TWI508862B - 光吸收性層狀結構 - Google Patents

光吸收性層狀結構 Download PDF

Info

Publication number
TWI508862B
TWI508862B TW102116696A TW102116696A TWI508862B TW I508862 B TWI508862 B TW I508862B TW 102116696 A TW102116696 A TW 102116696A TW 102116696 A TW102116696 A TW 102116696A TW I508862 B TWI508862 B TW I508862B
Authority
TW
Taiwan
Prior art keywords
layered structure
sublayer
particles
layer
less
Prior art date
Application number
TW102116696A
Other languages
English (en)
Chinese (zh)
Other versions
TW201412542A (zh
Inventor
Wilma Dewald
Bernd Szyszka
Albert Kastner
Sabine Schneider-Betz
Martin Schlott
Markus Schultheis
Jens Wagner
Original Assignee
Heraeus Materials Tech Gmbh
Fraunhofer Ges Forschung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Materials Tech Gmbh, Fraunhofer Ges Forschung filed Critical Heraeus Materials Tech Gmbh
Publication of TW201412542A publication Critical patent/TW201412542A/zh
Application granted granted Critical
Publication of TWI508862B publication Critical patent/TWI508862B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/003—Light absorbing elements
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0688—Cermets, e.g. mixtures of metal and one or more of carbides, nitrides, oxides or borides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/206—Filters comprising particles embedded in a solid matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Physical Vapour Deposition (AREA)
TW102116696A 2012-06-01 2013-05-10 光吸收性層狀結構 TWI508862B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102012010803A DE102012010803A1 (de) 2012-06-01 2012-06-01 Licht absorbierende Schichtstruktur

Publications (2)

Publication Number Publication Date
TW201412542A TW201412542A (zh) 2014-04-01
TWI508862B true TWI508862B (zh) 2015-11-21

Family

ID=48366128

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102116696A TWI508862B (zh) 2012-06-01 2013-05-10 光吸收性層狀結構

Country Status (6)

Country Link
EP (1) EP2669718B1 (enExample)
JP (1) JP5675896B2 (enExample)
KR (1) KR101489070B1 (enExample)
CN (1) CN103454708B (enExample)
DE (1) DE102012010803A1 (enExample)
TW (1) TWI508862B (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101983691B1 (ko) * 2012-08-17 2019-05-30 삼성디스플레이 주식회사 차광 부재 및 이를 포함하는 표시 장치
WO2015135524A1 (de) 2014-03-13 2015-09-17 Hottinger Baldwin Messtechnik Gmbh Monolithische miniatur-breitband-lichtquelle für messungen mit fbg-dehnungssensoren
EP3467140A1 (de) * 2017-10-06 2019-04-10 Plansee SE Targetmaterial zur abscheidung von molybdänoxid-schichten
TWI850175B (zh) * 2022-10-20 2024-07-21 大立光電股份有限公司 光路轉折元件、成像鏡頭模組及電子裝置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5976639A (en) * 1995-01-11 1999-11-02 Anelva Corporation Black matrix laminated film and reactive sputtering apparatus
US20010030721A1 (en) * 1999-12-23 2001-10-18 Z. Ivan Indutnyy Black matrix and preparing method thereof, and a display device employing the black matrix
US20100313875A1 (en) * 2007-10-18 2010-12-16 Kennedy Cheryl E High temperature solar selective coatings

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04342204A (ja) * 1991-05-20 1992-11-27 Matsushita Electric Ind Co Ltd ブラックマトリクスおよびその製造方法
KR100615154B1 (ko) * 1999-08-19 2006-08-25 삼성에스디아이 주식회사 콘트라스트가 향상된 음극선관
JP4614027B2 (ja) 2000-07-03 2011-01-19 ソニー株式会社 光学多層構造体および光スイッチング素子、並びに画像表示装置
US7332852B2 (en) * 2004-07-02 2008-02-19 Samsung Electronics Co., Ltd. One-way transparent optical system having light absorption elements and light refracting structures

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5976639A (en) * 1995-01-11 1999-11-02 Anelva Corporation Black matrix laminated film and reactive sputtering apparatus
US20010030721A1 (en) * 1999-12-23 2001-10-18 Z. Ivan Indutnyy Black matrix and preparing method thereof, and a display device employing the black matrix
US20100313875A1 (en) * 2007-10-18 2010-12-16 Kennedy Cheryl E High temperature solar selective coatings

Also Published As

Publication number Publication date
KR20130135766A (ko) 2013-12-11
CN103454708A (zh) 2013-12-18
TW201412542A (zh) 2014-04-01
EP2669718B1 (de) 2016-12-28
DE102012010803A1 (de) 2013-12-05
JP2013250560A (ja) 2013-12-12
CN103454708B (zh) 2016-08-10
EP2669718A1 (de) 2013-12-04
JP5675896B2 (ja) 2015-02-25
KR101489070B1 (ko) 2015-02-02

Similar Documents

Publication Publication Date Title
TWI506154B (zh) 吸光層系統，彼之製法以及適合彼所用之濺射靶材
CN105143931B (zh) 光吸收层及含该层层系统、层系统制造方法及适用溅镀靶
TWI700382B (zh) 氧化物薄膜及用以製造該薄膜之濺鍍靶用氧化物燒結體
TW201539487A (zh) 導電結構體及其製造方法
TWI508862B (zh) 光吸收性層狀結構
CN108242276A (zh) 层叠布线膜及其制造方法以及Mo合金溅射靶材
US20160224151A1 (en) Electrode to be used in input device and method for producing same
WO2014171149A1 (ja) 透明導電体及びその製造方法
CN109704596A (zh) 一种折射率匹配的减反射导电膜及其制备方法
TWI269817B (en) Sputtering target, transparent conductive oxide, and process for producing the sputtering target
TW202018111A (zh) 光學機能膜、濺鍍靶及濺鍍靶之製造方法
JP4316868B2 (ja) 透明導電積層体
JP2017068219A (ja) 電極構造
TW202200816A (zh) 濺鍍靶材及光學功能膜
WO2020050421A1 (ja) 光学機能膜、スパッタリングターゲット、及び、スパッタリングターゲットの製造方法
WO2014030617A1 (ja) フラットパネルディスプレイの半透過電極用Ａｌ合金膜、およびフラットパネルディスプレイ用半透過電極
Yabe et al. Effect of Film Thickness on Electrical and Optical Properties of ZnO/Ag Dual Layer Film

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees