CN205362162U - A automatic system for rinsing a dull and stereotyped component - Google Patents
A automatic system for rinsing a dull and stereotyped component Download PDFInfo
- Publication number
- CN205362162U CN205362162U CN201520953155.7U CN201520953155U CN205362162U CN 205362162 U CN205362162 U CN 205362162U CN 201520953155 U CN201520953155 U CN 201520953155U CN 205362162 U CN205362162 U CN 205362162U
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- spaced walls
- groove
- sidewall
- flow
- runner
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Casting Support Devices, Ladles, And Melt Control Thereby (AREA)
- Clamps And Clips (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
Abstract
The utility model discloses an automatic system for rinsing a dull and stereotyped component includes a base, a cell body, one calorie of casket structure and one moves and carry a mechanism, the cell body sets up on the base, it has a first trough room and a second groove room to distinguish at least to separate in it, card casket structure sets up the first trough room or the second groove is indoor, it includes a first track and 1 the 1st drive arrangement to move a year mechanism, first track setting is in on the base, a drive arrangement includes a first base and a first driving piece, first base slidable ground sets up on the first track, and corresponding a first trench of the first trough room with correspond remove between a second trench of second groove room, first driving piece telescopically install in on the first base and the fixing in card casket structure is with the drive card casket structure is left or is got into the first trough room or second groove room.
Description
Technical field
This utility model relates to a kind of automated system, particularly relates to a kind of automated system for cleaning a planar plate members.
Background technology
Recently, glass baseplate is used heavily on different products, especially display pannel, therefore each manufacturer introduces different automatic flows and automation equipment one after another to promote production capacity, deal with the demand of increase day by day whereby, how to provide the automated system of a kind of production efficiency improving glass baseplate just to become one of the problem that industry is made great efforts.
Utility model content
Therefore, for solving the problems referred to above, this utility model provides a kind of and is used for cleaning the automated system of a planar plate members so that overall operation program is simplified more, and makes to produce online overall operation space and more effectively utilize, whereby with improving production efficiency.
nullFor reaching above-mentioned purpose，This utility model discloses a kind of automated system being used for cleaning a planar plate members，It includes a base、One cell body、One cartridge structure and a transfer mechanism，Described cell body is arranged on described base，One first groove room and one second groove room has at least been separated in it，Described cartridge structure is selectively disposed in described first groove room or described second groove is indoor，In order to carry described planar plate members，Described transfer mechanism includes one first track and one first driving device，Described first track is arranged on described base，It is axial that described first track has one first，Described first driving device includes one first pedestal and one first actuator，Described first pedestal is slidably disposed on described first track，Described first pedestal can be moved to one second groove position of corresponding described second groove room or along moving to described first groove position by described second groove displacement in contrast to a second direction of described first direction along being parallel to a described first axial first direction by one first groove displacement of corresponding described first groove room，It is axial that described first pedestal has one second，Described first actuator is telescopically installed on described first pedestal and is immobilizated in described cartridge structure，When described first actuator along be parallel to described second axial one stretch out direction stretch out in described first pedestal time，Described first actuator drives described cartridge structure to leave described first groove room or described second groove room，When described first actuator is along when retracting in described first pedestal in contrast to the described retracted orientation stretching out direction，Described first actuator drives described cartridge structure to enter described first groove room or described second groove room.
nullAccording to one of them embodiment of this utility model，Described transfer mechanism also includes one second track and one second driving device，Described second track be arranged on described base and with described first parallel track，Described second driving device includes one second pedestal and one second actuator，Described second pedestal is slidably disposed on described second track，Described second pedestal by described first groove displacement can be moved to described second groove position along described first direction with described first pedestal with moving or be moved to described first groove position by described second groove displacement along described second direction，Described second actuator is telescopically installed on described second pedestal and is immobilizated in described cartridge structure，Described second actuator can stretch out direction described in edge with described first actuator stretch out in described second pedestal with moving，To drive described cartridge structure to leave described first groove room or described second groove room，Or retract in described second pedestal along described retracted orientation，To drive described cartridge structure to enter described first groove room or described second groove room.
According to one of them embodiment of this utility model, described first driving device and a described second driving device respectively pneumatic cylinder mechanism, described first pedestal and a described second pedestal respectively pneumatic cylinder seat, and described first actuator and a described second actuator respectively gas-pressure mandril.
According to one of them embodiment of this utility model, described first driving device is a pneumatic cylinder mechanism, and described first pedestal is a pneumatic cylinder seat, and described first actuator is a gas-pressure mandril.
According to one of them embodiment of this utility model, described first be axially perpendicular to described second axial.
nullAccording to one of them embodiment of this utility model，Described cell body includes a diapire、One the first side wall、One second sidewall、One first spaced walls、One second spaced walls and a first flow sidewall，Described diapire is arranged on described base，Described the first side wall is connected to one first side of described diapire，Described the first side wall is formed with a blasthole，Described second sidewall is connected to the described diapire one second side relative to described first side，Described first spaced walls is arranged between described the first side wall and described second sidewall，Described first groove room is defined between described first spaced walls and described the first side wall，Described first spaced walls has one first spaced walls upper end and one first spaced walls lower end，Described first spaced walls lower end is connected to described diapire，One first wall is defined high between described first spaced walls upper end and described diapire，Described second spaced walls is arranged between described first spaced walls and described second sidewall，Described second spaced walls has one second spaced walls upper end and one second spaced walls lower end，Described second spaced walls lower end is connected to described diapire，One second wall is defined high between described second spaced walls upper end and described diapire，Described first flow sidewall is arranged between described first spaced walls and described second spaced walls，A first flow is defined between described first flow sidewall and described first spaced walls，Described second groove room is defined between described first flow sidewall and described second spaced walls，Described first flow sidewall has a first flow sidewall upper and a first flow side wall lower ends，A first flow entrance is defined between described first flow sidewall upper and described first spaced walls upper end，There is between described first flow side wall lower ends and described diapire one first gap，Described first flow is made to be communicated in described second groove room，Wherein a cleanout fluid injects described first groove room by described blasthole，Described first wall is tall and big high in described second wall，The described cleanout fluid being injected described first groove room by described blasthole enters described first flow entrance by described first spaced walls upper end，And enter described second groove room by described first gap.
