TWI482545B - Printed circuit board and method for manufacturing same - Google Patents

Printed circuit board and method for manufacturing same Download PDF

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Publication number
TWI482545B
TWI482545B TW102118548A TW102118548A TWI482545B TW I482545 B TWI482545 B TW I482545B TW 102118548 A TW102118548 A TW 102118548A TW 102118548 A TW102118548 A TW 102118548A TW I482545 B TWI482545 B TW I482545B
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layer
copper
conductive
region
copper plating
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TW102118548A
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TW201442581A (en
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Chao Meng Cheng
Cong Lei
hai-bo Qin
Mao Feng Hsu
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Zhen Ding Technology Co Ltd
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Description

電路板及其製作方法 Circuit board and manufacturing method thereof

本發明涉及電路板領域,尤其涉及一種電路板及其製作方法。 The present invention relates to the field of circuit boards, and in particular, to a circuit board and a method of fabricating the same.

電路板一般包括產品部及廢料部,產品部即具有電路功能之區域,廢料部即於電路板打件後需要去除之部分。產品部包括相對之第一表面及第二表面,亦即上下兩個表面。一般之,產品部之第一表面及第二表面之邊緣並不會出現裸露之銅面,即產品部之第一表面及第二表面之邊緣都覆蓋有絕緣層。隨著手機類消費性電子產品功能多樣化需求,於電路板設計中亦出現了之產品部之第一表面及第二表面之邊緣具有裸露之銅面之情況,並且此類設計要求電路板之產品部之連接第一表面及第二表面之側面上亦形成側銅面,所述側銅面連接產品部之第一表面及第二表面之邊緣之裸露之銅面。製作此類設計之電路板時,需要對電路板進行產品部側面之電鍍以形成所述側銅面,目前之製作方法為:首先,對所述電路板進行第一次沖型,使所述產品部與所述廢料部部分分離,從而暴露出所述產品部待電鍍之側面,之後,對所述產品部待電鍍之側面及第一表面及第二表面之邊緣待電鍍之部位進行電鍍,最後,藉由第二次撈型將產品部與廢料部進行分離。惟此方法於對電路板進行第二次撈型時,產品部電鍍位置容易出現銅之 拉絲及毛邊等不良,進而可能影響焊錫良率。 The circuit board generally includes a product part and a waste part, and the product part is an area having a circuit function, and the waste part is a part that needs to be removed after the circuit board is hit. The product part includes a first surface and a second surface opposite to each other, that is, upper and lower surfaces. Generally, the exposed surface of the first surface and the second surface of the product portion does not have a bare copper surface, that is, the first surface of the product portion and the edge of the second surface are covered with an insulating layer. With the diversified needs of mobile consumer electronics products, there are also cases where the first surface of the product part and the edge of the second surface have exposed copper surfaces in the circuit board design, and such designs require a circuit board. A side copper surface is also formed on the side of the product portion connecting the first surface and the second surface, and the side copper surface connects the exposed surface of the first surface of the product portion and the exposed surface of the second surface. When manufacturing a circuit board of such a design, it is necessary to perform electroplating on the side of the product part to form the side copper surface. The current manufacturing method is as follows: first, the circuit board is firstly punched, so that The product portion is partially separated from the scrap portion to expose the side of the product portion to be plated, and then, the side to be plated of the product portion and the portion to be plated on the edge of the first surface and the second surface are plated. Finally, the product department is separated from the waste department by the second fishing type. However, when this method is used for the second fishing of the circuit board, the plating position of the product part is prone to copper. Bad wire drawing and burrs, which may affect the solder yield.

有鑒於此,有必要提供一種電路板及其製作方法,以減少電路板產品部電鍍位置之銅之拉絲及毛邊等不良。 In view of the above, it is necessary to provide a circuit board and a manufacturing method thereof to reduce defects such as brushed wire and burrs of copper in the plating position of the product part of the circuit board.

一種電路板之製作方法,包括步驟:提供電路基板,所述電路基板包括分別位於所述電路基板之最外兩側第一導電層及第二導電層;所述電路基板包括產品部及廢料部,定義所述廢料部與所述產品部之交界為交界線;所述產品部包括至少一個第一板邊待電鍍區及至少一個第二板邊待電鍍區,所述至少一個第一板邊待電鍍區位於所述第一導電層,所述至少一個第二板邊待電鍍區位於所述第二導電層,所述第一板邊待電鍍區與所述第二板邊待電鍍區之位置逐個相對應;於所述電路基板之廢料部形成至少一個貫通孔,所述貫通孔具有第一側壁,所述第一側壁相對於所述電路基板傾斜;於所述第一導電層之第一板邊待電鍍區形成第二鍍銅層,於所述第二導電層之第二板邊待電鍍區形成第四鍍銅層,以及於所述第一側壁靠中間區域形成連接所述第二鍍銅層及第四鍍銅層之第三鍍銅層;蝕刻並控制蝕刻時間從而將將所述電路基板之未形成鍍銅層區域之第一導電層及第二導電層去除,從而於與所述第一板邊待電鍍區對應之位置形成第一板邊導電區,於與所述第二板邊待電鍍區對應之位置形成第二板邊導電區,於所述貫通孔之第一側壁形成第三板邊導電區,所述第三板邊導電區分別與所述第一板邊導電區及第二板邊導電區相連;以及將所述產品部與所述廢料部相分離,從而將所述產品部製作形成電路板,其中,所述電路板之側壁包括所述第一側壁。 A method for manufacturing a circuit board, comprising the steps of: providing a circuit substrate, wherein the circuit substrate comprises a first conductive layer and a second conductive layer respectively located on outermost sides of the circuit substrate; the circuit substrate comprises a product part and a waste part Defining a boundary between the waste portion and the product portion as a boundary line; the product portion includes at least one first plate edge to be plated region and at least one second plate edge to be plated region, the at least one first plate edge The to-be-plated area is located in the first conductive layer, and the at least one second board side to be plated area is located in the second conductive layer, the first board side to be plated area and the second board side to be plated area Positioning one by one; forming at least one through hole in the waste portion of the circuit substrate, the through hole having a first sidewall, the first sidewall being inclined with respect to the circuit substrate; and the first conductive layer Forming a second copper plating layer on a plate to be plated, forming a fourth copper plating layer on the second plate side of the second conductive layer, and forming a connection between the first side wall and the intermediate portion Two copper plating layers and a third copper plating layer of the fourth copper plating layer; etching and controlling the etching time to remove the first conductive layer and the second conductive layer of the circuit substrate where the copper plating layer is not formed, thereby Forming a first plate edge conductive region at a position corresponding to the plated region, forming a second plate edge conductive region at a position corresponding to the second plate edge to be plated region, and forming a third plate on the first sidewall of the through hole An edge conducting region, wherein the third board edge conductive region is respectively connected to the first board edge conductive region and the second board edge conductive region; and separating the product portion from the scrap portion to thereby The portion is formed to form a circuit board, wherein a sidewall of the circuit board includes the first sidewall.

一種電路板,其包括分別位於所述電路板之兩側之第三導電線路層及第四導電線路層,所述第三導電線路層包括第一導電圖形及第一板邊導電區,所述第四導電線路層包括第二導電圖形及第二板邊導電區,所述電路板還具有第一側壁,所述第一側壁相對於所述電路板傾斜,所述第一側壁形成有所述第三板邊導電區,所述第三板邊導電區、所述第一板邊導電區及第二板邊導電區相連。 A circuit board comprising a third conductive circuit layer and a fourth conductive circuit layer respectively located on two sides of the circuit board, the third conductive circuit layer comprising a first conductive pattern and a first board edge conductive region, The fourth conductive circuit layer includes a second conductive pattern and a second board edge conductive region, the circuit board further has a first sidewall, the first sidewall is inclined with respect to the circuit board, and the first sidewall is formed with the The third board edge conductive region, the third board edge conductive region, the first board edge conductive region and the second board edge conductive region are connected.

