TWI566918B - 立體列印系統 - Google Patents
立體列印系統 Download PDFInfo
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- TWI566918B TWI566918B TW104140607A TW104140607A TWI566918B TW I566918 B TWI566918 B TW I566918B TW 104140607 A TW104140607 A TW 104140607A TW 104140607 A TW104140607 A TW 104140607A TW I566918 B TWI566918 B TW I566918B
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- 238000010146 3D printing Methods 0.000 title claims description 32
- 239000007788 liquid Substances 0.000 claims description 74
- 239000012778 molding material Substances 0.000 claims description 69
- 230000003287 optical effect Effects 0.000 claims description 59
- 238000010521 absorption reaction Methods 0.000 claims description 23
- 238000003384 imaging method Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 16
- 230000004907 flux Effects 0.000 claims description 6
- 230000005611 electricity Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 48
- 238000001723 curing Methods 0.000 description 23
- 238000000034 method Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000007639 printing Methods 0.000 description 4
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 238000011960 computer-aided design Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000000110 selective laser sintering Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004035 construction material Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000011265 semifinished product Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4296—Coupling light guides with opto-electronic elements coupling with sources of high radiant energy, e.g. high power lasers, high temperature light sources
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/34—Optical coupling means utilising prism or grating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/0204—Compact construction
- G01J1/0209—Monolithic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0422—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using light concentrators, collectors or condensers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/30—Optical coupling means for use between fibre and thin-film device
