TWI509756B - Chip-on-film package structure - Google Patents
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- TWI509756B TWI509756B TW102135393A TW102135393A TWI509756B TW I509756 B TWI509756 B TW I509756B TW 102135393 A TW102135393 A TW 102135393A TW 102135393 A TW102135393 A TW 102135393A TW I509756 B TWI509756 B TW I509756B
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Description
本發明是有關於一種封裝結構,且特別是有關於一種薄膜覆晶封裝結構。The present invention relates to a package structure, and more particularly to a film flip chip package structure.
隨著半導體技術的改良,使得液晶顯示器具有低的消耗電功率、薄型量輕、解析度高、色彩飽和度高、壽命長等優點,因而廣泛地應用在行動電話、筆記型電腦或桌上型電腦的液晶螢幕及液晶電視等與生活息息相關之電子產品。其中,顯示器之驅動晶片(driver IC)更是液晶顯示器不可或缺的重要元件。With the improvement of semiconductor technology, liquid crystal displays have the advantages of low power consumption, light weight, high resolution, high color saturation, long life, etc., and thus are widely used in mobile phones, notebook computers or desktop computers. LCD screens and LCD TVs and other electronic products that are closely related to life. Among them, the driver IC of the display is an indispensable component of the liquid crystal display.
因應液晶顯示裝置驅動晶片各種應用之需求,一般是採用捲帶自動接合封裝技術進行晶片封裝,其中包括有薄膜覆晶(Chip On Film,COF)封裝、捲帶承載封裝(Tape Carrier Package,TCP)等。捲帶自動接合封裝係將半導體晶片電性連接於表面形成有配線構造的可撓性薄膜基材上,其中配線構造包含輸入端引腳及輸出端引腳,這些引腳的內端電性連接晶片之電性端點(例如:凸塊)。In view of the needs of various applications of liquid crystal display device driving wafers, wafer packaging is generally carried out by using tape and tape automatic bonding packaging technology, including chip on film (COF) packaging and tape carrier package (TCP). Wait. The tape automatic bonding package electrically connects the semiconductor wafer to the flexible film substrate having the wiring structure formed on the surface, wherein the wiring structure includes an input terminal pin and an output terminal pin, and the inner ends of the pins are electrically connected. The electrical end of the wafer (eg, bumps).
習知的捲帶或薄膜封裝結構,為了加強晶片的散熱效果,且避免影響晶片之運作,可撓性薄膜基材相對於晶片所設置的表面通常會貼附一散熱片。然而,上述的散熱片配置方式,晶片運作時所產生的熱能須經過導熱性差的可撓性薄膜基材才能傳遞至散熱片,其散熱效率有限,而隨著晶片運作時的高耗能與高頻率的設計趨勢下,習知貼附於可撓性薄膜基材另一表面上之散熱片的散熱效率並不敷需求,因此改善習知晶片散熱封裝結構確有其必要性。In a conventional tape or film package structure, in order to enhance the heat dissipation effect of the wafer and to avoid affecting the operation of the wafer, a surface of the flexible film substrate relative to the wafer is usually attached with a heat sink. However, in the above-mentioned heat sink arrangement mode, the heat energy generated during the operation of the wafer is transmitted to the heat sink through the flexible film substrate having poor thermal conductivity, and the heat dissipation efficiency is limited, and the high energy consumption and high efficiency of the wafer operation. Under the design trend of frequency, the heat dissipation efficiency of the heat sink attached to the other surface of the flexible film substrate is not sufficient, so it is necessary to improve the conventional heat dissipation package structure.
本發明提供一種薄膜覆晶封裝結構,其具有較佳的散熱效率。The invention provides a thin film flip chip package structure, which has better heat dissipation efficiency.