本技術方案提供之電路板製作方法,先於電路基板上形成一個梯形之貫通孔,使所述貫通孔具有一個傾斜之第一側面,再於第一側面上形成一個第三板邊導電區,及形成與所述第三板邊導電區相連之第一板邊導電區及第二板邊導電區,之後再將所述產品部與所述廢料部相分離,且分離時保留了所述第一側壁,從而,形成貫通孔時,產品部之邊緣還沒有電鍍銅,故不會出現銅之拉絲及毛邊等現象,分離廢料部時雖然進行了電鍍銅,但因貫通孔位置之所述產品部已經藉由貫通孔與所述廢料部相分離,故,不用再對已分離之部位進行切割,亦即分離廢料部亦不會接觸到第一側壁上之導電區,故,亦不會出現銅之拉絲及毛邊等現象。 The circuit board manufacturing method provided by the technical solution forms a trapezoidal through hole on the circuit substrate, the through hole has a sloped first side surface, and a third board edge conductive area is formed on the first side surface. And forming a first board edge conductive region and a second board edge conductive region connected to the third board edge conductive region, and then separating the product portion from the scrap portion, and retaining the first part when separating One side wall, and thus, when the through hole is formed, the edge of the product portion is not plated with copper, so that the phenomenon of drawing and burrs of copper does not occur, and although the copper is plated when the waste portion is separated, the product is in the position of the through hole. The portion has been separated from the scrap portion by the through hole, so that the separated portion is not required to be cut, that is, the separated scrap portion does not contact the conductive region on the first side wall, and therefore does not appear. Brushed and burrs of copper.

10‧‧‧電路基板 10‧‧‧ circuit board

101‧‧‧第一導電層 101‧‧‧First conductive layer

102‧‧‧第一絕緣層 102‧‧‧First insulation

103‧‧‧第一導電線路層 103‧‧‧First conductive circuit layer

104‧‧‧第二絕緣層 104‧‧‧Second insulation

105‧‧‧第二導電線路層 105‧‧‧Second conductive circuit layer

106‧‧‧第三絕緣層 106‧‧‧third insulation

107‧‧‧第二導電層 107‧‧‧Second conductive layer

110‧‧‧產品部 110‧‧‧Products Department

120‧‧‧廢料部 120‧‧‧Disposal Department

121‧‧‧交界線 121‧‧‧Boundary line

1011‧‧‧第一板邊待電鍍區 1011‧‧‧First board side plating area

1071‧‧‧第二板邊待電鍍區 1071‧‧‧Second board side plating area

1012‧‧‧第一邊 1012‧‧‧ first side

1013‧‧‧第二邊 1013‧‧‧ second side

131‧‧‧貫通孔 131‧‧‧through holes

1311‧‧‧第一開口 1311‧‧‧first opening

1312‧‧‧第二開口 1312‧‧‧second opening

1315‧‧‧第一側壁 1315‧‧‧First side wall

1316‧‧‧第二側壁 1316‧‧‧second side wall

1317‧‧‧第三側壁 1317‧‧‧ third side wall

1318‧‧‧第四側壁 1318‧‧‧ fourth side wall

1313‧‧‧第一底邊 1313‧‧‧ first bottom

1314‧‧‧第二底邊 1314‧‧‧second bottom

141‧‧‧第一沉銅層 141‧‧‧First copper layer

142‧‧‧第二沉銅層 142‧‧‧Second copper layer

143‧‧‧第三沉銅層 143‧‧‧The third copper layer

144‧‧‧第五沉銅層 144‧‧‧ fifth copper layer

151‧‧‧光阻層 151‧‧‧Photoresist layer

161‧‧‧第一沉銅暴露區 161‧‧‧First copper exposed area

162‧‧‧第二沉銅暴露區 162‧‧‧Second copper exposed area

163‧‧‧第三沉銅暴露區 163‧‧‧ Third copper exposed area

164‧‧‧第四沉銅暴露區 164‧‧‧4nd copper exposed area

165‧‧‧第五沉銅暴露區 165‧‧‧5th copper exposed area

171‧‧‧第一鍍銅層 171‧‧‧First copper plating

172‧‧‧第二鍍銅層 172‧‧‧Second copper plating

173‧‧‧第三鍍銅層 173‧‧‧ third copper plating

174‧‧‧第四鍍銅層 174‧‧‧The fourth copper plating

175‧‧‧第五鍍銅層 175‧‧‧ fifth copper plating

108‧‧‧第三導電線路層 108‧‧‧ Third conductive circuit layer

1081‧‧‧第一導電圖形 1081‧‧‧First conductive graphic

1082‧‧‧第一板邊導電區 1082‧‧‧First board edge conductive area

109‧‧‧第四導電線路層 109‧‧‧fourth conductive layer

1091‧‧‧第二導電圖形 1091‧‧‧Second conductive pattern

1092‧‧‧第二板邊導電區 1092‧‧‧Second board edge conductive area

1093‧‧‧第三板邊導電區 1093‧‧‧ Third plate edge conductive zone

20‧‧‧電路板 20‧‧‧ boards

2011‧‧‧第五側壁 2011‧‧‧ fifth side wall

2012‧‧‧第六側壁 2012‧‧‧ sixth side wall

2013‧‧‧第七側壁 2013‧‧‧ seventh side wall

2014‧‧‧第八側壁 2014‧‧‧ eighth side wall

2015‧‧‧第九側壁 2015 ‧ ‧ ninth side wall

2016‧‧‧第十側壁 2016‧‧‧10th side wall

圖1係本技術方案實施例提供之電路基板之俯視示意圖。 1 is a top plan view of a circuit substrate provided by an embodiment of the present technical solution.

圖2係本技術方案實施例提供之電路基板之剖面示意圖。 2 is a schematic cross-sectional view of a circuit substrate provided by an embodiment of the present technical solution.

圖3係本技術方案實施例提供之於圖1之電路基板上形成貫通孔後之俯視示意圖。 FIG. 3 is a top plan view showing a through hole formed on the circuit substrate of FIG. 1 according to an embodiment of the present invention.

圖4係本技術方案實施例提供之於圖2之電路基板上形成貫通孔後 之剖面示意圖。 4 is a through hole formed on the circuit substrate of FIG. 2 provided by the embodiment of the present technical solution. Schematic diagram of the section.

圖5係本技術方案實施例提供之於圖4中之電路基板上形成沉銅層後之剖面示意圖。 FIG. 5 is a schematic cross-sectional view showing a copper-clad layer formed on the circuit substrate of FIG. 4 according to an embodiment of the present technical solution.

圖6係本技術方案實施例提供之於圖5中之電路基板上形成光阻層後之剖面示意圖。 FIG. 6 is a schematic cross-sectional view showing a photoresist layer formed on the circuit substrate of FIG. 5 according to an embodiment of the present invention.

圖7係本技術方案實施例提供之於圖6中之電路基板上形成圖案化之光阻層使部分沉銅層暴露出來後之剖面示意圖。 FIG. 7 is a schematic cross-sectional view showing a patterned photoresist layer formed on the circuit substrate of FIG. 6 after the partial copper layer is exposed by the embodiment of the present invention.

圖8係本技術方案實施例提供之於圖7中之電路基板上形成鍍銅層後之剖面示意圖。 FIG. 8 is a schematic cross-sectional view showing a copper plating layer formed on the circuit substrate of FIG. 7 according to an embodiment of the present technical solution.

圖9係本技術方案實施例提供之將圖8中之電路基板上之光阻層去除後之剖面示意圖。 FIG. 9 is a schematic cross-sectional view showing the photoresist layer on the circuit substrate of FIG. 8 after the embodiment of the present invention is removed.

圖10係本技術方案實施例提供之於圖9中之電路基板上蝕刻後之剖面示意圖。 FIG. 10 is a cross-sectional view showing the etching on the circuit substrate of FIG. 9 provided by the embodiment of the present technical solution.

圖11係本技術方案提供之電路板之俯視示意圖。 11 is a top plan view of a circuit board provided by the present technical solution.

圖12係本技術方案提供之電路板之剖面示意圖。 FIG. 12 is a schematic cross-sectional view of a circuit board provided by the technical solution.

下面將結合附圖及實施例對本技術方案提供之電路板及其製作方法作進一步之詳細說明。 The circuit board provided by the technical solution and the manufacturing method thereof will be further described in detail below with reference to the accompanying drawings and embodiments.

本技術方案實施例提供之電路板之製作方法包括以下步驟: The manufacturing method of the circuit board provided by the embodiment of the technical solution includes the following steps:

第一步,請參閱圖1-2,提供電路基板10。 In the first step, referring to FIG. 1-2, a circuit substrate 10 is provided.