- G02B6/305—Optical coupling means for use between fibre and thin-film device and having an integrated mode-size expanding section, e.g. tapered waveguide
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
- G02B6/4206—Optical features
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
- G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4295—Coupling light guides with opto-electronic elements coupling with semiconductor devices activated by light through the light guide, e.g. thyristors, phototransistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1446—Devices controlled by radiation in a repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04B—TRANSMISSION
- H04B10/00—Transmission systems employing electromagnetic waves other than radio-waves, e.g. infrared, visible or ultraviolet light, or employing corpuscular radiation, e.g. quantum communication
- H04B10/07—Arrangements for monitoring or testing transmission systems; Arrangements for fault measurement of transmission systems
- H04B10/075—Arrangements for monitoring or testing transmission systems; Arrangements for fault measurement of transmission systems using an in-service signal
- H04B10/079—Arrangements for monitoring or testing transmission systems; Arrangements for fault measurement of transmission systems using an in-service signal using measurements of the data signal
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12083—Constructional arrangements
- G02B2006/12121—Laser
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12133—Functions
- G02B2006/12147—Coupler
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4298—Coupling light guides with opto-electronic elements coupling with non-coherent light sources and/or radiation detectors, e.g. lamps, incandescent bulbs, scintillation chambers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0147—Carriers and holders
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/16—Inspection; Monitoring; Aligning
- H05K2203/163—Monitoring a manufacturing process
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
