TW200414468A - Flip-chip package structure - Google Patents
Flip-chip package structure Download PDFInfo
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- TW200414468A TW200414468A TW92100980A TW92100980A TW200414468A TW 200414468 A TW200414468 A TW 200414468A TW 92100980 A TW92100980 A TW 92100980A TW 92100980 A TW92100980 A TW 92100980A TW 200414468 A TW200414468 A TW 200414468A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73253—Bump and layer connectors
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Abstract
Description
200414468200414468
【發明所屬之技術領域】 本發明係有關於-種半導體裝置, 覆晶封裝結構。 係有關於一種 【先前技術】 請參考㈣圖’係顯示一傳統的覆 所谓覆晶封裝是在1C晶片180的主動表面或^°冓7 0 0。 板(SUbstrate) 7 0 2 —表面上的接點71〇上形=^封裝基 後,將1C晶片180以主動表面朝下的方式與= ”790 702進行接合,並在IC晶片18〇與覆晶封裝基= = 成一填充物7 7 0且填滿導電凸塊79〇之間的間02之間形 植球(bal 1 Placement)等方式在覆晶封裝基板^ ’以例^ .表面的接點73 0上形成作為引腳的錫球73 2, 、 封裝結構的技術。 形成一覆晶 相較於傳統麵·線接合(w i r e b 〇 n d i n g)封裳的步 、 裝結構的面積必須遷就上述銲線的佈局(丨ay — ) ^而>必夕封 大於ic晶片的面積;在覆晶封裝結構中,Ic晶片與/曰^ 裝基板的接點範圍就僅僅分布在上述IC晶片本身^ : 1 圍,有助於特別是接腳數小於2 〇 〇的封裝結構或封裝基^反祀 的面積可縮小至I C晶片面積的1 · 2倍以下一即是所^的曰 片尺寸封裝(chip-scale package ; CSP)。而在中央處= 器(central process unit ; CPU)、繪圖晶片、晶片組 (chipset)、或其他以系統單晶片(system 〇n a chip ; S〇C)所6又计的I c晶片的封裝結構,因其多樣的功能與高操[Technical field to which the invention belongs] The present invention relates to a semiconductor device and a flip-chip package structure. Related to a kind of [Previous Technology] Please refer to the figure 系 to show a traditional cover. The so-called flip chip package is on the active surface of the 1C chip 180 or ^ ° 冓 7 0 0. Board (SUbstrate) 7 0 2 —Contacts 71 on the surface = After the package base, the 1C chip 180 is bonded with the active surface facing downwards = 790 702, and the IC chip 18 and the chip The chip packaging base = = a filling 7 7 0 and filled with a ball 1 (bal 1 Placement) between the conductive bumps 79 0 and other methods on the chip-on-chip packaging substrate ^ 'for example ^. Surface connection The technique of forming a solder ball 73 2 as a pin on the point 73 0, and the packaging structure. Compared with the conventional step of forming a flip chip, the area of the mounting structure must be adjusted to the above soldering. The layout of the lines (丨 ay —) ^ and > Bi Xifeng is larger than the area of the IC chip; in the flip-chip package structure, the contact range of the IC chip and the mounting substrate is only distributed in the IC chip itself ^: It can help reduce the area of the package structure or package base, especially the number of pins is less than 2000. The area of the chip can be reduced to 1 or 2 times the IC chip area. The following is the chip size package (chip size package). -scale package; CSP). And at the center = central process unit (CPU), graphics chip, crystal Set (Chipset), or other systems to a single wafer (system 〇n a chip; S〇C) and the 6 meter package structure I c of the wafer, because of its multiple functions and high operating
0702-8850TWf(nl);91P58;Dwwang.ptd 第5頁 200414468 五、發明說明(2) "~' -- 作頻率,接腳數通常會超過3〇〇甚至超過1〇〇〇,其封裝基 板的走線複雜,封裝結構或封裝基板的面積較難達到&上"述 的晶片尺寸封裝的程度;然而相較於傳統銲線(w i re bonding)封裝的形式,在覆晶封裝結構中,Ic晶片與封裝 基板之間的通路較短,有助於減少電子訊號在I C晶片與封 裝基板之間傳輸時的干擾與延遲。因此,非晶片尺寸封裝 的覆晶封裝結構的應用也逐漸普及。 、、;名而’卩过著市場上對電子產品要輕、薄、短、小的需 $ —除了必須在1 C晶片的設計上下工夫,在有限面積的半 導,基,,放入更多的電子元件之外;在電路板的設計上 $別是在上述覆晶封裝結構的應用上,其覆晶封裝基板 的δ又计也必須在有限面積中,放入更高密度的内部線路, 因此在傳輸線(transmissi〇n 1 ine)便無多餘空間可以加 入VSS或VDD來作遮蔽(shielding),導致一導線(trace line)有電氣訊號變化(signal⑽)時,鄰近的導 線之間會產生感應電感(mutual induCtance)及感應電容 (mutual capacit〇r)而發生串音效應(cr〇sstaik ef feet),不但會影響電路訊號品質及系統穩定度,更會 影響到傳輸線的特十峰K . 卞侧冰日7軒改阻抗(character impedance)。 4西在,I基板或其他型式的電路板的傳輸線設計中,最 的就疋阻4几匹配(lmpedance match);其中上述傳輸 秦山的基本木構為一輸出端經由一導線將一信號傳至一負載 _ ? ^ ^ $線由上述負載端連接至上述輸出端構成一 ^ ,k没在上述傳輸線中,信號的輸出阻抗為ZG、負載0702-8850TWf (nl); 91P58; Dwwang.ptd Page 5 200414468 V. Description of the invention (2) " ~ '-the operating frequency, the number of pins will usually exceed 300 or even 1000, its package The substrate routing is complicated, and the package structure or the area of the package substrate is difficult to reach the level of the chip size package described above; however, compared to the conventional wi re bonding package, the flip chip package structure In this case, the short path between the IC chip and the package substrate helps reduce the interference and delay when electronic signals are transmitted between the IC chip and the package substrate. Therefore, the application of flip-chip packaging structures for non-chip-size packages is also becoming more and more popular. ","; The name of the "I have to pass the market for electronic products to be light, thin, short, small and small $-In addition to the 1 C chip design work must be done, in a limited area of the semiconductor, base, put more In addition to many electronic components; in the design of the circuit board, not only in the application of the above-mentioned flip-chip packaging structure, the delta of the flip-chip packaging substrate must also be placed in a limited area with higher-density internal wiring. Therefore, when there is no extra space in the transmission line (transmission 1 ine), VSS or VDD can be added for shielding. As a result, the electrical signal change of a trace line (signal⑽) will occur between adjacent wires. The crosstalk effect (crosstaik ef feet) occurs due to the inductive inductance (mutual induCtance) and the inductive capacitance (mutual capacit〇r), which will not only affect the signal quality of the circuit and system stability, but also affect the special ten peaks K of the transmission line. The character impedance of the 7th Xuan side ice sun changed. In the design of the transmission line of the I substrate or other types of circuit boards, the most impediment is the lmpedance match. The basic wooden structure of the transmission Qinshan is an output terminal that transmits a signal to a signal via a wire. A load _? ^ ^ The $ line is connected to the output end by the load end to form a ^, k is not in the transmission line, the output impedance of the signal is ZG, load