According to one of them embodiment of this utility model, described cell body also includes one first flow distribution plate, it is arranged between described first flow side wall lower ends and described first spaced walls lower end, be formed with multiple first shunting hole on described first flow distribution plate, described blasthole the described cleanout fluid injected enters described first gap by the plurality of first shunting hole.
According to one of them embodiment of this utility model, described first flow distribution plate mitered is in described first spaced walls and described first flow sidewall.
According to one of them embodiment of this utility model, defining one first plate hight between described first flow sidewall upper and described diapire, described first plate hight is high more than described second wall.
According to one of them embodiment of this utility model, described first plate hight is high less than described first wall.
It is respectively formed with a wave structure according to one of them embodiment of this utility model, described first spaced walls upper end and described second spaced walls upper end.
nullAccording to one of them embodiment of this utility model，A three groove chamber and one the 4th groove room has separately been separated in described cell body，Described cartridge structure is selectively disposed in described first groove room、Described second groove room、Described three groove chamber or described 4th groove are indoor，Described first pedestal is in the described first groove position of corresponding described first groove room、The described second groove position of corresponding described second groove room、One the 3rd groove position of corresponding described three groove chamber and one the 4th groove interdigit of corresponding described 4th groove room move，Described second pedestal is in the described primary importance of corresponding described first groove position、The described second position of corresponding described second groove position、With described first pedestal with dynamic between one the 3rd position of corresponding described 3rd groove position and one the 4th position of corresponding described 4th groove position，And described cell body also includes one the 3rd spaced walls、One second runner sidewall and one the 3rd runner sidewall，Described 3rd spaced walls is arranged between described second spaced walls and described second sidewall，Described 3rd spaced walls has one the 3rd spaced walls upper end and one the 3rd spaced walls lower end，Described 3rd spaced walls lower end connects described diapire，One the 3rd wall is defined high between described 3rd spaced walls upper end and described diapire，Described second runner sidewall is arranged between described 3rd spaced walls and the second spaced walls，One second runner is defined between described second runner sidewall and described second spaced walls，Described three groove chamber is defined between described second runner sidewall and described 3rd spaced walls，Described second runner sidewall has one second runner sidewall upper and one second runner side wall lower ends，One second flow channel entry point is defined between described second runner sidewall upper and described second spaced walls upper end，There is between described second runner side wall lower ends and described diapire one second gap，Described second runner is made to be communicated in described three groove chamber，Described 3rd runner sidewall is arranged between described 3rd spaced walls and described second sidewall，One the 3rd runner is defined between described 3rd runner sidewall and described 3rd spaced walls，Described 4th groove room is defined between described 3rd runner sidewall and described second sidewall，Described 3rd runner sidewall has one the 3rd runner sidewall upper and one the 3rd runner side wall lower ends，One the 3rd flow channel entry point is defined between described 3rd runner sidewall upper and described 3rd spaced walls upper end，Between described 3rd runner side wall lower ends and described diapire, there is a third space，Make described 3rd flow passage in described 4th groove room，Wherein，Described second wall is tall and big high in described 3rd wall，The described cleanout fluid being entered described second groove room by described first gap enters described second flow channel entry point by described second spaced walls upper end，And enter described three groove chamber by described second gap，And enter the described cleanout fluid of described three groove chamber by described 3rd described 3rd flow channel entry point of spaced walls upper end entrance by described second gap，And enter described 4th groove room by described third space.
nullAccording to one of them embodiment of this utility model，Described cell body also includes one first flow distribution plate、One second flow distribution plate and one the 3rd flow distribution plate，Described first flow distribution plate is arranged between described first flow side wall lower ends and described first spaced walls lower end，Described first flow distribution plate is formed multiple first shunting hole，The described cleanout fluid injected by described blasthole enters described first gap by the plurality of first shunting hole，Described second flow distribution plate，It is arranged between described second runner side wall lower ends and described second spaced walls lower end，Described second flow distribution plate is formed multiple second shunting hole，The described cleanout fluid entering described second groove room enters described second gap by the plurality of second shunting hole，Described 3rd flow distribution plate，It is arranged between described 3rd runner side wall lower ends and described 3rd spaced walls lower end，Described 3rd flow distribution plate is formed multiple 3rd shunting hole，The described cleanout fluid entering described three groove chamber enters described third space by the plurality of 3rd shunting hole.
According to one of them embodiment of this utility model, described first flow distribution plate mitered is in described first spaced walls and described first flow sidewall, described second flow distribution plate mitered is in described second spaced walls and described second runner sidewall, and described 3rd flow distribution plate mitered is in described 3rd spaced walls and described 3rd runner sidewall.
According to one of them embodiment of this utility model, one first plate hight is defined between described first flow sidewall upper and described diapire, one second plate hight is defined between described second runner sidewall upper and described diapire, one the 3rd plate hight is defined between described 3rd runner sidewall upper and described diapire, described first plate hight is high more than described second wall, and described second plate hight is high more than described 3rd wall.
According to one of them embodiment of this utility model, described first plate hight is high less than described first wall, and described second plate hight is high less than described second wall, and described 3rd plate hight is high less than described 3rd wall.
According to one of them embodiment of this utility model, described second sidewall is formed with the apopore being communicated in described 4th groove room, and the described cleanout fluid flowing into described 4th groove room is flowed out by described apopore.
