TWI505933B - The manufacturing method and the layered body of the layered body - Google Patents

The manufacturing method and the layered body of the layered body Download PDF

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Publication number
TWI505933B
TWI505933B TW100116558A TW100116558A TWI505933B TW I505933 B TWI505933 B TW I505933B TW 100116558 A TW100116558 A TW 100116558A TW 100116558 A TW100116558 A TW 100116558A TW I505933 B TWI505933 B TW I505933B
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Taiwan
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substrate
resin layer
resin
coupling agent
decane coupling
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TW100116558A
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TW201202030A (en
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Kenichi Ebata
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Asahi Glass Co Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/283Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polysiloxanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/28Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
    • B32B27/286Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polysulphones; polysulfides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/30Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
    • B32B27/308Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/34Layered products comprising a layer of synthetic resin comprising polyamides
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/36Layered products comprising a layer of synthetic resin comprising polyesters
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/12Interconnection of layers using interposed adhesives or interposed materials with bonding properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B9/00Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
    • B32B9/04Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B9/045Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/50Properties of the layers or laminate having particular mechanical properties
    • B32B2307/546Flexural strength; Flexion stiffness
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/732Dimensional properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/12Photovoltaic modules
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/202LCD, i.e. liquid crystal displays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/20Displays, e.g. liquid crystal displays, plasma displays
    • B32B2457/206Organic displays, e.g. OLED

Description

積層體之製造方法及積層體Method for manufacturing laminated body and laminated body

本發明係關於一種積層體之製造方法及積層體。The present invention relates to a method for producing a laminate and a laminate.

近年來,正進行太陽電池(PV)、液晶面板(LCD)、有機EL面板(OLED)等裝置(電子設備)之薄型化、輕量化,並進行用於該等裝置之基板之薄板化。另一方面,若由於薄板化而使基板之強度不足,則於裝置之製造步驟中,基板之操作性下降。In recent years, devices (electronic devices) such as solar cells (PV), liquid crystal panels (LCDs), and organic EL panels (OLEDs) have been thinned and lightened, and thinning of substrates for such devices has been carried out. On the other hand, if the strength of the substrate is insufficient due to the thinning, the handleability of the substrate is lowered in the manufacturing process of the device.

因此,先前廣泛採用在厚於最終厚度之基板上形成裝置用構件(例如薄膜電晶體)後,藉由化學蝕刻處理使基板薄板化之方法。然而,於該方法中,例如於將1片基板之厚度自0.7 mm薄板化成0.2 mm或0.1 mm之情形時,會利用蝕刻液,將原本之基板之材料削落一大半,故就生產性或原材料之使用效率之觀點而言欠佳。Therefore, a method of thinning a substrate by a chemical etching process after forming a device member (for example, a thin film transistor) on a substrate thicker than the final thickness has been widely used. However, in this method, for example, when the thickness of one substrate is reduced from 0.7 mm to 0.2 mm or 0.1 mm, the etching material is used to cut the material of the original substrate by a large part, so that productivity or The use efficiency of raw materials is not good.

又,於上述利用化學蝕刻之基板之薄板化方法中,於基板表面存在微細之損傷時,存在由於蝕刻處理而以損傷為起點形成微細之凹處(腐蝕坑),從而形成光學缺陷之情形。Further, in the thinning method of the substrate by chemical etching, when there is a fine damage on the surface of the substrate, a fine recess (corrosion pit) is formed from the damage as a starting point due to the etching treatment, thereby forming an optical defect.

最近,為應對上述課題,提出準備積層有基板與加強板之積層體,於積層體之基板上形成裝置用構件後,自基板剝離加強板之方法(例如參照專利文獻1)。加強板包含玻璃板與固定於該玻璃板上之樹脂層,樹脂層與基板可剝離地密接。加強板自基板剝離後,可與新的基板積層而作為積層體再次利用。Recently, in order to cope with the above-mentioned problem, a method of preparing a laminated body having a substrate and a reinforcing plate, and forming a member for a device on a substrate of the laminated body, and then peeling the reinforcing plate from the substrate has been proposed (for example, see Patent Document 1). The reinforcing plate includes a glass plate and a resin layer fixed to the glass plate, and the resin layer is detachably adhered to the substrate. After the reinforcing plate is peeled off from the substrate, it can be laminated with a new substrate and reused as a laminate.

先前技術文獻Prior technical literature 專利文獻Patent literature

專利文獻1:國際公開第07/018028號Patent Document 1: International Publication No. 07/018028

然而,於上述先前之構成之積層體中,當將加強板自基板剝離時,存在加強板之樹脂層受到凝聚破壞,樹脂層之一部分附著於製品側之基板上之情形。一般認為其原因在於,根據裝置之製造步驟中之加熱處理或化學液處理之條件,樹脂層劣化,或者樹脂層與基板之密接強度上升。However, in the laminate of the above-described prior art, when the reinforcing plate is peeled off from the substrate, the resin layer of the reinforcing plate is agglomerated and the resin layer is partially adhered to the substrate on the product side. The reason for this is considered to be that the resin layer is deteriorated or the adhesion strength between the resin layer and the substrate is increased depending on the conditions of the heat treatment or the chemical liquid treatment in the manufacturing steps of the apparatus.

本發明係鑒於上述課題而完成者,其目的在於提供一種剝離樹脂層與基板時,可抑制樹脂層受到凝聚破壞之積層體之製造方法、及積層體。The present invention has been made in view of the above-described problems, and an object of the invention is to provide a method for producing a laminate which can suppress aggregation failure of a resin layer when a resin layer and a substrate are peeled off, and a laminate.

為解決上述目的,本發明之積層體之製造方法係如下者:其係包含基板、支持板及存在於其等之間之樹脂層的積層體之製造方法,且係包括將上述樹脂層形成於上述支持板上之步驟、及使上述樹脂層與上述基板可剝離地密接之步驟者,且包括於上述密接步驟之前,預先以聚矽氧油或矽烷偶合劑對將要密接之上述基板表面及上述樹脂層表面之至少一方進行處理之步驟,或者於形成上述樹脂層之步驟中,由含有聚矽氧油或矽烷偶合劑之樹脂形成上述樹脂層,其後,於上述密接步驟中使上述基板及上述樹脂層重疊密接。In order to achieve the above object, a method for producing a laminate according to the present invention is a method for producing a laminate comprising a substrate, a support plate, and a resin layer present between the substrate, and a method of forming the resin layer. a step of the support plate and a step of adhering the resin layer to the substrate in a peelable manner, and comprising: before the bonding step, preliminarily contacting the surface of the substrate to be adhered with a polyoxygenated oil or a decane coupling agent a step of treating at least one of the surface of the resin layer or a step of forming the resin layer, wherein the resin layer is formed of a resin containing a polysiloxane or a decane coupling agent, and thereafter, the substrate and the substrate are adhered in the adhesion step The above resin layers are overlapped and adhered.

於本發明之積層體之製造方法中,較佳為包括如下步驟:於將要密接之上述基板表面及上述樹脂層表面之至少一方塗佈聚矽氧油或矽烷偶合劑;於塗佈聚矽氧油之情形時,進行使聚矽氧油低分子量化之處理;於塗佈矽烷偶合劑之情形時,進行使矽烷偶合劑反應之處理;其後,於上述密接步驟中使上述基板及上述樹脂層重疊密接。又,較佳為利用聚矽氧油或矽烷偶合劑對所密接之上述基板表面進行表面處理,實施有上述處理之基板表面之水接觸角為90°以上。In the method for producing a laminate according to the present invention, preferably, the method comprises the steps of: coating a surface of the substrate to be adhered and at least one of the surface of the resin layer with a polyoxygenated oil or a decane coupling agent; In the case of oil, a treatment for lowering the molecular weight of the polyoxyxene oil is carried out; in the case of coating the decane coupling agent, a treatment for reacting the decane coupling agent is carried out; thereafter, the substrate and the resin are subjected to the adhesion step Layers overlap and close. Further, it is preferable that the surface of the substrate to be adhered is surface-treated with a polyoxygen oxyhydroxide or a decane coupling agent, and the water contact angle of the surface of the substrate subjected to the above treatment is 90 or more.

於本發明之積層體之製造方法中,較佳為於將上述樹脂層形成於上述支持板上之步驟中,於上述支持板表面形成硬化性樹脂組合物層,繼而使該硬化性樹脂組合物硬化而形成上述樹脂層。In the method for producing a laminate according to the present invention, it is preferable that a step of forming the resin layer on the support sheet forms a curable resin composition layer on the surface of the support sheet, and then the curable resin composition is formed. The resin layer is formed by hardening.

又,於本發明之積層體之製造方法中,較佳為上述樹脂層包含聚矽氧樹脂。Further, in the method for producing a laminate according to the present invention, it is preferable that the resin layer contains a polyoxyn resin.

進而,於本發明之積層體之製造方法中,較佳為上述樹脂層包含有機烯基聚矽氧烷與有機氫聚矽氧烷之反應硬化物。Further, in the method for producing a laminate according to the present invention, it is preferable that the resin layer contains a reaction cured product of an organic alkenyl polysiloxane and an organic hydrogen polyoxyalkylene.

又,本發明之積層體係如下者:其係包含基板、支持板及存在於其等之間之樹脂層,上述樹脂層與上述基板可剝離地密接,上述樹脂層於上述支持板上以其等之間之剝離強度高於上述樹脂層與上述基板之間之剝離強度的方式而固定者,且所密接之上述基板表面及上述樹脂層表面之至少一方包含預先經聚矽氧油或矽烷偶合劑所處理之表面,或者上述樹脂層係由含有聚矽氧油或矽烷偶合劑之樹脂所形成者。Further, the laminated system of the present invention includes a substrate, a support plate, and a resin layer interposed therebetween, wherein the resin layer is detachably adhered to the substrate, and the resin layer is on the support plate. The peeling strength between the resin layer and the substrate is fixed, and at least one of the surface of the substrate and the surface of the resin layer which are in contact with each other includes a polyoxygenated oil or a decane coupling agent. The surface to be treated, or the above resin layer, is formed of a resin containing a polyoxygenated oil or a decane coupling agent.

於本發明之積層體中,較佳為與上述樹脂層表面密接之基板表面為利用聚矽氧油或矽烷偶合劑進行表面處理之表面。又,較佳為上述經表面處理之基板表面之水接觸角為90°以上。In the laminate of the present invention, it is preferred that the surface of the substrate which is in close contact with the surface of the resin layer is a surface which is surface-treated with a polyoxygenated oil or a decane coupling agent. Further, it is preferable that the water contact angle of the surface of the surface-treated substrate is 90 or more.

又,於本發明之積層體中,較佳為上述樹脂層包含聚矽氧樹脂。Further, in the laminate of the present invention, it is preferable that the resin layer contains a polyfluorene oxide resin.

進而,於本發明之積層體中,較佳為上述樹脂層包含有機烯基聚矽氧烷與有機氫聚矽氧烷之反應硬化物。Further, in the laminate of the present invention, it is preferred that the resin layer contains a reaction cured product of an organic alkenyl polysiloxane and an organic hydrogen polyoxyalkylene.

根據本發明,可提供一種剝離樹脂層與基板時,可抑制樹脂層受到凝聚破壞之積層體之製造方法、及積層體。According to the present invention, it is possible to provide a method for producing a laminate which can suppress aggregation damage of the resin layer when the resin layer and the substrate are peeled off, and a laminate.

以下,參照圖式,對用以實施本發明之形態進行說明,但本發明並不受以下實施形態之限制,可不脫離本發明之範圍而對以下實施形態進行各種變形及置換。In the following, the embodiments of the present invention are described with reference to the accompanying drawings, but the present invention is not limited by the following embodiments, and various modifications and substitutions are made in the following embodiments without departing from the scope of the invention.

再者,於本發明中,所謂樹脂層固定於支持板上,係指樹脂層與支持板之間之剝離強度高於樹脂層與基板之間之剝離強度的狀態。Further, in the present invention, the fact that the resin layer is fixed to the support plate means that the peel strength between the resin layer and the support plate is higher than the peel strength between the resin layer and the substrate.

(第1實施形態)(First embodiment)

圖1係本發明之積層體之一例之部分側面圖。如圖1所示,積層體10係於基板20與支持板31其等之間存在樹脂層32之積層體。樹脂層32固定於支持板31上,且與基板20之第1主面201可剝離地密接。支持板31及樹脂層32於液晶面板等裝置(電子設備)之製造步驟中,作為加強基板20之加強板30而發揮功能。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partial side elevational view showing an example of a laminate of the present invention. As shown in FIG. 1, the laminated body 10 is a laminated body in which the resin layer 32 exists between the board|substrate 20, the support board 31, etc.. The resin layer 32 is fixed to the support plate 31 and is detachably adhered to the first main surface 201 of the substrate 20. The support plate 31 and the resin layer 32 function as the reinforcing plate 30 of the reinforcing substrate 20 in the manufacturing process of a device (electronic device) such as a liquid crystal panel.