200414468200414468
五、發明說明(3) 阻抗為ZL、傳輸線的特性阻抗為Z0,貝彳ZG = Z〇 = ZL即是所、 的阻抗匹配。以負載端而言,當Z0 = ZL,所有傳輸線^上^胃 能量與信號會完全傳送至上述負載端;如果上述傳輸線、、 特性阻抗因上述的串音效應的影響而發生變化而導致阻^ 不匹配(impedance mismatch),便會有部份的能量與传號 會被反射(re fleet ion)回上述的輸出端。上述的訊號反射b 現象會造成訊號過激(oversh〇〇t)、欠激(undershoot)、' 與振鈐(ringback),並影響訊號的單一性(mon〇t〇icity) ’不但會影響電路訊號品質及系統穩定度,更會造成電子 元件的損壞。如果上述傳輸線的特性阻抗值能得以控制, 進而能夠依需要而予以調整,可大大地降低在電路設計上 的困難度。 另外,在第7A圖的覆晶封裝結構7 0 0中,1C晶片180係 成裸晶(bare die)狀態,而容易在後續加工製程中導致晶 片崩裂等機械性損壞的問題。 對於覆晶封裝結構施以電磁防護,防止覆晶封裝結構 受到外界無線電射頻干擾(r ad i 〇 frequency interference,RFI)或電磁干擾(electromagnetic interference ; EMI)的覆晶封裝結構揭露於美國專利第5, 3 3 1,0 5 9號,該專利係在所曝露出的〗c晶片以及底膠 (under f i 1 1)的表面以濺鍍法形成一金屬薄膜,並使上述 金屬;4膜連接至封裝基板上的一接地墊(g r 〇 u n d p a d )上形 呈接地狀態來針對該封裝結構,特別係該〗c晶片,提供電 磁防護;而美國專利第5,3 7 4,4 〇 4號專利係在已形成有底V. Description of the invention (3) The impedance is ZL, the characteristic impedance of the transmission line is Z0, and ZG = Z〇 = ZL is the impedance matching. As far as the load side is concerned, when Z0 = ZL, all the transmission lines ^ stomach energy and signals will be completely transmitted to the load side; if the transmission line, the characteristic impedance changes due to the influence of the crosstalk effect, resulting in resistance ^ If they do not match (impedance mismatch), part of the energy and signal will be reflected (re fleet ion) back to the above output. The above-mentioned signal reflection b phenomenon will cause the signal to overshoot, undershoot, 'and ringback, and affect the signal's unity (mon〇t〇icity)' will not only affect the circuit signal Quality and system stability will cause damage to electronic components. If the characteristic impedance value of the above-mentioned transmission line can be controlled and then adjusted as needed, the difficulty in circuit design can be greatly reduced. In addition, in the flip-chip package structure 700 of FIG. 7A, the 1C wafer 180 is in a bare die state, which may easily cause mechanical damage such as chip cracking in a subsequent processing process. The flip-chip package structure is electromagnetically protected to prevent the flip-chip package structure from external radio frequency interference (RFI) or electromagnetic interference (EMI). The flip-chip package structure is disclosed in US Patent No. 5 No. 3,3,0,5,9, the patent is a method of forming a metal thin film by sputtering on the surface of the exposed chip c and the primer (under fi 1 1), and making the above metal; 4 film connected to A ground pad (groundpad) on the packaging substrate is in a grounded state to target the package structure, especially the chip, to provide electromagnetic protection; and US Patent No. 5, 3, 7, 4, 04 patent system Has formed a bottom
0702-8850TWf(nl);91P58;Dwwang.ptd0702-8850TWf (nl); 91P58; Dwwang.ptd
i 200414468 五、發明說明(4) 膠的覆晶封裝結構更加上一傳統的封膠製程:將一金屬含 量約70%〜7 5%且具有導電與導熱性質的封膠體(㈣丨心叫 compound)形成於已進行完填底膠(underfiii)步驟、且在i 200414468 V. Description of the invention (4) The flip-chip packaging structure of the glue is more traditional. It is a traditional sealing process: a metal content of about 70% to 75% and a conductive and thermally conductive sealing compound (㈣ 丨 heart called compound ) Is formed after the underfiii step has been performed, and
If晶片外圍具有一接地墊的封裝基板上,上述封膠體並覆 盎上述1C晶片與接地墊上,更在上述封膠體的上表面形成 複數個散熱鰭片(fin),兼具對1(:晶片進行電磁防護與幫 助散熱的功能。 叫芩考第1 A〜1 C圖,係顯示美國專利第5,g 7 7,6 2 6號與 日本特許公開第P2 0 0 0-775 75A號所揭露之一散熱裝置32之 上視圖(第1A圖)、剖面圖(第“圖)、與在一覆晶封裝結構 的應用(第1C圖)。在第1A圖中,散熱裝置32係具有一平面 部3 2a、一凸出部32b、一位於凸出部32b的支持部32(:、與 四個位於平面部32a的支持部32d ;而散熱裝置32沿^線的 剖面圖係繪示於第1 B圖。在第1 C圖中,在封裝基板2 〇上, 將I C晶片2 2以覆晶封裝的形式組裝於封裝基板2 〇的一表面 上後;再進行填底膠的步驟將底膠2 4 a填充於I c晶片2 2盘 封裝基板20之間的導電凸塊26a之間的空隙;然$將散熱 裝置32組裝於封裝基板20上,其中位於凸出部32b的支持 部3 2 c與I C晶片2 2連接、四個位於平面部3 2 a的支持部3 2d 經由接著劑34使散熱裝置32與封裝基板20形成電性連社; 再以封膠體30覆蓋散熱裝置32並使凸出部32b曝露。其 散熱裝置32係以凸出部32b的曝露以及支持部32〇與1〇^晶片 2 2的連接而對I C晶片2 2提供散熱的功能;且以支持部3 2己 與封裝基板2 0的電性連結以及支持部3 2 c與1C晶片2 2的連If the package substrate with a ground pad is located on the periphery of the chip, the sealing compound covers the 1C chip and the ground pad, and a plurality of heat sink fins (fins) are formed on the upper surface of the sealing compound. The function of electromagnetic protection and heat dissipation. Called No. 1 A ~ 1 C, it is shown in US Patent No. 5, g 7 7, 6 2 6 and Japanese Patent Publication No. P2 0 0 0-775 75A. One of the heat dissipating device 32 is a top view (FIG. 1A), a cross-sectional view (FIG. 1), and an application of a flip chip package structure (FIG. 1C). In FIG. Part 32a, a protruding part 32b, a supporting part 32 () located at the protruding part 32b, and four supporting parts 32d located at the flat part 32a; and a cross-sectional view of the heat sink 32 along the line ^ is shown in the first Figure 1 B. In Figure 1 C, on the packaging substrate 20, the IC chip 22 is assembled on a surface of the packaging substrate 20 in the form of a flip-chip package; and then the primer-filling step is performed to remove the substrate. The glue 2 4 a fills the gap between the conductive bumps 26 a between the IC chip 2 and the 2 package substrate 20; The support 32 is assembled on the package substrate 20, in which the support portion 3 2 c located at the protruding portion 32 b is connected to the IC chip 2 2, and the four support portions 3 2 d located at the flat portion 3 2 a make the heat dissipation device 32 and The packaging substrate 20 forms an electric company; and then the heat dissipation device 32 is covered with the sealing compound 30 and the protrusions 32b are exposed. The heat dissipation device 32 is the exposure of the protrusions 32b and the support portions 32 and 10. The chip 2 2 The IC chip 2 2 is provided with a heat dissipation function; and the support part 32 is electrically connected to the package substrate 20 and the support part 3 2 c is connected to the 1C chip 22.
