JP5826854B2 - シランを精製する方法及びシステム - Google Patents

シランを精製する方法及びシステム Download PDF

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Publication number
JP5826854B2
JP5826854B2 JP2013532822A JP2013532822A JP5826854B2 JP 5826854 B2 JP5826854 B2 JP 5826854B2 JP 2013532822 A JP2013532822 A JP 2013532822A JP 2013532822 A JP2013532822 A JP 2013532822A JP 5826854 B2 JP5826854 B2 JP 5826854B2
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Japan
Prior art keywords
silane
distillation column
fraction
reduced
produced
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Active
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JP2013532822A
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English (en)
Japanese (ja)
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JP2013542163A5 (enExample
JP2013542163A (ja
Inventor
ティモシー・ディン・トゥルオング
グ・ジーホイ
プニート・グプタ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SunEdison Inc
Original Assignee
SunEdison Inc
MEMC Electronic Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US12/898,487 external-priority patent/US8524044B2/en
Priority claimed from US12/898,494 external-priority patent/US8524048B2/en
Application filed by SunEdison Inc, MEMC Electronic Materials Inc filed Critical SunEdison Inc
Publication of JP2013542163A publication Critical patent/JP2013542163A/ja
Publication of JP2013542163A5 publication Critical patent/JP2013542163A5/ja
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Publication of JP5826854B2 publication Critical patent/JP5826854B2/ja
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/14—Fractional distillation or use of a fractionation or rectification column
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/14—Fractional distillation or use of a fractionation or rectification column
    • B01D3/143—Fractional distillation or use of a fractionation or rectification column by two or more of a fractionation, separation or rectification step
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D3/00—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/34—Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping with one or more auxiliary substances
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C01B33/046—Purification

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP2013532822A 2010-10-05 2011-09-21 シランを精製する方法及びシステム Active JP5826854B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US39007510P 2010-10-05 2010-10-05
US39007810P 2010-10-05 2010-10-05
US12/898,487 US8524044B2 (en) 2010-10-05 2010-10-05 Systems for recovering silane from heavy-ends separation operations
US61/390,078 2010-10-05
US61/390,075 2010-10-05
US12/898,487 2010-10-05
US12/898,494 2010-10-05
US12/898,494 US8524048B2 (en) 2010-10-05 2010-10-05 Processes for recovering silane from heavy-ends separation operations
PCT/US2011/052588 WO2012047522A2 (en) 2010-10-05 2011-09-21 Processes and systems for purifying silane

Publications (3)

Publication Number Publication Date
JP2013542163A JP2013542163A (ja) 2013-11-21
JP2013542163A5 JP2013542163A5 (enExample) 2014-11-13
JP5826854B2 true JP5826854B2 (ja) 2015-12-02

Family

ID=44720191

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013532822A Active JP5826854B2 (ja) 2010-10-05 2011-09-21 シランを精製する方法及びシステム

Country Status (6)

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EP (2) EP2624929B1 (enExample)
JP (1) JP5826854B2 (enExample)
KR (1) KR101752949B1 (enExample)
CN (1) CN103153420B (enExample)
TW (1) TWI466826B (enExample)
WO (1) WO2012047522A2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015111886A1 (ko) 2014-01-24 2015-07-30 한화케미칼 주식회사 폐가스의 정제방법 및 정제장치
US10252916B2 (en) * 2014-09-04 2019-04-09 Corner Star Limited Methods for separating halosilanes
CN108079608A (zh) * 2017-12-22 2018-05-29 天津科创复兴科技咨询有限公司 一种有氮气保护的高效的蒸馏提纯设备
CN108751201A (zh) * 2018-08-09 2018-11-06 洛阳中硅高科技有限公司 乙硅烷的制备装置
CN115092934A (zh) * 2022-06-21 2022-09-23 云南通威高纯晶硅有限公司 一种控制精制三氯氢硅中二氯氢硅含量的方法及系统

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4632816A (en) 1982-12-13 1986-12-30 Ethyl Corporation Process for production of silane
US4554141A (en) 1984-05-14 1985-11-19 Ethyl Corporation Gas stream purification
US4900347A (en) * 1989-04-05 1990-02-13 Mobil Corporation Cryogenic separation of gaseous mixtures
US5206004A (en) 1990-04-30 1993-04-27 Ethyl Corporation Silane compositions and process
US5211931A (en) * 1992-03-27 1993-05-18 Ethyl Corporation Removal of ethylene from silane using a distillation step after separation using a zeolite molecular sieve
CA2203352C (en) * 1996-06-07 2000-08-01 Walter H. Whitlock Method and apparatus for purifying a substance
ITRM20040570A1 (it) * 2004-11-19 2005-02-19 Memc Electronic Materials Procedimento e impianto di purificazione di triclorosilano e di tetracloruro di silicio.
CN101817527B (zh) * 2010-04-16 2012-01-25 浙江中宁硅业有限公司 一种多晶硅生产过程中的电子级硅烷精制提纯的方法

Also Published As

Publication number Publication date
WO2012047522A3 (en) 2012-11-29
CN103153420B (zh) 2015-06-17
EP2993157A3 (en) 2016-06-22
KR20130124323A (ko) 2013-11-13
EP2624929B1 (en) 2015-07-22
WO2012047522A2 (en) 2012-04-12
TW201219304A (en) 2012-05-16
KR101752949B1 (ko) 2017-07-03
TWI466826B (zh) 2015-01-01
EP2993157A2 (en) 2016-03-09
CN103153420A (zh) 2013-06-12
JP2013542163A (ja) 2013-11-21
EP2624929A2 (en) 2013-08-14

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