TWI520785B - Intermittent coating apparatus and coating film forming system - Google Patents

Intermittent coating apparatus and coating film forming system Download PDF

Info

Publication number
TWI520785B
TWI520785B TW103101666A TW103101666A TWI520785B TW I520785 B TWI520785 B TW I520785B TW 103101666 A TW103101666 A TW 103101666A TW 103101666 A TW103101666 A TW 103101666A TW I520785 B TWI520785 B TW I520785B
Authority
TW
Taiwan
Prior art keywords
nozzle
coating
base
valve
coating liquid
Prior art date
Application number
TW103101666A
Other languages
Chinese (zh)
Other versions
TW201436872A (en
Inventor
早川允規
Original Assignee
斯克林集團公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 斯克林集團公司 filed Critical 斯克林集團公司
Publication of TW201436872A publication Critical patent/TW201436872A/en
Application granted granted Critical
Publication of TWI520785B publication Critical patent/TWI520785B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • B05C11/1023Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to velocity of target, e.g. to web advancement rate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05CAPPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1039Recovery of excess liquid or other fluent material; Controlling means therefor
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Coating Apparatus (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Inert Electrodes (AREA)

Description

間歇式塗覆裝置及塗膜形成系統 Batch coating device and coating film forming system

本發明係關於一種將塗覆液自噴嘴朝向基材間歇地塗覆之間歇式塗覆裝置及包含該間歇式塗覆裝置之塗膜形成系統。 The present invention relates to a batch coating apparatus for intermittently coating a coating liquid from a nozzle toward a substrate, and a coating film forming system including the batch coating apparatus.

先前,於鋰離子電池等化學電池之製造中,使用有自噴嘴向作為基材之金屬箔上噴出相對高黏度之電極材料之塗覆液而形成塗覆膜之塗覆裝置。此種塗覆裝置有進行斷續地塗覆電極材料而交替形成塗覆區域及非塗覆區域之間歇式塗覆者(例如專利文獻1)。 Conventionally, in the production of a chemical battery such as a lithium ion battery, a coating device that forms a coating film by ejecting a coating liquid of a relatively high-viscosity electrode material from a nozzle onto a metal foil as a substrate is used. Such a coating device has a batch coater that alternately forms an electrode material and alternately forms a coated region and a non-coated region (for example, Patent Document 1).

於專利文獻1所揭示之進行間歇式塗覆之裝置中,自具有微小之狹縫狀噴出口之狹縫式模具斷續地噴出塗覆液。於該裝置中,從自塗液儲存器件連接至狹縫式模具之送液路徑分支而設置有洩放路徑,藉由利用三向閥重複切換路徑而進行間歇式塗覆。於非塗覆時流入至洩放路徑之塗覆液係回流至塗液儲存器件。 In the apparatus for intermittent coating disclosed in Patent Document 1, the coating liquid is intermittently ejected from a slit die having a minute slit-like discharge port. In this apparatus, a bleed path is provided from the liquid supply path branching of the self-coating liquid storage device to the slit mold, and intermittent coating is performed by repeating the switching path by the three-way valve. The coating liquid that flows into the bleed path during non-coating is returned to the coating liquid storage device.

又,作為與本發明相關之技術揭示有專利文獻2。 Further, Patent Document 2 is disclosed as a technique related to the present invention.

[先前技術文獻] [Previous Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2012-30193號公報 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2012-30193

[專利文獻2]日本專利特開2011-83719號公報 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2011-83719

於進行間歇式塗覆時,精度良好地維持狹縫式模具之噴出口與基材之間隔較為重要。原因在於:若噴出口相對於基材變動,則無法以所需之形狀精度良好地形成塗覆區域。 In the case of intermittent coating, it is important to accurately maintain the interval between the discharge port of the slit die and the substrate. The reason is that if the discharge port is changed with respect to the substrate, the coated region cannot be formed with high precision in a desired shape.

且說,例如藉由利用三向閥重複切換路徑而進行間歇式塗覆時,由於路徑之切換伴隨著機械性動作(配管之開啟及關閉),故而三向閥會根據該切換而產生振動。而且,若該振動傳遞至噴出口,則噴出口與基材之間隔可能產生變動。如上所述不宜出現該情況。 In addition, for example, when intermittent coating is performed by repeating the switching path by the three-way valve, since the switching of the path is accompanied by mechanical operation (opening and closing of the piping), the three-way valve generates vibration according to the switching. Further, if the vibration is transmitted to the discharge port, the interval between the discharge port and the substrate may vary. This is not the case as described above.

本發明係鑒於上述問題而完成者,其目的在於提供一種可降低自切換器件向噴嘴傳遞之振動之間歇式塗覆裝置。 The present invention has been made in view of the above problems, and an object thereof is to provide a batch coating apparatus capable of reducing vibration transmitted from a switching device to a nozzle.

為解決上述問題,技術方案1之發明之特徵在於:其係將塗覆液自噴嘴朝向基材間歇地塗覆者,且包括:噴嘴;供給配管,其連接於上述噴嘴,且塗覆液朝向上述噴嘴流動;切換器件,其藉由重複切換上述供給配管之開啟及關閉,而使上述塗覆液自上述噴嘴朝向上述基材間歇地噴出;噴嘴基座,其載置上述噴嘴;及切換器件基座,其與上述噴嘴基座為獨立個體,且載置上述切換器件。 In order to solve the above problems, the invention of claim 1 is characterized in that it coats the coating liquid intermittently from the nozzle toward the substrate, and includes: a nozzle; a supply pipe connected to the nozzle, and the coating liquid is oriented The nozzle flows; the switching device intermittently ejects the coating liquid from the nozzle toward the substrate by repeatedly switching the opening and closing of the supply pipe; the nozzle base is mounted with the nozzle; and the switching device The susceptor is independent of the nozzle base and the switching device is placed.

又,技術方案2之發明之特徵在於:於技術方案1之發明之塗覆裝置中進而包括:噴嘴移動器件,其使上述噴嘴基座移動而調整上述噴嘴相對於上述基材之位置;及切換移動器件,其使上述切換器件向與上述噴嘴基座藉由上述噴嘴移動器件而移動之方向相同之方向移動。 Further, the invention of claim 2 further includes the nozzle moving device of the invention of claim 1, wherein the nozzle base moves to adjust a position of the nozzle relative to the substrate; and The moving device moves the switching device in the same direction as the direction in which the nozzle base moves by the nozzle moving device.

又,技術方案3之發明之特徵在於:於技術方案2之間歇式塗覆裝置中,上述噴嘴移動器件使上述噴嘴基座於水平方向移動,上述切換移動器件可使上述切換器件向任意之水平方向自由地移動,藉由經由上述供給配管而傳遞上述噴嘴之移動,而使上述切換器件向與上述 移動方向相同之方向移動。 According to a third aspect of the invention, in the intermittent coating apparatus of the second aspect, the nozzle moving device moves the nozzle base in a horizontal direction, and the switching moving device can move the switching device to an arbitrary level. The direction is free to move, and the switching device is moved to the above by transmitting the movement of the nozzle through the supply pipe. Move in the same direction.

又,技術方案4之發明之特徵在於:於技術方案1至技術方案3中任一項之間歇式塗覆裝置中進而包括振動抑制器件,該振動抑制器件設置於上述切換器件基座,抑制自上述切換器件向上述噴嘴傳遞振動。 Further, the invention of claim 4 is characterized in that the intermittent coating apparatus according to any one of the first to third aspects further includes a vibration suppression device which is provided on the switching device base and suppresses The switching device transmits vibration to the nozzle.

又,技術方案5之發明包括:如技術方案1至技術方案4中任一項之間歇式塗覆裝置;乾燥器件,其對藉由上述間歇式塗覆裝置而塗佈有上述塗覆液之上述基材進行加熱處理而使上述塗覆液乾燥;及搬送器件,其將上述基材依序搬送至上述間歇式塗覆裝置及上述乾燥器件。 Further, the invention of claim 5 includes: the batch coating device according to any one of claims 1 to 4; the drying device which is coated with the coating liquid by the above-described batch coating device The substrate is subjected to heat treatment to dry the coating liquid, and a transfer device that sequentially transports the substrate to the batch coating device and the drying device.

於間歇式塗覆裝置中,較短地設定噴嘴與切換器件之間之供給配管。其目的在於使利用切換器件進行之供給配管之開啟及關閉的切換迅速地反映至噴嘴處之間歇性噴出(即,噴出/停止)。而且,相互近距離地配置之構件通常載置於同一個體之基座上。 In the batch coating apparatus, the supply pipe between the nozzle and the switching device is set short. The purpose is to promptly switch the opening and closing of the supply pipe by the switching device to intermittent discharge (ie, discharge/stop) at the nozzle. Moreover, members that are disposed at close distances are typically placed on the base of the same individual.