200414468 五、發明說明(5) ^ -- 接而對I C晶片2 2提供電磁防護的功能。 另外’请參考第2圖,係顯示中華民國專利公告號第 4 1 0445號與美國專利第6, 2 5 5,丨4〇號所揭露之半導體晶方 尺寸封裝(chip-scaie package ;cSP)結構,具有一散熱 元,3—12覆蓋在已以覆晶封裝的形式與基板3ι^組合的a半導 q兀311之上,其邊緣連結到填充於半導體晶元311和基 板3 1 3之間的錫球3丨6的間隙並向外延伸的填膠声 t ^ ^ ^ #312 ^ # ^ € ^^ ^ 二=性連二,連結;且散熱元件312尚可以與基板313形 : 連、、、°以加強對半導體晶元3 1 1提供電磁防護的功 上述先前技藝中均僅對覆晶封裝 電磁防護,以避免受到來自外界的外界 電磁干擾,而對於霜曰扭壯斗碰▲ ^ 1甩射頻干擾或 :控制傳輸線的特性; 術内容均付之閟士π · LL、 甲日祝象的方法與技 思及因覆晶封裝結構中n的技術水準而言,並無法 所導致的傳輸線的特部線路密度的增加 形。 抗變化與導線間的串音現象等情200414468 V. Description of the invention (5) ^-The function of providing electromagnetic protection to IC chip 2 2 in turn. In addition, please refer to the second figure, which shows the semiconductor chip-size package (cSP) disclosed in the Republic of China Patent Bulletin No. 4 1 0445 and U.S. Patent No. 6, 2 55, 丨 40. The structure has a heat sink, 3-12 is covered on the a semiconductor 311 which has been combined with the substrate 3ι ^ in the form of a flip-chip package, and its edge is connected to the semiconductor wafer 311 and the substrate 3 1 3. The gap between the solder balls 3 丨 6 and the outwardly extending glue filling sound t ^ ^ ^ # 312 ^ # ^ € ^^ ^ Two = sex two, connection; and the heat sink 312 can still be connected to the substrate 313: ,,, ° to strengthen the function of providing electromagnetic protection to the semiconductor wafer 3 1 1 In the previous techniques, only the flip chip package was electromagnetically protected to avoid external electromagnetic interference from the outside world. ^ 1 rejection of radio frequency interference or: control of the characteristics of the transmission line; the technical content is given to the methods and techniques of π · LL, A Day wish, and the technical level of n in the flip-chip packaging structure cannot be caused The increase in the shape of the special line density of the transmission line. Resistance to changes and crosstalk between wires
另外,請參考第3a〜3B 號第50 8778號所揭露之半導許/片4民國專利公告 3A圖)與半導體晶片4 a日日片十衣構&之剖面圖(第 ,固1構造之散熱片之上視圖ί楚π岡、 在弟3Α圖所繪示的半導 圖(弟3Β圖) 板…電性連接於體晶片封裝構造2中係包含:基 基板41上的半導體晶片42 ;與設於半導In addition, please refer to the semi-conducting permits / sheets disclosed in No. 3a ~ 3B No. 50 8778 (Paper 3A of the Republic of China Patent Publication) and the cross-sectional view of the semiconductor wafer 4a-day and ten-sheet structure & The top view of the heat sink is Chu Pigang, the semi-conductor diagram (Picture 3B) shown in Figure 3A, and the board is electrically connected to the body chip package structure 2. The system includes: a semiconductor wafer 42 on a base substrate 41 ; And set in semiconducting
0702-8850TWf(nl);91P58;Dwwang.ptd 五、發明說明(6) 片45具有一第一散熱部 熱部45b係分別自第一 K而,在中華民國專利 封裝構造2揭露有關散 裝構造中的傳輪線提供 與導線間的串音現象的 以當時的技術水準而 的基板的内部線路密度 變化與導線間的串音現 體晶片42上的散熱片45,其中散熱 45a與一對第二散熱部45b,第二散 月欠熱。卩4 5 a相對之兩側彎延設置。氣 公告號第5 08 778號僅在半導體晶片 熱片45的技術内容,而對於覆晶封 遮蔽,從而控制傳輸線的特性阻抗 方法與技術内容均付之闕如;因此 言,亦無法思及因覆晶封裝構造中 :增加所導致的傳輪線的特性阻抗 象荨情形。 【發明内容】 有鑑於此,本私 構,具有一電性保護勺主要目的係提供一種覆晶封裝結 結構中傳輸線的特性阻广綠2以控制並調整上述覆晶封裝 減低電路設計時的困難^二,可增加電路設計的彈性, 本發明的另一目的係提供一曰 電性保護裝置,可以控制、,二種俣日日封衣結構,具有一 線的特性阻抗變化,二上述覆晶封裝結構中傳輸 質及系統穩定度。…晶封裝結構中的電路訊號品 本發明的又另一目的係一 -電性保護裝i,可以控制並調;::3裝結構,具有 輸線的特性阻抗變化, ° = 处俣晶封裝結構中傳 路訊號品質及系統穩定二I二以,升覆晶封裝結構中的電 度之外’更能保護覆晶封裝結構; 五、發明說明(7) 槿的了 ^不被不正常的電路訊號而損壞,提升令^ 構的可靠度與使用壽命。 損我知升覆晶圭 本發明的又s -電性保罐f置~目的係提供一種覆晶封裝結構, 中僂於始。又置,除了可以控制並調整上述覆曰#狀 以保護上述覆曰2Γ交化之外,上述的電性保護裝置 受到機械性破;。衣結構的心片在後續加工製程中 裝結:達ϊί::的上述” ’本發明係提供-種覆 上述封褒基板的:表=基:反,具有-内部線路, 接點;—丨 ^面,、有稷數個以一定間隙排列的 IC a h & f ,組裝於上述封裝基板的上述表面, 述第一接點之Η沾Ϊ 晶片與上述封裝基板 • m a ^ ¥電凸塊與上述封裝基板形成電性 上、t、2 1成於上述封袭基板與上述1C晶片之間 上述填充物更填充在β道+ 间 性保 在上述¥電凸塊的間隙之間;以及 出=ΐ —凸出部與一邊緣延伸部,其中上 其L =復盍㈣晶〗,而上述邊緣延伸部延伸至上迷 1、“: ί ί表面’11由一接合物質連接上述邊緣延伸 ϊ ΐ : 的上述表面而將上述電性保護裝置固定 =而衣土板上,且上述邊緣延伸部與上述封裝基板的 表面之間的間隙(gap)高度為不大於40 mil.。 【實施方式】 為δ襄本發明之上述和其他目的、特徵、和優點能 ------ f裝結 具有 結構 更可 不會 晶封 其中 第一 上述 的上 連結 ,且 一電 述凸 封裝 部與 於上 上述 更明0702-8850TWf (nl); 91P58; Dwwang.ptd V. Description of the invention (6) The sheet 45 has a first heat-dissipating part, and the heat part 45b is respectively from the first K. In the Republic of China patent package structure 2 the relevant bulk structure is disclosed. The transmission line provides cross-talk phenomenon between the conductors at the current technological level of the substrate and changes in the internal circuit density of the substrate and the cross-talk between the conductors. The heat sink 45 on the wafer 42 includes heat dissipation 45a and a pair of second The heat radiating portion 45b is underheated in the second month.卩 4 5 a is curved on opposite sides. The gas bulletin No. 5 08 778 is only in the technical content of the semiconductor wafer hot sheet 45, and the method and technical content of the flip chip sealing and shielding to control the characteristic impedance of the transmission line are equally well; therefore, it cannot be considered In the crystal package structure: the characteristic impedance of the transfer line caused by the increase is like the net case. [Summary of the Invention] In view of this, the main purpose of this private structure with an electrical protection spoon is to provide a characteristic of the transmission line in the flip-chip package junction structure to block the green 2 to control and adjust the flip-chip package to reduce the difficulty in circuit design. ^ Second, it can increase the flexibility of circuit design. Another object of the present invention is to provide an electrical protection device, which can control two kinds of next-day dressing structures, which have first-line characteristic impedance changes. Transmission quality and system stability in the structure. … Circuit signal products in a crystal package structure Another object of the present invention is an electrical protection package i, which can be controlled and adjusted; :: 3-pack structure with characteristic impedance change of the transmission line, ° = at the crystal package The signal quality and system stability of the transmission path in the structure can be protected more than the electrical power in the flip-chip packaging structure; moreover, the flip-chip packaging structure can be protected; V. Description of the invention (7) The hibiscus is not abnormal. The circuit signal is damaged, which improves the reliability and service life of the structure. I know that the flip chip technology of the present invention is to provide a flip chip packaging structure, which starts from the beginning. In addition, in addition to controlling and adjusting the above-mentioned cover #shape to protect the above-mentioned cover 2Γ, the above-mentioned electrical protection device is mechanically broken; The heart piece of the clothing structure is knotted in the subsequent processing process: up to the above: "The present invention provides-a kind of covering the above sealing substrate: table = base: reverse, with-internal wiring, contacts;-丨^ Surface, there are several ICs ah & f arranged at a certain gap, assembled on the surface of the package substrate, the first contact of the chip and the package substrate • ma ^ ¥ Electric bump and The package substrate is formed electrically, t, 21% between the sealed substrate and the 1C wafer. The filler is further filled in the β channel + interstitial space between the ¥ electric bumps; and the output = ΐ — a protruding portion and an edge extension, where L = complex crystal, and the above edge extension extends to the upper fan 1, ": ί Surface '11 is connected to the above edge extension by a bonding substance ϊ ΐ: The electrical protection device is fixed on the surface, and the height of the gap between the edge extension and the surface of the package substrate is not more than 40 mil. [Embodiment] For the above and other purposes, features, and advantages of the present invention, the f-junction has a structure that can not crystallize the first above-mentioned upper connection, and an electrical package. The above is more clear with the above
