TWI481971B - 曝光方法及曝光裝置 - Google Patents

曝光方法及曝光裝置 Download PDF

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Publication number
TWI481971B
TWI481971B TW095120320A TW95120320A TWI481971B TW I481971 B TWI481971 B TW I481971B TW 095120320 A TW095120320 A TW 095120320A TW 95120320 A TW95120320 A TW 95120320A TW I481971 B TWI481971 B TW I481971B
Authority
TW
Taiwan
Prior art keywords
substrate
exposure
mask
unit
pattern
Prior art date
Application number
TW095120320A
Other languages
English (en)
Chinese (zh)
Other versions
TW200801861A (en
Inventor
Jin Iino
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW200801861A publication Critical patent/TW200801861A/zh
Application granted granted Critical
Publication of TWI481971B publication Critical patent/TWI481971B/zh

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  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Filters (AREA)
TW095120320A 2005-04-08 2006-06-08 曝光方法及曝光裝置 TWI481971B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005111928A JP4304165B2 (ja) 2005-04-08 2005-04-08 露光方法および露光装置

Publications (2)

Publication Number Publication Date
TW200801861A TW200801861A (en) 2008-01-01
TWI481971B true TWI481971B (zh) 2015-04-21

Family

ID=37413583

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095120320A TWI481971B (zh) 2005-04-08 2006-06-08 曝光方法及曝光裝置

Country Status (2)

Country Link
JP (1) JP4304165B2 (ja)
TW (1) TWI481971B (ja)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4738887B2 (ja) * 2005-05-19 2011-08-03 株式会社ブイ・テクノロジー 露光装置
JP2008281919A (ja) * 2007-05-14 2008-11-20 Dainippon Printing Co Ltd カラーフィルタ形成基板の作製方法およびカラーフィルタ形成基板
JP5685756B2 (ja) 2010-11-10 2015-03-18 株式会社ブイ・テクノロジー フィルム露光方法
JP5630864B2 (ja) * 2010-12-06 2014-11-26 凸版印刷株式会社 露光装置
JP2012159713A (ja) * 2011-02-01 2012-08-23 Arisawa Mfg Co Ltd フィルム状製品の製造方法、フィルム状製品の製造装置、及び、マスク
JPWO2013035696A1 (ja) * 2011-09-05 2015-03-23 株式会社ニコン 基板搬送装置及び基板処理装置
CN104145299B (zh) * 2012-03-12 2017-09-22 住友化学株式会社 光学显示零件的校准装置及光学显示零件的校准方法
EP3061120A4 (en) * 2013-10-22 2017-06-28 Applied Materials, Inc. Roll to roll mask-less lithography with active alignment
CN107077080B (zh) * 2015-01-15 2019-04-26 株式会社村田制作所 曝光装置
JP7052573B2 (ja) * 2018-06-06 2022-04-12 東京エレクトロン株式会社 塗布膜形成装置及び塗布膜形成装置の調整方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060132735A1 (en) * 2004-12-22 2006-06-22 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060132735A1 (en) * 2004-12-22 2006-06-22 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby

Also Published As

Publication number Publication date
JP4304165B2 (ja) 2009-07-29
JP2006292919A (ja) 2006-10-26
TW200801861A (en) 2008-01-01

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