According to one of them embodiment of this utility model, described first spaced walls upper end, described second spaced walls upper end and described 3rd spaced walls upper end are respectively formed with a wave structure.
In sum, this utility model automated system utilizes transfer mechanism to be moved in each groove interdigit of corresponding each groove room by planar plate members, and this utility model automated system separately utilizes the first actuator of transfer mechanism and the second actuator drive described cartridge structure to enter or leave the groove room of correspondence, therefore automated system of the present utility model not only makes the overall operation program of immersion plating or cleaning planar plate members more simplify, and more makes the online overall operation space of production more effectively utilize.About addressing other technologies content, feature and effect before this utility model, coordinate with reference in the detailed description of the embodiment of accompanying drawing following, can clearly present.
Accompanying drawing explanation
Fig. 1 and Fig. 2 is that this utility model embodiment automated system is in the schematic appearance of different visual angles.
Fig. 3 is the top view of this utility model embodiment automated system.
Fig. 4 is the schematic appearance of this utility model embodiment cell body.
Fig. 5 is the top view of this utility model embodiment cell body.
Fig. 6 be this utility model embodiment in Fig. 5 cell body along the generalized section of line A-A section.
Fig. 7 is the side view of automated system shown in Fig. 1.
Fig. 8 is the schematic diagram that this utility model embodiment automated system is in a retracted mode.
Wherein, description of reference numerals is as follows:
1 automated system
10 bases
11 cell bodies
110 diapires
1101 first sides
1102 second sides
111 the first side walls
1111 blastholes
112 second sidewalls
1121 apopores
113 first spaced walls
1131 first spaced walls upper ends
1132 first spaced walls lower ends
114 second spaced walls
1141 second spaced walls upper ends
1142 second spaced walls lower ends
115 first flow sidewalls
1151 first flow sidewall upper
1152 first flow side wall lower ends
116 the 3rd spaced walls
1161 the 3rd spaced walls upper ends
1162 the 3rd spaced walls lower ends
117 second runner sidewalls
1171 second runner sidewall upper
1172 second runner side wall lower ends
118 the 3rd runner sidewalls
1181 the 3rd runner sidewall upper
1182 the 3rd runner side wall lower ends
119 first flow distribution plates
1190 first shunting holes
120 second flow distribution plates
1200 second shunting holes
121 the 3rd flow distribution plates
1210 the 3rd shunting holes
122 wave structures
12 cartridge structures
13 transfer mechanisms
130 first tracks
131 first driving devices
1310 first pedestals
1311 first actuators
132 second tracks
133 second driving devices
1330 second pedestals
1331 second actuators
2 planar plate members
C1 the first groove room
C2 the second groove room
C3 three groove chamber
C4 the 4th groove room
D1 first direction
D2 second direction
D3 stretches out direction
D4 retracted orientation
E1 first flow entrance
E2 the second flow channel entry point
E3 the 3rd flow channel entry point
F cleanout fluid
G1 the first gap
G2 the second gap
G3 third space
H1 the first wall is high
H2 the second wall is high
H3 the 3rd wall is high
L1 the first plate hight
L2 the second plate hight
L3 the 3rd plate hight
P1 first flow
P2 the second runner
P3 the 3rd runner
S1 first is axial
S2 second is axial
Detailed description of the invention
The direction term being previously mentioned in following example, for instance: upper and lower, left and right, front or rear etc., it is only the direction with reference to attached drawings.Therefore, the direction term of use is used to illustrate not for limiting this utility model.Refer to Fig. 1 to Fig. 3, Fig. 1 and Fig. 2 be this utility model embodiment one automated system 1 in the schematic appearance of different visual angles, Fig. 3 is the top view of this utility model embodiment automated system 1.nullAs shown in Figure 1 to Figure 3，Automated system 1 is used for cleaning a planar plate members 2，And include a base 10、One cell body 11、One cartridge structure 12 and a transfer mechanism 13，Cell body 11 is arranged on base 10，And its inner region is separated with one first groove room C1、One second groove room C2、One three groove chamber C3 and one the 4th groove room C4，Cartridge structure 12 is optionally provided at the first groove room C1、Second groove room C2、In three groove chamber C3 or the 4th groove room C4 and in order to loading plate component 2，Transfer mechanism 13 includes one first track 130、One first driving device 131、One second track 132 and one second driving device 133，First track 130 is arranged on base 10 and has one first axial S1，First driving device 131 includes one first pedestal 1310 and one first actuator 1311，First pedestal 1310 is slidably disposed on the first track 130，One end of first actuator 1311 is immobilizated in the side of cartridge structure 12.Second track 132 is arranged on base 10 and parallel with the first track 130, second driving device 133 includes one second pedestal 1330 and one second actuator 1331, second pedestal 1330 is slidably disposed on the second track 132, and one end of the second actuator 1331 is immobilizated in the opposite side of cartridge structure 12.
In practical application, an available control chip (not being illustrated in figure) controls the first pedestal 1310 and the second pedestal 1330 with dynamic, so that the first pedestal 1310 and the second pedestal 1330 can move along the first axial S1 towards a first direction D1 or along the first axial S1 towards moving in contrast to a second direction D2 of first direction D1 simultaneously.Further, the first actuator 1311 has one second axial S2, and the first actuator 1311 is telescopically installed on the first pedestal 1310, and the second actuator 1331 is telescopically installed on the second pedestal 1330.It should be noted that, described control chip separately can control the first actuator 1311 and the second actuator 1331 with dynamic, so that the first actuator 1311 and the second actuator 1331 can stretch out direction D3 along the second axial S2 towards one and stretch out in the first pedestal 1310 and the second pedestal 1330 respectively or along the second axial S2 towards retracting respectively in the first pedestal 1310 and the second pedestal 1330 in contrast to the retracted orientation D4 stretching out direction D3 simultaneously.In the present embodiment, the first axial S1 is perpendicular to the second axial S2, and namely the first track 130 and the first pedestal 1310 are orthogonal, and the second track 132 and the second pedestal 1330 orthogonal, but this utility model is not limited thereto.