該積層體10係使用至裝置之製造步驟之中途為止。即,該積層體10係使用至在基板20上形成薄膜電晶體等裝置用構件為止。其後,將加強板30自基板20剝離,使其不成為構成裝置之構件。自基板20剝離之加強板30可與新的基板20積層,而作為積層體10再次利用。以下,對各構成進行詳細說明。This laminated body 10 is used until the middle of the manufacturing process of the apparatus. In other words, the laminated body 10 is used until a member for a device such as a thin film transistor is formed on the substrate 20. Thereafter, the reinforcing plate 30 is peeled off from the substrate 20 so as not to become a member constituting the device. The reinforcing plate 30 peeled off from the substrate 20 can be laminated with the new substrate 20 and reused as the laminated body 10. Hereinafter, each configuration will be described in detail.

首先,對基板20進行說明。First, the substrate 20 will be described.

基板20於第2主面202形成裝置用構件,而構成裝置。此處,所謂裝置用構件,係指構成裝置之至少一部分之構件。作為裝置用構件之具體例,可列舉薄膜電晶體(TFT,Thin Film Transistor)、彩色濾光片(CF,Color Filter)。作為裝置,可例示太陽電池(PV)、液晶面板(LCD)、有機EL面板(OLED)等。The substrate 20 forms a device member on the second main surface 202 to constitute a device. Here, the means for the device means a member constituting at least a part of the device. Specific examples of the member for the device include a thin film transistor (TFT, Thin Film Transistor) and a color filter (CF, Color Filter). As the device, a solar cell (PV), a liquid crystal panel (LCD), an organic EL panel (OLED), or the like can be exemplified.

基板20之種類可為一般者,例如矽晶圓、玻璃基板、樹脂基板,或者亦可為不鏽鋼(SUS)基板或銅基板等金屬基板。該等之中,較佳為玻璃基板。其原因在於,玻璃基板之耐化學品性、耐透濕性優異,且熱收縮率較低。作為熱收縮率之指標,可使用JIS R 3102-1995中規定之線膨脹係數。The type of the substrate 20 may be a general one, for example, a germanium wafer, a glass substrate, a resin substrate, or a metal substrate such as a stainless steel (SUS) substrate or a copper substrate. Among these, a glass substrate is preferable. The reason for this is that the glass substrate is excellent in chemical resistance and moisture permeability resistance, and has a low heat shrinkage rate. As an index of the heat shrinkage rate, the linear expansion coefficient specified in JIS R 3102-1995 can be used.

若基板20之線膨脹係數較大,則由於裝置之製造步驟多伴隨加熱處理,故容易產生各種不良情形。例如,於基板20上形成TFT之情形時,若冷卻於加熱下形成TFT之基板20,則存在由於基板20之熱收縮,而使TFT之位置偏移變得過大。When the linear expansion coefficient of the substrate 20 is large, since the manufacturing process of the apparatus is often accompanied by heat treatment, various problems are likely to occur. For example, when a TFT is formed on the substrate 20, if the substrate 20 on which the TFT is formed by heating is cooled, there is a thermal contraction of the substrate 20, and the positional shift of the TFT is excessively large.

玻璃基板可將玻璃原料熔融,使熔融玻璃成形為板狀而獲得。上述成形方法可為一般者,例如可使用浮式法、融合法、流孔下引法法、富可法、魯伯法等。又,厚度特別薄之玻璃基板可利用將暫時成形為板狀之玻璃加熱至可成形之溫度,以延伸等手段進行拉伸使其變薄之方法(再曳引法)進行成形而獲得。The glass substrate can be obtained by melting a glass raw material and forming the molten glass into a plate shape. The above-mentioned forming method may be a general one, and for example, a floating method, a fusion method, a flow hole down-draw method, a rich method, a Luber method, or the like may be used. Further, the glass substrate having a particularly small thickness can be obtained by heating a glass which has been temporarily formed into a plate shape to a temperature at which it can be formed, and stretching it by means of stretching or the like (re-drawing method).

玻璃基板之玻璃並無特別限定,較佳為無鹼玻璃、硼矽玻璃、鈉鈣玻璃、高矽玻璃、化學強化玻璃、以及其他以氧化矽作為主成分之氧化物系玻璃。作為氧化物系玻璃,較佳為以氧化物換算之氧化矽含量為40~90質量%之玻璃。The glass of the glass substrate is not particularly limited, and is preferably an alkali-free glass, a borosilicate glass, a soda-lime glass, a sorghum glass, a chemically strengthened glass, or another oxide-based glass containing cerium oxide as a main component. The oxide-based glass is preferably a glass having a cerium oxide content of 40 to 90% by mass in terms of oxide.

作為玻璃基板之玻璃,可採用適合裝置之種類或其製造步驟之玻璃。例如,關於液晶面板用之玻璃基板,由於鹼金屬成分之溶出容易對液晶造成影響,故包含實質上不含鹼金屬成分之玻璃(無鹼玻璃)。如此般,玻璃基板之玻璃可根據所應用之裝置之種類及其製造步驟而適當選擇。As the glass of the glass substrate, a glass suitable for the type of the device or a manufacturing step thereof can be used. For example, the glass substrate for a liquid crystal panel contains a glass (alkali-free glass) which does not substantially contain an alkali metal component because the elution of an alkali metal component is easy to influence a liquid crystal. In this manner, the glass of the glass substrate can be appropriately selected depending on the type of the apparatus to be applied and the manufacturing steps thereof.

玻璃基板之厚度並無特別限定,就玻璃基板之薄型化及/或輕量化之觀點而言,通常未達0.8 mm,較佳為0.3 mm以下,更佳為0.15 mm以下。於厚度為0.8 mm以上之情形時,不滿足玻璃基板之薄型化及/或輕量化之要求。於厚度為0.3 mm以下之情形時,可對玻璃基板賦予良好之可撓性。於厚度為0.15 mm以下之情形時,可將玻璃基板捲取為輥狀。又,根據玻璃基板之製造容易、玻璃基板之操作容易等理由,玻璃基板之厚度較佳為0.03 mm以上。The thickness of the glass substrate is not particularly limited, and is usually less than 0.8 mm, preferably 0.3 mm or less, and more preferably 0.15 mm or less from the viewpoint of thickness reduction and/or weight reduction of the glass substrate. When the thickness is 0.8 mm or more, the requirements for thinning and/or weight reduction of the glass substrate are not satisfied. When the thickness is 0.3 mm or less, good flexibility can be imparted to the glass substrate. When the thickness is 0.15 mm or less, the glass substrate can be wound into a roll shape. Further, the thickness of the glass substrate is preferably 0.03 mm or more for the reason that the production of the glass substrate is easy and the operation of the glass substrate is easy.

樹脂基板之樹脂種類並無特別限定。具體可例示:聚對苯二甲酸乙二酯樹脂、聚碳酸酯樹脂、聚醯亞胺樹脂、氟樹脂、聚醯胺樹脂、芳族聚醯胺樹脂、聚醚碸樹脂、聚醚酮樹脂、聚醚醚酮樹脂、聚萘二甲酸乙二酯樹脂、聚丙烯酸系樹脂、各種液晶聚合物樹脂、環烯烴樹脂、聚矽氧樹脂等。再者,樹脂基板可透明,亦可不透明。又,樹脂基板亦可為於表面形成有保護層等功能層而成者。The type of the resin of the resin substrate is not particularly limited. Specific examples thereof include polyethylene terephthalate resin, polycarbonate resin, polyimide resin, fluororesin, polyamide resin, aromatic polyamide resin, polyether oxime resin, polyether ketone resin, Polyetheretherketone resin, polyethylene naphthalate resin, polyacrylic resin, various liquid crystal polymer resins, cycloolefin resins, polyoxyxylene resins, and the like. Further, the resin substrate may be transparent or opaque. Further, the resin substrate may be formed by forming a functional layer such as a protective layer on the surface.

再者,基板20可包含2層以上,於該情形時,形成各層之材料可為同種材料,亦可為不同種材料。又,於該情形時,「基板20之厚度」係指基板中之所有層之合計厚度。就基板之薄型化及/或輕量化之觀點而言,基板20之厚度通常未達1.0 mm,較佳為0.5 mm以下,更佳為0.3 mm以下。又,根據基板之製造容易、及基板之操作容易等理由,較佳為0.01 mm以上。Furthermore, the substrate 20 may include two or more layers. In this case, the materials forming the layers may be the same material or different materials. Moreover, in this case, "the thickness of the substrate 20" means the total thickness of all the layers in the substrate. The thickness of the substrate 20 is usually less than 1.0 mm, preferably 0.5 mm or less, and more preferably 0.3 mm or less from the viewpoint of thinning and/or weight reduction of the substrate. Further, it is preferably 0.01 mm or more depending on the ease of production of the substrate and the ease of handling of the substrate.

繼而,對支持板31進行說明。Next, the support board 31 will be described.

支持板31與樹脂層32共同作用,支持並加強基板20,於裝置之製造步驟中防止基板20之變形、損傷、破損等。又,於使用厚度較先前更薄之基板20之情形時,藉由形成與先前之基板相同厚度之積層體10,可於裝置之製造步驟中使用適合先前之厚度之基板的製造技術或製造設備亦為使用支持板31之目的之一。The support plate 31 cooperates with the resin layer 32 to support and reinforce the substrate 20, thereby preventing deformation, damage, breakage, and the like of the substrate 20 in the manufacturing steps of the device. Moreover, when a substrate 20 having a thinner thickness than the previous one is used, by forming the laminated body 10 having the same thickness as the previous substrate, a manufacturing technique or manufacturing apparatus suitable for the substrate of the previous thickness can be used in the manufacturing steps of the device. It is also one of the purposes of using the support board 31.

作為支持板31,例如可使用玻璃板、樹脂板、或不鏽鋼(SUS)板等金屬板等。支持板31於裝置之製造步驟伴隨熱處理之情形時,較佳為由與基板20之線膨脹係數差較小之材料所形成,更佳為由與基板20相同之材料所形成。於基板20為玻璃基板之情形時,支持板31較佳為玻璃板。尤佳為包含與玻璃基板相同之玻璃材料之玻璃板。As the support plate 31, for example, a metal plate such as a glass plate, a resin plate, or a stainless steel (SUS) plate can be used. The support plate 31 is preferably formed of a material having a small difference in linear expansion coefficient from the substrate 20 in the case where the manufacturing process of the device is accompanied by heat treatment, and is more preferably formed of the same material as the substrate 20. In the case where the substrate 20 is a glass substrate, the support plate 31 is preferably a glass plate. More preferably, it is a glass plate containing the same glass material as the glass substrate.

支持板31之厚度可厚於基板20,亦可薄於基板20。較佳為根據基板20之厚度、樹脂層32之厚度、及積層體10之厚度而選擇支持板31之厚度。例如,於現行之裝置之製造步驟係以處理厚度為0.5 mm之基板之方式而設計者,且基板20之厚度與樹脂層32之厚度之和為0.1 mm之情形時,將支持板31之厚度設為0.4 mm。於通常之情形,支持板31之厚度較佳為0.08~5.0 mm,更佳為0.2~5.0 mm,進而更佳為0.2~1.0 mm。The thickness of the support plate 31 may be thicker than the substrate 20 or thinner than the substrate 20. It is preferable to select the thickness of the support plate 31 in accordance with the thickness of the substrate 20, the thickness of the resin layer 32, and the thickness of the laminated body 10. For example, in the case where the manufacturing process of the current apparatus is designed to handle a substrate having a thickness of 0.5 mm, and the sum of the thickness of the substrate 20 and the thickness of the resin layer 32 is 0.1 mm, the thickness of the support plate 31 is used. Set to 0.4 mm. In the usual case, the thickness of the support plate 31 is preferably 0.08 to 5.0 mm, more preferably 0.2 to 5.0 mm, and still more preferably 0.2 to 1.0 mm.

於支持板31為玻璃板之情形時,根據容易操作、難以斷裂等理由,玻璃板之厚度較佳為0.08 mm以上。又,根據於裝置用構件形成後剝離時,可期待適度彎曲而不會斷裂之剛性之理由,玻璃板之厚度較佳為1.0 mm以下。In the case where the support plate 31 is a glass plate, the thickness of the glass plate is preferably 0.08 mm or more for reasons of easy handling, difficulty in breaking, and the like. Moreover, the thickness of the glass plate is preferably 1.0 mm or less, depending on the reason why the member for the device is peeled off after formation and can be expected to be moderately bent without being broken.

基板20與支持板31之於25~300℃下之平均線膨脹係數(以下簡稱作「平均線膨脹係數」)之差較佳為500×10-7 /℃以下,更佳為300×10-7 /℃以下,進而更佳為200×10-7 /℃以下。若差過大,則有可能於裝置之製造步驟中之加熱冷卻時,積層體10發生嚴重翹曲,基板20與加強板30剝離。於基板20之材料與支持板31之材料相同之情形時,可抑制產生上述問題。The difference between the average linear expansion coefficient of the substrate 20 and the support plate 31 at 25 to 300 ° C (hereinafter referred to as "average linear expansion coefficient") is preferably 500 × 10 -7 / ° C or less, more preferably 300 × 10 - 7 / ° C or less, and more preferably 200 × 10 -7 / ° C or less. If the difference is too large, there is a possibility that the laminate 10 is severely warped during heating and cooling in the manufacturing process of the apparatus, and the substrate 20 and the reinforcing plate 30 are peeled off. When the material of the substrate 20 is the same as the material of the support plate 31, the above problem can be suppressed.

