TWI470721B - A substrate holder, a substrate handling device, and a substrate processing system - Google Patents

A substrate holder, a substrate handling device, and a substrate processing system Download PDF

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Publication number
TWI470721B
TWI470721B TW97147411A TW97147411A TWI470721B TW I470721 B TWI470721 B TW I470721B TW 97147411 A TW97147411 A TW 97147411A TW 97147411 A TW97147411 A TW 97147411A TW I470721 B TWI470721 B TW I470721B
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Taiwan
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substrate
support
substrate holder
main body
protective member
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TW97147411A
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Chinese (zh)
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TW200941627A (en
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Hideki Komada
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Tokyo Electron Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742Mechanical parts of transfer devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J11/00Manipulators not otherwise provided for
    • B25J11/0095Manipulators transporting wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J19/00Accessories fitted to manipulators, e.g. for monitoring, for viewing; Safety devices combined with or specially adapted for use in connection with manipulators
    • B25J19/0075Means for protecting the manipulator from its environment or vice versa
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00Material or article handling
    • Y10S414/135Associated with semiconductor wafer handling
    • Y10S414/141Associated with semiconductor wafer handling includes means for gripping wafer

Description

基板保持具、基板搬運裝置以及基板處理系統Substrate holder, substrate transfer device, and substrate processing system

本發明係關於在搬運例如平面顯示器(FPD)用之基板時用以保持此之基板保持具及具備有該基板保持具之基板搬運裝置以及基板處理系統。The present invention relates to a substrate holder for holding such a substrate for a flat panel display (FPD), a substrate transfer device including the substrate holder, and a substrate processing system.

在液晶顯示器(LCD)所代表之FPD之製造過程中,在真空下對玻璃基板等之基板被施予蝕刻、成膜等之各種處理。於FPD之製造時使用具備多數基板處理室之所謂的多腔室類型之基板處理系統。如此之基板處理系統具有配設搬運基板之基板搬運裝置的搬運室,和被設置在該搬運室周圍之多數製程腔室。然後,藉由搬運室內之基板搬運裝置,基板被搬入至各製程腔室內,或是已處理完之基板自各製程腔室被搬出。基板之搬運通常使用被稱為叉架(Fork)之基板保持具。叉架具有在被安裝於可進出、退避之搬運手臂部上的共同基部上梳齒狀形成多數支持撿取器之構造。In the manufacturing process of the FPD represented by a liquid crystal display (LCD), various processes such as etching, film formation, and the like are applied to a substrate such as a glass substrate under vacuum. A so-called multi-chamber type substrate processing system having a plurality of substrate processing chambers is used in the manufacture of FPDs. Such a substrate processing system includes a transfer chamber in which a substrate transfer device for transporting a substrate is disposed, and a plurality of process chambers provided around the transfer chamber. Then, the substrate is carried into the respective process chambers by the substrate transfer device in the transfer chamber, or the processed substrates are carried out from the respective process chambers. The substrate holder is usually a substrate holder called a fork. The fork has a structure in which a plurality of support grippers are formed in a comb shape on a common base attached to the transportable arm portion that can be accessed and retracted.

近來,對FPD用之基板強烈要求大型化,也有以一邊超過2m之巨大基板當作處理對象之情形。然後,對應於基板之大型化,上述叉架也大型化。當叉架大型化時,即使在無載置基板之狀態下,由於其自重,使得從支持撿取器之基端部到前端部弓狀地產生彎曲。再者,在將大型基板載置於叉架之狀態下,又施加了基板的荷重。為了防止如此之彎曲,也執行以高剛性之陶瓷形成叉架。但是,因於製造陶瓷零件必須執行燒成工程,故為了藉由陶瓷製造大型叉架,必須要有大型燒成爐。為了解決該問題,在專利文獻1中,提案有具備肘桿(wrist)部,和與肘桿部結合之多數終端效應器,該終端效應器係藉由與肘桿部結合之基部,和與基部結合之前端部而形成之終端效應器組件。即是,在專利文獻1中,將叉架之支持撿取器以其一半左右之長度分割成基部和前端部,藉由設成接上兩者之構造,使得容易製造當作前端部使用之陶瓷零件。Recently, there has been a strong demand for a large-sized substrate for FPD, and a large substrate having a side of more than 2 m is used as a processing target. Then, the fork is also increased in size in accordance with the enlargement of the substrate. When the fork frame is enlarged, even in the state where the substrate is not placed, due to its own weight, the base end portion to the front end portion of the support gripper is bowed and bent. Further, in the state where the large substrate is placed on the fork, the load of the substrate is applied. In order to prevent such bending, a fork formed of a highly rigid ceramic is also performed. However, since it is necessary to perform a firing process for manufacturing ceramic parts, in order to manufacture a large fork by ceramics, it is necessary to have a large-scale baking furnace. In order to solve this problem, Patent Document 1 proposes a wrist portion having a wrist portion and a plurality of end effectors combined with the toggle portion, the end effector being coupled to the base portion of the toggle portion, and The end effector assembly formed by the base in combination with the front end. In other words, in Patent Document 1, the support holder of the yoke is divided into a base portion and a front end portion by a length of about half of the length, and the structure is provided so that the front end portion can be easily manufactured. Ceramic parts.

然而,叉架中之支持撿取器之材質係使用CFRP(Carbon Fiber Reinforced Plastics:碳纖維強化塑膠)。輕量且高剛性之CFRP具有當作支持撿取器之材質為佳之特性。但是,就以CFRP之缺點而言,由於強固碳纖維之複合材料,故有於破損之時有難以修理、修復之問題。再者,CFRP因碳纖維構成層構造,故也有當損傷時則碳纖維自其部分剝落,層構造之纖維捲起,容易成為顆粒產生源之問題。並且,例如使用CFRP製之支持撿取器而在搬運途中玻璃基板破損之時,也有當支持撿取器具有損傷時,微小之玻璃片自此進入至碳纖維間而變得難以除去,成為新顆粒產生源之問題。However, the material of the support picker in the fork is CFRP (Carbon Fiber Reinforced Plastics). The lightweight and highly rigid CFRP has the advantage of being a material that supports the picker. However, in terms of the disadvantages of CFRP, due to the composite material of the strong carbon fiber, there is a problem that it is difficult to repair and repair at the time of damage. Further, since the CFRP has a carbon fiber constituting layer structure, the carbon fiber is peeled off from the portion when the glass fiber is damaged, and the fiber of the layer structure is rolled up, which tends to be a source of particle generation. Further, for example, when the glass substrate is damaged during the conveyance by using the CFRP-supported pick-up device, when the support picker is damaged, the minute glass piece enters between the carbon fibers and becomes difficult to remove, and becomes a new particle. The problem of generating the source.

由上述所舉出之問題,以高價位之CFRP材料所形成之支持撿取器即使其一部分破損時,則必須更換支持撿取器之全體。According to the above-mentioned problem, even if a part of the support picker formed of the CFRP material of a high price is damaged, it is necessary to replace the entire support picker.

[專利文獻1]日本特開2006-41496號公報[Patent Document 1] Japanese Laid-Open Patent Publication No. 2006-41496

隨著叉架之大型化,在基板處理系統內移動叉架之時的控制,比起使用以往之小型叉架之時,變的更加困難。因此,支持撿取器之前端接觸於構成基板處理系統之腔室壁等之系統構成構件而受到損傷之確率較以往增加。於使用CFRP作為支持撿取器之材質之時,也避免不了以某程度之頻率與系統構成構件接觸。As the fork is enlarged, the control of moving the fork in the substrate processing system becomes more difficult than when using a conventional small fork. Therefore, the accuracy of damage to the system constituent members that support the front end of the picker in contact with the chamber wall or the like constituting the substrate processing system is increased as compared with the prior art. When using CFRP as a material to support the picker, it is also impossible to avoid contact with the system components at a certain frequency.

本發明係鑑於上述情形而所研究出者,其目的為即使於具有用以支持基板之支持構件的基板保持具與系統構成構件接觸之時,亦可以極力迴避支持構件之損傷。The present invention has been made in view of the above circumstances, and an object thereof is to prevent damage to a supporting member as much as possible even when a substrate holder having a supporting member for supporting a substrate is in contact with a system constituent member.

本發明所涉及之基板保持具,具備有基部,和互相隔著間隔連結於上述基部之多數支持構件,在該些多數支持構件上保持基板。然後,在本發明之基板保持具中,上述支持構件具備有本體和保護該本體之前端的可裝卸之保護構件。A substrate holder according to the present invention includes a base portion and a plurality of support members that are coupled to the base portion with a space therebetween, and the substrate is held by the plurality of support members. Then, in the substrate holder of the present invention, the support member is provided with a body and a detachable protection member that protects the front end of the body.

在本發明之基板保持具中,上述本體即使構成中空之筒形狀亦可。此時,本發明之基板保持具即使藉由上述保護構件塞住上述本體之前端亦可。再者,上述保護構件即使具有插入至上述本體之內部的凸部亦可。In the substrate holder of the present invention, the main body may have a hollow cylindrical shape. In this case, the substrate holder of the present invention may be inserted into the front end of the body by the protective member. Furthermore, the protective member may have a convex portion that is inserted into the inside of the main body.

再者,在本發明之基板保持具中,上述保護構件即使具有覆蓋上述本體之前端附近之周圍的被覆部亦可。再者,在本發明之基板保持具中,上述本體即使由CFRP構成亦可。Further, in the substrate holder of the present invention, the protective member may have a covering portion that covers the periphery of the front end of the main body. Further, in the substrate holder of the present invention, the main body may be composed of CFRP.

再者,在本發明之基板保持具中,上述保護構件即使由金屬或楊氏係數為1MPa以上10GPa以下之高分子材料所構成亦可。此時,上述金屬即使為不鏽鋼或鋁亦可,上述高分子材料即使為氟橡膠、聚四氟乙烯樹脂或是尼龍樹脂亦可。Further, in the substrate holder of the present invention, the protective member may be composed of a metal or a polymer material having a Young's modulus of 1 MPa or more and 10 GPa or less. In this case, the metal may be stainless steel or aluminum, and the polymer material may be a fluororubber, a polytetrafluoroethylene resin or a nylon resin.