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第11頁 0702-8850TWf(nl);91P58;Dwwang.ptd 200414468 五、發明說明(8) 比較例,並配合所 顯十重,下文特舉出三較佳實施例與 附圖式,作詳細說明如下: 、 弟一實施例: 口月芩考第4 A圖,係顯示本發 — 結構4 0 0。其巾,本發 ?/ -貫施例之覆晶封裝 402係一具有—内部線路 所使用的封裝基板 的封裝:板Kir;?應用就偈限在使用上述形式 熟習此技藝者,在;:1 :曰曰封裝形式的封裝結構,任何 此4夕ί: 離本發明之精神和範圍a,當可作 本發明第一實施似ί Ϊ /、 式的覆晶封裝基板。 保護裝置440,可以有弋批1晶封裝結構400係具有一電性 ;線=性阻抗變化,其中在封裝基板4。2,其一表面呈 定間隙排列的接點41^ '曰衣土反 的上述表面,以複數個以一定間隙排列在 成=^與接點410之間的導電凸塊4 9 0與封裝基板40 2形 迅、、’Ό,另外填充物4 7 〇係形成於封裝基板4 〇 2與丨c晶 180之間,且填充物47〇更填充在導電凸塊49〇的間隙之 間,以及電性保護裝置44〇,其上視圖係繪示於第4β圖, ^ f 一凸出部446與一邊緣延伸部444,其中凸出部446係 覆蓋1C晶片180,而邊緣延伸部444延伸至封裝基板4〇2的 上述表面’使電性保護裝置4 4 〇可以有效控制並調整覆晶 =I結構4 0 0中傳輸線的特性阻抗變化,並藉由一接合物 質422連接邊緣延伸部444與封裝基板4〇2的上述表面而將 200414468 五、發明說明(9) 電性保護裝置440固定於封裝基板4〇2上。 另外’如有散熱方面的 連接1C晶片18。虚凸出邱“而要’可另外以接合物質422 以Μ外1 t μ ” 出σΜ46,可使電性保護裝置440更可 以頭外具有幫助1C晶片180散熱的功能。 更1 較好Lt述生保護裝置“°的材質為具導電性的材質, -防:ί強::二電性保護震置的表層亦可以具有 蝕化的鍍層;而在考慮幫助&曰曰片⑽ =,;”質422較好為-導熱物質例如為-金屬銀; 末與一 ί展虱樹脂的混合物。 1刀 而上述封裝基板4 0 2在上述表面上、接點4 1 f)以Α μ r 域係具有-導線(trace llne)區,上述導接二4的區 伸部444所覆蓋;上述導線F盥、真 令、、泉區係為緣延 盔門陏妝铲+、日士友£人迖緣延伸部444的間隙可為 二=隙狀悲或具有不大於40 mil•之間隙,而在本發明 貫施例中,上述導線區盥邊缘 隙狀態。 、午良匕/、边、、、水延伸部444的間隙為無間 另外在封裝基板402的另一表面上具有複數個外部接 ::43 0 ’且上述外部接點43〇分別接合有一錫球432,其材 =為m錫基合金或不含錯的錫基合金的錫球似. 由錫球432將覆晶封裝結構4〇〇焊接於一例如為印席卜 :板的外部元件上(未繪示於圖面),進而完成最終之電; 實 裝基板4〇2中的層積電路與邊 ^延伸部444之相對位置關係之示意圖纷示於第“圖。在 弟4C圖中,顯示出封裝基板402的第—層線路451中之五忾P.11 0702-8850TWf (nl); 91P58; Dwwang.ptd 200414468 V. Description of the invention (8) Comparative example, combined with the tenfold manifestation, three preferred embodiments and attached drawings are given below for detailed description. It is as follows: 1. An example: Figure 4A of the Oral Examination Examination, which shows the present-structure 4 0 0. Its towel, this hair? /-The flip-chip package 402 of the embodiment is a package having a package substrate used for internal circuits: board Kir;? Applications are limited to those skilled in the art using the above form, in: 1: package form Any packaging structure, which is beyond the spirit and scope of the present invention, can be used as a flip-chip package substrate of the first embodiment of the present invention. The protection device 440 may have a single-crystal package structure 400 which has an electrical property; a linear impedance change, wherein a contact 41 is arranged on a surface of the package substrate 4.2 at a certain gap. The above-mentioned surface is formed by a plurality of conductive bumps 4 9 0 and a package substrate 40 2 which are arranged with a certain gap between the contact 410 and the contact 410. The shape of the filler 4 7 0 is formed in the package. Between the substrate 4 0 2 and the c crystal 180, and the filler 47 0 is filled between the gap of the conductive bump 49 0 and the electrical protection device 44 0, the upper view of which is shown in Figure 4β, ^ f A protruding portion 446 and an edge extending portion 444, wherein the protruding portion 446 covers the 1C chip 180, and the edge extending portion 444 extends to the above-mentioned surface of the package substrate 4 ′, so that the electrical protection device 4 4 ′ may be effective. Control and adjust the characteristic impedance change of the transmission line in the flip-chip = I structure 4 0, and connect the edge extension 444 to the above surface of the package substrate 4 2 with a bonding substance 422. 200414468 V. Description of the invention (9) Electricity The protective device 440 is fixed on the package substrate 40. In addition, there is a 1C chip 18 for heat dissipation. The imaginary protrusion Qiu “and ca n’t use the bonding material 422 and 1 t μ in addition to 1 t μ” to produce σM46, which can make the electrical protection device 440 more capable of helping the 1C chip 180 to dissipate heat outside the head. More 1 The material of the better Lt bio-protection device "° is a conductive material. -Anti-: Strong :: Secondary electrical protection. The surface layer of the vibration protection can also have an etched coating; and in consideration of help & "⑽" = ";" 422 is preferably-a thermally conductive substance such as-metallic silver; and a mixture with a resin. 1 knife and the package substrate 4 0 2 on the surface and the contact 4 1 f) has a trace llne region in the A μr field system, and the area extension 444 of the lead 2 4 is covered; the lead F toilet, Zhenling, and spring area are Yuanyan helmet door makeup shovel +, Japanese friends. The gap between the human edge extension 444 may be two = gap-like sadness or a gap of not more than 40 mil, and In the embodiment of the present invention, the above-mentioned lead region is in a state of a marginal gap. The gap between the Wuliang Dagger /, the edge, and the water extension 444 is infinite. On the other surface of the package substrate 402, there are a plurality of external contacts: 43 0 ', and the external contacts 43 are respectively joined with a solder ball 432. , Its material = m-based tin-based alloy or tin-based alloy containing no error-like tin balls. The flip-chip package structure 400 is soldered by a solder ball 432 to an external component such as a printed board: (The drawing is shown in the figure), and then the final electricity is completed; The schematic diagram of the relative positional relationship between the laminated circuit and the edge extension 444 in the mounted substrate 4 is shown in the "Figure." Five out of the first layer wiring 451 of the package substrate 402
200414468 五、發明說明(10) 上導線TT1〜TT5,和第六層線路45 6中之五條下導線卜 ΤΒ5 ;而上導線TT1〜ΤΤ5與下導線ΤΒ1〜ΤΒ5的線寬均為約4〇 // m、導線厚度均為約1 5 // m、且相鄰的導線之間均有約4 〇 "m的間隙,且上導線ΤΠ〜ΤΤ5與下導線TB1〜TB5分別為厚 度約3 5 // m的防銲層4 6 1與厚度約3 5 // m的防銲層4 6 7所覆 盍。另外’在第一層線路451與第二層線路452之間有一厚 度約3 3 // m的介電層4 6 2,其中第二層線路4 5 2的厚度為約 21 // m ;在第二層線路452與第三層線路453之間有一厚度 約70//m的介電層463,其中第三層線路453的厚度為約18 // m ;在第三層線路4 5 3與第四層線路4 5 4之間有一厚度約 5 0 2 //in的介電層464,其中第四層線路454的厚度約18 // m ’在第四層線路454與第五層線路455之間有一厚度約70 //ra的介電層465,其中第五層線路455的厚度約21 //m ;在 第五層線路45 5與第六層線路45 6之間則有一厚度為33 //m 的介電層466。