繼而,對樹脂層32進行說明。Next, the resin layer 32 will be described.

樹脂層32固定於支持板31上,又,與基板20可剝離地密接。樹脂層32於進行剝離操作之前防止基板20之位置偏移,且藉由剝離操作容易自基板20剝離,防止基板20等因剝離操作而破損。The resin layer 32 is fixed to the support plate 31, and is detachably adhered to the substrate 20. The resin layer 32 prevents the positional deviation of the substrate 20 before performing the peeling operation, and is easily peeled off from the substrate 20 by the peeling operation, thereby preventing the substrate 20 or the like from being damaged by the peeling operation.

樹脂層32之大小並無特別限定。樹脂層32之大小可大於基板20或支持板31,亦可小於基板20或支持板31。The size of the resin layer 32 is not particularly limited. The resin layer 32 may be larger than the substrate 20 or the support plate 31, and may be smaller than the substrate 20 or the support plate 31.

樹脂層32之基材側之表面321(以下亦稱作「密接面321」)較佳為並非藉由如一般黏著劑所具有之黏著力,而是藉由起因於固體分子間之凡得瓦耳力(Van Der Waals force)之力而貼附於基板20之表面201(以下亦稱作「密接面201」)。其原因在於可容易地剝離。於本發明中,將該樹脂層表面之可容易剝離之性質稱作剝離性。The surface 321 of the substrate side of the resin layer 32 (hereinafter also referred to as "adhesive surface 321") is preferably not by the adhesive force as a general adhesive, but by the vanadium caused by the solid molecules. The force of the Van Der Waals force is attached to the surface 201 of the substrate 20 (hereinafter also referred to as "the contact surface 201"). The reason for this is that it can be easily peeled off. In the present invention, the property of the surface of the resin layer which can be easily peeled off is referred to as peelability.

另一方面,與樹脂層32對基板20之表面201之結合力相比,樹脂層32對支持板31之表面之結合力相對較高。因此,樹脂層32與支持板31之間之剝離強度高於樹脂層32與基板20之間之剝離強度。於本發明中,將樹脂層表面對基板表面之結合稱作密接,將樹脂層表面對支持板表面之結合稱作固定。樹脂層32與支持板31之間較佳為以黏著力或接著力結合。但並不限定於此,只要與樹脂層32對密接面201之結合力相比而相對較高,則樹脂層32與支持板31之間亦可藉由起因於上述凡得瓦耳力之力而貼附。On the other hand, the bonding strength of the resin layer 32 to the surface of the support plate 31 is relatively higher than the bonding force of the resin layer 32 to the surface 201 of the substrate 20. Therefore, the peeling strength between the resin layer 32 and the support sheet 31 is higher than the peel strength between the resin layer 32 and the substrate 20. In the present invention, the bonding of the surface of the resin layer to the surface of the substrate is referred to as adhesion, and the bonding of the surface of the resin layer to the surface of the support plate is referred to as fixation. Preferably, the resin layer 32 and the support plate 31 are bonded by an adhesive force or an adhesive force. However, the present invention is not limited thereto, and as long as it is relatively higher than the bonding strength of the resin layer 32 to the adhesion surface 201, the resin layer 32 and the support plate 31 may be caused by the force due to the above-described van der Waals force. Attached.

樹脂層32之厚度並無特別限定,較佳為1~100 μm,更佳為5~30 μm,進而更佳為7~20 μm。其原因在於,若樹脂層32之厚度為上述範圍,則樹脂層32與基板20之密接變得充分。又,其原因在於,即便於樹脂層32與基板20之間介有氣泡或異物,亦可抑制基板20之應變缺陷之產生。又,若樹脂層32之厚度過厚,則形成樹脂層時需要耗費時間及材料,故於經濟上不利。The thickness of the resin layer 32 is not particularly limited, but is preferably 1 to 100 μm, more preferably 5 to 30 μm, and still more preferably 7 to 20 μm. The reason for this is that when the thickness of the resin layer 32 is in the above range, the adhesion between the resin layer 32 and the substrate 20 is sufficient. Moreover, the reason is that even if air bubbles or foreign matter are interposed between the resin layer 32 and the substrate 20, the occurrence of strain defects of the substrate 20 can be suppressed. Moreover, when the thickness of the resin layer 32 is too thick, it takes time and material to form a resin layer, and it is economically disadvantageous.

再者,樹脂層32可包含2層以上。於該情形時,「樹脂層32之厚度」係指樹脂層之所有層之合計厚度。Further, the resin layer 32 may include two or more layers. In this case, the "thickness of the resin layer 32" means the total thickness of all the layers of the resin layer.

又,於樹脂層32包含2層以上之情形時,形成各層之樹脂之種類可不相同。Moreover, when the resin layer 32 contains two or more layers, the kind of the resin which forms each layer may differ.

樹脂層32較佳為包含玻璃轉移點低於室溫(25℃左右)或不具有玻璃轉移點之材料。其原因在於,樹脂層32成為非黏著性之樹脂層,可更加容易地與基板20剝離,同時與基板20之密接亦變得充分。The resin layer 32 preferably contains a material having a glass transition point lower than room temperature (about 25 ° C) or having no glass transition point. This is because the resin layer 32 is a non-adhesive resin layer, and can be more easily peeled off from the substrate 20, and the adhesion to the substrate 20 is also sufficient.

又,樹脂層32於裝置之製造步驟中常常進行加熱處理,故較佳為具有耐熱性。Further, since the resin layer 32 is often subjected to heat treatment in the manufacturing process of the apparatus, it is preferably heat-resistant.

又,若樹脂層32之彈性模數過高,則存在與基板20之密接性變低之傾向。另一方面,若樹脂層32之彈性模數過低,則剝離性變低。Further, when the elastic modulus of the resin layer 32 is too high, the adhesion to the substrate 20 tends to be low. On the other hand, if the elastic modulus of the resin layer 32 is too low, the peelability becomes low.

形成樹脂層32之樹脂之種類並無特別限定。例如可列舉丙烯酸系樹脂、聚烯烴樹脂、聚胺基甲酸酯樹脂及聚矽氧樹脂。亦可混合若干種樹脂而使用。其中,較佳為聚矽氧樹脂。其原因在於,聚矽氧樹脂之耐熱性及剝離性優異。又,其原因在於,於支持板31為玻璃板之情形時,藉由與玻璃板表面之矽烷醇基之縮合反應而容易固定於玻璃板上。聚矽氧樹脂層即便於介裝於支持板31與基板20之間之狀態下,例如於大氣中,以200℃左右處理1小時左右,剝離性亦幾乎未發生劣化,就該方面而言亦較佳。The kind of the resin forming the resin layer 32 is not particularly limited. For example, an acrylic resin, a polyolefin resin, a polyurethane resin, and a polyoxyl resin can be mentioned. It can also be used by mixing several kinds of resins. Among them, polyfluorene oxide resin is preferred. The reason for this is that the polyoxynoxy resin is excellent in heat resistance and peelability. Further, the reason is that when the support plate 31 is a glass plate, it is easily fixed to the glass plate by a condensation reaction with a stanol group on the surface of the glass plate. Even if the polyoxynoxy resin layer is interposed between the support plate 31 and the substrate 20, for example, in the atmosphere, it is treated at about 200 ° C for about 1 hour, and the peeling property is hardly deteriorated. Preferably.

樹脂層32較佳為包含聚矽氧樹脂中用於剝離紙用之聚矽氧樹脂(硬化物)。使成為剝離紙用聚矽氧樹脂之硬化性樹脂組合物於支持板31之表面硬化而形成的樹脂層32具有優異之剝離性,故而較佳。又,由於柔軟性較高,故即便樹脂層32與基板20之間混入氣泡或灰塵等異物,亦可抑制基板20之應變缺陷之產生。The resin layer 32 is preferably a polyoxyl resin (hardened product) for use in a release paper in a polyoxyxylene resin. The resin layer 32 formed by curing the surface of the support sheet 31 as a curable resin composition for a release resin for a release paper has excellent releasability, which is preferable. Moreover, since the flexibility is high, even if foreign matter such as bubbles or dust is mixed between the resin layer 32 and the substrate 20, the occurrence of strain defects of the substrate 20 can be suppressed.

上述成為剝離紙用聚矽氧樹脂之硬化性聚矽氧根據其硬化機制而分類為縮合反應型聚矽氧、加成反應型聚矽氧、紫外線硬化型聚矽氧及電子束硬化型聚矽氧,其等均可使用。該等之中,較佳為加成反應型聚矽氧。其原因在於,硬化反應之容易性、形成樹脂層32時之剝離性之程度良好,耐熱性亦較高。The above-mentioned curable polyfluorene oxide which is a polyoxyxylene resin for release paper is classified into a condensation reaction type polyoxane, an addition reaction type polyoxane, an ultraviolet curing type polyfluorene oxygen, and an electron beam hardening type polycondensation according to the curing mechanism. Oxygen, etc. can be used. Among these, an addition reaction type polyoxane is preferred. The reason for this is that the ease of the curing reaction and the degree of peeling property when the resin layer 32 is formed are good, and the heat resistance is also high.

加成反應型聚矽氧係包含主劑及交聯劑,且於鉑系觸媒等觸媒之存在下硬化之硬化性之組合物。加成反應型聚矽氧之硬化藉由加熱處理得到促進。加成反應型聚矽氧之主劑包含具有鍵結於矽原子上之烯基(乙烯基等)之直鏈狀有機聚矽氧烷(即有機烯基聚矽氧烷),乙烯基等成為交聯點。加成反應型聚矽氧之交聯劑包含具有鍵結於矽原子上之氫原子(氫矽烷基)之直鏈狀有機聚矽氧烷(即有機氫聚矽氧烷),氫矽烷基等成為交聯點。The addition reaction type polyoxo oxygen-based composition containing a main component and a crosslinking agent and hardened in the presence of a catalyst such as a platinum-based catalyst. The hardening of the addition reaction type polyoxane is promoted by heat treatment. The main component of the addition reaction type polyoxane includes a linear organopolyoxyalkylene (ie, an organic alkenyl polyoxyalkylene) having an alkenyl group (vinyl group or the like) bonded to a ruthenium atom, and a vinyl group or the like Cross-linking point. The addition reaction type polyfluorene crosslinking agent comprises a linear organopolyoxane (i.e., an organic hydrogen polyoxyalkylene) having a hydrogen atom (hydroalkylene group) bonded to a halogen atom, a hydroquinone group, or the like. Become a cross-linking point.

又,成為剝離紙用聚矽氧樹脂之硬化性聚矽氧於形態上有溶劑型、乳液型及無溶劑型,其等均可使用。該等之中,較佳為無溶劑型。其原因在於生產性、安全性及環境特性之方面優異。又,於形成樹脂層32時之硬化時、即進行加熱硬化、紫外線硬化或電子束硬化時,不含產生發泡之溶劑,故難以於樹脂層32中殘留氣泡。Further, the curable polyfluorene oxide which is a polyoxyxylene resin for release paper has a solvent type, an emulsion type, and a solventless type, and can be used. Among these, a solventless type is preferred. The reason is excellent in terms of productivity, safety, and environmental characteristics. Moreover, when curing the resin layer 32, that is, when heat curing, ultraviolet curing, or electron beam curing is performed, the solvent that causes foaming is not contained, so that it is difficult to leave bubbles in the resin layer 32.

又,作為成為剝離紙用聚矽氧樹脂之硬化性聚矽氧,具體而言,作為市售之商品名或型號,可列舉:KNS-320A、KS-847(均由Shin-Etsu Silicone公司製造)、TPR6700(GE Toshiba Silicone公司製造)、乙烯基聚矽氧「8500」(荒川化學工業公司製造)與甲基氫聚矽氧烷「12031」(荒川化學工業公司製造)之組合、乙烯基聚矽氧「11364」(荒川化學工業公司製造)與甲基氫聚矽氧烷「12031」(荒川化學工業公司製造)之組合、乙烯基聚矽氧「11365」(荒川化學工業公司製造)與甲基氫聚矽氧烷「12031」(荒川化學工業公司製造)之組合等。In addition, as a commercially available product name or model, KNS-320A and KS-847 (both manufactured by Shin-Etsu Silicone Co., Ltd.) are specifically mentioned as a curable polyfluorene which is a polyoxyl resin for a release paper. ), TPR6700 (manufactured by GE Toshiba Silicone Co., Ltd.), vinyl polyoxylium "8500" (manufactured by Arakawa Chemical Industries, Ltd.), and methyl hydrogen polyoxyalkylene "12031" (manufactured by Arakawa Chemical Industries, Ltd.), vinyl polymerization a combination of "11364" (manufactured by Arakawa Chemical Industries Co., Ltd.) and methyl hydrogen polyoxyalkylene "12031" (manufactured by Arakawa Chemical Industries, Ltd.), vinyl polyoxylium "11365" (manufactured by Arakawa Chemical Industries, Ltd.) and A A combination of a base hydrogen polyoxane "12031" (manufactured by Arakawa Chemical Industries, Ltd.).