所述電路基板10可以為雙層電路基板或多層電路基板。本實施例 中,以一個四層之電路基板10為例進行說明。 The circuit substrate 10 may be a two-layer circuit substrate or a multilayer circuit substrate. This embodiment A four-layer circuit substrate 10 will be described as an example.

所述電路基板10包括依次疊合之第一導電層101、第一絕緣層102、第一導電線路層103、第二絕緣層104、第二導電線路層105、第三絕緣層106及第二導電層107。所述第一導電層101與所述第二導電層107分別位於所述電路基板10之最外兩側且均為未形成導電線路之銅箔層。所述第一導電層101與所述第二導電層107之厚度大致相同。 The circuit substrate 10 includes a first conductive layer 101, a first insulating layer 102, a first conductive wiring layer 103, a second insulating layer 104, a second conductive wiring layer 105, a third insulating layer 106, and a second layer which are sequentially laminated. Conductive layer 107. The first conductive layer 101 and the second conductive layer 107 are respectively located on the outermost sides of the circuit substrate 10 and are copper foil layers on which the conductive lines are not formed. The first conductive layer 101 and the second conductive layer 107 have substantially the same thickness.

所述電路基板10為大致長方形,其包括產品部110及廢料部120。所述廢料部120包圍所述產品部110。定義所述廢料部120與所述產品部110之交界為交界線121。 The circuit board 10 is substantially rectangular and includes a product portion 110 and a waste portion 120. The waste portion 120 surrounds the product portion 110. The boundary between the scrap portion 120 and the product portion 110 is defined as a boundary line 121.

所述產品部110包括至少一個第一板邊待電鍍區1011及至少一個第二板邊待電鍍區1071。所述至少一個第一板邊待電鍍區1011位於所述第一導電層101,所述至少一個第二板邊待電鍍區1071位於所述第二導電層107,所述第一板邊待電鍍區1011與所述第二板邊待電鍍區1071之位置逐個相對應,且所述第一板邊待電鍍區1011與對應之所述第二板邊待電鍍區1071形狀尺寸大致相同。本實施例中,所述第一板邊待電鍍區1011與所述第二板邊待電鍍區之數量均為一個;所述第一板邊待電鍍區1011與所述第二板邊待電鍍區1071均為長方形。所述第一板邊待電鍍區1011靠近所述交界線121且具有與所述交界線121相重合之第一邊1012,所述第二板邊待電鍍區1071靠近所述交界線121且略超過所述交界線121,其具有位於所述廢料部120上平行於所述交界線121之第二邊1013。 The product portion 110 includes at least one first plate edge to be plated region 1011 and at least one second plate edge to be plated region 1071. The at least one first board edge to be plated region 1011 is located on the first conductive layer 101, and the at least one second board edge to be plated region 1071 is located on the second conductive layer 107, the first board edge to be plated The region 1011 corresponds to the position of the second plate edge to be plated region 1071, and the first plate edge to be plated region 1011 and the corresponding second plate edge to be plated region 1071 have substantially the same shape. In this embodiment, the number of the first plate edge to be plated region 1011 and the second plate edge to be plated is one; the first plate edge to be plated region 1011 and the second plate edge to be plated The area 1071 is rectangular. The first plate edge to be plated region 1011 is adjacent to the boundary line 121 and has a first side 1012 that coincides with the boundary line 121. The second plate edge to be plated region 1071 is adjacent to the boundary line 121 and slightly Exceeding the boundary line 121, having a second side 1013 on the scrap portion 120 parallel to the boundary line 121.

當然,本步驟中所述電路基板10之產品部110及廢料部120尚未分 離,故,所述交界線121為虛擬之線。另,所述電路基板10並不限於本實施例中之形狀;所述產品部110及廢料部120亦並不限於本實施例中之形狀;所述第一板邊待電鍍區1011與所述第二板邊待電鍍區1071亦不限於本實施例中之形狀。並且,所述電路基板10具有至少一個導電孔或連通孔(圖未示),導電孔或連通孔之作用為電連接或於後續步驟中電連接所述各個導電層和導電線路層。 Of course, the product part 110 and the waste part 120 of the circuit substrate 10 in this step are not yet divided. Therefore, the boundary line 121 is a virtual line. In addition, the circuit board 10 is not limited to the shape in the embodiment; the product part 110 and the waste part 120 are not limited to the shape in the embodiment; the first board edge to be plated area 1011 and the The second plate edge to be plated region 1071 is also not limited to the shape in this embodiment. Moreover, the circuit substrate 10 has at least one conductive hole or communication hole (not shown), and the conductive hole or the communication hole functions to electrically connect or electrically connect the respective conductive layers and the conductive circuit layer in a subsequent step.

第二步,請參閱圖3-4,於所述電路基板10之廢料部120形成至少一個梯形之貫通孔131。 In the second step, referring to FIG. 3-4, at least one trapezoidal through hole 131 is formed in the scrap portion 120 of the circuit substrate 10.

所述貫通孔131之數量與所述第一板邊待電鍍區1011之數量相同。本實施例中,所述貫通孔131之數量為一個。 The number of the through holes 131 is the same as the number of the first plate side to be plated regions 1011. In this embodiment, the number of the through holes 131 is one.

所述貫通孔131形成於所述廢料部120且位於所述第一板邊待電鍍區1011之一側。所述貫通孔131具有第一開口1311及第二開口1312,所述第一開口1311形成於所述第一導電層101側,所述第二開口1312形成於第二導電層107側。所述第一開口1311與所述第二開口1312正對且均為長方形,所述第一開口1311之各邊與所述第二開口1312之各邊對應相平行。所述第一開口1311之長及寬之尺寸相應均大於所述第二開口1312之長及寬之尺寸。所述貫通孔131具有依次相連之均為梯形之第一側壁1315、第二側壁1316、第三側壁1317及第四側壁1318。所述第一側壁1315具有相對之第一底邊1313及第二底邊1314,所述第一側壁1315之第一底邊1313即為所述第一開口1311之一條長邊,所述第二底邊1314即為所述第二開口1312之一條長邊,其中,所述第一底邊1313與所述第一邊1012相重合,所述第二底邊1314與所述第二邊1013重合。 定義所述第一邊1012之長度為L1,定義所述第二邊1013之長度為L2,定義所述第一底邊1313之長度為L3,定義所述第二底邊1314之長度為L4,則L3>L4>L1,且L3>L4>L2,本實施例中,L1=L2。因所述第一開口1311之尺寸大於所述第二開口1312之尺寸,故,所述第一側壁1315、第二側壁1316、第三側壁1317及第四側壁1318均為梯形且均相對於所述貫通孔131之中軸線傾斜,亦即均相對於所述電路基板10所於之平面傾斜。 The through hole 131 is formed in the scrap portion 120 and is located on one side of the first plate side to be plated region 1011. The through hole 131 has a first opening 1311 formed on the first conductive layer 101 side and a second opening 1312 formed on the second conductive layer 107 side. The first opening 1311 is opposite to the second opening 1312 and is rectangular. The sides of the first opening 1311 are parallel to the sides of the second opening 1312. The dimensions of the length and width of the first opening 1311 are correspondingly larger than the length and width of the second opening 1312. The through hole 131 has a first side wall 1315, a second side wall 1316, a third side wall 1317 and a fourth side wall 1318 which are all connected in a trapezoidal shape. The first sidewall 1315 has a first bottom edge 1313 and a second bottom edge 1314. The first bottom edge 1313 of the first sidewall 1315 is a long side of the first opening 1311, and the second The bottom edge 1314 is a long side of the second opening 1312, wherein the first bottom edge 1313 coincides with the first edge 1012, and the second bottom edge 1314 coincides with the second edge 1013. . The length of the first side 1012 is defined as L1, the length of the second side 1013 is defined as L2, the length of the first bottom edge 1313 is defined as L3, and the length of the second bottom edge 1314 is defined as L4. Then L3>L4>L1, and L3>L4>L2. In the present embodiment, L1=L2. Because the size of the first opening 1311 is larger than the size of the second opening 1312, the first sidewall 1315, the second sidewall 1316, the third sidewall 1317, and the fourth sidewall 1318 are all trapezoidal and are opposite to each other. The central axis of the through hole 131 is inclined, that is, both are inclined with respect to the plane on which the circuit board 10 is placed.