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- Engineering & Computer Science (AREA)
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- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Computer Networks & Wireless Communication (AREA)
- Signal Processing (AREA)
- Optical Couplings Of Light Guides (AREA)
- Optical Integrated Circuits (AREA)
- Optical Communication System (AREA)
- Wire Bonding (AREA)
- Light Receiving Elements (AREA)
- Image Input (AREA)
- Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
- Tests Of Electronic Circuits (AREA)
Description
本發明是有關於一種立體列印系統。
隨著科技的進步,以及製造技術的演進,許多工件的製造時程與精度都不斷的提升。然而傳統的切削加工,鑄造成型等技術,已無法完全解決各種形狀特殊工件的生產需求,因此,立體列印技術的發展,給這些製造的難題帶來了解答,其不但可以提供快速模型成型,甚至可以直接提供足夠精度的成品或半成品成型。
一般而言,加成式製造技術是將利用電腦輔助設計(computer aided design, CAD)等軟體所建構的3D模型的設計資料轉換為連續堆疊的多個薄(准二維)橫截面層。於此同時,許多可以形成多個薄橫截面層的技術手段也逐漸被提出。舉例來說,列印裝置的列印模組通常可依據3D模型的設計資料所建構的空間座標XYZ在基座的上方沿著XY平面移動,從而使建構材料形成正確的橫截面層形狀。所沉積的建構材料可隨後自然硬化,或者透過加熱或光源的照射而被固化,從而形成所要的橫截面層。因此,藉由列印模組沿著軸向Z逐層移動,即可使多個橫截面層沿Z軸逐漸堆疊,進而使建構材料在逐層固化的狀態下形成立體結構。
現有立體列印技術包括選擇性雷射燒結成型(Selective Laser Sintering, SLS)、三維粉末黏結(3DP)、分層實體製造(Laminated Object Manufacturing, LOM)到目前主流的熔融沉積成型(Fused Deposition Modeling, FDM),乃至於最新的光固化(DLP)技術,都已經成功地開發,並投入生產。
以光固化列印技術為例,其藉由層層光照而固化液態成型材為不同圖案以逐層堆疊成立體物件。目前每一層的程序包括在載板上光照固化單層、固化層剝離載板、注膠覆位以進行下一層的固化,如此逐一且反覆地進行,此舉讓載板受控而配合光固化層以機械式作動行程則成為立體列印製程中造成時間延長的瓶頸。同時,現有技術須待每一層固化層完成固化後,再將載台上移一層固化層的厚度,並需等待周邊的液態成型材回流至前一固化層移開所遺留的空間並使回流的液態成型材回復至穩定後,方能再進行下一層固化層的固化動作。因此一來,整個立體列印製程將會有大部分的時間均耗費在前述載台移動以及液態成型材的回流等待時間,因而造成立體列印的效率低落。據此,如何設法降低前述每一步驟的製程時間,或改善需逐一完成的工序配置,則是相關人員所需予以進一步思考的。
本發明提供一種立體列印系統,其藉由調整光學模組的成像位置而在液態成型材內形成固化面,並持續地逐層固化液態成型材,以有效降低立體物件的成型時間。
本發明的立體列印系統,包括盛槽、載台、光學模組以及控制模組。盛槽盛裝液態成型材。載台可移動地設置於盛槽內。光學模組設置於盛槽下方。控制模組電性連接載台與光學模組。控制模組控制光學模組產生光線穿過盛槽底部而照射到盛槽內的液態成型材,以產生固化層於載台上,並隨著控制模組驅動載台持續地移離光學模組,而堆疊多層固化層於載台上以形成立體物件。光學模組受控制模組驅動以產生光線照射液態成型材,且光學模組的成像位置在液態成型材中離開盛槽底部的特定位置形成固化面,以使固化面處的液態成型材堆疊為固化層。
本發明的立體列印系統包括盛槽、載台以及光學模組。盛槽盛裝液態成型材。載台可移動地設置於盛槽內。光學模組設置於盛槽下方。光學模組產生光線穿過盛槽底部而照射到盛槽內的液態成型材,光學模組的成像位置在液態成型材中形成固化面,以使固化面的液態成型材堆疊為固化層於載台上,並隨著載台持續地移離光學模組,而堆疊多層固化層於載台上以形成立體物件。每一固化面的光子吸收量D(z)為:D(z)=[S(z,θ)+S’(z,θ)]Φ0te-αZ,其中S(z,θ)為該光學模組在成像位置所形成的光斑大小,θ為光線經過透鏡後的入射角度,z為距盛槽底部的距離,t為時間,α為液態成型材的材料吸收係數,而S’(z,θ)=(2tanθ)/[S0+2(f-z)tanθ]3,其中f為固化面相對於盛槽底部的距離,S0是光線入射盛槽底部時的光斑大小,且D(f-△f)-D(△f)≧0,f>2△f,其中固化層的厚度為2△f。