再者,KNS-320A、KS-847及TPR6700為預先含有主劑與交聯劑之硬化性聚矽氧。Further, KNS-320A, KS-847, and TPR6700 are hardening polyfluorenes containing a main component and a crosslinking agent in advance.

又,形成樹脂層32之聚矽氧樹脂較佳為具有聚矽氧樹脂層中之成分難以轉移至基板20之性質、即低聚矽氧轉移性。Further, the polyfluorene oxide resin forming the resin layer 32 preferably has a property that it is difficult to transfer the components in the polyoxynoxy resin layer to the substrate 20, that is, oligomeric oxygen transfer property.

將樹脂層32固定於支持板31上之方法並無特別限定,例如可列舉將膜狀之樹脂固定於支持板31之表面之方法。具體可列舉如下方法:為賦予對膜之表面之較高固定力(較高之剝離強度),而對支持板31之表面進行表面改質處理(底塗處理),從而將樹脂層32固定於支持板31上。例如可例示:如矽烷偶合劑之化學地提高固定力之化學方法(底層處理)、如火焰(flame)處理般增加表面活性基之物理方法、如噴砂處理般藉由增加表面之粗糙度而增加抓力之機械處理方法等。The method of fixing the resin layer 32 to the support plate 31 is not particularly limited, and examples thereof include a method of fixing a film-like resin to the surface of the support plate 31. Specifically, in order to impart a high fixing force (high peel strength) to the surface of the film, the surface of the support plate 31 is subjected to a surface modification treatment (primer treatment) to fix the resin layer 32 to the resin layer 32. Support plate 31. For example, a chemical method such as a chemical reaction for increasing the fixing force of a decane coupling agent (underlayer treatment), a physical method of increasing a surface active group such as a flame treatment, and an increase in surface roughness by sandblasting may be exemplified. Mechanical handling methods for holding power, etc.

又,例如亦可利用於支持板31表面上形成成為樹脂層32之硬化性樹脂組合物之層,繼而使該硬化性樹脂組合物硬化而形成樹脂層32之方法,而形成固定於支持板31上之樹脂層32。作為於支持板31表面上形成硬化性樹脂組合物之層之方法,例如可列舉將硬化性樹脂組合物塗佈於支持板31上之方法。作為塗佈方法,可列舉:噴塗法、模塗法、旋塗法、浸塗法、輥塗法、棒塗法、網版印刷法、凹版印刷塗佈法等。可根據樹脂組合物之種類,自上述方法中適當選擇。In addition, for example, a layer of the curable resin composition to be the resin layer 32 is formed on the surface of the support sheet 31, and then the curable resin composition is cured to form the resin layer 32, and is formed to be fixed to the support sheet 31. The resin layer 32 thereon. As a method of forming a layer of the curable resin composition on the surface of the support sheet 31, for example, a method of applying the curable resin composition onto the support sheet 31 can be mentioned. Examples of the coating method include a spray coating method, a die coating method, a spin coating method, a dip coating method, a roll coating method, a bar coating method, a screen printing method, and a gravure coating method. It can be suitably selected from the above methods depending on the kind of the resin composition.

又,於將成為樹脂層32之硬化性樹脂組合物塗佈於支持板31上之情形時,其塗佈量較佳為1~100 g/m2 ,更佳為5~20 g/m2Further, when the curable resin composition to be the resin layer 32 is applied onto the support sheet 31, the coating amount thereof is preferably from 1 to 100 g/m 2 , more preferably from 5 to 20 g/m 2 . .

例如,於由加成反應型聚矽氧之硬化性樹脂組合物形成樹脂層32之情形時,藉由上述噴塗法等公知之方法,將包含有機烯基聚矽氧烷、有機氫聚矽氧烷及觸媒之混合物之硬化性樹脂組合物塗佈於支持板31上,其後進行加熱硬化。加熱硬化條件亦根據觸媒之調配量不同而有所不同,例如於相對於有機烯基聚矽氧烷與有機氫聚矽氧烷之合計量100質量份而調配鉑系觸媒2質量份之情形時,於大氣中,以50℃~250℃、較佳為以100℃~200℃進行反應。又,該情形時之反應時間設為5~60分鐘、較佳為10~30分鐘。For example, when the resin layer 32 is formed of a curable resin composition of an addition reaction type polyoxymethylene, the organic alkenyl polysiloxane or the organic hydrogen polyoxygen oxide is contained by a known method such as the above-described spraying method. The curable resin composition of the mixture of the alkane and the catalyst is applied onto the support sheet 31, and then heat-hardened. The heat-hardening conditions are also different depending on the amount of the catalyst to be mixed. For example, the platinum-based catalyst is blended in an amount of 2 parts by mass based on 100 parts by mass of the total of the organic alkenyl polysiloxane and the organohydrogenpolyoxyalkylene. In the case of the reaction, the reaction is carried out at 50 ° C to 250 ° C, preferably at 100 ° C to 200 ° C in the atmosphere. Further, the reaction time in this case is set to 5 to 60 minutes, preferably 10 to 30 minutes.

藉由使硬化性樹脂組合物進行加熱硬化,而於硬化反應時使聚矽氧樹脂與支持板31化學地結合,及/或藉由投錨效應使聚矽氧樹脂層與支持板31結合。藉由該等作用,使聚矽氧樹脂層牢固地固定於支持板31上。再者,於由硬化性樹脂組合物形成包含聚矽氧樹脂以外之樹脂之樹脂層之情形時,亦可利用與上述相同之方法形成固定於支持板上之樹脂層。By curing the curable resin composition by heat hardening, the polyoxyxylene resin is chemically bonded to the support sheet 31 at the time of the hardening reaction, and/or the polyoxyxylene resin layer is bonded to the support sheet 31 by the anchoring effect. By these actions, the polyoxyxene resin layer is firmly fixed to the support plate 31. In the case where a resin layer containing a resin other than the polyfluorene resin is formed from the curable resin composition, the resin layer fixed to the support sheet may be formed by the same method as described above.

使樹脂層32可剝離地密接於基板20上之方法可為公知之方法。例如可列舉於常壓環境下,於樹脂層32之剝離性表面重疊基板20後,使用輥或壓製機,壓接樹脂層32與基板20之方法。藉由利用輥或壓製機進行壓接,可使樹脂層32與基板20更加密接,故而較佳。又,藉由利用輥或壓製機之壓接,可相對容易地去除樹脂層32與基板20之間混入之氣泡,故而較佳。The method of adhering the resin layer 32 to the substrate 20 in a peelable manner can be a well-known method. For example, a method in which the resin layer 32 and the substrate 20 are pressure-bonded by using a roll or a press after the substrate 20 is superposed on the peeling surface of the resin layer 32 in a normal pressure environment. The resin layer 32 and the substrate 20 can be more cryptographically bonded by pressure bonding using a roll or a press, which is preferable. Further, since the air bubbles mixed between the resin layer 32 and the substrate 20 can be relatively easily removed by pressure bonding using a roll or a press, it is preferable.

若藉由真空層壓法或真空壓製法進行壓接,則可更佳地進行氣泡混入之抑制或良好密接之確保,故而更佳。藉由在真空下進行壓接,亦存在以下優點:即便於殘存微小氣泡之情形時,亦不會由於加熱而使氣泡成長,難以導致基板20之應變缺陷。When the pressure bonding is carried out by a vacuum lamination method or a vacuum pressing method, it is more preferable to suppress the incorporation of air bubbles or to ensure good adhesion. By crimping under vacuum, there is also an advantage that even in the case where fine bubbles remain, the bubbles are not grown by heating, and it is difficult to cause strain defects of the substrate 20.

於使樹脂層32可剝離地密接於基板20上時,較佳為充分洗淨樹脂層32及基板20之相互接觸之側之面,於潔淨度較高之環境進行積層。即便於樹脂層32與基板20之間混入異物,亦不會由於樹脂層32發生變形而對基板20之表面之平坦性造成影響,潔淨度越高,其平坦性越良好,故而較佳。When the resin layer 32 is peelably adhered to the substrate 20, it is preferable to sufficiently clean the surface of the resin layer 32 and the substrate 20 on the side in contact with each other, and to laminate the layer in a highly clean environment. That is, it is easy to mix foreign matter between the resin layer 32 and the substrate 20, and the flatness of the surface of the substrate 20 is not affected by the deformation of the resin layer 32. The higher the cleanliness, the better the flatness, which is preferable.

再者,將樹脂層32固定於支持板31上之步驟、與使樹脂層32可剝離地密接於基板20上之步驟的順序並無限制,例如亦可大致同時進行。Further, the order of the step of fixing the resin layer 32 to the support plate 31 and the step of adhering the resin layer 32 to the substrate 20 in a peelable manner are not limited, and for example, they may be performed substantially simultaneously.

於本發明中,密接面201及密接面321之至少一方預先經聚矽氧油或矽烷偶合劑所處理,或者樹脂層32係由含有聚矽氧油或矽烷偶合劑之樹脂所形成。於第1實施形態中,為其中前者之表面處理。藉由使密接面201及密接面321之至少一方於密接前預先以聚矽氧油或矽烷偶合劑進行表面處理,可適當調節存在於密接面201、321上之極性基之密度。再者,於本實施形態中,可預先對基板20側之密接面201進行表面處理,亦可預先對樹脂層32側之密接面321進行表面處理,還可預先對兩側之密接面201、321進行表面處理。再者,藉由由含有聚矽氧油或矽烷偶合劑之樹脂形成樹脂層32(第2實施形態),亦可同樣地適當調節存在於密接面321上之極性基之密度。In the present invention, at least one of the adhesion surface 201 and the adhesion surface 321 is previously treated with a polyoxygenated oil or a decane coupling agent, or the resin layer 32 is formed of a resin containing a polyoxygenated oil or a decane coupling agent. In the first embodiment, the surface treatment of the former is performed. By subjecting at least one of the adhesion surface 201 and the adhesion surface 321 to surface treatment with a polyoxygenated oil or a decane coupling agent before the adhesion, the density of the polar groups existing on the adhesion surfaces 201 and 321 can be appropriately adjusted. Furthermore, in the present embodiment, the adhesion surface 201 on the substrate 20 side may be subjected to surface treatment in advance, or the adhesion surface 321 on the resin layer 32 side may be surface-treated in advance, and the adhesion surfaces 201 on both sides may be previously provided. 321 is surface treated. In addition, by forming the resin layer 32 from the resin containing a polysiloxane or a decane coupling agent (second embodiment), the density of the polar group existing on the adhesion surface 321 can be appropriately adjusted in the same manner.

此處,作為存在於玻璃基板之表面之極性基,例如可列舉羥基(-OH)等。又,作為存在於樹脂層之表面之極性基,例如可列舉羰基(-CO)、羧基(-COOH)等。該等極性基均為親水基。Here, examples of the polar group present on the surface of the glass substrate include a hydroxyl group (-OH). Moreover, examples of the polar group present on the surface of the resin layer include a carbonyl group (-CO) and a carboxyl group (-COOH). These polar groups are all hydrophilic groups.

所謂存在於基板20與樹脂層32之密接面201、321的極性基之密度適當,可於密接前測定成為密接面201、321之表面之水接觸角而判斷。通常有存在於表面之親水性之極性基的密度越高,水接觸角越小之傾向。此處,所謂水接觸角,係指JIS R 3257-1999中規定之接觸角。The density of the polar groups existing on the adhesion surfaces 201 and 321 of the substrate 20 and the resin layer 32 is appropriate, and the water contact angle of the surfaces of the adhesion surfaces 201 and 321 can be measured before the adhesion. Generally, the higher the density of the hydrophilic polar groups present on the surface, the smaller the water contact angle. Here, the water contact angle means a contact angle defined in JIS R 3257-1999.

經表面處理之密接面201、321之密接前的水接觸角較佳為90°以上,更佳為90~120°,進而更佳為90~110°。若兩方之密接面201、321之密接前的水接觸角均小於90°,則存在於基板20或樹脂層32之表面的極性基之密度過高。因此,若於裝置之製造步驟中,積層體10之溫度超出250℃,則可促進基板20與樹脂層32之化學結合,難以分離基板20與樹脂層32(加強板30)。The water contact angle of the surface-treated adhesive surfaces 201, 321 before the adhesion is preferably 90 or more, more preferably 90 to 120, and still more preferably 90 to 110. If the water contact angles before the close contact between the two adjacent surfaces 201 and 321 are less than 90, the density of the polar groups present on the surface of the substrate 20 or the resin layer 32 is too high. Therefore, if the temperature of the laminated body 10 exceeds 250 ° C in the manufacturing process of the apparatus, chemical bonding between the substrate 20 and the resin layer 32 can be promoted, and it is difficult to separate the substrate 20 from the resin layer 32 (the reinforcing plate 30).