本發明的薄膜覆晶封裝結構包括可撓性基板、晶片、散熱片以及封裝膠體。可撓性基板包括可撓性介電層以及多個引腳,可撓性介電層具有第一表面、第二表面以及多個貫穿孔,其中引腳形成於第一表面上,且包括至少一虛引腳,貫穿孔對應至少一虛引腳。晶片設置於可撓性介電層之第一表面上,晶片具有主動表面以及多個配置於主動表面上的凸塊,其中凸塊分別與引腳連接。散熱片位於可撓性介電層之第二表面上,散熱片具有多個虛凸塊,且這些虛凸塊穿入這些貫穿孔內,且散熱片透過這些虛凸塊與虛引腳連接。封裝膠體填充於晶片與可撓性基板之間。The thin film flip chip package structure of the present invention comprises a flexible substrate, a wafer, a heat sink and an encapsulant. The flexible substrate includes a flexible dielectric layer having a first surface, a second surface, and a plurality of through holes, wherein the pins are formed on the first surface and include at least A dummy pin, the through hole corresponding to at least one dummy pin. The wafer is disposed on the first surface of the flexible dielectric layer, the wafer has an active surface and a plurality of bumps disposed on the active surface, wherein the bumps are respectively connected to the leads. The heat sink is disposed on the second surface of the flexible dielectric layer, the heat sink has a plurality of dummy bumps, and the dummy bumps penetrate into the through holes, and the heat sinks are connected to the dummy pins through the dummy bumps. The encapsulant is filled between the wafer and the flexible substrate.
在本發明的一實施例中,上述的可撓性基板更包括防焊 層,設置於可撓性介電層之第一表面上並局部覆蓋引腳,且防焊層具有一開口,以供晶片設置於其內。In an embodiment of the invention, the flexible substrate further includes solder resist The layer is disposed on the first surface of the flexible dielectric layer and partially covers the lead, and the solder resist layer has an opening for the wafer to be disposed therein.
在本發明的一實施例中,上述的虛凸塊的高度大於可撓性介電層的厚度。In an embodiment of the invention, the height of the dummy bump is greater than the thickness of the flexible dielectric layer.
在本發明的一實施例中,上述的散熱片與可撓性介電層之間具有一間隙。In an embodiment of the invention, the heat sink and the flexible dielectric layer have a gap therebetween.
在本發明的一實施例中,上述的引腳更包括多個訊號引腳,且晶片之凸塊與訊號引腳電性連接。In an embodiment of the invention, the pin further includes a plurality of signal pins, and the bumps of the chip are electrically connected to the signal pins.
在本發明的一實施例中,上述的封裝膠體進一步填入於貫穿孔內,以包覆虛凸塊。In an embodiment of the invention, the encapsulant is further filled in the through hole to cover the dummy bump.
在本發明的一實施例中,上述的封裝膠體進一步填充於間隙內。In an embodiment of the invention, the encapsulant is further filled in the gap.
在本發明的一實施例中,上述的散熱片的面積等於晶片的面積。In an embodiment of the invention, the area of the heat sink is equal to the area of the wafer.
在本發明的一實施例中,上述的散熱片的面積介於晶片之面積的1至2.5倍之間。In an embodiment of the invention, the heat sink has an area between 1 and 2.5 times the area of the wafer.
在本發明的一實施例中,上述的貫穿孔的直徑介於45微米至75微米之間。In an embodiment of the invention, the through hole has a diameter of between 45 micrometers and 75 micrometers.
基於上述,本發明藉由在可撓性介電層上形成貫穿孔,並將散熱片透過虛凸塊穿過貫穿孔與可撓性基板上之虛引腳接合。因此,晶片運作時所產生的熱能不單是可透過晶片的背面逸散至外界,更可進一步藉由虛引腳傳遞至虛凸塊,再經由虛凸塊 傳遞至散熱片而逸散至外界,從而大幅提升晶片封裝結構的散熱效率。此外,本發明的散熱片的面積可大致與晶片的面積相等,因此在大幅提升晶片封裝結構的散熱效率的同時,亦不致影響薄膜覆晶封裝結構之撓折。再者,散熱片與晶片分別設置於可撓性基板之兩相對表面,且散熱片係對應晶片位置而設置,因此,可進一步對晶片起支撐之作用,增加晶片設置區之強度。Based on the above, the present invention forms a through hole on the flexible dielectric layer and bonds the heat sink through the dummy bump through the through hole to the dummy pin on the flexible substrate. Therefore, the thermal energy generated during the operation of the wafer can be transmitted not only to the outside through the back side of the wafer, but also to the dummy bumps through the dummy pins, and then through the dummy bumps. Passing to the heat sink and dissipating to the outside, thereby greatly improving the heat dissipation efficiency of the chip package structure. In addition, the area of the heat sink of the present invention can be substantially equal to the area of the wafer, so that the heat dissipation efficiency of the chip package structure is greatly improved, and the deflection of the film flip chip package structure is not affected. Furthermore, the heat sink and the wafer are respectively disposed on opposite surfaces of the flexible substrate, and the heat sink is disposed corresponding to the position of the wafer. Therefore, the wafer can be further supported to increase the strength of the wafer installation region.