形成所述貫通孔131之方式優選為銑刀成型,選用之刀具為與待成型產品呈小於90度傾斜之刀具,以形成各側壁均為梯形之貫通孔131。當然,亦可以採用其他方式形成所述貫通孔131,如鐳射切割等。 The manner of forming the through hole 131 is preferably a milling cutter. The selected tool is a tool that is inclined by less than 90 degrees with the product to be formed to form a through hole 131 each having a trapezoidal shape. Of course, the through holes 131 may be formed in other ways, such as laser cutting or the like.

另,所述貫通孔131亦可以為具有三個側壁之通孔或者多於四個側壁之通孔,此時只需要有一個側壁與所述貫通孔131之中軸線相傾斜,且該側壁之一底邊與所述第一邊1012重合以及長度大於該第一邊1012即可;或者亦可以為圓台狀通孔等。 In addition, the through hole 131 may also be a through hole having three side walls or a through hole having more than four side walls. In this case, only one side wall needs to be inclined with respect to the central axis of the through hole 131, and the side wall is A bottom edge may coincide with the first side 1012 and a length greater than the first side 1012; or may be a truncated-shaped through hole or the like.

第三步,請參閱圖5,於所述電路基板10之第一導電層101、第二導電層107、第一側壁1315、第二側壁1316、第三側壁1317及第四側壁1318表面分別形成第一沉銅層141、第二沉銅層142、第三沉銅層143、第四沉銅層(圖未示)、第五沉銅層144及第六沉銅層(圖未示)。 In the third step, referring to FIG. 5, the first conductive layer 101, the second conductive layer 107, the first sidewall 1315, the second sidewall 1316, the third sidewall 1317, and the fourth sidewall 1318 are formed on the surface of the circuit substrate 10, respectively. The first copper layer 141, the second copper layer 142, the third copper layer 143, the fourth copper layer (not shown), the fifth copper layer 144, and the sixth copper layer (not shown).

形成所述第一沉銅層141、第二沉銅層142、第三沉銅層143、第四沉銅層、第五沉銅層144及第六沉銅層之方式可以為化學鍍銅或濺鍍銅等。因所述貫通孔131貫通所述第一導電層101及所述第二導電層107,故於其側壁沉銅後,所述第一導電層101及所述第 二導電層107相電連接。因同時電鍍,故,所述各沉銅層之厚度大致相同。 Forming the first copper layer 141, the second copper layer 142, the third copper layer 143, the fourth copper layer, the fifth copper layer 144, and the sixth copper layer may be electroless copper plating or Sputtered copper, etc. Since the through hole 131 penetrates the first conductive layer 101 and the second conductive layer 107, after the sidewall is filled with copper, the first conductive layer 101 and the first layer The two conductive layers 107 are electrically connected. Because of the simultaneous plating, the thickness of each of the copper-clad layers is substantially the same.

第四步,請參閱圖6,於所述電路基板10塗布液態光阻並固化所述液態光阻形成光阻層151。 In the fourth step, referring to FIG. 6, a liquid photoresist is applied to the circuit substrate 10 and the liquid photoresist is cured to form a photoresist layer 151.

具體之,於所述第一沉銅層141、第二沉銅層142、第三沉銅層143、第四沉銅層、第五沉銅層144及第六沉銅層表面分別形成光阻層151。 Specifically, a photoresist is formed on the surfaces of the first copper sink layer 141, the second copper sink layer 142, the third copper sink layer 143, the fourth copper sink layer, the fifth copper sink layer 144, and the sixth copper sink layer, respectively. Layer 151.

優選所述液態光阻為浸泡式之,亦即藉由將所述電路基板10浸泡於液態光阻中形成上述光阻層。選用浸泡式液態光阻之原因為普通乾膜光阻只能覆蓋於電路板之兩側,而不能完全覆蓋所述貫通孔131之各個側壁,而浸泡式之液態光阻可以流動從而可以穿過所述貫通孔131從而於其個各側壁覆蓋上光阻。 Preferably, the liquid photoresist is immersed, that is, the photoresist layer is formed by immersing the circuit substrate 10 in a liquid photoresist. The reason why the immersion liquid photoresist is selected is that the ordinary dry film photoresist can only cover both sides of the circuit board, and cannot completely cover the respective side walls of the through hole 131, and the immersed liquid photoresist can flow and can pass through. The through holes 131 thus cover the photoresist on each of the side walls.

第五步,請參閱圖7,曝光及顯影所述液態光阻形成圖案化之光阻層,從而使部分沉銅層暴露出來。 In the fifth step, referring to FIG. 7, the liquid photoresist is exposed and developed to form a patterned photoresist layer, thereby exposing a portion of the copper layer.

曝光顯影所述液態光阻形成圖案化之光阻層後,未被所述光阻層覆蓋之部位之沉銅層暴露出,暴露出之沉銅層包括第一沉銅暴露區161、第二沉銅暴露區162、第三沉銅暴露區163、第四沉銅暴露區164及第五沉銅暴露區165。所述第一沉銅暴露區161位於所述第一沉銅層141,所述第一沉銅暴露區161具有一定圖案,此圖案與後續步驟中形成之電路板之一個外層導電線路層之圖案相同。所述第二沉銅暴露區162亦位於所述第一沉銅層141,其與所述產品部110之所述第一板邊待電鍍區1011位置、形狀及尺寸相同。所述第三沉銅暴露區163位於所述第三沉銅層143,其與所述第 二沉銅暴露區162相連,所述第三沉銅暴露區163亦為長方形且與所述第二沉銅暴露區162共邊。所述第四沉銅暴露區164位於所述第二沉銅層142,其與所述產品部110之所述第二板邊待電鍍區1071位置、形狀及尺寸相同,且與所述第三沉銅暴露區163相連且共邊。所述第五沉銅暴露區165亦位於所述第二沉銅層142上,所述第五沉銅暴露區165亦具有一定圖案,此圖案與後續步驟中形成之電路板之另一個外層導電線路層之圖案相同。 After exposing and developing the liquid photoresist to form a patterned photoresist layer, the copper layer of the portion not covered by the photoresist layer is exposed, and the exposed copper layer includes the first copper exposed region 161 and the second The copper exposed area 162, the third copper exposed area 163, the fourth copper exposed area 164, and the fifth copper exposed area 165. The first copper exposed region 161 is located on the first copper sink layer 141, and the first copper exposed region 161 has a pattern, and the pattern is patterned with an outer conductive layer of the circuit board formed in the subsequent step. the same. The second copper exposed region 162 is also located in the first copper-clad layer 141, which is the same as the position, shape and size of the first plate edge to be plated region 1011 of the product portion 110. The third copper exposed region 163 is located in the third copper sink layer 143, and the first The second copper exposed regions 162 are connected, and the third copper exposed regions 163 are also rectangular and co-edge with the second copper exposed regions 162. The fourth copper exposed region 164 is located at the second copper sink layer 142, which is the same as the position, shape and size of the second plate edge to be plated region 1071 of the product portion 110, and the third The copper exposed regions 163 are connected and co-edge. The fifth copper exposed region 165 is also located on the second copper sink layer 142, and the fifth copper exposed region 165 also has a pattern, and the pattern is electrically conductive with the other outer layer of the circuit board formed in the subsequent step. The pattern of the circuit layers is the same.

形成所述第一沉銅暴露區161及第五沉銅暴露區165之作用為於後續步驟中將所述第一導電層101及第二導電層107製作形成導電線路圖形。同時形成所述第一沉銅暴露區161、第二沉銅暴露區162、第三沉銅暴露區163、第四沉銅暴露區164及第五沉銅暴露區165可以節省電路板製作成本。當然,亦可以不於本步驟形成所述第一沉銅暴露區161及第五沉銅暴露區165,而於後續步驟中另行進行乾膜、曝光、顯影及蝕刻等流程將所述第一導電層101及第二導電層107製作形成導電線路圖形。 The forming of the first copper exposed region 161 and the fifth copper exposed region 165 serves to form the conductive layer pattern by forming the first conductive layer 101 and the second conductive layer 107 in a subsequent step. Simultaneously forming the first copper exposure region 161, the second copper exposure region 162, the third copper exposure region 163, the fourth copper exposure region 164, and the fifth copper exposure region 165 can save board manufacturing costs. Of course, the first copper exposed region 161 and the fifth copper exposed region 165 may not be formed in this step, and the first conductive layer may be separately subjected to dry film, exposure, development, and etching in a subsequent step. The layer 101 and the second conductive layer 107 are formed to form a conductive line pattern.