再者,本發明之基板保持具即使在上述本體之上面具有從下方抵接於基板之可裝卸的第1突起部亦可。此時,即使在上述保護構件之上部,具有從下方抵接於基板之第2突起部亦可。並且,即使以上述本體之上面為基準,相對於上述第1突起部之頂點的高度,上述第2突起部之頂點的高度被形成較高亦可。再者,上述本體即使具有能夠可變調節上述第1突起部之配設位置及/或配設數量的多數安裝部亦可。Further, the substrate holder of the present invention may have a detachable first projection that abuts against the substrate from below even on the upper surface of the main body. At this time, even in the upper portion of the protective member, the second protruding portion that abuts against the substrate from below may be provided. Further, even if the height of the apex of the first projection is based on the upper surface of the main body, the height of the apex of the second projection may be increased. Further, the main body may have a plurality of mounting portions that can variably adjust the arrangement position and/or the number of the first projections.

本發明所涉及之基板搬運裝置具備有可進出及退避之搬運手臂部,和被安裝於該搬運手臂部之基板保持具,藉由上述基板保持具保持基板而予以搬運。在該基板搬運裝置中,上述基板保持具具備基部,和互相隔著間隔而被連結於上述基部之多數支持構件,然後,在本發明之基板搬運裝置中,上述支持構件係具備有本體,和保護該本體之前端的可裝卸之保護構件,或是上述支持構件具有本體,和保護該本體前端之可裝卸的保護構件,和被設置在上述本體之上面,從下方抵接於基板之可裝卸的突起部。The substrate transfer device according to the present invention includes a transport arm portion that can be moved in and out, and a substrate holder that is attached to the transport arm portion, and is transported by the substrate holder holding substrate. In the substrate transfer device, the substrate holder includes a base portion and a plurality of support members that are coupled to the base portion with a space therebetween. In the substrate transfer device of the present invention, the support member is provided with a main body, and a detachable protective member that protects the front end of the body, or the support member has a body, and a detachable protective member that protects the front end of the body, and a detachable protective member that is disposed on the upper surface of the body and abuts against the substrate from below Protrusion.

本發明所涉及之基板處理系統具備處理基板之基板處理裝置,和將基板搬運至該基板處理裝置之基板搬運裝置。在該基板處理系統中,上述基板搬運裝置具備有可進出及退避之搬運手臂部,和被安裝於該搬運手臂部保持基板之基板保持具。並且,在該基板處理系統中,上述基板保持具具備基部,和互相隔著間隔而被連結於上述基部之多數支持構件。然後,在本發明之基板處理系統中,上述支持構件具備有本體和保護該本體之前端的可裝卸之保護構件。A substrate processing system according to the present invention includes a substrate processing apparatus that processes a substrate, and a substrate transfer apparatus that transports the substrate to the substrate processing apparatus. In the substrate processing system, the substrate transfer device includes a transport arm portion that can be moved in and out, and a substrate holder that is attached to the transport arm portion holding substrate. Further, in the substrate processing system, the substrate holder includes a base portion and a plurality of support members that are coupled to the base portion with a space therebetween. Then, in the substrate processing system of the present invention, the support member is provided with a body and a detachable protection member that protects the front end of the body.

若藉由本發明之基板保持具,藉由在支持構件之前端設置保護構件,即使支持構件接觸於腔室壁等之時,亦可以保護支持構件,防止支持構件之損傷。因此,達成可以使支持構件之壽命長期化並且可以防止因支持構件之損傷引起產生顆粒的效果。According to the substrate holder of the present invention, by providing the protective member at the front end of the support member, the support member can be protected from damage of the support member even when the support member contacts the chamber wall or the like. Therefore, it is achieved that the life of the support member can be prolonged and the effect of generating particles due to damage of the support member can be prevented.

[第1實施型態][First embodiment]

以下,針對本發明之實施型態,參照圖面予以詳細說明。在此,針對具備有本發明之第1實施型態之基板保持具的基板搬運裝置以及具備有該基板搬運裝置之基板處理系統舉例進行說明。第1圖為概略性表示當作基板處理系統之真空處理系統100之斜視圖,第2圖為概略性表示各腔室之內部之俯視圖。該真空處理系統100係構成具有多數製程腔室1a、1b、1c之多腔室構造。真空處理系統100係構成用以對例如FPD用之玻璃基板(以下,單稱為「基板」)S執行電漿處理之處理系統。並且,就以FPD而言例示有液晶顯示器(LCD)、電激發光(Electro Luminescence:EL)顯示器、電漿顯示面板(PDP)等。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. Here, an example of a substrate transfer device including the substrate holder of the first embodiment of the present invention and a substrate processing system including the substrate transfer device will be described. Fig. 1 is a perspective view schematically showing a vacuum processing system 100 as a substrate processing system, and Fig. 2 is a plan view schematically showing the inside of each chamber. The vacuum processing system 100 constitutes a multi-chamber configuration having a plurality of process chambers 1a, 1b, 1c. The vacuum processing system 100 constitutes a processing system for performing plasma processing on, for example, a glass substrate (hereinafter simply referred to as "substrate") S for FPD. Further, examples of the FPD include a liquid crystal display (LCD), an electroluminescence (EL) display, a plasma display panel (PDP), and the like.

真空處理系統100係多數大型腔室俯視觀看時連結成十字形狀。在中央部配置搬運室3,鄰接於其三方之側面配設有對基板S執行電漿處理之3個製程腔室1a、1b、1c。再者,鄰接於搬運室3之殘留之一方之側面,配設有裝載鎖定室5。該些3個製程腔室1a、1b、1c、搬運室3及裝載鎖定室5中之任一者皆構成真空腔室。搬運室3和各製程腔室1a、1b、1c之間設置有無圖式之開口部,在該開口部各配設有具有開關功能之閘閥7a。再者,在搬運室3和裝載鎖定室5之間配設有閘閥7b。閘閥7a、7b係在關閉狀態下氣密密封各腔室之間,並且在打開狀態下使腔室間連通而可移送基板S。再者,在裝載鎖定室5和外部大氣環境之間也配備有閘閥7c,使在關閉狀態下能夠維持裝載鎖定室5之氣密性,並且在打開狀態下能夠在裝載鎖定室5和外部之間移送基板S。The vacuum processing system 100 is connected to a cross shape when most of the large chambers are viewed from above. The transfer chamber 3 is disposed at the center portion, and three process chambers 1a, 1b, and 1c for performing plasma treatment on the substrate S are disposed adjacent to the three side faces. Further, a load lock chamber 5 is disposed adjacent to one side of the remaining portion of the transfer chamber 3. Any of the three process chambers 1a, 1b, 1c, the transfer chamber 3, and the load lock chamber 5 constitutes a vacuum chamber. An opening portion having no pattern is provided between the transfer chamber 3 and each of the processing chambers 1a, 1b, and 1c, and a gate valve 7a having a switching function is disposed in each of the openings. Further, a gate valve 7b is disposed between the transfer chamber 3 and the load lock chamber 5. The gate valves 7a, 7b hermetically seal between the chambers in a closed state, and communicate between the chambers in an open state to transfer the substrate S. Further, a gate valve 7c is also provided between the load lock chamber 5 and the external atmospheric environment so that the airtightness of the load lock chamber 5 can be maintained in the closed state, and the load lock chamber 5 and the outside can be held in the open state. The substrate S is transferred between.

在裝載鎖定室5之外側,設置有兩個匣盒指示器9a、9b。在各匣盒指示器9a、9b上載置有各收容基板S之匣盒11a、11b。在各匣盒11a、11b內於上下隔著間隔多段配置有基板S。再者,各匣盒11a、11b藉由升降機構部13a、13b構成各升降自如。在本實施型態中,構成在例如卡匣11a可以收容未處理基板,在另一方之匣盒11b可以收容處理完之基板。On the outer side of the load lock chamber 5, two cassette indicators 9a, 9b are provided. The cassettes 11a and 11b of the respective storage substrates S are placed on the respective cassette indicators 9a and 9b. The substrate S is placed in a plurality of stages in the respective cassettes 11a and 11b with a plurality of intervals therebetween. Further, each of the cassettes 11a and 11b is configured to be movable up and down by the elevating mechanism portions 13a and 13b. In the present embodiment, for example, the cassette 11a can accommodate an unprocessed substrate, and the other cassette 11b can accommodate the processed substrate.

在該些兩個匣盒11a、11b之間設置有用以搬運基板S之搬運裝置15。該搬運裝置15具備有被設置在上下兩段當作基板保持具之叉架17a及叉架17b,和可進出、退避及旋轉支持該些叉架17a、叉架17b之驅動部19,和支持該驅動部19之支持台21。A conveying device 15 for transporting the substrate S is provided between the two cassettes 11a and 11b. The conveying device 15 includes a fork frame 17a and a fork frame 17b which are provided as a substrate holder in the upper and lower stages, and a drive unit 19 that can support, retreat, and rotate the support of the forks 17a and the forks 17b, and supports The support table 21 of the drive unit 19.

製程腔室1a、1b、1c係被構成可以在其內部空間維持特定減壓環境(真空狀態)。在各製程腔室1a、1b、1c內如第2圖所示般,配備有當作載置基板S之載置台的承載器2。然後,各製程腔室1a、1b、1c係在將基板S載置在承載器2之狀態下,對基板S,執行例如真空條件下之蝕刻處理、灰化處理、成膜處理等之電漿處理。The process chambers 1a, 1b, 1c are configured to maintain a specific reduced pressure environment (vacuum state) in their internal spaces. As shown in FIG. 2, in each of the process chambers 1a, 1b, and 1c, a carrier 2 serving as a mounting table on which the substrate S is placed is provided. Then, in each of the processing chambers 1a, 1b, and 1c, in the state in which the substrate S is placed on the carrier 2, plasma is performed on the substrate S, for example, etching treatment under vacuum conditions, ashing treatment, film formation treatment, and the like. deal with.