基於上述,由於光學模組能讓在載台與盛槽底部之間的特定位置的液態成型材固化,即光學模組的成像位置是能被控制,而在液態成型材中離開盛槽底部的特定位置形成固化面,降低載台的移動時間,以及降低固化層隨載台移動而導致周邊液態成型材的回流等待時間。換句話說,藉由光學模組能讓盛槽內的液態成型材達到遠端固化的效果,藉此降低製程時間以提高製程效率。
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。
圖1是依據本發明一實施例的一種立體列印系統的示意圖。圖2是圖1的立體列印系統形成立體物件的示意圖。請同時參考圖1與圖2,在本實施例中,立體列印系統100包括盛槽110、載台120、光學模組130以及控制模組140,其中盛槽110盛裝液態成型材200,載台120與光學模組130分別電性連接控制模組140以受控而進行相關作動,載台120是受控而能在盛槽110中移動,光學模組130設置於盛槽110的下方,以受控而產生光線穿過盛槽110底部而投射至盛槽110內的液態成型材200。
進一步地說,載台120受控於控制模組140而沿Z軸可移動地配置於盛槽110。藉此,載台120能移出盛槽110或移入盛槽110並浸置於液態成型材200中。如此一來,光學模組130所提供光線便能投射至載台120處的液態成型材200而在載台120上堆疊形成固化層210。隨著控制模組140驅動載台140移動,例如讓載台120沿Z軸遠離(正Z軸方向)光學模組130,便能讓固化層210堆疊在載台120上,以形成立體物件220。
液態成型材200例如是光敏樹脂,而光學模組130則是用以提供能固化光敏樹脂之波段的光線(例如紫外線),因此藉由光學模組130所提供的光線穿透盛槽110並掃描照射載台120與盛槽110底部之間的液態成型材200,便能將液態成型材200逐層固化並堆疊固著在載台120上,隨著載台120(沿正Z軸方向)遠離盛槽110的底部,最終便能在載台120上成型出立體物件220(亦即立體物件220的成型方向是朝向負Z軸方向)。
在此,重要的是,光學模組130能受控於控制模組140而使其所產生的光線的成像位置P1座落於液態成型材200中離開盛槽110底部的特定位置,以使光學模組130的成像位置P1在液態成型材200中形成固化面,並讓固化面處的液態成型材200被固化堆疊為固化層210。詳細而言,光學模組130包括至少一光源132與至少一透鏡134,更進一步地說,本實施例的光源132包括微發光二極體(μLED)或其陣列,在此所述微LED陣列是指作為顯示元件的發光像素(pixel)。例如:全高清(FHD)解析度之顯示器,其微LED陣列數即為1920x1080。本實施例的透鏡134包括微透鏡或其陣列,其中透鏡134位於光源132與盛槽110之間,以讓光源132所產生的光線經由透鏡134而以入射角度θ投射至盛槽110內,進而讓光學模組130的成像位置P1在液態成型材中的距離盛槽110底部的特定位置成像聚焦而形成固化面,以使固化面處的液態成型材200得以被堆疊固化成固化層210,因此載台120即能受驅動而持續地朝正Z軸方向移動以堆疊多層固化層210。
圖3繪示圖1及圖2中光源與透鏡的局部放大圖,在此僅繪示單一光源132與單一透鏡134的光線路徑示意。請參考圖3,在本實施例中,藉由透鏡134的搭配,而讓光線經由透鏡134後能進行大角度的聚光,使光學模組130在成像位置P1處形成光斑P2,且光斑P2的大小會小於光源132之發光區D1的大小(即,P2的尺寸小於D1的尺寸)。如此,能提高固化與非固化材料介面的對比度,使成型的物件表面更為平滑,亦即讓立體物件220在固化成型後能具有較高的解析度與精細的外觀。在另一未繪示的實施例中,前述微透鏡陣列也可藉由光學套筒貼附在傳統的成像鏡頭上,亦或是成為成像鏡頭的多片透鏡之一,以整合為單一形式(一體式)的鏡頭組。
另一方面,如圖1所示,液態成型材200是否固化實際上是取決於一段時間內其單位面積(或單位體積)所接收到的光子數量,也就是在以光線照射液態成型材200時,液態成型材200中某處的光子密度需達一定值以上,方能讓該處的液態成型材200固化。由圖1可知,在光學模組130所產生光線穿過盛槽110的液態成型材200的路徑上,能藉由光源132與透鏡134的相互搭配,而設定在成像位置P1處的光子密度達到足以讓該處液態成型材200固化的光子量而形成所述的固化面。
在此提供直角座標系以利於後續之相關描述,且讓盛槽110的底部座落於X-Y平面,即Z=0處。據此,在本實施例中,依據比爾-朗伯定律(Beer–Lambert law)為基礎所進行的推導,光子會隨入射至盛槽110的深度(即相對於盛槽110底部的距離z)而產生不同的分布狀態,其分布函數為,Φ(z)=Φ
0S(z,θ)e
-αz,其中Φ