為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。The above described features and advantages of the invention will be apparent from the following description.
100‧‧‧薄膜覆晶封裝結構100‧‧‧film flip chip package structure
110‧‧‧可撓性基板110‧‧‧Flexible substrate
112‧‧‧可撓性介電層112‧‧‧Flexible dielectric layer
112a‧‧‧第一表面112a‧‧‧ first surface
112b‧‧‧第二表面112b‧‧‧ second surface
112c‧‧‧貫穿孔112c‧‧‧through holes
114‧‧‧引腳114‧‧‧ pin
114a‧‧‧訊號引腳114a‧‧‧Signal pin
114b‧‧‧虛引腳114b‧‧‧virtual pin
120‧‧‧晶片120‧‧‧ wafer
120a‧‧‧主動表面120a‧‧‧Active surface
120b‧‧‧背面120b‧‧‧back
122‧‧‧凸塊122‧‧‧Bumps
130‧‧‧散熱片130‧‧‧ Heat sink
130a‧‧‧散熱面130a‧‧‧heating surface
130s‧‧‧側表面130s‧‧‧ side surface
132‧‧‧虛凸塊132‧‧‧Virtual bumps
140‧‧‧封裝膠體140‧‧‧Package colloid
D1‧‧‧直徑D1‧‧‧ diameter
D2‧‧‧尺寸D2‧‧‧ size
G‧‧‧間距G‧‧‧ spacing
H‧‧‧高度H‧‧‧ Height
T‧‧‧厚度T‧‧‧ thickness
圖1為本發明一實施例的薄膜覆晶封裝結構的局部剖面示意圖1 is a partial cross-sectional view showing a film flip chip package structure according to an embodiment of the invention;
圖2為圖1的薄膜覆晶封裝結構的局部俯視圖。2 is a partial plan view of the thin film flip chip package structure of FIG. 1.
圖1為本發明一實施例的薄膜覆晶封裝結構的局部剖面示意圖。圖2為圖1的薄膜覆晶封裝結構的局部俯視圖,其中為求清楚表示與說明,省略繪示封裝膠體140。請參考圖1,在本實施例中,薄膜覆晶封裝結構100包括可撓性基板110、晶片120、散熱片130以及封裝膠體140。1 is a partial cross-sectional view showing a film flip chip package structure according to an embodiment of the present invention. 2 is a partial plan view of the thin film flip chip package structure of FIG. 1 , wherein the encapsulant 140 is omitted for clarity and illustration. Referring to FIG. 1 , in the embodiment, the thin film flip chip package structure 100 includes a flexible substrate 110 , a wafer 120 , a heat sink 130 , and an encapsulant 140 .
可撓性基板110包括可撓性介電層112、多個引腳114以 及防焊層116,其中可撓性介電層112具有第一表面112a及第二表面112b。引腳114形成於可撓性介電層112之第一表面112a上,防焊層116設置於第一表面112a上並局部覆蓋引腳114,以防止引腳114因外露被污染而短路。此外,防焊層116具有一開口以形成晶片設置區,並顯露出引腳114之內端,以與晶片120接合。The flexible substrate 110 includes a flexible dielectric layer 112 and a plurality of pins 114 And a solder mask 116, wherein the flexible dielectric layer 112 has a first surface 112a and a second surface 112b. A pin 114 is formed on the first surface 112a of the flexible dielectric layer 112. The solder resist layer 116 is disposed on the first surface 112a and partially covers the pin 114 to prevent the pin 114 from being short-circuited due to contamination. In addition, solder mask layer 116 has an opening to form a wafer placement region and exposes the inner end of pin 114 for bonding to wafer 120.
