JP2013542163A5 - - Google Patents
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- Publication number
- JP2013542163A5 JP2013542163A5 JP2013532822A JP2013532822A JP2013542163A5 JP 2013542163 A5 JP2013542163 A5 JP 2013542163A5 JP 2013532822 A JP2013532822 A JP 2013532822A JP 2013532822 A JP2013532822 A JP 2013532822A JP 2013542163 A5 JP2013542163 A5 JP 2013542163A5
- Authority
- JP
- Japan
- Prior art keywords
- silane
- distillation column
- fraction
- reduced
- produced
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000077 silane Inorganic materials 0.000 claims description 899
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 897
- 238000004821 distillation Methods 0.000 claims description 385
- 238000000034 method Methods 0.000 claims description 123
- 150000001875 compounds Chemical class 0.000 claims description 116
- 238000009835 boiling Methods 0.000 claims description 110
- 238000011084 recovery Methods 0.000 claims description 86
- 239000007788 liquid Substances 0.000 claims description 69
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 53
- 239000005977 Ethylene Substances 0.000 claims description 53
- KCWYOFZQRFCIIE-UHFFFAOYSA-N ethylsilane Chemical compound CC[SiH3] KCWYOFZQRFCIIE-UHFFFAOYSA-N 0.000 claims description 51
- 238000000926 separation method Methods 0.000 claims description 51
- 239000007789 gas Substances 0.000 claims description 25
- 230000008569 process Effects 0.000 claims description 24
- 150000004756 silanes Chemical class 0.000 claims description 23
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 18
- 230000003247 decreasing effect Effects 0.000 claims description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 10
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims description 10
- 239000000047 product Substances 0.000 claims description 10
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 claims description 9
- 239000002808 molecular sieve Substances 0.000 claims description 9
- 230000009467 reduction Effects 0.000 claims description 9
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 claims description 9
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 8
- 239000005052 trichlorosilane Substances 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 6
- -1 alkaline earth metal silanes Chemical class 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims description 6
- UCXUKTLCVSGCNR-UHFFFAOYSA-N diethylsilane Chemical compound CC[SiH2]CC UCXUKTLCVSGCNR-UHFFFAOYSA-N 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000003513 alkali Substances 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 claims description 5
- 230000007423 decrease Effects 0.000 claims description 4
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 4
- 238000001179 sorption measurement Methods 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 3
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 3
- 239000006096 absorbing agent Substances 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 239000012264 purified product Substances 0.000 claims 1
- 238000000746 purification Methods 0.000 description 19
- 239000012535 impurity Substances 0.000 description 15
- 230000032258 transport Effects 0.000 description 15
- 239000002699 waste material Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000004064 recycling Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 238000009833 condensation Methods 0.000 description 3
- 230000005494 condensation Effects 0.000 description 3
- 238000007323 disproportionation reaction Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 241000183024 Populus tremula Species 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000011234 economic evaluation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- VZKFTDUROKGLBF-UHFFFAOYSA-N ethene ethylsilane Chemical compound C(C)[SiH3].C=C VZKFTDUROKGLBF-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910000856 hastalloy Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000066 reactive distillation Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000011856 silicon-based particle Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US39007510P | 2010-10-05 | 2010-10-05 | |
| US39007810P | 2010-10-05 | 2010-10-05 | |
| US12/898,487 US8524044B2 (en) | 2010-10-05 | 2010-10-05 | Systems for recovering silane from heavy-ends separation operations |
| US61/390,078 | 2010-10-05 | ||
| US61/390,075 | 2010-10-05 | ||
| US12/898,487 | 2010-10-05 | ||
| US12/898,494 | 2010-10-05 | ||
| US12/898,494 US8524048B2 (en) | 2010-10-05 | 2010-10-05 | Processes for recovering silane from heavy-ends separation operations |
| PCT/US2011/052588 WO2012047522A2 (en) | 2010-10-05 | 2011-09-21 | Processes and systems for purifying silane |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013542163A JP2013542163A (ja) | 2013-11-21 |
| JP2013542163A5 true JP2013542163A5 (enExample) | 2014-11-13 |
| JP5826854B2 JP5826854B2 (ja) | 2015-12-02 |
Family
ID=44720191
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013532822A Active JP5826854B2 (ja) | 2010-10-05 | 2011-09-21 | シランを精製する方法及びシステム |
Country Status (6)
| Country | Link |
|---|---|
| EP (2) | EP2624929B1 (enExample) |
| JP (1) | JP5826854B2 (enExample) |
| KR (1) | KR101752949B1 (enExample) |
| CN (1) | CN103153420B (enExample) |
| TW (1) | TWI466826B (enExample) |
| WO (1) | WO2012047522A2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015111886A1 (ko) | 2014-01-24 | 2015-07-30 | 한화케미칼 주식회사 | 폐가스의 정제방법 및 정제장치 |
| US10252916B2 (en) * | 2014-09-04 | 2019-04-09 | Corner Star Limited | Methods for separating halosilanes |
| CN108079608A (zh) * | 2017-12-22 | 2018-05-29 | 天津科创复兴科技咨询有限公司 | 一种有氮气保护的高效的蒸馏提纯设备 |
| CN108751201A (zh) * | 2018-08-09 | 2018-11-06 | 洛阳中硅高科技有限公司 | 乙硅烷的制备装置 |
| CN115092934A (zh) * | 2022-06-21 | 2022-09-23 | 云南通威高纯晶硅有限公司 | 一种控制精制三氯氢硅中二氯氢硅含量的方法及系统 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4632816A (en) | 1982-12-13 | 1986-12-30 | Ethyl Corporation | Process for production of silane |
| US4554141A (en) | 1984-05-14 | 1985-11-19 | Ethyl Corporation | Gas stream purification |
| US4900347A (en) * | 1989-04-05 | 1990-02-13 | Mobil Corporation | Cryogenic separation of gaseous mixtures |
| US5206004A (en) | 1990-04-30 | 1993-04-27 | Ethyl Corporation | Silane compositions and process |
| US5211931A (en) * | 1992-03-27 | 1993-05-18 | Ethyl Corporation | Removal of ethylene from silane using a distillation step after separation using a zeolite molecular sieve |
| CA2203352C (en) * | 1996-06-07 | 2000-08-01 | Walter H. Whitlock | Method and apparatus for purifying a substance |
| ITRM20040570A1 (it) * | 2004-11-19 | 2005-02-19 | Memc Electronic Materials | Procedimento e impianto di purificazione di triclorosilano e di tetracloruro di silicio. |
| CN101817527B (zh) * | 2010-04-16 | 2012-01-25 | 浙江中宁硅业有限公司 | 一种多晶硅生产过程中的电子级硅烷精制提纯的方法 |
-
2011
- 2011-09-21 EP EP11761806.6A patent/EP2624929B1/en active Active
- 2011-09-21 CN CN201180048451.7A patent/CN103153420B/zh active Active
- 2011-09-21 KR KR1020137011660A patent/KR101752949B1/ko active Active
- 2011-09-21 WO PCT/US2011/052588 patent/WO2012047522A2/en not_active Ceased
- 2011-09-21 JP JP2013532822A patent/JP5826854B2/ja active Active
- 2011-09-21 EP EP15170509.2A patent/EP2993157A3/en not_active Withdrawn
- 2011-10-04 TW TW100135942A patent/TWI466826B/zh active
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