0是光線入射於盛槽110底部時的光子通量(即,此時z=0,即X-Y平面上),θ為光學模組130的入射角度,α為液態成型材200的材料吸收係數,同時亦代表。S(z,θ)代表光線入射至液態成型材後的光斑大小,其為入射角度θ與距離z的函數。據此,S(z,θ)=1/[S
0+2(f-z)tanθ]
2,其中f為固化面相對於盛槽110底部的距離,S
0是光線入射於盛槽110底部(即z=0)時的光斑大小。同時,由圖1亦能得知,當入射角度θ越大,則光斑的大小會隨著距離z而快速減小,因此也代表此時的光子密度會越大(會隨著距離z而快速增加)。因此,將上式對距離z取導數,並乘上光線照射的時間t之後,便能得出單位距離的光子吸收量(absorbed photon dosage per unit depth)D(z),即:
D(z)=[S(z,θ)+S’(z,θ)]
Φ
0te
-αz,
其中S’(z,θ)=(2tanθ)/[S
0+2(f-z)tanθ]
3。
據此,便能以此作為液態成型材200於特定位置(距離z)的固化與否的判斷。
圖4與圖5分別繪示於不同條件下的光子吸收量的示意圖。請先參考圖4,其在f=50μm、入射角度θ=30°,以及光子通量Φ
0=1(予以歸一化而作為基準量)的情形下各種不同的液態成型材200(在此以不同的材料吸收係數α作為區隔及表示,同時亦代表光學模組130所產生的光線波長需對應不同種類的液態成型材200),所對應單位距離的光子吸收量D(z),且由圖4可知,選擇較低材料吸收係數α的液態成型材200,其中較佳為材料吸收係數α≦0.04,而能達到所需在特定位置產生固化的效果。又如圖5所示,其繪示在f=50μm且液態成型材200的材料吸收係數α=0.04的情形下,光學模組130以不同入射角度θ所對應單位距離的光子吸收量D(z),其中能得知,以較大的入射角度,較佳為入射角度θ≧30°,而能達到所需在特定位置產生固化的效果。
圖6繪示立體列印系統於另一狀態的光子吸收量的示意圖。請參考圖6,如前所述,本實施例為了達到在載台120與盛槽110底部之間的液態成型材200能在特定位置進行固化,因此前述光子吸收量D(z)還需滿足:
D(f-Δf)-D(Δf)≧0,
亦即讓光子吸收量在(f-Δf)位置時超過固化所需臨界值,而此時固化層210的厚度約2Δf,即f>2Δf,固層厚度2Δf 可藉由入射光角度θ及材料吸收係數調整決定,即液態成型材200能被瞬間固化的厚度,其中在所述狀態下,固化面相對於盛槽110底部的距離f、入射角度θ及材料吸收係數α均已設定(f=50μm、θ=30°、α=0.02)。換句話說,此時固化面(即所述f=50μm處)的液態成型材200已然固化為固化層210,而從盛槽110底部(z=0,即X-Y平面)至(f-Δf)處的液態成型材200則仍保持液態,因此讓立體列印系統100能達到遠端固化(remote curing)的效果。進一步地說,在光線的照射路徑上(即前述z=0直至(f-Δf)處)的液態成型材200因光子密度不足,而得以維持液態。有鑑於此,請再參考圖1,當第一層固化層210形成前,載台120與盛槽110底部之間存在間隙,且此間隙大於固化層210的厚度。
此外,在本發明另一實施例中,所述光源132(即前述微發光二極體或其陣列)可藉由特定的排列方式,而使其產生具有特定圖案的光線,以讓光學模組130的成像位置P1即具備前述特定圖案,因此在液態成型材200中形成具有特定圖案的固化面。如此,便能直接讓液態成型材200固化為具有特定圖案的固化層210,並逐層堆疊出立體物件220。類似地,光學模組130亦能藉由光學元件(例如導光元件或遮光元件)而讓光源產生具有前述特定圖案的光線。
綜上所述,在本發明的上述實施例中,藉由光學模組而能在載台與盛槽底部之間的特定位置使液態成型材固化,以降低載台的移動時間,即藉此降低周邊液態成型材的回流等待時間。換句話說,藉由光學模組能讓盛槽內的液態成型材達到遠端固化的效果,而無需如現有技術需逐層等待固化,即立體列印系統能因光學模組而調整在液態成型材中的成像位置(即,相當於上述光學模組的成像位置能沿Z軸而移至所需位置而在液態成型材中形成固化面),因而能有效地降低驅動載台的製程時間,提高製程效率。
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。
100‧‧‧立體列印系統
110‧‧‧盛槽
120‧‧‧載台
130‧‧‧光學模組
132‧‧‧光源
134‧‧‧透鏡
140‧‧‧控制模組
200‧‧‧液態成型材
210‧‧‧固化層
220‧‧‧立體物件
D1‧‧‧發光區
P1‧‧‧成像位置
P2‧‧‧光斑
f‧‧‧固化面相對於盛槽底部的距離
2Δf‧‧‧固化層的厚度
θ‧‧‧入射角度
α‧‧‧材料吸收係數
Φ0‧‧‧光線入射於盛槽底部時的光子通量
S‧‧‧成像位置的光斑大小
S0‧‧‧光線入射於盛槽底部時的光斑大小
110‧‧‧盛槽
120‧‧‧載台
130‧‧‧光學模組
132‧‧‧光源
134‧‧‧透鏡
140‧‧‧控制模組
200‧‧‧液態成型材
210‧‧‧固化層
220‧‧‧立體物件