密接前之水接觸角為90°以上之表面較佳為基板20之密接面201。若密接面201之水接觸角為90°以上,則即便密接面321之密接前之水接觸角未達90°,只要樹脂並非親水性特別高者,則亦可容易地剝離樹脂層32與基板20。尤其是,於樹脂層32為聚矽氧樹脂等疏水性樹脂之情形時,即便密接面321之密接前之水接觸角未達90°亦可容易地剝離。The surface having a water contact angle of 90 or more before the adhesion is preferably the adhesion surface 201 of the substrate 20. When the water contact angle of the adhesion surface 201 is 90° or more, even if the water contact angle before the adhesion of the adhesion surface 321 is less than 90°, the resin layer 32 and the substrate can be easily peeled off as long as the resin is not particularly hydrophilic. 20. In particular, when the resin layer 32 is a hydrophobic resin such as a polysiloxane resin, even if the water contact angle before the adhesion of the adhesion surface 321 is less than 90°, the resin layer 32 can be easily peeled off.

於基板20之密接面201亦可藉由密接前之表面處理而預先形成微細之凹凸結構。於該情形時,藉由凹凸結構之投錨效應,可以充分之結合力使基板20之密接面201與樹脂層32之密接面321密接,而容易操作積層體10。再者,若藉由表面處理形成微細之凹凸結構,則存在水接觸角增加之傾向,有時水接觸角會超出120°。The fine surface 201 of the substrate 20 may be previously formed with a fine uneven structure by surface treatment before the adhesion. In this case, by the anchoring effect of the uneven structure, the bonding surface 201 of the substrate 20 can be brought into close contact with the adhesion surface 321 of the resin layer 32 with sufficient bonding force, and the laminated body 10 can be easily handled. Further, when the fine uneven structure is formed by the surface treatment, the water contact angle tends to increase, and the water contact angle may exceed 120°.

進行表面處理之表面較佳為充分潔淨之面,較佳為剛洗淨後之面。若潔淨度(活性度)過低,則無法進行均勻之表面處理。作為洗淨方法,可使用玻璃表面或樹脂表面之洗淨中所使用之通常之方法。The surface to be surface-treated is preferably a sufficiently clean surface, preferably a surface just after washing. If the cleanliness (activity) is too low, uniform surface treatment cannot be performed. As the washing method, a usual method used for washing the glass surface or the resin surface can be used.

未進行表面處理之表面較理想為預先以遮罩等保護膜進行保護。其原因在於,於裝置之製造步驟中,難以於表面處理之材料錯誤附著之面形成裝置用構件。The surface which is not subjected to the surface treatment is preferably protected by a protective film such as a mask in advance. The reason for this is that in the manufacturing step of the device, it is difficult to form the member for the device on the surface on which the surface-treated material is erroneously adhered.

作為表面處理之材料之聚矽氧油、矽烷偶合劑可單獨使用或組合使用。於組合使用之情形時,可以矽烷偶合劑進行表面處理後,再以聚矽氧油進行表面處理,亦可以聚矽氧油進行表面處理後,再以矽烷偶合劑進行表面處理。The polyoxygenated oil and the decane coupling agent which are materials for surface treatment may be used singly or in combination. In the case of combined use, the surface treatment may be carried out after the surface treatment of the decane coupling agent, or the surface treatment may be carried out by polyoxygenated oil, followed by surface treatment with a decane coupling agent.

聚矽氧油之種類並無特別限定,可例示:二甲基聚矽氧油、甲基苯基聚矽氧油、甲基氫聚矽氧油等直鏈聚矽氧油(straight silicone oil)、於側鏈或末端導入有烷基、氫基、環氧基、胺基、羧基、聚醚基、鹵基等之改性聚矽氧油。作為具體例,可列舉甲基氫聚矽氧烷、二甲基聚矽氧烷、甲基苯基聚矽氧烷、二苯基聚矽氧烷等,按照所列之順序耐熱性逐步增加,耐熱性最高者為二苯基聚矽氧烷。該等聚矽氧油通常用於玻璃基板或經底層處理之金屬基板等基板之表面之斥水處理。The type of the polyoxygenated oil is not particularly limited, and examples thereof include straight silicone oil such as dimethylpolyphthalic acid oil, methylphenyl polyfluorene oxide oil, and methyl hydrogen polyoxygenated oil. A modified polyoxyxylene oil having an alkyl group, a hydrogen group, an epoxy group, an amine group, a carboxyl group, a polyether group, a halogen group or the like introduced into the side chain or the terminal. Specific examples thereof include methyl hydrogen polyoxyalkylene oxide, dimethyl polyoxyalkylene oxide, methylphenyl polyoxyalkylene oxide, and diphenyl polyoxyalkylene. The heat resistance is gradually increased in the order listed. The highest heat resistance is diphenyl polysiloxane. These polyoxygenated oils are generally used for water repellent treatment on the surface of a substrate such as a glass substrate or a metal substrate subjected to an underlayer treatment.

利用聚矽氧油之表面處理方法可為一般方法。於僅塗佈聚矽氧油之處理中,存在聚矽氧油結合於被處理表面之程度較低,無法充分發揮處理效果之虞,因此較佳為於塗佈聚矽氧油後,進行使聚矽氧油結合於被處理表面之處理。使聚矽氧油結合於被處理表面之處理為如切割聚矽氧油之分子鏈之處理,可認為所切割之片段結合於被處理表面上(以下將該處理稱作聚矽氧油之低分子量化)。The surface treatment method using polyoxygenated oil can be a general method. In the treatment of coating only the polyoxygenated oil, there is a possibility that the polyoxyphthalocene oil is bonded to the surface to be treated to a low extent and the treatment effect cannot be sufficiently exerted. Therefore, it is preferred to apply the polyfluorene oxide after the coating. The polyoxygenated oil is combined with the treatment of the treated surface. The treatment of binding the polyoxyxene oil to the surface to be treated is a treatment such as cutting the molecular chain of the polyoxygenated oil, and it is considered that the cut segment is bonded to the surface to be treated (hereinafter, the treatment is referred to as a low concentration of polyoxygenated oil). Molecular weight).

作為利用聚矽氧油之表面處理方法,較佳為將聚矽氧油塗佈於基板20之密接面201或樹脂層32之密接面321上而進行低分子量化之方法。藉由調節聚矽氧油之塗佈量或低分子量化之處理條件等,可將存在於基板20之密接面201或樹脂層32之密接面321的極性基之密度調整為最佳化。因此,剝離樹脂層32與基板20時,可抑制樹脂層32受到凝聚破壞。As a surface treatment method using polyoxyxylene oil, a method of applying a polyoxyxylene oil to the adhesion surface 201 of the substrate 20 or the adhesion surface 321 of the resin layer 32 is preferably carried out to reduce the molecular weight. The density of the polar groups existing on the adhesion surface 201 of the substrate 20 or the adhesion surface 321 of the resin layer 32 can be adjusted to be optimized by adjusting the coating amount of the polyoxygenated oil or the processing conditions for lowering the molecular weight. Therefore, when the resin layer 32 and the substrate 20 are peeled off, the resin layer 32 can be prevented from being agglomerated and destroyed.

聚矽氧油之塗佈方法可為一般方法。例如可根據聚矽氧油之種類或塗佈量等,自噴塗法、模塗法、旋塗法、浸塗法、輥塗法、棒塗法、網版印刷法、凹版印刷塗佈法等中適當選定。作為塗佈液,較理想為使用以己烷、庚烷、二甲苯等溶劑將聚矽氧油稀釋至1質量%以下之溶液。若超出1質量%,則低分子量化之處理時間過長。又,較理想為使用稀釋至0.01質量%以上之溶液。若未達0.01質量%,則不足以使極性基之密度最佳化。The coating method of the polyoxygenated oil can be a general method. For example, depending on the type or coating amount of the polyoxygenated oil, self-spraying method, die coating method, spin coating method, dip coating method, roll coating method, bar coating method, screen printing method, gravure coating method, etc. Appropriately selected. As the coating liquid, it is preferred to use a solution in which the polyfluorene oxide oil is diluted to 1% by mass or less with a solvent such as hexane, heptane or xylene. When it exceeds 1 mass%, the processing time of low molecular weight is too long. Further, it is preferred to use a solution diluted to 0.01% by mass or more. If it is less than 0.01% by mass, it is not sufficient to optimize the density of the polar group.

使聚矽氧油低分子量化之方法可使用一般方法,例如有藉由光分解或熱分解切割聚矽氧油之矽氧鍵之方法。光分解中使用自低壓水銀燈或氙弧燈等照射之紫外線,亦可併用藉由大氣中之紫外線照射而產生之臭氧。熱分解可於分批式爐、輸送式爐等中進行,亦可利用電漿或電弧放電等。於利用分批式爐或輸送式爐進行熱分解之情形時,亦取決於上述塗佈液之聚矽氧油之種類或濃度,較理想為250℃至400℃之處理。若未達250℃,則聚矽氧之低分子量化不充分,於超出400℃之情形時,聚矽氧之二氧化矽化顯著,作為低分子量化處理而不充分。A method of lowering the molecular weight of the polyoxygenated oil can be carried out by a general method such as a method of cutting the oxygen bond of the polyoxygenated oil by photolysis or thermal decomposition. In the photolysis, ultraviolet rays irradiated from a low-pressure mercury lamp or a xenon arc lamp or the like may be used, and ozone generated by ultraviolet irradiation in the atmosphere may be used in combination. The thermal decomposition can be carried out in a batch furnace, a conveyor furnace, or the like, or a plasma or an arc discharge or the like can be used. In the case of thermal decomposition using a batch furnace or a conveyor furnace, it is also preferably treated at a temperature of from 250 ° C to 400 ° C depending on the type or concentration of the polyoxygenated oil of the above coating liquid. When the temperature is less than 250 ° C, the molecular weight of polyoxymethylene is insufficient, and when it exceeds 400 ° C, the cerium oxide of polyoxymethylene is remarkable, and it is insufficient as a low molecular weight treatment.

若切割聚矽氧油之矽氧鍵,則甲基等疏水性之官能基之密度變高,存在於基板20之密接面201或樹脂層32之密接面321的親水性之極性基之密度降低。再者,若過度切割聚矽氧油之矽氧鍵,則存在親水性之極性基之密度再次增加之傾向。When the oxygen bond of the polyoxygenated oil is cut, the density of the hydrophobic functional group such as a methyl group becomes high, and the density of the hydrophilic polar group existing on the adhesion surface 201 of the substrate 20 or the adhesion surface 321 of the resin layer 32 is lowered. . Further, if the oxygen bond of the polyoxygenated oil is excessively cleaved, the density of the hydrophilic polar group tends to increase again.

矽烷偶合劑之種類並無特別限定,例如可較佳地使用選自六甲基二矽氮烷(HMDS)、3-胺基丙基三乙氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、N-{N-(2-胺基乙基)-2-胺基乙基}-3-胺基丙基三甲氧基矽烷、3-苯胺基丙基三甲氧基矽烷等胺基矽烷類;或3-縮水甘油氧基丙基三甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷等環氧矽烷類;如3-氯丙基三甲氧基矽烷之氯矽烷類或氟矽烷類;3-巰基三甲氧基矽烷等巰基矽烷;乙烯基三甲氧基矽烷、N-2-(N-乙烯基苄基-2-胺基乙基)-3-胺基丙基三甲氧基矽烷等乙烯基矽烷類;3-甲基丙烯醯氧基丙基三甲氧基矽烷等丙烯醯基矽烷類中之1種以上者。The type of the decane coupling agent is not particularly limited, and for example, hexamethyldiaziridine (HMDS), 3-aminopropyltriethoxydecane, and N-(2-aminoethyl) can be preferably used. --3-aminopropyltrimethoxydecane, N-{N-(2-aminoethyl)-2-aminoethyl}-3-aminopropyltrimethoxydecane, 3-anilino An alkyl decane such as propyltrimethoxydecane; or an epoxy decane such as 3-glycidoxypropyltrimethoxydecane or 2-(3,4-epoxycyclohexyl)ethyltrimethoxydecane; Such as 3-chloropropyltrimethoxydecane chlorodecane or fluorodecane; 3-mercaptotrimethoxydecane and other decyl decane; vinyl trimethoxy decane, N-2-(N-vinylbenzyl-2 One or more of a vinyl decane such as an aminoethyl)-3-aminopropyltrimethoxy decane or an acrylonitrile decane such as 3-methylpropenyloxypropyltrimethoxydecane.

利用矽烷偶合劑之表面處理方法可為一般方法。例如有使基板20之密接面201或樹脂層32之密接面321曝露於包含使矽烷偶合劑氣化而成之氣體之環境下,將存在於基板20之密接面201或樹脂層32之密接面321的親水性之極性基取代成甲基等疏水性之官能基的方法等。藉由調節環境中之矽烷偶合劑之濃度、溫度、處理時間等,可將存在於基板20之密接面201或樹脂層32之密接面321的極性基之密度調整為最佳化。因此,於剝離樹脂層32與基板20時可抑制樹脂層32受到凝聚破壞。The surface treatment method using a decane coupling agent can be a general method. For example, in a case where the adhesion surface 201 of the substrate 20 or the adhesion surface 321 of the resin layer 32 is exposed to a gas containing a gas obtained by vaporizing a decane coupling agent, it may exist on the adhesion surface 201 of the substrate 20 or the adhesion surface of the resin layer 32. A method in which a hydrophilic polar group of 321 is substituted with a hydrophobic functional group such as a methyl group. By adjusting the concentration, temperature, treatment time, and the like of the decane coupling agent in the environment, the density of the polar groups existing on the adhesion surface 201 of the substrate 20 or the adhesion surface 321 of the resin layer 32 can be optimized. Therefore, when the resin layer 32 and the substrate 20 are peeled off, the resin layer 32 can be suppressed from being agglomerated and destroyed.