另一方面,根據技術方案1、5之發明,如此近距離地配置之噴嘴及切換器件係分別載置於獨立個體之噴嘴基座及切換器件基座。由於利用切換器件進行之供給配管之開啟及關閉的切換伴隨著機械性變化,故而會產生振動,而本發明中該振動不易經由基座而傳遞至噴嘴。噴嘴之振動會使間歇式塗覆之精度變差,而本發明可抑制此種間歇式塗覆之精度變差。 On the other hand, according to the inventions of claims 1 and 5, the nozzles and the switching devices arranged at such a close distance are respectively placed on the nozzle base and the switching device base of the individual individuals. Since the switching of the opening and closing of the supply pipe by the switching device is accompanied by a mechanical change, vibration is generated, and in the present invention, the vibration is not easily transmitted to the nozzle via the susceptor. The vibration of the nozzle deteriorates the accuracy of the intermittent coating, and the present invention can suppress the deterioration of the accuracy of such intermittent coating.

於技術方案2之發明中,由於噴嘴與切換器件之位置關係不易變化,故而可減小產生於供給配管之應力。尤其於間歇式塗覆裝置中,噴嘴與切換器件之間之距離較短。由此,假設切換器件之位置被固定,則伴隨噴嘴之移動會於供給配管產生相對較大之應力。因此,可減小應力之技術方案2之發明對於間歇式塗覆裝置尤其適合。 According to the invention of claim 2, since the positional relationship between the nozzle and the switching device does not easily change, the stress generated in the supply pipe can be reduced. Especially in batch coating devices, the distance between the nozzle and the switching device is short. Thus, assuming that the position of the switching device is fixed, a relatively large stress is generated in the supply pipe accompanying the movement of the nozzle. Therefore, the invention of claim 2 which can reduce stress is particularly suitable for a batch coating device.

另一方面,於技術方案2之發明中,切換器件會移動。由此,切換器件之上游側(與噴嘴為相反側)之構件,例如貯存塗覆液之貯存器件與切換器件之間之相對位置可變化。然而,就提高間歇式塗覆之精度之觀點而言,較短地設定切換器件之上游側之配管長度之必要性較低。由此,可較長地設定該配管長度。若如此較長地設定配管長度,則伴隨切換器件之移動而產生之配管之應力較小,不易成為問題。 On the other hand, in the invention of claim 2, the switching device moves. Thereby, the relative position between the member on the upstream side (opposite side of the nozzle) of the switching device, for example, the storage device storing the coating liquid, and the switching device can be varied. However, from the viewpoint of improving the accuracy of the batch coating, the necessity of setting the length of the piping on the upstream side of the switching device to be short is low. Thereby, the length of the pipe can be set long. If the length of the pipe is set so long, the stress caused by the movement of the switching device is small, which is less likely to be a problem.

根據技術方案3之發明,切換移動器件可使切換器件向任意之水平方向自由地移動,因此可無需進行切換移動器件相對於噴嘴移動器件之位置對準。 According to the invention of claim 3, switching the moving device allows the switching device to freely move in any horizontal direction, so that it is not necessary to perform the positional alignment of the switching moving device with respect to the nozzle moving device.

又,於噴嘴之位置被固定而進行間歇式塗覆時,切換器件可因自身之切換動作而於水平方向移動,故而振動不易經由切換器件基座而傳遞至噴嘴。 Further, when the position of the nozzle is fixed and intermittently applied, the switching device can be moved in the horizontal direction by its own switching operation, so that the vibration is not easily transmitted to the nozzle via the switching device base.

根據技術方案4之發明,可進一步抑制振動之傳遞。 According to the invention of claim 4, the transmission of vibration can be further suppressed.

1‧‧‧塗膜形成系統 1‧‧·film formation system

5‧‧‧基材 5‧‧‧Substrate

10‧‧‧間歇式塗覆裝置 10‧‧‧Intermittent coating device

11‧‧‧塗覆噴嘴 11‧‧‧ Coating nozzle

11a‧‧‧噴出口 11a‧‧‧Spray outlet

12‧‧‧支承輥 12‧‧‧Support roller

20‧‧‧貯存槽 20‧‧‧ storage tank

30‧‧‧供給配管 30‧‧‧Supply piping

31‧‧‧泵 31‧‧‧ pump

32‧‧‧切換器件(供給閥) 32‧‧‧Switching device (supply valve)

33‧‧‧過濾器 33‧‧‧Filter

35‧‧‧壓力計 35‧‧‧ pressure gauge

36‧‧‧注射器 36‧‧‧Syringe

37‧‧‧供給配管 37‧‧‧Supply piping

40‧‧‧循環配管 40‧‧‧Recycling piping

41‧‧‧循環閥 41‧‧‧Circulation valve

43‧‧‧過濾器 43‧‧‧Filter

50‧‧‧噴嘴基座 50‧‧‧Nozzle base

51‧‧‧噴嘴移動器件(噴嘴用移動機構) 51‧‧‧Nozzle moving device (moving mechanism for nozzle)

60‧‧‧切換器件基座(閥基座) 60‧‧‧Switching device base (valve base)

61‧‧‧切換移動器件(閥用移動機構) 61‧‧‧Switching mobile device (moving mechanism for valve)

63‧‧‧基台 63‧‧‧Abutment

64‧‧‧振動抑制構件 64‧‧‧Vibration suppression components

70‧‧‧乾燥部 70‧‧‧Drying Department

80‧‧‧搬送機構 80‧‧‧Transportation agency

81‧‧‧捲出輥 81‧‧‧Rolling roll

82‧‧‧捲取輥 82‧‧‧Winding roller

83‧‧‧輔助輥 83‧‧‧Auxiliary roller

90‧‧‧控制部 90‧‧‧Control Department

圖1係表示組入有本發明之間歇式塗覆裝置之塗膜形成系統之整體構成之圖。 Fig. 1 is a view showing the overall configuration of a coating film forming system incorporating the batch coating apparatus of the present invention.

圖2係表示本發明之間歇式塗覆裝置之概略構成之圖。 Fig. 2 is a view showing a schematic configuration of a batch coating apparatus of the present invention.

圖3係表示本發明之間歇式塗覆裝置之一部分之概略構成之立體圖。 Fig. 3 is a perspective view showing a schematic configuration of a part of the batch coating apparatus of the present invention.

圖4係表示本發明之間歇式塗覆裝置之一部分之概略構成之立體圖。 Fig. 4 is a perspective view showing a schematic configuration of a part of the batch coating apparatus of the present invention.

圖5係表示本發明之間歇式塗覆裝置之一部分之概略構成之圖。 Fig. 5 is a view showing a schematic configuration of a part of the batch coating apparatus of the present invention.

以下,一面參照圖式一面對本發明之實施形態進行詳細說明。 Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

<塗膜形成系統之整體構成> <Overall composition of coating film forming system>

圖1係表示組入有本發明之間歇式塗覆裝置之塗膜形成系統1之 整體構成之圖。再者,於圖1及以下各圖中,為易於理解,視需要將各部分之尺寸或數誇張或簡化地描繪。 Figure 1 is a view showing a coating film forming system 1 incorporating the batch coating apparatus of the present invention. The overall composition of the map. Furthermore, in FIG. 1 and the following drawings, the size or number of each part may be exaggerated or simplified as needed for easy understanding.

該塗膜形成系統1係於作為基材之金屬箔上塗覆作為電極材料之活性物質之塗覆液,並進行該塗覆液之乾燥處理而進行鋰離子二次電池之電極製造的裝置。塗膜形成系統1包括間歇式塗覆裝置10、乾燥部70及搬送機構80。又,塗膜形成系統1包括管理系統整體之控制部90。 This coating film forming system 1 is a device which applies a coating liquid as an active material of an electrode material to a metal foil as a substrate, and performs drying treatment of the coating liquid to perform electrode production of a lithium ion secondary battery. The coating film forming system 1 includes a batch coating device 10, a drying unit 70, and a conveying mechanism 80. Further, the coating film forming system 1 includes a control unit 90 that manages the entire system.

基材5係作為鋰離子二次電池之集電體而發揮功能之金屬箔。於藉由塗膜形成系統1製造鋰離子二次電池之正極之情形時,可使用例如鋁箔(Al)作為基材5。又,於藉由塗膜形成系統1製造負極之情形時,可使用例如銅箔(Cu)作為基材5。基材5為長條之片狀金屬箔,其寬度及厚度並無特別限定,例如可設為寬度600mm~700mm、厚度10μm~20μm。 The substrate 5 is a metal foil that functions as a current collector of a lithium ion secondary battery. In the case where the positive electrode of the lithium ion secondary battery is manufactured by the coating film forming system 1, for example, an aluminum foil (Al) can be used as the substrate 5. Further, in the case where the negative electrode is produced by the coating film forming system 1, for example, a copper foil (Cu) can be used as the substrate 5. The base material 5 is a long sheet metal foil, and the width and thickness thereof are not particularly limited, and may be, for example, a width of 600 mm to 700 mm and a thickness of 10 μm to 20 μm.