其中,第二層線路4 5 2、第三層線路45 3、 第四層線路4 5 4 '與第五層線路4 5 5均為舖銅層;第二層線 路45 2與第三層線路453係為VSS層,即接地層(ground); 而第四層線路454與第五層線路455係為VDD層,即電源層 (power) ° 在本發明第一實施例中,電性保護裝置4 4 0的邊緣延 伸部444與封裝基板4〇2的防銲層461呈無間隙的狀態,而 電性保護裝置440未與第二層線路4 5 2、第三層線路45 3、 或其他接地元件電性連接,而為未接地的狀態;而以電性 模擬的方法所得之本發明第一實施例之半導體封裝結構200414468 V. Description of the invention (10) The upper conductors TT1 ~ TT5, and the five lower conductors TB5 of the sixth-layer wiring 45 6; and the widths of the upper conductors TT1 ~ TT5 and the lower conductors TB1 ~ TB5 are about 4 / / m, the thickness of the wires are about 1 5 // m, and there is a gap of about 4 m between the adjacent wires, and the upper wires ΤΠ ~ ΤΤ5 and the lower wires TB1 ~ TB5 are each about 3 5 thick. // m solder mask 4 6 1 and solder mask 4 6 7 with a thickness of about 3 5 // m. In addition, there is a dielectric layer 4 6 2 having a thickness of about 3 3 // m between the first layer of wiring 451 and the second layer of wiring 452, wherein the thickness of the second layer of wiring 4 5 2 is about 21 // m; A dielectric layer 463 having a thickness of about 70 // m is formed between the second layer wiring 452 and the third layer wiring 453, wherein the thickness of the third layer wiring 453 is about 18 // m; the third layer wiring 453 and There is a dielectric layer 464 with a thickness of about 5 0 2 // in between the fourth layer wiring 4 5 4, wherein the thickness of the fourth layer wiring 454 is about 18 // m ′ between the fourth layer wiring 454 and the fifth layer wiring 455 There is a dielectric layer 465 with a thickness of about 70 // ra between them, of which the thickness of the fifth layer line 455 is about 21 // m; between the fifth layer line 45 5 and the sixth layer line 45 6 there is a thickness of 33 // m of dielectric layer 466. Among them, the second layer line 4 5 2, the third layer line 45 3, the fourth layer line 4 5 4 ′ and the fifth layer line 4 5 5 are copper layers; the second layer line 45 2 and the third layer line 453 is the VSS layer, that is, the ground layer; and the fourth layer 454 and the fifth layer 455 are the VDD layer, which is the power layer. In the first embodiment of the present invention, the electrical protection device The edge extension 444 of 4 4 0 and the solder mask layer 461 of the package substrate 40 are in a state of no gap, and the electrical protection device 440 is not connected to the second layer circuit 4 5 2, the third layer circuit 453, or other The grounding element is electrically connected and is in an ungrounded state; and the semiconductor package structure of the first embodiment of the present invention obtained by an electrical simulation method
0702-8850TWf(nl);91P58;Dwwang.ptd 第14頁 2004144680702-8850TWf (nl); 91P58; Dwwang.ptd Page 14 200414468
五、發明說明(ΙΌ 4 0 0之傳輸線的特性阻抗控制 (互感)值紀錄在表一之中。 範圍以及導線間之感應電感 第二實施例: 口月茶考弟5圖’係顯示本黎穿 ^ 斗丄 貝丁不兔明弟二實施例之覆晶封裝 結構5 0 0。其中,本發明之筮— ,no , a ^ 个〜月之弟一貫施例所使用的封裝基板 5 0 2係一具有一内部線路為丄恳 &牡贫α 馬,、層層積電路的BGA形式的覆晶 封裝基板,但不代表本發明的庵 ^ 勺應用就侷限在使用上述形式 的封裝基板,只要是採用霜曰私壯、 4α1 +文疋休用俣日日封裝形式的封裝結構,任何 = ϊίΐ ’在不脫離本發明之精神和範圍a,當可作 些^更㈣潤=4使用其他形式的覆晶封裝基板。 貝也例之復日日封I結構5 0 0係具有一電性 保4I置5 4 0,可以有效批制廿上田社 认说认此α &制调整覆晶封裝結構5 0 〇中傳 輸線的特性阻抗變化,i中扁抖爿士 ιψ ^ ^ ^ , 八甲在封叙基板5 0 2,其一表面呈 二T r曰μ彳Q η〆 f夕]的接』5 1 0以及複數個接點5 2 〇 ; 而I C晶片1 8 0係組裝於封梦其^; ς n 9 以-宗μ 二 的上述表面,以複數個 以疋間隙排列找晶片18〇與接點51 590與封裝基板5 0 2形成電性連社· ] 3 ¥电凸塊 七人w壯甘』取迅庇連、乡口,另外填充物5 7 0係形成 於封衣基板5 0 2與1C晶片18〇之間,且 導電凸塊5 9 0的間隙之門.1^士^兄物1)更真充在 凸出部546與一邊緣延伸邻544,衣置b4U ^有一V. Description of the Invention The characteristic impedance control (mutual inductance) value of the transmission line (1-4) is recorded in Table 1. The range and the induced inductance between the wires Second embodiment: Oral tea tea test 5 Picture 'shows this Li The chip-on-chip package structure 50 of the second embodiment of the beating and beating is not included. Among them, the package substrate of the present invention, which is the same as that of the conventional embodiment, is used as the package substrate. It is a flip-chip package substrate with a BGA form having an internal circuit of & & poor α horse, and a layered circuit, but does not mean that the application of the invention is limited to the use of the above-mentioned package substrate. As long as the packaging structure is in the form of a frosty package, 4α1 + text, and daily packaging, any = ϊίΐ 'without departing from the spirit and scope of the present invention a, when you can do something ^ 更 ㈣ 润 = 4 use other A flip-chip package substrate. The structure of the day-to-day cover I 5000 has an electrical protection 4I and 5 4 0, which can effectively approve the Ueda Corporation to recognize this α & system to adjust the flip chip The characteristic impedance change of the transmission line in the package structure 5 0 〇 ^, Bajia on the sealing substrate 5 02, one surface of which is two T r (μ 彳 Q η〆f)] 5 1 0 and a plurality of contacts 5 2 0; and the IC chip 1 8 0 series Assembled on Feng Mengqi ^ n 9 The above-mentioned two surfaces of -zong μ are arranged in a plurality of gaps to find the wafer 18〇 and the contact 51 590 and the package substrate 5 0 2 to form an electrical company ·] 3 ¥ Electric bump seven people w Zhuanggan ”take the quick shelter, rural entrance, in addition the filler 570 is formed between the coating substrate 502 and the 1C chip 180, and the gap between the conductive bump 590 Door. 1 ^ ^ brother 1) more true filling in the protruding portion 546 and an edge extending adjacent to 544, clothing b4U ^ one
曰κ 18(),而名# 申邛4 ”中凸出部54Θ係覆蓋1C 延伸部544,延伸至封裝基板5〇2的上述 表面,使電性保護裝置54Q可以有效控制並調 結構5 0 0中傳輪線的特性阻抗變 、衣 丨机义化且邊緣延伸部544更具It is said that κ 18 (), and the name # 申 邛 4 ”in the protruding part 54Θ covers the 1C extension part 544 and extends to the above surface of the package substrate 502, so that the electrical protection device 54Q can effectively control and adjust the structure 5 0 The characteristic impedance of the transmission line in 0 changes, the clothing becomes more mechanized, and the edge extension 544 is more
200414468200414468
有·""""接點5 4 2 ’並精由一接八仏^ an二时+ α . !! 接合物質5 2 2連接接點542*接豇 5 2 0而將電性保護裝置54〇固定於封 ::接點 性保護裝置540與封裝基板5〇2中上^ 亚將電 層(未繪示於圖面)連接。而雷地7 ^曰和甩路中的一接地 細圖中所緣示的電性保 不繪示。 f @ ’便予以省略 另 連接1C 以額外 而 較好為 一防蝕 封裝基 的情況 幫助I C 且導熱 壞氧樹 而 域係具 蓋;上 或具有 ,上述 另 點 5 3 0 , 戈口啕笟熟方面的需要 具有幫助1C晶片180散熱的功能。、40更可 i述=保護裝置540的材質為具導電性的材質, 或強化的鍍層;而在考慮電性:=有 板5。2中層積電路中的接地 性 = 下,接合物質522較好為—導雷物#連、、、°而接地 的物質,例如接合物質5 2 2 ' &子為一導電 脂的混合物。 了為一金屬銀粉末與一 ί^ί板Γ述在導上Λ表/上、接點51°以外的區 :大於…·之間隙,而在= = = 外在封裝基議的另一 d:間f狀態。 且上述外部接點530分別接合有、—二外=There are " " " " Contacts 5 4 2 'and are connected by one by eight ^ an two times + α. !! Bonding substance 5 2 2 Connected to contact 542 * Connected to 5 2 0 The sexual protection device 54 is fixed to the seal :: contact resistance protection device 540 and the upper layer of the package substrate 502, and the electrical layer (not shown in the figure) is connected. However, the electrical guarantee shown in the detailed picture in a grounded lightning circuit is not shown. f @ 'It will be omitted to connect another 1C. In the case of an extra and better anti-corrosion package base, it helps the IC and the thermally conductive bad oxygen tree and the field system has a lid; on or with, the above point 5 3 0, well-known In terms of needs, it has a function to help the 1C chip 180 dissipate heat. , 40 can be described as follows: The material of the protective device 540 is a conductive material, or a reinforced plating; while considering the electrical properties: = there is a board 5. 2 grounding in the laminated circuit = 2, the bonding substance 522 is more than It is better that-conductive mine #connected, grounded, grounded, such as the bonding material 5 2 2 '& is a mixture of conductive grease. It is described as an area other than 51 ° between a metal silver powder and a metal plate on the guide table / on, the contact is more than 51 °, and the other d in the external packaging base is === : Between f states. And the above-mentioned external contacts 530 are respectively joined,-two outer =
