TWI560526B - Electrostatic clamp, lithographic apparatus, and device manufacturing method - Google Patents
Electrostatic clamp, lithographic apparatus, and device manufacturing methodInfo
- Publication number
- TWI560526B TWI560526B TW101105881A TW101105881A TWI560526B TW I560526 B TWI560526 B TW I560526B TW 101105881 A TW101105881 A TW 101105881A TW 101105881 A TW101105881 A TW 101105881A TW I560526 B TWI560526 B TW I560526B
- Authority
- TW
- Taiwan
- Prior art keywords
- device manufacturing
- lithographic apparatus
- electrostatic clamp
- electrostatic
- clamp
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
- G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201161453719P | 2011-03-17 | 2011-03-17 | |
US201161490682P | 2011-05-27 | 2011-05-27 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201239551A TW201239551A (en) | 2012-10-01 |
TWI560526B true TWI560526B (en) | 2016-12-01 |
Family
ID=45562345
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW101105881A TWI560526B (en) | 2011-03-17 | 2012-02-22 | Electrostatic clamp, lithographic apparatus, and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US9360771B2 (zh) |
EP (1) | EP2686736B1 (zh) |
JP (1) | JP5898705B2 (zh) |
KR (1) | KR101872886B1 (zh) |
CN (1) | CN103415812B (zh) |
TW (1) | TWI560526B (zh) |
WO (1) | WO2012123188A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016147539A1 (ja) * | 2015-03-16 | 2016-09-22 | セイコーエプソン株式会社 | 圧電素子の製造方法、圧電素子、圧電駆動装置、ロボット、およびポンプ |
KR20200119816A (ko) * | 2018-02-13 | 2020-10-20 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치에서의 인시튜 입자 제거를 위한 장치 및 방법 |
US11673161B2 (en) * | 2019-03-11 | 2023-06-13 | Technetics Group Llc | Methods of manufacturing electrostatic chucks |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4139833A (en) * | 1976-11-22 | 1979-02-13 | Gould Inc. | Resistance temperature sensor |
JP2000036449A (ja) * | 1998-07-17 | 2000-02-02 | Nikon Corp | 露光装置 |
EP1372009A1 (en) * | 2002-06-14 | 2003-12-17 | ASML Holding, N.V. | Method and apparatus for compensating transients heat loads in a lithography mirror |
EP1909308A1 (en) * | 2005-07-08 | 2008-04-09 | Creative Technology Corporation | Electrostatic chuck and electrode sheet for electrostatic chuck |
US20090207392A1 (en) * | 2008-02-20 | 2009-08-20 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
WO2011001978A1 (ja) * | 2009-07-02 | 2011-01-06 | 株式会社クリエイティブ テクノロジー | 静電吸着構造体及びその製造方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2106325A (en) * | 1981-09-14 | 1983-04-07 | Philips Electronic Associated | Electrostatic chuck |
US5221403A (en) | 1990-07-20 | 1993-06-22 | Tokyo Electron Limited | Support table for plate-like body and processing apparatus using the table |
JPH05166757A (ja) * | 1991-12-13 | 1993-07-02 | Tokyo Electron Ltd | 被処理体の温調装置 |
KR100238629B1 (ko) * | 1992-12-17 | 2000-01-15 | 히가시 데쓰로 | 정전척을 가지는 재치대 및 이것을 이용한 플라즈마 처리장치 |
US5822171A (en) * | 1994-02-22 | 1998-10-13 | Applied Materials, Inc. | Electrostatic chuck with improved erosion resistance |
US5646814A (en) * | 1994-07-15 | 1997-07-08 | Applied Materials, Inc. | Multi-electrode electrostatic chuck |
US5671116A (en) | 1995-03-10 | 1997-09-23 | Lam Research Corporation | Multilayered electrostatic chuck and method of manufacture thereof |
US5835333A (en) | 1995-10-30 | 1998-11-10 | Lam Research Corporation | Negative offset bipolar electrostatic chucks |
