TWI561136B - Method and device for determining the pressure distribution for bonding - Google Patents

Method and device for determining the pressure distribution for bonding

Info

Publication number
TWI561136B
TWI561136B TW101120357A TW101120357A TWI561136B TW I561136 B TWI561136 B TW I561136B TW 101120357 A TW101120357 A TW 101120357A TW 101120357 A TW101120357 A TW 101120357A TW I561136 B TWI561136 B TW I561136B
Authority
TW
Taiwan
Prior art keywords
bonding
determining
pressure distribution
distribution
pressure
Prior art date
Application number
TW101120357A
Other languages
English (en)
Other versions
TW201309144A (zh
Inventor
Bernhard Rebhan
Markus Wimplinger
Original Assignee
Ev Group E Thallner Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ev Group E Thallner Gmbh filed Critical Ev Group E Thallner Gmbh
Publication of TW201309144A publication Critical patent/TW201309144A/zh
Application granted granted Critical
Publication of TWI561136B publication Critical patent/TWI561136B/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B30PRESSES
    • B30BPRESSES IN GENERAL
    • B30B15/00Details of, or accessories for, presses; Auxiliary measures in connection with pressing
    • B30B15/06Platens or press rams
    • B30B15/062Press plates
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00Measuring force or stress, in general
    • G01L1/24Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0061Force sensors associated with industrial machines or actuators
    • G01L5/0076Force sensors associated with manufacturing machines
    • G01L5/008Force sensors integrated in an article or a dummy workpiece
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0061Force sensors associated with industrial machines or actuators
    • G01L5/0076Force sensors associated with manufacturing machines
    • G01L5/0085Force sensors adapted for insertion between cooperating machine elements, e.g. for measuring the nip force between rollers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/185Joining of semiconductor bodies for junction formation
    • H01L21/187Joining of semiconductor bodies for junction formation by direct bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Force Measurement Appropriate To Specific Purposes (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Measuring Fluid Pressure (AREA)
TW101120357A 2011-06-06 2012-06-06 Method and device for determining the pressure distribution for bonding TWI561136B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2011/059308 WO2012167814A1 (de) 2011-06-06 2011-06-06 Verfahren und vorrichtung zur ermittlung der druckverteilung zum bonden

Publications (2)

Publication Number Publication Date
TW201309144A TW201309144A (zh) 2013-02-16
TWI561136B true TWI561136B (en) 2016-12-01

Family

ID=44627444

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101120357A TWI561136B (en) 2011-06-06 2012-06-06 Method and device for determining the pressure distribution for bonding

Country Status (8)

Country Link
US (1) US9500541B2 (zh)
EP (1) EP2718094B9 (zh)
JP (1) JP5864733B2 (zh)
KR (1) KR101830471B1 (zh)
CN (1) CN103561944B (zh)
SG (1) SG194935A1 (zh)
TW (1) TWI561136B (zh)
WO (1) WO2012167814A1 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014194944A1 (de) 2013-06-05 2014-12-11 Ev Group E. Thallner Gmbh Messeinrichtung und verfahren zur ermittlung einer druckkarte
US10526124B2 (en) * 2016-05-25 2020-01-07 International Business Machines Corporation Surface distortion detector for packaging
EP3379222B1 (en) 2017-03-22 2020-12-30 Methode Electronics Malta Ltd. Magnetoelastic based sensor assembly
CN110462558A (zh) * 2017-07-19 2019-11-15 深圳纽迪瑞科技开发有限公司 一种压力感应装置及压力感应设备
US11084342B2 (en) 2018-02-27 2021-08-10 Methode Electronics, Inc. Towing systems and methods using magnetic field sensing
EP3758959A4 (en) 2018-02-27 2022-03-09 Methode Electronics, Inc. TOWING SYSTEMS AND METHODS USING MAGNETIC SENSING
US11221262B2 (en) 2018-02-27 2022-01-11 Methode Electronics, Inc. Towing systems and methods using magnetic field sensing
US11135882B2 (en) 2018-02-27 2021-10-05 Methode Electronics, Inc. Towing systems and methods using magnetic field sensing
US11491832B2 (en) 2018-02-27 2022-11-08 Methode Electronics, Inc. Towing systems and methods using magnetic field sensing
DE102020206978A1 (de) 2020-06-04 2021-12-09 Robert Bosch Gesellschaft mit beschränkter Haftung Verfahren zur Überprüfung einer Verbindung, Prüfeinrichtung, Computerprogrammprodukt und Fertigungseinrichtung
US11829077B2 (en) 2020-12-11 2023-11-28 Kla Corporation System and method for determining post bonding overlay
US11782411B2 (en) 2021-07-28 2023-10-10 Kla Corporation System and method for mitigating overlay distortion patterns caused by a wafer bonding tool
CN117810109B (zh) * 2024-02-29 2024-05-14 华南理工大学 晶圆键合保持方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10311764A (ja) * 1997-05-13 1998-11-24 Super Silicon Kenkyusho:Kk 圧力分布測定用ウェーハ
TW200946628A (en) * 2008-01-24 2009-11-16 Brewer Science Inc Method for reversibly mounting a device wafer to a carrier substrate