長條之基材5藉由自捲出輥81送出並由捲取輥82捲取,而依序搬送至間歇式塗覆裝置10、乾燥部70。搬送機構80係包括該等捲出輥81、捲取輥82及複數之輔助輥83而構成。再者,輔助輥83之個數及配置位置並不限定於圖1之例,可視需要適當增減。 The long substrate 5 is fed from the take-up roll 81 and taken up by the take-up roll 82, and sequentially conveyed to the batch coating device 10 and the drying unit 70. The transport mechanism 80 includes the take-up rolls 81, the take-up rolls 82, and a plurality of auxiliary rolls 83. In addition, the number of the auxiliary rolls 83 and the arrangement position are not limited to the example of FIG. 1, and may be appropriately increased or decreased as needed.

乾燥部70進行藉由間歇式塗覆裝置10而形成於基材5上之塗覆液之塗膜之乾燥處理。乾燥部70對由搬送機構80搬送之基材5進行加熱,藉此使溶劑自塗覆液蒸發而進行乾燥處理。乾燥部70亦可包括例如使塗覆液之塗膜緩緩升溫之預熱部、使塗膜升溫至特定溫度而進行主要之加熱之主乾燥部、將塗膜加熱至更高溫而去除膜中之應變或殘留應力之退火部、使加熱後之塗膜冷卻之冷卻部等。 The drying unit 70 performs a drying process of the coating film of the coating liquid formed on the substrate 5 by the batch coating device 10. The drying unit 70 heats the substrate 5 conveyed by the conveying mechanism 80, thereby evaporating the solvent from the coating liquid to perform drying treatment. The drying unit 70 may include, for example, a preheating portion that gradually raises the coating film of the coating liquid, a main drying portion that heats the coating film to a specific temperature to perform main heating, and heats the coating film to a higher temperature to remove the film. An annealing portion for strain or residual stress, a cooling portion for cooling the coating film after heating, and the like.

<塗覆裝置> <Coating device>

圖2係表示本發明之間歇式塗覆裝置10之概略構成之圖。間歇式塗覆裝置10包括塗覆噴嘴11、貯存槽20、供給配管30、37及循環配管 40作為主要之元件。貯存槽20貯存作為鋰離子二次電池之電極材料之活性物質之溶液作為塗覆液。於藉由塗膜形成系統1製造正極之情形時,作為正極材料之塗覆液,例如貯存作為正極活性物質之鈷酸鋰(LiCoO2)、作為導電助劑之碳(C)、作為黏合劑之聚偏二氟乙烯(PVDF)、作為溶劑之N-甲基-2-吡咯啶酮(NMP)之混合液。亦可代替鈷酸鋰而使用鎳酸鋰(LiNiO2)、錳酸鋰(LiMn2O4)、磷酸鐵鋰(LiFePO4)等作為正極活性物質。 Fig. 2 is a view showing a schematic configuration of a batch coating apparatus 10 of the present invention. The batch coating device 10 includes a coating nozzle 11, a storage tank 20, supply pipes 30, 37, and a circulation pipe 40 as main components. The storage tank 20 stores a solution of an active material as an electrode material of a lithium ion secondary battery as a coating liquid. In the case where the positive electrode is produced by the coating film forming system 1, the coating liquid as the positive electrode material stores, for example, lithium cobaltate (LiCoO 2 ) as a positive electrode active material, carbon (C) as a conductive auxiliary agent, and a binder. A mixture of polyvinylidene fluoride (PVDF) and N-methyl-2-pyrrolidone (NMP) as a solvent. Lithium nickelate (LiNiO 2 ), lithium manganate (LiMn 2 O 4 ), lithium iron phosphate (LiFePO 4 ), or the like may be used as the positive electrode active material instead of lithium cobaltate.

另一方面,於藉由塗膜形成系統1製造負極之情形時,作為負極材料之塗覆液,例如將作為負極活性物質之石墨(graphite)、作為黏合劑之PVDF、作為溶劑之NMP之混合液貯存於貯存槽20。亦可代替石墨而使用硬碳、鈦酸鋰(Li4Ti5O12)、矽合金、錫合金等作為負極活性物質。又,於正極材料及負極材料兩者中,可代替PVDF而使用苯乙烯-丁二烯橡膠(SBR)等作為黏合劑,可代替NMP而使用水(H2O)等作為溶劑。進而,於使用SBR作為黏合劑、使用水作為溶劑之情形時,亦可併用羧甲基纖維素(CMC)作為增黏劑。該等正極材料及負極材料之塗覆液為分散有固體(微粒子)之漿料,其黏度均為1Pa.s(帕斯卡秒)以上,通常具有搖變性。 On the other hand, in the case where the negative electrode is produced by the coating film forming system 1, the coating liquid as the negative electrode material is, for example, a graphite as a negative electrode active material, a PVDF as a binder, and a NMP as a solvent. The liquid is stored in the storage tank 20. Instead of graphite, hard carbon, lithium titanate (Li 4 Ti 5 O 12 ), a ruthenium alloy, a tin alloy or the like may be used as the negative electrode active material. Further, in the positive electrode material and the negative electrode material, styrene-butadiene rubber (SBR) or the like may be used as the binder instead of PVDF, and water (H 2 O) or the like may be used as the solvent instead of NMP. Further, when SBR is used as a binder and water is used as a solvent, carboxymethylcellulose (CMC) may be used in combination as a tackifier. The coating liquid of the positive electrode material and the negative electrode material is a slurry in which solid (fine particles) are dispersed, and the viscosity thereof is 1 Pa. Above s (Pascal seconds), usually with shaking.

亦可於貯存槽20附設攪拌機及空氣加壓單元等。攪拌機攪拌貯存於貯存槽20之塗覆液而將濃度分佈均勻化。空氣加壓單元將高壓之空氣送入至貯存槽20內之氣相部分而將所貯存之塗覆液之液面加壓。 A mixer, an air pressurizing unit, and the like may be attached to the storage tank 20. The mixer agitates the coating liquid stored in the storage tank 20 to homogenize the concentration distribution. The air pressurizing unit feeds the high pressure air into the gas phase portion in the storage tank 20 to pressurize the liquid level of the stored coating liquid.

貯存槽20與塗覆噴嘴11係藉由供給配管30、37而連通連接。供給配管37朝向供給閥32供給貯存於貯存槽20之塗覆液。供給配管30朝向塗覆噴嘴11供給來自供給閥32之塗覆液。作為供給配管30、37,可使用不鏽鋼管或樹脂管(包含軟性配管,下同)。於供給配管37之路徑中途介插有泵31,於供給配管30之路徑中途介插有過濾器33及注射器36。又,自供給配管37之路徑中途分支而設置有循環配管40。循環配 管40之基端側係於較泵31更下游側(靠近塗覆噴嘴11之側)之位置連接於供給配管37,前端側係連接於貯存槽20。 The storage tank 20 and the coating nozzle 11 are connected in communication by the supply pipes 30 and 37. The supply pipe 37 supplies the coating liquid stored in the storage tank 20 toward the supply valve 32. The supply pipe 30 supplies the coating liquid from the supply valve 32 toward the coating nozzle 11. As the supply pipes 30 and 37, a stainless steel pipe or a resin pipe (including a soft pipe, the same applies hereinafter) can be used. A pump 31 is inserted in the middle of the path of the supply pipe 37, and a filter 33 and a syringe 36 are inserted in the middle of the path of the supply pipe 30. Moreover, the circulation piping 40 is provided in the middle of the path of the supply piping 37. Cycle matching The proximal end side of the tube 40 is connected to the supply pipe 37 at a position on the downstream side of the pump 31 (the side close to the coating nozzle 11), and the front end side is connected to the storage tank 20.

泵31係設置於較循環配管40之連接部位更上游側(靠近貯存槽20之側),且藉由控制部90予以控制,將貯存於貯存槽20之電極材料之塗覆液壓送至供給配管37。供給閥32藉由控制部90予以控制,重複開啟及關閉供給配管30之流路。藉此,重複切換塗覆液向塗覆噴嘴11之供給/停止。過濾器33係介插於供給閥32和供給配管30之路徑上之與循環配管40之連接部位之間,自於供給配管30中朝向塗覆噴嘴11流動之塗覆液中去除異物。注射器36係設置於供給閥32與塗覆噴嘴11之間。注射器36藉由控制部90而控制,於關閉供給閥32時自供給配管30抽入塗覆液。藉此,可迅速停止自塗覆噴嘴11噴出塗覆液。 The pump 31 is disposed on the upstream side of the connection portion of the circulation pipe 40 (on the side closer to the storage tank 20), and is controlled by the control unit 90 to supply the coating hydraulic pressure of the electrode material stored in the storage tank 20 to the supply pipe. 37. The supply valve 32 is controlled by the control unit 90 to repeatedly open and close the flow path of the supply pipe 30. Thereby, the supply/stop of the coating liquid to the coating nozzle 11 is repeatedly switched. The filter 33 is interposed between the supply valve 32 and the supply pipe 30 at a connection point with the circulation pipe 40, and removes foreign matter from the coating liquid flowing toward the coating nozzle 11 in the supply pipe 30. The syringe 36 is disposed between the supply valve 32 and the coating nozzle 11. The syringe 36 is controlled by the control unit 90, and the coating liquid is drawn from the supply pipe 30 when the supply valve 32 is closed. Thereby, the coating liquid can be quickly stopped from being sprayed from the coating nozzle 11.