第六步,請參閱圖8,電鍍從而於從圖案化之光阻層中暴露出來之沉銅層上形成鍍銅層。 In the sixth step, referring to Figure 8, electroplating is performed to form a copper plating layer on the copper layer exposed from the patterned photoresist layer.

具體之,於所述第一沉銅暴露區161上形成第一鍍銅層171,於所述第二沉銅暴露區162上形成第二鍍銅層172,於所述第三沉銅暴露區163上形成第三鍍銅層173,於所述第四沉銅暴露區164上形成第四鍍銅層174,及於所述第五沉銅暴露區165上形成第五鍍銅層175。因同時電鍍,故,所述各鍍銅層之厚度大致相同。所述第一導電層101與所述沉銅層之厚度之和小於所述鍍銅層之厚度;優選鍍銅層之厚度小於光阻層之厚度。 Specifically, a first copper plating layer 171 is formed on the first copper exposed region 161, and a second copper plating layer 172 is formed on the second copper exposed region 162 in the third copper exposed region. A third copper plating layer 173 is formed on the 163, a fourth copper plating layer 174 is formed on the fourth copper exposed region 164, and a fifth copper plating layer 175 is formed on the fifth copper exposed region 165. Since the plating is performed at the same time, the thickness of each of the copper plating layers is substantially the same. The sum of the thicknesses of the first conductive layer 101 and the copper-clad layer is smaller than the thickness of the copper-plated layer; preferably, the thickness of the copper-plated layer is smaller than the thickness of the photoresist layer.

當然,亦可以不形成所述沉銅層,而直接藉由選擇性濺鍍等方式同時於第一導電層101形成形狀位置與待形成之導電線路圖形相同之第一鍍銅層171,於第二導電層107形成形狀位置與待形成之導電線路圖形相同之第五鍍銅層175,於第一導電層101之第一板邊待電鍍區1011形成第二鍍銅層172,於第二導電層107之第二板邊待電鍍區1071形成第四鍍銅層174,以及於第一側壁1315之靠中間區域形成連接所述第二鍍銅層172及第四鍍銅層174之第三鍍銅層173。 Of course, the first copper plating layer 171 having the same shape and shape as the conductive line pattern to be formed may be formed on the first conductive layer 101 by selective sputtering or the like without forming the copper layer. The second conductive layer 107 forms a fifth copper plating layer 175 having the same shape as the conductive circuit pattern to be formed, and a second copper plating layer 172 is formed on the first plate side of the first conductive layer 101 to be plated, and the second conductive layer is formed on the first conductive layer 101. The second plate side of the layer 107 is to be plated to form a fourth copper plating layer 174, and the third side of the first side wall 1315 is formed with a third plating plate connecting the second copper plating layer 172 and the fourth copper plating layer 174. Copper layer 173.

第七步,請參閱圖9,去除所述光阻層,從而將所述光阻層覆蓋之所述沉銅層全部暴露出來。 In a seventh step, referring to FIG. 9, the photoresist layer is removed to expose the copper layer covered by the photoresist layer.

去除所述光阻層後之所述電路基板10之兩側均為全銅面,但係此時全銅面之厚度並不相同。所述第一沉銅暴露區161對應之位置之銅層包括第一導電層101、第一沉銅層141及第一鍍銅層171。所述第二沉銅暴露區162對應之位置之銅層包括第一導電層101、第一沉銅層141及第二鍍銅層172。所述第三沉銅暴露區163對應之位置之銅層包括第三沉銅層143及第三鍍銅層173。所述第四沉銅暴露區164對應之位置之銅層包括第二導電層107、第二沉銅層142及第四鍍銅層174。所述第五沉銅暴露區165對應之位置之銅層包括第二導電層107、第二沉銅層142及第五鍍銅層175。所述第一側壁1315之其他位置、所述第二側壁1316、所述第三側壁1317及所述第四側壁1318之表面分別形成第三沉銅層143、第四沉銅層、第五沉銅層144及第六沉銅層。所述電路基板10之第一導電層101側除第一沉銅暴露區161、第二沉銅暴露區162以外,銅層均包括第一導電層101及第一沉銅層141。所述電路基板10之 第二導電層107側除所述第四沉銅暴露區164及第五沉銅暴露區165以外,銅層均包括第二導電層107及第二沉銅層142。亦即,第一沉銅暴露區161、第二沉銅暴露區162、第三沉銅暴露區163、第四沉銅暴露區164及第五沉銅暴露區165所於位置之銅層較其他位置厚。 The circuit board 10 after removing the photoresist layer has a copper surface on both sides, but the thickness of the copper surface is not the same at this time. The copper layer corresponding to the first copper exposed region 161 includes a first conductive layer 101, a first copper sink layer 141, and a first copper plating layer 171. The copper layer corresponding to the location of the second copper exposed region 162 includes a first conductive layer 101, a first copper sink layer 141, and a second copper plating layer 172. The copper layer corresponding to the location of the third copper exposed region 163 includes a third copper layer 143 and a third copper plating layer 173. The copper layer corresponding to the location of the fourth copper exposed region 164 includes a second conductive layer 107, a second copper sink layer 142, and a fourth copper plating layer 174. The copper layer corresponding to the location of the fifth copper exposed region 165 includes a second conductive layer 107, a second copper sink layer 142, and a fifth copper plating layer 175. The other positions of the first side wall 1315, the second side wall 1316, the third side wall 1317 and the fourth side wall 1318 form a third copper sink layer 143, a fourth copper sink layer, and a fifth sink, respectively. Copper layer 144 and sixth copper layer. The first conductive layer 101 side of the circuit substrate 10 includes a first conductive layer 101 and a first copper sink layer 141 except for the first copper exposed region 161 and the second copper exposed region 162. The circuit substrate 10 The second conductive layer 107 side includes a second conductive layer 107 and a second copper sink layer 142 except for the fourth copper exposed region 164 and the fifth copper exposed region 165. That is, the copper layer of the first copper exposed region 161, the second copper exposed region 162, the third copper exposed region 163, the fourth copper exposed region 164, and the fifth copper exposed region 165 is located at a position other than the other copper layer. The location is thick.

第八步,請參閱圖10,蝕刻並控制蝕刻時間從而將將所述第一沉銅暴露區161、第二沉銅暴露區162、第三沉銅暴露區163、第四沉銅暴露區164及第五沉銅暴露區165以外區域之銅層去除,並將第一沉銅暴露區161、第二沉銅暴露區162、第三沉銅暴露區163、第四沉銅暴露區164及第五沉銅暴露區165所於位置之銅層減薄。 In the eighth step, referring to FIG. 10, the etching time is etched and controlled so that the first copper exposed region 161, the second copper exposed region 162, the third copper exposed region 163, and the fourth copper exposed region 164 are to be etched. And removing the copper layer in the region other than the fifth copper exposed region 165, and the first copper exposed region 161, the second copper exposed region 162, the third copper exposed region 163, the fourth copper exposed region 164, and the first The copper layer at the location of the 165 copper exposed area is thinned.

從而,於所述第一絕緣層102側形成第三導電線路層108,所述第三導電線路層108包括位於產品部110之與所述第一沉銅暴露區161之位置對應之第一導電圖形1081及位於產品部110之與所述第一板邊待電鍍區1011位置對應之第一板邊導電區1082;於所述第三絕緣層106側形成第四導電線路層109,所述第四導電線路層109包括位於產品部110之與所述第五沉銅暴露區165之位置對應之第二導電圖形1091及位於產品部110之與所述第二板邊待電鍍區1071位置對應之第二板邊導電區1092;於所述貫通孔131之第一側壁1315形成第三板邊導電區1093,所述第三板邊導電區1093、所述第一板邊導電區1082及第二板邊導電區1092均為長方形,所述第三板邊導電區1093分別與所述第一板邊導電區1082及第二板邊導電區1092相連且共邊。 Therefore, a third conductive circuit layer 108 is formed on the first insulating layer 102 side, and the third conductive circuit layer 108 includes a first conductive portion corresponding to the position of the first copper exposed region 161 of the product portion 110. a first plate edge conductive region 1082 corresponding to the position of the first plate edge to be plated region 1011 of the product portion 110, and a fourth conductive circuit layer 109 formed on the third insulating layer 106 side. The fourth conductive circuit layer 109 includes a second conductive pattern 1091 corresponding to the position of the fifth copper exposed region 165 of the product portion 110 and a position corresponding to the position of the product portion 110 to be plated to be plated 1071. a second board edge conductive region 1092; a third board edge conductive region 1093 formed on the first sidewall 1315 of the through hole 131, the third board edge conductive region 1093, the first board edge conductive region 1082 and the second The board edge conductive regions 1092 are all rectangular, and the third board edge conductive regions 1093 are respectively connected to the first board edge conductive region 1082 and the second board edge conductive region 1092 and are adjacent to each other.

