TWI495041B - 半導體裝置、用於半導體裝置之製造方法及電子設備 - Google Patents

半導體裝置、用於半導體裝置之製造方法及電子設備 Download PDF

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Publication number
TWI495041B
TWI495041B TW101121190A TW101121190A TWI495041B TW I495041 B TWI495041 B TW I495041B TW 101121190 A TW101121190 A TW 101121190A TW 101121190 A TW101121190 A TW 101121190A TW I495041 B TWI495041 B TW I495041B
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Taiwan
Prior art keywords
electrode
insulating film
film
layer
substrate
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TW101121190A
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English (en)
Chinese (zh)
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TW201304064A (zh
Inventor
Yoshihisa Kagawa
Kenichi Aoyagi
Yoshiya Hagimoto
Nobutoshi Fujii
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Sony Corp
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Priority claimed from JP2011168021A external-priority patent/JP5982748B2/ja
Priority claimed from JP2011170666A external-priority patent/JP5803398B2/ja
Priority claimed from JP2011210142A external-priority patent/JP6127360B2/ja
Priority claimed from JP2012006356A external-priority patent/JP6031765B2/ja
Application filed by Sony Corp filed Critical Sony Corp
Publication of TW201304064A publication Critical patent/TW201304064A/zh
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Publication of TWI495041B publication Critical patent/TWI495041B/zh

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