Referring to the schematic appearance that Fig. 4 to Fig. 6, Fig. 4 are this utility model embodiment cell body 11, Fig. 5 is the top view of this utility model embodiment cell body 11, Fig. 6 be this utility model embodiment in Fig. 5 cell body 11 along the generalized section of line A-A section.As shown in Figures 4 to 6, cell body 11 includes diapire 110, the first side wall 111,1 second sidewall 112,1 first spaced walls 113,1 second spaced walls 114, first flow sidewall 115, the 3rd spaced walls 116,1 second runner sidewall 117, the 3rd runner sidewall 118,1 first flow distribution plate 119,1 second flow distribution plate 120 and one the 3rd flow distribution plate 121.
nullDiapire 110 is arranged on base 10，The first side wall 111 is connected to one first side 1101 of diapire 110，The first side wall 111 is formed with a blasthole 1111，Second sidewall 112 is connected to the diapire 110 one second side 1102 relative to the first side 1101，Second sidewall 112 is formed with an apopore 1121，First spaced walls 113 is arranged between the first side wall 111 and the second sidewall 112，The first groove room C1 is defined between the first spaced walls 113 and the first side wall 111，One cleanout fluid F injects the first groove room C1 by blasthole 1111，First spaced walls 113 has one first spaced walls upper end 1131 and one first spaced walls lower end 1132，First spaced walls lower end 1132 is connected to diapire 110，One first wall height H1 is defined between the first spaced walls upper end 1131 and diapire 110，Second spaced walls 114 is arranged between the first spaced walls 113 and the second sidewall 112，Second spaced walls 114 has one second spaced walls upper end 1141 and one second spaced walls lower end 1142，Second spaced walls lower end 1142 is connected to diapire 110，One second wall height H2 is defined between the second spaced walls upper end 1141 and diapire 110，First flow sidewall 115 is arranged between the first spaced walls 113 and the second spaced walls 114，A first flow P1 is defined between first flow sidewall 115 and the first spaced walls 113，The second groove room C2 is defined between first flow sidewall 115 and the second spaced walls 114，First flow sidewall 115 has first flow sidewall upper 1151 and a first flow side wall lower ends 1152，One first plate hight L1 is defined between first flow sidewall upper 1151 and diapire 110，A first flow entrance E1 is defined between first flow sidewall upper 1151 and the first spaced walls upper end 1131，There is between first flow side wall lower ends 1152 and diapire 110 one first clearance G 1，First flow P1 is made to be communicated in the second groove room C2.
null3rd spaced walls 116 is arranged between the second spaced walls 114 and the second sidewall 112，3rd spaced walls 116 has one the 3rd spaced walls upper end 1161 and one the 3rd spaced walls lower end 1162，3rd spaced walls lower end 1162 connects diapire 110，One the 3rd wall height H3 is defined between the 3rd spaced walls upper end 1161 and diapire 110，Second runner sidewall 117 is arranged between the 3rd spaced walls 116 and the second spaced walls 114，114 definition one second runner P2 between the second runner sidewall 117 and the second spaced walls，Three groove chamber C3 is defined between the second runner sidewall 117 and the 3rd spaced walls 116，Second runner sidewall 117 has one second runner sidewall upper 1171 and one second runner side wall lower ends 1172，One second plate hight L2 is defined between the second runner sidewall upper 1171 and diapire 110，One second flow channel entry point E2 is defined between the second runner sidewall upper 1171 and the second spaced walls upper end 1141，There is between the second runner side wall lower ends 1172 and diapire 110 one second clearance G 2，The second runner P2 is made to be communicated in three groove chamber C3，3rd runner sidewall 118 is arranged between the 3rd spaced walls 116 and the second sidewall 112，One the 3rd runner P3 is defined between the 3rd runner sidewall 118 and the 3rd spaced walls 116，The 4th groove room C4 is defined between the 3rd runner sidewall 118 and the second sidewall 112，3rd runner sidewall 18 has one the 3rd runner sidewall upper 1181 and one the 3rd runner side wall lower ends 1182，One the 3rd plate hight L3 is defined between the 3rd runner sidewall upper 1181 and diapire 110，One the 3rd flow channel entry point E3 is defined between the 3rd runner sidewall upper 1181 and the 3rd spaced walls upper end 1161，There is between the 3rd runner side wall lower ends 1182 and diapire 110 a third space G3，The 3rd runner P3 is made to be communicated in the 4th groove room C4.In the present embodiment, the first wall height H1 more than the first plate hight L1, the first plate hight L1 more than the second wall height H2, second wall height H2 is more than the second plate hight L2, second plate hight L2 is more than the 3rd wall height H3, and the 3rd wall height H3 is more than the 3rd plate hight L3, but this utility model is not limited thereto.In the present embodiment, the 1131, second spaced walls upper end, the first spaced walls upper end 1141 and the 3rd spaced walls upper end 1161 are respectively formed with a wave structure 122.
As shown in Figures 4 to 6, cleanout fluid F injects the first groove room C1 by blasthole 1111, when a cleanout fluid F liquid level in the first groove room C1 is more than the first wall height H1, namely when a cleanout fluid F liquid level C10 in the first groove room C1 is higher than the first spaced walls upper end 1131 of the first spaced walls 113, cleanout fluid F can overflow across the first spaced walls upper end 1131 from liquid level C10, and enters first flow P1 by first flow entrance E1.Further, when cleanout fluid F overflows across the first spaced walls upper end 1131 from liquid level C10, cleanout fluid F can uniformly be overflowed across the first spaced walls upper end 1131 by the wave structure 122 being positioned at the first spaced walls upper end 1131, namely cleanout fluid F can by wave structure 122 along a length direction (i.e. direction X of the first spaced walls 113, overflow as shown in Figure 5) the first groove room C1 fifty-fifty, and enter first flow P1 by first flow entrance E1.