塗覆噴嘴11係沿著基材5之寬度方向設置有狹縫狀之噴出口11a之狹縫噴嘴。塗覆噴嘴11係經由供給配管37、30而將所傳送之塗覆液自噴出口11a塗覆至於由支承輥12推壓支持之狀態下移行之基材5之表面。於塗覆噴嘴11設置有調整支承輥12與噴出口11a之間隔之噴嘴用移動機構51及規定姿勢之姿勢調整機構(省略圖示)。 The coating nozzle 11 is a slit nozzle in which a slit-shaped discharge port 11a is provided along the width direction of the substrate 5. The coating nozzle 11 applies the transferred coating liquid from the discharge port 11a to the surface of the substrate 5 which is moved in a state of being supported by the backup roll 12 via the supply pipes 37 and 30. The coating nozzle 11 is provided with a nozzle moving mechanism 51 that adjusts the distance between the backup roller 12 and the discharge port 11a, and a posture adjusting mechanism (not shown) that defines a posture.

自供給配管37之路徑中途分支而設置之循環配管40之前端側係連接於貯存槽20。與供給配管30、37同樣地,作為循環配管40,亦可使用不鏽鋼管或樹脂管。循環配管40使自貯存槽20送出並自供給配管30流入之塗覆液回流至貯存槽20。於循環配管40介插有循環閥41及過濾器43。循環閥41藉由控制部90而控制,開啟及關閉循環配管40之流路。過濾器43係設置於循環閥41與貯存槽20之間,自循環配管40中朝向貯存槽20流動之塗覆液中去除異物。 The front end side of the circulation pipe 40 which is provided in the middle of the path from the supply pipe 37 is connected to the storage tank 20. Similarly to the supply pipes 30 and 37, a stainless steel pipe or a resin pipe can be used as the circulation pipe 40. The circulation pipe 40 returns the coating liquid sent from the storage tank 20 and flowing in from the supply pipe 30 to the storage tank 20. A circulation valve 41 and a filter 43 are inserted into the circulation pipe 40. The circulation valve 41 is controlled by the control unit 90 to open and close the flow path of the circulation pipe 40. The filter 43 is disposed between the circulation valve 41 and the storage tank 20, and removes foreign matter from the coating liquid flowing from the circulation pipe 40 toward the storage tank 20.

若關閉循環閥41並且打開供給閥32,則自貯存槽20送出之塗覆液遍及供給配管37、30之整體而流動,且供給至塗覆噴嘴11。 When the circulation valve 41 is closed and the supply valve 32 is opened, the coating liquid sent from the storage tank 20 flows over the entire supply pipes 37 and 30 and is supplied to the coating nozzle 11.

另一方面,若關閉供給閥32並且打開循環閥41,則自貯存槽20 送出之塗覆液流動至供給配管37之中途並流入至循環配管40,再次回流至貯存槽20。即,供給閥32係藉由重複切換自貯存器件送入之塗覆液經由供給配管30向塗覆噴嘴11之送出/停止,而作為使塗覆液自塗覆噴嘴11間歇地噴出之切換器件發揮功能。 On the other hand, if the supply valve 32 is closed and the circulation valve 41 is opened, the self-storage tank 20 is The supplied coating liquid flows into the supply pipe 37 and flows into the circulation pipe 40, and is again returned to the storage tank 20. In other words, the supply valve 32 is a switching device that intermittently switches the coating liquid fed from the storage device to the coating nozzle 11 via the supply pipe 30 as a switching device for intermittently ejecting the coating liquid from the coating nozzle 11. Play the function.

又,伴隨供給閥32之關閉,注射器36自供給配管30抽吸塗覆液。藉此,噴出口11a之塗覆液被抽吸至供給閥32側,而抑制塗覆液之滴落。 Further, the syringe 36 sucks the coating liquid from the supply pipe 30 in association with the closing of the supply valve 32. Thereby, the coating liquid of the discharge port 11a is sucked to the supply valve 32 side, and the dripping of the coating liquid is suppressed.

供給閥32及循環閥41之開啟及關閉之時序係由控制部90適當地控制,藉由重複切換該開啟及關閉而於基材5之特定位置以特定寬度間歇地塗佈塗覆液。 The timing of opening and closing of the supply valve 32 and the circulation valve 41 is appropriately controlled by the control unit 90, and the coating liquid is intermittently applied at a specific width of the substrate 5 at a specific position of the substrate 5 by repeatedly switching the opening and closing.

又,於圖2之例示中,附設有壓力計35。壓力計35例如於與循環配管40之連接部位和泵31之間之位置設置於供給配管37。壓力計35所計測之測定值係輸出至控制部90。控制部90例如能以該壓力成為所需之值之方式控制泵31之驅動速度(旋轉速度)。 Further, in the example of Fig. 2, a pressure gauge 35 is attached. The pressure gauge 35 is provided in the supply pipe 37 at a position between the connection portion with the circulation pipe 40 and the pump 31, for example. The measured value measured by the pressure gauge 35 is output to the control unit 90. The control unit 90 can control the driving speed (rotation speed) of the pump 31 such that the pressure becomes a desired value.

且說,於間歇式塗覆裝置中,如上所述,藉由對設置於供給配管30之基端之供給閥32進行開關控制而控制自設置於供給配管30之前端之塗覆噴嘴11之間歇式塗覆。又,於關閉供給閥32時,注射器36自供給配管30抽入塗覆液,藉此迅速停止自塗覆噴嘴11之噴出。 In the batch coating apparatus, as described above, the intermittent control of the coating nozzle 11 provided at the front end of the supply pipe 30 is controlled by switching the supply valve 32 provided at the base end of the supply pipe 30. Coating. Further, when the supply valve 32 is closed, the syringe 36 draws in the coating liquid from the supply pipe 30, thereby rapidly stopping the discharge from the coating nozzle 11.

由此,供給配管30之配管長度會對間歇式塗覆之回應性造成影響。此處所謂之回應性係指供給閥32之開啟/關閉至塗覆液自塗覆噴嘴11之噴出/停止之時間上之回應性。配管長度越長,該回應性越低。更詳細地說明其原因,則為於供給配管30中流動之塗覆液包含微小氣泡,該微小氣泡發揮緩衝之作用,導致不易抽入會自塗覆噴嘴11滴落之塗覆液。而且,配管長度越長,包含越多微小氣泡,故而更不易抽入塗覆液。因此,於關閉供給閥32時,即便注射器36已抽入塗覆液,於配管長度較長之情形時塗覆液亦可能自塗覆噴嘴11滴落。因 此,回應性劣化。 Thereby, the length of the piping of the supply piping 30 affects the responsiveness of the intermittent coating. The responsiveness herein refers to the responsiveness of the opening/closing of the supply valve 32 to the time when the coating liquid is ejected/stopped from the coating nozzle 11. The longer the length of the pipe, the lower the responsiveness. The reason for this is that the coating liquid flowing in the supply pipe 30 contains fine bubbles which act as a buffer, and it is difficult to draw in the coating liquid which dripped from the coating nozzle 11. Further, the longer the length of the pipe, the more fine bubbles are contained, so that it is less likely to draw in the coating liquid. Therefore, when the supply valve 32 is closed, even if the syringe 36 has drawn in the coating liquid, the coating liquid may drip from the coating nozzle 11 when the length of the piping is long. because Therefore, the responsiveness deteriorates.

又,伴隨設置於供給配管30之基端之供給閥32之開啟及關閉而產生的塗覆液之壓力變化傳遞至設置於供給配管30之前端之塗覆噴嘴11需耗費時間,該情況亦可作為回應性劣化之因素加以探討。就該觀點而言,亦為供給配管30越長則回應性越劣化。 Further, it takes time to transmit the pressure change of the coating liquid generated by the opening and closing of the supply valve 32 provided at the proximal end of the supply pipe 30 to the coating nozzle 11 provided at the front end of the supply pipe 30. As a factor of responsive deterioration. From this point of view, the longer the supply piping 30 is, the more the responsiveness deteriorates.

而且,於間歇式塗覆裝置中,塗覆液自塗覆噴嘴11之噴出/停止之時序會對塗膜之形成位置及形狀造成影響,故而較理想為回應性較高。因此,於間歇式塗覆裝置中,供給閥32與塗覆噴嘴11之間之距離設定為較短。 Further, in the batch coating apparatus, the timing at which the coating liquid is ejected/stopped from the coating nozzle 11 affects the position and shape of the coating film, and therefore it is preferable to have high responsiveness. Therefore, in the batch coating apparatus, the distance between the supply valve 32 and the coating nozzle 11 is set to be short.