在本實施型態中,即使以3個製程腔室1a、1b、1c執行同種處理亦可,即使對每製程腔室執行不同種類之處理亦可。並且,製程腔室之數量並不限定於3個,即使為4個以上亦可。In the present embodiment, even if the same processing is performed in the three processing chambers 1a, 1b, 1c, it is possible to perform different kinds of processing for each processing chamber. Further, the number of the process chambers is not limited to three, and may be four or more.

搬運室3係構成與真空處理室之製程腔室1a~1c相同,可以保持於特定減壓環境。在搬運室3中,如第2圖所示般配設有搬運裝置23。然後,藉由搬運裝置23,在3個製程腔室1a、1b、1c及裝載鎖定室5之間執行基板S之搬運。The transfer chamber 3 has the same configuration as the process chambers 1a to 1c of the vacuum processing chamber, and can be held in a specific decompression environment. In the transfer chamber 3, a transfer device 23 is disposed as shown in Fig. 2 . Then, the conveyance device 23 performs conveyance of the substrate S between the three process chambers 1a, 1b, 1c and the load lock chamber 5.

搬運裝置23具備設置成上下兩段之搬運機構,構成各個獨立而可以執行基板S之搬出搬入。第3圖係表示具有當作基板保持具之叉架101的上段搬運機構23a之概略構成。搬運機構23a主要之構成具備有台座部113,和被設置成對台座部113可滑動之滑動手臂115,和被設置成可在該滑動手臂115上滑動,當作支持基板S之支持構件的叉架101。叉架101具備有當作基部之撿取器基座117,和被連結於該撿取器基座117之多數(例如4根)的支持撿取器119。在支持撿取器119之前端設置有當作保護構件之蓋部133。接著,針對該叉架101之詳細構成於後說明。The transport device 23 includes a transport mechanism that is provided in two stages, and is configured to be independent of each other, and can carry out the loading and unloading of the substrate S. Fig. 3 is a view showing a schematic configuration of an upper conveyance mechanism 23a having a fork 101 as a substrate holder. The transport mechanism 23a is mainly configured to include a pedestal portion 113, a sliding arm 115 that is provided to be slidable to the pedestal portion 113, and a fork that is provided to be slidable on the sliding arm 115 as a supporting member for supporting the substrate S. Rack 101. The fork frame 101 is provided with a picker base 117 as a base, and a plurality of (for example, four) support pickers 119 coupled to the picker base 117. A cover portion 133 as a protective member is provided at the front end of the support gripper 119. Next, the detailed configuration of the fork 101 will be described later.

在滑動手臂115之側部設置有用以使滑動手臂115對台座部113滑動之導件121。然後,在基部113設置有可滑動地支持導件121之滑動支持部123。A guide 121 for sliding the sliding arm 115 against the pedestal portion 113 is provided at a side portion of the sliding arm 115. Then, the base portion 113 is provided with a slide support portion 123 that slidably supports the guide member 121.

再者,在滑動手臂115之側部,與上述導件121平行設置有用以使叉架101對滑動手臂115滑動之導件125。然後,設置有沿著導件125滑動之滑動件127,在該滑動件127安裝有叉架101。Further, on the side of the sliding arm 115, a guide 125 for sliding the fork 101 against the sliding arm 115 is provided in parallel with the above-described guide 121. Then, a slider 127 that slides along the guide 125 is provided, and the fork 101 is attached to the slider 127.

在第3圖中,雖然針對上段之搬運機構23a予以說明,但是下段之搬運機構(省略圖示)也具有與上段之搬運機構23a相同之構成。然後,上下之搬運機構藉由無圖示之連結機構連結,成為一體構成可以在水平方向旋轉。再者,構成上下兩段之搬運機構連結於執行滑動手臂115及叉架101之滑動動作,或台座部113之旋轉動作及升降動作之無圖示之驅動單元。In the third embodiment, the transport mechanism 23a of the upper stage is described. However, the transport mechanism (not shown) of the lower stage has the same configuration as the transport mechanism 23a of the upper stage. Then, the upper and lower conveyance mechanisms are coupled by a connection mechanism (not shown), and the integrated structure can be rotated in the horizontal direction. Further, the transport mechanism that constitutes the upper and lower stages is connected to a drive unit that performs a slide operation of the slide arm 115 and the fork frame 101, or a rotation operation and a lift operation of the base portion 113.

裝載鎖定室5係被構成與各製程腔室1a~1c及搬運室3相同可以保持於特定減壓環境。裝載室5為用以在位於大氣環境之匣盒11a、11b和減壓環境之搬運室3之間執行基板S之交接。裝載鎖定室5在反覆大氣環境和減壓環境之關係上,係構成極力縮小其內容積。在裝載鎖定室5上下兩段設置有基板收容部27(在第2圖中僅圖示上段),在各基板收容部27隔著間隔設置有支持基板S之多數緩衝器28。在該些緩衝器28之間隔成為梳齒狀之支持撿取器(例如叉架101之支持叉架119)之退避溝。再者,在裝載鎖定室5內,設置有抵接於矩形狀基板S之互相對向的角部附近而執行定位之定位器29。The load lock chamber 5 is configured to be held in a specific pressure reducing environment in the same manner as each of the process chambers 1a to 1c and the transfer chamber 3. The loading chamber 5 is for performing the transfer of the substrate S between the cassettes 11a and 11b located in the atmospheric environment and the transfer chamber 3 of the decompression environment. The load lock chamber 5 is configured to minimize the internal volume in the relationship between the atmospheric environment and the decompression environment. The substrate accommodating portion 27 (only the upper portion is shown in Fig. 2) is provided in the upper and lower stages of the load lock chamber 5, and a plurality of buffers 28 for supporting the substrate S are provided at intervals in the respective substrate accommodating portions 27. The gaps between the buffers 28 are the escape grooves of the comb-shaped support gripper (for example, the support fork 119 of the fork frame 101). Further, in the load lock chamber 5, a positioner 29 that abuts on the vicinity of the opposite corner portions of the rectangular substrate S and performs positioning is provided.

如第2圖所示般,真空處理系統100之各構成部成為被連接於控制部30而被控制之構成(在第1圖中省略圖式)。控制部30具備有:具有CPU之控制器31、使用者介面32和記憶部33。控制器31係在真空處理系統100中,統籌例如製程腔室1a~1c、搬運裝置15、搬運裝置23等之各構成部而加以控制。使用者介面32係由工程管理者為了管理真空處理系統100執行指令輸入操作等之鍵盤,或使真空處理系統100之運轉狀況可觀視而所顯示之顯示器等所構成。記憶部33係保存有處理程式,該處理程式記錄有用以在控制器31之控制下實現在真空處理系統100所實行之各種處理之控制程式(軟體),或處理條件資料等。使用者介面32及記憶部33係被連接於控制器31。As shown in FIG. 2, each component of the vacuum processing system 100 is configured to be connected to the control unit 30 (the drawing is omitted in FIG. 1). The control unit 30 includes a controller 31 having a CPU, a user interface 32, and a storage unit 33. The controller 31 is controlled in the vacuum processing system 100 by coordinating, for example, the respective components of the process chambers 1a to 1c, the conveyance device 15, and the conveyance device 23. The user interface 32 is composed of a keyboard that the engineering manager performs a command input operation or the like for managing the vacuum processing system 100, or a display that displays the operation state of the vacuum processing system 100 in a viewable manner. The memory unit 33 stores a processing program for recording a control program (software) for realizing various processes executed by the vacuum processing system 100 under the control of the controller 31, or processing condition data and the like. The user interface 32 and the memory unit 33 are connected to the controller 31.

然後,依其所需,以來自使用者介面32之指示等自記憶部33叫出任意處理程式,使製程控制器31實行,依此,在製程控制器31之控制下,執行在真空處理系統100中的所欲處理。Then, if necessary, the arbitrary processing program is called from the memory unit 33 by an instruction from the user interface 32, and the process controller 31 is executed. Accordingly, the vacuum processing system is executed under the control of the process controller 31. 100 in the desired treatment.

上述控制程式或處理條件資料等之處理程式係可以利用儲存於電腦可讀取之記憶媒體,例如CD-ROM、硬碟、軟碟、快閃記憶體等之狀態者。或是,亦可自其他裝置經例如專用迴線隨時傳送而在線上利用。The processing programs such as the control program or the processing condition data can be stored in a computer-readable memory medium such as a CD-ROM, a hard disk, a floppy disk, a flash memory, or the like. Alternatively, it may be used on-line from other devices via, for example, a dedicated return line.

接著,針對構成上述般之真空處理系統100動作予以說明。Next, the operation of the vacuum processing system 100 constituting the above will be described.

首先,使搬運裝置15之兩片叉架17a、17b進退驅動,自收容未處理基板之匣盒11a接取基板S,各載置於裝載鎖定室5之上下兩段基板收容部27之緩衝器28。First, the two forks 17a and 17b of the conveying device 15 are driven forward and backward, and the substrate S is taken up from the cassette 11a for accommodating the unprocessed substrate, and the buffers are placed on the lower two stages of the substrate housing portion 27 on the load lock chamber 5. 28.

於使叉架17a、17b退避之後,關閉裝載鎖定室5之大氣側之閘閥7C。之後,使裝載鎖定室5內排氣,將內部減壓至特定真空度。接著,打開搬運室3和裝載鎖定室5之間的閘閥7b,藉由搬運裝置23之叉架101,接取被收容於裝載鎖定室5之基板收容部27之基板S。After the forks 17a, 17b are retracted, the gate valve 7C on the atmospheric side of the load lock chamber 5 is closed. Thereafter, the inside of the load lock chamber 5 is exhausted, and the inside is decompressed to a specific degree of vacuum. Next, the gate valve 7b between the transfer chamber 3 and the load lock chamber 5 is opened, and the substrate S accommodated in the substrate housing portion 27 of the load lock chamber 5 is picked up by the fork 101 of the transport device 23.