In like manner, when liquid level is more than the second wall height H2 one of in the second groove room C2 for cleanout fluid F, namely when a cleanout fluid F liquid level C20 in the second groove room C2 is higher than the second spaced walls upper end 1141 of the second spaced walls 114, cleanout fluid F can overflow across the second spaced walls upper end 1141 from liquid level C20, and enters the second runner P2 by the second flow channel entry point E2.Further, when cleanout fluid F overflows across the second spaced walls upper end 1141 from liquid level C20, cleanout fluid F can uniformly be overflowed across the second spaced walls upper end 1141 by the wave structure 122 being positioned at the second spaced walls upper end 1141, namely cleanout fluid F can by wave structure 122 along length direction (the i.e. described direction X of the second spaced walls 114, overflow as shown in Figure 2) the second groove room C2 fifty-fifty, and enter the second runner P2 by the second flow channel entry point E2.By that analogy, cleanout fluid F overflows three groove chamber C3 and cleanout fluid F and overflows the process of the 4th groove room C4 and overflow the first groove room C1 or cleanout fluid F with above-mentioned cleanout fluid F and overflow the similar process of the second groove room C2, repeats no more in this.
nullAs shown in FIG. 6 and 7，First flow distribution plate 119 is arranged between first flow side wall lower ends 1152 and the first spaced walls lower end 1132，And mitered is in the first spaced walls 113 and first flow sidewall 115，First flow distribution plate 119 is formed multiple first shunting hole 1190，Second flow distribution plate 120 is arranged between the second runner side wall lower ends 1172 and the second spaced walls lower end 1142，And mitered is in the second spaced walls 114 and the second runner sidewall 117，Second flow distribution plate 120 is formed multiple second shunting hole 1200，3rd flow distribution plate 121 is arranged between the 3rd runner side wall lower ends 1182 and the 3rd spaced walls lower end 1162，And mitered is in the 3rd spaced walls 116 and the 3rd runner sidewall 118，3rd flow distribution plate 121 is formed multiple 3rd shunting hole 1210.
When cleanout fluid F enters first flow P1 by first flow entrance E1, the cleanout fluid F being entered first flow P1 by first flow entrance E1 can flow downwardly to the first flow distribution plate 119 by first flow P1.When cleanout fluid F flows downwardly to the first flow distribution plate 119, the first shunting hole 1190 that cleanout fluid F can pass through on the first flow distribution plate 119 flows through the first flow distribution plate 119, make cleanout fluid F be tapped hole 1190 by first to tap, and then come in the second groove room C2 through the first clearance G 1 fifty-fifty, first flow distribution plate 119 just can make cleanout fluid F on average and stably flow into the second groove room C2 whereby, and then makes the cleanout fluid F in the second groove room C2 keep a steady statue.In like manner, when cleanout fluid F enters the second runner P2 by the second flow channel entry point E2, the cleanout fluid F being entered the second runner P2 by the second flow channel entry point E2 can flow downwardly to the second flow distribution plate 120 by the second runner P2.When cleanout fluid F flows downwardly to the second flow distribution plate 120, the second shunting hole 1200 that cleanout fluid F can pass through on the second flow distribution plate 120 flows through the second flow distribution plate 120, make cleanout fluid F be tapped hole 1200 by second to tap, and then come in three groove chamber C3 through the second clearance G 2 fifty-fifty, second flow distribution plate 20 just can make cleanout fluid F on average and stably flow into three groove chamber C3 whereby, and then makes the cleanout fluid F in three groove chamber C3 keep a steady statue.By that analogy, cleanout fluid F comes the process of the 4th groove room C4 and above-mentioned cleanout fluid F through third space G3 and comes the process of the second groove room C2 or cleanout fluid F comes the similar process of three groove chamber C3 through the second clearance G 2 through the first clearance G 1, repeats no more in this.Finally, the cleanout fluid F entering the 4th groove room C4 will pass through apopore 1121 and flows out.
nullWhen being intended to clean planar plate members 2，Lithographic plate component 2 sequentially can be positioned over the 4th groove room C4、Three groove chamber C3、Second groove room C2、First groove room C1，By lithographic plate component 2 sequentially by the 4th groove room C4、Three groove chamber C3、Second groove room C2、First groove room C1 cleans，And when planar plate members 2 is according to above by the 4th groove room C4、Three groove chamber C3、Second groove room C2、When the order of the first groove room C1 is cleaned，Planar plate members 2 is entering the clean level before each groove room，It is sequentially that the clean level before planar plate members 2 enters the 4th groove room C4 enters the clean level before three groove chamber C3 less than planar plate members 2，Planar plate members 2 enter three groove chamber C3 before clean level enter the clean level before the second groove room C2 less than planar plate members 2，And planar plate members 2 enter the second groove room C2 before clean level enter the clean level before the first groove room C1 less than planar plate members 2.