再者,密接面201、321於裝置之製造步驟之中途相互剝離後,可藉由特定之處理而恢復至表面處理前之狀態。例如,實施有利用聚矽氧油或矽烷偶合劑之表面處理的面可藉由光分解或熱分解而恢復至表面處理前之狀態。若如此般,例如使基板20之表面201恢復至表面處理前之狀態,則於表面201貼附光學膜(例如偏光膜)之情形時,可提高其貼附強度。並且,若重視返工性,則亦可於表面處理後之狀態之基板20的表面201貼附光學膜。Further, the adhesion surfaces 201 and 321 are mutually peeled off in the middle of the manufacturing process of the apparatus, and can be restored to the state before the surface treatment by a specific treatment. For example, a surface subjected to surface treatment using a polyoxygenated oil or a decane coupling agent can be restored to a state before surface treatment by photolysis or thermal decomposition. In this manner, for example, when the surface 201 of the substrate 20 is returned to the state before the surface treatment, when the optical film (for example, a polarizing film) is attached to the surface 201, the adhesion strength can be improved. Further, if the reworkability is emphasized, the optical film may be attached to the surface 201 of the substrate 20 in the state after the surface treatment.

(第2實施形態)(Second embodiment)

本實施形態之積層體之構成與圖1大致相同,故省略圖示。The configuration of the laminated body of the present embodiment is substantially the same as that of Fig. 1, and therefore the illustration thereof is omitted.

於本實施形態中,樹脂層32係由含有聚矽氧油或矽烷偶合劑之樹脂所形成。樹脂層32較佳為藉由使含有聚矽氧油或矽烷偶合劑之硬化性樹脂組合物硬化而形成。作為硬化性樹脂組合物,並無特別限定,例如可使用成為剝離紙用聚矽氧樹脂之硬化性樹脂組合物。再者,基板20及樹脂層32之密接面201、321亦可並非於密接前實施上述表面處理者。In the present embodiment, the resin layer 32 is formed of a resin containing a polyoxygenated oil or a decane coupling agent. The resin layer 32 is preferably formed by curing a curable resin composition containing a polyoxygenated oil or a decane coupling agent. The curable resin composition is not particularly limited, and for example, a curable resin composition which is a polyfluorene resin for release paper can be used. Further, the adhesion surfaces 201 and 321 of the substrate 20 and the resin layer 32 may not be subjected to the surface treatment before the adhesion.

聚矽氧油、矽烷偶合劑可單獨使用或組合使用,較佳為分別使用不具有與硬化性樹脂組合物之成分反應之官能基者。例如,於由上述加成反應型聚矽氧之硬化性樹脂組合物形成樹脂層32之情形時,作為聚矽氧油或矽烷偶合劑,可使用不具有成為交聯點之官能基(例如乙烯基或氫矽烷基)者。又,於由縮合反應型聚矽氧之硬化性樹脂組合物形成樹脂層32之情形時,可使用不具有可共縮合之官能基(水解性基或矽烷醇基等)之聚矽氧油。The polyoxygenated oil and the decane coupling agent may be used singly or in combination, and it is preferred to use a functional group which does not have a reaction with a component of the curable resin composition, respectively. For example, when the resin layer 32 is formed of the above-described addition reaction type polyoxyl curable resin composition, as the polyoxygenated oil or the decane coupling agent, a functional group which does not have a crosslinking point (for example, ethylene) can be used. Or a hydroquinone group. In the case where the resin layer 32 is formed of the condensation reaction type polyfluorene-based curable resin composition, a polyoxygenated oil which does not have a co-condensable functional group (hydrolyzable group or stanol group or the like) can be used.

聚矽氧油於上述硬化性樹脂組合物之硬化時不進行交聯而分散含於該樹脂層32中。又,矽烷偶合劑通常於上述硬化性樹脂組合物之硬化時縮合,以矽烷偶合劑之縮合物之形式含於經硬化之樹脂中。因此,於樹脂層32之密接面321分散含有聚矽氧油或矽烷偶合劑之縮合物。The polyoxygenated oil is dispersed in the resin layer 32 without being crosslinked at the time of curing of the curable resin composition. Further, the decane coupling agent is usually condensed at the time of curing of the curable resin composition, and is contained in the cured resin in the form of a condensate of a decane coupling agent. Therefore, a condensate containing a polyoxygenated oil or a decane coupling agent is dispersed on the adhesion surface 321 of the resin layer 32.

例如,於樹脂層32之密接面321含有聚矽氧油之情形時,若於裝置之製造步驟中,積層體10之溫度變高,則聚矽氧油進行低分子量化。其結果,存在於兩密接面201、321之親水性之極性基的密度降低,甲基等疏水性之官能基之密度增大。For example, when the adhesion surface 321 of the resin layer 32 contains a polyoxygenated oil, if the temperature of the laminated body 10 becomes high in the manufacturing process of the apparatus, the polyoxygenated oil is reduced in molecular weight. As a result, the density of the hydrophilic polar group existing in the two close contact faces 201 and 321 is lowered, and the density of the hydrophobic functional group such as a methyl group is increased.

又,於樹脂層32之密接面321含有矽烷偶合劑縮合物之情形時,存在於兩密接面201、321之親水性之極性基被取代成甲基等疏水性之官能基。In the case where the adhesion surface 321 of the resin layer 32 contains a decane coupling agent condensate, the hydrophilic polar group of the two adhesion surfaces 201 and 321 is substituted with a hydrophobic functional group such as a methyl group.

因此,藉由調節成為樹脂層32之硬化性樹脂組合物中所含的聚矽氧油或矽烷偶合劑之含量或種類,可將存在於兩密接面201、321之極性基之密度調整為最佳化。Therefore, by adjusting the content or type of the polyoxygenated oil or the decane coupling agent contained in the curable resin composition to be the resin layer 32, the density of the polar groups existing on the two closely-bonded surfaces 201 and 321 can be adjusted to the maximum. Jiahua.

因此,於本實施形態中,亦與第1實施形態同樣地可於剝離樹脂層32與基板20時抑制樹脂層32受到凝聚破壞。此外,由於使聚矽氧油低分子量化之步驟與其他目的之步驟一起進行,又,並無使矽烷偶合劑氣化之步驟,故而可降低工數。Therefore, in the present embodiment, similarly to the first embodiment, the resin layer 32 can be prevented from being agglomerated and broken when the resin layer 32 and the substrate 20 are peeled off. Further, since the step of lowering the molecular weight of the polyoxygenated oil is carried out together with the steps of other purposes, and there is no step of vaporizing the decane coupling agent, the number of operations can be reduced.

成為樹脂層32之硬化性樹脂組合物中所含的聚矽氧油及矽烷偶合劑之含量較理想為相對於含有該等之硬化性樹脂組合物之固形物成分而為0.1~5質量%。於含量未達0.1質量%之情形時,無法獲得充分之效果。另一方面,於含量超出5質量%之情形時,樹脂層32之耐熱性變得過低。The content of the polyoxygenated oil and the decane coupling agent to be contained in the curable resin composition of the resin layer 32 is preferably 0.1 to 5% by mass based on the solid content of the curable resin composition. When the content is less than 0.1% by mass, sufficient effects cannot be obtained. On the other hand, when the content exceeds 5% by mass, the heat resistance of the resin layer 32 becomes too low.

於第2實施形態之情形時,基板20之密接面201亦可並非實施有上述第1實施形態中之表面處理者。於基板20為玻璃基板之情形時,由於其表面為親水性較高之表面,故密接面201亦可於密接前預先實施上述第1實施形態中之表面處理。In the case of the second embodiment, the surface 201 of the substrate 20 may not be subjected to the surface treatment in the first embodiment. In the case where the substrate 20 is a glass substrate, since the surface thereof is a surface having high hydrophilicity, the surface of the first embodiment can be preliminarily performed before the adhesion surface 201 is adhered.

實施例Example

以下,藉由實施例等對本發明進行說明,但本發明並不受該等例之限定。Hereinafter, the present invention will be described by way of examples, but the present invention is not limited by the examples.

[實施例1][Example 1]

基板及支持板使用均由浮式法所得之縱720 mm×橫600 mm之玻璃板(旭硝子公司製造,AN100,無鹼玻璃)。再者,基板之厚度設為0.4 mm,支持板之厚度設為0.3 mm。基板及支持板之平均線膨脹係數分別為38×10-7 /℃。As the substrate and the support plate, a glass plate (manufactured by Asahi Glass Co., Ltd., AN100, alkali-free glass) which is obtained by a floating method and has a length of 720 mm × a width of 600 mm is used. Further, the thickness of the substrate was set to 0.4 mm, and the thickness of the support plate was set to 0.3 mm. The average linear expansion coefficients of the substrate and the support plate were 38 × 10 -7 / ° C, respectively.

(加強板之製作)(production of reinforcing board)

對支持板進行純水洗淨、UV(ultraviolet,紫外線)洗淨,使支持板之表面潔淨化。其後,藉由網版印刷,於支持板之單面塗佈硬化性樹脂組合物(塗佈量30 g/m2 )。The support plate is washed with pure water and UV (ultraviolet) to clean the surface of the support plate. Thereafter, a curable resin composition (coating amount: 30 g/m 2 ) was applied to one side of the support sheet by screen printing.

硬化性樹脂組合物使用無溶劑加成反應型聚矽氧(Shin-Etsu Silicone公司製造,KNS-320A)100質量份與鉑系觸媒(Shin-Etsu Silicone公司製造,CAT-PL-56)2質量份之混合物。The curable resin composition was 100 parts by mass of a solvent-free addition-reactive polyfluorene (Kn-Etsu Silicone Co., Ltd., KNS-320A) and a platinum-based catalyst (manufactured by Shin-Etsu Silicone Co., Ltd., CAT-PL-56) 2 a mixture of parts by mass.

上述無溶劑加成反應型聚矽氧係包含具有鍵結於矽原子上之乙烯基與甲基之直鏈狀有機烯基聚矽氧烷(主劑)、及具有鍵結於矽原子上之氫原子與甲基之直鏈狀有機氫聚矽氧烷(交聯劑)者。The solventless addition reaction type polyoxo oxygen group includes a linear organic alkenyl polyoxyalkylene (main component) having a vinyl group and a methyl group bonded to a ruthenium atom, and has a bond to a ruthenium atom. A linear organohydrogenpolyoxyalkylene (crosslinking agent) having a hydrogen atom and a methyl group.

將塗佈於支持板上之混合物於大氣中以180℃加熱硬化30分鐘,於支持板上之中央形成縱705 mm×橫595 mm×厚20 μm之聚矽氧樹脂層,並加以固定。The mixture coated on the support plate was heat-hardened at 180 ° C for 30 minutes in the atmosphere, and a polyoxynitride resin layer having a length of 705 mm × a width of 595 mm × a thickness of 20 μm was formed in the center of the support plate and fixed.

(基板之表面處理)(surface treatment of the substrate)

對基板進行純水洗淨、UV洗淨,使基板之表面潔淨化。其後,對作為基板之單面之第2主面實施遮罩後,於相反側之第1主面噴塗聚矽氧油含量為0.5質量%之庚烷溶液,並加以乾燥。聚矽氧油使用二甲基聚矽氧烷(Dow Corning Toray公司製造,SH200)。繼而,為使聚矽氧油低分子量化,於空氣中進行2分鐘之利用低壓水銀燈之紫外線處理。The substrate is washed with pure water and UV washed to clean the surface of the substrate. Thereafter, after the second main surface of the single surface of the substrate was masked, a heptane solution having a polyoxygenated oil content of 0.5% by mass was sprayed on the first main surface on the opposite side, and dried. As the polyoxygenated oil, dimethylpolysiloxane (manufactured by Dow Corning Toray Co., Ltd., SH200) was used. Then, in order to lower the molecular weight of the polyoxygenated oil, ultraviolet treatment with a low pressure mercury lamp was carried out for 2 minutes in the air.

其後,使用接觸角計(Krss公司製造,DROP SHAPE ANALYSIS SYSTEM DSA 10Mk2),測定基板之第1主面之水接觸角,結果為100°。Thereafter, using a contact angle meter (Kr Manufactured by Ss Corporation, DROP SHAPE ANALYSIS SYSTEM DSA 10Mk2), the water contact angle of the first main surface of the substrate was measured and found to be 100°.

