TWI541866B - 處理基底的方法 - Google Patents

處理基底的方法 Download PDF

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Publication number
TWI541866B
TWI541866B TW103120272A TW103120272A TWI541866B TW I541866 B TWI541866 B TW I541866B TW 103120272 A TW103120272 A TW 103120272A TW 103120272 A TW103120272 A TW 103120272A TW I541866 B TWI541866 B TW I541866B
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TW
Taiwan
Prior art keywords
substrate
alignment mark
reference point
laser beam
distance
Prior art date
Application number
TW103120272A
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English (en)
Chinese (zh)
Other versions
TW201447985A (zh
Inventor
蘇二彬
崔均旭
黃潤鎬
Original Assignee
Ａｐ系統股份有限公司
三星顯示有限公司
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Application filed by Ａｐ系統股份有限公司, 三星顯示有限公司 filed Critical Ａｐ系統股份有限公司
Publication of TW201447985A publication Critical patent/TW201447985A/zh
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Publication of TWI541866B publication Critical patent/TWI541866B/zh

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Recrystallisation Techniques (AREA)
  • Optics & Photonics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Toxicology (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
TW103120272A 2013-06-14 2014-06-12 處理基底的方法 TWI541866B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020130068365A KR101432156B1 (ko) 2013-06-14 2013-06-14 기판 처리 방법

Publications (2)

Publication Number Publication Date
TW201447985A TW201447985A (zh) 2014-12-16
TWI541866B true TWI541866B (zh) 2016-07-11

Family

ID=51750893

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103120272A TWI541866B (zh) 2013-06-14 2014-06-12 處理基底的方法

Country Status (3)

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KR (1) KR101432156B1 (ko)
CN (1) CN104241091B (ko)
TW (1) TWI541866B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240100661A (ko) * 2022-12-23 2024-07-02 주식회사 선익시스템 이종의 다중 정렬 키를 이용한 기판의 정렬 방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW527732B (en) * 2001-08-21 2003-04-11 Samsung Electronics Co Ltd Masks for forming polysilicon and methods for manufacturing thin film transistor using the masks
KR100876275B1 (ko) * 2002-11-18 2008-12-26 삼성모바일디스플레이주식회사 레이저 결정화 장비용 패턴 마스크
KR100525443B1 (ko) * 2003-12-24 2005-11-02 엘지.필립스 엘시디 주식회사 결정화 장비 및 이를 이용한 결정화 방법
KR20070072200A (ko) * 2005-12-30 2007-07-04 엘지.필립스 엘시디 주식회사 실리콘 결정화 장치 및 이를 이용한 실리콘 결정화방법
JP2007214388A (ja) * 2006-02-09 2007-08-23 Shimadzu Corp 結晶化装置、および位置決めステージ
KR101135537B1 (ko) * 2010-07-16 2012-04-13 삼성모바일디스플레이주식회사 레이저 조사 장치
KR20120025300A (ko) * 2010-09-07 2012-03-15 삼성모바일디스플레이주식회사 다결정 규소막 검사 장치 및 검사 방법

Also Published As

Publication number Publication date
TW201447985A (zh) 2014-12-16
CN104241091B (zh) 2017-09-22
KR101432156B1 (ko) 2014-08-20
CN104241091A (zh) 2014-12-24

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