200414468 五、發明說明(13) - 質可為含鉛的錫基合金或不含鉛的錫基合金的錫 錫球532將覆晶封裝結構5 0 0焊接於一例如為印刷 ::的外部元件上(未繪示於圖面)’進而完成最終之電子 本發明第二實施例之封裝基板5〇2中的層積電路血 =延伸部544之相對位置關係之示意圖,係雷同於第代 中所績示的封裝基板402中的層積電路與邊緣延伸部4 相對位置關係之示意圖。請參考本發明第4C圖盘本 一實施例中,對第4C圖之描述,在此便與以省略。x弟 在本發明第二實施例中,電性保護製置54〇的 伸部544與封裝基板5 0 2之間係為無間隙狀態,而性 裝置與封裝基板5〇2之上述層積電路中的一接地保^ 當於弟4C圖之第二層線路452或第三層、線路4 5 3 )電性連接 ,而為接地的狀態;而以電性模擬的方法所得之本發 施例之半導體封裝結構50 0之傳輸線的特性阻抗控 槌圍以及導線間之感應電感(互感)值紀錄在表一之中。制 第三實施例: 請參考第6A圖,係顯示本發明第 Π;為本發明第二實施例之覆晶繼;:二 化。一者的不同點在於本發明第三實施 5〇〇,中,以接點542,置換本發明第二每奸復日日封衣結構 #5 0 0 ^ ^ II ^ £ 540 ^ ,,,542 度的變化,在電性保護裝置54〇仍與封裝基板5〇2之層:電 戯 If 第17頁 0702-885〇mf(nl);91P58;Dwwang.ptd 200414468 五、發明說明(14) —接地層(相當於第4C圖之第二層線路452¾第-展 施例之辛曰1連接、而為接地的狀態下,使本發明第三實 ;:5i:r" ^5°2 ^ ^ ί : 晶封士::乳間隙548。而有關本發明第三實施例之覆 罗曰二、、Γ構 的其他描述皆可參考本發明第二實施例之 後日日封裝結構5〇〇之相關描述,在此則予以省略。 護f 第三實施例之覆晶封裝結構5QQ,中,電性保 屢ς置540的邊緣延伸部544與封裝基板5〇2的上述表面上 的^Γ線區之間有不大於4 0 m i 1 · ( 1 · 〇 1 6 mm}的空氣間隙 gap) 548,而電性保護裝置54〇與封裝基板5〇2之層積 電路中的一接地層(相當於第4C圖之第二層線路452或第三 層線路453 )電性連接,而為接地的狀態;而以電性模擬的 方法所得之本發明第三實施例之半導體封裝結構5〇〇,之傳 輸線的特性阻抗控制範圍以及導線間之感應電感(互感)值 紀錄在表一之中。 比較例: 明參考第7 A圖,係顯示一比較例之覆晶封裴結構7 〇 〇 ’為一不具有電性保護之傳統的覆晶封裝結構7〇〇。其中 ’本發明之比較例所使用的封裝基板7 〇 2係一具有一内部 線路為六層層積電路的BGA形式的覆晶封裝基板。 本發明比較例之覆晶封裝結構7 0 0中,包含:封裝基 板7 0 2 ’其一表面具有複數個以一定間隙排列的接點71〇以200414468 V. Description of the invention (13)-The tin-ball 532, which can be a lead-based alloy or a lead-free tin-based alloy, 532 solders the flip-chip package structure 5 0 0 to an external component such as printing :: The above (not shown in the figure) 'to complete the final electronic schematic diagram of the relative positional relationship of the laminated circuit blood = extended portion 544 in the package substrate 502 of the second embodiment of the present invention is the same as in the first generation The relative positional relationship between the laminated circuit and the edge extension 4 in the package substrate 402 is shown. Please refer to the 4C diagram of the present invention for the description of the 4C diagram, which is omitted here. In the second embodiment of the present invention, the gap 544 between the extension 544 of the electrical protection device 54 and the package substrate 502 is in a state without a gap, and the above-mentioned laminated circuit of the device and the package substrate 502 is One of the grounding protections is when the second layer line 452 or the third layer and the line 4 5 3 in the 4C diagram are electrically connected, but in a grounded state; and the present embodiment obtained by the electrical simulation method The characteristic impedance control of the transmission line of the semiconductor package structure of 500 and the induction inductance (mutual inductance) between the wires are recorded in Table 1. The third embodiment: Please refer to FIG. 6A, which shows the second embodiment of the present invention; it is a flip-flop following the second embodiment of the present invention; The difference between the two is that in the third embodiment of the present invention, the contact point 542 is used to replace the second daily coat structure of the present invention # 5 0 0 ^ ^ II ^ £ 540 ^ ,, 542 The degree of change is still between the electrical protection device 54 and the package substrate 502: the electronic game If Page 17 0702-885mf (nl); 91P58; Dwwang.ptd 200414468 V. Description of the invention (14) — Grounding layer (corresponding to the second layer of the line 4452 in Figure 4C), the first embodiment of the present invention is in a state of 1 connection and grounded, which makes the present invention the third embodiment ;: 5i: r " ^ 5 ° 2 ^ ^ ί: crystal seal :: milk gap 548. For other descriptions of the structure of the third embodiment of the present invention, please refer to the related packaging structure 500 after the second embodiment of the present invention. The description is omitted here. In the third embodiment of the flip-chip packaging structure 5QQ, the edge extension 544 of the electrical protection layer 540 and the ^ Γ line area on the surface of the packaging substrate 502 are repeatedly disposed. There is an air gap gap 548 of no more than 40 mi 1 · (1 · 〇16 mm), and the electrical protection device 54 is connected to one of the laminated circuits of the package substrate 50 Layer (corresponding to the second layer line 452 or the third layer line 453 in FIG. 4C) is electrically connected and grounded; and the semiconductor package structure 5 of the third embodiment of the present invention obtained by an electrical simulation method 5 The control range of the characteristic impedance of the transmission line and the value of the induced inductance (mutual inductance) between the conductors are recorded in Table 1. Comparative Example: Refer to Figure 7A, which shows a flip-chip package structure of a comparative example 7 〇 〇 'is a traditional flip-chip package structure 700 without electrical protection. Among them, the package substrate 7 used in the comparative example of the present invention is a BGA form with an internal circuit of a six-layer laminated circuit. The flip-chip package structure 700 according to the comparative example of the present invention includes: a package substrate 7 0 2 ′, one surface of which has a plurality of contacts 71
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第18頁 200414468Page 18 200414468
及複數個接點720 ;而iC晶片180係組裝於封裝A 表面,以複數個以—缓隙排列找 71〇之間的導電凸塊7 9 0與封裝基板702形成電性連;接= 及填充物770係形成於封裝基板702與1C晶片18〇之問,曰 填充物770更填充在導電凸塊79〇的間隙之間。曰’ 另外’在封裝基板7 〇 2的另一表面上呈古、— 接點73°’且上述外部接麵分別接合有 材質:為含錯的錫基合金或不含錯的錫基合二』 二藉由錫伽將覆晶封裝結構70。谭接::= =的外部元件上(未缘示於圖面),進而完成最= 之相:=n702中的層積電路與邊緣延伸麵 之相對位置關係之示意圖繪示於第冗圖。錄丨: ;出封Λ基板7〇2的第一層線路751中之五條上導線τη广 ΤΤ5,和弟六層線路756中之五條下導線TB1〜TB5 ; ^And a plurality of contacts 720; and the iC chip 180 is assembled on the surface of the package A, and a plurality of conductive bumps between 71 and 710 are arranged in a slow-gap arrangement to form an electrical connection with the package substrate 702; The filler 770 is formed between the package substrate 702 and the 1C wafer 180. That is, the filler 770 fills the gap between the conductive bumps 79. "Another" on the other surface of the package substrate 7 〇2 is ancient,-contact 73 ° ', and the above external interfaces are respectively bonded with a material: a tin-based alloy containing the wrong or tin-based two without error 』Two flip-chip packaging structure 70 by Siga. Tan Jie :: == on the external component (not shown in the drawing), and then complete the most phase: = n702 The schematic diagram of the relative positional relationship between the laminated circuit and the edge extension surface is shown in the first redundant figure. Recording 丨:; Five upper wires τη wide TT5 in the first layer of the circuit 751 sealing Λ substrate 702, and five lower wires TB1 ~ TB5 in the sixth layer of the circuit 756; ^
線ΤΤ1〜ΤΤ5與下導線ΤΒ卜ΤΒ5的線寬均Α έΛ)4η ... V 度均為約1 5 // m、且相鄰的導飨夕„认士 ^ ^ 且…tTT"TWr二 間均有約4〇"m的間隙, 且上¥ MTHT5與下導線TB1〜TB5分 防銲層761與厚度約35 "爪的防銲層767 又。、力/^的 第一層線路751與第二層線路752 < n &復^ ,在 介電層762,其中第二層線路75以=^ — 二層線路752與第三層線路753之門右又、、以m ,在第 電㈣3,其中第三層線路7 5 3 =:厚度約7°”的介 1〜的y子度為 8 一 層線議與第四層線路754之間有一厚度約5〇2㈣弟介二電The line widths of the lines TT1 to TT5 and the lower conductors TB and TB5 are both Δ Λ) 4η ... V degrees are all about 1 5 // m, and the adjacent guide lines are „recognition ^ ^ and… tTT " TWr two There is a gap of about 40mm between the top and bottom MTHT5 and the lower conductors TB1 to TB5. The solder mask 761 and the solder mask 767 with a thickness of about 35 claws are the first layer of the circuit. 751 and the second layer line 752 < n & complex ^, in the dielectric layer 762, where the second layer line 75 is at the gate of the second layer line 752 and the third layer line 753, and m, In the third electric line 3, where the third layer of the line 7 5 3 =: the thickness of about 7 ° ", the degree of y of the medium 1 ~ 8 is 8 there is a thickness of about 502 between the first layer line and the fourth layer line 754 Electricity
