end
It is respectively formed with a wave structure.
7. cell body as claimed in claim 1 is it is characterised in that also include：
One the 3rd spaced walls, are arranged between described second spaced walls and described second sidewall, described 3rd spaced walls have one
3rd spaced walls upper end and one the 3rd spaced walls lower end, described 3rd spaced walls lower end connects described diapire, described 3rd interval
One the 3rd wall is defined high between wall upper end and described diapire；
One second flow channel side wall, is arranged between described 3rd spaced walls and the second spaced walls, described second flow channel side wall and institute
State and between the second spaced walls, define a second flow channel, between described second flow channel side wall and described 3rd spaced walls, define one the 3rd groove
Room, described second flow channel side wall has a second flow channel sidewall upper and second flow channel side wall lower ends, described second flow channel side
A second flow channel entrance, described second flow channel side wall lower ends and described diapire is defined between wall upper end and described second spaced walls upper end
Between there is one second gap, make described second flow channel be communicated in described three groove chamber；And
One third flow channel side wall, is arranged between described 3rd spaced walls and described second sidewall, described third flow channel side wall with
Define a third flow channel between described 3rd spaced walls, between described third flow channel side wall and described second sidewall, define one the 4th groove
Room, described planar plate members are selectively disposed in described first groove room, described second groove room, described three groove chamber or the described 4th
Groove is indoor, and described third flow channel side wall has a third flow channel sidewall upper and third flow channel side wall lower ends, described 3rd stream
Define a third flow channel entrance between road sidewall upper and described 3rd spaced walls upper end, described third flow channel side wall lower ends with described
There is between diapire a third space, make described third flow channel be communicated in described 4th groove room；
Wherein, described second wall is tall and big high in described 3rd wall, is entered described in described second groove room by described first gap
Cleanout fluid enters described second flow channel entrance by described second spaced walls upper end, and enters described the by described second gap
Three groove chamber, and entered by described 3rd spaced walls upper end by the described cleanout fluid that described second gap enters described three groove chamber
Enter described third flow channel entrance, and described 4th groove room is entered by described third space.
8. cell body as claimed in claim 7 is it is characterised in that also include：
One first flow distribution plate, is arranged between described first flow side wall lower ends and described first spaced walls lower end, described first
Multiple first shunting holes are formed with flow distribution plate, pass through the plurality of first point by the described cleanout fluid that described blasthole injects
Discharge orifice hole enters described first gap；And
One second flow distribution plate, is arranged between described second flow channel side wall lower ends and described second spaced walls lower end, described second
Multiple second shunting holes are formed with flow distribution plate, the described cleanout fluid entering described second groove room passes through the plurality of second point
Discharge orifice hole enters described second gap；
One the 3rd flow distribution plate, is arranged between described third flow channel side wall lower ends and described 3rd spaced walls lower end, the described 3rd
Multiple 3rd shunting holes are formed with flow distribution plate, the described cleanout fluid entering described three groove chamber passes through the plurality of 3rd point
Discharge orifice hole enters described third space.
9. cell body as claimed in claim 8 is it is characterised in that described first flow distribution plate mitered is in described first spaced walls and institute
State first flow side wall, described second flow distribution plate mitered in described second spaced walls and described second flow channel side wall, and described the
Three flow distribution plate mitereds are in described 3rd spaced walls and described third flow channel side wall.
10. cell body as claimed in claim 7 is it is characterised in that define between described first flow sidewall upper and described diapire
One first plate hight, defines one second plate hight between described second flow channel sidewall upper and described diapire, on the wall of described third flow channel side
One the 3rd plate hight is defined, described first plate hight is more than described second wall height, described second plate hight is more than institute between end and described diapire
State the 3rd wall high.
11. cell bodies as claimed in claim 10 it is characterised in that described first plate hight to be less than described first wall high, described the
Two plate hights are less than described second wall height, and it is high that described 3rd plate hight is less than described 3rd wall.