第九步,請一併參閱圖11-12,將所述產品部110與所述廢料部 120相分離,從而將所述產品部製作形成電路板20。 In the ninth step, please refer to FIG. 11-12 together, the product part 110 and the waste department. The 120 phases are separated to form the product portion to form the circuit board 20.

具體撈型之方向請參閱圖11中之箭頭所示,沿所述第一側壁1315之第二底邊1314之一端向所述產品部110行進至所述第一側壁1315之第一底邊1313之一端,即箭頭A所示方向,從而形成所述電路板20之第五側壁2011,所述第五側壁2011為三角形且所述電路板20相垂直;之後沿所述交界線121行進至所述第一側壁1315之第一底邊1313之另一端,即箭頭B及C所示方向,從而形成所述電路板20之第六側壁2012及第七側壁2013,所述第六側壁2012及第七側壁2013均為方形且均與所述電路板20相垂直,所述第六側壁2012及第七側壁2013還與所述第五側壁2011相垂直;直至之後沿所述交界線121行進至所述第一側壁1315之第一底邊1313之另一端,即箭頭D及E所示方向,從而形成所述電路板20之第八側壁2014及第九側壁2015,第八側壁2014及第九側壁2015均為方形且均與所述電路板20相垂直,所述第八側壁2014及第九側壁2015還與所述第五側壁2011呈鈍角;最後沿所述第一側壁1315之第一底邊1313之另一端行進至所述第一側壁1315之第二底邊1314之另一端,即箭頭F所示方向,從而形成所述電路板20之第十側壁2016,所述第十側壁2016亦為三角形且所述電路板20相垂直,所述第十側壁2016還與所述第八側壁2014及第九側壁2015呈鈍角;因所述貫通孔131位置之所述產品部110已經與所述廢料部120相分離,故,此處不用再沿撈型,亦即電路板20保留了所述貫通孔131之第一側壁1315。其中,所述第七側壁2013、第六側壁2012、第五側壁2011、第一側壁1315、第十側壁2016、第九側壁2015及第八側壁2014依次相連。 The direction of the specific fishing type is as shown by the arrow in FIG. 11 , and travels toward the product portion 110 along one end of the second bottom edge 1314 of the first sidewall 1315 to the first bottom edge 1313 of the first sidewall 1315 . One end, that is, the direction indicated by the arrow A, thereby forming the fifth side wall 2011 of the circuit board 20, the fifth side wall 2011 is triangular and the circuit board 20 is vertical; then travels along the boundary line 121 to the The other end of the first bottom side 1313 of the first side wall 1315, that is, the direction indicated by arrows B and C, thereby forming the sixth side wall 2012 and the seventh side wall 2013 of the circuit board 20, the sixth side wall 2012 and the The seven side walls 2013 are all square and are perpendicular to the circuit board 20, and the sixth side wall 2012 and the seventh side wall 2013 are also perpendicular to the fifth side wall 2011; until then, the boundary line 121 is advanced to the The other end of the first bottom side 1313 of the first side wall 1315, that is, the direction indicated by the arrows D and E, thereby forming the eighth side wall 2014 and the ninth side wall 2015 of the circuit board 20, the eighth side wall 2014 and the ninth side wall 2015 is square and is perpendicular to the circuit board 20, and the eighth sidewall 201 4 and the ninth side wall 2015 are also obtusely angled with the fifth side wall 2011; finally, the other end of the first bottom side 1313 of the first side wall 1315 travels to the second bottom side 1314 of the first side wall 1315. One end, that is, the direction indicated by the arrow F, thereby forming the tenth side wall 2016 of the circuit board 20, the tenth side wall 2016 is also triangular and the circuit board 20 is perpendicular, the tenth side wall 2016 is also The eighth side wall 2014 and the ninth side wall 2015 are obtuse angles; since the product portion 110 at the position of the through hole 131 is separated from the scrap portion 120, there is no need to follow the fishing type, that is, the circuit board 20 The first side wall 1315 of the through hole 131 is retained. The seventh sidewall 2013, the sixth sidewall 2012, the fifth sidewall 2011, the first sidewall 1315, the tenth sidewall 2016, the ninth sidewall 2015, and the eighth sidewall 2014 are sequentially connected.

分離所述廢料部120之方式可以為沖型、撈型或鐳射切割等。本實施例為撈型。 The method of separating the waste portion 120 may be a punching, fishing, or laser cutting. This embodiment is a fishing type.

所述電路板20包括依次疊合之第三導電線路層108、第一絕緣層102、第一導電線路層103、第二絕緣層104、第二導電線路層105、第三絕緣層106及第四導電線路層109。所述第三導電線路層108包括板內之第一導電圖形1081及板邊之第一板邊導電區1082。所述第四導電線路層109包括板內之第二導電圖形1091及板邊之第二板邊導電區1092。所述電路板還包括依次相連之第六側壁2012、第五側壁2011、第一側壁1315、第八側壁2014及所述第七側壁2013。所述第五側壁2011及所述第八側壁2014為三角形且所述電路板20相垂直。所述第六側壁2012及第七側壁2013均為方形且均與所述電路板20相垂直。所述第一側壁1315為梯形,所述第一側壁1315相對於所述電路板20傾斜。所述第一側壁1315包括平行相對之第一底邊1313及第二底邊1314,所述第一側壁1315上形成有所述第三板邊導電區1093,所述第三板邊導電區1093、所述第一板邊導電區1082及第二板邊導電區1092均為長方形,所述第三板邊導電區1093分別與所述第一板邊導電區1082及第二板邊導電區1092相連且共邊。定義所述第三板邊導電區1093與所述第一板邊導電區1082及第二板邊導電區1092共有之邊之長度均為L1,定義所述第一底邊1313之長度為L3,定義所述第二底邊1314之長度為L4,則L3>L4>L1。 The circuit board 20 includes a third conductive circuit layer 108, a first insulating layer 102, a first conductive circuit layer 103, a second insulating layer 104, a second conductive circuit layer 105, a third insulating layer 106, and a plurality of layers. Four conductive circuit layers 109. The third conductive circuit layer 108 includes a first conductive pattern 1081 in the board and a first board edge conductive region 1082 in the board edge. The fourth conductive circuit layer 109 includes a second conductive pattern 1091 in the board and a second board edge conductive region 1092 in the board edge. The circuit board further includes a sixth side wall 2012, a fifth side wall 2011, a first side wall 1315, an eighth side wall 2014, and the seventh side wall 2013 which are sequentially connected. The fifth sidewall 2011 and the eighth sidewall 2014 are triangular and the circuit board 20 is perpendicular. The sixth side wall 2012 and the seventh side wall 2013 are both square and are perpendicular to the circuit board 20. The first sidewall 1315 is trapezoidal, and the first sidewall 1315 is inclined with respect to the circuit board 20. The first sidewall 1315 includes a first bottom edge 1313 and a second bottom edge 1314. The first sidewall 1315 is formed with the third board edge conductive region 1093. The third board edge conductive region 1093 is formed. The first board edge conductive region 1082 and the second board edge conductive region 1092 are both rectangular, and the third board edge conductive region 1093 and the first board edge conductive region 1082 and the second board edge conductive region 1092 are respectively Connected and shared. Defining the length of the side of the third board edge conductive region 1093 shared with the first board edge conductive region 1082 and the second board edge conductive region 1092 is L1, and defining the length of the first bottom edge 1313 to be L3. The length of the second bottom edge 1314 is defined as L4, then L3>L4>L1.

所述電路板20可以為撓性電路板、剛性電路板或剛撓電路板。 The circuit board 20 can be a flexible circuit board, a rigid circuit board, or a rigid-flex circuit board.

另,於將所述產品部110與所述廢料部120相分離前,還可以包括防焊、鍍化金等步驟。 In addition, before the product portion 110 is separated from the waste portion 120, steps such as solder resist, gold plating, and the like may be included.