nullIt is worth mentioning that，Along with cleanout fluid F is continued to inject the first groove room C1 by blasthole 1111，Cleanout fluid F is overflowed by the first groove room C1 constantly，Cleanout fluid F is made sequentially to flow through the first groove room C1、First flow P1、Second groove room C2、Second runner P2、Three groove chamber C3、3rd runner P3 and the four groove room C4，In addition above-mentioned planar plate members 2 is entering the clean level before each groove room，Make the particle concentration of the first groove room C1 cleaning liquid inside F particle concentration less than the second groove room C2 cleaning liquid inside F，The described particle concentration of a second groove room C2 cleaning liquid inside F particle concentration less than three groove chamber C3 cleaning liquid inside F，The described particle concentration of a three groove chamber C3 cleaning liquid inside F particle concentration less than the 4th groove indoor cleanout fluid F，Namely the more described particle concentration of the first C1 to the 4th groove room, groove room C4 cleaning liquid inside F sequentially successively decreases.Therefore, when being intended to clean planar plate members 2, lithographic plate component 2 is sequentially cleaned in the 4th groove room C4, three groove chamber C3, the second groove room C2 and the first groove room C1 and just can reach a good cleaning performance.In addition, this utility model separately can comprise a circulated filter system, is connected to blasthole 1111 and apopore 1121, apopore 1121 the cleanout fluid F discharging the 4th groove room C4 can after circulated filter system purifies, deliver to blasthole 1111 again, to reduce the consumption of cleanout fluid F.Additionally, flow through corresponding runner due to the cleanout fluid F of each groove room spilling and next groove room from bottom to top is injected in gap, therefore the cleanout fluid overflowed will not directly fall on the liquid level of next groove room, make each groove indoor liquid level can't produce excessive fluctuation, and then maintain the flatness of planar plate members 2.
How following description this utility model automated system 1 utilizes transfer mechanism 13 that cartridge structure 12 and planar plate members 2 are selectively disposed in the first groove room C1, the second groove room C2, three groove chamber C3 or the 4th groove room C4.For example, in above-mentioned cleaning process, lithographic plate component 2 needs sequentially to be positioned in the 4th groove room C4, three groove chamber C3, the second groove room C2, the first groove room C1, refer to Fig. 1, Fig. 7 and Fig. 8, Fig. 7 is the side view of automated system 1 shown in Fig. 1, and Fig. 8 is the schematic diagram that this utility model embodiment automated system 1 is in a retracted mode.nullSuch as Fig. 1、Shown in Fig. 7 and Fig. 8，First described control chip controls the first pedestal 1310 and is positioned one the 4th groove position of corresponding 4th groove room C4 with the second pedestal 1330，And control the first actuator 1311 and the second actuator 1331 stretch out in the first pedestal 1310 and the second pedestal 1330 respectively along stretching out direction D3，Again planar plate members 2 is positioned in cartridge structure 12 and cartridge structure 12 is immobilizated in the first actuator 1311 and the second actuator 1331 (as shown in Figure 7)，Then described control chip controls the first actuator 1311 and the second actuator 1331 and retracts respectively in the first pedestal 1310 and the second pedestal 1330 along retracted orientation D4，Make to take advantage of the cartridge structure 12 carrying planar plate members 2 to enter the 4th groove room C4，And then clean planar plate members 2.After planar plate members 2 cleans in the 4th groove room C4, described control chip controls the first actuator 1311 and the second actuator 1331 and stretches out in the first pedestal 1310 and the second pedestal 1330 respectively along stretching out direction D3, makes to take advantage of the cartridge structure 12 carrying planar plate members 2 to leave the 4th groove room C4.When be intended to switch to planar plate members 2 three groove chamber C3 carry out next stage clean time, described control chip controls the first pedestal 1310 and is moved one the 3rd groove position to corresponding three groove chamber C3 with the second pedestal 1330 D1 in the first direction by one the 4th groove displacement of corresponding 4th groove room C4, then described control chip controls the first actuator 1311 and the second actuator 1331 and retracts in the first pedestal 1310 and the second pedestal 1330 respectively along retracted orientation D4, make to take advantage of the cartridge structure 12 carrying planar plate members 2 to enter three groove chamber C3, and then in three groove chamber C3, planar plate members 2 can be carried out next stage cleaning.By that analogy, after cleaning in planar plate members 2 is due to three groove chamber C3, and be intended to that planar plate members 2 is switched to the second groove room C2 and carry out next stage cleaning, and after planar plate members 2 cleans in the second groove room C2, and be intended to that planar plate members 2 is switched to the first groove room C1 and carry out next stage cleaning, described control chip controls start process and the start similar process of control chip described above control transfer mechanism 13 of transfer mechanism 13, repeats no more in this.
Finally after planar plate members 2 completes final stage cleaning in the first groove room C1, described control chip controls the first actuator 1311 and the second actuator 1331 and stretches out in the first pedestal 1310 and the second pedestal 1330 respectively along stretching out direction D3, so that taking advantage of the cartridge structure 12 of load planar plate members 2 to leave the first groove room C1, now then can be taken off by the first actuator 1311 and the second actuator 1331 by cartridge structure 12, and planar plate members 2 is taken out, in order to planar plate members 2 is carried out next stage processing procedure.In the present embodiment, first driving device 131 and the second driving device 133 can respectively pneumatic cylinder mechanisms, first pedestal 1310 and the second pedestal 1330 can respectively pneumatic cylinder seats, and first actuator 1311 and the second actuator 1331 can a respectively gas-pressure mandril, but this utility model is not limited thereto.
Compared to prior art, this utility model automated system utilizes transfer mechanism to be moved in each groove interdigit of corresponding each groove room by planar plate members, and this utility model automated system separately utilizes the first actuator of transfer mechanism and the second actuator drive described cartridge structure to enter or leave the groove room of correspondence, therefore automated system of the present utility model not only makes the overall operation program of cleaning planar plate members more simplify, and more makes the online overall operation space of production more effectively utilize.
The foregoing is only preferred embodiment of the present utility model, be not limited to this utility model, for a person skilled in the art, this utility model can have various modifications and variations.All within spirit of the present utility model and principle, any amendment of making, equivalent replacement, improvement etc., should be included within protection domain of the present utility model.