12. cell bodies as claimed in claim 7 are communicated in described 4th groove room it is characterised in that described second sidewall is formed with
An apopore, and flow into described 4th groove room described cleanout fluid flowed out by described apopore.
13. cell bodies as claimed in claim 7 are it is characterised in that described first spaced walls upper end, described second spaced walls upper end
And described 3rd spaced walls upper end is respectively formed with a wave structure.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562197105P | 2015-07-27 | 2015-07-27 | |
| US62/197,105 | 2015-07-27 | ||
| TW104135695A TWI571320B (en) | 2015-07-27 | 2015-10-30 | Basin for washing a plate member |
| TW104135695 | 2015-10-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106391550A true CN106391550A (en) | 2017-02-15 |
| CN106391550B CN106391550B (en) | 2018-09-18 |
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ID=55837789
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510842958.XA Active CN106391550B (en) | 2015-07-27 | 2015-11-26 | Tank body for cleaning flat plate member |
| CN201520962036.8U Withdrawn - After Issue CN205200048U (en) | 2015-07-27 | 2015-11-26 | Tank body for cleaning flat plate member |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201520962036.8U Withdrawn - After Issue CN205200048U (en) | 2015-07-27 | 2015-11-26 | Tank body for cleaning flat plate member |
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| Country | Link |
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| CN (2) | CN106391550B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106391550B (en) * | 2015-07-27 | 2018-09-18 | 盟立自动化股份有限公司 | Tank body for cleaning flat plate member |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1101298A (en) * | 1993-08-20 | 1995-04-12 | 恩维列克斯有限公司 | Clarifier |
| CN2400435Y (en) * | 1999-11-05 | 2000-10-11 | 张存信 | Improved combined water-filtering tank |
| CN2542312Y (en) * | 2002-04-12 | 2003-04-02 | 庄朔崴 | Improved composite floating trough removing structure |
| CN1780697A (en) * | 2003-04-04 | 2006-05-31 | 纽卡斯尔大学研究协会有限公司 | Overflow launder |
| JP4236072B2 (en) * | 2000-05-17 | 2009-03-11 | Ｄｏｗａホールディングス株式会社 | Oil-liquid separator |
| CN203861996U (en) * | 2014-02-07 | 2014-10-08 | 李时珍养生堂有限公司 | Bending flow channel type casing of water filter device |
| CN205200048U (en) * | 2015-07-27 | 2016-05-04 | 盟立自动化股份有限公司 | Tank body for cleaning flat plate member |
-
2015
- 2015-11-26 CN CN201510842958.XA patent/CN106391550B/en active Active
- 2015-11-26 CN CN201520962036.8U patent/CN205200048U/en not_active Withdrawn - After Issue
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1101298A (en) * | 1993-08-20 | 1995-04-12 | 恩维列克斯有限公司 | Clarifier |
| CN2400435Y (en) * | 1999-11-05 | 2000-10-11 | 张存信 | Improved combined water-filtering tank |
| JP4236072B2 (en) * | 2000-05-17 | 2009-03-11 | Ｄｏｗａホールディングス株式会社 | Oil-liquid separator |
| CN2542312Y (en) * | 2002-04-12 | 2003-04-02 | 庄朔崴 | Improved composite floating trough removing structure |
| CN1780697A (en) * | 2003-04-04 | 2006-05-31 | 纽卡斯尔大学研究协会有限公司 | Overflow launder |
| CN203861996U (en) * | 2014-02-07 | 2014-10-08 | 李时珍养生堂有限公司 | Bending flow channel type casing of water filter device |
| CN205200048U (en) * | 2015-07-27 | 2016-05-04 | 盟立自动化股份有限公司 | Tank body for cleaning flat plate member |
Also Published As
| Publication number | Publication date |
|---|---|
| CN205200048U (en) | 2016-05-04 |
| CN106391550B (en) | 2018-09-18 |
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