TWI561128B - Print circuit board and method of manufacturing the same - Google Patents

Print circuit board and method of manufacturing the same

Info

Publication number
TWI561128B
TWI561128B TW101102461A TW101102461A TWI561128B TW I561128 B TWI561128 B TW I561128B TW 101102461 A TW101102461 A TW 101102461A TW 101102461 A TW101102461 A TW 101102461A TW I561128 B TWI561128 B TW I561128B
Authority
TW
Taiwan
Prior art keywords
manufacturing
same
circuit board
print circuit
print
Prior art date
Application number
TW101102461A
Other languages
English (en)
Other versions
TW201251532A (en
Inventor
Nobuki Tanaka
Teppei Ito
Kazuya Hamaya
Kuniharu Umeno
Original Assignee
Sumitomo Bakelite Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co filed Critical Sumitomo Bakelite Co
Publication of TW201251532A publication Critical patent/TW201251532A/zh
Application granted granted Critical
Publication of TWI561128B publication Critical patent/TWI561128B/zh

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1603—Process or apparatus coating on selected surface areas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1689—After-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • C25D5/022—Electroplating of selected surface areas using masking means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/22—Secondary treatment of printed circuits
    • H05K3/24—Reinforcing the conductive pattern
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1646—Characteristics of the product obtained
    • C23C18/165—Multilayered product
    • C23C18/1653—Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/1803—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces
    • C23C18/1824—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment
    • C23C18/1827—Pretreatment of the material to be coated of metallic material surfaces or of a non-specific material surfaces by chemical pretreatment only one step pretreatment
    • C23C18/1831—Use of metal, e.g. activation, sensitisation with noble metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/38—Electroplating: Baths therefor from solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0332—Structure of the conductor
    • H05K2201/0335—Layered conductors or foils
    • H05K2201/0355—Metal foils
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1184—Underetching, e.g. etching of substrate under conductors or etching of conductor under dielectrics; Means for allowing or controlling underetching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42—Plated through-holes or plated via connections
    • H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
    • H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Laminated Bodies (AREA)
TW101102461A 2011-01-26 2012-01-20 Print circuit board and method of manufacturing the same TWI561128B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011014126 2011-01-26

Publications (2)

Publication Number Publication Date
TW201251532A TW201251532A (en) 2012-12-16
TWI561128B true TWI561128B (en) 2016-12-01

Family

ID=46580563

Family Applications (1)

Application Number Title Priority Date Filing Date
TW101102461A TWI561128B (en) 2011-01-26 2012-01-20 Print circuit board and method of manufacturing the same

Country Status (4)