本技術方案提供之電路板及其製作方法,先於電路基板10上形成一個梯形之貫通孔131,使所述貫通孔131具有一個傾斜之第一側壁1315,再藉由液態光阻、曝光顯影及蝕刻等步驟於第一側壁1315上形成一個第三板邊導電區1093,且於電路基板10之板邊分別形成與所述第三板邊導電區1093相連之第一板邊導電區1082及第二板邊導電區1092,之後再將所述產品部110與所述廢料部120相分離,且分離時保留了所述貫通孔131之第一側壁1315,即第一次成型時電路基板10之產品部110之邊緣還沒有電鍍銅,故不會出現銅之拉絲及毛邊等現象,第二次成型雖然進行了電鍍銅,但因貫通孔131位置之所述產品部110已經與所述廢料部120相分離,故,不用再對已分離之部位進行切割,亦即第二次成型不會接觸到第一側壁上之第三板邊導電區1093及與所述第三板邊導電區1093相連之第一板邊導電區1082及第二板邊導電區1092,故,亦不會出現銅之拉絲及毛邊等現象;並且電路板外層之線路隨所述第三板邊導電區1093、第一板邊導電區1082及第二板邊導電區1092一起形成,不用另行進行製作線路所需之化學鍍銅、電鍍銅及乾膜曝光顯影蝕刻等流程,從而可以節約電路板製作成本。 The circuit board provided by the technical solution and the manufacturing method thereof, a trapezoidal through hole 131 is formed on the circuit substrate 10, so that the through hole 131 has an inclined first side wall 1315, and is further developed by liquid photoresist and exposure. And forming a third board edge conductive region 1093 on the first sidewall 1315, and forming a first board edge conductive region 1082 connected to the third board edge conductive region 1093 on the board edge of the circuit substrate 10 and The second board edge conductive region 1092, and then the product portion 110 is separated from the waste portion 120, and the first sidewall 1315 of the through hole 131 is retained when separated, that is, the circuit substrate 10 is formed during the first molding. There is no copper plating on the edge of the product part 110, so there is no phenomenon such as drawing and burrs of copper. Although the second molding is performed by electroplating copper, the product part 110 due to the position of the through hole 131 has been associated with the scrap. The portion 120 is phase separated, so that the separated portion is not further cut, that is, the second molding does not contact the third board edge conductive region 1093 on the first sidewall and the third panel edge conductive region 1093. Connected first board edge guide The region 1082 and the second board edge conductive region 1092, so that the phenomenon of drawing and burrs of copper does not occur; and the circuit of the outer layer of the circuit board follows the third board edge conductive region 1093, the first board edge conductive region 1082 and The second board edge conductive regions 1092 are formed together, and the processes of electroless copper plating, copper plating, dry film exposure and development etching required for the circuit are not separately required, thereby saving the manufacturing cost of the circuit board.

惟,以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士爰依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 However, the above description is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.

20‧‧‧電路板 20‧‧‧ boards

102‧‧‧第一絕緣層 102‧‧‧First insulation

106‧‧‧第三絕緣層 106‧‧‧third insulation

110‧‧‧產品部 110‧‧‧Products Department

1315‧‧‧第一側壁 1315‧‧‧First side wall

108‧‧‧第三導電線路層 108‧‧‧ Third conductive circuit layer

1081‧‧‧第一導電圖形 1081‧‧‧First conductive graphic

1082‧‧‧第一板邊導電區 1082‧‧‧First board edge conductive area

109‧‧‧第四導電線路層 109‧‧‧fourth conductive layer

1091‧‧‧第二導電圖形 1091‧‧‧Second conductive pattern

1092‧‧‧第二板邊導電區 1092‧‧‧Second board edge conductive area

1093‧‧‧第三板邊導電區 1093‧‧‧ Third plate edge conductive zone

Claims (9)