200414468 五、發明說明(16) 層764 ,其中第四屛餘々7 ^ 木臂線路7 54的厚度約18 //m 線 二754 ^綠線路75 5之間二Ϊ二:二 、中弟五層線路75 5的 m 二 :與=層㈣56之間則有一賴^ 八二第一層線路75 2、第三層線路753、第四^ 一54、與第五層線路75 5均為舖銅層;第二層線路75^2座 第一層線路=53係、為vss層,即接地層(gr_d);而第四層 線路754與第五層線路75 5係為VDD層,即電源層㈧⑽。曰 以電性模擬的方法所得之比較例之半導體封裝結構 7 0 0之傳輸線的特性阻抗控制範圍以及導線間之感應電感 (互感)值紀錄在下列表一之中。 導線TT1與導線 TT2之互感 (nH/mrn) 導線TT1與導 線Π3之互感 (nH/mrn) 導線ΤΠ與導 線TT4之互感 (nH/mm) 特性阻抗控制 (Ω) 比較例 0.0710 0.0236 0_ 51 第一冒施例 0.0269 0.0146 0.0138 32-51 第一霣施例 0.0131 0.03067 〇·03⑴6 30-51 第二富施例 0.0599 0.0149 0.00404 47-51 ^表一各賓施例與比較例之特性阻抗値可控制的範圍以及各賓施例與比較 例之導線ΤΠ分別與導線TT2、TT3、TT4之閭的互感値的電性模擬結果 請參考表一,係顯示在各實施例與比較例之特性阻抗 (character impedance)值可控制的範圍以及各實施例與 比較例之導線TT1分別與導線TT2、TT3、TT4之間的互感值 的電性模擬結果。在比較例之傳統的覆晶封裝結構7 〇 0中200414468 V. Description of the invention (16) Layer 764, of which the thickness of the fourth line Yu 7 7 ^ wooden arm line 7 54 is about 18 // m line 2 754 ^ green line 75 5 between 22: 2 Layer 2 of the line 75 5: There is a gap between == layer ㈣56 ^ The first layer of the line 75 2, the third layer of the line 753, the fourth ^ 54, and the fifth layer of the line 75 5 are copper The second layer is 75 ^ 2, the first layer is 53 series, it is the vss layer, which is the ground layer (gr_d); and the fourth layer 754 and the fifth layer 75 are the VDD layer, which is the power layer. Alas. The semiconductor package structure of the comparative example obtained by the electrical simulation method is used to record the characteristic impedance control range of the transmission line and the value of the induced inductance (mutual inductance) between the wires in Table 1 below. Mutual inductance of lead TT1 and lead TT2 (nH / mrn) Mutual inductance of lead TT1 and lead Π3 (nH / mrn) Mutual inductance of lead TTII and lead TT4 (nH / mm) Characteristic impedance control (Ω) Comparative example 0.0710 0.0236 0_ 51 First Example 0.0269 0.0146 0.0138 32-51 First example 0.0131 0.03067 〇03⑴6 30-51 Second rich example 0.0599 0.0149 0.00404 47-51 ^ Table 1 The characteristic impedance of each of the examples and comparative examples is controllable. For the range and the electrical simulation results of the mutual inductance between the lead Π and the lead TT2, TT3, and TT4 of each of the examples and comparative examples, please refer to Table 1, which shows the characteristic impedance of the examples and comparative examples. ) Value controllable range and the electrical simulation results of the mutual inductance between the wire TT1 and the wires TT2, TT3, and TT4 of the examples and comparative examples. In the conventional flip-chip package structure 7000 of the comparative example
0702-8850TWf(nl);91P58;Dwwang.ptd 第20頁 200414468 五、發明說明(17) ’無電性保護裝置的号_,i # 封裝結構40 0中,電性伴護I士置4 Χ弟貝也例之覆晶 接地的壯r R /保姜衣置44〇之邊緣延伸部444為未 接地的狀悲,且邊緣延伸部444 *美勹禾 隙的狀態,苴在特性阻h枯叮¥、土板402的v線區為無間 為可#制在Μ Ο ^ η 制的範圍的電性模擬結果 :了抆制在32 Ω〜51Ω的範圍内; 禾 覆晶封裝結構5 0 0中,電性仵,壯月/:只轭例之 係接地於基板5〇2的接:Γ且:;4:之邊緣延伸部544 的導線區為無間隙的狀能層邊緣延伸部544與基板5〇2 的電性模擬紝果盔叮心,、在特性阻抗值可控制的範圍 明^二;,制在3〇〇〜51〇的範圍内;而本發 一貝施例之後晶封裝結構5 0 〇,中,電性伴1 # 之邊緣延伸部544係接地於基板:置540 部544與基板50 2的導線 板50 2的:地層,且邊緣延伸 548,其在特性阻f信_^/、有不大於40 mil.的空氣間隙. 控制在心〜:範^ 圍的電性模擬結果為可 ,其:果彳:知:本發明之覆晶封裝結構 結構中傳輸線的特性財科i以控制亚5周整上述覆晶封裝 減低電路設計時的困難度」的i要; 提升覆晶封裝纟士椹由AA兩t ^ 土蛋目的、 另一目的、盥「伴1弔曰甩矾號品質及系統穩定度」的 的電路訊號而損壞,接、°構中勺1 c曰曰片不被不正常 命」的又另-目=。^升復晶封裝結構的可靠度與使用壽 另外,本發明之覆晶封裝社豆 °構,、具有一電性保護裝0702-8850TWf (nl); 91P58; Dwwang.ptd Page 20 200414468 V. Description of the invention (17) 'No. of electrical protection device _, i # Package structure 40 0, electrical protection I, 4 The edge extension 444 of the crystal-covered grounded R R / Bao Jiang Yi 44 〇 is ungrounded, and the edge extension 444 * beautiful in the state of the gap. ¥, the V-line area of the soil plate 402 is infinite, and the electrical simulation results can be made in the range of Μ Ο ^ η: the thickness is in the range of 32 Ω to 51 Ω; and the flip chip package structure 5 0 0 , Electricity, Zhuangyue /: only the yoke example is grounded to the substrate 502: Γ and: 4; the lead region of the edge extension 544 is a gap-free energy layer edge extension 544 and the substrate The electric simulation of 502 is carried out in a nutshell with a characteristic impedance value within a controllable range; the range is from 300 to 5100; and the crystal package structure after the implementation of this example 5 0 〇 , 中 , 电 性伴 1 # The edge extension 544 is grounded to the substrate: the 540 portion 544 and the substrate 50 2 of the lead plate 50 2 are: the ground layer, and the edge extends 548, which has a characteristic resistance f _ ^ / 、 There is an air gap of not more than 40 mil. Controlled in the heart ~: The range of electrical simulation results is acceptable, which is: Fruit: Know: The characteristics of the transmission line in the flip-chip packaging structure of the present invention The purpose is to control the above-mentioned flip-chip package to reduce the difficulty in circuit design during the 5th week; to improve the flip-chip package. The AA chip is designed for two purposes. The quality and system stability of the alum number are damaged and the circuit signal is damaged, and the connection is not abnormal. ^ Reliability and service life of the multi-crystal package structure In addition, the flip-chip package of the present invention is constructed with an electrical protective device
200414468 五、發明說明(18) 置,係覆蓋上述覆晶封裝結構中的I C晶片及封裝基板,更 可以保護上述覆晶封裝結構的I C晶片在後續加工製程中不 會受到機械性破壞。 而在各組導線TT1分別與導線TT2、TT3、TT4之間的互 感值的電性模擬結果方面,本發明三個實施例之覆晶封裝 結構之電性保護裝置亦可有效的降低導線之間的互感現 象,更使本發明之覆晶封裝結構之電性保護裝置亦具有降 低導線之間的互感現象之附加優點。 雖然本發明已以較佳實施例揭露如上,然其並非用以 限定本發明,任何熟習此技藝者,在不脫離本發明之精神 和範圍内,當可作些許之更動與潤飾,因此本發明之保護 範圍當視後附之申讀專利範圍所界定者為準。200414468 V. Description of the invention (18) The device covers the IC chip and the packaging substrate in the above-mentioned flip-chip packaging structure, and can further protect the IC chip of the above-mentioned flip-chip packaging structure from mechanical damage during subsequent processing. In terms of the electrical simulation results of the mutual inductance between each group of wires TT1 and wires TT2, TT3, and TT4, the electrical protection device of the flip-chip package structure of the three embodiments of the present invention can also effectively reduce the The mutual inductance phenomenon also makes the electrical protection device of the flip-chip package structure of the present invention have the additional advantage of reducing the mutual inductance phenomenon between the wires. Although the present invention has been disclosed in the preferred embodiment as above, it is not intended to limit the present invention. Any person skilled in the art can make some modifications and retouching without departing from the spirit and scope of the present invention. Therefore, the present invention The scope of protection shall be determined by the scope of the attached patent application.
