TWI560288B - Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using thin film deposition apparatus - Google Patents

Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using thin film deposition apparatus

Info

Publication number
TWI560288B
TWI560288B TW099143846A TW99143846A TWI560288B TW I560288 B TWI560288 B TW I560288B TW 099143846 A TW099143846 A TW 099143846A TW 99143846 A TW99143846 A TW 99143846A TW I560288 B TWI560288 B TW I560288B
Authority
TW
Taiwan
Prior art keywords
thin film
deposition apparatus
film deposition
display device
organic light
Prior art date
Application number
TW099143846A
Other languages
English (en)
Other versions
TW201127970A (en
Inventor
Chang-Soon Ji
Tae-Seung Kim
Jong-Woo Lee
Cheng-Guo An
Original Assignee
Samsung Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Co Ltd filed Critical Samsung Display Co Ltd
Publication of TW201127970A publication Critical patent/TW201127970A/zh
Application granted granted Critical
Publication of TWI560288B publication Critical patent/TWI560288B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
TW099143846A 2009-12-15 2010-12-14 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using thin film deposition apparatus TWI560288B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090125029A KR101156433B1 (ko) 2009-12-15 2009-12-15 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법

Publications (2)

Publication Number Publication Date
TW201127970A TW201127970A (en) 2011-08-16
TWI560288B true TWI560288B (en) 2016-12-01

Family

ID=44143392

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099143846A TWI560288B (en) 2009-12-15 2010-12-14 Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using thin film deposition apparatus

Country Status (5)

Country Link
US (2) US8173481B2 (zh)
JP (1) JP5557653B2 (zh)
KR (1) KR101156433B1 (zh)
CN (1) CN102148234B (zh)
TW (1) TWI560288B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101968664B1 (ko) * 2012-08-06 2019-08-14 삼성디스플레이 주식회사 박막 형성 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법
KR102114950B1 (ko) 2013-01-29 2020-05-26 삼성디스플레이 주식회사 증착 마스크 및 이를 포함하는 증착 설비
US9692019B2 (en) * 2013-03-29 2017-06-27 Dai Nippon Printing Co., Ltd. Element manufacturing method and element manufacturing apparatus utilizing differential pressure for covering a substrate
KR20150021009A (ko) * 2013-08-19 2015-02-27 주식회사 엘지화학 유기물 마스크를 포함하는 적층체 및 이를 이용한 유기 발광 소자의 제조방법
KR20150053161A (ko) * 2013-11-07 2015-05-15 삼성디스플레이 주식회사 증착 장치, 이를 이용한 유기발광 디스플레이 장치 제조 방법
CN106159107B (zh) * 2016-08-09 2018-05-29 京东方科技集团股份有限公司 有机发光二极管照明灯片及其制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03183758A (ja) * 1989-12-11 1991-08-09 Canon Inc マスキング部材

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EP0615271A1 (en) * 1993-03-08 1994-09-14 Optical Coating Laboratory, Inc. Device for discharging electrostatic energy
JPH09111453A (ja) * 1995-10-13 1997-04-28 Shin Etsu Chem Co Ltd 真空基板搬送装置及び真空基板搬送方法
KR200257219Y1 (ko) 2001-09-07 2001-12-24 엘지.필립스 엘시디 주식회사 유기발광 소자의 제조장치
JP2003231964A (ja) * 2001-12-05 2003-08-19 Toray Ind Inc 蒸着マスクおよびその製造方法並びに有機電界発光装置およびその製造方法
KR100422487B1 (ko) 2001-12-10 2004-03-11 에이엔 에스 주식회사 전자석을 이용한 유기전계발광소자 제작용 증착장치 및그를 이용한 증착방법
JP2003257630A (ja) * 2002-02-27 2003-09-12 Sanyo Electric Co Ltd 真空蒸着方法
KR20040042160A (ko) 2002-11-13 2004-05-20 주식회사 엘리아테크 유기 전계 발광 디스플레이용 증착장비에서 섀도우 마스크패턴 유지방법
JP4124437B2 (ja) * 2002-11-20 2008-07-23 株式会社アルバック イオン注入装置およびイオン注入方法
KR100523932B1 (ko) 2003-01-07 2005-11-28 (주)아비츠 커뮤니케이션즈 펠티어 효과를 이용한 섀도우 마스크 온도 조절 장치 및방법
KR100575233B1 (ko) * 2003-11-04 2006-05-02 엘지.필립스 엘시디 주식회사 액정표시장치 제조 방법
JP2005235568A (ja) 2004-02-19 2005-09-02 Seiko Epson Corp 蒸着装置及び有機ｅｌ装置の製造方法
JP2005302457A (ja) * 2004-04-09 2005-10-27 Toray Ind Inc 蒸着マスクおよびその製造方法並びに有機電界発光装置の製造方法
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JP4543013B2 (ja) * 2005-06-29 2010-09-15 エルジー ディスプレイ カンパニー リミテッド 液晶表示装置及びその製造方法
KR20070016878A (ko) * 2005-08-05 2007-02-08 엘지전자 주식회사 유기 전계발광 표시소자용 모기판 및 이를 이용한 유기전계발광 표시소자의 제조방법
KR20080100051A (ko) 2007-05-11 2008-11-14 주식회사 하이닉스반도체 정전기 방전 장치
KR101028416B1 (ko) * 2007-08-20 2011-04-13 재단법인서울대학교산학협력재단 박막 제조 방법 및 박막 제조 장치
JP2009140903A (ja) * 2007-11-14 2009-06-25 Sony Corp 表示装置の製造方法
US8174021B2 (en) * 2009-02-06 2012-05-08 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacturing the semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03183758A (ja) * 1989-12-11 1991-08-09 Canon Inc マスキング部材

Also Published As

Publication number Publication date
CN102148234A (zh) 2011-08-10
JP2011127218A (ja) 2011-06-30
CN102148234B (zh) 2015-05-27
US8173481B2 (en) 2012-05-08
KR101156433B1 (ko) 2012-06-18
TW201127970A (en) 2011-08-16
JP5557653B2 (ja) 2014-07-23
US20110143473A1 (en) 2011-06-16
US20120186517A1 (en) 2012-07-26
US8482422B2 (en) 2013-07-09
KR20110068179A (ko) 2011-06-22

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