接著,藉由搬運裝置23之叉架101,將基板S搬入至製程腔室1a、1b、1c中之任一者,交接至承載器2。然後,在製程腔室1a、1b、1c內對基板S實施蝕刻等之特定處理。接著,處理完之基板S從承載器2被交接至搬運裝置23之叉架101,自製程腔室1a、1b、1c被搬出。Next, the substrate S is carried into the process chambers 1a, 1b, 1c by the fork 101 of the transport device 23, and is delivered to the carrier 2. Then, the substrate S is subjected to a specific process such as etching in the process chambers 1a, 1b, and 1c. Next, the processed substrate S is transferred from the carrier 2 to the fork frame 101 of the conveying device 23, and the self-made process chambers 1a, 1b, 1c are carried out.

然後,基板S係以與上述相反之路徑,經由裝載鎖定室5,藉由搬運裝置15被收容在匣盒11b。並且,即使將處理完之基板S返回至原來之匣盒11a亦可。Then, the substrate S is housed in the cassette 11b by the transport device 15 via the load lock chamber 5 in a path opposite to the above. Further, even if the processed substrate S is returned to the original cassette 11a.

接著,一面參照第4圖以及第5圖,針對當作第1實施型態所涉及之基板保持具之叉架101予以說明。第4圖為表示叉架101之外觀的斜視圖。如上述般,叉架101具備有固定於滑動件127之撿取器基座117,和當作被連結於該撿取器基座117之支持構件的多數(例如4根)之支持撿取器119。Next, the fork frame 101 which is the substrate holder according to the first embodiment will be described with reference to FIGS. 4 and 5. Fig. 4 is a perspective view showing the appearance of the fork 101. As described above, the fork 101 is provided with a gripper base 117 fixed to the slider 127, and a plurality of (for example, four) support grippers as support members coupled to the gripper base 117. 119.

撿取器基座117確實固定多數支持撿取器119(在本實施型態中為4根),若為可以連結於滑動手臂115(滑動器127)者則不管其構成。再者,撿取器基座117和支持撿取器119之連結構造也為任意。例如,撿取器基座117即使為使用能夠夾持支持撿取器119之基端部之兩片板材的固定構造亦可,即使為使用能夠支持多數支持撿取器119之一片板材的固定構造亦可。在本實施型態中,撿取器基座117係藉由彎曲成例如剖面觀視呈ㄈ字型之板材所構成。然後,在彎曲之板材之間隙插入多數支持撿取器119之各個基端部,藉由無圖示之固定手段例如螺桿等固定。The gripper base 117 is surely fixed to a plurality of support grippers 119 (four in the present embodiment), and is configured irrespective of whether it can be coupled to the slide arm 115 (slider 127). Further, the connection structure of the gripper base 117 and the support gripper 119 is also arbitrary. For example, even if the picker base 117 is a fixed structure using two sheets capable of holding the base end portion of the support gripper 119, even if a fixing structure capable of supporting one of the plurality of support grippers 119 is used, Also. In the present embodiment, the picker base 117 is formed by bending a sheet of a U-shaped portion, for example, in a cross-sectional view. Then, the respective base end portions of the plurality of support grippers 119 are inserted into the gap of the bent plate, and fixed by a fixing means such as a screw or the like (not shown).

叉架101之支持撿取器119具有構成中空之角筒狀的本體131,和裝卸自如地被安裝於本體131之前端的當作保護構件之蓋部133。作為支持撿取器119之本體131的材質,使用輕量,並且具有高剛性之材料,使得在載置大型基板S之狀態下盡量不會產生因荷重所造成之彎曲,例如CFRP。The support gripper 119 of the fork frame 101 has a body 131 constituting a hollow rectangular tube shape, and a cover portion 133 as a protective member that is detachably attached to the front end of the body 131. As a material for supporting the body 131 of the picker 119, a material which is lightweight and has high rigidity is used so that bending due to a load, such as CFRP, is not generated as much as possible in a state where the large substrate S is placed.

在叉架101之各支持撿取器119之上面,多處(在第4圖中,在一個支持撿取器119中有兩處)可裝卸地設置有當作支持基板S之第1突起部的支持突起200。支持突起200係藉由例如橡膠或PEEK(聚醚酮:Polyetheretherketone)樹脂、PTFE(聚四氟乙烯:Polytetrafluoroethylene)樹脂等之彈性材料所構成。不管支持突起200之形狀,即使例如半球狀或O型環般之環狀亦可。On the top of each of the support grippers 119 of the fork frame 101, a plurality of places (in the fourth figure, two in one of the support pickers 119) are detachably provided with a first projection as a support substrate S. Support protrusion 200. The support protrusion 200 is made of an elastic material such as rubber or PEEK (Polyetheretherketone) resin or PTFE (polytetrafluoroethylene) resin. Regardless of the shape of the support protrusion 200, even a ring shape such as a hemispherical shape or an O-ring may be used.

第5圖表示在本體131安裝蓋部133之狀態的支持撿取器119之前端部之剖面構造。蓋部133係被安裝成塞住支持撿取器119之本體131之前端。為了使支持撿取器119輕量化,使用CFRP般之輕量且高剛性之材料,將本體131形成筒狀,將內部設為空洞為佳。但是,在中空角筒狀之本體131之前端為開口之狀態下,除對抗衝擊的強度不充分之外,也擔心在內部附著異物等而成為顆粒產生源。在本實施型態中,將本體131設為中空狀以謀求支持撿取器119之輕量化,並且藉由蓋部133封閉其前端,依此確保對抗衝擊性,並且預防產生顆粒。Fig. 5 shows a cross-sectional structure of the end portion of the support gripper 119 in a state where the cover portion 133 is attached to the main body 131. The cover portion 133 is mounted to plug the front end of the body 131 supporting the picker 119. In order to reduce the weight of the support gripper 119, the body 131 is formed into a cylindrical shape by using a lightweight and highly rigid material such as CFRP, and it is preferable to make the inside a cavity. However, in the state in which the front end of the hollow-necked body 131 is open, the strength against impact is insufficient, and foreign matter or the like is attached to the inside to become a particle generation source. In the present embodiment, the main body 131 is hollow so as to support the weight reduction of the picker 119, and the front end thereof is closed by the lid portion 133, thereby ensuring impact resistance and preventing generation of particles.

在本實施型態中,蓋部133藉由螺桿137可裝卸地被固定在插入於中空狀之本體131之前端的安裝塊135。安裝塊135係藉由例如接合劑等被固定在本體131之內面。蓋部133由保護支持撿取器119之前端尤其角部之目的來看,以具有本體131之斷面積以上之大小為佳。再者,蓋部133為僅設置在支持撿取器119之前端附近者。相對於本體131之長度,蓋部133之長度設為例如1/10~1/500左右為佳。當過度增大支持撿取器119之全長中的蓋部133長度分配時,因前端重量增加在支持撿取器119產生彎曲,故蓋部133對本體131之長度比設為上述範圍內為佳。In the present embodiment, the lid portion 133 is detachably fixed to the mounting block 135 inserted at the front end of the hollow body 131 by the screw 137. The mounting block 135 is fixed to the inner surface of the body 131 by, for example, a bonding agent or the like. The cover portion 133 is preferably of a size larger than a sectional area of the main body 131 for the purpose of protecting the front end of the gripper 119, particularly the corner portion. Further, the cover portion 133 is provided only in the vicinity of the front end of the support gripper 119. The length of the lid portion 133 is preferably, for example, about 1/10 to 1/500 with respect to the length of the main body 131. When the length of the cover portion 133 in the entire length of the support gripper 119 is excessively increased, the bending of the support gripper 119 is caused by the increase in the front end weight, so that the length ratio of the cover portion 133 to the main body 131 is preferably within the above range. .

藉由安裝蓋部133,即使支持撿取器119接觸於基板處理系統100中之屬於系統構成構件的腔室壁等之時,亦可以保護藉由高價位之CFRP材料所構成之支持撿取器119之本體131。此時,即使蓋部133破損時,因僅更換蓋部133即可,故可以使支持撿取器119之本體131的壽命長期化。再者,因可以藉由蓋部133防止支持撿取器119之本體131損傷,故可以防止CFRP材料之碳纖維自本體131之損傷部位剝離,或捲起而成為顆粒源。並且,亦可以防止玻璃片等混入至本體131之損傷部位而成為顆粒源。By mounting the cover portion 133, the support picker constructed by the high-priced CFRP material can be protected even when the support picker 119 is in contact with the chamber wall or the like belonging to the system constituent member in the substrate processing system 100. The body 131 of 119. At this time, even if the lid portion 133 is broken, it is only necessary to replace the lid portion 133, so that the life of the body 131 supporting the gripper 119 can be prolonged. Further, since the cover 131 can prevent the main body 131 of the support gripper 119 from being damaged, it is possible to prevent the carbon fibers of the CFRP material from being peeled off from the damaged portion of the body 131 or rolled up to become a particle source. Further, it is also possible to prevent the glass piece or the like from being mixed into the damaged portion of the body 131 to become a particle source.

如此一來,藉由安裝蓋部133,有效果預防支持撿取器119之本體131受到損傷或破損。並且,可以迴避支持撿取器119本體131之損傷的結果,亦可以降低顆粒產生。As a result, by attaching the cover portion 133, it is effective to prevent the body 131 supporting the picker 119 from being damaged or damaged. Moreover, the result of supporting the damage of the body 131 of the picker 119 can be avoided, and the generation of particles can also be reduced.

作為蓋部133之材質,除例如金屬之外,亦可以使用橡膠或合成樹脂等之高分子材料。作為蓋部133之材質所要求之特性,可舉出輕量、抗衝擊強、容易成形、與其它構件接觸時對另一側所造成之接物損傷的可能性低。由如此之觀點,針對成為蓋部133之候補的多種材料,執行有關「重量」、「衝擊強度」、「成形性」、「接物損傷可能性」之四個項目的評價。As the material of the lid portion 133, a polymer material such as rubber or synthetic resin can be used in addition to metal. The characteristics required for the material of the lid portion 133 are exemplified by being lightweight, strong against impact, easy to form, and low in damage to the other side due to contact with other members. From such a viewpoint, evaluation of four items of "weight", "impact strength", "formability", and "possibility of damage" is performed for various materials that are candidates for the lid portion 133.