請參考圖1與圖2,引腳114包括多個訊號引腳114a以及至少一虛引腳114b。晶片120具有主動表面120a以及多個配置於主動表面120a上的多個凸塊122,晶片120設置於可撓性介電層112之第一表面112a上並位於晶片設置區內,且以凸塊122接合訊號引腳114a。可撓性介電層112具有貫穿孔112c,貫穿孔112c對應虛引腳114b。散熱片130位於可撓性介電層112之第二表面112b上並對應晶片設置區,散熱片130具有虛凸塊132,並且透過虛凸塊132穿入貫穿孔112c中與虛引腳114b接合而固接於可撓性基板110上。封裝膠體140填充於晶片120與可撓性基板110之間,以保護電性接點,封裝膠體140更進一步填入於貫穿孔112c內以包覆虛凸塊132。Referring to FIG. 1 and FIG. 2, the pin 114 includes a plurality of signal pins 114a and at least one dummy pin 114b. The wafer 120 has an active surface 120a and a plurality of bumps 122 disposed on the active surface 120a. The wafer 120 is disposed on the first surface 112a of the flexible dielectric layer 112 and located in the wafer setting region, and has a bump. 122 engages signal pin 114a. The flexible dielectric layer 112 has a through hole 112c, and the through hole 112c corresponds to the dummy pin 114b. The heat sink 130 is disposed on the second surface 112b of the flexible dielectric layer 112 and corresponds to the wafer setting region. The heat sink 130 has a dummy bump 132 and penetrates into the through hole 112c through the dummy bump 132 to be bonded to the dummy pin 114b. It is fixed to the flexible substrate 110. The encapsulant 140 is filled between the wafer 120 and the flexible substrate 110 to protect the electrical contacts. The encapsulant 140 is further filled in the through holes 112c to cover the dummy bumps 132.
在本實施例中,可撓性介電層112的材質例如是聚乙烯對苯二甲酸酯(polyethylene terephthalate,PET)、聚醯亞胺(Polyimide,PI)、聚醚(polyethersulfone,PES)或碳酸脂(polycarbonate,PC)。可撓性介電層112之貫穿孔112c可藉由雷射穿孔的方式形成,其中貫穿孔112c之形狀例如是圓形,且其直徑D1例如是介於45微米至75微米之間。然而,貫穿孔112c之 形狀可為其他適合之形狀,本發明並不加以限制。此外,引腳114例如是由銅等金屬材質所構成。In this embodiment, the material of the flexible dielectric layer 112 is, for example, polyethylene terephthalate (PET), polyimide (PI), polyethersulfone (PES) or Polycarbonate (PC). The through hole 112c of the flexible dielectric layer 112 can be formed by laser perforation, wherein the shape of the through hole 112c is, for example, a circle, and the diameter D1 thereof is, for example, between 45 micrometers and 75 micrometers. However, the through hole 112c The shape may be other suitable shapes, and the invention is not limited thereto. Further, the lead 114 is made of, for example, a metal material such as copper.
