TWI561921B - Photosensitive resin composition, light blocking layer manufactured using the same, and color filter - Google Patents

Photosensitive resin composition, light blocking layer manufactured using the same, and color filter

Info

Publication number
TWI561921B
TWI561921B TW103132884A TW103132884A TWI561921B TW I561921 B TWI561921 B TW I561921B TW 103132884 A TW103132884 A TW 103132884A TW 103132884 A TW103132884 A TW 103132884A TW I561921 B TWI561921 B TW I561921B
Authority
TW
Taiwan
Prior art keywords
resin composition
color filter
same
photosensitive resin
blocking layer
Prior art date
Application number
TW103132884A
Other languages
English (en)
Other versions
TW201533536A (zh
Inventor
Ji-Hye Kim
Chang-Min Lee
Kyung-Hee Hyung
Original Assignee
Samsung Sdi Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Sdi Co Ltd filed Critical Samsung Sdi Co Ltd
Publication of TW201533536A publication Critical patent/TW201533536A/zh
Application granted granted Critical
Publication of TWI561921B publication Critical patent/TWI561921B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/23—Photochromic filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
TW103132884A 2014-02-24 2014-09-24 Photosensitive resin composition, light blocking layer manufactured using the same, and color filter TWI561921B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140021434A KR101656000B1 (ko) 2014-02-24 2014-02-24 감광성 수지 조성물, 이를 이용한 차광층 및 컬러필터

Publications (2)

Publication Number Publication Date
TW201533536A TW201533536A (zh) 2015-09-01
TWI561921B true TWI561921B (en) 2016-12-11

Family

ID=53882022

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103132884A TWI561921B (en) 2014-02-24 2014-09-24 Photosensitive resin composition, light blocking layer manufactured using the same, and color filter

Country Status (4)

Country Link
US (1) US9541675B2 (zh)
KR (1) KR101656000B1 (zh)
CN (1) CN104865795B (zh)
TW (1) TWI561921B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017053942A (ja) * 2015-09-08 2017-03-16 三菱化学株式会社 感光性着色組成物、硬化物、着色スペーサー、及び画像表示装置
KR102393376B1 (ko) * 2017-04-10 2022-05-03 삼성디스플레이 주식회사 감광성 수지 조성물 및 이를 포함한 패턴 형성용 조성물의 경화물을 포함하는 전자 장치
KR20240114478A (ko) * 2023-01-17 2024-07-24 주식회사 케이씨씨 감광성 수지 조성물
KR20240114566A (ko) * 2023-01-17 2024-07-24 주식회사 케이씨씨 감광성 수지 조성물

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201407282A (zh) * 2012-08-08 2014-02-16 Dongwoo Fine Chem Co Ltd 著色感光性樹脂組合物、濾色器及包括其的液晶顯示裝置

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69132630T2 (de) 1990-06-20 2002-02-07 Dai Nippon Printing Co., Ltd. Farbfilter und dessen herstellungsverfahren
JP2968349B2 (ja) 1991-02-01 1999-10-25 日本ペイント株式会社 多色表示装置の製造方法
US5612360A (en) 1992-06-03 1997-03-18 Eli Lilly And Company Angiotensin II antagonists
WO1994014892A1 (en) 1992-12-24 1994-07-07 Sumitomo Chemical Company, Limited Photosensitive resin composition for color filter
WO1995002839A1 (fr) 1993-07-15 1995-01-26 Nippon Kayaku Kabushiki Kaisha Procede de fabrication d'un filtre couleur
JP3455915B2 (ja) 1993-09-24 2003-10-14 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物およびカラーフィルタ
KR950011163A (ko) 1993-10-11 1995-05-15 전성원 바아형 스테빌라이저
JPH10221848A (ja) 1997-02-06 1998-08-21 Nan Ya Plast Corp ソルダーレジスト樹脂組成物とその硬化物
JP3824285B2 (ja) 1997-03-14 2006-09-20 富士写真フイルム株式会社 感放射線性着色組成物
KR100245930B1 (ko) 1997-12-31 2000-06-01 서영배 내금도금성, 내냉열충격성이 우수한 감광성 솔더레지스트조성물
KR100368907B1 (ko) * 1999-12-22 2003-01-24 주식회사 셀라인텔레콤 이동단말기용 배터리의 직류 충전장치
KR100550938B1 (ko) * 1999-12-28 2006-02-13 제일모직주식회사 광중합성 감광 수지 조성물
JP4004826B2 (ja) 2002-03-15 2007-11-07 新日鐵化学株式会社 着色感光性樹脂組成物及びカラーフィルター
JP4756963B2 (ja) 2005-09-08 2011-08-24 東京応化工業株式会社 カラーフィルタ用感光性樹脂組成物およびこれを用いたカラーフィルタ
KR100750331B1 (ko) 2006-09-20 2007-08-20 대주전자재료 주식회사 열 경화형 카본 저항 페이스트 조성물
KR101308267B1 (ko) * 2006-10-04 2013-09-13 동우 화인켐 주식회사 수·유계 용매에 용해성을 가지는 실리콘계 계면활성제를함유하는 양성 포토레지스트 조성물
JP5033430B2 (ja) 2007-01-25 2012-09-26 大日本印刷株式会社 液晶配向制御用突起形成用組成物
JP5034616B2 (ja) 2007-03-30 2012-09-26 大日本印刷株式会社 カラーフィルタおよびカラーフィルタの製造方法
JP5397651B2 (ja) 2008-01-11 2014-01-22 Ｄｉｃ株式会社 感光性樹脂組成物及び酸基含有重合性樹脂
KR20100131437A (ko) 2008-03-03 2010-12-15 후지필름 가부시키가이샤 경화성 조성물, 및 컬러 필터
US20130126217A1 (en) 2010-04-23 2013-05-23 Panasonic Corporation Epoxy resin composition, prepreg, metal-clad laminate, and printed wiring board
KR20120057467A (ko) * 2010-11-26 2012-06-05 삼성전자주식회사 실리콘 변성 그룹을 갖는 감광성 폴리이미드, 이를 포함하는 접착 조성물 및 반도체 패키지
KR101486560B1 (ko) * 2010-12-10 2015-01-27 제일모직 주식회사 감광성 수지 조성물 및 이를 이용한 차광층
KR101360968B1 (ko) * 2012-03-19 2014-02-11 주식회사 엘지화학 광경화성 및 열경화성을 갖는 수지 조성물과, 드라이 필름 솔더 레지스트
KR101296851B1 (ko) 2012-07-30 2013-08-14 주식회사 엘지화학 광경화성 및 열경화성을 갖는 수지 조성물 및 드라이 필름 솔더 레지스트

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201407282A (zh) * 2012-08-08 2014-02-16 Dongwoo Fine Chem Co Ltd 著色感光性樹脂組合物、濾色器及包括其的液晶顯示裝置

Also Published As

Publication number Publication date
KR20150100084A (ko) 2015-09-02
US20150241600A1 (en) 2015-08-27
US9541675B2 (en) 2017-01-10
KR101656000B1 (ko) 2016-09-08
CN104865795A (zh) 2015-08-26
TW201533536A (zh) 2015-09-01
CN104865795B (zh) 2019-05-31

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