作為蓋部133之材料候補,選定陶瓷(氧化鋁)、玻璃、CFRP(東邦Tenax公司製產品名Composite)、SUS、氟橡膠(Nichias公司製產品名Fluoro-Plus)、聚四氟乙烯(PTFE)、鋁以及MC尼龍樹脂之8種類。As a material candidate for the lid portion 133, ceramic (aluminum oxide), glass, CFRP (commercial product name manufactured by Toho Tenax Co., Ltd.), SUS, fluororubber (product name Fluoro-Plus manufactured by Nichias Co., Ltd.), and polytetrafluoroethylene (PTFE) are selected. 8 types of aluminum and MC nylon resins.

在該評價中,將不適合作為蓋部133之材質者設為「1」,將適合作為蓋部133之材質者設為「5」,將在兩者中間姑且可當作蓋部133之材質使用者設為「3」,以三階段進行評價。然後,以所有評價項目之合計點為基準,綜合判斷可否當作蓋部133之材質。將其結果表示於表1。In this evaluation, the material that is not suitable as the material of the lid portion 133 is "1", and the material that is suitable as the material of the lid portion 133 is "5", and the material of the lid portion 133 can be used as the material of the lid portion 133. The number is set to "3" and evaluated in three stages. Then, based on the total points of all the evaluation items, it is judged whether or not the material of the cover portion 133 can be used. The results are shown in Table 1.

在本實施型態中,將合計點12點以上之材料判斷成「適合」當作蓋部133之材質。另外,合計點低於12點之材料則判斷成「不適合」當作蓋部133之材質。依照以上之評價,作為蓋部133之材質,以使用例如鋁、SUS(不鏽鋼)等之金屬材料,氟橡膠、PTFE樹脂或尼龍樹脂等之高分子材料等為佳。另外,陶瓷具有高剛性,相反的接物損傷性高,並且脆弱缺乏衝擊強度,故作為蓋部133之材質較不佳。再者,玻璃或DFRP也有脆弱缺乏衝擊強度之點,作為蓋部133之材質較不佳。In the present embodiment, the material of 12 points or more in total is judged to be "suitable" as the material of the lid portion 133. In addition, the material whose total point is less than 12 points is judged to be "unsuitable" as the material of the lid portion 133. According to the above evaluation, as the material of the lid portion 133, a metal material such as aluminum or SUS (stainless steel), a polymer material such as fluororubber, PTFE resin or nylon resin is preferably used. Further, since the ceramic has high rigidity, the opposite joint has high damage, and is weak in impact strength, it is less preferable as the material of the lid portion 133. Furthermore, glass or DFRP also has a weak point of lack of impact strength, and the material of the cover portion 133 is relatively poor.

再者,在本實施型態中,由充分確保耐衝擊性或耐破壞韌性之觀點來看,作為蓋部133之材質,以使用楊氏係數為100GPa以下(例如1MPa以上100GPa以下)之材料為佳。作為楊氏系統為100GPa以下之材料,金屬中可舉出例如鋁。橡膠或合成樹脂等所代表之高分子材料一般為楊氏係數100GPa以下,但是尤其以使用持有楊氏係數10GPa以下(例如1MPa以上10GPa以下)之彈性的高分子材料為佳。作為楊氏係數1MPa以上10GPa以下之高分子材料之較佳例,可以舉出例如氟橡膠、PTFE樹脂、MC尼龍樹脂等。In the present embodiment, the material of the lid portion 133 is made of a material having a Young's modulus of 100 GPa or less (for example, 1 MPa or more and 100 GPa or less) from the viewpoint of sufficiently ensuring impact resistance or fracture toughness. good. The material of the Young's system is 100 GPa or less, and examples of the metal include aluminum. The polymer material represented by the rubber or the synthetic resin is generally a Young's modulus of 100 GPa or less. However, it is preferable to use an elastic polymer material having a Young's modulus of 10 GPa or less (for example, 1 MPa or more and 10 GPa or less). Preferred examples of the polymer material having a Young's modulus of 1 MPa or more and 10 GPa or less include fluororubber, PTFE resin, and MC nylon resin.

如上述般,若藉由本實施型態之叉架101,藉由在支持撿取器119之前端設置蓋部133,即使支持撿取器119接觸於基板處理系統100中之屬於系統構成構件的腔室壁等之時,亦可以保護支持撿取器119之本體131。因此,達成可以使支持撿取器119之使用壽命長期化並且可以防止因本體131之損傷引起產生顆粒等的效果。As described above, with the fork 101 of the present embodiment, by providing the cover portion 133 at the front end of the support picker 119, even if the support picker 119 is in contact with the cavity belonging to the system constituent member in the substrate processing system 100 The body 131 supporting the picker 119 can also be protected at the time of the wall or the like. Therefore, it is achieved that the service life of the support gripper 119 can be made long-term and the effect of generating particles or the like due to the damage of the body 131 can be prevented.

[第2實施型態][Second embodiment]

第6圖係表示本發明之第2實施型態所涉及之叉架101中的支持撿取器119之前端部的剖面構造。在本實施型態中,蓋部139具有主要吸收X方向之衝擊的主保護部139a,和自該主保護部139a突出設置之插入部139b,剖面構成凸形。並且,在以下之說明中,以與第1實施型態不同之點為中心予以說明,對於與第1實施型態相同之構成賦予相同符號省略說明。Fig. 6 is a cross-sectional view showing the front end portion of the fork ejector 101 according to the second embodiment of the present invention. In the present embodiment, the lid portion 139 has a main protection portion 139a that mainly absorbs an impact in the X direction, and an insertion portion 139b that protrudes from the main protection portion 139a, and has a cross section that is convex. In the following description, the differences from the first embodiment will be mainly described, and the same components as those in the first embodiment will be denoted by the same reference numerals and will not be described.

蓋部139係屬於被其一部分之插入部139b被插入於支持撿取器119之本體131之前端部分而安裝。蓋部139係保護支持撿取器119之前端,以減少與基板處理系統100中之屬於系統構成構件之腔室壁等接觸時所受到之衝擊。再者,在蓋部139中,藉由在密接於角筒狀之本體131之內面的狀態下嵌入插入部139b,可以持有自內側補強中空狀之本體131之功能。即是,藉由蓋部139,在支持撿取器119之前端附近,不僅來自正面(X方向)之衝擊,即使對來自支持撿取器119之側方或上下方向(例如Y方向或Z方向)之衝擊亦可以提高耐衝擊性。因此,在支持撿取器119之前端部分,可以極力防止本體131之破損。The lid portion 139 is attached to the front end portion of the body 131 of the support gripper 119 by the insertion portion 139b of a part thereof. The cover portion 139 protects the front end of the support gripper 119 to reduce the impact received when it comes into contact with the chamber wall or the like of the system constituent member in the substrate processing system 100. Further, in the lid portion 139, by fitting the insertion portion 139b in a state of being in close contact with the inner surface of the rectangular tubular body 131, it is possible to hold the function of reinforcing the hollow body 131 from the inside. That is, by the cover portion 139, in the vicinity of the front end of the support gripper 119, not only the impact from the front side (X direction), but also the side from the support gripper 119 or the up and down direction (for example, the Y direction or the Z direction) The impact can also improve the impact resistance. Therefore, the damage of the body 131 can be prevented as much as possible in the end portion of the support picker 119.

再者,蓋部139藉由在密接於角筒狀之本體131之內面嵌入插入部139b,依據摩擦阻力被固定於本體131。因此,插入部139b也當作防止蓋部139自支持撿取器119之本體131脫落之防脫作用部而發揮功能。該防脫功能可以依據被插入至本體131之插入部139b之插入長度L1而適當調整。Further, the lid portion 139 is fixed to the body 131 in accordance with the frictional resistance by being fitted into the insertion portion 139b on the inner surface of the body 131 which is in close contact with the corner cylinder. Therefore, the insertion portion 139b also functions as a detachment preventing portion that prevents the lid portion 139 from coming off the body 131 of the support gripper 119. This anti-off function can be appropriately adjusted in accordance with the insertion length L1 of the insertion portion 139b inserted into the body 131.

在本實施型態中,以例如橡膠或合成樹脂等之彈性材料構成蓋部139為佳。並且,雖然省略圖示,但是即使在蓋部139之插入部139b周圍,形成凹凸(皺摺)而提高防脫作用亦可。再者,即使以螺桿等將蓋部139固定於本體131亦可。In the present embodiment, it is preferable to form the lid portion 139 with an elastic material such as rubber or synthetic resin. Further, although not shown in the drawings, irregularities (wrinkles) may be formed around the insertion portion 139b of the lid portion 139 to improve the separation prevention effect. Further, the cover portion 139 may be fixed to the main body 131 by a screw or the like.

本實施型態中之其他構成、作用以及效果與第1實施型態相同。Other configurations, operations, and effects of the present embodiment are the same as those of the first embodiment.

[第3實施型態][Third embodiment]

第7圖係表示本發明之第3實施型態所涉及之叉架中的支持撿取器119之前端部的剖面構造。在本實施型態中,如第7圖所示般,蓋部141具有主要吸收來自X方向之衝擊的主保護部141a,和大略直角形成於該主保護部141a之壁狀被覆部141b,剖面構成凹形。屬於蓋部141之一部分的被覆部141b係以覆蓋支持撿取器119之本體131之前端附近之周圍的方式而被安裝。Fig. 7 is a cross-sectional view showing the front end portion of the support gripper 119 in the fork frame according to the third embodiment of the present invention. In the present embodiment, as shown in Fig. 7, the lid portion 141 has a main protection portion 141a that mainly absorbs an impact from the X direction, and a wall-shaped coating portion 141b that is formed at a substantially right angle to the main protection portion 141a. Form a concave shape. The covering portion 141b belonging to a part of the lid portion 141 is attached so as to cover the periphery of the front end of the body 131 supporting the picker 119.