如上所述,於間歇式塗覆裝置中供給閥32與塗覆噴嘴11之間之距離設定為較短,故而通常供給閥32與塗覆噴嘴11載置於同一基座。 As described above, in the batch coating apparatus, the distance between the supply valve 32 and the coating nozzle 11 is set to be short, so that the supply valve 32 and the coating nozzle 11 are normally placed on the same susceptor.

圖3係表示間歇式塗覆裝置之一部分之一例之模式性立體圖。於圖3中,為便於看圖,而省略貯存槽20、泵31、過濾器33、43、壓力計35、注射器36及移動機構51、61。 Fig. 3 is a schematic perspective view showing an example of a part of a batch coating device. In Fig. 3, the storage tank 20, the pump 31, the filters 33, 43, the pressure gauge 35, the syringe 36, and the moving mechanisms 51, 61 are omitted for convenience of viewing.

雖有上述情況,但於本實施形態中,如圖3所示,供給閥32及塗覆噴嘴11分別載置於獨立個體之閥基座60及噴嘴基座50。噴嘴基座50與閥基座60相互隔開。 In the above embodiment, as shown in FIG. 3, the supply valve 32 and the coating nozzle 11 are placed on the valve base 60 and the nozzle base 50 of the individual bodies, respectively. The nozzle base 50 and the valve base 60 are spaced apart from each other.

且說,由於供給閥32之開啟及關閉會伴隨機械性動作,故而供給閥32因重複之開啟及關閉動作而產生振動。該開啟及關閉之切換例如於1秒鐘進行數次以上,故而會產生數Hz以上之振動。 Further, since the opening and closing of the supply valve 32 is accompanied by a mechanical operation, the supply valve 32 is vibrated by repeated opening and closing operations. The switching between the opening and closing is performed several times or more, for example, in one second, so that vibrations of several Hz or more are generated.

然而,於本實施形態中,載置供給閥32之閥基座60與載置塗覆噴嘴11之噴嘴基座50為獨立個體。因此,與將供給閥32及塗覆噴嘴11載置於同一基座之構造相比,可抑制自供給閥32經由基座向塗覆噴嘴11傳遞之振動。 However, in the present embodiment, the valve base 60 on which the supply valve 32 is placed and the nozzle base 50 on which the coating nozzle 11 is placed are independent members. Therefore, vibration transmitted from the supply valve 32 to the coating nozzle 11 via the susceptor can be suppressed as compared with a configuration in which the supply valve 32 and the coating nozzle 11 are placed on the same susceptor.

假設塗覆噴嘴11振動,則會使關於塗覆膜(亦稱為塗膜)之形狀之精度降低,而於本實施形態中可抑制塗覆噴嘴11之振動,因此可抑制 該精度之降低。換言之,可降低為提高塗覆膜之形狀之精度而採用不易振動之閥作為供給閥32之必要性,而可採用更廉價之閥。 Assuming that the coating nozzle 11 vibrates, the accuracy with respect to the shape of the coating film (also referred to as a coating film) is lowered, and in the present embodiment, the vibration of the coating nozzle 11 can be suppressed, thereby suppressing This precision is reduced. In other words, it is possible to reduce the accuracy of the shape of the coating film and to use a valve that is not easily vibrated as the supply valve 32, and a cheaper valve can be employed.

再者,如上所述,循環閥41於打開供給閥32時關閉,於關閉供給閥32時打開,故而循環閥41亦產生與供給閥32同樣之振動。因此,較理想為如圖3所示,循環閥41亦載置於與噴嘴基座50為獨立個體之基座。藉此,可抑制來自供給閥32及循環閥41之振動傳遞至塗覆噴嘴11。於圖3之例示中,供給閥32及循環閥41載置於同一閥基座60。 Further, as described above, the circulation valve 41 is closed when the supply valve 32 is opened, and is opened when the supply valve 32 is closed. Therefore, the circulation valve 41 also generates vibration similar to that of the supply valve 32. Therefore, it is preferable that the circulation valve 41 is also placed on the base of the individual body separate from the nozzle base 50 as shown in FIG. Thereby, the vibration from the supply valve 32 and the circulation valve 41 can be suppressed from being transmitted to the coating nozzle 11. In the example of FIG. 3, the supply valve 32 and the circulation valve 41 are placed on the same valve base 60.

又,噴嘴基座50及閥基座60既可安裝於共用之基台,亦可分別安裝於獨立個體之基台。即便為前者,亦由於噴嘴基座50與基台為獨立個體,且閥基座60與基台為獨立個體,故而與其等為一體之情形相比,可抑制自供給閥32、或進而自循環閥41向塗覆噴嘴11傳遞之振動。 Further, the nozzle base 50 and the valve base 60 may be attached to a common base or may be attached to a separate base. Even in the former case, since the nozzle base 50 and the base are independent individuals, and the valve base 60 and the base are independent individuals, the self-supply valve 32 or the self-circulation can be suppressed as compared with the case where it is integrated. The vibration transmitted by the valve 41 to the coating nozzle 11 is transmitted.

又,注射器36可設置於噴嘴基座50及閥基座60之任一者。就回應性之觀點而言,注射器36較理想為設置於塗覆噴嘴11附近,故而較理想為設置於噴嘴基座50。另一方面,由於利用注射器36進行之塗覆液之抽入亦伴隨著機械性動作,故而就抑制振動之觀點而言,注射器36亦可設置於閥基座60。 Further, the syringe 36 may be provided in any one of the nozzle base 50 and the valve base 60. From the viewpoint of responsiveness, the syringe 36 is preferably disposed in the vicinity of the coating nozzle 11, and is preferably disposed on the nozzle base 50. On the other hand, since the drawing of the coating liquid by the syringe 36 is accompanied by mechanical action, the syringe 36 may be provided in the valve base 60 from the viewpoint of suppressing vibration.

<移動機構> <moving mechanism>

如上所述,於塗覆噴嘴11設置有用以進行相對於支承輥12之位置調整之噴嘴用移動機構51(參照圖2)。作為噴嘴用移動機構51,例如可採用可雙軸移動且主動地受到控制之公知之移動機構。噴嘴用移動機構51係安裝於噴嘴基座50並使噴嘴基座50移動。藉此,相對於噴嘴基座50位置固定之塗覆噴嘴11亦會移動。例如藉由使塗覆噴嘴11遠離支承輥12而擴大其等之間之空間,進行塗覆噴嘴11之維護。 As described above, the coating nozzle 11 is provided with a nozzle moving mechanism 51 (see FIG. 2) for performing position adjustment with respect to the backup roller 12. As the nozzle moving mechanism 51, for example, a known moving mechanism that can be biaxially moved and actively controlled can be employed. The nozzle moving mechanism 51 is attached to the nozzle base 50 to move the nozzle base 50. Thereby, the coating nozzle 11 fixed in position with respect to the nozzle base 50 also moves. Maintenance of the coating nozzle 11 is performed, for example, by expanding the space between the coating nozzles 11 away from the backup roller 12 and the like.

於間歇式塗覆裝置中,為提高回應性,必須較短地設定供給閥32與塗覆噴嘴之間之距離。即,較短地設定供給配管30之配管長度。 然而,為使得於供給閥32之位置被固定之狀態下可靈活地移動塗覆噴嘴11,而考慮將軟性配管作為供給配管30,但配管長度較短之軟性配管通常可撓性較低。因此,會縮小可用作供給配管30之配管之種類,導致成本增加。 In the batch coating apparatus, in order to improve the responsiveness, the distance between the supply valve 32 and the coating nozzle must be set short. That is, the length of the piping of the supply pipe 30 is set short. However, in order to allow the coating nozzle 11 to be flexibly moved while the position of the supply valve 32 is fixed, it is conceivable to use the flexible piping as the supply piping 30, but the flexible piping having a short piping length is generally low in flexibility. Therefore, the kind of piping that can be used as the supply pipe 30 is reduced, resulting in an increase in cost.

圖4係表示間歇式塗覆裝置之一部分之一例之立體圖。於圖4中,與圖3同樣地為便於看圖而適當省略各構成。於本實施形態中,較理想為如圖1、4所例示般,設置有用以移動供給閥32之閥用移動機構61。閥用移動機構61例如安裝於閥基座60,且可移動閥基座60。藉此,相對於閥基座60位置固定之供給閥32亦可移動。 Fig. 4 is a perspective view showing an example of a part of a batch coating apparatus. In FIG. 4, similarly to FIG. 3, each structure is abbreviate|omitted suitably, and is easy to see. In the present embodiment, it is preferable to provide a valve moving mechanism 61 for moving the supply valve 32 as exemplified in Figs. The valve moving mechanism 61 is attached to the valve base 60, for example, and can move the valve base 60. Thereby, the supply valve 32 fixed in position with respect to the valve base 60 can also be moved.