Family Cites Families (14)

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JPH0658272B2 (ja) * 1988-05-24 1994-08-03 工業技術院長 触圧覚センサ
DE4104975C2 (de) * 1991-02-19 1994-02-24 Ferrozell Gmbh Verfahren zum Prüfen der Flächenpressung von Pressen für Laminate sowie die Verwendung eines dafür geeigneten Laminates
JPH05172666A (ja) * 1991-12-26 1993-07-09 Toppan Printing Co Ltd 簡易接触圧力測定シート
US6033987A (en) 1999-01-15 2000-03-07 Winbond Electronics Corp. Method for mapping and adjusting pressure distribution of CMP processes
TW418476B (en) * 1999-03-02 2001-01-11 Winbond Electronics Corp Apparatus and method for measuring the pressure distribution on the wafer surface
US6508896B1 (en) 2000-08-09 2003-01-21 The Goodyear Tire & Rubber Company Method and apparatus for calibrating and optimizing equipment for product fabrication
CN1383198A (zh) * 2001-04-24 2002-12-04 华邦电子股份有限公司 作用于晶片表面压力零件的压力分布测量与回馈方法
GB0313794D0 (en) * 2003-06-14 2003-07-23 Univ Dundee Tactile sensor assembly
JP4951930B2 (ja) * 2005-10-21 2012-06-13 株式会社ニコン 半導体集積センサ
US7635014B2 (en) * 2005-11-11 2009-12-22 Semiconductor Energy Laboratory Co., Ltd. Method for pressure bonding and method for manufacturing semiconductor device
US7698952B2 (en) 2006-10-03 2010-04-20 Kla-Tencor Corporation Pressure sensing device
JP5020037B2 (ja) 2007-11-26 2012-09-05 富士フイルム株式会社 圧力分布測定方法
DE102008025287A1 (de) * 2008-05-27 2009-12-03 SID Sächsisches Institut für die Druckindustrie GmbH Institut des Vereins POLYGRAPH Leipzig e.V. Vorrichtung zur Messung von Pressungskenngrößen im Spalt zwischen zylindrischen Körpern
WO2011013111A2 (en) 2009-07-31 2011-02-03 Schlumberger Canada Limited Pressure measurement of a reservoir fluid in a microfluidic device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10311764A (ja) * 1997-05-13 1998-11-24 Super Silicon Kenkyusho:Kk 圧力分布測定用ウェーハ
TW200946628A (en) * 2008-01-24 2009-11-16 Brewer Science Inc Method for reversibly mounting a device wafer to a carrier substrate

Also Published As

Publication number Publication date
CN103561944B (zh) 2016-09-28
JP5864733B2 (ja) 2016-02-17
KR101830471B1 (ko) 2018-02-20
US20140102221A1 (en) 2014-04-17
WO2012167814A1 (de) 2012-12-13
EP2718094B1 (de) 2018-01-10
JP2014516160A (ja) 2014-07-07
US9500541B2 (en) 2016-11-22
KR20140031290A (ko) 2014-03-12
CN103561944A (zh) 2014-02-05
EP2718094B9 (de) 2018-04-25
TW201309144A (zh) 2013-02-16
EP2718094A1 (de) 2014-04-16
SG194935A1 (en) 2013-12-30

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