請繼續參考圖1與圖2,訊號引腳114a與凸塊122之間為電性連接,而虛引腳114b可與凸塊122之間形成非電性連接,或者不與凸塊122連接。換言之,晶片120可透過凸塊122與虛引腳114b連接而傳導熱能,又因為,散熱片130之虛凸塊132與虛引腳114b連接,因此,晶片120運作時所產生的熱能可藉由虛引腳114b、虛凸塊132及散熱片130傳遞至外界,而達到散熱的功效。一般來說,虛凸塊132與虛引腳114b可藉由熱壓方式而相互共晶接合。此外,部分的虛引腳114b可跨越前述晶片設置區,如此配置下,可進一步補強可撓性介電層112的機械強度,詳細而言,跨越前述晶片設置區的虛引腳114b可用以支撐可撓性介電層112,避免其因受熱而彎曲下陷。Referring to FIG. 1 and FIG. 2 , the signal pin 114 a and the bump 122 are electrically connected, and the dummy pin 114 b may be electrically connected to the bump 122 or not connected to the bump 122 . In other words, the wafer 120 can be connected to the dummy pin 114b through the bump 122 to conduct thermal energy, and because the dummy bump 132 of the heat sink 130 is connected to the dummy pin 114b, the heat generated by the operation of the wafer 120 can be utilized. The dummy pin 114b, the dummy bump 132, and the heat sink 130 are transmitted to the outside to achieve heat dissipation. Generally, the dummy bumps 132 and the dummy pins 114b can be eutectic bonded to each other by a hot pressing method. In addition, a portion of the dummy pin 114b can span the aforementioned wafer setting area. In this configuration, the mechanical strength of the flexible dielectric layer 112 can be further reinforced. In detail, the dummy pin 114b spanning the aforementioned wafer setting area can be used to support The flexible dielectric layer 112 is prevented from being bent and depressed by heat.
另一方面,散熱片130之材質例如是鋁或矽。虛凸塊132例如是銅、銀、錫、鋁、鎳或金等金屬材質所構成。其中,虛凸塊132的高度H大於可撓性介電層112的厚度T,也就是說,當散熱片130藉由虛凸塊132與虛引腳114b連接後,散熱片130與可撓性介電層112之間相隔一間隙G。此外,虛凸塊132的尺寸D2小於貫穿孔112c的直徑D1,以使虛凸塊132能輕易穿過貫穿孔112c而與虛引腳114b接合。值得一提的是,散熱片130的面積可大致與晶片120的面積相等,因此可在不影響薄膜覆晶封裝結構100撓折的情況下,來提升薄膜覆晶封裝結構100的散熱效 率。當然,在基於不影響薄膜覆晶封裝結構100撓折的原則下,散熱片130的面積亦可以是大於晶片120的面積,例如是介於晶片之面積的1至2.5倍之間,如此為之,可增加散熱片130的散熱面積,進而提升散熱效果。On the other hand, the material of the heat sink 130 is, for example, aluminum or tantalum. The dummy bump 132 is made of, for example, a metal material such as copper, silver, tin, aluminum, nickel, or gold. The height H of the dummy bump 132 is greater than the thickness T of the flexible dielectric layer 112. That is, when the heat sink 130 is connected to the dummy pin 114b by the dummy bump 132, the heat sink 130 and the flexible portion The dielectric layers 112 are separated by a gap G. In addition, the size D2 of the dummy bump 132 is smaller than the diameter D1 of the through hole 112c, so that the dummy bump 132 can easily pass through the through hole 112c to be engaged with the dummy pin 114b. It is worth mentioning that the area of the heat sink 130 can be substantially equal to the area of the wafer 120, so that the heat dissipation effect of the film flip chip package structure 100 can be improved without affecting the deflection of the film flip chip package structure 100. rate. Of course, the surface of the heat sink 130 may also be larger than the area of the wafer 120, for example, between 1 and 2.5 times the area of the wafer, based on the principle of not affecting the deflection of the thin film flip chip package 100. The heat dissipation area of the heat sink 130 can be increased, thereby improving the heat dissipation effect.
在本實施例中,封裝膠體140例如是環氧樹脂或其他高分子材料。具體來說,封裝膠體140不單是填入於貫穿孔112c內以包覆虛凸塊132,亦進一步填充於散熱片130與可撓性介電層112間之間隙G內並包覆散熱片130的多個側表面130s,以固定散熱片130。此外,封裝膠體140分別將晶片120的背面120b以及散熱片130的散熱面130a暴露於外,也因此可大幅提升薄膜覆晶封裝結構100的散熱效率。In the present embodiment, the encapsulant 140 is, for example, an epoxy resin or other polymer material. Specifically, the encapsulant 140 is not only filled in the through hole 112c to cover the dummy bump 132, but is further filled in the gap G between the heat sink 130 and the flexible dielectric layer 112 and covers the heat sink 130. A plurality of side surfaces 130s are provided to fix the fins 130. In addition, the encapsulant 140 exposes the back surface 120b of the wafer 120 and the heat dissipation surface 130a of the heat sink 130, respectively, thereby greatly improving the heat dissipation efficiency of the film flip chip package structure 100.