蓋部141係保護支持撿取器119之本體131之前端,以減少與基板處理系統100中之屬於系統構成構件之腔室壁等接觸時所受到之衝擊。在蓋部141中,因可以藉由被覆部141b覆蓋本體131之前端附近之周圍,故持有不僅本體131之前端,亦可以從前端保護至些許基端部側之位置的功能。即是,藉由被覆部141b覆蓋,依此在支持撿取器119之前端附近,不僅來自正面(X方向)之衝擊,即使對來自支持撿取器119之側方或上下方向(Y方向或Z方向)之衝擊,亦可以提高耐衝擊性。再者,藉由被覆部141b覆蓋,依此防止在支持撿取器119之前端附近造成細小損傷。因此,可以極力防止本體131之破損或因破損所產生之顆粒產生。The cover portion 141 protects the front end of the body 131 supporting the picker 119 to reduce the impact received when it comes into contact with the chamber wall or the like of the system constituent member in the substrate processing system 100. In the lid portion 141, since the periphery of the vicinity of the front end of the main body 131 can be covered by the covering portion 141b, it is possible to hold not only the front end of the main body 131 but also the position from the front end to the position on the side of the base end portion. That is, it is covered by the covering portion 141b, whereby in the vicinity of the front end of the support gripper 119, not only the impact from the front side (X direction) but also the side from the support picker 119 or the up and down direction (Y direction or The impact in the Z direction can also improve the impact resistance. Further, it is covered by the covering portion 141b, thereby preventing fine damage in the vicinity of the front end of the support gripper 119. Therefore, it is possible to prevent the breakage of the body 131 or the generation of particles due to breakage as much as possible.

蓋部141藉由使角筒狀之本體131密接於被覆部141b之內側而嵌入,依據摩擦阻力被固定於本體131。因此,被覆部141b也當作防止蓋部141自支持撿取器119之本體131脫落之防脫作用部而發揮功能。該防脫功能可以依據覆蓋本體131之側部的被覆部141b之內徑,或被覆長度L2而適當調整。The lid portion 141 is fitted by fitting the corner tubular body 131 to the inside of the covering portion 141b, and is fixed to the main body 131 in accordance with the frictional resistance. Therefore, the covering portion 141b also functions as a detachment preventing portion that prevents the lid portion 141 from coming off the body 131 of the support gripper 119. This anti-off function can be appropriately adjusted depending on the inner diameter of the covering portion 141b covering the side portion of the main body 131 or the covering length L2.

在本實施型態中,以例如橡膠或合成樹脂等之彈性材料構成蓋部141為佳。藉由以彈性材料形成蓋部141之被覆部141b,亦可以在被覆部141b之上面從下側支持基板S。此時,因在支持撿取器119之最前端位置支持基板S,故可以藉由叉架101安定支持基板S。並且,雖然省略圖示,但是在本實施型態之蓋部141中,即使在被覆部141b之內周形成持有防脫作用之凹凸(皺摺)亦可。再者,即使以螺桿等將蓋部141固定於本體131亦可。In the present embodiment, it is preferable to form the lid portion 141 with an elastic material such as rubber or synthetic resin. The substrate S can be supported from the lower side on the upper surface of the covering portion 141b by forming the covering portion 141b of the lid portion 141 with an elastic material. At this time, since the substrate S is supported at the most distal end position of the support picker 119, the support substrate S can be stably supported by the fork 101. In addition, in the lid portion 141 of the present embodiment, the uneven portion (wrinkle) that holds the release preventing effect may be formed on the inner circumference of the covering portion 141b. Further, the cover portion 141 may be fixed to the main body 131 by a screw or the like.

本實施型態中之其他構成、作用以及效果與第1實施型態相同。Other configurations, operations, and effects of the present embodiment are the same as those of the first embodiment.

[第4實施型態][Fourth embodiment]

接著,一面參照第8圖至第10圖,針對本發明之第4實施型態予以說明。第8圖係表示本發明之第4實施型態所涉及之叉架101中的支持撿取器119之前端部的剖面構造。在本實施型態中,在與第1實施形態相同之構成的蓋部133之上部,設置有當作自下方支持基板S之第2突起部的支持突起143。支持突起143係由例如橡膠、合成樹脂等之彈性材料所形成。支持突起143除第8圖所示般之半球狀以外,即使為例如O型環般之環狀亦可。在本實施型態中,在例如金屬性之蓋部133上固定以另外之材質(例如橡膠)所形成之彈性構件而當作支持突起143。將支持突起143固定於蓋部133之方法,例如螺桿固定、藉由接合材之固定等任意。並且,即使以例如橡膠等之彈性材料一體形成蓋部133和支持突起143亦可。Next, a fourth embodiment of the present invention will be described with reference to Figs. 8 to 10 . Fig. 8 is a cross-sectional view showing the front end portion of the fork ejector 101 according to the fourth embodiment of the present invention. In the present embodiment, a support protrusion 143 serving as a second protrusion from the lower support substrate S is provided on the upper portion of the lid portion 133 having the same configuration as that of the first embodiment. The support protrusions 143 are formed of an elastic material such as rubber or synthetic resin. The support protrusion 143 may be a ring shape such as an O-ring, in addition to the hemispherical shape as shown in Fig. 8. In the present embodiment, an elastic member formed of another material (for example, rubber) is fixed to the metal cover portion 133 as a support protrusion 143, for example. A method of fixing the support protrusion 143 to the lid portion 133, for example, screw fixing, fixing by a bonding material, or the like. Further, the cover portion 133 and the support protrusions 143 may be integrally formed of an elastic material such as rubber.

在本實施型態中,藉由在蓋部133之上部設置支持突起,如第8圖所示般,可以在支持撿取器119之最前端支持基板S。基板S因越大型越容易產生彎曲,故在支持撿取器119之最前端設置支持突起143在下方予以支持,則可以在叉架101安定保持基板S。In the present embodiment, by providing the support protrusions on the upper portion of the lid portion 133, as shown in Fig. 8, the substrate S can be supported at the foremost end of the support gripper 119. Since the substrate S is more likely to be bent due to the larger size, the support protrusion 143 is supported at the foremost end of the support gripper 119 to support the substrate S.

並且,支持突起143亦可以設置在第2實施型態之蓋部139或第3實施型態之蓋部141。第9圖為將支持突起143一體形成在第2實施型態所涉及之蓋部139之上部的例子。再者,第10圖為將支持突起143一體形成在第3實施型態所涉及之蓋部141之上部的例子。Further, the support protrusion 143 may be provided in the lid portion 139 of the second embodiment or the lid portion 141 of the third embodiment. Fig. 9 is an example in which the support protrusions 143 are integrally formed on the upper portion of the lid portion 139 according to the second embodiment. In addition, FIG. 10 is an example in which the support protrusions 143 are integrally formed on the upper portion of the lid portion 141 according to the third embodiment.

本實施型態中之其他構成、作用以及效果與第1至3實施型態相同。Other configurations, operations, and effects of the present embodiment are the same as those of the first to third embodiments.

[第5實施型態][Fifth Embodiment]

第11圖係表示本發明之第5實施型態所涉及之叉架101中的支持撿取器的俯視圖。在本實施型態之叉架中,於支持撿取器119之本體131之上面,多處設置有用以安裝支持突起200之安裝孔150。安裝孔150係以特定間隔被配設在支持撿取器119之本體131之上面。Fig. 11 is a plan view showing a support gripper in the fork frame 101 according to the fifth embodiment of the present invention. In the fork frame of the present embodiment, mounting holes 150 for mounting the support protrusions 200 are provided at a plurality of places on the body 131 supporting the picker 119. The mounting holes 150 are disposed above the body 131 supporting the picker 119 at specific intervals.

第12圖以及第13圖係表示利用安裝孔150之支持突起200之安裝構造之例子。第12圖係表示利用支持撿取器119之安裝孔150,安裝半球狀之支持突起200a之狀態。半球狀之支持突起200a係從配置在支持撿取器119之本體131之上面之金屬製(鋁等)之擋板151之上方,以螺桿203夾住彈性構件201之下部的凸緣201a,依此可裝卸地固定於本體131。並且,在第12圖中,因容易執行藉由螺桿203之固定,故在支持撿取器119之本體131之安裝孔150安裝有螺母側153。FIGS. 12 and 13 show an example of a mounting structure of the support protrusions 200 by the mounting holes 150. Fig. 12 shows a state in which the hemispherical support projections 200a are attached by the mounting holes 150 of the support gripper 119. The hemispherical support protrusion 200a is formed by a metal plate (aluminum or the like) baffle 151 disposed above the body 131 supporting the picker 119, and the screw 201 203 sandwiches the flange 201a of the lower portion of the elastic member 201. This is detachably fixed to the body 131. Further, in Fig. 12, since the fixing by the screw 203 is easily performed, the nut side 153 is attached to the mounting hole 150 of the body 131 supporting the picker 119.

第13圖係表示利用支持撿取器之安裝孔150,安裝O型環狀之支持突起200b之狀態。O型環狀之支持突起200b係從配置在支持撿取器119之上面的金屬製之擋板151之上方,隔著盤狀之固定構件211以螺桿203可裝卸地固定於本體131。盤狀之固定構件211係發揮抵接於O型環狀之彈性構件213之內周側而將該彈性構件213推壓至擋板151之任務。並且,在第13圖中,因容易執行藉由螺桿203之固定,故在支持撿取器119之安裝孔150安裝有螺母側153。Fig. 13 is a view showing a state in which the O-ring-shaped supporting projection 200b is attached by the mounting hole 150 supporting the picker. The O-ring-shaped support projection 200b is detachably fixed to the main body 131 by a screw 203 via a disk-shaped fixing member 211 from above a metal baffle 151 disposed on the upper surface of the support gripper 119. The disk-shaped fixing member 211 serves to abut against the inner peripheral side of the O-ring elastic member 213 and press the elastic member 213 against the shutter 151. Further, in Fig. 13, since the fixing by the screw 203 is easily performed, the nut side 153 is attached to the mounting hole 150 of the support gripper 119.

