TWI466826B - 用於純化矽烷之方法及系統 - Google Patents
用於純化矽烷之方法及系統 Download PDFInfo
- Publication number
- TWI466826B TWI466826B TW100135942A TW100135942A TWI466826B TW I466826 B TWI466826 B TW I466826B TW 100135942 A TW100135942 A TW 100135942A TW 100135942 A TW100135942 A TW 100135942A TW I466826 B TWI466826 B TW I466826B
- Authority
- TW
- Taiwan
- Prior art keywords
- decane
- fraction
- distillation column
- rich
- depleted
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 112
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title description 2
- 229910000077 silane Inorganic materials 0.000 title description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 1921
- 238000004821 distillation Methods 0.000 claims description 407
- 238000009835 boiling Methods 0.000 claims description 118
- 150000001875 compounds Chemical class 0.000 claims description 114
- 238000011084 recovery Methods 0.000 claims description 86
- 239000007788 liquid Substances 0.000 claims description 68
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 67
- 239000005977 Ethylene Substances 0.000 claims description 67
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 claims description 58
- 238000000926 separation method Methods 0.000 claims description 54
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical group CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 claims description 29
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 18
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 18
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 14
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 12
- 239000002808 molecular sieve Substances 0.000 claims description 12
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims description 12
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 230000007812 deficiency Effects 0.000 claims description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 8
- RPDFRSKJKOQCIT-UHFFFAOYSA-N 3-ethyldodecane Chemical compound CCCCCCCCCC(CC)CC RPDFRSKJKOQCIT-UHFFFAOYSA-N 0.000 claims description 6
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims description 6
- KHPNGCXABLTQFJ-UHFFFAOYSA-N 1,1,1-trichlorodecane Chemical compound CCCCCCCCCC(Cl)(Cl)Cl KHPNGCXABLTQFJ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- 150000001340 alkali metals Chemical class 0.000 claims description 5
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 5
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 5
- -1 decane compound Chemical class 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- FRGJFERYCDBOQD-UHFFFAOYSA-N 1,1,1,2-tetrachlorodecane Chemical compound CCCCCCCCC(Cl)C(Cl)(Cl)Cl FRGJFERYCDBOQD-UHFFFAOYSA-N 0.000 claims 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 3
- 239000000203 mixture Substances 0.000 claims 3
- 239000002594 sorbent Substances 0.000 claims 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims 1
- 210000003918 fraction a Anatomy 0.000 claims 1
- 239000012535 impurity Substances 0.000 description 15
- 239000007789 gas Substances 0.000 description 10
- 230000032258 transport Effects 0.000 description 10
- 230000005484 gravity Effects 0.000 description 9
- 238000000746 purification Methods 0.000 description 7
- 238000007796 conventional method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- 239000002699 waste material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 229960001701 chloroform Drugs 0.000 description 3
- 238000007323 disproportionation reaction Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000004064 recycling Methods 0.000 description 3
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 241000183024 Populus tremula Species 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- IHTNRDIBNXBSIF-UHFFFAOYSA-N 2-ethyloxane Chemical compound CCC1CCCCO1 IHTNRDIBNXBSIF-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 229950005499 carbon tetrachloride Drugs 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000011234 economic evaluation Methods 0.000 description 1
- 238000004508 fractional distillation Methods 0.000 description 1
- 238000005194 fractionation Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000066 reactive distillation Methods 0.000 description 1
- 230000003134 recirculating effect Effects 0.000 description 1
- IREVRWRNACELSM-UHFFFAOYSA-J ruthenium(4+);tetrachloride Chemical compound Cl[Ru](Cl)(Cl)Cl IREVRWRNACELSM-UHFFFAOYSA-J 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 1
- CBIYWHCPXHKZME-UHFFFAOYSA-J tetrafluororuthenium Chemical compound [F-].[F-].[F-].[F-].[Ru+4] CBIYWHCPXHKZME-UHFFFAOYSA-J 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/14—Fractional distillation or use of a fractionation or rectification column
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/14—Fractional distillation or use of a fractionation or rectification column
- B01D3/143—Fractional distillation or use of a fractionation or rectification column by two or more of a fractionation, separation or rectification step
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
- B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/04—Hydrides of silicon