D1‧‧‧發光區
P1‧‧‧成像位置
P2‧‧‧光斑
f‧‧‧固化面相對於盛槽底部的距離
2Δf‧‧‧固化層的厚度
θ‧‧‧入射角度
α‧‧‧材料吸收係數
Φ0‧‧‧光線入射於盛槽底部時的光子通量
S‧‧‧成像位置的光斑大小
S0‧‧‧光線入射於盛槽底部時的光斑大小
D(z)‧‧‧單位距離的光子吸收量
z‧‧‧距盛槽底部的距離
t‧‧‧時間
X-Y-Z‧‧‧直角座標系
圖1是依據本發明一實施例的一種立體列印系統的示意圖。
圖2是圖1的立體列印系統形成立體物件的示意圖。
圖3繪示圖1及圖2中光源與透鏡的局部放大圖。
圖4與圖5分別繪示於不同條件下的光子吸收量的示意圖。
圖6繪示立體列印系統於另一狀態的光子吸收量的示意圖。
100‧‧‧立體列印系統
110‧‧‧盛槽
120‧‧‧載台
130‧‧‧光學模組
132‧‧‧光源
134‧‧‧透鏡
140‧‧‧控制模組
200‧‧‧液態成型材
210‧‧‧固化層
P1‧‧‧成像位置
f‧‧‧固化面相對於盛槽底部的距離
θ‧‧‧入射角度
Φ0‧‧‧光線入射於盛槽底部時的光子通量
S0‧‧‧光線入射於盛槽底部時的光斑大小
X-Y-Z‧‧‧直角座標系
Claims (11)
- 一種立體列印系統,包括:一盛槽,盛裝液態成型材;一載台,可移動地設置於該盛槽內;一光學模組,設置於該盛槽下方;以及一控制模組,電性連接該載台與該光學模組,其中該控制模組控制該光學模組產生光線穿過該盛槽底部而照射到該盛槽內的液態成型材,以產生一固化層於該載台上,並隨著該控制模組驅動該載台持續地移離該光學模組,而堆疊多層固化層於該載台上以形成一立體物件,其中該光學模組受該控制模組驅動所產生光線照射液態成型材,且該光學模組的一成像位置在液態成型材中離開盛槽底部的特定位置形成一固化面,以使該固化面的液態成型材堆疊為該固化層。
- 如申請專利範圍第1項所述的立體列印系統,其中在第一層固化層形成時,該載台與該盛槽的底部之間存在一間隙。
- 如申請專利範圍第2項所述的立體列印系統,其中該間隙大於該第一層固化層厚度。
- 如申請專利範圍第1項所述的立體列印系統,其中該光學模組包括:至少一光源;以及至少一透鏡,對應於該光源設置,以將該光源所產生光線聚焦於該成像位置,且在液態成型材中形成該固化面。
- 如申請專利範圍第4項所述的立體列印系統,其中該光源包括微發光二極體或其陣列。
- 如申請專利範圍第4項所述的立體列印系統,其中該透鏡包括微透鏡或其陣列。
- 如申請專利範圍第4項所述的立體列印系統,其中該光學模組包括多個光源與多個透鏡,各該光源所產生之光線經由該些透鏡而在該成像位置形成一光斑,該光斑的尺寸小於該光源的尺寸。
- 如申請專利範圍第4項所述的立體列印系統,其中液態成型材在該固化面上對於該光學模組所產生光線的光子吸收量(dosage)D(z)為:D(z)=[S(z,θ)+S’(z,θ)]Φ0te-αZ,其中S(z,θ)為該光學模組在該成像位置所形成的光斑大小,S(z,θ)=1/[S0+2(f-z)tanθ]2,Φ0是光線入射於該盛槽底部時的光子通量,θ為光學模組的入射角度,z為距該盛槽底部的距離,t為時間,α為液態成型材的材料吸收係數,而S’(z,θ)=(2tanθ)/[S0+2(f-z)tanθ]3,其中f為該固化面相對於該盛槽底部的距離,S0是光線入射該盛槽底部時的光斑大小,且D(f-△f)-D(△f)≧0,f>2△f,其中固化層的厚度為2△f。
- 如申請專利範圍第8項所述的立體列印系統,其中α≦0.04。
- 如申請專利範圍第8項所述的立體列印系統,其中θ≧30°。
- 一種立體列印系統,包括:一盛槽,盛裝液態成型材;一載台,可移動地設置於該盛槽內;以及一光學模組,設置於該盛槽下方,其中該光學模組產生光線穿過該盛槽底部且照射到該盛槽內的液態成型材,該光學模組的一成像位置在液態成型材中形成一固化面,以使該固化面的液態成型材堆疊為一固化層於該載台上,並隨著該載台持續地移離該光學模組,而堆疊多層固化層於該載台上以形成一立體物件,每一固化面的光子吸收量D(z)為:D(z)=[S(z,θ)+S’(z,θ)]Φ0te-αZ,其中S(z,θ)為該光學模組在該成像位置所形成的光斑大小,S(z,θ)=1/[S0+2(f-z)tanθ]2,Φ0是光線入射於該盛槽底部時的光子通量,θ為光線經過該透鏡後的入射角度,z為距該盛槽底部的距離,t為時間,α為液態成型材的材料吸收係數,而S’(z,θ)=(2tanθ)/[S0+2(f-z)tanθ]3,其中f為該固化面相對於該盛槽底部的距離,S0是光線入射於該盛槽底部時的光斑大小,且D(f-△f)-D(△f)≧0,f>2△f,其中固化層的厚度為2△f。
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TW105123986A TWI616072B (zh) | 2015-07-29 | 2016-07-29 | 光接收器以及光收發器 |
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