又,閥用移動機構61使供給閥32向與噴嘴用移動機構51之移動方向相同之方向移動。換言之,閥用移動機構61使供給閥32追隨塗覆噴嘴11之移動而移動。藉此,可一面抑制塗覆噴嘴11與供給閥32之相對位置之變動,一面使塗覆噴嘴11移動。因此,可抑制伴隨塗覆噴嘴11之移動而產生之供給配管30之彎曲應力。 Further, the valve moving mechanism 61 moves the supply valve 32 in the same direction as the moving direction of the nozzle moving mechanism 51. In other words, the valve moving mechanism 61 moves the supply valve 32 following the movement of the coating nozzle 11. Thereby, the coating nozzle 11 can be moved while suppressing the fluctuation of the relative position between the coating nozzle 11 and the supply valve 32. Therefore, the bending stress of the supply pipe 30 caused by the movement of the coating nozzle 11 can be suppressed.

由此,可採用例如形狀固定之配管(例如不鏽鋼之配管)作為供給配管30。又,即便為軟性配管,亦可採用配管長度較短而相對不易彎曲者。即,能增大可採用之配管之種類。 Thus, for example, a pipe having a fixed shape (for example, a pipe of stainless steel) can be employed as the supply pipe 30. Moreover, even if it is a soft piping, the length of piping may be short and it is relatively difficult to bend. That is, it is possible to increase the type of piping that can be used.

再者,例如於圖4之例示中,供給配管30彎曲成大致直角。於本間歇式塗覆裝置中,由於塗覆噴嘴11與供給閥32之間之距離較短,故而供給配管30必須以非常小之曲率半徑彎曲。如此要以較小之曲率半徑將軟性配管彎曲,對通常流通之軟性配管而言較難。由此,於此情形時,較理想為採用例如不鏽鋼等形狀固定之配管,且為預先製造成彎曲之形狀之配管。換言之,藉由使用閥用移動機構61,可採用形狀固定之配管作為供給配管30,藉此,與採用軟性配管之情形相比,可提高供給閥32及塗覆噴嘴11之設置自由度。 Further, for example, in the example of Fig. 4, the supply pipe 30 is bent at a substantially right angle. In the intermittent coating apparatus, since the distance between the coating nozzle 11 and the supply valve 32 is short, the supply pipe 30 must be bent with a very small radius of curvature. In this way, it is difficult to bend the flexible pipe with a small radius of curvature, which is difficult for a soft pipe that is normally circulated. Therefore, in this case, it is preferable to use a pipe fixed in a shape such as stainless steel, and a pipe which is previously formed into a curved shape. In other words, by using the valve moving mechanism 61, a pipe having a fixed shape can be used as the supply pipe 30, whereby the degree of freedom in providing the supply valve 32 and the coating nozzle 11 can be improved as compared with the case of using a flexible pipe.

又,於本實施形態中供給閥32會移動,故而供給配管30之上游 側之元件(例如貯存槽20或泵31等)與供給閥32之位置關係會變動。由此,該元件與供給閥32之間之配管較理想為採用軟性配管。然而,於較供給閥32更上游側,就提高間歇式塗覆之回應性之觀點而言,限制配管之長度之必要性較小。因此,可將於較供給閥32更上游側所採用之軟性配管之長度設定為足夠長。由於可如此較長地設定初始狀態之配管長度,故而即便供給閥32移動,於該軟性配管產生之彎曲應力亦較小。因此,即便固定該元件之位置亦不會產生問題。 Further, in the present embodiment, the supply valve 32 moves, so that the supply pipe 30 is upstream. The positional relationship between the components on the side (e.g., storage tank 20 or pump 31, etc.) and supply valve 32 may vary. Therefore, it is preferable that the piping between the element and the supply valve 32 is a flexible piping. However, on the upstream side of the supply valve 32, the necessity of limiting the length of the piping is small from the viewpoint of improving the responsiveness of the intermittent coating. Therefore, the length of the flexible piping to be used on the upstream side of the supply valve 32 can be set to be sufficiently long. Since the length of the piping in the initial state can be set so long, even if the supply valve 32 moves, the bending stress generated in the flexible piping is small. Therefore, there is no problem even if the position of the component is fixed.

<閥用移動機構之具體例> <Specific example of valve moving mechanism>

閥用移動機構61只要採用發揮追隨噴嘴用移動機構51之移動之追隨功能之任意移動機構即可。例如於噴嘴用移動機構51及閥用移動機構61為藉由控制部90而控制之公知之移動機構之情形時,閥用移動機構61之追隨功能亦可由控制部90實現。或者,亦可藉由使噴嘴用移動機構51與閥用移動機構61機械性地連動而實現閥用移動機構61。 The valve moving mechanism 61 may be any moving mechanism that functions to follow the movement of the nozzle moving mechanism 51. For example, when the nozzle moving mechanism 51 and the valve moving mechanism 61 are known moving mechanisms controlled by the control unit 90, the following function of the valve moving mechanism 61 can be realized by the control unit 90. Alternatively, the valve moving mechanism 61 may be realized by mechanically interlocking the nozzle moving mechanism 51 and the valve moving mechanism 61.

然而,較理想為噴嘴用移動機構51使噴嘴基座50於水平方向移動,且閥用移動機構61可使供給閥32向任意之水平方向自由地移動。根據此種閥用移動機構51,塗覆噴嘴11之移動經由供給配管30而傳遞至供給閥32,藉此供給閥32向與塗覆噴嘴11之移動方向相同之方向移動。 However, it is preferable that the nozzle moving mechanism 51 moves the nozzle base 50 in the horizontal direction, and the valve moving mechanism 61 can freely move the supply valve 32 in an arbitrary horizontal direction. According to the valve moving mechanism 51, the movement of the coating nozzle 11 is transmitted to the supply valve 32 via the supply pipe 30, whereby the supply valve 32 moves in the same direction as the moving direction of the coating nozzle 11.

作為閥用移動機構61,可採用輥構造。該輥構造具有特定之轉動體(例如球體等),且該轉動體設置於閥基座60與基台63之間。又,該轉動體可旋轉地固定於閥基座60,藉由該轉動體轉動,閥基座60可相對於基台63向任意之水平方向自由地移動。再者,轉動體亦能夠可旋轉地固定於基台63。 As the valve moving mechanism 61, a roller structure can be employed. The roller structure has a specific rotating body (for example, a ball or the like), and the rotating body is disposed between the valve base 60 and the base 63. Further, the rotating body is rotatably fixed to the valve base 60, and by rotating the rotating body, the valve base 60 is freely movable in any horizontal direction with respect to the base 63. Furthermore, the rotor can also be rotatably fixed to the base 63.

若採用此種閥用移動機構61,則於進行間歇式塗覆時,供給閥32伴隨自身之開啟及關閉動作而於水平方向自由地移動。由此,伴隨供給閥32之開啟及關閉之振動能量作為供給閥32之水平運動而被消 耗,因此向供給配管30側傳遞之振動亦被抑制。且說,就抑制經由供給配管30傳遞振動之觀點而言亦可採用軟性配管,而此處由於如上所述般向供給配管30傳遞之振動被抑制,因此亦可採用剛性更高之例如由不鏽鋼等所形成之配管。 When such a valve moving mechanism 61 is used, when the intermittent coating is performed, the supply valve 32 is freely moved in the horizontal direction with its own opening and closing operation. Thereby, the vibration energy accompanying the opening and closing of the supply valve 32 is eliminated as the horizontal movement of the supply valve 32. Since it is consumed, the vibration transmitted to the side of the supply pipe 30 is also suppressed. In addition, it is also possible to use a flexible pipe from the viewpoint of suppressing transmission of vibration through the supply pipe 30. However, since the vibration transmitted to the supply pipe 30 as described above is suppressed, it is also possible to use a stainless steel such as stainless steel. The piping formed.

又,由於供給閥32於水平方向自由地移動,故而與供給閥32被固定之情形相比,亦可抑制自供給閥32向閥基座60側(以及基台63側)傳遞之振動。因此,可進一步減少振動經由基台63傳遞至塗覆噴嘴11。又,亦可添加將噴嘴基座50與閥基座60之間利用具有可撓性之支撐構件連結連接之構成。 Further, since the supply valve 32 is freely movable in the horizontal direction, vibration transmitted from the supply valve 32 to the valve base 60 side (and the base 63 side) can be suppressed as compared with the case where the supply valve 32 is fixed. Therefore, vibration can be further reduced to be transmitted to the coating nozzle 11 via the base 63. Further, a configuration may be adopted in which the nozzle base 50 and the valve base 60 are connected and connected by a flexible supporting member.

