TWI498372B - Photosensitive composition, partition, color filter and organic EL element (1) - Google Patents

Photosensitive composition, partition, color filter and organic EL element (1) Download PDF

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Publication number
TWI498372B
TWI498372B TW099146288A TW99146288A TWI498372B TW I498372 B TWI498372 B TW I498372B TW 099146288 A TW099146288 A TW 099146288A TW 99146288 A TW99146288 A TW 99146288A TW I498372 B TWI498372 B TW I498372B
Authority
TW
Taiwan
Prior art keywords
group
polymer
photosensitive composition
partition wall
mass
Prior art date
Application number
TW099146288A
Other languages
English (en)
Chinese (zh)
Other versions
TW201139537A (en
Inventor
Hideyuki Takahashi
Kenji Ishizeki
Masayuki Kawashima
Kotaro Yamada
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of TW201139537A publication Critical patent/TW201139537A/zh
Application granted granted Critical
Publication of TWI498372B publication Critical patent/TWI498372B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays
    • H10K59/173—Passive-matrix OLED displays comprising banks or shadow masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electroluminescent Light Sources (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Optical Filters (AREA)
TW099146288A 2009-12-28 2010-12-28 Photosensitive composition, partition, color filter and organic EL element (1) TWI498372B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009298959 2009-12-28

Publications (2)

Publication Number Publication Date
TW201139537A TW201139537A (en) 2011-11-16
TWI498372B true TWI498372B (zh) 2015-09-01

Family

ID=44226553

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099146288A TWI498372B (zh) 2009-12-28 2010-12-28 Photosensitive composition, partition, color filter and organic EL element (1)

Country Status (5)

Country Link
JP (1) JP5682572B2 (ja)
KR (1) KR101763441B1 (ja)
CN (1) CN102652285B (ja)
TW (1) TWI498372B (ja)
WO (1) WO2011081149A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013050505A (ja) * 2011-08-30 2013-03-14 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物
TW201329635A (zh) * 2011-11-11 2013-07-16 Asahi Glass Co Ltd 負型感光性樹脂組成物、隔壁、黑色矩陣及光學元件
ITBS20130110A1 (it) * 2013-07-22 2015-01-23 Guarniflon S P A Polimero fluorurato
CN103730207B (zh) * 2013-11-26 2016-08-17 沃太能源南通有限公司 一种单晶硅太阳能电池用铝浆的制备方法
CN109065762A (zh) * 2018-08-01 2018-12-21 武汉华星光电半导体显示技术有限公司 Oled装置的制作方法及oled装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142779A (ja) * 1996-11-05 1998-05-29 Fuji Photo Film Co Ltd 感光性樹脂組成物及び感光性多層シート
CN1756995A (zh) * 2003-03-07 2006-04-05 旭硝子株式会社 感光性树脂组合物及其涂膜固化物
JP2007025427A (ja) * 2005-07-20 2007-02-01 Toppan Printing Co Ltd インキ吐出印刷物及びその製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3856298B2 (ja) * 2001-02-08 2006-12-13 富士フイルムホールディングス株式会社 平版印刷版原版
JP4141120B2 (ja) * 2001-08-16 2008-08-27 富士フイルム株式会社 平版印刷版用原版
JP2003228164A (ja) * 2002-02-06 2003-08-15 Fuji Photo Film Co Ltd 平版印刷版用原版
JP4543886B2 (ja) * 2003-11-14 2010-09-15 旭硝子株式会社 画像表示素子の隔壁の形成方法
JP4513399B2 (ja) * 2004-04-27 2010-07-28 旭硝子株式会社 感光性樹脂組成物及びその塗膜硬化物
US20060263720A1 (en) 2005-05-11 2006-11-23 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate
JP2008242273A (ja) * 2007-03-28 2008-10-09 Fujifilm Corp 着色硬化性樹脂組成物、着色パターン形成方法、着色パターン、カラーフィルタの製造方法、カラーフィルタ、及び液晶表示素子
JP2008249867A (ja) * 2007-03-29 2008-10-16 Fujifilm Corp 感光性樹脂組成物、感光性転写材料、離画壁及びその形成方法、カラーフィルタ及びその製造方法、並びに表示装置
JP2009069589A (ja) * 2007-09-14 2009-04-02 Fujifilm Corp 画像形成方法
JP5085342B2 (ja) * 2008-01-11 2012-11-28 東京応化工業株式会社 着色感光性樹脂組成物
KR20100053476A (ko) * 2008-11-12 2010-05-20 스미또모 가가꾸 가부시끼가이샤 감광성 흑색 수지 조성물, 블랙 매트릭스 기판 및 컬러 필터의 제조 방법
JP5574088B2 (ja) * 2009-01-28 2014-08-20 Ｊｓｒ株式会社 感放射線性樹脂組成物ならびに液晶表示素子のスペーサーおよびその形成方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142779A (ja) * 1996-11-05 1998-05-29 Fuji Photo Film Co Ltd 感光性樹脂組成物及び感光性多層シート
CN1756995A (zh) * 2003-03-07 2006-04-05 旭硝子株式会社 感光性树脂组合物及其涂膜固化物
JP2007025427A (ja) * 2005-07-20 2007-02-01 Toppan Printing Co Ltd インキ吐出印刷物及びその製造方法

Also Published As

Publication number Publication date
JPWO2011081149A1 (ja) 2013-05-13
WO2011081149A1 (ja) 2011-07-07
TW201139537A (en) 2011-11-16
KR101763441B1 (ko) 2017-07-31
CN102652285B (zh) 2014-05-21
CN102652285A (zh) 2012-08-29
KR20120124397A (ko) 2012-11-13
JP5682572B2 (ja) 2015-03-11

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