綜上所述,本發明藉由在可撓性介電層上形成貫穿孔,並將散熱片透過虛凸塊穿過貫穿孔與可撓性基板上之虛引腳接合。因此,晶片運作時所產生的熱能不單是可透過晶片的背面逸散至外界,更可進一步藉由虛引腳傳遞至虛凸塊,再經由虛凸塊傳遞至散熱片而逸散至外界,從而大幅提升晶片封裝結構的散熱效率。此外,本發明的散熱片的面積可大致與晶片的面積相等,因此在大幅提升晶片封裝結構的散熱效率的同時,亦不致影響薄膜覆晶封裝結構之撓折。再者,散熱片與晶片分別設置於可撓性基板之兩相對表面,且散熱片係對應晶片位置而設置,因此,可進一步對晶片起支撐之作用,增加晶片設置區之強度。In summary, the present invention forms a through hole on the flexible dielectric layer and bonds the heat sink through the through hole to the dummy pin on the flexible substrate. Therefore, the thermal energy generated during the operation of the wafer is not only dissipated to the outside through the back surface of the wafer, but is further transmitted to the dummy bump by the dummy pin, and then transmitted to the heat sink through the dummy bump to escape to the outside. Thereby greatly improving the heat dissipation efficiency of the chip package structure. In addition, the area of the heat sink of the present invention can be substantially equal to the area of the wafer, so that the heat dissipation efficiency of the chip package structure is greatly improved, and the deflection of the film flip chip package structure is not affected. Furthermore, the heat sink and the wafer are respectively disposed on opposite surfaces of the flexible substrate, and the heat sink is disposed corresponding to the position of the wafer. Therefore, the wafer can be further supported to increase the strength of the wafer installation region.
雖然本發明已以實施例揭露如上,然其並非用以限定本 發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above by way of example, it is not intended to limit the present invention. The scope of the present invention is defined by the scope of the appended claims, which are defined by the scope of the appended claims, without departing from the spirit and scope of the invention. quasi.
100‧‧‧薄膜覆晶封裝結構100‧‧‧film flip chip package structure
110‧‧‧可撓性基板110‧‧‧Flexible substrate
112‧‧‧可撓性介電層112‧‧‧Flexible dielectric layer
112a‧‧‧第一表面112a‧‧‧ first surface
112b‧‧‧第二表面112b‧‧‧ second surface
112c‧‧‧貫穿孔112c‧‧‧through holes
114‧‧‧引腳114‧‧‧ pin
114b‧‧‧虛引腳114b‧‧‧virtual pin
116‧‧‧防焊層116‧‧‧ solder mask
120‧‧‧晶片120‧‧‧ wafer
120a‧‧‧主動表面120a‧‧‧Active surface
120b‧‧‧背面120b‧‧‧back
122‧‧‧凸塊122‧‧‧Bumps
130‧‧‧散熱片130‧‧‧ Heat sink
130a‧‧‧散熱面130a‧‧‧heating surface
130s‧‧‧側表面130s‧‧‧ side surface
132‧‧‧虛凸塊132‧‧‧Virtual bumps
140‧‧‧封裝膠體140‧‧‧Package colloid
D1‧‧‧直徑D1‧‧‧ diameter
D2‧‧‧尺寸D2‧‧‧ size
G‧‧‧間距G‧‧‧ spacing
H‧‧‧高度H‧‧‧ Height
T‧‧‧厚度T‧‧‧ thickness
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US6611055B1 (en) * | 2000-11-15 | 2003-08-26 | Skyworks Solutions, Inc. | Leadless flip chip carrier design and structure |
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TW200539246A (en) * | 2004-05-26 | 2005-12-01 | Matsushita Electric Ind Co Ltd | Semiconductor device and method for manufacturing the same |
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