又,可無需進行噴嘴用移動機構51與閥用移動機構61之位置對準。為更詳細地進行說明,例如考慮採用可單向地移動之移動機構作為噴嘴用移動機構51及閥用移動機構61。此時,為不使塗覆噴嘴11與供給閥32之相對位置變動地使塗覆噴嘴11移動,必須將噴嘴用移動機構51與閥用移動機構61精度良好地平行配置。然而,於圖4之例示中,閥用移動機構61可向任意之水平方向自由地移動。由此,即便不進行位置對準,只要使塗覆噴嘴11移動,該移動力便經由供給配管30傳遞至供給閥32,從而供給閥32向與塗覆噴嘴11相同之方向移動。由此,可提高安裝閥用移動機構61時之作業性。 Further, it is not necessary to align the position of the nozzle moving mechanism 51 and the valve moving mechanism 61. For a more detailed description, for example, a moving mechanism that can move in one direction is used as the nozzle moving mechanism 51 and the valve moving mechanism 61. At this time, in order to move the coating nozzle 11 without changing the relative positions of the coating nozzle 11 and the supply valve 32, it is necessary to arrange the nozzle moving mechanism 51 and the valve moving mechanism 61 in parallel with high precision. However, in the illustration of Fig. 4, the valve moving mechanism 61 is freely movable in any horizontal direction. Thereby, even if the coating nozzle 11 is not moved, the moving force is transmitted to the supply valve 32 via the supply pipe 30, and the supply valve 32 is moved in the same direction as the coating nozzle 11. Thereby, the workability when the valve moving mechanism 61 is attached can be improved.

再者,於圖4之例示中,設置有3個閥用移動機構61,且該3個閥用移動機構61分別於3個部位支持閥基座60。假設於4個以上之部位支持閥基座60,則閥基座60會因閥用移動機構61之高度之偏差而晃動,而此處係於3個部位予以支持,因此可避免該晃動。 Further, in the example of FIG. 4, three valve moving mechanisms 61 are provided, and the three valve moving mechanisms 61 support the valve base 60 at three locations. If the valve base 60 is supported at four or more locations, the valve base 60 is shaken by the deviation of the height of the valve moving mechanism 61, and is supported at three locations here, so that the sway can be avoided.

又,閥用移動機構61並不限於輥構造,亦可具有可於水平方向橫向滑動之一對板構件。例如藉由使一對板構件之接合面以較低之摩擦係數接觸,而使一對板構件可相對地橫向滑動。該板構件之一者固定於閥基座60之下表面,另一者固定於基台63之上表面。藉此,閥基 座60可相對於基台63向任意之水平方向自由地移動。 Further, the valve moving mechanism 61 is not limited to the roller structure, and may have a pair of plate members that can slide laterally in the horizontal direction. The pair of plate members are slidable relative to each other, for example, by bringing the joint faces of the pair of plate members into contact with a lower coefficient of friction. One of the plate members is fixed to the lower surface of the valve base 60, and the other is fixed to the upper surface of the base 63. Thereby, the valve base The seat 60 is free to move in any horizontal direction with respect to the base 63.

然而,若採用輥構造,則轉動體與閥基座60或基台63之接觸面積較小,因此其等不易磨耗。由此,壽命相對較長。 However, if the roller structure is employed, the contact area between the rotor and the valve base 60 or the base 63 is small, so that it is less likely to be worn. Thus, the life is relatively long.

<振動抑制構件> <Vibration suppression member>

亦可設置抑制自供給閥32向塗覆噴嘴11傳遞振動之振動抑制構件。例如作為振動抑制構件64,可使用由橡膠、凝膠狀素材、或發泡苯乙烯等形成並吸收振動之構件。圖5係簡略地表示支持供給閥32之部分之概略構成之圖。於圖5之例示中,振動抑制構件64具有板狀之形狀,介插於供給閥32與閥基座60之間。藉此,可抑制振動自供給閥32傳遞至閥基座60,而可進一步抑制自供給閥32向塗覆噴嘴11傳遞振動。或者,振動抑制構件亦可設置於閥基座60與基台63之間(閥基座60與閥用移動機構61之間、或閥用移動機構61與基台63之間)。藉此,亦可抑制振動。 A vibration suppressing member that suppresses transmission of vibration from the supply valve 32 to the coating nozzle 11 may be provided. For example, as the vibration suppression member 64, a member formed of rubber, a gel-like material, or foamed styrene or the like and absorbing vibration can be used. Fig. 5 is a view schematically showing a schematic configuration of a portion supporting the supply valve 32. In the example of FIG. 5, the vibration suppression member 64 has a plate shape and is interposed between the supply valve 32 and the valve base 60. Thereby, vibration can be suppressed from being transmitted from the supply valve 32 to the valve base 60, and vibration can be further suppressed from being transmitted from the supply valve 32 to the coating nozzle 11. Alternatively, the vibration suppressing member may be provided between the valve base 60 and the base 63 (between the valve base 60 and the valve moving mechanism 61 or between the valve moving mechanism 61 and the base 63). Thereby, vibration can also be suppressed.

再者,圖4、5所示之可向任意之水平方向自由地移動之閥用移動機構61由於抑制振動傳遞,故而亦可理解成振動抑制構件之1種。 Further, the valve moving mechanism 61 that can be freely moved in any horizontal direction as shown in FIGS. 4 and 5 can be understood as one type of vibration suppressing member because vibration transmission is suppressed.

又,於圖4之例示中,供給配管30由複數之配管構成。於該等配管之接頭亦可介插有例如由橡膠、凝膠狀素材、或發泡苯乙烯等形成並吸收振動之振動抑制構件。藉此,可抑制供給閥32之振動經由供給配管30傳遞至塗覆噴嘴11。 Moreover, in the example of FIG. 4, the supply piping 30 is comprised by the plural piping. A vibration suppressing member formed of, for example, rubber, a gel-like material, or foamed styrene, and absorbing vibration may be interposed in the joint of the pipes. Thereby, the vibration of the supply valve 32 can be suppressed from being transmitted to the coating nozzle 11 via the supply pipe 30.

又,配管中之過濾器之設置位置並不限定於上述實施形態之例,亦可為供給配管30之路徑上之循環配管40之連接部位與泵31之間、或供給閥32與塗覆噴嘴11之間。進而,過濾器並非必需元件,亦可不設置。 Moreover, the installation position of the filter in the piping is not limited to the example of the above embodiment, and may be between the connection portion of the circulation pipe 40 on the path of the supply pipe 30 and the pump 31, or the supply valve 32 and the coating nozzle. 11 between. Further, the filter is not an essential component and may not be provided.

又,塗覆噴嘴11並不限定於具有1條狹縫狀之噴出口11a之狹縫噴嘴,可為具有複數條狹縫者,亦可為自大致圓形之噴出口噴出塗佈液之噴嘴。 Further, the coating nozzle 11 is not limited to the slit nozzle having the one slit-shaped discharge port 11a, and may be a nozzle having a plurality of slits or a nozzle for discharging the coating liquid from the substantially circular discharge port. .

又,成為使用本發明之技術進行塗覆處理之對象之塗覆液並不限定於鋰離子二次電池之電極材料,例如亦可為太陽電池材料(電極材料、密封材料)之塗覆液或電子材料之絕緣膜或保護膜之塗覆液、包含燃料電池用之觸媒之塗覆液。於將黏度相對較高之塗覆液塗覆於基材時,可較佳地應用本發明之技術。由此,於塗佈顏料或接著劑之塗覆液時,亦可使用本發明之技術。 Further, the coating liquid to be subjected to the coating treatment using the technique of the present invention is not limited to the electrode material of the lithium ion secondary battery, and may be, for example, a coating liquid of a solar cell material (electrode material, sealing material) or A coating liquid for an insulating film or a protective film of an electronic material, and a coating liquid containing a catalyst for a fuel cell. The technique of the present invention can be preferably applied when a coating liquid having a relatively high viscosity is applied to a substrate. Thus, the technique of the present invention can also be used when applying a coating liquid of a pigment or an adhesive.

11‧‧‧塗覆噴嘴 11‧‧‧ Coating nozzle

12‧‧‧支承輥 12‧‧‧Support roller

30‧‧‧供給配管 30‧‧‧Supply piping

32‧‧‧切換器件(供給閥) 32‧‧‧Switching device (supply valve)

37‧‧‧供給配管 37‧‧‧Supply piping

40‧‧‧循環配管 40‧‧‧Recycling piping

41‧‧‧循環閥 41‧‧‧Circulation valve

50‧‧‧噴嘴基座 50‧‧‧Nozzle base

60‧‧‧切換器件基座(閥基座) 60‧‧‧Switching device base (valve base)

Claims (4)