一種電路板之製作方法,包括步驟:提供電路基板,所述電路基板包括分別位於所述電路基板之最外兩側第一導電層及第二導電層;所述電路基板包括產品部及廢料部,定義所述廢料部與所述產品部之交界為交界線;所述產品部包括至少一個第一板邊待電鍍區及至少一個第二板邊待電鍍區,所述至少一個第一板邊待電鍍區位於所述第一導電層,所述至少一個第二板邊待電鍍區位於所述第二導電層,所述第一板邊待電鍍區與所述第二板邊待電鍍區之位置逐個相對應;於所述電路基板之廢料部形成至少一個貫通孔,所述貫通孔具有第一側壁,所述第一側壁相對於所述電路基板傾斜;於所述第一導電層之第一板邊待電鍍區形成第二鍍銅層,於所述第二導電層之第二板邊待電鍍區形成第四鍍銅層,以及於所述第一側壁靠中間區域形成連接所述第二鍍銅層及第四鍍銅層之第三鍍銅層;蝕刻並控制蝕刻時間將所述電路基板之未形成鍍銅層區域之第一導電層及第二導電層去除,從而於與所述第一板邊待電鍍區對應之位置形成第一板邊導電區,於與所述第二板邊待電鍍區對應之位置形成第二板邊導電區,於所述貫通孔之第一側壁形成第三板邊導電區,所述第三板邊導電區分別與所述第一板邊導電區及第二板邊導電區相連;以及將所述產品部與所述廢料部相分離,從而將所述產品部製作形成電路板,所述電路板之側壁包括所述第一側壁。 A method for manufacturing a circuit board, comprising the steps of: providing a circuit substrate, wherein the circuit substrate comprises a first conductive layer and a second conductive layer respectively located on outermost sides of the circuit substrate; the circuit substrate comprises a product part and a waste part Defining a boundary between the waste portion and the product portion as a boundary line; the product portion includes at least one first plate edge to be plated region and at least one second plate edge to be plated region, the at least one first plate edge The to-be-plated area is located in the first conductive layer, and the at least one second board side to be plated area is located in the second conductive layer, the first board side to be plated area and the second board side to be plated area Positioning one by one; forming at least one through hole in the waste portion of the circuit substrate, the through hole having a first sidewall, the first sidewall being inclined with respect to the circuit substrate; and the first conductive layer Forming a second copper plating layer on a plate to be plated, forming a fourth copper plating layer on the second plate side of the second conductive layer, and forming a connection between the first side wall and the intermediate portion Two copper plating layers and a third copper plating layer of the fourth copper plating layer; etching and controlling the etching time to remove the first conductive layer and the second conductive layer of the circuit substrate where the copper plating layer is not formed, thereby waiting with the first board a first plate edge conductive region is formed at a position corresponding to the plating region, a second plate edge conductive region is formed at a position corresponding to the second plate edge to be plated region, and a third plate edge conductive layer is formed on the first sidewall of the through hole a region, the third board edge conductive region is respectively connected to the first board edge conductive region and the second board edge conductive region; and separating the product portion from the scrap portion to thereby manufacture the product portion A circuit board is formed, the sidewall of the circuit board including the first sidewall. 如請求項第1項所述之電路板之製作方法,其中,所述第一板邊待電鍍區具有與所述交界線相重合之第一邊,所述第二板邊待電鍍區具有位於所 述廢料部且與所述交界線相平行之第二邊,所述第一側壁具有相對之第一底邊及第二底邊,所述第一底邊與所述第一邊相重合,所述第二底邊與所述第二邊相重合,定義所述第一邊之長度為L1,定義所述第二邊之長度為L2,定義所述第一底邊之長度為L3,定義所述第二底邊之長度為L4,則L3>L4>L1,且L3>L4>L2。 The method of manufacturing the circuit board of claim 1, wherein the first board edge to be plated region has a first side that coincides with the boundary line, and the second board edge to be plated area has a Place a second side of the waste portion and parallel to the boundary line, the first side wall has a first bottom edge and a second bottom edge, and the first bottom edge coincides with the first side The second bottom edge is coincident with the second side, and the length of the first side is defined as L1, the length of the second side is defined as L2, and the length of the first bottom side is defined as L3. The length of the second bottom side is L4, then L3>L4>L1, and L3>L4>L2. 如請求項第1項所述之電路板之製作方法,其中,於所述第一導電層之第一板邊待電鍍區形成第二鍍銅層,於所述第二導電層之第二板邊待電鍍區形成第四鍍銅層,以及於所述第一側壁靠中間區域形成連接所述第二鍍銅層及第四鍍銅層之第三鍍銅層之方法包括步驟:於所述電路基板之第一導電層、第二導電層及第一側壁表面分別形成第一沉銅層、第二沉銅層及第三沉銅層;於所述第一沉銅層、第二沉銅層及第三沉銅層上形成圖案化之光阻層,未被所述光阻層覆蓋之所述沉銅層包括第二沉銅暴露區、第三沉銅暴露區及第四沉銅暴露區;所述第二沉銅暴露區位於所述第一沉銅層,所述第二沉銅暴露區與所述產品部之所述第一板邊待電鍍區位置、形狀及尺寸相同;所述第四沉銅暴露區位於所述第二沉銅層,所述第四沉銅暴露區與所述產品部之所述第二板邊待電鍍區位置、形狀及尺寸相同;所述第三沉銅暴露區位於所述第三沉銅層且所述第三沉銅暴露區兩端分別與所述第二沉銅暴露區及第四沉銅暴露區相連;於所述第一沉銅暴露區電鍍形成第二鍍銅層,於所述第四沉銅暴露區電鍍形成第四鍍銅層,以及於所述第三沉銅暴露區電鍍形成連接所述第二鍍銅層及第四鍍銅層之第三鍍銅層;以及去除所述光阻層。 The method of manufacturing the circuit board of claim 1, wherein a second copper plating layer is formed on the first plate side of the first conductive layer to be plated, and a second plate is formed on the second conductive layer. Forming a fourth copper plating layer adjacent to the plating region, and forming a third copper plating layer connecting the second copper plating layer and the fourth copper plating layer on the intermediate portion of the first sidewall includes a step of: The first conductive layer, the second conductive layer and the first sidewall surface of the circuit substrate respectively form a first copper sink layer, a second copper sink layer and a third copper sink layer; and the first copper sink layer and the second copper sink layer Forming a patterned photoresist layer on the layer and the third copper layer, the copper layer not covered by the photoresist layer including the second copper exposed region, the third copper exposed region, and the fourth copper exposed The second copper exposed area is located in the first copper sinking layer, and the second copper exposed area is the same as the position, shape and size of the first plate side to be plated area of the product part; The fourth copper exposed region is located in the second copper sink layer, the fourth copper sink exposed region and the second plate edge of the product portion The position, shape and size of the electroplating zone are the same; the third copper exposed area is located in the third copper sinking layer and the two exposed copper exposed areas are respectively opposite to the second copper exposed area and the fourth a copper-plated exposed area is connected; a second copper plating layer is plated in the exposed portion of the first copper sink, a fourth copper plating layer is formed on the exposed portion of the fourth copper sink, and the exposed portion of the third copper sink is exposed Electroplating forms a third copper plating layer connecting the second copper plating layer and the fourth copper plating layer; and removing the photoresist layer. 如請求項第1項所述之電路板之製作方法,其中,將所述電路基板之未形成鍍銅層區域之第一導電層及第二導電層去除之同時,還將所述第一板 邊待電鍍區之第一導電層及第二鍍銅層整體減薄,將所述第二板邊待電鍍區之第二導電層及第四鍍銅層整體減薄,將所述第一側壁靠中間區域之第三鍍銅層減薄。 The method of manufacturing the circuit board of claim 1, wherein the first conductive layer and the second conductive layer of the circuit substrate where the copper plating layer region is not formed is removed, and the first board is further removed The first conductive layer and the second copper plating layer to be electroplated are integrally thinned, and the second conductive layer and the fourth copper plating layer of the second plate to be plated are integrally thinned, and the first sidewall is The third copper plating layer in the middle area is thinned. 如請求項第1項所述之電路板之製作方法,其中,於所述第一導電層之第一板邊待電鍍區形成第二鍍銅層,於所述第二導電層之第二板邊待電鍍區形成第四鍍銅層,以及於所述第一側壁靠中間區域形成連接所述第二鍍銅層及第四鍍銅層之第三鍍銅層之同時,還於所述第一導電層形成第一鍍銅層,及於第二導電層形成第五鍍銅層,蝕刻並控制蝕刻時間從而將所述電路基板之未形成鍍銅層區域之第一導電層及第二導電層去除之同時,還於與所述第一鍍銅層對應之區域形成第一導電線路圖形,於與所述第五鍍銅層對應之區域形成第二導電線路圖形。 The method of manufacturing the circuit board of claim 1, wherein a second copper plating layer is formed on the first plate side of the first conductive layer to be plated, and a second plate is formed on the second conductive layer. Forming a fourth copper plating layer on the side to be plated, and forming a third copper plating layer connecting the second copper plating layer and the fourth copper plating layer on the intermediate portion of the first sidewall; a conductive layer forms a first copper plating layer, and a second copper plating layer is formed on the second conductive layer, and etching time is controlled to control the first conductive layer and the second conductive region of the circuit substrate where the copper plating layer region is not formed. At the same time as the layer is removed, a first conductive line pattern is formed in a region corresponding to the first copper plating layer, and a second conductive line pattern is formed in a region corresponding to the fifth copper plating layer. 如請求項第5項所述之電路板之製作方法,其中,將所述電路基板之未形成鍍銅層區域之第一導電層及第二導電層去除之同時,還將所述第一鍍銅層及對應之所述第一導電層整體減薄,及將所述第五鍍銅層及對應之所述第二導電層整體減薄,從而於與所述第一鍍銅層對應之區域形成第一導電線路圖形,於與所述第五鍍銅層對應之區域形成第二導電線路圖形。 The method of manufacturing the circuit board of claim 5, wherein the first conductive layer and the second conductive layer of the circuit substrate where the copper plating layer region is not formed is removed, and the first plating is further performed The copper layer and the corresponding first conductive layer are integrally thinned, and the fifth copper plating layer and the corresponding second conductive layer are integrally thinned to be in a region corresponding to the first copper plating layer. Forming a first conductive line pattern, and forming a second conductive line pattern in a region corresponding to the fifth copper plating layer. 如請求項第1項所述之電路板之製作方法,其中,所述貫通孔具有第一開口及第二開口,所述第一開口形成於所述第一導電層側,所述第二開口形成於第二導電層側,所述第一開口與所述第二開口正對且所述第一開口之尺寸大於所述第二開口之尺寸。 The manufacturing method of the circuit board of claim 1, wherein the through hole has a first opening and a second opening, the first opening is formed on the first conductive layer side, and the second opening Formed on the second conductive layer side, the first opening is opposite to the second opening and the size of the first opening is larger than the size of the second opening. 如請求項第1項所述之電路板之製作方法,其中,形成所述貫通孔之方式為銑刀成型,使用與待成型產品呈小於90度傾斜之刀具進行銑刀成型。 The method of manufacturing the circuit board according to Item 1, wherein the through hole is formed by milling, and the cutter is formed by using a tool having a tilt of less than 90 degrees with the product to be molded. 一種電路板,其包括分別位於所述電路板之兩側之第三導電線路層及第四導電線路層,所述第三導電線路層包括第一導電圖形及第一板邊導電 區,所述第四導電線路層包括第二導電圖形及第二板邊導電區,所述電路板還具有第一側壁,所述第一側壁相對於所述電路板傾斜,所述第一側壁形成有所述第三板邊導電區,所述第三板邊導電區、所述第一板邊導電區及第二板邊導電區相連,其中,所述第一側壁包括相對之第一底邊及第二底邊,定義所述第三板邊導電區與所述第一板邊導電區共有之邊為第一邊,所述第一邊與所述第一底邊重合,定義所述第一邊之長度為L1,定義所述第一底邊之長度為L3,定義所述第二底邊之長度為L4,則L3>L4>L1。 A circuit board comprising a third conductive circuit layer and a fourth conductive circuit layer respectively located on two sides of the circuit board, the third conductive circuit layer comprising a first conductive pattern and a first board edge conductive The fourth conductive circuit layer includes a second conductive pattern and a second board edge conductive region, the circuit board further has a first sidewall, the first sidewall being inclined relative to the circuit board, the first sidewall Forming the third board edge conductive region, the third board edge conductive region, the first board edge conductive region and the second board edge conductive region are connected, wherein the first sidewall comprises an opposite first bottom a side defining a side shared by the third board edge conductive region and the first board edge conductive region as a first side, the first side overlapping the first bottom edge, and defining the The length of the first side is L1, the length of the first bottom side is defined as L3, and the length of the second bottom side is defined as L4, then L3>L4>L1.
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