(積層體之製作)(production of laminated body)

紫外線處理後,於基板之第1主面重疊聚矽氧樹脂層,於室溫下,藉由真空壓製機,使基板與聚矽氧樹脂層密接,獲得包含基板與加強板之積層體。After the ultraviolet treatment, the polyoxyxylene resin layer was placed on the first main surface of the substrate, and the substrate and the polyoxyxylene resin layer were adhered to each other at room temperature by a vacuum press to obtain a laminate including the substrate and the reinforcing plate.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體於氧氣體積濃度為1000 ppm以下之氮氣環境中,以350℃加熱處理1小時。其後,冷卻至室溫後,於基板與聚矽氧樹脂層之間刺入剝離刀,使基板側保持平坦,同時自刺入位置附近使聚矽氧樹脂層側依序彎曲變形,剝離基板與聚矽氧樹脂層。The laminate was heat-treated at 350 ° C for 1 hour in a nitrogen atmosphere having a volume concentration of oxygen of 1000 ppm or less. Thereafter, after cooling to room temperature, a peeling blade is pierced between the substrate and the polyoxynitride resin layer to keep the substrate side flat, and the side of the polyoxyxylene resin layer is sequentially bent and deformed from the vicinity of the piercing position, and the substrate is peeled off. With a layer of polyoxymethylene resin.

於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之轉印物。再者,剝離後之基板之第1主面的水接觸角為100°。No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer material from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 100°.

[實施例2][Embodiment 2]

基板及支持板分別使用與實施例1相同之玻璃板。The same glass plate as in Example 1 was used for the substrate and the support plate, respectively.

(加強板之製作)(production of reinforcing board)

於實施例2中,使用兩末端具有乙烯基之直鏈狀有機烯基聚矽氧烷(乙烯基聚矽氧,荒川化學工業公司製造,8500)、分子內具有氫矽烷基之甲基氫聚矽氧烷(荒川化學工業公司製造,12031)、及鉑系觸媒(荒川化學工業公司製造,CAT12070)之混合物作為硬化性樹脂組合物,除此以外,以與實施例1相同之方式製作加強板。In Example 2, a linear organoalkenyl polyoxyalkylene having a vinyl group at both ends (vinyl polyfluorene, manufactured by Arakawa Chemical Industries, Ltd., 8500) and a methyl hydrogen group having a hydroquinone group in the molecule were used. A mixture of a siloxane (manufactured by Arakawa Chemical Industry Co., Ltd., 12031) and a platinum-based catalyst (manufactured by Arakawa Chemical Industries, Ltd., CAT 12070) was used as a curable resin composition, and was reinforced in the same manner as in Example 1. board.

此處,直鏈狀有機烯基聚矽氧烷與甲基氫聚矽氧烷之混合比係以乙烯基與氫矽烷基之莫耳比成為1:1之方式而調節。又,鉑系觸媒相對於直鏈狀有機烯基聚矽氧烷與甲基氫聚矽氧烷之合計100質量份而設為5質量份。Here, the mixing ratio of the linear organic alkenyl polyoxyalkylene to the methylhydrogenpolyoxyalkylene is adjusted so that the molar ratio of the vinyl group to the hydrofluorenyl group becomes 1:1. In addition, the platinum-based catalyst is used in an amount of 5 parts by mass based on 100 parts by mass of the total of the linear organic alkenyl polysiloxane and the methylhydrogenpolyoxyalkylene.

(基板之表面處理)(surface treatment of the substrate)

於實施例2中,為進行聚矽氧油之低分子量化,而利用常壓遙距電漿(remote plasma)裝置(積水化學公司製造,RT系列)進行電漿處理,除此以外,以與實施例1相同之方式進行基板之表面處理。In the second embodiment, in order to carry out the low molecular weight of the polyoxygenated oil, the plasma treatment is carried out using a remote plasma device (RT series manufactured by Sekisui Chemical Co., Ltd., RT series), in addition to The surface treatment of the substrate was carried out in the same manner as in Example 1.

此處,電漿處理之處理條件設為輸出3 kw、氮氣/空氣流量比=600 slm/750 sccm、搬送速度5 m/min。電漿照射時之基板之表面溫度為50℃以下。表面處理後之基板之第1主面的水接觸角為95°。Here, the processing conditions of the plasma treatment were set to output 3 kw, nitrogen/air flow ratio = 600 slm/750 sccm, and conveying speed of 5 m/min. The surface temperature of the substrate when the plasma is irradiated is 50 ° C or lower. The water contact angle of the first main surface of the surface-treated substrate was 95°.

(積層體之製作)(production of laminated body)

表面處理後,以與實施例1相同之方式獲得包含基板與加強板之積層體。After the surface treatment, a laminate including the substrate and the reinforcing plate was obtained in the same manner as in Example 1.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層。於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之轉印物。再者,剝離後之基板之第1主面的水接觸角為100°。After the laminate was heat-treated in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer material from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 100°.

[實施例3][Example 3]

基板及支持板分別使用與實施例1相同之玻璃板。The same glass plate as in Example 1 was used for the substrate and the support plate, respectively.

(加強板之製作)(production of reinforcing board)

於實施例3中,以與實施例2相同之方式製作加強板。In Example 3, a reinforcing plate was produced in the same manner as in Example 2.

(基板之表面處理)(surface treatment of the substrate)

於實施例3中,為進行聚矽氧油之低分子量化,而於大氣中,以400℃加熱處理10分鐘,除此以外,以與實施例1相同之方式進行基板之表面處理。表面處理後之基板之第1主面的水接觸角為105°。In the third embodiment, the surface treatment of the substrate was carried out in the same manner as in Example 1 except that the polyoxymethane oil was reduced in molecular weight and heat-treated at 400 ° C for 10 minutes in the air. The water contact angle of the first main surface of the surface-treated substrate was 105°.

(積層體之製作)(production of laminated body)

表面處理後,以與實施例1相同之方式獲得包含基板與加強板之積層體。After the surface treatment, a laminate including the substrate and the reinforcing plate was obtained in the same manner as in Example 1.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層。於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之轉印物。再者,剝離後之基板之第1主面的水接觸角為105°。After the laminate was heat-treated in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer material from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 105°.

[實施例4][Example 4]

基板及支持板分別使用與實施例1相同之玻璃板。The same glass plate as in Example 1 was used for the substrate and the support plate, respectively.

(加強板之製作)(production of reinforcing board)

於實施例4中,以與實施例2相同之方式製作加強板。In Example 4, a reinforcing plate was produced in the same manner as in Example 2.

(基板之表面處理)(surface treatment of the substrate)

於實施例4中,為進行聚矽氧油之低分子量化,而於基板之第1主面噴塗聚矽氧油含量為0.1質量%之庚烷溶液,並加以乾燥,於大氣中,以250℃加熱處理10分鐘,除此以外,以與實施例1相同之方式進行基板之表面處理。表面處理後之基板之第1主面的水接觸角為98°。In Example 4, in order to reduce the molecular weight of the polyoxygenated oil, a heptane solution having a polyoxyxane content of 0.1% by mass was sprayed on the first main surface of the substrate, and dried in the atmosphere at 250. The surface treatment of the substrate was carried out in the same manner as in Example 1 except that the temperature was heated for 10 minutes at °C. The water contact angle of the first main surface of the surface-treated substrate was 98°.

(積層體之製作)(production of laminated body)

表面處理後,以與實施例1相同之方式獲得包含基板與加強板之積層體。After the surface treatment, a laminate including the substrate and the reinforcing plate was obtained in the same manner as in Example 1.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層。於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之轉印物。再者,剝離後之基板之第1主面的水接觸角為98°。After the laminate was heat-treated in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer material from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 98°.

[實施例5][Example 5]

基板及支持板分別使用藉由浮式法所得之縱720 mm×橫600 mm之玻璃板(旭硝子公司製造,AS,鈉鈣玻璃)。再者,基板之厚度設為0.4 mm,支持板之厚度設為0.3 mm。基板及支持板之平均線膨脹係數分別為85×10-7 /℃。The substrate and the support plate were each made of a glass plate (manufactured by Asahi Glass Co., Ltd., AS, soda lime glass) having a length of 720 mm × a width of 600 mm obtained by a floating method. Further, the thickness of the substrate was set to 0.4 mm, and the thickness of the support plate was set to 0.3 mm. The average linear expansion coefficients of the substrate and the support plate were 85×10 -7 /°C, respectively.

(加強板之製作)(production of reinforcing board)

於實施例5中,以與實施例2相同之方式製作加強板。In Example 5, a reinforcing plate was produced in the same manner as in Example 2.

(基板之表面處理)(surface treatment of the substrate)

於實施例5中,為進行聚矽氧油之低分子量化,而於基板之第1主面噴塗聚矽氧油含量為0.5質量%之庚烷溶液,並加以乾燥,於大氣中,以350℃加熱處理10分鐘,除此以外,以與實施例1相同之方式進行基板之表面處理。表面處理後之基板之第1主面的水接觸角為102°。In the fifth embodiment, in order to reduce the molecular weight of the polyoxygenated oil, a heptane solution having a polyoxyxane content of 0.5% by mass is sprayed on the first main surface of the substrate, and dried in the atmosphere at 350. The surface treatment of the substrate was carried out in the same manner as in Example 1 except that the temperature was heated for 10 minutes at °C. The water contact angle of the first main surface of the surface-treated substrate was 102°.

(積層體之製作)(production of laminated body)

表面處理後,以與實施例1相同之方式獲得包含基板與加強板之積層體。After the surface treatment, a laminate including the substrate and the reinforcing plate was obtained in the same manner as in Example 1.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層。於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之轉印物。再者,剝離後之基板之第1主面的水接觸角為102°。After the laminate was heat-treated in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer material from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 102°.

[實施例6][Embodiment 6]

基板及支持板分別使用除了經化學強化以外與實施例5相同之玻璃板。The same glass plate as in Example 5 except for chemical strengthening was used for the substrate and the support plate, respectively.

(加強板之製作)(production of reinforcing board)

於實施例6中,以與實施例2相同之方式製作加強板。In Example 6, a reinforcing plate was produced in the same manner as in Example 2.

(基板之表面處理)(surface treatment of the substrate)

於實施例6中,為進行聚矽氧油之低分子量化,而以與實施例5相同之方式進行基板之表面處理。表面處理後之基板之第1主面的水接觸角為102°。In Example 6, the surface treatment of the substrate was carried out in the same manner as in Example 5 in order to reduce the molecular weight of the polyoxygenated oil. The water contact angle of the first main surface of the surface-treated substrate was 102°.

(積層體之製作)(production of laminated body)

表面處理後,以與實施例1相同之方式獲得包含基板與加強板之積層體。After the surface treatment, a laminate including the substrate and the reinforcing plate was obtained in the same manner as in Example 1.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層。於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之轉印物。再者,剝離後之基板之第1主面的水接觸角為102°。After the laminate was heat-treated in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer material from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 102°.

[實施例7][Embodiment 7]

基板及支持板分別使用與實施例1相同之玻璃板。The same glass plate as in Example 1 was used for the substrate and the support plate, respectively.

(加強板之製作)(production of reinforcing board)

對支持板進行純水洗淨、UV洗淨,使支持板之表面潔淨化。其後,於支持板之單面,藉由網版印刷塗佈硬化性樹脂組合物99.5質量份與聚矽氧油0.5質量份之混合物(塗佈量30 g/m2 )。此處,硬化性樹脂組合物使用與實施例2相同者,聚矽氧油使用二甲基聚矽氧烷(Dow Corning Toray公司製造,SH200)。The support plate is washed with pure water and UV washed to clean the surface of the support plate. Thereafter, a mixture of 99.5 parts by mass of the curable resin composition and 0.5 parts by mass of the polyoxyxylene oil (coating amount: 30 g/m 2 ) was applied to one side of the support sheet by screen printing. Here, as the curable resin composition, the same as in Example 2 was used, and dimethylpolysiloxane (manufactured by Dow Corning Toray Co., Ltd., SH200) was used.

將塗佈於支持板上之混合物於大氣中以180℃加熱硬化30分鐘,於支持板上之中央形成縱705 mm×橫595 mm×厚20 μm之聚矽氧樹脂層,並加以固定。The mixture coated on the support plate was heat-hardened at 180 ° C for 30 minutes in the atmosphere, and a polyoxynitride resin layer having a length of 705 mm × a width of 595 mm × a thickness of 20 μm was formed in the center of the support plate and fixed.

(積層體之製作)(production of laminated body)

於加強板之製作後,於基板之洗淨後之表面重疊聚矽氧樹脂層,於室溫下,藉由真空壓製機使基板與聚矽氧樹脂層密接,獲得包含基板與加強板之積層體。After the preparation of the reinforcing plate, the surface of the substrate is washed with a polysilicon oxide resin layer, and the substrate is adhered to the polyoxyn resin layer by a vacuum press at room temperature to obtain a laminate comprising the substrate and the reinforcing plate. body.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層。於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之樹脂之轉印。再者,剝離後之基板之第1主面的水接觸角為102°。After the laminate was heat-treated in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer of the resin from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 102°.

[實施例8][Embodiment 8]

基板及支持板均使用縱720 mm×橫600 mm之聚醯亞胺樹脂板(Toray‧Dupont公司製造,Kapton 200HV)。再者,基板之厚度設為0.05 mm,支持板之厚度設為0.5 mm。A substrate of 720 mm × 600 mm in width was used for the substrate and the support plate (Toray‧Dupont, Kapton 200HV). Further, the thickness of the substrate was set to 0.05 mm, and the thickness of the support plate was set to 0.5 mm.

(加強板之製作)(production of reinforcing board)

於實施例8中,以與實施例2相同之方式製作加強板。In Example 8, a reinforcing plate was produced in the same manner as in Example 2.