並且,對第12圖以及第13圖所示之安裝孔150安裝支持突起200a、200b的安裝構造僅為例示,並不限定於該些。Further, the attachment structure for attaching the support protrusions 200a and 200b to the attachment hole 150 shown in FIGS. 12 and 13 is merely an example, and is not limited thereto.

在本實施型態中,藉由在支持撿取器119之上面設置多數安裝孔150,可以自由變更支持突起200之配置。例如第14圖係表示在支持撿取器119之兩處配置半球狀之支持突起200a之例子。第15圖係表示在支持撿取器119之四處配設半球狀之支持突起200a,並且也在蓋部133設置支持突起143之例子。再者,第16圖係表示在支持撿取器119之上面,各配設兩個半球狀之支持突起200a,和O型環狀之支持突起200b,並且也在蓋部133設置支持突起143之例子。第17圖為在各支持撿取器119上適當配置支持突起200a和200b之叉架101之俯視圖。In the present embodiment, the arrangement of the support protrusions 200 can be freely changed by providing a plurality of mounting holes 150 on the upper surface of the support picker 119. For example, Fig. 14 shows an example in which the hemispherical support protrusions 200a are disposed at two places of the support picker 119. Fig. 15 shows an example in which the hemispherical support protrusions 200a are disposed at four places of the support picker 119, and the support protrusions 143 are also provided in the cover portion 133. Further, Fig. 16 shows that on the upper surface of the support gripper 119, two hemispherical support projections 200a and O-ring-shaped support projections 200b are provided, and the support projections 143 are also provided in the cover portion 133. example. Fig. 17 is a plan view showing the fork frame 101 in which the support projections 200a and 200b are appropriately disposed on the respective support grippers 119.

如此在本實施型態中,因在本體131之多處設置安裝孔150,故可以提高支持突起200之配置自由度。支持突起200因在叉架101(各支持撿取器119)上成為從下之支持基板S之支點,故因應基板S之大小等,變更支持突起200之配置或種類,依此可以在叉架101上安定保持基板S。例如,於欲防止基板S貼於叉架101時,重點性使用與基板S之接觸面積小之半球狀的支持突起200a,或相反的於欲增大基板S和叉架101之吸附力之時,可多數配置O型環之支持突起200b等,能夠作各種應用。並且,在本實施型態中,因應所需,也利用蓋部133之支持突起143,故藉由組合支持突起200和支持突起143,更提高叉架101中之基板S保持能力,可以安定保持基板S。As described above, in the present embodiment, since the mounting holes 150 are provided at a plurality of places of the main body 131, the degree of freedom in arrangement of the support protrusions 200 can be improved. Since the support protrusions 200 are fulcrums of the support substrate S from the lower support frame 119 (the support holders 119), the arrangement or type of the support protrusions 200 can be changed depending on the size of the substrate S, and the like. The substrate S is held on the 101. For example, when it is desired to prevent the substrate S from sticking to the yoke 101, it is important to use a hemispherical support protrusion 200a having a small contact area with the substrate S, or vice versa when it is desired to increase the adsorption force of the substrate S and the yoke 101. Most of the O-ring support protrusions 200b can be arranged for various applications. Further, in the present embodiment, the support protrusions 143 of the cover portion 133 are also utilized as needed. Therefore, by combining the support protrusions 200 and the support protrusions 143, the substrate S holding ability in the yoke 101 can be further improved, and can be stably maintained. Substrate S.

再者,在本實施型態中,因容易交換支持突起200,故可以持有各種功能之材質構成支持突起200。例如,藉由使用導電性材料當作支持突起200之材質,可以謀求基板S和支持撿取器119之導通。再者,作為支持突起200之構成材料,使用例如吸附性材料確實保持基板S,或相反地使用相對於基板S黏著性低之低黏著性材料,依此可以防止基板S貼附於叉架101。Further, in the present embodiment, since the support protrusions 200 are easily exchanged, the support protrusions 200 can be formed of materials having various functions. For example, by using a conductive material as the material of the support protrusion 200, conduction between the substrate S and the support picker 119 can be achieved. Further, as a constituent material of the support protrusion 200, for example, the substrate S is surely held by using an adsorptive material, or a low-adhesive material having low adhesion to the substrate S is used instead, whereby the substrate S can be prevented from being attached to the yoke 101. .

並且,在本實施型態中,由於可在支持撿取器119上配置多數支持突起200,故亦可例如第18圖所示般,由支持撿取器119之撿取器基座117側,朝向最前端之蓋部133,階段性升高支持突起200之高度。即是,在第18圖中,對於支持撿取器119之上面,最靠近於撿取器基座117之側的第1號支持突起200之高度H1 ,和第2號之支持突起200之高度H2 ,和第3號之支持突起200之高度H3 ,和第4號之蓋部133之支持突起143之高度H4 係被設定成H4 >H3 >H2 >H1Further, in the present embodiment, since the plurality of support protrusions 200 can be disposed on the support gripper 119, the picker base 117 side of the support gripper 119 can be provided, for example, as shown in Fig. 18. The lid portion 133 toward the foremost end gradually raises the height of the support protrusion 200. That is, in Fig. 18, with respect to the upper surface of the support gripper 119, the height H 1 of the first support protrusion 200 closest to the side of the gripper base 117, and the support protrusion 200 of the second number are provided. height H 2, the No. 3 and support projections 200 of a height H 3, the lid portion and support the resolution of 4133 143 of a height of the projection system is set to H 4 H 4> H 3> H 2 > H 1.

如此一來,在本實施型態中,可以以支持基板S之支持點從支持撿取器119之撿取器基座117側朝向前端側漸漸升高之方式,設定支持突起200及支持突起143之高度。藉由如此之構成,於依據基板S之重量或支持撿取器119之自重所產生之彎曲,使得叉架101之前端側下降之時,下降範圍藉由支持突起200以及支持突起143之高度可以某程度相抵。因此,可以藉由叉架101在極力接近於水平之狀態下一邊安定性保持基板S,一邊執行搬運動作。In this manner, in the present embodiment, the support protrusion 200 and the support protrusion 143 can be set such that the support point of the support substrate S gradually rises from the side of the picker base 117 supporting the picker 119 toward the front end side. The height. With such a configuration, when the front end side of the yoke 101 is lowered according to the weight of the substrate S or the bending caused by the self-weight of the support 119, the lowering range can be supported by the height of the supporting protrusion 200 and the supporting protrusion 143. A certain degree of offset. Therefore, the conveyance operation can be performed while maintaining the substrate S stably while the fork frame 101 is close to the horizontal force as much as possible.

並且,在以上之說明中,雖然舉例說明第1實施型態之蓋部133而予以說明,但是當然可以使用蓋部139(第2實施型態)或蓋部141(第3實施型態)來取代蓋部133。本實施型態中之其他構成、作用以及效果與第1至4實施型態相同。In the above description, the lid portion 133 of the first embodiment will be described by way of example. However, it is of course possible to use the lid portion 139 (second embodiment) or the lid portion 141 (third embodiment). The cover portion 133 is replaced. Other configurations, operations, and effects of the present embodiment are the same as those of the first to fourth embodiments.

以上,雖然敘述本發明之實施型態,但是本發明並不限定於上述實施型態,當然可作各種之變形。例如,在上述實施型態中,雖然以支持撿取器119之本體131為中空角筒狀之情形為例,但是本體形狀,即使為例如剖面構成三角形之上面為平的筒形狀亦可。再者,雖然舉出配備於真空側之搬運室3之搬運裝置23的叉架101作為基板保持具之例予以說明,但是本發明亦可適用於例如大氣側之搬運裝置15之叉架17a、17b。The embodiments of the present invention have been described above, but the present invention is not limited to the above-described embodiments, and various modifications can of course be made. For example, in the above-described embodiment, the case where the main body 131 supporting the picker 119 has a hollow rectangular tube shape is taken as an example, but the main body shape may be, for example, a flat cylindrical shape in which the upper surface of the cross section is a flat shape. In addition, although the fork 101 which is provided in the conveyance apparatus 23 of the conveyance chamber 3 of the vacuum side is demonstrated as a board|substrate holder, the present invention is also applicable, for example, to the fork 17a of the conveyance apparatus 15 of the atmospheric side, 17b.

再者,可使用本發明之基板保持具之基板搬運裝置之構成,並不限定於配備於上下兩段之滑動手臂式,即使以一段構成或三段構成亦可,並不限於滑動式,即使為例如多關節手臂式之基板搬運裝置亦可。Further, the configuration of the substrate transfer device of the substrate holder of the present invention can be used, and is not limited to the slide arm type provided in the upper and lower stages, and may be configured not only in one-stage configuration but also in three stages, and is not limited to a sliding type, even if For example, a multi-joint arm type substrate transfer device may be used.

再者,作為依據本發明之基板保持具的搬運對象,並不限於FPD製造用之基板,可以以各種用途之基板為對象。In addition, the object to be transported by the substrate holder according to the present invention is not limited to the substrate for FPD manufacturing, and can be used for substrates of various uses.

1a、1b、1c...製程腔室1a, 1b, 1c. . . Process chamber

3...搬運室3. . . Handling room

5...裝載鎖定室5. . . Load lock room

100...真空處理系統100. . . Vacuum processing system

101...叉架101. . . Fork

117...撿取器基座117. . . Picker base

119...支持撿取器119. . . Support picker

131...本體131. . . Ontology

133...蓋部133. . . Cover

135...安裝塊135. . . Mounting block

200...支持突起200. . . Support protrusion

第1圖為概略性表示真空處理系統之斜視圖。Fig. 1 is a perspective view schematically showing a vacuum processing system.