- C01B33/046—Purification
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39007510P | 2010-10-05 | 2010-10-05 | |
| US39007810P | 2010-10-05 | 2010-10-05 | |
| US12/898,487 US8524044B2 (en) | 2010-10-05 | 2010-10-05 | Systems for recovering silane from heavy-ends separation operations |
| US12/898,494 US8524048B2 (en) | 2010-10-05 | 2010-10-05 | Processes for recovering silane from heavy-ends separation operations |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201219304A TW201219304A (en) | 2012-05-16 |
| TWI466826B true TWI466826B (zh) | 2015-01-01 |
Family
ID=44720191
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100135942A TWI466826B (zh) | 2010-10-05 | 2011-10-04 | 用於純化矽烷之方法及系統 |
Country Status (6)
| Country | Link |
|---|---|
| EP (2) | EP2624929B1 (enExample) |
| JP (1) | JP5826854B2 (enExample) |
| KR (1) | KR101752949B1 (enExample) |
| CN (1) | CN103153420B (enExample) |
| TW (1) | TWI466826B (enExample) |
| WO (1) | WO2012047522A2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106061585B (zh) | 2014-01-24 | 2018-12-11 | 韩华化学株式会社 | 废气的净化方法和净化设备 |
| US10252916B2 (en) * | 2014-09-04 | 2019-04-09 | Corner Star Limited | Methods for separating halosilanes |
| CN108079608A (zh) * | 2017-12-22 | 2018-05-29 | 天津科创复兴科技咨询有限公司 | 一种有氮气保护的高效的蒸馏提纯设备 |
| CN108751201A (zh) * | 2018-08-09 | 2018-11-06 | 洛阳中硅高科技有限公司 | 乙硅烷的制备装置 |
| CN115092934A (zh) * | 2022-06-21 | 2022-09-23 | 云南通威高纯晶硅有限公司 | 一种控制精制三氯氢硅中二氯氢硅含量的方法及系统 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5206004A (en) * | 1990-04-30 | 1993-04-27 | Ethyl Corporation | Silane compositions and process |
| US5211931A (en) * | 1992-03-27 | 1993-05-18 | Ethyl Corporation | Removal of ethylene from silane using a distillation step after separation using a zeolite molecular sieve |
| EP0811815A2 (en) * | 1996-06-07 | 1997-12-10 | The Boc Group, Inc. | Method and apparatus for purifying a substance |
| CN101817527A (zh) * | 2010-04-16 | 2010-09-01 | 浙江中宁硅业有限公司 | 一种多晶硅生产过程中的电子级硅烷精制提纯的方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4632816A (en) | 1982-12-13 | 1986-12-30 | Ethyl Corporation | Process for production of silane |
| US4554141A (en) * | 1984-05-14 | 1985-11-19 | Ethyl Corporation | Gas stream purification |
| US4900347A (en) * | 1989-04-05 | 1990-02-13 | Mobil Corporation | Cryogenic separation of gaseous mixtures |
| ITRM20040570A1 (it) * | 2004-11-19 | 2005-02-19 | Memc Electronic Materials | Procedimento e impianto di purificazione di triclorosilano e di tetracloruro di silicio. |
-
2011
- 2011-09-21 KR KR1020137011660A patent/KR101752949B1/ko active Active
- 2011-09-21 JP JP2013532822A patent/JP5826854B2/ja active Active
- 2011-09-21 WO PCT/US2011/052588 patent/WO2012047522A2/en not_active Ceased
- 2011-09-21 EP EP11761806.6A patent/EP2624929B1/en active Active
- 2011-09-21 CN CN201180048451.7A patent/CN103153420B/zh active Active
- 2011-09-21 EP EP15170509.2A patent/EP2993157A3/en not_active Withdrawn
- 2011-10-04 TW TW100135942A patent/TWI466826B/zh active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5206004A (en) * | 1990-04-30 | 1993-04-27 | Ethyl Corporation | Silane compositions and process |
| US5211931A (en) * | 1992-03-27 | 1993-05-18 | Ethyl Corporation | Removal of ethylene from silane using a distillation step after separation using a zeolite molecular sieve |
| EP0811815A2 (en) * | 1996-06-07 | 1997-12-10 | The Boc Group, Inc. | Method and apparatus for purifying a substance |
| CN101817527A (zh) * | 2010-04-16 | 2010-09-01 | 浙江中宁硅业有限公司 | 一种多晶硅生产过程中的电子级硅烷精制提纯的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2993157A2 (en) | 2016-03-09 |
| CN103153420A (zh) | 2013-06-12 |
| WO2012047522A2 (en) | 2012-04-12 |
| JP5826854B2 (ja) | 2015-12-02 |
| TW201219304A (en) | 2012-05-16 |
| CN103153420B (zh) | 2015-06-17 |
| EP2624929A2 (en) | 2013-08-14 |
| EP2993157A3 (en) | 2016-06-22 |
| EP2624929B1 (en) | 2015-07-22 |
| WO2012047522A3 (en) | 2012-11-29 |
| JP2013542163A (ja) | 2013-11-21 |
| KR101752949B1 (ko) | 2017-07-03 |
| KR20130124323A (ko) | 2013-11-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI466826B (zh) | 用於純化矽烷之方法及系統 | |
| JP4620694B2 (ja) | 高純度トリクロロシランの製造方法 | |
| TW200815285A (en) | Enhanced process for the purification of anhydrous hydrogen chloride gas | |
| US8524048B2 (en) | Processes for recovering silane from heavy-ends separation operations | |
| EP1912720B1 (en) | Process for removing carbon and/or phosphorus impurities from a silicon production facility | |
| JP2013542163A5 (enExample) | ||
| US8551298B2 (en) | Processes for purifying silane | |
| JP6391389B2 (ja) | オクタクロロトリシランの製造方法並びに該方法により製造されるオクタクロロトリシラン | |
| CN101531400B (zh) | 一种五氟化锑的制备方法 | |
| TWI570129B (zh) | 用於純化矽烷的流程及系統 | |
| EP1067346A1 (en) | Method and apparatus for recovering xenon or a mixture of krypton and xenon from air | |
| US8524044B2 (en) | Systems for recovering silane from heavy-ends separation operations | |
| JP6486049B2 (ja) | ペンタクロロジシランの製造方法並びに該方法により製造されるペンタクロロジシラン | |
| TW201210940A (en) | Process for separating monosilane from chlorosilanes-rich mixture | |
| CN222131012U (zh) | 还原回收料的精馏系统 |