US5986873A (en) * | 1996-07-01 | 1999-11-16 | Packard Hughes Interconnect Co. | Creating surface topography on an electrostatic chuck with a mandrel |
US5835334A (en) | 1996-09-30 | 1998-11-10 | Lam Research | Variable high temperature chuck for high density plasma chemical vapor deposition |
JP3936004B2 (ja) | 1996-11-26 | 2007-06-27 | 財団法人神奈川科学技術アカデミー | 静電浮上チャック |
EP0947884B1 (en) | 1998-03-31 | 2004-03-10 | ASML Netherlands B.V. | Lithographic projection apparatus with substrate holder |
JP4640876B2 (ja) | 2000-06-13 | 2011-03-02 | 株式会社アルバック | 基板搬送装置 |
US6542224B2 (en) | 2000-10-13 | 2003-04-01 | Corning Incorporated | Silica-based light-weight EUV lithography stages |
EP1359469B1 (en) | 2002-05-01 | 2011-03-02 | ASML Netherlands B.V. | Chuck, lithographic projection apparatus and device manufacturing method |
US7092231B2 (en) * | 2002-08-23 | 2006-08-15 | Asml Netherlands B.V. | Chuck, lithographic apparatus and device manufacturing method |
US7105836B2 (en) * | 2002-10-18 | 2006-09-12 | Asml Holding N.V. | Method and apparatus for cooling a reticle during lithographic exposure |
JP2004247387A (ja) * | 2003-02-12 | 2004-09-02 | Sumitomo Electric Ind Ltd | 半導体製造装置用ウェハ保持体およびそれを搭載した半導体製造装置 |
US7626681B2 (en) * | 2005-12-28 | 2009-12-01 | Asml Netherlands B.V. | Lithographic apparatus and method |
US7940511B2 (en) * | 2007-09-21 | 2011-05-10 | Asml Netherlands B.V. | Electrostatic clamp, lithographic apparatus and method of manufacturing an electrostatic clamp |
JP2010161319A (ja) * | 2009-01-09 | 2010-07-22 | Nikon Corp | 静電吸着保持装置、露光装置及びデバイスの製造方法 |
NL2008630A (en) * | 2011-04-27 | 2012-10-30 | Asml Netherlands Bv | Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder. |
-
2012
- 2012-02-07 EP EP12702285.3A patent/EP2686736B1/en active Active
- 2012-02-07 KR KR1020137027294A patent/KR101872886B1/ko active IP Right Grant
- 2012-02-07 US US14/005,686 patent/US9360771B2/en active Active
- 2012-02-07 CN CN201280012836.2A patent/CN103415812B/zh active Active
- 2012-02-07 JP JP2013558344A patent/JP5898705B2/ja active Active
- 2012-02-07 WO PCT/EP2012/052044 patent/WO2012123188A1/en active Application Filing
- 2012-02-22 TW TW101105881A patent/TWI560526B/zh active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4139833A (en) * | 1976-11-22 | 1979-02-13 | Gould Inc. | Resistance temperature sensor |
JP2000036449A (ja) * | 1998-07-17 | 2000-02-02 | Nikon Corp | 露光装置 |
EP1372009A1 (en) * | 2002-06-14 | 2003-12-17 | ASML Holding, N.V. | Method and apparatus for compensating transients heat loads in a lithography mirror |
EP1909308A1 (en) * | 2005-07-08 | 2008-04-09 | Creative Technology Corporation | Electrostatic chuck and electrode sheet for electrostatic chuck |
US20090207392A1 (en) * | 2008-02-20 | 2009-08-20 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
WO2011001978A1 (ja) * | 2009-07-02 | 2011-01-06 | 株式会社クリエイティブ テクノロジー | 静電吸着構造体及びその製造方法 |
Also Published As
Publication number | Publication date |
---|---|
EP2686736A1 (en) | 2014-01-22 |
US9360771B2 (en) | 2016-06-07 |
KR20140030154A (ko) | 2014-03-11 |
WO2012123188A1 (en) | 2012-09-20 |
JP2014512675A (ja) | 2014-05-22 |
CN103415812A (zh) | 2013-11-27 |
EP2686736B1 (en) | 2014-12-17 |
KR101872886B1 (ko) | 2018-06-29 |
CN103415812B (zh) | 2015-10-21 |
TW201239551A (en) | 2012-10-01 |
JP5898705B2 (ja) | 2016-04-06 |
US20140218711A1 (en) | 2014-08-07 |
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