第2圖為第1圖之真空處理系統的俯視圖。Fig. 2 is a plan view of the vacuum processing system of Fig. 1.

第3圖為說明搬運機構之概略構成之斜視圖。Fig. 3 is a perspective view showing a schematic configuration of a transport mechanism.

第4圖為表示叉架之概略構成之斜視圖。Fig. 4 is a perspective view showing a schematic configuration of a fork.

第5圖係表示本發明之第1實施型態所涉及之叉架中的支持撿取器之前端部的剖面圖。Fig. 5 is a cross-sectional view showing a front end portion of a fork in the fork frame according to the first embodiment of the present invention.

第6圖係表示本發明之第2實施型態所涉及之叉架中的支持撿取器之前端部的剖面圖。Fig. 6 is a cross-sectional view showing the front end portion of the fork in the fork frame according to the second embodiment of the present invention.

第7圖係表示本發明之第3實施型態所涉及之叉架中的支持撿取器之前端部的剖面圖。Fig. 7 is a cross-sectional view showing the front end portion of the fork in the fork frame according to the third embodiment of the present invention.

第8圖係表示本發明之第4實施型態所涉及之叉架中的支持撿取器之前端部的剖面圖。Fig. 8 is a cross-sectional view showing the front end portion of the fork in the fork frame according to the fourth embodiment of the present invention.

第9圖係表示本發明之第4實施型態所涉及之叉架中的支持撿取器之前端部的另外剖面圖。Fig. 9 is a cross-sectional view showing the front end of the support gripper in the fork frame according to the fourth embodiment of the present invention.

第10圖係表示本發明之第4實施型態所涉及之叉架中的支持撿取器之前端部的又一另外剖面圖。Fig. 10 is still another cross-sectional view showing the front end portion of the fork in the fork frame according to the fourth embodiment of the present invention.

第11圖係表示本發明之第5實施型態所涉及之叉架中的支持撿取器之俯視圖。Fig. 11 is a plan view showing a support gripper in the fork frame according to the fifth embodiment of the present invention.

第12圖為說明支持突起之固定構造之圖面。Fig. 12 is a view showing a fixing structure for supporting the projections.

第13圖為說明支持突起之固定構造之另外例的圖面。Fig. 13 is a view showing another example of the fixing structure for supporting the projections.

第14圖為表示支持突起之配置例的支持撿取器之俯視圖。Fig. 14 is a plan view showing a support gripper showing an arrangement example of the support projections.

第15圖為表示支持突起之另外配置例的支持撿取器之俯視圖。Fig. 15 is a plan view showing a support picker showing another arrangement example of the support protrusions.

第16圖為表示支持突起之又一另外配置例的支持撿取器之俯視圖。Fig. 16 is a plan view showing a support picker showing still another arrangement example of the support protrusions.

第17圖為表示支持突起之配置例的叉架之俯視圖。Fig. 17 is a plan view showing the fork of the arrangement example of the support projections.

第18圖為表示支持突起之配置例的支持撿取器之側面圖。Fig. 18 is a side view showing a support gripper showing an arrangement example of the support projections.

101...叉架101. . . Fork

117...撿取器基座117. . . Picker base

200...支持突起200. . . Support protrusion

119...支持撿取器119. . . Support picker

131...本體131. . . Ontology

133...蓋部133. . . Cover

Claims (14)

一種基板保持具,具備有基部,和互相隔著間隔連結於上述基部之多數支持構件,在該些多數支持構件上保持基板,其特徵為:上述支持構件具備有本體和保護該本體之前端的可裝卸之保護構件,在上述本體之上面,具有從下方抵接於基板之可裝卸的第1突起部,在上述保護構件之上部,具有從下方抵接於基板的第2突起部。 A substrate holder comprising a base portion and a plurality of support members coupled to the base portion with a space therebetween, wherein the plurality of support members hold the substrate, wherein the support member is provided with a body and a front end for protecting the body The detachable protective member has a detachable first projection that abuts against the substrate from below, and a second projection that abuts against the substrate from below at the upper portion of the protective member. 如申請專利範圍第1項所記載之基板保持具,其中,上述本體構成中空之筒形狀。 The substrate holder according to the first aspect of the invention, wherein the main body has a hollow cylindrical shape. 如申請專利範圍第2項所記載之基板保持具,其中,藉由上述保護構件塞住上述本體之前端。 The substrate holder according to claim 2, wherein the front end of the body is plugged by the protective member. 如申請專利範圍第3項所記載之基板保持具,其中,上述保護構件具有被插入至上述本體之內部的凸部。 The substrate holder according to claim 3, wherein the protective member has a convex portion that is inserted into the inside of the body. 如申請專利範圍第1至4項中之任一項所記載之基板保持具,其中,上述保護構件具有覆蓋上述本體之前端附近之周圍的被覆部。 The substrate holder according to any one of claims 1 to 4, wherein the protective member has a covering portion that covers a periphery of the front end of the body. 如申請專利範圍第1至4項中之任一項所記載之基 板保持具,其中,上述本體係由CFRP所構成。 As stated in any one of claims 1 to 4 of the patent application scope A plate holder, wherein the above system is composed of CFRP. 如申請專利範圍第1至4項中之任一項所記載之基板保持具,其中,上述保護構件係由金屬或楊氏係數為1MPa以上10GPa以下之高分子材料所構成。 The substrate holder according to any one of claims 1 to 4, wherein the protective member is made of a metal material or a polymer material having a Young's modulus of 1 MPa or more and 10 GPa or less. 如申請專利範圍第7項所記載之基板保持具,其中,上述金屬為不鏽鋼或是鋁。 The substrate holder according to claim 7, wherein the metal is stainless steel or aluminum. 如申請專利範圍第7項所記載之基板保持具,其中,上述高分子材料為氟橡膠、聚四氟乙烯樹脂或是尼龍樹脂。 The substrate holder according to the seventh aspect of the invention, wherein the polymer material is a fluororubber, a polytetrafluoroethylene resin or a nylon resin. 如申請專利範圍第1項所記載之基板保持具,其中,以上述本體之上面為基準,相對於上述第1突起部之頂點的高度,上述第2突起部之頂點的高度被形成較高。 In the substrate holder according to the first aspect of the invention, the height of the apex of the second protrusion is formed higher with respect to the height of the apex of the first protrusion based on the upper surface of the main body. 如申請專利範圍第1項所記載之基板保持具,其中,上述本體具有能夠可變調節上述第1突起部之配設位置及/或配設數量的多數安裝部。 The substrate holder according to the first aspect of the invention, wherein the main body has a plurality of mounting portions capable of variably adjusting an arrangement position and/or a number of the first protrusions. 一種基板搬運裝置,具備有可進出及退避之搬運手臂部,和被安裝於該搬運手臂部之基板保持具,藉由上述基板保持具保持基板而予以搬運,其特徵為: 上述基板保持具具備基部,和互相隔著間隔而被連結於上述基部之多數支持構件,上述支持構件具備有本體和保護該本體之前端的可裝卸之保護構件,在上述本體之上面,具有從下方抵接於基板之可裝卸的第1突起部,在上述保護構件之上部,具有從下方抵接於基板的第2突起部。 A substrate transfer device includes a transport arm portion that can be moved in and out, and a substrate holder that is attached to the transport arm portion, and is transported by the substrate holder holding substrate, and is characterized in that: The substrate holder includes a base portion and a plurality of support members coupled to the base portion with a space therebetween. The support member includes a main body and a detachable protection member for protecting a front end of the main body, and has a lower surface on the upper surface of the main body. The detachable first projection that abuts against the substrate has a second projection that abuts against the substrate from below at the upper portion of the protective member. 一種基板搬運裝置,具備有可進出及退避之搬運手臂部,和被安裝於該搬運手臂部之基板保持具,藉由上述基板保持具保持基板而予以搬運,其特徵為:上述基板保持具具備基部,和互相隔著間隔而被連結於上述基部之多數支持構件,上述支持構件具備有本體,和保護該本體之前端的可裝卸之保護構件,和被設置在上述本體之上面,從下方抵接於基板之可裝卸的突起部,在上述本體之上面,具有從下方抵接於基板之可裝卸的第1突起部,在上述保護構件之上部,具有從下方抵接於基板的第2突起部。 A substrate transporting device including a transport arm portion that can be moved in and out, and a substrate holder attached to the transport arm portion, which is transported by the substrate holder holding substrate, wherein the substrate holder has a base portion and a plurality of support members coupled to the base portion with a space therebetween, wherein the support member includes a main body and a detachable protective member for protecting a front end of the main body, and is disposed on the upper surface of the main body to abut from below The detachable projection on the substrate has a detachable first projection that abuts against the substrate from below, and a second projection that abuts against the substrate from below at the upper portion of the protective member . 一種基板處理系統,具備處理基板之基板處理裝置,和將基板搬運至該基板處理裝置之基板搬運裝置,其特徵為:上述基板搬運裝置具備有可進出及退避之搬運手臂 部,和被安裝於該搬運手臂部保持基板之基板保持具,上述基板保持具具備基部,和互相隔著間隔而被連結於上述基部之多數支持構件,上述支持構件具備有本體和保護該本體之前端的可裝卸之保護構件,在上述本體之上面,具有從下方抵接於基板之可裝卸的第1突起部,在上述保護構件之上部,具有從下方抵接於基板的第2突起部。 A substrate processing system including a substrate processing apparatus for processing a substrate, and a substrate transfer device for transporting the substrate to the substrate processing apparatus, wherein the substrate transfer device includes a transport arm that can be moved in and out And a substrate holder attached to the transport arm holding substrate, the substrate holder having a base portion and a plurality of support members coupled to the base portion with a space therebetween, wherein the support member includes a body and protects the body The detachable protective member at the front end has a detachable first projection that abuts against the substrate from below, and a second projection that abuts against the substrate from below at the upper portion of the protective member.
TW97147411A 2007-12-06 2008-12-05 A substrate holder, a substrate handling device, and a substrate processing system TWI470721B (en)

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