0702-8850TWf(n 1); 91P5 8 ;Dwwang. ptd 第22頁 200414468 圖式簡單說明 第1 A〜1 C圖為一系列上視圖與剖面圖,用以說明美國 專利第5, 9 7 7, 6 2 6號與日本特許公開第P 2 0 0 0 - 7 7 5 7 5A號所 揭露之散熱裝置與在覆晶封裝結構的應用。 第2圖為一剖面圖,用以說明中華民國專利公告號第 4 1 0 445號與美國專利第6, 2 5 5, 1 4 0號所揭露之半導體晶方 尺寸封裝結構。 第3 A〜3B圖為一剖面圖與一上視圖,用以說明中華民 國專利公告號第5 0 8 7 7 8號所揭露之半導體晶片封裝構造。 第4A〜4C圖為一剖面圖、一上視圖與一示意圖,用以 說明本發明第一實施例之覆晶封裝結構。 第5圖為一剖面圖,用以說明本發明第二實施例之覆 晶封裝結構。 第6圖為一剖面圖,用以說明本發明第三實施例之覆 晶封裝結構。 第7 A〜7B圖為一剖面圖與一示意圖,用以說明一作為 比較例之傳統的覆晶封裝結構。 【符號說明】 2 0〜封裝基板; 2 2〜I C晶片; 2 4 a〜底膠; 26a〜導電凸塊, 2 8〜錫球; 3 0〜封膠體; 32〜散熱裝置;0702-8850TWf (n 1); 91P5 8; Dwwang. Ptd page 22 200414468 Figures briefly explain Figures 1 A to 1 C are a series of top and cross-sectional views used to illustrate US Patent No. 5, 9 7 7, The heat dissipation device disclosed in 6 2 6 and Japanese Patent Publication No. P 2 0 0 0-7 7 5 7 5A and its application in a flip-chip package structure. FIG. 2 is a cross-sectional view illustrating the semiconductor cube-size package structure disclosed in the Republic of China Patent Publication No. 4 10 445 and the US Patent No. 6, 2 55, 140. 3A to 3B are a cross-sectional view and a top view, which are used to illustrate the semiconductor chip package structure disclosed in the Republic of China Patent Publication No. 5 0 8 7 7. 4A to 4C are a cross-sectional view, a top view, and a schematic view, which are used to explain a flip-chip package structure according to the first embodiment of the present invention. Fig. 5 is a sectional view for explaining a flip-chip package structure according to a second embodiment of the present invention. Fig. 6 is a sectional view for explaining a flip-chip package structure according to a third embodiment of the present invention. Figures 7A to 7B are a cross-sectional view and a schematic diagram for explaining a conventional flip-chip package structure as a comparative example. [Symbol description] 2 0 ~ package substrate; 2 2 ~ IC chip; 2 4 a ~ primer; 26 a ~ conductive bumps, 2 8 ~ solder balls; 3 0 ~ sealing gel; 32 ~ heat sink;
0702-8850TWf(nl);91P58;Dwwang.ptd 第23頁 200414468 圖式簡單說明 3 2 a〜平面部; 32b〜凸出部; 3 2 c〜支持部; 3 2 d〜支持部; 4 1〜基板; 42〜半導體晶片; 4 3〜凸塊; 44、47、48〜填充體; 4 5〜散熱片; 45a〜第一散熱部; 45b〜第二散熱部; 4 9〜錫球; 2、4 0 0、5 0 0、5 0 0 ’、7 0 0〜覆晶封裝結構; 4 0 2、5 0 2、7 0 2〜封裝基板; 11 0、1 3 0〜接點; 4 3 2、5 3 2、7 3 2 〜錫球; 4 7 0、5 7 0、7 7 0〜填充物; 1 8 0〜I C晶片; 490、590、790〜導電凸塊; 311〜半導體晶元, 3 1 2〜散熱元件; 3 1 3〜基板; 3 1 4〜黏性環氧樹脂; 3 1 5、3 1 6〜錫球;0702-8850TWf (nl); 91P58; Dwwang.ptd Page 23 200414468 Brief description of the drawing 3 2 a ~ flat part; 32 b ~ protruding part; 3 2 c ~ support part; 3 2 d ~ support part; 4 1 ~ Substrate; 42 ~ semiconductor wafer; 4 3 ~ bump; 44, 47, 48 ~ filling body; 4 5 ~ heat sink; 45a ~ first heat sink; 45b ~ second heat sink; 4 9 ~ solder ball; 2, 4 0 0, 5 0 0, 5 0 0 ', 7 0 0 ~ flip-chip package structure; 4 0 2, 5 0 2, 7 0 2 ~ package substrate; 11 0, 1 3 0 ~ contacts; 4 3 2 , 5 3 2, 7 3 2 ~ solder balls; 4 7 0, 5 7 0, 7 7 0 ~ fillers; 1 80 ~ IC wafers; 490, 590, 790 ~ conductive bumps; 311 ~ semiconductor wafer, 3 1 2 ~ heat dissipation element; 3 1 3 ~ substrate; 3 1 4 ~ adhesive epoxy resin; 3 1 5、3 1 6 ~ solder ball;
0702-8850TWf(nl);91P58;Dwwang.ptd 第24頁 200414468 圖式簡早說明 3 1 7〜填膠層; 3 1 8〜空隙; 3 1 9〜空隙; 4 1 0、4 3 0〜接點; 4 2 2、5 2 2〜接合物質; 440、54 0〜電性保護裝置; 4 4 4、5 4 4〜邊緣延伸部; 446、546〜凸出部; 4 5 1、7 5 1〜第一層線路; 4 5 2、7 5 2〜第二層線路; 4 5 3、7 5 3〜第三層線路; 454、754〜第四層線路; 4 5 5、7 5 5〜第五層線路; 456、756〜第六層線路; 4 6 1、4 6 7〜防銲層; 46 2、46 3、464、46 5、46 6 〜介電層; 510、52 0、5 3 0、542、542’ 〜接點; 5 4 8〜空氣間隙; 7 1 0、7 3 0〜接點; 761、767〜防鲜層; 7 6 2、7 6 3、764、7 6 5、7 6 6 〜介電層; TB1、TB2、TB3、TB4、TB5 〜下導線; TT1、TT2、TT3、TT4、TT5〜上導線。0702-8850TWf (nl); 91P58; Dwwang.ptd Page 24 200414468 Simple and early description of the drawing 3 1 7 ~ filling layer; 3 1 8 ~ void; 3 1 9 ~ void; 4 1 0, 4 3 0 ~ connected Point; 4 2 2, 5 2 2 ~ bonding material; 440, 54 0 ~ electrical protection device; 4 4 4, 5 4 4 ~ edge extension; 446, 546 ~ protruding portion; 4 5 1, 7 5 1 ~ First layer line; 4 5 2, 7 5 2 ~ Second layer line; 4 5 3, 7 5 3 ~ Third layer line; 454, 754 ~ Fourth layer line; 4 5 5, 7 5 5 ~ No. Five-layer circuit; 456, 756 to sixth layer circuit; 4 6 1, 4, 6 7 to solder mask; 46 2, 46 3, 464, 46 5, 46 6 to dielectric layer; 510, 52 0, 5 3 0,542,542 '~ contact; 5 4 8 ~ air gap; 7 1 0, 7 3 0 ~ contact; 761, 767 ~ fresh-proof layer; 7 6 2, 7 6 3, 764, 7 6 5, 7 6 6 ~ Dielectric layer; TB1, TB2, TB3, TB4, TB5 ~ lower conductor; TT1, TT2, TT3, TT4, TT5 ~ upper conductor.
0702-8850TWf(nl);91P58;Dwwang.ptd 第25頁0702-8850TWf (nl); 91P58; Dwwang.ptd Page 25
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TWI509756B (en) * | 2013-09-30 | 2015-11-21 | Chipmos Technologies Inc | Chip-on-film package structure |
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