Country Link
JP (1) JP5929219B2 (zh)
KR (1) KR20140009322A (zh)
TW (1) TWI561128B (zh)
WO (1) WO2012101984A1 (zh)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014054811A1 (ja) * 2012-10-04 2014-04-10 Jx日鉱日石金属株式会社 多層プリント配線基板の製造方法及びベース基材
TWI452955B (zh) * 2012-10-08 2014-09-11 Subtron Technology Co Ltd 基板結構的製作方法
KR101391187B1 (ko) 2013-01-24 2014-05-07 하이쎌(주) 방열특성이 향상된 플렉서블 모듈 및 이의 제조 방법
KR102198541B1 (ko) * 2014-03-17 2021-01-06 삼성전기주식회사 캐리어 부재
TWI542739B (zh) * 2014-03-21 2016-07-21 長春石油化學股份有限公司 電解銅箔
CN106715118B (zh) * 2014-10-30 2021-04-16 三井金属矿业株式会社 带载体的铜箔以及使用该带载体的铜箔的印刷线路板的制造方法
JP6417964B2 (ja) * 2015-01-23 2018-11-07 住友金属鉱山株式会社 積層体基板、配線基板ならびにそれらの製造方法
KR102040605B1 (ko) 2015-07-15 2019-12-05 엘지이노텍 주식회사 인쇄회로기판 및 그의 제조 방법
JP6842229B2 (ja) * 2016-04-05 2021-03-17 住友金属鉱山株式会社 導電性基板、導電性基板の製造方法
JP2017199854A (ja) * 2016-04-28 2017-11-02 Tdk株式会社 貫通配線基板
JP2018026392A (ja) * 2016-08-08 2018-02-15 イビデン株式会社 配線板及びその製造方法
KR102302184B1 (ko) * 2018-02-01 2021-09-13 에스케이넥실리스 주식회사 고온 치수 안정성 및 집합조직 안정성을 갖는 전해동박 및 그 제조방법
JP7070188B2 (ja) 2018-07-17 2022-05-18 株式会社村田製作所 インダクタ部品
JP6962284B2 (ja) * 2018-07-17 2021-11-05 株式会社村田製作所 インダクタ部品
US11979983B2 (en) 2019-07-04 2024-05-07 Sumitomo Electric Industries, Ltd. Printed wiring board and method of manufacturing the same
US11512406B2 (en) 2019-10-17 2022-11-29 Rohm And Haas Electronic Materials Llc Method of enhancing copper electroplating
KR102108433B1 (ko) * 2019-10-30 2020-05-11 엘지이노텍 주식회사 인쇄회로기판 및 그의 제조 방법
KR102175534B1 (ko) * 2020-04-29 2020-11-06 엘지이노텍 주식회사 인쇄회로기판 및 그의 제조 방법
TWI823044B (zh) * 2020-09-28 2023-11-21 財團法人工業技術研究院 電解銅箔與鋰電池負極集電體
KR102413300B1 (ko) * 2020-12-10 2022-06-27 와이엠티 주식회사 금속박, 이를 포함하는 캐리어 부착 금속박 및 이를 포함하는 인쇄회로기판
TWI809441B (zh) * 2021-07-06 2023-07-21 長春石油化學股份有限公司 表面處理銅箔及銅箔基板
TWI761251B (zh) * 2021-07-06 2022-04-11 長春石油化學股份有限公司 表面處理銅箔及銅箔基板
US11540389B1 (en) 2021-07-06 2022-12-27 Chang Chun Petrochemical Co., Ltd. Surface-treated copper foil and copper clad laminate
US20230019067A1 (en) * 2021-07-06 2023-01-19 Chang Chun Petrochemical Co., Ltd. Surface-treated copper foil and copper clad laminate
WO2023013525A1 (ja) * 2021-08-05 2023-02-09 住友電工プリントサーキット株式会社 プリント配線板
KR20230080171A (ko) * 2021-11-29 2023-06-07 와이엠티 주식회사 표면조도가 낮은 금속박을 이용한 기판의 회로패턴 형성방법

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07268678A (ja) * 1994-03-31 1995-10-17 Mitsui Mining & Smelting Co Ltd プリント配線板用電解銅箔およびその製造方法
JP2009177153A (ja) * 2007-12-25 2009-08-06 Ngk Spark Plug Co Ltd 配線基板及びその製造方法
TW200936817A (en) * 2007-10-31 2009-09-01 Mitsui Mining & Smelting Co Electrolytic copper foil and process for producing the electrolytic copper foil

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JP2680234B2 (ja) * 1992-11-12 1997-11-19 株式会社日立製作所 配線パターン形成方法
JP4137279B2 (ja) * 1999-04-23 2008-08-20 イビデン株式会社 プリント配線板及びその製造方法
JP2003243810A (ja) * 2002-02-15 2003-08-29 Mitsubishi Gas Chem Co Inc 極細線パターンを有するプリント配線板製造方法。
JP2007095910A (ja) * 2005-09-28 2007-04-12 Elna Co Ltd 配線基板の製造方法
JP2007182623A (ja) * 2005-12-08 2007-07-19 Mitsui Mining & Smelting Co Ltd 金属薄体の製造方法
JP2008258309A (ja) * 2007-04-03 2008-10-23 Hitachi Chem Co Ltd プリント配線板の穴あけ方法及びプリント配線板

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07268678A (ja) * 1994-03-31 1995-10-17 Mitsui Mining & Smelting Co Ltd プリント配線板用電解銅箔およびその製造方法
TW200936817A (en) * 2007-10-31 2009-09-01 Mitsui Mining & Smelting Co Electrolytic copper foil and process for producing the electrolytic copper foil
JP2009177153A (ja) * 2007-12-25 2009-08-06 Ngk Spark Plug Co Ltd 配線基板及びその製造方法

Also Published As

Publication number Publication date
TW201251532A (en) 2012-12-16
KR20140009322A (ko) 2014-01-22
JP5929219B2 (ja) 2016-06-01
JP2012169597A (ja) 2012-09-06
WO2012101984A1 (ja) 2012-08-02

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