一種間歇式塗覆裝置,其特徵在於:其係將塗覆液自噴嘴朝向基材間歇地塗覆者,且包括:噴嘴;供給配管,其連接於上述噴嘴,且塗覆液朝向上述噴嘴流動;切換器件,其藉由重複切換上述供給配管之開啟及關閉,而使上述塗覆液自上述噴嘴朝向上述基材間歇地噴出;噴嘴基座,其載置上述噴嘴;及切換器件基座,其與上述噴嘴基座為獨立個體,且載置上述切換器件;且該間歇式塗覆裝置進而包括:噴嘴移動器件,其使上述噴嘴基座移動而調整上述噴嘴相對於上述基材之位置;及切換移動器件,其使上述切換器件向與上述噴嘴基座藉由上述噴嘴移動器件而移動之方向相同之方向移動。 A batch coating apparatus characterized in that it coats a coating liquid intermittently from a nozzle toward a substrate, and includes: a nozzle; a supply pipe connected to the nozzle, and a coating liquid flowing toward the nozzle a switching device that intermittently ejects the coating liquid from the nozzle toward the substrate by repeatedly switching the opening and closing of the supply pipe; a nozzle base on which the nozzle is placed; and a switching device base; And the switching device is disposed separately from the nozzle base; and the intermittent coating device further includes: a nozzle moving device that moves the nozzle base to adjust a position of the nozzle relative to the substrate; And switching the moving device to move the switching device in a direction that is the same as a direction in which the nozzle base moves by the nozzle moving device. 一種間歇式塗覆裝置,其特徵在於:其係將塗覆液自噴嘴朝向基材間歇地塗覆者,且包括:噴嘴;供給配管,其連接於上述噴嘴,且塗覆液朝向上述噴嘴流動;切換器件,其藉由重複切換上述供給配管之開啟及關閉,而使上述塗覆液自上述噴嘴朝向上述基材間歇地噴出;噴嘴基座,其載置上述噴嘴;及切換器件基座,其與上述噴嘴基座為獨立個體,且載置上述切換器件;且該間歇式塗覆裝置進而包括: 振動抑制器件,該振動抑制器件設置於上述切換器件基座,抑制自上述切換器件向上述噴嘴傳遞之振動。 A batch coating apparatus characterized in that it coats a coating liquid intermittently from a nozzle toward a substrate, and includes: a nozzle; a supply pipe connected to the nozzle, and a coating liquid flowing toward the nozzle a switching device that intermittently ejects the coating liquid from the nozzle toward the substrate by repeatedly switching the opening and closing of the supply pipe; a nozzle base on which the nozzle is placed; and a switching device base; It is independent of the above-mentioned nozzle base, and the above-mentioned switching device is placed; and the intermittent coating device further comprises: The vibration suppression device is provided on the switching device base to suppress vibration transmitted from the switching device to the nozzle. 如請求項1或2之間歇式塗覆裝置,其中上述噴嘴移動器件使上述噴嘴基座於水平方向移動,上述切換移動器件可使上述切換器件向任意之水平方向自由地移動,藉由經由上述供給配管而傳遞上述噴嘴之移動,而使上述切換器件向與上述移動方向相同之方向移動。 The intermittent coating apparatus of claim 1 or 2, wherein the nozzle moving means moves the nozzle base in a horizontal direction, and the switching moving means can freely move the switching means in an arbitrary horizontal direction by The piping is supplied to transmit the movement of the nozzle, and the switching device is moved in the same direction as the moving direction. 一種塗膜形成系統,其特徵在於包括:如請求項1或2之間歇式塗覆裝置;乾燥器件,其對藉由上述間歇式塗覆裝置而塗佈有上述塗覆液之上述基材進行加熱處理而使上述塗覆液乾燥;及搬送器件,其將上述基材依序搬送至上述間歇式塗覆裝置及上述乾燥器件。 A coating film forming system comprising: the batch coating device of claim 1 or 2; and a drying device for performing the substrate coated with the coating liquid by the batch coating device The coating liquid is dried by heat treatment, and the transfer device sequentially transports the substrate to the batch coating device and the drying device.
TW103101666A 2013-03-27 2014-01-16 Intermittent coating apparatus and coating film forming system TWI520785B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013066322A JP6152287B2 (en) 2013-03-27 2013-03-27 Intermittent coating apparatus and coating film forming system

Publications (2)

Publication Number Publication Date
TW201436872A TW201436872A (en) 2014-10-01
TWI520785B true TWI520785B (en) 2016-02-11

Family

ID=51591817

Family Applications (1)

Application Number Title Priority Date Filing Date
TW103101666A TWI520785B (en) 2013-03-27 2014-01-16 Intermittent coating apparatus and coating film forming system

Country Status (4)

Country Link
JP (1) JP6152287B2 (en)
KR (1) KR101671055B1 (en)
CN (1) CN104069984B (en)
TW (1) TWI520785B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6661401B2 (en) * 2016-02-22 2020-03-11 株式会社Screenホールディングス Manufacturing equipment for membrane / electrode assemblies
JP7527092B2 (en) * 2018-08-23 2024-08-02 芝浦機械株式会社 Intermittent coating method and intermittent coating device
JP7152930B2 (en) * 2018-10-11 2022-10-13 株式会社Subaru Sealing material dispensing nozzle and sealing material dispensing device
CN112317258A (en) * 2020-10-28 2021-02-05 江苏沙钢集团有限公司 Oil drop dripping recycling system and method for oiling machine
CN112871588A (en) * 2021-01-11 2021-06-01 佛山市格锐特机械设备有限公司 Photosensitive dry film coating production line for circuit board and technological process thereof
CN118287345B (en) * 2024-06-04 2024-09-06 新乡华锐锂电新能源股份有限公司 Diaphragm coating device for sodium ion battery production and coating method thereof

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4938994A (en) * 1987-11-23 1990-07-03 Epicor Technology, Inc. Method and apparatus for patch coating printed circuit boards
CN2159414Y (en) * 1993-07-23 1994-03-23 黄雨成 Water supply
JP4366757B2 (en) * 1999-05-27 2009-11-18 東レ株式会社 Coating apparatus, coating method, and method for manufacturing plasma display or display member
JP2001149840A (en) * 1999-11-24 2001-06-05 Sony Corp Method and device for coating
JP4419303B2 (en) * 2000-09-27 2010-02-24 東レ株式会社 Coating apparatus and coating method, and color filter manufacturing apparatus and manufacturing method
JP4764615B2 (en) * 2004-05-07 2011-09-07 富士フイルム株式会社 Coating apparatus, coating method, and manufacturing method of web with coating film
JP4575103B2 (en) * 2004-09-30 2010-11-04 大日本印刷株式会社 Electrode plate manufacturing method and manufacturing apparatus
JP2008075537A (en) * 2006-09-21 2008-04-03 Toray Ind Inc Pulsation absorption device, application method and application device using same, and method for manufacturing liquid crystal display member
JP5083524B2 (en) * 2007-08-21 2012-11-28 凸版印刷株式会社 Web coating device
JP5565031B2 (en) * 2010-03-29 2014-08-06 凸版印刷株式会社 Double-sided intermittent coating device
JP5757777B2 (en) * 2011-04-15 2015-07-29 パナソニック株式会社 Substrate coating method, substrate coating apparatus, and organic electroluminescent device manufacturing method using the same
TWM420363U (en) * 2011-08-31 2012-01-11 Ching Huei Prec Co Ltd Intermittent ink supply system for slit coating head
CN202725432U (en) * 2012-04-18 2013-02-13 嘉兴市博源涂布科技有限公司 Discontinuous coating device

Also Published As

Publication number Publication date
TW201436872A (en) 2014-10-01
CN104069984B (en) 2017-03-01
CN104069984A (en) 2014-10-01
JP6152287B2 (en) 2017-06-21
KR101671055B1 (en) 2016-10-31
KR20140118735A (en) 2014-10-08
JP2014188447A (en) 2014-10-06

Similar Documents

Publication Publication Date Title
TWI520785B (en) Intermittent coating apparatus and coating film forming system
CN103165858B (en) The manufacture method of electrode
JP2014065000A (en) Double-sided coating apparatus, double-sided coating method, and film forming system
CN104759388A (en) Coating apparatus
JP6328949B2 (en) Double-sided coating apparatus, double-sided coating method and coating film forming system
CN203415654U (en) Cathode pole piece treatment device for lithium ion battery
JP2018167193A (en) Double-sided coating apparatus and coating film formation system
JP2011092915A (en) Thin film coating apparatus and double-side thin film coating apparatus
JP2012179540A (en) Coating apparatus and coating film formation system
US11024834B2 (en) Electrode coating apparatus
JP2011143388A (en) Thin film coating apparatus and double-sided thin film coating apparatus
JP2013048995A (en) Coating apparatus, coating film forming system, coating method, and coating film forming method
JP2015188776A (en) Double-sided coating apparatus, double-sided coating method, and coating film formation system
JP6473644B2 (en) Coating apparatus, coating method and coating film forming system
KR20130044160A (en) Electrode, electrode manufacturing apparatus and electrode manufacturing method
CN109530166B (en) Coating device and coating method
JP2015062865A (en) Nozzle adjustment method, double-side coating device, and coating nozzle
JP6011478B2 (en) Battery electrode plate manufacturing apparatus and battery electrode plate manufacturing method
JP2015044138A (en) Web coating device
KR20160126670A (en) Rolling machine for electrode sheet of battery
JP2011121034A (en) Membrane coating equipment, and membrane double-side coating equipment
JP2012202650A (en) Drying device and processing device
JP6036358B2 (en) Electrode manufacturing apparatus and electrode manufacturing method
JP2012211568A (en) Coating device and coating film forming system
WO1995023031A1 (en) Intermittent coating method and apparatus therefor