Claims (18)
1. the automated system being used for cleaning a planar plate members, it is characterised in that described automated system includes:
One base；
One cell body, is arranged on described base, has at least separated one first groove room and one second groove room in it；
One cartridge structure, is selectively disposed in described first groove room or described second groove is indoor, in order to carry described planar plate members；And
One transfer mechanism, includes:
One first track, is arranged on described base, and it is axial that described first track has one first；And
One first driving device, includes:
One first pedestal, it is slidably disposed on described first track, described first pedestal can along be parallel to a described first axial first direction by one first groove displacement of corresponding described first groove room move to corresponding described second groove room one second groove position or along moving to described first groove position by described second groove displacement in contrast to a second direction of described first direction, it is axial that described first pedestal has one second；And
One first actuator, telescopically it is installed on described first pedestal and is immobilizated in described cartridge structure, when described first actuator along be parallel to described second axial one stretch out direction stretch out in described first pedestal time, described first actuator drives described cartridge structure to leave described first groove room or described second groove room, when described first actuator is along when retracting in described first pedestal in contrast to the described retracted orientation stretching out direction, described first actuator drives described cartridge structure to enter described first groove room or described second groove room.
2. automated system as claimed in claim 1, it is characterised in that described transfer mechanism also includes:
One second track, be arranged on described base and with described first parallel track；And
One second driving device, includes:
One second pedestal, being slidably disposed on described second track, described second pedestal by described first groove displacement can be moved to described second groove position along described first direction with described first pedestal with moving or be moved to described first groove position by described second groove displacement along described second direction；And
One second actuator, telescopically it is installed on described second pedestal and is immobilizated in described cartridge structure, described second actuator can stretch out direction with moving described in edge with described first actuator and stretch out in described second pedestal, to drive described cartridge structure to leave described first groove room or described second groove room, or retract in described second pedestal along described retracted orientation, to drive described cartridge structure to enter described first groove room or described second groove room.
3. automated system as claimed in claim 2, it is characterized in that, described first driving device and a described second driving device respectively pneumatic cylinder mechanism, described first pedestal and a described second pedestal respectively pneumatic cylinder seat, and described first actuator and a described second actuator respectively gas-pressure mandril.
4. automated system as claimed in claim 1, it is characterised in that described first driving device is a pneumatic cylinder mechanism, and described first pedestal is a pneumatic cylinder seat, and described first actuator is a gas-pressure mandril.
5. automated system as claimed in claim 1, it is characterised in that described first be axially perpendicular to described second axial.
6. automated system as claimed in claim 2, it is characterised in that described cell body includes:
One diapire, is arranged on described base；
One the first side wall, is connected to one first side of described diapire, and described the first side wall is formed with a blasthole；
One second sidewall, is connected to the described diapire one second side relative to described first side；
One first spaced walls, it is arranged between described the first side wall and described second sidewall, described first groove room is defined between described first spaced walls and described the first side wall, described first spaced walls has one first spaced walls upper end and one first spaced walls lower end, described first spaced walls lower end is connected to described diapire, defines one first wall high between described first spaced walls upper end and described diapire；
One second spaced walls, it is arranged between described first spaced walls and described second sidewall, described second spaced walls has one second spaced walls upper end and one second spaced walls lower end, described second spaced walls lower end is connected to described diapire, defines one second wall high between described second spaced walls upper end and described diapire；And
One first flow sidewall, it is arranged between described first spaced walls and described second spaced walls, a first flow is defined between described first flow sidewall and described first spaced walls, described second groove room is defined between described first flow sidewall and described second spaced walls, described first flow sidewall has a first flow sidewall upper and a first flow side wall lower ends, a first flow entrance is defined between described first flow sidewall upper and described first spaced walls upper end, there is between described first flow side wall lower ends and described diapire one first gap, described first flow is made to be communicated in described second groove room；
Wherein, one cleanout fluid injects described first groove room by described blasthole, described first wall is tall and big high in described second wall, the described cleanout fluid being injected described first groove room by described blasthole enters described first flow entrance by described first spaced walls upper end, and enters described second groove room by described first gap.
7. automated system as claimed in claim 6, it is characterised in that described cell body also includes:
One first flow distribution plate, it is arranged between described first flow side wall lower ends and described first spaced walls lower end, be formed with multiple first shunting hole on described first flow distribution plate, described blasthole the described cleanout fluid injected enters described first gap by the plurality of first shunting hole.
8. automated system as claimed in claim 7, it is characterised in that described first flow distribution plate mitered is in described first spaced walls and described first flow sidewall.
9. automated system as claimed in claim 6, it is characterised in that define one first plate hight between described first flow sidewall upper and described diapire, described first plate hight is high more than described second wall.
10. automated system as claimed in claim 9, it is characterised in that described first plate hight is high less than described first wall.
11. automated system as claimed in claim 6, it is characterised in that described first spaced walls upper end and described second spaced walls upper end are respectively formed with a wave structure.
12. automated system as claimed in claim 6, it is characterized in that, a three groove chamber and one the 4th groove room has separately been separated in described cell body, described cartridge structure is selectively disposed in described first groove room, described second groove room, described three groove chamber or described 4th groove are indoor, described first pedestal moves together with described second pedestal and can in the described first groove position of corresponding described first groove room, the described second groove position of corresponding described second groove room, one the 3rd groove position of corresponding described three groove chamber and one the 4th groove interdigit of corresponding described 4th groove room move, and described cell body also includes:
One the 3rd spaced walls, it is arranged between described second spaced walls and described second sidewall, described 3rd spaced walls has one the 3rd spaced walls upper end and one the 3rd spaced walls lower end, described 3rd spaced walls lower end connects described diapire, defines one the 3rd wall high between described 3rd spaced walls upper end and described diapire；
One second runner sidewall, it is arranged between described 3rd spaced walls and the second spaced walls, one second runner is defined between described second runner sidewall and described second spaced walls, described three groove chamber is defined between described second runner sidewall and described 3rd spaced walls, described second runner sidewall has one second runner sidewall upper and one second runner side wall lower ends, one second flow channel entry point is defined between described second runner sidewall upper and described second spaced walls upper end, there is between described second runner side wall lower ends and described diapire one second gap, described second runner is made to be communicated in described three groove chamber；And
One the 3rd runner sidewall, it is arranged between described 3rd spaced walls and described second sidewall, one the 3rd runner is defined between described 3rd runner sidewall and described 3rd spaced walls, described 4th groove room is defined between described 3rd runner sidewall and described second sidewall, described 3rd runner sidewall has one the 3rd runner sidewall upper and one the 3rd runner side wall lower ends, one the 3rd flow channel entry point is defined between described 3rd runner sidewall upper and described 3rd spaced walls upper end, between described 3rd runner side wall lower ends and described diapire, there is a third space, make described 3rd flow passage in described 4th groove room；
Wherein, described second wall is tall and big high in described 3rd wall, the described cleanout fluid being entered described second groove room by described first gap enters described second flow channel entry point by described second spaced walls upper end, and enter described three groove chamber by described second gap, and enter the described cleanout fluid of described three groove chamber by described 3rd described 3rd flow channel entry point of spaced walls upper end entrance by described second gap, and enter described 4th groove room by described third space.