(基板之表面處理)(surface treatment of the substrate)

於實施例8中,以與實施例2相同之方式進行基板之表面處理。表面處理後之基板之第1主面的水接觸角為100°。In Example 8, the surface treatment of the substrate was carried out in the same manner as in Example 2. The water contact angle of the first main surface of the surface-treated substrate was 100°.

(積層體之製作)(production of laminated body)

表面處理後,於基板之第1主面重疊聚矽氧樹脂層,於室溫下,藉由真空壓製機使基板與聚矽氧樹脂層密接,獲得包含基板與加強板之積層體。After the surface treatment, the polyoxyxylene resin layer was placed on the first main surface of the substrate, and the substrate was adhered to the polyoxymethylene resin layer by a vacuum press at room temperature to obtain a laminate including the substrate and the reinforcing plate.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層。於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之轉印物。再者,剝離後之基板之第1主面的水接觸角為100°。After the laminate was heat-treated in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer material from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 100°.

[實施例9][Embodiment 9]

基板及支持板分別使用與實施例1相同之玻璃板。The same glass plate as in Example 1 was used for the substrate and the support plate, respectively.

(加強板之製作)(production of reinforcing board)

於實施例9中,以與實施例2相同之方式製作加強板。In Example 9, a reinforcing plate was produced in the same manner as in Example 2.

(基板之表面處理)(surface treatment of the substrate)

對基板進行純水洗淨、UV洗淨,使基板之表面潔淨化。其後,對作為基板之單面之第2主面實施遮罩後,將相反側之第1主面於使矽烷偶合劑(Dow Corning Toray公司製造,Z6040)氣化而成之氣體維持飽和狀態之環境下曝露10分鐘。曝露時之基板之表面溫度為25℃。曝露後之基板之第1主面的水接觸角為100°。The substrate is washed with pure water and UV washed to clean the surface of the substrate. Thereafter, after the second main surface of the single surface of the substrate is masked, the first main surface on the opposite side is maintained in a saturated state in a gas obtained by vaporizing a decane coupling agent (manufactured by Dow Corning Toray Co., Ltd., Z6040). Exposure for 10 minutes in the environment. The surface temperature of the substrate when exposed was 25 °C. The water contact angle of the first main surface of the exposed substrate was 100°.

(積層體之製作)(production of laminated body)

利用矽烷偶合劑進行表面處理後,於基板之第1主面重疊聚矽氧樹脂層,於室溫下,藉由真空壓製機使基板與聚矽氧樹脂層密接,獲得包含基板與加強板之積層體。After surface treatment with a decane coupling agent, the polyoxyxylene resin layer is superposed on the first main surface of the substrate, and the substrate and the polyoxynoxy resin layer are adhered to each other by a vacuum press at room temperature to obtain a substrate and a reinforcing plate. Laminated body.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層。於利用光學顯微鏡進行觀察之剝離後之聚矽氧樹脂層中未見到凝聚破壞,於剝離後之基板上未見到來自聚矽氧樹脂層之轉印物。再者,剝離後之基板之第1主面的水接觸角為100°。After the laminate was heat-treated in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. No cohesive failure was observed in the polyoxyxene resin layer after peeling observed by an optical microscope, and no transfer material from the polyoxyxylene resin layer was observed on the substrate after peeling. Further, the water contact angle of the first main surface of the substrate after peeling was 100°.

[比較例1][Comparative Example 1]

基板及支持板分別使用與實施例1相同之玻璃板。The same glass plate as in Example 1 was used for the substrate and the support plate, respectively.

(積層體之製作)(production of laminated body)

於比較例1中,以與實施例2相同之方式製作加強板,對基板之第1主面進行純水洗淨及UV洗淨使其潔淨化後,於基板之第1主面重疊聚矽氧樹脂層,於室溫下,藉由真空壓製機使基板與聚矽氧樹脂層密接,獲得包含基板與加強板之積層體。再者,基板之密接面(第1主面)之密接前的水接觸角為7°。In Comparative Example 1, a reinforcing plate was produced in the same manner as in Example 2, and the first main surface of the substrate was washed with pure water and UV-cleaned to be cleaned, and then laminated on the first main surface of the substrate. The oxygen resin layer was adhered to the polyoxynitride resin layer by a vacuum press at room temperature to obtain a laminate including the substrate and the reinforcing plate. Further, the water contact angle before the adhesion of the adhesion surface (first main surface) of the substrate was 7°.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層,結果聚矽氧樹脂層受到凝聚破壞,聚矽氧樹脂層之一部分附著於基板側。After the laminate was subjected to a heat treatment in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. As a result, the polyoxyxylene resin layer was agglomerated and a part of the polyoxynitride resin layer was adhered to the substrate. side.

[比較例2][Comparative Example 2]

基板及支持板分別使用與實施例1相同之玻璃板。The same glass plate as in Example 1 was used for the substrate and the support plate, respectively.

(加強板之製作)(production of reinforcing board)

於比較例2中,以與實施例2相同之方式製作加強板。In Comparative Example 2, a reinforcing plate was produced in the same manner as in Example 2.

(積層體之製作)(production of laminated body)

以與實施例2相同之方式製作加強板,對基板之第1主面進行純水洗淨使其潔淨化後,於基板之第1主面重疊聚矽氧樹脂層,於室溫下,藉由真空壓製機使基板與聚矽氧樹脂層密接,獲得包含基板與加強板之積層體。再者,基板之第1主面之密接前的水接觸角為40°。A reinforcing plate was produced in the same manner as in Example 2, and the first main surface of the substrate was washed with pure water to be cleaned, and then the polyoxyalkyl resin layer was laminated on the first main surface of the substrate, and the mixture was allowed to stand at room temperature. The substrate was adhered to the polyoxymethylene resin layer by a vacuum press to obtain a laminate including the substrate and the reinforcing plate. Further, the water contact angle before the first main surface of the substrate was in contact with each other was 40°.

(積層體之耐熱試驗)(heat test of laminate)

將該積層體與實施例1同樣地進行加熱處理後,與實施例1同樣地剝離基板與聚矽氧樹脂層,結果聚矽氧樹脂層受到凝聚破壞,聚矽氧樹脂層之一部分附著於基板側。After the laminate was subjected to a heat treatment in the same manner as in Example 1, the substrate and the polyoxyalkylene resin layer were peeled off in the same manner as in Example 1. As a result, the polyoxyxylene resin layer was agglomerated and a part of the polyoxynitride resin layer was adhered to the substrate. side.

以上,詳細且參照特定之實施態樣對本發明進行了說明,但本領域人員清楚瞭解,可不脫離本發明之精神與範圍而進行各種修正或變更。The present invention has been described in detail with reference to the preferred embodiments thereof.

本申請案係基於2010年5月11日提出申請之日本專利申請2010-108952者,其內容以參照之方式併入本文中。The present application is based on Japanese Patent Application No. 2010-108952, filed on Jan.

10...積層體10. . . Laminated body

20...基板20. . . Substrate

30...加強板30. . . Reinforcing plate

31...支持板31. . . Support board

32...樹脂層32. . . Resin layer

201...密接面(第1主面)201. . . Close contact surface (1st main surface)

202...第2主面202. . . Second main face

321...密接面321. . . Close contact

圖1係本發明之積層體之一例之部分側面圖。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partial side elevational view showing an example of a laminate of the present invention.

10...積層體10. . . Laminated body

20...基板20. . . Substrate

30...加強板30. . . Reinforcing plate

31...支持板31. . . Support board

32...樹脂層32. . . Resin layer

201...密接面(第1主面)201. . . Close contact surface (1st main surface)

202...第2主面202. . . Second main face

321...密接面321. . . Close contact

Claims (11)

一種積層體之製造方法,其係包含基板、支持板及存在於其等之間之樹脂層的積層體之製造方法,且係包括將上述樹脂層形成於上述支持板上之步驟、及使上述樹脂層與上述基板可剝離地密接之步驟者,且包括於上述密接步驟之前,預先以聚矽氧油或矽烷偶合劑對將要密接之上述基板表面及上述樹脂層表面之至少一方進行處理之步驟,或者於形成上述樹脂層之步驟中,由含有聚矽氧油或矽烷偶合劑之樹脂形成上述樹脂層,其後,於上述密接步驟中使上述基板及上述樹脂層重疊密接。 A method for producing a laminate comprising a method of producing a laminate of a substrate, a support plate, and a resin layer present between the substrate, and a method of forming the resin layer on the support plate, and a step of adhering the resin layer to the substrate in a peelable manner, and comprising the step of treating at least one of the surface of the substrate to be adhered and the surface of the resin layer to be closely adhered by a polyoxygenated oil or a decane coupling agent before the adhesion step Or, in the step of forming the resin layer, the resin layer is formed of a resin containing a polysiloxane or a decane coupling agent, and thereafter, the substrate and the resin layer are adhered to each other in the adhesion step. 如請求項1之積層體之製造方法,其包括如下步驟:於將要密接之上述基板表面及上述樹脂層表面之至少一方塗佈聚矽氧油或矽烷偶合劑;於塗佈聚矽氧油之情形時,進行使上述聚矽氧油低分子量化之處理;於塗佈矽烷偶合劑之情形時,進行使上述矽烷偶合劑反應之處理;其後,於上述密接步驟中,使上述基板及上述樹脂層重疊密接。 The method for producing a laminate according to claim 1, comprising the steps of: coating a surface of the substrate to be adhered and at least one of the surface of the resin layer with a polyoxygenated oil or a decane coupling agent; and coating the polyoxygenated oil. In the case of performing the treatment of lowering the molecular weight of the polyoxygenated oil; in the case of applying the decane coupling agent, performing a treatment for reacting the decane coupling agent; thereafter, in the adhesion step, the substrate and the substrate are The resin layers are overlapped and adhered. 如請求項2之積層體之製造方法,其中利用聚矽氧油或矽烷偶合劑,對將要密接之上述基板表面進行表面處理,實施有上述處理之基板表面之水接觸角為90°以上。 The method for producing a laminate according to claim 2, wherein the surface of the substrate to be adhered is surface-treated with a polyoxygen oxyhydroxide or a decane coupling agent, and a water contact angle of the surface of the substrate subjected to the above treatment is 90° or more. 如請求項1至3中任一項之積層體之製造方法,其中於將上述樹脂層形成於上述支持板上之步驟中,於上述支持 板表面形成硬化性樹脂組合物層,繼而使該硬化性樹脂組合物硬化而形成上述樹脂層。 The method for producing a laminate according to any one of claims 1 to 3, wherein in the step of forming the resin layer on the support sheet, the support is A curable resin composition layer is formed on the surface of the sheet, and then the curable resin composition is cured to form the above resin layer. 如請求項1至3中任一項之積層體之製造方法,其中上述樹脂層包含聚矽氧樹脂。 The method for producing a laminate according to any one of claims 1 to 3, wherein the resin layer comprises a polyoxyxylene resin. 如請求項5之積層體之製造方法,其中上述樹脂層包含有機烯基聚矽氧烷與有機氫聚矽氧烷之反應硬化物。 The method for producing a laminate according to claim 5, wherein the resin layer comprises a reaction hardened product of an organic alkenyl polysiloxane and an organic hydrogen polyoxyalkylene. 一種積層體,其係包含基板、支持板及存在於其等之間之樹脂層,上述樹脂層與上述基板可剝離地密接,上述樹脂層於上述支持板上以其等之間之剝離強度高於上述樹脂層與上述基板之間之剝離強度的方式而固定者,且所密接之上述基板表面及上述樹脂層表面之至少一方包含預先經聚矽氧油或矽烷偶合劑所處理之表面,或者上述樹脂層係由含有聚矽氧油或矽烷偶合劑之樹脂所形成者。 A laminate comprising a substrate, a support plate, and a resin layer present between the substrate, the resin layer being detachably adhered to the substrate, and the resin layer having a high peeling strength between the layers on the support plate Fixing the peeling strength between the resin layer and the substrate, and at least one of the surface of the substrate and the surface of the resin layer that are in close contact with each other includes a surface previously treated with a polyoxygenated oil or a decane coupling agent, or The resin layer is formed of a resin containing a polyoxygenated oil or a decane coupling agent. 如請求項7之積層體,其中與上述樹脂層表面密接之基板表面為利用聚矽氧油或矽烷偶合劑進行了表面處理之表面。 The laminate according to claim 7, wherein the surface of the substrate which is in close contact with the surface of the resin layer is a surface which has been surface-treated with a polyoxygenated oil or a decane coupling agent. 如請求項8之積層體,其中上述經表面處理之基板表面之水接觸角為90°以上。 The laminate according to claim 8, wherein the surface of the surface-treated substrate has a water contact angle of 90 or more. 如請求項7至9中任一項之積層體,其中上述樹脂層包含聚矽氧樹脂。 The laminate according to any one of claims 7 to 9, wherein the resin layer comprises a polysiloxane resin. 如請求項10之積層體,其中上述樹脂層包含有機烯基聚矽氧烷與有機氫聚矽氧烷之反應硬化物。The laminate according to claim 10, wherein the resin layer comprises a reaction hardened product of an organic alkenyl polysiloxane and an organic hydrogen polyoxyalkylene.
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