13. automated system as claimed in claim 12, it is characterised in that described cell body also includes:
One first flow distribution plate, it is arranged between described first flow side wall lower ends and described first spaced walls lower end, be formed with multiple first shunting hole on described first flow distribution plate, described blasthole the described cleanout fluid injected enters described first gap by the plurality of first shunting hole；
One second flow distribution plate, it is arranged between described second runner side wall lower ends and described second spaced walls lower end, being formed with multiple second shunting hole on described second flow distribution plate, the described cleanout fluid entering described second groove room enters described second gap by the plurality of second shunting hole；And
One the 3rd flow distribution plate, it is arranged between described 3rd runner side wall lower ends and described 3rd spaced walls lower end, being formed with multiple 3rd shunting hole on described 3rd flow distribution plate, the described cleanout fluid entering described three groove chamber enters described third space by the plurality of 3rd shunting hole.
14. automated system as claimed in claim 13, it is characterized in that, described first flow distribution plate mitered is in described first spaced walls and described first flow sidewall, described second flow distribution plate mitered is in described second spaced walls and described second runner sidewall, and described 3rd flow distribution plate mitered is in described 3rd spaced walls and described 3rd runner sidewall.
15. automated system as claimed in claim 12, it is characterized in that, one first plate hight is defined between described first flow sidewall upper and described diapire, one second plate hight is defined between described second runner sidewall upper and described diapire, one the 3rd plate hight is defined between described 3rd runner sidewall upper and described diapire, described first plate hight is high more than described second wall, and described second plate hight is high more than described 3rd wall.
16. automated system as claimed in claim 15, it is characterised in that described first plate hight is high less than described first wall, described second plate hight is high less than described second wall, and described 3rd plate hight is high less than described 3rd wall.
17. automated system as claimed in claim 12, it is characterised in that described second sidewall is formed with the apopore being communicated in described 4th groove room, and the described cleanout fluid flowing into described 4th groove room is flowed out by described apopore.
18. automated system as claimed in claim 12, it is characterised in that described first spaced walls upper end, described second spaced walls upper end and described 3rd spaced walls upper end are respectively formed with a wave structure.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
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| US201562197105P | 2015-07-27 | 2015-07-27 | |
| US62/197,105 | 2015-07-27 |
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| CN205362162U true CN205362162U (en) | 2016-07-06 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510833225.XA Active CN106391623B (en) | 2015-07-27 | 2015-11-25 | For cleaning the automated system of a planar plate members |
| CN201520953155.7U Withdrawn - After Issue CN205362162U (en) | 2015-07-27 | 2015-11-25 | A automatic system for rinsing a dull and stereotyped component |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510833225.XA Active CN106391623B (en) | 2015-07-27 | 2015-11-25 | For cleaning the automated system of a planar plate members |
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| CN (2) | CN106391623B (en) |
| TW (12) | TWM515418U (en) |
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| CN106391623A (en) * | 2015-07-27 | 2017-02-15 | 盟立自动化股份有限公司 | Automatic system for cleaning a plate member |
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- 2015-11-25 CN CN201510833225.XA patent/CN106391623B/en active Active
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106391623A (en) * | 2015-07-27 | 2017-02-15 | 盟立自动化股份有限公司 | Automatic system for cleaning a plate member |
| CN106391623B (en) * | 2015-07-27 | 2018-09-18 | 盟立自动化股份有限公司 | For cleaning the automated system of a planar plate members |
| CN107479060A (en) * | 2017-08-17 | 2017-12-15 | 京东方科技集团股份有限公司 | Cassette cleaning equipment |
| CN107479060B (en) * | 2017-08-17 | 2019-09-27 | 京东方科技集团股份有限公司 | Cassette cleaning equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201704116A (en) | 2017-02-01 |
| TWI571320B (en) | 2017-02-21 |
| TWI571321B (en) | 2017-02-21 |
| TW201704103A (en) | 2017-02-01 |
| CN106391623B (en) | 2018-09-18 |
| TWM521064U (en) | 2016-05-01 |
| TWM515418U (en) | 2016-01-11 |
| TWI561452B (en) | 2016-12-11 |
| TWI574895B (en) | 2017-03-21 |
| TWM520515U (en) | 2016-04-21 |
| TWI572533B (en) | 2017-03-01 |
| TWM522082U (en) | 2016-05-21 |
| TWM523187U (en) | 2016-06-01 |
| CN106391623A (en) | 2017-02-15 |
| TW201703888A (en) | 2017-02-01 |
| TW201704129A (en) | 2017-02-01 |
| TW201704130A (en) | 2017-02-01 |
| TWM519645U (en) | 2016-04-01 |
| TW201703887A (en) | 2017-02-01 |
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Granted publication date: 20160706 Effective date of abandoning: 20180918 |